JPH0372073A - Production of long-sized object coated with ceramics having excellent adhesive property - Google Patents
Production of long-sized object coated with ceramics having excellent adhesive propertyInfo
- Publication number
- JPH0372073A JPH0372073A JP20791989A JP20791989A JPH0372073A JP H0372073 A JPH0372073 A JP H0372073A JP 20791989 A JP20791989 A JP 20791989A JP 20791989 A JP20791989 A JP 20791989A JP H0372073 A JPH0372073 A JP H0372073A
- Authority
- JP
- Japan
- Prior art keywords
- long
- sized object
- long object
- adhesive property
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 230000001070 adhesive effect Effects 0.000 title abstract 5
- 238000007733 ion plating Methods 0.000 claims abstract description 14
- 238000001704 evaporation Methods 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 13
- 238000005524 ceramic coating Methods 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 5
- 230000007547 defect Effects 0.000 abstract 1
- 230000007812 deficiency Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910001423 beryllium ion Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 244000025254 Cannabis sativa Species 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、密着性が均一かつ優れたセラ稟ツク被膜を有
する長尺物の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Field of Application> The present invention relates to a method for manufacturing a long article having a ceramic film with uniform and excellent adhesion.
〈従来の技術〉
近年、金属、ガラス、プラスチック等の素材表面に別種
の物質の被膜を形成し、新規な特性を具備させたり、あ
るいは素材の特性を向上させることが盛んに行われてい
る。<Prior Art> In recent years, it has become common practice to form a film of a different type of substance on the surface of materials such as metals, glass, plastics, etc. to provide them with new characteristics or to improve the characteristics of the materials.
具体例としては、ｔｊＡ ４ｔＦに亜鉛を連続的に真空
蒸着すること、レンズ等に各種の反射防・止膜を成膜す
ること、ドリル、バイト等の切削工具でＴｉＮ。Specific examples include continuous vacuum deposition of zinc on tjA 4tF, formation of various antireflection/anti-reflection films on lenses, etc., and TiN coating with cutting tools such as drills and bits.
ＴＩＣなどを成膜し耐摩耗性を向上させることなどが挙
げられる。ことに真空技術の進展に伴い、金属ストリッ
プに連続的にＴＩＮなどのセラミック被膜も形成し得る
ようになり、ステンレス鋼板表面にＴｉＮを形成し、そ
の美麗な黄金色により、装飾用あるいは外装用素材とし
ての用途が開拓されつつある。Examples include forming a film of TIC or the like to improve wear resistance. In particular, with advances in vacuum technology, it has become possible to continuously form ceramic coatings such as TIN on metal strips. Its uses are being developed.
上記のような被膜を密着性よく形成させるために、蒸発
物をイオン化して被着するイオンプレーティングが利用
されている。In order to form the above-mentioned film with good adhesion, ion plating, in which evaporated matter is ionized and deposited, is used.
イオンプレーティングを連続的に施すための装置として
は、特開昭６１〜２８１８６７号公報に開示されるよう
な、長尺物コイルを大気中から真空装置を経て再び大気
中へ戻るようなＡｉｒ ｔｏ Ａｉｒ方式のものが実用
化されている。その−例を第４図により説明する。これ
は、片面交互成膜を行うものであり、１はイオンプレー
ティングされる長尺物、２ａ〜２ｃは長尺物を高真空に
排気されたイオンプレーティング室に導入するための順
次圧力が低くなっている入側差圧室、３８〜３ｄは入側
差圧各室のシールロールである。４は長尺物を予備的に
加熱するための加熱装置であり、一般的には電子ビーム
銃、赤外線照射装置などが利用されている。An example of a device for continuously applying ion plating is an Air to Co., Ltd. device, which takes a long coil from the atmosphere, passes through a vacuum device, and returns to the atmosphere, as disclosed in Japanese Unexamined Patent Publication No. 1986-281867. Air type devices have been put into practical use. An example thereof will be explained with reference to FIG. This method performs single-sided alternating film formation, and 1 is a long object to be ion plated, and 2a to 2c are long objects to be ion plated. The inlet differential pressure chambers 38 to 3d are seal rolls for each of the inlet differential pressure chambers. 4 is a heating device for preliminarily heating a long object, and generally an electron beam gun, an infrared ray irradiation device, etc. are used.
