TWI596242B - Measurement method of gap between liquid level of raw material melt and lower end of seed, preheating method of seed and manufacturing method of single crystal - Google Patents

Measurement method of gap between liquid level of raw material melt and lower end of seed, preheating method of seed and manufacturing method of single crystal Download PDF

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TWI596242B
TWI596242B TW105105600A TW105105600A TWI596242B TW I596242 B TWI596242 B TW I596242B TW 105105600 A TW105105600 A TW 105105600A TW 105105600 A TW105105600 A TW 105105600A TW I596242 B TWI596242 B TW I596242B
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crystal
raw material
material melt
seed crystal
point
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TW201702438A (en
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清水泰順
高梨啟一
中野清貴
斉藤正夫
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Sumco股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/20Controlling or regulating
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon

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  • Engineering & Computer Science (AREA)
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  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Description

原料融液液面與種結晶下端之間隔測定方法、種結晶之預熱方 法以及單結晶之製造方法 Method for determining the interval between the liquid level of the raw material melt and the lower end of the seed crystal, and the preheating method of the seed crystal Method and method for manufacturing single crystal

本發明是關於測定用於培育單結晶的原料融液的液面與種結晶的下端之間隔的方法、種結晶之預熱方法以及單結晶之製造方法。 The present invention relates to a method for measuring a gap between a liquid surface of a raw material melt for culturing a single crystal and a lower end of a seed crystal, a preheating method for seed crystals, and a method for producing a single crystal.

作為矽單結晶的製造方法,有丘克拉斯基(Czochralski)法(以下稱為「CZ法」)。在CZ法,對於收容於坩堝且成為原料的矽融液,在上方配置矽單結晶構成的種結晶(seed),使種結晶與矽融液接近,種結晶接觸矽融液之後,向上方拉起種結晶,使矽單結晶在種結晶之下成長。在種結晶將要接觸矽融液之時,若種結晶下端與矽融液液面的溫差大,在種結晶會因為熱應力而產生高密度的差排。 As a manufacturing method of a single crystal, there is a Czochralski method (hereinafter referred to as "CZ method"). In the CZ method, a seed crystal composed of a single crystal is placed on the crucible to be contained in the crucible, and the seed crystal is brought close to the crucible, and the crystal is contacted with the crucible and then pulled upward. Crystallization is carried out to grow monocrystalline crystals under seed crystals. When the seed crystal is to be in contact with the mash, if the temperature difference between the lower end of the seed crystal and the liquid surface of the mash is large, the crystallization of the seed crystal will result in a high density difference due to thermal stress.

差排可藉由達斯縮頸(dash neck)法減低。然而,頻度雖低但有一定的頻度,差排會殘留於結晶中心部(以下將此殘留差排稱為「軸狀差排」)。為了減低此軸狀差排的發生頻度,有必要降低進行達斯縮頸之前的結晶的差排密度,為此, 降低在種結晶已接觸矽融液時產生的差排的密度是有效的。 The difference can be reduced by the Dash neck method. However, although the frequency is low but has a certain frequency, the difference is left in the center of the crystal (hereinafter, the residual difference is referred to as "axial difference"). In order to reduce the occurrence frequency of the axial difference row, it is necessary to reduce the difference in the density of crystallization before the Dars necking. It is effective to reduce the density of the difference rows which are produced when the crystals have been in contact with the mash.

因此,以先使正要接觸矽融液前的種結晶下端的溫度,成為儘量接近矽融液液面的溫度為佳。將種結晶配置於矽融液的上方時,種結晶會被來自矽融液的輻射熱加熱。因此,種結晶的溫度,是隨著種結晶愈接近矽融液而變得愈高。因此,為了縮小種結晶下端與矽融液液面的溫度差,將種結晶配置在對矽融液液面儘量靠近的位置並予以預熱是有效的。 Therefore, it is preferable to first bring the temperature of the lower end of the seed crystal before the mash to be brought close to the temperature of the liquid surface of the mash. When the seed crystal is placed above the mash, the seed crystal is heated by the radiant heat from the mash. Therefore, the temperature of the seed crystal is higher as the seed crystal is closer to the melt. Therefore, in order to reduce the temperature difference between the lower end of the seed crystal and the liquid surface of the mash, it is effective to arrange the seed crystal at a position close to the liquid surface of the mash and to preheat it.

【先行技術文獻】 [First technical literature] 【專利文獻】 [Patent Literature]

【專利文獻1】特開2005-170773號公報 [Patent Document 1] JP-A-2005-170773

然而,先前對於矽融液液面與種結晶下端之間隔(以下,稱為「結晶下間隔」),無法正確地先測定好,在即將預熱種結晶時,作業員是藉由目視調整相對於矽融液液面的種結晶的高度,使結晶下間隔成為目標的間隔。因此,在預熱種結晶時,結晶下間隔在實際上並未正確地成為目標的間隔。而且,與結晶下間隔的目標的間隔的偏差,是逐次不同。伴隨於此,在預熱終了後的時間點的種結晶的溫度亦是逐次不同。其結果,在使種結晶接觸原料融液液面之時,會有種結晶下端的溫度與原料融液液面的溫度的差變大的情況,此時即使藉由達斯縮頸法減低差排,在結晶仍會殘留軸狀差排。 However, the interval between the liquid surface of the mash and the lower end of the seed crystal (hereinafter referred to as the "interval of crystallization") cannot be correctly measured first. When the crystal is to be preheated, the operator adjusts the relative by visual adjustment. The height of the seed crystal at the surface of the liquid of the sputum is such that the interval under the crystallization becomes the target interval. Therefore, at the time of preheating the crystallization, the interval under crystallization does not actually become the target interval. Moreover, the deviation from the interval of the target spaced apart under the crystal is successively different. Along with this, the temperature of the seed crystal at the time point after the end of the preheating is also different. As a result, when the seed crystal is brought into contact with the liquid surface of the raw material melt, the difference between the temperature of the lower end of the seed crystal and the temperature of the liquid surface of the raw material melt becomes large, and even if the difference is reduced by the Darth necking method, In the row, the shaft-like difference row remains in the crystallization.

