TWI627044B - Production method of metal part - Google Patents

Production method of metal part Download PDF

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TWI627044B
TWI627044B TW103129868A TW103129868A TWI627044B TW I627044 B TWI627044 B TW I627044B TW 103129868 A TW103129868 A TW 103129868A TW 103129868 A TW103129868 A TW 103129868A TW I627044 B TWI627044 B TW I627044B
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metal
metal part
pattern
layer
organic solvent
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TW103129868A
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TW201514986A (en
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諸岡篤
梅澤朋一
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富士軟片股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/20Separation of the formed objects from the electrodes with no destruction of said electrodes
    • C25D1/22Separating compounds

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

在利用電鑄的金屬零件的製造方法中,即便凹凸圖案的尺度為微細,亦可無圖案缺陷地剝離金屬零件。在表面具有微細凹凸圖案的模板的所述表面,沿著凹凸圖案形成脫模層,在脫模層上形成具有導電性的初始層,在初始層上將金屬材料電鑄而形成金屬層,將初始層與金屬層成為一體的複合體在有機溶劑中自模板剝離,而製造金屬模具等金屬零件。此時,在將凹凸圖案的高度設為Hμm及將凹凸圖案的密度設為N個/μm2時,有機溶劑在35℃時的黏性率ηmPa.s滿足式1及式2。η<0.9…式1 η×H×N<1.6…式2 In the method of manufacturing a metal part by electroforming, even if the scale of the uneven pattern is fine, the metal part can be peeled off without pattern defects. On the surface of the template having a fine concavo-convex pattern on the surface, a release layer is formed along the concavo-convex pattern, an initial layer having conductivity is formed on the release layer, and a metal material is electroformed on the initial layer to form a metal layer. The composite in which the initial layer and the metal layer are integrated is peeled off from the template in an organic solvent to produce a metal part such as a metal mold. In this case, when the height of the concave-convex pattern is H μm and the density of the concave-convex pattern is N/μm 2 , the viscosity of the organic solvent at 35 ° C is ηmPa. s satisfies Equations 1 and 2. η<0.9...form 1 η×H×N<1.6...form 2

Description

金屬零件的製造方法 Method of manufacturing metal parts

本發明是有關於一種在表面具有特定凹凸圖案的金屬零件的製造方法。 The present invention relates to a method of manufacturing a metal part having a specific concave-convex pattern on a surface.

作為製造金屬零件(例如金屬模具、或奈米壓印(nanoimprint)用模)的方法,已知有:使用金屬製模板(或母盤)藉由電鑄使金屬材料析出於模板的凹凸圖案面上,並將所述金屬材料自模板剝離的方法。在如上所述的金屬零件的製造方法中,先前將在不破壞凹凸圖案的情況下將作為經電鑄的金屬材料的金屬零件自模板剝離作為1個課題。 As a method of manufacturing a metal part (for example, a metal mold or a nanoimprint mold), it is known to use a metal template (or master) to deposit a metal material out of a concave-convex pattern surface of a template by electroforming. And a method of peeling off the metal material from the template. In the method of manufacturing a metal part as described above, it has been previously proposed to peel a metal part as an electroformed metal material from a stencil without damaging the uneven pattern.

例如專利文獻1及專利文獻2中揭示:藉由在電鑄步驟前在模板的凹凸圖案面上形成包含Ni的通電用初始層,而兼具導電性與脫模性的金屬零件的製造方法。 For example, Patent Document 1 and Patent Document 2 disclose a method of producing a metal part having both conductivity and mold release property by forming an initial layer for conducting electricity containing Ni on the uneven pattern surface of the template before the electroforming step.

另外,例如專利文獻3中揭示:藉由將含有氟化合物的脫模層設置於模板的凹凸圖案面上,而提高脫模性的金屬零件的製造方法。 Further, for example, Patent Document 3 discloses a method of producing a metal part which improves mold release property by providing a release layer containing a fluorine compound on a concave-convex pattern surface of a template.

[現有技術文獻] [Prior Art Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2009-134793號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-134793

[專利文獻2]日本專利特開2010-73272號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2010-73272

[專利文獻3]日本專利特開2012-56246號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2012-56246

然而,先前的方法中存在以下問題:隨著凹凸圖案的尺度變得微細,而變得難以剝離,根據情況無法在無圖案缺陷的情况下剝離金屬零件。 However, in the prior method, there is a problem that as the scale of the concavo-convex pattern becomes fine, it becomes difficult to peel off, and the metal part cannot be peeled off without pattern defects as the case may be.

本發明鑒於所述問題而成,目的是提供一種在利用電鑄的金屬零件的製造方法中,即便凹凸圖案的尺度為微細,亦可無圖案缺陷地剝離金屬零件的金屬零件的製造方法。 The present invention has been made in view of the above problems, and an object of the invention is to provide a method for producing a metal part in which a metal part is peeled off without pattern defects even in a method of manufacturing a metal part by electroforming.

為了解決所述課題,本發明的金屬零件的製造方法是如下的方法:在表面具有微細凹凸圖案的模板的所述表面,沿著凹凸圖案形成脫模層,在脫模層上形成具有導電性的初始層,在初始層上將金屬材料電鑄而形成金屬層,將初始層與金屬層成為一體的複合體在有機溶劑中自模板剝離,而製造作為模板的複合體的金屬零件,且所述金屬零件的製造方法的特徵在於, 在將凹凸圖案的高度設為Hμm、及將凹凸圖案的密度設為N個/μm2時,有機溶劑在35℃時的黏性率ηmPa.s滿足式1及式2:η<0.9…式1 In order to solve the above problems, a method for producing a metal component according to the present invention is a method of forming a release layer along a concave-convex pattern on the surface of a template having a fine uneven pattern on a surface thereof, and forming a conductive layer on the release layer. The initial layer is formed by electroforming a metal material on the initial layer to form a metal layer, and the composite body in which the initial layer and the metal layer are integrated is peeled off from the template in an organic solvent, thereby manufacturing a metal part of the composite as a template, and The method for producing a metal component is characterized in that the viscosity of the organic solvent at 35 ° C is ηmPa when the height of the concave-convex pattern is H μm and the density of the concave-convex pattern is N/μm 2 . s satisfies Equation 1 and Equation 2: η < 0.9... Equation 1

η×H×N<1.6…式2。 η × H × N < 1.6... Formula 2.

