TWI592241B - Method of constant laser beam terminal energy and processing system thereof - Google Patents

Description

Constant laser beam terminal energy method and processing system thereof

The present invention relates to a method of constant laser beam end energy, and more particularly to a method for constant beam laser end energy using adjustment of beam spacing.

In the existing laser processing system, the cost of the processing system using the mirror to guide the laser beam to the terminal irradiation position is relatively low compared to the fiber guide only in terms of its manufacturing cost; however, The invention only discusses and solves the problem of the prior art of using the mirror to guide the laser beam; first, the existing laser processing system using the mirror to guide the laser beam, when only When the same laser source is used to produce the same beam energy, the terminal irradiation position will be linearly displaced during processing (eg, single-axis back-and-forth displacement in a fixed range, displacement in a fixed range of the same plane, or displacement in a fixed range of three-dimensional space) Between the mirrors in the illumination position of the terminal and the corresponding mirrors, the pitch change is inevitably generated; however, the change in the pitch will cause significant differences and changes in the energy of the beam at different terminal illumination positions (ie: The smaller the spacing, the stronger the energy, and the larger the spacing, the weaker the energy. This will seriously affect the processed quality of the object to be processed; In order to improve the processing quality, how to balance the beam energy of the laser beam at different terminal irradiation positions is an important key factor for improving the processing quality.

In order to solve the problem that the beam irradiation energy is unstable due to the laser irradiation system in a wide range of different terminal irradiation positions, the current solutions of the relevant industry can be summarized into the following three categories: the first category, such as TW Patent Announcement No. 498004 Prior art, the prior art is mainly a laser processing head Move on top to achieve a wide range of processing; that is, the laser processing head above the prior art laser processing system must be considered to be free to move, but also must consider the design of the circuit, not only the structure is more complicated And the laser processing head with considerable weight has been shaken for a long time, which often causes the problem of the deviation of the focus of the laser beam, etc. In addition, because the volume of the prior art laser processing system is quite large, it not only takes up a lot of indoor space. And the manufacturing cost and the selling price of the laser processing system are both high, which is inconsistent with the market demand; the second type, as in the prior art of the TW Patent Publication No. M246083, the prior art mainly moves the object under the large range below. The way to achieve its wide range of processing; that is to say, if the object to be processed under the prior art laser processing system is to be freely movable, the area under the laser processing system must be very large, so Although there is no longer the problem of the complicated structure of the first type of prior art and the high defect rate caused by the shaking of the laser processing head of TW Patent Publication No. 498004, There is still a lack of volume, large proportion of indoor space, high material cost and high price, etc.; the third category, such as the prior art of TW Patent Publication No. I398060, is mainly controlled by a circuit. The energy output of the laser source is used to improve the energy required for different terminal illumination positions to achieve a constant purpose; therefore, the third type of prior art laser processing system of the third type can improve the existing two types of the existing The technology has a problem of high defect rate, excessive volume, and large proportion of indoor space caused by the shaking of the laser processing head. However, due to the high development cost and electronic component cost of the control circuit of the laser light source, it is implemented as a laser processing. The price of the system is also relatively high, still not in line with market demand. In summary, it can be clearly understood that the above three types of existing technologies still have their corresponding missing existence; therefore, if a substantial and effective solution can be found to meet all the existing shortcomings of the above various types of prior art, The demand of the market is indeed the top priority of the technology-related industry or the R&D personnel familiar with the technology.

The main object of the present invention is to solve the above-mentioned prior art laser beam terminal energy unevenness, resulting in a problem that the object to be processed has a high incidence of failure; The problem that the prior art laser processing system is too large and the structure is too complicated is solved. Furthermore, the problem that the manufacturing cost of the prior art laser processing system is high and the price is expensive is not in line with the market demand.

In accordance with the above objects, the present invention provides a method of constant laser beam end energy for energizing a constant laser beam at different terminal illumination locations; the method comprising: providing a laser source capable of illuminating a beam; providing a a terminal action unit capable of being displaced and receiving the light beam to be guided to the terminal illumination position; providing at least one pitch adjustment unit located in the beam path and linearly displaced; providing at least four interposed laser light sources and the terminal action unit And a reflector located in the beam path, wherein at least two or more of the plurality of reflection systems are fixed to the pitch adjustment unit, and the number of the two of the reflectors is used as a set of the pitch adjustment unit to calculate the quantity And each of the two sets of the beam path corresponding to the incident and adjustment unit is parallel to the displacement line of the pitch adjustment unit itself; and the spacing adjustment unit is maintained between the reflector corresponding to the outside thereof There is a fixed spacing for providing the spacing adjustment unit to form a reference line; a displacement of the terminal action unit is predetermined a maximum effective range, and calculating a maximum total distance and a position of the laser light source to the terminal action unit by using a coordinate axis formed by the beam path relative to the maximum range of action, and setting the reference point of the terminal action unit And calculating, according to the coordinate axis, a relative distance formed by the terminal when the terminal acting unit is displaced within the maximum range of motion, and then obtaining a relative distance sum value; and synchronizing the relative distance One-half of the total value is set as the total adjustment length of the pitch adjustment unit, and the adjustment total length is allocated according to the number of the pitch adjustment units, and the pitch adjustment unit is synchronously adjusted to make the pitch adjustment unit relative to the reference The total spacing formed by the lines is the same as the total length of the adjustment, and the spacing formed by the laser source from the laser source to the terminal action unit is always equal to the maximum total spacing.

Still further, the method of terminating the energy of a constant laser beam, wherein the tuning The total length of the section is equally distributed to the pitch adjustment unit according to the number of the pitch adjustment units for the adjustment operation.

Further, the method for terminating the energy of the constant laser beam, wherein the reflector in the pitch adjusting unit has a right angle formed by the angle formed by reflecting the reflected beam path.

