TWI603775B - Chlorine dioxide gas processing structure, chlorine dioxide gas processing device, sterilization device, and environmental purification device - Google Patents

Chlorine dioxide gas processing structure, chlorine dioxide gas processing device, sterilization device, and environmental purification device Download PDF

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TWI603775B
TWI603775B TW103107695A TW103107695A TWI603775B TW I603775 B TWI603775 B TW I603775B TW 103107695 A TW103107695 A TW 103107695A TW 103107695 A TW103107695 A TW 103107695A TW I603775 B TWI603775 B TW I603775B
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chlorine dioxide
dioxide gas
air
concentration
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TW201500102A (en
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松永敏宏
山本秀樹
石井健三
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Fmi股份有限公司
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
    • A61L2/16Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using chemical substances
    • A61L2/20Gaseous substances, e.g. vapours
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/68Halogens or halogen compounds
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B11/00Oxides or oxyacids of halogens; Salts thereof
    • C01B11/02Oxides of chlorine
    • C01B11/022Chlorine dioxide (ClO2)
    • C01B11/028Separation; Purification
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2202/00Aspects relating to methods or apparatus for disinfecting or sterilising materials or objects
    • A61L2202/20Targets to be treated
    • A61L2202/24Medical instruments, e.g. endoscopes, catheters, sharps
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2253/00Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10Inorganic adsorbents
    • B01D2253/102Carbon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2253/00Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10Inorganic adsorbents
    • B01D2253/112Metals or metal compounds not provided for in B01D2253/104 or B01D2253/106
    • B01D2253/1122Metals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/204Inorganic halogen compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/80Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/804UV light

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Veterinary Medicine (AREA)
  • Public Health (AREA)
  • General Health & Medical Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • Epidemiology (AREA)
  • Inorganic Chemistry (AREA)
  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
  • Treating Waste Gases (AREA)
  • Separation Of Gases By Adsorption (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)

Description

二氧化氯氣體處理結構、二氧化氯氣體處理裝置、殺菌裝置及環境淨化裝置 Chlorine dioxide gas treatment structure, chlorine dioxide gas treatment device, sterilization device and environmental purification device

本發明係關於將作用於淨化周圍環境之二氧化氯氣體,以短時間降低至對人體安全之濃度的二氧化氯氣體處理結構、二氧化氯氣體處理裝置、殺菌裝置及環境淨化裝置。 The present invention relates to a chlorine dioxide gas treatment structure, a chlorine dioxide gas treatment device, a sterilization device, and an environmental purification device which are used to purify chlorine dioxide gas in the surrounding environment and are reduced to a safe concentration for a short period of time.

在人生活的空間內,包含著例如塵埃、香煙的煙等極小微粒、各種大氣汙染物質、浮游菌類、源自塗料等化學物質之有機揮發氣體、及源自人體與各種製品等之含有異味等的各種微粒、氣體、黴菌、有害細菌等。 In the space where people live, there are extremely small particles such as dust and cigarette smoke, various atmospheric pollutants, floating bacteria, organic volatile gases derived from chemicals such as paints, and odors derived from human bodies and various products. Various kinds of particles, gases, molds, harmful bacteria, and the like.

為了減少這些對人體有害的細菌等,會進行殺菌/除臭等淨化處理。二氧化氯氣體從過去以來便已知在殺菌/除臭等淨化作用上極為優異。但是二氧化氯氣體在常溫、常壓下具有如氯或臭氧般的刺激性氣味,且對光與熱不穩定。因此,為了能在沒有危險性的穩定狀態下使用二氧化氯氣體,開發了讓二氧化氯氣體在純水中以鹼加以穩定化之穩定性二氧化氯。於是提出了將凝膠狀態、 液體狀態或固體狀態之穩定性二氧化氯加以活性化來把二氧化氯氣體取出,使其接觸空間內的淨化對象物,來廣範圍地淨化空間內部之技術。 In order to reduce these bacteria that are harmful to the human body, purification treatment such as sterilization/deodorization is performed. Chlorine dioxide gas has been known from the past to be extremely excellent in purification such as sterilization/deodorization. However, chlorine dioxide gas has a pungent odor such as chlorine or ozone at normal temperature and normal pressure, and is unstable to light and heat. Therefore, in order to use chlorine dioxide gas in a stable state without danger, a stable chlorine dioxide in which chlorine dioxide gas is stabilized by alkali in pure water has been developed. So proposed the state of the gel, Stability in a liquid state or a solid state The technique in which chlorine dioxide is activated to take out chlorine dioxide gas to contact a purification object in a space to purify the inside of the space in a wide range.

依據過去的以二氧化氯氣體進行之淨化處理,處理後的氣體中所包含的殘餘二氧化氯氣體係以水或活性碳等過濾/吸附而降為低濃度。此外,雖然對於二氧化氯氣體的光分解作用還有許多不明白之處,但已知二氧化氯氣體會被紫外線分解(專利文獻1;段落0004)。因此,作用於淨化處理之二氧化氯氣體,在如前述般降為低濃度後,可排放、擴散至大氣中。 According to the conventional purification treatment with chlorine dioxide gas, the residual chlorine dioxide gas system contained in the treated gas is reduced to a low concentration by filtration/adsorption by water or activated carbon. Further, although there is still a lot of discomfort regarding the photodecomposition of chlorine dioxide gas, it is known that chlorine dioxide gas is decomposed by ultraviolet rays (Patent Document 1; paragraph 0004). Therefore, the chlorine dioxide gas acting on the purification treatment can be discharged and diffused into the atmosphere after being lowered to a low concentration as described above.

只要是為了能直接將二氧化氯氣體排出至屋外而附設有排氣管道之空氣調和裝置,就能將從排氣管道排出的二氧化氯氣體排出至屋外的大量空氣中並加以稀釋。但是,用於淨化於醫院內使用的醫療儀器之殺菌裝置,係讓殺菌後的二氧化氯氣體達到對人體安全的既定濃度以下再擴散至儀器的周圍。在此,對於人體安全之濃度,係依照美國職業安全衛生局(OSHA)的基準的二氧化氯氣體之濃度,在1日8小時或一週40小時的期間內之時間負荷平均值(TWA)被設定在0.1ppm以下。此外,在美國政府工業衛生師協會(ACGIH)的基準中,除了上述以外,並將15分鐘的短時間暴露界限值(STEL)設定為0.3ppm,因而必須要將二氧化氯氣體持續地維持在此種低濃度的範圍內。但是,依據過去的吸附至活性碳等來降低二氧化氯氣體之處理方法,由於在到達比既定濃度還低的濃度後吸附作用會變緩慢,故在二氧化氯氣體到達可排放之低濃度前需要長時間。 As long as it is an air conditioner that can directly discharge chlorine dioxide gas to the outside and is provided with an exhaust duct, the chlorine dioxide gas discharged from the exhaust duct can be discharged to a large amount of air outside the room and diluted. However, the sterilizing device for purifying medical instruments used in hospitals allows the sterilized chlorine dioxide gas to reach a predetermined concentration below the human body and then diffuse around the instrument. Here, the concentration of human body safety is based on the concentration of chlorine dioxide gas based on the Occupational Safety and Health Administration (OSHA) standard, and the time load average (TWA) during the period of 8 hours a day or 40 hours a week is Set to 0.1 ppm or less. In addition, in the benchmark of the American Association of Governmental Industrial Hygienists (ACGIH), in addition to the above, the 15-minute short exposure limit value (STEL) is set to 0.3 ppm, so it is necessary to continuously maintain the chlorine dioxide gas. This range of low concentrations. However, according to the conventional method of reducing chlorine dioxide gas by adsorption to activated carbon or the like, since the adsorption becomes slow after reaching a concentration lower than a predetermined concentration, before the chlorine dioxide gas reaches a low concentration that can be discharged It takes a long time.

另一方面,還提出了將高濃度的二氧化氯氣體排放於空間內,來 淨化空間內的環境之技術。例如,專利文獻2中,藉由純二氧化氯氣體液劑,能以高濃度包含溶存之二氧化氯,並能從高濃度至低濃度作濃度調整(專利文獻2;段落0072)。此外,專利文獻3中揭示一種以比過去還高的濃度使用二氧化氯來燻蒸被汙染的空間或物品之技術。根據專利文獻3,至少要花5至6小時來除去二氧化氯(專利文獻;段落0024)。 On the other hand, it is also proposed to discharge high concentration of chlorine dioxide gas into the space. The technology to purify the environment within the space. For example, in Patent Document 2, the dissolved chlorine dioxide can be contained in a high concentration by a pure chlorine dioxide gas liquid, and the concentration can be adjusted from a high concentration to a low concentration (Patent Document 2; Paragraph 0072). Further, Patent Document 3 discloses a technique of fumigation of a contaminated space or article using chlorine dioxide at a higher concentration than in the past. According to Patent Document 3, it takes at least 5 to 6 hours to remove chlorine dioxide (Patent Document; Paragraph 0024).

在如專利文獻2與專利文獻3之技術般,使用高濃度的二氧化氯之情形,會有需要長時間除去二氧化氯之課題,而妨礙了利用高濃度二氧化氯氣體來做環境淨化之普及。另外,由於即便是低濃度,依據二氧化氯氣體的排放量還是會對外部環境帶來影響,因此需要以短時間有效率的減少二氧化氯氣體之處理結構及裝置。 In the case of using a high concentration of chlorine dioxide as in the techniques of Patent Document 2 and Patent Document 3, there is a problem that it is necessary to remove chlorine dioxide for a long period of time, which hinders the use of a high concentration of chlorine dioxide gas for environmental purification. popular. In addition, since the emission amount of the chlorine dioxide gas affects the external environment even at a low concentration, it is necessary to efficiently reduce the chlorine dioxide gas treatment structure and apparatus in a short time.

本發明人們在對二氧化氯氣體照射紫外線的同時進行各種實驗,為了在短時間減少二氧化氯氣體,發現將以活性碳過濾器等到達所需的低濃度之二氧化氯氣體,在以紫外線照射被水濕潤之鋼絲絨的狀態下重複與其接觸,能在短時間內將二氧化氯氣體減少或消除至對人體安全之低濃度,而達成本發明。 The present inventors conducted various experiments while irradiating ultraviolet rays to chlorine dioxide gas, and in order to reduce chlorine dioxide gas in a short time, it was found that an activated carbon filter or the like is used to reach a desired low concentration of chlorine dioxide gas in ultraviolet rays. The present invention is achieved by repeatedly contacting the steel wool which is wetted with water in a short time to reduce or eliminate the chlorine dioxide gas to a low concentration which is safe for the human body.

《先前技術文獻》 Prior Technical Literature 〈專利文獻〉 <Patent Literature>

專利文獻1:特開平4-300201號公報 Patent Document 1: Japanese Patent Publication No. 4-300201

專利文獻2:特開平11-278808號公報 Patent Document 2: Japanese Patent Publication No. 11-278808

專利文獻3:特表2005-528930號公報 Patent Document 3: Japanese Patent Publication No. 2005-528930

解決為了將作用於淨化周圍環境之二氧化氯氣體降低至對人體安全之濃度需要長時間的問題。 It is a problem to solve the problem that it takes a long time to reduce the chlorine dioxide gas acting on the purification of the surrounding environment to a safe concentration for the human body.