並且,在本發明的金屬零件的製造方法中,較佳為黏性率η滿足式3:η<0.6…式3。 Further, in the method for producing a metal part according to the present invention, it is preferable that the viscosity ratio η satisfies the formula 3: η < 0.6 (Formula 3).

另外,在本發明的金屬零件的製造方法中,較佳為黏性率η滿足式4:η×H×N<1.0…式4。 Further, in the method for producing a metal part according to the present invention, it is preferable that the viscosity ratio η satisfies the formula 4: η × H × N < 1.0 (Formula 4).

另外,在本發明的金屬零件的製造方法中,較佳為有機溶劑可採用甲醇、辛烷及己烷的至少1種,有機溶劑特佳為辛烷或己烷。 Further, in the method for producing a metal part according to the present invention, at least one of methanol, octane and hexane is preferably used as the organic solvent, and the organic solvent is particularly preferably octane or hexane.

另外,在本發明的金屬零件的製造方法中,有機溶劑的溫度較佳為以電鑄步驟中所使用的電鑄液的溫度為基準而±15℃的範圍內。 Further, in the method for producing a metal part according to the present invention, the temperature of the organic solvent is preferably within a range of ±15 ° C based on the temperature of the electroforming solution used in the electroforming step.

本發明的金屬零件的製造方法特別是由於使用黏性率低於水(黏性率為0.9mPa.s)且滿足η×H×N<1.6的有機溶劑作為剝離液,並且在所述有機溶劑中將金屬零件自模板剝離,因此與先前所使用的純水相比,剝離液容易進入至金屬零件及模板的間隙。其結果,在利用電鑄的金屬零件的製造方法中,即便凹凸圖案的尺度為微細,亦可無圖案缺陷地剝離金屬零件。 The method for producing a metal part of the present invention is particularly effective in that an organic solvent having a viscosity lower than water (viscosity: 0.9 mPa·s) and satisfying η × H × N < 1.6 is used as a stripping liquid, and in the organic solvent The metal part is peeled off from the stencil, so the stripping liquid easily enters the gap between the metal part and the stencil compared to the pure water used previously. As a result, in the method of manufacturing a metal part by electroforming, even if the scale of the uneven pattern is fine, the metal part can be peeled off without pattern defects.

10‧‧‧金屬模具 10‧‧‧Metal mold

12‧‧‧金屬層 12‧‧‧metal layer

14‧‧‧初始層 14‧‧‧ initial layer

16‧‧‧脫模層 16‧‧‧ release layer

20‧‧‧模板 20‧‧‧ template

圖1是表示實施形態的金屬零件的製造方法的步驟的概略剖面圖。 Fig. 1 is a schematic cross-sectional view showing a procedure of a method of manufacturing a metal component according to an embodiment.

以下,在本發明的實施形態中使用圖式進行說明,但本發明並不限定於所述實施形態。另外,為了容易視覺辨認,圖式中的各構成要素的比例尺等與實際者適當不同。 Hereinafter, the embodiment of the present invention will be described using the drawings, but the present invention is not limited to the embodiment. In addition, in order to make it easy to visually recognize, the scale of each component in the drawing and the like are appropriately different from those of the actual person.

另外,以下的說明中,對製造例如在奈米壓印法中所使用的金屬模具(亦稱為母模等)作為金屬零件的情形進行說明。 In the following description, a case where a metal mold (also referred to as a master mold or the like) used in, for example, a nanoimprint method is manufactured as a metal member will be described.

圖1是表示本實施形態的金屬模具的製造方法的步驟的概略剖面圖。本實施形態的金屬模具的製造方法是如下的方法:首先準備模板20(圖1的a),在表面具有微細凹凸圖案的模板20的所述表面,沿著凹凸圖案形成脫模層16(圖1的b),在脫模層16上形成具有導電性的初始層14(圖1的c),在初始層14上將 金屬材料電鑄而形成金屬層12(圖1的d),將初始層14與金屬層12成為一體的複合體在有機溶劑中自模板20剝離(圖1的e),而製造作為模板20的複合體的金屬模具10,且在將凹凸圖案的高度設為Hμm及將凹凸圖案的密度設為N個/μm2時,有機溶劑在35℃時的黏性率ηmPa.s滿足下述式5及式6。 Fig. 1 is a schematic cross-sectional view showing the procedure of a method of manufacturing a mold according to the embodiment. The method for producing a mold according to the present embodiment is a method of first preparing a template 20 (a of FIG. 1), and forming a release layer 16 along the surface of the template 20 having a fine uneven pattern on the surface (Fig. b) of 1), a conductive initial layer 14 is formed on the release layer 16 (c of FIG. 1), and a metal material is electroformed on the initial layer 14 to form a metal layer 12 (d of FIG. 1), which will initially The composite in which the layer 14 and the metal layer 12 are integrated is peeled off from the stencil 20 in an organic solvent (e of FIG. 1), and the metal mold 10 as a composite of the stencil 20 is produced, and the height of the concave-convex pattern is set to H μm and When the density of the concave-convex pattern is N/μm 2 , the viscosity of the organic solvent at 35 ° C is ηmPa. s satisfies the following formulas 5 and 6.

η<0.9…式5 η<0.9...式5

η×H×N<1.6…式6 η×H×N<1.6...form 6

藉此,獲得作為以模板20為母盤、且具有所述模板20所具有的凹凸圖案的反轉圖案的複合體的金屬模具10。即,本實施形態中所製造的金屬模具10包含金屬層12、初始層14及脫模層16。另外,由於脫模層16包含有機材料,因此亦存在脫模層16的一部分或全部在剝離步驟時殘存於模板側的情況。 Thereby, the metal mold 10 which is a composite body which has the template 20 as a master and has the reverse pattern of the uneven pattern of the template 20 is obtained. That is, the metal mold 10 manufactured in the present embodiment includes the metal layer 12, the initial layer 14, and the release layer 16. Further, since the release layer 16 contains an organic material, some or all of the release layer 16 may remain on the template side during the peeling step.

