TWI589614B - Resin composition - Google Patents

Resin composition Download PDF

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TWI589614B
TWI589614B TW102114234A TW102114234A TWI589614B TW I589614 B TWI589614 B TW I589614B TW 102114234 A TW102114234 A TW 102114234A TW 102114234 A TW102114234 A TW 102114234A TW I589614 B TWI589614 B TW I589614B
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resin composition
resin
compound
mass
epoxy
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TW102114234A
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TW201345941A (en
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Mineo Nouchi
Hisashi Tabata
Kiyonori Furuta
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Ajinomoto Kk
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L47/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/58Epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67Unsaturated compounds having active hydrogen
    • C08G18/69Polymers of conjugated dienes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/66Mercaptans
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/36Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37Thiols
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/844Encapsulations
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/002Physical properties
    • C08K2201/005Additives being defined by their particle size in general
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13069Thin film transistor [TFT]

Description

樹脂組成物 Resin composition

本發明係關於樹脂組成物。詳言之,係關於適於作為各種技術領域之裝置、器件(device)、構件等中之表面保護或絕緣用之材料的樹脂組成物。 The present invention relates to a resin composition. More specifically, it relates to a resin composition suitable for use as a material for surface protection or insulation in devices, devices, members, and the like in various technical fields.

近年來,於有機EL顯示器、電子紙等各種顯示裝置之領域中使用有機半導體層之薄膜電晶體(TFT)備受矚目,並稱為有機TFT。有機TFT作為置換使用無機半導體層之以往的無機TFT之器件正被看好,至於其用途,列舉有前述之顯示裝置等各種電子設備。由於與無機TFT比較,無機TFT可在比蒸鍍法等更低之溫度下形成有機半導體層,故期待可將TFT安裝於耐熱性較低之塑膠膜等基材上。 In recent years, thin film transistors (TFTs) using an organic semiconductor layer in the field of various display devices such as organic EL displays and electronic papers have been attracting attention, and are called organic TFTs. An organic TFT is exemplified as a device for replacing a conventional inorganic TFT using an inorganic semiconductor layer, and various electronic devices such as the aforementioned display device are listed for use. Since the inorganic TFT can form an organic semiconductor layer at a lower temperature than the vapor deposition method, it is expected that the TFT can be mounted on a substrate such as a plastic film having low heat resistance.

尤其,藉由將有機TFT安裝於塑膠膜等可撓性基體上,可實現可彎折之電子設備。該情況下,不僅在低溫下形成有機半導體層,且藉由在低溫下形成絕緣膜,而可防止基材或有機TFT元件受到熱損傷。因此,已提案有使用印刷法等形成有機半導體層或絕緣膜。例如,國 際公開2009/051209號中提案利用網版印刷法將清漆狀之樹脂組成物(外覆塗佈劑)印刷成期望之圖型,且使之硬化之方法,但樹脂組成物之性能(亦即,低溫硬化性、硬化物之柔軟性、印刷性等)不足,尚有改善餘地。 In particular, by mounting the organic TFT on a flexible substrate such as a plastic film, a bendable electronic device can be realized. In this case, not only the organic semiconductor layer is formed at a low temperature, but also the insulating film is formed at a low temperature, whereby the substrate or the organic TFT element can be prevented from being thermally damaged. Therefore, it has been proposed to form an organic semiconductor layer or an insulating film using a printing method or the like. For example, the country In the publication No. 2009/051209, the varnish-like resin composition (overcoating agent) is printed by a screen printing method into a desired pattern and hardened, but the properties of the resin composition (ie, There is insufficient room for improvement in low-temperature hardening property, softness of cured product, printability, and the like.

據此,本發明所解決之課題係提供一種低溫硬化性、柔軟性及印刷性優異之樹脂組成物。 Accordingly, the problem to be solved by the present invention is to provide a resin composition excellent in low-temperature curability, flexibility, and printability.

本發明人等為解決上述課題而積極檢討之結果,發現若為含有特定之聚丁二烯樹脂及硫醇系硬化劑之樹脂組成物,即可解決上述課題,因而完成本發明。 The inventors of the present invention have found that the above-described problems can be solved by a resin composition containing a specific polybutadiene resin and a thiol-based curing agent, and the present invention has been completed.

亦即,本發明為包含以下之內容者。 That is, the present invention is intended to include the following.

[1]一種樹脂組成物,其係含有(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂,及(B)硫醇系硬化劑之樹脂組成物,其特徵為將樹脂組成物之固體成分全體設為100質量%時,(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂之含量為50~95質量%。 [1] A resin composition comprising (A) a polybutadiene resin having an epoxy group and a urethane structure, and (B) a resin composition of a thiol-based curing agent, characterized in that When the total solid content of the resin composition is 100% by mass, the content of the (A) polybutadiene resin having an epoxy group and a urethane structure is 50 to 95% by mass.

[2]如上述[1]所記載之樹脂組成物,其中(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂之數平均分子量為500~200000。 [2] The resin composition according to the above [1], wherein (A) the polybutadiene resin having an epoxy group and a urethane structure has a number average molecular weight of 500 to 200,000.

[3]如上述[1]或[2]所記載之樹脂組成物,其中(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂之環氧當量為300~10000。 [3] The resin composition according to the above [1] or [2] wherein (A) the epoxy equivalent of the polybutadiene resin having an epoxy group and a urethane structure is from 300 to 10,000.

[4]如上述[1]~[3]中任一項所記載之樹脂組成物, 其中(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂為使(a)分子內具有2個以上羥基之聚二烯多元醇化合物、(b)分子內具有1個以上羥基與1個以上環氧基之環氧化合物、及(c)分子內具有2個以上異氰酸酯基之聚異氰酸酯化合物反應而得者。 [4] The resin composition as described in any one of the above [1] to [3], (A) The polybutadiene resin having an epoxy group and a urethane structure is a polydiene polyol compound having (a) two or more hydroxyl groups in the molecule, and (b) one or more molecules in the molecule. The hydroxyl group is obtained by reacting an epoxy compound having one or more epoxy groups and (c) a polyisocyanate compound having two or more isocyanate groups in the molecule.

[5]如上述[1]~[4]中任一項所記載之樹脂組成物,其中將樹脂組成物之固體成分全體設為100質量%時,(B)硫醇系硬化劑之含量為0.5~15質量%。 [5] The resin composition according to any one of the above [1], wherein the content of the (B) thiol-based curing agent is when the total solid content of the resin composition is 100% by mass. 0.5 to 15% by mass.

[6]如上述[1]~[5]中任一項所記載之樹脂組成物,其又含有(C)無機填充材。 [6] The resin composition according to any one of [1] to [5] further comprising (C) an inorganic filler.

[7]如上述[6]所記載之樹脂組成物,其中(C)無機填充材之平均粒徑為0.005~1μm。 [7] The resin composition according to [6] above, wherein (C) the inorganic filler has an average particle diameter of 0.005 to 1 μm.

[8]如上述[1]~[7]中任一項所記載之樹脂組成物,其又含有(D)硬化促進劑。 [8] The resin composition according to any one of [1] to [7] further comprising (D) a curing accelerator.

[9]如上述[1]~[8]中任一項所記載之樹脂組成物,其為外覆塗佈劑用或層間絕緣膜用。 [9] The resin composition according to any one of the above [1] to [8], which is used for an overcoating agent or an interlayer insulating film.

[10]如上述[9]所記載之樹脂組成物,其中外覆塗佈劑係用於封裝有機TFT元件之外覆塗佈劑。 [10] The resin composition according to [9] above, wherein the overcoating agent is used for encapsulating the organic TFT element with a coating agent.

[11]一種液狀樹脂組成物或薄膜狀樹脂組成物,其係使用如上述[1]~[10]中任一項所記載之樹脂組成物所成者。 [11] A liquid resin composition or a film-like resin composition, which is obtained by using the resin composition according to any one of the above [1] to [10].

[12]一種硬化體,其係如上述[1]~[8]中任一項所記載之樹脂組成物之硬化體,其伸長率為20%以上,彈性模數為1000MPa以下。 [12] A hardened body of the resin composition according to any one of the above [1] to [8], which has an elongation of 20% or more and an elastic modulus of 1000 MPa or less.

[13]一種可撓性印刷配線板,其包含如上述[12]所記載之硬化體。 [13] A flexible printed wiring board comprising the cured body according to [12] above.

[14]一種有機TFT器件,其包含如上述[12]所記載之硬化體。 [14] An organic TFT device comprising the hardened body according to [12] above.

[15]一種電子設備,其內置有如上述[13]所記載之可撓性印刷配線板或如上述[14]所記載之有機TFT器件。 [15] An electronic device comprising the flexible printed wiring board according to [13] or the organic TFT device according to [14] above.

依據本發明,可提供一種低溫硬化性、柔軟性及印刷性優異之樹脂組成物。 According to the invention, it is possible to provide a resin composition which is excellent in low-temperature curability, flexibility, and printability.

另外,本發明之樹脂組成物由於低溫硬化性、柔軟性及印刷性優異,故在例如可撓性印刷配線板、有機TFT器件等中不會產生元件或基板之熱劣化,且可容易地應用於欲實現該等之表面保護或絕緣之部位,其結果,不會產生元件或基板之熱劣化、可撓性、彎折性等下降,可提供實現期望之表面保護或絕緣之可撓性配線板、有機TFT器件等。 Further, since the resin composition of the present invention is excellent in low-temperature curability, flexibility, and printability, it does not cause thermal deterioration of elements or substrates in, for example, a flexible printed wiring board or an organic TFT device, and can be easily applied. In order to achieve such surface protection or insulation, as a result, thermal degradation, flexibility, bendability, and the like of the element or substrate are not reduced, and flexible wiring for achieving desired surface protection or insulation can be provided. Board, organic TFT device, etc.

本發明之樹脂組成物之特徵為含有(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂,及(B)硫醇系硬化劑。 The resin composition of the present invention is characterized by containing (A) a polybutadiene resin having an epoxy group and a urethane structure, and (B) a thiol-based curing agent.

<(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂> <(A) Polybutadiene Resin having an epoxy group and a urethane structure>

(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂(以 下亦稱為「(A)成分」)為具有環氧基、胺基甲酸酯構造與聚丁二烯骨架之聚合物,並無特別限制,可藉由例如使(a)分子內具有2個以上羥基之聚二烯多元醇(以下亦稱為「化合物(a)」)、(b)分子內具有1個以上羥基與1個以上環氧基之環氧化合物(以下亦稱為「化合物(b)」)、及(c)分子內具有2個以上異氰酸酯基之聚異氰酸酯化合物(以下亦稱為「化合物(c)」)反應而獲得。 (A) a polybutadiene resin having an epoxy group and a urethane structure ( The "(A) component") is a polymer having an epoxy group, a urethane structure, and a polybutadiene skeleton, and is not particularly limited, and for example, (a) has 2 in the molecule. a polydiene polyol having a hydroxyl group or more (hereinafter also referred to as "compound (a)"), and (b) an epoxy compound having one or more hydroxyl groups and one or more epoxy groups in the molecule (hereinafter also referred to as "a compound" (b) ") and (c) a polyisocyanate compound having two or more isocyanate groups in the molecule (hereinafter also referred to as "compound (c)") is obtained by a reaction.

至於化合物(a)並無特別限制,列舉為聚丁二烯多元醇、氫化聚丁二烯多元醇、聚異戊二烯多元醇、氫化聚異戊二烯多元醇等,亦可使用該等之1種或組合2種以上使用。尤其,就目的樹脂組成物之耐熱性提高、印刷性提高、絕緣信賴性提高等之觀點而言,化合物(a)較好為氫化物,亦即氫化聚二烯多元醇。據此,本發明中,(A)成分較好為聚丁二烯骨架經氫化者,亦即,具有環氧基與胺基甲酸酯構造之氫化聚丁二烯樹脂。 The compound (a) is not particularly limited, and examples thereof include polybutadiene polyol, hydrogenated polybutadiene polyol, polyisoprene polyol, hydrogenated polyisoprene polyol, and the like. One type or a combination of two or more types can be used. In particular, the compound (a) is preferably a hydrogenated product, that is, a hydrogenated polydiene polyol, from the viewpoints of improvement in heat resistance of the target resin composition, improvement in printability, improvement in insulation reliability, and the like. Accordingly, in the present invention, the component (A) is preferably a hydrogenated polybutadiene resin having a polybutadiene skeleton, that is, a hydrogenated polybutadiene resin having an epoxy group and a urethane structure.

化合物(a)可藉習知方法合成,但可使用市售品。至於聚丁二烯多元醇列舉為主要具有1,4-鍵之羥基末端液狀聚丁二烯的Poly bd R-45HT、R-15HT(以上為出光興產(股)製)、羥基末端聚丁二烯氫化物的POLYTAIL H、POLYTAIL HA(以上為三菱化學(股)製)、主要具有1,2-鍵之羥基末端聚丁二烯的G-1000、G-2000、G-3000(以上為日本曹達(股)製)、主要具有1,2-鍵之羥基末端聚丁二烯之氫化物的GI-1000、GI-2000、GI-3000(以上為日本曹達(股)製)等。另外,聚異戊二烯多元醇列舉為羥基末端液狀 異戊二烯的Poly ip、EPOLE(以上為出光興產(股)製)等。 The compound (a) can be synthesized by a conventional method, but a commercially available product can be used. The polybutadiene polyol is exemplified by Poly bd R-45HT, R-15HT (manufactured by Idemitsu Kosan Co., Ltd.) having a hydroxyl group-terminated liquid polybutadiene mainly having a 1,4-bond, and hydroxyl group-end polycondensation. Butadiene hydride of POLYTAIL H, POLYTAIL HA (above is Mitsubishi Chemical Co., Ltd.), G-1000, G-2000, G-3000 (mainly having hydroxyl terminated polybutadiene with 1,2-bonds) GI-1000, GI-2000, GI-3000 (manufactured by Nippon Soda Co., Ltd.), which is a hydride of a hydroxyl group-terminated polybutadiene mainly having 1,2-bonds. In addition, polyisoprene polyols are listed as hydroxyl terminal liquids. Poly ip, EPOLE of isoprene (above is produced by Idemitsu Kosan Co., Ltd.).

化合物(a)就提高對有機溶劑之相溶性之觀點而言,數平均分子量較好為10000以下,更好為7000以下,又更好為4000以下。另一方面,就提高樹脂組成物之硬化體之柔軟性之觀點而言,數平均分子量較好為300以上,更好為600以上,又更好為900以上。本發明中之數平均分子量為以凝膠滲透層析儀(GPC)測定之聚苯乙烯換算之值。以GPC法測定之數平均分子量具體而言係使用昭和電工(股)製之GPC-101作為測定裝置,使用昭和電工(股)製之Shodex KF-800RH/LF-804作為管柱,且使用四氫呋喃作為移動相,以管柱溫度40℃進行測定,且使用標準聚苯乙烯之校正線算出。 The compound (a) has a number average molecular weight of preferably 10,000 or less, more preferably 7,000 or less, and still more preferably 4,000 or less from the viewpoint of improving compatibility with an organic solvent. On the other hand, from the viewpoint of improving the flexibility of the cured body of the resin composition, the number average molecular weight is preferably 300 or more, more preferably 600 or more, still more preferably 900 or more. The number average molecular weight in the present invention is a value in terms of polystyrene measured by a gel permeation chromatography (GPC). Specifically, the number average molecular weight measured by the GPC method is GPC-101 manufactured by Showa Denko Co., Ltd., and Shodex KF-800RH/LF-804 manufactured by Showa Denko Co., Ltd. is used as a column, and tetrahydrofuran is used. The mobile phase was measured at a column temperature of 40 ° C and calculated using a calibration line of standard polystyrene.

