TWI638059B - Apparatus for supporting a flexible substrate in a vacuum processing chamber, processing apparatus having the same, and method for supporting a flexible substrate by using the same - Google Patents

Abstract

The present disclosure provides a device (100) for supporting a flexible substrate (10) in a vacuum processing chamber. The device (100) includes a coating drum rotatable about a rotating shaft (105), wherein the coating drum has a support surface (110) configured to support the flexible substrate (10), wherein the support surface (110) is symmetrical with respect to the rotation axis (105), and wherein a central portion of the rotation shaft (105) and the support surface (110) in a direction perpendicular to the rotation axis (105) ( A first distance (120) between 112) is less than a second distance (122) between the axis of rotation (105) and the peripheral edge (114, 116) of the support surface (110).

Description

Means for supporting a flexible substrate in a vacuum processing chamber, Processing device having the same, and method for supporting the same using the same

Embodiments of the present disclosure are directed to a device for supporting a flexible substrate in a vacuum processing chamber, a processing device configured for layer deposition on a flexible substrate, and a device for use on a coating drum A method of supporting a flexible substrate. Embodiments of the present disclosure are particularly directed to thin film processing equipment, such as with respect to a device for processing a flexible substrate, and more particularly to a roll-to-roll (R2R) system.

In the packaging industry, the semiconductor industry, and other industries, the processing of flexible substrates such as plastic films or foils can be employed. The processing can include coating the flexible substrate with one or more coating materials, such as metals, semiconductor materials, and dielectric materials. The process can also include other processing aspects, such as etching. At Processing devices of these aspects can include a coating drum coupled to a system for transporting a flexible substrate. This type of continuous winding system provides high throughput.

A coating process such as a sputter deposition process, a thermal evaporation process, or a chemical vapor deposition (CVD) process can be used to deposit a thin layer of coating material onto the flexible substrate. The temperature of the flexible substrate can be increased during the coating process. Flexible substrates may be damaged by increased temperatures. In particular, the edges of the flexible substrate may experience thermal damage. For example, the edges of the flexible substrate may be wrinkled.

Based on the above, a new apparatus for supporting a flexible substrate in a vacuum processing chamber, a processing apparatus configured for layer deposition on a flexible substrate, and for use in overcoming at least some of the problems of the prior art A method of supporting a flexible substrate on a coating drum is advantageous. In particular, devices, processing apparatus, and methods that can avoid thermal damage to the flexible substrate, such as thermal damage at the edges of the flexible substrate, are advantageous.

In view of the above, a device for supporting a flexible substrate in a vacuum processing chamber, a processing device configured for layer deposition on a flexible substrate, and a support for coating on a coating drum are provided. A method of flexible substrates. Additional aspects, advantages, and features of the disclosure are apparent from the claims, the description, and the drawings.

In accordance with an aspect of the present disclosure, an apparatus for supporting a flexible substrate in a vacuum processing chamber is provided. The device comprises a coating drum, a coating drum Rotatable about a rotational axis, wherein the coating drum has a support surface configured to support the flexible substrate, wherein the support surface is symmetrical with respect to the axis of rotation, and wherein the one perpendicular to the axis of rotation A first distance between the rotational axis and a central portion of the support surface in the direction is less than a second distance between the rotational axis and the peripheral edge of the support surface.

In accordance with another aspect of the present disclosure, a processing apparatus configured for layer deposition on a flexible substrate is provided. The processing apparatus includes a vacuum processing chamber, a device for supporting a flexible substrate according to the present disclosure, and one or more processing tools, the device being located in a vacuum processing chamber, the one or more processing tools Selected from the group consisting of a deposition source and an etch tool, wherein the one or more processing tools are located adjacent to the coating drum of the device.

According to still another aspect of the present disclosure, a method for supporting a flexible substrate on a coating drum is provided. The method includes supporting a flexible substrate on a support surface of a coating drum, wherein the support surface is symmetrical with respect to a rotational axis of the coating drum, and wherein the rotating shaft and the supporting surface are in a direction perpendicular to the rotating shaft A distance therebetween varies along the axis of rotation, and a force is applied to the plurality of edge portions of the flexible substrate by the support surface.