構成成為母盤的模板20的材料並無特別限制,例如可為:Ni、Ni-P、Ni-B、Ti及W等金屬,氧化矽等無機氧化物,石英玻璃等玻璃,丙烯酸系樹脂及苯乙烯樹脂等樹脂的任一種。但需要不溶於所使用的有機溶劑。模板20具有應轉印至金屬模具10上的凹凸圖案(更準確而言為其反轉圖案)。凹凸圖案的凸部或凹部的形狀適當設計為多角柱狀、多角錐狀、圓柱狀、圓錐狀、圓頂狀等。凸部或凹部的俯視的寬度例如為10nm~10μm,高度或深度例如為10nm~10μm,凸部彼此或凹部彼此的間隔例如為10 nm~10μm。另外,與先前的剝離液(純水)相比,本發明對於凸部或凹部的俯視的寬度為10nm~1μm、高度或深度為10nm~1μm、凸部彼此或凹部彼此的間隔為10nm~1μm的情形特別有效果。具有凹凸圖案的此種模板20例如可藉由以下方式製造:在成為模板的基礎的基盤的表面形成抗蝕劑膜,藉由光微影術(photo lithography)或電子束微影術將抗蝕劑膜圖案化,然後將經圖案化的抗蝕劑膜作為遮罩進行蝕刻。另外,藉由自組織化技術在基盤的表面配置遮罩材料,然後進行蝕刻,亦可製造模板20。 The material of the template 20 to be the master is not particularly limited, and examples thereof include metals such as Ni, Ni-P, Ni-B, Ti, and W, inorganic oxides such as cerium oxide, glass such as quartz glass, and acrylic resins. Any of resins such as styrene resins. However, it is necessary to be insoluble in the organic solvent used. The template 20 has a concavo-convex pattern (more precisely, a reverse pattern thereof) to be transferred onto the metal mold 10. The shape of the convex portion or the concave portion of the concave-convex pattern is appropriately designed into a polygonal column shape, a polygonal pyramid shape, a cylindrical shape, a conical shape, a dome shape, or the like. The width of the convex portion or the concave portion in the plan view is, for example, 10 nm to 10 μm, the height or the depth is, for example, 10 nm to 10 μm, and the interval between the convex portions or the concave portions is, for example, 10 Nm~10μm. Further, in the present invention, the width of the convex portion or the concave portion in the plan view is 10 nm to 1 μm, the height or depth is 10 nm to 1 μm, and the interval between the convex portions or the concave portions is 10 nm to 1 μm as compared with the conventional peeling liquid (pure water). The situation is particularly effective. Such a template 20 having a concavo-convex pattern can be produced, for example, by forming a resist film on the surface of a substrate which is the basis of the template, and resisting it by photolithography or electron beam lithography The film is patterned and the patterned resist film is then etched as a mask. Further, the template 20 can also be fabricated by disposing a mask material on the surface of the substrate by a self-organization technique and then performing etching.

在脫模層形成步驟中,形成用以容易自金屬模具10的模板20剝離的脫模層16。作為脫模層16,並無特別限定,例如脫模層16可採用包含矽烷偶合劑等有機材料的分子膜。作為矽烷偶合劑,例如較佳為具有芳香環且進一步具有胺基、硫基或羥基的矽烷偶合劑。同時具有芳香環與胺基的矽烷偶合劑例如為三乙氧基[2-(苯基胺基)甲基]矽烷、三甲氧基[3-(苯基胺基)丙基]矽烷。同時具有芳香環與硫基的矽烷偶合劑例如為2-(3-三甲氧基矽烷基丙硫基)噻吩。同時具有芳香環與羥基的矽烷偶合劑例如為2-羥基-4-(3-三乙氧基矽烷基丙氧基)二苯基酮。藉由存在芳香環,而脫模性提高,藉由存在胺基、硫基或羥基,而可形成初始層。 In the release layer forming step, the release layer 16 for easy peeling from the template 20 of the metal mold 10 is formed. The release layer 16 is not particularly limited. For example, the release layer 16 may be a molecular film containing an organic material such as a decane coupling agent. As the decane coupling agent, for example, a decane coupling agent having an aromatic ring and further having an amine group, a sulfur group or a hydroxyl group is preferable. The decane coupling agent having both an aromatic ring and an amine group is, for example, triethoxy[2-(phenylamino)methyl]decane, trimethoxy[3-(phenylamino)propyl]decane. The decane coupling agent having both an aromatic ring and a sulfur group is, for example, 2-(3-trimethoxydecylpropylthio)thiophene. The decane coupling agent having both an aromatic ring and a hydroxyl group is, for example, 2-hydroxy-4-(3-triethoxydecylpropoxy)diphenyl ketone. By the presence of an aromatic ring, the mold release property is improved, and an initial layer can be formed by the presence of an amine group, a sulfur group or a hydroxyl group.

此種分子膜例如藉由使用含有矽烷偶合劑的脫模劑的表面處理而形成。表面處理的方法可使用:氣相法、浸漬法、塗佈法及噴霧法等公知的任一種方法。例如藉由使用矽烷偶合劑的表面處理而形成的脫模層16,為單分子膜或接近單分子膜的薄 膜,膜厚為數Å~數十Å左右。因此,此種脫模層16對模板20的凹凸圖案的形狀的追隨性極高。 Such a molecular film is formed, for example, by surface treatment using a release agent containing a decane coupling agent. As the method of the surface treatment, any of known methods such as a vapor phase method, a dipping method, a coating method, and a spray method can be used. For example, the release layer 16 formed by surface treatment using a decane coupling agent is a monomolecular film or a thin film close to a monomolecular film. The film has a film thickness of several Å to several tens of Å. Therefore, such a release layer 16 has extremely high followability to the shape of the uneven pattern of the template 20.

在初始層形成步驟中,形成初始層14作為用以實施電鑄的通電膜。初始層14的形成方法並無特別限制,可為濺鍍法等乾式製程法,亦可為無電鍍敷等濕式製程法。 In the initial layer forming step, the initial layer 14 is formed as an energized film for performing electroforming. The method for forming the initial layer 14 is not particularly limited, and may be a dry process such as a sputtering method or a wet process such as electroless plating.

