TWI586531B - Moisture-impermeable Unit,Moisture-impermeable Structure, and Lighting Device - Google Patents

Moisture-impermeable Unit,Moisture-impermeable Structure, and Lighting Device Download PDF

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TWI586531B
TWI586531B TW105113310A TW105113310A TWI586531B TW I586531 B TWI586531 B TW I586531B TW 105113310 A TW105113310 A TW 105113310A TW 105113310 A TW105113310 A TW 105113310A TW I586531 B TWI586531 B TW I586531B
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xylene
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water vapor
tetrafluoro
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TW201738091A (en
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吳文海
胡建任
王孝宸
曾威傑
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南臺科技大學
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水氣阻隔積層體、水氣阻隔結構體,及發光裝置Water vapor barrier laminate, water vapor barrier structure, and light emitting device

本發明是有關於一種積層體及發光裝置,特別是指一種水氣阻隔積層體及包含該水氣阻隔積層體的發光裝置。The present invention relates to a laminate and a light-emitting device, and more particularly to a water vapor barrier laminate and a light-emitting device including the water-gas barrier laminate.

有機電激發光裝置包含兩上下相間隔地設置的可撓性基板、一位於該等可撓性基板間並連接該等可撓性基板且與該等可撓性基板相配合界定出一容置空間的水氣阻隔圍壁,以及一容置在該容置空間內的有機電激發光元件。該有機電激發光裝置雖透過該水氣阻隔圍壁可避免該有機電激發光元件接觸到水氣而縮短使用期限的問題,然而,該水氣阻隔圍壁僅能針對四周進入的水氣進行阻隔,但無法阻隔由該可撓性基板進入的水氣,再者,該可撓性基板阻隔水氣的效果不佳,因此,該有機電激發元件仍會接觸到水氣,使得該有機電激發光裝置的使用期限仍不符合業界需求。The organic electroluminescent device includes two flexible substrates disposed at intervals between the upper and lower sides, and is disposed between the flexible substrates and connected to the flexible substrates to define an accommodation. The moisture of the space blocks the surrounding wall, and an organic electroluminescent element housed in the accommodating space. The organic electroluminescence device can prevent the organic electroluminescence element from coming into contact with the moisture by the moisture barrier wall, thereby shortening the service life. However, the moisture barrier wall can only be used for the moisture entering the surrounding area. Blocking, but not blocking the moisture entering from the flexible substrate, further, the flexible substrate is not effective in blocking moisture, and therefore, the organic electro-active element is still exposed to moisture, so that the organic electricity The life of the excitation device is still not in line with industry demand.

參閱圖1,台灣專利公開第200829070號揭示一種有機電激發光裝置。該有機電激發光裝置包含一可撓性基板4、一設置於該可撓性基板4上的一下阻隔膜單元5、兩相間隔地設置於該下阻隔膜單元5上的有機電激發光元件6、一設置在該有機電激發光元件6上的吸收層7,以及一包覆該有機電激發光元件6及該吸收層7的上阻隔膜單元8。該下阻隔膜單元5包括一第一阻隔膜51及一設置於該第一阻隔膜51上的第二阻隔膜52。該上阻隔膜單元8包括一第三阻隔膜81及一設置於該第三阻隔膜81上的第四阻隔膜82。該第一阻隔膜51包括一有機層511及一設置在該有機層511上的無機層512。該第二阻隔膜52包括一有機層521及一設置在該有機層521上的無機層522。該第三阻隔膜81包括一有機層811及一設置在該有機層811上的無機層812。該第四阻隔膜82包括一有機層821及一設置在該有機層821上的無機層822。該有機層例如紫外光硬化型、熱固型或聚對二甲苯系(parylene)高分子。該無機層例如二氧化矽(SiO 2)、四氮化三矽(Si 3N 4)、三氧化二鋁(Al 2O 3)、氮化鋁(A1N)、二氧化鈦(TiO 2)、氮化鈦(TiN)、三氧化二鉻(Cr 2O 3)、碳化矽(SiC),或類鑽碳(diamond-like carbon,簡稱DLC)。 Referring to Fig. 1, an organic electroluminescent device is disclosed in Taiwan Patent Publication No. 200829070. The organic electroluminescent device comprises a flexible substrate 4, a lower barrier film unit 5 disposed on the flexible substrate 4, and an organic electroluminescent device disposed on the lower barrier film unit 5 at intervals 6. An absorbing layer 7 disposed on the organic electroluminescent device 6, and an upper barrier film unit 8 covering the organic electroluminescent device 6 and the absorbing layer 7. The lower barrier film unit 5 includes a first barrier film 51 and a second barrier film 52 disposed on the first barrier film 51. The upper barrier film unit 8 includes a third barrier film 81 and a fourth barrier film 82 disposed on the third barrier film 81. The first barrier film 51 includes an organic layer 511 and an inorganic layer 512 disposed on the organic layer 511. The second barrier film 52 includes an organic layer 521 and an inorganic layer 522 disposed on the organic layer 521. The third barrier film 81 includes an organic layer 811 and an inorganic layer 812 disposed on the organic layer 811. The fourth barrier film 82 includes an organic layer 821 and an inorganic layer 822 disposed on the organic layer 821. The organic layer is, for example, an ultraviolet light curing type, a thermosetting type or a parylene polymer. The inorganic layer such as cerium oxide (SiO 2 ), tri-n-triazine (Si 3 N 4 ), aluminum oxide (Al 2 O 3 ), aluminum nitride (A1N), titanium dioxide (TiO 2 ), nitriding Titanium (TiN), chromium oxide (Cr 2 O 3 ), tantalum carbide (SiC), or diamond-like carbon (DLC).

該有機電激發光裝置雖透過該等阻隔膜可輔助該基板阻隔水氣,但該有機電激發光裝置僅考量到水氣阻隔效果,然而,作為一有機電激發光裝置仍需考量在這樣設計下是否會影響發光強度,因此,仍有必要尋找出可兼具水氣阻隔性及光穿透性的有機電激發光裝置。Although the organic electroluminescent device can assist the substrate to block moisture through the barrier film, the organic electroluminescent device only considers the water vapor barrier effect. However, as an organic electroluminescent device, it is still necessary to consider such a design. Whether it will affect the luminous intensity, it is still necessary to find an organic electroluminescent device that can have both moisture barrier and light penetration.

因此,本發明之第一目的,即在提供一種具有光穿透性及水氣阻隔性的水氣阻隔積層體。Accordingly, a first object of the present invention is to provide a water vapor barrier laminate having light penetrability and water vapor barrier properties.

於是,本發明水氣阻隔積層體,包含一聚(α,α,α’,α’-四氟對二甲苯)層及一連接該聚(α,α,α’,α’-四氟對二甲苯)層的無機層,其中,該聚(α,α,α’,α’-四氟對二甲苯)層是由一包括1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯的有機組分所形成,且該無機層的成份包括由三氧化二鋁及氮化矽組成的材料群中選擇的至少一種材料。Thus, the water vapor barrier laminate of the present invention comprises a poly(α,α,α',α'-tetrafluorop-xylene) layer and a poly(α,α,α',α'-tetrafluoro pair An inorganic layer of a layer of xylene), wherein the poly(α,α,α',α'-tetrafluorop-xylene) layer is comprised of one including 1, 1, 2, 2, 9, 9, 10, 10- An organic component of octafluoro[2.2]diparylene is formed, and the composition of the inorganic layer includes at least one selected from the group consisting of aluminum oxide and tantalum nitride.

本發明之第二目的,即在提供一種具有光穿透性及水氣阻隔性的水氣阻隔結構體。A second object of the present invention is to provide a water vapor barrier structure having light penetrability and water vapor barrier properties.

