TWI592953B - Automotive anti-sulfur chip resistor manufacturing method - Google Patents

Automotive anti-sulfur chip resistor manufacturing method Download PDF

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TWI592953B
TWI592953B TW104118672A TW104118672A TWI592953B TW I592953 B TWI592953 B TW I592953B TW 104118672 A TW104118672 A TW 104118672A TW 104118672 A TW104118672 A TW 104118672A TW I592953 B TWI592953 B TW I592953B
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electrode
substrate
resistance
sintering
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TW201643904A (en
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wen-xi Li
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車用抗硫化晶片電阻器之製造方法Method for manufacturing anti-vulcanized wafer resistor for vehicle

本發明係有關於一種車用抗硫化晶片電阻器之製造方法,尤指涉及一種既可提升晶片電阻器抗硫化能力,亦可大幅降低晶片電阻器端電極材料成本之方法。The invention relates to a method for manufacturing a vulcanization resistant chip resistor for a vehicle, in particular to a method for improving the vulcanization resistance of a chip resistor and greatly reducing the material cost of a chip resistor terminal electrode.

晶片電阻器之電阻值主要係靠電阻層材料與幾何結構來決定,再透過正面金屬端電極導通後,經由電鍍鎳與錫連接到印刷電路板(Printed Circuit Board, PCB)使用。基本上,晶片電阻器之端電極可以分成三部份,分別為正面端電極、側面端電極與背面端電極,其中側面端電極與背面端電極只是利用來供後製程電鍍鎳與錫晶種層使用,而正面端電極除了用來供後製程電鍍鎳與錫晶種層使用之外,在其架構上也必需負責連接電阻層導通之路徑,即連接電阻層與電鍍鎳錫後焊接於PCB板,如美國US 6,153,256號專利案、中華民國第I423271及350071號專利案;當然,也有使用背面端銀電極連接電阻層之技術,如中華民國第I294129號專利案,其原理與上述以正面端電極連接電阻層相同。而為了與電阻層形成歐姆接觸,因此正面端電極之導電率必須遠低於電阻層電阻率才可形成歐姆接觸,否則會造成寄生電阻影響電阻器最後電阻值。The resistance value of the chip resistor is mainly determined by the material and geometry of the resistor layer, and then connected to the printed circuit board (PCB) through electroplating nickel and tin after being turned on through the front metal terminal electrode. Basically, the terminal electrode of the chip resistor can be divided into three parts, namely a front end electrode, a side end electrode and a back end electrode, wherein the side end electrode and the back end electrode are only used for the post process electroplating of nickel and tin seed layers. In addition to the use of the front-end electrode for the post-process electroplating nickel and tin seed layer, it is also necessary to be responsible for the connection of the resistance layer conduction path, that is, the connection of the resistance layer and the electroplated nickel tin and soldering to the PCB board. For example, US Patent No. 6,153,256, and the Republic of China No. I423271 and No. 350071; of course, there is also a technique of using a silver electrode on the back side to connect a resistive layer, such as the Patent No. I294129 of the Republic of China, the principle and the above-mentioned front end electrode The connection resistance layer is the same. In order to form an ohmic contact with the resistive layer, the conductivity of the front end electrode must be much lower than the resistive layer resistivity to form an ohmic contact, otherwise the parasitic resistance will affect the final resistance value of the resistor.

為了符合晶片電阻端電極之功能與材料成本考量,目前晶片電阻器其端電極材料係以銀導體為主,然而晶片電阻端電極銀金屬有一嚴重缺點,其容易與應用環境中的硫起反應生成硫化銀,特別是在高溫、高濕度與高硫濃度之環境,如汽車電子之應用下反應特別激烈、特別嚴重,其晶片電阻硫化現象如第6圖所示。而硫化銀之生成將影響晶片電阻器之電性特性與可靠度。In order to meet the function and material cost of the chip resistor terminal electrode, the current electrode material of the wafer resistor is mainly silver conductor. However, the chip resistor electrode silver metal has a serious disadvantage, which is easy to react with sulfur in the application environment. Silver sulfide, especially in the environment of high temperature, high humidity and high sulfur concentration, such as automotive electronics, is particularly intense and extremely severe, and its wafer resistance vulcanization phenomenon is shown in Fig. 6. The formation of silver sulfide will affect the electrical characteristics and reliability of the chip resistor.

目前主要製作抗硫化車用晶片電阻器,係將銀端電極添加高含量(5mol%以上)之鈀形成銀鈀合金來降低與硫反應形成硫化銀之反應活性,如美國US 5,966,067專利案、中華民國第I429609及I395232號專利案。然而,如此一來端電極材料成本將大幅升高,且隨著硫化環境愈惡劣,形成硫化銀還是有一定之風險。故,ㄧ般習用者係無法符合使用者於實際使用時之所需。At present, the main anti-vulcanization wafer resistors are made by adding a high content (more than 5 mol%) of palladium to a silver-palladium alloy to reduce the reaction reaction with sulfur to form silver sulfide. For example, US Patent No. 5,966,067, China Patent No. I429609 and I395232 of the Republic of China. However, as a result, the cost of the terminal electrode material will increase significantly, and as the sulfurization environment becomes more severe, there is a certain risk of forming silver sulfide. Therefore, the user-like users cannot meet the needs of the user in actual use.

本發明之主要目的係在於,克服習知技藝所遭遇之上述問題並提供一種以多孔性鋁端電極取代原先銀端電極,除了可大幅降低晶片電阻器端電極材料成本,亦可完全克服原先晶片電阻硫化問題,而能有效應用於汽車電子上,提升 晶片電阻器抗硫化能力之車用抗硫化晶片電阻器之製造方法。The main object of the present invention is to overcome the above problems encountered in the prior art and to provide a porous aluminum terminal electrode instead of the original silver terminal electrode, in addition to greatly reducing the material cost of the wafer resistor terminal electrode, and completely overcoming the original wafer. A method for manufacturing a vulcanization resistant chip resistor for a vehicle that can be effectively applied to automotive electronics to improve the resistance of the wafer resistor to vulcanization.

