TWI600628B - Manufacturing method of a glass substrate, and manufacturing apparatus of a glass substrate - Google Patents

Manufacturing method of a glass substrate, and manufacturing apparatus of a glass substrate Download PDF

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TWI600628B
TWI600628B TW104128508A TW104128508A TWI600628B TW I600628 B TWI600628 B TW I600628B TW 104128508 A TW104128508 A TW 104128508A TW 104128508 A TW104128508 A TW 104128508A TW I600628 B TWI600628 B TW I600628B
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cleaning
glass substrate
glass sheet
liquid
glass
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TW201615591A (en
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Nobuhiro Izaki
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Avanstrate Inc
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  • Physics & Mathematics (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Chemical & Material Sciences (AREA)
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Description

玻璃基板之製造方法、及玻璃基板之製造裝置 Method for producing glass substrate and device for manufacturing glass substrate

本發明係關於一種玻璃基板之製造方法及玻璃基板之製造裝置。 The present invention relates to a method for producing a glass substrate and a device for producing a glass substrate.

業界使用平坦之玻璃板作為液晶顯示裝置或電漿顯示裝置等之顯示器之顯示部之零件。於以下之說明中,將此種玻璃板稱為顯示器用玻璃基板、或僅稱為玻璃基板。例如,於液晶顯示裝置中,改變對被封入至玻璃基板間之液晶施加之電場而改變液晶之配向,藉此而可實現動態圖像顯示。液晶顯示裝置於顯示圖像時需要改變電場,因此於玻璃基板上形成用以施加電壓之透明電極。 The industry uses a flat glass plate as a component of a display portion of a display such as a liquid crystal display device or a plasma display device. In the following description, such a glass plate is referred to as a glass substrate for a display or simply as a glass substrate. For example, in a liquid crystal display device, the alignment of the liquid crystal is changed by changing the electric field applied to the liquid crystal sealed between the glass substrates, whereby dynamic image display can be realized. The liquid crystal display device needs to change the electric field when displaying an image, and thus a transparent electrode for applying a voltage is formed on the glass substrate.

又,為了控制對玻璃基板上之電極所施加之電壓之接通、斷開,需要高品質顯示之電視接收機等所使用之液晶顯示裝置採用了使用薄膜電晶體(TFT)之主動矩陣方式之控制。該TFT亦形成於玻璃基板上。具體而言,液晶顯示器係以控制光之透過量之TFT(Thin Film Transistor)與液晶、及彩色濾光片作為構成要素。液晶顯示器中之彩色濾光片面板之製造方法通常使用如下方法:於玻璃基板之表面形成黑色之矩陣,繼而將紅、綠、藍之不同色相依次按條狀或馬賽克狀等配色圖案而形成。 Further, in order to control the turning on and off of the voltage applied to the electrodes on the glass substrate, a liquid crystal display device used for a television receiver or the like which requires high-quality display uses an active matrix method using a thin film transistor (TFT). control. The TFT is also formed on a glass substrate. Specifically, the liquid crystal display is composed of a TFT (Thin Film Transistor) that controls the amount of light transmitted, a liquid crystal, and a color filter. In the method of manufacturing a color filter panel in a liquid crystal display, a method is generally used in which a black matrix is formed on the surface of a glass substrate, and then different hue of red, green, and blue are sequentially formed in a color pattern such as a strip or a mosaic.

隨著顯示器之高清化,配置於玻璃基板表面之黑矩陣之線寬及間距減小。例如,為了達成顯示器之高對比度化,而需要由黑矩陣之高細線化、高清化(具體而言,未達20μm之線寬)而實現開口率提 高、及由黑矩陣之高尺寸精度而實現遮光性提高。又,隨著顯示器像素數之高密度化,圖案尺寸因彩色濾光片之用途以及各顏色而異,作為一例,紅、綠、藍之像素之一邊之尺寸自200~300μm進展為100μm,黑矩陣之尺寸自20μm進展為10μm、進而5μm,對應於此而開發出細線技術。 As the display is HD, the line width and pitch of the black matrix disposed on the surface of the glass substrate are reduced. For example, in order to achieve high contrast of the display, it is necessary to increase the aperture ratio by the high thinning and high definition of the black matrix (specifically, the line width of less than 20 μm). High and improved by the high dimensional accuracy of the black matrix. Further, as the number of pixels of the display is increased, the size of the pattern varies depending on the use of the color filter and the color. As an example, the size of one of the pixels of red, green, and blue is advanced from 200 to 300 μm to 100 μm. The size of the matrix has progressed from 20 μm to 10 μm and further 5 μm, and a thin line technique has been developed in response to this.

如此,為了於顯示器用玻璃基板之玻璃面上利用極薄之金屬膜或半導體形成電極或主動元件,而要求玻璃基板之玻璃表面具有極高之平坦性與極高之清潔性。 Thus, in order to form an electrode or an active element using a very thin metal film or semiconductor on the glass surface of the glass substrate for a display, it is required that the glass surface of the glass substrate has extremely high flatness and extremely high cleanability.

但是,顯示器用玻璃基板若為例如液晶顯示裝置所使用者(以下,稱為液晶用玻璃基板),則呈現較薄之長方形板狀之形態。液晶用玻璃基板通常厚度為0.05mm~0.7mm之程度而薄於1mm,業界對尺寸大型化之要求逐年提高。 However, if the glass substrate for a display is, for example, a user of a liquid crystal display device (hereinafter referred to as a glass substrate for liquid crystal), it has a thin rectangular plate shape. The glass substrate for liquid crystal is usually thinner than 1 mm to a thickness of 0.05 mm to 0.7 mm, and the demand for size increase in the industry is increasing year by year.

液晶用玻璃基板係以稱為母玻璃之形態供給至液晶顯示裝置之製造步驟,該母玻璃所具有之大小相當於複數片一個液晶顯示裝置所需大小之玻璃基板之大小。該母玻璃之大小習慣以「代」之稱呼來表現,例如第6代母玻璃之大小為1500mm×1850mm。母玻璃係藉由將成形為板狀之玻璃板切割成特定大小而獲得。而且,為了去除切割玻璃板時所產生之污漬或切割屑等,需要對母玻璃即液晶用玻璃基板進行清洗。 The glass substrate for liquid crystal is supplied to a liquid crystal display device in a form called a mother glass, and the size of the mother glass corresponds to the size of a glass substrate having a size required for one liquid crystal display device. The size of the mother glass is expressed by the name "generation". For example, the size of the 6th generation mother glass is 1500 mm × 1850 mm. The mother glass is obtained by cutting a glass plate formed into a plate shape into a specific size. Further, in order to remove stains, cutting chips, and the like which are generated when the glass sheet is cut, it is necessary to clean the mother glass, that is, the glass substrate for liquid crystal.

於上述狀況下進行之液晶用玻璃基板之玻璃表面之清洗中,使用純水、界面活性劑等洗劑、及氟化合物等各種液體。玻璃表面之清洗所使用之液體藉由噴出氣流而去除,於結束清洗步驟後,經過洗劑去除步驟、檢查步驟等後出貨,但有已成為製品之液晶玻璃基板之表面固著有洗劑成分之情況。 In the cleaning of the glass surface of the liquid crystal glass substrate which is carried out under the above-mentioned conditions, various liquids such as a washing agent such as pure water or a surfactant, and a fluorine compound are used. The liquid used for cleaning the surface of the glass is removed by the discharge airflow, and after the completion of the cleaning step, it is shipped after the lotion removal step, the inspection step, etc., but the surface of the liquid crystal glass substrate which has become the product is fixed with the lotion. The situation of ingredients.

洗劑成分殘留,該洗劑成分之固著導致形成於玻璃基板上之電極或元件產生不良,而導致液晶顯示裝置發生故障。又,於將液晶顯 示所需之構件形成於液晶用玻璃基板上時亦進行清洗,但即便於此種情況下進行之清洗中,亦會產生洗劑成分固著之問題。又,有無法充分達成黑矩陣樹脂對玻璃基板表面之高密接性之虞。 The lotion component remains, and the fixation of the lotion component causes defects in the electrode or element formed on the glass substrate, causing malfunction of the liquid crystal display device. Also, the liquid crystal display When the member required for the formation is formed on the glass substrate for liquid crystal, it is also cleaned. However, even in the case of cleaning in this case, there is a problem that the lotion component is fixed. Further, there is a possibility that the high adhesion of the black matrix resin to the surface of the glass substrate cannot be sufficiently achieved.

因此,為了防止發生洗劑成分固著,例如專利文獻1所記載般先前利用氣刀等較薄之平面狀噴出氣流,自清洗後之液晶用玻璃基板之玻璃表面去除清洗所使用之洗劑等液體。 Therefore, in order to prevent the occurrence of the washing agent component, the thinner planar airflow such as an air knife is used to remove the lotion from the glass surface of the liquid crystal glass substrate after cleaning, for example. liquid.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2009-6299號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-6299

然而,上述技術中,由氣刀形成噴出氣流,因此即便利用噴出氣流自玻璃基板之表面去除清洗所使用之液體,亦無法完全防止發生洗劑成分之固著。若加快來自氣刀之噴出氣流之噴出速度,則清洗所使用之液體中之水會揮發,而有洗劑成分沿著來自氣刀之噴出氣流之噴出方向直線狀地固著之情況。若於固著有洗劑成分之玻璃基板上形成黑矩陣、彩色濾光片,則存在接著狀態變差而發生剝落之問題。另一方面,若減緩來自氣刀之噴出氣流之噴出速度,則含有洗劑之液體會殘留於玻璃基板上,於去除洗劑之洗劑去除步驟中無法徹底去除洗劑,而有洗劑殘留於玻璃基板上之情況。若於玻璃基板上殘留有洗劑之狀態下形成黑矩陣、彩色濾光片,則存在接著狀態變差而發生剝落之問題。 However, in the above technique, since the jetted airflow is formed by the air knife, even if the liquid used for washing is removed from the surface of the glass substrate by the jetted airflow, the fixation of the lotion component cannot be completely prevented. When the discharge speed of the jet stream from the air knife is increased, the water in the liquid used for washing is volatilized, and the lotion component is linearly fixed along the discharge direction of the jet stream from the air knife. When a black matrix or a color filter is formed on the glass substrate to which the lotion component is fixed, there is a problem that the subsequent state is deteriorated and peeling occurs. On the other hand, if the discharge speed of the jet stream from the air knife is slowed down, the liquid containing the lotion remains on the glass substrate, and the lotion cannot be completely removed in the lotion removal step of removing the lotion, and the lotion remains. On the case of a glass substrate. When a black matrix or a color filter is formed in a state in which a lotion remains on the glass substrate, there is a problem in that the subsequent state is deteriorated and peeling occurs.

因此,本發明之目的在於提供藉由利用清洗單元去除玻璃基板上之含有洗劑之液體而可抑制黑矩陣剝落的玻璃基板之製造方法及玻璃基板之製造裝置。 Accordingly, an object of the present invention is to provide a method for producing a glass substrate and a glass substrate manufacturing apparatus capable of suppressing peeling of a black matrix by removing a liquid containing a lotion on a glass substrate by a cleaning unit.

本發明之一態樣係表面形成黑矩陣樹脂之彩色濾光片用玻璃基板之製造方法,其具有以下形態。 One aspect of the present invention is a method for producing a glass substrate for a color filter having a black matrix resin formed on its surface, which has the following embodiment.

