TWI608071B - Thermal-radiative film and thermal adhesive tape - Google Patents

Thermal-radiative film and thermal adhesive tape Download PDF

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TWI608071B
TWI608071B TW103102075A TW103102075A TWI608071B TW I608071 B TWI608071 B TW I608071B TW 103102075 A TW103102075 A TW 103102075A TW 103102075 A TW103102075 A TW 103102075A TW I608071 B TWI608071 B TW I608071B
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filler
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TW201435039A (en
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青木孝浩
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維愛吉科技有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K5/00Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
    • C09K5/08Materials not undergoing a change of physical state when used
    • C09K5/14Solid materials, e.g. powdery or granular
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3737Organic materials with or without a thermoconductive filler
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Combustion & Propulsion (AREA)
  • Thermal Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesive Tapes (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Description

熱放射性膜及熱放射性黏著帶 Thermal radiation film and thermal radioactive adhesive tape

本發明係關於熱放射性膜及熱放射性黏著帶。更詳細而言,本發明係關於一種熱放射性膜及熱放射性黏著帶,其係適合使用在希望從電氣機器、電子機器等因電力消費而發熱之構件散熱之用途。 The present invention relates to thermal radiation films and thermal radioactive adhesive tapes. More specifically, the present invention relates to a thermal radiation film and a thermal radioactive adhesive tape which are suitable for use in heat dissipation from a member which is expected to generate heat due to power consumption such as an electric machine or an electronic device.

構成電氣機器、電子機器等之構件,係隨其積體度提升及運作速度提升而使消費電力增加,其結果造成發熱量增加。若發熱量增加則會造成構件本身溫度上昇。構件溫度上昇係會造成因構件錯誤運作或故障而造成壽命減少、使使用者燙傷等,故希望能抑制溫度之上昇。 The components constituting the electric machine, the electronic device, etc., increase the consumption power as the degree of integration increases and the operation speed increases, and as a result, the amount of heat generation increases. If the amount of heat is increased, the temperature of the component itself will rise. When the temperature of the component rises, the life of the component is reduced due to malfunction or malfunction of the component, and the user is burnt. Therefore, it is desirable to suppress an increase in temperature.

溫度上昇之抑制手段已知有使散熱板與構件接觸之技術。藉由使散熱板與構件接觸,而將構件產生的熱傳導至散熱板,其結果可抑制構件溫度上昇。 A means for suppressing the rise in temperature is known as a technique for bringing a heat sink into contact with a member. By bringing the heat sink into contact with the member, the heat generated by the member is conducted to the heat sink, and as a result, the temperature rise of the member can be suppressed.

散熱板中係使用如金屬之類之熱傳導率高的材料。但是,若散熱板溫度與外氣溫度的差小,則積蓄在散熱板的熱不會排出,而依然積蓄在散熱板。因此,作為溫度上昇抑制手段之散熱板係還有改善的餘地。 A material having a high thermal conductivity such as metal is used in the heat dissipation plate. However, if the difference between the temperature of the heat sink and the temperature of the outside air is small, the heat accumulated in the heat sink is not discharged, but is still accumulated in the heat sink. Therefore, there is still room for improvement in the heat dissipation plate system as a means for suppressing the temperature rise.

於日本特許第2807198號(專利文獻1)已提出解決上 述散熱板之課題之技術。專利文獻1中,係提出使用包括熱放射率大之熱放射性材料之薄片與包括熱傳導率大之熱傳導性材料之薄片的積層體,而作為散熱體。專利文獻1中,熱放射性材料可舉出堇青石、鈦酸鋁、β-鋰輝石、陶瓷、碳黑、碳纖維等,熱傳導性材料可舉出鐵氧體。又,專利文獻1中,上述2種薄片係藉由聚矽氧加硫體而維持其形狀,該等個別的厚度形成為1mm。 It has been proposed in Japanese Patent No. 2807198 (Patent Document 1) The technology of the subject of the heat sink. In Patent Document 1, it is proposed to use a laminate including a sheet of a thermally radioactive material having a large thermal emissivity and a sheet comprising a sheet of a thermally conductive material having a large thermal conductivity as a heat dissipating body. In the patent document 1, the thermal conductive material may, for example, be cordierite, aluminum titanate, β-spodumene, ceramics, carbon black, or carbon fiber, and the thermal conductive material may be ferrite. Further, in Patent Document 1, the above two types of sheets are maintained in shape by a polyfluorene oxygen addition body, and the individual thicknesses are formed to be 1 mm.

[先行技術文獻] [Advanced technical literature]

專利文獻1:日本特許第2807198號 Patent Document 1: Japanese Patent No. 2807198

上述專利文獻1之散熱體亦無法充分抑制構件之溫度上昇,而希望能更為改善。又,因電氣機器或電子機器係求更薄化,故散熱體也求薄膜化。由此觀點來看,專利文獻1之散熱體在其可使用範圍內薄膜化有其極限。 The heat sink of the above Patent Document 1 cannot sufficiently suppress the temperature rise of the member, and it is desired to be more improved. Further, since the electric device or the electronic device is made thinner, the heat sink is also thinned. From this point of view, the heat sink of Patent Document 1 has its limit in thinning in its usable range.

如此,根據本發明可提供一種熱放射性膜,係含有胺甲酸酯(urethane)系樹脂與熱傳導性填料,且具有0.5W/m.K以上之熱傳導率、0.85以上之熱放射率、5N/20mm以上之拉伸強度及10至30μm之膜厚。 Thus, according to the present invention, a thermal radioactive film comprising a urethane resin and a thermally conductive filler and having a thickness of 0.5 W/m can be provided. The thermal conductivity of K or more, the thermal emissivity of 0.85 or more, the tensile strength of 5N/20 mm or more, and the film thickness of 10 to 30 μm.

又,根據本發明可提供一種熱放射性黏著帶,係在厚度方向具有上述熱放射性膜及黏著劑層。 Further, according to the present invention, there can be provided a thermal radioactive adhesive tape comprising the above-mentioned thermal radiation film and an adhesive layer in the thickness direction.

根據本發明可提供一種可更抑制構成電氣機器、電 子機器等之構件的溫度上昇之薄膜之熱放射性膜,以及熱放射性黏著帶。 According to the present invention, it is possible to provide a device that can more inhibit the formation of electrical equipment and electricity. A thermal radiation film of a film whose temperature rises as a component of a child machine, and a thermal radioactive adhesive tape.

又,在具備以下任一者之情形中,可提供可進一步抑制構件之溫度上昇的薄膜之熱放射性膜,以及熱放射性黏著帶。 Moreover, in the case of any of the following, it is possible to provide a thermal radiation film of a film which can further suppress the temperature rise of the member, and a thermal radioactive adhesive tape.

(1)熱傳導性填料係由氧化鋁、氧化鈦、氧化鋯、鐵氧體、氧化矽、氧化鋅、氧化鎂、碳化鋁、碳化矽、氮化鋁、氮化硼、碳黑、石墨、碳纖維及氰尿酸三聚氰胺(melamine cyanurate)所選擇之1種一上。 (1) The thermally conductive filler is composed of alumina, titania, zirconia, ferrite, cerium oxide, zinc oxide, magnesium oxide, aluminum carbide, lanthanum carbide, aluminum nitride, boron nitride, carbon black, graphite, carbon fiber. And one of the selected ones of melamine cyanurate.

(2)熱傳導性填料,係由氧化鋁、氧化鈦、氧化鋯、鐵氧體、氧化矽、氧化鋅、氧化鎂、碳化鋁、碳化矽、氮化鋁、氮化硼及氰尿酸三聚氰胺所選擇之填料A與由碳黑、石墨及碳纖維所選擇之填料B之組合,或是由氧化鋁、氧化鈦、氧化鋯、鐵氧體、氧化矽、氧化鋅、氧化鎂、碳化鋁、碳化矽、氮化鋁及氮化硼所選擇之填料C與氰尿酸三聚氰胺之填料D之組合。 (2) Thermally conductive filler selected from alumina, titania, zirconia, ferrite, cerium oxide, zinc oxide, magnesium oxide, aluminum carbide, tantalum carbide, aluminum nitride, boron nitride and melamine cyanurate a combination of filler A and filler B selected from carbon black, graphite and carbon fibers, or alumina, titania, zirconia, ferrite, cerium oxide, zinc oxide, magnesium oxide, aluminum carbide, tantalum carbide, Combination of filler C selected from aluminum nitride and boron nitride with filler D of melamine cyanurate.

(3)熱傳導性填料相對於胺甲酸酯系樹脂100重量份係含有100至600重量份。 (3) The thermally conductive filler is contained in an amount of 100 to 600 parts by weight based on 100 parts by weight of the urethane resin.

(4)填料B相對於填料A之100重量份係含有0.5至30重量份,填料D相對於填料C之100重量份係含有1至200重量份。 (4) The filler B contains 0.5 to 30 parts by weight based on 100 parts by weight of the filler A, and the filler D contains 1 to 200 parts by weight based on 100 parts by weight of the filler C.

