TWI609214B - Pixel structure - Google Patents

Pixel structure Download PDF

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TWI609214B
TWI609214B TW106100499A TW106100499A TWI609214B TW I609214 B TWI609214 B TW I609214B TW 106100499 A TW106100499 A TW 106100499A TW 106100499 A TW106100499 A TW 106100499A TW I609214 B TWI609214 B TW I609214B
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pixel
auxiliary electrode
data line
electrode
pixel electrode
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TW106100499A
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TW201825972A (en
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黃建文
葉詠津
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友達光電股份有限公司
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Priority to TW106100499A priority Critical patent/TWI609214B/en
Priority to CN201710092605.1A priority patent/CN107065324B/en
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Publication of TW201825972A publication Critical patent/TW201825972A/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/134309Electrodes characterised by their geometrical arrangement
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
    • G02F2201/123Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode pixel

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Geometry (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Description

畫素結構 Pixel structure

本發明是關於一種畫素結構。 The present invention relates to a pixel structure.

於各式消費性電子產品之中,應用薄膜電晶體(thin film transistor;TFT)的液晶顯示器已經被廣泛地使用。液晶顯示器主要是由薄膜電晶體陣列基板、彩色濾光陣列基板和液晶層所構成,薄膜電晶體陣列基板包含多個畫素結構,薄膜電晶體陣列基板上設置有多個以陣列排列的薄膜電晶體,以及與每一個薄膜電晶體對應配置的畫素電極。此外,薄膜電晶體陣列基板上也會設置金屬層,以做為資料線或掃描線。 Among various consumer electronic products, liquid crystal displays using thin film transistors (TFTs) have been widely used. The liquid crystal display is mainly composed of a thin film transistor array substrate, a color filter array substrate and a liquid crystal layer. The thin film transistor array substrate comprises a plurality of pixel structures, and the thin film transistor array substrate is provided with a plurality of thin film electrodes arranged in an array. A crystal, and a pixel electrode corresponding to each of the thin film transistors. In addition, a metal layer is also disposed on the thin film transistor array substrate as a data line or a scan line.

然而,若寄生電容產生於畫素結構中,畫素結構的效能可能會受到此寄生電容的影響。再者,當畫素結構內的元件因製程變異而與原設計間產生差異時,所產生的寄生電容的影響效果可能將更大,並進而影響液晶顯示器的顯示品質。 However, if parasitic capacitance is generated in the pixel structure, the performance of the pixel structure may be affected by this parasitic capacitance. Furthermore, when the components in the pixel structure are different from the original design due to process variation, the effect of the generated parasitic capacitance may be greater, and thus the display quality of the liquid crystal display may be affected.

本發明之一實施方式提供一種畫素結構,包含資料線、第一輔助電極、第二輔助電極及畫素電極,其中資料線、 第一輔助電極及第二輔助電極可透過同一道製程形成。第一輔助電極及第二輔助電極分別位於資料線的左右兩側。於畫素結構運作時,第一輔助電極及第二輔助電極可分別與資料線產生耦合電容,且此耦合電容的量值大於畫素電極與資料線產生的耦合電容的量值。因此,透過第一輔助電極及第二輔助電極與資料線所產生的耦合電容,即使畫素電極的形成位置產生偏移並造成其與資料線的耦合電容量值產生變化時,資料線與其兩側的帶電層體結構的耦合電容差異值仍落在可允許的範圍之內,從而防止液晶顯示器產生亮暗線的現象。 An embodiment of the present invention provides a pixel structure including a data line, a first auxiliary electrode, a second auxiliary electrode, and a pixel electrode, wherein the data line, The first auxiliary electrode and the second auxiliary electrode can be formed through the same process. The first auxiliary electrode and the second auxiliary electrode are respectively located on the left and right sides of the data line. When the pixel structure is in operation, the first auxiliary electrode and the second auxiliary electrode respectively generate a coupling capacitance with the data line, and the magnitude of the coupling capacitance is greater than the magnitude of the coupling capacitance generated by the pixel electrode and the data line. Therefore, the coupling capacitance generated by the first auxiliary electrode and the second auxiliary electrode and the data line, even if the formation position of the pixel electrode is shifted and the coupling capacitance value with the data line changes, the data line and the two The coupling capacitance difference value of the side charged layer structure still falls within the allowable range, thereby preventing the liquid crystal display from producing a bright dark line.

本發明之一實施方式提供一種畫素結構,包含資料線、第一主動元件、第二主動元件、第一輔助電極及第二輔助電極。第一主動元件及第二主動元件分別包含第一汲極及第二汲極。第一輔助電極及第二輔助電極分別與第一汲極及第二汲極直接連接,其中資料線位於第一輔助電極與第二輔助電極之間。 An embodiment of the present invention provides a pixel structure including a data line, a first active device, a second active device, a first auxiliary electrode, and a second auxiliary electrode. The first active component and the second active component respectively include a first drain and a second drain. The first auxiliary electrode and the second auxiliary electrode are directly connected to the first drain and the second drain, respectively, wherein the data line is located between the first auxiliary electrode and the second auxiliary electrode.

於部分實施方式中,資料線與第一輔助電極之間的水平距離約等於資料線與第二輔助電極之間的水平距離。 In some embodiments, the horizontal distance between the data line and the first auxiliary electrode is approximately equal to the horizontal distance between the data line and the second auxiliary electrode.

於部分實施方式中,畫素結構更包含第一畫素電極及第二畫素電極。第一畫素電極位於第一輔助電極之上。第二畫素電極位於第二輔助電極之上,且第一畫素電極與第二畫素電極分別位於資料線的相對兩側。第一輔助電極與第二輔助電極之間的最小水平距離小於第一畫素電極與第二畫素電極之間的最小水平距離,其中第一畫素電極與資料線之間的最小水平距離異於第二畫素電極與資料線之間的最小水平距離。 In some embodiments, the pixel structure further includes a first pixel electrode and a second pixel electrode. The first pixel electrode is located above the first auxiliary electrode. The second pixel electrode is located above the second auxiliary electrode, and the first pixel electrode and the second pixel electrode are respectively located on opposite sides of the data line. The minimum horizontal distance between the first auxiliary electrode and the second auxiliary electrode is smaller than the minimum horizontal distance between the first pixel electrode and the second pixel electrode, wherein the minimum horizontal distance between the first pixel electrode and the data line is different The minimum horizontal distance between the second pixel electrode and the data line.

於部分實施方式中,畫素結構更包含第一遮光層及第二遮光層。第一輔助電極至少位於第一遮光層上方。第二輔助電極至少位於第二遮光層上方,且第一遮光層與第二遮光層之間的水平距離小於第一輔助電極與第二輔助電極之間的水平距離。 In some embodiments, the pixel structure further includes a first light shielding layer and a second light shielding layer. The first auxiliary electrode is located at least above the first light shielding layer. The second auxiliary electrode is located at least above the second light shielding layer, and a horizontal distance between the first light shielding layer and the second light shielding layer is smaller than a horizontal distance between the first auxiliary electrode and the second auxiliary electrode.