在使用無電鍍敷時,預先對脫模層16提供無電鍍敷用觸媒。觸媒提供液根據欲藉由無電鍍敷而析出的材料(即初始層14的材料)而適當選擇。特別是如上所述般,在脫模層16具有胺基、硫基或羥基時,脫模層16具有良好的觸媒吸附性(吸附成為觸媒的金屬離子的性質),並且觸媒能確實地析出。藉此,能以所析出的觸媒(金屬)為契機藉由無電鍍敷形成初始層14。對脫模層16的觸媒提供、與其後的無電鍍敷的方法並無特別限制,可使用公知的方法而進行。例如,觸媒提供藉由使用觸媒提供液的浸漬法、塗佈法及噴霧法等公知的方法而進行,其結果對脫模層16提供所期望的觸媒(Pd、Ag、Cu、Ni等)。另外,無電鍍敷例如藉由在由鍍敷溶液充滿的鍍敷槽中,浸漬提供了觸媒的模板20的方法等公知的鍍敷浴進行。如此,在藉由觸媒的提供與無電鍍敷而形成初始層14時,與藉由真空成膜等特別的成膜方法形成初始層14的情形相比,不需要大規模的裝置且成膜所需要的時間亦變短,因此步驟簡便。 When electroless plating is used, the release layer 16 is supplied with an electroless plating catalyst in advance. The catalyst supply liquid is appropriately selected depending on the material to be deposited by electroless plating (that is, the material of the initial layer 14). In particular, as described above, when the release layer 16 has an amine group, a sulfur group or a hydroxyl group, the release layer 16 has good catalyst adsorption property (the property of adsorbing metal ions which become a catalyst), and the catalyst can be confirmed. Precipitate. Thereby, the initial layer 14 can be formed by electroless plating in consideration of the precipitated catalyst (metal). The method of supplying the catalyst to the release layer 16 and the subsequent electroless plating is not particularly limited, and it can be carried out by a known method. For example, the catalyst is supplied by a known method such as a dipping method using a catalyst supply liquid, a coating method, and a spray method, and as a result, the desired catalyst (Pd, Ag, Cu, Ni is supplied to the release layer 16). Wait). Further, the electroless plating is carried out, for example, by a known plating bath such as a method of immersing a template 20 in which a catalyst is supplied in a plating bath filled with a plating solution. As described above, when the initial layer 14 is formed by the supply of the catalyst and the electroless plating, the large-scale apparatus and the film formation are not required as compared with the case where the initial layer 14 is formed by a special film formation method such as vacuum film formation. The time required is also shorter, so the steps are simple.

初始層14的厚度較佳為在0.05μm~0.5μm的範圍內進行設定。原因是,若初始層14的厚度小於0.05μm,則有電鑄時 斷線的擔憂,另外若初始層14的厚度超過0.5μm,則有產生因應力引起的密接不良的情況而欠佳。 The thickness of the initial layer 14 is preferably set in the range of 0.05 μm to 0.5 μm. The reason is that if the thickness of the initial layer 14 is less than 0.05 μm, there is electroforming Further, if the thickness of the initial layer 14 exceeds 0.5 μm, the adhesion failure due to stress may be unsatisfactory.

在電鑄步驟中,藉由對初始層14通電而金屬材料析出於初始層14上,並在初始層14上形成金屬層12。金屬材料的析出所用的電鑄液、或液溫、pH值、電流密度、通電時間等電鑄條件,並無特別限制,可適當選擇先前公知的電鑄液,並根據所製造的金屬零件適當設定條件。另外,金屬材料的材質例如可列舉:Ni、Cr、Cu、Ni-Cr合金、Ni-Fe合金、Ni-W合金等金屬。金屬層12的厚度較佳為10μm以上。原因是,若厚度小於10μm,則有在下一剝離步驟中導致金屬模具10破損的情況而欠佳。電鑄的溫度較佳為在25℃~55℃的範圍內進行。原因是,若電鑄溫度小於25℃,則電鑄時間變長而生產適性消失,另外,若電鑄溫度超過55℃,則有因模板20的熱應變而凹凸圖案的尺寸精度降低的情況而欠佳。 In the electroforming step, the metal material is deposited on the initial layer 14 by energizing the initial layer 14, and the metal layer 12 is formed on the initial layer 14. The electroforming liquid used for the precipitation of the metal material, or the electroforming conditions such as the liquid temperature, the pH value, the current density, and the energization time are not particularly limited, and the previously known electroforming liquid can be appropriately selected and appropriately selected according to the metal parts to be produced. Set the conditions. Further, examples of the material of the metal material include metals such as Ni, Cr, Cu, a Ni-Cr alloy, a Ni-Fe alloy, and a Ni-W alloy. The thickness of the metal layer 12 is preferably 10 μm or more. The reason is that if the thickness is less than 10 μm, there is a case where the metal mold 10 is broken in the next peeling step, which is not preferable. The temperature of the electroforming is preferably carried out in the range of 25 ° C to 55 ° C. The reason is that if the electroforming temperature is less than 25 ° C, the electroforming time becomes long and the production suitability disappears. Further, when the electroforming temperature exceeds 55 ° C, the dimensional accuracy of the concavo-convex pattern is lowered due to the thermal strain of the template 20 . Poor.