本發明之次要目的係在於,提供一種新晶片電阻器端電極材料與新端電極結構,以低成本鋁端電極取代目前高單價之銀端電極,當鋁端電極應用於較高電阻值晶片電阻,元件結構不變,只需加大電流;當多孔性鋁端電極應用於較低電阻值晶片電阻,可經由新結構藉由保護層與電阻層尺寸不同改變電流導通路徑,從原先透過印刷正面端電極導通電阻層路徑改變成以側面端電極導通電阻層新路徑之方法。A secondary object of the present invention is to provide a new wafer resistor terminal electrode material and a new terminal electrode structure, which replaces the current high unit price silver terminal electrode with a low cost aluminum terminal electrode, and the aluminum terminal electrode is applied to a higher resistance value wafer. Resistance, component structure is unchanged, only need to increase the current; when the porous aluminum terminal electrode is applied to the lower resistance value of the chip resistor, the current conduction path can be changed by the new structure by the size of the protective layer and the resistance layer, from the original through printing The front end electrode conduction resistance layer path is changed to a new path of the side end electrode conduction resistance layer.

為達以上之目的,本發明係一種車用抗硫化晶片電阻器之製造方法,係包括:(A)端電極印刷及燒結:首先在一基板背面印刷形成二相間隔而互不連接之背面端電極,再於該基板正面印刷形成二相間隔而互不連接之正面端電極,之後將該基板送入燒結爐中進行600~900°C高溫燒結作業,使該背面端電極與該正面端電極能夠與該基板進行熔結;其中,該正面端電極係為低固含量之多孔性鋁電極;(B)電阻層印刷及燒結:於該基板上二相間隔正面端電極之間印刷形成一電阻層,該電阻層之兩端部係延伸至該等正面端電極上,使得該電阻層之兩端部係搭接於該等正面端電極相間隔面之端部上,之後再將該基板送入燒結爐中進行600~900°C高溫燒結作業,俾使該電阻層能夠與該基板進行熔結;(C)內塗層印刷與燒結:於完成燒結之電阻層上印刷形成一內塗層,且該內塗層之尺寸係小於該電阻層而不會接觸到該等正面端電極,使該電阻層之兩端部外露,之後再將該基板送入燒結爐中進行450~700°C高溫燒結作業,俾使該內塗層能夠與該電阻層進行熔結;(D)鐳射切割:將該基板送入鐳射切割裝置,利用鐳射光於該內保護層上對該電阻層進行切割作業,於該電阻層之上切出所需形狀之調節槽以修整該電阻層之電阻值;(E)外塗層印刷與燒結:於該內塗層表面上再印刷形成一外塗層,且該外塗層之尺寸與該內塗層相同,係小於該電阻層而不會接觸到該等正面端電極,使該電阻層之兩端部外露,之後再將該基板送入燒結爐中進行150~250°C燒結,俾使該外塗層能夠與該內塗層進行熔結,並藉由該內、外塗層構成一保護層;(F)字碼層印刷:於該保護層上印刷有代表該晶片電阻之辨識字碼;(G)折條:將呈片狀之基板送至滾壓裝置,利用滾壓分割方式,使該基板分裂成為條狀;(H)端電極側導印刷:將折成條狀之基板兩側面印刷上導電材質,形成二側面端電極於該電阻層外露之兩端部上方,該等側面端電極係覆蓋該等正面端電極與該等背面端電極,之後再將完成端電極側導印刷之條狀基板送入燒結爐中進行150~250°C燒結,俾使該側導印刷後之側面端電極可與該正面端電極及該背面端電極進行熔結,使該基板同一側邊之該等正面端電極與該等背面端電極形成相互連接導通,該等側面端電極會接觸到該等正面端電極,並可透過以多孔性鋁為材質之正面端電極連接該電阻層;(I)折粒:完成側面端電極燒結之條狀基板,再次利用滾壓裝置進行分割,將呈條狀之基板壓折,使相連之晶片電阻分成多數獨立且具有二正面端電極、二背面端電極、二側面端電極、一電阻層,及一包括內塗層與外塗層之保護層之粒狀體;以及(J)電鍍:將形成為粒狀之晶片電阻送至電鍍槽進行電鍍作業,於晶片電阻導電材質之側面端電極外部鍍上一電鍍層,以製得車用抗硫化晶片電阻器。For the purpose of the above, the present invention relates to a method for manufacturing a vulcanization resistant wafer resistor for a vehicle, comprising: (A) printing and sintering of a terminal electrode: firstly, a back surface end of a substrate is formed to form a two-phase interval without being connected to each other. Electrode is further printed on the front surface of the substrate to form a front end electrode which is separated from each other by two phases, and then the substrate is sent to a sintering furnace for high temperature sintering operation at 600 to 900 ° C to make the back end electrode and the front end electrode The substrate can be sintered; wherein the front end electrode is a low solid content porous aluminum electrode; (B) the resistive layer printing and sintering: a resistor is printed between the two phase spaced front end electrodes on the substrate a layer, the two ends of the resistive layer are extended to the front end electrodes, such that the two ends of the resistive layer are overlapped on the end portions of the front end electrode spacing faces, and then the substrate is sent Performing a high-temperature sintering operation at 600-900 ° C in a sintering furnace to enable the resistive layer to be sintered with the substrate; (C) printing and sintering of the undercoat layer: printing on the sintered resistive layer to form an inner layer a layer, and the size of the inner coating layer is smaller than the resistance layer without contacting the front end electrodes, exposing both ends of the resistance layer, and then feeding the substrate into the sintering furnace for 450-700° C high-temperature sintering operation, so that the inner coating layer can be sintered with the electric resistance layer; (D) laser cutting: the substrate is sent to a laser cutting device, and the resistive layer is cut by laser light on the inner protective layer Working, cutting a desired shape of the adjusting groove on the resistive layer to trim the resistance value of the resistive layer; (E) printing and sintering the overcoat layer: reprinting on the surface of the inner coating layer to form an outer coating layer, And the outer coating layer has the same size as the inner coating layer, is smaller than the resistance layer and does not contact the front end electrodes, exposes both ends of the resistance layer, and then sends the substrate into the sintering furnace. Sintering at 150-250 ° C, so that the outer coating layer can be sintered with the inner coating layer, and the inner and outer coating layers form a protective layer; (F) word layer printing: on the protective layer Printed with identification code representing the resistance of the chip; (G) fold The sheet-shaped substrate is sent to a rolling device, and the substrate is split into strips by a roll dividing method; (H) the end electrode side guide printing: a conductive material is printed on both sides of the substrate folded into a strip shape to form a conductive material. The two side end electrodes are disposed above the exposed end portions of the resistance layer, and the side end electrodes cover the front end electrodes and the back end electrodes, and then the strip substrate which completes the end electrode side printing is sent to the sintering Sintering at 150-250 ° C in a furnace, so that the side-end electrode after the side-guide printing can be sintered with the front-end electrode and the back-end electrode, so that the front-end electrode of the same side of the substrate The back end electrodes are connected to each other to form a mutual connection, and the side end electrodes are in contact with the front end electrodes, and the resistance layer is connected through a front end electrode made of porous aluminum; (I) Folding: completing the side end The strip-shaped substrate on which the electrode is sintered is again divided by a rolling device, and the strip-shaped substrate is folded, so that the connected wafer resistor is divided into a plurality of independent and has two front end electrodes, two back end electrodes, and two sides. a surface electrode, a resistance layer, and a granular body including a protective layer of the undercoat layer and the overcoat layer; and (J) electroplating: feeding the wafer resistance formed into a granularity to the plating bath for plating operation on the wafer The side electrode of the resistive conductive material is plated with a plating layer to obtain a vulcanization resistant chip resistor for the vehicle.

