TWI601640B - Sealing film - Google Patents

Sealing film Download PDF

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Publication number
TWI601640B
TWI601640B TW104106424A TW104106424A TWI601640B TW I601640 B TWI601640 B TW I601640B TW 104106424 A TW104106424 A TW 104106424A TW 104106424 A TW104106424 A TW 104106424A TW I601640 B TWI601640 B TW I601640B
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Taiwan
Prior art keywords
resin
sealing
layer
electrode
sealing film
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TW104106424A
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Chinese (zh)
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TW201522056A (en
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鹿島甲介
山本史郎
小林新一
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藤森工業股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/78Cases; Housings; Encapsulations; Mountings
    • H01G11/80Gaskets; Sealings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M50/00Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
    • H01M50/10Primary casings; Jackets or wrappings
    • H01M50/183Sealing members
    • H01M50/186Sealing members characterised by the disposition of the sealing members
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/32Layered products comprising a layer of synthetic resin comprising polyolefins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/74Terminals, e.g. extensions of current collectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M50/00Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
    • H01M50/10Primary casings; Jackets or wrappings
    • H01M50/183Sealing members
    • H01M50/19Sealing members characterised by the material
    • H01M50/193Organic material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M50/00Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
    • H01M50/10Primary casings; Jackets or wrappings
    • H01M50/183Sealing members
    • H01M50/19Sealing members characterised by the material
    • H01M50/197Sealing members characterised by the material having a layered structure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2323/00Polyalkenes
    • B32B2323/04Polyethylene
    • B32B2323/043HDPE, i.e. high density polyethylene
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/16Capacitors
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02TCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T10/00Road transport of goods or passengers
    • Y02T10/60Other road transportation technologies with climate change mitigation effect
    • Y02T10/70Energy storage systems for electromobility, e.g. batteries

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Sealing Battery Cases Or Jackets (AREA)
  • Laminated Bodies (AREA)
  • Electric Double-Layer Capacitors Or The Like (AREA)

Description

密封膜 Sealing film

本發明係關於一種密封袋體所收納之二次電池或電容器等發電元件之電極的密封膜之製造方法及密封膜。 The present invention relates to a method for producing a sealing film for sealing an electrode of a power generating element such as a secondary battery or a capacitor housed in a bag body, and a sealing film.

本申請案基於2010年11月11日於日本提出申請之日本專利特願2010-252940號而主張優先權,並將其內容援用至本文中。 The present application claims priority based on Japanese Patent Application No. 2010-252940, filed on Jan.

近年來,業界正逐步採用例如包含膜之袋體所收納之二次電池或電容器等作為筆記型電腦或行動電話等電子機器之電源或混合動力汽車、燃料電池汽車或電池汽車之電池等。 In recent years, the industry is gradually adopting, for example, a secondary battery or a capacitor housed in a bag containing a film as a power source for an electronic device such as a notebook computer or a mobile phone, or a battery for a hybrid car, a fuel cell car, or a battery car.

先前,該等二次電池或電容器係將扁平之發電元件密封於包含將聚烯烴之密封層積層於鋁箔等金屬箔上而成之層壓膜的平袋或拉伸成形之袋體中而構成。於袋體之膜基材上,係使使用於充放電之電極一端突出至外部並進行密封。於密封時,係由袋體之膜基材夾持帶狀之電極並進行熱密封(電極引板)。 Conventionally, these secondary batteries or capacitors are formed by sealing a flat power generating element in a flat bag or a stretch-formed bag including a laminate film in which a sealing layer of polyolefin is laminated on a metal foil such as an aluminum foil. . On the film substrate of the bag body, one end of the electrode for charging and discharging is protruded to the outside and sealed. At the time of sealing, the strip-shaped electrode is sandwiched by the film substrate of the bag body and heat-sealed (electrode lead plate).

該等二次電池等(以下,有稱為「電池組」之情形)電極厚於袋體之密封層,因此於密封時,難以使樹脂無間隙地迴繞於電極之厚度方向之周圍,而於電極之厚度方向之周圍產生間隙。若於電極之周圍產生間隙,則於長期使用、高溫或多濕等嚴酷環境等下,有密封部劣化,或密封部之袋體與電極之接著強度下降,導致電解液自密封部洩漏之可能性。 In such a secondary battery or the like (hereinafter, referred to as a "battery pack"), the electrode is thicker than the sealing layer of the bag body, so that it is difficult to rewind the resin around the thickness direction of the electrode without a gap during sealing. A gap is formed around the thickness direction of the electrode. When a gap is formed around the electrode, the sealing portion is deteriorated in a severe environment such as long-term use, high temperature, or high humidity, or the bonding strength between the bag body and the electrode of the sealing portion is lowered, and the electrolyte may leak from the sealing portion. Sex.

針對該等問題,近年來使用利用密封膜夾持電極之表背面並與袋體之膜基材進行熱密封之方法。但是,若為了提高袋體與電極之密著性,而嚴格設定密封時之加熱或加壓之條件,則有袋體之金屬箔與電極之間之樹脂變薄,或密封膜變形,而引起短路之可能性。 In response to such problems, in recent years, a method of sandwiching the front and back surfaces of an electrode with a sealing film and heat-sealing the film substrate of the bag body has been used. However, if the conditions of heating or pressurization at the time of sealing are strictly set in order to improve the adhesion between the bag and the electrode, the resin between the metal foil of the bag body and the electrode becomes thin, or the sealing film is deformed, causing The possibility of a short circuit.

又,於袋體之膜基材與電極之間夾持密封膜並進行熱密封時,例如專利文獻2所揭示般,使密封膜自袋體之開口端露出數毫米並進行熱密封。藉由上述方式露出密封膜,可確實地防止短路。但是,於熱密封時,由於密封棒接觸或接近該露出部,故而有因高溫之密封棒之接觸或輻射熱而使密封膜熔化或變形之情形。藉此,電極變得容易與袋體之膜基材之金屬箔接觸。 Further, when the sealing film is sandwiched between the film substrate of the bag and the electrode and heat-sealed, for example, as disclosed in Patent Document 2, the sealing film is exposed to the opening end of the bag by several millimeters and heat-sealed. By exposing the sealing film in the above manner, it is possible to reliably prevent the short circuit. However, in the case of heat sealing, since the sealing rod contacts or approaches the exposed portion, there is a case where the sealing film is melted or deformed due to the contact of the sealing rod or the radiant heat at a high temperature. Thereby, the electrode becomes easy to come into contact with the metal foil of the film substrate of the bag body.

為了解決該等問題,例如專利文獻1中揭示有利用被覆材料被覆端子材料之熱密封部,而防止短路之構成,上述被覆材料係具有利用熱接著性膜夾住包含織布、不織布、或超高分子量聚乙烯之耐熱層而成之積層構造者。 In order to solve such problems, for example, Patent Document 1 discloses a configuration in which a heat seal portion of a terminal material is covered with a covering material to prevent short-circuiting, and the covering material has a woven fabric, a non-woven fabric, or a super-adhesive film. A laminated structure made of a heat-resistant layer of high molecular weight polyethylene.

又,專利文獻2中揭示有將經電子束交聯之聚烯烴層與酸改性聚烯烴層積層而成之接著性膜。 Further, Patent Document 2 discloses an adhesive film in which an electron beam crosslinked polyolefin layer and an acid-modified polyolefin are laminated.

[先前技術文獻] [Previous Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特開昭62-61268號公報 [Patent Document 1] Japanese Patent Laid-Open No. 62-61268

[專利文獻2]日本專利特開2001-297748號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2001-297748

由於專利文獻1所揭示之被覆材料係利用織布或不織布而確保耐熱性,故而作為織布或不織布需要選擇難以熔融者。但是,由於織布或不織布不熔融,故而難以高密著度地將該等與熱接著性膜積層。因此,有容易形成針孔,密封性不提高之可能性。有密封性反而下降之 情況。又,由於超高分子量聚乙烯難以獲得,於成本方面不利。又,超高分子量聚乙烯無法與包含聚丙烯系之樹脂之熱接著性膜積層。因此,無法於袋體之密封層中採用聚丙烯系之樹脂,而難以提高袋體之耐熱性。 Since the covering material disclosed in Patent Document 1 uses a woven fabric or a non-woven fabric to ensure heat resistance, it is necessary to select a woven fabric or a non-woven fabric to be difficult to melt. However, since the woven fabric or the non-woven fabric is not melted, it is difficult to laminate the thermal adhesive film with high adhesion. Therefore, there is a possibility that pinholes are easily formed and the sealing property is not improved. Sealing instead of falling Happening. Moreover, since ultrahigh molecular weight polyethylene is difficult to obtain, it is disadvantageous in terms of cost. Further, the ultrahigh molecular weight polyethylene cannot be laminated with a thermal adhesive film containing a polypropylene-based resin. Therefore, it is not possible to use a polypropylene-based resin in the sealing layer of the bag body, and it is difficult to improve the heat resistance of the bag body.

專利文獻2所揭示之接著性膜之耐熱性優異。但是,該膜之製造方法係預先使聚烯烴膜電子束交聯並將酸改性聚烯烴層擠出層壓,或藉由共擠出而積層聚烯烴層與酸改性聚烯烴層後進行電子束交聯。因此,採用任一方法均需要電子束交聯之步驟。專利文獻2之段落0013中揭示有如下情況:由於通常之聚丙烯藉由電子束照射而分解,故而需要使用特定之樹脂。又,於藉由共擠出而積層聚烯烴層與酸改性聚烯烴層後進行電子束交聯之情形時,酸改性聚烯烴亦發生交聯而使柔軟性下降,因此變得難以使樹脂無間隙地迴繞於電極之厚度方向之周圍。 The adhesive film disclosed in Patent Document 2 is excellent in heat resistance. However, the film is produced by previously crosslinking the polyolefin film electron beam and extrusion laminating the acid-modified polyolefin layer, or by laminating the polyolefin layer and the acid-modified polyolefin layer by co-extrusion. Electron beam crosslinking. Therefore, the step of electron beam crosslinking is required by either method. Paragraph 0013 of Patent Document 2 discloses that since a usual polypropylene is decomposed by electron beam irradiation, it is necessary to use a specific resin. Further, when the polyolefin layer and the acid-modified polyolefin layer are laminated by co-extrusion and then subjected to electron beam crosslinking, the acid-modified polyolefin is also crosslinked to lower the flexibility, so that it becomes difficult to make The resin wraps around the thickness direction of the electrode without a gap.