本發明之第1發明係用於減少包含二氧化氯氣體之被處理空氣中的二氧化氯氣體之二氧化氯氣體處理結構,其具備:讓該被處理空氣循環之空間、氣流產生元件、接觸層、及紫外線照射元件,其中該接觸層係將由鐵製細絲固定成綿狀而成之鋼絲絨以水濕潤之接觸層,該氣流產生元件係讓被處理空氣在該空間內循環,而在該紫外線照射元件將紫外線照射至該被處理空氣的循環路徑上之該接觸層的狀態下,該被處理空氣反復地接觸該接觸層。 According to a first aspect of the invention, there is provided a chlorine dioxide gas treatment structure for reducing chlorine dioxide gas in a process air containing chlorine dioxide gas, comprising: a space for circulating the air to be treated, a gas flow generating element, and a contact a layer, and an ultraviolet ray illuminating element, wherein the contact layer is a contact layer of a steel wool which is fixed by a wire made of iron and is wetted by water, the airflow generating element circulates the air to be treated in the space, and The ultraviolet ray irradiation element irradiates ultraviolet rays to the contact layer on the circulation path of the air to be treated, and the air to be treated repeatedly contacts the contact layer.

此處的被處理空氣係指在存在各種微粒、氣體、黴菌、有害細菌等之空間內,經過殺菌、除臭、除黴等作用的包含二氧化氯氣體之空氣,且不限定於人生活的空間,也包含例如殺菌裝置中的空氣。而循環之空間只要是讓被處理空氣循環並重複接觸接觸層之空間即可。此外,也未限定二氧化氯氣體的濃度。 The air to be treated here refers to air containing chlorine dioxide gas which is sterilized, deodorized, and mildewed in a space in which various particles, gases, molds, harmful bacteria, and the like exist, and is not limited to human life. The space also contains, for example, air in the sterilization device. The space of the circulation is only required to circulate the air to be treated and repeatedly contact the contact layer. Further, the concentration of chlorine dioxide gas is not limited.

紫外線之波長,由紫外-可見光吸收光譜分析,較佳係設定為對於二氧化氯氣體吸光度高之波長254nm至270nm的紫外線,但不限定於此(參照第8圖)。其中,第8圖之圖表係以純水做為稀釋溶液將500ppm的穩定性二氧化氯稀釋100倍,再以其作紫外-可見光吸收光譜分析實驗,而得到的測定結果之圖表,縱軸表示吸光度,橫軸表示紫外線之波長。 The wavelength of the ultraviolet light is preferably set to ultraviolet light having a wavelength of 254 nm to 270 nm which is high in absorbance of chlorine dioxide gas by ultraviolet-visible absorption spectrum analysis, but is not limited thereto (see Fig. 8). Among them, the graph in Fig. 8 is a graph in which the 500 ppm of stabilized chlorine dioxide is diluted 100 times with pure water as a dilute solution, and then subjected to ultraviolet-visible absorption spectroscopy analysis, and the obtained measurement results are plotted on the vertical axis. The absorbance, the horizontal axis represents the wavelength of ultraviolet light.

藉由以紫外線照射二氧化氯氣體,使得二氧化氯氣體更容易起反應。藉此,將容易起反應之二氧化氯氣體,經由氣流產生元件循 環,而與在由鐵製細絲固定成綿狀而成之鋼絲絨以水濕潤之接觸層相接觸使鐵氧化,即使是在過去的處理方法中減低緩慢之低濃度中,也具有可以短時間減少被處理空氣中的二氧化氯氣體之有利效果。此處紫外線的強度不限定,可依據紫外線的強度對應之二氧化氯氣體的減低效果(參照第9圖)。第9圖之圖表,係對各邊設為1m的由遮蔽外光之壓克力板所構成之立方體形狀的容器內之二氧化氯氣體,改變紫外線強度加以照射,確認二氧化氯氣體的濃度降低趨勢之圖表。大致在所有的時間帶中可確認紫外線之強度為2倍者(附加△標誌之折線)相對於另一方(附加□標誌之折線),二氧化氯氣體的濃度之降低效果較高。 The chlorine dioxide gas is more easily reacted by irradiating chlorine dioxide gas with ultraviolet rays. Thereby, the chlorine dioxide gas which is easy to react is passed through the gas flow generating element. Ring, which is in contact with a contact layer which is wetted by water in a steel wool which is fixed by a filament made of iron, and which is capable of being oxidized even in a low concentration which is reduced in the past treatment method. Time reduces the beneficial effect of chlorine dioxide gas in the treated air. Here, the intensity of the ultraviolet ray is not limited, and the effect of reducing the chlorine dioxide gas according to the intensity of the ultraviolet ray can be used (refer to Fig. 9). In the graph of Fig. 9, the chlorine dioxide gas in a cubic container made of an acryl plate shielding the outer side of each side is changed, and the intensity of the chlorine dioxide gas is confirmed by changing the ultraviolet ray intensity. A chart that reduces trends. It is confirmed that the intensity of the ultraviolet ray is twice as high as that of the other side (the crease line of the □ mark) with respect to the other side (the fold line of the □ mark added) in all the time zones.

氣流產生元件只要是使產生空氣流動之習知的風扇即可。可依據被處理空氣的量、被處理空氣與接觸層之接觸次數來選擇適當的送風能力之風扇。此外,鋼絲絨由於其表面被二氧化氯氣體氧化而會使二氧化氯氣體的減低效果降低,較佳為收納於讓被處理空氣通過之袋中並能交換者。 The airflow generating element may be any conventional fan that causes air to flow. A fan that selects an appropriate air blowing capability can be selected depending on the amount of air to be treated, the number of times the air to be treated is contacted with the contact layer. Further, the steel wool is oxidized by the chlorine dioxide gas to lower the effect of reducing the chlorine dioxide gas, and is preferably stored in a bag through which the air to be treated passes and can be exchanged.

本發明之第2發明係如第1發明之二氧化氯氣體處理結構,其中該細絲的直徑係0.02mm至0.04mm。即使鋼絲絨的重量相同,細絲的直徑越小,其表面積會變越大,使二氧化氯氣體的接觸面積變大。另一方面,若細絲的直徑變得過小則細絲會折斷而容易散亂。即使是使用相同重量的鋼絲絨,較佳者為細絲直徑0.02mm至0.04mm之鋼絲絨,因為其表面積可增加而且細絲具有不會折斷散亂之寬度。 A second invention of the present invention is the chlorine dioxide gas treatment structure according to the first aspect of the invention, wherein the filament has a diameter of 0.02 mm to 0.04 mm. Even if the weight of the steel wool is the same, the smaller the diameter of the filament, the larger the surface area thereof, and the larger the contact area of the chlorine dioxide gas. On the other hand, if the diameter of the filament becomes too small, the filament is broken and easily scattered. Even if steel wool of the same weight is used, steel wool having a filament diameter of 0.02 mm to 0.04 mm is preferable because its surface area can be increased and the filament has a width which does not break and disperse.

本發明之第3發明係如第1或第2發明之二氧化氯氣體處理結構,其中在照射來自該紫外線照射元件之紫外線的該空間的內面係具 備紫外線反射面。在該空間的內面適合裝載紫外線反射率高的鋁材質之薄膜或板材。依據第3發明,即使使用相同的紫外線燈也能有較強的紫外線照射。 According to a third aspect of the present invention, in the chlorine dioxide gas treatment structure of the first or second aspect, the inner surface of the space for irradiating the ultraviolet ray from the ultraviolet ray irradiation element Prepare an ultraviolet reflective surface. The inner surface of the space is suitable for loading a film or sheet of aluminum material having a high ultraviolet reflectance. According to the third invention, strong ultraviolet rays can be irradiated even if the same ultraviolet lamp is used.

本發明之第4發明係如第1至第3發明之二氧化氯氣體處理結構,其中係具備讓水濕潤鋼絲絨之濕潤元件。濕潤元件可以是讓鋼絲絨於蓄水之水槽中進出,使鋼絲絨成為濕潤狀態,也可以是以噴霧器將水噴霧讓鋼絲絨成為濕潤狀態。藉由配備濕潤元件,讓最初濕潤並設置於該空間內的鋼絲絨不乾燥,而持續接觸層的效果。 According to a fourth aspect of the present invention, in the chlorine dioxide gas treatment structure according to the first to third aspects of the present invention, the wetted element for moisturizing the steel wool with water is provided. The wetting element may allow the steel wool to enter and exit in the water storage tank to make the steel wool wet, or the sprayer may spray the water to make the steel wool wet. By providing a wetting element, the steel wool initially wetted and placed in the space is not dried, and the effect of the contact layer is continued.

本發明之第5發明係用於減少藉由二氧化氯氣體作空氣淨化後的被處理空氣中所包含之二氧化氯氣體之二氧化氯氣體處理裝置,其包含:使該二氧化氯氣體降低至所需濃度之第1次處理元件,及如第1至第4發明中任一項之該二氧化氯氣體處理結構,其中第1次處理元件係具備第1氣流產生元件及活性碳過濾器;而在進行以該第1氣流產生元件讓該被處理空氣中的二氧化氯氣體被該活性碳過濾器吸附之第1次處理後,以該二氧化氯氣體處理結構來減少第1次處理後的被處理空氣中所包含之二氧化氯氣體。 According to a fifth aspect of the invention, there is provided a chlorine dioxide gas treatment apparatus for reducing chlorine dioxide gas contained in a process air after air purification by chlorine dioxide gas, comprising: reducing the chlorine dioxide gas The first processing element of the present invention, wherein the first processing element is provided with the first gas generating element and the activated carbon filter, and the chlorine dioxide gas treatment structure according to any one of the first to fourth inventions And after performing the first treatment in which the chlorine gas in the air to be treated is adsorbed by the activated carbon filter by the first airflow generating element, the chlorine dioxide gas treatment structure is used to reduce the first treatment. The chlorine dioxide gas contained in the treated air after the treatment.

依據第5發明,係用過去的活性碳過濾器吸附處理之技術作為第1次處理元件讓濃度為所需的濃度,例如2.5ppm至5.0ppm之範圍後,以第1至第4發明之二氧化氯氣體處理結構將二氧化氯氣體的濃度降低至對人體安全之濃度。依據以過去技術的活性碳過濾器所做之吸附處理,二氧化氯氣體在到達既定濃度後,吸附作用即會變緩慢。因此,為了讓二氧化氯氣體達到所需濃度,例如低於0.1ppm,將需要長時間。但是依據本發明,係在直到過去的活性 碳過濾器能維持高減低效率之濃度為止,以活性碳過濾器來減低二氧化氯氣體後,再藉由以第1至第4發明之二氧化氯氣體處理結構來降低二氧化氯氣體的濃度,而縮短了到對人體安全之所需的低濃度之時間。 According to the fifth aspect of the invention, the technique for adsorbing and treating the activated carbon filter in the past is used as the first processing element, and the concentration is a desired concentration, for example, in the range of 2.5 ppm to 5.0 ppm, and the first to fourth inventions are used. The chlorine oxide gas treatment structure reduces the concentration of chlorine dioxide gas to a safe concentration for humans. According to the adsorption treatment by the activated carbon filter of the prior art, the adsorption of chlorine dioxide gas becomes slow after reaching a predetermined concentration. Therefore, in order for the chlorine dioxide gas to reach the desired concentration, for example, less than 0.1 ppm, it will take a long time. However, according to the present invention, the activity is until the past The carbon filter can maintain the concentration of high and low efficiency, and the chlorine dioxide gas is reduced by the activated carbon filter, and then the chlorine dioxide gas concentration is lowered by treating the structure with the chlorine dioxide gas of the first to fourth inventions. , and shortened the time required for low concentration to the human body.