本發明水氣阻隔結構體,包含一基板單元及一連接該基板單元的水氣阻隔積層體。該水氣阻隔積層體包含一聚(α,α,α’,α’-四氟對二甲苯)層及一連接該聚(α,α,α’,α’-四氟對二甲苯)層的無機層,其中,該聚(α,α,α’,α’-四氟對二甲苯)層是由一包括1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯的有機組分所形成,且該無機層的成份包括由三氧化二鋁及氮化矽組成的材料群中選擇的至少一種材料。The water vapor barrier structure of the present invention comprises a substrate unit and a water vapor barrier laminate connected to the substrate unit. The water vapor barrier laminate comprises a poly(α,α,α',α'-tetrafluoro-p-xylene) layer and a layer of the poly(α,α,α',α'-tetrafluoro-p-xylene) The inorganic layer, wherein the poly(α,α,α',α'-tetrafluorop-xylene) layer is composed of one including 1,1,2,2,9,9,10,10-octafluoro[2.2 The organic component of the dimeric p-xylene is formed, and the composition of the inorganic layer includes at least one selected from the group consisting of aluminum oxide and tantalum nitride.

本發明之第三目的,即在提供一種具有長使用壽命且高發光強度的發光裝置。A third object of the present invention is to provide a light-emitting device having a long life and high luminous intensity.

本發明發光裝置,包含兩相間隔設置的水氣阻隔結構體、一水氣阻隔圍壁以及一發光元件。每一水氣阻隔結構體包含一基板單元,及一連接該基板單元的水氣阻隔積層體。該水氣阻隔積層體包含一聚(α,α,α’,α’-四氟對二甲苯)層,及一連接該聚(α,α,α’,α’-四氟對二甲苯)層的無機層,其中,該聚(α,α,α’,α’-四氟對二甲苯)層是由一包括1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯的有機組分所形成,且該無機層的成份包括由三氧化二鋁及氮化矽組成的材料群中選擇的至少一種材料。該水氣阻隔圍壁位於該等水氣阻隔結構體間,且與其中一水氣阻隔結構體的水氣阻隔積層體的無機層及另一水氣阻隔結構體的基板單元連接,並與該無機層及該基板單元相配合界定出一容置空間。該發光元件容置於該容置空間內。The light-emitting device of the invention comprises a two-phase water vapor barrier structure, a water gas barrier wall and a light-emitting element. Each moisture barrier structure comprises a substrate unit and a water vapor barrier laminate connected to the substrate unit. The water vapor barrier laminate comprises a poly(α,α,α',α'-tetrafluoro-p-xylene) layer, and a poly(α,α,α',α'-tetrafluoro-p-xylene) An inorganic layer of a layer, wherein the poly(α,α,α',α'-tetrafluoro-p-xylene) layer is composed of one including 1,1,2,2,9,9,10,10-octafluoro[ 2.2] An organic component of dimerized p-xylene formed, and the composition of the inorganic layer comprises at least one selected from the group consisting of aluminum oxide and tantalum nitride. The moisture barrier wall is located between the water vapor barrier structures, and is connected to the inorganic layer of the water vapor barrier laminate of one of the water vapor barrier structures and the substrate unit of the other moisture barrier structure, and The inorganic layer and the substrate unit cooperate to define an accommodation space. The illuminating element is received in the accommodating space.

本發明之功效在於:透過使用1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯形成聚(α,α,α’,α’-四氟對二甲苯)層並搭配使用三氧化二鋁或氮化矽的無機層來形成該水氣阻隔積層體,使得利用該水氣阻隔積層體的水氣阻隔結構體具有高光穿透性及高水氣阻隔性,也就是說,該水氣阻隔積層體提升了該基板單元的光穿透性及水氣阻隔性。The effect of the present invention is to form a poly(α,α,α',α'-tetrafluoro-pair by using 1,1,2,2,9,9,10,10-octafluoro[2.2]di-p-xylene. The xylene) layer is combined with an inorganic layer of aluminum oxide or tantalum nitride to form the water vapor barrier laminate, so that the water vapor barrier structure using the water vapor barrier laminate has high light transmittance and high moisture. The barrier property, that is, the water vapor barrier laminate improves the light transmittance and water vapor barrier properties of the substrate unit.

本發明將就以下該等實施例來作進一步說明,但應瞭解的是,該等實施例僅為例示說明之用,而不應被解釋為本發明該等實施之限制。The invention is further described in the following examples, but it should be understood that these examples are for illustrative purposes only and are not to be construed as limiting.

參閱圖2,本發明發光裝置之一第一實施例,包含兩上下相間隔地設置的水氣阻隔結構體1、一水氣阻隔圍壁2,以及一發光元件3。箭頭表示光的行徑方向。Referring to Fig. 2, a first embodiment of a light-emitting device of the present invention comprises two water-gas barrier structures 1, a water-gas barrier wall 2, and a light-emitting element 3, which are spaced apart from each other. The arrows indicate the direction of the light.

每一水氣阻隔結構體1包含一基板單元11及一連接該基板單元11的水氣阻隔積層體12。該基板單元11包括一可撓性基板111及一設置在該可撓性基板111的導電層112。該可撓性基板111例如但不限於聚對苯二甲酸乙二酯(polyethylene terephthalate,簡稱PET)基板、聚醚碸(poylether sulfone,簡稱PES)基板,或聚醯亞胺(polyimide,簡稱PI)基板等。該導電層112例如電極層或透明導電層等。該透明導電層例如但不限於氧化銦錫(indium tin oxide,簡稱ITO)層或氧化銦鋅(Indium Zinc Oxide,簡稱IZO)層。該電極層例如但不限於鋁電極層、鋁鎂合金電極層、鋁鋰合金電極層,或鋁鈣合金電極層等。在本發明的第一實施例中,該等水氣阻隔結構體1的基板單元11的可撓性基板111為聚對苯二甲酸乙二酯基板、其中一水氣阻隔結構體1的基板單元11的導電層112為氧化銦錫層,且另一水氣阻隔結構體1的基板單元11的導電層112為鋁電極層。Each moisture barrier structure 1 includes a substrate unit 11 and a moisture barrier laminate 12 connected to the substrate unit 11. The substrate unit 11 includes a flexible substrate 111 and a conductive layer 112 disposed on the flexible substrate 111. The flexible substrate 111 is, for example but not limited to, a polyethylene terephthalate (PET) substrate, a polyether sulfone (PES) substrate, or a polyimide (PI). Substrate, etc. The conductive layer 112 is, for example, an electrode layer or a transparent conductive layer or the like. The transparent conductive layer is, for example but not limited to, an indium tin oxide (ITO) layer or an Indium Zinc Oxide (IZO) layer. The electrode layer is, for example but not limited to, an aluminum electrode layer, an aluminum-magnesium alloy electrode layer, an aluminum-lithium alloy electrode layer, or an aluminum-calcium alloy electrode layer or the like. In the first embodiment of the present invention, the flexible substrate 111 of the substrate unit 11 of the water vapor barrier structure 1 is a polyethylene terephthalate substrate, and a substrate unit of the water vapor barrier structure 1 The conductive layer 112 of 11 is an indium tin oxide layer, and the conductive layer 112 of the substrate unit 11 of the other moisture barrier structure 1 is an aluminum electrode layer.

該其中一水氣阻隔結構體1的水氣阻隔積層體12包含一連接該基板單元11的導電層112的聚(α,α,α’,α’-四氟對二甲苯)層121,及一連接該聚(α,α,α’,α’-四氟對二甲苯)層121的無機層122。該另一水氣阻隔結構體1的水氣阻隔積層體12包含一連接該基板單元11的可撓性基板111的聚(α,α,α’,α’-四氟對二甲苯)層121,及一連接該聚(α,α,α’,α’-四氟對二甲苯)層121的無機層122。The moisture barrier laminate 12 of the water vapor barrier structure 1 includes a poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121 connected to the conductive layer 112 of the substrate unit 11, and An inorganic layer 122 of the poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121 is attached. The water vapor barrier laminate 12 of the other moisture barrier structure 1 includes a poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121 connected to the flexible substrate 111 of the substrate unit 11. And an inorganic layer 122 connecting the poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121.