[形態1] [Form 1]

一種彩色濾光片用玻璃基板之製造方法,其特徵在於具備如下步驟:清洗步驟,對玻璃基板供給包含添加有界面活性材之無機鹼系清洗劑之清洗液並進行清洗,沖洗步驟,使沖洗液滲透至上述清洗步驟中附著於上述玻璃基板之表面之清洗液中,及去除步驟,藉由將上述沖洗步驟中滲透有上述沖洗液之上述清洗液通入自上述玻璃基板之一端跨至另一端所設置之清洗單元,而去除該清洗液。 A method for producing a glass substrate for a color filter, comprising the steps of: supplying a cleaning liquid containing an inorganic alkali-based cleaning agent to which an interface active material is added to a glass substrate, and performing washing, rinsing step, and rinsing The liquid penetrates into the cleaning liquid adhered to the surface of the glass substrate in the cleaning step, and the removing step is performed by passing the cleaning liquid infiltrated with the rinsing liquid in the rinsing step into one end from the glass substrate to the other The cleaning unit is provided at one end to remove the cleaning liquid.

[形態2] [Form 2]

如形態1之製造方法,其中上述去除步驟中,於將上述玻璃基板通入上述清洗單元前後之步驟中,至少於後續步驟中為了防止上述清洗液乾燥而對上述玻璃基板之表面供給液體。 According to the manufacturing method of the first aspect, in the removing step, in the step of passing the glass substrate before and after the cleaning unit, the liquid is supplied to the surface of the glass substrate at least in a subsequent step in order to prevent drying of the cleaning liquid.

[形態3] [Form 3]

如形態1或2之製造方法,其中上述去除步驟中,將清洗過上述玻璃基板之上述清洗液回收,並測定所回收之清洗液之濃度,測得之上述清洗液之濃度越低,越增強將上述清洗單元壓抵於上述表面之力。 The manufacturing method of the aspect 1 or 2, wherein in the removing step, the cleaning liquid that has been washed with the glass substrate is recovered, and the concentration of the recovered cleaning liquid is measured, and the lower the concentration of the cleaning liquid is measured, the more enhanced The force of pressing the cleaning unit against the surface.

[形態4] [Form 4]

如形態1至3中任一項之製造方法,其中於利用上述清洗單元去除上述清洗液之前後步驟中,對上述表面添加水而抑制上述表面之乾燥。 The production method according to any one of the aspects 1 to 3, wherein, in the subsequent step of removing the cleaning liquid by the cleaning unit, water is added to the surface to suppress drying of the surface.

[形態5] [Form 5]

如形態1至4中任一項之製造方法,其中上述去除步驟中,於利用上述清洗單元去除上述清洗液後,利用上述液體清洗上述玻璃基板,並測定清洗過之上述液體之導電率,測得之上述液體之導電率越高,越增強將上述清洗單元壓抵於上述表面之力。 The manufacturing method according to any one of the aspects 1 to 4, wherein, in the removing step, after the cleaning liquid is removed by the cleaning unit, the glass substrate is washed with the liquid, and the conductivity of the cleaned liquid is measured. The higher the conductivity of the above liquid, the stronger the force that presses the cleaning unit against the surface.

[形態6] [Form 6]

如形態1至5中任一項之製造方法,其中上述清洗單元係使相對於即將進行上述沖洗步驟前之清洗液之溫度而溫度差為0℃以上且25℃以下之沖洗液於上述沖洗步驟之初期滲透而去除。 The manufacturing method according to any one of the aspects 1 to 5, wherein the cleaning unit is configured to cause a rinsing liquid having a temperature difference of 0 ° C or more and 25 ° C or less with respect to a temperature of the cleaning liquid immediately before the rinsing step. It is removed by infiltration at the beginning.

本發明之另一態樣係於表面形成黑矩陣樹脂之彩色濾光片用之玻璃基板之製造裝置,其具有以下形態。 Another aspect of the present invention is a manufacturing apparatus for a glass substrate for forming a color filter of a black matrix resin on the surface, which has the following embodiment.

[形態7] [Form 7]

一種彩色濾光片用之玻璃基板之製造裝置,其特徵在於具備如下裝置:清洗裝置,其對玻璃基板供給包含添加有界面活性材之無機鹼系清洗劑之清洗液並進行清洗,及去除裝置,其使沖洗液滲透至附著於上述玻璃基板之表面之清洗液中,並藉由將滲透有上述沖洗液之上述清洗液通入自上述玻璃基板之一端跨至另一端所設置之清洗單元而去除上述清洗液。 A manufacturing apparatus for a glass substrate for a color filter, comprising: a cleaning device that supplies a cleaning liquid containing an inorganic alkali-based cleaning agent to which an interface active material is added to a glass substrate, and performs cleaning; and a removing device And allowing the rinsing liquid to permeate into the cleaning liquid attached to the surface of the glass substrate, and passing the cleaning liquid penetrating the rinsing liquid into the cleaning unit disposed from one end of the glass substrate to the other end Remove the above cleaning solution.

根據本發明,可利用清洗單元物理性地去除玻璃基板上之含有洗劑之液體,並且抑制黑矩陣之剝落。 According to the present invention, the cleaning unit can be used to physically remove the liquid containing the lotion on the glass substrate, and the peeling of the black matrix can be suppressed.

1‧‧‧單片清洗裝置 1‧‧‧Single sheet cleaning device

10‧‧‧清洗單元 10‧‧‧cleaning unit

12‧‧‧刷單元 12‧‧‧ brush unit

12a‧‧‧清洗刷輥 12a‧‧‧Washing brush roller

12b‧‧‧清洗刷輥 12b‧‧‧Washing brush roller

14‧‧‧海綿單元 14‧‧‧Sponge unit

14a‧‧‧清洗海綿輥 14a‧‧‧Clean sponge roller

14b‧‧‧清洗海綿輥 14b‧‧‧Clean sponge roller

15‧‧‧夾輥 15‧‧‧Pinch roller

16‧‧‧噴淋單元 16‧‧‧Spray unit

17‧‧‧夾輥 17‧‧‧Pinch roller

18‧‧‧清洗劑罐 18‧‧‧cleaning agent tank

18a‧‧‧噴嘴 18a‧‧‧Nozzles

18b‧‧‧噴嘴 18b‧‧‧Nozzles

18c‧‧‧噴嘴 18c‧‧‧ nozzle

18d‧‧‧噴嘴 18d‧‧‧ nozzle

19‧‧‧純水罐 19‧‧‧ Pure water tank

19a‧‧‧噴嘴 19a‧‧‧Nozzles

19b‧‧‧噴嘴 19b‧‧‧Nozzles

G‧‧‧玻璃片材 G‧‧‧glass sheet

圖1係用以說明本實施形態之玻璃基板之製造方法之一例之概要的流程圖。 Fig. 1 is a flow chart for explaining an outline of an example of a method for producing a glass substrate of the embodiment.

圖2係本實施形態之單片清洗裝置之一例之概略圖。 Fig. 2 is a schematic view showing an example of the one-chip cleaning apparatus of the embodiment.

圖3係本實施形態之清洗單元之一例之俯視圖。 Fig. 3 is a plan view showing an example of the cleaning unit of the embodiment.

圖4係圖3所示之清洗單元之側視圖。 Figure 4 is a side view of the cleaning unit shown in Figure 3.

圖5係本實施形態中使用之夾棍之一例之俯視圖。 Fig. 5 is a plan view showing an example of a rivet used in the embodiment.

圖6係表示被回收至清洗劑回收罐中之清洗液之濃度與將夾輥壓抵於玻璃片材之力之關係之一例的圖表。 Fig. 6 is a graph showing an example of the relationship between the concentration of the cleaning liquid recovered in the cleaning agent recovery tank and the force for pressing the nip rolls against the glass sheet.

<玻璃片材之組成> <Composition of glass sheets>

玻璃片材(玻璃基板)係用於例如包括液晶顯示器等平板顯示器(FPD)之顯示器之製造的玻璃。以下,以FPD用玻璃片材為例進行說明。該玻璃片材係藉由於表面配置黑矩陣及使紅色(R)/綠色(G)/藍色(B)之光透過之波長選擇元件即RGB像素,而形成彩色濾光片。黑矩陣係藉由遮斷RGB像素區域以外之背光裝置之漏光,防止相互鄰接之RGB像素之混色,而提高顯示對比度。即,彩色濾光片之光之透過區域係由黑矩陣之形狀及配置而決定。玻璃片材之厚度例如為0.1mm~0.7mm。玻璃片材之尺寸例如為680mm×880mm(G4尺寸)、2200mm×2500mm(G8尺寸)。 A glass sheet (glass substrate) is used for, for example, glass manufactured by a display including a flat panel display (FPD) such as a liquid crystal display. Hereinafter, a glass sheet for FPD will be described as an example. The glass sheet is formed into a color filter by arranging a black matrix and RGB pixels which are wavelength selective elements for transmitting light of red (R)/green (G)/blue (B). The black matrix improves the display contrast by blocking the light leakage of the backlight device other than the RGB pixel region and preventing the color mixture of adjacent RGB pixels. That is, the light transmission region of the color filter is determined by the shape and arrangement of the black matrix. The thickness of the glass sheet is, for example, 0.1 mm to 0.7 mm. The size of the glass sheet is, for example, 680 mm × 880 mm (G4 size), 2200 mm × 2500 mm (G8 size).

用於FPD製造之玻璃片材較佳為無鹼玻璃或微鹼玻璃。於玻璃片材為無鹼玻璃之情形時,玻璃之組成例如為SiO2 50質量%~70質量%、Al2O3 0質量%~25質量%、B2O3 1質量%~15質量%、MgO 0質量%~10質量%、CaO 0質量%~20質量%、SrO 0質量%~20質量%、BaO 0質量%~10質量%。 The glass sheet used for the production of FPD is preferably an alkali-free glass or a slightly alkali glass. When the glass sheet is an alkali-free glass, the composition of the glass is, for example, SiO 2 50% by mass to 70% by mass, Al 2 O 3 0% by mass to 25% by mass, and B 2 O 3 1% by mass to 15% by mass. MgO 0% by mass to 10% by mass, CaO 0% by mass to 20% by mass, SrO 0% by mass to 20% by mass, and BaO 0% by mass to 10% by mass.

此處,MgO、CaO、SrO及BaO之合計含量為5質量%~30質量%。 Here, the total content of MgO, CaO, SrO, and BaO is 5% by mass to 30% by mass.

於玻璃片材為含有微量鹼金屬之微鹼玻璃之情形時,玻璃之組成進而含有0.1質量%~0.5質量%之R'2O,較佳為含有0.2質量%~0.5質量%之R'2O。此處,R'係選自Li、Na及K中之至少1種。再者,R'2O之含量之合計可未達0.1質量%。 When the glass sheet is a micro alkali glass containing a trace amount of an alkali metal, the composition of the glass further contains 0.1% by mass to 0.5% by mass of R' 2 O, preferably 0.2% by mass to 0.5% by mass of R' 2 . O. Here, R' is at least one selected from the group consisting of Li, Na, and K. Further, the total content of R' 2 O may be less than 0.1% by mass.

又,玻璃片材中,除了上述成分以外,可進而含有SnO2 0.01質量%~1質量%(較佳為0.01質量%~0.5質量%)、Fe2O3 0質量%~0.2質量%(較佳為0.01質量%~0.08質量%),考慮到環境負擔,亦可實質上不含As2O3、Sb2O3及PbO。 Further, the glass sheet may further contain, in addition to the above components, 0.01% by mass to 1% by mass of SnO 2 (preferably 0.01% by mass to 0.5% by mass), and Fe 2 O 3 0% by mass to 0.2% by mass. It is preferably 0.01% by mass to 0.08% by mass), and may contain substantially no As 2 O 3 , Sb 2 O 3 and PbO in consideration of environmental burden.

