TWI583003B - Semiconductor devices - Google Patents

Semiconductor devices Download PDF

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TWI583003B
TWI583003B TW104113644A TW104113644A TWI583003B TW I583003 B TWI583003 B TW I583003B TW 104113644 A TW104113644 A TW 104113644A TW 104113644 A TW104113644 A TW 104113644A TW I583003 B TWI583003 B TW I583003B
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wire
wires
diode
coupled
semiconductor device
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TW104113644A
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TW201639179A (en
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張雄世
洪培恒
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世界先進積體電路股份有限公司
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Description

半導體元件 Semiconductor component

本發明係有關於一種電路佈局的擺放方式,特別係有關於一種二極體之電路佈局的擺放方式。 The invention relates to a way of placing a circuit layout, in particular to a way of placing a circuit layout of a diode.

隨著電子裝置的功能不斷日新月異,耗電量也因此隨之增加。例如二極體,隨著耗電量的增加,二極體的驅動亦隨之上升,然而二極體的驅動電流係與接面周長成正比,使得二極體的面積勢必隨之增加。所以,如何有效率地利用面積來增加二極體有效的接面周長,成了目前亟需解決的問題。 As the functions of electronic devices continue to change, so does the power consumption. For example, in the case of a diode, as the power consumption increases, the driving of the diode also increases. However, the driving current of the diode is proportional to the circumference of the junction, so that the area of the diode is bound to increase. Therefore, how to effectively use the area to increase the effective junction perimeter of the diode has become an urgent problem to be solved.

有鑑於此,本發明提出一種半導體元件,包括:複數第一導線以及複數第二導線。上述第一導線之每一者係形成一封閉多邊形,且圍繞一中心。上述第二導線之每一者係形成上述封閉多邊形,且圍繞上述中心。上述第一導線以及上述第二導線相互交錯,並且上述第一導線以及上述第二導線之任二者不相連接。 In view of this, the present invention provides a semiconductor device including: a plurality of first wires and a plurality of second wires. Each of the first wires described above forms a closed polygon and surrounds a center. Each of the second wires described above forms the closed polygon and surrounds the center. The first wire and the second wire are interlaced with each other, and neither of the first wire and the second wire are connected.

根據本發明之一實施例,更包括:複數第三導線以及複數第四導線。上述第三導線位於上述第一導線以及上述第二導線之上,且自上述中心向外輻射延伸。上述第四導線位於上述第一導線以及上述第二導線之上,且自上述中心向外輻射延伸。 According to an embodiment of the invention, the method further includes: a plurality of third wires and a plurality of fourth wires. The third wire is located above the first wire and the second wire, and radiates outward from the center. The fourth wire is located above the first wire and the second wire, and radiates outward from the center.

根據本發明之一實施例,上述第三導線以及上述第四導線相互交錯且不相連接,其中上述第三導線以及上述第四導線係等分上述封閉多邊形。 According to an embodiment of the invention, the third wire and the fourth wire are staggered and not connected to each other, wherein the third wire and the fourth wire are equally divided into the closed polygon.

根據本發明之一實施例,上述第三導線相交於上述中心以及一第一連接點,上述第四導線相交於一第二連接點,其中上述第一連接點以及上述第二連接點係位於上述第一導線以及上述第二導線所形成之上述封閉多邊形之外。 According to an embodiment of the present invention, the third wire intersects the center and a first connection point, and the fourth wire intersects with a second connection point, wherein the first connection point and the second connection point are located above The first wire and the second wire are formed by the closed polygon formed by the second wire.

根據本發明之一實施例,更包括:複數第五導線以及複數第六導線。上述第五導線與上述第一導線重疊且位於上述第一導線之上,其中上述第五導線與上述第三導線相耦接,上述第五導線與上述第四導線之間具有一既定間隙。上述第六導線與上述第二導線重疊且位於上述第二導線之上,其中上述第六導線與上述第四導線相耦接,上述第五導線與上述第三導線之間具有上述既定間隙。 According to an embodiment of the present invention, the method further includes: a plurality of fifth wires and a plurality of sixth wires. The fifth wire overlaps with the first wire and is located above the first wire, wherein the fifth wire is coupled to the third wire, and the fifth wire and the fourth wire have a predetermined gap. The sixth wire overlaps with the second wire and is located above the second wire, wherein the sixth wire is coupled to the fourth wire, and the predetermined gap is formed between the fifth wire and the third wire.

