TWI599728B - 多孔質氣靜壓載體及其多孔質本體 - Google Patents

多孔質氣靜壓載體及其多孔質本體 Download PDF

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TWI599728B
TWI599728B TW104141211A TW104141211A TWI599728B TW I599728 B TWI599728 B TW I599728B TW 104141211 A TW104141211 A TW 104141211A TW 104141211 A TW104141211 A TW 104141211A TW I599728 B TWI599728 B TW I599728B
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venting portion
pores
porous
apertures
porosity
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TW201721033A (zh
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王祥賓
簡國諭
許富銓
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財團法人金屬工業研究發展中心
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Priority to US14/982,084 priority patent/US20170157884A1/en
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Description

多孔質氣靜壓載體及其多孔質本體
本發明是關於一種多孔質氣靜壓載體及其多孔質本體，特別是該多孔質本體是以一積層製造方法製造形成，以控制該多孔質本體的孔隙的孔徑尺寸及孔隙率。
習知的一多孔質氣靜壓軸承是將金屬粉末、陶瓷粉末或石墨粉末等材料，以壓模及粉末冶金方法經高溫燒結製造成形，因此該多孔質氣靜壓軸承的孔隙會因粉末顆粒的粒徑不同，而造成孔隙的孔徑尺寸無法控制，相對地也使得該多孔質氣靜壓軸承的孔隙率、透氣率及滲透率不均，因此也造成該多孔質氣靜壓軸承的出氣的氣壓或出液的液壓不均的問題。
當該多孔質氣靜壓軸承裝設於一載台，由於該多孔質氣靜壓軸承的出氣壓力不平均，容易使該載台在一軌道上移動時產生晃動，而影響該載台移動的穩定性。
本發明之主要目的在於提供一種多孔質氣靜壓載體，包含有一多孔質本體及一封孔層，該多孔質本體以一積層製造方法製造形成，該多孔質本體 具有一第一通氣部及一第二通氣部，該第一通氣部包含複數個第一孔隙，該第二通氣部包含複數個第二孔隙，該些第一孔隙連通該些第二孔隙，其中該第一通氣部的一第一孔隙率大於該第二通氣部的一第二孔隙率，該封孔層覆蓋該第二通氣部，該封孔層具有複數個通孔，該通孔顯露出部分的該些第二孔隙。
本發明之主要目的在於提供一種多孔質本體，其以一積層製造方法製造形成，該多孔質本體具有一第一通氣部及一第二通氣部，該第一通氣部包含複數個第一孔隙，該第二通氣部包含複數個第二孔隙，該些第一孔隙連通該些第二孔隙，其特徵在於該第一通氣部的該第一孔隙率大於該第二通氣部的該第二孔隙率。
本發明藉由該多孔質本體以該積層製造方法製造形成，以控制該第一通氣部的該些第一孔隙的孔徑尺寸及該第二通氣部的該些第二孔隙的孔徑尺寸，並使該第一通氣部的一第一孔隙率大於該第二通氣部的一第二孔隙率，以達到使該多孔質氣靜壓載體的出氣壓力或出液壓力均勻的目的。
100‧‧‧多孔質氣靜壓載體
110‧‧‧多孔質本體
111‧‧‧第一通氣部