Embodiments are also directed to apparatus for performing the disclosed methods, and include apparatus portions for performing the various method aspects described. These method aspects can be performed by hardware components, computers programmed with appropriate software, by any combination of the two, or in any other manner. Furthermore, embodiments in accordance with the present disclosure are also directed to A method of operating the device. A method for operating the device includes method aspects for performing each function of the device.

1‧‧‧ arrow

10‧‧‧Flexible substrate

100‧‧‧ device

105‧‧‧Rotary axis

110‧‧‧Support surface

112‧‧‧Central Part

114‧‧‧First border

116‧‧‧ second border

120‧‧‧First distance

122‧‧‧Second distance

124‧‧‧Width

400‧‧‧ device

410‧‧‧First linear inclined part

412‧‧‧Second linear inclined part

414‧‧‧Central Part

415‧‧‧ first border

416‧‧‧ second border

500‧‧‧ device

520‧‧‧ Straight line

522‧‧‧Width

600‧‧‧ device

610‧‧‧ first curve section

612‧‧‧Second curve section

615‧‧‧ first border

616‧‧‧ second border

700‧‧‧Processing equipment

701‧‧‧Plug chamber part unit

702‧‧‧First chamber section

703‧‧‧Substrate chamber part unit

704‧‧‧Second chamber section

705‧‧‧vacuum flange

706‧‧‧ third chamber section

708‧‧‧ partition wall

709‧‧‧Gap brake

710‧‧‧ Coating drum

711‧‧‧ dotted line

730‧‧‧Sedimentary source

732‧‧‧ etching tool

740‧‧ units

742‧‧‧Pretreatment of plasma source

744‧‧‧Optical measuring unit

746‧‧‧Ionization unit

764‧‧‧First Roller

765‧‧‧Second roller

766‧‧‧plug-in roller

767‧‧‧Side Roller

800‧‧‧ method

810‧‧‧ square

820‧‧‧ square

In order to be able to understand the details of the above-mentioned features of the present disclosure, a more detailed description of the disclosure of the present disclosure will be made with reference to the embodiments. The drawings are directed to embodiments of the present disclosure and are described as follows: Figure 1 illustrates a cross-sectional view of an apparatus for supporting a flexible substrate in a vacuum processing chamber in accordance with embodiments described herein.

Fig. 2 is a schematic cross-sectional view showing another embodiment of the apparatus of Fig. 1.

Figure 3 shows a schematic view of one of the devices for supporting a flexible substrate in accordance with embodiments described herein.

Figure 4 illustrates a cross-sectional view of one of the devices for supporting a flexible substrate in a vacuum processing chamber in accordance with embodiments described herein.

Figure 5 illustrates a cross-sectional view of one of the devices for supporting a flexible substrate in a vacuum processing chamber in accordance with additional embodiments described herein.

Figure 6 shows a schematic cross-sectional view of an apparatus for supporting a flexible substrate in a vacuum processing chamber in accordance with still further embodiments described herein.

Figure 7 illustrates a cross-sectional schematic view of a processing apparatus configured for layer deposition on a flexible substrate in accordance with embodiments described herein.

Figure 8 illustrates a flow chart of a method for supporting a flexible substrate on a coating drum in accordance with embodiments described herein.

Various embodiments of the present disclosure will now be described in detail, one or more examples of which are illustrated in the drawings. In the following description of the drawings, the same reference numerals are used to refer to the same elements. In general, only the differences of the individual embodiments will be described. The examples are provided by way of explanation of the disclosure, and are not intended to be limiting. In addition, features illustrated or described as part of one embodiment can be used or combined with other embodiments to produce yet another embodiment. The content is intended to encompass such modifications and variations.

The temperature of the flexible substrate can be increased during substrate processing, for example during the coating process. Flexible substrates may be damaged by increased temperatures. In particular, the edges of the substrate may experience thermal damage, for example, the edges of the substrate may become wavy or wrinkled. According to the present disclosure, the coating drum has a varying diameter to locally increase the tension of the flexible substrate. As an example, varying diameters can increase the tension of the substrate toward the edges and/or the tension at the edges of the substrate. The local increase in the tension of the flexible substrate allows for mitigation or even avoidance of thermal damage to the flexible substrate. Specifically, by increasing the tension at the edge of the substrate, it is possible to prevent the edge of the substrate from becoming wavy or wrinkled.

The term "tension", as used throughout the disclosure, can be understood as a "pull" that operates on a flexible substrate by a support surface. Specifically, "tension" is relative to "compression."