In accordance with the above objects, the present invention provides a processing system for constant laser beam end energy, the processing system having a laser source capable of illuminating a beam of light, a terminal that is displaced and receives the beam and directed to the terminal illumination position a function unit and a control unit for controlling the action of the processing system; wherein the processing system further comprises at least one pitch adjustment unit located in the beam path and linearly displaced; at least four between the laser source and the terminal a reflector between the active cells and located in the beam path, wherein at least two or more of the reflective systems are fixed to the pitch adjusting unit, and each of the two reflectors is a set of the pitch adjusting unit Calculating the number, and each of the two beam paths corresponding to the incident and the corresponding ones of the spacing adjustment unit are parallel to the displacement line of the spacing adjustment unit itself; and the spacing adjustment unit is between the reflectors corresponding to the outside thereof Maintaining a fixed pitch that provides the pitch adjustment unit to form a reference line; and the processing system is also predetermined a maximum range of action of the displacement of the terminal unit, and calculating a maximum total distance and a position of the laser light source to the terminal acting unit with respect to a coordinate axis formed by the beam path relative to the maximum range of action, and setting the function as a terminal a reference point of the unit; that is, when the terminal action unit is controlled by the control unit to be displaced within the maximum range of motion, the control unit can synchronously obtain a relative distance with respect to the reference point along the coordinate axis, and The relative distance is summed to obtain a relative distance sum value, and then one-half of the relative distance sum is provided as the adjustment total length of the pitch adjusting unit, and is allocated according to the number of the spacing adjusting unit. Controlling the spacing adjustment unit to perform an adjustment operation, so that the total spacing formed by the spacing adjustment unit relative to the reference line is the same as the total adjustment length, that is, The distance formed by the laser source from the laser source to the terminal action unit is always equal to the maximum total pitch; the beam of the processing system is capable of having a constant energy at different terminal illumination positions.

Further, the processing system of the constant laser beam end energy, wherein the reflector is a total reflection mirror; and the terminal action unit is an optical focusing device; in addition, the reflection in the pitch adjustment unit The angle formed by the body and reflected from the path of the beam is a right angle.

Further, the processing system of the constant laser beam end energy, wherein the processing system is assembled on a body, and the base body further has a working unit that carries the terminal and is horizontally leveled on the body. Horizontal displacement of the displacement.

Further, the processing system of the constant laser beam end energy, wherein the base body further comprises at least one driving rod, a roller under the terminal acting unit and at least one shaft.

Further, the processing system of the constant laser beam terminal energy, wherein the terminal action unit has to achieve linear displacement by the horizontal displacement frame.

Further, the processing system of the constant laser beam end energy, wherein the horizontal displacement frame is connected with a vertical displacement frame which is horizontally displaced with the horizontal displacement frame and drives the terminal action unit to move up and down. .

Further, the processing system of the constant laser beam end energy, wherein the vertical displacement frame is provided with a driving device that drives the terminal action unit by a link connection and is synchronously displaced with the terminal action unit.

According to the above technical solution, the beneficial effects achieved by the present invention over the essence of the prior art are as follows: 1. The present invention can effectively improve the system performance by effectively limiting the terminal energy of the laser beam; 2. The structure of the processing system of the present invention is indeed Simplified to make the processing system The volume is relatively reduced, so that the proportion of the indoor space required for the erection of the processing system can be effectively reduced. Third, since the present invention simplifies the construction of the processing system, the failure rate of the processing system can be greatly reduced. It is more advantageous for the processing system to reduce manufacturing costs, increase production and lower the selling price, so the present invention can effectively meet the market quality and quantity requirements of the laser processing system.

10‧‧‧Processing system

11‧‧‧Control unit

20‧‧‧Laser light source

21‧‧‧ Beam

30‧‧‧pitch adjustment unit

40‧‧‧ reflector

50‧‧‧terminal action unit

60‧‧‧Maximum range of action

70‧‧‧ body

71‧‧‧ horizontal displacement frame

72‧‧‧Vertical displacement frame

73‧‧‧Drive rod

74‧‧‧Roller

75‧‧‧Tension shaft

80‧‧‧Drive device

81‧‧‧ linkage

90‧‧‧Processing objects

a, b, b1, b2, b3, c, L0‧‧ ‧ fixed spacing

B0‧‧‧ benchmark

B1‧‧‧ baseline

L1, L2‧‧‧ individual spacing

X, y, z‧‧‧ coordinate axis

X0, y0, z0‧‧‧ axial maximum spacing

X1, y1, z1‧‧‧ relative distance

1 is a top plan view of a first preferred embodiment of the present invention.

Fig. 2 is a schematic view showing the continuous operation of "Fig. 1" of the present invention.

Fig. 3 is a schematic view showing the continuous operation of "Fig. 2" of the present invention.

Fig. 4 is a perspective view showing the embodiment of Fig. 2 of the present invention.

Figure 5 is a top plan view of a second preferred embodiment of the present invention.

Fig. 6 is a schematic view showing the continuous operation of "Fig. 5" of the present invention.

Fig. 7 is a schematic view showing the continuous operation of "Fig. 6" of the present invention.

Fig. 8 is a top plan view showing another embodiment of the "Fig. 6" of the present invention.

Figure 9 is a top plan view of a third preferred embodiment of the present invention.

Fig. 10 is a schematic view showing the continuous operation of Fig. 9 of the present invention.

Figure 11 is a schematic view showing the continuous operation of Figure 10 of the present invention.

Fig. 12 is a top plan view showing another embodiment of the "Fig. 10" of the present invention.

Figure 13 is a top plan view of a fourth preferred embodiment of the present invention.

Fig. 14 is a schematic view showing the continuous operation of Fig. 13 of the present invention.

Fig. 15 is a schematic view showing the continuous operation of Fig. 14 of the present invention.

Fig. 16 is a perspective view showing the embodiment of Fig. 14 of the present invention.

Figure 17 is a perspective view showing the embodiment of the fifth preferred embodiment of the present invention.

