TWI647742B - Light emitting device and method of manufacturing same - Google Patents

Light emitting device and method of manufacturing same Download PDF

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Publication number
TWI647742B
TWI647742B TW107113417A TW107113417A TWI647742B TW I647742 B TWI647742 B TW I647742B TW 107113417 A TW107113417 A TW 107113417A TW 107113417 A TW107113417 A TW 107113417A TW I647742 B TWI647742 B TW I647742B
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light
magnetic element
emitting diode
substrate
pad
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TW107113417A
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Chinese (zh)
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TW201944460A (en
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俞方正
陳振彰
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友達光電股份有限公司
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Priority to CN201810580058.6A priority patent/CN108615741B/en
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Publication of TW201944460A publication Critical patent/TW201944460A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/15Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
    • H01L27/153Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
    • H01L27/156Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Led Device Packages (AREA)

Abstract

一種發光裝置,包括基板、發光二極體、第一電極、第二電極、第一磁性元件以及第二磁性元件。基板具有第一接墊與第二接墊。第一電極與第二電極位於發光二極體上。第一電極電性連接至第一接墊,第二電極電性連接至第二接墊。第一磁性元件形成於基板上,大致環繞第一電極,且不接觸第一接墊與第二接墊。第二磁性元件形成於發光二極體之側邊,且大致位於第一磁性元件的上方,其中第一磁性元件與第二磁性元件系為磁性相吸。本發明還提出一種發光裝置的製造方法。A light emitting device includes a substrate, a light emitting diode, a first electrode, a second electrode, a first magnetic element, and a second magnetic element. The substrate has a first pad and a second pad. The first electrode and the second electrode are located on the light emitting diode. The first electrode is electrically connected to the first pad, and the second electrode is electrically connected to the second pad. The first magnetic element is formed on the substrate, substantially surrounds the first electrode, and does not contact the first pad and the second pad. The second magnetic element is formed on the side of the light emitting diode and is generally located above the first magnetic element. The first magnetic element and the second magnetic element are magnetically attracted. The invention also provides a method for manufacturing a light emitting device.

Description

發光裝置及其製造方法Light emitting device and manufacturing method thereof

本發明是有關於一種發光裝置,且特別是有關於具有磁性元件的發光裝置及其製造方法。 The present invention relates to a light emitting device, and more particularly, to a light emitting device having a magnetic element and a manufacturing method thereof.

微發光二極體顯示器(Micro Light Emitting Device Display,micro LED display)為新一代的顯示技術,其關鍵技術在於如何將大量之微型發光二極體轉移至畫素陣列基板上。 Micro Light Emitting Device Display (micro LED display) is a new generation of display technology. The key technology is how to transfer a large number of micro light emitting diodes to a pixel array substrate.

然而,轉移技術為機械式操作,轉移技術的成效取決於機台精度以及轉印器件本身的精度與良率。當提取微型發光二極體時會遇到機台作動誤差及轉印器件精度誤差,放置微型發光二極體時則會面臨另一次機台作動對位偏差,若微型發光二極體並未放至於正確的位置,將使得微型發光二極體無法正常運作。因此,目前亟需一種能夠解決前述問題的方法。 However, the transfer technology is a mechanical operation, and the effectiveness of the transfer technology depends on the accuracy of the machine and the accuracy and yield of the transfer device itself. When extracting a micro-light-emitting diode, it will encounter machine operation errors and transfer device accuracy errors. When placing a micro-light-emitting diode, it will face another machine operation misalignment. If the micro-light-emitting diode is not placed, As for the correct position, the micro light-emitting diode will not work properly. Therefore, there is an urgent need for a method capable of solving the aforementioned problems.

本發明提供一種發光裝置,其具有較高的產品良率。 The invention provides a light emitting device, which has a high product yield.

本發明亦提供一種發光裝置的製造方法,可以提升微型發光二極體的對位精度。 The invention also provides a manufacturing method of the light emitting device, which can improve the alignment accuracy of the micro light emitting diode.

本發明的一種發光裝置,包括基板、發光二極體、第一電極、第二電極、第一磁性元件以及第二磁性元件。基板具有一第一接墊與一第二接墊。發光二極體位於基板上。第一電極與第二電極位於發光二極體上。第一電極電性連接至第一接墊。第二電極電性連接至第二接墊。第一磁性元件形成於基板上,大致環繞第一電極,且不接觸第一接墊與第二接墊。第二磁性元件形成於發光二極體之側邊,且大致位於第一磁性元件的上方,其中第一磁性元件與第二磁性元件系為磁性相吸。 A light-emitting device of the present invention includes a substrate, a light-emitting diode, a first electrode, a second electrode, a first magnetic element, and a second magnetic element. The substrate has a first pad and a second pad. The light emitting diode is located on the substrate. The first electrode and the second electrode are located on the light emitting diode. The first electrode is electrically connected to the first pad. The second electrode is electrically connected to the second pad. The first magnetic element is formed on the substrate, substantially surrounds the first electrode, and does not contact the first pad and the second pad. The second magnetic element is formed on the side of the light emitting diode and is generally located above the first magnetic element. The first magnetic element and the second magnetic element are magnetically attracted.

本發明的一種發光裝置的製造方法,包括:提供具有第一接墊與第二接墊的基板;形成第一磁性元件於基板上;形成發光二極體於生長基板上;形成第二磁性元件於發光二極體之側邊;將發光二極體以及第二磁性元件轉置於基板上,且第二磁性元件與第一磁性元件磁性相吸;固定發光二極體於基板上;電性連接發光二極體與第一接墊;以及電性連接發光二極體與第二接墊。 A method for manufacturing a light emitting device according to the present invention includes: providing a substrate having a first pad and a second pad; forming a first magnetic element on the substrate; forming a light emitting diode on a growth substrate; and forming a second magnetic element On the side of the light emitting diode; transferring the light emitting diode and the second magnetic element onto the substrate, and the second magnetic element magnetically attracts the first magnetic element; fixing the light emitting diode on the substrate; electrical Connecting the light emitting diode and the first pad; and electrically connecting the light emitting diode and the second pad.

基於上述,藉由第二磁性元件大致位於第一磁性元件的上方,並當接近至一定距離後產生的磁性相吸,進而達到自組裝的效果。如此一來,具有上述的磁性元件能提升微型發光二極體的對位精度,使得製造出的發光裝置具有較高的產品良率。 Based on the above, the second magnetic element is located substantially above the first magnetic element, and the magnetic attraction generated after approaching to a certain distance, thereby achieving the effect of self-assembly. In this way, the above-mentioned magnetic element can improve the alignment accuracy of the micro-light-emitting diode, so that the manufactured light-emitting device has a higher product yield.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 In order to make the above features and advantages of the present invention more comprehensible, embodiments are hereinafter described in detail with reference to the accompanying drawings.