(5)熱傳導性填料為下述任一組合,‧由氧化鋁、碳化矽、氮化鋁及氰尿酸三聚氰胺所選擇之填料與碳黑之填料之組合;‧由氧化鋁之填料與氰尿酸三聚氰胺之填料之組合。 (5) The thermally conductive filler is any combination of the following: ‧ a combination of a filler selected from alumina, tantalum carbide, aluminum nitride and melamine cyanurate and a filler of carbon black; ‧ a filler of alumina and melamine cyanurate a combination of fillers.

(6)胺甲酸酯系樹脂之厚度為25μm時,具有5N/20mm以上之拉伸強度。 (6) When the thickness of the urethane-based resin is 25 μm, the tensile strength is 5 N/20 mm or more.

1‧‧‧熱放射性膜 1‧‧‧Thermal radioactive film

2、4‧‧‧黏著劑層 2, 4‧‧‧ adhesive layer

3‧‧‧熱傳導性材料(薄片) 3‧‧‧Hot conductive materials (flakes)

a‧‧‧熱放射性黏著帶 a‧‧‧Hot radioactive adhesive tape

b‧‧‧銅箔 B‧‧‧copper foil

c‧‧‧加熱器 C‧‧‧heater

d‧‧‧熱電偶 D‧‧‧ thermocouple

e‧‧‧隔熱材 e‧‧‧Insulation

第1圖係本發明熱放射性黏著帶之示意剖面圖。 Figure 1 is a schematic cross-sectional view of a thermal radioactive adhesive tape of the present invention.

第2圖係本發明熱放射性黏著帶之示意剖面圖。 Figure 2 is a schematic cross-sectional view of a thermal radioactive adhesive tape of the present invention.

第3圖係本發明熱放射性黏著帶之示意剖面圖。 Figure 3 is a schematic cross-sectional view of a thermal radioactive adhesive tape of the present invention.

第4圖(a)及(b)係實施例之散熱效果試驗之示意說明圖。 Fig. 4 (a) and (b) are schematic explanatory views of the heat dissipation effect test of the embodiment.

第5圖係表示實施例1及比較例1之熱放射性黏著帶的散熱效果試驗中,測定溫度之經時變化的圖表。 Fig. 5 is a graph showing changes in temperature over time in the heat radiation effect test of the thermal radiation adhesive tapes of Example 1 and Comparative Example 1.

(熱放射性膜) (thermal radiation film)

熱放射性膜是代表含有胺甲酸酯系樹脂及熱傳導性填料且具有10至30μm膜厚者。進一步,熱放射性膜具有0.5W/m.K以上之熱傳導率、0.85以上之熱放射率及5N/20mm以上之拉伸強度。 The thermal radiation film is represented by a film containing an urethane resin and a thermally conductive filler and having a film thickness of 10 to 30 μm. Further, the thermal radioactive film has a thickness of 0.5 W/m. The thermal conductivity of K or more, the thermal emissivity of 0.85 or more, and the tensile strength of 5N/20 mm or more.

熱放射性膜具有上述範圍之熱傳導率、熱放射率、拉伸強度及膜厚,而可抑制構件之溫度上昇,且可在可使用範圍內實現薄膜化。在此,可使用範圍是指貼於構件時,膜不會容易產生造成作業障礙之程度之使用性。 The thermal radiation film has the thermal conductivity, the thermal emissivity, the tensile strength, and the film thickness in the above range, and can suppress the temperature rise of the member, and can be thinned within a usable range. Here, the usable range refers to the usability in which the film does not easily cause work obstacles when attached to the member.

熱傳導率較佳為0.5W/m.K以上,更佳為1.0W/m.K以上。熱放射率較佳為0.85以上,更佳為0.88以上。若在該等較佳之熱傳導率及熱放射率之範圍,則可提供可進一步抑制構件之溫度上昇之膜。熱傳導率可為0.5W/m.K、1.0W/m.K、1.5W/m.K、2.0W/m.K、2.5W/m.K、3.0W/m.K等的值。熱放射率可為0.85、0.86、0.87、0.88、0.89、0.90、0.91、0.92、0.95。 The thermal conductivity is preferably 0.5 W/m. K or more, more preferably 1.0 W/m. K or more. The heat emissivity is preferably 0.85 or more, more preferably 0.88 or more. In the range of such preferable thermal conductivity and thermal emissivity, a film which can further suppress the temperature rise of the member can be provided. The thermal conductivity can be 0.5W/m. K, 1.0W/m. K, 1.5W/m. K, 2.0W/m. K, 2.5W/m. K, 3.0W/m. The value of K, etc. The heat emissivity may be 0.85, 0.86, 0.87, 0.88, 0.89, 0.90, 0.91, 0.92, 0.95.

拉伸強度較佳為5N/20mm以上,更佳為10N/20mm以上。膜 厚較佳為10至30μm,更佳為10至25μm。若在該等較佳之拉伸強度及膜厚之範圍,則可提供使用更容易且更薄膜之膜。拉伸強度可為10N/20mm、15N/20mm、20N/20mm、25N/20mm、30N/20mm、35N/20mm、40N/20mm。膜厚可為10μm、15μm、20μm、25μm。 The tensile strength is preferably 5 N/20 mm or more, more preferably 10 N/20 mm or more. membrane The thickness is preferably from 10 to 30 μm, more preferably from 10 to 25 μm. If such a preferred range of tensile strength and film thickness is present, a film that is easier and more film-friendly can be provided. The tensile strength may be 10 N/20 mm, 15 N/20 mm, 20 N/20 mm, 25 N/20 mm, 30 N/20 mm, 35 N/20 mm, 40 N/20 mm. The film thickness may be 10 μm, 15 μm, 20 μm, or 25 μm.

(a)胺甲酸酯系樹脂 (a) Amino acid ester resin

胺甲酸酯系樹脂可成為30μm厚度之膜形狀,且只要是可賦予膜5N/20mm以上拉伸強度之樹脂則無特別限定。該等胺甲酸酯系樹脂中,更佳為在厚度25μm時具有5N/20mm以上拉伸強度之樹脂。在30μm及/或25μm之厚度時拉伸強度可為5N/20mm、10N/20mm、15N/20mm、20N/20mm、25N/20mm、30N/20mm、35N/20mm、40N/20mm。 The urethane-based resin may have a film shape having a thickness of 30 μm, and is not particularly limited as long as it is a resin capable of imparting a tensile strength of 5 N/20 mm or more. Among these urethane-based resins, a resin having a tensile strength of 5 N/20 mm or more at a thickness of 25 μm is more preferable. The tensile strength at a thickness of 30 μm and/or 25 μm may be 5 N/20 mm, 10 N/20 mm, 15 N/20 mm, 20 N/20 mm, 25 N/20 mm, 30 N/20 mm, 35 N/20 mm, 40 N/20 mm.

胺甲酸酯系樹脂,例如可列舉:(1)己內酯開環聚合所得之聚內酯酯多元醇與二異氰酸酯(例如甲苯二異氰酸酯、二苯基甲烷二異氰酸酯、萘二異氰酸酯、六亞甲基二異氰酸酯等)藉由聚合加成反應所合成之己內酯型聚胺甲酸酯彈性體;(2)將二羧酸(例如己二酸、酞酸等)與二醇(例如聚丙二醇)之二羧酸酯多元醇,與二異氰酸酯藉由聚合加成反應所合成之二羧酸酯型聚胺甲酸酯彈性體;(3)將聚伸丁二醇、聚伸烷二醇(例如聚丙二醇)等之聚醚多元醇,與二異氰酸酯藉由聚合加成反應所合成之聚醚型聚胺甲酸酯彈性體;及(4)聚碳酸酯多元醇。 Examples of the urethane-based resin include (1) a polylactone ester polyol obtained by ring-opening polymerization of caprolactone and a diisocyanate (for example, toluene diisocyanate, diphenylmethane diisocyanate, naphthalene diisocyanate, and hexa a methyl diisocyanate or the like) a caprolactone type polyurethane elastomer synthesized by a polymerization addition reaction; (2) a dicarboxylic acid (for example, adipic acid, citric acid, etc.) and a diol (for example, poly a dicarboxylate polyol of propylene glycol), a dicarboxylate type polyurethane elastomer synthesized by a polymerization addition reaction with a diisocyanate; (3) a polybutanediol, a polyalkylene glycol to be polymerized A polyether polyol such as polypropylene glycol (polypropylene glycol), a polyether polyurethane elastomer synthesized by a polymerization addition reaction with a diisocyanate; and (4) a polycarbonate polyol.

胺甲酸酯系樹脂可為該等(1)至(4)之混合物。 The urethane resin may be a mixture of the above (1) to (4).

胺甲酸酯系樹脂可具有羧基、胺基等官能基。尤其藉由具有羧基,可提升熱傳導性填料之分散性。 The urethane-based resin may have a functional group such as a carboxyl group or an amine group. In particular, by having a carboxyl group, the dispersibility of the thermally conductive filler can be improved.

胺甲酸酯彈性體較佳為具有1萬至20萬之重量平均分子量。若為此範圍之分子量,則可得更容易使用且更薄膜之膜。 The urethane elastomer preferably has a weight average molecular weight of 10,000 to 200,000. If the molecular weight is in this range, a film which is easier to use and more thin can be obtained.