<玻璃片材之製造方法之流程> <Flow of Manufacturing Method of Glass Sheet>

圖1係表示玻璃片材之製造方法之流程之一例的流程圖。以下,對流程圖之各步驟S1~S10進行說明。 Fig. 1 is a flow chart showing an example of a flow of a method for producing a glass sheet. Hereinafter, each of the steps S1 to S10 of the flowchart will be described.

最初,於步驟S1中,為了製造具有上述組成之玻璃片材而製備之玻璃原料藉由加熱而生成熔融玻璃,利用下拉法、再曳引法或浮式法等由熔融玻璃或預型體玻璃連續地成形為具有特定厚度之玻璃帶。於步驟S2中,將步驟S1中生成之玻璃帶進行切割,而獲得具有特定尺寸之素板玻璃。於步驟S3中,步驟S2中所獲得之素板玻璃係以隔著用以保護素板玻璃之表面之間隔紙進行積層而成之積層體之形式載置於用於搬送及保管素板玻璃之托板上。 First, in step S1, the glass raw material prepared by producing the glass sheet having the above composition is heated to form molten glass, and the molten glass or the preform glass is used by a down-draw method, a re-drawing method, a floating method, or the like. Continuously formed into a glass ribbon having a specific thickness. In step S2, the glass ribbon produced in step S1 is cut to obtain a plain glass having a specific size. In the step S3, the plain glass obtained in the step S2 is placed in the form of a laminate which is laminated with the spacer paper for protecting the surface of the plain glass, and is placed in the form of a laminate for transporting and storing the plain glass. On the pallet.

繼而,於步驟S4中,自素板玻璃之積層體取出素板玻璃,將素板玻璃切割成作為製品之玻璃片材之尺寸。於步驟S5中,對步驟S4中所獲得之玻璃片材進行端面之研削及研磨、端面之蝕刻等端面加工處理。 Then, in step S4, the plain glass is taken out from the laminated body of the plain glass, and the plain glass is cut into the size of the glass sheet as the product. In step S5, the glass sheet obtained in step S4 is subjected to end surface processing such as grinding, polishing, and etching of the end faces.

繼而,於步驟S6中,進行玻璃片材之清洗。於玻璃片材之清洗 步驟中,去除附著於玻璃片材表面之玻璃之微小片即玻璃屑、灰塵、污漬、黏著性異物等。又,於玻璃片材之清洗步驟中,為了使經過清洗之玻璃片材之表面不會再次附著該等異物,而使用包含界面活性劑之無機鹼系清洗劑。 Then, in step S6, the glass sheet is cleaned. Cleaning of glass sheets In the step, glass pieces, dust, stains, adhesive foreign matter, and the like which are small pieces of glass adhering to the surface of the glass sheet are removed. Further, in the step of washing the glass sheet, an inorganic alkali-based cleaning agent containing a surfactant is used in order to prevent the foreign matter from adhering to the surface of the washed glass sheet.

繼而,於步驟S7中,對於步驟S6中經過清洗之玻璃片材進行光學檢查。於步驟S8中,於步驟S7之檢查中合格之玻璃片材係以與用於保護玻璃片材表面之間隔紙交替積層而成之積層體之形式載置於托板上並加以包裝。於步驟S9中,經過包裝之玻璃片材之積層體被出貨至FPD製造業者之收貨地址。就防止來自間隔紙之異物附著於玻璃片材表面之觀點來看,夾於出貨之玻璃片材之積層體中之間隔紙使用不含再生紙之紙漿紙。 Then, in step S7, the glass sheet subjected to cleaning in step S6 is optically inspected. In step S8, the glass sheets which have passed the inspection in step S7 are placed on the pallet in the form of a laminate which is alternately laminated with the spacer paper for protecting the surface of the glass sheet, and is packaged. In step S9, the laminated body of the packaged glass sheet is shipped to the receiving address of the FPD manufacturer. From the viewpoint of preventing foreign matter from the spacer paper from adhering to the surface of the glass sheet, the spacer paper sandwiched between the laminated sheets of the glass sheets used is a pulp paper containing no recycled paper.

又,於步驟S3中載置於托板上之素板玻璃之積層體於步驟S10中可保管長達數週或數月之長時間。此時,就成本及環境保護之觀點來看,夾於所保管之素板玻璃之積層體中之間隔紙使用再生紙。經過長期保管之素板玻璃之積層體係如上所述般經過自步驟S4之切割步驟至步驟S8之包裝步驟而於步驟S9中出貨。再者,於步驟S8中被載置於托板上並進行包裝之玻璃片材之積層體於步驟S10中可保管長達數週或數月之長時間。 Further, the laminate of the plain glass placed on the pallet in the step S3 can be stored for a long time of several weeks or several months in the step S10. At this time, from the viewpoint of cost and environmental protection, the spacer paper sandwiched between the laminated sheets of the preserved plain glass uses recycled paper. The laminate system of the plain glass which has been stored for a long period of time is shipped in the step S9 through the cutting step from the step S4 to the packaging step of the step S8 as described above. Further, the laminate of the glass sheets placed on the pallet and packed in step S8 can be stored for a long period of several weeks or months in step S10.

<玻璃片材之清洗步驟之流程> <Flow of cleaning step of glass sheet>

繼而,對圖1之步驟S6中所進行之玻璃片材之清洗步驟之詳細情況進行說明。玻璃片材之清洗步驟中,使用添加有界面活性劑之無機鹼系清洗劑進行玻璃片材表面之清洗。 Next, the details of the cleaning step of the glass sheet performed in step S6 of Fig. 1 will be described. In the washing step of the glass sheet, the surface of the glass sheet is cleaned using an inorganic alkali-based cleaning agent to which a surfactant is added.

於清洗步驟中,例如使用添加有界面活性劑之無機鹼系清洗劑,進行玻璃片材表面之清洗。無機鹼系清洗劑係藉由對利用水將市售之玻璃片材用清洗液稀釋所獲得之稀釋液添加鹼性成分而生成。作為玻璃片材用清洗液,例如可使用Parker Corporation公司製造之PK- LCG系列、或橫浜油脂工業股份有限公司製造之SemiClean系列等。更具體而言,可使用添加有聚氧伸烷基醚或聚氧乙烯伸烷基醚等作為界面活性劑之清洗液。聚氧伸烷基醚或聚氧乙烯伸烷基醚等為非離子界面活性劑(非離子性界面活性劑),清洗液中所使用之其他陰離子界面活性劑(陰離子性界面活性劑)與例如烷磺酸相比,容易殘留於玻璃片材之表面,而引起黑矩陣之剝落。非離子界面活性劑即便溶解於水中亦不顯示出離子性,但於玻璃片材表面形成黑矩陣時,由於與玻璃表面無法形成如共價鍵般之較強之鍵,故而非離子界面活性劑上所塗佈之黑矩陣會因顯像而剝離。但是,非離子界面活性劑係為了滿足清洗力而必需之成分,而被使用。玻璃片材用清洗液係以例如成為1質量%~5質量%之濃度之方式利用水進行稀釋。關於稀釋液之鹼性成分之濃度,換算成氫氧化鉀(KOH)之濃度例如為0.02質量%~0.15質量%。就保持玻璃片材表面潔淨方面而言,用於稀釋清洗劑之水較佳為實施過離子交換處理、EDI(Electrodeionization,電去電離)處理、利用反滲透膜(RO膜)之過濾處理、及通過脫二氧化碳裝置之脫二氧化碳處理所獲得之純水或超純水。又,為了去除溶解性之有機物,較佳為對水進行通向活性碳之處理。具體而言,較佳為,使用過濾器將微粒子等異物自水中去除,繼而,將水通向活性碳而去除有機物,繼而,實施離子交換處理、EDI處理、利用反滲透膜之過濾處理、及通過脫二氧化碳裝置之脫二氧化碳處理。於離子交換處理中,將水所含之離子性物質、例如氯離子或鈉離子等使用離子交換樹脂膜自水中去除。於EDI處理中,使用離子交換樹脂膜,且利用對電極賦予電位而形成之電位梯度,將離子性物質以高精度自水中去除。於利用反滲透膜之過濾處理中,將離子性物質、鹽類及有機物自水中去除。於脫二氧化碳處理中,使用脫二氧化碳裝置將二氧化碳自水中去除。 In the washing step, for example, the surface of the glass sheet is washed using an inorganic alkali-based detergent to which a surfactant is added. The inorganic alkali-based cleaning agent is produced by adding an alkaline component to a dilution liquid obtained by diluting a commercially available glass sheet with a washing liquid with water. As the cleaning liquid for the glass sheet, for example, PK-manufactured by Parker Corporation can be used. LCG series, or the SemiClean series manufactured by Yokohama Oil & Fats Co., Ltd., etc. More specifically, a cleaning liquid to which a polyoxyalkylene ether or a polyoxyethylene alkylene ether is added as a surfactant can be used. A polyoxyalkylene ether or a polyoxyethylene alkylene ether is a nonionic surfactant (nonionic surfactant), and another anionic surfactant (anionic surfactant) used in the cleaning solution is, for example, Compared with the alkanesulfonic acid, it tends to remain on the surface of the glass sheet, causing peeling of the black matrix. Nonionic surfactants do not exhibit ionicity even when dissolved in water. However, when a black matrix is formed on the surface of a glass sheet, a non-ionic surfactant is not formed because a strong bond such as a covalent bond cannot be formed on the surface of the glass. The black matrix coated on it will be peeled off due to development. However, the nonionic surfactant is used in order to satisfy the cleaning power. The glass sheet cleaning liquid is diluted with water so as to have a concentration of, for example, 1% by mass to 5% by mass. The concentration of the alkaline component of the diluent is, for example, 0.02% by mass to 0.15% by mass in terms of the concentration of potassium hydroxide (KOH). In terms of keeping the surface of the glass sheet clean, the water for diluting the cleaning agent is preferably subjected to ion exchange treatment, EDI (Electrodeionization) treatment, filtration treatment using a reverse osmosis membrane (RO membrane), and Pure water or ultrapure water obtained by decarbonation treatment of a decarbonation device. Further, in order to remove the soluble organic matter, it is preferred to treat the water to the activated carbon. Specifically, it is preferable to remove a foreign substance such as fine particles from water using a filter, and then pass the water to the activated carbon to remove the organic substance, and then perform an ion exchange treatment, an EDI treatment, a filtration treatment using a reverse osmosis membrane, and Decarbonation treatment by a carbon dioxide removal unit. In the ion exchange treatment, an ionic substance such as chloride ion or sodium ion contained in water is removed from the water using an ion exchange resin membrane. In the EDI treatment, an ion exchange resin film is used, and a potential gradient formed by applying a potential to the electrode is used to remove the ionic substance from the water with high precision. In the filtration treatment using a reverse osmosis membrane, ionic substances, salts, and organic substances are removed from the water. In the decarbonation treatment, carbon dioxide is removed from the water using a decarbonation device.