Figure 18 is an isometric view of a sixth preferred embodiment of the present invention.

Fig. 19 is a schematic view showing the continuous operation of Fig. 18 of the present invention.

Fig. 20 is a schematic view showing the continuous operation of Fig. 19 of the present invention.

Fig. 21 is a perspective view showing the embodiment of Fig. 19 of the present invention.

The preferred embodiment and the detailed technical content of the method for processing the energy of the constant laser beam terminal according to the present invention and the processing system thereof are as follows. First, please refer to FIG. 1 to FIG. 4, which are schematic diagrams of a top view of the first preferred embodiment of the present invention, and a schematic diagram of the continuous action and the implementation state. As is apparent from the figures, the method of the present invention comprises: providing a laser source 20 capable of illuminating a beam 21; providing a terminal unit that is displaced and receives the beam 21 for guidance to the terminal illumination position 50; providing at least one pitch adjustment unit 30 located in the path of the light beam 21 and linearly displaceable; providing at least four reflectors 40 between the laser light source 20 and the terminal action unit 50 and located in the path of the light beam 21, At least two or more of the reflectors 40 are fixed to the pitch adjustment unit 30, and each of the two reflectors 40 is used as a set of the pitch adjustment unit 30 to calculate the number (where the figure The number of the spacing adjustment units 30 from 1" to "Fig. 4" is only one set; the calculation of the number of the spacing adjustment units 30 parallel in parallel in "Fig. 5" to "Fig. 8" is two groups, and The number of the spacing adjustment units 30 that are linearly displaced in different directions in FIG. 9 to FIG. 12 is of course two sets, and the path of the two beams 21 corresponding to each of the spacing adjustment units 30 is reflected and reflected. And the spacing adjustment unit 30 The straight line of the displacement is kept parallel; that is, the two reflectors 40 fixed to the spacing adjusting unit 30 are not necessary to form a right angle with the angle formed by the path of the reflected beam 21 (eg, As can be seen from Fig. 12, it can be achieved that the path of the two beams 21 reflected and reflected by the pitch adjusting unit 30 can be parallel to the line of displacement of the pitch adjusting unit 30 itself, but For the convenience of implementation, it is preferable to form a right angle; and the gap adjusting unit 30 and the reflector 40 corresponding thereto are maintained to provide a space therebetween. The fixing unit 30 forms a fixed pitch L0 of the reference line B1; that is, the spacing adjusting unit 30 has the fixed spacing L0 between the reflector 40 and the reflector 40 for external reflection, and the spacing adjusting unit 30 is opposite to the The pitch of the reference line B1 is calculated; a maximum range 60 of displacement of the terminal action unit 50 is predetermined, and the beam is calculated by the coordinate axis x-axis and the coordinate axis y-axis formed by the beam 21 path relative to the maximum range 60; The maximum total distance and location of the light source 20 to the terminal action unit 50 are set as the reference point B0 of the terminal action unit 50; along the coordinate axis x-axis and the coordinate axis y-axis are calculated as the terminal action unit 50, when the displacement is within the maximum range of action 60, relative to the relative distance formed by the reference point B0, and then summed to obtain a relative distance summed value (as shown in FIG. 2 to FIG. 4). After 30 displacements, a relative distance x1 and a relative distance y1) are formed; and, the relative distance is synchronized (as shown in FIG. 2 to FIG. 4), and the spacing adjustment unit 30 is displaced to form a relative distance x1 and A relative distance y1) plus one-half of the total value is set as the total adjustment length L of the pitch adjusting unit 30 (in order to facilitate the description of the following formula, the present invention will add the symbol "L" or the following to the total length of the adjustment. It is only simplified to "L", and the total length L is allocated according to the number of the spacing adjustment units 30 (the number of the spacing adjustment units 30 in the "FIG. 1" to "FIG. 4" is only one set). Synchronization causes the pitch adjustment unit 30 to perform an adjustment operation of the individual pitch L1 such that the total pitch (the individual pitch L1) formed by the pitch adjustment unit 30 with respect to the reference line B1 is the same as the adjustment total length L (so, "FIG. 1" ~ "FIG. 4", only one set of the pitch adjustment unit 30 is formed at a pitch with respect to the reference line B1, that is, the same as the adjustment total length L, and the light beam 21 is caused by the laser light source 20 to the terminal action unit 50. The resulting spacing is always equivalent to the maximum total spacing. It is worth mentioning that, as can be clearly seen from Fig. 1, the maximum total spacing = fixed spacing a + fixed spacing L0 + fixed spacing b + fixed spacing L0 + fixed spacing c + axial maximum spacing x 0 + axial maximum spacing y0; After the displacement of the terminal action unit 50, the distance between the coordinate axis x and the coordinate axis y two axial directions relative to the reference point B0 (the relative distance x1 and the relative distance y1) is added, which is the pitch of the present invention. The adjustment unit 30 is opposite to the reference line B1 The individual spacing L1 (since the individual spacing L1 already contains the length of the path of the two segments of the beam 21, it is equal to the relative distance x1 and the relative distance y1 plus one-half of the total value). Therefore, when the terminal action unit 50 is displaced within the maximum range of motion 60 as shown in FIG. 2 to FIG. 4, it can be known that the adjusted total length L of the pitch adjustment unit 30 is equal to the individual pitch L1, which is equal to The relative distance x1 is added to the relative distance y1 by a factor of two. However, in "Fig. 1" to "Fig. 4", if the method of the present invention is represented by only the symbols in the drawings, it can be simplified to the formula (1): L = L1 = (x1 + y1) / 2