根據本發明之一實施例,上述第五導線係與上述第一導線電性連接,上述第六導線係與上述第二導線電性連接。 According to an embodiment of the invention, the fifth lead wire is electrically connected to the first wire, and the sixth wire is electrically connected to the second wire.

根據本發明之一實施例,上述封閉多邊形係為一正多邊形、一圓形或一橢圓形。 According to an embodiment of the invention, the closed polygon is a regular polygon, a circle or an ellipse.

根據本發明之一實施例,上述第一導線係耦接至一二極體一P型摻雜層,上述第二導線係耦接至上述二極體之一N型摻雜層。 According to an embodiment of the invention, the first wire is coupled to a diode-P-doped layer, and the second wire is coupled to one of the diodes.

根據本發明之一實施例,上述第一導線係為一二極體正極端,上述第二導線係為一二極體負極端。 According to an embodiment of the invention, the first wire is a diode positive terminal, and the second wire is a diode negative terminal.

10、20、30、40‧‧‧二極體 10, 20, 30, 40‧‧‧ diodes

11‧‧‧P型摻雜層 11‧‧‧P type doped layer

12‧‧‧N型摻雜層 12‧‧‧N-doped layer

21、31‧‧‧第一導線 21, 31‧‧‧ first wire

22、32‧‧‧第二導線 22, 32‧‧‧ second wire

23、33、43‧‧‧中心 23, 33, 43 ‧ ‧ Center

41‧‧‧第三導線 41‧‧‧ Third wire

42‧‧‧第四導線 42‧‧‧fourth wire

44‧‧‧第五導線 44‧‧‧ fifth wire

45‧‧‧第六導線 45‧‧‧6th wire

第1圖係顯示根據本發明之一實施例所述之二極體之剖面圖;第2圖係顯示根據本發明之一實施例所述之二極體之上視圖;第3圖係顯示根據本發明之另一實施例所述之二極體之上視圖;以及第4圖係顯示根據本發明之一實施例所述之二極體導線連接之上視圖。 1 is a cross-sectional view showing a diode according to an embodiment of the present invention; FIG. 2 is a top view showing a diode according to an embodiment of the present invention; and FIG. 3 is a view showing A top view of a diode according to another embodiment of the present invention; and a fourth view showing a top view of a diode wire connection according to an embodiment of the present invention.

為使本發明之上述目的、特徵和優點能更明顯易懂,下文特例舉一較佳實施例,並配合所附圖式,來作詳細說明如下:以下將介紹係根據本發明所述之較佳實施例。必須要說明的是,本發明提供了許多可應用之發明概念,在此所揭露之特定實施例,僅是用於說明達成與運用本發明之特定方式,而不可用以侷限本發明之範圍。 The above described objects, features, and advantages of the present invention will become more apparent from the description of the appended claims appended claims A good example. It is to be understood that the invention is not limited to the scope of the invention.

第1圖係顯示根據本發明之一實施例所述之二極體之剖面圖。如第1圖所示,二極體10包括P型摻雜層11以及N型摻雜層12,P型摻雜層11耦接至第一導線21,N型摻雜層12耦接至第二導線22。根據本發明之一實施例,二極體10係為一蕭特基二極體(Schottky diode);根據本發明之另一實施例,二極體10係為一快速回復二極體(fast recovery diode)。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing a diode according to an embodiment of the present invention. As shown in FIG. 1 , the diode 10 includes a P-type doped layer 11 and an N-type doped layer 12 . The P-type doped layer 11 is coupled to the first conductive line 21 , and the N-type doped layer 12 is coupled to the first Two wires 22. According to an embodiment of the invention, the diode 10 is a Schottky diode; according to another embodiment of the invention, the diode 10 is a fast recovery diode (fast recovery) Diode).

