TWI633621B - Substrate docking device and docking method - Google Patents

Substrate docking device and docking method Download PDF

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Publication number
TWI633621B
TWI633621B TW106125508A TW106125508A TWI633621B TW I633621 B TWI633621 B TW I633621B TW 106125508 A TW106125508 A TW 106125508A TW 106125508 A TW106125508 A TW 106125508A TW I633621 B TWI633621 B TW I633621B
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substrate
docking device
docking
kit
adsorption
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TW106125508A
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TW201804561A (en
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王東
劉凱
王剛
阮冬
宋海軍
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上海微電子裝備(集團)股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67775Docking arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Abstract

本發明係揭露一種基板的對接裝置及對接方法,其中,基板的對接裝置包含帶動基板旋轉的旋轉機構以及至少一個基板吸附機構,基板吸附機構用於支撐並固定基板,旋轉機構帶動基板吸附機構旋轉。藉由本發明提供的基板的對接裝置,以實現當基板需從不同角度位置進入基板產線設備或版庫時,可優先對基板進行旋轉以達到所需的角度位置,進而實現基板的旋轉對接的過程。 The invention discloses a substrate docking device and a docking method, wherein the substrate docking device includes a rotation mechanism that drives the substrate to rotate and at least one substrate adsorption mechanism. The substrate adsorption mechanism is used to support and fix the substrate, and the rotation mechanism drives the substrate adsorption mechanism to rotate . With the substrate docking device provided by the present invention, when the substrate needs to enter the substrate production line equipment or the library from different angular positions, the substrate can be preferentially rotated to achieve the desired angular position, and then the substrate can be rotated and docked process.

Description

基板的對接裝置及對接方法 Substrate docking device and docking method

本發明關於半導體技術領域,特別是關於一種基板的對接裝置及對接方法。 The present invention relates to the field of semiconductor technology, and in particular to a substrate docking device and docking method.

在半導體的製造過程中,基板需藉由板叉由版庫中抓取並上載至機械設備中,從而對基板進行相應的製程加工。其中,基板於版庫中的存放方向通常是一致的,板叉在抓取基板時,所述板叉以一定的方向抓取基板,並以相同的方向將基板放置於機械設備中。然而,在某些製程過程中,基板需以一定的角度位置放置於機械設備中,此時,就需在上載基板之前,先將基板旋轉一角度,再將旋轉至特定方向的基板放置於機械設備中。例如,在TFT的光刻製程中,基板為長方形的玻璃,板叉通常沿著基板的長邊方向抓取基板,而當基板需以短邊方向進入到光刻曝光設備中時,此時在將基板上載至光刻曝光設備之前或在對基板進行預先對準之前需將基板旋轉90°,然後再採用板叉將旋轉後的基板上載至光刻曝光設備中。在這個過程中,亟需一種對接裝置能實現旋轉對接過程。 In the semiconductor manufacturing process, the substrate needs to be picked up from the plate library by the fork and uploaded to the mechanical equipment, so as to process the substrate accordingly. Wherein, the storage direction of the substrate in the plate library is generally the same. When the plate fork grabs the substrate, the plate fork grabs the substrate in a certain direction and places the substrate in the mechanical equipment in the same direction. However, in some manufacturing processes, the substrate needs to be placed in the mechanical equipment at a certain angle. At this time, before uploading the substrate, the substrate must be rotated by an angle, and then the substrate rotated to a specific direction can be placed on the machine In the device. For example, in the TFT lithography process, the substrate is a rectangular glass, the plate fork usually grabs the substrate along the long side of the substrate, and when the substrate needs to enter the lithography exposure equipment in the short side direction, at this time Before the substrate is uploaded to the lithography exposure apparatus or before the substrate is pre-aligned, the substrate needs to be rotated by 90 °, and then the plated fork is used to upload the rotated substrate to the lithography exposure apparatus. In this process, there is an urgent need for a docking device that can achieve a rotating docking process.

本發明的目的在於提供一種基板的對接裝置,以實現基板從不同的角度位置進入設備或版庫時,可優先對基板進行旋轉以達到所 需的角度位置的目的。 The object of the present invention is to provide a substrate docking device, so that when the substrate enters the device or the library from different angular positions, the substrate can be preferentially rotated to achieve the The purpose of the desired angular position.

為此,本發明提供一種基板的對接裝置,實現基板在版庫和基板產線設備之間的對接,其中,對接裝置包含用於帶動基板旋轉的旋轉機構和至少一個固定在旋轉機構上的基板吸附機構,基板吸附機構用於支撐並固定基板,旋轉機構帶動基板吸附機構旋轉。 To this end, the present invention provides a substrate docking device to realize the docking of the substrate between the plate library and the substrate production line equipment, wherein the docking device includes a rotating mechanism for driving the substrate to rotate and at least one substrate fixed on the rotating mechanism The suction mechanism, the substrate suction mechanism is used to support and fix the substrate, and the rotation mechanism drives the substrate suction mechanism to rotate.

較佳地,基板吸附機構包含一吸附套件以及一吸附盤,藉由吸附套件實現基板吸附機構在旋轉機構上的固定,吸附盤由吸附套件的內部向外延伸形成用於與基板接觸的接觸面,吸附盤內設有與接觸面連通的真空通道。 Preferably, the substrate adsorption mechanism includes an adsorption kit and an adsorption disk. The adsorption kit is used to fix the substrate adsorption mechanism on the rotating mechanism. The adsorption disc extends outward from the interior of the adsorption kit to form a contact surface for contact with the substrate The suction channel is provided with a vacuum channel communicating with the contact surface.

較佳地,基板吸附機構還包含一支撐件,支撐件位於吸附套件內,且位於接觸面下方以支撐接觸面。 Preferably, the substrate suction mechanism further includes a support member, the support member is located in the suction kit and is located below the contact surface to support the contact surface.