於本發明上述實施例中,該基板之材質係為氧化鋁陶瓷基板。In the above embodiment of the invention, the material of the substrate is an alumina ceramic substrate.

於本發明上述實施例中,該保護層之尺寸係小於該電阻層至少1微米(μm)以上。In the above embodiment of the invention, the protective layer has a size smaller than the resistive layer by at least 1 micrometer (μm).

於本發明上述實施例中,該二側面端電極係為銅、鎳、錫或其組合中選出之金屬電極。In the above embodiment of the present invention, the two side end electrodes are selected from the group consisting of copper, nickel, tin or a combination thereof.

於本發明上述實施例中,該內塗層之材質係為玻璃。In the above embodiment of the invention, the material of the inner coating is glass.

於本發明上述實施例中,該外塗層之材質係為環氧樹脂。In the above embodiment of the invention, the material of the outer coating layer is an epoxy resin.

於本發明上述實施例中,該正面端電極係可進一步為高固含量之鋁電極,適用於高電阻值晶片電阻。In the above embodiment of the invention, the front end electrode system can further be a high solid content aluminum electrode suitable for high resistance wafer resistance.

11‧‧‧基板11‧‧‧Substrate

12‧‧‧背面端電極12‧‧‧Back end electrode

13‧‧‧正面端電極13‧‧‧ front side electrode

131‧‧‧端部131‧‧‧End

14、14a‧‧‧電阻層14, 14a‧‧‧ resistance layer

141‧‧‧端部141‧‧‧End

15、15a‧‧‧保護層15, 15a‧‧‧ protective layer

151‧‧‧內塗層151‧‧‧Inner coating

152‧‧‧外塗層152‧‧‧Overcoat

16‧‧‧側面端電極16‧‧‧ Side electrode

17‧‧‧電鍍層17‧‧‧Electroplating

s101~s110‧‧‧步驟S101~s110‧‧‧step

第1圖,係本發明之製作流程示意圖。Fig. 1 is a schematic view showing the production process of the present invention.

第2圖,係本發明第一實施例之車用抗硫化晶片電阻器剖面示意圖。Fig. 2 is a schematic cross-sectional view showing a vulcanization resistant chip resistor for a vehicle according to a first embodiment of the present invention.

第3圖,係本發明第二實施例之車用抗硫化晶片電阻器剖面示意圖。Fig. 3 is a cross-sectional view showing a vulcanization resistant chip resistor for a vehicle according to a second embodiment of the present invention.

第4圖,係本發明不同電阻值之晶片電阻多孔性鋁端電極印刷與燒結照片。Fig. 4 is a photograph showing the printing and sintering of a wafer resistance porous aluminum end electrode of different resistance values of the present invention.

第5圖,係本發明之晶片電阻多孔性鋁端電極完成品照片。Fig. 5 is a photograph of the finished wafer resistance porous aluminum terminal electrode of the present invention.

第6圖,係習用晶片電阻硫化現象照片。Figure 6 is a photograph of a conventional wafer resistance vulcanization phenomenon.

請參閱『第1圖~第5圖』所示,係分別為本發明之製作流程示意圖、本發明第一實施例之車用抗硫化晶片電阻器剖面示意圖、本發明第二實施例之車用抗硫化晶片電阻器剖面示意圖、本發明不同電阻值之晶片電阻多孔性鋁端電極印刷與燒結照片、以及本發明之晶片電阻多孔性鋁端電極完成品照片。如圖所示:本發明係一種車用抗硫化晶片電阻器之製造方法,係利用氧化鋁陶瓷基板配合厚膜印刷製程,依序經過端電極印刷及燒結、電阻層印刷及燒結、內塗層印刷與燒結、鐳射切割、外塗層印刷與燒結、字碼層印刷、折條、端電極側導印刷、折粒、及電鍍等步驟完成車用抗硫化晶片電阻器。如第1、3圖所示,本發明所述之車用抗硫化晶片電阻器之製程,主要係透過以下步驟據以實施:Referring to FIG. 1 to FIG. 5, which are schematic diagrams of the manufacturing process of the present invention, a cross-sectional view of a vulcanization resistant chip resistor for a vehicle according to a first embodiment of the present invention, and a vehicle for use in a second embodiment of the present invention. A schematic diagram of a cross-section of a vulcanization resistant wafer resistor, a photo resistive porous aluminum end electrode printing and sintering photograph of different resistance values of the present invention, and a photograph of a wafer resistance porous aluminum end electrode finished product of the present invention. As shown in the figure: The present invention is a method for manufacturing a vulcanization resistant wafer resistor for a vehicle, which uses an alumina ceramic substrate in combination with a thick film printing process, sequentially through end electrode printing and sintering, resistive layer printing and sintering, and inner coating. Printing and sintering, laser cutting, overcoat printing and sintering, word layer printing, folding, end electrode side guiding printing, folding, and electroplating steps complete the automotive anti-vulcanization chip resistor. As shown in the first and third figures, the process of the anti-vulcanization chip resistor for a vehicle according to the present invention is mainly implemented by the following steps:

端電極印刷及燒結步驟s101,首先在一基板11背面適當處印刷形成二相間隔而互不連接之背面端電極12,再於該基板11正面適當處印刷形成二相間隔而互不連接之正面端電極13;之後將該基板11送入燒結爐中進行600~900°C高溫燒結作業,使該背面端電極12與該正面端電極13能夠與該基板11進行熔結;其中,該正面端電極13係為低固含量之多孔性鋁電極。In the terminal electrode printing and sintering step s101, first, the back end electrode 12 which is separated from each other and which is not connected to each other is formed at a suitable position on the back surface of the substrate 11, and then printed on the front surface of the substrate 11 to form a two-phase interval without being connected to each other. a terminal electrode 13; the substrate 11 is then sent to a sintering furnace for performing a high-temperature sintering operation at 600 to 900 ° C, so that the back end electrode 12 and the front end electrode 13 can be sintered with the substrate 11; wherein the front end The electrode 13 is a low solid content porous aluminum electrode.