於本實施形態中,對玻璃片材用清洗液之稀釋液添加選自由 KOH、NaOH、ETDA(乙二胺四乙酸)-4Na、ETDA-4K、Na4P2O7(焦磷酸四鈉)及K4P2O7(焦磷酸四鉀)所組成之群中之1種以上鹼性成分,藉此生成清洗步驟中使用之清洗劑。關於該清洗劑之鹼性成分之濃度,換算成氫氧化鉀(KOH)之濃度為1質量%以上。上述鹼性成分與其他鹼性成分相比,對玻璃之蝕刻性高,且溶解性優異。尤其,就蝕刻性、溶解性、及防止對形成於玻璃片材上之薄膜電晶體之不良影響之觀點來看,較佳為單獨使用KOH作為鹼性成分。又,KOH及NaOH與其他鹼性成分相比,於排水處理方面有利。 In the present embodiment, the diluent for the cleaning liquid for the glass sheet is selected from the group consisting of One or more alkaline components of a group consisting of KOH, NaOH, ETDA (ethylenediaminetetraacetic acid)-4Na, ETDA-4K, Na4P2O7 (tetrasodium pyrophosphate) and K4P2O7 (tetrapotassium pyrophosphate) are thereby produced The cleaning agent used in the cleaning step. The concentration of the alkaline component of the cleaning agent is 1% by mass or more in terms of potassium hydroxide (KOH). The alkaline component is more etchable to glass than the other alkaline components, and is excellent in solubility. In particular, KOH is preferably used as an alkaline component from the viewpoint of etchability, solubility, and prevention of adverse effects on the thin film transistor formed on the glass sheet. Further, KOH and NaOH are advantageous in drainage treatment as compared with other alkaline components.

再者,關於清洗步驟中使用之清洗劑,鹼性成分濃度越高,自玻璃片材去除異物之清洗力越強。但是,若鹼性成分之濃度過高,則會產生玻璃片材之清洗裝置發生腐蝕、清洗劑中生成結晶等問題。因此,清洗劑之鹼性成分之濃度較佳為不超過10質量%。又,為了使清洗劑之操作變得容易,清洗劑之鹼性成分之濃度更佳為不超過5質量%。 Further, regarding the cleaning agent used in the cleaning step, the higher the concentration of the alkaline component, the stronger the cleaning power for removing foreign matter from the glass sheet. However, if the concentration of the alkaline component is too high, there is a problem that the cleaning device of the glass sheet is corroded and crystals are formed in the cleaning agent. Therefore, the concentration of the alkaline component of the cleaning agent is preferably not more than 10% by mass. Further, in order to facilitate the operation of the cleaning agent, the concentration of the alkaline component of the cleaning agent is more preferably not more than 5% by mass.

於本實施形態中,玻璃片材之清洗方法有單片清洗及批次清洗2種清洗方法。首先,對利用單片清洗之玻璃片材之清洗方法進行說明。圖2係進行單片清洗之玻璃片材G之單片清洗裝置之一例之概略圖。單片清洗裝置1包括進行清洗步驟之清洗單元10。玻璃片材G係於清洗單元10中利用添加有界面活性劑之無機鹼系清洗劑進行清洗。 In the present embodiment, the glass sheet cleaning method includes a single sheet cleaning method and a batch cleaning method. First, a cleaning method of a glass sheet which is cleaned by a single piece will be described. Fig. 2 is a schematic view showing an example of a single-piece cleaning device for glass sheet G which is subjected to single-piece cleaning. The single-chip cleaning apparatus 1 includes a cleaning unit 10 that performs a cleaning step. The glass sheet G is washed in the cleaning unit 10 by an inorganic alkali-based cleaning agent to which a surfactant is added.

圖3係清洗單元10之俯視圖,圖4係清洗單元10之側視圖。於圖3及圖4中,省略了搬送玻璃片材G之搬送裝置。 3 is a plan view of the cleaning unit 10, and FIG. 4 is a side view of the cleaning unit 10. In FIG. 3 and FIG. 4, the conveyance apparatus which conveys the glass sheet G is abbreviate|omitted.

清洗單元10如圖3所示,具備刷單元12、海綿單元14、噴淋單元16、及夾輥(nip roller)15、17。該等單元自玻璃片材G之搬送方向之上游側向下游側依序配置。清洗單元10如圖4所示,進而具備清洗劑罐18、純水罐19、噴嘴18a、18b、18c、18d、19a、19b。 As shown in FIG. 3, the cleaning unit 10 includes a brush unit 12, a sponge unit 14, a shower unit 16, and nip rollers 15, 17. These units are arranged in order from the upstream side to the downstream side in the conveying direction of the glass sheet G. As shown in FIG. 4, the cleaning unit 10 further includes a cleaning agent tank 18, a pure water tank 19, and nozzles 18a, 18b, 18c, 18d, 19a, and 19b.

刷單元12具有清洗刷輥12a、12b。清洗刷輥12a、12b係沿著玻璃 片材G之搬送方向配置。清洗刷輥12a、12b以分別可清洗所搬送之玻璃片材G之兩個表面之方式成對配置於玻璃片材G之上下。清洗刷輥12a、12b以分別如圖3所示般橫跨玻璃片材G之搬送方向之方式配置。於清洗刷輥12a、12b之外周面安裝有複數個清洗刷。藉由清洗刷輥12a、12b之軸旋轉,使清洗刷接觸所搬送之玻璃片材G之表面,而對玻璃片材G之表面進行清洗。於圖3中,清洗刷輥12a、12b沿著玻璃片材G之搬送方向配置有2行,亦可僅配置1行,或可配置3行以上。 The brush unit 12 has cleaning brush rollers 12a, 12b. Cleaning brush rollers 12a, 12b are along the glass The conveying direction of the sheet G is arranged. The cleaning brush rollers 12a and 12b are disposed in pairs above and below the glass sheet G so that the two surfaces of the glass sheet G to be conveyed can be cleaned, respectively. The cleaning brush rollers 12a and 12b are disposed so as to straddle the conveying direction of the glass sheet G as shown in Fig. 3, respectively. A plurality of cleaning brushes are attached to the outer peripheral surface of the cleaning brush rollers 12a and 12b. The surface of the glass sheet G is cleaned by the rotation of the washing brush rolls 12a and 12b so that the cleaning brush contacts the surface of the glass sheet G to be conveyed. In FIG. 3, the cleaning brush rolls 12a and 12b are arranged in two rows along the conveying direction of the glass sheet G, and may be arranged in only one row or three rows or more.

海綿單元14具有清洗海綿輥14a、14b。清洗海綿輥14a、14b係沿著玻璃片材G之搬送方向配置。清洗海綿輥14a、14b以分別可清洗所搬送之玻璃片材G之兩個表面之方式成對配置於玻璃片材G之上下。清洗海綿輥14a、14b以分別如圖3所示般橫跨玻璃片材G之搬送方向之方式配置。於清洗海綿輥14a、14b之外周面安裝有清洗海綿。藉由清洗海綿輥14a、14b之軸旋轉,使清洗海綿接觸搬送之玻璃片材G之表面,而對玻璃片材G之表面進行清洗。於圖3中,清洗海綿輥14a、14b沿著玻璃片材G之搬送方向配置有2行,亦可僅配置1行,或可配置3行以上。 The sponge unit 14 has cleaning sponge rolls 14a, 14b. The cleaning sponge rolls 14a and 14b are arranged along the conveying direction of the glass sheet G. The cleaning sponge rolls 14a and 14b are disposed in pairs above and below the glass sheet G so as to wash both surfaces of the conveyed glass sheet G, respectively. The cleaning sponge rolls 14a and 14b are arranged so as to straddle the conveying direction of the glass sheet G as shown in Fig. 3, respectively. A cleaning sponge is attached to the outer peripheral surface of the cleaning sponge rolls 14a and 14b. The surface of the glass sheet G is cleaned by the rotation of the shafts of the cleaning sponge rolls 14a and 14b so that the cleaning sponge contacts the surface of the conveyed glass sheet G. In FIG. 3, the cleaning sponge rolls 14a and 14b are arranged in two rows along the conveying direction of the glass sheet G, and may be arranged in only one row or three rows or more.

夾輥15、17係為了去除附著於玻璃片材G之正面及背面之洗劑、液體而成對配置於玻璃片材G之上下,其係與玻璃片材G之搬送方向正交之方向上自玻璃片材G之一端跨至另一端所設置之具備海綿之清洗裝置的一部分。夾輥15、17係藉由接觸玻璃片材G而去除洗劑、液體之清洗單元(物理清洗單元)。圖5係夾輥之一例之俯視圖。如該圖所示,夾輥15、17與清洗海綿輥14a、14b同樣地以橫跨玻璃片材G之搬送方向之方式配置。於夾輥15、17之外周面安裝有清洗海綿。夾輥15、17主要去除使用清洗劑進行清洗而附著於玻璃片材G之清洗劑。夾輥15、17與玻璃片材G之距離由夾輥15、17之位置控制裝置(並未圖 示)適當控制,藉由夾輥15、17於接觸玻璃片材G之狀態下進行軸旋轉,而清洗海綿接觸搬送之玻璃片材G之表面,將附著於玻璃片材G之表面之洗劑、液體去除。夾輥15配置於海綿單元14與噴淋單元16之間,夾輥17配置於噴淋單元16之下游側。於夾輥15之上游側及/或下游側設置噴淋裝置(並未圖示)以防止玻璃片材G之乾燥。噴淋裝置例如噴出純水或超純水而濡濕玻璃片材G,藉此,於清洗步驟中防止玻璃片材G發生乾燥。若玻璃片材G發生乾燥,則附著於玻璃片材G之清洗劑固著,即便使用夾輥15、17、及噴淋單元16亦難以去除。因此,藉由濡濕玻璃片材G防止乾燥,而容易使用夾輥15等去除清洗劑。再者,噴淋裝置宜於自噴淋裝置噴出之純水、超純水等沖洗液不直接淋於夾輥15、17之範圍內接近夾輥15、17而設置。又,夾輥15、17之尺寸於片材玻璃G之搬送過程中可覆蓋片材玻璃G之整個正面及背面便可,可根據玻璃片材G之大小而適當變更。又,覆蓋夾輥15、17之兩個外周面之海綿之形狀、厚度、材料可根據所使用之清洗劑、自噴淋裝置噴出之純水量等而適當變更。 The nip rolls 15 and 17 are disposed so as to be disposed above the glass sheet G in order to remove the lotion and liquid adhering to the front and back surfaces of the glass sheet G, and are oriented in a direction orthogonal to the direction in which the glass sheet G is conveyed. A portion of the sponge-equipped cleaning device disposed from one end of the glass sheet G to the other end. The nip rolls 15, 17 are a cleaning unit (physical cleaning unit) that removes the lotion or liquid by contacting the glass sheet G. Figure 5 is a plan view of an example of a nip roller. As shown in the figure, the nip rolls 15 and 17 are disposed so as to straddle the conveying direction of the glass sheet G in the same manner as the cleaning sponge rolls 14a and 14b. A cleaning sponge is attached to the outer peripheral surface of the nip rolls 15, 17. The nip rolls 15 and 17 mainly remove the cleaning agent adhered to the glass sheet G by washing with a cleaning agent. The distance between the nip rollers 15, 17 and the glass sheet G is controlled by the position of the nip rollers 15, 17 (not shown) According to an appropriate control, the nip rolls 15 and 17 are rotated by the shaft in contact with the glass sheet G, and the cleaning sponge contacts the surface of the conveyed glass sheet G to adhere the surface of the glass sheet G to the lotion. , liquid removal. The nip roller 15 is disposed between the sponge unit 14 and the shower unit 16, and the nip roller 17 is disposed on the downstream side of the shower unit 16. A shower device (not shown) is provided on the upstream side and/or the downstream side of the nip roller 15 to prevent drying of the glass sheet G. The shower device, for example, sprays pure water or ultrapure water to wet the glass sheet G, thereby preventing the glass sheet G from being dried during the washing step. When the glass sheet G is dried, the cleaning agent adhering to the glass sheet G is fixed, and it is difficult to remove even if the nip rolls 15 and 17 and the shower unit 16 are used. Therefore, by dampening the glass sheet G to prevent drying, it is easy to remove the cleaning agent using the nip roller 15 or the like. Further, the shower device is preferably disposed such that the rinse liquid such as pure water or ultrapure water sprayed from the shower device is not directly exposed to the nip rolls 15, 17 within the range of the nip rolls 15, 17. Moreover, the size of the nip rolls 15 and 17 can cover the entire front surface and the back surface of the sheet glass G during the conveyance of the sheet glass G, and can be appropriately changed according to the size of the glass sheet G. Further, the shape, thickness, and material of the sponge covering the outer peripheral surfaces of the nip rolls 15 and 17 can be appropriately changed depending on the cleaning agent to be used, the amount of pure water sprayed from the shower device, and the like.