較佳地,吸附盤的材質為高分子樹脂材料。 Preferably, the material of the suction disk is a polymer resin material.

較佳地,支撐件的材料為橡膠材料。 Preferably, the material of the support is a rubber material.

較佳地,基板的對接裝置還包含板叉檢測裝置,板叉檢測裝置具有一感測器,感測器用於判斷其感應區域內是否存在板叉。 Preferably, the docking device of the substrate further includes a plate fork detection device. The plate fork detection device has a sensor, which is used to determine whether a plate fork exists in its sensing area.

較佳地,基板的對接裝置還包含基板檢測裝置,基板檢測裝置具有一感測器,感測器用於判斷其感應區域內是否存在基板。 Preferably, the substrate docking device further includes a substrate detection device. The substrate detection device has a sensor. The sensor is used to determine whether the substrate exists in the sensing area.

較佳地,基板的對接裝置還包含複數個輔助支撐機構,複數個輔助支撐機構分佈在旋轉機構周圍,用於輔助支撐基板。 Preferably, the docking device of the substrate further includes a plurality of auxiliary support mechanisms, and the plurality of auxiliary support mechanisms are distributed around the rotating mechanism for auxiliary support of the substrate.

較佳地,輔助支撐機構為柱狀結構,柱狀結構與基板接觸的端面為圓弧形。 Preferably, the auxiliary support mechanism is a columnar structure, and the end surface of the columnar structure in contact with the substrate is arc-shaped.

較佳地,輔助支撐機構藉由第一支架套件與旋轉機構連 接,旋轉機構帶動輔助支撐機構旋轉。 Preferably, the auxiliary support mechanism is connected to the rotation mechanism through the first bracket kit Then, the rotating mechanism drives the auxiliary supporting mechanism to rotate.

較佳地,基板的對接裝置還包含複數個用於夾持基板邊緣的基板夾持機構,基板夾持機構包含與基板邊緣平行的夾持部和驅動夾持部沿垂直基板邊緣方向移動的驅動裝置。 Preferably, the substrate docking device further includes a plurality of substrate clamping mechanisms for clamping the edge of the substrate. The substrate clamping mechanism includes a clamping portion parallel to the edge of the substrate and a drive that drives the clamping portion to move in a direction perpendicular to the edge of the substrate Device.

較佳地,基板夾持機構藉由第二支架套件與旋轉機構連接,旋轉機構帶動基板夾持機構旋轉。 Preferably, the substrate clamping mechanism is connected to the rotating mechanism through the second bracket kit, and the rotating mechanism drives the substrate clamping mechanism to rotate.

較佳地,基板的對接裝置還包含位置檢測裝置,位置檢測裝置包含感測器套件以及機械限位套件,感測器套件用於檢測旋轉機構的旋轉角度,機械限位套件用於限定旋轉機構可旋轉的極限位置。 Preferably, the docking device of the substrate further includes a position detection device, the position detection device includes a sensor kit and a mechanical limit kit, the sensor kit is used to detect the rotation angle of the rotating mechanism, and the mechanical limit kit is used to define the rotating mechanism Rotatable limit position.

本發明的又一目的在於,提供一種基板的對接方法,其包含下列步驟:提供如上所述的基板的對接裝置,從版庫/基板產線設備上取出基板放置在基板吸附機構上,基板吸附機構支撐並固定基板;旋轉機構驅動基板吸附機構旋轉,使基板旋轉至角度位置;對基板實現機械預先對準;將預先對準後的基板取出放在基板產線設備或版庫。 Still another object of the present invention is to provide a substrate docking method, which includes the following steps: providing a substrate docking device as described above, removing the substrate from the plate library / substrate production line equipment and placing it on the substrate adsorption mechanism, the substrate is adsorbed The mechanism supports and fixes the substrate; the rotation mechanism drives the substrate suction mechanism to rotate to rotate the substrate to an angular position; realizes mechanical pre-alignment of the substrate; removes the pre-aligned substrate and places it in a substrate production line device or a library.

本發明提供了一種基板的對接裝置,當需改變基板的角度位置以進入設備或版庫時,則可藉由對接裝置對基板進行旋轉以達到特定的角度位置,從而實現基板的取放過程。 The invention provides a substrate docking device. When the angular position of the substrate needs to be changed to enter the device or the library, the substrate can be rotated by the docking device to reach a specific angular position, thereby realizing the substrate pick-and-place process.

並且,在本發明提供的基板的對接裝置中,藉由基板吸附機構對基板進行固定,並且基板吸附機構由旋轉機構驅動而進行旋轉,進而使吸附於基板吸附機構上的基板發生旋轉。即,在本發明提供的基 板的對接裝置中,帶動基板旋轉的向心力是由基板表面和基板吸附機構之間的摩擦力提供,而不是對基板的邊緣施加作用力,因此在基板邊緣位置不會產生局部應力,進而可確保基板的完整性。 In addition, in the substrate docking device provided by the present invention, the substrate is fixed by the substrate suction mechanism, and the substrate suction mechanism is driven to rotate by the rotation mechanism, thereby further rotating the substrate adsorbed on the substrate suction mechanism. That is, in the base provided by the present invention In the board docking device, the centripetal force that drives the rotation of the substrate is provided by the friction between the surface of the substrate and the substrate suction mechanism, rather than exerting a force on the edge of the substrate, so no local stress will be generated at the edge of the substrate, thereby ensuring that Substrate integrity.