此外,由於變成低濃度以後,再使二氧化氯氣體與鋼絲絨反應的緣故,所以可以減少鋼絲絨的使用量。此外,鋼絲絨的交換頻率也會變少。 Further, since the chlorine dioxide gas is reacted with the steel wool after the concentration is lowered, the amount of the steel wool can be reduced. In addition, the exchange frequency of steel wool is also reduced.

本發明之第6發明係用於減少藉由二氧化氯氣體作空氣淨化後的被處理空氣中所包含之二氧化氯氣體之二氧化氯氣體處理裝置,其包含:使該二氧化氯氣體降低至所需濃度之第1次處理元件,及第1至第4發明中任一項之該二氧化氯氣體處理結構,其中第1次處理元件係具備第1氣流產生元件、紫外線照射元件、及做為接觸層之由鐵製細絲固定成綿狀而成之鋼絲絨;而在以該紫外線照射元件對該接觸層照射紫外線之狀態下,進行以該第1氣流產生元件讓該被處理空氣中的二氧化氯氣體循環至該接觸層並與其接觸之第1次處理後,以該二氧化氯氣體處理結構來減少第1次處理後的被處理空氣中所包含之二氧化氯氣體。 According to a sixth aspect of the invention, there is provided a chlorine dioxide gas treatment apparatus for reducing chlorine dioxide gas contained in a process air after air purification by chlorine dioxide gas, comprising: reducing the chlorine dioxide gas And a chlorine dioxide gas treatment structure according to any one of the first to fourth inventions, wherein the first processing element includes a first gas flow generation element, an ultraviolet irradiation element, and a steel wool which is fixed as a contact layer by a wire made of iron; and the ultraviolet light is irradiated to the contact layer by the ultraviolet ray irradiation element, and the air is processed by the first air flow generating element. After the first chlorine dioxide gas is circulated to the contact layer and brought into contact therewith, the chlorine dioxide gas treatment structure is used to reduce the chlorine dioxide gas contained in the air to be treated after the first treatment.

本發明之第6發明中,取代第5發明之以第1次處理元件的活性碳過濾器進行之吸附作用,將以鋼絲絨層為接觸層,一邊照射紫外線,一邊讓被處理空氣循環使其接觸接觸層之元件,做為二氧化氯氣體之第1次處理元件。即使一邊對鋼絲絨照射紫外線一邊接觸被處理空氣,如後述(評價結果2-1)及(評價結果2-2)所示,可確認會發揮與活性碳過濾器大致相同之效果。此處鋼絲絨的鐵絲的細絲之直徑適合在0.02mm至0.04mm。 In the sixth invention of the present invention, in place of the adsorption by the activated carbon filter of the first treatment element of the fifth invention, the steel wool layer is used as a contact layer, and the air to be treated is circulated while being irradiated with ultraviolet rays. The element contacting the contact layer is used as the first processing element of chlorine dioxide gas. Even when the steel wool was irradiated with ultraviolet rays while being irradiated with the air to be treated, as described later (evaluation result 2-1) and (evaluation result 2-2), it was confirmed that the effect was substantially the same as that of the activated carbon filter. Here, the diameter of the filament of the steel wool is suitably 0.02 mm to 0.04 mm.

本發明之第7發明係用於讓醫療用儀器接觸二氧化氯氣體來做殺菌處理之殺菌裝置,其係具備第1至4發明中任一項發明所述之該二氧化氯氣體處理結構。藉由具備本發明之第1至第4發明之二氧化氯氣體處理結構,讓作用於殺菌之高濃度的二氧化氯氣體的濃度達到所需的濃度,例如低於0.1ppm的時間變短,藉由殺菌裝置能讓醫療儀器以短時間的循環來殺菌,而可有效地活用殺菌裝置。 According to a seventh aspect of the invention, the sterilizing apparatus for sterilizing the medical device with the chlorine dioxide gas is provided, and the chlorine dioxide gas treating structure according to any one of the first to fourth aspects of the invention is provided. By having the chlorine dioxide gas treatment structure according to the first to fourth inventions of the present invention, the concentration of the chlorine dioxide gas having a high concentration for sterilization is brought to a desired concentration, for example, a time shorter than 0.1 ppm becomes short. The sterilization device can sterilize the medical instrument in a short cycle, and the sterilization device can be effectively utilized.

本發明之第8發明係將二氧化氯氣體導入至設置有空氣淨化裝置之封閉環境內,讓該環境內的物品與該二氧化氯氣體接觸並加以淨化處理之環境淨化裝置,其係具備第1至4發明中任一項所述之該二氧化氯氣體處理結構。藉由具備本發明之第1至第4發明中任一項發明之二氧化氯氣體處理結構,讓作用於除黴等環境淨化之大量且高濃度的二氧化氯氣體的濃度到達所需濃度,例如0.1ppm,之時間變短,讓以二氧化氯氣體所做之淨化對象擴大。例如即使在住宅建築物多的地區,也能以片材將住宅建物全體覆蓋,以二氧化氯氣體對住宅內所具備之所有物品做除黴及殺菌,並以短時間減少該二氧化氯氣體,做為針對居住者之防過敏手段。 According to an eighth aspect of the present invention, the chlorine dioxide gas is introduced into an enclosed environment in which an air purifying device is installed, and an article in the environment is brought into contact with the chlorine dioxide gas and purified. The chlorine dioxide gas treatment structure according to any one of claims 1 to 4. By the chlorine dioxide gas treatment structure according to any one of the first to fourth aspects of the present invention, the concentration of a large amount of high-concentration chlorine dioxide gas acting on environmental purification such as mold removal is brought to a desired concentration. For example, 0.1 ppm, the time is shortened, and the object of purification by chlorine dioxide gas is expanded. For example, even in areas with many residential buildings, it is possible to cover all the residential buildings with sheets, to remove mold and sterilize all the items in the house with chlorine dioxide gas, and to reduce the chlorine dioxide gas in a short time. As a hypoallergenic means for occupants.

‧依據本發明之第1發明,以氣流產生元件使得變容易起反應之二氧化氯氣體產生循環,而與由鐵製細絲固定成綿狀而成之鋼絲絨被水濕潤之接觸層相接觸,進而使鐵氧化,即便是變成在過去的處理方法中低減緩慢之低濃度,也具有可以短時間減少被處理空氣中的二氧化氯氣體之有利效果。 According to the first invention of the present invention, the gas generating element causes the chlorine dioxide gas which is easily reacted to be circulated, and is in contact with the contact layer in which the steel wool which is fixed by the iron filament is wetted by water. Further, the iron is oxidized, and even if it is a low concentration which is lowered slowly in the conventional treatment method, it has an advantageous effect that the chlorine dioxide gas in the air to be treated can be reduced in a short time.

‧依據本發明之第2發明,較適合者為在相同重量下增加與二氧 化氯氣體反應之鐵的表面積,細絲不會折斷散亂者。 According to the second invention of the present invention, it is more suitable to increase the amount of dioxane under the same weight. The surface area of the iron reacted by the chlorine gas, the filament does not break the scattered person.

‧依據本發明之第3發明,即使使用相同紫外線燈也能照射較強的紫外線。 According to the third invention of the present invention, strong ultraviolet rays can be irradiated even if the same ultraviolet lamp is used.

‧依據本發明之第4發明,藉由具備濕潤元件,可使得最初濕潤並設置於該空間內之鋼絲絨不會變乾,且持續接觸層之效果。 According to the fourth aspect of the present invention, by providing the wetting element, the steel wool which is initially wetted and placed in the space does not dry, and the effect of the contact layer is continued.

‧依據本發明之第5發明,於活性碳過濾器能維持在高減低效率之濃度以活性碳過濾器降低二氧化氯氣體濃度,而在活性碳過濾器產生的降低趨勢到達變緩慢之濃度時,再藉由以第1至第4發明中任一項所述之二氧化氯氣體處理結構降低二氧化氯氣體之濃度,能縮短到對人體安全之所需的低濃度之時間。 According to the fifth invention of the present invention, the activated carbon filter can maintain the concentration at a high and low efficiency, and the concentration of the chlorine dioxide gas is lowered by the activated carbon filter, and when the decreasing tendency of the activated carbon filter reaches a slower concentration. Further, by reducing the concentration of the chlorine dioxide gas by the chlorine dioxide gas treatment structure according to any one of the first to fourth inventions, it is possible to shorten the time required for low concentration to be safe for human body.

‧依據本發明之第6發明,與第5發明同樣地,在對鋼絲絨的接觸層照射紫外線使二氧化氯氣體減低的趨勢到達變緩慢之濃度後,藉由以第1至第4發明中任一項所述之二氧化氯氣體處理結構來降低二氧化氯氣體之濃度,來縮短達到對人體安全之所需的低濃度之時間。 According to the sixth aspect of the present invention, in the same manner as the fifth aspect, the contact layer of the steel wool is irradiated with ultraviolet rays to reduce the concentration of the chlorine dioxide gas, and the concentration is slow, and then the first to fourth inventions are used. Any of the chlorine dioxide gas treatment structures described herein reduce the concentration of chlorine dioxide gas to reduce the time required to achieve a low concentration for human safety.

‧依據本發明之第7發明,能縮短讓二氧化氯氣體的濃度到達所需濃度,例如0.1ppm之時間,藉由殺菌裝置能讓醫療儀器以短時間的循環殺菌,而可有效利用殺菌裝置。 According to the seventh invention of the present invention, it is possible to shorten the concentration of the chlorine dioxide gas to a desired concentration, for example, 0.1 ppm, and the sterilization apparatus can sterilize the medical apparatus in a short period of time, thereby effectively utilizing the sterilization apparatus. .

‧依據本發明之第8發明,讓作用於除黴等環境淨化之大量且高濃度的二氧化氯氣體的濃度到達所需濃度,例如0.1ppm之時間變短,讓二氧化氯氣體所做之淨化對象擴大。 According to the eighth invention of the present invention, the concentration of a large amount of high-concentration chlorine dioxide gas acting on environmental purification such as mold removal reaches a desired concentration, for example, 0.1 ppm, and the chlorine dioxide gas is allowed to be made. The object of purification is expanded.