第2圖係顯示根據本發明之一實施例所述之二極體之上視圖。如第2圖所示,二極體20包括複數第一導線21以及複數第二導線22,第一導線21以及第二導線22之每一者係形成一封閉多邊形,並且第一導線21以及第二導線22之每一者皆圍繞中心23。 Fig. 2 is a top view showing a diode according to an embodiment of the present invention. As shown in FIG. 2, the diode 20 includes a plurality of first wires 21 and a plurality of second wires 22, each of the first wires 21 and the second wires 22 forming a closed polygon, and the first wires 21 and Each of the two wires 22 surrounds the center 23.

根據本發明之一實施例,第一導線21係疊於P型摻雜層之上且耦接至P型摻雜層,第二導線22係疊於N型摻雜層之上且耦接至N型摻雜層。根據本發明之另一實施例,第一導線21係疊於N型摻雜層之上且耦接至N型摻雜層,第二導線22係疊於P型摻雜層之上且耦接至P型摻雜層。 According to an embodiment of the invention, the first wire 21 is stacked on the P-type doped layer and coupled to the P-type doped layer, and the second wire 22 is stacked on the N-type doped layer and coupled to N-type doped layer. According to another embodiment of the present invention, the first wire 21 is stacked on the N-type doped layer and coupled to the N-type doped layer, and the second wire 22 is stacked on the P-type doped layer and coupled To the P-type doped layer.

根據本發明之一實施例,該封閉多邊形係為正四邊形、正六邊形、正八邊形、正十六邊形、圓形、橢圓形或其他任意的正多邊形。根據本發明之另一實施例,該封閉多邊性可為其他任意封閉的圖形。根據第1圖之實施例,第一導線21以及第二導線22係形成以環繞中心23之同心圓。 According to an embodiment of the invention, the closed polygon is a regular quadrilateral, a regular hexagon, a regular octagon, a regular hexagon, a circle, an ellipse or any other regular polygon. According to another embodiment of the invention, the closed polygon may be any other enclosed graphic. According to the embodiment of Fig. 1, the first wire 21 and the second wire 22 are formed to be concentric circles around the center 23.

如第2圖所示,第一導線21以及第二導線22係相互交錯,並且任兩者之第一導線21以及第二導線22接互相不相連接。根據本發明之一實施例,每兩條第一導線21的中間,皆插入一條第二導線22,而最外圈係為第一導線21。根據本發明之另一實施例,最外圈係為第二導線22,並且每兩條第二導線22之間皆插入一條第一導線21。 As shown in FIG. 2, the first wire 21 and the second wire 22 are interlaced with each other, and the first wire 21 and the second wire 22 of either of them are not connected to each other. According to an embodiment of the invention, a second wire 22 is inserted in the middle of each of the two first wires 21, and the outermost ring is the first wire 21. According to another embodiment of the present invention, the outermost ring is the second wire 22, and a first wire 21 is inserted between each of the two second wires 22.

根據本發明之一實施例,第一導線21以及第二導線22之間,係包括一導線間距,而該導線間距之最小值係根據半導體製程的設計規範(design rule)所決定。根據本發明之一 實施例,由於第一導線21以及第二導線22分別代表二極體20之正極端以及負極端,因此第一導線21以及第二導線22並不相連接,以防止發生短路的情況。 According to an embodiment of the invention, the first wire 21 and the second wire 22 comprise a wire pitch, and the minimum wire pitch is determined according to a design rule of the semiconductor process. According to one of the inventions In the embodiment, since the first wire 21 and the second wire 22 respectively represent the positive terminal and the negative terminal of the diode 20, the first wire 21 and the second wire 22 are not connected to prevent a short circuit from occurring.