110‧‧‧旋轉機構 110‧‧‧rotating mechanism

120‧‧‧基板吸附機構 120‧‧‧Substrate adsorption mechanism

121‧‧‧吸附套件 121‧‧‧Adsorption kit

122‧‧‧吸附盤 122‧‧‧Adsorption disk

122a‧‧‧接觸面 122a‧‧‧Contact surface

123‧‧‧支撐件 123‧‧‧Support

124‧‧‧螺旋緊固件 124‧‧‧Screw fastener

125‧‧‧真空通道 125‧‧‧Vacuum channel

130‧‧‧板叉 130‧‧‧ plate fork

130a‧‧‧第一板叉 130a‧‧‧The first plate fork

130b‧‧‧第二板叉 130b‧‧‧Second plate fork

140‧‧‧板叉檢測裝置 140‧‧‧Plate and fork detection device

150‧‧‧基板檢測裝置 150‧‧‧ substrate inspection device

160‧‧‧輔助支撐機構 160‧‧‧Auxiliary support mechanism

170‧‧‧基板夾持機構 170‧‧‧ substrate clamping mechanism

171‧‧‧滾輪 171‧‧‧roller

172‧‧‧驅動裝置 172‧‧‧Drive device

180‧‧‧位置檢測裝置 180‧‧‧Position detection device

190‧‧‧第一支架套件 190‧‧‧ First bracket kit

191‧‧‧第二支架套件 191‧‧‧Second bracket kit

200‧‧‧基板 200‧‧‧ substrate

S10~S40‧‧‧步驟 S10 ~ S40‧‧‧Step

圖1是本發明一實施例中的基板的對接裝置的結構示意圖;圖2a為本發明一實施例中基板的對接裝置的基板吸附機構的局部放大示意圖;圖2b為本發明一實施例中基板的對接裝置的基板吸附機構的剖面圖; 圖3為本發明採用兩個板叉分別對旋轉前後的基板進行取放的結構示意圖; 圖4為本發明一實施例中基板的對接裝置的基板夾持機構的局部放大示意圖: 圖5為本發明一實施例中基板的對接方法的流程示意圖。 1 is a schematic structural view of a substrate docking device in an embodiment of the invention; FIG. 2a is a partially enlarged schematic view of a substrate adsorption mechanism of a substrate docking device in an embodiment of the invention; FIG. 2b is a substrate in an embodiment of the invention Sectional view of the substrate adsorption mechanism of the docking device; 3 is a schematic structural view of the present invention using two plate forks to pick and place the substrates before and after rotation; 4 is a partially enlarged schematic view of a substrate clamping mechanism of a substrate docking device in an embodiment of the invention: FIG. 5 is a schematic flowchart of a substrate docking method according to an embodiment of the invention.

如先前技術所述,為使基板能夠優先旋轉一定角度以在設備和版庫之間進行傳送,亟需提供一種對接裝置以實現旋轉對接的過程。 As described in the prior art, in order to enable the substrate to be rotated by a certain angle preferentially to be transferred between the device and the library, it is urgent to provide a docking device to realize the process of rotating docking.

為此,本發明提供一種基板的對接裝置,以實現基板在版庫和基板產線設備之間的對接,其中,對接裝置包含帶動基板旋轉的旋 轉機構和至少一個固定在旋轉機構上的基板吸附機構,基板吸附機構用於支撐並固定基板,旋轉機構帶動基板吸附機構旋轉。 To this end, the present invention provides a substrate docking device to realize the docking of the substrate between the plate library and the substrate production line equipment, wherein the docking device includes a spinner that drives the rotation of the substrate The rotation mechanism and at least one substrate adsorption mechanism fixed on the rotation mechanism are used to support and fix the substrate, and the rotation mechanism drives the substrate adsorption mechanism to rotate.

在本發明提供的基板的對接裝置中,藉由一基板吸附機構對基板進行固定,並且基板吸附機構由旋轉機構驅動而進行旋轉,進而使吸附於基板吸附機構上的基板發生旋轉。 In the substrate docking device provided by the present invention, the substrate is fixed by a substrate suction mechanism, and the substrate suction mechanism is driven to rotate by the rotation mechanism, thereby rotating the substrate adsorbed on the substrate suction mechanism.

以下結合圖式和具體實施例對本發明提出的基板的對接裝置作進一步詳細說明。根據下面說明和申請專利範圍,本發明的優點和特徵將更清楚。需說明的是,圖式均採用非常簡化的形式且均使用非精準的比例,僅用以方便、明晰地輔助說明本發明實施例的目的。 The substrate docking device provided by the present invention will be further described in detail below with reference to the drawings and specific embodiments. The advantages and features of the present invention will be clearer from the following description and patent application scope. It should be noted that the drawings are in a very simplified form and all use inaccurate proportions, which are only used to conveniently and clearly assist the purpose of explaining the embodiments of the present invention.

圖1為本發明一實施例中的基板的對接裝置的結構示意圖,如圖1所示,基板的對接裝置,包含帶動基板旋轉的旋轉機構110以及至少一個固定在旋轉機構110上的基板吸附機構120,基板吸附機構120用於支撐並固定基板,旋轉機構110驅動基板吸附機構120旋轉。 1 is a schematic structural diagram of a substrate docking device according to an embodiment of the present invention. As shown in FIG. 1, the substrate docking device includes a rotating mechanism 110 that drives the substrate to rotate and at least one substrate adsorption mechanism fixed on the rotating mechanism 110 120. The substrate suction mechanism 120 is used to support and fix the substrate, and the rotation mechanism 110 drives the substrate suction mechanism 120 to rotate.

當採用本發明提供的基板的對接裝置對基板進行旋轉時,基板吸附機構120與基板的下表面接觸並吸附基板,以對基板進行固定。當旋轉機構110驅動基板吸附機構120旋轉時,則相應的即帶動固定於基板吸附機構120上的基板。其中,帶動基板旋轉的向心力為基板表面和基板吸附機構120之間的摩擦力,而不是對基板的邊緣施加作用力,因此在基板的邊緣位置不會產生局部應力,進而可確保基板的完整性。 When the substrate docking device provided by the present invention is used to rotate the substrate, the substrate suction mechanism 120 contacts the lower surface of the substrate and sucks the substrate to fix the substrate. When the rotating mechanism 110 drives the substrate suction mechanism 120 to rotate, the substrate fixed on the substrate suction mechanism 120 is correspondingly driven. Among them, the centripetal force that drives the rotation of the substrate is the friction between the substrate surface and the substrate adsorption mechanism 120, rather than exerting a force on the edge of the substrate, so no local stress will be generated at the edge of the substrate, thereby ensuring the integrity of the substrate .