Where 0≦x1<x0; and 0≦y1<y0

Please also refer to FIG. 5 to FIG. 8 for a schematic view of a top plan view and a continuous operation diagram thereof according to a second preferred embodiment of the present invention, and FIG. 9 to FIG. A schematic top plan view of a third preferred embodiment of the present invention and a schematic diagram of its continuous operation. The second and third preferred embodiments of the present invention differ from the first preferred embodiment of the present invention in that the adjustment total length L is assigned according to the number of the spacing adjustment units 30 and the spacing adjustment unit 30 is synchronized. The adjustment operation of the individual spacing L1 and the individual spacing L2 (wherein the number of the spacing adjusting units 30 are both in the "Fig. 5" to "Fig. 12"), so that the spacing adjusting unit 30 is opposite to the reference line B1 The total pitch formed is the same as the total length L of the adjustment (therefore the individual spacing L1 and the individual spacing L2 of the spacing adjustment unit 30 of the two groups in the "Fig. 6" to "Fig. 8" and "Fig. 10" to "Fig. 12" The total sum L is the same as the total length L of the adjustment, and the total adjustment length L of "Fig. 6", "Fig. 7" and "Fig. 10" to "Fig. 12" is equally distributed to the individual spacing L1 and the individual spacing L2, The "FIG. 8" shows that the adjustment total length L is not evenly distributed to the individual spacing L1 and the individual spacing L2), and the beam 21 is formed by the laser source 20 to the terminal action unit 50. The spacing is always equal to the maximum total spacing. It is worth mentioning that, from Fig. 6 to Fig. 8 and Fig. 10 to Fig. 12, the end effect unit 50 is displaced from the coordinate axis x and the coordinate axis y to the reference point. The distance length of B0 (the relative distance x1 and the relative distance y1) is one-half of the sum, that is, the hair The adjustment total length L of the spacing adjustment unit 30 (that is, the individual spacing L1 is added to the individual spacing L2). Therefore, when the terminal action unit 50 is displaced within the maximum range of motion 60 as shown in FIG. 6 to FIG. 8 and FIG. 10 to FIG. 12, the pitch adjustment unit 30 is required to be known. Adjusting the total length L is equal to the individual spacing L1 plus the individual spacing L2, which is equal to the relative distance x1 and the relative distance y1 summed up by one-half. However, in "Fig. 5" to "Fig. 12", if the method of the present invention is represented by only the symbols in the drawings, it can be simplified to the formula (2): L = (L1 + L2) = (x1 + y1) )/2

Where 0≦x1<x0; and 0≦y1<y0

And wherein 0≦L1≦(x1+y1)/2; and 0≦L2≦(x1+y1)/2

That is to say, after determining the distance allocated to the individual spacing L1, the distance that the individual spacing L2 can be allocated is only the distance of the adjustment total length L minus the individual spacing L1.

Or in the formula (2), L1=L2; that is, wherein the adjustment total length L can be equally distributed to the individual spacing L1 and the individual spacing L2 according to the number of the spacing adjusting units 30 (FIG. In the formula, the two spacing adjustment units 30 are taken as an example, so that the total length L of the adjustment is divided by 2, that is, the individual spacing). It is worth mentioning that if the total length L of the adjustment is not necessary, the designer can design different distances according to the requirements of the size, shape or position of the finished product, and the emphasis is on the individual spacing L1 and the individual spacing. After L2 is added, it needs to be equal to the total length L of the adjustment.

Please also refer to FIG. 13 to FIG. 16 for a schematic view of a top view of the fourth preferred embodiment of the present invention, and a schematic diagram of its continuous operation and implementation; and FIG. 17 A perspective view of an embodiment of the fifth preferred embodiment of the present invention. Similarly, as shown in the figure, a maximum effective range 60 of the displacement of the terminal action unit 50 is first determined, and the laser light source 20 is calculated by the coordinate axis x axis formed by the path of the light beam 21 with respect to the maximum effective range 60. The maximum total spacing and location of the terminal action unit 50 is set as the reference point B0 of the terminal action unit 50; and the relative distance is synchronized (as shown in FIG. 14 to FIG. 17). spacing After the displacement of the adjusting unit 30, only one relative distance x1) is added, so that only one-half of the relative distance x1 is set as the total adjustment length L of the spacing adjusting unit 30 (that is, the individual spacing L1), and The number of the spacing adjustment units 30 (the number of the spacing adjustment units 30 in the "FIG. 14" to "FIG. 17" is only one set) is allocated to the adjustment total length L and the spacing adjustment unit 30 is synchronized to perform the individual spacing L1. The adjustment operation is such that the total distance formed by the pitch adjustment unit 30 with respect to the reference line B1 is the same as the total adjustment length L (so that only one of the "pitch adjustment units 30" of the "FIG. 14" to "FIG. 17" is formed. The individual spacing L1 is the same as the total adjustment length L, and the spacing formed by the laser beam 20 from the laser source 20 to the terminal action unit 50 is always equal to the maximum total spacing. It is worth mentioning that, similarly, one-half of the distance length (the relative distance x1) of the coordinate axis x axial direction relative to the reference point B0 after the displacement of the terminal action unit 50 is the pitch adjustment unit 30 of the present invention. The adjustment total length L (since the individual spacing L1 already contains the length of the path of the two segments of the beam 21, it is equal to equal to one-half of the relative distance x1). Therefore, when the terminal action unit 50 is displaced within the maximum range of motion 60 as shown in FIG. 14 to FIG. 17, it can be known that the adjusted total length L of the pitch adjustment unit 30 is equal to the individual pitch L1, which is equal to the Relative distance x1 is one-half. However, in "Fig. 13" to "Fig. 17", if the method of the present invention is represented by only the symbols in the drawings, it can be simplified to the equation (3): L = L1 = x1/2