該聚(α,α,α’,α’-四氟對二甲苯)(亦稱parylene HT或parylene AF4)層121是由一包括1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯(1,1,2,2,9,9,10,10-octafluoro[2.2]paracyclophane)的有機組分所形成。該聚(α,α,α’,α’-四氟對二甲苯)層121形成步驟包含對該1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯加熱至90℃~160℃進行氣化,再加熱至650℃~750℃進行裂解,接著,於沉積壓力範圍在1mTorr~100mTorr間進行化學氣相沉積(chemical vapor deposition,簡稱CVD)處理,並聚合形成該聚(α,α,α’,α’-四氟對二甲苯)層121。在本發明的第一實施例中,該聚(α,α,α’,α’-四氟對二甲苯)層121形成步驟的氣化溫度為150℃、該裂解溫度為720℃,且該聚合溫度為32℃且沉積壓力為25mTorr。The poly(α,α,α',α'-tetrafluoro-p-xylene) (also known as parylene HT or parylene AF4) layer 121 is comprised of one including 1, 1, 2, 2, 9, 9, 10, 10- An organic component of octafluoro[2.2]di-p-xylene (1,1,2,2,9,9,10,10-octafluoro[2.2]paracyclophane) is formed. The poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121 forming step comprises the 1,1,2,2,9,9,10,10-octafluoro[2.2] dimerization pair The xylene is heated to a temperature of 90 ° C to 160 ° C for gasification, and then heated to 650 ° C to 750 ° C for cracking, followed by chemical vapor deposition (CVD) at a deposition pressure ranging from 1 mTorr to 100 mTorr. And polymerizing to form the poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121. In the first embodiment of the present invention, the gasification temperature of the poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121 forming step is 150 ° C, the cracking temperature is 720 ° C, and the The polymerization temperature was 32 ° C and the deposition pressure was 25 mTorr.

該無機層122的成份包括三氧化二鋁及氮化矽組成的材料群中選擇的至少一種材料。該無機層122形成步驟包含對一無機靶材進行射頻磁控濺鍍(RF Magnetron Sputtering)處理而沉積並形成該無機層122。該無機靶材為三氧化二鋁靶材或矽靶材。該無機層122為氮化矽時,是於一包含有以氮氣作為反應氣體的環境下進行該射頻磁控濺鍍處理而形成。該射頻磁控濺鍍處理的操作壓力範圍為0.1mTorr至20mTorr。該射頻磁控濺鍍處理的操作溫度範圍為10℃至110℃。在本發明的第一實施例中,該無機層122形成步驟的射頻功率為100W,且該操作溫度為24℃。在本發明的第一實施例中,該水氣阻隔積層體12的無機層122的成份為氮化矽。The composition of the inorganic layer 122 includes at least one selected from the group consisting of aluminum oxide and tantalum nitride. The inorganic layer 122 forming step includes depositing and forming the inorganic layer 122 by performing an RF Magnetron Sputtering process on an inorganic target. The inorganic target is a alumina target or a ruthenium target. When the inorganic layer 122 is tantalum nitride, it is formed by performing the radio frequency magnetron sputtering treatment in an environment containing nitrogen as a reaction gas. The RF magnetron sputtering process operates at a pressure in the range of 0.1 mTorr to 20 mTorr. The RF magnetron sputtering process operates at temperatures ranging from 10 ° C to 110 ° C. In the first embodiment of the present invention, the RF power of the inorganic layer 122 forming step is 100 W, and the operating temperature is 24 °C. In the first embodiment of the present invention, the inorganic layer 122 of the water vapor barrier laminate 12 is made of tantalum nitride.

該水氣阻隔圍壁2位於該等水氣阻隔結構體1間。該水氣阻隔圍壁2的底緣及頂緣分別連接該其中一水氣阻隔結構體1的水氣阻隔積層體12的無機層122及該另一水氣阻隔結構體1的基板單元11的導電層112。該水氣阻隔圍壁2與該無機層122及該導電層112可相配合界定出一容置空間20。該水氣阻隔圍壁2包含分別連接該其中一水氣阻隔結構體1的水氣阻隔積層體12的無機層122及該另一水氣阻隔結構體1的基板單元11的導電層112的兩聚(α,α,α’,α’-四氟對二甲苯)層21及一連接並位於該等聚(α,α,α’,α’-四氟對二甲苯)層21間的無機層22。該聚(α,α,α’,α’-四氟對二甲苯)層21是由一包括1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯的有機組分所形成,且該無機層22的成份包括由三氧化二鋁及氮化矽組成的材料群中選擇的至少一種材料。該等聚(α,α,α’,α’-四氟對二甲苯)層21除可有助於水氣阻隔效果外,因該等水氣阻隔結構體1的無機層122及該導電層112及該水氣阻隔圍壁2的無機層22屬於硬質材質,當彼此相直接相疊合時會產生應力,導致龜裂或生長缺陷的問題產生,故可透過該等聚(α,α,α’,α’-四氟對二甲苯)層21作為緩衝層,以避免應力的產生。該水氣阻隔圍壁2的該等聚(α,α,α’,α’-四氟對二甲苯)層21及該無機層22的形成方式如形成該水氣阻隔積層體12的聚(α,α,α’,α’-四氟對二甲苯)層121及該無機層122,故不再贅述。在本發明的第一實施例中,該水氣阻隔圍壁2的無機層22的成份為氮化矽。The moisture barrier wall 2 is located between the water vapor barrier structures 1. The bottom edge and the top edge of the moisture barrier wall 2 are respectively connected to the inorganic layer 122 of the water vapor barrier laminate 12 of the water vapor barrier structure 1 and the substrate unit 11 of the other moisture barrier structure 1 Conductive layer 112. The moisture barrier wall 2 and the inorganic layer 122 and the conductive layer 112 can cooperate to define an accommodating space 20 . The moisture barrier wall 2 includes two inorganic layers 122 respectively connecting the water vapor barrier laminate 12 of the one water vapor barrier structure 1 and two conductive layers 112 of the substrate unit 11 of the other water vapor barrier structure 1. a poly(α,α,α',α'-tetrafluoro-p-xylene) layer 21 and an inorganic layer connected between the poly(α,α,α',α'-tetrafluoro-p-xylene) layer 21 Layer 22. The poly(α,α,α',α'-tetrafluoro-p-xylene) layer 21 is composed of a 1,1,2,2,9,9,10,10-octafluoro[2.2] dimerized pair. An organic component of toluene is formed, and the composition of the inorganic layer 22 includes at least one selected from the group consisting of aluminum oxide and tantalum nitride. The poly(α,α,α',α'-tetrafluoro-p-xylene) layer 21 may contribute to the water vapor barrier effect, because the inorganic layer 122 of the water vapor barrier structure 1 and the conductive layer 112 and the inorganic layer 22 of the moisture barrier wall 2 are of a hard material, and when they are directly superposed on each other, stress is generated, which causes a problem of cracking or growth defects, so that the poly (α, α, The α',α'-tetrafluoro-p-xylene) layer 21 serves as a buffer layer to avoid stress generation. The poly (α,α,α',α'-tetrafluoro-p-xylene) layer 21 of the moisture barrier wall 2 and the inorganic layer 22 are formed in such a manner as to form the polycondensation of the water vapor barrier laminate 12 ( The α, α, α', α'-tetrafluorop-xylene) layer 121 and the inorganic layer 122 are not described again. In the first embodiment of the present invention, the inorganic layer 22 of the moisture barrier wall 2 is made of tantalum nitride.

該發光元件3容置於該水氣阻隔圍壁2的容置空間20內。該發光元件3例如但不限於有機發光二極體。The light-emitting element 3 is housed in the accommodating space 20 of the moisture barrier wall 2 . The light-emitting element 3 is, for example but not limited to, an organic light-emitting diode.