於部分實施方式中,畫素結構更包含第三主動元件。第三主動元件包含第三汲極,其中資料線與第二主動元件及第三主動元件電性連接,且第二主動元件之第二汲極與第三主動元件之第三汲極分別位於資料線的相對兩側。 In some embodiments, the pixel structure further includes a third active component. The third active component includes a third drain, wherein the data line is electrically connected to the second active component and the third active component, and the second drain of the second active component and the third drain of the third active component are respectively located in the data The opposite sides of the line.

於部分實施方式中,資料線沿第一方向延伸,且第二主動元件與第三主動元件沿第一方向連續排列。 In some embodiments, the data line extends in the first direction, and the second active element and the third active element are continuously arranged in the first direction.

於部分實施方式中,畫素結構更包含第一絕緣層及第二絕緣層。資料線、第一輔助電極及第二輔助電極位於第一絕緣層上。第二絕緣層位於資料線、第一輔助電極、第二輔助電極及第一絕緣層之上。 In some embodiments, the pixel structure further includes a first insulating layer and a second insulating layer. The data line, the first auxiliary electrode and the second auxiliary electrode are located on the first insulating layer. The second insulating layer is located above the data line, the first auxiliary electrode, the second auxiliary electrode, and the first insulating layer.

於部分實施方式中,畫素結構設置於基板上,且第一畫素電極於基板的垂直投影與第一輔助電極於基板的垂直投影至少部分重疊,且第二畫素電極於基板的垂直投影與第二輔助電極於基板的垂直投影至少部分重疊。 In some embodiments, the pixel structure is disposed on the substrate, and the vertical projection of the first pixel electrode on the substrate and the vertical projection of the first auxiliary electrode on the substrate at least partially overlap, and the vertical projection of the second pixel electrode on the substrate A vertical projection with the second auxiliary electrode on the substrate at least partially overlaps.

100A、100B‧‧‧畫素結構 100A, 100B‧‧‧ pixel structure

102‧‧‧基板 102‧‧‧Substrate

130‧‧‧第一畫素電極 130‧‧‧ first pixel electrode

132‧‧‧第二畫素電極 132‧‧‧Second pixel electrode

104‧‧‧第一掃描線 104‧‧‧First scan line

105‧‧‧第二掃描線 105‧‧‧Second scan line

106‧‧‧第一資料線 106‧‧‧First data line

107‧‧‧第二資料線 107‧‧‧Second data line

110‧‧‧第一主動元件 110‧‧‧First active component

112‧‧‧第一源極 112‧‧‧first source

114‧‧‧第一汲極 114‧‧‧First bungee

116‧‧‧第二主動元件 116‧‧‧Second active components

118‧‧‧第二源極 118‧‧‧Second source

120‧‧‧第二汲極 120‧‧‧Second bungee

122‧‧‧第三主動元件 122‧‧‧ Third active component

124‧‧‧第三源極 124‧‧‧ third source

126‧‧‧第三汲極 126‧‧‧third bungee

128‧‧‧第一輔助電極 128‧‧‧First auxiliary electrode

129‧‧‧第二輔助電極 129‧‧‧Second auxiliary electrode

134‧‧‧第三畫素電極 134‧‧‧ third pixel electrode

140‧‧‧第一絕緣層 140‧‧‧First insulation

142‧‧‧第二絕緣層 142‧‧‧Second insulation

150‧‧‧第一遮光層 150‧‧‧ first light shielding layer

152‧‧‧第二遮光層 152‧‧‧ second light shielding layer

A-A’、C-C’、D-D’、F-F’、G-G’‧‧‧線段 A-A’, C-C’, D-D’, F-F’, G-G’‧‧‧ segments

B、E‧‧‧區域 B, E‧‧‧ area

D1‧‧‧第一方向 D1‧‧‧ first direction

D2‧‧‧第二方向 D2‧‧‧ second direction

L1、L2、L3、L4、L5、L6、L7、L8‧‧‧距離 L1, L2, L3, L4, L5, L6, L7, L8‧‧‧ distance

第1A圖為依據本揭露內容的第一實施方式所繪示畫素結構的上視示意圖。 FIG. 1A is a top plan view showing a pixel structure according to a first embodiment of the present disclosure.

第1B圖繪示第1A圖的區域B的放大圖。 Fig. 1B is an enlarged view of a region B of Fig. 1A.

第1C圖為沿第1B圖的線段C-C’的剖面示意圖。 Fig. 1C is a schematic cross-sectional view taken along line C-C' of Fig. 1B.

第2A圖繪示當第一實施方式的畫素結構的畫素電極發生偏移時的上視示意圖,其中第2A圖所繪的區域範圍同於第1B圖。 FIG. 2A is a top view showing a state in which the pixel electrode of the pixel structure of the first embodiment is shifted, wherein the area depicted in FIG. 2A is the same as that in FIG. 1B.

第2B圖為沿第2A圖的線段D-D’的剖面示意圖。 Fig. 2B is a schematic cross-sectional view taken along line D-D' of Fig. 2A.

第3A圖為依據本揭露內容的第二實施方式所繪的畫素結構的上視示意圖。 FIG. 3A is a top plan view of a pixel structure according to a second embodiment of the present disclosure.

第3B圖繪示第3A圖的區域E的放大圖。 Fig. 3B is an enlarged view of a region E of Fig. 3A.

第3C圖為沿第3B圖的線段F-F’的剖面示意圖。 Fig. 3C is a schematic cross-sectional view taken along line F-F' of Fig. 3B.

第4A圖繪示當第二實施方式的畫素結構的畫素電極發生偏移時的上視示意圖,其中第4A圖所繪的區域範圍同於第3B圖。 FIG. 4A is a top view showing a state in which the pixel electrode of the pixel structure of the second embodiment is shifted, wherein the area depicted in FIG. 4A is the same as that in FIG. 3B.

第4B圖為沿第4A圖的線段G-G’的剖面示意圖。 Fig. 4B is a schematic cross-sectional view of the line segment G-G' taken along line 4A.

以下將以圖式揭露本發明之複數個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明部分實施方式中,這些實務上的細節為非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。 The embodiments of the present invention are disclosed in the following drawings, and the details of However, it should be understood that these practical details are not intended to limit the invention. That is, in some embodiments of the invention, these practical details are not necessary. In addition, some of the conventional structures and elements are shown in the drawings in a simplified schematic manner in order to simplify the drawings.

在本文中,使用第一、第二與第三等等之詞彙,是用於描述各種元件、組件、區域、層是可以被理解的。但是 這些元件、組件、區域、層不應該被這些術語所限制。這些詞彙只限於用來辨別單一元件、組件、區域、層。因此,在下文中的一第一元件、組件、區域、層也可被稱為第二元件、組件、區域、層,而不脫離本發明的本意。 The words "first, second, third, etc." are used herein to describe various elements, components, regions, and layers. but These elements, components, regions, and layers should not be limited by these terms. These terms are used to identify a single element, component, region, or layer. Thus, a singular element, component, region, or layer may be hereinafter referred to as a second element, component, region, layer, without departing from the spirit of the invention.