另外,若因為未正確地測定結晶下間隔而縮小目標的間隔,例如設定為3mm以下,會有種結晶在意料之外而 接觸原料融液的情況。此時,種結晶未充分被預熱,種結晶是在原料融液液面與種結晶下端的溫差大的狀態接觸原料融液,因此在種結晶產生高密度差排,在結晶仍會殘留軸狀差排的可能性變高。 In addition, if the interval between the targets is not accurately measured and the interval between the targets is not accurately measured, for example, it is set to 3 mm or less, and the crystals are unexpected. Contact with raw material melt. At this time, the seed crystal is not sufficiently preheated, and the seed crystal is in contact with the raw material melt in a state where the temperature difference between the raw material melt liquid surface and the seed crystal lower end is large, so that a high density difference is generated in the seed crystal, and the axis remains in the crystal. The possibility of a difference is higher.

因此,為了抑制起因於原料融液液面與種結晶下端的溫差的差排在種結晶生成的情況,有必要正確地測定結晶下間隔。 Therefore, in order to suppress the difference in the temperature difference between the liquid level of the raw material melt and the lower end of the seed crystal, it is necessary to accurately measure the interval under the crystal.

在專利文獻1,揭露一種裝置,在藉由CZ法製造單結晶中,在培育單結晶前調整原料融液液面的上下方向的起始位置。在此裝置,具有檢測設備來檢測從基準位置到原料融液液面的距離。然而,以此檢測設備,是藉由種結晶接觸原料融液而檢測從基準位置到原料融液液面的距離。因此,在單結晶接觸原料融液之前,無法知道單結晶與原料融液的間隔。 Patent Document 1 discloses an apparatus for adjusting a starting position in the vertical direction of a liquid level of a raw material melt before culturing a single crystal in a single crystal produced by a CZ method. In this device, there is a detection device for detecting the distance from the reference position to the liquid level of the raw material melt. However, with this detecting device, the distance from the reference position to the liquid level of the raw material melt is detected by contacting the raw material melt with the crystal. Therefore, the interval between the single crystal and the raw material melt cannot be known until the single crystal is contacted with the raw material melt.

本發明是有鑑於這樣的狀況而完成者,其目的在於提供一種方法,其在單結晶接觸原料融液液面之前,可以正確地測定原料融液液面與種結晶下端之間隔。 The present invention has been made in view of such circumstances, and an object thereof is to provide a method for accurately measuring the interval between a raw material melt liquid surface and a seed crystal lower end before a single crystal is brought into contact with a raw material melt liquid surface.

本發明的其他目的是提供一種預熱方法,其可以提高預熱後的種結晶的溫度的再現性。 Another object of the present invention is to provide a preheating method which can improve the reproducibility of the temperature of the seed crystal after preheating.

本發明的另一其他目的是提供一種單結晶的製造方法,其可以抑制差排的導入。 Still another object of the present invention is to provide a method for producing a single crystal which can suppress introduction of a difference row.

本發明是以下列(1)的測定原料融液液面與種結晶下端之間隔的方法、下列(2)的種結晶之預熱方法及下列(3)的單結晶之製造方法為要旨。 The present invention is based on the following method (1) of measuring the distance between the raw material melt liquid surface and the seed crystal lower end, the following (2) seed crystal preheating method, and the following (3) single crystal production method.

(1)一種間隔測定方法,其是使種結晶的下端接觸坩堝內的原料融液而在上述種結晶的下端培育單結晶之前,測定上述原料融液的液面與配置於上述原料融液的上方之種結晶的下端之間隔的方法,其中:藉由光學性手法,獲得實像下端點的位置資訊與鏡像點的位置資訊,上述實像下端點是在上述單結晶的下端之特定的點,上述鏡像點是在映於上述液面的上述種結晶的鏡像之對應於上述實像下端點之點;以上述實像下端點的位置與上述鏡像點的位置為一致的點設為上述原料融液的液面與上述種結晶的下端的間隔為0,求出上述原料融液的液面與上述種結晶的下端的間隔。 (1) A method for measuring the interval, wherein the lower end of the seed crystal is brought into contact with the raw material melt in the crucible, and the liquid surface of the raw material melt is measured and disposed in the raw material melt before the single crystal is grown at the lower end of the seed crystal. a method for spacing the lower ends of the crystals above, wherein: by optical means, the position information of the end points of the real image and the position information of the mirror points are obtained, and the lower end point of the real image is a specific point at the lower end of the single crystal, The mirror point is a point corresponding to the lower end point of the real image on the mirror image of the crystal of the liquid level reflected on the liquid surface; and the point at which the position of the end point of the real image coincides with the position of the mirror point is the liquid of the raw material melt The distance between the surface and the lower end of the above-mentioned crystal was 0, and the distance between the liquid surface of the raw material melt and the lower end of the seed crystal was determined.

(2)一種種結晶之預熱方法,其是在用於培育單結晶的原料融液的液面的上方配置種結晶,預熱上述種結晶的方法,包含:藉由如上述(1)之間隔測定方法,測定上述原料融液的液面與上述種結晶的下端的間隔的步驟;為了消除以上述測定間隔的步驟測定後的上述間隔與設為目標的間隔之差,使上述種結晶及上述坩堝的至少一個移動的步驟;以及在上述移動的步驟之後,預熱上述種結晶的步驟。 (2) A method of preheating a seed crystal, wherein a seed crystal is disposed above a liquid surface of a raw material melt for cultivating a single crystal, and a method of preheating the seed crystal comprises: by (1) The method for measuring the interval, the step of measuring the distance between the liquid surface of the raw material melt and the lower end of the seed crystal; and eliminating the difference between the interval after the measurement at the measurement interval and the target interval, and a step of moving at least one of the above enthalpy; and a step of preheating said crystallization after said step of moving.