10、20、30、40、50‧‧‧發光裝置 10, 20, 30, 40, 50‧‧‧ light-emitting devices

100‧‧‧基板 100‧‧‧ substrate

110‧‧‧第一磁性元件 110‧‧‧first magnetic element

112、142‧‧‧光阻材料 112, 142‧‧‧Photoresistive materials

114、144‧‧‧磁性粒子 114, 144‧‧‧ magnetic particles

120A‧‧‧第一導電結構 120A‧‧‧First conductive structure

120B‧‧‧第二導電結構 120B‧‧‧Second conductive structure

200‧‧‧生長基板 200‧‧‧ Growth substrate

130、430‧‧‧發光二極體 130, 430‧‧‧light-emitting diodes

132、432‧‧‧第一電極 132, 432‧‧‧ First electrode

134、434‧‧‧第二電極 134, 434‧‧‧Second electrode

138‧‧‧反射層 138‧‧‧Reflective layer

136、436‧‧‧絕緣層 136, 436‧‧‧ Insulation

140‧‧‧第二磁性元件 140‧‧‧Second magnetic element

210‧‧‧犧牲層 210‧‧‧ sacrificial layer

220、420、420’‧‧‧繫鏈結構 220, 420, 420’‧chain structure

230‧‧‧中介基板 230‧‧‧ intermediary substrate

300‧‧‧拾取結構 300‧‧‧Pick up structure

L1‧‧‧第一導線 L1‧‧‧first lead

L2‧‧‧第二導線 L2‧‧‧Second Conductor

410‧‧‧黏著層 410‧‧‧Adhesive layer

CH‧‧‧通道 CH‧‧‧channel

COM‧‧‧共用電極 COM‧‧‧Common electrode

D‧‧‧汲極 D‧‧‧ Drain

DL‧‧‧資料線 DL‧‧‧Data Line

G‧‧‧閘極 G‧‧‧Gate

LL‧‧‧發光層 LL‧‧‧Light-emitting layer

P‧‧‧光阻層 P‧‧‧Photoresistive layer

P1‧‧‧第一接墊 P1‧‧‧The first pad

P2‧‧‧第二接墊 P2‧‧‧Second pad

S‧‧‧源極 S‧‧‧Source

SL‧‧‧掃描線 SL‧‧‧scan line

SM1、SM2‧‧‧半導體層 SM1, SM2‧‧‧ semiconductor layer

T‧‧‧開關元件 T‧‧‧switching element

W1、W2‧‧‧寬度 W1, W2‧‧‧Width

圖1是依照本發明一實施例的一種發光裝置的俯視示意圖。 FIG. 1 is a schematic top view of a light emitting device according to an embodiment of the present invention.

圖2A~圖2G是圖1之發光裝置的製造方法的剖面示意圖。 2A to 2G are schematic cross-sectional views of a method for manufacturing the light-emitting device of FIG. 1.

圖3是依照本發明一實施例的一種發光裝置的俯視示意圖。 FIG. 3 is a schematic top view of a light emitting device according to an embodiment of the present invention.

圖4是依照本發明一實施例的一種發光裝置的俯視示意圖。 FIG. 4 is a schematic top view of a light emitting device according to an embodiment of the present invention.

圖5A~圖5F是圖4之發光裝置的製造方法的剖面示意圖。 5A to 5F are schematic cross-sectional views of a method for manufacturing the light-emitting device of FIG. 4.

圖6是依照本發明一實施例的一種發光裝置的俯視示意圖。 FIG. 6 is a schematic top view of a light emitting device according to an embodiment of the invention.

圖7是依照本發明一實施例的一種發光裝置的俯視示意圖。 FIG. 7 is a schematic top view of a light emitting device according to an embodiment of the invention.

圖8A~圖8C是依照本發明一實施例的一種發光裝置的製造方法的剖面示意圖。 8A-8C are schematic cross-sectional views of a method for manufacturing a light-emitting device according to an embodiment of the invention.

以下將以圖式揭露本發明之多個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明部分實施方式中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式為之。 Several embodiments of the present invention will be disclosed in the following drawings. For the sake of clear description, many practical details will be described in the following description. It should be understood, however, that these practical details should not be used to limit the invention. That is, in some embodiments of the present invention, these practical details are unnecessary. In addition, in order to simplify the drawings, some conventional structures and elements will be shown in the drawings in a simple and schematic manner.

在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件“上”或 “連接到”另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反地,當元件被稱為“直接在另一元件上”或“直接連接到”另一元件時,不存在中間元件。如本文所使用的,“連接”可以指物理及/或電性連接。然而,電性連接係為二元件間存在其它元件。 In the drawings, the thicknesses of layers, films, panels, regions, etc. are exaggerated for clarity. Throughout the description, the same reference numerals denote the same elements. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" another element or When "connected to" another element, it may be directly on or connected to the other element, or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to a physical and / or electrical connection. However, the electrical connection is such that there are other elements between the two elements.

應當理解,儘管術語“第一”與“第二”等在本文中可以用於描述各種元件、部件、區域、層及/或部分,但是這些元件、部件、區域、及/或部分不應受這些術語的限制。這些術語僅用於將一個元件、部件、區域、層或部分與另一個元件、部件、區域、層或部分區分開。因此,下面討論的“第一元件”、“部件”、“區域”、“層”、或“部分”可以被稱為第二元件、部件、區域、層或部分而不脫離本文的教導。 It should be understood that, although the terms "first" and "second" etc. may be used herein to describe various elements, components, regions, layers and / or sections, these elements, components, regions, and / or sections should not be affected Limitations of these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a "first element," "component," "region," "layer," or "portion" discussed below may be termed a second element, component, region, layer, or section without departing from the teachings herein.

這裡使用的術語僅僅是為了描述特定實施例的目的,而不是限制性的。如本文所使用的,除非內容清楚地指示,否則單數形式“一”、“一個”和“該”旨在包括複數形式,包括“至少一個”。“或”表示“及/或”。如本文所使用的,術語“及/或”包括一個或多個相關所列項目的任何和所有組合。還應當理解,當在本說明書中使用時,術語“包括”及/或“包括”指定所述特徵、區域、整體、步驟、操作、元件的存在及/或部件,但不排除一個或多個其它特徵、區域整體、步驟、操作、元件、部件及/或其組合的存在或添加。 The terminology used herein is for the purpose of describing particular embodiments only and is not limiting. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms including "at least one" unless the content clearly indicates otherwise. "Or" means "and / or". As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items. It should also be understood that when used in this specification, the terms "including" and / or "including" designate the stated features, regions, wholes, steps, operations, presence of elements and / or components, but do not exclude one or more The presence or addition of other features, areas as a whole, steps, operations, elements, components, and / or combinations thereof.

此外,諸如“下”或“底部”和“上”或“頂部”的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理 解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其他元件的“下”側的元件將被定向在其他元件的“上”側。因此,示例性術語“下”可以包括“下”和“上”的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件“下”或“下方”的元件將被定向為在其它元件“上方”。因此,示例性術語“下”或“下面”可以包括上方和下方的取向。 In addition, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe the relationship of one element to another element, as shown. Should be Solution, relative terms are intended to include different orientations of the device in addition to the orientations shown in the figures. For example, if the device in one of the figures is turned over, elements described as being on the "lower" side of other elements would then be oriented on "upper" sides of the other elements. Thus, the exemplary term "down" may include orientations of "down" and "up", depending on the particular orientation of the drawings. Similarly, if the device in one of the figures is turned over, elements described as "below" or "beneath" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "below" or "below" may include orientations above and below.

本文使用的“約”或“實質上”包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,“約”可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。再者,本文使用的“約”或“實質上”可依光學性質、蝕刻性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。 As used herein, "about" or "substantially" includes the stated value and an average value within an acceptable deviation range of a particular value determined by one of ordinary skill in the art, taking into account the measurement in question and measurement-related errors. A specific number (ie, a limitation of the measurement system). For example, "about" may mean within one or more standard deviations of the stated value, or within ± 30%, ± 20%, ± 10%, ± 5%. Furthermore, "about" or "substantially" as used herein may select a more acceptable range of deviations or standard deviations according to optical properties, etching properties, or other properties, and all properties may not be applied without one standard deviation.