至於化合物(b)只要是分子內具有1個以上羥基與1個以上環氧基者即無特別限制,可為聚有縮水甘油醚骨架、縮水甘油酯骨架、縮水甘油基胺骨架、脂環式環氧骨架、或環氧乙烷環之環氧化合物之任一種。化合物(b)可使用1種或組合2種以上使用。化合物(b)可藉習知方法合成,但亦可使用市售品。具有縮水甘油醚骨架之環氧化合物列舉為JER-1001、JER-1002、JRR-1003、JER-1004(三菱化學(股)製)等,具有環氧乙烷之環氧化合物列舉為羥基末端環氧化之聚丁二烯PB-3600(Daicel化學工業(股))。 The compound (b) is not particularly limited as long as it has one or more hydroxyl groups and one or more epoxy groups in the molecule, and may be a glycidyl ether skeleton, a glycidyl ester skeleton, a glycidylamine skeleton, or an alicyclic group. Either of an epoxy skeleton or an epoxy compound of an oxirane ring. The compound (b) can be used alone or in combination of two or more. The compound (b) can be synthesized by a conventional method, but a commercially available product can also be used. The epoxy compound having a glycidyl ether skeleton is exemplified by JER-1001, JER-1002, JRR-1003, JER-1004 (manufactured by Mitsubishi Chemical Corporation), and the epoxy compound having ethylene oxide is exemplified as a hydroxyl terminal ring. Oxidized polybutadiene PB-3600 (Daicel Chemical Industry Co., Ltd.).

化合物(b)可藉由使(d)分子內具有2個以上環氧基之環氧化合物(以下稱為「化合物(d)」)與(e)分子內具 有與環氧基反應之1個以上活性氫基之化合物(以下稱為「化合物(e)」)反應而獲得。 The compound (b) can be obtained by (b) an epoxy compound having two or more epoxy groups in the molecule (hereinafter referred to as "compound (d)") and (e) It is obtained by reacting a compound having one or more active hydrogen groups reactive with an epoxy group (hereinafter referred to as "compound (e)").

至於化合物(d)列舉為雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、氫化雙酚A型環氧樹脂、氫化雙酚F型環氧樹脂、酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、二環戊二烯型環氧樹脂、烷基酚酚醛清漆型環氧樹脂、聯苯型環氧樹脂、萘型環氧樹脂、酚與具有酚性羥基之芳香族醛類之縮合物之環氧化物、三縮水甘油基異氰尿酸酯、脂環式環氧樹脂、縮水甘油基胺樹脂、縮水甘油基酯樹脂、芳香族二醇之二縮水甘油醚、脂環式二醇脂之二縮水甘油醚等環氧樹脂。該等可使用1種或組合2種以上使用。 The compound (d) is exemplified by a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a bisphenol S type epoxy resin, a hydrogenated bisphenol A type epoxy resin, a hydrogenated bisphenol F type epoxy resin, and a phenol. Novolak type epoxy resin, cresol novolac type epoxy resin, dicyclopentadiene type epoxy resin, alkylphenol novolac type epoxy resin, biphenyl type epoxy resin, naphthalene type epoxy resin, phenol Epoxide, triglycidyl isocyanurate, alicyclic epoxy resin, glycidylamine resin, glycidyl ester resin, aromatic two with a condensate of an aromatic aldehyde having a phenolic hydroxyl group An epoxy resin such as an diglycidyl ether of an alcohol or a diglycidyl ether of an alicyclic glycol ester. These may be used alone or in combination of two or more.

化合物(e)列舉為具有1個以上酚性羥基之化合物、具有1個以上羧基之化合物等。活性氫基之數,為了降低與化合物(d)反應中凝膠化之可能性,化合物(e)較好為具有1或2個活性氫者。具有1個活性氫基之化合物列舉為酚化合物、硫酚化合物、羧酸化合物等。具有2個活性氫基之化合物列舉為雙酚A、雙酚F、雙酚S、聯酚、氫醌、己二酸、癸二酸、十二烷二酸、8,12-二十碳二烯二酸、二十碳二酸等。化合物(e)可使用1種或組合2種以上使用。 The compound (e) is exemplified by a compound having one or more phenolic hydroxyl groups, a compound having one or more carboxyl groups, and the like. The number of active hydrogen groups is preferably one or two active hydrogens in order to reduce the possibility of gelation in the reaction with the compound (d). The compound having one active hydrogen group is exemplified by a phenol compound, a thiophenol compound, a carboxylic acid compound, and the like. The compound having two active hydrogen groups is exemplified by bisphenol A, bisphenol F, bisphenol S, biphenol, hydroquinone, adipic acid, sebacic acid, dodecanedioic acid, 8, 12- 20 carbon two. Aenedioic acid, eicosadioic acid, and the like. The compound (e) can be used alone or in combination of two or more.

化合物(d)與化合物(e)可在反應溫度80℃~180℃下反應1小時~8小時之範圍。反應亦可視需要添加有機溶劑,且亦可視需要添加觸媒而進行。觸媒列舉為氮 系化合物、磷系化合物等。 The compound (d) and the compound (e) can be reacted at a reaction temperature of from 80 ° C to 180 ° C for a period of from 1 hour to 8 hours. The reaction may also be carried out by adding an organic solvent as needed, and may also be carried out by adding a catalyst as needed. The catalyst is listed as nitrogen A compound, a phosphorus compound, or the like.

化合物(c)並無特別限制,列舉為2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、六亞甲基二異氰酸酯、異佛爾酮二異氰酸酯、二苯基甲烷二異氰酸酯、二環己基甲烷二異氰酸酯、萘二異氰酸酯、二甲苯二異氰酸酯、氫化二甲苯二異氰酸酯、四亞甲基二甲苯二異氰酸酯、三甲基六亞甲基二異氰酸酯、降冰片烯二異氰酸酯等。該等可使用1種亦可組合2種以上使用。 The compound (c) is not particularly limited and is exemplified by 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, diphenylmethane diisocyanate, and bicyclo ring. Hexyl methane diisocyanate, naphthalene diisocyanate, xylene diisocyanate, hydrogenated xylene diisocyanate, tetramethylene xylene diisocyanate, trimethyl hexamethylene diisocyanate, norbornene diisocyanate, and the like. These may be used alone or in combination of two or more.

化合物(a)、化合物(b)及化合物(c)之反應條件可為例如在有機溶劑中,反應溫度15℃~120℃、反應時間1~8小時之範圍內反應。另外,亦可視需要添加觸媒進行反應。 The reaction conditions of the compound (a), the compound (b) and the compound (c) can be, for example, a reaction in an organic solvent at a reaction temperature of from 15 ° C to 120 ° C and a reaction time of from 1 to 8 hours. In addition, it is also possible to add a catalyst to react as needed.

化合物(a)、化合物(b)及化合物(c)之反應比例,於將化合物(a)之羥基數設為Xa,將化合物(b)之羥基數設為Xb,將化合物(c)之異氰酸酯基數設為Y時,(Xa+Xb)/Y之值較好為1~3之範圍,更好為1.01~2之範圍。藉由使該比率為1以上,防止異氰酸酯基過量,而容易控制分子量。且,藉由為3以下,而容易提高分子量。 The reaction ratio of the compound (a), the compound (b) and the compound (c) is such that the number of hydroxyl groups of the compound (a) is Xa, the number of hydroxyl groups of the compound (b) is Xb, and the isocyanate of the compound (c) When the base is set to Y, the value of (Xa+Xb)/Y is preferably in the range of 1 to 3, more preferably in the range of 1.01 to 2. By setting the ratio to 1 or more, the amount of the isocyanate group is prevented from being excessive, and the molecular weight is easily controlled. Further, the molecular weight is easily increased by 3 or less.

且,化合物(a)與化合物(b)以質量比計,較好以化合物(a):化合物(b)=90:10~10:90之範圍使用,更好以80:20~30:70之範圍使用。質量比超過90:10而化合物(a)之比例較多時,會有硬化體之耐熱性下降之傾向,於質量比超過10:90而化合物(b)之比例較多時,會有硬化體之柔軟性變不充分之傾向。 Further, the compound (a) and the compound (b) are preferably used in the range of the compound (a): compound (b) = 90:10 to 10:90 by mass ratio, more preferably 80:20 to 30:70. The scope is used. When the mass ratio exceeds 90:10 and the ratio of the compound (a) is large, the heat resistance of the cured body tends to decrease, and when the mass ratio exceeds 10:90 and the ratio of the compound (b) is large, there is a hardened body. The tendency for the softness to become insufficient.

反應中使用之有機溶劑可列舉為例如N,N-二甲基甲醯胺、N,N-二乙基甲醯胺、N,N-二甲基乙醯胺、N,N-二乙基乙醯胺、N-甲基-2-吡咯烷酮、四甲基脲等含氮化合物系溶劑,二甲基亞碸、二乙基亞碸等含硫化合物系溶劑、γ-丁內酯等環狀酯化合物系溶劑、環戊酮、環己酮等酮系溶劑、二甘醇二甲醚、三甘醇二甲醚等醚系溶劑、卡必醇乙酸酯、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯等之酯系溶劑等之極性溶劑。該等可使用1種亦可組合2種以上使用。另外,亦可視需要適當混合芳香族烴等之非極性溶劑使用。 The organic solvent used in the reaction may, for example, be N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diethyl a solvent containing a nitrogen-containing compound such as acetamide, N-methyl-2-pyrrolidone or tetramethylurea, a solvent such as a sulfur-containing compound such as dimethyl hydrazine or diethyl hydrazine, or a ring such as γ-butyrolactone. Ester compound solvent, ketone solvent such as cyclopentanone or cyclohexanone, ether solvent such as diglyme or triglyme, carbitol acetate, propylene glycol monomethyl ether acetate A polar solvent such as an ester solvent such as propylene glycol monoethyl ether acetate. These may be used alone or in combination of two or more. Further, a non-polar solvent such as an aromatic hydrocarbon may be appropriately mixed as needed.

反應可視需要添加觸媒而進行,至於觸媒可列舉為四甲基丁烷二胺、苄基二甲基胺、三乙醇胺、三乙基胺、N,N-二甲基哌啶、α-甲基苄基二甲基胺、N-甲基嗎啉、三伸乙基二胺等三級胺,或二丁基錫月桂酸鹽、二氯化二丁基錫、環烷酸鈷、環烷酸鋅等有機金屬觸媒等。 The reaction may be carried out by adding a catalyst as needed, and the catalyst may be exemplified by tetramethylbutanediamine, benzyldimethylamine, triethanolamine, triethylamine, N,N-dimethylpiperidine, α- a tertiary amine such as methylbenzyldimethylamine, N-methylmorpholine or tri-ethylenediamine, or dibutyltin laurate, dibutyltin dichloride, cobalt naphthenate, zinc naphthenate, etc. Organometallic catalysts, etc.

本發明中之(A)成分之數平均分子量,就防止樹脂組成物之黏度上升、操作性下降之觀點而言,較好為200000以下,更好為150000以下,又更好為100000以下,再更好為80000以下,又再更好為60000以下,最好為40000以下。另一方面,就提高樹脂組成物硬化體之柔軟性之觀點而言,較好為500以上,更好為4000以上,又更好為8000以上,再更好為12000以上,又再更好為16000以上,最好為20000以上。數平均分子量可與上述方法同樣測定。 The number average molecular weight of the component (A) in the present invention is preferably 200,000 or less, more preferably 150,000 or less, and still more preferably 100,000 or less, from the viewpoint of preventing the viscosity of the resin composition from increasing and the workability from decreasing. It is preferably 80,000 or less, and more preferably 60,000 or less, and preferably 40,000 or less. On the other hand, from the viewpoint of improving the flexibility of the cured body of the resin composition, it is preferably 500 or more, more preferably 4,000 or more, still more preferably 8,000 or more, still more preferably 12,000 or more, and further preferably More than 16,000, preferably more than 20,000. The number average molecular weight can be measured in the same manner as the above method.

本發明中之(A)成分之環氧當量,就提高耐溶劑性之觀點而言,較好為10000以下,更好為7000以下,又更好為4000以下。另一方面,就防止樹脂組成物硬化體之交聯性(交聯密度)變得過高而使柔軟性下降之觀點而言,較好為300以上,更好為500以上,又更好為1000以上。又,所謂環氧當量(g/eq)為每1個環氧基之(A)成分(具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂)之分子量,且係根據JIS K7236測定。 The epoxy equivalent of the component (A) in the present invention is preferably 10,000 or less, more preferably 7,000 or less, still more preferably 4,000 or less from the viewpoint of improving solvent resistance. On the other hand, from the viewpoint of preventing the crosslinkability (crosslinking density) of the cured resin composition from being too high and reducing the flexibility, it is preferably 300 or more, more preferably 500 or more, and more preferably 1000 or more. In addition, the epoxy equivalent (g/eq) is a molecular weight of the component (A) (polybutadiene resin having an epoxy group and a urethane structure) per one epoxy group, and is based on JIS K7236. Determination.

本發明之樹脂組成物中之(A)成分之調配量,就提高樹脂組成物硬化體之柔軟性之觀點而言,以樹脂組成物之固體成分全體作為100質量%時,較好為50質量%以上,更好為55質量%以上,又更好為60質量%以上,再更好為65質量%以上。另一方面,就提高樹脂組成物之相溶性或提高印刷性之觀點而言,以樹脂組成物之固體成分全體作為100質量%時,較好為95質量%以下,更好為93質量%以下,又更好為91質量%以下,再更好為89質量%以下。 In the resin composition of the present invention, the amount of the component (A) is preferably 50% by mass of the entire solid content of the resin composition, from the viewpoint of improving the flexibility of the cured resin composition. More than %, more preferably 55% by mass or more, still more preferably 60% by mass or more, and even more preferably 65% by mass or more. On the other hand, when the total solid content of the resin composition is 100% by mass, the content of the resin composition is preferably 95% by mass or less, more preferably 93% by mass or less. Further, it is preferably 91% by mass or less, and more preferably 89% by mass or less.

<(B)硫醇系硬化劑> <(B) mercaptan-based hardener>

本發明中,藉由使用(B)硫醇系硬化劑(以下稱為「(B)成分」),可提高低溫硬化性。(B)成分只要是可使環氧基交聯或聚合之化合物即無特別限制,列舉為例如三羥甲基丙烷參(3-巰基丙酸酯)、季戊四醇肆(3-巰基丙酸酯)、二季戊四醇陸(3-巰基丙酸酯)、參-[(3-巰基丙醯氧基)-乙基]- 異氰尿酸酯、參(3-巰基丙基)異氰尿酸酯等。市售品列舉為淀化學股份有限公司製之OTG、EGTG、TMTG、PETG、3-MPA、TMTP、PETP、堺化學工業股份有限公司製之TEMP、PEMP、TEMPIC、DPMP、昭和電工股份有限公司製之PE-1、BD-1、NR-1、TPMB、TEMB等。 In the present invention, by using the (B) thiol-based curing agent (hereinafter referred to as "component (B)"), the low-temperature curability can be improved. The component (B) is not particularly limited as long as it is a compound which can crosslink or polymerize an epoxy group, and is exemplified by, for example, trimethylolpropane ginseng (3-mercaptopropionate) or pentaerythritol ruthenium (3-mercaptopropionate). , dipentaerythritol tert-(3-mercaptopropionate), gins-[(3-mercaptopropoxy)-ethyl]- Isocyanurate, ginseng (3-mercaptopropyl) isocyanurate, and the like. Commercially available products are OTG, EGTG, TMTG, PETG, 3-MPA, TMTP, PETP, TEMP, PEMP, TEMPIC, DPMP, and Showa Denko Co., Ltd., manufactured by Dian Chemical Co., Ltd. PE-1, BD-1, NR-1, TPMB, TEMB, and the like.

