TWI647068B - Processing device - Google Patents
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- TWI647068B TWI647068B TW104121834A TW104121834A TWI647068B TW I647068 B TWI647068 B TW I647068B TW 104121834 A TW104121834 A TW 104121834A TW 104121834 A TW104121834 A TW 104121834A TW I647068 B TWI647068 B TW I647068B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q11/00—Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
- B23Q11/0032—Arrangements for preventing or isolating vibrations in parts of the machine
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q2703/00—Work clamping
- B23Q2703/12—Accessories for attaching
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Auxiliary Devices For Machine Tools (AREA)
- Machine Tool Units (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Abstract
本發明之課題是提供已將由振動形成的加工影響降低了的加工裝置。解決手段是做成以下的構成:其包含保持被加工物之保持組件;加工被加工物之加工組件;配置有保持組件及加工組件的裝置基座;以及將裝置基座、保持組件、及加工組件的周圍包圍且將成為振動產生源之零件予以支撐的裝置框架。裝置基座與裝置框架是各自獨立而豎立設置,並透過防振構件而相接觸以維持相互之位置關係,且以防振構件吸收由零件產生之振動。 An object of the present invention is to provide a processing device which has reduced processing influence due to vibration. The solution is to construct the following components: a holding component for holding the processed object; a processing component for processing the processed object; a device base provided with the holding component and the processing component; and a device base, the holding component, and processing A device frame that surrounds the module and supports parts that become sources of vibration. The device base and the device frame are independently and erected separately, and are in contact with each other through the vibration-proof member to maintain the mutual positional relationship, and the vibration-proof member absorbs the vibration generated by the parts.
Description
本發明是有關於一種將半導體晶圓等被加工物加工之加工裝置。 The present invention relates to a processing device for processing a workpiece such as a semiconductor wafer.
在以被稱為切割道(street)之分割預定線所劃分的表面側之複數個領域中分別形成有IC等元件之半導體晶圓,在例如將背面側磨削後,會被分割成對應各元件的複數個元件晶片,且可被組裝進電子機器等中。這種半導體晶圓的加工,一般而言是使用磨削裝置、切割裝置等加工裝置來實施。 Semiconductor wafers in which components such as ICs are formed in a plurality of areas on the surface side divided by a planned dividing line called a street. After, for example, grinding the back side, the semiconductor wafer is divided into corresponding areas. A plurality of component wafers of the component can be assembled into an electronic device or the like. Processing of such a semiconductor wafer is generally performed using a processing device such as a grinding device or a dicing device.
近年來,為了提高元件晶片的生產性,持續進行著半導體晶圓的大口徑化。另一方面,當將半導體晶圓大口徑化時,因應該種情況造成加工裝置也要大型化。對於此問題,已有藉由將電裝零件等配置於上部而減少內部的間隙,以縮小佔地面積的加工裝置之方案被提出(參照例如專利文獻1、2)。 In recent years, in order to improve the productivity of element wafers, the diameter of semiconductor wafers has continued to increase. On the other hand, when the semiconductor wafer is made larger in diameter, the processing equipment also needs to be increased in size due to the circumstances. In order to solve this problem, there has been proposed a processing device that reduces the internal clearance by arranging electrical components and the like at the upper portion to reduce the area (see, for example, Patent Documents 1 and 2).
專利文獻1:日本專利特開2010-162665號公報 Patent Document 1: Japanese Patent Laid-Open No. 2010-162665
專利文獻2:日本專利特開2010-287764號公報 Patent Document 2: Japanese Patent Laid-Open No. 2010-287764
在上述之加工裝置上,是藉由將可設置電裝零件等的框架(裝置框架)固定至加工裝置的基座(裝置基座)之作法,而將電裝零件等配置在上部。由於從此電裝零件會產生熱,所以在框架上安裝有將熱往外部排出並吸進低溫空氣之吸排氣用的風扇。 In the above-mentioned processing device, a frame (device frame) capable of providing electrical components and the like is fixed to a base (device base) of the processing device, and the electrical components and the like are arranged on the upper portion. Since heat is generated from the electrical components, a fan for suction and exhaust that discharges heat to the outside and draws in low-temperature air is attached to the frame.