圖1是依照本發明一實施例的一種發光裝置的俯視示意圖。圖2A~圖2G是圖1之發光裝置的製造方法的剖面示意圖。圖2G是沿圖1之AA’線剖面的示意圖,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。 FIG. 1 is a schematic top view of a light emitting device according to an embodiment of the present invention. 2A to 2G are schematic cross-sectional views of a method for manufacturing the light-emitting device of FIG. 1. FIG. 2G is a schematic cross-sectional view taken along the line AA 'in FIG. 1, in which the same or similar reference numerals are used to indicate the same or similar elements, and the description of the same technical content is omitted.

請參考圖2A,提供基板100。基板100具有第一接墊P1與第二接墊P2。第一接墊P1與第一導線L1電性連接。第二接墊P2與第二導線L2電性連接。第一接墊P1與第二接墊P2垂直投影於基板100上的形狀例如是圓形、橢圓形或多邊形,但本發明 並不限於此。 Referring to FIG. 2A, a substrate 100 is provided. The substrate 100 includes a first pad P1 and a second pad P2. The first pad P1 is electrically connected to the first lead L1. The second pad P2 is electrically connected to the second lead L2. The shape of the first pad P1 and the second pad P2 perpendicularly projected on the substrate 100 is, for example, a circle, an oval, or a polygon, but the present invention It is not limited to this.

於基板100上形成第一磁性元件110,其中第一磁性元件110大致環繞第一接墊P1(例如是於垂直基板100的方向上觀察),且第一磁性元件110不接觸第一接墊P1與第二接墊P2。第一磁性元件110具有寬度W1。在本實施例中,第一磁性元件110包含光阻材料112以及分散於其中的多個磁性粒子114。由於第一磁性元件110包含光阻材料112,因此第一磁性元件110可藉由黃光製程獲得所欲形成的形狀及大小,以提升製程的簡易性。在一些實施例中,光阻材料112例如包括負型光阻樹脂或正型光阻樹脂,磁性粒子114例如包括鐵、鈷、鎳、釓等鐵磁材料或是鐵磁材料合金或是鐵磁與非鐵磁材料合金之組合,然而本發明不以此為限。在本實施例中,磁性粒子114的粒徑小於350奈米,較佳為5nm~50nm。如此一來,可減少磁性粒子114造成的紫外線曝光散射,提升第一磁性元件110的製程良率。 A first magnetic element 110 is formed on the substrate 100, wherein the first magnetic element 110 substantially surrounds the first pad P1 (for example, viewed in a direction perpendicular to the substrate 100), and the first magnetic element 110 does not contact the first pad P1 With the second pad P2. The first magnetic element 110 has a width W1. In this embodiment, the first magnetic element 110 includes a photoresist material 112 and a plurality of magnetic particles 114 dispersed therein. Since the first magnetic element 110 includes a photoresist material 112, the first magnetic element 110 can obtain a desired shape and size through a yellow light process, so as to improve the simplicity of the process. In some embodiments, the photoresist material 112 includes, for example, a negative photoresist resin or a positive photoresist resin, and the magnetic particles 114 include ferromagnetic materials such as iron, cobalt, nickel, and rhenium, or ferromagnetic material alloys, or ferromagnetic In combination with a non-ferromagnetic material alloy, the present invention is not limited thereto. In this embodiment, the particle size of the magnetic particles 114 is less than 350 nm, and preferably 5 nm to 50 nm. In this way, the ultraviolet exposure and scattering caused by the magnetic particles 114 can be reduced, and the process yield of the first magnetic element 110 can be improved.

請參考圖2B,於第一接墊P1上形成第一導電結構120A,其中第一磁性元件110環繞第一導電結構120A。形成第一導電結構120A的方法例如選自印刷、電鍍、沉積及微影製程。 Referring to FIG. 2B, a first conductive structure 120A is formed on the first pad P1, and the first magnetic element 110 surrounds the first conductive structure 120A. The method of forming the first conductive structure 120A is selected from, for example, printing, plating, deposition, and lithography processes.

第一導電結構120A例如為焊料,第一導電結構120A的材料可以包括金屬、導電有機物、導電膠材或是其組合。第一導電結構120A垂直投影於基板100上的形狀例如是圓形、橢圓形或其他幾何形狀,但本發明並不限於此。 The first conductive structure 120A is, for example, solder. The material of the first conductive structure 120A may include a metal, a conductive organic substance, a conductive adhesive, or a combination thereof. The shape of the first conductive structure 120A perpendicularly projected on the substrate 100 is, for example, a circle, an oval, or other geometric shapes, but the present invention is not limited thereto.

請參考圖2C,於生長基板200上形成發光二極體130。 生長基板200可為藍寶石基板、磷化鎵基板、砷化鎵基板、碳化矽基板或是其他可適用的基板。發光二極體130例如包括半導體層SM1、發光層LL、半導體層SM2以及絕緣層136。在一些實施例中,發光二極體130還包括反射層138。反射層138位於發光二極體130的表面,但本發明不以此為限。反射層138的材料例如包括鋁、銀或是其組合,然而本發明不以此為限。半導體層SM1與半導體層SM2例如是不同導電型態的半導體層。舉例而言,若半導體層SM1為N型半導體層,則半導體層SM2為P型半導體層,然而本發明不以此為限。絕緣層136環繞半導體層SM1、發光層LL及半導體層SM2。反射層138位於絕緣層136上。絕緣層136及反射層138暴露出部份的半導體層SM2的表面。形成第一電極132於半導體層SM2上。在本實施例中,發光二極體130可以是垂直式發光二極體,但本發明不以此為限。在另一些實施例中,發光二極體130亦可以是水平式發光二極體。 Please refer to FIG. 2C, a light emitting diode 130 is formed on the growth substrate 200. The growth substrate 200 may be a sapphire substrate, a gallium phosphide substrate, a gallium arsenide substrate, a silicon carbide substrate, or other applicable substrates. The light emitting diode 130 includes, for example, a semiconductor layer SM1, a light emitting layer LL, a semiconductor layer SM2, and an insulating layer 136. In some embodiments, the light emitting diode 130 further includes a reflective layer 138. The reflective layer 138 is located on the surface of the light emitting diode 130, but the invention is not limited thereto. The material of the reflective layer 138 includes, for example, aluminum, silver, or a combination thereof, but the present invention is not limited thereto. The semiconductor layer SM1 and the semiconductor layer SM2 are, for example, semiconductor layers of different conductivity types. For example, if the semiconductor layer SM1 is an N-type semiconductor layer, the semiconductor layer SM2 is a P-type semiconductor layer, but the present invention is not limited thereto. The insulating layer 136 surrounds the semiconductor layer SM1, the light emitting layer LL, and the semiconductor layer SM2. The reflective layer 138 is located on the insulating layer 136. The insulating layer 136 and the reflective layer 138 expose a part of the surface of the semiconductor layer SM2. A first electrode 132 is formed on the semiconductor layer SM2. In this embodiment, the light emitting diode 130 may be a vertical light emitting diode, but the present invention is not limited thereto. In other embodiments, the light emitting diode 130 may also be a horizontal light emitting diode.