Where 0≦x1<x0

Please also refer to FIG. 18 to FIG. 21 for an isometric view of the sixth preferred embodiment of the present invention, and a schematic diagram of the continuous operation and the embodiment. Similarly, as shown in the figure, a maximum effective range 60 of the displacement of the terminal action unit 50 is first determined, and the coordinate axis x-axis, the coordinate axis y-axis and the coordinate axis z-axis formed by the beam 21 path relative to the maximum range of action 60 are Calculating the maximum total distance and location of the laser source 20 to the terminal action unit 50, and setting it as the reference point B0 of the terminal action unit 50; and synchronizing the relative distance (as shown in FIG. 19) "Figure 21" As shown, the spacing adjustment unit 30 is displaced to form a relative distance x1, a relative distance y1 and a relative distance z1), and one-half of the total value is set as the total adjustment length L of the spacing adjustment unit 30, and according to the spacing The number of adjustment units 30 (the number of the spacing adjustment units 30 in the "FIG. 19" to "FIG. 21" is only one set) is assigned to the adjustment total length L and the adjustment of the spacing adjustment unit 30 to the individual spacing L1 is synchronized. The total spacing formed by the spacing adjustment unit 30 with respect to the reference line B1 is the same as the total adjustment length L (so that only one of the spacing adjustment units 30 of the "FIG. 19" to "FIG. 21" forms the individual. The pitch L1 is the same as the total length L of the adjustment, and the spacing formed by the laser beam 20 from the laser source 20 to the terminal action unit 50 is always equal to the maximum total pitch. Similarly, after the terminal action unit 50 is displaced, the distance length between the coordinate axis x, the coordinate axis y, and the coordinate axis z of the three axes relative to the reference point B0 (the relative distance x1, the relative distance y1 and the relative distance z1) are added. One-half, that is, the adjusted total length L of the pitch adjusting unit 30 of the present invention (since the individual spacing L1 already includes the length of the path of the two segments of the light beam 21, it is equal to the relative distance x1, the relative distance y1 and Add one-half of the total value). Therefore, when the terminal action unit 50 is displaced within the maximum range of motion 60 as shown in FIG. 19 to FIG. 21, it can be known that the adjusted total length L of the pitch adjustment unit 30 is equal to the individual pitch L1, which is equal to the The relative distance x1, the relative distance y1 and the relative distance z1 are summed up by one-half. However, in "Fig. 18" to "Fig. 21", if the method of the present invention is represented by only the symbols in the drawings, it can be simplified to the equation (4): L = L1 = (x1 + y1 + z1) / 2

Where 0≦x1<x0; and 0≦y1<y0; and 0≦z1<z0

According to the disclosure of the above formula (1) to the formula (4), the method of the present invention can extend the following standard formula: L=(L1+L2+...+Ln)=(x1+y1+z1) )/2

Where 0≦x1<x0; and 0≦y1<y0; and 0≦z1<z0

And wherein 0≦L1, L2,... or Ln≦(x1+y1+z1)/2

Similarly, L1, L2, ... Ln can be inferred according to the formula (2) to know how to allocate it, so it will not be repeated here; and the standard formula may also be L1=L2=...=Ln; That is to say, wherein the total length L of the adjustment is evenly distributed according to the number of the spacing adjustment units 30 (so when the spacing adjustment unit 30 has n, the adjustment total length L is conveniently divided by n, that is Individual spacing). It is worth mentioning that if the total length L of the adjustment is not necessary, the designer can design different spacings according to the requirements of the size, shape or position of the finished product, and the emphasis is on the individual spacing L1 to the individual spacing. After Ln is added, it needs to be equal to the total length L of the adjustment. Of course, it is known from the above formula that the designer can select the end effect unit 50 that is only displaced by the x-axis linearity, or the terminal that is displaced by the x-axis and the y-axis two-dimensional plane, depending on the processing property and the demand. The processing unit 10 is implemented by the action unit 50, or the end effect unit 50 of the x-axis, the y-axis and the z-axis three-dimensional spatial displacement; the pitch adjustment unit can be further shaped according to the actual shape of the processing system 10. 30 sets the appropriate amount. For example, the standard formula of the method of the present invention: L = (L1 + L2 + ... + Ln) = (x1 + y1 + z1) / 2; when the design is as shown in "Figure 2", then L2 ~ Ln Both are 0, and z1 is also 0, so the standard formula is: Br=(L1+0)=(x1+y1+0)/2 is equivalent to the formula (1): L=L1=(x1+ Y1)/2; when the design is as shown in "Figure 6", "Figure 8", "Figure 10" and "Figure 12", then L3~Ln are all 0, and z1 is also 0, so after bringing in The standard formula: L = (L1 + L2 + 0) = (x1 + y1 + 0) / 2 is equivalent to the formula (two): L = (L1 + L2) = (x1 + y1) / 2; when the design is like " As shown in Fig. 14", L2~Ln are all 0, and y1 and z1 are also 0, so the standard formula is: L=(L1+0)=(x1+0+0)/2 Equivalent to the formula (3): L=L1=x1/2; Finally, when the design is as shown in Fig. 19, then L2~Ln are all 0, so the standard formula is: L=(L1+0) )=(x1+y1+z1)/2 is equivalent to the formula (4): L=L1=(x1+y1+z1)/2; therefore, the standard equations can be equivalent to each other after being brought into the respective embodiments. (1) The formula (4), if it is ok, the method of the present invention does apply to the various embodiments and aspects.

