TWI616659B - Damping component and integrated-circuit testing apparatus using the same - Google Patents
Damping component and integrated-circuit testing apparatus using the same Download PDFInfo
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Abstract
本發明一種實施方式提供一減震元件,包含殼體、至少一滑動件、流體以及至少一彈性體。殼體具有至少一開口。滑動件可滑動地封閉開口,並部分地露出於開口之外。進而在殼體內形成容置空間。流體填滿容置空間。彈性體設置於容置空間中。 One embodiment of the present invention provides a cushioning component comprising a housing, at least one slider, a fluid, and at least one elastomer. The housing has at least one opening. The slider slidably closes the opening and is partially exposed outside the opening. Further, an accommodation space is formed in the casing. The fluid fills the accommodating space. The elastic body is disposed in the accommodating space.
Description
本揭露是有關於一種減震元件,特別是有關於一種晶片測試裝置的減震元件。 The present disclosure relates to a damper element, and more particularly to a damper element of a wafer testing apparatus.
隨著電子產品的普及與需求度增加,電子產品所使用的電子元件的產量也隨之上升。特別是應用在現今多數電子產品內的半導體元件,如晶片等。由於對半導體元件的需求增加,傳統的半導體元件產線也逐漸走向自動化生產,像是晶圓製造、封裝等製造過程都逐一自動化。然而,在將半導體元件的測試自動化的過程中,常因測試機台的震動而影響到半導體元件較細微的外接接點與測試平台的連接點的接合。因此,為避免影響半導體元件測試時接合的品質,常藉由固定式的支架結構,來讓半導體元件在測試過程中,所造成的震動減緩,進而避免震動反聵到測試系統中,去影響半導體元件與測試平台的接合。但即便震動的幅度降低,震動仍會持續一段時間才被消滅,容易造成測試機台內的元件的磨耗增加,降低測試機台內的元件的壽命。甚或,會讓測試機台內的元件需要檢修的 週期變短,使得使用測試機台的營運成本上升。所以,為減少測試機台的耗損,以及伴隨維修測試系統所需付出的時間成本與零件成本,有待相關領域具有通常知識者提出改進之方法,以彌補既有架構之不足。 As the popularity and demand for electronic products increase, so does the output of electronic components used in electronic products. In particular, semiconductor components such as wafers used in most electronic products today. As the demand for semiconductor components increases, the traditional semiconductor component production lines are gradually becoming automated, and manufacturing processes such as wafer fabrication and packaging are automated one by one. However, in the process of automating the testing of semiconductor components, the bonding of the finer external contacts of the semiconductor components to the connection points of the test platform is often affected by the vibration of the testing machine. Therefore, in order to avoid affecting the quality of the bonding of the semiconductor component test, the vibration of the semiconductor component during the testing process is often slowed down by the fixed bracket structure, thereby preventing the vibration from colliding into the test system and affecting the semiconductor. The bonding of the component to the test platform. However, even if the amplitude of the vibration is reduced, the vibration will be extinguished for a while, which will easily increase the wear of the components in the test machine and reduce the life of the components in the test machine. Or even, the components in the test machine need to be overhauled. The shorter cycle makes the operating costs of using the test machine increase. Therefore, in order to reduce the loss of the test machine and the time and cost of the repair test system, there is a need for the general knowledge to propose improvements in the relevant fields to make up for the deficiencies of the existing architecture.
本發明之一技術態樣是有關於一種減震元件,其利用滑動件接收外界的應力,並傳遞至在殼體內的流體與至少一彈性體之間,再透過滑動件與彈性體不同的阻尼係數製造阻尼震盪,以讓應力產生的震盪的振幅快速地隨時間降低而被吸收,進而達致減震的效果。 One aspect of the present invention relates to a damper member that receives an external stress by a slider and transmits it between a fluid in the housing and at least one elastomer, and then transmits a damping different from the elastomer through the slider. The coefficient creates a damped oscillation so that the amplitude of the oscillation generated by the stress is quickly absorbed as time passes, thereby achieving the effect of damping.