電阻層印刷及燒結步驟s102,於該基板11上二相間隔正面端電極13之間印刷形成一電阻層14,該電阻層14之兩端部141係延伸至該等正面端電極13上,使得該電阻層14之兩端部141係搭接於該等正面端電極13相間隔面之端部131上;之後再將該基板11送入燒結爐中進行600~900°C高溫燒結作業,俾使該電阻層14能夠與該基板11進行熔結。a resistive layer printing and sintering step s102, a resistive layer 14 is formed on the substrate 11 between the two-phase spaced front end electrodes 13, and the two end portions 141 of the resistive layer 14 extend to the front end electrodes 13 so that The two end portions 141 of the resistive layer 14 are overlapped on the end portions 131 of the front surface of the front end electrodes 13; the substrate 11 is then sent to a sintering furnace for high temperature sintering at 600 to 900 ° C. The resistance layer 14 can be sintered with the substrate 11.

內塗層印刷與燒結步驟s103,於完成燒結之電阻層14上印刷形成一內塗層151,且該內塗層151之尺寸係小於該電阻層14而不會接觸到該等正面端電極13,使該電阻層14之兩端部141外露;之後再將該基板11送入燒結爐中進行450~700°C高溫燒結作業,俾使該內塗層151能夠與該電阻層14進行熔結;其中,該內塗層151係以玻璃為主成分組成之絕緣體。The inner coating printing and sintering step s103 is printed on the sintered resistive layer 14 to form an inner coating layer 151, and the inner coating layer 151 is smaller in size than the resistive layer 14 without contacting the front end electrode 13 The two ends 141 of the resistive layer 14 are exposed; the substrate 11 is then sent to a sintering furnace for high-temperature sintering at 450-700 ° C, so that the inner coating 151 can be sintered with the resistive layer 14. The inner coating layer 151 is an insulator composed mainly of glass.

鐳射切割步驟s104,將該基板11送入鐳射切割裝置,利用鐳射光於該內保護層151上對該電阻層14進行切割作業,於該電阻層14之適當處切出適當形狀(「I」、「L」或「一」等形狀)之調節槽以修整該電阻層14之電阻值。In the laser cutting step s104, the substrate 11 is sent to a laser cutting device, and the resistive layer 14 is cut on the inner protective layer 151 by laser light, and an appropriate shape is cut out at the appropriate place of the resistive layer 14 ("I" The adjustment groove of the shape of "L" or "one" is used to trim the resistance value of the resistance layer 14.

外塗層印刷與燒結步驟s105,於該內塗層151表面上再印刷形成一外塗層152,且該外塗層152之尺寸與該內塗層151相同,係小於該電阻層14至少1微米(μm)以上而不會接觸到該等正面端電極13,使該電阻層14之兩端部141外露;之後再將該基板11送入燒結爐中進行150~250°C燒結,俾使該外塗層152能夠與該內塗層151進行熔結,並藉由該內、外塗層151、152構成一保護層15;其中該外塗層152係以環氧樹脂為主成分組成之絕緣材質。The outer coating printing and sintering step s105 is further printed on the surface of the inner coating layer 151 to form an outer coating layer 152, and the outer coating layer 152 has the same size as the inner coating layer 151, and is smaller than the resistance layer 14 at least The micron (μm) or more does not contact the front end electrodes 13 to expose the both end portions 141 of the resistance layer 14; the substrate 11 is then sent to a sintering furnace for sintering at 150 to 250 ° C. The outer coating layer 152 can be sintered with the inner coating layer 151, and the inner and outer coating layers 151, 152 form a protective layer 15; wherein the outer coating layer 152 is composed mainly of epoxy resin. Insulation material.

字碼層印刷步驟s106,於該保護層15上印刷有代表該晶片電阻之相關辨識字碼,例如型號、電阻值等等。The character layer printing step s106 is printed on the protective layer 15 with an associated identification code representing the resistance of the wafer, such as a model number, a resistance value, and the like.

折條步驟s107,將呈片狀之基板11送至滾壓裝置,利用滾壓分割方式,使該基板11分裂成為條狀。In the folding step s107, the sheet-like substrate 11 is sent to a rolling device, and the substrate 11 is split into strips by a roll division method.

端電極側導印刷步驟s108,將折成條狀之基板11兩側面印刷上導電材質,形成二側面端電極16於該電阻層14外露之兩端部141上方,該等側面端電極16係覆蓋該等正面端電極13與該等背面端電極12;之後再將完成端電極側導印刷之條狀基板11送入燒結爐中進行150~250°C燒結,俾使該側導印刷後之側面端電極16可與該正面端電極13及該背面端電極12進行熔結,使該基板11同一側邊之該等正面端電極13與該等背面端電極12形成相互連接導通,該等側面端電極16會接觸到該等正面端電極13,並可透過以多孔性鋁為材質之正面端電極13連接該電阻層14;其中該等側面端電極16係為銅、鎳、錫或其組合中選出之金屬電極。In the terminal electrode side printing step s108, the conductive material is printed on both sides of the strip-shaped substrate 11 to form two side end electrodes 16 above the exposed end portions 141 of the resistive layer 14, and the side end electrodes 16 are covered. The front end electrode 13 and the back end electrode 12; and then the strip substrate 11 on which the end electrode side guide printing is completed is sent to a sintering furnace for sintering at 150 to 250 ° C, and the side surface of the side guide is printed. The front electrode 16 and the front end electrode 12 are fused to the front end electrode 13 and the rear end electrode 12 of the same side of the substrate 11 to be electrically connected to each other. The electrode 16 is in contact with the front end electrode 13 and is connected to the resistive layer 14 through a front end electrode 13 made of porous aluminum; wherein the side end electrodes 16 are made of copper, nickel, tin or a combination thereof. Selected metal electrodes.