The term "flexible substrate", as used herein, shall encompass a flexible substrate such as a coil or foil. It is noted herein that the flexible substrate as used in the embodiments described herein can be characterized as being bendable.

1 shows a schematic cross-sectional view of an apparatus 100 for supporting a flexible substrate in a vacuum processing chamber in accordance with an embodiment described herein, the apparatus 100 having a coating drum that can be wrapped around A rotating shaft 105 rotates. Specifically, FIG. 1 shows a schematic cross-sectional view of the apparatus 100 in a plane parallel to the axis of rotation 105. Figure 2 shows another schematic cross-sectional view of the apparatus of Figure 1 in a plane perpendicular to the axis of rotation 105.

The apparatus 100 includes or is a coating drum that is rotatable about a rotational axis 105. The coating drum has a support surface 110 that is configured to support a flexible substrate, wherein the support surface 110 is symmetrical with respect to the axis of rotation 105. As an example, the support surface 110 is substantially symmetrical about the axis of rotation 105. The word "substantially" should be interpreted as the cause of the manufacturing tolerance of the coating drum, particularly the manufacturing tolerance of the support surface 110. A first distance 120 between the rotating shaft 105 and a central portion 112 of the support surface 110 in a direction perpendicular to the axis of rotation 105 is less than a second distance 122 between the axis of rotation 105 and a peripheral edge of the support surface 110 .

The coating drum can also be referred to as a "substrate support." In particular, the coating drum can be configured to support the flexible substrate in a vacuum processing chamber during substrate processing such as a coating process. In particular, the flexible substrate can be moved through a coating zone of the vacuum processing chamber that is provided at the location of the coating drum and corresponding to one or more deposition sources. During operation, the coating drum rotates about the axis of rotation 105 such that the flexible substrate moves forward or backward. As an example, the coating drum is configured to rotate clockwise or counterclockwise about the axis of rotation 105 to transport the flexible substrate.

The term "support surface", as used throughout the disclosure, refers to a surface that is configured to contact a flexible substrate to support a flexible substrate. In particular, the support surface is different from the coating drum and is not intended or provided to contact or support other surface portions of the flexible substrate.

According to some embodiments that can be combined with other embodiments described herein, the support surface 110 can be provided by a circumferential surface such as an outer circumferential surface of the coating drum. In some embodiments, the coating drum can be substantially cylindrical, wherein the support surface 110 can be provided by a circumferential surface of a substantially cylindrical coating drum. The term "substantially cylindrical" should take into account the varying distance between the axis of rotation 105 of the coating drum and the support surface 110.

According to some embodiments that can be combined with other embodiments described herein, the perimeter of the support surface 110 is a boundary (eg, an edge or terminal) that supports the surface 110 in a direction parallel to the axis of rotation 105. As an example, the perimeter of the support surface 110 includes a first boundary 114 and a second boundary 116 relative to the first boundary 114. The support surface 110 can extend between the first boundary 114 and the second boundary 116. In the cross-sectional view of FIG. 1, the first boundary 114 can be a left edge or a left end of the support surface 110. The second boundary 116 can be a right edge or a right end of the support surface 110.

The support surface 110 has a width 124 in a direction parallel to the axis of rotation 105. The width 124 can be defined between the perimeter of the support surface 110, for example, between the first boundary 114 and the second boundary 116. The width 124 of the support surface 110 can be at least 300 mm (mm), in particular at least 1 m (m), more particularly at least 3 meter. As an example, the width of the support surface 110 can fall within a range between 300 mm and 5 meters, and more particularly can fall within a range between 400 mm and 4.5 meters.

The central portion 112 of the support surface 110 can be located at or near the center or midpoint between the circumferences of the support surface 110 in a direction parallel to the axis of rotation 105. As an example, the central portion 112 can be located at or near the center or midpoint between the first boundary 114 and the second boundary 116.

The first distance 120 and the second distance 122 can be defined or measured along a line connecting the rotating shaft 105 and the support surface 110. This line can be perpendicular to the axis of rotation 105. It should be understood that the line, in some embodiments, can be non-perpendicular to the support surface 110 due to the curvature of the support surface in a direction parallel to the axis of rotation 105.