然而,當如上述地將電裝零件等重量物配置於上部時,重心的位置會變高而讓加工裝置容易振動。因此,在上述的加工裝置上,有時會有吸排氣用之風扇等所產生的振動對半導體晶圓等等被加工物之加工造成不良影響的情形。 However, when a heavy object such as an electric component is placed on the upper part as described above, the position of the center of gravity becomes high, which makes the processing device easy to vibrate. Therefore, in the above-mentioned processing apparatus, there may be a case where vibrations generated by a fan for suction and exhaust may adversely affect processing of a workpiece such as a semiconductor wafer.
本發明是有鑒於所述問題點而作成的發明,其目的在於提供已將由振動形成的加工影響降低的加工裝置。 The present invention has been made in view of the problems described above, and it is an object of the present invention to provide a processing device that has reduced the influence of processing by vibration.
根據本發明所提供之加工裝置,特徵在於,其包含:保持被加工物之保持組件;加工被加工物之加工組件;配置有該保持組件及該加工組件的裝置基座;以及將該裝置基座、該保持組件、及該加工組件的周圍包圍且將成為振動產生源之零件予以支撐的裝置框架,該裝置基座與該裝置框架是各自獨立而豎立設置,並透過防振構件而相接 觸以維持相互之位置關係,且以該防振構件吸收由該零件產生之振動。 The processing device according to the present invention is characterized in that it comprises: a holding component for holding the processed object; a processing component for processing the processed object; a device base configured with the holding component and the processing component; and the device base The device frame, which is surrounded by the base, the holding component, and the processing component, and which will support the parts that will become the source of the vibration generation, the device base and the device frame are each independently set upright, and are connected through the vibration-proof member Touch to maintain the mutual positional relationship, and the vibration-proof member absorbs the vibration generated by the part.
在本發明中,較理想的是,該裝置框架透過可拆裝之固定構件而可固定於該裝置基座上。 In the present invention, it is desirable that the device frame can be fixed to the device base through a detachable fixing member.
在本發明之加工裝置上,由於配置有保持組件與加工組件之裝置基座、和支撐成為振動產生源之零件的裝置框架,是各自獨立而豎立設置,並透過防振構件而相接觸,所以在此零件上產生之振動可藉防振構件而被吸收,幾乎不會傳播至裝置基座。據此,可以將由振動形成的加工影響降低。 In the processing device of the present invention, since the device base on which the holding component and the processing component are arranged, and the device frame supporting the parts that become a source of vibration are independently and vertically arranged, and are in contact with each other through the vibration-proof member, The vibration generated on this part can be absorbed by the vibration-proof member, and it hardly propagates to the device base. According to this, it is possible to reduce the processing influence due to vibration.
2‧‧‧加工裝置 2‧‧‧Processing equipment
4‧‧‧裝置基座 4‧‧‧ device base
4a‧‧‧開口 4a‧‧‧ opening
4b‧‧‧基座腳部 4b‧‧‧foot
4c‧‧‧螺孔 4c‧‧‧Screw hole
6‧‧‧防塵防滴護罩 6‧‧‧Dustproof and dripproof cover
8‧‧‧工作夾台(保持組件) 8‧‧‧Work clamp table (holding assembly)
8a‧‧‧保持面 8a‧‧‧ keep face
10‧‧‧支撐構造 10‧‧‧ support structure
11‧‧‧被加工物 11‧‧‧Processed
12‧‧‧移動機構 12‧‧‧ mobile agency
14‧‧‧旋削單元(加工組件) 14‧‧‧Turning unit (machining component)
16‧‧‧旋削輪(旋削工具) 16‧‧‧Rotary turning wheel (rotating tool)
18‧‧‧裝置框架 18‧‧‧ device frame
20‧‧‧框架材 20‧‧‧Frame material
22‧‧‧框架本體 22‧‧‧Frame Ontology
24‧‧‧框架腳部 24‧‧‧Frame feet
24a‧‧‧開口 24a‧‧‧ opening
26‧‧‧收容盒 26‧‧‧Storage Box
28‧‧‧防振構件 28‧‧‧Anti-vibration member
30‧‧‧固定具 30‧‧‧ Fixture
32‧‧‧螺絲(固定構件) 32‧‧‧screw (fixing member)
X、Y、Z‧‧‧方向 X, Y, Z‧‧‧ directions
圖1是將加工裝置模式地表示的分解立體圖。 FIG. 1 is an exploded perspective view schematically showing a processing device.