折粒步驟s109,完成側面端電極16燒結之條狀基板11,再次利用滾壓裝置進行分割,將呈條狀之基板11壓折,使相連之晶片電阻分成多數獨立且具有二背面端電極12、二正面端電極13、一電阻層14、二側面端電極16,及一包括內塗層151與外塗層152之保護層15之粒狀體。In the granulation step s109, the strip substrate 11 on which the side end electrode 16 is sintered is completed, and the strip substrate 11 is again divided by the rolling device, and the strip substrate 11 is folded, so that the connected wafer resistors are divided into a plurality of independent and have two back end electrodes 12 And a front end electrode 13, a resistive layer 14, two side end electrodes 16, and a granular body including a protective layer 15 of the inner coating layer 151 and the outer coating layer 152.

電鍍步驟s110,將形成為粒狀之晶片電阻送至電鍍槽進行電鍍作業,於晶片電阻導電材質之側面端電極16外部鍍上一電鍍層17,以製得車用抗硫化晶片電阻器。如是,藉由上述揭露之流程構成一全新之車用抗硫化晶片電阻器之製造方法。In the electroplating step s110, the wafer resistance formed into a granular shape is sent to the plating bath for electroplating, and a plating layer 17 is plated on the outside of the side end electrode 16 of the wafer resistor conductive material to obtain a vulcanization resistant chip resistor for the vehicle. As such, a new method of manufacturing a vulcanization resistant wafer resistor for a vehicle is constructed by the above disclosed process.

本發明亦可以上述流程於基板背面形成另一電阻層及另一保護層,以期達到不同需求之晶片電阻器結構。In the present invention, another resistance layer and another protective layer may be formed on the back surface of the substrate in order to achieve different requirements of the wafer resistor structure.

為了解決晶片電阻端電極銀硫化問題,本發明使用鋁電極取代銀電極,藉由鋁不會與硫反應,具抗硫化功能,因此本發明提出以化學方式或物理方式形成之金屬鋁端電極取代原先金屬銀端電極應用於晶片電阻,如此一來即可以解決原先晶片電阻銀端電極之硫化問題,特別係汽車電子應用之晶片電阻。鑑於鋁導電性不似銀高,故本發明根據目前晶片電阻銀端電極結構,分別針對高阻值晶片電阻與低阻值晶片電阻提出第2圖所示之晶片電阻鋁端電極結構與第3圖所示之晶片電阻多孔性鋁端電極結構。其中第2圖係針對高阻值晶片電阻端電極(電阻1K Ω以上),採用高導電率之電阻膏,以大於85%以上之高固含量,將正面端電極13以鋁電極取代原先銀電極,但原先結構中保護層15a與電阻層14a尺寸相同。該高固含量鋁電極其表面會自然形成一層氧化鋁,在固定電壓下,通入0.0001~100安培(A)電流,係可通過表面氧化鋁而將高電阻之電阻層直接導出形成通路;而針對低阻值晶片電阻端電極(電阻小於1K Ω),其包含兩種方式,第一種係在保護層開孔,讓電鍍金屬(如銅、鎳、錫或其組合)直接連出去,第二種則如本發明第3圖所示,將鋁做成低固含量,變成多孔性鋁,在電鍍金屬(如銅、鎳、錫或其組合)之時就可以填進去來連接電阻層,而且除了將正面端電極13以多孔性鋁電極取代銀電極,還將保護層15縮短讓電阻層14兩端部141曝露出來以利於後製程側面端電極16可以直接鍍在低電阻之電阻層14上,使電鍍金屬可以透過多孔性鋁電極連接該電阻層14,將低電阻之電阻層14以電鍍金屬(如銅、鎳、錫或其組合)直接導出形成新之端電極通路,解決多孔性金屬鋁膏電阻太高無法導出正確電阻層阻值問題。In order to solve the problem of silver vulcanization of the resistor terminal electrode of the wafer, the present invention replaces the silver electrode with an aluminum electrode, and the aluminum does not react with sulfur, and has anti-vulcanization function. Therefore, the present invention proposes to replace the metal aluminum terminal electrode formed by chemical or physical means. The original metal silver terminal electrode is applied to the chip resistor, so that the vulcanization problem of the original chip resistor silver terminal electrode can be solved, especially the chip resistance of the automotive electronic application. In view of the fact that aluminum conductivity is not like silver height, the present invention proposes the wafer resistance aluminum terminal electrode structure shown in FIG. 2 and the third embodiment according to the current wafer resistance silver terminal electrode structure for high resistance wafer resistance and low resistance wafer resistance, respectively. The wafer resistance porous aluminum end electrode structure shown in the figure. The second picture is for the high-resistance chip resistance terminal electrode (resistance 1K Ω or more), using a high conductivity resistance paste, with a high solid content of more than 85%, the front end electrode 13 is replaced by the aluminum electrode with the original silver electrode However, the protective layer 15a and the resistive layer 14a have the same size in the original structure. The high solid content aluminum electrode naturally forms a layer of aluminum oxide on the surface thereof, and a current of 0.0001 to 100 amps (A) is applied at a fixed voltage, and the high resistance resistive layer can be directly led to form a passage through the surface alumina; For the low-resistance chip resistor terminal electrode (resistance less than 1K Ω), it contains two ways, the first is in the protective layer opening, allowing the plating metal (such as copper, nickel, tin or a combination thereof) to directly connect out, the first In the second embodiment, as shown in Fig. 3 of the present invention, aluminum is made into a low solid content and becomes porous aluminum. When electroplated metal (such as copper, nickel, tin or a combination thereof), it can be filled in to connect the resistance layer. Moreover, in addition to replacing the silver electrode with the front end electrode 13 with a porous aluminum electrode, the protective layer 15 is shortened so that the end portions 141 of the resistive layer 14 are exposed to facilitate the post-process side end electrode 16 to be directly plated on the low-resistance resistive layer 14. The electroplated metal can be connected to the resistive layer 14 through a porous aluminum electrode, and the low-resistance resistive layer 14 can be directly exported as a plating metal (such as copper, nickel, tin or a combination thereof) to form a new one. End of the electrode paths, solving the porous metal such as aluminum paste can not export the proper resistance is too high resistive layer resistance problem.