請參照第1A圖,其中第1A圖為依據本揭露內容的第一實施方式所繪示畫素結構100A的上視示意圖。畫素結構100A設置於基板102上,並包含第一掃描線104、第二掃描線105、第一資料線106、第二資料線107、第一主動元件110、第二主動元件116、第三主動元件122、第一輔助電極128、第二輔助電極129、第一畫素電極130、第二畫素電極132及第三畫素電極134。 Please refer to FIG. 1A , wherein FIG. 1A is a top view of the pixel structure 100A according to the first embodiment of the present disclosure. The pixel structure 100A is disposed on the substrate 102 and includes a first scan line 104, a second scan line 105, a first data line 106, a second data line 107, a first active device 110, a second active device 116, and a third The active element 122, the first auxiliary electrode 128, the second auxiliary electrode 129, the first pixel electrode 130, the second pixel electrode 132, and the third pixel electrode 134.

第一掃描線104及第二掃描線105依序沿第一方向D1排列於基板102,並沿第二方向D2延伸,其中第一方向D1與第二方向D2不同,例如第一方向D1與第二方向D2可呈正交關係。第一資料線106及第二資料線107沿第二方向D2依序排列於基板102,並沿第一方向D1延伸。掃描線104、105與資料線106、107互相交錯,從而於基板102上定義出第一畫素區域(未標示)、第二畫素區域(未標示)及第三畫素區域(未標示),其中第一畫素區域可由第一掃描線104、第二掃描線105、第一資料線106與第二資料線107定義。第一畫素區域及第二畫素區域為基板102上沿第二方向D2的連續排列的兩個畫素區域,而第一畫素區域及第三畫素區域為基板102上沿第一方向D1的連續排列的兩個畫素區域。 The first scan line 104 and the second scan line 105 are sequentially arranged in the first direction D1 on the substrate 102 and extend in the second direction D2, wherein the first direction D1 is different from the second direction D2, for example, the first direction D1 and the first The two directions D2 can be in an orthogonal relationship. The first data line 106 and the second data line 107 are sequentially arranged on the substrate 102 in the second direction D2 and extend in the first direction D1. The scan lines 104, 105 and the data lines 106, 107 are interleaved to define a first pixel area (not labeled), a second pixel area (not labeled), and a third pixel area (not labeled) on the substrate 102. The first pixel area may be defined by the first scan line 104, the second scan line 105, the first data line 106, and the second data line 107. The first pixel region and the second pixel region are two pixel regions arranged in a continuous direction along the second direction D2 on the substrate 102, and the first pixel region and the third pixel region are in the first direction on the substrate 102. Two pixel regions of D1 that are consecutively arranged.

第一主動元件110、第二主動元件116及第三主動 元件122例如為薄膜電晶體(thin film transistor;TFT)。第一主動元件110包含第一閘極(未標示)、第一源極112及第一汲極114,其中第一主動元件110的第一閘極及第一源極112分別與第一掃描線104及第一資料線106電性連接。第二主動元件116包含第二閘極(未標示)、第二源極118及第二汲極120,其中第二主動元件116的第二閘極及第二源極118分別與第一掃描線104及第二資料線107電性連接。此外,第一主動元件110及第二主動元件116例如為沿第二方向D2連續排列的兩個主動元件。第三主動元件122包含第三閘極(未標示)、第三源極124及第三汲極126,其中第三主動元件122的第三閘極及第三源極124分別與第二掃描線105及第二資料線107電性連接。此外,第二主動元件116之第二汲極120與第三主動元件122之第三汲極126可分別位於第二資料線107的相對兩側(即左右兩側),且第二主動元件116及第三主動元件122可為第二資料線107於第一方向D1上的連續排列的兩個主動元件。此外,第一畫素電極130、第二畫素電極132及第三畫素電極134分別設置於第一畫素區域、第二畫素區域及第三畫素區域之中,並分別由第一主動元件110、第二主動元件116及第三主動元件122控制。為方便觀察,本揭露中之主動元件未繪出通道層,但不用以限制本發明。 The first active component 110, the second active component 116, and the third active The element 122 is, for example, a thin film transistor (TFT). The first active device 110 includes a first gate (not labeled), a first source 112, and a first drain 114. The first gate and the first source 112 of the first active device 110 are respectively connected to the first scan line. 104 and the first data line 106 are electrically connected. The second active device 116 includes a second gate (not labeled), a second source 118, and a second drain 120. The second gate and the second source 118 of the second active device 116 are respectively connected to the first scan line. 104 and the second data line 107 are electrically connected. In addition, the first active component 110 and the second active component 116 are, for example, two active components that are continuously arranged in the second direction D2. The third active device 122 includes a third gate (not labeled), a third source 124 and a third drain 126, wherein the third gate and the third source 124 of the third active device 122 are respectively connected to the second scan line 105 and the second data line 107 are electrically connected. In addition, the second drain 120 of the second active component 116 and the third drain 126 of the third active component 122 are respectively located on opposite sides (ie, left and right sides) of the second data line 107, and the second active component 116 The third active component 122 can be two active components of the second data line 107 that are consecutively arranged in the first direction D1. In addition, the first pixel electrode 130, the second pixel electrode 132, and the third pixel electrode 134 are respectively disposed in the first pixel region, the second pixel region, and the third pixel region, and are respectively The active component 110, the second active component 116, and the third active component 122 are controlled. For ease of observation, the active elements of the present disclosure do not depict a channel layer, but are not intended to limit the invention.

透過上述配置,畫素結構100A中對應同一條資料線的畫素電極可以呈現鋸齒型(zig-zag)配置。於鋸齒型配置下,當畫素結構100A運作時,單一資料線的左右兩側的畫素電極可具有極性相反的電位。例如,同一列中位於第二資料線 107左側的第一畫素電極130及位於其右側的第二畫素電極132可被驅動為具有極性相反的電位。透過鋸齒型配置,可降低純色畫面下,資料線電位位準切換極性次數,可有效降低功耗。 Through the above configuration, the pixel electrodes corresponding to the same data line in the pixel structure 100A can be in a zig-zag configuration. In the zigzag configuration, when the pixel structure 100A operates, the pixel electrodes on the left and right sides of a single data line may have opposite potentials. For example, the second data line in the same column The first pixel electrode 130 on the left side of 107 and the second pixel electrode 132 on the right side thereof may be driven to have potentials of opposite polarities. Through the zigzag configuration, the number of polarity of the data line potential level can be reduced under the solid color screen, which can effectively reduce the power consumption.