參閱表1,本發明發光裝置之一第二實施例至一第八實施例與該第一實施例不同在於改變該等水氣阻隔積層體12的無機層122的膜厚及形成該無機層122的操作壓力。參閱表1,為能突顯本發明該等實施例中的技術效果,設計出比較例1至3作為比較對象。該比較例1與該第一實施例不同在於該水氣阻隔結構體1沒有聚(α,α,α’,α’-四氟對二甲苯)層121。該比較例2與該第一實施例不同在於該水氣阻隔結構體1沒有無機層122。該比較例3與該第一實施例不同在於沒有該水氣阻隔積層體12。Referring to Table 1, a second embodiment to an eighth embodiment of the light-emitting device of the present invention differs from the first embodiment in that the film thickness of the inorganic layer 122 of the water vapor barrier laminate 12 is changed and the inorganic layer 122 is formed. Operating pressure. Referring to Table 1, Comparative Examples 1 to 3 were designed as comparison objects in order to highlight the technical effects in the embodiments of the present invention. This Comparative Example 1 differs from the first embodiment in that the moisture barrier structure 1 does not have a poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121. This Comparative Example 2 differs from the first embodiment in that the moisture barrier structure 1 has no inorganic layer 122. This Comparative Example 3 differs from the first embodiment in that the water vapor barrier laminate 12 is not provided.

參閱圖3,本發明發光裝置之一個第九實施例與該第一實施例不同在於每一個水氣阻隔結構體1還包含一位於該基板單元11與該水氣阻隔積層體12的聚(α,α,α’,α’-四氟對二甲苯)層121間,並將該基板單元11與該水氣阻隔積層體12連接固定一起的銜接層13。每一個水氣阻隔積層體12還包括一位於該聚(α,α,α’,α’-四氟對二甲苯)層121及該無機層122間,並將該聚(α,α,α’,α’-四氟對二甲苯)層121及該無機層122連接固定一起的連接層123。該水氣阻隔圍壁2還包括四層連結層23。其中兩層連結層23分別位於該等聚(α,α,α’,α’-四氟對二甲苯)層21及該無機層22間,並將該等聚(α,α,α’,α’-四氟對二甲苯)層21及該無機層22連接固定一起。其餘兩層連結層23分別連接該等聚(α,α,α’,α’-四氟對二甲苯)層21,以將該水氣阻隔圍壁2與該等水氣阻隔結構體1連接固定一起。Referring to FIG. 3, a ninth embodiment of the light-emitting device of the present invention is different from the first embodiment in that each moisture barrier structure 1 further comprises a poly(α) located in the substrate unit 11 and the water vapor barrier laminate 12. The α, α', α'-tetrafluorop-xylene) layer 121, and the substrate unit 11 and the water vapor barrier laminate 12 are joined together to form the bonding layer 13. Each of the moisture barrier laminates 12 further includes a poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121 and the inorganic layer 122, and the poly(α,α,α The connection layer 123 of the ', α'-tetrafluoro-p-xylene) layer 121 and the inorganic layer 122 are bonded together. The moisture barrier wall 2 further includes four tie layers 23. Two of the bonding layers 23 are respectively located between the poly(α,α,α',α'-tetrafluoro-p-xylene) layer 21 and the inorganic layer 22, and the poly(α,α,α', The α'-tetrafluoro-p-xylene) layer 21 and the inorganic layer 22 are joined together. The remaining two connecting layers 23 are respectively connected to the poly(α,α,α',α'-tetrafluoro-p-xylene) layer 21 to connect the water-gas barrier surrounding wall 2 to the water-gas barrier structures 1 Fixed together.

該銜接層13、該連接層123,及該等連結層23的材質為芳香基羥基矽烷化合物。該芳香基羥基矽烷化合物是由一包括芳香基烷氧基矽烷化合物的組分經水解所形成。該芳香基烷氧基矽烷化合物例如但不限於苯基三甲氧基矽烷(phenyltrimethoxysilane)、苯基三乙氧基矽烷(phenyltriethoxysilane),或N-[2-N-(乙烯基苄基胺基)乙基]-3-胺基丙基三甲氧基矽烷{N-[2-(N-vinylbenzylamino)ethyl]-3-aminopropyltrimethoxysilane}。透過該芳香基羥基矽烷化合物中的芳香基與該聚(α,α,α’,α’-四氟對二甲苯)層中的苯基間的相容性,可使得該銜接層13、該連接層123,及該等連結層23穩定地吸附於該聚(α,α,α’,α’-四氟對二甲苯)層上,以及,透過該芳香基羥基矽烷化合物中的羥基與該無機層或導電層形成鍵結,使得該銜接層13、該連接層123,及該等連結層23穩定地與該無機層或導電層結合,繼而使該水氣阻隔積層體12的聚(α,α,α’,α’-四氟對二甲苯)層121及無機層122連接固定一起、使該水氣阻隔圍壁2的聚(α,α,α’,α’-四氟對二甲苯)層21及無機層22連接固定一起以及使該基板單元11與該水氣阻隔積層體12連接固定一起。該銜接層13、該連接層123,及該等連結層23的形成方式,可採用浸置成膜方式。以該銜接層13來說,將該基板單元11進行清洗並乾燥,接著,將該乾燥後的基板單元11浸泡於一包含芳香基羥基矽烷化合物的溶液中,其中,該芳香基羥基矽烷化合物的溶液是由將芳香基烷氧基矽烷化合物置於醋酸水溶液中進行水解反應所形成。然後,取出該基板單元11並乾燥,即可在該基板單元11上形成該銜接層13。該清洗使用的試劑依序為丙酮、甲醇及去離子水。該連接層123及該連結層23形成方式如同該銜接層13的形成方式,故不再贅述。The material of the bonding layer 13, the connecting layer 123, and the connecting layer 23 is an aromatic hydroxy decane compound. The aromatic hydroxy decane compound is formed by hydrolysis of a component comprising an arylalkoxy decane compound. The arylalkoxy decane compound such as, but not limited to, phenyltrimethoxysilane, phenyltriethoxysilane, or N-[2-N-(vinylbenzylamino)B 5-aminopropyltrimethoxydecane {N-[2-(N-vinylbenzylamino)ethyl]-3-aminopropyltrimethoxysilane}. The interface layer 13 can be made by the compatibility between the aromatic group in the aromatic hydroxy decane compound and the phenyl group in the poly(α,α,α',α'-tetrafluoro-p-xylene) layer. The connecting layer 123, and the connecting layer 23 are stably adsorbed on the poly(α,α,α',α'-tetrafluoro-p-xylene) layer, and the hydroxyl group in the aromatic hydroxy decane compound and the The inorganic layer or the conductive layer forms a bond, so that the bonding layer 13, the connecting layer 123, and the connecting layer 23 are stably combined with the inorganic layer or the conductive layer, and then the water vapor barrier layer 12 is aggregated (α). , α, α', α'-tetrafluoro-p-xylene) layer 121 and inorganic layer 122 are joined together to make the water vapor barrier wall 2 poly(α,α,α',α'-tetrafluoro-ply The toluene layer 21 and the inorganic layer 22 are joined and fixed together, and the substrate unit 11 is connected and fixed to the water vapor barrier laminate 12. The bonding layer 13, the connecting layer 123, and the manner in which the connecting layers 23 are formed may be formed by a method of immersion film formation. In the case of the bonding layer 13, the substrate unit 11 is washed and dried, and then the dried substrate unit 11 is immersed in a solution containing an aromatic hydroxy decane compound, wherein the aryl hydroxy decane compound The solution is formed by subjecting an aromatic alkoxydecane compound to an aqueous acetic acid solution for hydrolysis. Then, the substrate unit 11 is taken out and dried to form the bonding layer 13 on the substrate unit 11. The reagents used for the cleaning are acetone, methanol and deionized water. The connection layer 123 and the connection layer 23 are formed in the same manner as the formation of the connection layer 13, and therefore will not be described again.