接著,於發光二極體130之側邊形成第二磁性元件140。在本實施例中,第二磁性元件140包括互相分離的多個部分,但本發明不以此為限。在其他實施例中,第二磁性元件140環繞發光二極體130一圈,且並未包括互相分離的部分。在本實施例中,第二磁性元件140包含光阻材料142以及分散於其中的多個磁性粒子144。由於第二磁性元件140包含光阻材料142,因此可藉由黃光製程獲得所欲形成的形狀及大小,以提升製程的簡易性。在一些實施例中,光阻材料142例如包括負型光阻樹脂或正型光阻樹 脂,磁性粒子144例如包括鐵、鈷、鎳或其他材料或是多種材料之組合,然而本發明不以此為限。在本實施例中,磁性粒子144的粒徑小於350奈米,較佳為5nm~50nm。如此一來,可減少磁性粒子144造成的紫外線曝光散射,提升第二磁性元件140的製程良率。此外,磁性粒子144的磁化率為5*10-4~0.5emu/g可具有適當的磁吸能力,以執行自組裝的製程。 Next, a second magnetic element 140 is formed on the side of the light emitting diode 130. In this embodiment, the second magnetic element 140 includes a plurality of parts separated from each other, but the present invention is not limited thereto. In other embodiments, the second magnetic element 140 surrounds the light emitting diode 130 once, and does not include separate parts. In this embodiment, the second magnetic element 140 includes a photoresist material 142 and a plurality of magnetic particles 144 dispersed therein. Since the second magnetic element 140 includes a photoresist material 142, the desired shape and size can be obtained by the yellow light process, so as to improve the simplicity of the process. In some embodiments, the photoresist material 142 includes, for example, a negative photoresist resin or a positive photoresist resin, and the magnetic particles 144 include, for example, iron, cobalt, nickel, or other materials or a combination of multiple materials. Limited. In this embodiment, the particle size of the magnetic particles 144 is less than 350 nm, and preferably 5 nm to 50 nm. In this way, the ultraviolet exposure and scattering caused by the magnetic particles 144 can be reduced, and the process yield of the second magnetic element 140 can be improved. In addition, the magnetic particle 144 has a magnetic susceptibility of 5 * 10 -4 to 0.5 emu / g, and may have a proper magnetic attraction ability to perform a self-assembly process.

第二磁性元件140的寬度W2較佳大於第一磁性元件110的寬度W1,以使第二磁性元件140於後續的製程中更容易對準於第一磁性元件110,但本發明不以此為限。在一些實施例中,第二磁性元件140的高度加上第一磁性元件110的高度大於或等於發光二極體130的高度。此外,第一磁性元件110與第二磁性元件140可以是相同的材料,亦可以是不同的材料。也就是說,光阻材料112及光阻材料142可以是相同或是不同的材料,磁性粒子114及磁性粒子144可以是相同或是不同的材料,只要第一磁性元件110與第二磁性元件140能夠磁性相吸即可。 The width W2 of the second magnetic element 140 is preferably larger than the width W1 of the first magnetic element 110, so that the second magnetic element 140 is more easily aligned with the first magnetic element 110 in subsequent processes, but the present invention does not take this as limit. In some embodiments, the height of the second magnetic element 140 plus the height of the first magnetic element 110 is greater than or equal to the height of the light emitting diode 130. In addition, the first magnetic element 110 and the second magnetic element 140 may be the same material or different materials. That is, the photoresist material 112 and the photoresist material 142 may be the same or different materials, and the magnetic particles 114 and the magnetic particles 144 may be the same or different materials, as long as the first magnetic element 110 and the second magnetic element 140 It can be magnetically attracted.

請參考圖2D,形成犧牲層210包覆第二磁性元件140以及發光二極體130。接著,於第二磁性元件140以及發光二極體130上形成繫鏈結構220及中介基板230。繫鏈結構220至少部分接觸於發光二極體130、發光二極體130上之第一電極132、絕緣層136或反射層138。舉例來說,犧牲層210具有暴露出第一電極132的開口,且繫鏈結構220透過犧牲層210之開口而與第一電極132接觸。 Referring to FIG. 2D, a sacrificial layer 210 is formed to cover the second magnetic element 140 and the light emitting diode 130. Next, a tether structure 220 and an interposer substrate 230 are formed on the second magnetic element 140 and the light emitting diode 130. The tether structure 220 is at least partially in contact with the light-emitting diode 130, the first electrode 132, the insulating layer 136, or the reflective layer 138 on the light-emitting diode 130. For example, the sacrificial layer 210 has an opening exposing the first electrode 132, and the tether structure 220 is in contact with the first electrode 132 through the opening of the sacrificial layer 210.

請參考圖2E,移除生長基板200,以暴露出發光二極體130的半導體SM1的表面。形成第二電極134於半導體SM1的表面上。移除犧牲層210,其中第二電極134例如是形成於移除犧牲層210之前,但本發明不以此為限。 Referring to FIG. 2E, the growth substrate 200 is removed to expose the surface of the semiconductor SM1 of the light emitting diode 130. A second electrode 134 is formed on the surface of the semiconductor SM1. The sacrificial layer 210 is removed. The second electrode 134 is formed before the sacrificial layer 210 is removed, but the invention is not limited thereto.

請參考圖2F,以拾取結構300同時拾取多個發光二極體130、第一電極132、第二電極134以及位於每一個發光二極體130的兩側的第二磁性元件140,為了方便示意,圖2F以拾取一個發光二極體130及其周圍的元件為例。在前述的拾取過程中,發光二極體130因拾取所產生的機械力而從繫鏈結構220及中介基板230上剝離。在一些實施例中,拾取結構300可以是利用真空吸引力、靜電吸附力或是凡德瓦爾力(Van Der Waals force)以吸附發光二極體130及第二磁性元件140。在一些實施例中,拾取結構300的材料例如包括聚二甲基矽氧烷、橡膠或其它合適的材料。在本實施例中,拾取結構300的材料為聚二甲基矽氧烷,並利用凡德瓦爾力吸附發光二極體130及第二磁性元件140。 Please refer to FIG. 2F, a plurality of light-emitting diodes 130, a first electrode 132, a second electrode 134, and second magnetic elements 140 on both sides of each light-emitting diode 130 are picked up at the same time by the picking structure 300. FIG. 2F takes a light-emitting diode 130 and its surrounding components as an example. In the aforementioned pickup process, the light emitting diode 130 is peeled from the tether structure 220 and the interposer substrate 230 due to the mechanical force generated by the pickup. In some embodiments, the pickup structure 300 may use a vacuum attraction force, an electrostatic adsorption force, or a Van Der Waals force to attract the light emitting diode 130 and the second magnetic element 140. In some embodiments, the material of the pick-up structure 300 includes, for example, polydimethylsiloxane, rubber, or other suitable materials. In this embodiment, the material of the pick-up structure 300 is polydimethylsiloxane, and the light emitting diode 130 and the second magnetic element 140 are adsorbed by Van der Waals force.

接著,將發光二極體130、第一電極132、第二電極134及第二磁性元件140轉置於基板100上。並且,第二磁性元件140大致位於第一磁性元件110的上方,使得第二磁性元件140與第一磁性元件110能磁性相吸。因此,第二磁性元件140及第一磁性元件110之間的磁性相吸可以改善轉置過程中產生偏差的問題。 Next, the light emitting diode 130, the first electrode 132, the second electrode 134, and the second magnetic element 140 are transferred onto the substrate 100. In addition, the second magnetic element 140 is located substantially above the first magnetic element 110, so that the second magnetic element 140 and the first magnetic element 110 can magnetically attract each other. Therefore, the magnetic attraction between the second magnetic element 140 and the first magnetic element 110 can improve the problem of deviation during the transposition process.

請參考圖1與圖2G,將發光二極體130固定於基板100上,以基本上大致完成發光裝置10的製造過程。第一磁性元件110 之內緣與發光二極體130之間的距離G小於10μm,較佳為1μm~4μm,因此,發光二極體130能較佳的對位於基板100上。在本實施例中,第一磁性元件110連續地環繞發光二極體130,然而本發明不以此為限。在其他實施例中,第一磁性元件110亦可以是不連續地環繞發光二極體130。 Referring to FIGS. 1 and 2G, the light-emitting diode 130 is fixed on the substrate 100 to substantially complete the manufacturing process of the light-emitting device 10. First magnetic element 110 The distance G between the inner edge of the inner edge and the light emitting diode 130 is less than 10 μm, and preferably 1 μm to 4 μm. Therefore, the light emitting diode 130 can be better positioned on the substrate 100. In this embodiment, the first magnetic element 110 continuously surrounds the light emitting diode 130, but the present invention is not limited thereto. In other embodiments, the first magnetic element 110 may also discontinuously surround the light emitting diode 130.