第一輔助電極128及第二輔助電極129分別設置於第一畫素區域及第二畫素區域之中,且第一輔助電極128及第二輔助電極129分別與第一汲極114及第二汲極120直接連接,例如,第一輔助電極128及第一汲極114可由同一金屬層形成。第二資料線107位於第一輔助電極128與第二輔助電極129之間,其中第二資料線107、第一輔助電極128及第二輔助電極129也可以由同一金屬層形成,即第二資料線107、第一輔助電極128、第二輔助電極129、第一汲極114及第二汲極120可由同一金屬層形成。此外,第一畫素電極130於基板102的垂直投影與第一輔助電極128於基板102的垂直投影至少部分重疊,且第二畫素電極132於基板102的垂直投影也與第二輔助電極129於基板102的垂直投影至少部分重疊,如第1A圖所示。 The first auxiliary electrode 128 and the second auxiliary electrode 129 are respectively disposed in the first pixel region and the second pixel region, and the first auxiliary electrode 128 and the second auxiliary electrode 129 are respectively connected to the first drain 114 and the second The drain 120 is directly connected. For example, the first auxiliary electrode 128 and the first drain 114 may be formed of the same metal layer. The second data line 107 is located between the first auxiliary electrode 128 and the second auxiliary electrode 129. The second data line 107, the first auxiliary electrode 128, and the second auxiliary electrode 129 may also be formed by the same metal layer, that is, the second data. The line 107, the first auxiliary electrode 128, the second auxiliary electrode 129, the first drain 114, and the second drain 120 may be formed of the same metal layer. In addition, the vertical projection of the first pixel electrode 130 on the substrate 102 and the vertical projection of the first auxiliary electrode 128 on the substrate 102 at least partially overlap, and the vertical projection of the second pixel electrode 132 on the substrate 102 is also combined with the second auxiliary electrode 129. The vertical projections on the substrate 102 at least partially overlap, as shown in FIG. 1A.

請再看到第1B圖及第1C圖,其中第1B圖繪示第1A圖的區域B的放大圖,而第1C圖為沿第1B圖的線段C-C’的剖面示意圖。如第1C圖所示,畫素結構100A可更包含第一絕緣層140及第二絕緣層142,其中第二資料線107、第一輔助電極128及第二輔助電極129位於第一絕緣層140上,且第二絕緣層142位於第二資料線107、第一輔助電極128、第二輔助電極129及第一絕緣層140之上。第一畫素電極130及第二畫素電極 132位於第二絕緣層142上,並分別位於第一輔助電極128及第二輔助電極129之上。 Please refer to FIG. 1B and FIG. 1C again, wherein FIG. 1B is an enlarged view of a region B of FIG. 1A, and FIG. 1C is a schematic cross-sectional view taken along line C-C' of FIG. 1B. As shown in FIG. 1C , the pixel structure 100A further includes a first insulating layer 140 and a second insulating layer 142 , wherein the second data line 107 , the first auxiliary electrode 128 , and the second auxiliary electrode 129 are located on the first insulating layer 140 . The second insulating layer 142 is located above the second data line 107, the first auxiliary electrode 128, the second auxiliary electrode 129, and the first insulating layer 140. First pixel electrode 130 and second pixel electrode The 132 is located on the second insulating layer 142 and is located above the first auxiliary electrode 128 and the second auxiliary electrode 129, respectively.

第二資料線107與第一輔助電極128之間的水平距離約等於第二資料線107與第二輔助電極129之間的水平距離。例如,第二資料線107與第一輔助電極128之間的最小水平距離可如第1B圖及第1C圖所標記的距離L1,而第二資料線107與第二輔助電極129之間的最小水平距離可如第1B圖及第1C圖所標記的距離L2,且距離L1約等於距離L2。此外,由於第二資料線107、第一輔助電極128及第二輔助電極129可由同一金屬層形成,故距離L1及距離L2之間的關係不易受到製程變異的影響。 The horizontal distance between the second data line 107 and the first auxiliary electrode 128 is approximately equal to the horizontal distance between the second data line 107 and the second auxiliary electrode 129. For example, the minimum horizontal distance between the second data line 107 and the first auxiliary electrode 128 may be the distance L1 marked in FIG. 1B and FIG. 1C, and the minimum between the second data line 107 and the second auxiliary electrode 129. The horizontal distance may be the distance L2 marked in FIG. 1B and FIG. 1C, and the distance L1 is approximately equal to the distance L2. In addition, since the second data line 107, the first auxiliary electrode 128, and the second auxiliary electrode 129 can be formed by the same metal layer, the relationship between the distance L1 and the distance L2 is not easily affected by the process variation.

第一輔助電極128與第二輔助電極129之間的水平距離小於第一畫素電極與130第二畫素電極132之間的水平距離。例如,第一輔助電極128與第二輔助電極129之間的最小水平距離可如第1B圖及第1C圖所標記的距離L3,而第一畫素電極130與第二畫素電極132之間的最小水平距離可如第1B圖及第1C圖所標記的距離L4,且距離L3小於距離L4。 The horizontal distance between the first auxiliary electrode 128 and the second auxiliary electrode 129 is smaller than the horizontal distance between the first pixel electrode and the second second pixel electrode 132. For example, the minimum horizontal distance between the first auxiliary electrode 128 and the second auxiliary electrode 129 may be between the first pixel electrode 130 and the second pixel electrode 132 as shown in FIG. 1B and FIG. 1C. The minimum horizontal distance may be the distance L4 marked in FIG. 1B and FIG. 1C, and the distance L3 is smaller than the distance L4.

於此配置下,當第一畫素電極130與第二畫素電極132分別由第一主動元件110(請見第1A圖)及第二主動元件116(請見第1A圖)驅動且施加電位時,第一輔助電極128及第二輔助電極129與第二資料線107分別產生耦合電容,且第一畫素電極130及第二畫素電極132也會與第二資料線107分別產生耦合電容。其中,當第一畫素電極130與第二資料線107之間的距離約等於第二畫素電極132與第二資料線107之間的 距離時,其與第二資料線107所分別產生的耦合電容量值可呈大致相同或為差異15%之內。 In this configuration, when the first pixel electrode 130 and the second pixel electrode 132 are driven by the first active device 110 (see FIG. 1A) and the second active device 116 (see FIG. 1A), respectively, the potential is applied. The first auxiliary electrode 128 and the second auxiliary electrode 129 and the second data line 107 respectively generate a coupling capacitance, and the first pixel electrode 130 and the second pixel electrode 132 also generate a coupling capacitance with the second data line 107, respectively. . Wherein, when the distance between the first pixel electrode 130 and the second data line 107 is approximately equal to between the second pixel electrode 132 and the second data line 107 When the distance is different, the coupled capacitance values respectively generated by the second data line 107 may be substantially the same or within 15% of the difference.