(3)一種單結晶之製造方法,其特徵在於包含:藉由上述(2)所載之種結晶之預熱方法,預熱種結晶的步驟;在上述預熱步驟之後,使上述種結晶及上述坩堝的至少一個移動,使上述種結晶接觸收容於上述坩堝內的上述原料融液 的步驟;以及上述接觸步驟之後,使上述種結晶及上述坩堝的至少一個移動,使單結晶在上述種結晶的下端成長的步驟。 (3) A method for producing a single crystal, comprising: a step of preheating seed crystals by a preheating method of the seed crystal of the above (2); and after the preheating step, the crystal of the above species is At least one movement of the above-mentioned crucible causes the above-mentioned crystal to contact the raw material melt contained in the crucible And a step of moving at least one of the above-mentioned crystals and the above-mentioned ruthenium to grow a single crystal at a lower end of the seed crystal after the contacting step.

藉由本發明的間隔測定方法,在種結晶接觸原料融液液面之前,可以正確地測定原料融液液面與種結晶下端之間隔。另外,藉由本發明的預熱方法,可以提高預熱後的種結晶的溫度的再現性。 According to the interval measuring method of the present invention, the interval between the liquid level of the raw material melt and the lower end of the seed crystal can be accurately measured before the seed crystal contacts the liquid surface of the raw material melt. Further, by the preheating method of the present invention, the reproducibility of the temperature of the seed crystal after preheating can be improved.

1‧‧‧原料融液 1‧‧‧ raw material melt

1a‧‧‧原料融液的液面 1a‧‧‧Liquid of raw material melt

2‧‧‧種結晶 2‧‧ ‧ kinds of crystal

2L‧‧‧種結晶的下端 2L‧‧‧ the lower end of the crystal

2M、2M’‧‧‧種結晶的鏡像 Mirror image of 2M, 2M’‧‧ ‧ crystals

2R、2R’‧‧‧種結晶的實像 Real image of 2R, 2R'‧‧ ‧ crystals

2U‧‧‧鏡像的上端 2U‧‧‧ upper end of the mirror

3‧‧‧影像 3‧‧‧Image

4‧‧‧坩堝 4‧‧‧坩埚

5‧‧‧驅動裝置 5‧‧‧ drive

6‧‧‧拉引軸 6‧‧‧ Pulling shaft

7‧‧‧相機 7‧‧‧ camera

L‧‧‧間隔 L‧‧‧ interval

P1‧‧‧實像下端點 P1‧‧‧ real image lower end

P2‧‧‧鏡像點 P2‧‧‧ mirror point

△LP‧‧‧影像的實像下端點與鏡像點的距離 △L P ‧‧‧The distance between the endpoint and the mirror point of the real image of the image

【第1A圖】第1A圖是概要地顯示實施本發明的間隔測定方法時的原料融液及種結晶的配置之圖,顯示種結晶離開融液液面的狀態。 [Fig. 1A] Fig. 1A is a view schematically showing the arrangement of the raw material melt and the seed crystal when the interval measurement method of the present invention is carried out, and shows a state in which the seed crystal leaves the molten liquid level.

【第1B圖】第1B圖是概要地顯示種結晶下端接觸融液液面後的狀態之圖。 [Fig. 1B] Fig. 1B is a view schematically showing a state in which the lower end of the seed crystal contacts the molten liquid level.

【第2圖】第2圖是概要地顯示從斜上方拍攝示於第1A圖的原料融液與種結晶的影像之圖。 [Fig. 2] Fig. 2 is a view schematically showing an image of a raw material melt and seed crystals shown in Fig. 1A obliquely from above.

【用以實施發明的形態】 [Formation for implementing the invention]

以下,針對本發明的實施的形態,參照圖式作詳細說明。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

第1A圖是概要地顯示實施本發明的間隔測定方法時的原料融液及種結晶的配置之圖,顯示種結晶下端離開融液液面的狀態。第1B圖是概要地顯示種結晶下端接觸原料融液液面後 的狀態之圖。第2圖是概要地顯示從斜上方拍攝示於第1A圖的原料融液與種結晶的影像之圖。 Fig. 1A is a view schematically showing the arrangement of the raw material melt and the seed crystal when the interval measurement method of the present invention is carried out, and shows a state in which the lower end of the seed crystal leaves the molten liquid surface. Figure 1B is a schematic view showing the lower end of the seed crystal after contact with the melt level of the raw material State of the map. Fig. 2 is a view schematically showing an image of a raw material melt and seed crystals shown in Fig. 1A obliquely from above.

原料融液1是收容於在拉引裝置具有的坩堝4。在原料融液1的上方,配置有種結晶2。例如,在培育矽單結晶的情況,原料融液1是由矽的融液構成,種結晶2是由矽的單結晶構成。 The raw material melt 1 is housed in a crucible 4 provided in the drawing device. A kind of crystal 2 is disposed above the raw material melt 1 . For example, in the case of cultivating a single crystal, the raw material melt 1 is composed of a molten liquid of cerium, and the seed crystal 2 is composed of a single crystal of cerium.

在拉引裝置,具有相機7。相機7,例如可由CCD相機而成。藉由相機7,拍攝種結晶2的實像2R與映於原料融液1的液面1a之種結晶2的鏡像2M所含的範圍(請參考第2圖)。通過此攝影,可以獲得種結晶2的實像2R的位置資訊與映於原料融液1的液面1a之種結晶2的鏡像2M的位置資訊。 In the pulling device, there is a camera 7. The camera 7 can be formed, for example, by a CCD camera. By the camera 7, the range of the real image 2R of the seed crystal 2 and the mirror image 2M of the seed crystal 2 which is reflected on the liquid surface 1a of the raw material melt 1 is taken (refer to Fig. 2). By this photographing, the positional information of the real image 2R of the seed crystal 2 and the positional information of the mirror image 2M of the seed crystal 2 which is reflected on the liquid surface 1a of the raw material melt 1 can be obtained.