圖2a為本發明一實施例中基板的對接裝置的基板吸附機構的局部放大示意圖,圖2b為本發明一實施例中基板的對接裝置的基板吸附機構的剖面圖,結合圖2a和圖2b所示,基板吸附機構120包含:吸附套件121以及吸附盤122。較佳地,基板吸附機構120與抽真空裝 置(圖中未繪示出)連接,進而可採用抽真空的方式固定基板。具體地,於基板吸附機構120中具有一個真空通道125,當基板放置於基板吸附機構120上之後,抽真空裝置藉由真空通道125抽取位於基板與基板吸附機構120之間的空氣,從而使基板吸附於基板吸附機構120上。 2a is a partially enlarged schematic view of a substrate adsorption mechanism of a substrate docking device in an embodiment of the present invention, and FIG. 2b is a cross-sectional view of a substrate adsorption mechanism of a substrate docking device in an embodiment of the present invention, combined with FIGS. 2a and 2b. As shown, the substrate suction mechanism 120 includes a suction kit 121 and a suction tray 122. Preferably, the substrate adsorption mechanism 120 and the vacuuming device (Not shown in the figure) connection, and the substrate can be fixed by vacuuming. Specifically, there is a vacuum channel 125 in the substrate adsorption mechanism 120. After the substrate is placed on the substrate adsorption mechanism 120, the vacuum device extracts the air between the substrate and the substrate adsorption mechanism 120 through the vacuum channel 125, so that the substrate It is adsorbed on the substrate adsorption mechanism 120.

其中,藉由吸附套件121可實現基板吸附機構的固定,即本實施例中,可採用螺旋緊固件124將吸附套件121固定於旋轉機構110上,從而實現對整個基板吸附機構120的固定。 Wherein, the suction kit 121 can be used to fix the substrate suction mechanism. That is, in this embodiment, the screw fastener 124 can be used to fix the suction kit 121 to the rotating mechanism 110, so as to fix the entire substrate suction mechanism 120.

繼續參考圖2a和圖2b所示,吸附盤122由吸附套件121的內部向外延伸形成與基板接觸的接觸面122a,其中,真空通道125即可設置於吸附盤122內並與接觸面122a連通。例如本實施例中,吸附套件121固定於旋轉機構上之後,其形成一中空結構並且於其上方還具有一開口,吸附盤122的外圍形狀與吸附套件121的內壁形狀相契合,同時吸附盤122沿著吸附套件121的內壁並藉由吸附套件的開口向吸附套件的外側延伸形成一接觸面122a。具體地,接觸面122a的形狀可以為任意形狀,例如圓形、橢圓形或矩形等。進一步地,吸附盤122可採用高分子樹脂材料製成,從而使吸附盤122具有一定的承壓性和彈性。由於在支撐及固定基板時,吸附盤122與基板接觸,因此採用高分子樹脂材料製成的吸附盤122具有一定的彈性,其一方面可更好的保護基板,避免對基板造成刮傷;另一方面,當基板進行旋轉時,吸附盤與基板之間易產生摩擦力,以利於實現基板的旋轉;除此之外,當基板發生翹曲現象時,由高分子樹脂材料製成的接觸面122a具有可塑性,因此其仍可以和基板的表面很好的貼合,進而保證基板吸附機構120對基板的吸附效果。 With continued reference to FIGS. 2a and 2b, the suction disk 122 extends outward from the inside of the suction kit 121 to form a contact surface 122a that contacts the substrate, wherein the vacuum channel 125 can be provided in the suction disk 122 and communicate with the contact surface 122a . For example, in this embodiment, after the suction kit 121 is fixed to the rotating mechanism, it forms a hollow structure and has an opening above it. The outer shape of the suction disk 122 matches the shape of the inner wall of the suction kit 121, and the suction disk 122 extends along the inner wall of the suction kit 121 through the opening of the suction kit to the outside of the suction kit to form a contact surface 122a. Specifically, the shape of the contact surface 122a may be any shape, such as a circle, an ellipse, or a rectangle. Further, the suction disk 122 may be made of a polymer resin material, so that the suction disk 122 has a certain pressure bearing property and elasticity. Since the suction disk 122 is in contact with the substrate when supporting and fixing the substrate, the suction disk 122 made of polymer resin has a certain elasticity. On the one hand, it can better protect the substrate and avoid scratching the substrate; On the one hand, when the substrate rotates, friction between the suction disk and the substrate is likely to occur to facilitate the rotation of the substrate; in addition, when the substrate warps, the contact surface made of polymer resin material 122a has plasticity, so it can still fit well with the surface of the substrate, thereby ensuring the adsorption effect of the substrate adsorption mechanism 120 on the substrate.