胺甲酸酯系樹脂之市售品可舉出源自於大日精化工業公司之DAIFERAMINE MAU系列(型號5022、4308HV、9022等)或RESAMINE ME系列(型號ME-44ELP、ME-8105LP等)等聚胺甲酸酯彈性體前驅物與日本聚胺甲酸酯公司之CORONATE L-55E、三井化學公司之Takenate D-160N等異氰酸酯系交聯劑反應之反應物的彈性體,kuraray公司之KURAMIRON U1000號系列(型號1180、1190等)或9000號系列(型號9180、9185等)之彈性體等。 The commercially available product of the urethane-based resin may be a DAIFERAMINE MAU series (models 5022, 4308HV, 9022, etc.) or a RESAMINE ME series (models ME-44ELP, ME-8105LP, etc.) derived from Dairi Seiki Co., Ltd. Elastomer of a reaction of a polyurethane elastomer precursor with an isocyanate crosslinking agent such as CORONATE L-55E of Japan Polyurethane Co., Ltd., Takenate D-160N of Mitsui Chemicals Co., Ltd., KURAMIRON U1000 of Kuraray Co., Ltd. Elastomers of the series (models 1180, 1190, etc.) or 9000 series (models 9180, 9185, etc.).

(b)熱傳導性填料 (b) Thermally conductive filler

作為熱傳導性填料,只要是可賦予膜0.5W/m.K以上之熱傳導率及0.85以上之熱放射率之填料則無特別限定。具體而言為由氧化鋁、氧化鈦、氧化鋯、鐵氧體、氧化矽、氧化鋅、氧化鎂、碳化鋁、碳化矽、氮化鋁、氮化硼、碳黑、石墨、碳纖維及氰尿酸三聚氰胺所選擇之1種以上。熱傳導率可為0.5W/m.K、1.0W/m.K、1.5W/m.K、2.0W/m.K、2.5W/m.K、3.0W/m.K等的值。熱放射率可為0.85、0.86、0.87、0.88、0.89、0.90、0.91、0.92、0.95。 As a thermally conductive filler, as long as it can be applied to the film 0.5W / m. The filler having a thermal conductivity of K or more and a thermal emissivity of 0.85 or more is not particularly limited. Specifically, it is composed of alumina, titania, zirconia, ferrite, cerium oxide, zinc oxide, magnesium oxide, aluminum carbide, cerium carbide, aluminum nitride, boron nitride, carbon black, graphite, carbon fiber, and cyanuric acid. One or more selected from the group consisting of melamine. The thermal conductivity can be 0.5W/m. K, 1.0W/m. K, 1.5W/m. K, 2.0W/m. K, 2.5W/m. K, 3.0W/m. The value of K, etc. The heat emissivity may be 0.85, 0.86, 0.87, 0.88, 0.89, 0.90, 0.91, 0.92, 0.95.

為了提升熱傳導及熱放射效率,熱傳導性填料較佳為:由氧化鋁、氧化鈦、氧化鋯、鐵氧體、氧化矽、氧化鋅、氧化鎂、碳化鋁、碳化矽、氮化鋁、氮化硼及氰尿酸三聚氰胺所選擇之填料A,與由碳黑、石墨及碳纖維所選擇之填料B之組合; 或由氧化鋁、氧化鈦、氧化鋯、鐵氧體、氧化矽、氧化鋅、氧化鎂、碳化鋁、碳化矽、氮化鋁及氮化硼所選擇之填料C,與氰尿酸三聚氰胺之填料D之組合。 In order to improve heat transfer and heat radiation efficiency, the thermally conductive filler is preferably: alumina, titania, zirconia, ferrite, yttria, zinc oxide, magnesium oxide, aluminum carbide, tantalum carbide, aluminum nitride, nitride a combination of boron and melamine cyanurate selected filler A, and filler B selected from carbon black, graphite and carbon fibers; Or filler C selected from alumina, titania, zirconia, ferrite, cerium oxide, zinc oxide, magnesium oxide, aluminum carbide, tantalum carbide, aluminum nitride and boron nitride, and filler D of melamine cyanurate The combination.

例如,填料A與填料B之組合可列舉:氧化鋁/碳黑、氧化鈦/碳黑、氧化鋯/碳黑、鐵氧體/碳黑、氧化矽/碳黑、氧化鋅/碳黑、氧化鎂/碳黑、碳化鋁/碳黑、碳化矽/碳黑、氮化鋁/碳黑、氮化硼/碳黑及氰尿酸三聚氰胺/碳黑;氧化鋁/石墨、氧化鈦/石墨、氧化鋯/石墨、鐵氧體/石墨、氧化矽/石墨、氧化鋅/石墨、氧化鎂/石墨、碳化鋁/石墨、碳化矽/石墨、氮化鋁/石墨、氮化硼/石墨及氰尿酸三聚氰胺/石墨;氧化鋁/碳纖維、氧化鈦/碳纖維、氧化鋯/碳纖維、鐵氧體/碳纖維、氧化矽/碳纖維、氧化鋅/碳纖維、氧化鎂/碳纖維、碳化鋁/碳纖維、碳化矽/碳纖維、氮化鋁/碳纖維、氮化硼/碳纖維及氰尿酸三聚氰胺/碳纖維。 For example, the combination of the filler A and the filler B may be exemplified by alumina/carbon black, titanium oxide/carbon black, zirconia/carbon black, ferrite/carbon black, cerium oxide/carbon black, zinc oxide/carbon black, oxidation. Magnesium/carbon black, aluminum carbide/carbon black, tantalum carbide/carbon black, aluminum nitride/carbon black, boron nitride/carbon black and melamine cyanurate/carbon black; alumina/graphite, titanium oxide/graphite, zirconia /graphite, ferrite/graphite, yttria/graphite, zinc oxide/graphite, magnesia/graphite, aluminum carbide/graphite, tantalum carbide/graphite, aluminum nitride/graphite, boron nitride/graphite and melamine cyanurate/ Graphite; alumina/carbon fiber, titanium oxide/carbon fiber, zirconia/carbon fiber, ferrite/carbon fiber, cerium oxide/carbon fiber, zinc oxide/carbon fiber, magnesium oxide/carbon fiber, aluminum carbide/carbon fiber, tantalum carbide/carbon fiber, nitriding Aluminum/carbon fiber, boron nitride/carbon fiber and melamine cyanurate/carbon fiber.

例如,填料C與填料D之組合可列舉:氧化鋁/氰尿酸三聚氰胺、氧化鈦/氰尿酸三聚氰胺、氧化鋯/氰尿酸三聚氰胺、鐵氧體/氰尿酸三聚氰胺、氧化矽/氰尿酸三聚氰胺、氧化鋅/氰尿酸三聚氰胺、氧化鎂/氰尿酸三聚氰胺、碳化鋁/氰尿酸三聚氰胺、碳化矽/氰尿酸三聚氰胺、氮化鋁/氰尿酸三聚氰胺及氮化硼/氰尿酸三聚氰胺。 For example, the combination of the filler C and the filler D may be exemplified by alumina/melamine cyanurate, titanium oxide/melamine cyanurate, zirconia/melamine cyanurate, ferrite/melamine cyanurate, cerium oxide/melamine cyanurate, zinc oxide. / Melamine cyanurate, magnesium oxide / melamine cyanurate, aluminum carbonate / melamine cyanurate, lanthanum carbide / melamine cyanurate, aluminum nitride / melamine cyanurate and boron nitride / melamine cyanurate.

更佳之組合為:‧由氧化鋁、碳化矽、氮化鋁及氰尿酸三聚氰胺所選擇之填料,與碳黑之填料之組合;或 ‧氧化鋁之填料與氰尿酸三聚氰胺之填料之組合。 A better combination is: ‧ a filler selected from alumina, tantalum carbide, aluminum nitride and melamine cyanurate, in combination with a filler of carbon black; ‧ Combination of alumina filler and melamine cyanurate filler.

為了提升熱傳導之效率,熱傳導性填料較佳為具有小的粒徑。例如,粒徑較佳為20μm以下,更佳為10μm以下。從作業容易性及取得容易性之觀點來看,粒徑之下限較佳為0.1μm。粒徑可為0.1μm、1μm、5μm、10μm、15μm、20μm。 In order to increase the efficiency of heat conduction, the thermally conductive filler preferably has a small particle diameter. For example, the particle diameter is preferably 20 μm or less, more preferably 10 μm or less. The lower limit of the particle diameter is preferably 0.1 μm from the viewpoint of ease of work and ease of availability. The particle diameter may be 0.1 μm, 1 μm, 5 μm, 10 μm, 15 μm, or 20 μm.

粒徑可藉由雷射繞射散射法而測定。 The particle size can be determined by laser diffraction scattering.