Referring to FIG. 4 again, a perspective view of an embodiment of the first preferred embodiment of the present invention, FIG. 2, is shown. As can be clearly seen, the processing system 10 is provided with a laser source 20 that emits a beam of light 21, a terminal action unit 50 that is displaced and receives the beam 21 for guidance to the terminal illumination position (eg, : an optical focusing device) and a control unit 11 (eg, a programmable controller CPU) that controls the operation of the processing system 10; wherein the processing system 10 further includes at least one pitch adjustment in the path of the beam 21 and linear displacement a unit 30; and five reflectors 40 (eg, total reflection mirrors) between the laser light source 20 and the terminal action unit 50 and located in the path of the light beam 21, wherein two of the reflectors 40 are fixed to The spacing adjustment unit 30 is such that the number of the spacing adjustment units 30 in the "FIG. 4" is only one set, and the path of the two beams 21 that are incident and reflected by the spacing adjustment unit 30 and the spacing adjustment unit 30 are The straight line of the displacement is kept parallel; that is, the two reflectors 40 fixed to the spacing adjusting unit 30 are not necessary to form a right angle with the angle formed by the path of the reflected beam 21 (eg, "Figure 12 As can be seen, as long as the path of the two beams 21 reflected and reflected by the pitch adjusting unit 30 can be kept parallel with the line of displacement of the pitch adjusting unit 30 itself, in order to implement Conveniently, the right angle is preferably formed; and the spacing adjustment unit 30 and the reflector 40 corresponding thereto are maintained with a fixed distance L0 for providing the spacing adjustment unit 30 to form the reference line B1; that is, The spacing adjustment unit 30 has the fixed spacing L0 between the reflector 40 and the reflector 40 for external reflection, and the spacing adjustment unit 30 is calculated with the spacing of the reference line B1; and the processing system 10 is further configured with the The maximum effective range 60 of the displacement of the terminal action unit 50, and calculating the maximum total distance of the laser light source 20 to the terminal action unit 50 by the coordinate axis x-axis and the coordinate axis y-axis formed by the path of the light beam 21 relative to the maximum range of action 60 And the location is set as the reference point B0 of the terminal action unit 50; therefore, when the terminal action unit 50 is controlled by the control unit 11 and is displaced within the maximum range 60 The control unit 11, i.e., along the coordinate axis is the x axis and y-axis of the coordinate axes to obtain relative synchronization of the reference point B0 distance x1 is formed from the opposite From y1, sum the relative distance x1 and the relative distance y1 to obtain a relative distance sum value (x1+y1), and then add the relative distance to the total value (x1+y1) by one-half [( X1+y1)/2] is provided as the adjustment total length L of the pitch adjustment unit 30, and is allocated according to the number of the pitch adjustment units 30 (here only one set) and the pitch adjustment unit 30 is controlled to perform one different The adjustment action of the spacing L1 is such that the total spacing formed by the spacing adjustment unit 30 relative to the reference line B1 is the same as the total adjustment length L (also the individual spacing L1), that is, the beam 21 is caused by the laser source 20 The spacing formed by the terminal action unit 50 is always equal to the maximum total pitch; if so, the beam 21 of the processing system 10 is capable of having constant energy at different terminal illumination positions; wherein the processing system 10 is assembled The body 70 is further provided with a horizontal displacement frame 71 carrying the terminal action unit 50 and horizontally displaced horizontally on the base body 70, and the terminal action unit 50 is provided by the horizontal displacement frame. The design and support of the 71 achieves a linear displacement.

In addition, please refer to FIG. 16 again, which is a perspective view of an embodiment of the fourth preferred embodiment of the present invention. As can be clearly seen, the processing system 10 is provided with a laser source 20 that emits a beam of light 21, a terminal action unit 50 that is displaced and receives the beam 21 for guidance to the terminal illumination position (eg, : an optical focusing device) and a control unit 11 (eg, a programmable controller CPU) that controls the operation of the processing system 10; wherein the processing system 10 is assembled on a body 70, and the base 70 further has a horizontal displacement frame 71 carrying the terminal action unit 50 and linearly displaced on the base body 70, and the terminal action unit 50 is linearly displaced by the design and support of the horizontal displacement frame 71; The base 70 is further provided with at least one driving rod 73, a drum 74 located under the terminal action unit 50 and at least one force shaft 75. The processing system 10 can drive a bearing by the driving rod 73. The object to be processed 90 is continuously displaced downward on the drum 74 and is a workpiece 90 of a soft material. When the object 90 is displaced downward, it is generated in the axial direction of the coordinate axis y with respect to the terminal action unit 50. Displacement, and Tension rod 75 by a shaft of the tension applying means 50 so that the terminal can be in any of the processing object 90 Cut or engrave at the desired position. In addition, the processing system 10 further includes a pitch adjustment unit 30 located in the path of the light beam 21 and linearly displaced; and five interposed between the laser light source 20 and the terminal action unit 50 and located in the path of the light beam 21. The reflector 40 (such as a total reflection mirror), wherein two of the reflectors 40 are fixed to the spacing adjustment unit 30, so the number of the spacing adjustment units 30 of the "FIG. 16" is only one group, and the spacing is adjusted. The path of the two beams 21 corresponding to the incident and reflected by the unit 30 is parallel to the line of displacement of the pitch adjusting unit 30 itself; for the convenience of implementation, it is preferable to form a right angle; and the pitch adjusting unit 30 is Between the reflectors 40 corresponding to the outside, there is maintained a fixed pitch L0 for providing the pitch adjusting unit 30 to form the reference line B1; that is, between the spacing adjusting unit 30 and the reflector 40 for externally corresponding reflection Having the fixed pitch L0, and the pitch adjusting unit 30 is calculated with a pitch relative to the reference line B1; and the processing system 10 is further predetermined to have a maximum range of action of the terminal acting unit 50. The maximum total distance and position of the laser light source 20 to the terminal action unit 50 are calculated by the path of the beam 21 relative to the coordinate axis x axis formed by the maximum range 60, and is set as the reference point B0 of the terminal action unit 50. Therefore, when the terminal action unit 50 is controlled by the control unit 11 to be displaced within the maximum range of motion 60, the control unit 11 can synchronously obtain a relative distance x1 with respect to the reference point B0 along the coordinate axis x-axis. And the relative distance x1 is summed (only the relative distance x1 is used in the present embodiment, so the relative distance x1 is also added after the summation) to obtain a relative distance total value x1, and then the relative distance is added to the total value. One-half (x1/2) of x1 is provided as the adjustment total length L of the pitch adjustment unit 30, and is allocated according to the number of the pitch adjustment units 30 (here only one set) to control the pitch adjustment unit 30, the adjustment operation of the individual spacing L1 is performed, and the total spacing formed by the spacing adjustment unit 30 and the reference line B1 is the same as the total adjustment length L (also equivalent to the individual spacing L1), that is, the beam 21 is caused by the laser. Light source 20 to the end Spacing means 50 formed action always equal to the maximum total distance; if so, to reach the machining system 21 of the beam 10 are different to the irradiation position of the terminal having a constant energy.