本發明利用改變晶片電阻端電極之材料與結構方式,對於高電阻值晶片電阻直接以高固含量鋁端電極取代原先銀端電極,由印刷到燒結與電鍍,藉由加大電流,可通過表面氧化鋁而將高電阻之電阻層直接導出形成通路;另一方面,對於低電阻值晶片電阻係以多孔性鋁端電極取代原先銀端電極,並使用新結構保護層與電阻層尺寸不同電流導通路徑取代傳統結構保護層與電阻層尺寸相同電流導通路徑,其印刷與燒結如第4圖所示,其中圖(a)為低電阻值(100mΩ)晶片電阻鋁端電極印刷與燒結圖,圖(b)為高電阻值(100KΩ)晶片電阻鋁端電極印刷與燒結圖。而經過端電極側導印刷側面端電極(電鍍銅、鎳、錫或其組合)後所得之晶片電阻多孔性鋁端電極完成品則如第5圖所示。The invention utilizes the material and structure mode of changing the resistance end electrode of the wafer, and replaces the original silver end electrode with a high solid content aluminum end electrode directly for high resistance value wafer electrode, from printing to sintering and electroplating, by increasing the current, the surface can be passed Alumina is used to directly lead the high-resistance resistive layer to form a via; on the other hand, the low-resistance chip resistor is replaced by a porous aluminum terminal electrode with a porous aluminum terminal electrode, and a new structural protective layer and a resistive layer are used to have different current conduction. The path replaces the conventional structure protective layer and the resistance layer with the same current conduction path. The printing and sintering are as shown in Fig. 4, wherein (a) is a low resistance (100mΩ) wafer resistance aluminum terminal electrode printing and sintering diagram, b) Printed and sintered graph of high resistance (100KΩ) wafer resistance aluminum terminal electrode. The wafer resistance porous aluminum terminal electrode obtained by the side electrode side printing side electrode (electroplated copper, nickel, tin or a combination thereof) is as shown in Fig. 5.

對於不同電阻值之晶片電阻以鋁當端電極,高電阻值(1206/33k Ω)晶片電阻其保護層沒有縮小,代表電阻層只能靠高固含量之鋁端電極導出,所以電阻值在電鍍側面端電極(如電鍍銅、鎳、錫或其組合)前後幾乎不變,只要藉由加大電流,即可通過鋁端電極表面的氧化鋁而將高電阻之電阻層直接導出形成通路;反之,對於低電阻值(1206/200 Ω)晶片電阻係以多孔性鋁當端電極並縮小保護層,其電阻值在電鍍側面端電極後可以大幅減少與集中,代表電阻層在電鍍側面端電極後引伸出新之導通路徑以取代原先鋁端電極,前述兩種晶片電阻結構之電阻值變化如表一所示;另外,本發明亦針對一般銀端電極晶片電阻器與本發明創新多孔性鋁端電極晶片電阻器,在105 °C,飽和硫蒸氣1000小時下進行抗硫化測試,其硫化測試結果如表二所示,足見以多孔性鋁端電極取代銀端電極之晶片電阻器確實可以達到改善晶片電阻器硫化問題,進而能以多孔性鋁端電極取代銀端電極之應用效果,在任何作用有銀之應用部分,達到大幅降低成本之功效。For different resistance values, the chip resistance is aluminum as the terminal electrode, and the high resistance (1206/33k Ω) chip resistance has no reduction in the protective layer. The representative resistance layer can only be derived from the high solid content aluminum terminal electrode, so the resistance value is electroplated. The side electrode (such as electroplated copper, nickel, tin or a combination thereof) is almost unchanged before and after, as long as the current is increased, the high resistance resistive layer can be directly led out through the aluminum oxide surface of the aluminum end electrode to form a path; For low resistance (1206/200 Ω) wafer resistance, the porous aluminum is used as the terminal electrode and the protective layer is reduced. The resistance value can be greatly reduced and concentrated after plating the side electrode, which represents the resistance layer after plating the side electrode. A new conduction path is introduced to replace the original aluminum terminal electrode, and the resistance values of the two kinds of chip resistor structures are shown in Table 1. In addition, the present invention is also directed to a general silver terminal electrode chip resistor and the inventive porous aluminum end of the present invention. The electrode chip resistor is tested for sulfurization resistance at 105 ° C and saturated sulfur vapor for 1000 hours. The results of the vulcanization test are shown in Table 2, which shows that the porous aluminum terminal is used. Chip Resistors substituted silver terminal electrodes can indeed achieve improved chip resistors vulcanization problems, and further can be substituted Application Effect silver terminal electrodes to the porous aluminum terminal electrodes with the application part of silver of any action to achieve a significant cost reduction effect.

表一Table I

 

 

 

 

 

表二Table II

本發明之側面端電極所使用電鍍金屬鎳或銅其電阻率皆低於金屬銀膏,即使是高固含量之金屬銀膏,本發明利用側面端鎳電極直接連接低電阻之電阻層,取代原先利用正面端銀電極連接電阻層,如此一來正面端銀電極扮演功能只是供後製成側面端鎳電極使用,其導電率只要能使側面端電極鍍膜即可,因此除了低固含量銀膏可以使用,其他金屬導電率只要能使側面端電極鍍膜皆可使用,如多孔性鋁或銅等。另外,側面端鎳電極連接電阻層,其電阻率遠低於電阻層之電阻率,即使是低阻值之電阻層,因此對於整個電阻器之最終阻值不會有效地影響,導致窄變化低阻值電阻器阻值控制容易。The electroplated metal nickel or copper used in the side terminal electrode of the invention has lower resistivity than the metal silver paste. Even in the case of a high solid content metal silver paste, the present invention directly connects the low resistance resistive layer with the side end nickel electrode instead of the original one. The front side silver electrode is used to connect the resistance layer, so that the front side silver electrode functions only for the post side nickel electrode, and the conductivity can be as long as the side end electrode can be coated, so that the low solid content silver paste can be used. For use, other metal conductivity can be used for coating the side electrode, such as porous aluminum or copper. In addition, the side-side nickel electrode is connected to the resistive layer, and its resistivity is much lower than that of the resistive layer. Even a low-resistance resistive layer does not effectively affect the final resistance of the entire resistor, resulting in a low variation. Resistance value resistance control is easy.