(c)胺甲酸酯系樹脂及熱傳導性填料 (c) urethane resin and thermally conductive filler

胺甲酸酯系樹脂及熱傳導性填料之含有比例,只要可賦予膜特定之熱傳導率、熱放射性、拉伸強度及膜厚則無特別限定。例如,熱傳導性填料相對於胺甲酸酯系樹脂100重量份較佳為含有100至600重量份之範圍,更佳為含有200至500重量份之範圍。 The content ratio of the urethane-based resin and the thermally conductive filler is not particularly limited as long as it can impart specific thermal conductivity, thermal activity, tensile strength, and film thickness to the film. For example, the thermally conductive filler preferably contains 100 to 600 parts by weight, more preferably 200 to 500 parts by weight, based on 100 parts by weight of the urethane resin.

熱傳導性填料使用上述填料A與填料B之組合時,填料B相對於填料A之100重量份較佳為含有0.5至30重量份。填料B之含量可為0.5重量份、10重量份、15重量份、20重量份、25重量份、30重量份。又,使用上述填料C與填料D之組合時,填料D相對於填料C之100重量份較佳為含有1至200重量份。填料D之含量可為1重量份、50重量份、100重量份、200重量份。 Thermal Conductive Filler When the combination of the above filler A and filler B is used, the filler B preferably contains 0.5 to 30 parts by weight based on 100 parts by weight of the filler A. The content of the filler B may be 0.5 parts by weight, 10 parts by weight, 15 parts by weight, 20 parts by weight, 25 parts by weight, or 30 parts by weight. Further, when the combination of the above filler C and the filler D is used, the filler D preferably contains from 1 to 200 parts by weight based on 100 parts by weight of the filler C. The content of the filler D may be 1 part by weight, 50 parts by weight, 100 parts by weight, or 200 parts by weight.

(d)其他成分 (d) Other ingredients

膜係可在不妨礙本發明效果之範圍內含有其他成分。其他成分可舉出著色劑、抗靜電劑、抗氧化劑等。 The film system may contain other components within a range that does not impair the effects of the present invention. Other components include a coloring agent, an antistatic agent, and an antioxidant.

(e)熱放射性膜之平面形狀 (e) Planar shape of the thermal radiation film

熱放射性膜並無特別限定,可為因應需熱放射的機器之要求的平面形狀。 The thermal radiation film is not particularly limited, and may be a planar shape required for a machine that requires heat radiation.

(熱放射性黏著帶) (thermal radioactive adhesive tape) (a)黏著劑層 (a) Adhesive layer

熱放射性黏著帶係例如第1圖之示意剖面圖所示,是指在厚度方向具有上述熱放射性膜1、黏著劑層2者。黏著劑層之厚度例如可在3至50μm之範圍。黏著劑層係可形成於熱放射性膜全面,也可以特定圖案而部分地形成。膜厚可為3μm、10μm、20μm、30μm、40μm、50μm。 The thermal radiation adhesive tape is, for example, a schematic cross-sectional view of Fig. 1 and refers to the thermal radiation film 1 and the adhesive layer 2 in the thickness direction. The thickness of the adhesive layer can be, for example, in the range of 3 to 50 μm. The adhesive layer can be formed entirely in the thermal radiation film or partially formed in a specific pattern. The film thickness may be 3 μm, 10 μm, 20 μm, 30 μm, 40 μm, or 50 μm.

黏著劑層並無特別限定,可使用公知黏著劑所構成之層。例如可舉出丙烯酸系黏著劑。 The adhesive layer is not particularly limited, and a layer composed of a known adhesive can be used. For example, an acrylic adhesive can be mentioned.

丙烯酸系黏著劑中,例如可使用將丙烯酸系單體在任意聚合起始劑存在下聚合藉此所得之黏著劑、或市售黏著劑。 As the acrylic pressure-sensitive adhesive, for example, an adhesive obtained by polymerizing an acrylic monomer in the presence of any polymerization initiator or a commercially available adhesive can be used.

(a-1)丙烯酸系單體 (a-1) Acrylic monomer

丙烯酸系單體中,較佳為含有具有碳數1至10之烷基之(甲基)丙烯酸烷酯作為主成分(50重量%以上)。又,(甲基)丙烯酸酯是指甲基丙烯酸酯或丙烯酸酯。 Among the acrylic monomers, an alkyl (meth)acrylate having an alkyl group having 1 to 10 carbon atoms is preferably contained as a main component (50% by weight or more). Further, (meth) acrylate means methacrylate or acrylate.

具有碳數1至14之烷基之(甲基)丙烯酸烷酯,例如可舉出(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸十二烷酯等。該等(甲基)丙烯酸烷酯可僅使用1種,也可組合2種以上使用。該等(甲基)丙烯酸烷酯中,較佳為具有碳數1至8之烷基之(甲基)丙烯酸烷酯,更佳為具有碳數1至4之烷基之(甲基)丙烯酸烷酯,又更佳為(甲基)丙烯酸正丁酯,特佳為丙烯酸正丁酯。 The alkyl (meth)acrylate having an alkyl group having 1 to 14 carbon atoms may, for example, be methyl (meth)acrylate, ethyl (meth)acrylate or n-propyl (meth)acrylate, or (methyl). Isopropyl acrylate, n-butyl (meth)acrylate, second butyl (meth)acrylate, tert-butyl (meth)acrylate, n-octyl (meth)acrylate, (meth)acrylic acid Octyl ester, 2-ethylhexyl (meth)acrylate, isodecyl (meth)acrylate, dodecyl (meth)acrylate, and the like. These alkyl (meth)acrylates may be used alone or in combination of two or more. Among the alkyl (meth)acrylates, preferred are alkyl (meth)acrylates having an alkyl group having 1 to 8 carbon atoms, more preferably (meth)acrylic groups having an alkyl group having 1 to 4 carbon atoms. The alkyl ester is more preferably n-butyl (meth)acrylate, particularly preferably n-butyl acrylate.

其他丙烯酸系單體可舉出丙烯酸、甲基丙烯酸、丙烯酸羧基乙酯等含有羧基之單體;(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、丙烯酸(4-羥基甲基環己基)-甲酯等含有羥基之單體。該等其他(甲基)丙烯酸酯可僅使用1種,也可組合2種以上使用。(甲基)丙烯酸酯中較佳為包含含有羧基之單體及含有羥基之單體兩者。 Examples of the other acrylic monomer include a carboxyl group-containing monomer such as acrylic acid, methacrylic acid or carboxyethyl acrylate; 2-hydroxyethyl (meth)acrylate; 2-hydroxypropyl (meth)acrylate; a hydroxyl group-containing monomer such as 4-hydroxybutyl acrylate, 6-hydroxyhexyl (meth)acrylate or (4-hydroxymethylcyclohexyl)-methyl acrylate. These other (meth) acrylates may be used alone or in combination of two or more. The (meth) acrylate preferably contains both a carboxyl group-containing monomer and a hydroxyl group-containing monomer.

丙烯酸系單體中含有具有碳數1至10之烷基之(甲基)丙烯酸烷酯作為主成分。因此,丙烯酸系單體係不用使用其他丙烯酸系單體,可為僅由(甲基)丙烯酸烷酯所成者。又,從容易獲得所求性能之黏著劑組成物的觀點來看,其他丙烯酸系單體較佳為含有未達50重量%且1重量%以上,更佳為含有5至30重量%,又更佳為含有5至15重量%。丙烯酸系單體之含量可為1重量%、5重量%、10重量%、30重量%、40重量%、49重量%。 The acrylic monomer contains, as a main component, an alkyl (meth)acrylate having an alkyl group having 1 to 10 carbon atoms. Therefore, the acrylic single system does not require the use of other acrylic monomers, and may be formed only of alkyl (meth)acrylate. Further, from the viewpoint of easily obtaining an adhesive composition having desired properties, the other acrylic monomer preferably contains less than 50% by weight and 1% by weight or more, more preferably 5 to 30% by weight, and still more It is preferably 5 to 15% by weight. The content of the acrylic monomer may be 1% by weight, 5% by weight, 10% by weight, 30% by weight, 40% by weight, or 49% by weight.

進一步,(甲基)丙烯酸酯中可視需要添加乙烯系單體。乙烯系單體例如可舉出伊康酸、馬來酸、巴豆酸、馬來酸酐、伊康酸酐、醋酸乙烯酯、N-乙烯吡咯啶酮、N-乙烯羧酸醯胺類、苯乙烯、N-乙烯己內醯胺等。該等乙烯系單體可僅使用1種,也可組合2種以上使用。 Further, a vinyl monomer may be added to the (meth) acrylate as needed. Examples of the vinyl monomer include itaconic acid, maleic acid, crotonic acid, maleic anhydride, itaconic anhydride, vinyl acetate, N-vinylpyrrolidone, N-vinylcarboxylic acid decylamine, styrene, and the like. N-ethylene caprolactam and the like. These vinyl monomers may be used alone or in combination of two or more.