It is worth mentioning that, in order to more clearly illustrate the processing system of the constant laser beam end energy of the present invention, please refer to FIG. 17 for a schematic perspective view of the fifth preferred embodiment of the present invention. As can be clearly seen from the figure, the embodiment of the present embodiment differs from the embodiment of the fourth preferred embodiment of FIG. 16 in that the designer can adapt to the actual processing requirements and the size, shape or shape of the processing system 10. After the position of the laser light source 20 and the terminal action unit 50 (eg, optical focusing device) is changed, only four positions between the laser light source 20 and the terminal action unit 50 are required. The reflector 40 (e.g., a total reflection mirror) can achieve the present invention.

Please refer to FIG. 21 again, which is a perspective view showing an embodiment of the sixth preferred embodiment of the present invention. As can be clearly seen, the processing system 10 is provided with a laser source 20 that emits a beam of light 21, a terminal action unit 50 that is displaced and receives the beam 21 for guidance to the terminal illumination position (eg, : an optical focusing device) and a control unit 11 (eg, a programmable controller CPU) that controls the operation of the processing system 10; wherein the processing system 10 is assembled on a body 70, and the base 70 further has There is a horizontal displacement frame 71 that carries the terminal action unit 50 and is horizontally displaced horizontally on the base body 70, and the terminal action unit 50 is linearly displaced by the design and support of the horizontal displacement frame 71. The horizontal displacement frame 71 is connected to a vertical displacement frame 72 which is horizontally displaced in synchronization with the horizontal displacement frame 71 and drives the terminal action unit 50 to move up and down. The processing system 10 further includes at least one light beam. a 21-path and linearly displaced pitch adjustment unit 30; and five reflectors 40 (eg, total reflection mirrors) between the laser source 20 and the terminal action unit 50 and located in the path of the beam 21, wherein The two kinds of the reflectors 40 are fixed to the pitch adjusting unit 30. Therefore, the number of the pitch adjusting units 30 of the "FIG. 21" is only one set, and the two correspondingly incident and reflected by the spacing adjusting unit 30 are The path of the beam 21 is parallel to the line of displacement of the pitch adjusting unit 30 itself; for the convenience of implementation, it is preferable to form a right angle; and the spacing adjusting unit 30 is maintained between the reflector 40 corresponding to the outside thereof. There is a fixing for providing the spacing adjustment unit 30 to form the reference line B1. a spacing L0; that is, the spacing adjustment unit 30 has the fixed spacing L0 between the reflector 40 and the reflector 40 for external reflection, and the spacing adjustment unit 30 is calculated with a spacing from the reference line B1; The processing system 10 further defines a maximum effective range 60 of the displacement of the terminal action unit 50, and calculates the laser light source by the coordinate axis x-axis, the coordinate axis y-axis and the coordinate axis z-axis formed by the beam 21 path relative to the maximum range of action 60. The maximum total distance and position of the terminal action unit 50 is set to the reference point B0 of the terminal action unit 50; therefore, when the terminal action unit 50 is controlled by the control unit 11 and is displaced within the maximum range 60 The control unit 11 is configured to obtain a relative distance x1, a relative distance y1 and a relative distance z1 formed relative to the reference point B0 along the coordinate axis x-axis and the coordinate axis y-axis, and the relative distance z1. X1, the relative distance y1 is summed with the relative distance z1 to obtain a relative distance sum value (x1+y1+z1), and then the relative distance is added to one-half of the total value (x1+y1+z1) [ (x1+y1+z1 /2] provides the adjustment total length L of the pitch adjustment unit 30, and allocates according to the number of the pitch adjustment units 30 (here only one set) and controls the pitch adjustment unit 30 to adjust the individual pitch L1. The total spacing (ie, the individual spacing L1) formed by the spacing adjustment unit 30 relative to the reference line B1 is the same as the total adjustment length L, that is, the beam 21 is caused by the laser source 20 to the terminal action unit 50. The resulting spacing is always equal to the maximum total spacing; if so, the beam 21 of the processing system 10 is achieved to have a constant energy at different terminal illumination locations. In addition, it is worth mentioning that the vertical displacement frame 72 is provided with a driving device 80 that is connected to the terminal action unit 50 by the connecting rod 81 and is displaced synchronously with the terminal action unit 50.

In summary, the present invention does improve the system performance by effectively reducing the terminal energy of the constant laser beam; and the configuration of the processing system 10 of the present invention is indeed simplified, so that the volume of the processing system is relatively reduced, thereby effectively reducing the The proportion of the indoor space required for the processing system to be erected; furthermore, since the present invention does simplify the construction of the processing system, the processing system 10 The failure rate can be greatly reduced, which is more conducive to the processing system 10 to reduce manufacturing costs, increase production and lower the selling price, so the present invention can effectively meet the market quality and quantity requirements of the laser processing system.

The present invention has been described in detail above, but the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the scope of the embodiments of the present invention. Modifications are still within the scope of the patents of the present invention.