５は高真空に排気されたイオンプレーティング室、６は
蒸発物７を収容したるつぼ、８ａ、８ｂは長尺物の方向
を変えるためのガイドロール、９は草発物１０を収容し
たるつぼである。１１ａ−１１ｃはイオンプレーティン
グされた長尺物１を大気中へ導出するための順次圧力が
高くなっている出側差圧室、１２ａ〜１２ｄは出側差圧
各室のシールロールである。１３は長尺物１のペイオフ
リール、１４はテンションリールである。１５ａ〜１５
ｄは人、出側差圧室３８〜３ｄ、ｌ１ａ−１ｉｄを〃ｉ
気するための真空ポンプである。これらの他に、図示し
ていないが、蒸発物を加熱蒸発させるための装置、一般
的には電子ビーム銃、ホローカソード放電（ＨＣＤ）銃
など、及び反応ガス吹込み管が必要である。5 is an ion plating chamber evacuated to a high vacuum, 6 is a crucible containing the evaporated material 7, 8a and 8b are guide rolls for changing the direction of the long object, and 9 is a crucible containing the herb 10. be. Reference numerals 11a to 11c designate outlet differential pressure chambers in which pressures are successively increased to guide the ion-plated long object 1 into the atmosphere, and 12a to 12d designate seal rolls for each outlet differential pressure chamber. 13 is a payoff reel for the long object 1, and 14 is a tension reel. 15a-15
d is a person, outlet differential pressure chambers 38 to 3d, l1a-1id are
It is a vacuum pump for cleaning. In addition to these, although not shown, a device for heating and vaporizing the evaporated material, typically an electron beam gun, a hollow cathode discharge (HCD) gun, etc., and a reaction gas blowing tube are required.
上記のような装置において、基板である長尺物ｌは、第
５図のように、平坦な状態でセラミンク被膜を形成する
ことが従来の方法であった。ここで、第５図は、第４図
の■〜■線矢視拡大図である。長尺物ｌの端部への蒸発
物７の入射角度は９０度からずれている。In the above-mentioned apparatus, the conventional method is to form a ceramic coating on the elongated substrate L in a flat state as shown in FIG. Here, FIG. 5 is an enlarged view of FIG. The angle of incidence of the evaporated material 7 on the end of the long object 1 is deviated from 90 degrees.
なお、特開昭５９−８３７６５号公報には、亜鉛を長尺
物に真空蒸着するに際し、雰囲気圧力と基板温度を好適
化することにより被膜の密着性を向上させる方法が開示
されており、一基板温度が低いほど良好な密着性が得ら
れると記述されている。しかし、この公報に示された温
度と密着性の関係は、亜鉛結晶粒サイズにより、低温域
において密着性が向上するというものである。これに対
し、イオンプレーティングにおいては、密着性を支配す
る要因はセラミック被膜と基板との混合層にあり、特開
昭５９−８３７６５号公報の技術とは思想的に異なるも
のである。Furthermore, Japanese Patent Application Laid-Open No. 59-83765 discloses a method for improving the adhesion of a film by optimizing the atmospheric pressure and substrate temperature when vacuum-depositing zinc onto a long object. It is stated that the lower the substrate temperature, the better the adhesion can be obtained. However, the relationship between temperature and adhesion shown in this publication is that adhesion improves in a low temperature range depending on the zinc grain size. On the other hand, in ion plating, the factor governing the adhesion is the mixed layer of the ceramic coating and the substrate, which is conceptually different from the technique of JP-A-59-83765.
〈発明が解決しようとするＦＪＡＢ＞
ところが、前述の従来のイオンプレーティング法により
長尺物にＴｉＮなどのセラミック被膜を形成した場合、
７７！膜直後は顕在化しないが、後に機械加工、焼鈍な
どを行った際、セラミック被膜の密着不良部は剥離を生
じ、製品特性、製品外観を著しくｍなう欠点があった。<FJAB to be solved by the invention> However, when a ceramic coating such as TiN is formed on a long object using the conventional ion plating method described above,
77! Although it does not become apparent immediately after the film is applied, when machining, annealing, etc. are performed later, the poor adhesion of the ceramic film causes peeling, which has the disadvantage of significantly deteriorating the product characteristics and product appearance.
特に、板幅の端部にその領内が強く、製品歩留りの著し
い低下を招くという問題点があった。In particular, there was a problem in that the area was strong at the edge of the width of the plate, resulting in a significant decrease in product yield.