清洗單元10之清洗劑罐18儲存清洗步驟中所使用之添加有界面活性劑之無機鹼系清洗劑。清洗劑罐18具有將清洗劑加熱至例如50℃~80℃之溫度範圍並進行保溫之功能。噴嘴18a、18b將清洗劑罐18所供給之清洗劑噴射至於刷單元12內搬送之玻璃片材G之兩個表面。噴嘴18c、18d將清洗劑罐18所供給之清洗劑噴射至於海綿單元14內搬送之玻璃片材G之兩個表面。由清洗劑罐18供給且被噴射至玻璃片材G之兩個表面之清洗劑自玻璃片材G流落,被回收至清洗劑回收罐(並未圖示)中。 The cleaning agent tank 18 of the cleaning unit 10 stores the inorganic alkali-based cleaning agent added with the surfactant used in the cleaning step. The cleaning agent tank 18 has a function of heating the cleaning agent to a temperature range of, for example, 50 ° C to 80 ° C and maintaining the temperature. The nozzles 18a and 18b spray the cleaning agent supplied from the cleaning agent tank 18 onto both surfaces of the glass sheet G conveyed in the brush unit 12. The nozzles 18c and 18d spray the cleaning agent supplied from the cleaning agent tank 18 onto both surfaces of the glass sheet G conveyed in the sponge unit 14. The cleaning agent supplied from the cleaning agent tank 18 and sprayed onto both surfaces of the glass sheet G flows from the glass sheet G and is recovered in a cleaning agent recovery tank (not shown).

純水罐19儲存上述純水或超純水。純水罐19具有將純水或超純水加熱至例如25℃~80℃之溫度範圍並進行保溫之功能。噴嘴19a、19b將純水罐19所供給之純水或超純水噴射至於噴淋單元16內搬送之 玻璃片材G之兩個表面。由純水罐19供給且被噴射至玻璃片材G之兩個表面之純水或超純水自玻璃片材G流落,而被回收至純水劑回收罐(並未圖示)中。 The pure water tank 19 stores the above pure water or ultrapure water. The pure water tank 19 has a function of heating pure water or ultrapure water to a temperature range of, for example, 25 ° C to 80 ° C and maintaining the temperature. The nozzles 19a and 19b spray the pure water or ultrapure water supplied from the pure water tank 19 to the shower unit 16 for transport. Two surfaces of the glass sheet G. Pure water or ultrapure water supplied from the pure water tank 19 and sprayed onto both surfaces of the glass sheet G flows from the glass sheet G, and is recovered into a pure water recovery tank (not shown).

再者,於本實施形態中,如圖4所示,刷單元12及海綿單元14共用清洗劑罐18,但是亦可使用各自之清洗劑罐18。此時,刷單元12及海綿單元14可使用不同濃度之清洗劑對玻璃片材G進行清洗。 Further, in the present embodiment, as shown in Fig. 4, the brush unit 12 and the sponge unit 14 share the cleaning agent tank 18, but the respective cleaning agent tanks 18 may be used. At this time, the brush unit 12 and the sponge unit 14 can clean the glass sheet G using different concentrations of the cleaning agent.

繼而,對單片清洗裝置1之玻璃片材G之清洗流程進行說明。首先,於清洗單元10之刷單元12中進行玻璃片材G之刷清洗。具體而言,自噴嘴18a、18b噴射之無機鹼系清洗劑附著於玻璃片材G之兩個表面,並藉由清洗刷輥12a、12b之軸旋轉而對玻璃片材G之兩個表面進行清洗。 Next, the cleaning process of the glass sheet G of the single-chip cleaning apparatus 1 will be described. First, the brush cleaning of the glass sheet G is performed in the brush unit 12 of the cleaning unit 10. Specifically, the inorganic alkali-based cleaning agent sprayed from the nozzles 18a and 18b is attached to both surfaces of the glass sheet G, and the two surfaces of the glass sheet G are subjected to rotation by the shafts of the cleaning brush rollers 12a and 12b. Cleaning.

繼而,於清洗單元10之海綿單元14中,進行玻璃片材G之海綿清洗。具體而言,自噴嘴18c、18d噴射之無機鹼系清洗劑附著於玻璃片材G之兩個表面,並藉由清洗海綿輥14a、14b之軸旋轉而對玻璃片材G之兩個表面進行清洗。 Then, in the sponge unit 14 of the cleaning unit 10, sponge cleaning of the glass sheet G is performed. Specifically, the inorganic alkali-based cleaning agent sprayed from the nozzles 18c and 18d is attached to both surfaces of the glass sheet G, and the two surfaces of the glass sheet G are subjected to rotation by the shafts of the cleaning sponge rolls 14a and 14b. Cleaning.

繼而,於清洗單元10之夾輥15,進行玻璃片材G之海綿清洗。具體而言,設置於夾輥15上游側之噴淋裝置(並未圖示)噴射之沖洗液(例如純水或超純水)濡濕玻璃片材G之正面及背面而防止乾燥,藉此,可抑制未能被海綿單元14去除之附著於正面及背面之清洗劑之固著。於玻璃片材G自上游向下游行進時,設置於玻璃片材G之正面及背面之一對夾輥15進行旋轉,而將附著於玻璃片材G之正面及背面之附著物去除。夾輥15將海綿部分壓向(壓抵於)玻璃片材G,並利用軸旋轉將殘留於玻璃片材G兩個表面之清洗劑去除。將夾輥15壓抵於玻璃片材G之力係根據對玻璃片材G供給並被回收至清洗劑回收罐(並未圖示)中之包含清洗劑之清洗液之濃度進行控制。清洗劑回收罐中回收含有清洗液之液體,但是若清洗液附著於玻璃片材G,則回收至清洗劑回收 罐中之清洗液之量減少。即,被回收至清洗劑回收罐中之清洗液之濃度變得低於儲存於清洗劑罐18中之供給前之清洗液之濃度。因此,藉由測定被回收至清洗劑回收罐中之清洗液之濃度,可測定因為清洗液附著於玻璃片材G上而造成之玻璃片材G之污染度。於玻璃片材G之污染度高時,即,於被回收至清洗劑回收罐中之清洗液之濃度低時,增強將夾輥15壓抵於玻璃片材G上之力,來提高夾輥15之清洗力,於玻璃片材G之污染度低時,即,於被回收至清洗劑回收罐中之清洗液之濃度高時,減弱將夾輥15壓抵於玻璃片材G上之力,來降低夾輥15之清洗力。圖6係表示被回收至清洗劑回收罐中之清洗液之濃度與將夾輥15壓抵於玻璃片材G上之力之關係之一例的圖表。如該圖所示,清洗液之濃度越低,清洗液越附著於玻璃片材G上,而玻璃片材G之正面及背面越被污染,因此,增強將夾輥15壓抵於玻璃片材G上之力來清洗玻璃片材G。另一方面,清洗液之濃度越高,清洗液越不附著於玻璃片材G上,玻璃片材G之正面及背面越不被污染,因此,減弱將夾輥15壓抵於玻璃片材G上之力來清洗玻璃片材G。被回收至清洗劑回收罐中之清洗液之濃度越低,越縮短夾輥15與玻璃片材G之距離,而增強將夾輥15壓抵於玻璃片材G上之力。藉此,可去除附著於玻璃片材G上之清洗劑,並且抑制發生洗劑成分之固著。而且,設置於夾輥15下游側之噴淋裝置(並未圖示)噴射之純水或超純水藉由濡濕玻璃片材G之正面及背面,而防止玻璃片材G之乾燥,同時玻璃片材G被搬向下游。 Then, sponge cleaning of the glass sheet G is performed on the nip roller 15 of the cleaning unit 10. Specifically, the rinsing liquid (for example, pure water or ultrapure water) sprayed from a shower device (not shown) provided on the upstream side of the nip roller 15 wets the front and back surfaces of the glass sheet G to prevent drying. The fixing of the cleaning agent attached to the front and back surfaces which is not removed by the sponge unit 14 can be suppressed. When the glass sheet G travels from the upstream to the downstream, one of the front surface and the back surface of the glass sheet G is rotated by the nip roller 15, and the adhering matter adhering to the front surface and the back surface of the glass sheet G is removed. The nip roller 15 presses (presses) the sponge portion against the glass sheet G, and removes the cleaning agent remaining on both surfaces of the glass sheet G by the shaft rotation. The force for pressing the nip roller 15 against the glass sheet G is controlled based on the concentration of the cleaning liquid containing the cleaning agent supplied to the glass sheet G and recovered in the cleaning agent recovery tank (not shown). The liquid containing the cleaning liquid is recovered in the cleaning agent recovery tank, but if the cleaning liquid adheres to the glass sheet G, it is recovered to the cleaning agent recovery The amount of cleaning fluid in the tank is reduced. That is, the concentration of the cleaning liquid recovered into the cleaning agent recovery tank becomes lower than the concentration of the cleaning liquid before the supply stored in the cleaning agent tank 18. Therefore, by measuring the concentration of the cleaning liquid recovered in the cleaning agent recovery tank, the degree of contamination of the glass sheet G due to the adhesion of the cleaning liquid to the glass sheet G can be measured. When the degree of contamination of the glass sheet G is high, that is, when the concentration of the cleaning liquid recovered into the cleaning agent recovery tank is low, the force of pressing the nip roller 15 against the glass sheet G is enhanced to increase the nip roller. The cleaning power of 15 is such that when the contamination degree of the glass sheet G is low, that is, when the concentration of the cleaning liquid recovered in the cleaning agent recovery tank is high, the force for pressing the nip roller 15 against the glass sheet G is weakened. To reduce the cleaning force of the nip roller 15. Fig. 6 is a graph showing an example of the relationship between the concentration of the cleaning liquid recovered in the cleaning agent recovery tank and the force for pressing the nip roller 15 against the glass sheet G. As shown in the figure, the lower the concentration of the cleaning liquid, the more the cleaning liquid adheres to the glass sheet G, and the front and back surfaces of the glass sheet G are contaminated, thereby enhancing the pressing of the nip roller 15 against the glass sheet. G is used to clean the glass sheet G. On the other hand, the higher the concentration of the cleaning liquid, the less the cleaning liquid adheres to the glass sheet G, and the front and back surfaces of the glass sheet G are less contaminated, so that the nip roller 15 is weakened against the glass sheet G. The force is used to clean the glass sheet G. The lower the concentration of the cleaning liquid recovered into the cleaning agent recovery tank, the shorter the distance between the nip roller 15 and the glass sheet G is, and the force for pressing the nip roller 15 against the glass sheet G is enhanced. Thereby, the cleaning agent adhering to the glass sheet G can be removed, and the fixation of the lotion component can be suppressed. Further, the pure water or ultrapure water sprayed from the shower device (not shown) provided on the downstream side of the nip roller 15 prevents the glass sheet G from being dried while the glass sheet G is dried while the glass sheet G is dried. The sheet G is moved downstream.