本發明中之(B)成分之調配量,就使樹脂組成物有效地低溫硬化之觀點而言,以樹脂組成物之固體成分全體作為100質量%時,較好為0.5質量%以上,更好為1質量%以上,又更好為1.5質量%以上,再更好為2質量%以上。另一方面,就提高樹脂組成物之保存安定性之觀點而言,以樹脂組成物之固體成分全體作為100質量%時,較好為15質量%以下,更好為13質量%以下,又更好為10質量%以下,再更好為7質量%以下,最好為5質量%以下。 In the case where the resin composition is effectively cured at a low temperature, the amount of the component (B) in the present invention is preferably 0.5% by mass or more, more preferably 0.5% by mass or more, based on the total solid content of the resin composition. It is 1% by mass or more, more preferably 1.5% by mass or more, and still more preferably 2% by mass or more. On the other hand, when the solid content of the resin composition is 100% by mass, the solid content of the resin composition is preferably 15% by mass or less, more preferably 13% by mass or less, and more preferably It is preferably 10% by mass or less, more preferably 7% by mass or less, and most preferably 5% by mass or less.

<(C)無機填充材> <(C) Inorganic filler>

本發明之樹脂組成物藉由視需要進一步含有(C)無機填充材,可調整樹脂組成物之黏度,且提高操作性。無機填充材並無特別限制,列舉為二氧化矽、氧化鋁、硫酸鋇、滑石、黏土、雲母粉、氫氧化鋁、氫氧化鎂、碳酸鈣、碳酸鎂、氧化鎂、氮化硼、硼酸鋁、鈦酸鋇、鈦酸鍶、鈦酸鈣、鈦酸鎂、鈦酸鉍、氧化鈦、鋯酸鋇、鋯酸鈣等,該等中,以二氧化矽較佳,最好為發煙二氧化矽。又,發煙二氧化矽可為疏水性,亦可為親水性,但以疏水 性發煙二氧化矽更好。無機填充材可使用市售品,列舉為例如親水性發煙二氧化矽的日本AEROSIL(股)製之「200」、「200CF」「300」、「300CF」、「380」等、疏水性發煙二氧化矽的日本AEROSIL(股)製之「R-805」、「R-812」、「RY-200」、「RY-300」、「RX-200」、「RX-300」等,熔融二氧化矽的Adematech(股)製之「SOC2」、「SOC1」等。 The resin composition of the present invention further contains (C) an inorganic filler as needed, and the viscosity of the resin composition can be adjusted to improve workability. The inorganic filler is not particularly limited, and is exemplified by cerium oxide, aluminum oxide, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum borate. , barium titanate, barium titanate, calcium titanate, magnesium titanate, barium titanate, titanium oxide, barium zirconate, calcium zirconate, etc., among these, preferably cerium oxide, preferably fuming Yttrium oxide. Moreover, the fumed cerium oxide may be hydrophobic or hydrophilic, but hydrophobic. Sexual fuming cerium oxide is better. For the inorganic filler, a commercially available product can be used, and for example, "200", "200CF", "300", "300CF", "380", etc., manufactured by Japan AEROSIL Co., Ltd., which are hydrophilic fuming cerium oxide, are used. "R-805", "R-812", "RY-200", "RY-300", "RX-200", "RX-300", etc., manufactured by Japan AEROSIL Co., Ltd. "SOC2" and "SOC1" manufactured by Adematech Co., Ltd. of cerium oxide.

本發明中之(C)無機填充材之平均粒徑,就容易提高絕緣信賴性、調整樹脂組成物之黏度之觀點而言,較好為1μm以下,更好為0.7μm以下,又更好為0.5μm以下,再更好為0.3μm以下,又再更好為0.1μm以下。另一方面,就防止無機填充材凝聚之觀點而言,較好為0.005μm以上。(C)無機填充材之平均粒徑可基於Mie散射理論,藉雷射繞射.散射法而測定。具體而言,可利用雷射繞射式粒度分布測定裝置,以體積基準作成無機填充材之粒度分布,以其中值徑作為平均粒徑進行測定。測定樣品較好使用以超音波將無機填充材分散於水中而成者。至於雷射繞射散射式粒度分布測定裝置,可使用崛場製作所(股)製之LA-500等。又,無機填充材為了提高耐濕性、分散性,較好為以矽烷偶合劑(環氧基矽烷系偶合劑、胺基矽烷系偶合劑、巰基矽烷系偶合劑等)、鈦酸酯系偶合劑、矽氮烷化合物等表面處理劑予以表面處理者。 The average particle diameter of the inorganic filler (C) in the present invention is preferably 1 μm or less, more preferably 0.7 μm or less, from the viewpoint of easily improving the insulation reliability and adjusting the viscosity of the resin composition. It is 0.5 μm or less, more preferably 0.3 μm or less, and still more preferably 0.1 μm or less. On the other hand, from the viewpoint of preventing aggregation of the inorganic filler, it is preferably 0.005 μm or more. (C) The average particle size of the inorganic filler can be based on the Mie scattering theory, by laser diffraction. Determined by scattering method. Specifically, the laser diffraction type particle size distribution measuring apparatus can be used to determine the particle size distribution of the inorganic filler on a volume basis, and the median diameter is used as the average particle diameter. It is preferable to use a sample in which the inorganic filler is dispersed in water by ultrasonic waves. As for the laser diffraction scattering type particle size distribution measuring apparatus, the LA-500 manufactured by Seisakusho Co., Ltd., etc. can be used. Further, in order to improve moisture resistance and dispersibility, the inorganic filler is preferably a decane coupling agent (epoxy decane coupling agent, an amine decane coupling agent, a mercapto decane coupling agent, or the like) or a titanate coupling. A surface treatment agent such as a mixture or a guanidinium compound is surface-treated.

環氧矽烷系偶合劑列舉為縮水甘油氧基丙基三甲氧基矽烷、縮水甘油氧基丙基三乙氧基矽烷、縮水甘 油氧基丙基甲基二乙氧基矽烷、縮水甘油基丁基三甲氧基矽烷、(3,4-環氧基環己基)乙基三甲氧基矽烷等,胺基矽烷系偶合劑列舉為胺基丙基甲氧基矽烷、胺基丙基三乙氧基矽烷、N-苯基-3-胺基丙基三甲氧基矽烷、N-2(胺基乙基)胺基丙基三甲氧基矽烷等,巰基矽烷系偶合劑列舉為巰基丙基三甲氧基矽烷、巰基丙基三乙氧基矽烷等。該等可使用1種亦可組合2種以上使用。 The epoxy decane coupling agent is exemplified by glycidoxypropyl trimethoxy decane, glycidoxypropyl triethoxy decane, and glycidol. Oloxypropylmethyldiethoxydecane, glycidylbutyltrimethoxydecane, (3,4-epoxycyclohexyl)ethyltrimethoxydecane, etc., and an amine-based decane coupling agent is exemplified as Aminopropyl methoxy decane, aminopropyl triethoxy decane, N-phenyl-3-aminopropyl trimethoxy decane, N-2 (aminoethyl) aminopropyl trimethoxy The decyl decane coupling agent is decyl propyl trimethoxy decane, decyl propyl triethoxy decane, and the like. These may be used alone or in combination of two or more.

鈦系偶合劑列舉為鈦酸丁酯二聚物、辛二醇鈦、二異丙氧基鈦雙(三乙醇胺)、二羥基鈦雙乳酸酯、二羥基雙(乳酸銨)鈦、雙(二辛基焦磷酸酯)伸乙基鈦酸酯、雙(二辛基焦磷酸酯)氧基乙酸酯鈦酸酯、三-正丁氧基鈦單硬脂酸酯、四正丁基鈦酸酯、四(2-乙基己基)鈦酸酯、四異丙基雙(二辛基亞磷酸酯)鈦酸酯、四辛基雙(二-十三烷基亞磷酸酯)鈦酸酯、四(2,2-二烯丙氧基甲基-1-丁基)雙(二-十三烷基)亞磷酸酯鈦酸酯、異丙基三辛醯基鈦酸酯、異丙基三異丙苯基苯基鈦酸酯、異丙基三異硬脂醯基鈦酸酯、異丙基異硬脂醯基二丙烯醯基鈦酸酯、異丙基二甲基丙烯醯基異硬脂醯基鈦酸酯、異丙基三(二辛基磷酸酯)鈦酸酯、異丙基三-十二烷基苯磺醯基鈦酸酯、異丙基參(二辛基焦磷酸酯)鈦酸酯、異丙基三(N-醯胺乙基.胺基乙基)鈦酸酯等。該等可使用1種亦可組合2種以上使用。 Titanium coupling agents are exemplified by butyl titanate dimer, octanediol titanium, diisopropoxy titanium bis(triethanolamine), dihydroxy titanium dilactate, dihydroxy bis(ammonium lactate) titanium, bis ( Dioctyl pyrophosphate) ethyl titanate, bis(dioctylpyrophosphate)oxyacetate titanate, tri-n-butoxytitanium monostearate, tetra-n-butyl titanium Acid ester, tetrakis(2-ethylhexyl) titanate, tetraisopropylbis(dioctylphosphite) titanate, tetraoctylbis(di-tridecylphosphite) titanate , tetrakis(2,2-diallyloxymethyl-1-butyl)bis(di-tridecyl)phosphite titanate, isopropyl trioctadecyl titanate, isopropyl triiso Propyl phenyl titanate, isopropyl triisostearyl decyl titanate, isopropyl isostearyl decyl bis decyl decyl titanate, isopropyl dimethyl propylene decyl isostearyl Mercapto titanate, isopropyl tris(dioctyl phosphate) titanate, isopropyl tri-dodecylbenzenesulfonate titanate, isopropyl ginseng (dioctyl pyrophosphate) Titanate, isopropyl tris(N-nonylamine ethyl.aminoethyl) titanate, and the like. These may be used alone or in combination of two or more.

矽氮烷化合物列舉為六甲基二矽氮烷、1,3-二乙烯基-1,1,3,3-四甲基二矽氮烷、八甲基三矽氮烷、六(第三丁基)二矽氮烷、六丁基二矽氮烷、六辛基二矽氮烷、 1,3-二乙基四甲基二矽氮烷、1,3-二正辛基四甲基二矽氮烷、1,3-二苯基四甲基二矽氮烷、1,3-二甲基四苯基二矽氮烷、1,3-二乙基四甲基二矽氮烷、1,1,3,3-四苯基-1,3-二甲基二矽氮烷、1,3-二丙基四甲基二矽氮烷、六甲基環三矽氮烷、六苯基二矽氮烷、二甲胺基三甲基矽氮烷、三矽氮烷、環三矽氮烷、1,1,3,3,5,5-六甲基環三矽氮烷等,最好為六甲基二矽氮烷。該等可使用1種亦可組合2種以上使用。 The indane alkane compounds are exemplified by hexamethyldiazepine, 1,3-divinyl-1,1,3,3-tetramethyldiazepine, octamethyltriazane, and six (third Butyl)dioxane, hexabutyldioxane, hexaoctyldioxane, 1,3-Diethyltetramethyldiazepine, 1,3-di-n-octyltetramethyldiazide, 1,3-diphenyltetramethyldiazide, 1,3- Dimethyltetraphenyldiazepine, 1,3-diethyltetramethyldiazepine, 1,1,3,3-tetraphenyl-1,3-dimethyldiazepine, 1,3-Dipropyltetramethyldiazepine, hexamethylcyclotriazane, hexaphenyldioxane, dimethylaminotrimethylguanidine, triazane, ring three A decazane, 1,1,3,3,5,5-hexamethylcyclotriazane or the like is preferably hexamethyldioxane. These may be used alone or in combination of two or more.

上述表面處理劑之處理量以無機填充材作為100質量%時,較好為0.1~6質量%,更好為0.3~4質量%。 When the amount of the surface treatment agent to be treated is 100% by mass based on the inorganic filler, it is preferably from 0.1 to 6% by mass, more preferably from 0.3 to 4% by mass.

本發明中,(C)無機填充材可使用1種亦可組合2種以上使用。另外,調配(C)無機填充材時之含量,就樹脂組成物之黏度調整容易之觀點而言,以樹脂組成物之固體成分全體作為100質量%時,較好為1質量%以上,更好為3質量%以上,又更好為5質量%以上。另一方面,就防止樹脂組成物硬化體之彈性模數或伸長率降低之觀點而言,以樹脂組成物之固體成分全體作為100質量%時,較好為30質量%以下,更好為25質量%以下,又更好為20質量%以下。 In the present invention, the inorganic filler (C) may be used alone or in combination of two or more. In addition, when the content of the (C) inorganic filler is adjusted, the viscosity of the resin composition is easily adjusted. When the total solid content of the resin composition is 100% by mass, it is preferably 1% by mass or more. It is 3% by mass or more, and more preferably 5% by mass or more. On the other hand, when the total modulus of the solid content of the resin composition is 100% by mass, it is preferably 30% by mass or less, more preferably 25, from the viewpoint of the reduction of the modulus of elasticity or the elongation of the cured resin composition. The mass% or less is more preferably 20% by mass or less.

<(D)硬化促進劑> <(D) hardening accelerator>

本發明之樹脂組成物藉由視需要進一步含有(D)硬化促進劑,可提高硬化體之耐熱性、接著性、耐藥品性等。 至於硬化促進劑並無特別限制,列舉為胺系硬化促進劑、胍系硬化促進劑、咪唑系硬化促進劑、鏻系硬化促進劑等。該等可使用1種亦可組合2種以上使用。 The resin composition of the present invention can further improve the heat resistance, adhesion, chemical resistance, and the like of the cured body by further containing (D) a curing accelerator as needed. The curing accelerator is not particularly limited, and examples thereof include an amine-based curing accelerator, an lanthanum-based curing accelerator, an imidazole-based curing accelerator, and an lanthanum-based curing accelerator. These may be used alone or in combination of two or more.

胺系硬化促進劑並無特別限制者,列舉為三乙胺、三丁基胺等三烷基胺,4-二甲胺基吡啶、苄基二甲基胺、2,4,6-參(二甲胺基甲基)酚、1,8-二氮雜雙環(5,4,0)-十一碳烯(以下簡寫為DBU)等胺化合物等。該等可使用1種亦可組合2種以上使用。 The amine-based hardening accelerator is not particularly limited, and examples thereof include trialkylamines such as triethylamine and tributylamine, 4-dimethylaminopyridine, benzyldimethylamine, and 2,4,6-gin ( An amine compound such as dimethylaminomethyl)phenol or 1,8-diazabicyclo(5,4,0)-undecene (hereinafter abbreviated as DBU). These may be used alone or in combination of two or more.

胍系硬化促進劑並無特別限制,列舉為二氰二醯胺、1-甲基胍、1-乙基胍、1-環己基胍、1-苯基胍、1-(鄰-甲苯基)胍、二甲基胍、二苯基胍、三甲基胍、四甲基胍、五甲基胍、1,5,7-三氮雜雙環[4.4.0]癸-5-烯、7-甲基-1,5,7-三氮雜雙環[4.4.0]癸-5-烯、1-甲基雙胍、1-乙基雙胍、1-正丁基雙胍、1-正十八烷基雙胍、1,1-二甲基雙胍、1,1-二乙基雙胍、1-環己基雙胍、1-烯丙基雙胍、1-苯基雙胍、1-(鄰-甲苯基)雙胍等。該等可使用1種亦可組合2種以上使用。 The lanthanide hardening accelerator is not particularly limited and is exemplified by dicyanamide, 1-methyl hydrazine, 1-ethyl hydrazine, 1-cyclohexyl hydrazine, 1-phenyl fluorene, 1-(o-tolyl).胍, dimethyl hydrazine, diphenyl hydrazine, trimethyl hydrazine, tetramethyl hydrazine, pentamethyl hydrazine, 1,5,7-triazabicyclo[4.4.0] fluorene-5-ene, 7- Methyl-1,5,7-triazabicyclo[4.4.0]non-5-ene, 1-methylbiguanide, 1-ethylbiguanide, 1-n-butylbiguanide, 1-n-octadecyl Biguanide, 1,1-dimethylbiguanide, 1,1-diethylbiguanide, 1-cyclohexylbiguanide, 1-allyl biguanide, 1-phenylbiguanide, 1-(o-tolyl)biguanide, and the like. These may be used alone or in combination of two or more.