另一方面,由於第一輔助電極128(或第二輔助電極129)與第二資料線107的距離小於第一畫素電極130(或第二畫素電極132)與第二資料線107的距離,故第一輔助電極128(或第二輔助電極129)與第二資料線107的耦合電容量值會大於第一畫素電極130(或第二畫素電極132)與第二資料線107的耦合電容量值。也就是說,於第二資料線107與其兩側的帶電層體結構的耦合電容之中,第一輔助電極128及第二輔助電極129與第二資料線107所產生的耦合電容可做為主要因子,而第一畫素電極130或第二畫素電極132與第二資料線107所產生的耦合電容則為次要因子。此外,由於第一輔助電極128及第二輔助電極129分別與第一汲極114及第二汲極120直接連接,故第一輔助電極128及第二輔助電極129具有電位,而非處於浮動狀態(floating),使得作為主要因子的耦合電容量值實質上不會浮動。 On the other hand, since the distance between the first auxiliary electrode 128 (or the second auxiliary electrode 129) and the second data line 107 is smaller than the distance between the first pixel electrode 130 (or the second pixel electrode 132) and the second data line 107 Therefore, the coupling capacitance value of the first auxiliary electrode 128 (or the second auxiliary electrode 129) and the second data line 107 may be greater than the first pixel electrode 130 (or the second pixel electrode 132) and the second data line 107. Coupling capacitance value. That is to say, among the coupling capacitances of the second data line 107 and the charged layer structure on both sides thereof, the coupling capacitance generated by the first auxiliary electrode 128 and the second auxiliary electrode 129 and the second data line 107 can be used as the main The factor, and the coupling capacitance generated by the first pixel electrode 130 or the second pixel electrode 132 and the second data line 107 is a secondary factor. In addition, since the first auxiliary electrode 128 and the second auxiliary electrode 129 are directly connected to the first drain electrode 114 and the second drain electrode 120, respectively, the first auxiliary electrode 128 and the second auxiliary electrode 129 have a potential instead of being in a floating state. (floating) such that the coupled capacitance value as the main factor does not substantially float.

因此,當第一畫素電極130及第二畫素電極132的製程產生變異,例如第一畫素電極130及第二畫素電極132的形成位置發生偏移時,由於做為耦合電容主要因子的第一輔助電極128及第二輔助電極129相對不易與第二資料線107的形成位置發生偏移,故可防止第二資料線107與其兩側的帶電層體結構的耦合電容差異值過大,進而防止亮暗線的產生。 Therefore, when the processes of the first pixel electrode 130 and the second pixel electrode 132 are mutated, for example, when the formation positions of the first pixel electrode 130 and the second pixel electrode 132 are shifted, the main factor of the coupling capacitance is The first auxiliary electrode 128 and the second auxiliary electrode 129 are relatively difficult to be offset from the formation position of the second data line 107, so that the difference in coupling capacitance between the second data line 107 and the charged layer structure on both sides thereof is prevented from being excessively large. In turn, the generation of bright and dark lines is prevented.

以下將舉例說明畫素電極發生偏移時的狀況,請看到第2A圖及第2B圖。第2A圖繪示當第一實施方式的畫素結 構100A的畫素電極發生偏移時的上視示意圖,其中第2A圖所繪的區域範圍同於第1B圖。第2B圖為沿第2A圖的線段D-D’的剖面示意圖。相較於第1B圖及第1C圖所繪的第一畫素電極130及第二畫素電極132,第2A圖及第2B圖所繪的第一畫素電極130及第二畫素電極132為稍微向右偏移。具體而言,第2A圖及第2B圖之中,第一畫素電極130與第二資料線107之間的水平距離會異於第二畫素電極132與第二資料線107之間的水平距離,例如,第一畫素電極130與第二資料線107之間的最小水平距離可如第2A圖及第2B圖所標記的距離L5,而第二畫素電極132與第二資料線107之間的最小水平距離可如第2A圖及第2B圖所標記的距離L6,且距離L5小於距離L6。 The following is an example of the situation when the pixel electrode is shifted. Please see Figures 2A and 2B. FIG. 2A illustrates the pixel knot when the first embodiment A top view of the pixel electrode of the structure 100A is shifted, wherein the area depicted in FIG. 2A is the same as that in FIG. 1B. Fig. 2B is a schematic cross-sectional view taken along line D-D' of Fig. 2A. The first pixel electrode 130 and the second pixel electrode 132 depicted in FIGS. 2A and 2B are compared to the first pixel electrode 130 and the second pixel electrode 132 depicted in FIGS. 1B and 1C. It is slightly offset to the right. Specifically, in FIGS. 2A and 2B, the horizontal distance between the first pixel electrode 130 and the second data line 107 may be different from the level between the second pixel electrode 132 and the second data line 107. For example, the minimum horizontal distance between the first pixel electrode 130 and the second data line 107 may be the distance L5 marked in FIGS. 2A and 2B, and the second pixel electrode 132 and the second data line 107. The minimum horizontal distance between them may be as the distance L6 marked in FIGS. 2A and 2B, and the distance L5 is smaller than the distance L6.

第2A圖及第2B圖中,當第一畫素電極130及第二畫素電極132向右偏移時,第一畫素電極130與第二資料線107會因其之間的水平距離縮短而導致其間之耦合電容量值上升,而第二畫素電極132與第二資料線107則會因其之間的水平距離增加而導致其間之耦合電容量值下降。然而,同前所述,因第一輔助電極128(或第二輔助電極129)與第二資料線107所產生的耦合電容量值大於第一畫素電極130(或第二畫素電極132)與第二資料線107所產生的耦合電容量值,雖第一畫素電極130及第二畫素電極132與第二資料線107所產生的耦合電容量值發生差異,但第二資料線107與其兩側的帶電層體結構的耦合電容差異值仍可落在可允許的範圍內。 In FIGS. 2A and 2B, when the first pixel electrode 130 and the second pixel electrode 132 are shifted to the right, the first pixel electrode 130 and the second data line 107 are shortened by the horizontal distance therebetween. As a result, the coupling capacitance value rises therebetween, and the second pixel electrode 132 and the second data line 107 decrease in the coupling capacitance value therebetween due to an increase in the horizontal distance therebetween. However, as described above, the coupling capacitance value generated by the first auxiliary electrode 128 (or the second auxiliary electrode 129) and the second data line 107 is larger than the first pixel electrode 130 (or the second pixel electrode 132). The coupling capacitance value generated by the second data line 107 is different from the coupling capacitance value generated by the first pixel electrode 130 and the second pixel electrode 132 and the second data line 107, but the second data line 107 is different. The difference in coupling capacitance between the charged layer structures on both sides can still fall within an allowable range.

