TWI614057B - Gas purifier - Google Patents

Abstract

A gas purification device includes a housing, a first purification chamber, a first receiving tank, a second purification chamber, a second receiving tank, a porous component, a first purification material, a first spraying device, a second purification material, and a second Spraying device. The housing includes an air inlet and an air outlet. A first exhaust duct is formed between the first purification outdoor side, the first receiving groove, and the casing. The top and bottom of the first purification chamber are connected to the air inlet and the first exhaust duct, respectively. A second exhaust duct is formed between the second purification outdoor side, the second receiving groove and the casing. The top and bottom of the second purification chamber are connected to the first exhaust duct and the second exhaust duct, respectively, and the second exhaust duct is connected to the exhaust port. The porous component is disposed on the top of the second purification chamber. The first spray device and the first purification material are located in the first purification room, and the second spray device and the second purification material are located in the second purification room.

Description

Gas purification device

The invention relates to the field of gas purification, in particular to a gas purification device.

In the field of industry, as the specifications of products become more and more precise, the requirements for the process environment are becoming stricter. The air in the process environment is also a factor that affects the quality of the process. Therefore, a gas purification device is usually installed in the process environment to maintain the air quality of the process environment. The gas purification device can reduce factors such as the concentration of suspended fine particles in the air and the acid-base value in the gas that are not conducive to the process or industrial safety.

Generally speaking, the way to purify the gas is to pass the gas to be processed into the chamber containing the adsorbent material in the gas purification device, and perform spray cleaning to purify the gas through washing and adsorption. If the wind speed of the gas to be processed into the chamber is too fast or too slow, the flow rate is too large or too small, it may affect the position of the adsorption material or the adsorption effect. For example, when the wind speed of the gas to be processed is too fast, if the adsorbent material is disturbed by the airflow, it will cause deviation, so that the pressure of the gas received across the adsorbent material is uneven, which affects the flow of the airflow, and then affects the adsorption effect and Follow-up product quality.

In addition, the porosity of the adsorbent material also affects the adsorption effect. For example, if the adsorbent material is excessively wet, water vapor will remain in the pores of the adsorbent material, which reduces the porosity of the adsorbent material, making it difficult for gas to pass through, thereby reducing The adsorption capacity of the adsorption material is reduced, and the effect of gas purification is further reduced.

One aspect disclosed in this case relates to a gas purification device. Gas purification device Containing a housing, a first purification chamber, a first receiving tank, a second cleaning chamber, a second receiving tank, a porous component, a first purification material, a first spraying device, a second purification material, and a second spraying device . The housing includes an air inlet and an air outlet. The first purification chamber is located in the casing, the top of the first purification chamber is connected to the air inlet, and the bottom of the first purification chamber has a first through hole. The first receiving groove is located in the casing and is located below the first purification chamber. A first exhaust duct is formed between the outside of the first purification chamber, the first receiving groove, and the casing, and the first purification chamber communicates with the first exhaust duct through a first through hole. The second purification chamber is located in the casing, the top of the second purification chamber is connected to the first exhaust duct, and the bottom of the second purification chamber includes a second through hole. The second receiving tank is located in the casing and is located below the second purification chamber. A second exhaust duct is formed between the outside of the second purification chamber, the second receiving groove, and the casing. The second purification chamber communicates with the second exhaust duct through the second through hole, and the second exhaust duct communicates with the exhaust port. The porous component is disposed on the top of the second purification chamber. The first purification material is located in the first purification chamber. The first spraying device is located in the first purification chamber and is located between the air inlet and the first purification material. The second purification material is located in the second purification chamber. The second spraying device is located in the second purification chamber and is located between the porous component and the second purification material.

In summary, the gas purification device of the embodiment of the present invention is suitable for continuously purifying gas, and it can adjust the air volume and speed of the intake air through the porous component to uniformly purify the material (the first purification material or / and the first Two purification materials) average the pressure of the gas and reduce the disturbance of the air flow, so that the purification materials can be kept from being easily displaced. In addition, in the gas purification device of the embodiment of the present invention, the intake direction of the gas to be processed into each purification chamber (the first purification chamber and the second purification chamber) is consistent with the spraying direction of the washing liquid, so that After washing, the washing liquid is smoothly discharged from the purification material, so that the purification material is easy to dry, thereby avoiding the residual washing liquid in the pores of the purification material and reducing the adsorption effect.