111a‧‧‧第一孔隙
111b‧‧‧第一表面
112‧‧‧第二通氣部
112a‧‧‧第二孔隙
112b‧‧‧第二表面
113‧‧‧第三通氣部
113a‧‧‧第三孔隙
120‧‧‧封孔層
121‧‧‧通孔
200‧‧‧軸桿
210‧‧‧桿體
220‧‧‧流道
230‧‧‧穿孔
第1至4圖：本發明「多孔質氣靜壓載體」的製造方法示意圖。
第5A及5B圖：本發明「多孔質本體」的多邊網狀結構示意圖。
第6A及6B圖：本發明「多孔質本體」的體心立方結構示意圖。
第7A及7B圖：本發明「多孔質本體」的面心立方結構示意圖。
第8圖：本發明「多孔質本體」的圓形立方結構示意圖。
第9圖：本發明「多孔質本體」的矩形立方結構示意圖。
第10圖：本發明「多孔質氣靜壓載體」的示意圖。
第11圖：本發明「多孔質本體」運用於軸桿的示意圖。
請參閱第4圖，本發明之第一實施例，一種多孔質氣靜壓載體100，其可被運用於光電半導體曝光機的載台、精密加工機的載台、量測設備的定位載台或精密軸承等精密設備中。
請參閱第4圖，該多孔質氣靜壓載體100包含有一多孔質本體110及一封孔層120，該多孔質本體110以一積層製造方法(Additive Manufacturing，AM)製造形成，該積層製造方法可選自於選擇性雷射燒結(Select Laser Melting，SLM)、電子束熔化成型(EBM，Electron Beam Melting)、直接金屬成形(Direct Metal Deposition，DMD)及3D列印技術(3D printing technology)等積層製造方法。
請參閱第1至4圖，其為該多孔質氣靜壓載體100的製造方法，首先請參閱第1圖，以該積層製造方法形成一第一通氣部111，形成該第一通氣部111的材料可選自於鋁合金、不鏽鋼、模具鋼、鈦合金、鎳合金、銅合金及鈷鉻合金等金屬材料，該第一通氣部111包含複數個第一孔隙111a及一第一表面111b，在本實施例中，該些第一孔隙111a的孔徑在100um至300um之間，由於該第一通氣部111是以該積層製造方法形成，因此可控制該些第一孔隙111a的導流方向及該些第一孔隙111a的孔徑，且該第一通氣部111具有一第一孔隙率，在本實施例中，該第一孔隙率在0.3至0.4之間。
接著，請參閱第2圖，以該積層製造方法形成一第二通氣部112，形成該第二通氣部112的材料可選自於鋁合金、不鏽鋼、模具鋼、鈦合金、鎳合金、 銅合金及鈷鉻合金等金屬材料，該第二通氣部112包含複數個第二孔隙112a，在本實施例中，該些第二孔隙112a的孔徑在100um至300um之間，由於該第二通氣部112是以該積層製造方法形成，因此可控制該些第二孔隙112a的導流方向及該些第二孔隙112a的孔徑，該第二通氣部112形成於該第一通氣部111的該第一表面111b，該第二通氣部112具有一第二孔隙率及一第二表面112b，且該些第一孔隙111a連通該些第二孔隙112a。
在本實施例中，該第一通氣部111的該第一孔隙率大於該第二通氣部112的該第二孔隙率，該第二孔隙率在0.15至0.25之間，且該些第一孔隙111a的孔徑與該些第二孔隙112a的孔徑實質上相同，其中該第一孔隙率可由Vv1/Vt1預先設定(Vv1為該些第一孔隙111a的體積、Vt1為該第一通氣部111的表觀體積)，該第二孔隙率可由Vv2/Vt2預先設定(Vv2為該些第二孔隙112a的體積、Vt2為該第二通氣部112的表觀體積)。
請參閱第2圖，相互連通的該些第一孔隙111a及該些第二孔隙112a構成複數個微流道結構，且該些微流道結構的導流方向在形成第一通氣部111及該第二通氣部112時預先設計，較佳地，該第一通氣部111及該第二通氣部112一體成型，且形成該第一通氣部111及該第二通氣部112的材料相同。