種結晶2是連結於引線(wire)等的拉引軸6。在拉引軸6,連接著拉引裝置所具有的驅動裝置5。藉由驅動裝置5,經由拉引軸6可使種結晶2在上下方向移動,因此可以使種結晶2相對於坩堝4作接近及離開。另外,藉由驅動裝置5的驅動量,可以檢測相對於拉引裝置的基準位置之種結晶2的高度位置。 The crystal 2 is a drawing shaft 6 that is connected to a wire or the like. The drive shaft 5 of the pulling device is connected to the pull shaft 6. The seed crystal 2 can be moved in the vertical direction via the drawing shaft 6 by the driving device 5, so that the seed crystal 2 can be approached and separated from the crucible 4. Further, by the driving amount of the driving device 5, the height position of the seed crystal 2 with respect to the reference position of the pulling device can be detected.

在本實施形態,相對於拉引裝置的基準位置,坩堝4是設為在上下方向未實質上移動。因此,藉由驅動裝置5檢測之種結晶2的高度位置,是對應於以坩堝4的高度位置為基準之種結晶2的高度位置。在此,「以坩堝4的高度位置為基準之種結晶2的高度位置」(以下,簡稱為「種結晶2的高度位置」)指的是,亦可不一定為關於上下方向的坩堝4與種結晶2的間隔,而亦可是與此間隔有一定的差者。 In the present embodiment, the crucible 4 is not substantially moved in the vertical direction with respect to the reference position of the pulling device. Therefore, the height position of the seed crystal 2 detected by the driving device 5 corresponds to the height position of the seed crystal 2 based on the height position of the crucible 4. Here, "the height position of the seed crystal 2 based on the height position of the crucible 4" (hereinafter, simply referred to as "the height position of the seed crystal 2") means that the crucible 4 and the species in the vertical direction are not necessarily required. The interval of the crystallization 2 may be a certain difference from the interval.

在本實施形態,種結晶2的下端2L是種結晶2的 下表面的全體。在以下的說明,在影像3上,將位於實像2R的下端2L的特定的點,稱為「實像下端點」P1,在鏡像2M的上端2U(下端2L的鏡像),將對應於實像下端點P1的點,稱為「鏡像點」P2。實像下端點P1可在影像3的下端2L上任意選擇。 In the present embodiment, the lower end 2L of the seed crystal 2 is a kind of crystal 2 The whole of the lower surface. In the following description, in the video 3, a specific point located at the lower end 2L of the real image 2R is referred to as a "real image lower end point" P1, and at the upper end 2U of the mirror image 2M (a mirror image of the lower end 2L), it corresponds to the real image lower end point. The point of P1 is called "mirror point" P2. The real image lower end point P1 can be arbitrarily selected at the lower end 2L of the image 3.

在測定原料融液1的液面1a與種結晶2的下端2L的間隔L時,首先藉由驅動裝置5,一邊使種結晶2在上下方向移動,一邊藉由相機7針對種結晶2的複數個高度位置分別取得含實像2R與鏡像2M的影像3。 When the distance L between the liquid surface 1a of the raw material melt 1 and the lower end 2L of the seed crystal 2 is measured, first, the seed crystal 2 is moved in the vertical direction by the driving device 5, and the plurality of crystals 2 are used by the camera 7 The image 3 including the real image 2R and the mirror image 2M is obtained at each height position.

然後,針對得到的各個影像3,求出實像下端點P1的影像3上的位置與鏡像點P2的影像3上的位置。如此,藉由光學性手法,求出實像下端點P1的位置資訊與鏡像點P2的位置資訊。 Then, for each of the obtained images 3, the position on the image 3 of the end point P1 of the real image and the position on the image 3 of the mirror point P2 are obtained. In this way, the position information of the end point P1 and the position information of the mirror point P2 in the real image are obtained by the optical method.

在影像3上,實像下端點P1的位置及鏡像點P2的位置,是以僅僅測定對應於拉引裝置的上下(鉛直)方向的位置者而成,影像3為數位形式的影像的情況,是以畫素單位劃定。如第1A圖所示,種結晶2的實像2R與種結晶2的鏡像2M,是相對於原料融液1的液面1a位於實質上對稱的位置;同樣地,種結晶2的移動後的實像2R’與鏡像2M’,是相對於液面1a位於實質上對稱的位置。 In the video 3, the position of the end point P1 and the position of the mirror point P2 in the real image are obtained by measuring only the position corresponding to the vertical (vertical) direction of the pulling device, and the image 3 is a digital image. Delimited by the pixel unit. As shown in Fig. 1A, the real image 2R of the seed crystal 2 and the mirror image 2M of the seed crystal 2 are located at substantially symmetrical positions with respect to the liquid surface 1a of the raw material melt 1; similarly, the moving image of the seed crystal 2 after moving 2R' and mirror 2M' are located at substantially symmetrical positions with respect to the liquid surface 1a.

然後,基於所得到的資訊,求出種結晶2的高度位置Z與影像3上的實像下端點P1的位置ZP1的回歸式(以下,稱為「實像回歸式」)及種結晶2的高度位置Z與影像3上的鏡像點P2的位置ZP2的回歸式(以下,稱為「鏡像回歸式」)。具體而言,藉由一次回歸,實像回歸式可表為ZP1=a1×Z+b1、鏡 像回歸式可表為ZP2=a2×Z+b2(a1、b1、a2及b2為常數)。 Then, based on the obtained information, the regression equation of the height position Z of the seed crystal 2 and the position ZP1 of the end point P1 of the real image on the image 3 (hereinafter referred to as "real image regression type") and the height position of the seed crystal 2 are obtained. The regression equation of Z and the position ZP2 of the mirror point P2 on the image 3 (hereinafter referred to as "mirror regression equation"). Specifically, by one regression, the real image regression equation can be expressed as ZP1 = a 1 × Z + b 1 , and the mirror regression equation can be expressed as ZP2 = a 2 × Z + b 2 (a 1 , b 1 , a 2 and b 2 is a constant).