第一電極132藉由第一導電結構120A電性連接至第一接墊P1。形成第二導電結構120B以電性連接第二電極134至第二接墊P2。第二導電結構120B之材料可為金屬、銦錫氧化物、銦鋅氧化物、導電有機物、導電膠材或是其他可適用的材料。 The first electrode 132 is electrically connected to the first pad P1 through the first conductive structure 120A. A second conductive structure 120B is formed to electrically connect the second electrode 134 to the second pad P2. The material of the second conductive structure 120B may be metal, indium tin oxide, indium zinc oxide, conductive organic matter, conductive glue, or other applicable materials.

請參考圖1,畫素結構設置於基板100中,每一畫素結構跟對應的掃描線SL與資料線DL電性連接。掃描線SL與資料線DL彼此交錯設置,且掃描線SL與資料線DL之間夾有絕緣層(未繪示)。換句話說,掃描線SL的延伸方向與資料線DL的延伸方向不平行,較佳的是掃描線SL的延伸方向與資料線DL的延伸方向垂直。基於導電性的考量,掃描線SL與資料線DL一般是使用金屬材料,但本發明不限於此。 Please refer to FIG. 1, a pixel structure is disposed in the substrate 100, and each pixel structure is electrically connected to a corresponding scan line SL and a data line DL. The scan lines SL and the data lines DL are arranged alternately with each other, and an insulation layer (not shown) is sandwiched between the scan lines SL and the data lines DL. In other words, the extending direction of the scanning line SL is not parallel to the extending direction of the data line DL. It is preferable that the extending direction of the scanning line SL is perpendicular to the extending direction of the data line DL. Based on the consideration of conductivity, the scan lines SL and the data lines DL are generally made of metal materials, but the present invention is not limited thereto.

在本實施例中,畫素結構包括開關元件T。開關元件T與掃描線SL以及資料線DL電性連接,且發光二極體130與開關元件T電性連接。開關元件T包括閘極G、通道CH、源極S以及汲極D。閘極絕緣層(未繪示)設置在通道CH與閘極G之間。源極S以及汲極D分別與通道CH電性連接。開關元件T的閘極G與掃描線SL連接,且開關元件T的源極S與資料線DL連接。此 外,開關元件T的汲極D與發光二極體130電性連接。本實施例中之開關元件T是以底部閘極型薄膜電晶體為例來說明,但本發明不限於此。在其他實施例中,上述之開關元件T也可以是頂部閘極型薄膜電晶體。 In this embodiment, the pixel structure includes a switching element T. The switching element T is electrically connected to the scanning line SL and the data line DL, and the light emitting diode 130 is electrically connected to the switching element T. The switching element T includes a gate G, a channel CH, a source S, and a drain D. A gate insulating layer (not shown) is disposed between the channel CH and the gate G. The source S and the drain D are electrically connected to the channel CH, respectively. The gate G of the switching element T is connected to the scanning line SL, and the source S of the switching element T is connected to the data line DL. this In addition, the drain D of the switching element T is electrically connected to the light emitting diode 130. The switching element T in this embodiment is described by taking a bottom gate thin film transistor as an example, but the present invention is not limited thereto. In other embodiments, the switching element T described above may also be a top-gate thin film transistor.

在一些實施例中,畫素結構包括一個以上的開關元件T、一個以上的驅動元件以及被動元件,但本發明不以此為限。 In some embodiments, the pixel structure includes more than one switching element T, more than one driving element, and passive elements, but the present invention is not limited thereto.

請再參考圖1,藉由第一導線L1電性連接第一接墊P1與開關元件T的汲極D,以及藉由第二導線L2電性連接第二接墊P2與共用電極COM,使得發光二極體130可以分別電性連接至開關元件T以及共用電極COM。其中,共用電極COM的延伸方向與掃描線SL的延伸方向例如為平行,但本發明不以此為限。在其他實施例中,共用電極COM的延伸方向與資料線DL的延伸方向例如為平行。在一些實施例中,共用電極COM與掃描線SL或資料線DL屬於同一膜層,但本發明不以此為限。共用電極COM電性連接至一共用電壓(Vcom)。 Please refer to FIG. 1 again, the first pad P1 and the drain D of the switching element T are electrically connected through the first wire L1, and the second pad P2 and the common electrode COM are electrically connected through the second wire L2, so that The light emitting diode 130 may be electrically connected to the switching element T and the common electrode COM, respectively. Wherein, the extending direction of the common electrode COM is parallel to the extending direction of the scanning line SL, but the invention is not limited thereto. In other embodiments, the extending direction of the common electrode COM is parallel to the extending direction of the data line DL, for example. In some embodiments, the common electrode COM and the scan line SL or the data line DL belong to the same film layer, but the present invention is not limited thereto. The common electrode COM is electrically connected to a common voltage (Vcom).

圖3是依照本發明一實施例的一種發光裝置的俯視示意圖。在此必須說明的是,圖3的實施例沿用圖1的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。 FIG. 3 is a schematic top view of a light emitting device according to an embodiment of the present invention. It must be noted here that the embodiment of FIG. 3 inherits the component numbers and parts of the embodiment of FIG. 1, wherein the same or similar reference numerals are used to represent the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and details are not described herein.

圖1之實施例與圖3之實施例的差異在於:圖1之發光裝置10的第二導電結構120B於垂直於基板100的方向上與第一 磁性元件110以及第二磁性元件140重疊,圖3之發光裝置20的第二導電結構120B則是於垂直於基板100的方向上與第一磁性元件110重疊且與第二磁性元件140不重疊。 The difference between the embodiment of FIG. 1 and the embodiment of FIG. 3 is that the second conductive structure 120B of the light emitting device 10 of FIG. 1 is perpendicular to the first conductive structure 120B in a direction perpendicular to the substrate 100. The magnetic element 110 and the second magnetic element 140 overlap, and the second conductive structure 120B of the light emitting device 20 of FIG. 3 overlaps the first magnetic element 110 and does not overlap the second magnetic element 140 in a direction perpendicular to the substrate 100.

圖4是依照本發明一實施例的一種發光裝置的俯視示意圖。圖5A~圖5F是圖4之發光裝置的製造方法的剖面示意圖。在此必須說明的是,圖5F是沿圖4之BB’線剖面的示意圖,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。 FIG. 4 is a schematic top view of a light emitting device according to an embodiment of the present invention. 5A to 5F are schematic cross-sectional views of a method for manufacturing the light-emitting device of FIG. 4. It must be noted here that FIG. 5F is a schematic cross-sectional view taken along the line BB 'in FIG. 4, in which the same or similar reference numerals are used to indicate the same or similar elements, and the description of the same technical content is omitted.

請參考圖5A,圖5A的步驟類似於圖2A,兩者的差別在於圖5A中的第一磁性元件110未環繞第一接墊P1。 Please refer to FIG. 5A. The steps in FIG. 5A are similar to those in FIG. 2A. The difference between the two is that the first magnetic element 110 in FIG. 5A does not surround the first pad P1.