100、200、300‧‧‧二氧化氯氣體處理裝置 100, 200, 300‧‧‧ chlorine dioxide gas treatment device

400‧‧‧殺菌裝置 400‧‧‧ sterilizer

10‧‧‧第1次處理元件 10‧‧‧1st processing component

20‧‧‧二氧化氯氣體處理結構 20‧‧‧ chlorine dioxide gas treatment structure

30‧‧‧導入空氣 30‧‧‧Introduction of air

40‧‧‧中間處理空氣 40‧‧‧Intermediate air treatment

50‧‧‧排放空氣 50‧‧‧Draining air

11‧‧‧活性碳過濾器 11‧‧‧Active carbon filter

12‧‧‧容器 12‧‧‧ Container

13‧‧‧風扇 13‧‧‧Fan

14‧‧‧箭頭 14‧‧‧ arrow

15‧‧‧偵測吸引口 15‧‧‧Detecting the suction port

16‧‧‧二氧化氯氣體用偵測管 16‧‧‧Detection tube for chlorine dioxide gas

21‧‧‧鋼絲絨 21‧‧‧ Steel wool

22‧‧‧容器 22‧‧‧ Container

23‧‧‧風扇 23‧‧‧Fan

24‧‧‧紫外線照射元件 24‧‧‧UV illumination components

25‧‧‧箭頭 25‧‧‧ arrow

26‧‧‧貯水盤 26‧‧‧Water storage tray

27‧‧‧濃度偵測位置 27‧‧‧ Concentration detection location

28‧‧‧鋁箔 28‧‧‧Aluminum foil

60‧‧‧第1次處理元件 60‧‧‧1st processing component

61‧‧‧鋼絲絨 61‧‧‧ Steel wool

62‧‧‧容器 62‧‧‧ Container

63‧‧‧風扇 63‧‧‧Fan

64‧‧‧紫外線照射元件 64‧‧‧UV illumination components

70‧‧‧容器 70‧‧‧ container

71‧‧‧第1次處理元件 71‧‧‧1st processing component

72‧‧‧二氧化氯氣體處理結構 72‧‧‧ chlorine dioxide gas treatment structure

80‧‧‧醫療器具收納部 80‧‧‧ Medical Device Storage Department

81‧‧‧二氧化氯氣體產生元件 81‧‧‧ chlorine dioxide gas generating components

82‧‧‧第1次處理元件 82‧‧‧1st processing component

83‧‧‧二氧化氯氣體處理結構 83‧‧‧ chlorine dioxide gas treatment structure

84‧‧‧通風口 84‧‧‧ vents

85‧‧‧穩定性二氧化氯水 85‧‧‧Stable chlorine dioxide water

86‧‧‧紫外線照射元件 86‧‧‧UV illumination components

87‧‧‧風扇 87‧‧‧fan

88‧‧‧通風口 88‧‧‧ vents

89‧‧‧風扇 89‧‧‧fan

90‧‧‧活性碳過濾器 90‧‧‧Active carbon filter

91‧‧‧通風口 91‧‧‧ vents

92‧‧‧鋼絲絨 92‧‧‧ Steel wool

第1圖為二氧化氯氣體處理裝置之結構的示意圖(實施例1) Figure 1 is a schematic view showing the structure of a chlorine dioxide gas treatment device (Example 1)

第2圖為顯示二氧化氯氣體處理結構的評價結果之圖表(實施例1) Fig. 2 is a graph showing the evaluation results of the chlorine dioxide gas treatment structure (Example 1)

第3圖為顯示小型二氧化氯氣體處理結構的評價圖表(實施例1) Figure 3 is an evaluation chart showing the structure of a small chlorine dioxide gas treatment (Example 1)

第4圖為二氧化氯氣體處理裝置的結構之示意圖(實施例2) Figure 4 is a schematic view showing the structure of a chlorine dioxide gas treatment device (Example 2)

第5圖為顯示第1次處理元件的評價結果之圖表(實施例2) Fig. 5 is a graph showing the evaluation results of the first processing element (Embodiment 2)

第6圖為二氧化氯氣體處理裝置之結構的示意圖(實施例3) Figure 6 is a schematic view showing the structure of a chlorine dioxide gas treatment device (Example 3)

第7圖為殺菌裝置的處理步驟圖(實施例4) Figure 7 is a diagram showing the processing steps of the sterilization device (Embodiment 4)

第8圖為顯示紫外-可見光吸收光譜分析實驗之圖表 Figure 8 is a graph showing the experiment of ultraviolet-visible absorption spectroscopy

第9圖為顯示紫外線強度與二氧化氯氣體之減低趨勢之圖表 Figure 9 is a graph showing the decrease in UV intensity and chlorine dioxide gas.

藉由以第1次處理元件將二氧化氯氣體的濃度降低至所需的低濃度後,再以二氧化氯處理結構進一步降低至對人體安全之低濃度,實現了將二氧化氯氣體以短時間降低至對人體安全的濃度之目的。 By lowering the concentration of chlorine dioxide gas to the desired low concentration with the first processing element, the chlorine dioxide treatment structure is further reduced to a low concentration safe to the human body, thereby realizing the chlorine dioxide gas to be short. Time is reduced to the purpose of safe concentration for the human body.

《實施例1》 "Embodiment 1"

參照第1圖,說明實施例1之二氧化氯氣體處理裝置100。第1圖係顯示實施例1的二氧化氯氣體處理裝置100之結構的示意圖。概略地顯示出由使用活性碳過濾器11吸附二氧化氯氣體,將高濃度二氧化氯氣體之處理前的導入空氣30之二氧化氯氣體的濃度處理為2.0ppm至5.0ppm的低濃度中間處理空氣40之第1次處理元件10,及將中間處理空氣40處理為比對人體安全的二氧化氯氣體濃度0.1ppm還低之低濃度,並做為排放空氣50排放之二氧化氯氣體處理結構20所構成之二氧化氯氣體處理裝置100的主要組成要素。 The chlorine dioxide gas treatment apparatus 100 of the first embodiment will be described with reference to Fig. 1 . Fig. 1 is a schematic view showing the structure of a chlorine dioxide gas treating apparatus 100 of the first embodiment. It is roughly shown that the concentration of chlorine dioxide gas introduced into the air 30 before the treatment of the high-concentration chlorine dioxide gas is treated with a low concentration intermediate treatment of adsorbing chlorine dioxide gas using the activated carbon filter 11 to 2.0 ppm to 5.0 ppm. The first processing element 10 of the air 40 and the intermediate processing air 40 are treated to a lower concentration than the chlorine dioxide gas concentration of 0.1 ppm which is safe for the human body, and are used as the chlorine dioxide gas treatment structure for discharging the air 50. The main components of the chlorine dioxide gas treatment device 100 composed of 20.

實施例1的第1次處理元件10係收納於由各邊設為1m之壓克力板所構成之立方體形狀的容器12中,但容器12的形狀、大小當然不限 定於此。於容器12之中,設置有讓導入空氣30循環之風扇13。藉由風扇13所產生之氣流,如示於第1次處理元件10之箭頭14所示,讓導入空氣30通過設置於風扇13前方的活性碳過濾器11,使導入空氣30中所包含的二氧化氯氣體被活性碳過濾器11吸附。 The first processing element 10 of the first embodiment is housed in a cubic container 12 composed of an acryl plate having 1 m each side, but the shape and size of the container 12 are of course not limited. It is here. A fan 13 for circulating the introduced air 30 is provided in the container 12. The air flow generated by the fan 13 passes through the activated carbon filter 11 provided in front of the fan 13 as indicated by an arrow 14 shown in the first processing element 10, so that the air contained in the introduction air 30 is included. The chlorine oxide gas is adsorbed by the activated carbon filter 11.

風扇13的風量及活性碳過濾器11的大小、厚度、活性碳的容量,可依據導入容器12中之導入空氣30所包含的二氧化氯氣體之濃度、量來適當選擇即可。此處活性碳過濾器11只要是能吸附酸性氣體之活性碳過濾器11即能適用,也可為粉末碳、粒狀碳。另外,當然也可併用中性氣體用活性碳層與鹼性氣體用活性碳層。 The air volume of the fan 13 and the size and thickness of the activated carbon filter 11, and the capacity of the activated carbon may be appropriately selected depending on the concentration and amount of the chlorine dioxide gas contained in the introduction air 30 in the introduction container 12. Here, the activated carbon filter 11 can be applied as long as it is an activated carbon filter 11 capable of adsorbing an acid gas, and may be powdered carbon or granular carbon. Further, of course, an activated carbon layer for a neutral gas and an activated carbon layer for an alkaline gas may be used in combination.

在第1次處理元件10,於中間處理空氣40的排出口附近設置能開關之偵測吸引口15,讓偵測吸引口15成為能開關之狀態,由該處將容器12中的被處理空氣吸引至二氧化氯氣體用偵測管16以測定二氧化氯氣體濃度,簡化第1次處理元件10的結構。二氧化氯氣體用偵測管16可使用股份有限公司GASTEC(註冊商標)之氣體濃度偵測管。另一方面,雖然未圖示,但也可設置習知的偵測元件(參照特開2007-68612號公報)做為二氧化氯氣體濃度偵測元件,來測定二氧化氯氣體之濃度。 In the first processing element 10, a detection suction port 15 of a switch can be disposed in the vicinity of the discharge port of the intermediate process air 40, so that the detection suction port 15 becomes a switchable state, and the processed air in the container 12 is taken there. The detection tube 16 for chlorine dioxide gas is sucked to measure the concentration of chlorine dioxide gas, and the structure of the first processing element 10 is simplified. The chlorine dioxide gas detecting tube 16 can use a gas concentration detecting tube of the company GASTEC (registered trademark). On the other hand, although not shown, a conventional detecting element (refer to Japanese Laid-Open Patent Publication No. 2007-68612) can be used as a chlorine dioxide gas concentration detecting element to measure the concentration of chlorine dioxide gas.

作用於空氣淨化,二氧化氯氣體濃度尚高的導入空氣30之二氧化氯氣體濃度,被偵測到在第1次處理元件10被處理為所需的低濃度後,做為中間處理空氣40由第1次處理元件10引導排至二氧化氯氣體處理結構20。 The chlorine dioxide gas concentration of the introduced air 30, which is applied to the air purification and has a high chlorine dioxide gas concentration, is detected as the intermediate processing air 40 after the first processing element 10 is processed to the required low concentration. The discharge to the chlorine dioxide gas treatment structure 20 is guided by the first processing element 10.

二氧化氯氣體處理結構20也是收納於由各邊為1m之壓克力板所構成之立方體形狀的容器22,但容器22的形狀、大小當然不限定於 此。容器22中係包含風扇23、紫外線照射元件24、及成為濕潤狀態之鋼絲絨21。此外,於容器22的內面裝載有鋁箔28。為了使由紫外線照射元件24照射出的紫外線不會漏出至外部,讓紫外線於容器內反射,提高紫外線強度,以鋁材料為合適,但不限定於鋁材料,也可為薄膜的箔體或板體。 The chlorine dioxide gas treatment structure 20 is also a cubic container 22 that is housed in an acrylic plate having sides of 1 m. However, the shape and size of the container 22 are of course not limited to this. The container 22 includes a fan 23, an ultraviolet ray irradiation element 24, and a steel wool 21 in a wet state. Further, an aluminum foil 28 is placed on the inner surface of the container 22. In order to prevent the ultraviolet ray irradiated by the ultraviolet ray irradiation element 24 from leaking to the outside, and to reflect the ultraviolet ray in the container to increase the ultraviolet ray intensity, the aluminum material is suitable, but the material is not limited to the aluminum material, and may be a foil body or a sheet of the film. body.