1‧‧‧Gas purification device

10‧‧‧shell

11‧‧‧air inlet

13‧‧‧ exhaust port

15‧‧‧The first exhaust duct

17‧‧‧Second Exhaust Duct

20‧‧‧The first clean room

21‧‧‧The first purification material

23‧‧‧The first spray device

25‧‧‧First through hole

30‧‧‧The first receiving trough

40‧‧‧Second Purification Room

41‧‧‧Second purification material

43‧‧‧Second spray device

45‧‧‧Second through hole

50‧‧‧Second receiving trough

60‧‧‧ porous component

60’‧‧‧ porous component

61‧‧‧ porous sheet

63‧‧‧Porous air duct

65‧‧‧ Pore

67‧‧‧ Guide

71‧‧‧Control Valve

73‧‧‧pump valve

80‧‧‧carrying plate

85‧‧‧Third through hole

90‧‧‧ preheating unit

110‧‧‧The third purification room

111‧‧‧Third purification material

113‧‧‧Third spray device

115‧‧‧through hole

117‧‧‧ Third Exhaust Duct

120‧‧‧ Third receiving trough

DL‧‧‧Spray direction

D1‧‧‧First intake direction

D2‧‧‧Second intake direction

D3‧‧‧Third intake direction

G1‧‧‧Gas to be processed

G2‧‧‧purified gas

L‧‧‧washing liquid

The above-mentioned and other exemplary embodiments of the present invention will have more advantages and features that will become more clear by describing the exemplary embodiments of the present invention in further detail with reference to the drawings, in which: Fig. 1 is a schematic sectional view of a first embodiment of a gas purification device; Fig. 2 is a schematic sectional view of a second embodiment of a gas purification device; Fig. 3 is a schematic sectional view of a third embodiment of a gas purification device; A schematic cross-sectional view of the embodiment; and FIG. 5 is a schematic cross-sectional view of the fourth embodiment of the gas purification device.

FIG. 1 is a schematic cross-sectional view of a first embodiment of a gas purification device. As shown in FIG. 1, the gas purification device 1 includes a casing 10, a first purification chamber 20, a plurality of first purification materials 21, a first spraying device 23, a first receiving tank 30, a second purification chamber 40, and a plurality of The second purification material 41, the second shower device 43, the second receiving tank 50, and the porous module 60.

The casing 10 includes an air inlet 11 and an air outlet 13. The first purification chamber 20 is located in the casing 10. The first purification material 21 is located in the first purification chamber 20. The first spraying device 23 is located in the first purification chamber 20 and is located between the air inlet 11 and the first purification material 21. The top of the first purification chamber 20 communicates with the air inlet 11, and the bottom of the first purification chamber 20 has a plurality of first through holes 25. The first receiving groove 30 is located in the casing 10 and is located below the first purification chamber 20. The outside of the first purification chamber 20, the space above the first receiving groove 30, and the casing 10 communicate with each other to form a first exhaust duct 15. The first purification chamber 20 communicates with the first exhaust duct 15 through a first through hole 25.

The second purification chamber 40 is located in the casing 10. The top of the second purification chamber 40 communicates with the first exhaust duct 15, and the bottom of the second purification chamber 40 includes a second through hole 45. The second purification material 41 is located in the second purification chamber 40. The second spraying device 43 is located in the second purification chamber 40 and between the porous component 60 and the second purification material 41. The second receiving tank 50 is located in the casing 10 and is located below the second purification chamber 40. The outside of the second purification chamber 40, the space above the second receiving groove 30, and the casing 10 communicate with each other to form a second exhaust duct 17. The second purification chamber 40 communicates with the second exhaust duct 17 through the second through hole 45, and the second exhaust duct 17 communicates with the exhaust port 13.

The porous module 60 is provided on the top of the second purification chamber 40. Here, the porous component 60 is used to adjust the wind speed and air volume of the gas G1 to be processed to prevent the second purification material 41 from shifting and reducing the purification efficiency. In some embodiments, the porous component 60 has a plurality of pores 65 connecting the first exhaust duct 15 and the second purification chamber 40 for the gas G1 to be processed to enter the second purification chamber 40 from the first exhaust duct 15.