在剝離步驟中,將金屬層12、初始層14及脫模層16經一體化者在有機溶劑中自模板20剝離,其結果獲得金屬模具10。在本發明中,在黏度比先前用作脫模液的純水低的有機溶劑中,將金屬模具10自模板20剝離。具體而言,所使用的有機溶劑較佳為:在將模板20的凹凸圖案的高度設為H μm及將所述凹凸圖案的密度設為N個/μm2時,有機溶劑在35℃時的黏性率ηmPa.s滿足所述式1及式2。此處,所謂「凹凸圖案的高度」,是指構成凹凸圖案的凸部的高度或凹部的深度的平均值(例如為任 意10點左右的平均值),所謂「凹凸圖案的密度」,是指每1μm2的所述凸部或所述凹部的個數(將凸部或凹部的總數除以整個圖案區域的面積者)。另外,黏性率例如使用電磁旋轉式(Electro-Magnetically Spinning,EMS)黏度計(京都電子工業股份有限公司),以在鋼球直徑為2mm、液溫為35℃及轉速為1000rpm的測定條件下而得的3次測定值的平均值而算出。 In the peeling step, the metal layer 12, the initial layer 14, and the release layer 16 are peeled off from the template 20 in an organic solvent by an integrator, and as a result, the metal mold 10 is obtained. In the present invention, the metal mold 10 is peeled off from the stencil 20 in an organic solvent having a lower viscosity than the pure water previously used as the mold release liquid. Specifically, the organic solvent to be used is preferably such that when the height of the uneven pattern of the template 20 is H μm and the density of the uneven pattern is N/μm 2 , the organic solvent is at 35 ° C. Viscosity rate ηmPa. s satisfies the above formula 1 and formula 2. Here, the "height of the uneven pattern" refers to the height of the convex portion constituting the concave-convex pattern or the average value of the depth of the concave portion (for example, an average value of about 10 points), and the "density of the concave-convex pattern" means The number of the convex portions or the concave portions per 1 μm 2 (the total number of convex portions or concave portions divided by the area of the entire pattern region). Further, the viscosity ratio is, for example, an Electro-Magnetically Spinning (EMS) viscometer (Kyoto Electronics Co., Ltd.) under the measurement conditions of a steel ball diameter of 2 mm, a liquid temperature of 35 ° C, and a rotational speed of 1000 rpm. The average value of the three measured values obtained was calculated.

所述式6是根據後述實施例的結果而導出者。並且,所述式6概念性地表示:凹凸圖案的高度越高或凹凸圖案的密度越大,即凹凸圖案的凸部或凹部的側壁面積越大,則較佳為使用黏性率更低的有機溶劑。在本實施形態中,由於使用滿足所述式6的程度地黏性率低的有機溶劑,並在所述有機溶劑中將金屬零件自模板剝離,因此與純水中相比,剝離液(有機溶劑)容易進入金屬層12與模板20的間隙,而表現出良好的脫模性。因此,能以高的再現性製造具有奈米級微細形狀部位的金屬零件。另外,有機溶劑實際上進入至脫模層16與模板20之間、脫模層16與初始層14之間、及脫模層16的內部的各種間隙。若η×H×N為1.6以上,則有機溶劑難以進入模板20與金屬模具10的間隙,而難以自模板20剝離金屬模具10(即金屬模具10的脫模)。 The equation 6 is derived based on the results of the embodiments described later. Further, the formula 6 conceptually indicates that the higher the height of the concave-convex pattern or the higher the density of the concave-convex pattern, that is, the larger the side wall area of the convex portion or the concave portion of the concave-convex pattern, it is preferable to use a lower viscosity ratio. Organic solvents. In the present embodiment, since the organic solvent having a low viscosity ratio which satisfies the above formula 6 is used, and the metal component is peeled off from the template in the organic solvent, the peeling liquid is compared with the pure water (organic The solvent) easily enters the gap between the metal layer 12 and the template 20, and exhibits good mold release property. Therefore, it is possible to manufacture a metal part having a nano-scale fine-shaped portion with high reproducibility. Further, the organic solvent actually enters various gaps between the release layer 16 and the template 20, between the release layer 16 and the initial layer 14, and inside the release layer 16. When η × H × N is 1.6 or more, it is difficult for the organic solvent to enter the gap between the die plate 20 and the mold 10, and it is difficult to peel the metal mold 10 from the die plate 20 (that is, the mold release of the metal mold 10).

有機溶劑的黏性率η較佳為進一步滿足式7及/或式8。原因是,黏性率越低,則脫模性越提高且亦越可縮短剝離所需要的時間。 The viscosity ratio η of the organic solvent is preferably such that the formula 7 and/or the formula 8 are further satisfied. The reason is that the lower the viscosity ratio, the more the mold release property is improved and the time required for peeling can be shortened.

η<0.6…式7 η<0.6... Equation 7

η×H×N<1.0…式8 η×H×N<1.0...8

另外,有機溶劑的溫度較佳為以電鑄步驟中所使用的電鑄液的溫度為基準而±15℃的範圍內。原因是,若有機溶劑的溫度超過所述範圍,則有因模板20與金屬模具10的線膨脹係數的差而產生圖案破壞的情況。另外,若為以電鑄液的溫度為基準而±15℃的範圍內,則由於與純水的關係而有機溶劑的黏性率的高低不會發生變化。另外,有機溶劑的溫度更佳為以電鑄液的溫度為基準而±10℃的範圍內。 Further, the temperature of the organic solvent is preferably within a range of ±15 ° C based on the temperature of the electroforming solution used in the electroforming step. The reason is that if the temperature of the organic solvent exceeds the above range, the pattern may be broken due to the difference in linear expansion coefficient between the template 20 and the mold 10. In addition, in the range of ±15 ° C based on the temperature of the electroforming liquid, the viscosity of the organic solvent does not change due to the relationship with the pure water. Further, the temperature of the organic solvent is more preferably within a range of ±10 ° C based on the temperature of the electroforming solution.

如以上所述般,本實施形態的金屬零件的製造方法特別 是由於使用黏性率低於水(黏性率為0.9mPa.s)且滿足η×H×N<1.6的有機溶劑作為剝離液,並在所述有機溶劑中將金屬零件自模板剝離,因此與先前所使用的純水相比,剝離液容易進入至金屬零件及模板的間隙。其結果,在利用電鑄的金屬零件的製造方法中,即便凹凸圖案的尺度為微細,亦可無圖案缺陷地剝離金屬零件。並且,作為其結果,可再現性佳地製造高品質的金屬零件。 As described above, the method of manufacturing the metal part of the present embodiment is particularly It is because an organic solvent having a viscosity lower than water (viscosity of 0.9 mPa·s) and satisfying η×H×N<1.6 is used as a peeling liquid, and the metal part is peeled off from the template in the organic solvent, The stripping liquid easily enters the gap between the metal part and the stencil compared to the pure water previously used. As a result, in the method of manufacturing a metal part by electroforming, even if the scale of the uneven pattern is fine, the metal part can be peeled off without pattern defects. Further, as a result, high-quality metal parts can be manufactured with excellent reproducibility.