鑒於上述背景而完成之本發明係提供一種使用容易獲得之材料,容易地使樹脂無間隙地迴繞於電極之厚度方向之周圍,且可藉由簡單之步驟而以較高接著強度直接積層耐熱層與電極接著層的耐熱性與密封性優異之密封膜之製造方法及藉由該製造方法所製造之密封膜。 The present invention has been made in view of the above background to provide a material which is easily obtained by rewinding the resin around the thickness direction of the electrode without a gap, and which can directly laminate the heat-resistant layer with a high bonding strength by a simple procedure. A method for producing a sealing film which is excellent in heat resistance and sealing property with an electrode adhesive layer, and a sealing film produced by the production method.

本發明之發明者於對耐熱性與密封性優異之密封膜之研究中獲得如下知識見解:接枝聚合有羧酸之酸改性聚烯烴樹脂之羧基容易與羥基、胺基、環氧基等反應,而可容易地獲得改性。本發明係基於該知識見解而完成者。 The inventors of the present invention have obtained the following knowledge in the study of a sealing film excellent in heat resistance and sealing property: the carboxyl group of the acid-modified polyolefin resin having a carboxylic acid grafting is easily bonded to a hydroxyl group, an amine group, an epoxy group, or the like. The reaction can be easily obtained by modification. The present invention has been completed based on this knowledge.

即,根據本發明之第1態樣,可提供以下之密封膜之製造方法。 That is, according to the first aspect of the present invention, the following method for producing a sealing film can be provided.

(1)一種密封膜之製造方法,其係夾入袋體所收納之發電元件之電極與袋體之邊緣之間的密封膜之製造方法,其具有如下步驟: 熔融混練步驟,其係藉由將接枝聚合有羧酸之酸改性聚烯烴樹脂A與具有可與樹脂A之羧基反應之官能基的樹脂B兩者進行熔融混練,使樹脂A之羧基與樹脂B之官能基進行化學鍵結而改性為樹脂C;耐熱層製膜步驟,其係將樹脂C成形為層狀而形成耐熱層;接著層製膜步驟,其係將羧酸改性聚烯烴樹脂D成形為層狀而形成接著於電極之電極接著層;積層步驟,其係於樹脂C與樹脂D中之任一者或兩者為熔融狀態時直接積層上述耐熱層與上述電極接著層。 (1) A method for producing a sealing film, which is a method for producing a sealing film which is sandwiched between an electrode of a power generating element housed in a bag body and an edge of a bag body, and has the following steps: a melt-kneading step of melt-kneading both the acid-modified polyolefin resin A graft-polymerized with a carboxylic acid and the resin B having a functional group reactive with the carboxyl group of the resin A to form a carboxyl group of the resin A The functional group of the resin B is chemically bonded to be modified into the resin C; the heat-resistant layer is formed by forming the resin C into a layer form to form a heat-resistant layer; and then a film forming step of the carboxylic acid-modified polyolefin The resin D is formed into a layer shape to form an electrode adhesion layer next to the electrode, and a lamination step is to directly laminate the heat-resistant layer and the electrode adhesion layer when either or both of the resin C and the resin D are in a molten state.

(2)如(1)之密封膜之製造方法,其中上述熔融混練步驟係於擠出機內進行。 (2) The method for producing a sealing film according to (1), wherein the melt-kneading step is carried out in an extruder.

(3)如(1)或(2)之密封膜之製造方法,其中上述熔融混練步驟與上述耐熱層製膜步驟係連續進行。 (3) The method for producing a sealing film according to (1) or (2), wherein the melt-kneading step and the heat-resistant layer forming step are continuously performed.

(4)如(1)至(3)中任一項之密封膜之製造方法,其中上述積層步驟係與上述耐熱層製膜步驟與上述接著層製膜步驟中之任一者或兩者連續進行。 (4) The method for producing a sealing film according to any one of (1) to (3) wherein the laminating step is continuous with either or both of the heat-resistant layer forming step and the subsequent layer forming step get on.

(5)如(1)至(4)中任一項之密封膜之製造方法,其中上述積層步驟係於共擠出模內進行。 (5) The method for producing a sealing film according to any one of (1) to (4) wherein the laminating step is carried out in a co-extrusion die.

(6)如(1)至(5)中任一項之密封膜之製造方法,其中上述熔融混練步驟係以相對於樹脂A為99~90而樹脂B成為1~10之重量百分比進行調配而進行。 (6) The method for producing a sealing film according to any one of (1) to (5), wherein the melt-kneading step is carried out by using a resin A of 99 to 90 and a resin B of 1 to 10 by weight. get on.

(7)如(1)至(6)中任一項之密封膜之製造方法,其中使用具有與樹脂A之熔點相同或低於其之熔點之樹脂作為樹脂D。 (7) A method for producing a sealing film according to any one of (1) to (6), wherein a resin having a melting point equal to or lower than a melting point of the resin A is used as the resin D.

又,根據本發明之第2態樣,可提供以下之密封膜。 Further, according to the second aspect of the present invention, the following sealing film can be provided.

(8)一種密封膜,其係夾入袋體所收納之發電元件之電極與袋體之邊緣之間者,並且具有將包含樹脂C之耐熱層直接積層於包含羧酸改性聚烯烴樹脂D之電極接著層上而成之積層構造,該樹脂C係藉由 將接枝聚合有羧酸之酸改性聚烯烴樹脂A與具有可與樹脂A之羧基反應之官能基之樹脂B兩者進行熔融混練,使樹脂A之羧基與樹脂B之官能基化學鍵結進行改性而成者。 (8) A sealing film which is sandwiched between the electrode of the power generating element housed in the bag body and the edge of the bag body, and has a heat-resistant layer containing the resin C directly laminated on the carboxylic acid-modified polyolefin resin D The electrode is formed on the layer by a layered structure, and the resin C is The acid-modified polyolefin resin A graft-polymerized with a carboxylic acid and the resin B having a functional group reactive with the carboxyl group of the resin A are melt-kneaded to chemically bond the carboxyl group of the resin A with the functional group of the resin B. Modified by the original.

(9)如(8)之密封膜,其中樹脂B係選自具有羥基、胺基或環氧基之樹脂中之一種或兩種以上。 (9) The sealing film of (8), wherein the resin B is one or more selected from the group consisting of a resin having a hydroxyl group, an amine group or an epoxy group.

(10)如(8)或(9)之密封膜,其中樹脂A係使順丁烯二酸酐接枝聚合於聚丙烯上而成之酸改性聚烯烴樹脂。 (10) The sealing film according to (8) or (9), wherein the resin A is an acid-modified polyolefin resin obtained by graft-polymerizing maleic anhydride onto polypropylene.

(11)如(8)至(10)中任一項之密封膜,其中上述積層構造係藉由樹脂C與樹脂D之共擠出而形成。 (11) The sealing film according to any one of (8) to (10) wherein the laminated structure is formed by co-extrusion of the resin C and the resin D.

(12)如(8)至(11)中任一項之密封膜,其係於上述耐熱層上積層有與袋體之最內層熱熔接之密封層者。 (12) The sealing film according to any one of (8) to (11), wherein the heat-resistant layer is laminated with a sealing layer thermally welded to the innermost layer of the bag body.

本發明之密封膜之製造方法係使樹脂A之羧基與樹脂B之官能基化學鍵結而改性為樹脂C,因此不需要電子束交聯等交聯步驟。因此,可藉由簡單之步驟而賦予耐熱層耐熱性。 In the method for producing a sealing film of the present invention, the carboxyl group of the resin A is chemically bonded to the functional group of the resin B to be modified into the resin C. Therefore, a crosslinking step such as electron beam crosslinking is not required. Therefore, the heat resistance of the heat-resistant layer can be imparted by a simple procedure.

由於僅將樹脂A與樹脂B之兩者熔融混練,故而可於製膜步驟所使用之通常擠出機內改性為樹脂C。 Since only the resin A and the resin B are melted and kneaded, they can be modified into the resin C in a usual extruder used in the film forming step.

於本發明中,於樹脂C與樹脂D中之任一者或兩者為熔融狀態時,直接積層耐熱層與電極接著層。積層方法係組合擠出機與製膜模頭而形成一個層後,擠出層壓另一層。另一積層方法係將耐熱層與電極接著層共擠出。藉由該等方法,於本發明中,可藉由簡單之步驟而以較高接著強度直接積層耐熱層與電極接著層。藉由該等方法之密封膜於熱密封時,難以產生因高溫之密封棒之接觸或輻射熱而引起之密封膜熔化,或變形。藉此,難以引起電極與袋體之金屬箔之短路。 In the present invention, when either or both of the resin C and the resin D are in a molten state, the heat-resistant layer and the electrode-attached layer are directly laminated. The lamination method combines an extruder with a film forming die to form a layer, and then extrusion laminates another layer. Another method of lamination is to coextrude the heat resistant layer with the electrode back layer. By these methods, in the present invention, the heat-resistant layer and the electrode-attached layer can be directly laminated with a high adhesion strength by a simple procedure. When the sealing film of these methods is heat-sealed, it is difficult to cause the sealing film to be melted or deformed due to the contact of the high-temperature sealing rod or the radiant heat. Thereby, it is difficult to cause a short circuit between the electrode and the metal foil of the bag body.

尤其是耐熱層與電極接著層之共擠出可藉由更為簡單之步驟,而以更高接著強度直接積層耐熱層與電極接著層。 In particular, the co-extrusion of the heat-resistant layer and the electrode-attached layer can directly laminate the heat-resistant layer and the electrode-attached layer with a higher bonding strength by a simpler step.

本發明之密封膜之耐熱層具有使樹脂A之羧基與樹脂B之官能基化學鍵結進行改性而成之熔融流動性較小之樹脂C。藉此,於熱密封時,耐熱層難以變薄,或密封膜難以熱變形。因此,難以引起電極與袋體之金屬箔之短路。 The heat-resistant layer of the sealing film of the present invention has a resin C having a small melt flow property by chemically bonding a carboxyl group of the resin A to a functional group of the resin B. Thereby, the heat-resistant layer is hard to be thinned at the time of heat sealing, or the sealing film is hard to be thermally deformed. Therefore, it is difficult to cause a short circuit between the electrode and the metal foil of the bag body.

若樹脂B為選自具有羥基、胺基或環氧基之樹脂中之一種或兩種以上,則樹脂A之羧基與樹脂B之官能基容易化學鍵結,而順利地改性為樹脂C。由於藉由將樹脂A與樹脂B熔融混練而改性為樹脂C,故而樹脂A之羧基與樹脂B之官能基容易均勻地化學鍵結。 When the resin B is one or more selected from the group consisting of a hydroxyl group, an amine group, or an epoxy group, the carboxyl group of the resin A and the functional group of the resin B are easily chemically bonded, and are smoothly modified into the resin C. Since the resin A and the resin B are melt-kneaded to be modified into the resin C, the carboxyl group of the resin A and the functional group of the resin B are easily chemically bonded uniformly.