第3圖係顯示根據本發明之另一實施例所述之二極體之上視圖。如第3圖所示,二極體30包括複數第一導線31以及複數第二導線32,其中第一導線31以及第二導線32之每一者係形成一橢圓形,並且第一導線31以及第二導線32之每一者皆圍繞中心33。 Figure 3 is a top view showing a diode according to another embodiment of the present invention. As shown in FIG. 3, the diode 30 includes a plurality of first wires 31 and a plurality of second wires 32, wherein each of the first wires 31 and the second wires 32 form an ellipse, and the first wires 31 and Each of the second wires 32 surrounds the center 33.

根據本發明之一實施例,第一導線31係疊於P型摻雜層之上且耦接至P型摻雜層,第二導線32係疊於N型摻雜層之上且耦接至N型摻雜層。根據本發明之另一實施例,第一導線31係疊於N型摻雜層之上且耦接至N型摻雜層,第二導線32係疊於P型摻雜層之上且耦接至P型摻雜層。 According to an embodiment of the invention, the first wire 31 is stacked on the P-type doped layer and coupled to the P-type doped layer, and the second wire 32 is stacked on the N-type doped layer and coupled to N-type doped layer. According to another embodiment of the present invention, the first wire 31 is stacked on the N-type doped layer and coupled to the N-type doped layer, and the second wire 32 is stacked on the P-type doped layer and coupled To the P-type doped layer.

如第3圖所示,第一導線31以及第二導線32係相互交錯,並且任兩者之第一導線31以及第二導線32接互相不相連接。根據本發明之一實施例,每兩條第一導線31的中間,皆插入一條第二導線22,而最外圈係為第一導線31。根據本發明之另一實施例,最外圈係為第二導線32,並且每兩條第二導線32之間皆插入一條第一導線31。 As shown in FIG. 3, the first wire 31 and the second wire 32 are mutually staggered, and the first wire 31 and the second wire 32 of either of them are not connected to each other. According to an embodiment of the present invention, a second wire 22 is inserted in the middle of each of the two first wires 31, and the outermost ring is the first wire 31. According to another embodiment of the present invention, the outermost ring is the second wire 32, and a first wire 31 is inserted between each of the two second wires 32.

根據本發明之一實施例,第一導線31以及第二導線32之間,係包括一導線間距,而該導線間距之最小值係根據半導體製程的設計規範(design rule)所決定。根據本發明之一實施例,由於第一導線31以及第二導線32分別代表二極體30之正極端以及負極端,因此第一導線31以及第二導線32並不相連 接,以防止發生短路的情況。 According to an embodiment of the invention, the first wire 31 and the second wire 32 comprise a wire pitch, and the minimum wire pitch is determined according to a design rule of the semiconductor process. According to an embodiment of the present invention, since the first wire 31 and the second wire 32 respectively represent the positive terminal and the negative terminal of the diode 30, the first wire 31 and the second wire 32 are not connected. Connect to prevent a short circuit.

第4圖係顯示根據本發明之一實施例所述之二極體導線連接之上視圖。為求詳細說明本發明之技術特徵,以下第4圖將搭配第2圖進行說明。如第4圖所示,二極體40更包括複數第三導線41、複數第四導線42、複數第五導線44以及複數第六導線45,其中第三導線41、第四導線42第五導線44以及第六導線45係皆位於第2圖之第一導線21以及第二導線22之上方。 Figure 4 is a top plan view showing a diode wire connection in accordance with an embodiment of the present invention. In order to explain the technical features of the present invention in detail, the fourth drawing will be described with reference to FIG. As shown in FIG. 4, the diode 40 further includes a plurality of third wires 41, a plurality of fourth wires 42, a plurality of fifth wires 44, and a plurality of sixth wires 45, wherein the third wire 41, the fourth wire 42, and the fifth wire 44 and the sixth conductor 45 are located above the first wire 21 and the second wire 22 of FIG.