[實施例] [Examples]

以下表示本發明的製造方法的實施例。 The examples of the production method of the present invention are shown below.

<實施例1> <Example 1>

(至電鑄步驟為止) (up to the electroforming step)

首先,準備藉由各向異性蝕刻等,在直徑為4英吋的圓區域 內實施下述奈米圖案的微細加工的直徑為6英吋的矽晶圓。另外,所謂圖案間距,是與所配置的孔有關而將相鄰接的孔彼此的間隔進行平均者。 First, prepare a circular area of 4 inches in diameter by anisotropic etching or the like. A ruthenium wafer having a diameter of 6 inches which is microfabricated by the following nano pattern is carried out. Further, the pattern pitch is an average of the intervals between the adjacent holes in relation to the arranged holes.

圖案1: Pattern 1:

孔形狀 圓柱形 Hole shape cylindrical

孔的深度 900nm(H=0.90) The depth of the hole is 900nm (H=0.90)

圖案間距 1000nm Pattern spacing 1000nm

每1μm2的孔數 2.3個(N=2.3) 2.3 holes per 1 μm 2 (N=2.3)

H×N=2.070 H×N=2.070

然後,對所述矽晶圓的形成有圖案的表面,使用UV-O3清潔劑(森特殊光源公司(SEN LIGHT corporation)光表面處理裝置(Photo Surface Pricessor)PL16-110D)進行表面活性化處理。繼而,以容積比計為10mL/L的方式,將三甲氧基[3-(苯基胺基)丙基]矽烷(東京化成工業股份有限公司、P1458)的脫模劑與矽晶圓一起封入密閉容器中。 Then, the patterned surface of the tantalum wafer was subjected to surface activation treatment using a UV-O3 detergent (SEN LIGHT corporation Photo Surface Prices) PL16-110D. Then, a release agent of trimethoxy[3-(phenylamino)propyl]decane (Tokyo Chemical Industry Co., Ltd., P1458) was sealed together with a ruthenium wafer in a volume ratio of 10 mL/L. In a closed container.

繼而,將所述密閉容器放入烘箱中在100℃下加熱2小時。然後,取出矽晶圓,藉由適當溶劑除去多餘的脫模劑而形成脫模層。將形成了脫模層的矽晶圓在SnCl2(和光純藥工業股份有限公司、208-01565)溶液(室溫)中浸漬1分鐘,並進行水洗,然後進一步在PdCl2(和光純藥工業股份有限公司、164-00052)溶液(室溫)中浸漬1分鐘,並進行水洗,藉此提供觸媒。然後,在包含0.1M的硫酸鎳(和光純藥工業股份有限公司、148-0117)、 0.2M的次磷酸鈉乙酸鈉(和光純藥工業股份有限公司、193-02225)及0.2M的乙酸銨(和光純藥工業股份有限公司、019-02835)的無電鍍鎳液(50℃)中,將提供了觸媒的矽晶圓浸漬2分鐘,使鎳(Ni)在脫模層表面析出。藉此形成包含鎳的通電膜。 Then, the sealed container was placed in an oven and heated at 100 ° C for 2 hours. Then, the germanium wafer is taken out, and the excess mold release agent is removed by a suitable solvent to form a release layer. The tantalum wafer on which the release layer was formed was immersed in a solution of SnCl 2 (Wako Pure Chemical Industries Co., Ltd., 208-01565) (room temperature) for 1 minute, and washed with water, and then further in PdCl 2 (Wako Pure Chemical Industries, Ltd.) Co., Ltd., 164-00052) was immersed in a solution (room temperature) for 1 minute and washed with water to provide a catalyst. Then, it contains 0.1M nickel sulfate (Wako Pure Chemical Industries Co., Ltd., 148-0117), 0.2M sodium hypophosphite sodium acetate (Wako Pure Chemical Industries Co., Ltd., 193-02225) and 0.2M ammonium acetate. In the electroless nickel plating solution (50 ° C) of Wako Pure Chemical Industries Co., Ltd., 019-02835, a catalyst-attached ruthenium wafer was immersed for 2 minutes to precipitate nickel (Ni) on the surface of the release layer. Thereby, an energized film containing nickel is formed.

繼而,將形成有通電膜的矽晶圓進行水洗後,將所述矽晶圓浸漬於鎳電鑄液中,以4A/dm2的電流密度對通電膜通電150分鐘,使鎳析出。電鑄被膜(金屬層)的最終的厚度為150μm。 Then, after the silicon wafer on which the current-carrying film was formed was washed with water, the germanium wafer was immersed in a nickel electroforming liquid, and the current-carrying film was energized at a current density of 4 A/dm 2 for 150 minutes to precipitate nickel. The final thickness of the electroformed film (metal layer) was 150 μm.

(剝離步驟) (peeling step)

將所述步驟中所得的4片矽晶圓分別藉由剝離步驟而浸漬於保溫為35℃的水(35℃時的η=0.90mPa.s)、甲醇(η=0.55)、辛烷(η=0.40)及己烷(η=0.10)的各溶液中,在模板與金屬零件間滑入剃刀分別進行剝離。 The four ruthenium wafers obtained in the above step were respectively immersed in water (35° C. at η=0.90 mPa·s), methanol (η=0.55), and octane (η) by a peeling step. In each of the solutions of =0.40) and hexane (η = 0.10), the razor was slid between the template and the metal parts and peeled off.

(評價基準) (evaluation benchmark)

藉由電子顯微鏡觀察經剝離的金屬零件的圖案,根據下述評價基準進行剝離結果的評價。 The pattern of the peeled metal parts was observed by an electron microscope, and the peeling result was evaluated based on the following evaluation criteria.

A:圖案無損傷且可在10分鐘以內剝離金屬零件。 A: The pattern is not damaged and the metal parts can be peeled off within 10 minutes.

