TWI653284B - 有機膜形成用組成物 - Google Patents
有機膜形成用組成物 Download PDFInfo
- Publication number
- TWI653284B TWI653284B TW106136454A TW106136454A TWI653284B TW I653284 B TWI653284 B TW I653284B TW 106136454 A TW106136454 A TW 106136454A TW 106136454 A TW106136454 A TW 106136454A TW I653284 B TWI653284 B TW I653284B
- Authority
- TW
- Taiwan
- Prior art keywords
- organic
- film
- organic film
- composition
- forming
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D201/00—Coating compositions based on unspecified macromolecular compounds
- C09D201/02—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
- B05D1/005—Spin coating
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/20—Diluents or solvents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201715669338A | 2017-08-04 | 2017-08-04 | |
US15/669,338 | 2017-08-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI653284B true TWI653284B (zh) | 2019-03-11 |
TW201910420A TW201910420A (zh) | 2019-03-16 |
Family
ID=65366663
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106136454A TWI653284B (zh) | 2017-08-04 | 2017-10-24 | 有機膜形成用組成物 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR102051189B1 (ko) |
CN (1) | CN109388021B (ko) |
TW (1) | TWI653284B (ko) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5859420B2 (ja) * | 2012-01-04 | 2016-02-10 | 信越化学工業株式会社 | レジスト下層膜材料、レジスト下層膜材料の製造方法、及び前記レジスト下層膜材料を用いたパターン形成方法 |
JP5894106B2 (ja) | 2012-06-18 | 2016-03-23 | 信越化学工業株式会社 | レジスト下層膜形成用化合物、これを用いたレジスト下層膜材料、レジスト下層膜形成方法、パターン形成方法 |
CN104838315B (zh) * | 2012-12-14 | 2019-06-07 | 日产化学工业株式会社 | 包含多羟基芳香环酚醛清漆树脂的抗蚀剂下层膜组合物 |
JP6119667B2 (ja) * | 2013-06-11 | 2017-04-26 | 信越化学工業株式会社 | 下層膜材料及びパターン形成方法 |
WO2015008560A1 (ja) * | 2013-07-19 | 2015-01-22 | Dic株式会社 | フェノール性水酸基含有化合物、感光性組成物、レジスト用組成物、レジスト塗膜、硬化性組成物、レジスト下層膜用組成物、及びレジスト下層膜 |
US9580623B2 (en) * | 2015-03-20 | 2017-02-28 | Shin-Etsu Chemical Co., Ltd. | Patterning process using a boron phosphorus silicon glass film |
-
2017
- 2017-10-24 TW TW106136454A patent/TWI653284B/zh active
- 2017-11-21 KR KR1020170155725A patent/KR102051189B1/ko active IP Right Grant
-
2018
- 2018-08-01 CN CN201810863232.8A patent/CN109388021B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN109388021A (zh) | 2019-02-26 |
KR102051189B1 (ko) | 2019-12-02 |
CN109388021B (zh) | 2022-09-27 |
KR20190015060A (ko) | 2019-02-13 |
TW201910420A (zh) | 2019-03-16 |
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