20‧‧‧Laser light source

21‧‧‧ Beam

30‧‧‧pitch adjustment unit

40‧‧‧ reflector

50‧‧‧terminal action unit

60‧‧‧Maximum range of action

a, b, c, L0‧‧‧ fixed spacing

B0‧‧‧ benchmark

B1‧‧‧ baseline

L1‧‧‧ individual spacing

X, y, z‧‧‧ coordinate axis

X1, y1, z1‧‧‧ relative distance

Claims (10)

A method for constant end energy of a laser beam for energy of a constant laser beam at different terminal illumination locations; the method comprising: providing a laser source (20) capable of illuminating a beam (21); providing Displacement and receiving the beam (21) to the terminal action unit (50) of the terminal illumination position; providing at least one pitch adjustment unit (30) located in the path of the beam (21) and linearly displaced; providing at least four a reflector (40) between the laser light source (20) and the terminal action unit (50) and located in the path of the light beam (21), wherein at least two or more of the reflectors (40) are secured The spacing adjustment unit (30) is arranged, and each of the two reflectors (40) is used as a group of the spacing adjustment unit (30) to calculate the quantity, and each group of the spacing adjustment unit (30) corresponds to the shot. The two beams (21) path in and out are kept parallel to the line of displacement of the pitch adjusting unit (30) itself; and the spacing adjusting unit (30) is between the reflector (40) corresponding to the outside thereof Maintaining a fixed line (B1) for providing the pitch adjustment unit (30) Distance (L0); a maximum effective range (60) of the displacement of the terminal action unit (50) is predetermined, and the laser (21) path is calculated relative to the coordinate axis formed by the maximum effective range (60) The maximum total distance and position of the light source (20) to the terminal action unit (50), and set it as a reference point (B0) of the terminal action unit (50); synchronously calculate the action unit along the coordinate axis (50) a relative distance summed with respect to the relative distance formed by the reference point (B0) when the displacement is within the maximum range of action (60), and a relative distance summation value is obtained; and the relative distance is added to the total value. One-half is set to the adjustment of the pitch adjustment unit (30) The total length of the section is allocated according to the number of the spacing adjustment unit (30), and the adjustment adjustment unit (30) is synchronized to perform the adjustment operation, so that the spacing adjustment unit (30) is opposite to the reference line (B1) The total spacing formed is the same as the total length of the adjustment, and the spacing formed by the beam (21) from the laser source (20) to the terminal action unit (50) is always equal to the maximum total spacing. The method of claiming a constant laser beam end energy according to claim 1, wherein the adjustment total length is equally distributed to the spacing adjustment unit (30) for adjustment according to the number of the spacing adjustment units (30) action. The method of claiming the energy of the constant laser beam end according to claim 1 or 2; wherein the reflector (40) in the pitch adjusting unit (30) injects and reflects the beam (21) The angle formed by the path is a right angle. A processing system for constant laser beam end energy, the processing system (10) having a laser source (20) capable of illuminating a beam (21), being displaced and receiving the beam (21) a terminal action unit (50) for the terminal illumination position and a control unit (11) for controlling the operation of the processing system (10); characterized in that the processing system (10) further comprises at least one path located in the light beam (21) a pitch adjustment unit (30) capable of linear displacement; at least four reflectors (40) interposed between the laser light source (20) and the terminal action unit (50) and located in the path of the light beam (21), wherein at least Two or more even-numbered reflectors (40) are fixed to the pitch adjustment unit (30), and the number of the two-dimensional reflectors (40) is calculated as a set of the pitch adjustment units (30). And each of the two sets of the beam (21) path corresponding to the incident and adjustment unit (30) is parallel to the displacement line of the pitch adjustment unit (30) itself; and the pitch adjustment unit (30) A gap adjustment unit (30) is provided between the reflector (40) corresponding to the outside thereof. a fixed pitch (L0) of the reference line (B1); and the processing system (10) is further predetermined to have a maximum effective range (60) of displacement of the terminal action unit (50), and the beam (21) path is opposite to the maximum Range of action (60) The formed coordinate axis calculates the maximum total distance and position of the laser light source (20) to the terminal action unit (50), and is set as a reference point (B0) of the terminal action unit (50); When the terminal action unit (50) is controlled by the control unit (11) to be displaced within the maximum range (60), the control unit (11) can synchronously acquire the reference point (B0) along the coordinate axis. Forming a relative distance, and summing the relative distances to obtain a relative distance summing value, and then providing one-half of the relative distance plus the total value as the adjustment total length of the spacing adjusting unit (30), and The number of the spacing adjustment units (30) is distributed to control the spacing adjustment unit (30) to perform an adjustment operation, so that the total spacing formed by the spacing adjustment unit (30) relative to the reference line (B1) is the same as the total length of the adjustment. That is, the distance formed by the laser beam (21) from the laser source (20) to the terminal action unit (50) is always equal to the maximum total pitch; the beam (21) of the processing system (10) is achieved. Different terminal illumination positions have a constant energy. a processing system for constant laser beam end energy according to claim 4; wherein the reflector (40) is a total reflection mirror; and the terminal action unit (50) is an optical focusing device; The reflector (40) in the pitch adjustment unit (30) is at a right angle to the angle formed by the path of the reflected beam (21). A processing system for constant laser beam end energy according to claim 4 or 5; wherein the processing system (10) is assembled on a body (70), and the base (70) is further provided There is a horizontal displacement frame (71) carrying the terminal action unit (50) and being horizontally displaced horizontally on the seat body (70). A machining system for constant laser beam end energy according to claim 6; wherein the base (70) further comprises at least one driving rod (73) and one below the terminal acting unit (50) The drum (74) is coupled to at least one shaft (75). A machining system for constant laser beam end energy as described in claim 6; wherein the terminal action unit (50) is linearly displaced by the horizontal displacement frame (71). The processing system of the constant laser beam terminal energy according to claim 8; wherein the horizontal displacement frame (71) is connected at both ends to be horizontally displaced with the horizontal displacement frame (71) and is driven. The terminal acts on the vertical displacement frame (72) of the unit (50) moving up and down. The processing system of the constant laser beam terminal energy according to claim 9; wherein the vertical displacement frame (72) is provided with a connecting rod (81) connecting the terminal acting unit (50) and obtaining The terminal action unit (50) drives the displacement device (80).