舉例而言,請看到表一,其中表一為比較例與實驗例的耦合電容差異值模擬結果,比較例為未使用第一輔助電 極及第二輔助電極的畫素結構,而實驗例為使用第一輔助電極及第二輔助電極的畫素結構,其中實驗例之中的畫素電極偏移量為0微米的結構可雷同第1A圖至第1C圖所繪,而實驗例之中的畫素電極偏移量為2微米的結構可雷同第2A圖及第2B圖所繪。此外,關於表一中的各參數:「畫素電極偏移量」表示畫素電極的預設位置與所形成的畫素電極的實際位置的差異量;「左側耦合電容量值」及「右側耦合電容量值」分別表示資料線與其左右兩側的帶電層體結構所產生的耦合電容值;「耦合電容差異值」表示「左側耦合電容量值」及「右側耦合電容量值」之中的較大一者減去較小一者的數值;「耦合電容差異倍數」表示偏移量為2微米時的耦合電容差異值與偏移量為0微米時的耦合電容差異值的倍數關係。 For example, please see Table 1, where Table 1 is the simulation result of the coupling capacitance difference value of the comparative example and the experimental example, and the comparative example is that the first auxiliary power is not used. The pixel structure of the pole and the second auxiliary electrode, and the experimental example is a pixel structure using the first auxiliary electrode and the second auxiliary electrode, wherein the structure in which the pixel electrode offset is 0 micrometer in the experimental example can be identical 1A to 1C, and the structure in which the pixel offset of the pixel is 2 micrometers in the experimental example can be similar to that of FIG. 2A and FIG. 2B. In addition, regarding each parameter in Table 1, "pixel pixel offset" indicates the difference between the preset position of the pixel electrode and the actual position of the formed pixel electrode; "left coupled capacitance value" and "right side" The coupled capacitance value indicates the coupling capacitance value generated by the data line and the charged layer structure on the left and right sides, respectively; the "coupling capacitance difference value" indicates "the left coupling capacitance value" and the "right coupling capacitance value". The larger one is subtracted from the smaller one; the "coupling capacitance difference multiple" indicates the multiple of the coupling capacitance difference value when the offset is 2 μm and the coupling capacitance difference value when the offset is 0 μm.

由表一的結果可知,於比較例之中,資料線與畫素電極所產生的耦合電容差異倍數為15.78倍。於實驗例之中,資料線與左右兩側的帶電層體結構所產生的耦合電容差異 倍數為4.09倍。也就是說,當畫素電極產生偏移時,透過輔助電極,可降低資料線與其兩側的帶電層體結構的耦合電容差異值,以使耦合電容差異值仍落在可允許的範圍內,進而防止畫素結構有亮暗線的產生。 As can be seen from the results of Table 1, in the comparative example, the difference in coupling capacitance between the data line and the pixel electrode is 15.78 times. In the experimental example, the difference in coupling capacitance between the data line and the charged layer structure on the left and right sides The multiple is 4.09 times. That is to say, when the pixel electrode is offset, the coupling capacitance between the data line and the charged layer structure on both sides thereof can be reduced by the auxiliary electrode, so that the coupling capacitance difference value still falls within an allowable range. In turn, the pixel structure is prevented from having a bright dark line.

此外,雖第1A圖至第1C圖及第2A圖至第2B圖是以對應相同條資料線之鋸齒型的畫素電極排列配置,然而,上述配置僅為例示,其為說明輔助電極於畫素結構中所可發揮的功效,換言之,輔助電極也可設置於其他形式的畫素電極配置,並於畫素電極產生偏移時,提供降低耦合電容差異值的功效。 In addition, although FIGS. 1A to 1C and FIGS. 2A to 2B are arranged in a zigzag-type pixel electrode arrangement corresponding to the same data line, the above configuration is merely an example, and the auxiliary electrode is illustrated. The effect that can be exerted in the prime structure, in other words, the auxiliary electrode can also be placed in other forms of pixel electrode configuration, and provides the effect of reducing the coupling capacitance difference value when the pixel electrode is offset.

請再看到第3A圖、第3B圖及第3C圖,其中第3A圖為依據本揭露內容的第二實施方式所繪示畫素結構100B的上視示意圖,第3B圖繪示第3A圖的區域E的放大圖,而第3C圖為沿第3B圖的線段F-F’的剖面示意圖。本實施方式與第一實施方式的至少一個差異點為,畫素結構100B更包含第一遮光層150及第二遮光層152,其中第一遮光層150及第二遮光層152分別位於第一畫素區域及第二畫素區域之中,並由第一絕緣層140覆蓋。與第一實施方式雷同,第一畫素區域為位於第一資料線106與第二資料線107之間,而第一畫素區域及第二畫素區域為沿水平方向的連續排列的兩個畫素區域。 3A, 3B, and 3C, wherein FIG. 3A is a top view of the pixel structure 100B according to the second embodiment of the present disclosure, and FIG. 3B is a third FIG. An enlarged view of the area E, and a 3C view is a schematic cross-sectional view of the line segment F-F' along the 3B. At least one difference between the embodiment and the first embodiment is that the pixel structure 100B further includes a first light shielding layer 150 and a second light shielding layer 152, wherein the first light shielding layer 150 and the second light shielding layer 152 are respectively located in the first painting Among the prime regions and the second pixel regions, the first insulating layer 140 is covered. Similar to the first embodiment, the first pixel area is located between the first data line 106 and the second data line 107, and the first pixel area and the second pixel area are consecutively arranged in the horizontal direction. The pixel area.

如第3C圖所示,第一輔助電極128及第一畫素電極130位於第一遮光層150上方。第二輔助電極129及第二畫素電極132位於第二遮光層152上方,且第一遮光層150與第二遮光層152之間的水平距離小於第一輔助電極128與第二輔助電 極129之間的水平距離。例如,第一遮光層150與第二遮光層152之間的最小水平距離可如第3B圖及第3C圖所標記的距離L7,而第一輔助電極128與第二輔助電極129之間的最小水平距離可如第3B圖及第3C圖所標記的距離L8,且距離L7小於距離L8。 As shown in FIG. 3C, the first auxiliary electrode 128 and the first pixel electrode 130 are located above the first light shielding layer 150. The second auxiliary electrode 129 and the second pixel electrode 132 are located above the second light shielding layer 152, and the horizontal distance between the first light shielding layer 150 and the second light shielding layer 152 is smaller than the first auxiliary electrode 128 and the second auxiliary power The horizontal distance between poles 129. For example, the minimum horizontal distance between the first light shielding layer 150 and the second light shielding layer 152 may be the distance L7 marked in FIGS. 3B and 3C, and the minimum between the first auxiliary electrode 128 and the second auxiliary electrode 129. The horizontal distance may be the distance L8 marked as in FIGS. 3B and 3C, and the distance L7 is smaller than the distance L8.

此外,第一掃描線104、第二掃描線105、第一遮光層128及第二遮光層129可由同一膜材圖案化製成,例如可以是由同一金屬層製成。藉由設置第一遮光層150與第二遮光層152,可在防止第二資料線107與其兩側的帶電層體結構的耦合電容差異值過大的狀況下,進一步提供第一畫素電極130及第二畫素電極132於邊緣處的遮光效果,從而提高畫素結構100B的顯示品質。 In addition, the first scan line 104, the second scan line 105, the first light shielding layer 128, and the second light shielding layer 129 may be patterned by the same film material, for example, may be made of the same metal layer. By providing the first light shielding layer 150 and the second light shielding layer 152, the first pixel electrode 130 can be further provided under the condition that the difference in the coupling capacitance between the second data line 107 and the charged layer structure on both sides thereof is prevented from being excessively large. The second pixel electrode 132 has a light blocking effect at the edge, thereby improving the display quality of the pixel structure 100B.