According to some embodiments, which can be combined with other embodiments described herein, the first distance 120 is at least 90% of the second distance 122, in particular at least 95% of the second distance 122, more particularly the second distance At least 99% of 122. The difference between the first distance 120 and the second distance 122 provides a locally increased tension in the flexible substrate.

In some embodiments, the coating drum or support surface 110 can have a diameter relative to the axis of rotation 105. This diameter can be measured or defined in a plane perpendicular to the axis of rotation 105. The diameter varies along at least a portion of the axis of rotation 105 to provide a first distance 120 and a second distance 122. This diameter can also be referred to as "localized diameter". The local diameter can be between the rotating shaft 105 and the supporting surface 110 Partial) twice the distance. As an example, the maximum diameter of the coating drum or support surface 110 can be twice the second distance 122. The minimum diameter of the coating drum or support surface 110 can be twice the first distance 120.

According to some embodiments which can be combined with other embodiments described herein, the diameter or maximum diameter of the coating drum at the periphery of the support surface 110 is at least 300 mm, in particular at least 0.5 mm, more particularly at least 1 meter. In particular, the diameter or maximum diameter of the coating drum at the periphery of the support surface is at least 0.5 meters. The diameter or maximum diameter can fall within the range between 300 mm and 3 meters, especially between 400 mm and 2 meters, more particularly at 400 mm and 1.8 m. Between the limits.

According to some embodiments that can be combined with other embodiments described herein, a diameter difference falls within the range of 0.005% to 5% of the width 124 of the support surface 110, particularly 0.01 of the width 124 of the support surface 110. It is in the range of % to 2%, more particularly in the range of 0.01% to 0.5% of the width 124 of the support surface 110. This difference in diameter can be defined as the difference between the largest diameter and the smallest diameter of the support surface 110. As an example, the difference in diameter can be defined as the difference between the diameter of the support surface 110 at the periphery of the support surface 110 (eg, the largest diameter) and the diameter of the support surface 110 at the central portion 112 of the support surface 110 (eg, the smallest diameter).

According to some embodiments which can be combined with other embodiments described herein, for a width of the support surface 110 per metre, a difference in diameter is less than 5 mm, in particular less than 2 mm, more particularly less than 1 mm.

According to some embodiments that can be combined with other embodiments described herein, the distance between the rotating shaft 105 and the support surface 110, such as the first distance 120 and the second distance 122, in a plane perpendicular to the axis of rotation 105 It is essentially constant. Specifically, the distance or diameter varies along the axis of rotation 105 and does not change in a plane perpendicular to the axis of rotation 105.

According to some embodiments that can be combined with other embodiments described herein, the support surface 110 has one or more concave portions. In particular, the support surface 110 can have a cross section in a plane (eg, FIG. 1) that is parallel to the axis of rotation 105 and in which the axis of rotation 105 is located. The outer circumference of the section of the support surface 110 can have the one or more concave portions. A concave coating drum (also referred to as a "concave roller" can increase the tension at the edge of the flexible substrate. Thermal damage on the edge of the flexible substrate can be mitigated or even avoided.

The terms "concave" and "concave", as used throughout the disclosure, are understood to mean that the support surface is curved inwardly relative to the axis of rotation 105. As an example, the distance between the support surface 110 and the axis of rotation 105 (or the diameter of the support surface 110) can be continuously and/or non-linearly reduced from one of the circumferences of the support surface 110 to one of the central portions 112. . This distance or diameter of the support surface 110 can be increased continuously and/or non-linearly in the direction from the central portion 112 to the periphery of the support surface 110, such as one of the first boundary 114 and the second boundary 116.

In some embodiments, as depicted in Figure 1, the support surface 110 is comprised of the concave portion. In other words, the entire support surface is concave in shape. In its In his implementation, the support surface 110 has two or more concave portions that can be successively disposed in a direction parallel to the axis of rotation 105.

The one or more concave portions can provide at least one of a circumference of the support surface 110 and the central portion 112. As an example, the one or more concave portions can provide a first boundary 114, a central portion 112, and a second boundary 116 of the support surface 110.

In some embodiments, the coating drum includes a cooling device configured to cool the support surface 110, such as to cool the support surface 110 during substrate processing. Cooling of the support surface 110 can further mitigate thermal damage to the flexible substrate, such as to further mitigate thermal damage to the flexible substrate during the coating process. According to some embodiments, the coating drum can be a double-walled coating drum. A cooling liquid can be provided between the two walls of the double wall coating drum. The two walls can be an inner wall and an outer wall, wherein the outer wall can provide a support surface 110.