圖2是將加工裝置之正面側的一部分放大表示的放大圖。 FIG. 2 is an enlarged view showing a part of the front side of the processing device in an enlarged manner.
參照附加圖式,對本發明之實施形態進行說明。圖1是將本實施形態之加工裝置模式地表示之分解立體圖,圖2是將加工裝置之正面側的一部分放大表示的放大圖。 An embodiment of the present invention will be described with reference to the attached drawings. FIG. 1 is an exploded perspective view schematically showing a processing device according to this embodiment, and FIG. 2 is an enlarged view showing a part of the front side of the processing device in an enlarged manner.
再者,在本實施形態中,作為加工裝置,雖然是以對由半導體晶圓為代表之板狀被加工物進行迴旋切削(旋削)之旋削裝置作為例示,但是本發明中的加工裝置也可以是磨削裝置、切割裝置(切削裝置)、雷射切割裝置(雷射 加工裝置)等。 In addition, in this embodiment, the processing device is exemplified by a rotary device that performs a rotary cutting (spinning) of a plate-shaped workpiece represented by a semiconductor wafer, but the processing device in the present invention may also be used. Grinding device, cutting device (cutting device), laser cutting device (laser Processing equipment) and so on.
如圖1所示,本實施形態之加工裝置2具備有直方體狀之裝置基座4。在裝置基座4之上表面於前後方向(X軸方向)上形成有長矩形之開口4a。 As shown in FIG. 1, the processing device 2 of this embodiment includes a cuboid-shaped device base 4. A long rectangular opening 4a is formed on the upper surface of the device base 4 in the front-rear direction (X-axis direction).
在此開口4a內配置有水平移動台(未圖示)、令水平移動台在前後方向上移動之水平移動機構(未圖示)、以及覆蓋水平移動機構之防塵防滴護罩6。 Inside this opening 4a are disposed a horizontal moving table (not shown), a horizontal moving mechanism (not shown) that moves the horizontal moving table in the front-rear direction, and a dustproof and drip-proof cover 6 covering the horizontal moving mechanism.
在水平移動台的上方設置有吸引保持被加工物11之工作夾台(保持組件)8。工作夾台8也藉由上述之水平移動機構與水平移動台一起在前後方向上移動。 Above the horizontal moving table, a work clamping table (holding unit) 8 for holding and holding the workpiece 11 is provided. The work clamp table 8 is also moved in the front-rear direction together with the horizontal moving table by the above-mentioned horizontal moving mechanism.
被加工物11為例如矩形的半導體晶圓,且在上表面側配置有金屬等製成的凸塊(未圖示)。本實施形態之加工裝置2是在例如這個凸塊的旋削加工中被使用。但是,被加工物11並不受限於此。 The processed object 11 is, for example, a rectangular semiconductor wafer, and bumps (not shown) made of metal or the like are arranged on the upper surface side. The processing device 2 of the present embodiment is used in, for example, the turning processing of this bump. However, the workpiece 11 is not limited to this.
工作夾台8之矩形的上表面為用於吸引保持被加工物11之保持面8a。該保持面8a是通過形成於工作夾台8內部之流路(未圖示)來與吸引源(未圖示)相連接。藉由將被加工物11載置於保持面8a上,並使吸引源之負壓作用,就可以藉工作夾台8吸引保持被加工物11。 The rectangular upper surface of the work table 8 is a holding surface 8 a for attracting and holding the workpiece 11. The holding surface 8a is connected to a suction source (not shown) through a flow path (not shown) formed inside the work clamp 8. By placing the workpiece 11 on the holding surface 8 a and applying the negative pressure of the suction source, the workpiece 11 can be sucked and held by the work clamp 8.