若樹脂A為使順丁烯二酸酐接枝聚合於聚丙烯上而成之酸改性聚烯烴樹脂,則樹脂A之羧基與樹脂B之官能基容易化學鍵結,變得更順利地改性為樹脂C。 When the resin A is an acid-modified polyolefin resin obtained by graft-polymerizing maleic anhydride onto polypropylene, the carboxyl group of the resin A and the functional group of the resin B are easily chemically bonded, and are more smoothly modified into Resin C.

若密封膜之積層構造係藉由樹脂C與樹脂D之共擠出而形成,則積層構造之接著強度較高,於熱密封時密封膜不會熱變形,或難以引起電極與袋體之金屬箔之短路。 If the laminated structure of the sealing film is formed by co-extrusion of the resin C and the resin D, the bonding strength of the laminated structure is high, the sealing film is not thermally deformed during heat sealing, or the metal of the electrode and the bag body is hard to be caused. Short circuit of the foil.

若將與袋體之最內層熱熔接之密封層積層於耐熱層上,則可提高袋體之最內層與密封膜之熱熔接強度。又,若將密封層直接積層於耐熱層上,則可防止由電解液引起之接著界面之剝離。 When the sealing layer thermally fused to the innermost layer of the bag is laminated on the heat-resistant layer, the heat fusion strength between the innermost layer of the bag and the sealing film can be improved. Further, when the sealing layer is directly laminated on the heat-resistant layer, peeling of the interface due to the electrolytic solution can be prevented.

1‧‧‧密封膜 1‧‧‧ sealing film

2‧‧‧電極接著層 2‧‧‧electrode layer

3‧‧‧耐熱層 3‧‧‧Heat resistant layer

4‧‧‧密封層 4‧‧‧ Sealing layer

10‧‧‧附有密封膜之電極 10‧‧‧electrode with sealing film

11‧‧‧電極 11‧‧‧Electrode

20‧‧‧袋體之層壓膜 20‧‧‧ laminated film of bag

21‧‧‧層壓膜之金屬箔 21‧‧‧Metal foil for laminated film

22‧‧‧層壓膜之密封層 22‧‧‧Layer film sealing layer

23‧‧‧層壓膜之膜基材 23‧‧‧ Film substrate of laminated film

圖1係表示本發明之密封膜之一例之剖面圖。 Fig. 1 is a cross-sectional view showing an example of a sealing film of the present invention.

圖2係表示使用圖1所示密封膜而接合袋體之層壓膜與電極之狀態之剖面圖。 Fig. 2 is a cross-sectional view showing a state in which a laminate film and an electrode of a bag body are joined using the sealing film shown in Fig. 1.

圖3A係表示將圖1所示密封膜接著於電極上而成之附有密封膜之電極的立體圖。 Fig. 3A is a perspective view showing an electrode with a sealing film formed by attaching the sealing film shown in Fig. 1 to an electrode.

圖3B係表示將圖1所示密封膜接著於電極上而成之附有密封膜之電極的剖面圖。 Fig. 3B is a cross-sectional view showing an electrode with a sealing film formed by attaching the sealing film shown in Fig. 1 to an electrode.

以下,基於實施形態對本發明進行詳細說明。 Hereinafter, the present invention will be described in detail based on the embodiments.

圖1係表示本發明之密封膜1之概略構成之剖面圖。 Fig. 1 is a cross-sectional view showing a schematic configuration of a sealing film 1 of the present invention.

圖2係表示將圖1所示之密封膜1插入袋體之層壓膜20與電極11之間並熔接之狀態,且沿電極11之長度方向之剖面圖。 Fig. 2 is a cross-sectional view showing the state in which the sealing film 1 shown in Fig. 1 is inserted between the laminate film 20 of the bag body and the electrode 11 and welded thereto, along the longitudinal direction of the electrode 11.

圖3A係表示將圖1所示之密封膜1接著於電極11上而成之附有密封膜之電極10之立體圖。圖3B係表示附有相同密封膜之電極10之與電極11之長度方向正交之方向上之剖面圖。 Fig. 3A is a perspective view showing the electrode 10 with the sealing film formed by attaching the sealing film 1 shown in Fig. 1 to the electrode 11. Fig. 3B is a cross-sectional view showing the electrode 10 with the same sealing film in a direction orthogonal to the longitudinal direction of the electrode 11.

本發明之密封膜1係夾入袋體所收納之發電元件之電極與袋體之邊緣之間。該膜之基本層構成如圖1及圖2所示,具有由電極接著層2與耐熱層3積層而成之包含至少2層之積層構造。本形態例之密封膜1係於基本層構成之耐熱層3上進而直接積層與袋體之最內層之密封層22熱熔接之密封層4。 The sealing film 1 of the present invention is sandwiched between the electrode of the power generating element housed in the bag body and the edge of the bag body. As shown in FIGS. 1 and 2, the basic layer structure of the film has a laminated structure including at least two layers formed by laminating the electrode underlayer 2 and the heat-resistant layer 3. The sealing film 1 of the present embodiment is a sealing layer 4 which is formed by laminating the heat-resistant layer 3 having a basic layer and directly laminating the sealing layer 22 of the innermost layer of the bag.

本發明之密封膜1之厚度較佳為50μm~300μm。若密封膜1之厚度小於該範圍,則有絕緣性降低之情況。再者,密封膜1之厚度亦可大於該範圍。但是,無法期待絕緣性之進一步提高,而且反而變得難以進行熱密封。 The thickness of the sealing film 1 of the present invention is preferably from 50 μm to 300 μm. If the thickness of the sealing film 1 is less than this range, the insulation property may fall. Furthermore, the thickness of the sealing film 1 may also be larger than this range. However, it is not expected to further improve the insulation property, and it becomes difficult to perform heat sealing.

耐熱層3包含樹脂C,該樹脂C係藉由將接枝聚合有羧酸之酸改性聚烯烴樹脂A與具有可與樹脂A之羧基反應之官能基之樹脂B兩者進行熔融混練,使樹脂A之羧基與樹脂B之官能基進行化學鍵結而改性者。 The heat-resistant layer 3 contains a resin C which is melt-kneaded by both an acid-modified polyolefin resin A graft-polymerized with a carboxylic acid and a resin B having a functional group reactive with a carboxyl group of the resin A. The carboxyl group of the resin A is chemically bonded to the functional group of the resin B to be modified.

此時之樹脂之調配比例較佳為相對於99~90重量%之樹脂A,樹脂B為1~10重量%。若樹脂B之調配比例低於該範圍,則有樹脂C之改性效果較小,而變得缺乏密封膜1之耐熱性之情況。若樹脂B之調配比例高於該範圍,則耐熱層3容易變脆。因此,於裝有電池組時,有因電極11之彎折而於耐熱層3上產生裂痕之情況。 The blending ratio of the resin at this time is preferably from 99 to 90% by weight of the resin A, and the resin B is from 1 to 10% by weight. When the blending ratio of the resin B is less than the above range, the effect of modifying the resin C is small, and the heat resistance of the sealing film 1 is lacking. If the blending ratio of the resin B is higher than the range, the heat-resistant layer 3 is liable to become brittle. Therefore, when the battery pack is mounted, cracks may occur on the heat-resistant layer 3 due to the bending of the electrode 11.

耐熱層3確保袋體之層壓膜20之金屬箔21與電極11之絕緣性。耐 熱層3防止於熱熔接時密封膜1之熱變形,只要可確保絕緣性,則較佳為較薄。耐熱層3之厚度較佳為30μm~150μm。若耐熱層3之厚度未達50μm,則有時密封膜1會發生熱變形,或於熱熔接時變薄,而變得缺乏絕緣性。再者,耐熱層3之厚度亦可超過150μm。但是,無法期待絕緣性之進一步提高。構成耐熱層3之樹脂與樹脂A相比,樹脂B僅化學鍵結於樹脂A上之部分與樹脂A相比高分子化,相對較硬而熔融流動性較低。因此,若耐熱層3變厚為必需以上,則於將電極11夾入兩片密封膜1、1之間時,由電極11之厚度之階差所產生之間隙於熱熔接時難以填滿。藉此,有時於密封膜1、1之間產生針孔。 The heat-resistant layer 3 ensures insulation between the metal foil 21 of the laminate film 20 of the bag body and the electrode 11. Resistant The heat layer 3 prevents thermal deformation of the sealing film 1 at the time of heat fusion, and is preferably thin as long as insulation can be ensured. The thickness of the heat-resistant layer 3 is preferably from 30 μm to 150 μm. When the thickness of the heat-resistant layer 3 is less than 50 μm, the sealing film 1 may be thermally deformed or thinned at the time of heat fusion, and may become insulative. Further, the thickness of the heat-resistant layer 3 may also exceed 150 μm. However, further improvement in insulation cannot be expected. The resin constituting the heat-resistant layer 3 is more polymerized than the resin A in the resin B than the resin A, and is relatively hard and has low melt fluidity. Therefore, when the heat-resistant layer 3 is thicker than necessary, when the electrode 11 is sandwiched between the two sealing films 1 and 1, the gap caused by the step of the thickness of the electrode 11 is hard to be filled at the time of heat fusion. Thereby, pinholes may be formed between the sealing films 1 and 1.

酸改性聚烯烴樹脂A係藉由將使伸烷基單體、例如乙烯、丙烯等之1種或2種以上聚合而成之聚烯烴作為基礎樹脂,接枝聚合不飽和羧酸或其衍生物而獲得。 The acid-modified polyolefin resin A is a graft-polymerized unsaturated carboxylic acid or a derivative thereof by using a polyolefin obtained by polymerizing one or two or more kinds of alkylene monomers, for example, ethylene or propylene. Obtained by things.

作為聚烯烴,例如使用聚丙烯或聚乙烯之均聚物及共聚物。作為共聚物,使用丙烯與1~5重量%之乙烯之無規共聚物(無規PP)或嵌段共聚物(嵌段PP)、乙烯與1~10重量%之丙烯之無規或嵌段共聚物、丙烯或乙烯與1~10重量%之碳數為4以上之α-烯烴之共聚物、及該等之混合物等。 As the polyolefin, for example, a homopolymer and a copolymer of polypropylene or polyethylene are used. As the copolymer, a random copolymer of propylene and 1 to 5% by weight of ethylene random copolymer (random PP) or block copolymer (block PP), ethylene and 1 to 10% by weight of propylene are used. A copolymer, a copolymer of propylene or ethylene and 1 to 10% by weight of an α-olefin having 4 or more carbon atoms, and a mixture thereof.