根據本發明一或多個實施方式,一種減震元件包含殼體、至少一滑動件、流體以及至少一彈性體。殼體具有至少一開口。滑動件可滑動地封閉開口,並部分地露出於開口之外。進而在殼體內形成容置空間。流體填滿容置空間。彈性體設置於容置空間中。 According to one or more embodiments of the present invention, a damper element includes a housing, at least one slider, a fluid, and at least one elastomer. The housing has at least one opening. The slider slidably closes the opening and is partially exposed outside the opening. Further, an accommodation space is formed in the casing. The fluid fills the accommodating space. The elastic body is disposed in the accommodating space.
在本發明一或多個實施方式中,上述之彈性體為球狀。 In one or more embodiments of the present invention, the elastic body is spherical.
在本發明一或多個實施方式中,上述之減震元件進一步包含複數個彈性體,且彈性體的彈性係數相異。 In one or more embodiments of the present invention, the shock absorbing element further includes a plurality of elastic bodies, and the elastic coefficients of the elastic bodies are different.
在本發明一或多個實施方式中,上述之複數個彈性體包含至少一第一彈性體以及至少一第二彈性體。第一彈性體的彈性係數大於第二彈性體的彈性係數,且第二彈性體位於開口與第一彈性體之間。 In one or more embodiments of the present invention, the plurality of elastomers include at least one first elastomer and at least one second elastomer. The first elastomer has a modulus of elasticity greater than the modulus of elasticity of the second elastomer, and the second elastomer is located between the opening and the first elastomer.
在本發明一或多個實施方式中,上述之減震元件進一步包含兩個滑動件以及兩個第二彈性體。殼體進一步具有兩個開口。每一第二彈性體位於第一彈性體與對應之開口之間。 In one or more embodiments of the present invention, the shock absorbing element further includes two sliding members and two second elastic bodies. The housing further has two openings. Each second elastomer is located between the first elastomer and the corresponding opening.
在本發明一或多個實施方式中,上述之流體為不可壓縮流體。 In one or more embodiments of the invention, the fluid described above is an incompressible fluid.
本發明之另一技術態樣是有關於一種晶片測試裝置,其利用減震元件的滑動件接收晶片測試裝置所產生的應力,像是晶片抓取裝置移動時的震動,並將應力傳遞至減震元件的殼體內的流體與至少一彈性體之間,再透過滑動件與彈性體不同的阻尼係數製造阻尼震盪,讓應力產生的震盪的振幅快速地隨時間降低而被吸收。如此一來,可降低晶片測試台以及晶片抓取裝置結合時震盪持續的時間與幅度,並進一步地降低重複測試對晶片測試裝置內的元件的磨耗,以降低晶片測試裝置進行晶片測試的成本。 Another aspect of the present invention relates to a wafer testing apparatus that uses a slider of a damper element to receive stress generated by a wafer testing apparatus, such as vibration when the wafer gripping apparatus moves, and transmits stress to Between the fluid in the housing of the seismic element and at least one of the elastomers, a damping coefficient is created by a different damping coefficient of the sliding member and the elastic body, so that the amplitude of the oscillation generated by the stress is quickly absorbed with time. In this way, the time and amplitude of the oscillating duration of the wafer test rig and the wafer gripping device can be reduced, and the wear of the components in the wafer testing device by the repeated testing can be further reduced to reduce the cost of the wafer testing device for wafer testing.
根據本發明一或多個實施方式,一種晶片測試裝置包含至少一減震元件、晶片測試台以及晶片抓取裝置。減震元件包含殼體、至少一滑動件、一流體以及至少一彈性體。殼體具有至少一開口。滑動件可滑動地封閉開口,並部分地露出於開口之外。進而在殼體內形成容置空間。流體填滿容置空間。彈性體設置於容置空間中。晶片測試台與滑動件相連接。晶片抓取裝置設置在晶片測試台上方。晶片抓取裝置配置以容置晶片,以讓晶片與晶片測試台相接觸。 In accordance with one or more embodiments of the present invention, a wafer testing apparatus includes at least one shock absorbing element, a wafer test station, and a wafer grasping device. The shock absorbing element includes a housing, at least one slider, a fluid, and at least one elastomer. The housing has at least one opening. The slider slidably closes the opening and is partially exposed outside the opening. Further, an accommodation space is formed in the casing. The fluid fills the accommodating space. The elastic body is disposed in the accommodating space. The wafer test stand is coupled to the slider. The wafer grabbing device is disposed above the wafer test station. The wafer grabber is configured to receive the wafer to bring the wafer into contact with the wafer test station.