請參考圖5B,於基板100上形成黏著層410,第一磁性元件110環繞黏著層410。在本實施例中,黏著層410僅位於第一磁性元件110中,但本發明不以此為限。在其他實施例中,部分黏著層410可以位於第一磁性元件110外。 Referring to FIG. 5B, an adhesive layer 410 is formed on the substrate 100, and the first magnetic element 110 surrounds the adhesive layer 410. In this embodiment, the adhesive layer 410 is only located in the first magnetic element 110, but the invention is not limited thereto. In other embodiments, part of the adhesive layer 410 may be located outside the first magnetic element 110.

請參考圖5C,在本實施例中,發光二極體430為水平式發光二極體,且其包括半導體層SM1、發光層LL、半導體層SM2以及絕緣層436。發光二極體430的半導體層SM2以及半導體層SM1分別電性連接至第一電極432以及第二電極434。在本實施例中,例如是先於生長基板上形成發光二極體430、第一電極432以及第二電極434,並在發光二極體430之側邊形成第二磁性元件140之後,藉由雷射剝離製程將發光二極體430、第一電極432、第二電極434及第二磁性元件140轉置於犧牲層210以及中介基 板230上。在本實施例中,犧牲層210並未包覆發光二極體430,而是位於發光二極體430以及第二磁性元件140的下方。中介基板230位於第二磁性元件140的下方。犧牲層210具有暴露出中介基板230的開口O。 Please refer to FIG. 5C. In this embodiment, the light emitting diode 430 is a horizontal light emitting diode, and includes a semiconductor layer SM1, a light emitting layer LL, a semiconductor layer SM2, and an insulating layer 436. The semiconductor layer SM2 and the semiconductor layer SM1 of the light-emitting diode 430 are electrically connected to the first electrode 432 and the second electrode 434, respectively. In this embodiment, for example, the light-emitting diode 430, the first electrode 432, and the second electrode 434 are formed on the growth substrate, and the second magnetic element 140 is formed on the side of the light-emitting diode 430. The laser lift-off process transfers the light-emitting diode 430, the first electrode 432, the second electrode 434, and the second magnetic element 140 to the sacrificial layer 210 and the interposer. Board 230. In this embodiment, the sacrifice layer 210 does not cover the light emitting diode 430, but is located under the light emitting diode 430 and the second magnetic element 140. The interposer substrate 230 is located below the second magnetic element 140. The sacrificial layer 210 has an opening O exposing the interposer substrate 230.

接著請參考圖5D,繫鏈結構420是在發光二極體430及第二磁性元件140轉置於犧牲層210以及中介基板230上之後,形成於發光二極體430上,並暴露出位於發光二極體430上的第一電極432以及第二電極434。繫鏈結構420填入犧牲層210的開口O,並與中介基板230接觸。請參考圖5E,移除犧牲層210。 5D, the tether structure 420 is formed on the light-emitting diode 430 after the light-emitting diode 430 and the second magnetic element 140 are transferred onto the sacrificial layer 210 and the interposer 230, and the light-emitting diode 430 is exposed. The first electrode 432 and the second electrode 434 on the diode 430. The tether structure 420 fills the opening O of the sacrificial layer 210 and is in contact with the interposer substrate 230. Referring to FIG. 5E, the sacrificial layer 210 is removed.

請參考圖4與圖5F,將發光二極體430、第一電極432、第二電極434以及第二磁性元件140轉置於如圖5B所示的基板100上。 Referring to FIGS. 4 and 5F, the light-emitting diode 430, the first electrode 432, the second electrode 434, and the second magnetic element 140 are transferred onto the substrate 100 as shown in FIG. 5B.

在本實施例中,部分的繫鏈結構420殘留於發光二極體430以及第二磁性元件140上,舉例來說,在轉置製程之後,一部份的繫鏈結構420與中介基板230分離,並於發光二極體430以及第二磁性元件140上形成繫鏈結構420’。繫鏈結構420’暴露出發光二極體430的第一電極432以及第二電極434。在本實施例中,藉由第二磁性元件140與第一磁性元件110磁性相吸的過程中,能夠更準確的將發光二極體430設置於基板100上。在本實施例中,於垂直於基板100的方向上,黏著層410位於發光二極體430與基板100之間,且於平行於基板100的方向上,黏著層410被第一磁性元件110至少部分環繞。藉由黏著層410可提升發 光二極體430以及基板100之間的貼附力。 In this embodiment, part of the tether structure 420 remains on the light-emitting diode 430 and the second magnetic element 140. For example, after the transposition process, part of the tether structure 420 is separated from the interposer substrate 230. A tether structure 420 ′ is formed on the light-emitting diode 430 and the second magnetic element 140. The tether structure 420 'exposes the first electrode 432 and the second electrode 434 of the light emitting diode 430. In this embodiment, during the process of magnetic attraction between the second magnetic element 140 and the first magnetic element 110, the light-emitting diode 430 can be more accurately disposed on the substrate 100. In this embodiment, the adhesive layer 410 is located between the light-emitting diode 430 and the substrate 100 in a direction perpendicular to the substrate 100 and is parallel to the substrate 100 by at least the first magnetic element 110. Partially wrapped. Hair can be enhanced by the adhesive layer 410 Adhesive force between the photodiode 430 and the substrate 100.

第一導電結構120A形成於第一電極432上,並且電性連接第一電極432至第一接墊P1。第二導電結構120B形成於第二電極434上,並且電性連接第二電極434至第二接墊P2。 The first conductive structure 120A is formed on the first electrode 432 and is electrically connected to the first electrode 432 to the first pad P1. The second conductive structure 120B is formed on the second electrode 434 and is electrically connected to the second electrode 434 to the second pad P2.

在本實施例中,發光裝置30包括基板100、發光二極體430、第一電極432、第二電極434、第一磁性元件110以及第二磁性元件140。基板100具有第一接墊P1與第二接墊P2。發光二極體430位於基板100上。第一電極432與第二電極434位於發光二極體430上。第一電極432電性連接至第一接墊P1。第二電極434電性連接至第二接墊P2。第一磁性元件110形成於基板100上,大致環繞第一電極432,且不接觸第一接墊P1與第二接墊P2。第二磁性元件140形成於發光二極體430之側邊,且大致位於第一磁性元件110的上方,其中第一磁性元件110與第二磁性元件140系為磁性相吸。 In this embodiment, the light emitting device 30 includes a substrate 100, a light emitting diode 430, a first electrode 432, a second electrode 434, a first magnetic element 110, and a second magnetic element 140. The substrate 100 includes a first pad P1 and a second pad P2. The light emitting diode 430 is located on the substrate 100. The first electrode 432 and the second electrode 434 are located on the light emitting diode 430. The first electrode 432 is electrically connected to the first pad P1. The second electrode 434 is electrically connected to the second pad P2. The first magnetic element 110 is formed on the substrate 100 and substantially surrounds the first electrode 432 and does not contact the first pad P1 and the second pad P2. The second magnetic element 140 is formed on a side of the light-emitting diode 430 and is generally located above the first magnetic element 110. The first magnetic element 110 and the second magnetic element 140 are magnetically attracted.

圖6是依照本發明一實施例的一種發光裝置的俯視示意圖。在此必須說明的是,圖6的實施例沿用圖4的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。 FIG. 6 is a schematic top view of a light emitting device according to an embodiment of the invention. It must be noted here that the embodiment of FIG. 6 inherits the component numbers and parts of the embodiment of FIG. 4, in which the same or similar reference numerals are used to represent the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and details are not described herein.