為了將袋體之層壓膜20之密封層22設為聚乙烯系樹脂,而於密封膜1之耐熱層3中使用聚乙烯系樹脂作為樹脂A之基礎樹脂之情形時,較佳為使用熔點為130~140℃左右之直鏈狀低密度聚乙烯或高密度聚乙烯。 In order to use the sealing layer 22 of the laminated film 20 of the bag body as a polyethylene resin and the polyethylene resin as the base resin of the resin A in the heat-resistant layer 3 of the sealing film 1, it is preferred to use a melting point. It is a linear low-density polyethylene or high-density polyethylene of about 130 to 140 °C.

酸改性聚烯烴樹脂A之基礎樹脂較佳為使用熔融流動速率(MFR)為0.5~30g/10min,尤其是5~15g/10min之均聚丙烯及丙烯-乙烯無規共聚物或,MFR為0.3~30g/10min之聚乙烯及乙烯-α烯烴共聚物。 The base resin of the acid-modified polyolefin resin A is preferably a homopolypropylene and a propylene-ethylene random copolymer having a melt flow rate (MFR) of 0.5 to 30 g/10 min, particularly 5 to 15 g/10 min, or MFR Polyethylene and ethylene-α-olefin copolymers of 0.3 to 30 g/10 min.

形成耐熱層3之樹脂C之MFR較佳為0.5g/10min~3g/10min之範圍。若MFR小於該範圍,則有難以成形之情況。若MFR大於該範圍, 則有於熱熔接時,耐熱層3會變形,或變薄,而導致絕緣性下降之情況。 The MFR of the resin C forming the heat-resistant layer 3 is preferably in the range of 0.5 g/10 min to 3 g/10 min. If the MFR is smaller than the range, it may be difficult to form. If the MFR is greater than the range, In the case of heat fusion, the heat-resistant layer 3 may be deformed or thinned, resulting in a decrease in insulation properties.

對於耐熱層3,謀求於將本發明之密封膜1熱熔接於電極11上時難以熔融或軟化。因此,形成其之樹脂C之熔點越高越好。具體而言,於包含聚丙烯系樹脂之密封膜之情形時,較佳為藉由JIS K6921-2DSC法所測得之熔點為130~170℃之樹脂。 In the heat-resistant layer 3, it is difficult to melt or soften the sealing film 1 of the present invention when it is thermally welded to the electrode 11. Therefore, the higher the melting point of the resin C forming the better, the better. Specifically, in the case of a sealing film comprising a polypropylene resin, a resin having a melting point of 130 to 170 ° C as measured by a JIS K6921-2DSC method is preferred.

為了獲得此種樹脂C,較佳使用以聚丙烯(PP)之均聚物、乙烯與丙烯之無規共聚物或嵌段共聚物或該等之聚合物合金作為基礎樹脂的酸改性聚烯烴樹脂作為樹脂A。PP系樹脂通常於低溫環境下容易變脆。由於乙烯與丙烯之嵌段共聚物即便熔點較高柔軟性亦優異,且於低溫環境下亦不變脆(耐寒性),故而較佳。 In order to obtain such a resin C, it is preferred to use an acid-modified polyolefin which is a homopolymer of polypropylene (PP), a random copolymer or block copolymer of ethylene and propylene or a polymer alloy of the above as a base resin. The resin was used as the resin A. PP-based resins are generally brittle in low temperature environments. Since the block copolymer of ethylene and propylene is excellent in flexibility even at a high melting point and is not brittle (cold resistance) in a low temperature environment, it is preferable.

作為接枝聚合於酸改性聚烯烴樹脂A之基礎樹脂上之不飽和羧酸,例如可列舉:丙烯酸、甲基丙烯酸、順丁烯二酸、反丁烯二酸、衣康酸、檸康酸、該等之酸酐、及該等之酯、醯胺、醯亞胺、金屬鹽等衍生物。該等不飽和羧酸中,較佳為順丁烯二酸,最佳為順丁烯二酸酐。又,為了促進聚烯烴與該等不飽和羧酸之反應,例如較佳為使用過氧化苯甲醯、過氧化月桂醯等有機過氧化物或偶氮二異丁腈等自由基聚合起始劑。 Examples of the unsaturated carboxylic acid graft-polymerized on the base resin of the acid-modified polyolefin resin A include acrylic acid, methacrylic acid, maleic acid, fumaric acid, itaconic acid, and citrine. An acid, such an acid anhydride, and derivatives of such esters, guanamines, quinones, metal salts, and the like. Among these unsaturated carboxylic acids, maleic acid is preferred, and maleic anhydride is most preferred. Further, in order to promote the reaction between the polyolefin and the unsaturated carboxylic acid, for example, an organic peroxide such as benzamidine peroxide or laurel, or a radical polymerization initiator such as azobisisobutyronitrile is preferably used. .

作為接枝聚合之不飽和羧酸之量,通常相對於單體之總重量為0.5~5重量%。 The amount of the unsaturated carboxylic acid to be graft-polymerized is usually 0.5 to 5% by weight based on the total weight of the monomers.

於聚烯烴上接枝聚合不飽和羧酸之方法例如有如下方法:於熔融狀態下使聚烯烴與不飽和羧酸反應之方法;於漿料狀態下使聚烯烴與不飽和羧酸反應之方法;於氣相狀態下使聚烯烴與不飽和羧酸反應之方法等。該等方法中,於熔融狀態下反應之方法由於操作容易,故而較佳。具體而言,利用滾筒、亨舍爾混合機等充分混合上述所示之聚烯烴、不飽和羧酸、有機過氧化物等聚合起始劑。其後,熔融混練 而進行接枝化反應。 The method for graft-polymerizing an unsaturated carboxylic acid onto a polyolefin is, for example, a method of reacting a polyolefin with an unsaturated carboxylic acid in a molten state; and a method of reacting a polyolefin with an unsaturated carboxylic acid in a slurry state; A method of reacting a polyolefin with an unsaturated carboxylic acid in a gas phase state. Among these methods, the method of reacting in a molten state is preferred because of ease of handling. Specifically, a polymerization initiator such as a polyolefin, an unsaturated carboxylic acid or an organic peroxide as described above is sufficiently mixed by a roll, a Henschel mixer or the like. Thereafter, melt kneading The grafting reaction is carried out.

熔融混練之方法並無特別限制,例如可使用螺旋擠出機、班伯裏混煉機、混煉輥等進行。該等方法中,螺旋擠出機由於操作簡便,故而可較佳地使用。螺旋擠出機可為單軸、雙軸、或其以上之多軸螺旋。熔融混練之溫度較佳為所使用之聚烯烴之熔點以上且所使用之有機過氧化物之分解溫度以下。具體之溫度及時間通常為於160~280℃下0.3~30分鐘,較佳為於170~250℃下1~10分鐘。 The method of melt kneading is not particularly limited, and for example, it can be carried out using a screw extruder, a Banbury mixer, a kneading roll or the like. Among these methods, the screw extruder can be preferably used because of its simple operation. The screw extruder can be a multi-axis spiral of uniaxial, biaxial, or more. The temperature of the melt kneading is preferably not less than the melting point of the polyolefin used and below the decomposition temperature of the organic peroxide used. The specific temperature and time are usually from 0.3 to 30 minutes at 160 to 280 ° C, preferably from 1 to 10 minutes at 170 to 250 ° C.

將於酸改性聚烯烴樹脂A中熔融混練樹脂B而改性之樹脂C成形為層狀,而形成賦予密封膜耐熱性之耐熱層3。形成耐熱層3之方法可列舉:將樹脂C於複數個輥間進行壓延之壓光法;利用T模或環模將熔融之樹脂C擠出之擠出法。該等方法中,擠出法由於可利用改性步驟所使用之擠出機而將熔融混練而成之樹脂C直接擠出,故而較佳。 The resin C modified by melt-kneading the resin B in the acid-modified polyolefin resin A is formed into a layer shape to form a heat-resistant layer 3 which imparts heat resistance to the sealing film. The method of forming the heat-resistant layer 3 may be a calendering method in which the resin C is rolled between a plurality of rolls, and an extrusion method in which the molten resin C is extruded by a T-die or a ring mold. Among these methods, the extrusion method is preferred because the resin C which is melt-kneaded can be directly extruded by the extruder used in the modification step.

於向樹脂C之改性步驟之前階段,較佳為增加將聚烯烴與不飽和羧酸類投入擠出機中進行熔融混練,而改性為酸改性聚烯烴樹脂A之步驟。其後,較佳為進而將樹脂B投入此擠出機中,將樹脂A改性為樹脂C。 In the stage before the modification step of the resin C, it is preferred to add a step of modifying the polyolefin-modified polyolefin resin A by introducing the polyolefin and the unsaturated carboxylic acid into an extruder for melt-kneading. Thereafter, it is preferred to further introduce the resin B into the extruder to modify the resin A into the resin C.

再者,將不飽和羧酸接枝聚合而成之酸改性聚烯烴樹脂在市面上有售,因此亦可使用市售品。 Further, since an acid-modified polyolefin resin obtained by graft-polymerizing an unsaturated carboxylic acid is commercially available, a commercially available product can also be used.

與不飽和羧酸接枝聚合而成之PP系聚合物包括利用金屬氫氧化物、氧化物、低級脂肪酸鹽等中和羧基而成之離子聚合物。 The PP-based polymer obtained by graft-polymerizing an unsaturated carboxylic acid includes an ionic polymer obtained by neutralizing a carboxyl group with a metal hydroxide, an oxide, or a lower fatty acid salt.

作為樹脂B所具有之可與樹脂A之羧基反應的官能基,可列舉羥基、胺基、羧基、甲醯基、環氧基等。作為具有該等官能基之樹脂B,並無特別限制,較佳為容易獲得之通用樹脂。作為此種通用樹脂,可列舉:乙烯-乙烯醇共聚物(EVOH,ethylene vinyl alcohol)、聚乙烯醇(PVA,polyvinyl alcohol)、尼龍6或尼龍66等聚醯胺(PA,polyamide)、乙烯-甲基丙烯酸縮水甘油酯共聚物(E-GMA,ethylene- glycidyl methacrylate)等含環氧基樹脂等。因此,作為可與樹脂A之羧基反應之較佳官能基,可列舉羥基、胺基、環氧基。 Examples of the functional group which the resin B can react with the carboxyl group of the resin A include a hydroxyl group, an amine group, a carboxyl group, a methyl group, an epoxy group and the like. The resin B having such a functional group is not particularly limited, and is preferably a general-purpose resin which is easily available. Examples of such a general-purpose resin include polyethylene vinyl alcohol (EVOH), polyvinyl alcohol (PVA, polyvinyl alcohol), nylon 6 or nylon 66, and the like. Glycidyl methacrylate copolymer (E-GMA, ethylene- An epoxy group-containing resin such as glycidyl methacrylate). Therefore, as a preferable functional group which can react with the carboxyl group of the resin A, a hydroxyl group, an amine group, and an epoxy group are mentioned.