(a-2)聚合起始劑 (a-2) polymerization initiator

任意使用之聚合起始劑,例如可舉出2,2’-偶氮雙異丁腈、2,2’-偶氮雙(2-甲基丙脒)二硫化物、2,2’-偶氮雙(4-甲氧基-2,4-二甲基戊腈)、2,2’-偶氮雙(2,4-二甲基戊腈)、2,2’-偶氮雙(2-甲基丁腈)、1,1’-偶氮雙(環己烷-1-腈)、2,2’-偶氮雙(2,4,4-三甲基 戊烷)、二甲基-2,2’-偶氮雙(2-甲基丙酸酯)、2,2’-偶氮雙[2-甲基-N-(苯基甲基)-丙脒]鹽酸鹽、2,2’-偶氮雙[2-(3,4,5,6-四氫嘧啶-2-基)丙烷]鹽酸鹽、2,2’-偶氮雙[2-(2-咪唑啉-2-基)丙烷]等偶氮系聚合起始劑;過硫酸鉀、過硫酸銨等過硫酸鹽系聚合起始劑;過氧化苯甲醯、過氧化氫、氫過氧化第三丁基、過氧化二(第三丁基)、過氧苯甲酸第三丁酯、過氧化二異丙苯基、1,1-雙(過氧化第三丁基)-3,3,5-三甲基環己烷、1,1-雙(過氧化第三丁基)環十二烷、過氧化3,3,5-三甲基環己醯、過氧化第三戊酸第三丁酯(t-butyl peroxypivalate)等過氧化物系聚合起始劑;由過硫酸鹽與亞硫酸氫鈉所構成之還原氧化系聚合起始劑等。該等聚合起始劑可僅使用1種,也可組合2種以上使用。 Examples of the polymerization initiator to be used arbitrarily include 2,2'-azobisisobutyronitrile, 2,2'-azobis(2-methylpropionamidine) disulfide, and 2,2'-couple. Nitrogen bis(4-methoxy-2,4-dimethylvaleronitrile), 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2'-azobis (2) -methylbutyronitrile), 1,1'-azobis(cyclohexane-1-carbonitrile), 2,2'-azobis(2,4,4-trimethyl) Pentane), dimethyl-2,2'-azobis(2-methylpropionate), 2,2'-azobis[2-methyl-N-(phenylmethyl)-propane脒] hydrochloride, 2,2'-azobis[2-(3,4,5,6-tetrahydropyrimidin-2-yl)propane] hydrochloride, 2,2'-azobis[2 An azo polymerization initiator such as -(2-imidazolin-2-yl)propane; a persulfate polymerization initiator such as potassium persulfate or ammonium persulfate; benzamidine peroxide, hydrogen peroxide, hydrogen Tert-butyl peroxide, di(tert-butyl peroxide), tert-butyl peroxybenzoate, dicumyl peroxide, 1,1-bis(t-butylperoxy-3)-3, 3,5-trimethylcyclohexane, 1,1-bis(t-butylperoxy)cyclododecane, 3,3,5-trimethylcyclohexanyl peroxide, peroxylated valeric acid A peroxide-based polymerization initiator such as t-butyl peroxypivalate; a reducing oxidation polymerization initiator composed of persulfate and sodium hydrogen sulfite. These polymerization initiators may be used alone or in combination of two or more.

聚合起始劑相對於丙烯酸系單體100重量份較佳為以0.005至1重量份之範圍使用。藉由以該範圍使用聚合起始劑,而可形成改善黏著特性之丙烯酸系黏著劑。進一步,聚合起始劑之使用量更佳為0.1至0.5重量份之範圍。聚合起始劑之使用量可為0.005重量份、0.01重量份、0.1重量份、0.5重量份、1重量份。 The polymerization initiator is preferably used in an amount of from 0.005 to 1 part by weight based on 100 parts by weight of the acrylic monomer. By using a polymerization initiator in this range, an acrylic adhesive having improved adhesion characteristics can be formed. Further, the polymerization initiator is preferably used in an amount of from 0.1 to 0.5 parts by weight. The polymerization initiator may be used in an amount of 0.005 parts by weight, 0.01 parts by weight, 0.1 parts by weight, 0.5 parts by weight, or 1 part by weight.

(a-3)有機溶劑 (a-3) organic solvent

由黏著劑層之形成容易性的觀點來看可含有機溶劑。該有機溶劑並無特別限定,可舉出可使用於黏著劑組成物之公知有機溶劑。例如可舉出己烷、庚烷等脂肪族烴;醋酸甲酯、醋酸乙酯、醋酸丙酯等酯類;甲苯、二甲苯、乙基苯等芳香族系烴。該等有機溶劑可僅使用1種,也可組合2種以上使用。 The organic solvent may be contained from the viewpoint of easiness of formation of the adhesive layer. The organic solvent is not particularly limited, and examples thereof include known organic solvents which can be used for the adhesive composition. Examples thereof include aliphatic hydrocarbons such as hexane and heptane; esters such as methyl acetate, ethyl acetate, and propyl acetate; and aromatic hydrocarbons such as toluene, xylene, and ethylbenzene. These organic solvents may be used alone or in combination of two or more.

又,使用有機溶劑時,較佳為調製其使用比例而使丙烯酸系 黏著劑所構成之固形分含量成為10重量%以上。進一步,更佳為調製使用比例而使固形分含量成為20至50重量%。 Further, when an organic solvent is used, it is preferred to adjust the ratio of use to make acrylic The solid content of the adhesive is 10% by weight or more. Further, it is more preferable to adjust the use ratio so that the solid content is 20 to 50% by weight.

(a-4)其他成分 (a-4) Other ingredients

為了提升黏著劑層之形狀安定性,丙烯酸系黏著劑可具有交聯構造。為了賦予交聯構造,例如相對丙烯酸系黏著劑100重量份,可將異氰酸酯系交聯劑、鋁螯合物系交聯劑以0.01至10重量份之範圍使用。交聯劑之使用量可為0.01重量份、0.1重量份、1.0重量份、5.0重量份、10重量份。 In order to improve the shape stability of the adhesive layer, the acrylic adhesive may have a crosslinked structure. In order to provide the crosslinked structure, for example, the isocyanate crosslinking agent or the aluminum chelate crosslinking agent may be used in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the acrylic pressure-sensitive adhesive. The crosslinking agent may be used in an amount of 0.01 parts by weight, 0.1 parts by weight, 1.0 part by weight, 5.0 parts by weight, or 10 parts by weight.

又,為了提升黏著劑層之熱傳導性,丙烯酸系黏著劑可含有熱傳導性填料。此填料可使用上述熱放射性膜之說明所舉出之熱傳導性填料之任一者。熱傳導性填料相對於丙烯酸系黏著劑100重量份係可以50至500重量份之範圍使用。熱傳導性填料之使用量可為50重量份、100重量份、200重量份、350重量份、500重量份。 Further, in order to improve the thermal conductivity of the adhesive layer, the acrylic adhesive may contain a thermally conductive filler. As the filler, any of the thermally conductive fillers exemplified in the above description of the thermal radiation film can be used. The thermally conductive filler may be used in an amount of 50 to 500 parts by weight based on 100 parts by weight of the acrylic adhesive. The heat conductive filler may be used in an amount of 50 parts by weight, 100 parts by weight, 200 parts by weight, 350 parts by weight, or 500 parts by weight.

(b)含有熱傳導性材料之薄片 (b) a sheet containing a thermally conductive material

為了提升帶的熱傳導性,熱放射性黏著帶係可在熱放射性膜與黏著劑層之間,進一步具有含有由銅、鋁及石墨所選擇之熱傳導性材料之薄片。具體構成係可舉出如第2圖所示之將薄片3直接密接於熱放射性膜1之構成,或如第3圖所示之透過黏著劑層4而將薄片3密接於熱放射性膜1之構成。 In order to improve the thermal conductivity of the tape, the thermal radioactive adhesive tape may further have a sheet containing a thermally conductive material selected from copper, aluminum and graphite between the thermal radiation film and the adhesive layer. The specific configuration is a configuration in which the sheet 3 is directly adhered to the thermal radiation film 1 as shown in Fig. 2, or the sheet 3 is adhered to the thermal radiation film 1 through the adhesive layer 4 as shown in Fig. 3. Composition.

例如可以銅箔之類之熱傳導性材料單獨保持薄片狀形狀時,該薄片可直接使用。又,使用粒子狀之熱傳導性材料時,可藉由與樹脂黏結劑混合而成為薄片狀。 For example, when a thermally conductive material such as a copper foil can be individually held in a sheet-like shape, the sheet can be used as it is. Moreover, when a particulate heat conductive material is used, it can be formed into a sheet shape by mixing with a resin binder.

薄片厚度在不阻礙熱傳導性之範圍內無特別限定,例如可為 10至5000μm。 The thickness of the sheet is not particularly limited insofar as it does not inhibit thermal conductivity, and for example, 10 to 5000 μm.

(熱放射性膜及熱放射性黏著帶之用途) (Use of thermal radiation film and thermal radioactive adhesive tape)

只要是希望使所產生的熱散熱至外部之用途,則熱放射性膜及熱放射性黏著帶可使用於任一種用途。例如可舉出馬達、照明等電氣機器;LSI、IC、電阻等電子機器之散熱用途。尤其可使用於近年來明顯薄膜化之行動電話、或液晶及有機EL等顯示器,因本發明之膜及帶係作為薄膜而可充分發揮,故為適合。 The thermal radiation film and the thermal radioactive adhesive tape can be used for any of the applications as long as it is desired to dissipate the generated heat to the outside. For example, electrical equipment such as motors and illuminations, and heat dissipation applications of electronic devices such as LSIs, ICs, and resistors can be cited. In particular, it is possible to use a mobile phone or a display such as a liquid crystal or an organic EL which has been significantly thinned in recent years, and the film and the tape system of the present invention can be sufficiently exhibited as a film.