咪唑系硬化促進劑並無特別限制,列舉為2-甲基咪唑、2-十一烷基咪唑、2-十五烷基咪唑、1,2-二甲基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、1-苄基-2-甲基咪唑、1-苄基-2-苯基咪唑、1-氰基乙基-2-甲基咪唑、1-氰基乙基-2-十一烷基咪唑、1-氰基乙基-2-乙基-4-甲基咪唑、1-氰基乙基-2-苯基咪唑、1-氰基乙基-2-十一烷基咪唑鎓均苯三甲酸鹽、1-氰基乙基-2-苯 基咪唑鎓均苯三甲酸鹽、2,4-二胺基-6-[2’-甲基咪唑基-(1’)]-乙基-s-三嗪、2,4-二胺基-6-[2’-十一烷基咪唑基-(1’)]-乙基-s-三嗪、2,4-二胺基-6-[2’-乙基-4’-甲基咪唑基-(1’)]-乙基-s-三嗪、2,4-二胺基-6-[2’-甲基咪唑基-(1’)]-乙基-s-三嗪異氰尿酸加成物、2-苯基咪唑異氰尿酸加成物、2-苯基-4,5-二羥基甲基咪唑、2-苯基-4-甲基-5-羥基甲基咪唑、2,3-二氫-1H-吡咯并[1,2-a]苯并咪唑、1-十二烷基-2-甲基-3-苄基咪唑鎓氯化物、2-甲基咪唑啉、2-苯基咪唑啉、1-(2-羥基)-3-苯氧基丙基-2-甲基咪唑等咪唑化合物及咪唑化合物與環氧樹脂之加成物。該等可使用1種亦可組合2種以上使用。 The imidazole-based hardening accelerator is not particularly limited and is exemplified by 2-methylimidazole, 2-undecylimidazole, 2-pentadecylimidazole, 1,2-dimethylimidazole, 2-ethyl-4- Methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl- 2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenyl Imidazole, 1-cyanoethyl-2-undecyl imidazolium phthalate, 1-cyanoethyl-2-benzene Imidazolium pyromellitate, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino- 6-[2'-undecyl imidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-ethyl-4'-methylimidazole -(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine isocyanide Uric acid adduct, 2-phenylimidazolium isocyanurate adduct, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2 ,3-dihydro-1H-pyrrolo[1,2-a]benzimidazole, 1-dodecyl-2-methyl-3-benzylimidazolium chloride, 2-methylimidazoline, 2 An imidazole compound such as phenylimidazoline or 1-(2-hydroxy)-3-phenoxypropyl-2-methylimidazole; and an adduct of an imidazole compound and an epoxy resin. These may be used alone or in combination of two or more.

鏻系硬化促進劑並無特別限制,列舉為三苯基膦、硼酸鏻化合物、四苯基鏻四苯基硼酸鹽、正丁基鏻四苯基硼酸鹽、四丁基鏻癸酸鹽、(4-甲基苯基)三苯基鏻硫代氰酸鹽、四苯基鏻硫代氰酸鹽、丁基三苯基鏻硫代氰酸鹽等。該等可使用1種亦可組合2種以上使用。 The lanthanum hardening accelerator is not particularly limited, and examples thereof include triphenylphosphine, lanthanum borate, tetraphenylphosphonium tetraphenylborate, n-butyl fluorene tetraphenylborate, tetrabutyl citrate, 4-methylphenyl)triphenylsulfonium thiocyanate, tetraphenylphosphonium thiocyanate, butyltriphenylphosphonium thiocyanate, and the like. These may be used alone or in combination of two or more.

本發明之樹脂組成物中,(D)硬化促進劑之含量以樹脂組成物之固體成分全體作為100質量%時,就提高樹脂組成物之保存安定性之觀點而言,較好為7質量%以下,更好為6質量%以下,又更好為5質量%以下。另一方面,就使樹脂組成物有效地硬化、提高低溫硬化性之觀點而言,以樹脂組成物之固體成分全體作為100質量%時,較好為0.005質量%以上,更好為0.01質量%以上,又更好為0.1質量%以上。 In the resin composition of the present invention, when the content of the hardening accelerator (D) is 100% by mass based on the total solid content of the resin composition, it is preferably 7 mass% from the viewpoint of improving the storage stability of the resin composition. Hereinafter, it is more preferably 6% by mass or less, and still more preferably 5% by mass or less. On the other hand, when the resin composition is effectively cured and the low-temperature curability is improved, the total solid content of the resin composition is preferably 100% by mass or more, more preferably 0.01% by mass, based on 100% by mass of the total solid content of the resin composition. The above is more preferably 0.1% by mass or more.

<其他成分> <Other ingredients>

本發明之樹脂組成物舉例有聚矽氧系消泡劑、氟樹脂系消泡劑、丙烯酸聚合物系消泡劑等消泡劑、氧化鈦、氧化鋅等無機顏料、酞菁藍、酞菁綠、碘綠、重氮(disazo)黃、碳黑等有機顏料、有機染料等之著色劑、受阻酚系化合物、磷系化合物、硫系化合物、聯胺系化合物等抗氧化劑,苯并三唑系化合物、受阻胺系化合物等紫外線吸收劑,磷系化合物、氫氧化鋁、氫氧化鎂等難燃劑,平流劑、觸變性賦予劑、2,4,6-三巰基-s-三唑、2,5-二巰基-1,3,4-噻二唑等之密著增進劑等。 The resin composition of the present invention is exemplified by a polyfluorene-based defoaming agent, a fluororesin-based antifoaming agent, an antifoaming agent such as an acrylic polymer defoaming agent, an inorganic pigment such as titanium oxide or zinc oxide, phthalocyanine blue, and phthalocyanine. Organic pigments such as green, iodine green, disazo yellow, carbon black, colorants such as organic dyes, hindered phenol compounds, phosphorus compounds, sulfur compounds, uramine compounds, etc., benzotriazole A UV absorber such as a compound or a hindered amine compound, a flame retardant such as a phosphorus compound, aluminum hydroxide or magnesium hydroxide, a flow agent, a thixotropic agent, and 2,4,6-tridecyl-s-triazole. A adhesion promoter such as 2,5-dimercapto-1,3,4-thiadiazole or the like.

本發明之樹脂組成物之硬化體之彈性模數可藉由後述之<柔軟性之評價>測定。就提高硬化體之機械強度、延長應用硬化體之裝置、器件、構件等之使用時間之觀點而言,硬化體之彈性模數較好為5MPa以上,更好為10MPa以上,又更好為15MPa以上。且,就提高應用硬化體之裝置、器件、構件等之柔軟性、提高耐彎折性之觀點而言,較好為1000MPa以下,更好為600MPa以下,又更好為400MPa以下。 The elastic modulus of the cured body of the resin composition of the present invention can be measured by <Evaluation of Softness> which will be described later. The elastic modulus of the hardened body is preferably 5 MPa or more, more preferably 10 MPa or more, and more preferably 15 MPa from the viewpoint of improving the mechanical strength of the hardened body and prolonging the use time of the device, device, member, and the like to which the hardened body is applied. the above. Further, from the viewpoint of improving the flexibility of the device, the device, the member, and the like to which the hardened body is applied and improving the bending resistance, it is preferably 1000 MPa or less, more preferably 600 MPa or less, and still more preferably 400 MPa or less.

本發明之樹脂組成物之硬化體之伸長率可藉後述之<柔軟性評價>測定。就防止硬化體龜裂之觀點而言,硬化體之伸長率較好為20%以上,更好為30%以上,又更好為40%以上,再更好為60%以上,最好為80%以上。且,硬化體之伸長率上限值並無特別限制,就操作性 之觀點而言,較好為500%以下,更好為400%以下,又更好為300%以下。 The elongation of the cured body of the resin composition of the present invention can be measured by the <softness evaluation> described later. The elongation of the hardened body is preferably 20% or more, more preferably 30% or more, still more preferably 40% or more, still more preferably 60% or more, and most preferably 80, from the viewpoint of preventing cracking of the hardened body. %the above. Moreover, the upper limit of the elongation of the hardened body is not particularly limited, and the operability is From the viewpoint of the above, it is preferably 500% or less, more preferably 400% or less, and still more preferably 300% or less.

本發明之樹脂組成物可藉由混合包含(A)成分及(B)成分之調配成分(視需要包含(A)成分及(B)成分以外之成分),且以三軸輥、球磨機、珠粒研磨機、砂磨機等混練機構,或者超研磨機、行星式混練機等攪拌機構溶解或分散,而調製樹脂漆料。調製中,亦可視需要使用用於調整黏度之有機溶劑。有機溶劑列舉為例如乙基甲基酮、環己酮等酮類,甲苯、二甲苯、四甲基苯等芳香族烴類,甲基溶纖素、丁基溶纖素、甲基卡必醇、丁基卡必醇、丙二醇單甲基醚、二丙二醇單乙基醚、二丙二醇二乙基醚、三乙二醇單乙基醚等二醇醚類,乙酸乙酯、乙酸丁酯、丁基溶纖素乙酸酯、卡必醇乙酸酯等酯類,辛烷、癸烷等脂肪族烴類,石油醚、石油腦、氫化石油腦、溶劑石油腦等石油系溶劑等。該等可使用1種亦可組合2種以上使用。 The resin composition of the present invention can be prepared by mixing a component containing the components (A) and (B) (including components other than the components (A) and (B) as necessary), and using a triaxial roll, a ball mill, and a bead. A mixing mechanism such as a grain grinder or a sand mill, or a stirring mechanism such as an ultra-grinding machine or a planetary kneading machine dissolves or disperses to prepare a resin paint. In the preparation, an organic solvent for adjusting the viscosity may also be used as needed. The organic solvent is exemplified by ketones such as ethyl methyl ketone and cyclohexanone, aromatic hydrocarbons such as toluene, xylene, and tetramethylbenzene, methyl cellosolve, butyl cellosolve, methyl carbitol, and butyl. Glycol ethers such as carbitol, propylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol diethyl ether, triethylene glycol monoethyl ether, ethyl acetate, butyl acetate, butyl cellosolve Esters such as acetate and carbitol acetate, aliphatic hydrocarbons such as octane and decane, petroleum solvents such as petroleum ether, petroleum brain, hydrogenated petroleum brain, and solvent petroleum brain. These may be used alone or in combination of two or more.

本發明之樹脂組成物之形態並無特別限制,較好以液狀樹脂組成物、薄膜狀樹脂組成物使用。又,所謂「液狀」意指在室溫下為液體。 The form of the resin composition of the present invention is not particularly limited, and it is preferably used as a liquid resin composition or a film-like resin composition. Moreover, "liquid" means a liquid at room temperature.

<液狀樹脂組成物> <Liquid resin composition>

本發明之樹脂組成物可藉由如上述溶解或分散於各種有機溶劑中成為液狀物,而製作液狀樹脂組成物。此處使用之有機溶劑並無特別限制,但就抑制溶劑之揮發、提高印刷性之觀點而言,較好使用沸點為100℃以上之溶劑, 進而,更好使用沸點為120℃以上之溶劑。樹脂組成物尤其是作為上覆塗佈劑(可撓性印刷配線板之上覆塗佈劑、封裝有機TFT元件用之上覆塗佈劑等)、印刷配線板之絕緣保護膜使用時,較好調製成液狀樹脂組成物。 The resin composition of the present invention can be produced into a liquid resin by dissolving or dispersing it in various organic solvents as described above. The organic solvent to be used herein is not particularly limited, but from the viewpoint of suppressing volatilization of the solvent and improving printability, a solvent having a boiling point of 100 ° C or higher is preferably used. Further, a solvent having a boiling point of 120 ° C or higher is more preferably used. When the resin composition is used as an overcoating agent (coating agent for a flexible printed wiring board, a coating agent for encapsulating an organic TFT element, etc.) or an insulating protective film for a printed wiring board, It is prepared into a liquid resin composition.

<薄膜狀樹脂組成物> <film-like resin composition>

本發明之樹脂組成物可根據熟悉本技藝者習知之方法,製作薄膜狀樹脂組成物。例如,將如上述調整之樹脂漆料塗佈於支撐體上,藉加熱或吹熱風等使有機溶劑乾燥,形成薄膜,而獲得薄膜狀樹脂組成物,製造作為附有支撐體之薄膜狀樹脂組成物。支撐體為製造薄膜狀樹脂組成物時成為支撐體者,係在將本發明之樹脂組成物應用於裝置、器件、構件等之所需部位時,經剝離或去除者。支撐體可列舉為聚乙烯、聚氯化乙烯等聚烯烴,聚對苯二甲酸乙二酯(以下有時簡稱為「PET」)、聚萘二甲酸乙二酯等聚酯、聚醯亞胺膜,以及脫模紙或銅箔等金屬箔等。 The resin composition of the present invention can be produced into a film-like resin composition according to a method known to those skilled in the art. For example, the resin paint adjusted as described above is applied onto a support, and the organic solvent is dried by heating or blowing hot air to form a film, thereby obtaining a film-like resin composition, and producing a film-like resin composition as a support. Things. The support is a support when the film-form resin composition is produced, and is used when the resin composition of the present invention is applied to a desired portion of a device, a device, a member, or the like, and is peeled off or removed. Examples of the support include polyolefins such as polyethylene and polyvinyl chloride, polyethylene terephthalate (hereinafter sometimes abbreviated as "PET"), polyester such as polyethylene naphthalate, and polyimine. A film, a metal foil such as a release paper or a copper foil, or the like.

樹脂漆料之乾燥條件並無特別限制,但為了保持樹脂組成物之接著能力,重要的是乾燥時儘可能不進行樹脂組成物之硬化。又,薄膜狀樹脂組成物內殘留較多有機溶劑時,由於會成為硬化後產生鼓起之原因,故乾燥至薄膜狀樹脂組成物中之有機溶劑之比例成為5質量%以下,較好成為3質量%以下。具體之乾燥條件較好為例如在50~120℃乾燥3~15分鐘。 The drying conditions of the resin paint are not particularly limited, but in order to maintain the adhesive ability of the resin composition, it is important that the resin composition is hardened as much as possible during drying. In addition, when a large amount of the organic solvent remains in the film-form resin composition, the amount of the organic solvent to be dried in the film-like resin composition is 5 mass% or less, preferably 3 Below mass%. The specific drying conditions are preferably, for example, drying at 50 to 120 ° C for 3 to 15 minutes.

另外,薄膜狀樹脂組成物之厚度並無特別限 制,但就提高硬化體之耐彎折性之觀點而言,較好為100μm以下,更好為80μm以下,又更好為60μm以下。另外,就提高操作性之觀點而言,較好為1μm以上,更好為3μm以上,又更好為10μm以上。 In addition, the thickness of the film-like resin composition is not particularly limited. In view of improving the bending resistance of the hardened body, it is preferably 100 μm or less, more preferably 80 μm or less, and still more preferably 60 μm or less. Moreover, from the viewpoint of improving workability, it is preferably 1 μm or more, more preferably 3 μm or more, and still more preferably 10 μm or more.