參閱表1及表2,本發明發光裝置之一第十實施例與該第一實施例不同在於該水氣阻隔積層體12的無機層122及該水氣阻隔圍壁2的無機層22的成分皆為三氧化二鋁。參閱表2,本發明發光裝置之一第十一實施例至一第十七實施例與該第十實施例不同在於改變該水氣阻隔積層體12的無機層122的膜厚及形成該無機層122的操作壓力。參閱表1及表2,本發明發光裝置之一第十八實施例與該第九實施例不同在於該水氣阻隔積層體12的無機層122及該水氣阻隔圍壁2的無機層22的成分為三氧化二鋁。參閱表2,為能突顯本發明該等實施例中的技術效果,設計出比較例4作為比較對象。該比較例4與該第十實施例不同在於該水氣阻隔結構體1沒有聚(α,α,α’,α’-四氟對二甲苯)層121。Referring to Tables 1 and 2, a tenth embodiment of the light-emitting device of the present invention differs from the first embodiment in the composition of the inorganic layer 122 of the water vapor barrier laminate 12 and the inorganic layer 22 of the moisture barrier wall 2. All are aluminum oxide. Referring to Table 2, an eleventh embodiment to a seventeenth embodiment of the light-emitting device of the present invention differs from the tenth embodiment in that the film thickness of the inorganic layer 122 of the water vapor barrier laminate 12 is changed and the inorganic layer is formed. Operating pressure of 122. Referring to Tables 1 and 2, an eighteenth embodiment of the light-emitting device of the present invention differs from the ninth embodiment in that the inorganic layer 122 of the water vapor barrier laminate 12 and the inorganic layer 22 of the moisture barrier wall 2 The composition is aluminum oxide. Referring to Table 2, in order to highlight the technical effects in the embodiments of the present invention, Comparative Example 4 was designed as a comparison object. This Comparative Example 4 differs from the tenth embodiment in that the moisture barrier structure 1 does not have a poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121.

評價項目Evaluation project

水氣阻隔性量測:使用鈣測試法對該等實施例的水氣阻隔結構體1、比較例1、2及4的水氣阻隔結構體1,及比較例3的基板單元11進行水氣滲透率(單位:g/m 2/day)的量測。 Water vapor barrier property measurement: Water vapor barrier structure 1 of the first embodiment, water vapor barrier structure 1 of Comparative Examples 1, 2 and 4, and substrate unit 11 of Comparative Example 3 were subjected to moisture gas using a calcium test method. Measurement of permeability (unit: g/m 2 /day).

平均光穿透率(單位:%):使用紫外光-可見光光譜儀(Ultraviolet -Visible Spectroscopy;廠牌:PerkinElmer;型號:Lambda 25)對該等實施例的水氣阻隔結構體1、比較例1、2及4的水氣阻隔結構體1,及比較例3的基板單元11進行量測,且偵測波長為400nm至800nm。Average light transmittance (unit: %): Water vapor barrier structure 1 of Comparative Example 1, Comparative Example 1, using Ultraviolet-Visible Spectroscopy (label: PerkinElmer; Model: Lambda 25) The water vapor barrier structure 1 of 2 and 4, and the substrate unit 11 of Comparative Example 3 were measured, and the detection wavelength was 400 nm to 800 nm.

附著性測試(單位:%,剝落百分比):使用百格刀分別在該第一實施例、第九實施例、第十實施例及第十八實施例的水氣阻隔結構體1的聚(α,α,α’,α’-四氟對二甲苯)層121及無機層122上分別刻畫網狀格線,形成100個格子點。將一膠帶黏貼在該等格子點上,接著,將該膠帶撕開,觀察該聚(α,α,α’,α’-四氟對二甲苯)層121及該無機層122剝落情況。Adhesion test (unit: %, percentage of peeling): Poly (α) of the water-gas barrier structure 1 of the first embodiment, the ninth embodiment, the tenth embodiment, and the eighteenth embodiment, respectively, using a hundred-knife knife The α, α', α'-tetrafluorop-xylene) layer 121 and the inorganic layer 122 are respectively patterned with a grid line to form 100 lattice points. A tape was adhered to the lattice dots, and then the tape was torn to observe the peeling of the poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121 and the inorganic layer 122.

表1 <TABLE border="1" borderColor="#000000" width="_0003"><TBODY><tr><td> 厚度 </td><td> 實施例 </td><td> 比較例 </td></tr><tr><td> 一 </td><td> 二 </td><td> 三 </td><td> 四 </td><td> 五 </td><td> 六 </td><td> 七 </td><td> 八 </td><td> 九 </td><td> 1 </td><td> 2 </td><td> 3 </td></tr><tr><td> 基板單元11 </td><td> 可撓性基板111(μm) </td><td> 175 </td><td> 175 </td><td> 175 </td><td> 175 </td></tr><tr><td> 透明導電層(nm) </td><td> 12 </td><td> 12 </td><td> 12 </td><td> 12 </td></tr><tr><td> 銜接層13 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 有 </td><td> -- </td><td> -- </td><td> -- </td></tr><tr><td> 聚(α,α,α’,α’-四氟對二甲苯)層121(nm) </td><td> 75 </td><td> -- </td><td> 75 </td><td> -- </td></tr><tr><td> 連接層123 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 有 </td><td> -- </td><td> -- </td><td> -- </td></tr><tr><td> 無機層 122 </td><td> 氮化矽 </td><td> 膜厚(nm) </td><td> 100 </td><td> 50 </td><td> 150 </td><td> 200 </td><td> 300 </td><td> 400 </td><td> 100 </td><td> 100 </td><td> 100 </td><td> 100 </td><td> -- </td><td> -- </td></tr><tr><td> 壓力(mTorr) </td><td> 1 </td><td> 1 </td><td> 1 </td><td> 1 </td><td> 1 </td><td> 1 </td><td> 5 </td><td> 9 </td><td> 1 </td><td> 1 </td><td> -- </td><td> -- </td></tr><tr><td> 三氧化二鋁 </td><td> 膜厚(nm) </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td></tr><tr><td> 壓力(mTorr) </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td></tr><tr><td> 水氣滲透率 (×10<sup>-3</sup>,g/m<sup>2</sup>/day) </td><td> 5.7 </td><td> 7.7 </td><td> 6.9 </td><td> 7.6 </td><td> 8.7 </td><td> 13 </td><td> 8.2 </td><td> 10 </td><td> 5.2 </td><td> 9.6 </td><td> 13 </td><td> 17 </td></tr><tr><td> 平均光穿透率 (%) </td><td> 95.9 </td><td> - </td><td> 94.06 </td><td> 93.54 </td><td> 92.63 </td><td> - </td><td> - </td><td> - </td><td> 95.6 </td><td> 94.5 </td><td> 83.7 </td><td> 79.4 </td></tr><tr><td> 附著性(%) (剝落百分比) </td><td> 30 </td><td> - </td><td> - </td><td> - </td><td> - </td><td> - </td><td> - </td><td> - </td><td> 0 </td><td> - </td><td> 60 </td><td> - </td></tr><tr height="0"><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td></tr></TBODY></TABLE>Table 1         <TABLE border="1" borderColor="#000000" width="_0003"><TBODY><tr><td> Thickness</td><td> Example </td><td> Comparative Example </td ></tr><tr><td> one</td><td> two</td><td> three</td><td> four</td><td> five</td><td > six</td><td> seven</td><td> eight</td><td> nine</td><td> 1 </td><td> 2 </td><td> 3 </td></tr><tr><td> substrate unit 11 </td><td> flexible substrate 111(μm) </td><td> 175 </td><td> 175 </ Td><td> 175 </td><td> 175 </td></tr><tr><td> Transparent Conductive Layer (nm) </td><td> 12 </td><td> 12 </td><td> 12 </td><td> 12 </td></tr><tr><td> Adapter layer 13 </td><td> None</td><td> None< /td><td> None</td><td> None</td><td> None</td><td> None</td><td> None</td><td> No</td ><td> Yes</td><td> -- </td><td> -- </td><td> -- </td></tr><tr><td> Poly (α, α,α',α'-tetrafluoro-p-xylene) layer 121 (nm) </td><td> 75 </td><td> -- </td><td> 75 </td><td > -- </td></tr><tr><td> Connection Layer 123 </td><td> None</td><td> None</td><td> None</td><td > None</td><td> None</td><td> None</td><td> None</td><td> None</td><td> Yes</td><td> - - </td><t d> -- </td><td> -- </td></tr><tr><td> inorganic layer 122 </td><td> tantalum nitride</td><td> film thickness ( Nm) </td><td> 100 </td><td> 50 </td><td> 150 </td><td> 200 </td><td> 300 </td><td> 400 </td><td> 100 </td><td> 100 </td><td> 100 </td><td> 100 </td><td> -- </td><td> -- </td></tr><tr><td> Pressure (mTorr) </td><td> 1 </td><td> 1 </td><td> 1 </td><td> 1 </td><td> 1 </td><td> 1 </td><td> 5 </td><td> 9 </td><td> 1 </td><td> 1 </ Td><td> -- </td><td> -- </td></tr><tr><td> Al2O3</td><td> Film Thickness (nm) </td> <td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td>< Td> -- </td></tr><tr><td> Pressure (mTorr) </td><td> -- </td><td> -- </td><td> -- < /td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td > -- </td><td> -- </td><td> -- </td><td> -- </td></tr><tr><td> Water vapor permeability (× 10<sup>-3</sup>,g/m<sup>2</sup>/day) </td><td> 5.7 </td><td> 7.7 </td><td> 6.9 < /td><td> 7.6 </td><td> 8.7 </td><td> 13 </ Td><td> 8.2 </td><td> 10 </td><td> 5.2 </td><td> 9.6 </td><td> 13 </td><td> 17 </td> </tr><tr><td> Average light transmittance (%) </td><td> 95.9 </td><td> - </td><td> 94.06 </td><td> 93.54 </td><td> 92.63 </td><td> - </td><td> - </td><td> - </td><td> 95.6 </td><td> 94.5 </ Td><td> 83.7 </td><td> 79.4 </td></tr><tr><td> Adhesion (%) (% of flaking) </td><td> 30 </td>< Td> - </td><td> - </td><td> - </td><td> - </td><td> - </td><td> - </td><td> - </td><td> 0 </td><td> - </td><td> 60 </td><td> - </td></tr><tr height="0">< Td></td><td></td><td></td><td></td><td></td><td></td><td></td><td ></td><td></td><td></td><td></td><td></td><td></td><td></td><td> </td><td></td></tr></TBODY></TABLE>