圖6之實施例與圖4之實施例的差異在於:圖4之發光裝置30的第二導電結構120B於垂直於基板100的方向上與第一磁性元件110以及第二磁性元件140重疊,圖6之發光裝置40的 第二導電結構120B則是於垂直於基板100的方向上與第一磁性元件110重疊且與第二磁性元件140不重疊。 The difference between the embodiment of FIG. 6 and the embodiment of FIG. 4 is that the second conductive structure 120B of the light emitting device 30 of FIG. 4 overlaps the first magnetic element 110 and the second magnetic element 140 in a direction perpendicular to the substrate 100. 6 of the light emitting device 40 The second conductive structure 120B overlaps the first magnetic element 110 and does not overlap the second magnetic element 140 in a direction perpendicular to the substrate 100.

圖7是依照本發明一實施例的一種發光裝置的俯視示意圖。圖8A~圖8C是依照本發明一實施例的一種發光裝置的製造方法的剖面示意圖。在此必須說明的是,圖8A~圖8C是沿圖7之CC’線剖面的示意圖,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。 FIG. 7 is a schematic top view of a light emitting device according to an embodiment of the invention. 8A-8C are schematic cross-sectional views of a method for manufacturing a light-emitting device according to an embodiment of the present invention. It must be noted here that FIGS. 8A to 8C are schematic diagrams taken along the CC ′ line of FIG. 7, in which the same or similar reference numerals are used to indicate the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and details are not described herein.

請參考圖8A,於生長基板200上形成發光二極體430、第一電極432以及第二電極434之後,形成光阻層P包覆發光二極體430,且暴露出位於發光二極體430上的第一電極432以及第二電極434。接著,分別在第一電極432以及第二電極434上形成第一導電結構120A以及第二導電結構120B。以製程加工性的觀點來看,第一導電結構120A以及第二導電結構120B較佳為利用相同的製程步驟同時形成於發光二極體430上,然而本發明不限於此。 Referring to FIG. 8A, after the light emitting diode 430, the first electrode 432, and the second electrode 434 are formed on the growth substrate 200, a photoresist layer P is formed to cover the light emitting diode 430, and the light emitting diode 430 is exposed. On the first electrode 432 and the second electrode 434. Next, a first conductive structure 120A and a second conductive structure 120B are formed on the first electrode 432 and the second electrode 434, respectively. From the viewpoint of process processability, the first conductive structure 120A and the second conductive structure 120B are preferably formed on the light emitting diode 430 at the same time by using the same process steps, but the present invention is not limited thereto.

請參考圖8B,移除光阻層P。於發光二極體430的側邊形成第二磁性元件140。 Referring to FIG. 8B, the photoresist layer P is removed. A second magnetic element 140 is formed on a side of the light emitting diode 430.

請參考圖7與圖8C,將發光二極體430倒裝於基板100上,並藉由覆晶接合製程,將第一導電結構520及第二導電結構120B對應設置於基板100的第一接墊P1以及第二接墊P2上。第一導電結構120A及第二導電結構120B位於發光二極體430與基 板100之間。第一導電結構120A位於發光二極體430與第一接墊P1之間。第二導電結構120B位於發光二極體430與第二接墊P2之間。第一導電結構120A及第二導電結構120B為第一磁性元件110所環繞。 Referring to FIG. 7 and FIG. 8C, the light-emitting diode 430 is flip-chip mounted on the substrate 100, and the first conductive structure 520 and the second conductive structure 120B are correspondingly disposed on the first connection of the substrate 100 through a flip-chip bonding process. On the pad P1 and the second pad P2. The first conductive structure 120A and the second conductive structure 120B are located between the light emitting diode 430 and the substrate. Between the boards 100. The first conductive structure 120A is located between the light emitting diode 430 and the first pad P1. The second conductive structure 120B is located between the light emitting diode 430 and the second pad P2. The first conductive structure 120A and the second conductive structure 120B are surrounded by the first magnetic element 110.

在本實施例中,發光裝置50包括基板100、發光二極體430、第一電極432、第二電極434、第一磁性元件110以及第二磁性元件140。基板100具有第一接墊P1與第二接墊P2。發光二極體430位於基板100上。第一電極432與第二電極434位於發光二極體430上。第一電極432電性連接至第一接墊P1。第二電極434電性連接至第二接墊P2。第一磁性元件110形成於基板100上,大致環繞第一電極432,且不接觸第一接墊P1與第二接墊P2。第二磁性元件140形成於發光二極體430之側邊,且大致位於第一磁性元件110的上方,其中第一磁性元件110與第二磁性元件140系為磁性相吸。 In this embodiment, the light emitting device 50 includes a substrate 100, a light emitting diode 430, a first electrode 432, a second electrode 434, a first magnetic element 110, and a second magnetic element 140. The substrate 100 includes a first pad P1 and a second pad P2. The light emitting diode 430 is located on the substrate 100. The first electrode 432 and the second electrode 434 are located on the light emitting diode 430. The first electrode 432 is electrically connected to the first pad P1. The second electrode 434 is electrically connected to the second pad P2. The first magnetic element 110 is formed on the substrate 100 and substantially surrounds the first electrode 432 and does not contact the first pad P1 and the second pad P2. The second magnetic element 140 is formed on a side of the light-emitting diode 430 and is generally located above the first magnetic element 110. The first magnetic element 110 and the second magnetic element 140 are magnetically attracted.

綜上所述,本發明的發光二極體在巨量轉移製程的過程中,藉由第二磁性元件大致位於第一磁性元件的上方,並當接近至一定距離後產生的磁性相吸,進而達到自組裝的效果。如此一來,具有上述的磁性元件能提升轉置發光二極體時的精準度,使得製造出的發光裝置具有較佳的良率。 In summary, during the process of mass transfer of the light-emitting diode of the present invention, the second magnetic element is located above the first magnetic element, and the magnetic attraction generated when the second magnetic element is approached to a certain distance, and then To achieve the effect of self-assembly. In this way, the above-mentioned magnetic element can improve the accuracy when the light-emitting diode is transposed, so that the manufactured light-emitting device has a better yield.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視 後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed as above with the examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some modifications and retouching without departing from the spirit and scope of the present invention. The scope of protection of the present invention should be regarded as The scope of the attached patent application shall prevail.

Claims (20)