在本發明一或多個實施方式中,上述之彈性體為球狀。 In one or more embodiments of the present invention, the elastic body is spherical.
在本發明一或多個實施方式中,上述之晶片測試裝置進一步包含複數個彈性體,且彈性體的彈性係數相異。 In one or more embodiments of the present invention, the wafer testing apparatus further includes a plurality of elastomers, and the elastic coefficients of the elastomers are different.
在本發明一或多個實施方式中,上述之複數個彈性體包含至少一第一彈性體以及至少一第二彈性體。第一彈性體的彈性係數大於第二彈性體的彈性係數,且第二彈性體位於開口與第一彈性體之間。 In one or more embodiments of the present invention, the plurality of elastomers include at least one first elastomer and at least one second elastomer. The first elastomer has a modulus of elasticity greater than the modulus of elasticity of the second elastomer, and the second elastomer is located between the opening and the first elastomer.
在本發明一或多個實施方式中,上述之減震元件進一步包含兩個滑動件以及兩個第二彈性體。殼體進一步具有兩個開口。每一第二彈性體位於第一彈性體與對應之開口之間。 In one or more embodiments of the present invention, the shock absorbing element further includes two sliding members and two second elastic bodies. The housing further has two openings. Each second elastomer is located between the first elastomer and the corresponding opening.
在本發明一或多個實施方式中,上述之流體為不可壓縮流體。 In one or more embodiments of the invention, the fluid described above is an incompressible fluid.
在本發明一或多個實施方式中,上述之晶片測試裝置可更包含底座,設置於固定平面。底座與減震元件相連接。 In one or more embodiments of the present invention, the wafer testing apparatus may further include a base disposed on the fixed plane. The base is connected to the damping element.
在本發明一或多個實施方式中,上述之晶片測試裝置可更包含第一傳動連桿,連接在底座與減震元件之間。 In one or more embodiments of the present invention, the wafer testing apparatus may further include a first transmission link connected between the base and the damper element.
在本發明一或多個實施方式中,上述之晶片測試裝置進一步包含複數個減震元件。晶片測試裝置可更包含第二傳動連桿連接在減震元件之間。 In one or more embodiments of the present invention, the wafer testing apparatus described above further includes a plurality of damping elements. The wafer testing device can further include a second drive link coupled between the damping elements.
在本發明一或多個實施方式中,上述之晶片測試裝置可更包含可移動裝置,與晶片抓取裝置以及晶片測試台相 連接。可移動裝置配置以調整晶片抓取裝置的高度,以讓晶片與晶片測試台相接觸。 In one or more embodiments of the present invention, the above wafer testing apparatus may further comprise a movable device, which is compatible with the wafer grasping device and the wafer test bench. connection. The movable device is configured to adjust the height of the wafer grabbing device to bring the wafer into contact with the wafer test station.