本發明之樹脂組成物之用途可使用於上覆塗佈劑、層間絕緣膜、預浸體、阻焊劑、底部填充材、固晶材、半導體封裝材、埋孔樹脂、零件包埋樹脂、TAB用途、COF用途等各種領域中之裝置、器件、構件等中之需要絕緣或保護等之各部位。其中,較好地適用於上覆塗佈劑(尤其是可撓性印刷配線板之上覆塗佈劑、封裝有機TFT元件用之上覆塗佈劑)、層間絕緣膜(尤其是有機EL顯示器、電子紙、觸控面板等各種顯示裝置之層間絕緣膜)。亦即,本發明之樹脂組成物由於低溫硬化性、印刷性優異,且其硬化體具有優異之柔軟性,故藉由使用本發明之樹脂組成物作為可撓性印刷配線板之上覆塗佈劑、封裝有機TFT元件用之上覆塗佈劑、有機EL顯示器等顯示裝置之層間絕緣膜,不會產生有機TFT元件之熱劣化、可撓性印刷配線板或顯示裝置中之元件或基板之熱劣化,而且,不會損及可撓性印刷配線板或顯示裝置所具有之可撓性或彎折性,可容易地形成期望之保護構造、絕緣構造、封裝構造。據此,如此獲得之可撓性印刷配線板、有機TFT器件等由於具有優異之性能,故亦可期待提高內置可撓性印刷配線板、有機TFT器件等之電子設備或性能。至於電子設備列舉為例如行動電話、數位相機、攝錄 影機、遊戲機、個人電腦、印表機、硬碟驅動器、電漿電視、液晶電視、液晶顯示器、汽車導航系統、影印機、傳真機、AV設備、量測設備、醫療設備、有機EL顯示器、電子紙等。 The use of the resin composition of the present invention can be used for an overcoating agent, an interlayer insulating film, a prepreg, a solder resist, an underfill, a solid crystal, a semiconductor package, a buried resin, a part embedding resin, TAB Various parts of equipment, devices, components, and the like that require insulation or protection in various fields such as applications and COF applications. Among them, it is preferably applied to an overcoating agent (especially a coating agent on a flexible printed wiring board, a coating agent for encapsulating an organic TFT element), an interlayer insulating film (especially an organic EL display) , interlayer insulating film of various display devices such as electronic paper and touch panel). In other words, the resin composition of the present invention is excellent in low-temperature curability and printability, and the cured body has excellent flexibility. Therefore, the resin composition of the present invention is coated on the flexible printed wiring board by using the resin composition of the present invention. An interlayer insulating film for a display device such as an overlying coating agent for an organic TFT element or an organic EL display, which does not cause thermal deterioration of an organic TFT element, or a component or substrate in a flexible printed wiring board or a display device. The heat is deteriorated, and the flexibility or bending property of the flexible printed wiring board or the display device is not impaired, and a desired protective structure, insulating structure, and package structure can be easily formed. According to this, the flexible printed wiring board, the organic TFT device, and the like thus obtained have excellent performance, and it is also expected to improve electronic equipment or performance such as a built-in flexible printed wiring board or an organic TFT device. As for electronic devices, such as mobile phones, digital cameras, and video recordings Cameras, game consoles, personal computers, printers, hard disk drives, plasma TVs, LCD TVs, LCD monitors, car navigation systems, photocopiers, fax machines, AV equipment, measuring equipment, medical equipment, organic EL displays , electronic paper, etc.

<可撓性印刷配線板或有機TFT器件> <Flexible printed wiring board or organic TFT device>

將本發明之液狀樹脂組成物塗佈於可撓性印刷配線板或有機TFT器件之特定部分上,使塗布面硬化,可獲得全部表面或一部分表面以本發明之樹脂組成物保護之可撓性印刷配線板或有機TFT器件。硬化條件由於至少必須為使構成液狀樹脂組成物之溶劑充分乾燥,且使樹脂組成物充分熱硬化之條件,故較好在80~200℃乾燥1~120分鐘。形成之表面保護膜之厚度並無特別限制,但較好為1~100μm。 The liquid resin composition of the present invention is applied onto a specific portion of a flexible printed wiring board or an organic TFT device to harden the coated surface, and the entire surface or a part of the surface can be obtained to be protected by the resin composition of the present invention. Printed wiring board or organic TFT device. The curing conditions are preferably at least 80 to 200 ° C for 1 to 120 minutes because at least the solvent constituting the liquid resin composition is sufficiently dried and the resin composition is sufficiently thermally cured. The thickness of the surface protective film to be formed is not particularly limited, but is preferably from 1 to 100 μm.

另外,藉由真空層合機將薄膜狀樹脂組成物層合於可撓性印刷配線板或有機TFT器件之特定部分上,使樹脂組成物硬化,可獲得全部表面或一部分表面以本發明之樹脂組成物保護之可撓性印刷配線板或有機TFT器件。此時,藉由使用附支撐體之薄膜狀樹脂組成物,不污染真空層合機即可完成。此時之層合條件可依據使用之薄膜狀樹脂組成物之種類適當設定,但較好溫度為80~200℃,壓力為1~40kgf/cm2,時間為5~180秒,空氣壓20mmHg以下之減壓下層合。且,層合方式可為批式亦可為利用輥之連續式。另外,硬化條件可依據使用之薄膜狀樹脂組成物之種類,由熟悉本技藝者適當設定,但至少必 須為使樹脂組成物充分熱硬化之條件。尤其,配置元件時,為了不使配置於基板上之元件劣化,較好為150℃以下,更好為130℃以下,又更好為110℃以下。另一方面,就提高硬化體之耐藥品性之觀點而言,較好為40℃以上,更好為45℃以上,又更好為50℃以上。 Further, the film-like resin composition is laminated on a flexible printed wiring board or a specific portion of the organic TFT device by a vacuum laminator to cure the resin composition, and the entire surface or a part of the surface can be obtained as the resin of the present invention. A flexible printed wiring board or an organic TFT device protected by a composition. At this time, it is completed by using a film-like resin composition with a support without contaminating the vacuum laminator. The lamination conditions at this time may be appropriately set depending on the type of the film-form resin composition to be used, but the temperature is preferably 80 to 200 ° C, the pressure is 1 to 40 kgf/cm 2 , the time is 5 to 180 seconds, and the air pressure is 20 mmHg or less. Laminating under reduced pressure. Moreover, the lamination method may be a batch type or a continuous type using a roll. Further, the curing conditions may be appropriately set by those skilled in the art depending on the kind of the film-form resin composition to be used, but at least the conditions for sufficiently curing the resin composition. In particular, when the device is placed, it is preferably 150 ° C or less, more preferably 130 ° C or less, and still more preferably 110 ° C or less in order not to deteriorate the element disposed on the substrate. On the other hand, from the viewpoint of improving the chemical resistance of the cured body, it is preferably 40 ° C or higher, more preferably 45 ° C or higher, and still more preferably 50 ° C or higher.

以下,基於實施例及比較例更具體說明本發明,但本發明並不限於以下之實施例。又,以下記載中之「份」意指「質量份」。 Hereinafter, the present invention will be more specifically described based on examples and comparative examples, but the present invention is not limited to the following examples. In addition, the "parts" in the following description means "parts by mass".

<製造例1> <Manufacturing Example 1>

於具備攪拌裝置、溫度計、冷凝器之500ml燒瓶中饋入聚二烯多元醇「GI-1000」(日本曹達(股)製,羥基價70mgKOH/g)157.8g、「SWASOLVE #1000」(有機溶劑,Daicel化學工業(股)製)26.2g、二乙二醇乙醚乙酸酯17.1g,且在氮氣環境下,於室溫邊攪拌邊添加使「CORONATE T-100」(2,4-甲苯二異氰酸酯,日本Polyurethane工業(股)製)34.4g及二乙二醇乙醚乙酸酯23.0g混合而成者,在室溫反應45分鐘。接著,再添加2.74g之「NEOSTANN U-810」(二辛基錫二月桂酸鹽,日東化成(股)製之SWASOLVE #1000之1%溶液,將物品溫度設為45℃反應1小時。隨後,冷卻至室溫後,邊攪拌邊添加將1,4-丁二醇17.8g、二乙二醇乙醚乙酸酯21g混合而成者,使物品溫度升溫至80℃反應90分鐘。藉由紅外線分光分析確認基於異氰酸酯基之吸收(2274cm-1)消失,獲得反應 物1。接著,於具備攪拌裝置、溫度計、冷凝器之1升燒瓶中饋入229.5g之反應物1、二乙二醇乙醚乙酸酯28.5g、「SWASOLVE #1000」23.4g,且在氮氣環境下,於室溫邊攪拌邊添加使「CORONATE T-100」26.3g及二乙二醇乙醚乙酸酯20.1g、「SWASOLVE #1000」11.7g混合而成者,使物品溫度升溫至45℃,反應1小時。冷卻至室溫後,邊攪拌邊添加將以固體成分換算59.8g之70%溶解於二乙二醇乙醚乙酸酯中之「JER-1001」(三菱化學(股)製)、1,4-丁二醇3.4g、二乙二醇乙醚乙酸酯44.4g、「SWASOLVE #1000」10.9g混合而成者,使物品溫度升溫至45℃反應45分鐘。隨後,添加使異丁醇0.84g、二乙二醇乙醚乙酸酯13.4g混合而成者,在物品溫度45℃下再反應1小時。最後添加「NEOSTANN U-810」之「SWASOLVE #1000」1%溶液1.3g,使物品溫度升溫至110℃,以紅外線分光分析,確認基於異氰酸酯基之吸收消失並終止反應,獲得具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂(製造物1)。 In a 500 ml flask equipped with a stirring device, a thermometer, and a condenser, a polydiene polyol "GI-1000" (manufactured by Nippon Soda Co., Ltd., hydroxyl group 70 mgKOH/g), 157.8 g, "SWASOLVE #1000" (organic solvent) was fed. , Daicel Chemical Industry Co., Ltd.) 26.2g, diethylene glycol diethyl ether acetate 17.1g, and added under a nitrogen atmosphere at room temperature with stirring to make "CORONATE T-100" (2,4-toluene) The isocyanate, which was prepared by mixing 34.4 g of Japan Polyurethane Co., Ltd. and 23.0 g of diethylene glycol diethyl ether acetate, was reacted at room temperature for 45 minutes. Next, 2.74 g of "NEOSTANN U-810" (dioctyltin dilaurate, 1% solution of SWASOLVE #1000 manufactured by Nitto Kasei Co., Ltd.) was added, and the temperature of the article was set to 45 ° C for 1 hour. After cooling to room temperature, 17.8 g of 1,4-butanediol and 21 g of diethylene glycol diethyl ether acetate were added while stirring, and the temperature of the article was raised to 80 ° C for 90 minutes. Spectroscopic analysis confirmed that the isocyanate group-based absorption (2274 cm -1 ) disappeared, and the reactant 1 was obtained. Next, 229.5 g of the reactant 1, diethylene glycol diethyl ether was fed into a 1-liter flask equipped with a stirring device, a thermometer, and a condenser. 28.5 g of acetate and 23.4 g of "SWASOLVE #1000", and added 26.3 g of "CORONATE T-100" and 20.1 g of diethylene glycol diethyl ether acetate under stirring in a nitrogen atmosphere at room temperature, "SWASOLVE"#1000"11.7g was mixed, and the temperature of the article was raised to 45 ° C, and the reaction was carried out for 1 hour. After cooling to room temperature, 70% of the solid content conversion of 59.8 g was dissolved in diethylene glycol diethyl ether. "JER-1001" (Mitsubishi Chemical Co., Ltd.), 1,4-butanediol 3.4g, diethylene glycol B in the acid ester 44.4 g of acetate and 10.9 g of "SWASOLVE #1000" were mixed, and the temperature of the article was raised to 45 ° C for 45 minutes. Then, 0.84 g of isobutanol and 13.4 g of diethylene glycol diethyl ether acetate were added. The product was reacted for an additional hour at an article temperature of 45 ° C. Finally, 1.3 g of "SWASOLVE #1000" 1% solution of "NEOSTANN U-810" was added, and the temperature of the article was raised to 110 ° C. The absorption of the isocyanate group disappears and the reaction is terminated, and a polybutadiene resin having an epoxy group and a urethane structure (Product 1) is obtained.

製造物1之性狀 Manufacture 1 trait

<製造例2> <Manufacturing Example 2>

於具備攪拌裝置、溫度計、冷凝器之500ml燒瓶中饋 入氫化聚二烯多元醇「G-1000」(日本曹達(股)製,羥基價73mgKOH/g)157.8g、「SWASOLVE #1000」(Daicel化學工業(股)製)26.2g、二乙二醇乙醚乙酸酯17.1g,在氮氣環境下,於室溫邊攪拌邊添加使「CORONATE T-100」(日本Polyurethane工業(股)製)34.4g及二乙二醇乙醚乙酸酯23.0g混合而成者,在室溫反應45分鐘。接著,再添加2.74g之「NEOSTANN U-810」之SWASOLVE #1000之1%溶液,使物品溫度成為45℃反應1小時。隨後,冷卻至室溫後,邊攪拌邊添加將「GI-1000」17.8g、二乙二醇乙醚乙酸酯21g混合而成者,使物品溫度升溫至80℃反應90分鐘。藉由紅外線分光分析確認基於異氰酸酯基之吸收(2274cm-1)消失,獲得反應物2。接著,於具備攪拌裝置、溫度計、冷凝器之1升燒瓶中饋入229.5g之反應物1、二乙二醇乙醚乙酸酯28.5g、「SWASOLVE #1000」23.4g,在氮氣環境下,於室溫邊攪拌邊添加將「CORONATE T-100」26.3g、二乙二醇乙醚乙酸酯20.1g、「SWASOLVE #1000」11.7g混合而成者,使物品溫度升溫至45℃反應1小時。冷卻至室溫後,邊攪拌邊添加使以固體成分換算59.8g之70%溶解於二乙二醇乙醚乙酸酯中之「JER-1001」、1,4-丁二醇3.4g、二乙二醇乙醚乙酸酯44.4g、「SWASOLVE #1000」10.9g混合而成者,使物品溫度升溫至45℃反應45分鐘。隨後,添加使異丁醇0.84g、二乙二醇乙醚乙酸酯13.4g混合而成者,在物品溫度45℃再反應1小時。最後添加「NEOSTANN U-810」之 「SWASOLVE #1000」1%溶液1.3g,使物品溫度升溫至110℃,以紅外線分光分析,確認基於異氰酸酯基之吸收消失並終止反應,獲得具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂(製造物2)。 In a 500 ml flask equipped with a stirring device, a thermometer, and a condenser, a hydrogenated polydiene polyol "G-1000" (manufactured by Nippon Soda Co., Ltd., hydroxyl group: 73 mgKOH/g), 157.8 g, "SWASOLVE #1000" (Daicel) was fed. Chemical Industry Co., Ltd., 26.2 g, 17.1 g of diethylene glycol ethyl ether acetate, and added under a nitrogen atmosphere at room temperature with stirring to make "CORONATE T-100" (made by Japan Polyurethane Industrial Co., Ltd.) 34.4 G and 2,300 g of diethylene glycol diethyl ether acetate were mixed and reacted at room temperature for 45 minutes. Next, 2.74 g of a 1% solution of "WAOSTANN U-810" of SWASOLVE #1000 was added, and the temperature of the article was changed to 45 ° C for 1 hour. Subsequently, after cooling to room temperature, 17.8 g of "GI-1000" and 21 g of diethylene glycol diethyl ether acetate were mixed with stirring, and the temperature of the article was raised to 80 ° C for 90 minutes. It was confirmed by infrared spectroscopic analysis that the absorption based on the isocyanate group (2274 cm -1 ) disappeared, and the reactant 2 was obtained. Next, 229.5 g of the reactant 1, 28.5 g of diethylene glycol diethyl ether acetate, and 23.4 g of "SWASOLVE #1000" were fed into a 1-liter flask equipped with a stirring device, a thermometer, and a condenser, and the mixture was placed under a nitrogen atmosphere. To the mixture, 26.3 g of "CORONATE T-100", 20.1 g of diethylene glycol diethyl ether acetate, and 11.7 g of "SWASOLVE #1000" were mixed at room temperature, and the temperature of the article was raised to 45 ° C for 1 hour. After cooling to room temperature, "JER-1001", 1,4-butanediol 3.4 g, and diethyl ether, which were dissolved in diethylene glycol diethyl ether acetate in an amount of 70.8% by weight of 59.8 g in terms of solid content, were added thereto while stirring. 44.4 g of diol ether acetate and 10.9 g of "SWASOLVE #1000" were mixed, and the temperature of the article was raised to 45 ° C for 45 minutes. Subsequently, 0.84 g of isobutanol and 13.4 g of diethylene glycol diethyl ether acetate were added, and the mixture was further reacted at an article temperature of 45 ° C for 1 hour. Finally, 1.3 g of "SWASOLVE #1000" 1% solution of "NEOSTANN U-810" was added, and the temperature of the article was raised to 110 ° C. The infrared spectroscopy analysis confirmed that the absorption based on the isocyanate group disappeared and the reaction was terminated to obtain an epoxy group. A polybutadiene resin of the urethane structure (manufacture 2).