藉此,本發明利用一種新晶片電阻器端電極材料與新端電極結構如第3圖所示,以低成本多孔性鋁端電極取代目前高單價之銀端電極,當鋁端電極應用於較高電阻值晶片電阻,元件結構不變,只需加大電流(第2圖),另一方面,當多孔性鋁端電極應用於較低電阻值晶片電阻,可經由新結構藉由保護層與電阻層尺寸不同改變電流導通路徑,從原先透過印刷正面端電極導通電阻層路徑改變成以側面端電極導通電阻層新路徑。本發明有兩大創新優點:Thereby, the present invention utilizes a new wafer resistor terminal electrode material and a new terminal electrode structure as shown in FIG. 3, and replaces the current high unit price silver terminal electrode with a low cost porous aluminum terminal electrode, when the aluminum terminal electrode is applied. High resistance wafer resistance, component structure is unchanged, only need to increase the current (Fig. 2), on the other hand, when the porous aluminum terminal electrode is applied to the lower resistance chip resistance, the new structure can be protected by a protective layer The resistance layer size changes the current conduction path from the original through-printing front-end electrode on-resistance layer path to a new path on the side-end electrode conduction resistance layer. The invention has two major innovation advantages:

1.以多孔性鋁端電極取代原先銀端電極可以大幅降低晶片電阻器端電極材料成本。1. Replacing the original silver-end electrode with a porous aluminum terminal electrode can greatly reduce the material cost of the wafer resistor terminal electrode.

2.以多孔性鋁端電極取代原先銀端電極可以完全克服原先晶片電阻硫化問題,對於晶片電阻進入車用電子有極大助益。2. Replacing the original silver-end electrode with a porous aluminum end electrode can completely overcome the problem of the original wafer resistance vulcanization, which is very helpful for the chip resistor to enter the vehicle electronics.

綜上所述,本發明係一種車用抗硫化晶片電阻器之製造方法,可有效改善習用之種種缺點,以多孔性鋁端電極取代原先銀端電極,使側面端電極之電鍍金屬可以透過正面端多孔性鋁電極連接電阻層,將低電阻之電阻層以電鍍金屬直接導出形成新之端電極通路,除了可以大幅降低晶片電阻器端電極材料成本,亦可完全克服原先晶片電阻硫化問題,而能有效應用於汽車電子上,提升 晶片電阻器抗硫化能力,進而使本發明之産生能更進步、更實用、更符合使用者之所須,確已符合發明專利申請之要件,爰依法提出專利申請。In summary, the present invention is a method for manufacturing a vulcanization resistant wafer resistor for a vehicle, which can effectively improve various disadvantages of the conventional use, and replace the original silver-end electrode with a porous aluminum end electrode, so that the plating metal of the side end electrode can pass through the front side. The end porous aluminum electrode is connected with the resistance layer, and the low resistance resistance layer is directly led out to form a new terminal electrode path, which can greatly reduce the material cost of the wafer resistor terminal electrode, and can completely overcome the problem of the original wafer resistance vulcanization. It can be effectively applied to automotive electronics, improve the anti-vulcanization ability of wafer resistors, and thus make the invention more progressive, more practical, and more in line with the needs of users. It has indeed met the requirements of the invention patent application, and has patented according to law. Application.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍;故,凡依本發明申請專利範圍及發明說明書內容所作之簡單的等效變化與修飾,皆應仍屬本發明專利涵蓋之範圍內。However, the above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto; therefore, the simple equivalent changes and modifications made in accordance with the scope of the present invention and the contents of the invention are modified. All should remain within the scope of the invention patent.

s101~s110‧‧‧步驟 S101~s110‧‧‧Steps

Claims (7)