在鏡像2M,因為會因液面1a的波動而發生搖晃,影像3的鏡像點P2的位置,會受到此搖晃的影響。增加在不同高度位置或相同高度位置的種結晶2的攝影次數,針對所得到的各個影像3測定位於影像3的鏡像點P2的位置,藉由增加測定數量,可以減低鏡像回歸式所受到的搖晃的影響。因此此一測定數量,是以數十點例如40點以上為佳。 In the mirror 2M, since the shaking occurs due to the fluctuation of the liquid surface 1a, the position of the mirror point P2 of the image 3 is affected by this shaking. Increasing the number of times of photographing of the seed crystal 2 at different height positions or the same height position, and measuring the position of the mirror point P2 of the image 3 for each of the obtained images 3, by increasing the number of measurements, the shaking of the mirror return type can be reduced. Impact. Therefore, the number of such measurements is preferably tens of points, for example, 40 points or more.

接下來,以△LP=(Preal-Pmirror)求出在種結晶2在任意的高度位置Z時,影像3的實像下端點P1與鏡像點P2的距離△LPNext, the distance ΔL P between the end point P1 of the real image of the image 3 and the mirror point P2 when the seed crystal 2 is at an arbitrary height position Z is obtained by ΔL P = (P real - P mirror ).

Preal:將高度位置Z代入實像回歸式時的實像下端點P1之影像3上的位置。亦即,Preal=ZP1=a1×Z+b1P real : Substituting the height position Z into the position on the image 3 of the end point P1 under the real image in the real image regression type. That is, P real = ZP1 = a 1 × Z + b 1 .

Pmirror:將高度位置Z代入鏡像回歸式時的鏡像點P2之影像3上的位置。亦即,Pmirror=ZP2=a2×Z+b2P mirror : Substituting the height position Z into the position on the image 3 of the mirror point P2 at the time of the mirror regression. That is, P mirror = ZP2 = a 2 × Z + b 2 .

因此,△LP=(a1-a2Z+(b1-b2) (A) Therefore, ΔL P = (a 1 - a 2 ) × Z + (b 1 - b 2 ) (A)

可以表記如上。距離△LP可說是基於藉由光學性手法得到的位置資訊、且以鏡像2M的位置為基準的實像2R的相對位置。 Can be expressed as above. The distance ΔL P can be said to be the relative position of the real image 2R based on the position information obtained by the optical method and based on the position of the mirror image 2M.

種結晶2的高度位置Z的位移量△Z若對應於影像3上的距離△LP,則藉由上式(A),為△LP=(a1-a2)×△ZThe displacement amount Δ Z of the height position Z of the crystal 2 corresponds to the distance ΔL P on the image 3, and is ΔL P = (a 1 - a 2 ) × Δ Z by the above formula (A).

因此,為△Z=△LP/(a1-a2)。 Therefore, △ Z = △ L P / ( a 1 -a 2).

亦即,實像下端點P1與鏡像點P2的距離為△LP 時,若將種結晶2的高度位置降低△Z的程度,實像下端點P1與鏡像點P2的距離就會變小△LP的量(△LP=0),種結晶2的下端2L就變成接觸原料融液1的液面1a。因此,可說是:在移動種結晶2之前,原料融液1的液面1a與種結晶2的下端2L之間隔L為△LP/(a1-a2)。這是基於實像回歸式及鏡像回歸式,以實像下端點P1的位置與鏡像點P2的位置為一致的點、即種結晶2在滿足ZP1=ZP2的高度位置Z時,設為原料融液1的液面1a與種結晶2的下端2L的間隔為0(請參考第1B圖),求出間隔L。 That is, when the distance between the end point P1 and the mirror point P2 of the real image is ΔL P , if the height position of the seed crystal 2 is lowered by Δ Z , the distance between the end point P1 and the mirror point P2 of the real image becomes smaller ΔL P The amount (ΔL P =0), the lower end 2L of the seed crystal 2 becomes the liquid surface 1a which contacts the raw material melt 1. Therefore, it can be said that the distance L between the liquid surface 1a of the raw material melt 1 and the lower end 2L of the seed crystal 2 is ΔL P /(a 1 - a 2 ) before moving the seed crystal 2 . This is based on the real image regression method and the mirror regression equation. The position of the end point P1 of the real image coincides with the position of the mirror point P2, that is, when the seed crystal 2 satisfies the height position Z of ZP1 = ZP2 , it is set as the raw material melt 1 The interval between the liquid surface 1a and the lower end 2L of the seed crystal 2 is 0 (refer to FIG. 1B), and the interval L is obtained.

另外,由於實像的移動與鏡像的移動通常具有對稱性,可設為a1=-a2。因此,亦可以不使用容易受液面的波動的影響的鏡像回歸式,將間隔L設為△LP/(2a1)。 In addition, since the movement of the real image and the movement of the mirror image are generally symmetrical, a 1 = - a 2 can be set. Therefore, it is also possible to set the interval L to ΔL P /(2a 1 ) without using a mirror regression equation which is susceptible to fluctuations in the liquid surface.

根據以上的方法,可以排除作業員的主觀,而在種結晶2的下端2L接觸原料融液1的液面1a之前,正確地測定原料融液1的液面1a與種結晶2的下端2L之間隔L。 According to the above method, the subjectivity of the worker can be excluded, and the liquid surface 1a of the raw material melt 1 and the lower end 2L of the seed crystal 2 can be accurately measured before the lower end 2L of the seed crystal 2 contacts the liquid surface 1a of the raw material melt 1. Interval L.

在即將預熱種結晶2之時,首先藉由上述的方法,測定原料融液1的液面1a與種結晶2的下端2L之間隔L。然後,藉由驅動裝置5,針對原料融液1的液面1a與種結晶2的下端2L之間隔,以相當於已測定的間隔L與目標的間隔之差值的量的程度,使種結晶2在消除此差值的方向移動。藉此,原料融液1的液面1a與種結晶2的下端2L之間隔,實質上成為目標的間隔。 At the time of preheating the seed crystal 2, the interval L between the liquid surface 1a of the raw material melt 1 and the lower end 2L of the seed crystal 2 is first determined by the above method. Then, by the driving device 5, the interval between the liquid surface 1a of the raw material melt 1 and the lower end 2L of the seed crystal 2 is such that the difference between the measured interval L and the target interval is 2 Move in the direction to eliminate this difference. Thereby, the interval between the liquid surface 1a of the raw material melt 1 and the lower end 2L of the seed crystal 2 is substantially the target interval.