以設置於二氧化氯氣體處理結構20內之風扇23所產生的氣流,如第1圖的二氧化氯氣體處理結構20中之箭頭25所示,循環使之與鋪設之鋼絲絨21的接觸層接觸。於二氧化氯氣體處理結構20中所鋪設的鋼絲絨21,係被水濕潤,以紫外線照射元件照射紫外線。中間處理空氣40接觸鋼絲絨21,使中間處理空氣40中所包含之二氧化氯氣體被處理為對人體安全的低濃度之排放空氣50。 The gas stream generated by the fan 23 disposed in the chlorine dioxide gas treatment structure 20 is circulated to the contact layer of the laid steel wool 21 as indicated by an arrow 25 in the chlorine dioxide gas treatment structure 20 of Fig. 1. contact. The steel wool 21 laid in the chlorine dioxide gas treatment structure 20 is wetted with water, and is irradiated with ultraviolet rays by an ultraviolet ray irradiation element. The intermediate process air 40 contacts the steel wool 21 so that the chlorine dioxide gas contained in the intermediate process air 40 is treated as a low concentration discharge air 50 that is safe for the human body.

此處,形成接觸層之鋼絲絨21,係使用325g的直徑為0.02mm至0.04mm之細絲的鋼絲絨。鋼絲絨21在舖設於二氧化氯氣體處理結構20內時,預先以噴霧噴灑約50mL的水,成為被水濕潤之狀態。鋼絲絨21也可於下方設置貯放水之貯水盤26,以未圖示之出沒元件使其適當出沒來保持濕潤狀態。 Here, the steel wool 21 forming the contact layer is 325 g of steel wool having a diameter of 0.02 mm to 0.04 mm. When the steel wool 21 is placed in the chlorine dioxide gas treatment structure 20, about 50 mL of water is sprayed in advance to be wetted by water. The steel wool 21 may be provided with a water storage tray 26 for storing water underneath, and may be properly wetted by an unillustrated member.

做為紫外線照射元件24,係使用三共電氣股份有限公司製的6支波長254nm之紫外線燈GPL9,及6支GPL27,成為合計輸出216W之紫外線燈。紫外線照度依據股份有限公司CUSTOM的紫外線強度計所做之測定,在設置該接觸層之位置被測量為0.345mW/cm2。此外,係在室溫為20℃且安定的室溫環境下進行計測實驗。 As the ultraviolet ray irradiation element 24, six ultraviolet light lamps GPL9 of 254 nm manufactured by Sankyo Electric Co., Ltd. and six GPLs 27 were used, and the ultraviolet light lamps of a total output of 216 W were used. The ultraviolet illuminance was measured according to the ultraviolet intensity meter of CUSTOM Co., Ltd., and the position at which the contact layer was provided was measured to be 0.345 mW/cm 2 . Further, the measurement experiment was carried out under a room temperature environment of room temperature of 20 ° C and stability.

中間處理空氣係藉由設置在排放口附近的位置之濃度偵測位置27的二氧化氯氣體濃度偵測元件來偵測、確認該二氧化氯氣體之濃 度為對人體安全之濃度,例如0.1ppm以下之後,做為排放空氣50排放至外界大氣。實施例1中,二氧化氯濃度為50ppm之導入空氣30,係在以第1次處理元件開始處理後經過8分鐘之時間點被處理為3.6ppm之中間處理空氣40,進一步以二氧化氯處理結構20開始處理中間處理空氣20後經過6分鐘後,二氧化氯濃度被處理為安全濃度之0.1ppm以下,在第1次處理開始後14分鐘成為檢測不到二氧化氯氣體之狀態,成為適合作為排放空氣50之狀態。 The intermediate process air detects and confirms the concentration of the chlorine dioxide gas by the chlorine dioxide gas concentration detecting element of the concentration detecting position 27 disposed at a position near the discharge port. After the concentration is safe for the human body, for example, 0.1 ppm or less, it is discharged as exhaust air 50 to the outside atmosphere. In the first embodiment, the introduction air 30 having a chlorine dioxide concentration of 50 ppm is treated as 3.6 ppm of the intermediate treatment air 40 at a time point of 8 minutes after the start of the treatment by the first treatment element, and further treated with chlorine dioxide. After 6 minutes from the start of the treatment of the intermediate process air 20, the chlorine dioxide concentration is treated to a safe concentration of 0.1 ppm or less, and the chlorine dioxide gas is not detected until 14 minutes after the start of the first treatment. As the state of the exhaust air 50.

(評價實驗1) (Evaluation Experiment 1)

此處,為了評價實施例1的二氧化氯氣體處理結構20之主要組成要素的效果,將實施例1的以二氧化氯氣體處理結構20降低處理二氧化氯氣體的濃度之情形,與從二氧化氯氣體處理結構20排除主要組成要素之情形做比較,進行確認主要組成要素之效果的實驗(評價實驗1)。參照第2圖說明其結果。第2圖係顯示二氧化氯氣體處理結構的評價結果及比較結果之圖表。(評價結果1-1)係顯示驅動二氧化氯氣體處理結構20之情形的中間處理空氣40之二氧化氯氣體濃度降低趨勢,(比較結果1-1)係顯示不濕潤接觸層之鋼絲絨就照射紫外線之情形的中間處理空氣40之二氧化氯氣體濃度降低趨勢,(比較結果1-2)係顯示取出鋼絲絨僅照射紫外線之情形的中間處理空氣40之二氧化氯氣體濃度降低趨勢。二氧化氯氣體之濃度係以股份有限公司GASTEC社(註冊商標)之氣體偵測管來偵測。 Here, in order to evaluate the effect of the main components of the chlorine dioxide gas treatment structure 20 of the first embodiment, the chlorine dioxide gas treatment structure 20 of the first embodiment is used to reduce the concentration of the chlorine dioxide gas, and The oxidation chlorine gas treatment structure 20 was compared with the main components, and an experiment for confirming the effects of the main components (evaluation experiment 1) was performed. The result will be described with reference to Fig. 2 . Fig. 2 is a graph showing the evaluation results of the chlorine dioxide gas treatment structure and the comparison results. (Evaluation Result 1-1) shows the tendency of the chlorine dioxide gas concentration of the intermediate process air 40 in the case where the chlorine dioxide gas treatment structure 20 is driven to be lowered, (comparison result 1-1) shows that the steel wool which does not wet the contact layer is The chlorine dioxide gas concentration of the intermediate process air 40 in the case of irradiating ultraviolet rays is decreased, and (comparison result 1-2) shows a tendency to decrease the chlorine dioxide gas concentration of the intermediate process air 40 in the case where the steel wool is taken out only by ultraviolet rays. The concentration of chlorine dioxide gas is detected by a gas detection tube of the company GASTEC (registered trademark).

(評價結果1-1) (Evaluation result 1-1)

二氧化氯氣體處理結構之評價結果(□標誌的折線圖):在室溫20℃下,將中間處理空氣40導入至以壓克力板構成之容積1m3之容 器的二氧化氯氣體處理結構20,從二氧化氯氣體的濃度為3.6ppm之狀態起,以實施例1之二氧化氯氣體處理結構20的結構處理二氧化氯氣體。以附加□標誌之折線圖顯示此二氧化氯氣體的濃度之降低。二氧化氯氣體之濃度從3.6ppm起在處理開始後經過4分鐘之時間點成為約0.12ppm,在經過6分鐘之時間點成為0.00ppm,與後文中顯示的(比較結果1-1)、(比較結果1-2)相比,能以短時間將二氧化氯氣體的濃度降低至安全濃度。 Evaluation result of chlorine dioxide gas treatment structure (line diagram of □ mark): Chlorine gas treatment structure in which intermediate process air 40 is introduced into a vessel having a volume of 1 m 3 composed of an acrylic plate at room temperature of 20 ° C 20. The chlorine dioxide gas was treated with the structure of the chlorine dioxide gas treatment structure 20 of Example 1 from the state where the concentration of the chlorine dioxide gas was 3.6 ppm. The decrease in the concentration of this chlorine dioxide gas is shown by a line graph of the additional □ mark. The concentration of the chlorine dioxide gas is about 0.12 ppm from the time of the lapse of 4 minutes from the start of the treatment at 3.6 ppm, and becomes 0.00 ppm at the time of the lapse of 6 minutes, as shown later (comparison result 1-1), ( Comparing the results 1-2), the concentration of the chlorine dioxide gas can be lowered to a safe concentration in a short time.

(比較結果1-1) (comparison result 1-1)

不以水潤濕鋼絲絨21,僅照射紫外線之情形的比較結果(附加△標誌之折線圖):以不讓水潤濕實施例1的二氧化氯氣體處理結構20之接觸層的鋼絲絨21之狀態的原樣導入中間處理空氣40,從二氧化氯氣體的濃度為2.76ppm之狀態起處理二氧化氯氣體。以附加△標誌之折線圖顯示此二氧化氯氣體的濃度之降低。二氧化氯氣體的濃度係從2.76ppm起在處理開始後經過6分鐘之時間點為0.24ppm,於經過10分鐘之時間點成為約0.01ppm。 The result of the comparison of the case where the steel wool 21 is not wetted by water and the ultraviolet rays are irradiated only (the line drawing of the additional Δ mark): the steel wool 21 which does not wet the contact layer of the chlorine dioxide gas treatment structure 20 of the first embodiment The intermediate process air 40 is introduced as it is, and the chlorine dioxide gas is treated from the state where the concentration of the chlorine dioxide gas is 2.76 ppm. The decrease in the concentration of the chlorine dioxide gas is shown by a line graph with an additional Δ mark. The concentration of chlorine dioxide gas was 0.24 ppm from 2.76 ppm at the time of 6 minutes after the start of the treatment, and was about 0.01 ppm at the time of 10 minutes.

(比較結果1-2) (comparison result 1-2)

取出鋼絲絨21,僅照射紫外線之情形的比較結果(附加○標誌之折線圖):取出實施例1的二氧化氯氣體處理結構20之鋼絲絨的接觸層,導入中間處理空氣40,從二氧化氯氣體的濃度為2.52ppm之狀態起處理二氧化氯氣體。以附加○標誌之折線圖顯示此二氧化氯氣體之濃度之降低。二氧化氯氣體的濃度從2.52ppm起在處理開始後經過6分鐘的時間點成為0.45ppm,但即使經過10分鐘後還是0.36ppm,還是大幅超過0.1ppm之濃度,未達到對人體安全之濃度。 The steel wool 21 is taken out, and the result of the comparison of only the ultraviolet rays is applied (the line drawing of the ○ mark is added): the contact layer of the steel wool of the chlorine dioxide gas treatment structure 20 of the first embodiment is taken out, and the intermediate process air 40 is introduced, from the second oxidation. The chlorine dioxide gas is treated in a state where the concentration of the chlorine gas is 2.52 ppm. The decrease in the concentration of the chlorine dioxide gas is shown by a line graph attached with the mark ○. The concentration of chlorine dioxide gas was 0.45 ppm from 2.52 ppm at the time of 6 minutes after the start of the treatment, but even if it was 0.36 ppm after 10 minutes, it was drastically more than 0.1 ppm, and the concentration which was safe for human body was not reached.