本発明は、このような問題を解決し、長尺物の全幅にわ
たり密着性が優れたセラミック被膜を有する長尺物の製
造方法を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to solve such problems and provide a method for manufacturing a long object having a ceramic coating with excellent adhesion over the entire width of the long object.
く課題を解決するための手段〉
本発明は、金属ストリップなどの長尺物に連続的にイオ
ンプレーティングによりセラミック被膜を形成するに際
し、長尺物を蒸発源から見て板幅方向に凹型に湾曲させ
て成膜することを特徴とする密着性の優れたセラミック
被覆長尺物の製造方法であり、
また、上記清面させた長尺物の板幅方向両端部を中央部
に比べ、ｌＯ°Ｃ以上高温に加熱して成膜することを特
徴とする密着性の優れたセラミック被覆長尺物の製造方
法である。Means for Solving the Problems> The present invention provides a method for forming a concave shape in the width direction of a long object such as a metal strip when viewed from an evaporation source when a ceramic coating is continuously formed on a long object such as a metal strip by ion plating. This is a method for manufacturing a ceramic-coated long article with excellent adhesion, which is characterized by forming a film in a curved manner. This is a method for producing a long ceramic coated article with excellent adhesion, which is characterized in that the film is formed by heating to a high temperature of .degree. C. or higher.
〈作 用〉
本発明者等は、イオンプレーティングにおける基４Ｆｉ
（長尺物）と形成されたセラミック被膜の端部におけ
る密着性に関して、検討を行った結果、膜厚と成膜温度
が関係している事実を見出した。<Function> The present inventors have discovered that the group 4Fi in ion plating
As a result of investigating the adhesion at the end of a ceramic coating formed on a long object, it was discovered that the film thickness and film formation temperature are related.
前者に関しては膜厚が薄さに過ぎると剥離の発生可能性
が高く、後者に関してはセラ旦ツクの各物質に好適な形
成温度の範囲があり、下限を下回ると密着性が急激に劣
化し、温度上昇により密着性の向上が見られるという知
見である。Regarding the former, if the film thickness is too thin, there is a high possibility of peeling, and regarding the latter, there is a suitable formation temperature range for each material in the ceramic material, and if it falls below the lower limit, the adhesion will deteriorate rapidly. This is the knowledge that adhesion improves as the temperature rises.
膜厚の幅方向の均一化を達成するには、るつぼと板幅方
向に複数個並べる方法が最も容易であるが、被着されな
かった蒸発物（無効蒸気）が真空槽内に堆積し、連続運
転においては装置駆動部へ重大な影響を及ぼすこと、同
時に経済的に不利であるため最適な方法ではない、そこ
で、成膜時間を延ばし、端部の膜厚を通常の条件の板幅
中央の値と同しにしたが、密着性は通常のｒｆｉ４ｆｆ
、時の中央部に比べ劣っていた。さらに、前記の知見か
ら、端部の温度を中央部より高く設定し、同様の実験を
繰り返したが、改善は認められたものの中央部と同程度
には至らなかった。The easiest way to achieve uniform film thickness in the width direction is to line up multiple crucibles in the width direction of the plate, but undeposited evaporated matter (ineffective vapor) accumulates in the vacuum chamber. In continuous operation, it is not the best method because it has a serious effect on the device drive part and is economically disadvantageous. Therefore, we decided to extend the film formation time and reduce the film thickness at the edge to the center of the board width under normal conditions. The adhesion was the same as that of the normal rfi4ff.
, was inferior to the central part at the time. Further, based on the above findings, the temperature at the end portions was set higher than the center portion and similar experiments were repeated, but although an improvement was observed, it did not reach the same level as the center portion.
本発明者等は引き続き、密着性を支配する要因に関し検
討を重ねた結果、渾発物の基板への入射角度が極めて重
要であり、入射角度が９０°に近いほど密着性が優れて
いるという知見を得た。The inventors continued to study the factors that govern adhesion, and found that the angle of incidence of the repellent onto the substrate is extremely important, and the closer the angle of incidence is to 90°, the better the adhesion. I gained knowledge.
また、膜厚、温度分布を種々変化させ、湾曲の有無によ
り密着性の評価を行ったところ、長尺物を湾曲させるこ
とにより、端部と中央部の密着性の差は大幅に改善され
、さらに両端部温度が中央部温度より高い場合に、両端
部で密着性の差のない被膜が形成されることを見出した
０本発明は、このような知見を基に完成したものである
。In addition, when we varied the film thickness and temperature distribution and evaluated the adhesion based on the presence or absence of curvature, we found that by curving a long object, the difference in adhesion between the edges and the center was significantly improved. Furthermore, it was discovered that when the temperature at both ends is higher than the temperature at the center, a film with no difference in adhesion is formed at both ends.The present invention was completed based on this finding.