100‧‧‧減震元件 100‧‧‧Vibration element
110‧‧‧殼體 110‧‧‧shell
112‧‧‧開口 112‧‧‧ openings
114‧‧‧容置空間 114‧‧‧ accommodating space
120‧‧‧滑動件 120‧‧‧Sliding parts
130‧‧‧流體 130‧‧‧ fluid
140‧‧‧彈性體 140‧‧‧ Elastomers
142‧‧‧第一彈性體 142‧‧‧First Elastomer
144‧‧‧第二彈性體 144‧‧‧Second elastomer
200‧‧‧晶片測試裝置 200‧‧‧ wafer tester
210‧‧‧底盤延伸塊 210‧‧‧Chassis extension block
220‧‧‧晶片抓取裝置 220‧‧‧ wafer grabbing device
230‧‧‧晶片測試台 230‧‧‧ wafer test bench
232‧‧‧接腳台 232‧‧‧foot table
240‧‧‧底盤 240‧‧‧Chassis
250‧‧‧外框 250‧‧‧Front frame
260‧‧‧可移動裝置 260‧‧‧Removable devices
270‧‧‧底座 270‧‧‧Base
280‧‧‧第一傳動連桿 280‧‧‧First transmission link
290‧‧‧第二傳動連桿 290‧‧‧Second transmission link
300‧‧‧晶片 300‧‧‧ wafer
400‧‧‧固定平面 400‧‧‧Fixed plane
A‧‧‧虛線框 A‧‧‧dotted box
D‧‧‧滑動方向 D‧‧‧Swing direction
X/Y/Z‧‧‧方向 X/Y/Z‧‧ Direction
第1圖繪示依照本發明多個實施方式之減震元件的簡單示意圖;第2圖繪示依照本發明多個實施方式之晶片測試裝置的側視示意圖;第3圖繪示依照本發明多個實施方式之晶片測試裝置的局部放大圖。 1 is a schematic view showing a damping element according to various embodiments of the present invention; FIG. 2 is a side view showing a wafer testing device according to various embodiments of the present invention; and FIG. 3 is a view showing more according to the present invention. A partial enlarged view of a wafer testing apparatus of one embodiment.
以下將以圖式揭露本發明之複數個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明部分實施方式中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。 The embodiments of the present invention are disclosed in the following drawings, and the details of However, it should be understood that these practical details are not intended to limit the invention. That is, in some embodiments of the invention, these practical details are not necessary. In addition, some of the conventional structures and elements are shown in the drawings in a simplified schematic manner in order to simplify the drawings.
在本文中,使用第一、第二與第三等等之詞彙,是用於描述各種元件、組件、區域、層與/或區塊是可以被理解的。但是這些元件、組件、區域、層與/或區塊不應該被這些術語所限制。這些詞彙只限於用來辨別單一元件、組件、區域、層與/或區塊。因此,在下文中的一第一元件、組件、區 域、層與/或區塊也可被稱為第二元件、組件、區域、層與/或區塊,而不脫離本發明的本意。 The use of the terms first, second, and third, etc., is used to describe various elements, components, regions, layers and/or blocks. However, these elements, components, regions, layers and/or blocks should not be limited by these terms. These terms are only used to identify a single element, component, region, layer, and/or block. Therefore, in the following a first component, component, zone A domain, layer, and/or block may also be referred to as a second element, component, region, layer, and/or block, without departing from the spirit of the invention.
第1圖為依照本發明多個實施方式繪示之減震元件100的簡單示意圖。如第1圖所示,在多個實施方式中,減震元件100包含殼體110、滑動件120、流體130以及至少一彈性體140。在多個實施方式中,殼體110具有至少一開口112。滑動件120可滑動地封閉開口112,並部分地露出於開口112之外。進而在殼體110內形成容置空間114。在多個實施方式中,滑動件120可沿滑動方向D在殼體110中移動。流體130填滿容置空間114。在多個實施方式中,流體130為不可壓縮流體。在多個實施方式中,流體130可為具潤滑性的流體,像是油或者其他適合的流體。彈性體140設置於容置空間114中。在多個實施方式中,彈性體140可為球狀,以均勻地接收流體130的壓力變化。在多個實施方式中,彈性體140可為阻尼球。 1 is a simplified schematic diagram of a damper element 100 in accordance with various embodiments of the present invention. As shown in FIG. 1 , in various embodiments, the damper element 100 includes a housing 110 , a slider 120 , a fluid 130 , and at least one elastomer 140 . In various embodiments, the housing 110 has at least one opening 112. The slider 120 slidably closes the opening 112 and is partially exposed outside the opening 112. Further, an accommodation space 114 is formed in the casing 110. In various embodiments, the slider 120 is movable in the housing 110 in the sliding direction D. The fluid 130 fills the accommodating space 114. In various embodiments, the fluid 130 is an incompressible fluid. In various embodiments, the fluid 130 can be a lubricious fluid such as oil or other suitable fluid. The elastic body 140 is disposed in the accommodating space 114. In various embodiments, the elastomer 140 can be spherical to uniformly receive pressure changes of the fluid 130. In various embodiments, the elastomer 140 can be a damping ball.