由表1的第一實施例及比較例1至3實驗數據可知,在相同膜厚下,本發明透過使用1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯形成聚(α,α,α’,α’-四氟對二甲苯)層121並搭配使用氮化矽的無機層122來形成該水氣阻隔積層體12,使得利用該水氣阻隔積層體12的水氣阻隔結構體1,相較於比較例1至3,具有高光穿透性及高水氣阻隔性。From the experimental data of the first embodiment and the comparative examples 1 to 3 of Table 1, it is understood that the present invention uses 1,1,2,2,9,9,10,10-octafluoro[2.2] two under the same film thickness. The poly(p-xylene) forms a poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121 and is combined with an inorganic layer 122 of tantalum nitride to form the water-gas barrier laminate 12, so that the water vapor is utilized. The moisture barrier structure 1 which blocks the laminated body 12 has high light transmittance and high moisture barrier property as compared with Comparative Examples 1 to 3.

再者,由該第一實施例及該第九實施例可知,本發明透過該銜接層13及該等連接層123,確實可更提升該聚(α,α,α’,α’-四氟對二甲苯)層121與該基板單元11及該無機層122間的附著性。Furthermore, it can be seen from the first embodiment and the ninth embodiment that the present invention can enhance the poly(α,α,α',α'-tetrafluoroethylene through the bonding layer 13 and the connecting layers 123. Adhesion between the p-xylene) layer 121 and the substrate unit 11 and the inorganic layer 122.

表2 <TABLE border="1" borderColor="#000000" width="_0004"><TBODY><tr><td> 厚度 </td><td> 實施例 </td><td> 比較例 </td></tr><tr><td> 十 </td><td> 十一 </td><td> 十二 </td><td> 十三 </td><td> 十四 </td><td> 十五 </td><td> 十六 </td><td> 十七 </td><td> 十八 </td><td> 4 </td></tr><tr><td> 基板單元11 </td><td> 可撓性基板111(μm) </td><td> 175 </td><td> 175 </td></tr><tr><td> 透明導電層(nm) </td><td> 12 </td><td> 12 </td></tr><tr><td> 銜接層13 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 有 </td><td> -- </td></tr><tr><td> 聚(α,α,α’,α’-四氟對二甲苯)層121(nm) </td><td> 75 </td><td> -- </td></tr><tr><td> 連接層123 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 無 </td><td> 有 </td><td> -- </td></tr><tr><td> 無機層122 </td><td> 氮化矽 </td><td> 膜厚(nm) </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td></tr><tr><td> 壓力(mTorr) </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td></tr><tr><td> 三氧化二鋁 </td><td> 膜厚(nm) </td><td> 25 </td><td> 8 </td><td> 16 </td><td> 50 </td><td> 100 </td><td> 200 </td><td> 25 </td><td> 25 </td><td> 25 </td><td> 25 </td></tr><tr><td> 壓力(mTorr) </td><td> 9 </td><td> 9 </td><td> 9 </td><td> 9 </td><td> 9 </td><td> 9 </td><td> 11 </td><td> 13 </td><td> 9 </td><td> 9 </td></tr><tr><td> WVTR (×10<sup>-3</sup>,g/m<sup>2</sup>/day) </td><td> 2.6 </td><td> 5.3 </td><td> 3.5 </td><td> 3 </td><td> 5 </td><td> 4.9 </td><td> 3.7 </td><td> 4.2 </td><td> 2.1 </td><td> 5.9 </td></tr><tr><td> 平均光穿透率 (%) </td><td> 92.6 </td><td> 93.3 </td><td> - </td><td> - </td><td> - </td><td> 92.3 </td><td> 92.8 </td><td> 95.1 </td><td> 92.4 </td><td> 84.7 </td></tr><tr><td> 附著性(%)(剝落百分比) </td><td> 40 </td><td> - </td><td> - </td><td> - </td><td> - </td><td> - </td><td> - </td><td> - </td><td> 0 </td><td>   </td></tr><tr height="0"><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td><td></td></tr></TBODY></TABLE>Table 2         <TABLE border="1" borderColor="#000000" width="_0004"><TBODY><tr><td> Thickness</td><td> Example </td><td> Comparative Example </td ></tr><tr><td> ten</td><td> eleven</td><td> twelve</td><td> thirteen</td><td> fourteen</ Td><td> fifteen</td><td> sixteen</td><td> seventeen</td><td> eighteen</td><td> 4 </td></tr> <tr><td> Substrate unit 11 </td><td> Flexible substrate 111(μm) </td><td> 175 </td><td> 175 </td></tr><tr ><td> Transparent Conductive Layer (nm) </td><td> 12 </td><td> 12 </td></tr><tr><td> Interfacing Layer 13 </td><td> No </td><td> no</td><td> no</td><td> no</td><td> no</td><td> no</td><td> no< /td><td> None</td><td> Yes</td><td> -- </td></tr><tr><td> Poly(α,α,α',α'- Tetrafluorop-xylene) layer 121 (nm) </td><td> 75 </td><td> -- </td></tr><tr><td> connection layer 123 </td>< Td> none</td><td> no</td><td> no</td><td> no</td><td> no</td><td> no</td><td> No </td><td> None</td><td> Yes </td><td> -- </td></tr><tr><td> Inorganic layer 122 </td><td> Tantalum nitride</td><td> film thickness (nm) </td><td> -- </td><td> -- </td><td> -- < /td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td > -- </td><td> -- </td></tr><tr><td> Pressure (mTorr) </td><td> -- </td><td> -- </ Td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td><td> -- </td></tr><tr><td> Al2O3</td><td> Film Thickness (nm) </td><td> 25 </td><td> 8 </td><td> 16 </td><td> 50 </td><td> 100 </td><td> 200 </ Td><td> 25 </td><td> 25 </td><td> 25 </td><td> 25 </td></tr><tr><td> pressure (mTorr) </ Td><td> 9 </td><td> 9 </td><td> 9 </td><td> 9 </td><td> 9 </td><td> 9 </td> <td> 11 </td><td> 13 </td><td> 9 </td><td> 9 </td></tr><tr><td> WVTR (×10<sup>- 3</sup>,g/m<sup>2</sup>/day) </td><td> 2.6 </td><td> 5.3 </td><td> 3.5 </td><td > 3 </td><td> 5 </td><td> 4.9 </td><td> 3.7 </td><td> 4.2 </td><td> 2.1 </td><td> 5.9 </td></tr><tr><td> Average Light Penetration (%) </td><td> 92.6 </td><td> 93.3 </td><td> - </td> <td> - </td><td> - </td><td> 92.3 </td><td> 92.8 </td><td> 95.1 </td><td> 92.4 </td><td > 84.7 </td></tr><tr> <td> Adhesion (%) (% of flaking) </td><td> 40 </td><td> - </td><td> - </td><td> - </td><td > - </td><td> - </td><td> - </td><td> - </td><td> 0 </td><td> </td></tr>< Tr height="0"><td></td><td></td><td></td><td></td><td></td><td></td>< Td></td><td></td><td></td><td></td><td></td><td></td><td></td><td ></td></tr></TBODY></TABLE>