在開口4a之後方側上方,豎立設置有門型之支撐構造10。在支撐構造10之前面,透過移動機構12而設置有旋削單元14(加工組件)。旋削單元14包含構成相對於鉛直方向(Z軸方向)大致平行之旋轉軸的主軸(未圖示)。 A gate-shaped support structure 10 is erected above the side after the opening 4a. A turning unit 14 (processing unit) is provided in front of the support structure 10 through the moving mechanism 12. The turning unit 14 includes a main shaft (not shown) constituting a rotation axis substantially parallel to the vertical direction (Z-axis direction).
在主軸的下端部裝設有旋削輪(旋削工具)16。旋 削輪16具備有由鋁、不鏽鋼等金屬材料形成之輪基台。在輪基台的下表面固定有由鑽石等製成之刀刃(切削刃)。 A rotary wheel (rotating tool) 16 is attached to a lower end portion of the main shaft. Spin The cutting wheel 16 includes a wheel base formed of a metal material such as aluminum or stainless steel. A blade (cutting edge) made of diamond or the like is fixed to the lower surface of the wheel base.
主軸的上端側連結有馬達等的旋轉機構(未圖示),旋削輪16是利用由旋轉機構所傳達之旋轉力而旋轉。又,旋削輪16是藉由上述之移動機構12而在左右方向(Y軸方向)及鉛直方向上移動。 A rotating mechanism (not shown) such as a motor is connected to the upper end side of the main shaft, and the turning wheel 16 is rotated by a rotating force transmitted from the rotating mechanism. The rotary wheel 16 is moved in the left-right direction (the Y-axis direction) and the vertical direction by the moving mechanism 12 described above.
例如,將旋削輪16之刀刃定位在與藉工作夾台8吸引保持之被加工物11接觸的高度上,以一邊使旋削輪16旋轉一邊使工作夾台8由前方往後方移動,藉此即可旋削被加工物11之上表面側。 For example, the blade of the rotary wheel 16 is positioned at a height contacting the workpiece 11 sucked and held by the work clamp table 8, and the work clamp table 8 is moved from the front to the rear while the rotary wheel 16 is rotated. The upper surface side of the workpiece 11 can be turned.
在將裝置基座4、工作夾台8、以及旋削單元14包圍之位置上配置有裝置框架18。裝置框架18包含以複數個框架材20構成之框架本體22,以及固定於框架本體22之底部的複數個框架腳部24。本裝置框架18是藉由框架腳部24得以獨自站立。 A device frame 18 is disposed at a position that surrounds the device base 4, the work table 8, and the turning unit 14. The device frame 18 includes a frame body 22 composed of a plurality of frame materials 20, and a plurality of frame leg portions 24 fixed to the bottom of the frame body 22. The device frame 18 can stand alone by the frame leg portion 24.
在裝置框架18之上部後方固定有收容電裝零件、吸排氣用風扇(成為振動產生源之零件)等之收容盒26。像這樣,藉由將電裝零件等(收容盒26)配置於上方,可以縮小加工裝置2之佔地面積。 To the rear of the upper part of the device frame 18, a storage box 26 for accommodating electric components, a fan for suction and exhaust (a component that becomes a source of vibration generation), and the like are fixed. As described above, by disposing the electric components and the like (the storage box 26) above, the footprint of the processing device 2 can be reduced.
如圖2所示,於框架腳部24的內側,以固定具30固定有橡膠等材料製成之防振構件28。裝置基座4與裝置框架18是透過此防振構件28而接觸著。 As shown in FIG. 2, a vibration-proof member 28 made of a material such as rubber is fixed to the inside of the frame leg portion 24 by a fixing tool 30. The device base 4 and the device frame 18 are in contact with each other through this vibration-proof member 28.