由於應力作用在滑動件120時,滑動件120會推擠流體130,並將應力傳遞到流體130內,進而透過流體130傳遞到彈性體140,使得作用於減震元件100的應力會被流體130與彈性體140吸收並抵銷,進而減少或避免應力繼續傳遞到與減震元件100相連接的其他元件上。更詳盡地說,由於流體130與彈性體140的阻尼係數不同。因此,會產生組合式的阻尼震盪(damping oscillation),讓應力在減震元件100中產生的震盪的振幅會隨時間逐漸降低。如此一來,可讓其他元件傳遞至減震元件100的應力,在減震元件100被吸收。 As stress acts on the slider 120, the slider 120 pushes the fluid 130 and transfers the stress into the fluid 130, which is transmitted through the fluid 130 to the elastomer 140 such that the stress acting on the cushioning element 100 is absorbed by the fluid 130. The elastomer 140 absorbs and cancels, thereby reducing or avoiding the continued transmission of stress to other components that are coupled to the cushioning element 100. More specifically, the damping coefficient of the fluid 130 and the elastomer 140 are different. Therefore, a combined damping oscillation is generated, so that the amplitude of the oscillation generated by the stress in the damper element 100 gradually decreases with time. As a result, the stress transmitted to the damper element 100 by other components can be absorbed by the damper element 100.
在多個實施方式中,減震元件100進一步可包含複數個彈性體140,且彈性體140的彈性係數相異。在本多個實施方式中,複數個彈性體140可包含至少一第一彈性體142以及至少一第二彈性體144。第一彈性體142的彈性係數大於第二彈性體144的彈性係數。在多個實施方式中,第二彈性體144可位於開口112與第一彈性體142之間。如此一來,當應力傳遞至具有不同彈性係數的第一彈性體142與第二彈性體144時,減震元件100所產生的組合式的阻尼震盪的振幅會更快速地隨時間逐漸降低。舉例來說,第一彈性體142與第二彈性體144的組合可能會讓減震元件100在接收到應力後,發生次阻尼(under damping)現象、臨界阻尼(critical damping)現象或過阻尼(over damping)現象等,使得應力在減震元件100所產生的震盪振幅會很快地被收斂,進而更快速地吸收系統中的應力。 In various embodiments, the cushioning element 100 can further include a plurality of elastomers 140, and the elastic coefficients of the elastomers 140 are different. In various embodiments, the plurality of elastomers 140 can include at least one first elastomer 142 and at least one second elastomer 144. The modulus of elasticity of the first elastomer 142 is greater than the modulus of elasticity of the second elastomer 144. In various embodiments, the second elastomer 144 can be located between the opening 112 and the first elastomer 142. As a result, when the stress is transmitted to the first elastic body 142 and the second elastic body 144 having different elastic coefficients, the amplitude of the combined damping oscillation generated by the damper element 100 is gradually lowered more gradually with time. For example, the combination of the first elastic body 142 and the second elastic body 144 may cause the damping element 100 to undergo an under damping phenomenon, a critical damping phenomenon or an over damping after receiving the stress ( Over damping phenomenon, etc., so that the oscillation amplitude generated by the stress in the damper element 100 is quickly converged, thereby absorbing the stress in the system more quickly.