之後，請參閱第3圖，將該封孔層120覆蓋於該第二通氣部112的該第二表面112b，該封孔層120的材料可選自於環氧樹脂(Epoxy)和聚醯亞胺(Polyimide，PI)，在本實施例中，該封孔層120可經由真空壓模、整平及高溫烘烤等製程覆蓋於該第二通氣部112的該第二表面112b，該封孔層120密封位在該第二表面112b的該第二孔隙112a的開口，最後，請參閱第4圖，在該封孔層120形成複數個通孔121，該通孔121可以雷射鑽孔等方法形成，該些通孔121顯露出 部分的該些第二孔隙112a，相互連通的該些第一孔隙111a、該些第二孔隙112a及該通孔121構成輸送流體的微流道，在不同實施例中，該封孔層120可預先形成該些通孔121，再將具有該些通孔121的該封孔層120覆蓋於該第二通氣部112的該第二表面112b，或者，在不同實施例中，該封孔層120也可以該積層製造方法製造形成，並在形成該封孔層120時同時形成該些通孔121，本發明並不局限形成該封孔層120的形成方法、材料及該些通孔121的形成方法。
請參閱第5A至8圖，該第一通氣部111及該第二通氣部112的結構選自於第5A及5B圖所揭露的多邊網狀結構、第6A及6B圖所揭露的體心立方結構、第7A及7B圖所揭露的面心立方結構、第8圖所揭露的圓形立方結構、第9圖所揭露的矩形立方結構或其它幾何立方結構。
請參閱第1及4圖，在不同實施例中，藉由改變該些第一孔隙111a及該些第二孔隙112a的孔徑，在相同的體積及相同的孔隙數條件下，使該些第一孔隙111a的孔徑大於該些第二孔隙112a的孔徑，也可使該第一通氣部111的該第一孔隙率大於該第二通氣部112的該第二孔隙率，請參閱第1圖，在形成該第一通氣部111時，該些第一孔隙111a的孔徑限制在200um至300um之間，請參閱第2圖，在形成該第二通氣部112時，該些第二孔隙112a的孔徑限制在100um至200um之間，即可使該第一通氣部111的該第一孔隙率大於該第二通氣部112的該第二孔隙率。
請參閱第4圖，本發明的該多孔質本體110是以該積層製造方法製造形成，且該第一通氣部111的該第一孔隙率大於該第二通氣部112的該第二孔隙率，因此可達成節流的目的，此外，由於該多孔質本體110是以該積層製造方法製造形成，因此可控制該些第一孔隙111a及該些第二孔隙112a的導流方向，並且 可控制該些第一孔隙111a及該些第二孔隙112a的孔徑，當流體由該第一通氣部111進入並通過該第二通氣部112時，可使該多孔質氣靜壓載體100的出氣壓力或出液壓力均勻，當該多孔質氣靜壓載體100裝設於一載台(圖未繪出)時，可避免該載台在一軌道(圖未繪出)上移動時產生晃動，以提高該載台移動的穩定性。
請參閱第10圖，本發明的一第二實施例，第二實施例及第一實施例的差異在於該多孔質本體110另具有一第三通氣部113，該第三通氣部113包含複數個第三孔隙113a，該第三通氣部113位於該第一通氣部111及該第二通氣部112之間，該第三通氣部113的材料可選自於鋁合金、不鏽鋼、模具鋼、鈦合金、鎳合金、銅合金及鈷鉻合金等金屬材料，較佳地，形成該第一通氣部111、該第二通氣部112及該第三通氣部113的材料相同，且該第一通氣部111、該第二通氣部112及該第三通氣部113一體成型，該些第三孔隙113a連通分別位於該第三通氣部113二側的該些第一孔隙111a及該些第二孔隙112a，且該第三通氣部113的一第三孔隙率由該第一通氣部111朝該第二通氣部112方向逐漸縮小，在本實施例中，該些第一孔隙111a的孔徑、該些第二孔隙112a的孔徑及該些第三孔隙113a的孔徑實質上相同，且該第三孔隙率可由Vv3/Vt3預先設定(Vv3為該些第三孔隙113a的體積、Vt3為該第三通氣部113的表觀體積)。