請接著再看到第4A圖及第4B圖。第4A圖繪示當第二實施方式的畫素結構100B的畫素電極發生偏移時的上視示意圖,其中第4A圖所繪的區域範圍同於第3B圖,而第4B圖為沿第4A圖的線段G-G’的剖面示意圖。相較於第3B圖及第3C圖所繪的第一畫素電極130及第二畫素電極132,第4A圖及第4B圖所繪的第一畫素電極130及第二畫素電極132為向右偏移,使得第4A圖及第4B圖的第一畫素電極130與第二資料線107會因其之間的距離縮短而使所產生的耦合電容量值上升,而第二畫素電極132與第二資料線107則會因其之間的距離增加而使所產生的耦合電容量值下降。同前所述,透過第一輔助電極128及第二輔助電極129,第二資料線107與其兩側的帶電層體結構的耦合電容差異值仍會落在可允許的範圍內。 Please see the 4A and 4B pictures. FIG. 4A is a top view showing a state in which the pixel electrode of the pixel structure 100B of the second embodiment is shifted, wherein the area depicted in FIG. 4A is the same as that in FIG. 3B, and the fourth FIG. A schematic cross-sectional view of line segment G-G' of Figure 4A. The first pixel electrode 130 and the second pixel electrode 132 depicted in FIGS. 4A and 4B are compared to the first pixel electrode 130 and the second pixel electrode 132 depicted in FIGS. 3B and 3C. In order to shift to the right, the first pixel electrode 130 and the second data line 107 of FIGS. 4A and 4B are caused by the shortening of the distance between them, and the resulting coupling capacitance value is increased, and the second drawing is performed. The element electrode 132 and the second data line 107 decrease the value of the coupled capacitance due to an increase in the distance therebetween. As described above, the difference in coupling capacitance between the second data line 107 and the charged layer structure on both sides thereof through the first auxiliary electrode 128 and the second auxiliary electrode 129 still falls within an allowable range.

舉例而言,請看到表二,其中表二為比較例與實驗例的耦合電容差異值模擬結果。表二中,比較例為同於表一的比較例,即未使用第一輔助電極及第二輔助電極的畫素結構,而實驗例為使用第一輔助電極及第二輔助電極的畫素結構,其中實驗例之中的畫素電極偏移量為0微米的結構可雷同第3A圖至第3C圖所繪,而實驗例之中的畫素電極偏移量為2微米的結構可雷同第4A圖及第4B圖所繪。此外,表二中的各參數的定義可同於表一,在此不再贅述。 For example, please see Table 2, where Table 2 shows the simulation results of the coupling capacitance difference between the comparative example and the experimental example. In Table 2, the comparative example is the comparative example of the same as Table 1, that is, the pixel structure in which the first auxiliary electrode and the second auxiliary electrode are not used, and the experimental example is the pixel structure using the first auxiliary electrode and the second auxiliary electrode. The structure in which the pixel offset of the pixel is 0 micrometer in the experimental example can be similar to that of the 3A to 3C, and the structure in which the pixel offset of the pixel is 2 micrometers in the experimental example can be the same. 4A and 4B. In addition, the definitions of the parameters in Table 2 can be the same as in Table 1, and will not be repeated here.

由表二的結果可知,於比較例之中,畫素電極與資料線所產生的耦合電容差異倍數為15.78倍。於實驗例之中,資料線與其兩側的帶電層體結構的耦合電容差異倍數為4.5倍。換言之,在有設置第一遮光層與第二遮光層的條件下,透過輔助電極,仍可防止因畫素電極偏移而使資料線與其兩側的帶電層體結構的耦合電容差異值過大的狀況發生。也就是說,即使遮光層與輔助電極同時設置於同一畫素結構之中,輔 數電極仍可發揮其穩定電容差異值的效果。 It can be seen from the results of Table 2 that in the comparative example, the difference in coupling capacitance between the pixel electrode and the data line is 15.78 times. In the experimental example, the difference in coupling capacitance between the data line and the charged layer structure on both sides is 4.5 times. In other words, under the condition that the first light shielding layer and the second light shielding layer are disposed, the auxiliary electrode can prevent the difference in the coupling capacitance between the data line and the charged layer structure on both sides due to the offset of the pixel electrode. The situation has occurred. That is, even if the light shielding layer and the auxiliary electrode are simultaneously disposed in the same pixel structure, The number electrode can still exert its effect of stabilizing the capacitance difference value.

綜上所述,本揭露內容的畫素結構包含資料線、第一輔助電極、第二輔助電極及畫素電極,其中資料線、第一輔助電極及第二輔助電極可透過同一道製程形成。第一輔助電極及第二輔助電極分別位於資料線的左右兩側。於畫素結構運作時,第一輔助電極及第二輔助電極可分別與資料線產生耦合電容,且此耦合電容的量值大於畫素電極與資料線產生的耦合電容的量值。因此,透過第一輔助電極及第二輔助電極與資料線所產生的耦合電容,即使畫素電極的形成位置產生偏移並造成其與資料線的耦合電容量值產生變化時,資料線與其兩側的帶電層體結構的耦合電容差異值仍可落在可允許的範圍之內,從而防止畫素結構產生亮暗線的現象。另一方面,設置有輔助電極的畫素結構可進一步搭配遮光層,以提供第一畫素電極及第二畫素電極於其邊緣處的遮光效果,從而提高畫素結構的顯示品質。 In summary, the pixel structure of the present disclosure includes a data line, a first auxiliary electrode, a second auxiliary electrode, and a pixel electrode, wherein the data line, the first auxiliary electrode, and the second auxiliary electrode are formed through the same process. The first auxiliary electrode and the second auxiliary electrode are respectively located on the left and right sides of the data line. When the pixel structure is in operation, the first auxiliary electrode and the second auxiliary electrode respectively generate a coupling capacitance with the data line, and the magnitude of the coupling capacitance is greater than the magnitude of the coupling capacitance generated by the pixel electrode and the data line. Therefore, the coupling capacitance generated by the first auxiliary electrode and the second auxiliary electrode and the data line, even if the formation position of the pixel electrode is shifted and the coupling capacitance value with the data line changes, the data line and the two The coupling capacitance difference value of the side charged layer structure can still fall within the allowable range, thereby preventing the pixel structure from producing bright and dark lines. On the other hand, the pixel structure provided with the auxiliary electrode can be further matched with the light shielding layer to provide a light shielding effect of the first pixel electrode and the second pixel electrode at the edge thereof, thereby improving the display quality of the pixel structure.

雖然本發明已以多種實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the invention has been described above in terms of various embodiments, it is not intended to limit the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application attached.