在多個實施方式中,減震元件100進一步可包含兩滑動件120以及兩第二彈性體144。殼體110進一步具有兩個開口112。在多個實施方式中,第二彈性體144可位於第一彈性體142與對應之開口112之間。值得注意的是,此處所繪示之開口112的位置、滑動件120的滑動方向D以及彈性體140的形狀與數量,僅為示例,其並非用以限制本發明。舉例來說,開口112也可位在相對的位置,而滑動件120的滑動方向D彼此相對。舉例來說,開口112的邊緣的延伸線也可夾一角度,滑動件120隨開口112的方向滑動。舉例來說,殼體110也可具有三或多個開口112,滑動件120隨開口112的方向滑動而具有不 同的滑動方向。舉例來說,減震元件100也可包含更多的彈性體140。舉例來說,彈性體140也可為橢圓形等。應瞭解到,本領域具有通常知識者,可視實際需要,在不脫離本揭露的精神和範圍下,做適度的修改或替代,只要能夠讓滑動件120將應力傳遞到流體130與彈性體140,且流體130與彈性體140可吸收應力即可。 In various embodiments, the damper element 100 can further include two sliders 120 and two second elastomers 144. The housing 110 further has two openings 112. In various embodiments, the second elastomer 144 can be positioned between the first elastomer 142 and the corresponding opening 112. It should be noted that the position of the opening 112, the sliding direction D of the slider 120, and the shape and number of the elastic body 140 are merely examples, which are not intended to limit the present invention. For example, the openings 112 may also be in opposite positions, while the sliding direction D of the slider 120 is opposite to each other. For example, the extension of the edge of the opening 112 can also be angled and the slider 120 slides in the direction of the opening 112. For example, the housing 110 can also have three or more openings 112, and the slider 120 slides in the direction of the opening 112 to have no Same sliding direction. For example, the cushioning element 100 can also include more elastomers 140. For example, the elastomer 140 can also be elliptical or the like. It is to be understood that a person skilled in the art can make a modest modification or substitution without departing from the spirit and scope of the disclosure, as long as the slider 120 can transmit stress to the fluid 130 and the elastomer 140. And the fluid 130 and the elastomer 140 can absorb stress.
第2圖為依照本發明多個實施方式繪示之晶片測試裝置200的側視示意圖。第3圖依照本發明多個實施方式繪示之晶片測試裝置200在第2圖的虛線框A的部分的局部放大上視圖。參照第2圖、第3圖,在多個實施方式中,晶片測試裝置200可包含減震元件100、底盤240、晶片測試台230以及晶片抓取裝置220。底盤240可包含底盤延伸塊210。晶片測試台230與減震元件100相連接。更詳盡地說,在多個實施方式中,晶片測試台230可與底盤延伸塊210相結合,並透過底盤延伸塊210與減震元件100的滑動件120相連接。滑動件120用以接收來自底盤延伸塊210的應力,並將應力傳遞至流體130與彈性體140,但不限於此。 2 is a side elevational view of a wafer testing apparatus 200 in accordance with various embodiments of the present invention. 3 is a partially enlarged top plan view of a portion of the wafer testing device 200 in the dashed frame A of FIG. 2, in accordance with various embodiments of the present invention. Referring to FIGS. 2 and 3 , in various embodiments, wafer testing apparatus 200 can include damping element 100 , chassis 240 , wafer test station 230 , and wafer capture device 220 . The chassis 240 can include a chassis extension 210. The wafer test station 230 is coupled to the snubber element 100. More specifically, in various embodiments, the wafer test station 230 can be coupled to the chassis extension block 210 and coupled to the slider 120 of the snubber element 100 through the chassis extension block 210. The slider 120 is for receiving stress from the chassis extension block 210 and transmitting the stress to the fluid 130 and the elastic body 140, but is not limited thereto.