進一步地,基板吸附機構120還包含支撐件123,支撐件 123位於吸附套件121內,並位於接觸面122a的下方以支撐接觸面122a。在基板吸附機構120支撐基板時,基板的表面與吸附盤122的接觸面122a貼合,此時,基板對吸附盤122具有一個向下的作用力,因此,為保證吸附盤122在受到基板的作用力時仍可以支撐基板,尤其當採用具有一定彈性的吸附盤時,在吸附盤122的接觸面122a受到基板的擠壓,更易發生變形,因此,當於接觸面122a的下方設置一個用於支撐接觸面122的支撐件123時,支撐件123可很好的支撐接觸面122a,避免在被基板擠壓之後,接觸面122a發生變形而無法支撐基板的問題。進一步地,支撐件123可採用橡膠材料製成。一方面橡膠材料具有一定的彈性,使基板在與接觸面122a貼合時具有一緩衝力,以減小對基板產生的瞬間衝擊力;另一方面,橡膠材料具有一定的彈性,能夠起到支撐接觸面的功能。 Further, the substrate adsorption mechanism 120 further includes a support 123, and the support 123 is located in the suction kit 121 and below the contact surface 122a to support the contact surface 122a. When the substrate suction mechanism 120 supports the substrate, the surface of the substrate is in contact with the contact surface 122a of the suction disk 122. At this time, the substrate has a downward force on the suction disk 122. Therefore, in order to ensure that the suction disk 122 receives the substrate It can still support the substrate when the force is applied, especially when a suction pad with a certain elasticity is used, the contact surface 122a of the suction pad 122 is squeezed by the substrate and is more likely to deform. Therefore, when a contact pad 122a is provided below When supporting the supporting member 123 of the contact surface 122, the supporting member 123 can support the contact surface 122a well, avoiding the problem that the contact surface 122a is deformed and cannot support the substrate after being pressed by the substrate. Further, the supporting member 123 may be made of rubber material. On the one hand, the rubber material has a certain elasticity, so that the substrate has a buffering force when it is attached to the contact surface 122a, so as to reduce the instantaneous impact force on the substrate; on the other hand, the rubber material has a certain elasticity, which can support The function of the contact surface.

較佳地,基板的對接裝置還包含位置檢測裝置180,具體地,位置檢測裝置180包含感測器套件以及機械限位套件,感測器套件即用於檢測旋轉機構110的旋轉角度,極限限位套件即可根據設定的極限位置限制旋轉機構110的旋轉角度。 Preferably, the docking device of the substrate further includes a position detection device 180. Specifically, the position detection device 180 includes a sensor kit and a mechanical limit kit. The sensor kit is used to detect the rotation angle of the rotation mechanism 110. The bit set can limit the rotation angle of the rotation mechanism 110 according to the set limit position.

繼續參考圖1所示,基板藉由板叉130取放於基板的對接裝置中。具體地,板叉130具有兩個板指,當板叉130抓取基板時,板叉130的兩個板指移動至基板的下方並托住基板,接著再以相反方向移動板叉以實現對基板的取放功能。此外,在實際應用過程中,可根據具體的基板以及基板旋轉的角度而選取相應的板叉或選用複數個板叉。例如,參考圖3所示,當基板200為長方形,並且需對其旋轉90°時,首先,需採用第一板叉130a沿旋轉機構110的第一側將基板200放置於基板的對接裝置中,此時,第一板叉130a的兩個板指沿基板200的短邊方向托住基板200;然後,基板的對接裝置使基板200旋轉90°;接著,需採用 第二板叉130b沿與第一側垂直的第二側抓取基板200,此時,所述第二板叉130b的扳指沿基板200的長邊方向托住基板。其中,第二板叉130b與第一板叉130a中兩個板指之間的距離,以及扳指的長度均需根據基板的長度和寬度設定。 With continued reference to FIG. 1, the substrate is picked and placed in the docking device of the substrate by the fork 130. Specifically, the plate fork 130 has two plate fingers. When the plate fork 130 grabs the substrate, the two plate fingers of the plate fork 130 move below the substrate and hold the substrate, and then move the plate fork in the opposite direction to achieve Board pick and place function. In addition, in the actual application process, a corresponding plate fork or a plurality of plate forks may be selected according to the specific substrate and the rotation angle of the substrate. For example, referring to FIG. 3, when the substrate 200 is rectangular and needs to be rotated by 90 °, first, the first plate fork 130a needs to be used to place the substrate 200 in the substrate docking device along the first side of the rotation mechanism 110 At this time, the two plate fingers of the first plate fork 130a hold the substrate 200 along the short side of the substrate 200; then, the substrate docking device rotates the substrate 200 by 90 °; The second plate fork 130b grabs the substrate 200 along a second side perpendicular to the first side. At this time, the finger of the second plate fork 130b supports the substrate along the long side direction of the substrate 200. Wherein, the distance between the second plate fork 130b and the two plate fingers in the first plate fork 130a, and the length of the pull finger need to be set according to the length and width of the substrate.

較佳地,基板的對接裝置還包含板叉檢測裝置140,板叉檢測裝置140用於檢測其對應區域內是否存在板叉。具體地,板叉檢測裝置140具有感測器,藉由感測器感應板叉的存在,其中,感測器可以是光敏感測器,即,藉由檢測光訊號以判斷板叉的存在。本實施例中,板叉檢測裝置140位於板叉130的移動方向上,並且設置於板叉130的扳指的下方,從而當扳指130進入到基板的對接裝置時,板叉檢測裝置140可立即感應到扳指的存在。此外,在需採用複數個板叉130實現基板於對接裝置100中的取放功能時,為避免複數個板叉在基板的對接裝置中發生碰撞,則可藉由板叉檢測裝置140感應在基板的對接裝置中是否存在有板叉,並限制複數個板叉同時進入到基板的對接裝置中,實現複數個板叉之間的互鎖,避免相互干擾。 Preferably, the docking device of the substrate further includes a plate fork detection device 140, and the plate fork detection device 140 is used to detect whether there is a plate fork in its corresponding area. Specifically, the plate and fork detection device 140 has a sensor that senses the presence of the plate fork, where the sensor may be a light-sensitive sensor, that is, the presence of the plate fork is determined by detecting an optical signal. In this embodiment, the plate fork detection device 140 is located in the moving direction of the plate fork 130, and is disposed below the trigger finger of the plate fork 130, so that when the trigger finger 130 enters the docking device of the substrate, the plate fork detection device 140 can immediately sense To the presence of the finger. In addition, when a plurality of plate forks 130 are needed to realize the pick-and-place function of the substrate in the docking device 100, in order to avoid collision of the plurality of plate forks in the substrate docking device, the plate fork detection device 140 can be used to sense the substrate Whether there is a plate fork in the docking device, and limit the plurality of plate forks to enter the docking device of the substrate at the same time, realize the interlock between the plurality of plate forks, and avoid mutual interference.