100A‧‧‧畫素結構 100A‧‧‧ pixel structure

102‧‧‧基板 102‧‧‧Substrate

104‧‧‧第一掃描線 104‧‧‧First scan line

105‧‧‧第二掃描線 105‧‧‧Second scan line

106‧‧‧第一資料線 106‧‧‧First data line

107‧‧‧第二資料線 107‧‧‧Second data line

110‧‧‧第一主動元件 110‧‧‧First active component

112‧‧‧第一源極 112‧‧‧first source

114‧‧‧第一汲極 114‧‧‧First bungee

116‧‧‧第二主動元件 116‧‧‧Second active components

118‧‧‧第二源極 118‧‧‧Second source

120‧‧‧第二汲極 120‧‧‧Second bungee

122‧‧‧第三主動元件 122‧‧‧ Third active component

124‧‧‧第三源極 124‧‧‧ third source

126‧‧‧第三汲極 126‧‧‧third bungee

128‧‧‧第一輔助電極 128‧‧‧First auxiliary electrode

129‧‧‧第二輔助電極 129‧‧‧Second auxiliary electrode

130‧‧‧第一畫素電極 130‧‧‧ first pixel electrode

132‧‧‧第二畫素電極 132‧‧‧Second pixel electrode

134‧‧‧第三畫素電極 134‧‧‧ third pixel electrode

B‧‧‧區域 B‧‧‧Area

D1‧‧‧第一方向 D1‧‧‧ first direction

D2‧‧‧第二方向 D2‧‧‧ second direction

Claims (10)

一種畫素結構,包含:一資料線;一第一主動元件,包含一第一汲極;一第二主動元件,包含一第二汲極;一第一輔助電極,與該第一汲極直接連接;以及一第二輔助電極,與該第二汲極直接連接,其中該資料線位於該第一輔助電極與該第二輔助電極之間。 A pixel structure comprising: a data line; a first active component comprising a first drain; a second active component comprising a second drain; a first auxiliary electrode directly opposite the first drain And a second auxiliary electrode directly connected to the second drain, wherein the data line is located between the first auxiliary electrode and the second auxiliary electrode. 如申請專利範圍第1項所述的畫素結構,其中該資料線與該第一輔助電極之間的水平距離約等於該資料線與該第二輔助電極之間的水平距離。 The pixel structure of claim 1, wherein a horizontal distance between the data line and the first auxiliary electrode is approximately equal to a horizontal distance between the data line and the second auxiliary electrode. 如申請專利範圍第2項所述的畫素結構,更包含:一第一畫素電極,位於該第一輔助電極之上;以及一第二畫素電極,位於該第二輔助電極之上,且該第一畫素電極與該第二畫素電極分別位於該資料線的相對兩側,其中該第一輔助電極與該第二輔助電極之間的最小水平距離小於該第一畫素電極與該第二畫素電極之間的最小水平距離,其中該第一畫素電極與該資料線之間的最小水平距離異於該第二畫素電極與該資料線之間的最小水平距離。 The pixel structure of claim 2, further comprising: a first pixel electrode located above the first auxiliary electrode; and a second pixel electrode located above the second auxiliary electrode The first pixel electrode and the second pixel electrode are respectively located on opposite sides of the data line, wherein a minimum horizontal distance between the first auxiliary electrode and the second auxiliary electrode is smaller than the first pixel electrode and a minimum horizontal distance between the second pixel electrodes, wherein a minimum horizontal distance between the first pixel electrode and the data line is different from a minimum horizontal distance between the second pixel electrode and the data line. 如申請專利範圍第1項所述的畫素結構,更 包含:一第一遮光層,其中該第一輔助電極至少位於該第一遮光層上方;以及一第二遮光層,其中該第二輔助電極至少位於該第二遮光層上方,且該第一遮光層與該第二遮光層之間的水平距離小於該第一輔助電極與該第二輔助電極之間的水平距離。 If the pixel structure described in item 1 of the patent application is applied, The method includes: a first light shielding layer, wherein the first auxiliary electrode is located at least above the first light shielding layer; and a second light shielding layer, wherein the second auxiliary electrode is located at least above the second light shielding layer, and the first light shielding layer The horizontal distance between the layer and the second light shielding layer is smaller than the horizontal distance between the first auxiliary electrode and the second auxiliary electrode. 如申請專利範圍第1項所述的畫素結構,更包含:一第三主動元件,包含一第三汲極,其中該資料線與該第二主動元件及該第三主動元件電性連接,且該第二主動元件之該第二汲極與該第三主動元件之該第三汲極分別位於該資料線的相對兩側。 The pixel structure of claim 1, further comprising: a third active component, comprising a third drain, wherein the data line is electrically connected to the second active component and the third active component, And the second drain of the second active component and the third drain of the third active component are respectively located on opposite sides of the data line. 如申請專利範圍第5項所述的畫素結構,其中該資料線沿一第一方向延伸,且該第二主動元件與該第三主動元件為該資料線於該第一方向上的連續排列的兩個主動元件。 The pixel structure of claim 5, wherein the data line extends along a first direction, and the second active component and the third active component are consecutively arranged in the first direction of the data line. Two active components. 如申請專利範圍第1項所述的畫素結構,更包含:一第一絕緣層,其中該資料線、該第一輔助電極及該第二輔助電極位於該第一絕緣層上;以及一第二絕緣層,位於該資料線、該第一輔助電極、該第 二輔助電極及該第一絕緣層之上。 The pixel structure of claim 1, further comprising: a first insulating layer, wherein the data line, the first auxiliary electrode and the second auxiliary electrode are located on the first insulating layer; a second insulating layer, located in the data line, the first auxiliary electrode, the first Two auxiliary electrodes and the first insulating layer. 如申請專利範圍第1項所述的畫素結構,更包含:一第一畫素電極,位於該第一輔助電極之上;以及一第二畫素電極,位於該第二輔助電極之上,且該第一畫素電極與該第二畫素電極分別位於該資料線的相對兩側,其中該第一輔助電極與該第二輔助電極之間的水平距離小於該第一畫素電極與該第二畫素電極之間的水平距離。 The pixel structure of claim 1, further comprising: a first pixel electrode located above the first auxiliary electrode; and a second pixel electrode located above the second auxiliary electrode, The first pixel electrode and the second pixel electrode are respectively located on opposite sides of the data line, wherein a horizontal distance between the first auxiliary electrode and the second auxiliary electrode is smaller than the first pixel electrode and the The horizontal distance between the second pixel electrodes. 如申請專利範圍第8項所述的畫素結構,其中該第一畫素電極與該資料線之間的最小水平距離異於該第二畫素電極與該資料線之間的最小水平距離。 The pixel structure of claim 8, wherein a minimum horizontal distance between the first pixel electrode and the data line is different from a minimum horizontal distance between the second pixel electrode and the data line. 如申請專利範圍第9項所述的畫素結構,其中該畫素結構設置於一基板上,且該第一畫素電極至該基板的垂直投影與該第一輔助電極至該基板的垂直投影至少部分重疊,且該第二畫素電極至該基板的垂直投影與該第二輔助電極至該基板的垂直投影至少部分重疊。 The pixel structure of claim 9, wherein the pixel structure is disposed on a substrate, and a vertical projection of the first pixel electrode to the substrate and a vertical projection of the first auxiliary electrode to the substrate At least partially overlapping, and the vertical projection of the second pixel electrode to the substrate at least partially overlaps the vertical projection of the second auxiliary electrode to the substrate.
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