在多個實施方式中,晶片抓取裝置220設置在晶片測試台230上方。晶片抓取裝置220用以容置晶片300,並配置以讓晶片300與晶片測試台230的接腳台232相接觸。在多個實施方式中,晶片測試裝置200可更包含可移動裝置260,與晶片抓取裝置220以及底盤延伸塊210相連接。可移動裝置260可用以讓晶片抓取裝置220在XYZ方向移動,以調整晶片抓取裝置220相對晶片測試台230的水平位置與高度,使得晶片300 可與晶片測試台230相接觸。其中,在可移動裝置260移動晶片抓取裝置220與晶片300的過程中所產生之應力,可透過底盤延伸塊210傳遞至減震元件100的滑動件120。在其他的實施方式中,晶片抓取裝置220移動時所產生的應力還可透過外框250、底盤240與底盤延伸塊210等傳遞至滑動件120。 In various embodiments, the wafer grabbing device 220 is disposed above the wafer test station 230. The wafer grabbing device 220 is configured to receive the wafer 300 and is configured to contact the wafer 300 with the pin 232 of the wafer test station 230. In various embodiments, the wafer testing device 200 can further include a movable device 260 coupled to the wafer grabbing device 220 and the chassis extension block 210. The movable device 260 can be used to move the wafer grabbing device 220 in the XYZ direction to adjust the horizontal position and height of the wafer grabbing device 220 relative to the wafer test station 230 such that the wafer 300 It can be in contact with the wafer test station 230. The stress generated during the movement of the wafer gripping device 220 and the wafer 300 by the movable device 260 can be transmitted to the slider 120 of the damper element 100 through the chassis extension 210. In other embodiments, the stress generated by the wafer gripping device 220 moving may also be transmitted to the slider 120 through the outer frame 250, the chassis 240, the chassis extension 210, and the like.
由於晶片抓取裝置220在移動晶片300時所產生的應力會透過滑動件120傳遞到流體130內,甚或,可透過滑動件120傳遞到流體130與彈性體140的複合體,使得應力會被流體130與彈性體140吸收並抵銷。更具體地說,由於流體130與彈性體140的阻尼係數不同,因此,會讓傳遞至減震元件100的應力在流體130與彈性體140之間產生阻尼震盪,並隨時間快速地降低在減震元件100內所產生的震盪的振幅,進而能更快速地吸收晶片測試裝置200的系統內的應力。如此一來,可減少或避免應力繼續傳遞到晶片測試裝置200的其他元件上,像是晶片測試台230等,進而增加晶片300與晶片測試台230的接腳台232接觸的穩定度。此外,在重複的測試行程中,應力對晶片測試裝置200所造成的磨耗也進一步地被降低,以延長晶片測試裝置200中元件的壽命,使得晶片測試裝置200所需的維修成本降低。 Since the stress generated by the wafer grasping device 220 when moving the wafer 300 is transmitted into the fluid 130 through the slider 120, or even transmitted through the slider 120 to the composite of the fluid 130 and the elastomer 140, the stress is caused by the fluid. 130 and elastomer 140 absorb and offset. More specifically, since the damping coefficient of the fluid 130 and the elastic body 140 are different, the stress transmitted to the damper member 100 is damped and oscillated between the fluid 130 and the elastic body 140, and is rapidly reduced over time. The amplitude of the oscillations generated within the seismic element 100, in turn, can more quickly absorb stress within the system of the wafer testing device 200. As a result, the stress can be reduced or prevented from continuing to be transmitted to other components of the wafer testing apparatus 200, such as the wafer testing station 230, thereby increasing the stability of the wafer 300 in contact with the pin 232 of the wafer testing station 230. Moreover, during repeated test passes, the wear caused by the stress on the wafer test apparatus 200 is further reduced to extend the life of the components in the wafer test apparatus 200, resulting in reduced maintenance costs for the wafer test apparatus 200.
如第2圖所示,在多個實施方式中,晶片測試裝置200還可包含底座270。底座270可設置於固定平面400。底座270與減震元件100相連接。在多個實施方式中,晶片測試裝置200還可包含第一傳動連桿280,連接在底座270與減震元 件100之間。如此一來,可進一步地透過底座270穩定減震元件100,以讓晶片測試裝置200達致更佳的穩定度。 As shown in FIG. 2, in various embodiments, wafer testing apparatus 200 can also include a base 270. The base 270 can be disposed on the fixed plane 400. The base 270 is coupled to the damper element 100. In various embodiments, the wafer testing device 200 can further include a first transmission link 280 coupled to the base 270 and the shock absorbing element Between pieces 100. In this way, the damping element 100 can be further stabilized through the base 270 to achieve better stability of the wafer testing device 200.