製造物2之性狀 Manufacture 2 properties

<製造例3> <Manufacturing Example 3>

於具備攪拌裝置、溫度計、冷凝器之500ml燒瓶中饋入「CORONATE T-100」36.8g、二乙二醇乙醚乙酸酯15.0g,「SWASOLVE #1000」28.8g,且在氮氣環境下,於室溫攪拌。接著添加使1,4-丁二醇9.5g、二乙二醇乙醚乙酸酯15.0g混合而成者,再添加0.78g之「NEOSTANN U-810」之「SWASOLVE #1000」之1%溶液,使物品溫度升溫至80℃反應90分鐘。冷卻至60℃以下後,添加使氫化聚丁二烯「GI-2000」(日本曹達股份有限公司製,羥基價=47mgKOH/g)124.1g、二乙二醇乙醚乙酸酯15.0g、「SWASOLVE #1000」28.8g混合而成者,再添加1.56g之「NEOSTANN U-810」之「SWASOLVE #1000」之1%溶液,使物品溫度升溫至45℃反應90分鐘。於其中添加使1,4-丁二醇9.5g、二乙二醇乙醚乙酸酯15.0g混合而成 者,使物品溫度升溫至80℃,再反應90分鐘。藉由紅外線分光分析確認基於異氰酸酯基之吸收(2274cm-1)消失,獲得反應物3。 In a 500 ml flask equipped with a stirring device, a thermometer, and a condenser, 36.8 g of "CORONATE T-100", 15.0 g of diethylene glycol diethyl ether acetate, and 28.8 g of "SWASOLVE #1000" were fed, and under a nitrogen atmosphere, Stir at room temperature. Next, a mixture of 9.5 g of 1,4-butanediol and 15.0 g of diethylene glycol diethyl ether acetate was added, and 0.78 g of a 1% solution of "SWASOLVE #1000" of "NEOSTANN U-810" was added. The temperature of the article was raised to 80 ° C for 90 minutes. After cooling to 60 ° C or lower, hydrogenated polybutadiene "GI-2000" (manufactured by Nippon Soda Co., Ltd., hydroxyl value = 47 mgKOH/g) 124.1 g, diethylene glycol diethyl ether acetate 15.0 g, "SWASOLVE" was added. #1000" 28.8g of the mixture was added, and 1.56g of "NEOSTANN U-810" 1% solution of "SWASOLVE #1000" was added, and the temperature of the article was raised to 45 ° C for 90 minutes. 9.5 g of 1,4-butanediol and 15.0 g of diethylene glycol diethyl ether acetate were added thereto, and the temperature of the article was raised to 80 ° C, and the reaction was further carried out for 90 minutes. It was confirmed by infrared spectroscopic analysis that the absorption based on the isocyanate group (2274 cm -1 ) disappeared, and the reactant 3 was obtained.

接著,於具備攪拌裝置、溫度計、冷凝器之1升燒瓶中饋入265.5g之所合成之反應物3、二乙二醇乙醚乙酸酯8.1g、「SWASOLVE #1000」69.2g,在氮氣環境下,於室溫邊攪拌邊添加使「CORONATE T-100」16.3g、二乙二醇乙醚乙酸酯6.1g、「SWASOLVE #1000」4.1g混合而成者,使物品溫度升溫至80℃反應90分鐘。冷卻至室溫後,邊攪拌邊添加使以固體成分換算74.0g之70%溶解於二乙二醇乙醚乙酸酯中之「JER-1001」、二乙二醇乙醚乙酸酯19.0g混合而成者,使物品溫度升溫至45℃反應60分鐘。接著添加使異丁醇1.0g、二乙二醇乙醚乙酸酯3.2g混合而成者,在物品溫度45℃下反應20分鐘,再添加「NEOSTANN U-810」之「SWASOLVE #1000」1%溶液1.2g,使物品溫度升溫至110℃反應90分鐘。 Next, 265.5 g of the synthesized reactant 3, diethylene glycol diethyl ether acetate 8.1 g, and "SWASOLVE #1000" 69.2 g were fed into a 1-liter flask equipped with a stirring device, a thermometer, and a condenser, in a nitrogen atmosphere. Next, a mixture of 16.3 g of "CORONATE T-100", 6.1 g of diethylene glycol diethyl ether acetate, and 4.1 g of "SWASOLVE #1000" was added while stirring at room temperature, and the temperature of the article was raised to 80 ° C. 90 minutes. After cooling to room temperature, "JER-1001" and 19.0 g of diethylene glycol diethyl ether acetate dissolved in diethylene glycol ethyl ether acetate in a solid content of 74.0 g of 70% were added thereto while stirring. In the case of the article, the temperature of the article was raised to 45 ° C for 60 minutes. Then, 1.0 g of isobutanol and 3.2 g of diethylene glycol diethyl ether acetate were added, and the reaction was carried out at an article temperature of 45 ° C for 20 minutes, and then "SWASOLVE #1000" of "NEOSTANN U-810" was added. 1.2 g of the solution was allowed to warm the article to 110 ° C for 90 minutes.

以紅外線分光分析,確認基於異氰酸酯基之吸收(2274cm-1)消失並終止反應,獲得具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂(製造物3)。 The infrared spectroscopy analysis confirmed that the isocyanate group-based absorption (2274 cm -1 ) disappeared and the reaction was terminated to obtain a polybutadiene resin having an epoxy group and a urethane structure (Product 3).

製造物3之性狀 Manufacture 3 properties

<製造例4> <Manufacturing Example 4>

於具備攪拌裝置、溫度計、冷凝器之1升燒瓶中饋入「CORONATE T-100」23.6g、二乙二醇乙醚乙酸酯13.3g,「SWASOLVE #1000」31.9g,在氮氣環境下,於室溫攪拌。於其中添加使1,4-丁二醇6.1g、二乙二醇乙醚乙酸酯13.3g混合而成者,再添加0.7g之「NEOSTANN U-810」之「SWASOLVE #1000」之1%溶液,使物品溫度升溫至80℃反應90分鐘。冷卻至60℃以下後,添加使氫化聚丁二烯「GI-3000」(日本曹達股份有限公司製,羥基價=30mgKOH/g)129.1g、二乙二醇乙醚乙酸酯13.3g、「SWASOLVE #1000」47.8g混合而成者,再添加1.4g之「NEOSTANN U-810」之「SWASOLVE #1000」之1%溶液,使物品溫度升溫至80℃反應80分鐘。冷卻至40℃後,再添加使1,4-丁二醇6.1g、二乙二醇乙醚乙酸酯13.3g混合而成者,使物品溫度升溫至80℃,再反應90分鐘。藉由紅外線分光分析確認基於異氰酸酯基之吸收(2274cm-1)消失並終止反應,獲得反應物4。接著,於具備攪拌裝置、溫度計、冷凝器之1升燒瓶中饋入311.1g之反應物4、二乙二醇乙醚乙酸酯7.4g、「SWASOLVE #1000」55.8g,在氮氣環境下,於室溫邊攪拌邊添加使「CORONATE T-100」12.3g、二乙二醇乙醚乙酸酯9.3g混合而成者,使物品溫度升溫至80℃反應90分鐘。冷卻至室溫後,邊攪拌邊添加將以固體成分換算55.9g之70%溶解於二乙二醇乙醚乙 酸酯中之「JER-1001」、二乙二醇乙醚乙酸酯17.5g混合而成者,使物品溫度升溫至45℃反應1小時。隨後添加異丁醇0.78g、二乙二醇乙醚乙酸酯3.0g,反應30分鐘後,添加「NEOSTANN U-810」之「SWASOLVE #1000」1%溶液3.1g,使物品溫度升溫至110℃反應2小時。以紅外線分光分析,確認基於異氰酸酯基之吸收(2274cm-1)消失並終止反應,獲得具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂(製造物4)。 In a 1-liter flask equipped with a stirring device, a thermometer, and a condenser, 23.6 g of "CORONATE T-100", 13.3 g of diethylene glycol diethyl ether acetate, and 31.9 g of "SWASOLVE #1000" were fed under a nitrogen atmosphere. Stir at room temperature. A 1% solution of "SWASOLVE #1000" of "NEOSTANN U-810" of 0.7 g of 1,4-butanediol and 13.3 g of diethylene glycol diethyl ether acetate was added thereto. The temperature of the article was raised to 80 ° C for 90 minutes. After cooling to 60 ° C or lower, hydrogenated polybutadiene "GI-3000" (manufactured by Nippon Soda Co., Ltd., hydroxyl value = 30 mgKOH/g) 129.1 g, diethylene glycol diethyl ether acetate 13.3 g, "SWASOLVE" was added. #1000" 47.8g of a mixture was added, and a 1% solution of "SWASOLVE #1000" of "NEOSTANN U-810" of 1.4 g was added, and the temperature of the article was raised to 80 ° C for 80 minutes. After cooling to 40 ° C, 6.1 g of 1,4-butanediol and 13.3 g of diethylene glycol diethyl ether acetate were added, and the temperature of the article was raised to 80 ° C, and the reaction was further carried out for 90 minutes. It was confirmed by infrared spectroscopy that the isocyanate group-based absorption (2274 cm -1 ) disappeared and the reaction was terminated to obtain a reactant 4. Next, 311.1 g of the reactant 4, 7.4 g of diethylene glycol diethyl ether acetate, and 55.8 g of "SWASOLVE #1000" were fed into a 1-liter flask equipped with a stirring device, a thermometer, and a condenser, and the mixture was placed under a nitrogen atmosphere. To the mixture, 12.3 g of "CORONATE T-100" and 9.3 g of diethylene glycol diethyl ether acetate were added while stirring at room temperature, and the temperature of the article was raised to 80 ° C for 90 minutes. After cooling to room temperature, a mixture of "JER-1001" and 17.5 g of diethylene glycol diethyl ether acetate dissolved in diethylene glycol ethyl ether acetate in an amount of 55.9 g of solid content was added thereto while stirring. The temperature of the article was raised to 45 ° C for 1 hour. Then, 0.78 g of isobutanol and 3.0 g of diethylene glycol diethyl ether acetate were added, and after reacting for 30 minutes, 3.1 g of "SWASOLVE #1000" 1% solution of "NEOSTANN U-810" was added to raise the temperature of the article to 110 ° C. Reaction for 2 hours. It was confirmed by infrared spectroscopic analysis that the absorption based on the isocyanate group (2274 cm -1 ) disappeared and the reaction was terminated to obtain a polybutadiene resin having an epoxy group and a urethane structure (Production 4).

製造物4之性狀 Manufacture 4 properties

<製造例5> <Manufacturing Example 5>

於具備攪拌裝置、溫度計、冷凝器之1升燒瓶中饋入205.1g之反應物1、二乙二醇乙醚乙酸酯16.9g、「SWASOLVE #1000」45.9g,在氮氣環境下,於室溫邊攪拌邊添加使「CORONATE T-100」23.5g、二乙二醇乙醚乙酸酯10.1g混合而成者,使物品溫度升溫至80℃反應90分鐘。冷卻至室溫後,邊攪拌邊添加使以固體成分換算107.1g之70%溶解於二乙二醇乙醚乙酸酯中之「JER-1001」、二乙二醇乙醚乙酸酯29.0g混合而成者,使物品溫度升溫至45℃反應1小時。隨後,添加使異丁醇1.5g、 二乙二醇乙醚乙酸酯4.7g混合而成者,在物品溫度45℃再反應30分鐘。最後添加「NEOSTANN U-810」之「SWASOLVE #1000」1%溶液1.3g,使物品溫度升溫至110℃反應90分鐘。以紅外線分光分析,確認基於異氰酸酯基之吸收(2274cm-1)消失並終止反應,獲得具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂(製造物5)。 Into a 1 liter flask equipped with a stirring device, a thermometer, and a condenser, 205.1 g of the reactant 1, diethylene glycol diethyl ether acetate (16.9 g, and "SWASOLVE #1000" 45.9 g were fed in a nitrogen atmosphere at room temperature. To the mixture, 23.5 g of "CORONATE T-100" and 10.1 g of diethylene glycol diethyl ether acetate were added while stirring, and the temperature of the article was raised to 80 ° C for 90 minutes. After cooling to room temperature, "JER-1001" and 29.0 g of diethylene glycol diethyl ether acetate dissolved in diethylene glycol diethyl ether acetate in an amount of 707.1% in terms of solid content were added thereto while stirring. The temperature of the article was raised to 45 ° C for 1 hour. Subsequently, 1.5 g of isobutanol and 4.7 g of diethylene glycol diethyl ether acetate were added, and the mixture was further reacted at an article temperature of 45 ° C for 30 minutes. Finally, 1.3 g of "SWASOLVE #1000" 1% solution of "NEOSTANN U-810" was added, and the temperature of the article was raised to 110 ° C for 90 minutes. It was confirmed by infrared spectroscopic analysis that the absorption based on the isocyanate group (2274 cm -1 ) disappeared and the reaction was terminated to obtain a polybutadiene resin having an epoxy group and a urethane structure (Product 5).

製造物5之性狀 Manufacture 5 properties

<製造例6> <Manufacturing Example 6>

於具備攪拌裝置、溫度計、冷凝器之1升燒瓶中饋入253.2g之反應物1、二乙二醇乙醚乙酸酯31.8g、「SWASOLVE #1000」29.0g,在氮氣環境下,於室溫邊攪拌邊添加使「CORONATE T-100」29.0g、二乙二醇乙醚乙酸酯27.9g混合而成者,使物品溫度升溫至40℃反應2小時。冷卻至室溫後,邊攪拌邊添加使以固體成分換算51.8g之70%溶解於二乙二醇乙醚乙酸酯中之「JER-1001」、1,4-丁二醇5.0g、二乙二醇乙醚乙酸酯19.9g、「SWASOLVE #1000」29.0g混合而成者,使物品溫度升溫至80℃反應90分鐘。隨後添加「NEOSTANN U-810」之「SWASOLVE #1000」1%溶液1.1g,使物品溫度升溫至110℃反應90分鐘。以 紅外線分光分析,確認基於異氰酸酯基之吸收(2274cm-1)消失並終止反應,獲得具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂(製造物6)。 Into a 1 liter flask equipped with a stirring device, a thermometer, and a condenser, 253.2 g of the reactant 1, 31.8 g of diethylene glycol diethyl ether acetate, and 29.0 g of "SWASOLVE #1000" were fed in a nitrogen atmosphere at room temperature. To the mixture, 29.0 g of "CORONATE T-100" and 27.9 g of diethylene glycol diethyl ether acetate were added while stirring, and the temperature of the article was raised to 40 ° C for 2 hours. After cooling to room temperature, "JER-1001", 1,4-butanediol 5.0 g, and 2, which are dissolved in diethylene glycol diethyl ether acetate in an amount of 71.8 g of solid content, are added thereto while stirring. 19.9 g of diol ether acetate and 29.0 g of "SWASOLVE #1000" were mixed, and the temperature of the article was raised to 80 ° C for 90 minutes. Subsequently, 1.1 g of "SWASOLVE #1000" 1% solution of "NEOSTANN U-810" was added, and the temperature of the article was raised to 110 ° C for 90 minutes. It was confirmed by infrared spectroscopic analysis that the absorption based on the isocyanate group (2274 cm -1 ) disappeared and the reaction was terminated to obtain a polybutadiene resin having an epoxy group and a urethane structure (Production 6).