(評價實驗2) (Evaluation Experiment 2)

接下來,假設每邊為65cm之立方體的殺菌裝置,將實施例1的二氧化氯氣體處理結構之容量設為0.25m3,進行確認不管容量大小,即使是小型的二氧化氯氣體處理結構,也會發揮其效果之評價實驗2。參照第3圖說明其結果。第3圖係顯示評價實驗2的小型二氧化氯氣體處理結構的評價結果之圖表。(評價結果2-1)係顯示驅動二氧化氯氣體處理結構20之情形的中間處理空氣之二氧化氯氣體濃度降低趨勢,(比較結果2-1)係顯示不濕潤接觸層之鋼絲絨就照射紫外線之情形的中間處理空氣之二氧化氯氣體濃度降低趨勢,(比較結果2-2)係顯示取出鋼絲絨僅照射紫外線之情形的中間處理空氣之二氧化氯氣體濃度降低趨勢。做為紫外線照射元件24,係使用三共電氣股份有限公司製的6支波長254nm之紫外線燈GPL9,使用合計54W之紫外線。形成接觸層之鋼絲絨係與評價實驗1相同。在容器內面裝載鋁箔的點、室溫條件等也相同。 Next, assuming that the capacity of the chlorine dioxide gas treatment structure of the first embodiment is 0.25 m 3 , the capacity of the chlorine dioxide gas treatment structure of the first embodiment is 0.25 m 3 , and it is confirmed that even a small chlorine dioxide gas treatment structure is used regardless of the capacity. Experiment 2 will also be used to evaluate its effects. The result will be described with reference to Fig. 3. Fig. 3 is a graph showing the evaluation results of the small chlorine dioxide gas treatment structure of Evaluation Experiment 2. (Evaluation Result 2-1) shows a tendency to decrease the concentration of chlorine dioxide gas in the intermediate process air in the case where the chlorine dioxide gas treatment structure 20 is driven, (Comparative Result 2-1) shows that the steel wool which does not wet the contact layer is irradiated In the case of ultraviolet rays, the concentration of chlorine dioxide gas in the intermediate treatment air is decreased, and (comparison result 2-2) shows a tendency to decrease the concentration of chlorine dioxide gas in the intermediate process air when the steel wool is irradiated only with ultraviolet rays. As the ultraviolet ray irradiation element 24, six ultraviolet light lamps GPL9 of 254 nm wavelength manufactured by Sankyo Electric Co., Ltd. were used, and a total of 54 W ultraviolet rays were used. The steel wool forming the contact layer was the same as in Evaluation Experiment 1. The point at which the aluminum foil is placed on the inner surface of the container, the room temperature condition, and the like are also the same.

(評價結果2-1) (Evaluation result 2-1)

小型二氧化氯氣體處理結構之評價結果(□標誌折線圖):於室溫20℃下,將中間處理空氣40導入小型容器的二氧化氯氣體處理結構20,從二氧化氯氣體的濃度為2.52ppm之狀態起,以上述結構處理二氧化氯氣體。第3圖中以附加□標誌之折線圖顯示此二氧化氯氣體之濃度之降低。在二氧化氯氣體的濃度從2.52ppm起在處理開始後經過2分鐘之時間點變成0.30ppm,在經過4分鐘之時間點變成0.00ppm。確認不管二氧化氯氣體處理結構之容量,只要適當決定紫外線之強度,即能得到與容量大的實施例1同樣地二氧化氯氣體之降低趨勢。與後文顯示之(比較結果2-1)、(比較 結果2-2)相比,能以短時間將二氧化氯氣體的濃度降低至安全濃度。 Evaluation result of small chlorine dioxide gas treatment structure (□ mark line diagram): The intermediate treatment air 40 is introduced into the small container chlorine dioxide gas treatment structure 20 at room temperature 20 ° C, and the concentration of chlorine dioxide gas is 2.52. From the state of ppm, the chlorine dioxide gas is treated in the above structure. In Fig. 3, the decrease in the concentration of the chlorine dioxide gas is shown by a line graph of the additional □ mark. The concentration of the chlorine dioxide gas was changed from 2.52 ppm to 0.30 ppm at the time point of 2 minutes after the start of the treatment, and became 0.00 ppm at the time of the passage of 4 minutes. It is confirmed that the chlorine dioxide gas is reduced in the same manner as in the first embodiment having a large capacity, as long as the intensity of the ultraviolet ray is appropriately determined regardless of the capacity of the chlorine dioxide gas treatment structure. As shown in the following (comparison result 2-1), (comparison As a result of 2-2), the concentration of chlorine dioxide gas can be lowered to a safe concentration in a short time.

(比較結果2-1) (comparison result 2-1)

不濕潤鋼絲絨,僅照射紫外線之情形的比較結果(附加△標誌之折線圖):在小型的二氧化氯氣體處理結構中,以不讓水濕潤接觸層的鋼絲絨之狀態的原樣導入中間處理空氣40,從二氧化氯氣體的濃度為2.16ppm之狀態起,處理二氧化氯氣體。第3圖中以附加△標誌之圖表顯示此二氧化氯氣體的濃度之降低。二氧化氯氣體的濃度從2.16ppm起在處理開始後經過2分鐘之時間點成為0.78ppm,在經過4分鐘之時間點成為0.30ppm,未達到安全濃度。 Comparison result of the case where the steel wool is not wet, and only the ultraviolet rays are irradiated (the line diagram of the additional △ mark): In the small chlorine dioxide gas treatment structure, the intermediate treatment is introduced as it is without letting the water wet the contact layer. The air 40 is treated with chlorine dioxide gas from a state where the concentration of chlorine dioxide gas is 2.16 ppm. In Fig. 3, the graph of the additional Δ mark shows the decrease in the concentration of the chlorine dioxide gas. The concentration of the chlorine dioxide gas was changed from 2.16 ppm to 0.78 ppm at the time point of 2 minutes after the start of the treatment, and became 0.30 ppm at the time point of 4 minutes, and the safe concentration was not reached.

(比較結果2-2) (comparison result 2-2)

取出鋼絲絨,僅照射紫外線之情形的比較結果(附加○標誌之折線圖):取出小型的二氧化氯氣體處理結構中之鋼絲絨的接觸層,導入中間處理空氣40,從二氧化氯氣體的濃度為2.10ppm之狀態起處理二氧化氯氣體。以附加○標誌之折線圖顯示此二氧化氯氣體之濃度降低。二氧化氯氣體的濃度從2.10ppm起在處理開始後經過2分鐘之時間點為1.08ppm,在經過4分鐘之時間點為超過0.48ppm之濃度,未達到安全濃度。 The result of the comparison of the case where the steel wool is taken out and only the ultraviolet rays are irradiated (the line drawing of the ○ mark is attached): the contact layer of the steel wool in the small chlorine dioxide gas treatment structure is taken out, and the intermediate process air 40 is introduced, from the chlorine dioxide gas. The chlorine dioxide gas is treated in a state of a concentration of 2.10 ppm. A decrease in the concentration of the chlorine dioxide gas is shown by a line graph attached with the mark ○. The concentration of chlorine dioxide gas was from 1.00 ppm at a time point of 1.08 ppm after 2 minutes from the start of the treatment, and at a concentration of more than 0.48 ppm at the time of 4 minutes, the safe concentration was not reached.

《實施例2》 <<Example 2》

參照第4圖說明實施例2之二氧化氯氣體處理裝置200。第4圖係二氧化氯氣體處理裝置200之結構的示意圖。取代實施例1之第1次處理元件10,以讓高濃度的二氧化氯氣體之導入空氣30之二氧化 氯氣體接觸狀態為照射紫外線之鋼絲絨,做為使二氧化氯氣體成為所需的低濃度之中間處理空氣40的第1次處理元件60。至於將中間處理空氣40處理為比對人體安全之二氧化氯氣體濃度的0.1ppm還要低濃度,成為排放空氣50之二氧化氯氣體處理結構20,因與實施例1相同,於圖式中賦予相同符號並省略其說明。 The chlorine dioxide gas treatment apparatus 200 of the second embodiment will be described with reference to Fig. 4 . Fig. 4 is a schematic view showing the structure of a chlorine dioxide gas treating apparatus 200. The first processing element 10 of the first embodiment is replaced to allow the high concentration of chlorine dioxide gas to be introduced into the air 30 for oxidation. The chlorine gas contact state is steel wool irradiated with ultraviolet rays, and is used as the first processing element 60 for making the chlorine dioxide gas the required low-concentration intermediate process air 40. As for the treatment of the intermediate treatment air 40 to a concentration lower than 0.1 ppm of the chlorine dioxide gas concentration of the human body, the chlorine dioxide gas treatment structure 20 of the discharge air 50 is the same as in the first embodiment, in the drawings. The same symbols are given and the description thereof is omitted.

實施例2之第1次處理元件60係收納於由各邊設為1m之壓克力板所構成之立方體形狀的容器62內,但與實施例1相同,容器62的形狀、大小當然不限定於此。容器62中設置有讓導入空氣30循環之風扇63。藉由風扇63,如在第1次處理元件60顯示之箭頭所示般產生氣流。在風扇63前方,設置狀態為被紫外線照射元件64照射紫外線之鋼絲絨61。讓導入空氣30通過鋼絲絨61,讓導入空氣30中所包含之二氧化氯氣體接觸狀態為被來自紫外線照射元件之紫外線照射之鋼絲絨61,將該二氧化氯濃度處理為所需濃度之中間處理空氣40。 The first processing element 60 of the second embodiment is housed in a cubic container 62 made of an acryl plate having 1 m each side. However, as in the first embodiment, the shape and size of the container 62 are of course not limited. herein. A fan 63 for circulating the introduction air 30 is provided in the container 62. The airflow is generated by the fan 63 as indicated by the arrow displayed on the first processing element 60. In front of the fan 63, a steel wool 61 in which ultraviolet rays are irradiated by the ultraviolet ray irradiation element 64 is provided. The introduction air 30 is passed through the steel wool 61, and the chlorine dioxide gas contained in the introduction air 30 is brought into contact with the steel wool 61 irradiated with ultraviolet rays from the ultraviolet irradiation element, and the chlorine dioxide concentration is treated to the middle of the desired concentration. Process air 40.

(評價實驗3) (Evaluation Experiment 3)

此處參照第5圖,顯示評價減低二氧化氯濃度高之導入空氣30的二氧化氯濃度,處理為中間處理空氣40之第1次處理元件之評價實驗3的結果。(評價結果3-1)係讓二氧化氯氣體吸附於活性碳過濾器之實施例1的第1次處理元件,(評價結果3-2)係在對鋼絲絨過濾器照射紫外線之狀態下接觸二氧化氯氣體之實施例2的第1次處理元件,(比較結果3-1)係顯示僅照射紫外線讓二氧化氯氣體濃度降低之情形的實驗結果。做為紫外線照射元件,係使用三共電氣股份有限公司製的6支波長254nm之紫外線燈GPL9,使用合計54W之紫外線。形成接觸層之鋼絲絨係與評價實驗1相同。在容器 內面裝載鋁箔的點、室溫條件等亦相同。 Here, referring to Fig. 5, the results of the evaluation experiment 3 of the first processing element of the intermediate treatment air 40 which is obtained by evaluating the chlorine dioxide concentration of the introduced air 30 having a high chlorine dioxide concentration are evaluated. (Evaluation Result 3-1) The first processing element of Example 1 in which chlorine dioxide gas was adsorbed to an activated carbon filter, (evaluation result 3-2) was contacted in a state where ultraviolet rays were irradiated to the steel wool filter. The first processing element of the second embodiment of the chlorine dioxide gas (comparison result 3-1) shows an experimental result of the case where only the ultraviolet ray is irradiated to lower the chlorine dioxide gas concentration. As the ultraviolet ray irradiation element, six ultraviolet light lamps GPL9 of 254 nm wavelength manufactured by Sankyo Electric Co., Ltd. were used, and a total of 54 W ultraviolet rays were used. The steel wool forming the contact layer was the same as in Evaluation Experiment 1. In the container The point at which the aluminum foil is loaded on the inner surface, the room temperature conditions, and the like are also the same.