實施例 Example

以下使用實施例進一步說明本發明,但本發明並不限定於以下實施例。又,熱放射性膜之熱傳導率、熱放射率及拉伸強度之測定法、熱放射性黏著帶之散熱效果試驗法的實施方式如下。 The present invention will be further illustrated by the following examples, but the present invention is not limited to the following examples. Further, the thermal conductivity of the thermal radiation film, the measurement of the thermal emissivity and the tensile strength, and the heat radiation effect test method of the thermal radiation adhesive tape are as follows.

(熱傳導率) (Thermal conductivity)

熱傳導率之測定係使用ULVAC理工公司製穩態法熱傳導率測定裝置GH-1而進行。將熱放射性膜以50mm徑之鋁板夾住,並將夾持物設置於測定裝置,根據ASTM E1530而測定熱傳導率。 The measurement of the thermal conductivity was carried out using a steady-state thermal conductivity measuring device GH-1 manufactured by ULVAC Corporation. The thermal radiation film was sandwiched between aluminum plates having a diameter of 50 mm, and the holder was placed in a measuring device, and the thermal conductivity was measured in accordance with ASTM E1530.

(熱放射率) (thermal emissivity)

熱放射率之測定係使用京都電子工業公司製熱放射率計D&S AERD而進行。將熱放射性膜裁切為寬及長60mm之大小,藉此而得測定試料。將熱放射率計以標準試料校正後,將測定試料設置於熱放射率計並測定熱放射率。 The measurement of the heat emissivity was carried out using a thermal emissivity meter D&S AERD manufactured by Kyoto Electronics Manufacturing Co., Ltd. The sample was measured by cutting the thermal radiation film into a width of 60 mm in length. After the thermal emissivity meter was calibrated to the standard sample, the measurement sample was placed on a thermal emissivity meter and the thermal emissivity was measured.

(拉伸強度) (Tensile Strength)

將熱放射性膜裁切為寬20mm、長度100mm之大小,藉此而得測定試料。以將測定試料之兩邊固定於島津製作所公司製 AUTOGRAPH AGS-H之方式設置,並以拉伸速度300mm/分鐘拉伸測定試料。測定測定試料破裂時的力,所得值係拉伸強度(N/20mm)。 The sample was measured by cutting the thermal radiation film to a size of 20 mm in width and 100 mm in length. To fix both sides of the test sample to Shimadzu Corporation The sample was set in the manner of AUTOGRAPH AGS-H, and the sample was stretched at a stretching speed of 300 mm/min. The force at which the sample was broken was measured, and the obtained value was tensile strength (N/20 mm).

(散熱效果試驗) (heat dissipation test)

在70μm厚之銅箔(寬及長度150mm)下面的中心,使用厚度10μm之黏著劑而設置加熱器(輸出10W、寬25mm、長度50mm)。於加熱器中心設置熱電偶,並將熱電偶載置於隔熱材上後,將加熱器以恒定輸出(10W)加熱。測定加熱15分鐘後之溫度。所得溫度係基準溫度。 A heater (output 10 W, width 25 mm, length 50 mm) was placed at a center below the 70 μm thick copper foil (width and length 150 mm) using an adhesive having a thickness of 10 μm. After the thermocouple is placed in the center of the heater and the thermocouple is placed on the insulation, the heater is heated at a constant output (10W). The temperature after heating for 15 minutes was measured. The resulting temperature is the reference temperature.

接著,在上述銅箔上將熱放射性黏著帶貼合後,以與基準溫度測定相同之方法而測定加熱15分鐘後之溫度。在第4圖(a)及(b)表示測定時之設置狀況之示意圖。第4圖(a)係俯視圖、第4圖(b)係側面圖。圖中,a代表熱放射性黏著帶、b代表銅箔、c代表加熱器、d代表熱電偶、e代表隔熱材。 Next, after bonding the thermal radiation adhesive tape to the said copper foil, the temperature after heating for 15 minutes was measured by the method similar to the measurement of a reference temperature. Fig. 4 (a) and (b) are schematic views showing the state of installation at the time of measurement. Fig. 4(a) is a plan view and Fig. 4(b) is a side view. In the figure, a represents a thermal radioactive adhesive tape, b represents a copper foil, c represents a heater, d represents a thermocouple, and e represents a heat insulating material.

由測定溫度減去基準溫度,並使用所得值評估散熱效果。減算值為-10℃以下時則散熱效果大並評估為○,高於-10℃時則散熱效果不足並評估為×。 The reference temperature is subtracted from the measured temperature, and the obtained value is used to evaluate the heat dissipation effect. When the reduction value is below -10 °C, the heat dissipation effect is large and evaluated as ○. When the temperature is higher than -10 °C, the heat dissipation effect is insufficient and evaluated as ×.

實施例1 Example 1 (熱放射性膜) (thermal radiation film)

在胺甲酸酯樹脂前驅物(大日精化工業公司製DAIFERAMINE MAU-5022,固形分35重量%,重量平均分子量6至7萬)286重量份中,添加異氰酸酯系交聯劑(日本聚胺甲酸酯公司製CORONATE L-55E,固形分55重量%)57重量份、氧化鋁(昭和電工公司製AL-47H,粒徑2μm)400重量份及碳黑(太平化學公司製CB4873)12 重量份並攪拌。攪拌後藉由脫泡而得熱放射性膜製造用組成物。 An isocyanate-based crosslinking agent (Japan Polyamine A) was added to 286 parts by weight of a urethane resin precursor (DAIFERAMINE MAU-5022, manufactured by Dairi Seiki Co., Ltd., solid content: 35 wt%, weight average molecular weight: 6 to 70,000). CORONATE L-55E manufactured by Oleate Co., Ltd., 55 parts by weight of solid content) 57 parts by weight, 400 parts by weight of alumina (AL-47H manufactured by Showa Denko Co., Ltd., particle size: 2 μm), and carbon black (CB4873, manufactured by Taiping Chemical Co., Ltd.) Parts by weight and stirred. After stirring, the composition for producing a thermal radiation film is obtained by defoaming.

將所得組成物以特定厚度塗布於剝離膜上。將所得塗膜以100℃乾燥2分鐘後,在40℃熟成3日,藉此獲得厚度25μm之熱放射性膜。 The obtained composition was applied to the release film at a specific thickness. The obtained coating film was dried at 100 ° C for 2 minutes, and then aged at 40 ° C for 3 days, whereby a thermal radiation film having a thickness of 25 μm was obtained.

(熱放射性黏著帶) (thermal radioactive adhesive tape)

將丙烯酸正丁酯91重量份、丙烯酸8重量份、甲基丙烯酸2-羥基乙酯1重量份、偶氮雙異丁腈(AIBN,聚合起始劑)0.2重量份、溶劑(醋酸乙酯:甲苯=9:1(重量比))150重量份混合。將所得混合物在氮氣流中以85℃反應5小時,藉此獲得固形分40重量%、黏度7000mP.s之丙烯酸系黏著劑。 91 parts by weight of n-butyl acrylate, 8 parts by weight of acrylic acid, 1 part by weight of 2-hydroxyethyl methacrylate, 0.2 parts by weight of azobisisobutyronitrile (AIBN, polymerization initiator), and a solvent (ethyl acetate: Toluene = 9:1 (weight ratio)) 150 parts by weight of the mixture. The obtained mixture was reacted at 85 ° C for 5 hours in a nitrogen stream, thereby obtaining a solid content of 40% by weight and a viscosity of 7000 mP. s acrylic adhesive.

在上述丙烯酸系黏著劑100重量份中,添加異氰酸酯系交聯劑(日本聚胺甲酸酯公司製CORONATE L-55E)1重量份及氧化鋁(昭和電工公司製AL-47H)120重量份並攪拌。攪拌後藉由脫泡而獲得黏著劑層製造用組成物。 1 part by weight of an isocyanate-based crosslinking agent (CORONATE L-55E manufactured by Nippon Polyurethane Co., Ltd.) and 120 parts by weight of alumina (AL-47H manufactured by Showa Denko Co., Ltd.) were added to 100 parts by weight of the acrylic pressure-sensitive adhesive. Stir. After stirring, the composition for producing an adhesive layer was obtained by defoaming.

將所得組成物以特定厚度塗布於剝離膜上。將所得塗膜以100℃乾燥2分鐘,藉此形成厚度25μm之黏著劑層。將黏著劑層轉印至熱放射性膜,以40℃熟成3日,藉此獲得熱放射性黏著帶。 The obtained composition was applied to the release film at a specific thickness. The obtained coating film was dried at 100 ° C for 2 minutes, thereby forming an adhesive layer having a thickness of 25 μm. The adhesive layer was transferred to a thermal radioactive film and aged at 40 ° C for 3 days, thereby obtaining a thermal radioactive adhesive tape.