B:圖案無損傷且可在10分鐘~1小時以內剝離金屬零件。 B: The pattern is not damaged and the metal parts can be peeled off within 10 minutes to 1 hour.

C:無法剝離。或經剝離的金屬零件的圖案產生損傷。 C: Cannot be peeled off. Or the pattern of the peeled metal part creates damage.

(結果) (result)

根據下述結果明白:與在水中剝離的情形相比,在有機溶劑中剝離的情形下,即便凹凸圖案的尺度為微細,亦可無圖案缺陷 地剝離金屬零件。 According to the results described below, in the case of peeling in an organic solvent as compared with the case of peeling in water, even if the scale of the concave-convex pattern is fine, there is no pattern defect. Strip the metal parts.

水(η=0.90) C Water (η=0.90) C

甲醇(η=0.55) B Methanol (η = 0.55) B

辛烷(η=0.40) A Octane (η=0.40) A

己烷(η=0.10) A Hexane (η=0.10) A

<實施例2> <Example 2>

形成4片實施了下述圖案的微細加工而成為奈米圖案的矽晶圓,藉由剝離步驟在水、甲醇、辛烷及己烷的各溶液中分別進行剝離,除此以外,與實施例1相同。 Four ruthenium wafers which were microfabricated by the following pattern and formed into a nano pattern were formed by peeling off each solution of water, methanol, octane, and hexane, respectively. 1 is the same.

圖案2: Pattern 2:

孔形狀 圓柱形 Hole shape cylindrical

孔的深度 150nm(H=0.15) The depth of the hole is 150nm (H=0.15)

圖案間距 100nm Pattern spacing 100nm

每1μm2的孔數 23.1個(N=23.1) The number of holes per 1 μm 2 is 23.1 (N=23.1)

H×N=3.465 H×N=3.465

(結果) (result)

水(η=0.90) C Water (η=0.90) C

甲醇(η=0.55) C Methanol (η = 0.55) C

辛烷(η=0.40) B Octane (η=0.40) B

己烷(η=0.10) A Hexane (η=0.10) A

<實施例3> <Example 3>

形成4片實施了下述圖案的微細加工而成為奈米圖案的矽晶 圓,藉由剝離步驟在水、甲醇、辛烷及己烷的各溶液中分別進行剝離,除此以外,與實施例1相同。 Forming four crystals that have been subjected to microfabrication with the following pattern to form a nano pattern The circle was the same as that of Example 1 except that the peeling step was carried out in each of water, methanol, octane and hexane.

圖案3: Pattern 3:

孔形狀 圓柱形 Hole shape cylindrical

孔的深度 200nm(H=0.20) The depth of the hole is 200nm (H=0.20)

圖案間距 100nm Pattern spacing 100nm

每1μm2的孔數 23.1個(N=23.1) The number of holes per 1 μm 2 is 23.1 (N=23.1)

H×N=4.620 H×N=4.620

(結果) (result)

水(η=0.90) C Water (η=0.90) C

甲醇(η=0.55) C Methanol (η = 0.55) C

辛烷(η=0.40) C Octane (η=0.40) C

己烷(η=0.10) A Hexane (η=0.10) A

<比較例1> <Comparative Example 1>

形成4片實施了下述圖案的微細加工而成為奈米圖案的矽晶圓,藉由剝離步驟在水、甲醇、辛烷及己烷的各溶液中分別進行剝離,除此以外,與實施例1相同。 Four ruthenium wafers which were microfabricated by the following pattern and formed into a nano pattern were formed by peeling off each solution of water, methanol, octane, and hexane, respectively. 1 is the same.

圖案4: Pattern 4:

孔形狀 圓柱形 Hole shape cylindrical

孔的深度 50nm(H=0.05) The depth of the hole is 50nm (H=0.05)

圖案間距 1000nm Pattern spacing 1000nm

圖案間距 1000nm Pattern spacing 1000nm

每1μm2的孔數 2.3個(N=2.3) 2.3 Number of holes (N = 2.3) per 1μm 2 of

H×N=0.115 H×N=0.115

(結果) (result)

水(η=0.90) A Water (η=0.90) A

甲醇(η=0.55) A Methanol (η = 0.55) A

辛烷(η=0.40) A Octane (η=0.40) A

己烷(η=0.10) A Hexane (η=0.10) A

<比較例2> <Comparative Example 2>

形成4片實施了下述圖案的微細加工而成為奈米圖案的矽晶圓,藉由剝離步驟在水、甲醇、辛烷及己烷的各溶液中分別進行剝離,除此以外,與實施例1相同。 Four ruthenium wafers which were microfabricated by the following pattern and formed into a nano pattern were formed by peeling off each solution of water, methanol, octane, and hexane, respectively. 1 is the same.

圖案5: Pattern 5:

孔形狀 圓柱形 Hole shape cylindrical

孔的深度 50nm(H=0.05) The depth of the hole is 50nm (H=0.05)

圖案間距 100nm Pattern spacing 100nm

每1μm2的孔數 23.1個(N=23.1) The number of holes per 1 μm 2 is 23.1 (N=23.1)

H×N=1.155 H×N=1.155

(結果) (result)

水(η=0.90) B Water (η=0.90) B

甲醇(η=0.55) A Methanol (η = 0.55) A

辛烷(η=0.40) A Octane (η=0.40) A

己烷(η=0.10) A Hexane (η=0.10) A

<總評> <General Review>

表1是將實施例1~實施例3及比較例1~比較例2的結果匯總的表。表中的各結果的數字為η×H×N的值,A、B或C為所述評價結果。 Table 1 is a table summarizing the results of Examples 1 to 3 and Comparative Examples 1 to 2. The number of each result in the table is a value of η × H × N, and A, B or C is the evaluation result.