請參閱第10圖，本發明的該多孔質本體110是以該積層製造方法製造形成，且該第一通氣部111的該第一孔隙率大於該第二通氣部112的該第二孔隙率，且該第三通氣部113的該第三孔隙率由該第一通氣部111朝該第二通氣部112方向逐漸縮小，因此可達成節流的目的，此外，由於該多孔質本體110是以該積層製造方法製造形成，因此可控制該些第一孔隙111a、該些第二孔隙112a及該些第三孔隙113a的導流方向，並且可控制該些第一孔隙111a、該些第二孔隙 112a及該些第三孔隙113a的孔徑，當流體由該第一通氣部111進入並依序通過該第三通氣部113及該第二通氣部112時，可使該多孔質氣靜壓載體100的出氣壓力或出液壓力均勻，當該多孔質氣靜壓載體100裝設於一載台(圖未繪出)時，可避免該載台在一軌道(圖未繪出)上移動時產生晃動，以提高該載台移動的穩定性。
請參閱第11圖，本發明的該多孔質本體110可被形成於一軸桿200，該軸桿200具有一桿體210、一流道220及複數個貫穿該桿體210的穿孔230，該桿體210環繞該流道220，該些穿孔230貫穿該桿體210且連通該流道220，該多孔質本體110形成於該桿體210，相同地，當流體由該流道220通過該些穿孔230並進入該多孔質本體110時，可使該多孔質氣靜壓載體100的出氣壓力或出液壓力均勻，以使該軸桿200轉動時具有較高的穩定性。
本發明之保護範圍當視後附之申請專利範圍所界定者為準，任何熟知此項技藝者，在不脫離本發明之精神和範圍內所作之任何變化與修改，均屬於本發明之保護範圍。
100‧‧‧多孔質氣靜壓載體
110‧‧‧多孔質本體
111‧‧‧第一通氣部
111a‧‧‧第一孔隙
112‧‧‧第二通氣部
112a‧‧‧第二孔隙
112b‧‧‧第二表面
120‧‧‧封孔層
121‧‧‧通孔

Claims (12)

  1. 一種多孔質氣靜壓載體，包含有：一多孔質本體，其是以一積層製造方法製造形成，該多孔質本體具有一第一通氣部及一第二通氣部，該第一通氣部包含複數個第一孔隙，該第二通氣部包含複數個第二孔隙，該些第一孔隙連通該些第二孔隙，該些第一孔隙及該些第二孔隙構成複數個微流道結構，其中該第一通氣部的一第一孔隙率大於該第二通氣部的一第二孔隙率；以及一封孔層，覆蓋於該第二通氣部，該封孔層具有複數個通孔，該通孔顯露出部分的該些第二孔隙。
  2. 如申請專利範圍第1項所述之多孔質氣靜壓載體，其中該第一通氣部及該第二通氣部一體成型。
  3. 如申請專利範圍第1項所述之多孔質氣靜壓載體，其中該多孔質本體另具有一第三通氣部，該第三通氣部包含複數個第三孔隙，該第三通氣部位於該第一通氣部及該第二通氣部之間，該些第三孔隙連通第一孔隙及該些第二孔隙，該第三通氣部的一第三孔隙率由該第一通氣部朝該第二通氣部方向逐漸縮小。
  4. 如申請專利範圍第3項所述之多孔質氣靜壓載體，其中該第一通氣部、該第二通氣部及該第三通氣部一體成型。
  5. 如申請專利範圍第1項所述之多孔質氣靜壓載體，其中該些第一孔隙的孔徑與該些第二孔隙的孔徑實質上相同。
  6. 如申請專利範圍第3項所述之多孔質氣靜壓載體，其中該些第一孔隙的孔徑、該些第二孔隙的孔徑及該些第三孔隙的孔徑實質上相同。
  7. 如申請專利範圍第5或6項所述之多孔質氣靜壓載體，其中該些第一孔隙的孔徑在100um至300um之間。
  8. 如申請專利範圍第1項所述之多孔質氣靜壓載體，其中該第一孔隙率在0.3至0.4之間。
  9. 如申請專利範圍第1或8項所述之多孔質氣靜壓載體，其中該第二孔隙率在0.15至0.25之間。
  10. 如申請專利範圍第1項所述之多孔質氣靜壓載體，其中該些第一孔隙的孔徑大於該些第二孔隙的孔徑。
  11. 如申請專利範圍第1項所述之多孔質氣靜壓載體，其中該些第一孔隙的孔徑200um至300um之間。
  12. 如申請專利範圍第11項所述之多孔質氣靜壓載體，其中該些第二孔隙的孔徑在100um至200um之間。
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