由表1及表2的第十實施例及比較例2至4實驗數據可知,在相同膜厚下,本發明透過使用1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯形成聚(α,α,α’,α’-四氟對二甲苯)層121並搭配使用三氧化二鋁的無機層122來形成該水氣阻隔積層體12,使得利用該水氣阻隔積層體12的水氣阻隔結構體1,相較於比較例2至4,具有高光穿透性及高水氣阻隔性。From the experimental data of the tenth embodiment and the comparative examples 2 to 4 of Tables 1 and 2, it is understood that the present invention uses 1,1,2,2,9,9,10,10-octafluorofluorene under the same film thickness [ 2.2] dimerized p-xylene forms a poly(α,α,α',α'-tetrafluoro-p-xylene) layer 121 and is combined with an inorganic layer 122 of aluminum oxide to form the water-gas barrier laminate 12, The moisture barrier structure 1 using the water vapor barrier laminate 12 has high light transmittance and high moisture barrier property as compared with Comparative Examples 2 to 4.

再者,由該第九實施例及該第十八實施例可知,本發明透過該銜接層13及該等連接層123,確實可更提升該聚(α,α,α’,α’-四氟對二甲苯)層121與該基板單元11及該無機層122間的附著性。Furthermore, it can be seen from the ninth embodiment and the eighteenth embodiment that the present invention can enhance the poly(α,α,α',α'-four by the connecting layer 13 and the connecting layer 123. Adhesion between the fluoro-p-xylylene layer 121 and the substrate unit 11 and the inorganic layer 122.

綜上所述,本發明透過使用1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯形成聚(α,α,α’,α’-四氟對二甲苯)層121並搭配使用三氧化二鋁或氮化矽的無機層122來形成該水氣阻隔積層體12,使得利用該水氣阻隔積層體12的水氣阻隔結構體1具有高光穿透性及高水氣阻隔性,也就是說,該水氣阻隔積層體12提升了該基板單元11的光穿透性及水氣阻隔性,故確實能達成本發明之目的。In summary, the present invention forms poly(α,α,α',α'-tetrafluoroethylene by using 1,1,2,2,9,9,10,10-octafluoro[2.2]dimerized p-xylene. The p-xylene) layer 121 is used in combination with the inorganic layer 122 of aluminum oxide or tantalum nitride to form the water vapor barrier laminate 12, so that the moisture barrier structure 1 using the water vapor barrier laminate 12 has high light penetration. The permeability and high moisture barrier property, that is, the water vapor barrier laminate 12 enhances the light transmittance and water vapor barrier properties of the substrate unit 11, so that the object of the present invention can be achieved.

惟以上所述者,僅為本發明之實施例而已,當不能以此限定本發明實施之範圍,凡是依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。However, the above is only the embodiment of the present invention, and the scope of the invention is not limited thereto, and all the equivalent equivalent changes and modifications according to the scope of the patent application and the patent specification of the present invention are still The scope of the invention is covered.

1‧‧‧水氣阻隔結構體
11‧‧‧基板單元
111‧‧‧可撓性基板
112‧‧‧導電層
12‧‧‧水氣阻隔積層體
121‧‧‧聚(α,α,α’,α’-四氟對二甲苯)層
122‧‧‧無機層
123‧‧‧連接層
13‧‧‧銜接層
2‧‧‧水氣阻隔圍壁
21‧‧‧聚(α,α,α’,α’-四氟對二甲苯)層
22‧‧‧無機層
23‧‧‧連結層
20‧‧‧容置空間
3‧‧‧發光元件
1‧‧‧Water-gas barrier structure
11‧‧‧Substrate unit
111‧‧‧Flexible substrate
112‧‧‧ Conductive layer
12‧‧‧Water vapor barrier laminate
121‧‧‧Poly(α,α,α',α'-tetrafluoro-p-xylene) layer
122‧‧‧Inorganic layer
123‧‧‧Connection layer
13‧‧‧Connecting layer
2‧‧‧Water and gas barrier wall
21‧‧‧Poly(α,α,α',α'-tetrafluoro-p-xylene) layer
22‧‧‧Inorganic layer
23‧‧‧Linking layer
20‧‧‧ accommodating space
3‧‧‧Lighting elements

本發明之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是台灣專利公開第200829070號的有機電激發裝置的一示意圖; 圖2是本發明發光裝置之一第一實施例的一立體分解示意圖;及, 圖3是本發明發光裝置之一第九實施例的一立體分解示意圖。Other features and effects of the present invention will be apparent from the following description of the drawings, wherein: Figure 1 is a schematic view of an organic electro-excitation device of Taiwan Patent Publication No. 200829070; A perspective exploded view of a first embodiment; and FIG. 3 is a perspective exploded view of a ninth embodiment of a light emitting device of the present invention.