(評價結果3-1) (Evaluation result 3-1)

讓導入空氣的二氧化氯氣體吸附於活性碳過濾器之實施例1的第1次處理元件之評價結果(附加○標誌之折線圖):實施例1的第1次處理元件中,讓包含高濃度的二氧化氯氣體之導入空氣接觸活性碳過濾器,使二氧化氯氣體被活性碳過濾器吸附,降低二氧化氯氣體之濃度。第5圖中以附加○標誌之折線圖顯示此二氧化氯氣體之濃度降低。在處理開始後經過5分鐘之時間點從50ppm降低至6.24ppm,在經過10分鐘之時間點成為1.20ppm。自此之後濃度下降變緩慢,在經過20分鐘之時間點成為0.12ppm,在處理開始後到達0.1ppm為止需要25分鐘的時間。 The evaluation result of the first processing element of Example 1 in which the chlorine dioxide gas introduced into the air is adsorbed to the activated carbon filter (the line drawing of the ○ mark is added): In the first processing element of the first embodiment, the inclusion is high. The introduction air of the concentration of chlorine dioxide gas contacts the activated carbon filter, so that the chlorine dioxide gas is adsorbed by the activated carbon filter to lower the concentration of the chlorine dioxide gas. In Fig. 5, the concentration of the chlorine dioxide gas is lowered by a line graph with the ○ mark attached. It was lowered from 50 ppm to 6.24 ppm at the time point of 5 minutes after the start of the treatment, and became 1.20 ppm at the time of 10 minutes. Since then, the concentration drop became slow, and it became 0.12 ppm at the time of 20 minutes, and it took 25 minutes until it reached 0.1 ppm after the start of the process.

(評價結果3-2) (Evaluation result 3-2)

一邊照射紫外線,讓導入空氣的二氧化氯氣體接觸鋼絲絨之實施例2的第1次處理元件之評價結果(附加△標誌之折線圖):實施例2的第1次處理元件中,在對鋼絲絨照射紫外線之狀態下,讓包含高濃度二氧化氯氣體之導入空氣30與其接觸,使二氧化氯氣體濃度降低。第5圖中以附加△標誌之折線圖顯示此二氧化氯氣體之濃度降低。雖在處理開始後經過10分鐘之時間點濃度從40ppm降低至2.40ppm,但此後二氧化氯氣體濃度緩慢降低,處理開始後到達0.1ppm為止,需要20分鐘的時間。但是,在處理開始後20分鐘之時間變得檢測不到二氧化氯氣體。若將其與實施例1的第1次處理元件相比之結果:實施例1之活性碳過濾器的方面雖然在到經過10分鐘的時間點為止發現些許優良的減低效果,但在到安全濃度之0.1ppm之前需要較長時間。另一方面,在二氧化氯濃度到 達2.5ppm之低濃度為止,實施例2的第1次處理元件與實施例1的第1次處理元件都只要經過約10分鐘即可,兩者均被評價為適合做為第1次處理元件。 The result of the evaluation of the first processing element of the second embodiment in which the chlorine dioxide gas introduced into the air is contacted with the ultraviolet ray while irradiating the ultraviolet ray (the line drawing of the Δ mark is added): in the first processing element of the second embodiment, When the steel wool is irradiated with ultraviolet rays, the introduction air 30 containing a high concentration of chlorine dioxide gas is brought into contact with it to lower the concentration of the chlorine dioxide gas. In Fig. 5, the concentration of the chlorine dioxide gas is shown as a line graph with an additional Δ mark. Although the concentration decreased from 40 ppm to 2.40 ppm after 10 minutes from the start of the treatment, the chlorine dioxide gas concentration gradually decreased thereafter, and it took 20 minutes to reach 0.1 ppm after the start of the treatment. However, chlorine dioxide gas became undetectable 20 minutes after the start of the treatment. The result of the comparison with the first processing element of the first embodiment: the aspect of the activated carbon filter of the first embodiment was found to have a somewhat excellent reduction effect at the time of the passage of 10 minutes, but at a safe concentration. It takes a long time before 0.1ppm. On the other hand, in the concentration of chlorine dioxide to The first processing element of the second embodiment and the first processing element of the first embodiment can be used for about 10 minutes until the low concentration of 2.5 ppm, and both are evaluated as suitable as the first processing element. .

(比較結果3-1) (comparison result 3-1)

僅對導入空氣之二氧化氯氣體照射紫外線來降低二氧化氯氣體之比較結果(附加□標誌之折線圖):在與實施例1相同溫度條件下於相同大小的容器中,以紫外線照射元件對包含高濃度二氧化氯氣體之導入空氣30照射紫外線,降低二氧化氯氣體之濃度。第5圖中以附加□標誌之折線圖顯示此二氧化氯氣體之濃度降低。在處理開始後經過20分鐘後從50ppm降低至47.5ppm,但降低趨勢緩慢。另一方面,無論在哪一個照射時間帶,都能以相同比例看到二氧化氯氣體之降減趨勢。 The result of the comparison of the chlorine dioxide gas introduced into the air to reduce the chlorine dioxide gas (the line diagram of the additional □ mark): in the same size of the container under the same temperature conditions as in Example 1, the pair of ultraviolet rays are irradiated The introduction air 30 containing a high concentration of chlorine dioxide gas is irradiated with ultraviolet rays to lower the concentration of chlorine dioxide gas. In Fig. 5, the line diagram of the additional □ mark shows that the concentration of the chlorine dioxide gas is lowered. It decreased from 50 ppm to 47.5 ppm after 20 minutes after the start of the treatment, but the tendency to decrease was slow. On the other hand, the decreasing trend of chlorine dioxide gas can be seen in the same ratio regardless of the irradiation time zone.

《實施例3》 Example 3

於實施例3,參照第6圖說明在相同容器70中具備第1次處理元件與二氧化氯氣體處理結構之實施例。第6圖係二氧化氯氣體處理裝置300的結構之示意圖,對於與實施例1相同結構的部分,於圖式中賦予相同符號並省略說明。被導入容器70中之二氧化氯氣體濃度高的導入空氣30,先在二氧化氯氣體處理結構72停止之狀態下,循環於第1次處理元件71之活性碳過濾器11,使二氧化氯氣體濃度降低。然後,在以偵測元件偵測到容器中的被處理空氣之二氧化氯氣體濃度變得比所需濃度小後,接下來停止第1次處理元件71,以二氧化氯氣體處理結構72一邊藉由紫外線照射元件24照射紫外線,讓被處理空氣接觸濕潤狀態之鋼絲絨21並使之循環。藉此,能在一個容器內以短時間降低二氧化氯氣體之濃度。 In the third embodiment, an embodiment in which the first processing element and the chlorine dioxide gas treatment structure are provided in the same container 70 will be described with reference to FIG. Fig. 6 is a schematic view showing the configuration of a chlorine dioxide gas treatment apparatus 300. The same components as those in the first embodiment are denoted by the same reference numerals and the description thereof will not be repeated. The introduction air 30 having a high concentration of chlorine dioxide gas introduced into the vessel 70 is circulated to the activated carbon filter 11 of the first treatment element 71 in a state where the chlorine dioxide gas treatment structure 72 is stopped, so that chlorine dioxide is generated. The gas concentration is lowered. Then, after the detection element detects that the chlorine dioxide gas concentration of the air to be treated in the container becomes smaller than the required concentration, the first processing element 71 is stopped, and the structure 72 is treated with chlorine dioxide gas. The ultraviolet ray irradiation element 24 is irradiated with ultraviolet rays, and the air to be treated is brought into contact with the steel wool 21 in a wet state and circulated. Thereby, the concentration of chlorine dioxide gas can be lowered in a container for a short time.

《實施例4》 Example 4

於實施例4,參照第7圖說明醫療用器具之殺菌裝置的實施例。第7圖係殺菌裝置之處理步驟圖,第7圖(A)圖係顯示產生高濃度二氧化氯氣體之步驟,第7圖(B)圖係在醫療器具殺菌後,將高濃度二氧化氯氣體降低至所需濃度,例如從2.0ppm降低至5.0ppm之濃度之步驟,第7圖(C)圖係顯示將降低至預先所需的濃度之二氧化氯氣體再降低至對人體安全之濃度之步驟的說明圖。 In the fourth embodiment, an embodiment of a sterilization device for a medical device will be described with reference to Fig. 7. Figure 7 is a process diagram of the sterilization device, Figure 7 (A) shows the step of producing high concentration of chlorine dioxide gas, and Figure 7 (B) shows the high concentration of chlorine dioxide after sterilization of the medical device. The step of reducing the gas to the desired concentration, for example, from 2.0 ppm to 5.0 ppm, and Figure 7 (C) shows the concentration of chlorine dioxide gas reduced to a previously required concentration and then lowered to a safe concentration for human body. An illustration of the steps.

殺菌裝置400中,係包含與醫療器具收納部80相接的二氧化氯氣體產生元件81、第1次處理元件82、二氧化氯氣體處理結構83。於二氧化氯氣體產生元件81,在開放與醫療器具收納部80的通風口84之狀態下,以紫外線照射元件86對凝膠或液體狀的穩定性二氧化氯水85照射紫外線,藉由風扇87將高濃度二氧化氯氣體如第7圖(A)圖所示之箭頭般送出至醫療器具收納部80,予以循環。醫療器具收納部80的二氧化氯氣體之濃度在到達既定濃度後,也可關閉通風口84,停止風扇87(參照第7圖(A)圖)。 The sterilizing apparatus 400 includes a chlorine dioxide gas generating element 81, a first processing element 82, and a chlorine dioxide gas processing structure 83 that are in contact with the medical device housing unit 80. The chlorine dioxide gas generating element 81 is irradiated with ultraviolet rays by gel or liquid-like stable chlorine dioxide water 85 by the ultraviolet ray irradiation element 86 in a state where the vent opening 84 of the medical device accommodating portion 80 is opened, by the fan. 87. The high-concentration chlorine dioxide gas is sent to the medical device storage unit 80 as an arrow shown in Fig. 7(A), and is circulated. After the concentration of the chlorine dioxide gas in the medical device housing portion 80 reaches a predetermined concentration, the vent opening 84 can be closed, and the fan 87 can be stopped (see Fig. 7(A)).

在醫療器具被殺菌後,於二氧化氯氣體產生元件81的通風口84關閉之狀態下,開放第1次處理元件82的通風口88,以風扇89讓醫療器具收納部80的氣體如第7圖(B)圖所示之箭頭般循環至活性碳過濾器90使二氧化氯氣體被吸附,而降低至所需的濃度。此處所需的濃度係為2.0ppm至5.0ppm之濃度即可,但並非限定於此範圍之濃度(參照第7圖(B)圖)。 After the medical device is sterilized, the vent opening 88 of the first processing element 82 is opened in a state where the vent hole 84 of the chlorine dioxide gas generating element 81 is closed, and the gas of the medical device accommodating portion 80 is the seventh by the fan 89. The arrow shown in the diagram (B) is circulated to the activated carbon filter 90 to cause the chlorine dioxide gas to be adsorbed and lowered to the desired concentration. The concentration required here is preferably from 2.0 ppm to 5.0 ppm, but is not limited to the concentration in this range (see Fig. 7(B)).