於使用EVOH作為樹脂B之情形時,就與樹脂A之相溶性或加工性之觀點而言,MFR較佳為1~30g/10min(230℃)。MFR更佳為1~20g/10min、尤佳為3~16g/10min。作為EVOH中之乙烯含量,乙烯較佳為20~60莫耳%,更佳為25~50莫耳%。 When EVOH is used as the resin B, the MFR is preferably from 1 to 30 g/10 min (230 ° C) from the viewpoint of compatibility with the resin A or workability. The MFR is preferably from 1 to 20 g/10 min, and more preferably from 3 to 16 g/10 min. As the ethylene content in the EVOH, ethylene is preferably from 20 to 60 mol%, more preferably from 25 to 50 mol%.

於使用聚醯胺作為樹脂B之情形時,就為了實現穩定化而封阻末端胺基從而減少末端胺基量之聚醯胺而言,較佳為使用末端胺基量與末端羧基量相同之聚醯胺,或末端接基相對於末端胺基之莫耳比為2以上且末端胺基量為8.0×10-5莫耳/g以上之聚醯胺。此種聚醯胺可提高樹脂C之熔融黏度之剪切速率依賴性。聚醯胺之熔點在通用樹脂中相對較高,因此所獲得之樹脂C之針對熱變形之耐性提高。 In the case where polyamine is used as the resin B, in order to stabilize the polyamine which blocks the terminal amine group and reduces the terminal amine group, it is preferred to use the same amount of the terminal amine group as the terminal carboxyl group. Polyammonium, or a polyamine having a molar ratio of terminal groups to terminal amino groups of 2 or more and terminal amino groups of 8.0 × 10 -5 mol/g or more. Such polyamine can increase the shear rate dependence of the melt viscosity of the resin C. The melting point of polyamine is relatively high in the general-purpose resin, and thus the resistance of the obtained resin C to thermal deformation is improved.

於使用含環氧基樹脂作為樹脂B之情形時,就與樹脂B之相溶性或加工性之觀點而言,較佳為將乙烯單體共聚合而成者。樹脂A之羧基將含環氧基樹脂之環氧基開環,而將由開環所生成之羥基酯化。該酯化反覆進行。結果樹脂C之分子構造成為交聯構造,而使針對熱變形之耐性提高。 When an epoxy group-containing resin is used as the resin B, it is preferred to copolymerize the ethylene monomer from the viewpoint of compatibility with the resin B or workability. The carboxyl group of the resin A is ring-opened with an epoxy group containing an epoxy group, and the hydroxyl group formed by ring opening is esterified. This esterification is carried out in turn. As a result, the molecular structure of the resin C became a crosslinked structure, and the resistance against thermal deformation was improved.

電極接著層2係將密封膜1於電極11上加熱加壓進行熱熔接而成之層。電極接著層2包含與金屬之接著性優異之羧酸改性聚烯烴樹脂D。 The electrode adhesive layer 2 is a layer obtained by heat-pressing the sealing film 1 on the electrode 11 to be thermally welded. The electrode adhesive layer 2 contains a carboxylic acid-modified polyolefin resin D excellent in adhesion to a metal.

樹脂D係使烷烯單體、例如乙烯、丙烯等之1種或2種以上與不飽和羧酸或其衍生物之1種或2種以上共聚合而成之樹脂。作為共聚物,可列舉嵌段共聚物、接枝共聚物或無規共聚物。於使用接枝共聚物之情形時,可將與樹脂A相同之聚烯烴和與樹脂A相同之不飽和羧酸接枝聚合而製成羧酸改性聚烯烴樹脂D。 Resin D is a resin obtained by copolymerizing one or two or more kinds of an alkene monomer, for example, ethylene or propylene, with one or more of an unsaturated carboxylic acid or a derivative thereof. The copolymer may, for example, be a block copolymer, a graft copolymer or a random copolymer. In the case of using a graft copolymer, the same polyolefin as the resin A and the unsaturated carboxylic acid similar to the resin A may be graft-polymerized to form a carboxylic acid-modified polyolefin resin D.

電極接著層2只要確保與電極11之熱熔接,則較佳為較薄。通常 電極接著層2之厚度為20μm~60μm。若電極接著層2之厚度小於該範圍,則有電極接著層2與電極11之接著強度降低之情況。若電極接著層2之厚度大於該範圍,則有變得缺乏密封膜1之耐熱性之情況。 The electrode underlayer 2 is preferably thin as long as it is thermally welded to the electrode 11. usually The thickness of the electrode underlayer 2 is 20 μm to 60 μm. If the thickness of the electrode underlayer 2 is smaller than the range, there is a case where the adhesion strength between the electrode underlayer 2 and the electrode 11 is lowered. If the thickness of the electrode underlayer 2 is larger than the range, the heat resistance of the sealing film 1 may become insufficient.

形成電極接著層2之樹脂D之熔點較佳為低於形成耐熱層3之樹脂C之熔點。於包含聚丙烯系樹脂之密封膜1之情形時,樹脂D之熔點較佳為130℃~150℃。若樹脂D之熔點低於該範圍,則有變得缺乏密封膜1之耐熱性之情況。若樹脂D之熔點高於該範圍,則難以增大與形成耐熱層3之樹脂C之熔點差。若樹脂D與樹脂C之熔點差為10℃以上,則熱熔接時之溫度管理變得容易,故而較佳。 The melting point of the resin D forming the electrode subsequent layer 2 is preferably lower than the melting point of the resin C forming the heat-resistant layer 3. In the case of the sealing film 1 containing a polypropylene resin, the melting point of the resin D is preferably from 130 ° C to 150 ° C. If the melting point of the resin D is less than the above range, the heat resistance of the sealing film 1 may become insufficient. If the melting point of the resin D is higher than the range, it is difficult to increase the difference in melting point of the resin C which forms the heat-resistant layer 3. When the difference in melting point between the resin D and the resin C is 10 ° C or more, temperature management at the time of heat fusion is facilitated, which is preferable.

樹脂D之熔點較佳為等於或低於樹脂A之熔點。若將樹脂A改性為樹脂C,則樹脂B之分子鍵結於樹脂A之分子上,而使樹脂C之分子量增大,從而使樹脂C之熔點變得高於樹脂A。藉此,變得容易使樹脂D與樹脂C之熔點差成為10℃以上。若將樹脂D與樹脂A採用相同之樹脂,則樹脂之管理變得容易。 The melting point of the resin D is preferably equal to or lower than the melting point of the resin A. When the resin A is modified to the resin C, the molecules of the resin B are bonded to the molecules of the resin A, and the molecular weight of the resin C is increased, so that the melting point of the resin C becomes higher than that of the resin A. Thereby, the difference in melting point between the resin D and the resin C is easily made 10 ° C or more. When the same resin is used for the resin D and the resin A, the management of the resin becomes easy.

形成電極接著層2之方法可列舉使用擠出機將熔融之樹脂D自T模或環模擠出之擠出法。使用接枝共聚物作為樹脂D之情形時,以與樹脂A相同之方式利用擠出機擠出時,可使聚烯烴與不飽和羧酸類接枝聚合。 The method of forming the electrode subsequent layer 2 may be an extrusion method in which the molten resin D is extruded from a T die or a ring die using an extruder. When a graft copolymer is used as the resin D, when extruded by an extruder in the same manner as the resin A, a polyolefin and an unsaturated carboxylic acid can be graft-polymerized.

為了製成包含聚乙烯系樹脂之密封膜,於電極接著層2中採用酸改性聚乙烯之情形時,較佳為熔點為90~120℃左右之順丁烯二酸酐接枝共聚合聚乙烯。酸改性聚乙烯包含將羧基中和而成之離子聚合物。 In order to form a sealing film comprising a polyethylene resin, in the case where an acid-modified polyethylene is used in the electrode adhesive layer 2, a maleic anhydride graft copolymerized polyethylene having a melting point of about 90 to 120 ° C is preferred. . The acid-modified polyethylene contains an ionic polymer obtained by neutralizing a carboxyl group.

形成電極接著層2之酸改性聚烯烴樹脂D之MFR較佳為3g/10min~30g/10min之範圍。MFR更佳為5g/10min~10g/10min之範圍。若MFR小於該等範圍,則於熱熔接時,酸改性聚烯烴難以充分迴繞於電極11之周圍。若MFR大於該等範圍,則電極接著層2變薄,而使接著強度不足。 The MFR of the acid-modified polyolefin resin D forming the electrode subsequent layer 2 is preferably in the range of 3 g/10 min to 30 g/10 min. The MFR is more preferably in the range of 5 g/10 min to 10 g/10 min. If the MFR is less than the above range, it is difficult for the acid-modified polyolefin to sufficiently rewind around the electrode 11 at the time of heat fusion. If the MFR is larger than the ranges, the electrode is subsequently thinned to the layer 2, so that the strength of the bonding is insufficient.

本發明中,MFR係依據JIS K7210,於聚丙烯系樹脂之情形時均於230℃下進行測定,於聚乙烯系樹脂之情形時均於190℃下進行測定。 In the present invention, the MFR is measured at 230 ° C in the case of a polypropylene resin in accordance with JIS K7210, and is measured at 190 ° C in the case of a polyethylene resin.

再者,羧酸改性聚烯烴樹脂在市面上有售,因此亦可使用市售品。 Further, since a carboxylic acid-modified polyolefin resin is commercially available, a commercially available product can also be used.

電極接著層2與耐熱層3係直接積層,並非於層間經由接著劑層或增黏劑層進行積層。藉此,可防止由電解液向積層界面之侵入所引起之剝離及密封膜1之柔軟性之下降。於密封膜1中,不僅電極接著層2,耐熱層3之向電極11周圍之迴繞亦重要。只要不影響柔軟性或與電解液之相互作用,亦可使用接著劑進行乾式層壓。又,於進行擠出層壓之情形時,亦可使用增黏劑。 The electrode underlayer 2 and the heat-resistant layer 3 are directly laminated, and are not laminated between the layers via the adhesive layer or the tackifier layer. Thereby, peeling by the penetration of the electrolytic solution to the laminated interface and deterioration of the flexibility of the sealing film 1 can be prevented. In the sealing film 1, not only the electrode is but also the layer 2, and the wrap around the electrode 11 of the heat-resistant layer 3 is also important. An adhesive can also be used for dry lamination as long as it does not affect softness or interaction with the electrolyte. Further, in the case of extrusion lamination, a tackifier may also be used.