製造物6之性狀 Manufacture 6 properties

<製造例7> <Manufacturing Example 7>

於具備攪拌裝置、溫度計、冷凝器之1升燒瓶中饋入聚丁二烯「G-3000」(日本曹達(股)製,羥基價=30mgKOH/g)197.4g、「SWASOLVE #1000」90.6g,在氮氣環境下升溫至物品溫度=60℃,且攪拌至均勻。於其中添加CORONATE T-100 19.4g,持續攪拌10分鐘後,再添加NEOSTANN U-100」(二丁基錫二月桂酸鹽,日東化成(股)製)之「SWASOLVE #1000」之1%溶液2.2g,使物品溫度升溫至75℃反應2小時。反應後,在物品溫度75℃之狀態下,添加使四鹼式酸二酐BTDA(Daicel(股)製)35.8g懸浮於二乙二醇乙醚乙酸酯157.1g中而成者,攪拌10分鐘後,添加以固體成分換算為0.25g之溶解10%三伸乙基二胺之二乙二醇乙醚乙酸酯,使物品溫度升溫至140℃反應180分鐘。以紅外線分光分析,確認基於異氰酸酯基之吸收(2274cm-1)消失,獲得具有酸酐基與胺 基甲酸酯構造之聚丁二烯樹脂(製造物7)。 In a 1-liter flask equipped with a stirring device, a thermometer, and a condenser, polybutadiene "G-3000" (manufactured by Nippon Soda Co., Ltd., hydroxyl value = 30 mgKOH/g), 197.4 g, "SWASOLVE #1000", 90.6 g, was fed. The temperature was raised to a temperature of the article = 60 ° C under a nitrogen atmosphere, and stirred until uniform. After adding 19.4 g of CORONATE T-100 and stirring for 10 minutes, a 1% solution of "SWASOLVE #1000" of NEOSTANN U-100" (dibutyltin dilaurate, manufactured by Nitto Kasei Co., Ltd.) was added. The temperature of the article was raised to 75 ° C for 2 hours. After the reaction, 35.8 g of tetrabasic acid dianhydride BTDA (manufactured by Daicel Co., Ltd.) was suspended in 157.1 g of diethylene glycol diethyl ether acetate at a temperature of 75 ° C, and stirred for 10 minutes. Thereafter, diethylene glycol diethyl ether acetate in which 10% of triethylethylene diamine was dissolved in a solid content of 0.25 g was added, and the temperature of the article was raised to 140 ° C for 180 minutes. In the infrared spectroscopy analysis, it was confirmed that the isocyanate group-based absorption (2274 cm -1 ) disappeared, and a polybutadiene resin having an acid anhydride group and a urethane structure (Product 7) was obtained.

製造物7之性狀 Manufacture 7 properties

<製造例8> <Manufacturing Example 8>

於具備攪拌裝置、溫度計、冷凝器之1升燒瓶中饋入聚碳酸酯二醇「UM-90(1/1)」(宇部興產,羥基價=126mgKOH/g)132.3g、二乙二醇乙醚乙酸酯18.9g、「SWASOLVE #1000」27.0g,在氮氣環境下,在室溫攪拌。於其中添加使「CORONATE T-100」51.2g、二乙二醇乙醚乙酸酯22.0g混合而成者。使物品溫度升溫至80℃反應2小時。冷卻至30℃後,添加使1,4-丁二醇26.5g、二乙二醇乙醚乙酸酯22.0g混合而成者,使物品溫度升溫至120℃反應90分鐘。以紅外線分光分析,確認基於異氰酸酯基之吸收(2274cm-1)消失,獲得反應物6。接著,於具備攪拌裝置、溫度計、冷凝器之1升燒瓶中饋入194.2g之反應物6、二乙二醇乙醚乙酸酯30.6g、「SWASOLVE #1000」26.7g,在氮氣環境下,於室溫邊攪拌邊添加使「CORONATE T-100」33.1g、二乙二醇乙醚乙酸酯20.4g、「SWASOLVE #1000」13.4g混合而成者,使物品溫度升溫至70℃反應2小時。冷卻至40℃後,邊攪拌邊 添加使70%溶解於二乙二醇乙醚乙酸酯中之「JER-1001」75.5g、1,4-丁二醇4.3g、二乙二醇乙醚乙酸酯40.7g、「SWASOLVE #1000」13.4g混合而成者,使物品溫度升溫至80℃反應1小時。隨後添加使異丁醇1.1g、二乙二醇乙醚乙酸酯10.2g混合而成者,在80℃再反應1小時。最後添加「NEOSTANN U-810」之「SWASOLVE #1000」1%溶液4.1g,使物品溫度在80℃反應1小時。以紅外線分光分析,確認基於異氰酸酯基之吸收(2274cm-1)消失並終止反應,獲得具有環氧基與胺基甲酸酯構造之聚碳酸酯樹脂(製造物8)。 Into a 1 liter flask equipped with a stirring device, a thermometer, and a condenser, a polycarbonate diol "UM-90 (1/1)" (Ube Industries, hydroxyvalence = 126 mg KOH/g) 132.3 g, diethylene glycol was fed. 18.9 g of diethyl ether acetate and 27.0 g of "SWASOLVE #1000" were stirred at room temperature under a nitrogen atmosphere. A mixture of 51.2 g of "CORONATE T-100" and 22.0 g of diethylene glycol diethyl ether acetate was added thereto. The temperature of the article was raised to 80 ° C for 2 hours. After cooling to 30 ° C, 26.5 g of 1,4-butanediol and 22.0 g of diethylene glycol diethyl ether acetate were added, and the temperature of the article was raised to 120 ° C for 90 minutes. It was confirmed by infrared spectroscopic analysis that the absorption based on the isocyanate group (2274 cm -1 ) disappeared, and the reactant 6 was obtained. Next, 194.2 g of the reactant 6, 30.6 g of diethylene glycol diethyl ether acetate, and 26.7 g of "SWASOLVE #1000" were fed into a 1-liter flask equipped with a stirring device, a thermometer, and a condenser, and the mixture was placed under a nitrogen atmosphere. To the mixture, 33.1 g of "CORONATE T-100", 20.4 g of diethylene glycol diethyl ether acetate, and 13.4 g of "SWASOLVE #1000" were mixed at room temperature, and the temperature of the article was raised to 70 ° C for 2 hours. After cooling to 40 ° C, 75.5 g of "JER-1001", 4.3 g of 1,4-butanediol, and diethylene glycol diethyl ether acetate, which were 70% dissolved in diethylene glycol diethyl ether acetate, were added with stirring. 40.7 g of the ester and 13.4 g of "SWASOLVE #1000" were mixed, and the temperature of the article was raised to 80 ° C for 1 hour. Subsequently, 1.1 g of isobutanol and 10.2 g of diethylene glycol diethyl ether acetate were added, and the mixture was further reacted at 80 ° C for 1 hour. Finally, 4.1 g of "SWASOLVE #1000" 1% solution of "NEOSTANN U-810" was added, and the temperature of the article was reacted at 80 ° C for 1 hour. It was confirmed by infrared spectroscopic analysis that the absorption based on the isocyanate group (2274 cm -1 ) disappeared and the reaction was terminated to obtain a polycarbonate resin having an epoxy group and a urethane structure (Product 8).

製造物8之性狀 Manufacture 8 properties

<硫醇化合物之製造> <Manufacture of thiol compound>

參(3-巰基丙基)異氰尿酸酯係直接使用以特開昭56-120671所記載之方法成者。亦即,使三烯丙基異氰尿酸酯(日本化成股份有限公司製)與硫醇丙酸(City Chemical LLC製造)在丙酮、乙酸之混合溶液中照射紫外線,進行反應。減壓去除溶劑後,於濃鹽酸中煮沸反應溶液之殘留物,添加無水碳酸鈉進行中和。隨後通過中活性氧化鋁管柱,去除溶劑,獲得參(3-巰基丙基)異氰尿酸酯。 The ginseng (3-mercaptopropyl) isocyanurate is used as it is in the method described in JP-A-56-120671. In other words, the reaction was carried out by irradiating ultraviolet rays with a mixed solution of triallyl isocyanurate (manufactured by Nippon Kasei Co., Ltd.) and thiol propionic acid (manufactured by City Chemical LLC) in acetone or acetic acid. After removing the solvent under reduced pressure, the residue of the reaction solution was boiled in concentrated hydrochloric acid and neutralized by adding anhydrous sodium carbonate. The solvent was then removed through a medium activated alumina column to obtain ginseng (3-mercaptopropyl)isocyanurate.

<實施例1> <Example 1>

混合以固體成分換算為44.4份之製造物1、合成之參(3-巰基丙基)異氰尿酸酯2.6份、作為無機填充材之疏水性二氧化矽「R-805」(日本AEROSIL(股)製,平均粒徑0.012μm)4.6份,以三輥研磨機進行混練後,添加「SWASOLVE #1000」2.0份將黏度調整至約35Pa.s。最後添加作為硬化觸媒之「NICHIGO IMIDAZOLE 1,2-DMI」(日本合成化學工業股份有限公司)2.2份,以自轉.公轉混練機「AWATORY練太郎AR-100」(THINKY(股)製)攪拌,製作樹脂漆料。 Manufactured as a solid content of 44.4 parts, 2.6 parts of synthetic ginseng (3-mercaptopropyl)isocyanurate, and hydrophobic cerium oxide "R-805" as an inorganic filler (Japan AEROSIL ( )), the average particle size of 0.012μm) 4.6 parts, after mixing with a three-roll mill, add "SWASOLVE #1000" 2.0 parts to adjust the viscosity to about 35Pa. s. Finally, 2.2 parts of "NICHIGO IMIDAZOLE 1,2-DMI" (Japan Synthetic Chemical Industry Co., Ltd.) as a hardening catalyst were added to rotate. The AWATORY RITAR AR-100 (manufactured by THINKY Co., Ltd.) was stirred to produce a resin paint.

<實施例2> <Example 2>

除了將實施例1之製造物1變更為製造物2以外,餘均與實施例1同樣,製作樹脂漆料。 A resin paint was produced in the same manner as in Example 1 except that the product 1 of Example 1 was changed to the product 2.

<實施例3> <Example 3>

除將實施例1之製造物1變更為製造物3,將參(3-巰基丙基)異氰尿酸酯之調配量變更為3.7份,將「R-805」之調配量變更為6.2份以外,餘均與實施例1同樣,製作樹脂漆料。 In addition, when the product 1 of the first embodiment was changed to the product 3, the amount of ginseng (3-mercaptopropyl) isocyanurate was changed to 3.7 parts, and the amount of "R-805" was changed to 6.2 parts. A resin paint was produced in the same manner as in Example 1 except for the remainder.

<實施例4> <Example 4>

除將實施例1之製造物1變更為製造物4以外,餘均 與實施例1同樣,製作樹脂漆料。 Except that the product 1 of the first embodiment is changed to the product 4, A resin paint was produced in the same manner as in Example 1.

<實施例5> <Example 5>

除將實施例1之製造物1變更為製造物5,將參(3-巰基丙基)異氰尿酸酯之調配量變更為4.4份,將「R-805」之調配量變更為7.6份以外,餘均與實施例1同樣,製作樹脂漆料。 In addition, when the product 1 of the first embodiment was changed to the product 5, the amount of ginseng (3-mercaptopropyl) isocyanurate was changed to 4.4 parts, and the amount of "R-805" was changed to 7.6 parts. A resin paint was produced in the same manner as in Example 1 except for the remainder.

<實施例6> <Example 6>

除將實施例1之製造物1變更為製造物6,且其調配量設為49份,將參(3-巰基丙基)異氰尿酸酯之調配量變更為2.2份,將「R-805」之調配量變更為3.7份以外,餘均與實施例1同樣,製作樹脂漆料。 In addition, the product 1 of the first embodiment was changed to the product 6, and the amount of the compound 1 was changed to 49 parts, and the amount of ginseng (3-mercaptopropyl) isocyanurate was changed to 2.2 parts, and "R- A resin paint was produced in the same manner as in Example 1 except that the blending amount of 805" was changed to 3.7 parts.

<實施例7> <Example 7>

除將實施例1之參(3-巰基丙基)異氰尿酸酯之調配量變更為9.6份,將「R-805」之調配量變更為16.3份,將「NICHIGO IMIDAZOLE 1,2-DMI」之調配量變更為3.7份以外,餘均與實施例1同樣,製作樹脂漆料。 In addition, the amount of the ginseng (3-mercaptopropyl) isocyanurate of Example 1 was changed to 9.6 parts, and the amount of "R-805" was changed to 16.3 parts, and "NICHIGO IMIDAZOLE 1, 2-DMI" was added. A resin paint was produced in the same manner as in Example 1 except that the blending amount was changed to 3.7 parts.

<實施例8> <Example 8>

除將實施例1之參(3-巰基丙基)異氰尿酸酯之調配量變更為1.6份,將「R-805」之調配量變更為2.7份,將「NICHIGO IMIDAZOLE 1,2-DMI」之調配量變更為0.56 份以外,餘均與實施例1同樣,製作樹脂漆料。 In addition, the amount of the ginseng (3-mercaptopropyl) isocyanurate of Example 1 was changed to 1.6 parts, and the amount of "R-805" was changed to 2.7 parts, and "NICHIGO IMIDAZOLE 1, 2-DMI" was added. The allocation is changed to 0.56 A resin paint was produced in the same manner as in Example 1 except for the remainder.

<實施例9> <Example 9>

除將實施例1之參(3-巰基丙基)異氰尿酸酯2.6g變更為「TMTP」(淀化學(股)製)3.0g以外,餘均與實施例1同樣,製作樹脂漆料。 A resin paint was produced in the same manner as in Example 1 except that 2.6 g of the ginseng (3-mercaptopropyl)isocyanurate of Example 1 was changed to 3.0 g of "TMTP" (manufactured by Seiki Chemical Co., Ltd.). .

<比較例1> <Comparative Example 1>

除將實施例1之參(3-巰基丙基)異氰尿酸酯2.6g變更為「TD2090」(DIC(股)製,MEK溶液)2.4g以外(固體成分換算),餘均與實施例1同樣,製作樹脂漆料。 In addition, 2.6 g of ginseng (3-mercaptopropyl)isocyanurate of Example 1 was changed to "TD2090" (MEK solution of DIC (manufactured by DIC)) (solid content conversion), and the remainder and examples 1 Similarly, a resin paint was produced.

<比較例2> <Comparative Example 2>

混合以固體成分換算為44.4g之製造物7、作為無機填充材之疏水性二氧化矽「R-805」7.8g,以三輥研磨機進行混練後,添加作為硬化劑之以固體成分換算為18.6g之溶於二乙二醇乙醚乙酸酯中之JER-1001、2.2g之「NICHIGO IMIDAZOLE 1,2-DMI」,以自轉.公轉混練機「AWATORY練太郎AR-100」(THINKY(股)製)攪拌,製作樹脂漆料。 The product 7 was converted into a solid content of 44.4 g, and 7.8 g of hydrophobic cerium oxide "R-805" was used as an inorganic filler. After kneading in a three-roll mill, the solid content was added as a curing agent. 18.6g of JER-1001, 2.2g of "NICHIGO IMIDAZOLE 1,2-DMI" dissolved in diethylene glycol ether acetate, for rotation. The AWATORY RITAR AR-100 (manufactured by THINKY Co., Ltd.) was stirred to produce a resin paint.