一種發光裝置,包括: 一基板,該基板具有一第一接墊與一第二接墊; 一發光二極體,位於該基板上; 一第一電極與一第二電極,位於該發光二極體上,該第一電極電性連接至該第一接墊,該第二電極電性連接至該第二接墊; 一第一磁性元件,形成於該基板上,大致環繞該第一電極,且不接觸該第一接墊與該第二接墊;以及 一第二磁性元件,形成於該發光二極體之側邊,且大致位於該第一磁性元件的上方,其中該第一磁性元件與該第二磁性元件系為磁性相吸。A light-emitting device includes: a substrate having a first pad and a second pad; a light-emitting diode on the substrate; a first electrode and a second electrode on the light-emitting diode On the body, the first electrode is electrically connected to the first pad, and the second electrode is electrically connected to the second pad. A first magnetic element is formed on the substrate and substantially surrounds the first electrode. And does not contact the first pad and the second pad; and a second magnetic element formed on a side of the light emitting diode and substantially above the first magnetic element, wherein the first magnetic element It is magnetically attracted to the second magnetic element. 如申請專利範圍第1項所述的發光裝置,其中該第一磁性元件連續地或不連續地環繞該發光二極體。The light-emitting device according to item 1 of the patent application scope, wherein the first magnetic element continuously or discontinuously surrounds the light-emitting diode. 如申請專利範圍第1項所述的發光裝置,其中該第二磁性元件包括互相分離的多個部分。The light emitting device according to item 1 of the patent application scope, wherein the second magnetic element includes a plurality of parts separated from each other. 如申請專利範圍第1項所述的發光裝置,其中該第二磁性元件的寬度大於該第一磁性元件的寬度。The light-emitting device according to item 1 of the patent application scope, wherein a width of the second magnetic element is larger than a width of the first magnetic element. 如申請專利範圍第1項所述的發光裝置,其中該第二磁性元件的高度加上該第一磁性元件的高度大於或等於該發光二極體的高度。The light emitting device according to item 1 of the scope of patent application, wherein the height of the second magnetic element plus the height of the first magnetic element is greater than or equal to the height of the light emitting diode. 如申請專利範圍第1項所述的發光裝置,其中該第一磁性元件與該第二磁性元件包含光阻材料以及多個磁性粒子。The light-emitting device according to item 1 of the patent application scope, wherein the first magnetic element and the second magnetic element include a photoresist material and a plurality of magnetic particles. 如申請專利範圍第6項所述的發光裝置,其中該些磁性粒子的粒徑小於350奈米。The light-emitting device according to item 6 of the scope of patent application, wherein the particle diameter of the magnetic particles is less than 350 nm. 如申請專利範圍第1項所述的發光裝置,其中該第一磁性元件與該發光二極體之間的距離小於10微米。The light-emitting device according to item 1 of the patent application scope, wherein a distance between the first magnetic element and the light-emitting diode is less than 10 micrometers. 如申請專利範圍第1項所述的發光裝置,更包括: 一第一導電結構,電性連接該第一電極至該第一接墊;以及 一第二導電結構,電性連接該第二電極至該第二接墊,其中該第二導電結構在垂直於該基板的方向上與該第二磁性元件至少部份重疊。The light emitting device according to item 1 of the scope of patent application, further comprising: a first conductive structure electrically connecting the first electrode to the first pad; and a second conductive structure electrically connecting the second electrode To the second pad, wherein the second conductive structure at least partially overlaps the second magnetic element in a direction perpendicular to the substrate. 如申請專利範圍第1項所述的發光裝置,其中該發光二極體包括水平式發光二極體。The light-emitting device according to item 1 of the patent application scope, wherein the light-emitting diode includes a horizontal light-emitting diode. 如申請專利範圍第10項所述的發光裝置,更包括: 一黏著層,在垂直於該基板的方向上該黏著層位於該發光二極體與該基板之間,且在平行於該基板的方向上該黏著層被該第一磁性元件至少部分環繞。The light emitting device according to item 10 of the scope of patent application, further comprising: an adhesive layer, the adhesive layer is located between the light emitting diode and the substrate in a direction perpendicular to the substrate, and is parallel to the substrate. The adhesive layer is at least partially surrounded by the first magnetic element in the direction. 如申請專利範圍第10項所述的發光裝置,更包括: 一第一導電結構,電性連接該第一電極至該第一接墊;以及 一第二導電結構,電性連接該第二電極至該第二接墊,其中該第一導電結構位於該發光二極體與該第一接墊之間,該第二導電結構位於該發光二極體與該第二接墊之間,且該第一導電結構及該第二導電結構為該第一磁性元件所環繞。The light-emitting device according to item 10 of the patent application scope, further comprising: a first conductive structure electrically connecting the first electrode to the first pad; and a second conductive structure electrically connecting the second electrode To the second pad, wherein the first conductive structure is located between the light emitting diode and the first pad, the second conductive structure is located between the light emitting diode and the second pad, and the The first conductive structure and the second conductive structure are surrounded by the first magnetic element. 如申請專利範圍第1項所述的發光裝置,其中該發光二極體包括垂直式發光二極體。The light-emitting device according to item 1 of the patent application scope, wherein the light-emitting diode includes a vertical light-emitting diode. 如申請專利範圍第13項所述的發光裝置,更包括: 一第一導電結構,電性連接該第一電極至該第一接墊;以及 一第二導電結構,電性連接該第二電極至該第二接墊,其中該第一導電結構位於該發光二極體與該第一接墊之間,且該第二導電結構在垂直於該基板的方向上與該第一磁性元件重疊且與該第二磁性元件不重疊。The light-emitting device according to item 13 of the scope of patent application, further comprising: a first conductive structure electrically connecting the first electrode to the first pad; and a second conductive structure electrically connecting the second electrode To the second pad, wherein the first conductive structure is located between the light emitting diode and the first pad, and the second conductive structure overlaps the first magnetic element in a direction perpendicular to the substrate and Does not overlap with this second magnetic element. 如申請專利範圍第1項所述的發光裝置,其中該發光二極體包括位於表面的一反射層。The light-emitting device according to item 1 of the patent application scope, wherein the light-emitting diode includes a reflective layer on a surface. 一種發光裝置的製造方法,包括: 提供一基板,該基板具有一第一接墊與一第二接墊; 形成一第一磁性元件於該基板上; 形成一發光二極體於一生長基板上; 形成一第二磁性元件於該發光二極體之側邊; 將該發光二極體以及該第二磁性元件轉置於該基板上,且該第二磁性元件與該第一磁性元件磁性相吸; 固定該發光二極體於該基板上; 電性連接該發光二極體與該第一接墊;以及 電性連接該發光二極體與該第二接墊。A method for manufacturing a light-emitting device includes: providing a substrate having a first pad and a second pad; forming a first magnetic element on the substrate; forming a light-emitting diode on a growth substrate Forming a second magnetic element on the side of the light emitting diode; transferring the light emitting diode and the second magnetic element on the substrate, and the second magnetic element and the first magnetic element being magnetically phased; Suction; fixing the light-emitting diode on the substrate; electrically connecting the light-emitting diode and the first pad; and electrically connecting the light-emitting diode and the second pad. 如申請專利範圍第16項所述的製造方法,在將該發光二極體以及該第二磁性元件轉置於該基板之前,更包括: 形成一犧牲層包覆該第二磁性元件以及該發光二極體; 形成一中介基板於該第二磁性元件以及該發光二極體上; 移除該犧牲層;以及 移除該生長基板。According to the manufacturing method described in claim 16, before the light-emitting diode and the second magnetic element are transferred to the substrate, the method further includes: forming a sacrificial layer to cover the second magnetic element and the light-emitting element. A diode; forming an interposer on the second magnetic element and the light emitting diode; removing the sacrificial layer; and removing the growth substrate. 如申請專利範圍第16項所述的製造方法,在將該發光二極體以及該第二磁性元件轉置於該基板之前,更包括: 形成一第一導電結構於該第一接墊上,該第一磁性元件環繞該第一導電結構。According to the manufacturing method described in item 16 of the application, before the light-emitting diode and the second magnetic element are transferred to the substrate, the method further includes: forming a first conductive structure on the first pad, the A first magnetic element surrounds the first conductive structure. 如申請專利範圍第16項所述的製造方法,在將該發光二極體以及該第二磁性元件轉置於該基板之前,更包括: 形成一黏著層於該基板上,該第一磁性元件環繞該黏著層。According to the manufacturing method described in claim 16, before the light emitting diode and the second magnetic element are transferred to the substrate, the method further includes: forming an adhesive layer on the substrate, and the first magnetic element. Surround the adhesive layer. 如申請專利範圍第16項所述的製造方法,在將該發光二極體以及該第二磁性元件轉置於該基板之前,更包括: 將該發光二極體自該生長基板上轉置於一中介基板及一犧牲層上; 形成一繫鏈結構於該發光二極體上;以及 移除該犧牲層。According to the manufacturing method described in item 16 of the application, before the light-emitting diode and the second magnetic element are transferred to the substrate, the method further includes: transferring the light-emitting diode from the growth substrate to An interposer substrate and a sacrificial layer; forming a tether structure on the light emitting diode; and removing the sacrificial layer.
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