作為直接積層之方法,可列舉:將所成形之電極接著層2與耐熱層3重疊並進行加熱熔接之熱層壓;預先成形電極接著層2與耐熱層3中之任一者,一面自T模將另一者以熔融狀態擠出,一面進行積層之擠出層壓法;於電極接著層2與耐熱層3兩者為熔融狀態時,一面自共擠出模擠出,一面進行積層之共擠出層壓法。該等方法中,共擠出層壓法係藉由將一面進行熔融混練而改性為樹脂C一面擠出樹脂C之擠出機、與擠出樹脂D之另一擠出機連接於共擠出模上,而於共擠出模內進行直接積層。藉此,可使向樹脂C之改性、耐熱層3之形成、電極接著層2之形成、電極接著層2與耐熱層3之積層於一個步驟中進行,故而較佳。 As a method of directly laminating, a heat lamination is performed in which the formed electrode underlayer 2 and the heat-resistant layer 3 are superposed and heat-welded; and any one of the electrode subsequent layer 2 and the heat-resistant layer 3 is formed in advance, and one side is self-t The extrusion lamination method in which the other is extruded in a molten state while laminating, and when the electrode underlayer 2 and the heat-resistant layer 3 are in a molten state, they are laminated while being extruded from a co-extrusion die. Co-extrusion lamination. In these methods, the coextrusion lamination method is an extruder which extrudes the resin C while being melt-kneaded on one side, and is connected to the other extruder of the extruded resin D by coextrusion. The mold is placed on the mold and laminated directly in the co-extrusion mold. Thereby, the modification to the resin C, the formation of the heat-resistant layer 3, the formation of the electrode underlayer 2, and the lamination of the electrode underlayer 2 and the heat-resistant layer 3 can be carried out in one step, which is preferable.

於本形態例中,將密封層4積層於耐熱層3之與電極接著層2相反面上。密封層4係與袋體之層壓膜20之密封層22進行加熱加壓而熔接之層。 In the present embodiment, the sealing layer 4 is laminated on the opposite surface of the heat-resistant layer 3 from the electrode subsequent layer 2. The sealing layer 4 is a layer which is heat-pressed and welded to the sealing layer 22 of the laminated film 20 of the bag body.

作為積層方法,基於與電極接著層2與耐熱層3之積層相同之原因而採用相同之方法。該等方法中,可將電極接著層2與耐熱層3與密 封層4一次性積層,因此較佳為利用共擠出層壓法進行積層。 As the lamination method, the same method is employed for the same reason as the lamination of the electrode underlayer 2 and the heat-resistant layer 3. In these methods, the electrode adhesion layer 2 and the heat resistant layer 3 can be densely bonded. Since the sealing layer 4 is laminated at one time, it is preferable to laminate by a co-extrusion lamination method.

密封層4只要確保與袋體之密封層22之熔接,則較佳為較薄。通常密封層4之厚度為20μm~40μm。若密封層4之厚度小於該等範圍,則密封層4與袋體之密封層22之熔接強度降低。若密封層4之厚度大於該範圍,則變得缺乏密封膜1之耐熱性。 The sealing layer 4 is preferably thin as long as it is welded to the sealing layer 22 of the bag body. Usually, the thickness of the sealing layer 4 is 20 μm to 40 μm. If the thickness of the sealing layer 4 is less than the above range, the welding strength of the sealing layer 4 and the sealing layer 22 of the bag body is lowered. If the thickness of the sealing layer 4 is larger than the range, the heat resistance of the sealing film 1 becomes insufficient.

就容易與袋體之層壓膜20之密封層22熔接之情況而言,形成密封層4之樹脂(以下,稱為樹脂E)較佳為與構成密封層22之樹脂同種或相同之樹脂。通常就耐熱性優異方面而言,密封膜1係由PP系樹脂所構成。 In the case where the sealing layer 22 of the laminated film 20 of the bag body is easily welded, the resin forming the sealing layer 4 (hereinafter referred to as the resin E) is preferably the same or the same resin as the resin constituting the sealing layer 22. In general, the sealing film 1 is composed of a PP resin in terms of excellent heat resistance.

於密封膜1由PP系樹脂所構成之情形時,樹脂E可列舉:PP之均聚物、乙烯與丙烯之無規共聚物或嵌段共聚物或該等之混合物、或該等之聚合物合金等。該等之中,就柔軟性優異方面而言,較佳為乙烯與丙烯之無規共聚物。 In the case where the sealing film 1 is composed of a PP-based resin, the resin E may be a homopolymer of PP, a random copolymer or a block copolymer of ethylene and propylene or a mixture thereof, or a polymer thereof. Alloys, etc. Among these, a random copolymer of ethylene and propylene is preferred in terms of excellent flexibility.

於包含PP系樹脂之密封膜之情形時,形成密封層4之樹脂E之熔點較佳為130℃~170℃。若樹脂E之熔點低於該範圍,則有變得缺乏密封膜1之耐熱性之情況。若形成密封層4之樹脂E之熔點高於該範圍,則難以增大與形成耐熱層3之樹脂C之熔點差。若樹脂E之熔點與樹脂C之熔點之差為10℃以上,則向袋體熔接層壓膜20時之溫度管理變得容易,故而較佳。 In the case of a sealing film comprising a PP-based resin, the melting point of the resin E forming the sealing layer 4 is preferably from 130 ° C to 170 ° C. If the melting point of the resin E is less than the above range, the heat resistance of the sealing film 1 may become insufficient. When the melting point of the resin E forming the sealing layer 4 is higher than the range, it is difficult to increase the difference in melting point of the resin C which forms the heat-resistant layer 3. When the difference between the melting point of the resin E and the melting point of the resin C is 10° C. or more, temperature management when the laminated body 20 is welded to the bag body is facilitated, which is preferable.

於將密封膜1製成聚乙烯系樹脂而於密封層4中採用聚乙烯系樹脂之情形時,較佳為使用熔點為100~120℃左右之低密度聚乙烯或直鏈狀低密度聚乙烯。 When the sealing film 1 is made of a polyethylene resin and a polyethylene resin is used for the sealing layer 4, it is preferable to use a low density polyethylene or a linear low density polyethylene having a melting point of about 100 to 120 ° C. .

於包含PP系樹脂之密封膜之情形時,形成密封層4之樹脂E之MFR較佳為3g/10min~30g/10min之範圍,更佳為5g/10min~10g/10min之範圍。若樹脂E之MFR小於該等範圍,則難以利用擠出層壓或共擠出層壓進行積層。若樹脂E之MFR大於該等範圍,則難以利用共 擠出環模進行成形。 In the case of a sealing film containing a PP-based resin, the MFR of the resin E forming the sealing layer 4 is preferably in the range of 3 g/10 min to 30 g/10 min, more preferably in the range of 5 g/10 min to 10 g/10 min. If the MFR of the resin E is less than the above range, it is difficult to laminate by extrusion lamination or co-extrusion lamination. If the MFR of the resin E is larger than the above range, it is difficult to utilize the total The extrusion ring mold is formed.

再者,密封層4為任意之層,於確保耐熱層3與袋體之密封層22之熔接之情形時,亦可不設置密封層4。 Further, the sealing layer 4 is an arbitrary layer, and when the heat-resistant layer 3 is welded to the sealing layer 22 of the bag body, the sealing layer 4 may not be provided.

將本發明之密封膜1熔接於袋體之密封層22與電極11之間。熔接密封膜1時,如圖2所示,使特定寬度之密封膜1自層壓膜20之端部露出並進行熔接。此時,為了使密封膜1之定位變得容易,較佳為預先著色2片密封膜1中之至少1片。著色之方法可使用對構成密封膜1之層之至少一層進行印刷、染色、染料或顏料等著色劑之捏合等方法。該等方法中,因著色劑之捏合簡便,故而較佳。著色之層亦可用於確認與袋體之密封層22之熔接是否良好。因此,著色之層較佳為於熔接時無變形或熔融之耐熱層3。 The sealing film 1 of the present invention is welded between the sealing layer 22 of the bag body and the electrode 11. When the sealing film 1 is welded, as shown in FIG. 2, the sealing film 1 of a specific width is exposed from the end of the laminated film 20 and welded. At this time, in order to facilitate the positioning of the sealing film 1, it is preferable to color at least one of the two sealing films 1 in advance. As the method of coloring, at least one layer of the layer constituting the sealing film 1 may be subjected to a method such as printing, dyeing, kneading of a coloring agent such as a dye or a pigment. Among these methods, the kneading of the coloring agent is simple, which is preferable. The colored layer can also be used to confirm whether the welding with the sealing layer 22 of the bag body is good. Therefore, the colored layer is preferably a heat-resistant layer 3 which is not deformed or melted at the time of welding.

本形態例之密封膜於熔接時為了實現密封膜1之定位與使樹脂無間隙地迴繞於電極之厚度方向之周圍,而如圖3A所示,較佳為預先使用密封膜1之電極接著層2而將本發明之密封膜1熱熔接於電極11之至少1面,較佳為兩面。藉此,可使用密封膜1之密封層4或耐熱層3,容易且確實地向袋體之密封層22進行熔接。此時,若將密封膜1著色,則於將密封膜與袋體之最內層熔接而成之電極引板之熱熔接時,可於自動化之熔接組裝線中使用感光器而將電極引板與密封膜1進行正確定位。 In the sealing film of the present embodiment, in order to achieve the positioning of the sealing film 1 and to wrap the resin around the thickness direction of the electrode without a gap, as shown in FIG. 3A, it is preferable to use the electrode bonding layer of the sealing film 1 in advance. 2, the sealing film 1 of the present invention is thermally fused to at least one surface of the electrode 11, preferably on both sides. Thereby, the sealing layer 4 of the sealing film 1 or the heat-resistant layer 3 can be used, and the sealing layer 22 of the bag body can be easily and surely welded. At this time, when the sealing film 1 is colored, when the sealing film is thermally welded to the electrode lead plate which is welded to the innermost layer of the bag body, the photoreceptor can be used in the automated welding assembly line to laminate the electrode lead plate. Correct positioning with the sealing film 1.

於密封膜1與電極11之熱熔接中,可使用熱封機或瞬間封口機等,並利用密封棒加熱而進行壓接。又,於密封膜1之加熱時,若使用電磁感應加熱或通電加熱而直接加熱電極11,則抑制由密封層4或耐熱層3之外側部分之熔融所引起之流動,並促進耐熱層3之內側部分或電極接著層2之軟化或熔融,故而較佳。 In the heat fusion bonding of the sealing film 1 and the electrode 11, a heat sealing machine, an instant sealing machine, or the like can be used, and the sealing can be performed by heating with a sealing rod. Further, when the electrode 11 is directly heated by electromagnetic induction heating or electric heating during heating of the sealing film 1, the flow caused by the melting of the sealing layer 4 or the outer portion of the heat-resistant layer 3 is suppressed, and the heat-resistant layer 3 is promoted. The inner portion or the electrode is preferably softened or melted by the layer 2, so that it is preferred.