During the purification process, the gas to be processed G1 enters the first purification chamber 20 of the casing 10 through the air inlet 11 to adsorb impurities in the gas G1 to be processed by the first purification material 21. The gas G1 to be processed processed by the first purification material 21 enters the first exhaust duct 15 through the first through hole 25, flows along the first exhaust duct 15 to the porous component 60, and passes through the pore 65 of the porous component 60. Enter the second purification chamber 40. The gas to be processed G1 entering the second purification chamber 40 is adsorbed again by the second purification material 41 to impurities in the gas to be processed G1 to form a purified gas G2. The purified gas G2 enters the second exhaust duct 17 through the second through hole 45, flows along the second exhaust duct 17 to the exhaust port 13, and is discharged from the exhaust port 13. In other words, during the purification process, the gas G1 to be processed passes in through the air inlet 11 and sequentially passes through the first purification chamber 20, the first exhaust duct 15, the porous component 60, and the second purification chamber 40 to purify it into Purge gas G2. The purified gas G2 is then discharged through the second exhaust duct 17 and the exhaust port 13.

During the purification process, the first spraying device 23 sprays the washing liquid L toward the inside of the first purification chamber 20 to rinse the gas G1 to be processed, causing the larger particles in the gas G1 to settle. After washing, the washing liquid L falls into the first receiving tank 30 through the first through hole 25 at the bottom of the first purification chamber 20. In other words, the first receiving tank 30 can receive the washing liquid L from the first purification chamber 20, and then the received washing liquid L is discharged through the pipeline. Similarly, the second spraying device 43 sprays the washing liquid L toward the inside of the second purification chamber 40 to rinse the gas G1 to be processed. After washing, the washing liquid L falls into the first receiving tank 30 through the second through hole 45 at the bottom of the second purification chamber 40. Further, the washing liquid L sprayed by the first spraying device 23 and the second spraying device 43 also reforms and regenerates the purification materials (the first purification material 21 and the second purification material 41).

In some embodiments, the first clean room 20 may be enclosed by a partition and connected to the interior of the casing 10. In some embodiments, the second clean room 40 may be enclosed by a partition and connected to the interior of the casing 10.

In some embodiments, the first purification material 21 and the second purification material 41 are porous materials, for example, activated carbon, porous graphite, porous alumina, porous zirconia, etc. The first purification material 21 and the second purification material 41 are formed with a coating layer such as nano silver or nano titanium. Here, the purification materials (the first purification material 21 and the second purification material 41) provide a large contact area for contact with the gas G1 to be processed due to the porous property. When the gas to be processed G1 is passed in, the purification material can adsorb impurities in the gas to be processed G1 or react with the impurities in the gas to be processed G1 to purify the gas to be processed G1. In some embodiments, the impurities adsorbed by the purification material may be suspended fine particles or acid-base substances.

As shown in FIG. 1, in some embodiments, the spray direction DL of the first spray device 23 spraying the washing liquid L is substantially the same as the first intake direction D1 of the gas G1 to be processed through the first purification chamber 20. And the spraying direction DL of the second spraying device 43 spraying the washing liquid L is substantially the same as the second intake direction D2 of the gas G1 to be processed through the second purification chamber 40. In other words, the processing gas G1 is passed into the purification chamber (the first purification chamber 20 or the second purification chamber 40) from the top, the washing liquid L is sprayed from the top, and the gas G1 to be processed is also passed from the top to the bottom. Clean room. In addition, the spray direction DL and the air intake direction (the first air intake direction D1 and the second air intake direction D2) represent the flow direction of the entire air flow and water flow, rather than the flow direction of a single air flow or a single nozzle spray direction, This is only an example and is not limited to this.

Since the spray direction DL is substantially the same as the first intake direction D1, the washing liquid L in the pores of the first purification material 21 can be quickly taken out, and the washing liquid L is prevented from remaining in the pores of the first purification material 21 And affect the effect of adsorption. Similarly, since the spray direction DL is substantially the same as the second intake direction D2, the washing liquid L in the pores of the second purification material 41 can be cleaned. Take it out quickly to avoid the washing liquid L remaining in the pores of the second purification material 41 and affect the adsorption effect.

In some embodiments, the first spraying device 23 and the second spraying device 43 are respectively connected to the control valve 71 through a pipeline. The control valve 71 is connected to a washing liquid supply tank (not shown), so as to provide the washing liquid L to the first spraying device 23 and the second spraying device 43 for spraying.

In some embodiments, the first receiving tank 30 and the second receiving tank 50 are respectively connected to the pumping valve 73 through a pipeline. The suction valve 73 extracts the washing liquid L from the first receiving tank 30 and the second receiving tank 50. Furthermore, the pumping valve 73 may be connected to the control valve 71 to return the extracted washing liquid L to recycle the washing liquid L.