實施例2 Example 2

除了將熱放射性膜製造用組成物所含氧化鋁之添加量設為200重量份以外,以與實施例1相同方式而獲得熱放射性黏著帶。 A thermal radioactive adhesive tape was obtained in the same manner as in Example 1 except that the amount of alumina contained in the composition for producing a thermal radiation film was 200 parts by weight.

實施例3 Example 3

除了將熱放射性膜製造用組成物所含氧化鋁之添加量設為500重量份以外,以與實施例1相同方式而獲得熱放射性黏著帶。 A thermal radioactive adhesive tape was obtained in the same manner as in Example 1 except that the amount of alumina contained in the composition for producing a thermal radiation film was 500 parts by weight.

實施例4 Example 4

除了將熱放射性膜製造用組成物所含氧化鋁之添加量設為180重量份,並添加氰尿酸三聚氰胺(日產化學工業公司製MC-6000,粒徑2μm)80重量份取代碳黑以外,以與實施例1相同方式而獲得熱放射性黏著帶。 In addition, the addition amount of the alumina contained in the composition for the production of the thermal radiation film was 180 parts by weight, and 80 parts by weight of the substituted carbon black of melamine cyanurate (manufactured by Nissan Chemical Industries, Ltd., particle size: 2 μm) was added. A thermal radioactive adhesive tape was obtained in the same manner as in Example 1.

實施例5 Example 5

除了添加氰尿酸三聚氰胺(日產化學工業公司製MC-6000,粒徑2μm)170重量份而取代熱放射性膜製造用組成物所含之氧化鋁以外,以與實施例1相同方式而獲得熱放射性黏著帶。 A thermal radioactive adhesive was obtained in the same manner as in Example 1 except that 170 parts by weight of melamine cyanurate (MC-6000 manufactured by Nissan Chemical Industries, Inc., particle size: 2 μm) was added instead of the alumina contained in the composition for producing a thermal radiation film. band.

實施例6 Example 6

除了添加氮化鋁(tokuyama公司製H grade,粒徑1μm)而取代熱放射性膜製造用組成物所含之氧化鋁以外,以與實施例1相同方式而獲得熱放射性黏著帶。 A thermal radioactive adhesive tape was obtained in the same manner as in Example 1 except that aluminum nitride (having a particle size of 1 μm manufactured by Tokuyama Co., Ltd.) was added instead of the alumina contained in the composition for producing a thermal radiation film.

實施例7 Example 7

除了添加碳化矽(信越電氣精鍊公司製H3000,粒徑4μm)而取代熱放射性膜製造用組成物所含之氧化鋁以外,以與實施例1相同方式而獲得熱放射性黏著帶。 A thermal radioactive adhesive tape was obtained in the same manner as in Example 1 except that cerium carbide (H3000 manufactured by Shin-Etsu Chemical Co., Ltd., particle size: 4 μm) was added instead of the alumina contained in the composition for producing a thermal radiation film.

實施例8 Example 8

將胺甲酸酯系熱可塑性樹脂(kuraray公司製KURAMIRON U1190,固形分100重量%)131重量份於60℃溶解於131重量份之N,N’-二甲基甲醯胺。於所得溶液添加氧化鋁(昭和電工公司製AL-47H,粒徑2μm)400重量份及碳黑(太平化學公司製CB4873)12重量份並攪拌。攪拌後藉由脫泡而得熱放射性膜製造用組成物。 131 parts by weight of a urethane-based thermoplastic resin (KURAMIRON U1190, manufactured by Kuraray Co., Ltd., solid content: 100% by weight) was dissolved in 131 parts by weight of N,N'-dimethylformamide at 60 °C. To the solution obtained, 400 parts by weight of alumina (AL-47H, manufactured by Showa Denko Co., Ltd., particle size: 2 μm) and 12 parts by weight of carbon black (CB4873 manufactured by Taiping Chemical Co., Ltd.) were added and stirred. After stirring, the composition for producing a thermal radiation film is obtained by defoaming.

將所得組成物以特定厚度塗布於剝離膜上。將所得塗膜以150℃乾燥3分鐘後,以40℃熟成3日,藉此獲得厚度25μm 之熱放射性膜。 The obtained composition was applied to the release film at a specific thickness. The obtained coating film was dried at 150 ° C for 3 minutes, and then aged at 40 ° C for 3 days, thereby obtaining a thickness of 25 μm. Thermal radioactive film.

除了使用上述膜以外,以與實施例1相同方式而獲得熱放射性黏著帶。 A thermal radioactive adhesive tape was obtained in the same manner as in Example 1 except that the above film was used.

實施例9 Example 9

除了使用kuraray公司製KURAMIRON U9185(固形分100重量%)作為胺甲酸酯系熱可塑性樹脂以外,以與實施例8相同方式而獲得熱放射性黏著帶。 A thermal radioactive adhesive tape was obtained in the same manner as in Example 8 except that KURAMIRON U9185 (solid content: 100% by weight) manufactured by Kuraray Co., Ltd. was used as the urethane-based thermoplastic resin.

比較例1 Comparative example 1

除了不在熱放射性膜製造用組成物中添加氧化鋁以外,以與實施例1相同方式而獲得熱放射性黏著帶。 A thermal radioactive adhesive tape was obtained in the same manner as in Example 1 except that alumina was not added to the composition for producing a thermal radiation film.

比較例2 Comparative example 2

除了將熱放射性膜製造用組成物所含氧化鋁之添加量設為700重量份以外,以與實施例1相同方式而欲製造熱放射性膜,但無法成膜作為膜。 The thermal radiation film was produced in the same manner as in Example 1 except that the amount of alumina contained in the composition for producing a thermal radiation film was 700 parts by weight, but the film could not be formed as a film.

比較例3 Comparative example 3

除了不在熱放射性膜製造用組成物中添加碳黑以外,以與實施例1相同方式而獲得熱放射性黏著帶。 A thermal radioactive adhesive tape was obtained in the same manner as in Example 1 except that carbon black was not added to the composition for producing a thermal radiation film.

比較例4 Comparative example 4

除了在熱放射性膜製造用組成物中不添加氧化鋁及碳黑,且添加氰尿酸三聚氰胺(日產化學工業公司製MC-6000,粒徑2μm)150重量份以外,以與實施例1相同方式而獲得熱放射性黏著帶。 In the same manner as in Example 1, except that alumina and carbon black were not added to the composition for producing a thermal radiation film, and 150 parts by weight of melamine cyanurate (MC-6000 manufactured by Nissan Chemical Industries, Ltd., particle size: 2 μm) was added. Get a radioactive adhesive tape.

比較例5 Comparative Example 5

除了在熱放射性膜製造用組成物中不添加氧化鋁及碳黑,且添加鋁(東洋鋁公司製11-0018)200重量份以外,以與實施例1相 同方式而獲得熱放射性黏著帶。 In addition to the addition of aluminum oxide and carbon black to the composition for producing a thermal radiation film, and adding 200 parts by weight of aluminum (11-0018, manufactured by Toyo Aluminum Co., Ltd.), it was the same as Example 1. In the same way, a thermal radioactive adhesive tape is obtained.

比較例6 Comparative Example 6

在環氧系樹脂(新日鐵住金化學公司製YP-50EK35,固形分35重量%,重量平均分子量約7萬)286重量份中,添加氧化鋁(昭和電工公司製AL-47H,粒徑2μm)200重量份及碳黑(太平化學公司製CB4873)12重量份並攪拌。攪拌後藉由脫泡而獲得熱放射性膜製造用組成物。 Alumina (AL-47H, manufactured by Showa Denko Co., Ltd., particle size 2 μm) was added to 286 parts by weight of epoxy resin (YP-50EK35, manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd., solid content: 35 wt%, weight average molecular weight: about 70,000). 200 parts by weight and carbon black (CB4873 manufactured by Taiping Chemical Co., Ltd.) 12 parts by weight and stirred. After stirring, the composition for producing a thermal radiation film was obtained by defoaming.

除了使用上述膜製造用組成物以外,以與實施例1相同方式而獲得熱放射性膜。所得膜不具有充分拉伸強度。 A thermal radiation film was obtained in the same manner as in Example 1 except that the above composition for film production was used. The resulting film did not have sufficient tensile strength.

比較例7 Comparative Example 7

除了熱放射性膜製造用組成物所含氧化鋁之添加量為400重量份以外,以與比較例6相同方式而欲製造熱放射性膜,但無法成膜作為膜。 The thermal radiation film was produced in the same manner as in Comparative Example 6, except that the amount of alumina contained in the composition for producing a thermal radiation film was 400 parts by weight, but the film could not be formed as a film.

比較例8 Comparative Example 8

在丙烯酸系樹脂(DIC公司製ACRYDIC A-804,固形分50重量%)200重量份中,添加異氰酸酯系交聯劑(日本聚胺甲酸酯公司製CORONATE L-55E,固形分55重量%)2重量份、氧化鋁(昭和電工公司製AL-47H,粒徑2μm)200重量份及碳黑(太平化學公司製CB4873)12重量份並攪拌。攪拌後,藉由脫泡而獲得熱放射性膜製造用組成物。 An isocyanate-based crosslinking agent (CORONATE L-55E, manufactured by Nippon Polyurethane Co., Ltd., solid content: 55 wt%) was added to 200 parts by weight of an acrylic resin (ACRYDIC A-804, manufactured by DIC Co., Ltd., 50% by weight). 2 parts by weight, 200 parts by weight of alumina (AL-47H manufactured by Showa Denko Co., Ltd., particle size: 2 μm), and 12 parts by weight of carbon black (CB4873 manufactured by Taiping Chemical Co., Ltd.) were stirred and stirred. After stirring, a composition for producing a thermal radiation film was obtained by defoaming.