繼而,於清洗單元10之噴淋單元16中,進行將附著於玻璃片材G表面之無機鹼系清洗劑去除之沖洗步驟。具體而言,自噴嘴19a、19b噴射出之經過溫度控制之沖洗液(例如純水或超純水)附著於玻璃片材G之兩個表面,藉此,玻璃片材G之表面被純水或超純水漂洗,而附著於表面之無機鹼系清洗劑被沖走。此處,所謂溫度控制,係指使相 對於即將進行沖洗步驟之前之清洗劑溫度而例如溫度差為0℃以上且25℃以下之沖洗液於沖洗步驟之初期滲透。清洗單元10係使相對於即將進行沖洗步驟之前之清洗劑溫度而溫度差(洗劑溫度-沖洗液溫度)為0℃以上且25℃以下之沖洗液於沖洗步驟之初期滲透而進行去除。藉此,可提高附著於玻璃片材G之表面之無機鹼系清洗劑之去除效率。再者,通過噴淋單元16之玻璃片材G之表面成為附著純水或超純水而濕潤之狀態。通過清洗單元10之玻璃片材G保持表面濕潤之狀態被搬送至設置有夾輥17之位置。夾輥17與夾輥15同樣地,對處於被噴淋裝置(並未圖示)濡濕之狀態之玻璃片材G進行清洗。利用夾輥17,進行去除純水或超純水之去除步驟。將夾輥17壓抵於玻璃片材G之力係根據對玻璃片材G供給並被回收至純水回收罐(並未圖示)中之純水之導電率進行控制。純水回收罐中回收含有清洗劑之純水,若利用夾輥17去除附著於玻璃片材G之清洗劑,則回收至純水回收罐中之純水所含之清洗劑之量增加,因此,被回收之純水之導電率提高。因此,藉由測定被回收至純水回收罐中之純水之導電率,可測定玻璃片材G之潔淨度。於玻璃片材G之潔淨度高時,即,於利用上游側之夾輥15等可去除附著於玻璃片材G上之清洗劑而導電率低時,減弱將夾輥17壓抵於玻璃片材G之力而進行清洗,於玻璃片材G之潔淨度低時,即,於清洗劑流入純水回收罐中而導電率高時,增強將夾輥17壓抵於玻璃片材G之力,而提高夾輥17之清洗力。被回收至純水回收罐中之純水之導電率越高,越縮短夾輥17與玻璃片材G之距離,來增強將夾輥17壓抵於玻璃片材G之力。藉此,可將附著於玻璃片材G上之清洗劑去除,而抑制發生洗劑成分之固著。由於可自玻璃片材G去除清洗劑而抑制發生洗劑成分之固著,故而於玻璃片材G上形成黑矩陣等時,可抑制黑矩陣之接著不良、接著後之剝落。設置於夾輥17下游側之噴淋裝置(並未圖示)噴射之純水或超純水藉由濡濕玻璃片材G之正 面及背面,而防止玻璃片材G之乾燥,同時玻璃片材G被搬向下游。通過清洗單元10之玻璃片材G保持表面濕潤之狀態被搬送。藉此,可控制通過清洗單元10之玻璃片材G之表面之異物附著量。 Then, in the shower unit 16 of the cleaning unit 10, a rinsing step of removing the inorganic alkali-based cleaning agent adhering to the surface of the glass sheet G is performed. Specifically, the temperature-controlled rinsing liquid (for example, pure water or ultrapure water) ejected from the nozzles 19a and 19b is attached to both surfaces of the glass sheet G, whereby the surface of the glass sheet G is pure water. Or rinsing with ultrapure water, and the inorganic alkali cleaning agent attached to the surface is washed away. Here, the so-called temperature control refers to the phase The rinse liquid immediately before the rinsing step, for example, the rinsing liquid having a temperature difference of 0 ° C or more and 25 ° C or less is infiltrated at the beginning of the rinsing step. The cleaning unit 10 removes the rinsing liquid having a temperature difference (washing agent temperature - rinsing liquid temperature) of 0 ° C or more and 25 ° C or less at the beginning of the rinsing step with respect to the temperature of the cleaning agent immediately before the rinsing step. Thereby, the removal efficiency of the inorganic alkali-based cleaning agent adhering to the surface of the glass sheet G can be improved. Further, the surface of the glass sheet G passing through the shower unit 16 is in a state of being wetted by adhering pure water or ultrapure water. The glass sheet G of the cleaning unit 10 is conveyed to a position where the nip roller 17 is provided while keeping the surface wet. Similarly to the nip roller 15, the nip roller 17 cleans the glass sheet G in a state of being wetted by a shower device (not shown). The removal step of removing pure water or ultrapure water is performed by the nip roller 17. The force for pressing the nip roller 17 against the glass sheet G is controlled based on the conductivity of the pure water supplied to the glass sheet G and recovered in a pure water recovery tank (not shown). The pure water containing the cleaning agent is recovered in the pure water recovery tank, and if the cleaning agent adhering to the glass sheet G is removed by the nip roller 17, the amount of the cleaning agent contained in the pure water recovered in the pure water recovery tank is increased, so The conductivity of the recovered pure water is increased. Therefore, the cleanliness of the glass sheet G can be measured by measuring the conductivity of the pure water recovered in the pure water recovery tank. When the cleanliness of the glass sheet G is high, that is, when the cleaning agent adhering to the glass sheet G can be removed by the nip roller 15 on the upstream side and the electrical conductivity is low, the nip roller 17 is weakened against the glass sheet. Cleaning with the force of the material G, when the cleanliness of the glass sheet G is low, that is, when the cleaning agent flows into the pure water recovery tank and the electrical conductivity is high, the force for pressing the nip roller 17 against the glass sheet G is enhanced. And the cleaning force of the nip roller 17 is increased. The higher the electrical conductivity of the pure water recovered into the pure water recovery tank, the shorter the distance between the nip roller 17 and the glass sheet G is, and the force for pressing the nip roller 17 against the glass sheet G is enhanced. Thereby, the cleaning agent adhering to the glass sheet G can be removed, and the fixation of the lotion component can be suppressed. Since the cleaning agent can be removed from the glass sheet G and the fixation of the lotion component is suppressed, when a black matrix or the like is formed on the glass sheet G, it is possible to suppress the subsequent failure of the black matrix and the subsequent peeling. The pure water or ultrapure water sprayed by the shower device (not shown) disposed on the downstream side of the nip roller 17 is pressed by the wet glass sheet G The surface and the back surface prevent drying of the glass sheet G, and the glass sheet G is moved downstream. The glass sheet G of the cleaning unit 10 is conveyed while keeping the surface wet. Thereby, the amount of foreign matter adhering to the surface of the glass sheet G passing through the cleaning unit 10 can be controlled.

關於測定清洗液之濃度、純水之導電率之方法,可使用任意測定器利用一般方法進行測定。又,夾輥15、17壓向玻璃片材G之力可根據玻璃片材G之搬送速度、清洗液之濃度、純水之導電率等而適當變更。又,亦可於利用夾輥15、17進行清洗後設置使用純水清洗玻璃片材G之純水清洗步驟。 The method for measuring the concentration of the cleaning liquid and the conductivity of the pure water can be measured by a general method using any measuring instrument. Further, the force of the nip rolls 15 and 17 pressed against the glass sheet G can be appropriately changed depending on the transport speed of the glass sheet G, the concentration of the cleaning liquid, the conductivity of pure water, and the like. Further, a pure water washing step of cleaning the glass sheet G with pure water may be provided after washing with the nip rolls 15 and 17.

以上,對單片清洗之玻璃片材之清洗方法進行說明。藉由上述清洗,可去除附著於玻璃片材上之清洗劑,而且由於不使用氣刀,故而可抑制片材玻璃發生乾燥,而可抑制因片材玻璃上殘留清洗劑而發生之洗劑成分之固著。又,於玻璃片材上形成黑矩陣等時,可抑制黑矩陣之接著不良、接著後之剝落。 The cleaning method of the glass sheet for single-chip cleaning will be described above. By the above cleaning, the cleaning agent adhering to the glass sheet can be removed, and since the air knife is not used, drying of the sheet glass can be suppressed, and the lotion component which occurs due to the residual cleaning agent on the sheet glass can be suppressed. Fixed. Further, when a black matrix or the like is formed on the glass sheet, the subsequent defects of the black matrix and the subsequent peeling can be suppressed.

<特徵> <Features>

先前,為了去除附著於玻璃片材表面之有機物,而採用使用無機鹼系清洗劑清洗玻璃片材表面之方法。於用於FPD製造之玻璃片材之表面形成TFT等半導體元件。上述玻璃片材為了抑制因剝離靜電或短路等引起之半導體元件之破壞,而對表面要求極高之潔淨度。因此,使用藉由使用無機鹼系清洗劑清洗玻璃片材表面而製造具有極高潔淨度之玻璃片材的方法。 Previously, in order to remove the organic matter adhering to the surface of the glass sheet, a method of cleaning the surface of the glass sheet with an inorganic alkali-based cleaning agent was employed. A semiconductor element such as a TFT is formed on the surface of the glass sheet used for FPD manufacturing. The glass sheet is required to have an extremely high degree of cleanliness on the surface in order to suppress destruction of the semiconductor element due to peeling off static electricity or short circuit. Therefore, a method of producing a glass sheet having an extremely high degree of cleanliness by washing the surface of a glass sheet with an inorganic alkali-based cleaning agent is used.

但是,玻璃片材為了獲得高潔淨度而使用KOH或NaOH系無機鹼系清洗劑進行過清洗,黑矩陣樹脂對該玻璃片材表面之密接性低,可知存在黑矩陣自玻璃片材表面剝離之問題。尤其,近年來,隨著顯示器高清化,配置於玻璃片材表面之黑矩陣之線寬及間距逐漸減小,因此黑矩陣樹脂對玻璃片材表面之密接性降低成為重要問題。 However, in order to obtain high cleanliness, the glass sheet was cleaned using a KOH or NaOH-based inorganic alkali-based cleaning agent, and the adhesion of the black matrix resin to the surface of the glass sheet was low, and it was found that the black matrix was peeled off from the surface of the glass sheet. problem. In particular, in recent years, as the display is high-definition, the line width and pitch of the black matrix disposed on the surface of the glass sheet are gradually reduced, so that the adhesion of the black matrix resin to the surface of the glass sheet is an important problem.

又,附著於玻璃片材表面之特定有機物(尤其洗劑所含之界面活 性劑)有可能成為黑矩陣樹脂對玻璃片材表面之密接性降低之原因。具體而言,若使用添加有界面活性劑之無機鹼系清洗劑對玻璃片材表面進行清洗,則黑矩陣樹脂對玻璃片材表面之密接性降低。因此,來自界面活性劑之有機物有可能成為黑矩陣樹脂之密接性降低之原因。又,導致黑矩陣樹脂之密接性降低之有機物有可能亦包括例如來自玻璃片材積層體所含之間隔紙之有機物、及玻璃片材積層體之保管及搬送環境下之氣體氛圍中之有機物。 Moreover, the specific organic matter attached to the surface of the glass sheet (especially the interface contained in the lotion) The agent may be a cause of a decrease in the adhesion of the black matrix resin to the surface of the glass sheet. Specifically, when the surface of the glass sheet is washed with an inorganic alkali-based cleaning agent to which a surfactant is added, the adhesion of the black matrix resin to the surface of the glass sheet is lowered. Therefore, the organic substance derived from the surfactant may cause a decrease in the adhesion of the black matrix resin. Further, the organic substance which causes a decrease in the adhesion of the black matrix resin may include, for example, an organic substance derived from a spacer paper contained in the glass sheet laminate, and an organic substance in a gas atmosphere in a storage and transport environment of the glass sheet laminate.