FIG. 3 shows a schematic diagram of an apparatus 100 for supporting a flexible substrate 10 in accordance with an embodiment described herein. The coating drum is configured to support the flexible substrate 10 in a vacuum processing chamber during a substrate processing such as a coating process. In particular, the flexible substrate 10 can be moved through a coating zone that is provided at the location of the coating drum and corresponding to one or more deposition sources (not shown). During operation, the coating drum rotates about the axis of rotation 105, for example, clockwise or counterclockwise, causing the flexible substrate 10 to move forward or backward.

A coating drum having a varying diameter can locally increase the tension in the substrate. For example, varying diameters can increase the tension of the substrate toward the edges. The local increase in the tension of the flexible substrate allows for mitigation or even avoidance of thermal damage to the flexible substrate. Specifically, by increasing the tension at the edge of the substrate, it is possible to prevent the edge of the substrate from becoming wavy or wrinkled. It is to be noted that the present disclosure is not limited to increasing the tension at the edge of the substrate. The diameter of the coating drum can be varied such that the tension locally increases where the flexible substrate is selected, such as where thermal damage may occur.

4 is a schematic diagram of an apparatus 400 for supporting a flexible substrate in a vacuum processing chamber in accordance with embodiments described herein.

According to some embodiments, which can be combined with other embodiments described herein, the support surface has one or more linearly inclined portions that are linearly oriented in a direction parallel to the axis of rotation 105. tilt. Specifically, the support surface can have a cross section in a plane (for example, FIG. 4) parallel to the rotation axis 105 and in which the rotation axis 105 is located. The outer circumference of the section of the support surface can have the one or more linear sloped portions.

In some embodiments, the one or more linearly inclined portions comprise a first linear inclined portion 410 and a second linear inclined portion 412, wherein the first linear inclined portion 410 and the second linear inclined portion 412 are opposite Tilted ground. As an example, the distance between the support surface 110 and the axis of rotation 105 can increase linearly from the central portion 414 to the various perimeters of the support surface, such as the first boundary 415 and the second boundary 416. Specifically, the first linear inclined portion 410 and the second linear inclined portion 412 Can be mirrored in reverse with respect to each other. According to some embodiments, the first linear inclined portion 410 and the second linear inclined portion 412 together can form a V shape.

According to some embodiments, the first linear inclined portion 410 and the second linear inclined portion 412 are connected to each other, for example, to the central portion 414 of the support surface. In particular, the connecting portion between the first linear inclined portion 410 and the second linear inclined portion 412 can provide the central portion 414.

In some embodiments, the first linear inclined portion 410 can be a first truncated cone and the second linear inclined portion 412 can be a second truncated cone. The first truncated cone and the second truncated cone can have substantially the same shape. In particular, the first truncated cone and the second truncated cone are mirror in reverse with respect to each other.

Figure 5 illustrates a schematic of an apparatus 500 for supporting a flexible substrate in a vacuum processing chamber in accordance with additional embodiments described herein.

According to some embodiments that can be combined with other embodiments described herein, the support surface has one or more straight portions 520 that are substantially parallel to the axis of rotation 105. In particular, the distance between the axis of rotation 105 and one or more of the linear portions 520 of the support surface can be substantially constant along (or parallel to) the axis of rotation 105. This distance can be measured in a direction perpendicular to the axis of rotation 105. The phrase "substantially parallel" relates to a direction in which, for example, one of the one or more straight portions 520 of the rotating shaft 105 and the support surface is substantially parallel, wherein a deviation of a few degrees from a precise parallel direction, for example A deviation of 5° or even 10° is still considered to be “substantially parallel”.

The one or more straight portions 520 can have a width 522 in a direction parallel to the axis of rotation 105. The width 522 of the one or more straight portions 520 can be less than 25%, less than 10%, and more specifically less than 5% of the total width of the support surface (indicated by the symbol "124" in Figure 1).

In some embodiments, the one or more straight portions 520 provide a central portion of the support surface. As an example, one or more of the straight portions 520 can be provided between two or more portions having varying distances relative to the axis of rotation 105. Specifically, one or more straight portions 520 can be provided between two or more linear inclined portions such as the first linear inclined portion 410 and the second linear inclined portion 412.