In some embodiments, the residence time of the gas to be processed G1 from the air inlet 11 through the first purification material 21 and the second purification material 41 to the exhaust port 13 is between 1 s and 3 s. In some embodiments, the average internal wind speed of the gas purification device 1 is between 0.2 and 1 m / s. Understandably, this preferred embodiment is merely an example, and is not limited thereto. It can be adjusted according to the volume of the gas purification device 1, the content of the first purification material 21 and the second purification material 41, and the space of the first purification room 20 and the second purification room 40.

In some embodiments, the gas purification device 1 further includes a plurality of carrier plates 80. The carrier plate 80 is located between the bottom of the first purification chamber 20 and the first purification material 21, and between the bottom of the second purification chamber 40 and the second purification material 41. Each carrier plate 80 includes a plurality of third through holes 85. Further, the diameter of the third through hole 85 is smaller than the diameter of the first through hole 25 and the diameter of the second through hole 45. The carrier plate 80 is used to carry the first purification material 21 or the second purification material 41 to prevent debris generated after the first purification material 21 or the second purification material 41 is worn away from blocking the first through hole 25 or the second through hole 45. For example, the carrier plate 80 may be a mesh plate or a sieve plate, which is merely an example and is not limited thereto.

Here, the porous component 60 can adjust the wind speed and air volume, avoid excessive air volume or unevenness, and prevent the second purification material 41 from being offset by excessive air volume or uneven wind direction. This causes uneven gas purification.

FIG. 2 is a schematic cross-sectional view of a second embodiment of a gas purification device. In some embodiments, the porous component 60 is a porous plate 61, as shown in FIG. 1, but is not limited thereto. Here, by adjusting the size of the pores 65 of the porous plate material 61, the amount of incoming air and the wind speed can be adjusted. In other embodiments, the porous component 60 is a porous air duct 63, as shown in FIG. 2. The porous air duct 63 includes a pore 65 and a flow guide 67, and the pore 65 is formed in the flow guide 67. Here, the direction, the amount of wind, and the wind speed can be changed through the aperture 65 and the air guide 67.

As shown in FIG. 1, in some embodiments, the air inlet 11 and the air outlet 13 are respectively located at the top and the bottom of the casing 10, but this is merely an example and is not limited thereto.

FIG. 3 is a schematic cross-sectional view of a third embodiment of the gas purification device. As shown in FIG. 3, in other embodiments, the air inlet 11 of the gas purification device 1 is located on the upper left side, and the air outlet 13 is located on the lower right side, but this is only an example and is not limited to this. It can be adjusted according to the wind speed, air volume and the position of the intake air.

In some embodiments, the first clean room 20 and the second clean room 40 may be arranged vertically, as shown in FIGS. 1 and 2. In other words, in other words, the first purification chamber 20 and the second purification chamber 40 are arranged substantially vertically, but are not limited to the arrangement on the same lead line. In other embodiments, the first purification chamber 20 and the second purification chamber 40 may be arranged left and right, as shown in FIG. 3. In other words, the first clean room 20 and the second clean room 40 are arranged substantially horizontally, but are not limited to the same horizontal height.

The arrangement of the first clean room 20 and the second clean room 40 in the above FIGS. 1-3 is merely an example, and is not intended to be limiting. However, regardless of the arrangement, the gas G1 to be processed must pass through the first intake direction D1 of the first purification chamber 20 and the second intake direction D2 through the second purification chamber 40, as well as the spray of the washing liquid L thereof. The direction of the DL is the same. In this way, it can be avoided that the purification material cannot be fully dried because the air flow hinders the discharge of the water (the pores of the purification material are filled with the washing liquid L), and It affects the effect of the first purification material 21 and the second purification material 41 on the gas G1 to be processed.

In some embodiments, when the first purification chamber 20 and the second purification material 41 are arranged side by side, the first receiving tank 30 and the second receiving tank 50 may be jointly surrounded by a partition and the inside of the casing 10 Out, as shown in Figure 3.

In some embodiments, the width of the top of the first purification chamber 20 is wider than the diameter of the air inlet 11. With this structural design, the wind speed of the gas G1 to be processed after entering the first purification chamber 20 is reduced, which can avoid excessive air volume and excessive concentration, and can avoid the deviation of the first purification material 21 caused by the impact, resulting in a reduction in purification efficiency , Or uneven purification.