藉此,例如收容盒26的風扇產生之振動會被防振構件28吸收,幾乎不會傳播至裝置基座4。又,由於獨立而 豎立設置之裝置基座4及裝置框架18是透過防振構件28而相接觸,所以能夠適度地維持其等的位置關係。再者,裝置基座4是藉由固定於底部之基座腳部4b而能夠獨自站立。 Thereby, for example, the vibration generated by the fan of the storage box 26 is absorbed by the vibration-proof member 28 and hardly propagates to the device base 4. Also, because of independence Since the device base 4 and the device frame 18 which are erected are in contact with each other through the vibration-proof member 28, the positional relationship can be appropriately maintained. Furthermore, the device base 4 can stand alone by the base leg portion 4b fixed to the bottom.
又,在框架腳部24上形成有與防振構件28及固定具30相鄰之開口24a。另一方面,裝置基座4上設置有對應開口24a之螺孔4c。藉由將螺絲(固定構件)32通過開口24a而鎖緊於螺孔4c之方式,可以將裝置框架18牢固地固定於裝置基座4上。 Further, an opening 24 a is formed in the frame leg portion 24 adjacent to the vibration-proof member 28 and the fixture 30. On the other hand, the device base 4 is provided with a screw hole 4c corresponding to the opening 24a. By fixing the screw (fixing member) 32 to the screw hole 4c through the opening 24a, the device frame 18 can be firmly fixed to the device base 4.
此螺絲32是在例如移動、搬送加工裝置2之時安裝。像這樣,只要將裝置基座4與裝置框架18以螺絲32固定,便可以在原樣保持著裝置基座4與裝置框架18之位置關係的狀態下移動、搬送加工裝置2。再者,此螺絲32在加工裝置2設置後會被拆下。 This screw 32 is attached when, for example, the processing device 2 is moved or transported. In this manner, as long as the device base 4 and the device frame 18 are fixed with screws 32, the processing device 2 can be moved and transported while maintaining the positional relationship between the device base 4 and the device frame 18. Moreover, the screw 32 is removed after the processing device 2 is set.
如以上所述,在本實施形態之加工裝置2中,由於將配置有工作夾台2(保持組件)及旋削單元(加工組件)14之裝置基座4、以及支撐風扇(成為振動產生源之零件)之裝置框架18各自獨立而豎立設置,並透過防振構件28相接觸,所以在風扇產生之振動會藉防振構件28而被吸收,幾乎不會傳播至裝置基座4。據此,可以將由振動形成的加工影響降低。 As described above, in the processing device 2 of this embodiment, the device base 4 on which the work clamp 2 (holding unit) and the turning unit (processing unit) 14 are arranged, and the support fan (which becomes a source of vibration generation) Parts) of the device frame 18 are independently and erected, and are in contact with each other through the anti-vibration member 28. Therefore, the vibration generated by the fan is absorbed by the anti-vibration member 28, and hardly propagates to the device base 4. According to this, it is possible to reduce the processing influence due to vibration.
再者,本發明並不限定於上述實施形態之記載,並可以進行各種變更而實施。例如,在上述實施形態中,雖然是假定吸排氣風扇作為振動產生源,但成為振動產生 源之零件並不受限於此。 In addition, this invention is not limited to the description of the said embodiment, It can implement various changes. For example, in the above-mentioned embodiment, although it is assumed that the suction and exhaust fan is used as a vibration generating source, the vibration is generated. The source parts are not limited to this.
又,在上述實施形態中,雖然是將防振構件28固定於框架腳部24,但將防振構件28固定於框架材20之任意位置亦可。同樣地,也可以在框架材20之任意位置形成開口,而固定螺絲(固定構件)32。 In the above-mentioned embodiment, although the vibration-proof member 28 is fixed to the frame leg portion 24, the vibration-proof member 28 may be fixed to any position of the frame material 20. Similarly, an opening may be formed at an arbitrary position of the frame material 20, and the screw (fixing member) 32 may be fixed.
另外,上述實施形態之構成、方法等,只要在不脫離本發明之目的之範圍內,均可適當變更而實施。 In addition, the configuration, method, and the like of the above embodiments can be appropriately modified and implemented as long as they do not depart from the purpose of the present invention.
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