然後,保持此狀態例如數分鐘。藉此,種結晶2接受來自原料融液1的輻射熱而被預熱。藉由每次可將種結晶 2置於離原料融液1的液面1a既定間隔而預熱,可以提高預熱後的種結晶2的溫度的再現性。另外,如果將目標的間隔設定得夠小,可以充分縮小種結晶2的下端2L的溫度與原料融液1的液面1a的溫度之差,可以縮小下端2L接觸液面1a時的熱衝擊。藉此,可以抑制差排導入種結晶2。 Then, keep this state for example, for a few minutes. Thereby, the seed crystal 2 is preheated by receiving the radiant heat from the raw material melt 1. By crystallization each time 2 The preheating is carried out at a predetermined interval from the liquid surface 1a of the raw material melt 1, and the reproducibility of the temperature of the seed crystal 2 after the preheating can be improved. Further, if the interval between the targets is set small enough, the difference between the temperature of the lower end 2L of the seed crystal 2 and the temperature of the liquid surface 1a of the raw material melt 1 can be sufficiently narrowed, and the thermal shock when the lower end 2L contacts the liquid surface 1a can be reduced. Thereby, it is possible to suppress the introduction of the seed crystal 2 into the difference.

另外,藉由可以正確地測定液面1a與下端2L的間隔,可以迴避意料之外的種結晶2接觸原料融液1的情事。例如,在即將預熱種結晶2之時,在藉由作業員的目視調整原料融液1的液面1a與種結晶2的下端2L之間隔L的習知的方法,作為目標的這個間隔小之時,例如設定為3mm以下時,曾有種結晶2在意料以外接觸原料融液1的情況。然而,藉由本發明,即使將這個間隔設定為3mm以下時,可以在不使種結晶2接觸原料融液1之下作預熱。 Further, by accurately measuring the interval between the liquid surface 1a and the lower end 2L, it is possible to avoid the unexpected contact of the seed crystal 2 with the raw material melt 1 . For example, when the seed crystal 2 is preheated, a conventional method of adjusting the distance L between the liquid surface 1a of the raw material melt 1 and the lower end 2L of the seed crystal 2 by visual observation by the operator is small as a target. In the case of 3 mm or less, for example, there is a case where the crystal 2 is in contact with the raw material melt 1 except for the unexpected one. However, according to the present invention, even when this interval is set to 3 mm or less, preheating can be performed without bringing the seed crystal 2 into contact with the raw material melt 1.

不過,由於原料融液1的液面1a會有發生波動的情況,液面1a與下端2L之目標的間隔,有必要考慮此波動作設定而使種結晶2不接觸原料融液1。目標的間隔,是以設為1mm以上為佳。 However, since the liquid level 1a of the raw material melt 1 fluctuates, and the distance between the liquid level 1a and the lower end 2L is determined, it is necessary to make the seed crystal 2 not in contact with the raw material melt 1 in consideration of the wave operation setting. The interval of the target is preferably set to 1 mm or more.

藉由以上的方法預熱種結晶2後,使種結晶2下降,使種結晶2接觸收容於坩堝4內的原料融液1,此後,使種結晶2上升,使單結晶成長於種結晶的下端,藉此可以製造單結晶。 After the seed crystal 2 is preheated by the above method, the seed crystal 2 is lowered, and the seed crystal 2 is brought into contact with the raw material melt 1 contained in the crucible 4, and thereafter, the seed crystal 2 is raised to grow the single crystal to the seed crystal. The lower end, whereby a single crystal can be produced.

在以上的實施形態,相對於拉引裝置的基準位置,坩堝4並未在上下方向移動,但亦可構成為坩堝4可藉由驅動裝置在上下移動。此時,藉由此驅動裝置的驅動量,可以 檢測坩堝4相對於拉引裝置的基準位置的高度位置;以坩堝4的高度位置為基準的種結晶2的高度位置,例如可以是以藉由驅動裝置的驅動量而檢測的坩堝4的高度位置與藉由驅動裝置5的驅動量而檢測的種結晶2的高度位置之差而成。 In the above embodiment, the crucible 4 is not moved in the vertical direction with respect to the reference position of the pulling device, but the crucible 4 may be configured to be moved up and down by the driving device. At this time, by the driving amount of the driving device, The height position of the crucible 4 relative to the reference position of the drawing device is detected; the height position of the seed crystal 2 based on the height position of the crucible 4 may be, for example, the height position of the crucible 4 detected by the driving amount of the driving device. The difference between the height positions of the seed crystals 2 detected by the driving amount of the driving device 5 is obtained.

另外,亦可構成為種結晶2相對於拉引裝置的基準位置,不在上下方向移動。此時,以坩堝4的高度位置為基準的種結晶2的高度位置,可以是以例如藉由驅動裝置檢測的坩堝4的高度位置而成。 Further, it may be configured such that the seed crystal 2 is moved relative to the reference position of the drawing device and does not move in the vertical direction. At this time, the height position of the seed crystal 2 based on the height position of the crucible 4 may be, for example, the height position of the crucible 4 detected by the driving device.

在坩堝4可在上下方向移動的情況預熱種結晶2之時,為了消除已測定的間隔L與目標的間隔之差,在使種結晶2在上下方向移動之外,或是亦可使坩堝4在上下方向移動,取代使種結晶2在上下方向移動的情況。 When the seed crystal 2 is preheated in the case where the crucible 4 is movable in the vertical direction, in order to eliminate the difference between the measured interval L and the target interval, the seed crystal 2 may be moved in the vertical direction, or may be made. 4 moves in the up and down direction instead of moving the seed crystal 2 in the vertical direction.