繼續參考圖1所示,基板的對接裝置還包含基板檢測裝置150,基板檢測裝置150可採用與板叉檢測裝置140相同的檢測裝置,具體地,基板檢測裝置150具有感測器,藉由所述感測器感應對應區域內是否存在基板。進一步地,基板檢測裝置150設置於基板的下方。基板檢測裝置150一方面可用於檢測基板的對接裝置中是否放置有基板,避免複數個基板重複放置於基板的對接裝置,造成基板的破損;另一方面,還可設置複數個基板檢測裝置150,並且設置於基板在旋轉不同角度時所對應的位置上,從而還可用於判斷基板於對接裝置100中的角度位置。 With continued reference to FIG. 1, the substrate docking device further includes a substrate detection device 150. The substrate detection device 150 can use the same detection device as the fork detection device 140. Specifically, the substrate detection device 150 has a sensor. The sensor senses whether there is a substrate in the corresponding area. Further, the substrate detection device 150 is provided below the substrate. On the one hand, the substrate detection device 150 can be used to detect whether a substrate is placed in the substrate docking device, to avoid multiple substrates being repeatedly placed on the substrate docking device, causing damage to the substrate; And it is set at the position corresponding to the substrate when rotating at different angles, so that it can also be used to determine the angular position of the substrate in the docking device 100.

繼續參考圖1所示,基板的對接裝置還包含複數個輔助支撐機構160,輔助支撐機構160用於輔助支撐基板,並調整基板的水平位置。具體地,輔助支撐機構160佈置於旋轉機構110的外圍區域。輔助支撐機構160為柱狀結構,柱狀結構與基板接觸的端面為圓弧形,進而可減少與基板的接觸面積,緩解輔助支撐機構160與基板之間的摩擦。本實施例中,輔助支撐機構160還藉由第一支架套件190與旋轉機構110連接,即,旋轉機構110在帶動基板吸附機構120旋轉時,其同時也帶動輔助支撐機構160旋轉,避免輔助支撐機構刮傷基板的表面。 With continued reference to FIG. 1, the substrate docking device further includes a plurality of auxiliary support mechanisms 160. The auxiliary support mechanism 160 is used to assist in supporting the substrate and adjust the horizontal position of the substrate. Specifically, the auxiliary support mechanism 160 is arranged in the peripheral area of the rotation mechanism 110. The auxiliary support mechanism 160 is a columnar structure, and the end surface of the columnar structure that contacts the substrate is arc-shaped, which further reduces the contact area with the substrate and eases the friction between the auxiliary support mechanism 160 and the substrate. In this embodiment, the auxiliary support mechanism 160 is also connected to the rotation mechanism 110 through the first bracket kit 190, that is, when the rotation mechanism 110 drives the substrate suction mechanism 120 to rotate, it also drives the auxiliary support mechanism 160 to rotate to avoid auxiliary support The mechanism scratches the surface of the substrate.

較佳地,基板的對接裝置還包含複數個用於夾持基板邊緣的基板夾持機構170,基板夾持機構170可用於調整基板的位置並進一步固定基板,如此,可確保基板在旋轉前和旋轉後的位置精度。圖4為本發明一實施例中基板的對接裝置的基板夾持機構的局部放大示意圖,具體參考圖4並結合圖1所示,基板夾持機構170包含與基板邊緣平行的夾持部和驅動夾持部沿垂直基板邊緣方向移動的驅動裝置172,夾持部上設有至少一個用於與基板邊緣接觸的滾輪171,其中,驅動裝置172可以為氣缸。當在對基板進行位置調整時,複數個滾輪171分別佈置於基板的外圍區域,此時驅動裝置172驅動滾輪171沿垂直於基板的邊緣方向移動,進而推動基板移動至預先定位置。在此過程中,基板的邊緣與滾輪接觸並移動,因此採用滾輪有助於基板的移動,減小對基板邊緣的摩擦。並且,當位於基板外圍的複數個滾輪171壓緊基板的邊緣時,即同時實現了對基板的固定。如圖1所示,本實施例中,基板的對接裝置中具有4個基板夾持機構170,其中每個基板夾持機構170上設置有2個滾輪,若對長方形的基板進行夾持固定時,則4個基板夾持機構170分別夾持所述長方形基板的四個邊緣,每個基板夾持機構170中的兩個滾輪171分別壓緊基板的每一條側邊。 Preferably, the substrate docking device further includes a plurality of substrate clamping mechanisms 170 for clamping the edges of the substrate. The substrate clamping mechanism 170 can be used to adjust the position of the substrate and further fix the substrate. In this way, the substrate can be ensured before rotation and Position accuracy after rotation. 4 is a partially enlarged schematic view of a substrate clamping mechanism of a substrate docking device according to an embodiment of the present invention. Referring specifically to FIG. 4 in conjunction with FIG. 1, the substrate clamping mechanism 170 includes a clamping portion parallel to the edge of the substrate and a drive A driving device 172 for moving the clamping part in a direction perpendicular to the edge of the substrate. The clamping part is provided with at least one roller 171 for contacting with the edge of the substrate. The driving device 172 may be an air cylinder. When adjusting the position of the substrate, a plurality of rollers 171 are respectively arranged in the peripheral area of the substrate. At this time, the driving device 172 drives the rollers 171 to move in a direction perpendicular to the edge of the substrate, thereby pushing the substrate to a predetermined position. In this process, the edge of the substrate contacts and moves with the roller, so the use of the roller helps the movement of the substrate and reduces the friction on the edge of the substrate. Moreover, when a plurality of rollers 171 located on the periphery of the substrate press the edge of the substrate, the substrate is simultaneously fixed. As shown in FIG. 1, in this embodiment, the substrate docking device has four substrate clamping mechanisms 170, wherein each substrate clamping mechanism 170 is provided with two rollers. If a rectangular substrate is clamped and fixed Then, the four substrate clamping mechanisms 170 respectively clamp the four edges of the rectangular substrate, and the two rollers 171 in each substrate clamping mechanism 170 respectively press each side of the substrate.