除了使用上述膜製造用組成物以外,以與實施例1相同方式而獲得熱放射性膜。所得膜不具有充分拉伸強度。 A thermal radiation film was obtained in the same manner as in Example 1 except that the above composition for film production was used. The resulting film did not have sufficient tensile strength.

比較例9 Comparative Example 9

除了將熱放射性膜製造用組成物所含氧化鋁之添加量設為 400重量份以外,以與比較例8相同方式而欲製造熱放射性膜,但無法成膜作為膜。 In addition to setting the amount of alumina contained in the composition for producing a thermal radiation film to A thermal radioactive film was produced in the same manner as in Comparative Example 8 except for 400 parts by weight, but a film could not be formed as a film.

比較例10 Comparative Example 10

將聚酯系熱可塑性樹脂(三菱Rayon公司製ER-1082,固形分100重量%,重量平均分子量約3萬)100重量份,於50℃溶解於100重量份之醋酸乙酯。在所得溶液中添加氧化鋁(昭和電工公司製AL-47H,粒徑2μm)200重量份及碳黑(太平化學公司製CB4873)12重量份並攪拌。攪拌後藉由脫泡而獲得熱放射性膜製造用組成物。 100 parts by weight of a polyester-based thermoplastic resin (ER-1082, manufactured by Mitsubishi Rayon Co., Ltd., 100% by weight solids, and a weight average molecular weight of about 30,000) was dissolved in 100 parts by weight of ethyl acetate at 50 °C. To the obtained solution, 200 parts by weight of alumina (AL-47H, manufactured by Showa Denko Co., Ltd., particle size: 2 μm) and 12 parts by weight of carbon black (CB4873 manufactured by Taiping Chemical Co., Ltd.) were added and stirred. After stirring, the composition for producing a thermal radiation film was obtained by defoaming.

將所得組成物以特定厚度塗布於剝離膜上。將所得塗膜以100℃乾燥3分鐘後,於40℃熟成3日,藉此獲得厚度25μm之熱放射性膜。所得膜不具有充分拉伸強度。 The obtained composition was applied to the release film at a specific thickness. The obtained coating film was dried at 100 ° C for 3 minutes, and then aged at 40 ° C for 3 days, whereby a thermal radiation film having a thickness of 25 μm was obtained. The resulting film did not have sufficient tensile strength.

比較例11 Comparative Example 11

除了將熱放射性膜製造用組成物所含氧化鋁之添加量設為400重量份以外,以與比較例10相同方式而欲製造熱放射性膜,但無法成膜作為膜。 The thermal radiation film was produced in the same manner as in Comparative Example 10 except that the amount of alumina contained in the composition for producing a thermal radiation film was 400 parts by weight, but the film could not be formed as a film.

所得熱放射性膜及熱放射性黏著帶之各種試驗結果、所使用材料種類及使用量皆示於表1。 The various test results of the obtained thermal radiation film and the thermal radioactive adhesive tape, the types of materials used, and the amounts used are shown in Table 1.

第5圖係表示實施例1及比較例1之熱放射性黏著帶在散熱效果試驗中測定溫度之經時變化的圖表。第5圖中一併表示不具有熱放射性膜之熱放射性黏著帶之圖表。 Fig. 5 is a graph showing changes in the measured temperature over time in the heat radiation effect test of the thermal radiation adhesive tapes of Example 1 and Comparative Example 1. Figure 5 shows a diagram of a thermal radioactive adhesive tape without a thermal radiation film.

由表1及第5圖可確認具有0.5W/m.K以上之熱傳導率、0.85以上之熱放射率、5N/20mm以上之拉伸強度及10至30μm之膜厚的實施例之熱放射性膜其散熱效果較高。 It can be confirmed from Table 1 and Figure 5 that it has 0.5 W/m. The thermal radiation film of the embodiment having a thermal conductivity of K or more, a thermal emissivity of 0.85 or more, a tensile strength of 5 N/20 mm or more, and a film thickness of 10 to 30 μm is high in heat dissipation.

1‧‧‧熱放射性膜 1‧‧‧Thermal radioactive film

2‧‧‧黏著劑層 2‧‧‧Adhesive layer

Claims (8)

一種熱放射性膜,係含有胺甲酸酯系樹脂與熱傳導性填料,且具有0.5W/m.K以上之熱傳導率、0.85以上之熱放射率、5N/20mm以上之拉伸強度及10至30μm之膜厚;前述熱傳導性填料係:由氧化鋁、氧化鈦、氧化鋯、鐵氧體、氧化矽、氧化鋅、氧化鎂、碳化鋁、碳化矽、氮化鋁、氮化硼及氰尿酸三聚氰胺所選擇之填料A,與由碳黑、石墨及碳纖維所選擇之填料B之組合;由氧化鋁、氧化鈦、氧化鋯、鐵氧體、氧化矽、氧化鋅、氧化鎂、碳化鋁、碳化矽、氮化鋁及氮化硼所選擇之填料C,與氰尿酸三聚氰胺之填料D之組合;或至少含有由碳化鋁、氮化鋁及氮化硼所選擇之填料者。 A thermal radioactive film comprising an urethane resin and a thermally conductive filler and having a thickness of 0.5 W/m. Thermal conductivity above K, thermal emissivity of 0.85 or more, tensile strength of 5N/20 mm or more, and film thickness of 10 to 30 μm; the above thermally conductive filler: by alumina, titania, zirconia, ferrite, oxidation Combination of filler A selected from cerium, zinc oxide, magnesium oxide, aluminum carbide, cerium carbide, aluminum nitride, boron nitride and melamine cyanurate, and filler B selected from carbon black, graphite and carbon fibers; a combination of filler C selected from titanium oxide, zirconium oxide, ferrite, lanthanum oxide, zinc oxide, magnesium oxide, aluminum carbide, tantalum carbide, aluminum nitride and boron nitride, and filler D of melamine cyanurate; or It contains at least a filler selected from aluminum carbide, aluminum nitride and boron nitride. 如申請專利範圍第1項所述之熱放射性膜,其中,前述熱傳導性填料相對於前述胺甲酸酯系樹脂100重量份係含有100至600重量份。 The thermally conductive film according to the above aspect of the invention, wherein the thermally conductive filler is contained in an amount of 100 to 600 parts by weight based on 100 parts by weight of the urethane resin. 如申請專利範圍第1項所述之熱放射性膜,其中,前述填料B相對於前述填料A之100重量份係含有0.5至30重量份,前述填料D相對於前述填料C之100重量份係含有1至200重量份。 The thermal radiation film according to claim 1, wherein the filler B contains 0.5 to 30 parts by weight based on 100 parts by weight of the filler A, and the filler D is contained in 100 parts by weight of the filler C. 1 to 200 parts by weight. 如申請專利範圍第1項所述之熱放射性膜,其中,前述熱傳導性填料係:由氧化鋁、碳化矽、氮化鋁及氰尿酸三聚氰胺所選擇之填料與碳黑之填料之組合;或 氧化鋁之填料與氰尿酸三聚氰胺之填料之組合。 The thermal radiation film according to claim 1, wherein the thermally conductive filler is a combination of a filler selected from alumina, tantalum carbide, aluminum nitride, and melamine cyanurate and a filler of carbon black; or A combination of a filler of alumina and a filler of melamine cyanurate. 如申請專利範圍第1項所述之熱放射性膜,其中,前述胺甲酸酯系樹脂之厚度為25μm時,係具有5N/20mm以上之拉伸強度。 The thermal radiation film according to the first aspect of the invention, wherein the urethane resin has a tensile strength of 5 N/20 mm or more when the thickness of the urethane resin is 25 μm. 一種熱放射性黏著帶,係在厚度方向具有申請專利範圍第1項所述之熱放射性膜與黏著劑層。 A thermal radioactive adhesive tape having a thermal radiation film and an adhesive layer as described in claim 1 in the thickness direction. 如申請專利範圍第6項所述之熱放射性黏著帶,其係在前述熱放射性膜與黏著劑層之間,進一步具有含有由銅、鋁及石墨所選擇之熱傳導性材料之薄片。 The thermal radioactive adhesive tape according to claim 6, which is provided between the thermal radiation film and the adhesive layer, and further comprises a sheet containing a thermally conductive material selected from copper, aluminum and graphite. 如申請專利範圍第7項所述之熱放射性黏著帶,係在前述熱放射性膜與含有熱傳導性材料之薄片之間,進一步具有黏著劑層。 The thermal radioactive adhesive tape according to claim 7, wherein the thermal radiation film and the heat conductive material-containing sheet further have an adhesive layer.
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