Figure 6 shows a schematic diagram of an apparatus 600 for supporting a flexible substrate in a vacuum processing chamber in accordance with still further embodiments described herein. Device 600 has one or more straight portions 520 as described above with reference to Figure 5. In the example of FIG. 6, one or more straight portions 520 are provided between two or more curved portions, such as a first curved portion 610 and a second curved portion 612. The one or more curved portions can be at least one of a non-linear portion and a concave portion.

In some embodiments, the distance between one or more curved portions of the support surface and the axis of rotation 105 can be from a central portion (eg, provided by one or more straight portions 520) to various perimeters of the support surface, such as The first boundary 615 and the second boundary 616 increase non-linearly. In particular, the first curved portion 610 and the second curved portion 612 can be mirror inverted with respect to each other.

Figure 7 shows a schematic diagram of a processing apparatus 700 configured for layer deposition on a flexible substrate 10 in a vacuum processing chamber, such as continuous winding, in accordance with embodiments described herein. Type deposition equipment.

Processing apparatus 700 includes a device for supporting a flexible substrate in a vacuum processing chamber, and one or more processing tools selected from the group of embodiments described herein, A group of deposition sources and etching tools. The one or more processing tools are located adjacent to the coating drum 710 of the device. The coating drum 710 has a varying diameter, as indicated by the dashed line 711.

Processing apparatus 700 can include at least three chamber portions, such as a first chamber portion 702, a second chamber portion 704, and a third chamber portion 706. The third chamber portion 706, or a combination of the second chamber portion 704 and the third chamber portion 706, can be a vacuum processing chamber configured as the present disclosure. The one or more processing tools, such as one or more deposition sources 730 and one or more etching tools 732, can be provided in the third chamber portion 706.

The flexible substrate 10 is provided on a first roller 764, which has, for example, a winding shaft. The flexible substrate 10 is unwound from the first roller 764 as indicated by the direction of substrate movement indicated by arrow 1. A dividing wall 708 provides a separation for the first chamber portion 702 and the second chamber portion 704. The partition wall 708 can be further provided with a plurality of gap sluices 709 for the flexible substrate 10 to pass therethrough. A vacuum flange 705 between the second chamber portion 704 and the third chamber portion 706 can be provided with a plurality of openings to receive the one or more processing tools, such as one or more deposition sources 730 and one or More etching tools 732.

The flexible substrate 10 is moved through a plurality of deposition zones (or coating zones) that are provided at the location of the coating drum 710 and corresponding to one or more deposition sources 730. During operation, the coating drum 710 rotates about the rotating shaft 105 such that the flexible substrate 10 moves in the direction of arrow 1. According to some embodiments, the flexible substrate 10 is guided from the first roller 764 to the coating drum 710 through one, two, or more rollers, and from the coating drum 710 to the second roller 765, second The roller 765 has, for example, a winding shaft on which the flexible substrate 10 is wound after the flexible substrate 10 is processed.

In some embodiments, the first chamber portion 702 is partitioned into an insert chamber portion unit 701 and a substrate chamber portion unit 703. A plurality of insert rolls 766 and a plurality of insert rolls 767 can be provided as a composite component of the processing apparatus 700. The processing apparatus 700 can also include a preheating unit 740 to heat the flexible substrate 10. Additionally or alternatively, a pre-processed plasma source 742, such as a radio frequency plasma source, can be provided to plasma treat the flexible substrate 10 prior to entering the third chamber portion 706.

According to yet another embodiment capable of being combined with other embodiments described herein, an optical measurement unit 744 for evaluating the results of substrate processing, and/or for adapting to the flexible substrate 10, can be selectively provided. One or more ionization units 746 of charge.

Figure 8 illustrates a flow diagram of a method 800 for supporting a flexible substrate on a coating drum in accordance with embodiments described herein. The method can be used according to The apparatus of the described embodiments for supporting a flexible substrate in a vacuum processing chamber, and a processing apparatus configured for layer deposition on a flexible substrate are implemented.

The method includes, in block 810, supporting a flexible substrate on a support surface of a coating drum, wherein the support surface is symmetrical with respect to a rotational axis of the coating drum, and wherein one of the axes perpendicular to the axis of rotation A distance between the rotating shaft and the support surface in the direction varies along the axis of rotation. The method includes, in block 820, applying a force through the support surface at a plurality of edge portions of the flexible substrate.