同時參照第2圖、第3圖,在多個實施方式中,晶片測試裝置200進一步包含複數個減震元件100。晶片測試裝置200還可包含第二傳動連桿290連接在減震元件100之間。如此一來,可將平行底盤延伸塊230所在的平面的各方向的力,透過第二傳動連桿290傳遞於減震元件100之間,以讓減震元件100可吸收在平面上各方向的應力。 Referring also to FIGS. 2 and 3, in various embodiments, wafer testing apparatus 200 further includes a plurality of damping elements 100. The wafer testing device 200 can also include a second drive link 290 coupled between the damping elements 100. In this way, the forces in the directions of the plane in which the parallel chassis extension block 230 is located can be transmitted between the damper elements 100 through the second transmission link 290, so that the damper element 100 can absorb the directions in all directions on the plane. stress.
綜上所述,本發明提供一種減震元件包含殼體、至少一滑動件、流體以及至少一彈性體。殼體具有至少一開口。滑動件可滑動地封閉開口,並部分地露出於開口之外。進而在殼體內形成容置空間。流體填滿容置空間。彈性體設置於容置空間中。藉由滑動件接收外界的應力在殼體內的流體與至少一彈性體之間產生震盪,再透過滑動件與彈性體不同的阻尼係數製造阻尼震盪,以讓應力產生的震盪的振幅快速地隨時間降低而被吸收。 In summary, the present invention provides a shock absorbing element comprising a housing, at least one sliding member, a fluid, and at least one elastic body. The housing has at least one opening. The slider slidably closes the opening and is partially exposed outside the opening. Further, an accommodation space is formed in the casing. The fluid fills the accommodating space. The elastic body is disposed in the accommodating space. The sliding member receives the external stress to generate vibration between the fluid in the casing and the at least one elastic body, and then generates a damping oscillation through a different damping coefficient of the sliding member and the elastic body, so that the amplitude of the oscillation generated by the stress rapidly changes with time. Reduced and absorbed.
本發明另外提供一種晶片測試裝置,包含至少一減震元件、晶片測試台以及晶片抓取裝置。減震元件包含殼體、至少一滑動件、流體以及至少一彈性體。殼體具有至少一開口。滑動件可滑動地封閉開口,並部分地露出於開口之外。 進而在殼體內形成容置空間。流體填滿容置空間。彈性體設置於容置空間中。晶片測試台與滑動件相連接。晶片抓取裝置設置在晶片測試台上方。晶片抓取裝置配置以容置晶片,以讓晶片與晶片測試台相接觸。藉由減震元件的滑動件接收晶片抓取 裝置所產生的應力,並將應力傳遞至減震元件的殼體內的流體與至少一彈性體之間產生震盪,再透過滑動件與彈性體不同的阻尼係數製造阻尼震盪,讓應力產生的震盪的振幅快速地隨時間降低而被吸收。如此一來,可增加晶片測試台以及晶片抓取裝置結合時的穩定度。 The present invention further provides a wafer testing apparatus comprising at least one shock absorbing element, a wafer testing station, and a wafer grasping device. The shock absorbing element includes a housing, at least one slider, a fluid, and at least one elastomer. The housing has at least one opening. The slider slidably closes the opening and is partially exposed outside the opening. Further, an accommodation space is formed in the casing. The fluid fills the accommodating space. The elastic body is disposed in the accommodating space. The wafer test stand is coupled to the slider. The wafer grabbing device is disposed above the wafer test station. The wafer grabber is configured to receive the wafer to bring the wafer into contact with the wafer test station. Receiving wafer capture by the slider of the damping element The stress generated by the device transmits stress to the fluid in the housing of the damper element and oscillates between the at least one elastic body, and then dampens the oscillating vibration through the damping coefficient of the sliding member and the elastic body, so that the stress is oscillated The amplitude is quickly absorbed as time decreases. In this way, the stability of the wafer test bench and the wafer gripping device can be increased.
雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention can be modified and modified without departing from the spirit and scope of the present invention. The scope is subject to the definition of the scope of the patent application attached.
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