於本實施形態中,於使用添加有界面活性劑之無機鹼系清洗劑對玻璃片材表面進行清洗之清洗步驟中,不使用氣刀而利用夾輥對玻璃片材進行清洗,藉此,可製造以下之玻璃片材:抑制發生洗劑成分之固著,並且去除清洗劑,具有極高潔淨度,並且黑矩陣樹脂之密接性不降低。來自清洗步驟中使用之清洗劑所含之界面活性劑的有機物係藉由清洗步驟而自玻璃片材表面被去除。該有機物係導致黑矩陣樹脂對玻璃片材表面之密接性降低之有機物。該有機物係GC/MS(氣相層析質譜分析計)中之保持時間為18分鐘以上之有機物,例如為芳香族化合物或非離子界面活性劑。本實施形態之製造方法可提高黑矩陣樹脂對玻璃片材表面之密接性。再者,使用GL Science股份有限公司製造之無極性管柱TC-1作為GC/MS中使用之毛細管柱。 In the present embodiment, in the washing step of washing the surface of the glass sheet with the inorganic alkali-based cleaning agent to which the surfactant is added, the glass sheet is cleaned by the nip rolls without using an air knife. The following glass sheets were produced: the fixing of the lotion component was suppressed, and the cleaning agent was removed, which had extremely high cleanliness, and the adhesion of the black matrix resin was not lowered. The organic material from the surfactant contained in the cleaning agent used in the cleaning step is removed from the surface of the glass sheet by a washing step. This organic substance is an organic substance which causes a decrease in the adhesion of the black matrix resin to the surface of the glass sheet. The organic substance is an organic substance having a holding time of 18 minutes or longer in a GC/MS (Gas Chromatography Mass Spectrometer), and is, for example, an aromatic compound or a nonionic surfactant. The manufacturing method of this embodiment can improve the adhesion of the black matrix resin to the surface of the glass sheet. Further, a non-polar column TC-1 manufactured by GL Science Co., Ltd. was used as a capillary column used in GC/MS.

於本實施形態中,於玻璃片材之清洗步驟後附著於玻璃片材表面之特定有機物(尤其洗劑所含之界面活性劑)之質量較佳為每1cm2玻璃片材表面為0.05ng~0.50ng,更佳為0.05ng~0.25ng。有機物之質量越多,黑矩陣樹脂對玻璃片材表面之密接性越降低,因此附著於玻璃片材表面之特定有機物之質量越少越佳,於本實施形態中,藉由控制為玻璃片材表面每1cm2為0.05ng~0.50ng,可提高黑矩陣樹脂之密接性。 In the present embodiment, the mass of the specific organic substance (especially the surfactant contained in the lotion) adhering to the surface of the glass sheet after the cleaning step of the glass sheet is preferably 0.05 ng per 1 cm 2 of the surface of the glass sheet. 0.50 ng, more preferably 0.05 ng to 0.25 ng. The more the quality of the organic substance, the lower the adhesion of the black matrix resin to the surface of the glass sheet, so that the quality of the specific organic substance adhering to the surface of the glass sheet is preferably as small as possible. In the present embodiment, the glass sheet is controlled by the glass sheet. The surface is 0.05 ng to 0.50 ng per 1 cm 2 , which improves the adhesion of the black matrix resin.

如此,藉由測定被回收至清洗劑回收罐中之清洗液之濃度、被 回收至純水回收罐中之純水之導電率,可測定玻璃片材G之潔淨度。因此,根據清洗液之濃度、純水之導電率,藉由控制為玻璃片材表面每1cm2為0.05ng~0.50ng,可提高黑矩陣樹脂之密接性。 Thus, the cleanliness of the glass sheet G can be measured by measuring the concentration of the cleaning liquid recovered in the cleaning agent recovery tank and the conductivity of the pure water recovered in the pure water recovery tank. Therefore, the adhesion of the black matrix resin can be improved by controlling the concentration of the cleaning liquid and the conductivity of the pure water by controlling the surface of the glass sheet to be 0.05 ng to 0.50 ng per 1 cm 2 .

又,本實施形態之製造方法於製造黑矩陣之線寬及間距小之彩色濾光片面板時尤其有效。彩色濾光片面板係於表面配置黑矩陣及RGB像素而形成有彩色濾光片之玻璃片材。藉由本實施形態之製造方法所製造之玻璃片材即便於表面配置具有未達10μm線寬之黑矩陣,亦充分抑制黑矩陣剝離。因此,該玻璃片材可於表面配置具有3μm~5μm線寬之高清黑矩陣。 Further, the manufacturing method of the present embodiment is particularly effective when manufacturing a color filter panel having a line width and a small pitch of a black matrix. The color filter panel is a glass sheet in which a black matrix and RGB pixels are arranged on the surface to form a color filter. The glass sheet produced by the production method of the present embodiment sufficiently suppresses black matrix peeling even if a black matrix having a line width of less than 10 μm is disposed on the surface. Therefore, the glass sheet can be provided with a high-definition black matrix having a line width of 3 μm to 5 μm on the surface.

於本實施形態中,於清洗單元10之刷單元12及海綿單元14中,利用無機鹼系清洗劑清洗過玻璃片材G表面後,利用夾輥15進行清洗。於夾輥15,附著於玻璃片材G表面之無機鹼系清洗劑被純水或超純水沖走而去除。又,於清洗單元10之噴淋單元16中,清洗過玻璃片材G表面後,利用夾輥17進行清洗。因為不使用氣刀,故而玻璃片材G之乾燥得到抑制,附著於玻璃片材G表面之無機鹼系清洗劑被夾輥15、17去除。又,藉由將即將到達夾輥15之前之洗劑溫度與剛離開夾輥15後之純水溫度之差設為0℃以上且25℃以下,而提高附著於玻璃片材G之表面之無機鹼系清洗劑之去除效率。 In the present embodiment, the surface of the glass sheet G is cleaned by the inorganic alkali-based cleaning agent in the brush unit 12 and the sponge unit 14 of the cleaning unit 10, and then washed by the nip rolls 15. In the nip roller 15, the inorganic alkali-based cleaning agent adhering to the surface of the glass sheet G is washed away by pure water or ultrapure water and removed. Further, in the shower unit 16 of the cleaning unit 10, the surface of the glass sheet G is cleaned and then washed by the nip rolls 17. Since the air knife is not used, the drying of the glass sheet G is suppressed, and the inorganic alkali-based cleaning agent adhering to the surface of the glass sheet G is removed by the nip rolls 15, 17. Further, by setting the difference between the temperature of the lotion immediately before the nip roller 15 and the temperature of the pure water immediately after leaving the nip roller 15 to 0 ° C or more and 25 ° C or less, the inorganic matter adhering to the surface of the glass sheet G is improved. The removal efficiency of the alkali cleaning agent.

清洗步驟中使用之無機鹼系清洗劑含有界面活性劑。界面活性劑如上所述,係導致黑矩陣樹脂對玻璃片材表面之密接性降低之有機物。若對該界面活性劑使用非離子界面活性劑(非離子性界面活性劑),則與使用陰離子界面活性劑(陰離子性界面活性劑)時相比,於玻璃片材表面容易殘留界面活性劑,而引起黑矩陣剝落。於清洗步驟之最後,利用夾輥清洗玻璃片材,並利用相對於即將到達夾輥之前之洗劑溫度而將溫度差控制為0℃以上且25℃以下之純水或超純水漂洗玻璃片材表面,而將附著於玻璃片材G表面之清洗劑沖走,藉此,可提 高附著於玻璃片材表面之有機物之去除效果。 The inorganic base cleaning agent used in the washing step contains a surfactant. As described above, the surfactant is an organic substance which causes a decrease in the adhesion of the black matrix resin to the surface of the glass sheet. When a nonionic surfactant (nonionic surfactant) is used for the surfactant, the surfactant is likely to remain on the surface of the glass sheet compared to when an anionic surfactant (anionic surfactant) is used. And cause the black matrix to peel off. At the end of the cleaning step, the glass sheet is cleaned by a nip roller, and the glass piece is rinsed with pure water or ultrapure water whose temperature difference is controlled to 0 ° C or more and 25 ° C or less with respect to the temperature of the lotion immediately before the nip roll is reached. The surface of the material, and the cleaning agent attached to the surface of the glass sheet G is washed away, thereby The removal effect of organic matter attached to the surface of the glass sheet.

於本實施形態中,清洗步驟中所使用之清洗劑係利用水將市售之玻璃基板用清洗液進行稀釋,並對所獲得之稀釋液添加KOH等鹼性成分而形成。具體而言,對玻璃基板用清洗液之稀釋液添加KOH等鹼性成分,而形成具有1質量%以上濃度之清洗劑。藉由添加鹼性成分,可並不製造及使用鹼性成分濃度非常高之清洗液而容易地生成鹼性成分濃度高之清洗劑。鹼性成分濃度高之清洗劑可提高玻璃片材之蝕刻性,且使玻璃屑或灰塵等異物、及於受到荷重之狀態下附著於玻璃片材表面之黏著性異物等自玻璃片材表面剝離而有效地去除。 In the present embodiment, the cleaning agent used in the washing step is formed by diluting a commercially available glass substrate with a washing liquid, and adding an alkaline component such as KOH to the obtained diluent. Specifically, an alkaline component such as KOH is added to the diluted solution of the cleaning liquid for a glass substrate to form a cleaning agent having a concentration of 1% by mass or more. By adding an alkaline component, it is possible to easily produce a cleaning agent having a high alkaline component concentration without using and using a cleaning liquid having a very high basic component concentration. The cleaning agent having a high concentration of an alkaline component can improve the etching property of the glass sheet, and peel off foreign matter such as glass dust or dust, and adhesive foreign matter adhering to the surface of the glass sheet under load, and peel off from the surface of the glass sheet. And effectively remove it.

又,藉由對玻璃基板用清洗液之稀釋液添加鹼性成分而形成清洗劑,其表面張力低於稀釋液。即,藉由對含有界面活性劑之玻璃基板用清洗液之稀釋液添加KOH等鹼性成分,而可獲得使清洗劑之表面張力降低之效果,該效果於將鹼性成分單獨添加於純水中時幾乎無法獲得。藉此,清洗劑變得容易滲透至黏著異物與玻璃板之間。而且,利用上述效果與由清洗劑獲得之玻璃片材蝕刻性提高之協同效應,而更有效地去除附著於玻璃片材上之異物。 Further, by adding an alkaline component to the diluted solution of the cleaning liquid for the glass substrate, a cleaning agent is formed, and the surface tension is lower than that of the diluent. In other words, by adding an alkaline component such as KOH to a diluent for a cleaning liquid for a glass substrate containing a surfactant, an effect of lowering the surface tension of the cleaning agent can be obtained, and the effect is that the alkaline component is separately added to the pure water. It is almost impossible to get in the middle. Thereby, the cleaning agent easily penetrates between the adhesive foreign matter and the glass plate. Further, by utilizing the above-described effects and the synergistic effect of the improvement of the etchability of the glass sheet obtained by the cleaning agent, the foreign matter adhering to the glass sheet is more effectively removed.