另外,在坩堝4可在上下方向移動的情況製造單結晶之時,在使種結晶2在上下方向移動之外,或是亦可使坩堝4在上下方向移動,取代使種結晶2在上下方向移動的情況,藉此使種結晶2接觸原料融液1,在種結晶2之下成長單結晶。 Further, when the single crystal is produced in the case where the crucible 4 can be moved in the vertical direction, the seed crystal 2 may be moved in the vertical direction, or the crucible 4 may be moved in the vertical direction instead of the seed crystal 2 in the up and down direction. In the case of moving, the seed crystal 2 is brought into contact with the raw material melt 1 to grow a single crystal under the seed crystal 2.

在本發明作為對象的原料融液1及種結晶2,並不限於由矽構成者,亦可以由其他的材料例如鍺、Al2O3(藍寶石)或是化合物半導體材料構成者,只要是會將種結晶2的鏡像2M映於原料融液1的液面1a者即可。 The raw material melt 1 and the seed crystal 2 to be used in the present invention are not limited to those composed of ruthenium, and may be composed of other materials such as ruthenium, Al 2 O 3 (sapphire) or a compound semiconductor material, as long as they are The mirror image 2M of the seed crystal 2 may be reflected on the liquid surface 1a of the raw material melt 1.

1‧‧‧原料融液 1‧‧‧ raw material melt

1a‧‧‧原料融液的液面 1a‧‧‧Liquid of raw material melt

2‧‧‧種結晶 2‧‧ ‧ kinds of crystal

2L‧‧‧種結晶的下端 2L‧‧‧ the lower end of the crystal

2M、2M’‧‧‧種結晶的鏡像 Mirror image of 2M, 2M’‧‧ ‧ crystals

2R、2R’‧‧‧種結晶的實像 Real image of 2R, 2R'‧‧ ‧ crystals

2U‧‧‧鏡像的上端 2U‧‧‧ upper end of the mirror

4‧‧‧坩堝 4‧‧‧坩埚

5‧‧‧驅動裝置 5‧‧‧ drive

6‧‧‧拉引軸 6‧‧‧ Pulling shaft

7‧‧‧相機 7‧‧‧ camera

L‧‧‧間隔 L‧‧‧ interval

P1‧‧‧實像下端點 P1‧‧‧ real image lower end

P2‧‧‧鏡像點 P2‧‧‧ mirror point

Claims (7)

一種間隔測定方法,其是使種結晶的下端接觸坩堝內的原料融液而在上述種結晶的下端培育單結晶之前,測定上述原料融液的液面與配置於上述原料融液的上方之種結晶的下端之間隔的方法,其特徵在於:藉由光學性手法,獲得實像下端點的位置資訊與鏡像點的位置資訊,上述實像下端點是在上述種結晶的下端之特定的點,上述鏡像點是在映於上述液面的上述種結晶的鏡像之對應於上述實像下端點之點;以上述實像下端點的位置與上述鏡像點的位置為一致的點設為上述原料融液的液面與上述種結晶的下端的間隔為0,求出上述原料融液的液面與上述種結晶的下端的間隔。 A method for measuring a gap by measuring a liquid surface of the raw material melt and a substance disposed above the raw material melt before the lower end of the seed crystal is brought into contact with the raw material melt in the crucible and the single crystal is grown at the lower end of the seed crystal. The method for spacing the lower end of the crystal is characterized in that the position information of the end point of the real image and the position information of the mirror point are obtained by an optical method, and the end point of the real image is a specific point at the lower end of the crystal, the mirror image The point is a point corresponding to the lower end point of the real image in the mirror image of the crystal of the above-mentioned liquid surface; the point at which the position of the end point of the real image coincides with the position of the mirror point is the liquid level of the raw material melt The distance from the lower end of the above-mentioned crystal was 0, and the interval between the liquid surface of the raw material melt and the lower end of the seed crystal was determined. 如申請專利範圍第1項所述之間隔測定方法,其中針對上述種結晶及上述坩堝內的上述原料融液的液面的至少一個在複數個高度位置的各個時候,分別藉由光學性手法求出上述實像下端點的位置資訊與上述鏡像點的位置資訊;以及基於下列(a)與(b),求出上述原料融液的上述液面與上述種結晶的下端的間隔:(a)上述種結晶的高度位置的位移量,以上述坩堝內的上述原料融液的液面的高度位置為基準而求出;(b)上述實像的相對位置的位移量,對應於上述(a)的位移量而變化,以上述種結晶的上述鏡像的位置為基準,上述種結晶的上述鏡像的位置是基於前述位置資訊。 The method for measuring an interval according to claim 1, wherein at least one of the liquid levels of the raw material melt and the raw material melt in the crucible is determined by an optical method at each of a plurality of height positions. Position information of the end point of the real image and position information of the mirror point; and determining the interval between the liquid surface of the raw material melt and the lower end of the seed crystal based on the following (a) and (b): (a) The displacement amount of the height position of the crystal is obtained based on the height position of the liquid surface of the raw material melt in the crucible; (b) the displacement amount of the relative position of the real image corresponds to the displacement of the above (a) The position of the mirror image of the above-mentioned crystal is based on the position information based on the position of the mirror image of the above-mentioned crystal. 如申請專利範圍第2項所述之間隔測定方法,其中針對上述種結晶以收容上述原料融液的上述坩堝的高度位置為基準而在複數個高度位置的各個時候,拍攝上述種結晶及上述液面,獲得含上述種結晶的上述實像及上述鏡像的影像,在上述影像上求出上述種結晶的上述實像下端點的上述位置資訊與上述鏡像點的上述位置資訊。 The method for measuring an interval according to the second aspect of the invention, wherein the seed crystal and the liquid are photographed at a plurality of height positions with respect to a height position of the crucible containing the raw material melt in the above-mentioned crystal. And obtaining a video image including the real image and the mirror image of the crystal of the above-mentioned crystal, and obtaining the position information of the end point of the real image of the seed crystal and the position information of the mirror point on the image. 如申請專利範圍第2項所述之間隔測定方法,其中根據上述種結晶的上述高度位置與上述實像下端點的位置的回歸式之實像回歸式以及上述種結晶的上述高度位置與上述鏡像點的位置的回歸式,求出上述(a)的位移量與(b)的位移量的關係。 The method for measuring an interval according to the second aspect of the invention, wherein the height of the above-mentioned crystal and the position of the lower end of the real image are a regression equation of the real image and the height position of the crystal and the mirror point. The relationship between the displacement amount of the above (a) and the displacement amount of (b) is obtained by the regression equation of the position. 如申請專利範圍第3項所述之間隔測定方法,其中根據上述種結晶的上述高度位置與上述實像下端點的位置的回歸式之實像回歸式以及上述種結晶的上述高度位置與上述鏡像點的位置的回歸式,求出上述(a)的位移量與(b)的位移量的關係。 The method for measuring an interval according to the third aspect of the invention, wherein the height of the above-mentioned crystal and the position of the lower end of the real image are a regression equation of the real image and the height position of the crystal and the mirror point. The relationship between the displacement amount of the above (a) and the displacement amount of (b) is obtained by the regression equation of the position. 一種種結晶之預熱方法,其是在用於培育單結晶的原料融液的液面的上方配置種結晶,預熱上述種結晶的方法,其特徵在於包含:藉由如申請專利範圍第1~5項任一項所述之間隔測定方法,測定上述原料融液的液面與上述種結晶的下端的間隔的步驟;為了消除以上述測定間隔的步驟測定後的上述間隔與設為目標的間隔之差,使上述種結晶及上述坩堝的至少一個移 動的步驟;以及在上述移動的步驟之後,預熱上述種結晶的步驟。 A preheating method for crystallization, which is a method for arranging seed crystals above a liquid surface for cultivating a single crystal raw material melt, and preheating the above crystallization, characterized in that it comprises: The method for measuring an interval according to any one of the items 5, wherein a step of measuring a distance between a liquid surface of the raw material melt and a lower end of the seed crystal is performed; and the interval between the measurement at the measurement interval and the target is determined. The difference in spacing causes at least one of the above crystallization and the above enthalpy a step of moving; and a step of preheating said crystallization after said step of moving. 一種單結晶之製造方法,其特徵在於包含:藉由如申請專利範圍第6項所述之種結晶之預熱方法,預熱種結晶的步驟;在上述預熱步驟之後,使上述種結晶及上述坩堝的至少一個移動,使上述種結晶接觸收容於上述坩堝內的上述原料融液的步驟;以及上述接觸步驟之後,使上述種結晶及上述坩堝的至少一個移動,使單結晶在上述種結晶的下端成長的步驟。 A method for producing a single crystal, comprising: a step of preheating crystallization by a preheating method of crystallization as described in claim 6; after the preheating step, the crystallization is performed At least one movement of the ruthenium, the step of contacting the seed crystal with the raw material melt contained in the crucible; and after the contacting step, moving at least one of the seed crystal and the crucible to form a single crystal in the crystal The steps to grow at the bottom.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI828140B (en) * 2021-09-06 2024-01-01 日商Sumco股份有限公司 Method and apparatus for manufacturing single crystal