本発明によれば、長尺物端部の膜厚の不足による密着性
不良は、長尺物を蒸発源から見て凹型に湾曲させ、蒸気
の入射角度を９０°に近づけることにより改善される。According to the present invention, poor adhesion due to insufficient film thickness at the end of a long object can be improved by curving the long object in a concave shape when viewed from the evaporation source and bringing the incident angle of vapor closer to 90°. .
さらに、端部の温度を中央部に比べ、１０°Ｃ以上高温
とすることにより、中央部と端部の密着性の差はさらに
解消される。Furthermore, by setting the temperature of the end portions to be 10° C. or more higher than that of the center portion, the difference in adhesion between the center portion and the end portions is further eliminated.
このような本発明の作用は、長尺物の温度が高いほど形
成された被膜と長尺物界面の混合層が形成されやすいこ
と、蒸発物の入射角度が基板に対して９０°に近いほど
混合層が厚くなることにより、密着性が向上するものと
Ｈｅ察される。Such effects of the present invention are such that the higher the temperature of the long object is, the more likely a mixed layer is to be formed between the formed film and the interface of the long object, and the closer the incident angle of the evaporated material is to 90 degrees with respect to the substrate It is believed that the thicker the mixed layer, the better the adhesion.
〈実施例〉 本発明の一実施例を図面に基づいて説明する。<Example> An embodiment of the present invention will be described based on the drawings.
第１図は本発明の方法を実施する装置の一例を概略的に
示した全体ｔｉ威図、第２図は第１図の１−［線矢視拡
大図、第３図は第１図の■−■線断面拡大図である。FIG. 1 is an overall diagram schematically showing an example of an apparatus for carrying out the method of the present invention, FIG. 2 is an enlarged view of FIG. It is an enlarged cross-sectional view taken along the line ■-■.
本発明の要点である、長尺物ｌの蒸発源から見て板幅方
向に凹型の湾曲は、凹型ロールを蒸発源７．１０の直上
に設け、長尺物ｌの材質に応し以下のような付加的手法
を用いることにより達成できる。In order to achieve the concave curvature of the long object 1 in the board width direction when viewed from the evaporation source, which is the gist of the present invention, a concave roll is installed directly above the evaporation source 7.10, and the following steps are performed depending on the material of the long object 1. This can be achieved by using additional techniques such as
すなわち、蒸着位置の前後に、凹型ロール１６ａ（１６
ａ’ ） 、１６ｂ （１６ｂ’ ）と凸型ロール１７
ａ（１７ａ’ ） 、１７ｂ （１７ｂ’ ）を組み合
わせた長尺物湾曲用のロール対を設け、るつぼ６．９の
上方の長尺物１の裏側には凹型ロール１６ｃ （１６ｃ
’ ）を設けである（ここで（）はるつぼ９に対応した
ロールを示す）、これにより、長尺物ｌの凹型溝０１１
を維持でき、草発物７、ｌＯの入射角度が板幅方向両端
部でも９０°に近づく、湾曲の程度は、湾曲ロール１６
ｃ （１６ｃ’ ）に接触している長尺物１の両端部の
法線が、蒸発面に入る程度が好適である。That is, concave rolls 16a (16
a'), 16b (16b') and convex roll 17
A (17a') and 17b (17b') are provided as a pair of rolls for bending a long object, and a concave roll 16c (16c) is provided on the back side of the long object 1 above the crucible 6.9.
) is provided (here, () indicates the roll corresponding to the crucible 9), thereby, the concave groove 011 of the long object l
can be maintained, the incident angle of the grass 7 and lO approaches 90° even at both ends in the sheet width direction, and the degree of curvature is the same as that of the curved roll 16.
It is preferable that the normal lines of both ends of the elongated object 1 that are in contact with c (16c') fall within the evaporation surface.
なお、長尺物ｌを湾［１１＋させるには、長尺物ｌにあ
る程度の張力を付与する必要があるが、それには、前記
の蒸着位置の前後に設けた長尺物湾曲用のロール対によ
り可能である。また、長尺物裏側に配置する凹型ロール
１６ｃを複数個使用したほうが、湾曲を維持しやすい。Note that in order to make the long object 1 curve [11+], it is necessary to apply a certain amount of tension to the long object 1. This is possible. Moreover, it is easier to maintain the curvature by using a plurality of concave rolls 16c placed on the back side of the long object.