電極11之形狀可例示帶狀或圓棒等。電極11之大小並無特別限制,例如若為帶狀,則厚度為50μm~500μm,寬度為5mm~100 mm,長度為40mm~100mm左右。帶狀之電極11亦可將其稜線(角緣部)變圓。又,雖然其表面亦可為經壓延加工之加工面之狀態,但較佳為藉由噴砂或蝕刻等表面處理進行粗面化。藉由進行粗面化,密封膜1之接著強度會提高。又,亦可實施化成處理等底層處理。 The shape of the electrode 11 can be exemplified by a belt shape or a round bar or the like. The size of the electrode 11 is not particularly limited. For example, if it is a strip shape, the thickness is 50 μm to 500 μm, and the width is 5 mm to 100. Mm, length is about 40mm~100mm. The strip-shaped electrode 11 can also round its ridge line (corner edge portion). Further, although the surface may be in the state of a processed surface which is subjected to calendering, it is preferably roughened by surface treatment such as sand blasting or etching. By roughening, the strength of the sealing film 1 is increased. Further, an underlayer process such as a chemical conversion process can also be performed.

作為電極11之材質,例如可使用鋁、銅、鎳、鉄、金、鉑或各種合金等金屬。該等之中,就導電性優異,且對成本亦有利之方面而言,較佳為使用鋁或銅。其中,鋁或銅存在如下情況:於電池組中,對於擔憂會於電解液中產生之氟化氫(氫氟酸)的耐性不充分。又,若PP系樹脂與銅接觸,則有促進樹脂劣化之可能性。因此,較佳為將導電性較高且對氫氟酸之耐性優異之鎳鍍敷於鋁或銅之底層金屬上。 As the material of the electrode 11, for example, a metal such as aluminum, copper, nickel, rhodium, gold, platinum or various alloys can be used. Among these, aluminum or copper is preferably used in terms of excellent electrical conductivity and advantageous in terms of cost. Among them, aluminum or copper has a case where the resistance to hydrogen fluoride (hydrofluoric acid) which is generated in the electrolytic solution is insufficient in the battery pack. Further, when the PP resin is in contact with copper, there is a possibility that the resin is deteriorated. Therefore, it is preferred to plate nickel having high conductivity and excellent resistance to hydrofluoric acid on the underlying metal of aluminum or copper.

熔接有本發明之密封膜1之袋體之層壓膜20例如可列舉如圖2所示,於金屬箔21之一面上積層密封層22,並於另一面上積層膜基材23而成之積層膜等。層壓膜20亦可積層其他層。 For example, as shown in FIG. 2, the laminate film 20 to which the bag body of the sealing film 1 of the present invention is welded is formed by laminating a sealing layer 22 on one surface of the metal foil 21 and laminating the film substrate 23 on the other surface. Laminated film, etc. The laminate film 20 may also be laminated with other layers.

袋體之層壓膜20係成形為經拉伸成形之袋或平袋等。作為金屬箔21,可列舉鋁箔、不鏽鋼箔、銅箔、鐵箔等。金屬箔21亦可實施化成處理等底層處理。 The laminated film 20 of the bag body is formed into a stretch-formed bag or a flat bag or the like. Examples of the metal foil 21 include an aluminum foil, a stainless steel foil, a copper foil, an iron foil, and the like. The metal foil 21 can also be subjected to an underlayer treatment such as a chemical conversion treatment.

形成袋體之層壓膜20之密封層22的樹脂係選擇可與密封膜1之密封層4熔接之樹脂。作為此種樹脂,例如於密封膜1之密封層4為PP系樹脂之情形時,可使用PP之均聚物或PP與乙烯之共聚物等。於聚乙烯系樹脂之情形時,可使用低密度聚乙烯或直鏈狀低密度聚乙烯等。構成膜基材23之樹脂並無特別限制,較佳為使用強度較大之聚醯胺、聚對苯二甲酸乙二酯(PET)或PP等。若將該等樹脂延伸而形成膜,則可獲得較高之物理強度。該等膜亦可積層複數層。 The resin forming the sealing layer 22 of the laminate film 20 of the bag body is selected from a resin which can be welded to the sealing layer 4 of the sealing film 1. When the sealing layer 4 of the sealing film 1 is a PP-based resin, for example, a homopolymer of PP or a copolymer of PP and ethylene can be used. In the case of a polyethylene-based resin, low-density polyethylene or linear low-density polyethylene or the like can be used. The resin constituting the film substrate 23 is not particularly limited, and it is preferred to use polyamine, polyethylene terephthalate (PET), PP or the like having high strength. When the resin is stretched to form a film, a high physical strength can be obtained. The films may also be laminated in multiple layers.

以上,雖然基於較佳之實施形態對本發明進行說明,但本發明並不限定於上述實施形態,可進行各種變更。 The present invention has been described above based on preferred embodiments, but the present invention is not limited to the above embodiments, and various modifications can be made.

例如密封膜1為了提高各樹脂層間之接著性、物理性強度或絕緣 性等,亦可進而含有樹脂層等其他層。於該情形時,其他層較佳為於熱熔接時難以熔融且柔軟性較高之層。又,亦可將各層間之層壓強度控制為適當範圍,而對密封膜1賦予於袋體內之溫度或壓力異常上升之情形時具備之安全閥之功能。 For example, the sealing film 1 is used to improve the adhesion, physical strength or insulation between the resin layers. Further, it may further contain other layers such as a resin layer. In this case, the other layer is preferably a layer which is difficult to melt and has high flexibility at the time of heat fusion. Moreover, the lamination strength between the layers can be controlled to an appropriate range, and the sealing film 1 can be provided with a function of a safety valve when the temperature or pressure in the bag abnormally rises.

[實施例] [Examples]

使用以下所示之樹脂而製作表1所示之密封膜1之實施例及比較例。 Examples and comparative examples of the sealing film 1 shown in Table 1 were produced using the resins shown below.

樹脂A:將順丁烯二酸酐接枝聚合於無規PP上而成之順丁烯二酸酐改性PP(MFR 2.4g/10min(230℃)、熔點143℃) Resin A: Maleic anhydride modified PP obtained by graft-polymerizing maleic anhydride onto a random PP (MFR 2.4 g/10 min (230 ° C), melting point 143 ° C)

樹脂B Resin B

樹脂B-1:乙烯比率48mol%之EVOH(MFR 15g/10min(230℃)、熔點160℃) Resin B-1: EVOH having an ethylene ratio of 48 mol% (MFR 15 g/10 min (230 ° C), melting point 160 ° C)

樹脂B-2:乙烯比率32mol%之EVOH(MFR 3.6g/10min(230℃)、熔點183℃) Resin B-2: EVOH having an ethylene ratio of 32 mol% (MFR 3.6 g/10 min (230 ° C), melting point 183 ° C)

樹脂B-3:尼龍6(相對黏度3.37、熔點220℃) Resin B-3: Nylon 6 (relative viscosity 3.37, melting point 220 ° C)

樹脂B-4:尼龍6(相對黏度4.08、熔點220℃) Resin B-4: Nylon 6 (relative viscosity 4.08, melting point 220 ° C)

樹脂B-5:甲基丙烯酸縮水甘油酯含有率6wt%之E-GMA共聚物(MFR 3g/10min(190℃)、熔點105℃) Resin B-5: E-GMA copolymer having a glycidyl methacrylate content of 6 wt% (MFR 3 g/10 min (190 ° C), melting point 105 ° C)

樹脂D Resin D

樹脂D-1:將順丁烯二酸酐接枝聚合於無規PP上而成之順丁烯二酸酐改性PP(MFR 7.5g/10min(230℃)、熔點135℃) Resin D-1: maleic anhydride modified PP obtained by graft-polymerizing maleic anhydride onto random PP (MFR 7.5 g/10 min (230 ° C), melting point 135 ° C)

樹脂D-2:將順丁烯二酸酐接枝聚合於無規PP上而成之順丁烯二酸酐改性PP(MFR 7.0g/10min(230℃)、熔點140℃) Resin D-2: Maleic anhydride modified PP obtained by graft-polymerizing maleic anhydride onto random PP (MFR 7.0 g/10 min (230 ° C), melting point 140 ° C)

樹脂E:嵌段PP(MFR 2.3g(230℃)/10min、熔點163℃) Resin E: block PP (MFR 2.3g (230 ° C) / 10 min, melting point 163 ° C)

<實施例1~15> <Examples 1 to 15>

將樹脂A與樹脂B以表1所示之調配比添加至擠出機之料斗中,一 面以表1所示之擠出溫度使之改性為樹脂C一面擠出,並於共擠出T模內與自另一擠出機擠出之樹脂D進行積層,而澆鑄成形密封膜1之實施例1~15。 Adding the resin A and the resin B to the hopper of the extruder in the mixing ratio shown in Table 1, The surface was modified to have a resin C extruded at the extrusion temperature shown in Table 1, and laminated in a co-extrusion T-die with a resin D extruded from another extruder, and the sealing film 1 was cast. Examples 1 to 15.

於表1之層構成之欄為3層之實施例中,於共擠出澆鑄成形時,進而自另一擠出機擠出樹脂E而進行共擠出積層。又,於表1之著色劑之欄為3份之實施例中,於調配樹脂A與樹脂B之情形時添加3重量份之PP基礎之顏料母料。 In the example in which the layer structure of Table 1 is three layers, in the co-extrusion casting molding, the resin E is further extruded from another extruder to perform co-extrusion lamination. Further, in the example in which the coloring agent in Table 1 is 3 parts, in the case of blending the resin A and the resin B, 3 parts by weight of a PP base pigment master batch is added.

樹脂D與樹脂E之擠出溫度均設為240℃。 The extrusion temperatures of Resin D and Resin E were both set to 240 °C.

以上述之方式成形將包含40μm之電極接著層2與表1之耐熱層之欄所示之厚度之耐熱層3的2層構造之積層膜、與20μm之密封層4積層而成之3層構造之積層膜。將該積層膜切割成25mm之寬度,而製作密封膜1之實施例1~15。 In the above-described manner, a three-layer structure in which a laminated film of a two-layer structure including a heat-resistant layer 3 having a thickness of 40 μm and a heat-resistant layer 3 shown in the column of the heat-resistant layer of Table 1 and a sealing layer of 20 μm were laminated was formed. Laminated film. The laminated film was cut into a width of 25 mm to prepare Examples 1 to 15 of the sealing film 1.