利用本實施形態所製造之玻璃片材(玻璃基板)適合作為平板顯示器用玻璃基板,例如液晶顯示器用玻璃基板或有機EL(Electroluminescence,電致發光)顯示器用玻璃基板。而且,藉由本實施形態所製造之玻璃基板尤其適合作為用於高清顯示器之LTPS(Low-temperature poly silicon,低溫多晶矽)-TFT顯示器用玻璃基板、或氧化物半導體-TFT顯示器用玻璃基板。 The glass sheet (glass substrate) produced by the present embodiment is suitable as a glass substrate for a flat panel display, for example, a glass substrate for a liquid crystal display or a glass substrate for an organic EL (Electroluminescence) display. Further, the glass substrate produced by the present embodiment is particularly suitable as a glass substrate for LTPS (Low-temperature polysilicon)-TFT display for high-definition display or a glass substrate for an oxide semiconductor-TFT display.

以上,對本發明之玻璃基板之製造方法及製造裝置進行詳細說明,但本發明並不限定於上述實施形態及實施例等,當然亦可於不脫離本發明之主旨之範圍內進行各種改良或變更。 In the above, the method and the apparatus for producing the glass substrate of the present invention are described in detail. However, the present invention is not limited to the above-described embodiments and examples, and various modifications and changes can be made without departing from the spirit and scope of the invention. .

10‧‧‧清洗單元 10‧‧‧cleaning unit

12‧‧‧刷單元 12‧‧‧ brush unit

12a‧‧‧清洗刷輥 12a‧‧‧Washing brush roller

12b‧‧‧清洗刷輥 12b‧‧‧Washing brush roller

14‧‧‧海綿單元 14‧‧‧Sponge unit

14a‧‧‧清洗海綿輥 14a‧‧‧Clean sponge roller

14b‧‧‧清洗海綿輥 14b‧‧‧Clean sponge roller

15‧‧‧夾輥 15‧‧‧Pinch roller

16‧‧‧噴淋單元 16‧‧‧Spray unit

17‧‧‧夾輥 17‧‧‧Pinch roller

18‧‧‧清洗劑罐 18‧‧‧cleaning agent tank

18a‧‧‧噴嘴 18a‧‧‧Nozzles

18b‧‧‧噴嘴 18b‧‧‧Nozzles

18c‧‧‧噴嘴 18c‧‧‧ nozzle

18d‧‧‧噴嘴 18d‧‧‧ nozzle

19‧‧‧純水罐 19‧‧‧ Pure water tank

19a‧‧‧噴嘴 19a‧‧‧Nozzles

19b‧‧‧噴嘴 19b‧‧‧Nozzles

G‧‧‧玻璃片材 G‧‧‧glass sheet

Claims (6)

一種玻璃基板之製造方法,其特徵在於:其係表面形成黑矩陣樹脂之彩色濾光片用玻璃基板之製造方法,並且具備如下步驟:清洗步驟,對上述玻璃基板供給包含添加有界面活性材之無機鹼系清洗劑之清洗液並進行清洗,沖洗步驟,使沖洗液滲透至於上述清洗步驟中附著於上述玻璃基板表面之清洗液中,及去除步驟,將於上述沖洗步驟中滲透有上述沖洗液之上述清洗液,藉由通過包括自上述玻璃基板之一端跨至另一端而設之第一輥與玻璃基板之上述表面接觸之構成的清洗單元而去除之;且上述清洗單元以使附著於上述玻璃基板之源自界面活性劑的有機物之附著量成為每1cm2上述玻璃基板之表面為0.05ng~0.50ng之方式,調整將上述第一輥壓抵於上述玻璃基板之力。 A method for producing a glass substrate, comprising: a method for producing a glass substrate for a color filter having a black matrix resin; and comprising: a cleaning step of supplying the glass substrate with an interface material added thereto The cleaning solution of the inorganic alkali cleaning agent is washed, the rinsing step is performed, the rinsing liquid is permeated into the cleaning liquid adhered to the surface of the glass substrate in the cleaning step, and the removing step is performed, and the rinsing liquid is permeated in the rinsing step The cleaning liquid is removed by a cleaning unit comprising a first roller disposed from one end of the glass substrate to the other end and contacting the surface of the glass substrate; and the cleaning unit is attached to the above The amount of the organic substance derived from the surfactant in the glass substrate is 0.05 ng to 0.50 ng per 1 cm 2 of the surface of the glass substrate, and the force for pressing the first roll against the glass substrate is adjusted. 如請求項1之玻璃基板之製造方法,其中上述去除步驟中,於使上述玻璃基板通過上述清洗單元前後之步驟中,至少於後續步驟中為了防止上述清洗液乾燥而對上述玻璃基板之表面供給液體。 The method for producing a glass substrate according to claim 1, wherein in the removing step, the surface of the glass substrate is supplied to prevent drying of the cleaning liquid at least in a subsequent step in a step of passing the glass substrate through the cleaning unit. liquid. 如請求項1或2之玻璃基板之製造方法,其進而具備步驟如後:將上述清洗步驟中附著於上述玻璃基板之表面之上述清洗劑,藉由通過自上述玻璃基板之一端跨至另一端而設且與上述玻璃基板接觸之第二輥而去除之;將上述清洗劑通過上述第二輥而去除之步驟中,將清洗過上述玻璃基板之上述清洗液回收,並測定所回收之 清洗液之濃度,測得之上述清洗液之濃度越低,越增強將上述第二輥壓抵於上述表面之力。 The method for producing a glass substrate according to claim 1 or 2, further comprising the step of: adhering the cleaning agent attached to a surface of the glass substrate in the cleaning step by passing from one end of the glass substrate to the other end And removing the second roller in contact with the glass substrate; and removing the cleaning liquid that has been washed through the glass substrate in the step of removing the cleaning agent through the second roller, and measuring the recovered The concentration of the cleaning liquid is measured such that the lower the concentration of the cleaning liquid is, the stronger the force for pressing the second roller against the surface is enhanced. 如請求項1或2之玻璃基板之製造方法,其中上述去除步驟中,藉由上述清洗單元將上述清洗液去除後,利用上述液體對上述玻璃基板進行清洗,並測定清洗過之上述液體之導電率,測得之上述液體之導電率越高,越增強將上述清洗單元壓抵於上述表面之力。 The method for producing a glass substrate according to claim 1 or 2, wherein, in the removing step, the cleaning liquid is removed by the cleaning unit, and the glass substrate is cleaned by the liquid, and the conductive conductivity of the liquid is measured. The higher the conductivity of the above liquid is measured, the stronger the force of pressing the cleaning unit against the surface is enhanced. 如請求項1或2之玻璃基板之製造方法,其中上述清洗單元係使相對於即將進行上述沖洗步驟前之清洗液之溫度之溫度差為0℃以上且25℃以下之沖洗液於上述沖洗步驟之初期滲透而進行去除。 The method for producing a glass substrate according to claim 1 or 2, wherein the cleaning unit is configured to cause a rinsing liquid having a temperature difference of 0 ° C or more and 25 ° C or less with respect to a temperature difference of a temperature of the cleaning liquid immediately before the rinsing step. It is removed by infiltration at the beginning. 一種玻璃基板之製造裝置,其特徵在於:其係表面形成黑矩陣樹脂之彩色濾光片用玻璃基板之製造裝置,且其具備:清洗裝置,其對上述玻璃基板供給包含添加有界面活性材之無機鹼系清洗劑之清洗液並進行清洗,及去除裝置,其使沖洗液滲透至附著於上述玻璃基板表面之清洗液中,並將滲透有上述沖洗液之上述清洗液,藉由通過包括自上述玻璃基板之一端跨至另一端而設之第一輥與上述玻璃基板之上述表面接觸之構成的清洗單元而去除之;且上述清洗單元以使附著於上述玻璃基板之源自界面活性劑的有機物之附著量成為每1cm2上述玻璃基板之表面為0.05ng~0.50ng之方式,調整將上述第一輥壓抵於上述玻璃基板之力。 A manufacturing apparatus for a glass substrate, comprising: a manufacturing apparatus for a glass substrate for a color filter of a black matrix resin; and a cleaning apparatus, wherein the glass substrate is supplied with an interface active material; a cleaning solution of the inorganic alkali-based cleaning agent, and a cleaning device, wherein the rinsing liquid is infiltrated into the cleaning liquid adhering to the surface of the glass substrate, and the cleaning liquid infiltrated with the rinsing liquid is passed through a cleaning unit configured such that a first roller of the glass substrate is connected to the other end of the glass substrate and the surface of the glass substrate is removed; and the cleaning unit is configured to adhere to the glass substrate and is derived from a surfactant. The amount of adhesion of the organic substance is 0.05 ng to 0.50 ng per 1 cm 2 of the surface of the glass substrate, and the force for pressing the first roll against the glass substrate is adjusted.
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Publication number Priority date Publication date Assignee Title
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103370642A (en) * 2011-01-28 2013-10-23 东洋油墨Sc控股株式会社 Colored composition for color filters, and color filter
TW201406694A (en) * 2012-08-06 2014-02-16 Avanstrate Korea Inc Method of producing glass plate for color filter, method of producing color filter panel, and glass substrate for display
TW201428062A (en) * 2013-01-11 2014-07-16 Toyo Ink Sc Holdings Co Ltd Coloring composition for use in color filter and color filter

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59101219A (en) * 1982-11-30 1984-06-11 Mitsubishi Electric Corp Draining device
JPH0744015Y2 (en) * 1987-04-03 1995-10-09 大日本スクリーン製造株式会社 Substrate drainer
JPS6471133A (en) * 1987-09-11 1989-03-16 Toshiba Corp Device for manufacturing semiconductor
JPH01255226A (en) * 1988-04-04 1989-10-12 Matsushita Electric Ind Co Ltd Substrate cleaning apparatus
JP3441559B2 (en) * 1995-04-25 2003-09-02 大日本スクリーン製造株式会社 Substrate drainer
JPH11290800A (en) * 1998-04-14 1999-10-26 Matsushita Electric Ind Co Ltd Chemical treatment device, chemical treatment method and substrate washing method
JP2003075626A (en) * 2001-09-07 2003-03-12 Sumitomo Chem Co Ltd Method for cleaning color filter substrate
JP4417180B2 (en) * 2004-06-11 2010-02-17 株式会社フューチャービジョン Substrate processing equipment
JP2009006299A (en) 2007-06-29 2009-01-15 Toppan Printing Co Ltd Apparatus for cleaning glass substrate
JP2013204012A (en) * 2012-03-29 2013-10-07 Avanstrate Inc Washing liquid of glass plate, washing method, and manufacturing method
JP2014061472A (en) * 2012-09-20 2014-04-10 Hitachi High-Technologies Corp Method and apparatus for treatment of substrate and method of producing panel for display

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103370642A (en) * 2011-01-28 2013-10-23 东洋油墨Sc控股株式会社 Colored composition for color filters, and color filter
TW201406694A (en) * 2012-08-06 2014-02-16 Avanstrate Korea Inc Method of producing glass plate for color filter, method of producing color filter panel, and glass substrate for display
TW201428062A (en) * 2013-01-11 2014-07-16 Toyo Ink Sc Holdings Co Ltd Coloring composition for use in color filter and color filter

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