1‧‧‧水氣阻隔結構體 1‧‧‧Water-gas barrier structure

11‧‧‧基板單元 11‧‧‧Substrate unit

111‧‧‧可撓性基板 111‧‧‧Flexible substrate

112‧‧‧導電層 112‧‧‧ Conductive layer

12‧‧‧水氣阻隔積層體 12‧‧‧Water vapor barrier laminate

121‧‧‧聚(α,α,α’,α’-四氟對二甲苯)層 121‧‧‧Poly(α,α,α',α'-tetrafluoro-p-xylene) layer

122‧‧‧無機層 122‧‧‧Inorganic layer

2‧‧‧水氣阻隔圍壁 2‧‧‧Water and gas barrier wall

21‧‧‧聚(α,α,α’,α’-四氟對二甲苯)層 21‧‧‧Poly(α,α,α',α'-tetrafluoro-p-xylene) layer

22‧‧‧無機層 22‧‧‧Inorganic layer

20‧‧‧容置空間 20‧‧‧ accommodating space

3‧‧‧發光元件 3‧‧‧Lighting elements

Claims (10)

一種水氣阻隔積層體,包含: 一聚(α,α,α’,α’-四氟對二甲苯)層;及 一無機層,連接該聚(α,α,α’,α’-四氟對二甲苯)層; 其中,該聚(α,α,α’,α’-四氟對二甲苯)層是由一包括1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯的有機組分所形成,且該無機層的成份包括由三氧化二鋁及氮化矽組成的材料群中選擇的至少一種材料。A water vapor barrier laminate comprising: a poly(α,α,α',α'-tetrafluoro-p-xylene) layer; and an inorganic layer connecting the poly(α,α,α',α'-four a layer of fluoro-p-xylene); wherein the layer of poly(α,α,α',α'-tetrafluoro-p-xylene) is composed of one, 1, 2, 2, 9, 9, 10, 10-8 The organic component of fluorine [2.2] di-p-xylene is formed, and the composition of the inorganic layer includes at least one selected from the group consisting of aluminum oxide and tantalum nitride. 如請求項1所述的水氣阻隔積層體,還包含一位於該聚(α,α,α’,α’-四氟對二甲苯)層及該無機層間,並將該聚(α,α,α’,α’-四氟對二甲苯)層及該無機層連接固定一起的連接層,且該連接層的材質為芳香基羥基矽烷化合物。The water vapor barrier laminate according to claim 1, further comprising a layer between the poly(α,α,α',α'-tetrafluorop-xylene) and the inorganic layer, and the poly(α,α The α', α'-tetrafluoro-p-xylene) layer and the connecting layer to which the inorganic layer is bonded and fixed, and the material of the connecting layer is an aromatic hydroxy decane compound. 一種水氣阻隔結構體,包含:一基板單元及一連接該基板單元的水氣阻隔積層體,該水氣阻隔積層體包括一聚(α,α,α’,α’-四氟對二甲苯)層及一連接該聚(α,α,α’,α’-四氟對二甲苯)層的無機層,其中,該聚(α,α,α’,α’-四氟對二甲苯)層是由一包括1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯的有機組分所形成,且該無機層的成份包括由三氧化二鋁及氮化矽組成的材料群中選擇的至少一種材料。A water vapor barrier structure comprising: a substrate unit and a water vapor barrier laminate connected to the substrate unit, the water vapor barrier laminate comprising a poly(α,α,α',α'-tetrafluoro-p-xylene a layer and an inorganic layer connecting the poly(α,α,α',α'-tetrafluoro-p-xylene) layer, wherein the poly(α,α,α',α'-tetrafluoro-p-xylene) The layer is formed of an organic component comprising 1,1,2,2,9,9,10,10-octafluoro[2.2]diparylene, and the composition of the inorganic layer comprises aluminum oxide And at least one material selected from the group consisting of tantalum nitride. 如請求項3所述的水氣阻隔結構體,其中,該水氣阻隔積層體還包括一位於該聚(α,α,α’,α’-四氟對二甲苯)層及該無機層間,並將該聚(α,α,α’,α’-四氟對二甲苯)層及該無機層連接固定一起的連接層,且該連接層的材質為芳香基羥基矽烷化合物。The moisture barrier structure according to claim 3, wherein the moisture barrier layer further comprises a layer of the poly(α,α,α',α'-tetrafluorop-xylene) and the inorganic layer. And the poly(α,α,α',α'-tetrafluoro-p-xylene) layer and the inorganic layer are bonded and fixed together, and the material of the connection layer is an aromatic hydroxy decane compound. 如請求項3所述的水氣阻隔結構體,其中,該基板單元包括一可撓性基板,及一設置在該可撓性基板的導電層。The moisture barrier structure according to claim 3, wherein the substrate unit comprises a flexible substrate, and a conductive layer disposed on the flexible substrate. 如請求項5所述的水氣阻隔結構體,其中,該導電層為透明導電層。The moisture barrier structure according to claim 5, wherein the conductive layer is a transparent conductive layer. 如請求項6所述的水氣阻隔結構體,還包含一位於該基板單元的透明導電層與該水氣阻隔積層體的聚(α,α,α’,α’-四氟對二甲苯)層間,並將該基板單元與該水氣阻隔積層體連接固定一起的銜接層,且該銜接層的材質為芳香基羥基矽烷化合物。The moisture barrier structure according to claim 6, further comprising a poly(α,α,α',α'-tetrafluoro-p-xylene) located in the transparent conductive layer of the substrate unit and the water vapor barrier laminate. An interlayer of the substrate unit and the water vapor barrier laminate are fixed together, and the material of the interface layer is an aromatic hydroxydecane compound. 一種發光裝置,包含: 兩個相間隔設置的水氣阻隔結構體,每一水氣阻隔結構體包含一基板單元及一連接該基板單元的水氣阻隔積層體,該水氣阻隔積層體包含一聚(α,α,α’,α’-四氟對二甲苯)層及一連接該聚(α,α,α’,α’-四氟對二甲苯)層的無機層,其中,該聚(α,α,α’,α’-四氟對二甲苯)層是由一包括1,1,2,2,9,9,10,10-八氟[2.2]二聚對二甲苯的有機組分所形成,且該無機層的成份包括由三氧化二鋁及氮化矽組成的材料群中選擇的至少一種材料; 一個水氣阻隔圍壁,位於該等水氣阻隔結構體間,且與其中一水氣阻隔結構體的水氣阻隔積層體的無機層及另一水氣阻隔結構體的基板單元連接,並與該無機層及該基板單元相配合界定出一容置空間;以及, 一個發光元件,容置於該容置空間內。A light-emitting device comprising: two spaced-apart water-gas barrier structures, each water-gas barrier structure comprising a substrate unit and a moisture barrier layer connected to the substrate unit, the moisture barrier layer body comprising a poly(α,α,α',α'-tetrafluoro-p-xylene) layer and an inorganic layer connecting the poly(α,α,α',α'-tetrafluoro-p-xylene) layer, wherein the poly layer The (α,α,α',α'-tetrafluoro-p-xylene) layer is composed of an organic organic compound including 1,1,2,2,9,9,10,10-octafluoro[2.2]di-p-xylene. a component formed, and the inorganic layer component comprises at least one selected from the group consisting of aluminum oxide and tantalum nitride; a moisture barrier wall located between the water vapor barrier structures, and And an inorganic layer of the moisture barrier layer of the water vapor barrier structure and a substrate unit of the other moisture barrier structure, and cooperate with the inorganic layer and the substrate unit to define an accommodation space; A light-emitting element is received in the accommodating space. 如請求項8所述的發光裝置,其中,該基板單元包括一可撓性基板,及一設置在該可撓性基板的導電層。The illuminating device of claim 8, wherein the substrate unit comprises a flexible substrate, and a conductive layer disposed on the flexible substrate. 如請求項9所述的發光裝置,其中,該等水氣阻隔結構體的該等基板單元的該等導電層中一者為透明導電層。The illuminating device of claim 9, wherein one of the conductive layers of the substrate units of the water vapor barrier structures is a transparent conductive layer.
TW105113310A 2016-04-28 2016-04-28 Moisture-impermeable Unit,Moisture-impermeable Structure, and Lighting Device TWI586531B (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050146267A1 (en) * 2002-04-04 2005-07-07 Dielectric Systems, Inc. Organic light emitting device having a protective barrier
TW200829070A (en) * 2006-12-27 2008-07-01 Ind Tech Res Inst Organic electroluminescent device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050146267A1 (en) * 2002-04-04 2005-07-07 Dielectric Systems, Inc. Organic light emitting device having a protective barrier
TW200829070A (en) * 2006-12-27 2008-07-01 Ind Tech Res Inst Organic electroluminescent device

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