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6939714B2 (en) * 2018-06-11 2021-09-22 株式会社Sumco Method for measuring the distance between the melt surface and the seed crystal, method for preheating the seed crystal, and method for producing a single crystal
WO2022075061A1 (en) 2020-10-07 2022-04-14 株式会社Sumco Method for producing single crystals
CN116732604A (en) 2022-06-01 2023-09-12 四川晶科能源有限公司 Single crystal pulling method and single crystal pulling equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1147570A (en) * 1995-06-02 1997-04-16 Memc电子材料有限公司 System and method for controlling growth of silicon crystal
CN1272147A (en) * 1997-09-30 2000-11-01 Memc电子材料有限公司 method and system for controlling growth of silicon crystal

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04328425A (en) * 1991-04-26 1992-11-17 Sumitomo Metal Ind Ltd Method and apparatus for measuring position of liquid level and method and apparatus for lifting up single crystal
JP2002539060A (en) * 1998-10-14 2002-11-19 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド Method and apparatus for accurately withdrawing crystals
JP4325389B2 (en) * 2003-12-15 2009-09-02 信越半導体株式会社 Melt surface initial position adjusting device, melt surface initial position adjusting method, and single crystal manufacturing method
CN101168848A (en) * 2006-10-23 2008-04-30 北京有色金属研究总院 Method for controlling fused silicon liquid level position of czochralski silicon mono-crystal furnace
JP5167651B2 (en) * 2007-02-08 2013-03-21 信越半導体株式会社 Method for measuring distance between heat shield member lower end surface and raw material melt surface, and method for controlling the distance
KR101080569B1 (en) * 2009-01-21 2011-11-04 주식회사 엘지실트론 Method for Measuring and Controlling Melting Gap in Cz-Si crystal growth
JP5293625B2 (en) * 2010-01-29 2013-09-18 信越半導体株式会社 Silicon single crystal manufacturing method and silicon single crystal manufacturing apparatus
CN102677157A (en) * 2012-06-04 2012-09-19 曾泽斌 Measuring method for relative liquid level position of silicon melt in Czochralski silicon single crystal furnace
CN103628131B (en) * 2013-12-06 2016-05-04 西安德伍拓自动化传动系统有限公司 A kind of molten silicon liquid level checking method and measurement mechanism of monocrystalline silicon crystal pulling furnace
CN104005083B (en) * 2014-05-20 2016-06-29 北京工业大学 A kind of apparatus and method measuring single crystal growing furnace fusion silicon liquid level height

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1147570A (en) * 1995-06-02 1997-04-16 Memc电子材料有限公司 System and method for controlling growth of silicon crystal
CN1272147A (en) * 1997-09-30 2000-11-01 Memc电子材料有限公司 method and system for controlling growth of silicon crystal

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI828140B (en) * 2021-09-06 2024-01-01 日商Sumco股份有限公司 Method and apparatus for manufacturing single crystal

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