<比較例3> <Comparative Example 3>

除將實施例1之製造物1變更為製造物8,將參(3-巰基丙基)異氰尿酸酯之調配量變更為3.3g,將「R-805」之調配量變更為5.7g以外,餘均與實施例1同樣,製作樹 脂漆料。 In addition, when the product 1 of the first embodiment was changed to the product 8, the amount of the ginseng (3-mercaptopropyl) isocyanurate was changed to 3.3 g, and the amount of the "R-805" was changed to 5.7 g. Other than the same as in the first embodiment, the production tree Grease paint.

接著,針對物性評價中之測定方法.評價方法加以說明。 Next, for the measurement method in the physical property evaluation. The evaluation method will be explained.

<低溫硬化性之評價> <Evaluation of low temperature hardenability>

使用200網眼版,將實施例及比較例所調製之樹脂漆料絲網印刷於50μm厚聚醯亞胺膜(UPILEX 50S:宇部興產(股)製)上,在80℃硬化60分鐘。使用浸入有丙酮之綿棒於硬化面上,以秤顯示10克荷重之力往返摩擦5次,觀察硬化面表面。無變色者評價為「◎」,稍有變色者評價為「○」,明顯變色者評價為「△」,硬化體溶解而露出膜者評價為「×」。又,比較例2中在室溫下因反應進行而見到膠凝化故無法評價。基於相同理由,以後之評價亦無法進行。結果示於表1。 The resin paint prepared in the examples and the comparative examples was screen-printed on a 50 μm thick polyimine film (UPILEX 50S: manufactured by Ube Industries, Ltd.) using a 200 mesh plate, and hardened at 80 ° C for 60 minutes. The sponge was immersed in acetone on the hardened surface, and the force of 10 g of the load was rubbed and rubbed 5 times to observe the surface of the hardened surface. The colorlessness was evaluated as "◎", the slightly discolored was evaluated as "○", the apparently discolored was evaluated as "△", and the hardened body was dissolved to expose the film as "X". Further, in Comparative Example 2, gelation was observed at room temperature due to the progress of the reaction, so that it could not be evaluated. For the same reason, future evaluations will not be possible. The results are shown in Table 1.

<印刷性之評價> <Evaluation of printability>

使用200網眼版,於形成有L/S=15/15μm、電路厚8μm之梳型電極圖型之38μm厚聚醯亞胺膜上,以覆蓋梳型電極圖型整面之方式,將實施例及比較例中調製之樹脂漆料絲網印刷於50μm厚之聚醯亞胺膜(UPILEX 50S:宇部興產(股)製)上。在20℃靜置10分鐘後,於80℃硬化60分鐘(僅比較例1於130℃硬化60分鐘)。硬化體之厚度為50μm。以金屬顯微鏡(MF-UD2017B,Mitsu Toyo股份有限公司製,對物鏡×5,合計倍率×150)觀察剛印刷後~至 10分鐘之印刷部表面、及硬化後之硬化體表面。剛印刷後~5分鐘以內無氣泡時記為「◎」,5分鐘~10分鐘以內無氣泡時記為「○」,硬化後殘留氣泡時記為「×」。結果示於表1。 Using a 200-mesh plate, a 38 μm thick polyimide film having a comb-shaped electrode pattern of L/S=15/15 μm and a circuit thickness of 8 μm was formed to cover the entire surface of the comb-shaped electrode pattern. The resin paint prepared in the examples and the comparative examples was screen-printed on a 50 μm-thick polyimide film (UPILEX 50S: manufactured by Ube Industries, Ltd.). After standing at 20 ° C for 10 minutes, it was hardened at 80 ° C for 60 minutes (only Comparative Example 1 was cured at 130 ° C for 60 minutes). The thickness of the hardened body was 50 μm. After a metal microscope (MF-UD2017B, manufactured by Mitsu Toyo Co., Ltd., objective lens × 5, total magnification × 150), it was observed immediately after printing ~ to 10 minutes of the surface of the printed part, and the surface of the hardened body after hardening. When there is no bubble within ~5 minutes immediately after printing, it is marked as "◎". When there is no bubble within 5 minutes to 10 minutes, it is marked as "○", and when it is left after curing, it is marked as "X". The results are shown in Table 1.

<柔軟性之評價> <Evaluation of softness> (彈性模數及伸長率) (elastic modulus and elongation)

使用棒塗佈器將實施例及比較例中調製之樹脂漆料塗佈於脫模PTFE(聚對苯二甲酸乙二酯)膜(AFLEX 50N:旭硝子(股)製)上,於80℃硬化60分鐘(僅比較例1於130℃硬化60分鐘)。硬化體之厚度為50μm。隨後,剝離PTFE膜。依據日本工業規格(JIS K7161),以溫度25℃、濕度40%RH、拉伸速度50mm/分鐘,使用TENSILON萬能試驗機(A&D(股)製)進行拉伸試驗。彈性模數及伸長率之測定係測定評價樣品之降伏點。結果示於表1。 The resin paint prepared in the examples and the comparative examples was applied to a release PTFE (polyethylene terephthalate) film (AFLEX 50N: manufactured by Asahi Glass Co., Ltd.) using a bar coater, and hardened at 80 ° C. 60 minutes (Comparative Example 1 was cured at 130 ° C for 60 minutes). The thickness of the hardened body was 50 μm. Subsequently, the PTFE film was peeled off. The tensile test was carried out using a TENSILON universal testing machine (manufactured by A&D Co., Ltd.) at a temperature of 25 ° C, a humidity of 40% RH, and a tensile speed of 50 mm/min according to Japanese Industrial Standards (JIS K7161). The measurement of the modulus of elasticity and the elongation are determined by measuring the drop point of the sample. The results are shown in Table 1.

(彎折性) (bending)

使用棒塗佈器將實施例及比較例中調製之樹脂漆料塗佈於50μm厚之聚醯亞胺膜(UPILEX 50S:宇部興產(股)製)上,於80℃硬化60分鐘(僅比較例1於130℃硬化60分鐘)。硬化體之厚度為50μm。以硬化面作為外側彎折180度,以反方向彎折360度。硬化面未引起白化亦未引起龜裂者記為「○」,硬化面見到白化者記為「△」,硬化面觀察到白化及龜裂者記為「×」。結果示於表1。 The resin paint prepared in the examples and the comparative examples was applied to a 50 μm-thick polyimine film (UPILEX 50S: manufactured by Ube Industries, Ltd.) using a bar coater, and hardened at 80 ° C for 60 minutes (only Comparative Example 1 was cured at 130 ° C for 60 minutes). The thickness of the hardened body was 50 μm. The hardened surface is bent 180 degrees on the outside and 360 degrees in the opposite direction. Those who have not been whitened on the hardened surface and have not caused cracks are marked as "○", those who have been cured on the hardened surface are marked as "△", and those who have been whitened and cracked on the hardened surface are marked as "X". The results are shown in Table 1.

<絕緣信賴性之評價> <Evaluation of insulation reliability>

使用200網眼版,於形成有L/S=15/15μm、電路厚8μm之梳型電極圖型之38μ厚聚醯亞胺膜上,以覆蓋梳型電極圖型整面之方式,絲網印刷實施例及比較例中調製之樹脂漆料,在80℃硬化60分鐘(僅比較例1於130℃硬化60分鐘)。一面對其施加100V之電壓,一面在85℃、相對濕度85%之環境下放置1000小時。測定直到觀察到離子遷移或絕緣電阻值下降(至106Ω以下)前之保持時間,以此作為HHBT(高溫及高濕基準試驗)耐久時間。HHBT耐久時間為1000小時以上者記為○,為500小時以上者記為△,未達500小時者記為×。結果示於表1。 Using a 200 mesh plate, on a 38 μ thick polyimine film formed with a comb-shaped electrode pattern of L/S=15/15 μm and a circuit thickness of 8 μm, covering the entire surface of the comb-shaped electrode pattern, the screen The resin varnish prepared in the printing examples and the comparative examples was cured at 80 ° C for 60 minutes (only Comparative Example 1 was cured at 130 ° C for 60 minutes). While applying a voltage of 100 V to it, it was allowed to stand for 1000 hours at 85 ° C and a relative humidity of 85%. The holding time until the ion migration or the insulation resistance value was decreased (to 106 Ω or less) was measured, and this was used as the HHBT (high temperature and high humidity reference test) durability time. When the HHBT endurance time is 1000 hours or longer, it is recorded as ○, when it is 500 hours or longer, it is recorded as Δ, and when it is less than 500 hours, it is recorded as ×. The results are shown in Table 1.

如表1所了解,實施例為可在80℃之低溫硬化之樹脂組成物,可知其硬化膜兼具有優異之柔軟性、印刷性及絕緣信賴性。另一方面,比較例1在低溫下之硬化不充分,硬化膜之伸長率差。比較例2立即凝膠化,就可使用時間方面而言並非耐使用者。比較例3之硬化膜缺乏柔軟性,印刷性、絕緣信賴性亦差。 As understood from Table 1, the examples are resin compositions which can be cured at a low temperature of 80 ° C, and it is understood that the cured film has excellent flexibility, printability, and insulation reliability. On the other hand, in Comparative Example 1, the hardening at a low temperature was insufficient, and the elongation of the cured film was poor. Comparative Example 2 gelled immediately and was not user resistant in terms of time. The cured film of Comparative Example 3 lacked flexibility and was inferior in printability and insulation reliability.

本申請案係以於日本申請之特願2012-097637為基礎,其內容全文包含於本說明書中。 The present application is based on Japanese Patent Application No. 2012-097637, the entire contents of which is incorporated herein.

Claims (17)

一種樹脂組成物,其係含有(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂及(B)硫醇系硬化劑之樹脂組成物,其中(B)硫醇系硬化劑為選自由三羥甲基丙烷參(3-巰基丙酸酯)、季戊四醇肆(3-巰基丙酸酯)、二季戊四醇陸(3-巰基丙酸酯)、參-[(3-巰基丙醯氧基)-乙基]-異氰尿酸酯、參(3-巰基丙基)異氰尿酸酯、硫代乙醇酸辛酯、乙二醇雙(巰基乙酸酯)、三羥甲基丙烷參(巰基乙酸酯)、季戊四醇肆(巰基乙酸酯)、3-巰基丙酸、季戊四醇肆(3-巰基丁酸酯)、1,4-雙(3-巰基丁醯氧基)丁烷、1,3,5-參(3-巰基丁醯氧基乙基)-1,3,5-三嗪-2,4,6(1 H,3 H,5 H)-三酮、三羥甲基丙烷參(3-巰基丁酸酯)及三羥甲基乙烷參(3-巰基丁酸酯)所成群之化合物。 A resin composition comprising (A) a polybutadiene resin having an epoxy group and a urethane structure, and (B) a thiol-based hardener, wherein (B) a thiol-based hardener The agent is selected from the group consisting of trimethylolpropane ginseng (3-mercaptopropionate), pentaerythritol bismuth (3-mercaptopropionate), dipentaerythritol tert-(3-mercaptopropionate), gins-[(3-mercaptopropionate)醯oxy)-ethyl]-isocyanurate, ginseng (3-mercaptopropyl)isocyanurate, octyl thioglycolate, ethylene glycol bis(mercaptoacetate), trimethylol Propane ginseng (mercaptoacetate), pentaerythritol hydrazide (mercaptoacetate), 3-mercaptopropionic acid, pentaerythritol bismuth (3-mercaptobutyrate), 1,4-bis(3-mercaptobutyloxy) butyl Alkane, 1,3,5-gin(3-mercaptobutyloxyethyl)-1,3,5-triazine-2,4,6(1 H,3 H,5 H)-trione, three A compound of the group consisting of methylolpropane ginseng (3-mercaptobutyrate) and trimethylolethane ginate (3-mercaptobutyrate). 如請求項1之樹脂組成物,其為將樹脂組成物之固體成分全體設為100質量%時,(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂之含量為50~95質量%。 In the resin composition of claim 1, when the total solid content of the resin composition is 100% by mass, the content of the (A) polybutadiene resin having an epoxy group and a urethane structure is 50. ~95% by mass. 如請求項1或2之樹脂組成物,其中(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂之數平均分子量為500~200000。 The resin composition of claim 1 or 2, wherein (A) the polybutadiene resin having an epoxy group and a urethane structure has a number average molecular weight of from 500 to 200,000. 如請求項1或2之樹脂組成物,其中(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂之環氧當量為300~10000。 The resin composition of claim 1 or 2, wherein (A) the polybutadiene resin having an epoxy group and a urethane structure has an epoxy equivalent of from 300 to 10,000. 如請求項1或2項之樹脂組成物,其中(A)具有環氧基與胺基甲酸酯構造之聚丁二烯樹脂為使(a)分子內具有 2個以上羥基之聚二烯多元醇化合物、(b)分子內具有1個以上羥基與1個以上環氧基之環氧化合物、及(c)分子內具有2個以上異氰酸酯基之聚異氰酸酯化合物反應而得者。 The resin composition of claim 1 or 2, wherein (A) the polybutadiene resin having an epoxy group and a urethane structure is such that (a) has intramolecular a polydiene polyol compound having two or more hydroxyl groups, (b) an epoxy compound having one or more hydroxyl groups and one or more epoxy groups in the molecule, and (c) a polyisocyanate compound having two or more isocyanate groups in the molecule The reaction comes. 如請求項1或2項之樹脂組成物,其中將樹脂組成物之固體成分全體設為100質量%時,(B)硫醇系硬化劑之含量為0.5~15質量%。 In the resin composition of the item 1 or 2, when the total solid content of the resin composition is 100% by mass, the content of the (B) thiol-based curing agent is 0.5 to 15% by mass. 如請求項1或2項之樹脂組成物,其又含有(C)無機填充材。 The resin composition of claim 1 or 2, which further contains (C) an inorganic filler. 如請求項7之樹脂組成物,其中(C)無機填充材之平均粒徑為0.005~1μm。 The resin composition of claim 7, wherein (C) the inorganic filler has an average particle diameter of 0.005 to 1 μm. 如請求項1或2項之樹脂組成物,其又含有(D)硬化促進劑。 The resin composition of claim 1 or 2, which further contains (D) a hardening accelerator. 如請求項1或2項之樹脂組成物,其為外覆塗佈劑用或層間絕緣膜用。 The resin composition of claim 1 or 2, which is used for an overcoating agent or an interlayer insulating film. 如請求項10之樹脂組成物,其中外覆塗佈劑係用於封裝有機TFT元件之外覆塗佈劑。 The resin composition of claim 10, wherein the overcoating agent is used for encapsulating the organic TFT element with a coating agent. 一種液狀樹脂組成物,其係使用如請求項1或2項之樹脂組成物所成。 A liquid resin composition obtained by using the resin composition of claim 1 or 2. 一種薄膜物,其係使用如請求項1~12中任一項之樹脂組成物所成者。 A film material obtained by using the resin composition according to any one of claims 1 to 12. 一種硬化體,其係如請求項1~9中任一項之樹脂組成物之硬化體,其伸長率為20%以上,彈性模數為1000MPa以下。 A hardened body of the resin composition according to any one of claims 1 to 9, which has an elongation of 20% or more and an elastic modulus of 1000 MPa or less. 一種可撓性印刷配線板,其包含如請求項14之硬 化體。 A flexible printed wiring board comprising the hard as claimed in Chemical body. 一種有機TFT器件,其包含如請求項14之硬化體。 An organic TFT device comprising the hardened body as claimed in claim 14. 一種電子設備,其內置有如請求項15之可撓性印刷配線板或如請求項16之有機TFT器件。 An electronic device incorporating a flexible printed wiring board as claimed in claim 15 or an organic TFT device as claimed in claim 16.
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