醫療器具收納部80的二氧化氯氣體濃度在藉由第1次處理元件到達所需的濃度後,關閉第1次處理元件之通風口88,開放二氧化 氯氣體處理元件與醫療器具收納部之通風口91,在以紫外線照射元件93對成為濕潤狀態之鋼絲絨92照射紫外線之狀態下,讓降為低濃度之二氧化氯氣體如第7圖(C)圖所的箭頭般循環並與其接觸,來降低二氧化氯氣體之濃度(參照第7圖(C)圖)。 After the concentration of chlorine dioxide gas in the medical device accommodating portion 80 reaches the desired concentration by the first processing element, the vent opening 88 of the first processing element is closed, and the oxidizing opening is opened. The venting port 91 of the chlorine gas processing element and the medical device accommodating portion is subjected to ultraviolet rays irradiated to the steel wool 92 in a wet state by the ultraviolet ray irradiation element 93, and is lowered to a low concentration of chlorine dioxide gas as shown in Fig. 7 (C). The arrows in the figure circulate and come into contact with them to reduce the concentration of chlorine dioxide gas (refer to Fig. 7(C)).

依照醫療器具收納部80的大小,來決定二氧化氯氣體產生元件81之處理時間、第1次處理元件82之處理時間、二氧化氯氣體處理結構83等各別的處理時間,也可藉由計時器控制來分別加以驅動,也可於殺菌裝置的醫療器具收納部80設置圖中省略之二氧化氯氣體濃度偵測元件,依據其偵測結果,來依序驅動二氧化氯氣體產生元件81、第1次處理元件82、二氧化氯氣體處理結構83。其中,紫外線照射元件之輸出、活性碳過濾器之容量、鋼絲絨之質量適當地選擇即可。 The processing time of the chlorine dioxide gas generating element 81, the processing time of the first processing element 82, and the chlorine dioxide gas processing structure 83 may be determined by the size of the medical device housing unit 80, or may be determined by The timer control is separately driven, and the chlorine dioxide gas concentration detecting element omitted in the drawing may be disposed in the medical device housing portion 80 of the sterilizing device, and the chlorine dioxide gas generating element 81 may be sequentially driven according to the detection result. The first processing element 82 and the chlorine dioxide gas treatment structure 83. Among them, the output of the ultraviolet ray irradiation element, the capacity of the activated carbon filter, and the quality of the steel wool may be appropriately selected.

(其他) (other)

‧上述實施例中,雖然展示並說明具體的尺寸、輸出及位置,但並非限定於此,在不脫離本發明之宗旨的範圍內,當然能夠加以變化。 In the above-described embodiments, the specific dimensions, outputs, and positions are shown and described, but the present invention is not limited thereto, and may be modified without departing from the spirit and scope of the invention.

‧該實施例中雖係以穩定性二氧化氯來產生二氧化氯氣體,但並非限定於此。 ‧ In this embodiment, chlorine dioxide gas is produced by using stabilized chlorine dioxide, but is not limited thereto.

‧本次所揭示的實施形態的全部要點皆為舉例,不應視為限制。本發明的技術範圍是不受限於上述的說明,且旨在包含與專利申請的範圍均等之意義及範圍內所有的變更。 ‧ All the points of the embodiments disclosed herein are examples and should not be considered as limiting. The technical scope of the present invention is not limited to the above description, and is intended to include all modifications within the meaning and scope of the scope of the patent application.

100‧‧‧二氧化氯氣體處理裝置 100‧‧‧ chlorine dioxide gas treatment unit

10‧‧‧第1次處理元件 10‧‧‧1st processing component

20‧‧‧二氧化氯氣體處理結構 20‧‧‧ chlorine dioxide gas treatment structure

30‧‧‧導入空氣 30‧‧‧Introduction of air

40‧‧‧中間處理空氣 40‧‧‧Intermediate air treatment

50‧‧‧排放空氣 50‧‧‧Draining air

11‧‧‧活性碳過濾器 11‧‧‧Active carbon filter

12‧‧‧容器 12‧‧‧ Container

13‧‧‧風扇 13‧‧‧Fan

14‧‧‧箭頭 14‧‧‧ arrow

15‧‧‧偵測吸引口 15‧‧‧Detecting the suction port

16‧‧‧二氧化氯氣體用偵測管 16‧‧‧Detection tube for chlorine dioxide gas

21‧‧‧鋼絲絨 21‧‧‧ Steel wool

22‧‧‧容器 22‧‧‧ Container

23‧‧‧風扇 23‧‧‧Fan

24‧‧‧紫外線照射元件 24‧‧‧UV illumination components

25‧‧‧箭頭 25‧‧‧ arrow

26‧‧‧貯水盤 26‧‧‧Water storage tray

27‧‧‧濃度偵測位置 27‧‧‧ Concentration detection location

28‧‧‧鋁箔 28‧‧‧Aluminum foil

Claims (8)

一種二氧化氯氣體處理結構,其係用於減少包含二氧化氯氣體之被處理空氣中的二氧化氯氣體之二氧化氯氣體處理結構,其係包含:讓該被處理空氣循環之空間、氣流產生元件、接觸層、及紫外線照射元件,該接觸層係將由鐵製細絲固定成綿狀而成之鋼絲絨以水濕潤之接觸層,該氣流產生元件係讓被處理空氣在該空間內循環,而且在該紫外線照射元件將紫外線照射至該被處理空氣的循環路徑上之該接觸層的狀態下,使該被處理空氣反復地接觸該接觸層。 A chlorine dioxide gas treatment structure for reducing a chlorine dioxide gas treatment structure of chlorine dioxide gas in a treated air containing chlorine dioxide gas, comprising: a space for circulating the treated air, a gas flow Producing a component, a contact layer, and an ultraviolet ray illuminating element, wherein the contact layer is a contact layer of a steel wool which is fixed by a wire made of iron and is wetted by water, and the airflow generating component circulates the air to be treated in the space Further, in the state where the ultraviolet ray irradiation element irradiates ultraviolet rays to the contact layer on the circulation path of the air to be treated, the air to be treated is repeatedly brought into contact with the contact layer. 如申請專利範圍第1項所述之二氧化氯氣體處理結構,其中該細絲的直徑為0.02mm至0.04mm。 The chlorine dioxide gas treatment structure according to claim 1, wherein the filament has a diameter of 0.02 mm to 0.04 mm. 如申請專利範圍第1或2項所述之二氧化氯氣體處理結構,其中在該紫外線照射元件之紫外線所照射的該空間的內面上係具備紫外線反射面。 The chlorine dioxide gas treatment structure according to claim 1 or 2, wherein the ultraviolet ray reflecting surface is provided on an inner surface of the space to which the ultraviolet ray irradiation element is irradiated. 如申請專利範圍第1或2項所述之二氧化氯氣體處理結構,其係具備讓該鋼絲絨被水濕潤之濕潤元件。 The chlorine dioxide gas treatment structure according to claim 1 or 2, which is provided with a wetting element for moistening the steel wool with water. 一種二氧化氯氣體處理裝置,其係用於減少經以二氧化氯氣體進行空氣淨化後的被處理空氣中所包含之二氧化氯氣體之二氧化氯氣體處理裝置,其係包含:使該二氧化氯氣體降低至所需濃度之第1次處理元件;以及如申請專利範圍第1至4項中任一項所述之該二氧化氯氣體處理結 構,其中該第1次處理元件係具備第1氣流產生元件及活性碳過濾器,在以該第1氣流產生元件進行使該被處理空氣中的二氧化氯氣體吸附於該活性碳過濾器之第1次處理後,以該二氧化氯氣體處理結構來減少該第1次處理後的被處理空氣中所包含之二氧化氯氣體。 A chlorine dioxide gas treatment device for reducing chlorine dioxide gas contained in a treated air after air purification by chlorine dioxide gas, comprising: The first treatment element of the chlorine dioxide gas is reduced to a desired concentration; and the chlorine dioxide gas treatment knot as described in any one of claims 1 to 4 The first processing element includes a first airflow generating element and an activated carbon filter, and the chlorine dioxide gas in the air to be treated is adsorbed to the activated carbon filter by the first airflow generating element. After the first treatment, the chlorine dioxide gas contained in the air to be treated after the first treatment is reduced by the chlorine dioxide gas treatment structure. 一種二氧化氯氣體處理裝置,其係用於減少經以二氧化氯氣體進行空氣淨化後的被處理空氣中所包含之二氧化氯氣體之二氧化氯氣體處理裝置,其係包含:使該二氧化氯氣體降低至所需濃度之第1次處理元件;以及如申請專利範圍第1至4項中任一項所述之該二氧化氯氣體處理結構,其中該第1次處理元件係具備第1氣流產生元件、紫外線照射元件、及做為接觸層之由鐵製細絲固定成綿狀而成之鋼絲絨,而在以該紫外線照射元件對該接觸層照射紫外線之狀態下,藉由以該第1氣流產生元件,進行使該被處理空氣中的二氧化氯氣體產生循環而與該接觸層相接觸之第1次處理後,以該二氧化氯氣體處理結構來減少第1次處理後的被處理空氣中所包含之二氧化氯氣體。 A chlorine dioxide gas treatment device for reducing chlorine dioxide gas contained in a treated air after air purification by chlorine dioxide gas, comprising: And a chlorine dioxide gas treatment structure according to any one of claims 1 to 4, wherein the first processing element has a first 1 a gas generating element, an ultraviolet ray illuminating element, and a steel wool which is fixed as a contact layer by a wire made of iron, and in a state where the contact layer is irradiated with ultraviolet rays by the ultraviolet ray irradiation element, The first airflow generating element performs a first treatment in which the chlorine dioxide gas in the air to be treated is circulated and comes into contact with the contact layer, and the chlorine dioxide gas treatment structure is used to reduce the first treatment. The chlorine dioxide gas contained in the treated air. 一種殺菌裝置,其係使醫療用儀器接觸二氧化氯氣體以進行殺菌處理之殺菌裝置,其係具備:如申請專利範圍第1至4項中任一項所述之該二氧化氯氣體處理結構。 A sterilizing device, which is a sterilizing device for contacting a medical device with chlorine dioxide gas for sterilizing treatment, which is provided with the chlorine dioxide gas treating structure according to any one of claims 1 to 4. . 一種環境淨化裝置,其係將二氧化氯氣體導入設置有空氣淨化裝置之封閉環境內,讓該環境內的物品與該二氧化氯氣體相接觸以進行淨化處理之環境淨化裝置,其係具備:如申請專利範圍第1 至4項中任一項所述之該二氧化氯氣體處理結構。 An environmental purification device is an environmental purification device that introduces chlorine dioxide gas into a closed environment provided with an air purification device, and contacts an object in the environment with the chlorine dioxide gas for purification treatment, and the system includes: For example, the scope of patent application is 1 The chlorine dioxide gas treatment structure according to any one of the four items.
TW103107695A 2013-06-18 2014-03-06 Chlorine dioxide gas processing structure, chlorine dioxide gas processing device, sterilization device, and environmental purification device TWI603775B (en)

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