In some embodiments, as shown in FIG. 3, the gas purification device 1 further includes another porous component 60 '. The porous component 60 'is disposed on the top of the first purification chamber 20, and is located between the air inlet 11 and the first spray device 23. Here, although the porous components 60 ′ provided on the top of the first purification chamber 20 are exemplarily shown in FIG. 3, the arrangement of the purification chambers is not limited by the present invention. For example, In the arranged gas purification device 1, another porous component 60 ′ may also be added between the top of the first purification chamber 20 and the air inlet 11 to adjust the entry of the first purification room 20 from the air inlet 11. Wind speed and volume.

In some embodiments, the porous component 60 ′ can adjust the wind speed and air volume, avoid excessive or uneven air volume, and prevent the first purification material 21 from shifting to an excessively large air volume or uneven wind direction, thereby causing gas. Uneven purification. In some embodiments, the porous component 60 ′ may be a porous plate (as shown in FIG. 3) or a porous air duct (for example, the porous air duct 60 in FIG. 2 is applied at the porous component 60 ′). .

FIG. 4 is a schematic cross-sectional view of a fourth embodiment of the gas purification device. Although FIGS. 1-3 exemplarily show that the gas purification device 1 includes two purification rooms (the first purification room 20 and the second purification room 40), if space of the field permits, the gas purification device 1 may include three or More clean rooms. In other words, one or more may be further provided between the first purification chamber 20 and the second purification chamber 40. Three third purification chambers 110 are shown in FIG. 4. In some embodiments, as shown in FIG. 4, the gas purification device 1 may further include a third purification chamber 110, a third receiving tank 120, a plurality of third purification materials 111, a third spraying device 113, and a porous component 60. . The third purification chamber 110 and the third receiving tank 120 are located in the casing 10, and are located between the first purification chamber 20 and the second purification chamber 40. Similarly, the third clean room 110 is located in the casing 10. The bottom of the third purification chamber 110 includes a through hole 115. The third purification material 111 is located in the third purification chamber 111. The third shower device 113 is located in the third purification chamber 111 and is located between the porous component 60 and the third purification material 111. The third receiving tank 120 is located in the casing 10 and is located below the third purification chamber 110. The porous component 60 is disposed on the top of the third purification chamber 110, and is used to adjust the wind speed and volume of the gas G1 to be processed to prevent the third purification material 111 from shifting and reducing the purification efficiency.

In some embodiments, as shown in FIG. 4, the third purification chamber 110 communicates with the bottom of the first purification chamber 20 through the first exhaust duct 15, and is outside the third purification chamber 110 and above the second receiving groove 120. The space and the casing 10 communicate with each other to form a third exhaust duct 117. The third purification chamber 110 communicates with the third exhaust duct 117 through the through hole 115, and the top and bottom ends of the second purification chamber 40 communicate with the third exhaust duct 117 and the second exhaust duct 17 communicate with the exhaust port 13 respectively. The above is merely an example, and the gas purification device 1 may be provided with more purification chambers and receiving tanks.

In some embodiments, the first clean room 20, the third clean room 110, and the second clean room 40 are sequentially arranged in an arranged manner (as shown in FIG. 4), however, this is only an example, and not Limited to this. For example, the first clean room 20, the third clean room 110, and the second clean room 40 may also be sequentially arranged in an arrangement manner arranged left and right as in the embodiment of FIG. However, the intake direction of the gas G1 to be processed into each purification chamber, for example, the first intake direction D1 to the first purification chamber 20, the second intake direction D2 to the second purification chamber 40, and the intake direction The third intake direction D3 of the third purification chamber 20 needs to be in the same direction as the spray direction DL of the washing liquid L therein.

FIG. 5 is a schematic cross-sectional view of a fifth embodiment of a gas purification device. In some implementations For example, as shown in FIG. 5, the gas purification device 1 may further include a preheating unit 90. The preheating unit 90 is located at the air inlet 11 and is used for preheating the gas G1 to be processed that is passed into the first purification chamber 20 through the air inlet 11. The preheating unit 90 can reduce the humidity of the gas G1 to be processed. Further, the preheated gas G1 can be used to dry the first purification material 21 and the second purification material 41. In this way, the washing liquid L remaining in the pores in the first purification material 21 or the second purification material 41 can be heated and volatilized to accelerate the drying of the purification material, thereby improving the adsorption effect. The gas purification device 1 shown in FIG. 5 is only an example of the installation position of the preheating unit 90. In other words, the preheating unit 90 may also be installed at the air inlet 11 of the gas purification device 1 shown in FIGS. 1 to 4.