此外,基板夾持機構170根據實際應用,選擇是否由旋轉機構110帶動旋轉。即,本發明提供的基板的對接裝置中,基板夾持機構170可固定設置,也可與旋轉機構110連接使其可以由旋轉機構110帶動旋轉。本實施例中,基板夾持架構170藉由第二支架套件191與第一支架套件190連接,從而可由所述旋轉機構110帶動並與基板吸附機構120同時旋轉。 In addition, the substrate clamping mechanism 170 selects whether to be rotated by the rotating mechanism 110 according to the actual application. That is, in the substrate docking device provided by the present invention, the substrate clamping mechanism 170 may be fixedly provided, or may be connected to the rotation mechanism 110 so that the rotation mechanism 110 can drive the rotation. In this embodiment, the substrate holding frame 170 is connected to the first bracket set 190 through the second bracket set 191, so that the rotating mechanism 110 can drive the same and rotate with the substrate suction mechanism 120 at the same time.

基於本發明提供的基板的對接裝置,本發明另一目的在於,提供一種基板的對接方法,即,採用如上所述的基板的對接裝置實現基板的對接。圖5為本發明一實施例中基板的對接方法的流程示意圖,具體參考圖5並結合圖1所示,基板的對接方法包含下列步驟:步驟S10,提供如上所述的基板的對接裝置,從版庫/基板產線設備上取出一基板放置在基板吸附機構120上,基板吸附機構120支撐並固定所述基板;步驟S20,旋轉機構110驅動基板吸附機構120旋轉,使基板旋轉至角度位置;步驟S30,對基板實現機械預先對準;步驟S40,將預先對準後的基板取出放在基板產線設備/版庫。 Based on the substrate docking device provided by the present invention, another object of the present invention is to provide a substrate docking method, that is, using the substrate docking device as described above to realize substrate docking. FIG. 5 is a schematic flow chart of a substrate docking method in an embodiment of the present invention. Referring specifically to FIG. 5 in conjunction with FIG. 1, the substrate docking method includes the following steps: Step S10, providing a substrate docking device as described above, from Remove a substrate from the library / substrate production line equipment and place it on the substrate adsorption mechanism 120. The substrate adsorption mechanism 120 supports and fixes the substrate; Step S20, the rotation mechanism 110 drives the substrate adsorption mechanism 120 to rotate to rotate the substrate to an angular position; In step S30, the mechanical pre-alignment of the substrate is realized; in step S40, the pre-aligned substrate is taken out and placed in the substrate production line device / repository.

本發明提供的基板的對接方法中,首先採用基板吸附機構120吸附固定基板,進而在旋轉機構110的驅動下,使基板吸附機構旋轉,從而藉由基板吸附機構110與基板表面之間的摩擦力形成一使基板旋轉的向心力,進而實現基板的旋轉。 In the substrate docking method provided by the present invention, the substrate adsorption mechanism 120 is first used to adsorb and fix the substrate, and then the substrate adsorption mechanism is rotated under the drive of the rotation mechanism 110, so that the friction force between the substrate adsorption mechanism 110 and the substrate surface A centripetal force is formed to rotate the substrate, thereby realizing the rotation of the substrate.

上述描述僅是對本發明較佳實施例的描述,並非對本發明 範圍的任何限定,本發明所屬技術領域的通常知識者根據上述揭示內容做的任何變更、修飾,均屬於申請專利範圍的保護範圍。 The above description is only a description of the preferred embodiments of the present invention, not the present invention Any limitation of the scope, any changes or modifications made by those of ordinary knowledge in the technical field to which the present invention belongs based on the above disclosure, shall fall within the protection scope of the patent application scope.

Claims (13)