根據表1,在H×N的值小(即,由於凹凸圖案的高度及/或凹凸圖案的密度小,而凹凸圖案相對較大)時,在水中的剝離與在有機溶劑中的剝離時,在剝離的容易性方面不那麼會產生差異。另一方面可知,在H×N的值大(即,由於凹凸圖案的高度及/或凹凸圖案的密度大,而凹凸圖案相對較微細)時,在有機溶劑中的剝離比在水中的剝離更有效果。具體結果是:在η×H×N的值為1.4以下時,剝離結果為A或B,在η×H×N的值為1.8以上時,剝離結果為C。藉此認為,若取其中間為η×H×N<1.6,則即便凹凸圖案的尺度為微細,亦可無圖案缺陷地剝離金屬零件。並且可知,若為η×H×N<1.0,則可縮短金屬模具的脫模所需要的時間。 According to Table 1, when the value of H×N is small (that is, when the height of the concave-convex pattern and/or the density of the concave-convex pattern is small and the concave-convex pattern is relatively large), when peeling in water and peeling in an organic solvent, There is less difference in the ease of peeling. On the other hand, it is understood that when the value of H×N is large (that is, since the height of the concave-convex pattern and/or the density of the concave-convex pattern is large and the concave-convex pattern is relatively fine), the peeling in the organic solvent is more than the peeling in the water. effective. Specifically, when the value of η × H × N is 1.4 or less, the peeling result is A or B, and when the value of η × H × N is 1.8 or more, the peeling result is C. From this, it is considered that if η×H×N<1.6 is taken in the middle, even if the scale of the uneven pattern is fine, the metal part can be peeled off without pattern defects. Further, it can be seen that if η × H × N < 1.0, the time required for mold release of the metal mold can be shortened.

另外,根據比較例1及比較例2可知,本發明亦具有以下的優點:即便是在水中亦可剝離的程度的大小的凹凸圖案,藉由使用有機溶劑將金屬模具脫模,而亦可縮短金屬模具的脫模所需要的時間。 Further, according to Comparative Example 1 and Comparative Example 2, the present invention also has the advantage that even if the concave-convex pattern of a size that can be peeled off in water is released from the mold by using an organic solvent, it can be shortened. The time required for the demolding of the metal mold.

[產業上之可利用性] [Industrial availability]

本發明中所製造的金屬模具例如可用於製作在元件的表面具有微細結構的使發光二極體(Light-Emitting Diode,LED)的亮度提高的發光二極體-圖案化藍寶石基板(Light-Emitting Diode-Patterned Sapphire Substrate,LED-PSS)領域中所使用的奈米壓印用模。 The metal mold manufactured in the present invention can be used, for example, to produce a light-emitting diode-patterned sapphire substrate (Light-Emitting) having a fine structure on the surface of the element and improving the brightness of a light-emitting diode (LED). Nanoimprint dies used in the field of Diode-Patterned Sapphire Substrate, LED-PSS).

另外,可藉由本發明而製造的金屬零件並不限定於金屬模具或模(mold)等,例如為包含如配線、電極、攝像裝置等具有奈米級微細形狀部位的金屬零件作為對象者。 In addition, the metal component which can be manufactured by the present invention is not limited to a metal mold, a mold, or the like, and is, for example, a metal component including a nano-scale fine-shaped portion such as a wiring, an electrode, or an image pickup device.

Claims (7)

一種金屬零件的製造方法,其是如下的方法:在表面具有微細凹凸圖案的模板的所述表面,沿著所述凹凸圖案形成脫模層,在所述脫模層上形成具有導電性的初始層,在所述初始層上將金屬材料進行電鑄而形成金屬層,將所述初始層與所述金屬層成為一體的複合體在有機溶劑中自所述模板剝離,而製造作為模板的複合體的金屬零件,且所述金屬零件的製造方法的特徵在於,在將所述凹凸圖案的高度設為H μm及將所述凹凸圖案的密度設為N個/μm2時,所述有機溶劑在35℃時的黏性率ηmPa.s滿足式1及式2:η<0.9…式1 η×H×N<1.6…式2。 A method for producing a metal part, which is a method of forming a release layer along the concave-convex pattern on the surface of a template having a fine uneven pattern on a surface, and forming an initial conductive layer on the release layer a layer on which a metal material is electroformed to form a metal layer, and a composite body in which the initial layer and the metal layer are integrated is peeled off from the template in an organic solvent to produce a composite as a template. The metal part of the body, and the method of manufacturing the metal part, characterized in that the organic solvent is used when the height of the uneven pattern is H μm and the density of the uneven pattern is N/μm 2 Viscosity ηmPa at 35 ° C. s satisfies Formula 1 and Formula 2: η < 0.9... Formula 1 η × H × N < 1.6... Formula 2. 如申請專利範圍第1項所述之金屬零件的製造方法,其中所述黏性率η滿足式3:η<0.6…式3。 The method for producing a metal part according to claim 1, wherein the viscosity ratio η satisfies Formula 3: η < 0.6 (Formula 3). 如申請專利範圍第1項所述之金屬零件的製造方法,其中所述黏性率η滿足式4: η×H×N<1.0…式4。 The method of manufacturing a metal part according to the first aspect of the invention, wherein the viscosity ratio η satisfies the formula 4: η × H × N < 1.0... Equation 4. 如申請專利範圍第2項所述之金屬零件的製造方法,其中所述黏性率η滿足式4:η×H×N<1.0…式4。 The method for producing a metal part according to the second aspect of the invention, wherein the viscosity ratio η satisfies the formula 4: η × H × N < 1.0 (Formula 4). 如申請專利範圍第1項所述之金屬零件的製造方法,其中所述有機溶劑為甲醇、辛烷及己烷的至少1種。 The method for producing a metal part according to the first aspect of the invention, wherein the organic solvent is at least one of methanol, octane and hexane. 如申請專利範圍第5項所述之金屬零件的製造方法,其中所述有機溶劑為辛烷或己烷。 The method for producing a metal part according to claim 5, wherein the organic solvent is octane or hexane. 如申請專利範圍第1項至第6項中任一項所述之金屬零件的製造方法,其中所述有機溶劑的溫度為以所述電鑄步驟中所使用的電鑄液的溫度為基準而±15℃的範圍內。 The method for producing a metal part according to any one of claims 1 to 6, wherein the temperature of the organic solvent is based on the temperature of the electroforming solution used in the electroforming step. Within the range of ±15 °C.
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