The gas purification devices of the above embodiments can prevent the washing liquid from remaining in the pores of the purification material by maintaining the intake direction of the processing gas and the spraying direction of the washing liquid to improve the adsorption effect. In addition, the gas purification device adjusts the amount of air entering the second purification chamber by setting a porous component to avoid disturbance of the air flow, so that the first purification material and the second purification material can not be easily shifted, and the pressure of the gas received is evened. The adsorption and purification effect can be more uniform.

Although the invention has been described in connection with exemplary embodiments that are presently considered to be practical, it should be understood that the invention is not limited to the disclosed embodiments, but rather, is intended to be applicable to various modifications and equivalent arrangements included in the appended claims Within the spirit and scope required.

1‧‧‧Gas purification device

10‧‧‧shell

11‧‧‧air inlet

13‧‧‧ exhaust port

15‧‧‧The first exhaust duct

17‧‧‧Second Exhaust Duct

20‧‧‧The first clean room

21‧‧‧The first purification material

23‧‧‧The first spray device

25‧‧‧First through hole

30‧‧‧The first receiving trough

40‧‧‧Second Purification Room

41‧‧‧Second purification material

43‧‧‧Second spray device

45‧‧‧Second through hole

50‧‧‧Second receiving trough

60‧‧‧ porous component

61‧‧‧ porous sheet

65‧‧‧ Pore

71‧‧‧Control Valve

73‧‧‧pump valve

80‧‧‧carrying plate

85‧‧‧Third through hole

DL‧‧‧Spray direction

D1‧‧‧First intake direction

D2‧‧‧Second intake direction

G1‧‧‧Gas to be processed

G2‧‧‧purified gas

L‧‧‧washing liquid

Claims (11)

A gas purification device includes: a casing including an air inlet and an exhaust port; a first purification chamber located in the casing; the top of the first purification chamber communicates with the air inlet, and the first The bottom of the clean room has a plurality of first through holes; a first receiving groove is located in the housing and is located below the first clean room, wherein the outside of the first clean room, the first receiving groove, and the A first exhaust duct is formed between the casings, and the first purification chamber communicates with the first exhaust duct through the first through holes; a second purification chamber is located in the casing, and the second purification chamber The top communicates with the first exhaust duct, and the bottom of the second purification chamber includes a plurality of second through holes; a second receiving groove is located in the housing and is located below the second purification chamber, wherein the second A second air exhaust duct is formed between the outside of the clean room, the second receiving groove, and the casing. The second clean room communicates with the second air exhaust channel through the second through holes, and the second air exhaust A passage communicates with the exhaust port; a porous component is disposed on the top of the second purification chamber; a plurality of A first purification material is located in the first purification room; a first spraying device is located in the first purification room and between the air inlet and the first purification materials; a plurality of second purification materials Is located in the second purification chamber; and a second spraying device is located in the second purification chamber and between the porous component and the second purification materials. The gas purification device according to claim 1, wherein the first spraying device and the second spraying device spray a spraying direction of a washing liquid and a first The air inlet direction and a second air inlet direction of the gas to be processed entering the second purification chamber are substantially the same, and the washing liquid enters the first receiving tank through the first purification materials and the first through holes, And enters the second receiving tank through the second purification materials and the second through holes, and the gas to be processed passes through the first purification chamber, the first exhaust duct, the perforation through the air inlet in order. The exhaust module, the second purification chamber, and the second exhaust duct are discharged from the exhaust port. The gas purification device according to claim 2, wherein the gas to be processed passes from the air inlet through the first purification material to the second purification material to the exhaust gas, and the gas residence time is between 1s and 3s, and the internal average The wind speed is between 0.2 ~ 1m / s. The gas purification device according to claim 1, further comprising a plurality of carrier plates, the carrier plates are located between the bottom of the first purification chamber and the first purification material, and the bottom of the second purification chamber and the Waiting between the second purification materials, and each of the carrier plates includes a plurality of third through holes. The gas purification device according to claim 4, wherein the diameters of the third through holes are smaller than the first through holes and the second through holes. The gas purification device according to claim 1, wherein the porous component is a porous plate. The gas purification device according to claim 1, wherein the porous component is a porous air duct. The gas purification device according to claim 1, further comprising another porous component, which is disposed on the top of the first purification chamber and is located between the air inlet and the first spray device. The gas purification device according to claim 1, wherein the first purification room and the second purification room are arranged vertically. The gas purification device according to claim 1, wherein the first purification room and the second purification room are arranged left and right. The gas purification device according to claim 1, further comprising a pre-heating unit, which is located at the air inlet and is used to pre-heat a gas to be processed that flows into the first purification chamber through the air inlet.