また、もう一つの要点である長尺物１の両端部の高温化
は、イオンプレーティング前の予備加熱を電子ビーム銃
で行い、そのビーム偏向用励磁電流波型を正弦波とする
ことにより容易に達成し得る。端部と中央部の温度差は
、イオンプレーティングによ、で成膜する物質の好適被
着温度に対し、１０°Ｃ以上が好ましい。In addition, raising the temperature at both ends of the long object 1, which is another key point, can be easily achieved by preheating with an electron beam gun before ion plating and by making the excitation current waveform for beam deflection a sine wave. can be achieved. The temperature difference between the end portions and the center portion is preferably 10° C. or more relative to the preferred deposition temperature of the substance to be formed into a film by ion plating.
第１図における他の構成要素は、前述の第４図の従来装
置と同しものなので、説明を省略する。The other components in FIG. 1 are the same as those in the conventional device shown in FIG. 4, so their explanation will be omitted.
次に、具体的な実施例について説明する。Next, specific examples will be described.
厚さ０．３Ｍのステンレス１１に第１図に示すような＾
ｉｒ ｔｏ Ａｉｒ方式の連続イオンプレーティング装
置を用い、ＨＣＤ銃を用い、Ｔｉを蒸発させ、同時にＨ
ｌを吹込み、片面当たり０゜５−目標にてＴｊＮを成膜
させた。この際、第２図、第５図に示すような湾曲の有
無及び電子ビーム銃による予備加熱方法を変化させ、長
尺物端部の高温化を組み合わせて、ＴｊＮ密着性を比較
した。Stainless steel 11 with a thickness of 0.3M as shown in Figure 1 ^
Using an ir-to-air continuous ion plating device and an HCD gun, Ti was evaporated and H was evaporated at the same time.
1 was injected to form a TjN film at a target of 0°5 on one side. At this time, the TjN adhesion was compared by varying the presence or absence of curvature as shown in FIGS. 2 and 5 and by changing the preheating method using an electron beam gun, in combination with raising the temperature at the end of the long object.
密着性は、針の先端に一定の荷重をかけ、被膜上を針で
こすり、被膜が剥離する咋界荷重で評価した。長尺物の
均一加熱、平坦状態での仮幅中央部は界荷重を１とし、
他の条件をＩｕ対値で比較した。その結果を第１表に示
す。Adhesion was evaluated by applying a constant load to the tip of a needle, rubbing the coating with the needle, and measuring the force at which the coating peeled off. Uniform heating of a long object, the field load at the center of the temporary width in a flat state is 1,
Other conditions were compared by Iu versus value. The results are shown in Table 1.
第１表に示すように、凹型の湾西を施し、長尺物端部の
加熱を施した本発明例は、比較例に比べ、端部と中央部
の差がなく、均一な密着性を有するイオンプレーティン
グ被膜が形成された。As shown in Table 1, the example of the present invention, which has a concave bay and is heated at the end of the long object, has no difference between the end and the center compared to the comparative example, and has uniform adhesion. An ion-plated coating was formed having the following properties.