【第1項】[Item 1] 一種車用抗硫化晶片電阻器之製造方法,係包括:
(A)端電極印刷及燒結:首先在一基板背面印刷形成二相間隔而互不連接之背面端電極,再於該基板正面印刷形成二相間隔而互不連接之正面端電極,之後將該基板送入燒結爐中進行600~900°C高溫燒結作業,使該背面端電極與該正面端電極能夠與該基板進行熔結;其中,該正面端電極係為低固含量之多孔性鋁電極;
(B)電阻層印刷及燒結:於該基板上二相間隔正面端電極之間印刷形成一電阻層,該電阻層之兩端部係延伸至該等正面端電極上,使得該電阻層之兩端部係搭接於該等正面端電極相間隔面之端部上,之後再將該基板送入燒結爐中進行600~900°C高溫燒結作業,俾使該電阻層能夠與該基板進行熔結;
(C)內塗層印刷與燒結:於完成燒結之電阻層上印刷形成一內塗層,且該內塗層之尺寸係小於該電阻層而不會接觸到該等正面端電極,使該電阻層之兩端部外露,之後再將該基板送入燒結爐中進行450~700°C高溫燒結作業,俾使該內塗層能夠與該電阻層進行熔結;
(D)鐳射切割:將該基板送入鐳射切割裝置,利用鐳射光於該內保護層上對該電阻層進行切割作業,於該電阻層之上切出所需形狀之調節槽以修整該電阻層之電阻值;
(E)外塗層印刷與燒結:於該內塗層表面上再印刷形成一外塗層,且該外塗層之尺寸與該內塗層相同,係小於該電阻層而不會接觸到該等正面端電極,使該電阻層之兩端部外露,之後再將該基板送入燒結爐中進行150~250°C燒結,俾使該外塗層能夠與該內塗層進行熔結,並藉由該內、外塗層構成一保護層;
(F)字碼層印刷:於該保護層上印刷有代表該晶片電阻之辨識字碼;
(G)折條:將呈片狀之基板送至滾壓裝置,利用滾壓分割方式,使該基板分裂成為條狀;
(H)端電極側導印刷:將折成條狀之基板兩側面印刷上導電材質,形成二側面端電極於該電阻層外露之兩端部上方,該等側面端電極係覆蓋該等正面端電極與該等背面端電極,之後再將完成端電極側導印刷之條狀基板送入燒結爐中進行150~250°C燒結,俾使該側導印刷後之側面端電極可與該正面端電極及該背面端電極進行熔結,使該基板同一側邊之該等正面端電極與該等背面端電極形成相互連接導通,該等側面端電極會接觸到該等正面端電極,並可透過以多孔性鋁為材質之正面端電極連接該電阻層;
(I)折粒:完成側面端電極燒結之條狀基板,再次利用滾壓裝置進行分割,將呈條狀之基板壓折,使相連之晶片電阻分成多數獨立且具有二正面端電極、二背面端電極、二側面端電極、一電阻層,及一包括內塗層與外塗層之保護層之粒狀體;以及
(J)電鍍:將形成為粒狀之晶片電阻送至電鍍槽進行電鍍作業,於晶片電阻導電材質之側面端電極外部鍍上一電鍍層,以製得車用抗硫化晶片電阻器。
A method for manufacturing a vulcanization resistant wafer resistor for a vehicle, comprising:
(A) End electrode printing and sintering: firstly, a back end electrode which is separated from each other and formed without two phases is printed on the back surface of the substrate, and a front end electrode which is not connected to each other is formed on the front surface of the substrate, and then the front end electrode is not connected to each other. The substrate is sent to a sintering furnace for performing a high-temperature sintering operation at 600 to 900 ° C, so that the back end electrode and the front end electrode can be sintered with the substrate; wherein the front end electrode is a low solid content porous aluminum electrode ;
(B) resistive layer printing and sintering: a resistive layer is printed on the substrate between the two-phase spaced front end electrodes, and the two ends of the resistive layer extend to the front end electrodes, so that the two resistive layers The end portion is overlapped on the end portion of the front end electrode spacing surface, and then the substrate is sent to a sintering furnace for high temperature sintering operation at 600 to 900 ° C, so that the resistance layer can be melted with the substrate. Knot
(C) inner coating printing and sintering: printing on the sintered resistive layer to form an inner coating layer, and the inner coating layer is smaller in size than the resistive layer without contacting the front end electrodes, so that the resistor The two ends of the layer are exposed, and then the substrate is sent to a sintering furnace for high-temperature sintering operation at 450-700 ° C, so that the inner coating layer can be sintered with the resistance layer;
(D) Laser cutting: the substrate is sent to a laser cutting device, and the resistive layer is cut on the inner protective layer by laser light, and a regulating groove of a desired shape is cut out over the resistive layer to trim the resistor The resistance value of the layer;
(E) overcoat printing and sintering: reprinting on the surface of the inner coating to form an outer coating, and the outer coating has the same size as the inner coating, and is smaller than the resistive layer without contacting the Waiting for the front end electrode to expose both ends of the resistive layer, and then feeding the substrate into a sintering furnace for sintering at 150 to 250 ° C, so that the outer coating layer can be sintered with the inner coating layer, and Forming a protective layer by the inner and outer coating layers;
(F) word layer printing: an identification code representing the resistance of the chip is printed on the protective layer;
(G) Folds: the substrate in the form of a sheet is sent to a rolling device, and the substrate is split into strips by a rolling division method;
(H) side electrode side guide printing: printing conductive materials on both sides of the strip-shaped substrate, forming two side end electrodes above the exposed end portions of the resistive layer, the side end electrodes covering the front ends Electrode and the back end electrodes, and then the strip substrate on which the end electrode side guide printing is completed is sent to the sintering furnace for sintering at 150 to 250 ° C, so that the side end electrode after the side guide printing can be connected to the front end The electrode and the back end electrode are sintered such that the front end electrodes on the same side of the substrate are electrically connected to the back end electrodes, and the side end electrodes are in contact with the front end electrodes and are transparent a front end electrode made of porous aluminum is connected to the resistance layer;
(I) Folding: the strip substrate which is sintered by the side end electrode is again divided by the rolling device, and the strip-shaped substrate is folded, so that the connected chip resistors are divided into many independent and have two front end electrodes and two back sides. a terminal electrode, two side end electrodes, a resistance layer, and a granular body including a protective layer of the undercoat layer and the overcoat layer; and (J) electroplating: feeding the wafer resistance formed into a granularity to the plating bath for plating In the operation, a plating layer is plated on the outside of the side electrode of the chip resistor conductive material to obtain a vulcanization resistant chip resistor for the vehicle.
【第2項】[Item 2] 依申請專利範圍第1項所述之車用抗硫化晶片電阻器之製造方法,其中,該基板之材質係為氧化鋁陶瓷基板。
The method for manufacturing a vulcanization resistant chip resistor for a vehicle according to the first aspect of the invention, wherein the material of the substrate is an alumina ceramic substrate.
【第3項】[Item 3] 依申請專利範圍第1項所述之車用抗硫化晶片電阻器之製造方法,其中,該保護層之尺寸係小於該電阻層至少1微米(μm)以上。The method for manufacturing a vulcanization resistant chip resistor for a vehicle according to claim 1, wherein the protective layer has a size smaller than the resistance layer by at least 1 micrometer (μm) or more. 【第4項】[Item 4] 依申請專利範圍第1項所述之車用抗硫化晶片電阻器之製造方法,其中,該二側面端電極係為銅、鎳、錫或其組合中選出之金屬電極。The method for manufacturing a vulcanization resistant chip resistor for a vehicle according to the first aspect of the invention, wherein the two side end electrodes are selected from the group consisting of copper, nickel, tin or a combination thereof. 【第5項】[Item 5] 依申請專利範圍第1項所述之車用抗硫化晶片電阻器之製造方法,其中,該內塗層之材質係為玻璃。The method for manufacturing a vulcanization resistant chip resistor for a vehicle according to claim 1, wherein the material of the undercoat layer is glass. 【第6項】[Item 6] 依申請專利範圍第1項所述之車用抗硫化晶片電阻器之製造方法,其中,該外塗層之材質係為環氧樹脂。The method for manufacturing a vulcanization resistant chip resistor for a vehicle according to the first aspect of the invention, wherein the material of the overcoat layer is an epoxy resin. 【第7項】[Item 7] 依申請專利範圍第1項所述之車用抗硫化晶片電阻器之製造方法,其中,該正面端電極係可進一步為高固含量之鋁電極,適用於高電阻值晶片電阻。The method for manufacturing a vulcanization resistant chip resistor for a vehicle according to claim 1, wherein the front end electrode is further a high solid content aluminum electrode suitable for high resistance wafer resistance.
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