According to some embodiments, the method 800 further includes rotating the coating drum about the axis of rotation to move the flexible substrate through a processing zone provided in the vacuum processing chamber. In some embodiments, method 800 includes processing a flexible substrate in the processing zone. The processing of the flexible substrate can include at least one of depositing a material layer on the flexible substrate and performing an etching process.

According to embodiments described herein, a method for supporting a flexible substrate on a coating drum can be performed by using a computer program, a software, a computer software product, and a controller associated with each other, the correlation being The controller can have a central processing unit, a memory, a user interface, and input and output means for communicating with corresponding elements of the apparatus of the present disclosure.

According to the present disclosure, the coating drum has a varying diameter to locally increase the tension of the substrate. As an example, varying diameters can increase the tension of the substrate toward the edge of the substrate. The local increase in the tension of the flexible substrate allows for mitigation or even avoidance of thermal damage to the flexible substrate. Specifically, by increasing the tension at the edge of the substrate, it is possible to prevent the edge of the substrate from becoming wavy or wrinkled.

While the foregoing is a description of the embodiments of the present invention, the scope of the disclosure is intended to be limited by the scope of the appended claims.

Claims (19)

An apparatus for supporting a flexible substrate in a vacuum processing chamber, comprising: a coating drum rotatable about a rotational axis, wherein the coating drum has a support surface configured to Supporting the flexible substrate, wherein the coating drum comprises a cooling device configured to cool the support surface; wherein the support surface is symmetrical with respect to the axis of rotation, and wherein A first distance between the rotating shaft and a central portion of the support surface in a direction of the rotating shaft is less than a second distance between the rotating shaft and a peripheral edge of the supporting surface. The device of claim 1, wherein the first distance is at least 95% of the second distance. The device of claim 1, wherein the circumference of the support surface comprises a first boundary of the support surface and a second boundary of the support surface relative to the first boundary. The device of claim 1, wherein the support surface has one or more concave portions. The device of claim 5, wherein the support surface is comprised of the one or more concave portions. The device of claim 5, wherein the one or more concave portions provide at least one of the circumference and the central portion of the support surface. The device of claim 6, wherein the one or more concave portions provide at least one of the circumference and the central portion of the support surface. The device of claim 1, wherein the support surface has one or more linear inclined portions that are linearly inclined in a direction parallel to the rotational axis. The apparatus of claim 9, wherein the one or more linear inclined portions comprise a first linear inclined portion and a second linear inclined portion, wherein the first linear inclined portion and the second The linearly inclined portions are relatively inclined. The device of claim 10, wherein the first linear inclined portion and the second linear inclined portion are connected to each other at the central portion of the support surface. The device of claim 1, wherein the support surface has one or more straight portions that are parallel to the axis of rotation. The device of claim 7, wherein the support surface has one or more straight portions that are parallel to the axis of rotation. The device of claim 9, wherein the support surface has one or more straight portions that are parallel to the axis of rotation. The device of any one of claims 12 to 14, wherein at least a straight line portion of the one or more straight portions provides the central portion of the support surface. The apparatus of any one of claims 1 to 14, wherein the coating drum has a diameter of the circumference of the support surface of at least 300 mm. The apparatus of any one of claims 1 to 14, wherein a diameter of the coating drum at the circumference of the support surface falls within a range between 300 mm and 3 meters. A processing apparatus configured for layer deposition on a flexible substrate, comprising: a vacuum processing chamber; the apparatus of claim 1 in the vacuum processing chamber; and More processing tools are selected from the group consisting of a deposition source and an etch tool, wherein the one or more processing tools are located adjacent to the coating drum of the device. A method for supporting a flexible substrate on a coating drum, comprising: supporting the flexible substrate on a support surface of the coating drum, wherein a rotation of the support surface relative to the coating drum The shaft is symmetrical, and wherein a distance between the axis of rotation and the support surface in a direction perpendicular to the axis of rotation is along the axis of rotation Variations wherein the coating drum comprises a cooling device configured to cool the support surface; and applying a force to the plurality of edge portions of the flexible substrate by the support surface. The method of claim 18, wherein the coating drum has a diameter of at least 300 mm at a peripheral edge of the support surface.