第１図は本発明の方法を実施する装置の一例を概略的に
示した全体構成図、第２図は第１図のＩ−ｒ線矢視拡大
図、第３図は第１図の■−■線断面拡大図、第４図は従
来のイオンプレーティング装置の説明図、第５図は第４
図の■−■線矢視拡大図である。
〈発明の効果〉
以上説明したように、本発明により、長尺物の両端部と
中央部のセラミック被膜の密着性の差をなくすことを容
易にでき、しかも、無効蒸気量も増加しないため、操業
性を阻害しない効果も有す■・・・長尺物、
２ａ〜２ｃ・・・入側差圧室、
３ａ〜３ｄ・・・シールロール、
４・・・予備加熱装置、
５・・・イオンプレーティング装置、
６・・・るつぼ、
７・・・蒸発物、
８ａ、８ｂ・・・ガイドロール、
９・・・るつぼ、
１０・・・蒸発物、
１１ａ〜Ｉｌｃ・・・出側差圧室、
１２ａ〜１２ｄ・・・シールロール
１３・・・ペイオフリール、
１４・・・テンションリール、
１．５ａ−１５ｄ・・・真空ポンプ、
１６ａ、１６ａ ’ 、１６ｂ、１６ｂ’ 、１６ｃ、
１６ｃ’・・・凹型ロール、
１７ａ、＋７ａ’ 、１７ｂ、１７ｂ’・・・凸型ロー
ル。
第３図FIG. 1 is an overall configuration diagram schematically showing an example of an apparatus for carrying out the method of the present invention, FIG. 2 is an enlarged view taken along the line I-r in FIG. 1, and FIG. -■ line cross-sectional enlarged view, Figure 4 is an explanatory diagram of the conventional ion plating device, Figure 5 is the 4th
It is an enlarged view taken along the line ■-■ in the figure. <Effects of the Invention> As explained above, according to the present invention, it is possible to easily eliminate the difference in adhesion between the ceramic coatings at both ends and the center of a long object, and the amount of ineffective steam does not increase. Also has the effect of not hindering operability ■... Long object, 2a to 2c... Inlet side differential pressure chamber, 3a to 3d... Seal roll, 4... Preheating device, 5... Ion plating device, 6... Crucible, 7... Evaporated material, 8a, 8b... Guide roll, 9... Crucible, 10... Evaporated material, 11a to Ilc... Outlet side differential pressure Chamber, 12a-12d... Seal roll 13... Payoff reel, 14... Tension reel, 1.5a-15d... Vacuum pump, 16a, 16a', 16b, 16b', 16c,
16c'...concave roll, 17a, +7a', 17b, 17b'...convex roll. Figure 3
Claims (2)
レーティングによりセラミック被膜を形成するに際し、
長尺物を蒸発源から見て板幅方向に凹型に湾曲させて成
膜することを特徴とする密着性の優れたセラミック被覆
長尺物の製造方法(1) When continuously forming a ceramic coating on a long object such as a metal strip by ion plating,
A method for manufacturing a ceramic-coated long object with excellent adhesion, characterized by forming a film by curving the long object in a concave shape in the board width direction when viewed from the evaporation source.
べ、１０℃以上高温に加熱して成膜することを特徴とす
る請求項（１）記載の密着性の優れたセラミック被覆長
尺物の製造方法。(2) The ceramic with excellent adhesion according to claim (1), characterized in that the film is formed by heating both ends in the width direction of the curved long object to a temperature of 10°C or more higher than the center part. A method for producing a coated long article.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20791989A JPH0372073A (en) | 1989-08-14 | 1989-08-14 | Production of long-sized object coated with ceramics having excellent adhesive property |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20791989A JPH0372073A (en) | 1989-08-14 | 1989-08-14 | Production of long-sized object coated with ceramics having excellent adhesive property |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0372073A true JPH0372073A (en) | 1991-03-27 |
Family
ID=16547733
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20791989A Pending JPH0372073A (en) | 1989-08-14 | 1989-08-14 | Production of long-sized object coated with ceramics having excellent adhesive property |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0372073A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997018342A1 (en) * | 1995-11-13 | 1997-05-22 | Balzers Aktiengesellschaft | Coating process and suitable substrate holder |
| KR100452758B1 (en) * | 2001-02-28 | 2004-10-14 | 주식회사 만도 | Disk Brake |
| WO2017084720A1 (en) * | 2015-11-20 | 2017-05-26 | Applied Materials, Inc. | Carrier for flexible substrates |
-
1989
- 1989-08-14 JP JP20791989A patent/JPH0372073A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997018342A1 (en) * | 1995-11-13 | 1997-05-22 | Balzers Aktiengesellschaft | Coating process and suitable substrate holder |
| US5738729A (en) * | 1995-11-13 | 1998-04-14 | Balzers Aktiengesellschaft | Coating chamber, accompanying substrate carrier, vacuum evaporation and coating method |
| CH692000A5 (en) * | 1995-11-13 | 2001-12-31 | Unaxis Balzers Ag | Coating chamber, substrate carrier therefor, method of vacuum deposition and coating methods. |
| KR100452758B1 (en) * | 2001-02-28 | 2004-10-14 | 주식회사 만도 | Disk Brake |
| WO2017084720A1 (en) * | 2015-11-20 | 2017-05-26 | Applied Materials, Inc. | Carrier for flexible substrates |
| CN108350571A (en) * | 2015-11-20 | 2018-07-31 | 应用材料公司 | Carrier for flexible base board |
| JP2018537586A (en) * | 2015-11-20 | 2018-12-20 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | Carrier for flexible substrates |
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