<比較例1> <Comparative Example 1>

於240℃下分別擠出樹脂D-1與樹脂E,並於共擠出T模內進行積層,而成形包含20μm之電極接著層2與80μm之密封層4之2層構造的積層膜澆鑄。將該積層膜切割成25mm之寬度,而製作比較例1之密封膜1。 Resin D-1 and Resin E were respectively extruded at 240 ° C, and laminated in a co-extrusion T-die, and a laminated film of a two-layer structure including an electrode 2 of 20 μm and a sealing layer 4 of 80 μm was formed. The laminated film was cut into a width of 25 mm to prepare a sealing film 1 of Comparative Example 1.

再者,表1中之「份」均指「重量份」。 In addition, the "parts" in Table 1 mean "parts by weight".

<電極接著強度之測定> <Measurement of electrode strength>

使用厚度50μm、寬度50mm、長度50mm之正方形之鋁箔作為電極11。分別將密封膜1之實施例1~15及比較例1切斷成60mm之長度。以密封膜1之電極接著層2為內側而重疊於電極11上。使用熱封機,於200℃、0.2MPa、3秒鐘之條件下自鋁箔側進行加熱,於一端殘留未熔接部,並熱熔接另一端。 As the electrode 11, a square aluminum foil having a thickness of 50 μm, a width of 50 mm, and a length of 50 mm was used. Each of Examples 1 to 15 and Comparative Example 1 of the sealing film 1 was cut into a length of 60 mm. The electrode subsequent layer 2 of the sealing film 1 is superposed on the electrode 11 as the inner side. The heat-sealing machine was used to heat the aluminum foil side at 200 ° C, 0.2 MPa, and 3 seconds, and the unwelded portion was left at one end, and the other end was thermally welded.

使用Instron型拉伸試驗機對各密封膜1之電極接著層2與電極11之剝離強度進行測定。於剝離強度之測定時,將未熔接於電極11上之密封膜1之端部與電極11之端部固定於拉伸試驗機之兩個夾頭上,並以300mm/min之速度進行拉伸,而對180度剝離強度進行測定。各密封膜1之電極接著層2與電極11係以27.5~32.8N/25mm之密封強度進行熱密封。 The peel strength of the electrode underlayer 2 and the electrode 11 of each sealing film 1 was measured using an Instron type tensile tester. In the measurement of the peeling strength, the end portion of the sealing film 1 not welded to the electrode 11 and the end portion of the electrode 11 were fixed to the two chucks of the tensile tester, and stretched at a speed of 300 mm/min. The 180 degree peel strength was measured. The electrode underlayer 2 of each sealing film 1 and the electrode 11 are heat-sealed at a sealing strength of 27.5 to 32.8 N/25 mm.

<層壓膜熔接強度之測定> <Measurement of laminate film fusion strength>

藉由乾式層壓將作為膜基材23之厚度12μm之雙軸延伸PET膜、作為金屬箔21之厚度40μm之鋁箔及作為密封層22之厚度40μm之乙烯與丙烯之無規共聚物膜進行積層。將所得之積層膜切割成邊長為100mm之正方形,而製作2片之袋體之層壓膜20。 A biaxially stretched PET film having a thickness of 12 μm as the film substrate 23, an aluminum foil having a thickness of 40 μm as the metal foil 21, and a random copolymer film of ethylene and propylene having a thickness of 40 μm as the sealing layer 22 were laminated by dry lamination. . The obtained laminated film was cut into a square having a side length of 100 mm to prepare a laminated film 20 of two bag bodies.

分別將密封膜1之實施例1~15及比較例1切割成60mm之長度。使 2片之袋體之層壓膜20之密封層22彼此相對,並於其之間夾入密封膜1。於挾入密封膜1時,使密封膜1自層壓膜20之端部露出5mm。 Examples 1 to 15 and Comparative Example 1 of the sealing film 1 were each cut into a length of 60 mm. Make The sealing layers 22 of the laminate film 20 of the two-piece bag body are opposed to each other with the sealing film 1 interposed therebetween. When the sealing film 1 was inserted, the sealing film 1 was exposed from the end of the laminated film 20 by 5 mm.

於與電極接著強度之測定相同之條件下自2片之袋體之層壓膜20之兩側進行加熱,並將密封膜1露出之側之一端進行熔接。另一端作為未熔接部而殘留。於密封膜1之熔接時,使密封膜1之露出部分之根部約2mm與密封棒接觸。 Heating was performed from both sides of the laminated film 20 of the two-piece bag body under the same conditions as the measurement of the adhesive strength of the electrode, and one end of the side on which the sealing film 1 was exposed was welded. The other end remains as an unwelded portion. When the sealing film 1 is welded, the root portion of the exposed portion of the sealing film 1 is brought into contact with the sealing rod by about 2 mm.

以與電極接著強度之測定相同之方式,將密封膜1之未熔接部之端部與層壓膜20之端部固定於拉伸試驗機之兩個夾頭上,於與電極接著強度之測定相同之條件下,對各密封膜1之密封層4或耐熱層3與層壓膜20之熱密封強度進行測定。各密封膜1與層壓膜20係以124.2~143.3N/25mm之密封強度進行熱密封。 The end portion of the unwelded portion of the sealing film 1 and the end portion of the laminate film 20 are fixed to the two chucks of the tensile tester in the same manner as the measurement of the adhesive strength of the electrode, in the same manner as the measurement of the strength of the electrode. The heat seal strength of the sealing layer 4 or the heat-resistant layer 3 of each sealing film 1 and the laminate film 20 was measured under the conditions. Each of the sealing film 1 and the laminate film 20 is heat-sealed at a sealing strength of 124.2 to 143.3 N/25 mm.

又,任一實施例中之密封膜1之自層壓膜20露出之部分未見熱變形或熔融之跡象。另一方面,於比較例中,自層壓膜20露出之部分根部稍有縮小。 Further, in the portion of the sealing film 1 in any of the embodiments from which the laminated film 20 is exposed, no evidence of thermal deformation or melting is observed. On the other hand, in the comparative example, the portion of the root portion exposed from the laminate film 20 was slightly reduced.

<混練品之MFR> <MFR of mixed products>

將95重量份之樹脂A與5重量份之樹脂B-1之熔融混練品(樹脂C-1)、95重量份之樹脂A與5重量份之樹脂B-3之熔融混練品(樹脂C-3)分別單獨擠出,並測定230℃下之MFR。原始之樹脂A之MFR為2.4。樹脂C-1之MFR為1.9,與樹脂A相比MFR下降。再者,樹脂C-3之MFR為2.5,與樹脂A相比MFR上升。由此推測,於本發明中密封膜1之耐熱性提高之原因不僅在於因樹脂A之羧基與樹脂B之官能基之化學鍵結而使分子量變大,亦受到部分交聯影響。 A melt-kneaded product (resin C-) of 95 parts by weight of the resin A and 5 parts by weight of the melt-kneaded product of the resin B-1 (resin C-1), 95 parts by weight of the resin A and 5 parts by weight of the resin B-3 3) Extrusion separately, and measuring the MFR at 230 °C. The original resin A had an MFR of 2.4. The MFR of the resin C-1 was 1.9, and the MFR was lowered as compared with the resin A. Further, the MFR of the resin C-3 was 2.5, and the MFR was higher than that of the resin A. From this, it is presumed that the heat resistance of the sealing film 1 is improved in the present invention not only because the molecular weight of the carboxyl group of the resin A and the functional group of the resin B are increased, but also the molecular weight is increased, and partial crosslinking is also affected.

[產業上之可利用性] [Industrial availability]

本發明可廣泛應用於密封袋體所收納之二次電池或電容器等發電元件之電極之密封膜的製造方法及密封膜。 The present invention can be widely applied to a method for producing a sealing film for an electrode of a power generating element such as a secondary battery or a capacitor housed in a sealed bag body, and a sealing film.

1‧‧‧密封膜 1‧‧‧ sealing film

2‧‧‧電極接著層 2‧‧‧electrode layer

3‧‧‧耐熱層 3‧‧‧Heat resistant layer

4‧‧‧密封層 4‧‧‧ Sealing layer

10‧‧‧附有密封膜之電極 10‧‧‧electrode with sealing film

11‧‧‧電極 11‧‧‧Electrode

20‧‧‧袋體之層壓膜 20‧‧‧ laminated film of bag

21‧‧‧層壓膜之金屬箔 21‧‧‧Metal foil for laminated film

22‧‧‧層壓膜之密封層 22‧‧‧Layer film sealing layer

23‧‧‧層壓膜之膜基材 23‧‧‧ Film substrate of laminated film

Claims (4)

一種密封膜,其係具有於包含羧酸改性聚烯烴樹脂D之接著層上將包含樹脂C之耐熱層於上述樹脂C與上述樹脂D之任一者或兩者為熔融狀態時直接積層而成之積層構造者,上述樹脂C係藉由將順丁烯二酸酐接枝聚合於聚丙烯上而成之酸改性聚丙烯樹脂A與具有可與上述樹脂A之羧基反應之官能基的樹脂B兩者熔融混練,使上述樹脂A之羧基與上述樹脂B之官能基進行化學鍵結而改性者,其中相對於上述樹脂A之調配比例為99~90重量%,上述樹脂B之調配比例為1~10重量%。 A sealing film having a heat-resistant layer containing a resin C directly laminated on the adhesive layer containing the carboxylic acid-modified polyolefin resin D when the resin C and the resin D are in a molten state In the laminated structure, the resin C is an acid-modified polypropylene resin A obtained by graft-polymerizing maleic anhydride onto polypropylene and a resin having a functional group reactive with the carboxyl group of the above resin A. B is melt-kneaded to modify the carboxyl group of the resin A and the functional group of the resin B to be chemically bonded, wherein the ratio of the resin A to the resin A is 99 to 90% by weight, and the ratio of the resin B is 1 to 10% by weight. 如請求項1之密封膜,其中樹脂B係選自具有羥基、胺基或環氧基之樹脂中之一種或兩種以上。 The sealing film of claim 1, wherein the resin B is one or more selected from the group consisting of a resin having a hydroxyl group, an amine group or an epoxy group. 如請求項1或2之密封膜,其中樹脂D係將順丁烯二酸酐接枝聚合於聚丙烯上而成之酸改性聚丙烯樹脂。 The sealing film of claim 1 or 2, wherein the resin D is an acid-modified polypropylene resin obtained by graft-polymerizing maleic anhydride onto polypropylene. 如請求項1或2之密封膜,其中上述積層構造係藉由樹脂C與樹脂D之共擠出而形成。 The sealing film of claim 1 or 2, wherein the laminated structure is formed by co-extrusion of a resin C and a resin D.
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