一種基板的對接裝置,實現該基板在版庫和基板產線設備之間的對接,該對接裝置包含用於帶動基板旋轉的旋轉機構和至少一個固定在該旋轉機構上的基板吸附機構,該基板吸附機構用於支撐並固定該基板,該旋轉機構帶動該基板吸附機構旋轉;其中該基板的對接裝置更包含用於夾持該基板邊緣的複數個基板夾持機構,該基板夾持機構包含與該基板邊緣平行的夾持部和驅動該夾持部沿垂直該基板邊緣方向移動的驅動裝置。A substrate docking device for docking the substrate between the plate library and the substrate production line equipment, the docking device includes a rotating mechanism for driving the substrate to rotate and at least one substrate adsorption mechanism fixed on the rotating mechanism, the substrate The adsorption mechanism is used to support and fix the substrate, and the rotation mechanism drives the substrate adsorption mechanism to rotate; wherein the substrate docking device further includes a plurality of substrate clamping mechanisms for clamping the edge of the substrate, the substrate clamping mechanism includes A clamping part with parallel edges of the substrate and a driving device for driving the clamping part to move in a direction perpendicular to the edge of the substrate. 如申請專利範圍第1項所述之基板的對接裝置,其中該基板吸附機構包含一吸附套件以及一吸附盤,藉由該吸附套件實現該基板吸附機構在該旋轉機構上的固定,該吸附盤由該吸附套件的內部向外延伸形成用於與該基板接觸的一接觸面,該吸附盤內設有與該接觸面連通的真空通道。The substrate docking device as described in item 1 of the patent application range, wherein the substrate adsorption mechanism includes an adsorption kit and an adsorption disk, and the adsorption kit is used to fix the substrate adsorption mechanism on the rotating mechanism. A contact surface for contacting with the substrate is formed by extending outward from the interior of the adsorption kit, and a vacuum channel communicating with the contact surface is provided in the adsorption disk. 如申請專利範圍第2項所述之基板的對接裝置,其中該基板吸附機構更包含一支撐件,該支撐件位於該吸附套件內,且位於該接觸面下方以支撐該接觸面。The substrate docking device as described in item 2 of the patent application range, wherein the substrate suction mechanism further includes a support member, the support member is located in the suction kit and is located below the contact surface to support the contact surface. 如申請專利範圍第2或3項所述之基板的對接裝置,其中該吸附盤的材質為高分子樹脂材料。The docking device for a substrate as described in item 2 or 3 of the patent application, wherein the material of the suction pad is a polymer resin material. 如申請專利範圍第3項所述之基板的對接裝置,其中該支撐件的材料為橡膠材料。The docking device for a substrate as described in item 3 of the patent application, wherein the material of the support member is a rubber material. 如申請專利範圍第1項所述之基板的對接裝置,其中該基板的對接裝置更包含一板叉檢測裝置,該板叉檢測裝置具有一感測器,該感測器用於判斷其感應區域內是否存在板叉。The docking device for a substrate as described in item 1 of the patent application range, wherein the docking device for the substrate further includes a plate and fork detection device, the plate and fork detection device having a sensor for judging its sensing area Whether there is a plate fork. 如申請專利範圍第1項所述之基板的對接裝置,其中該基板的對接裝置更包含一基板檢測裝置,該基板檢測裝置具有一感測器,該感測器用於判斷其感應區域內是否存在該基板。The substrate docking device as described in item 1 of the patent application scope, wherein the substrate docking device further includes a substrate detection device, the substrate detection device has a sensor, and the sensor is used to determine whether the sensing area is present The substrate. 如申請專利範圍第1項所述之基板的對接裝置,其中該基板的對接裝置更包含複數個輔助支撐機構,該複數個輔助支撐機構分佈在該旋轉機構周圍,用於輔助支撐該基板。The docking device for a substrate as described in item 1 of the patent application range, wherein the docking device for the substrate further includes a plurality of auxiliary support mechanisms, and the plurality of auxiliary support mechanisms are distributed around the rotation mechanism to assist and support the substrate. 如申請專利範圍第8項所述之基板的對接裝置,其中該輔助支撐機構為柱狀結構,該柱狀結構與該基板接觸的端面為圓弧形。The docking device for a substrate as described in item 8 of the patent application range, wherein the auxiliary support mechanism is a columnar structure, and the end surface of the columnar structure in contact with the substrate is arc-shaped. 如申請專利範圍第8項所述之基板的對接裝置,其中該輔助支撐機構藉由第一支架套件與該旋轉機構連接,該旋轉機構帶動該輔助支撐機構旋轉。The docking device for a substrate as described in item 8 of the patent application range, wherein the auxiliary support mechanism is connected to the rotation mechanism by a first bracket kit, and the rotation mechanism drives the auxiliary support mechanism to rotate. 如申請專利範圍第1項所述之基板的對接裝置,其中該基板夾持機構藉由第二支架套件與該旋轉機構連接,該旋轉機構帶動該基板夾持機構旋轉。The docking device for a substrate as described in item 1 of the patent application range, wherein the substrate clamping mechanism is connected to the rotation mechanism by a second bracket kit, and the rotation mechanism drives the substrate clamping mechanism to rotate. 如申請專利範圍第1項所述之基板的對接裝置,其中該基板的對接裝置更包含位置檢測裝置,該位置檢測裝置包含感測器套件以及機械限位套件,該感測器套件用於檢測旋轉機構的旋轉角度,該機械限位套件用於限定該旋轉機構可旋轉的極限位置。The docking device for a substrate as described in item 1 of the patent application scope, wherein the docking device for the substrate further includes a position detection device, the position detection device includes a sensor kit and a mechanical limit kit, the sensor kit is used for detection The rotation angle of the rotating mechanism, the mechanical limit kit is used to define the limit position where the rotating mechanism can rotate. 一種基板的對接方法,其包含下列步驟:提供如申請專利範圍第1至12項中任意一項所述之基板的對接裝置,從該版庫或該基板產線設備上取出基板放置在該基板吸附機構上,該基板吸附機構支撐並固定該基板;該旋轉機構驅動該基板吸附機構旋轉,使該基板旋轉至一角度位置;對該基板實現機械預先對準;將預先對準後的該基板取出放在該基板產線設備或該版庫。A substrate docking method, which includes the following steps: providing a substrate docking device as described in any one of claims 1 to 12 of the patent application, removing the substrate from the version library or the substrate production line equipment and placing it on the substrate On the suction mechanism, the substrate suction mechanism supports and fixes the substrate; the rotation mechanism drives the substrate suction mechanism to rotate to rotate the substrate to an angular position; mechanically pre-aligns the substrate; pre-aligns the substrate Take it out and put it in the substrate production line equipment or the library.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM370748U (en) * 2009-06-25 2009-12-11 Quick Test Corp Rotary substrate testing mechanism
TW201306165A (en) * 2011-06-02 2013-02-01 Tazmo Co Ltd Alignment device and alignment method
TWI529850B (en) * 2009-08-04 2016-04-11 友達光電股份有限公司 Dust proof structure for substrate sucker

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4524132B2 (en) * 2004-03-30 2010-08-11 東京エレクトロン株式会社 Vacuum processing equipment
US10410906B2 (en) * 2012-11-27 2019-09-10 Acm Research (Shanghai) Inc. Substrate supporting apparatus
CN203103273U (en) * 2013-03-06 2013-07-31 北京自动化技术研究院 Silicon chip conveyer
CN104485302B (en) * 2014-12-29 2017-05-10 颀中科技(苏州)有限公司 Wafer transfer batching and collecting equipment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM370748U (en) * 2009-06-25 2009-12-11 Quick Test Corp Rotary substrate testing mechanism
TWI529850B (en) * 2009-08-04 2016-04-11 友達光電股份有限公司 Dust proof structure for substrate sucker
TW201306165A (en) * 2011-06-02 2013-02-01 Tazmo Co Ltd Alignment device and alignment method

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