根據本發明之一實施例,第三導線41以及第四導線42係皆自中心43向外輻射延伸,並且第三導線41以及第四導線42互不相連接。根據本發明之一實施例,第三導線41以及第四導線42係等分第2圖之第一導線21以及第二導線22所圍成之同心圓。 According to an embodiment of the invention, the third wire 41 and the fourth wire 42 both radiate outwardly from the center 43 and the third wire 41 and the fourth wire 42 are not connected to each other. According to an embodiment of the present invention, the third wire 41 and the fourth wire 42 are equally divided into concentric circles surrounded by the first wire 21 and the second wire 22 of FIG.

如第4圖所示,二極體40具有三條第三導線41以及三條第四導線42,其中第三導線41以及第四導線42係將二極體40劃分為六等份。根據本發明之其他實施例,第三導線41以及第四導線42可任意等分第2圖之第一導線21以及第二導線22所圍成之封閉多邊形。 As shown in FIG. 4, the diode 40 has three third wires 41 and three fourth wires 42, wherein the third wire 41 and the fourth wire 42 divide the diode 40 into six equal parts. According to other embodiments of the present invention, the third wire 41 and the fourth wire 42 can arbitrarily divide the closed polygon surrounded by the first wire 21 and the second wire 22 of FIG.

第五導線44係與第2圖之第一導線21重疊,且第五導線44係位於第2圖之第一導線21之上方,並且第五導線44係與第2圖之第一導線21電性連接,其中第五導線44與第三導線41相耦接,並且第五導線44與第四導線42之間具有一既定間隙。根據本發明之一實施例,該既定間隙之最小值係根據半導體製程的設計規範(design rule)所決定。 The fifth wire 44 is overlapped with the first wire 21 of FIG. 2, and the fifth wire 44 is located above the first wire 21 of FIG. 2, and the fifth wire 44 is electrically connected to the first wire 21 of FIG. The first connection 44 is coupled to the third conductor 41 and has a predetermined gap between the fifth conductor 44 and the fourth conductor 42. According to an embodiment of the invention, the minimum value of the predetermined gap is determined according to a design rule of the semiconductor process.

第六導線45係與第2圖之第二導線22重疊,且第六導線45係位於第2圖之第二導線22之上方,並且第六導線45係與第2圖之第二導線22電性連接,其中第六導線45與第四導線42相耦接,並且第六導線45與第三導線41之間具有一既定間隙。根據本發明之一實施例,該既定間隙之最小值係根據半導體製程的設計規範(design rule)所決定。 The sixth wire 45 is overlapped with the second wire 22 of FIG. 2, and the sixth wire 45 is located above the second wire 22 of FIG. 2, and the sixth wire 45 is electrically connected to the second wire 22 of FIG. The sixth connection 45 is coupled to the fourth conductor 42 and has a predetermined gap between the sixth conductor 45 and the third conductor 41. According to an embodiment of the invention, the minimum value of the predetermined gap is determined according to a design rule of the semiconductor process.

如第4圖所示,第三導線41係於中心43相耦接。根據本發明之另一實施例,第四導線42係於中心43相耦接。根據本發明之一實施例,第三導線41以及第四導線42分別連接至位於第2圖之第一導線21以及第二導線22所圍成的封閉多邊形之外的第一連接點以及第二連接點。 As shown in FIG. 4, the third wire 41 is coupled to the center 43. According to another embodiment of the invention, the fourth wire 42 is coupled to the center 43. According to an embodiment of the present invention, the third wire 41 and the fourth wire 42 are respectively connected to the first connection point and the second outside the closed polygon surrounded by the first wire 21 and the second wire 22 of FIG. Junction.

根據本發明之一實施例,第2圖之第一導線21係耦接至第1圖之P型摻雜層11,第二導線22係耦接至N型摻雜層12,因此當第三導線41耦接至第一連接點且第四導線耦接至第二連接點時,代表第一連接點耦接至P型摻雜層11而第二連接點耦接至N型摻雜層12,所以第一連接點可作為二極體之正極端,而第二連接點可作為二極體之負極端。根據本發明之另一實施例,第一連接點以及第二連接點可藉由改變連接方式,而作為二極體之正極端以及二極體之負極端之一者。 According to an embodiment of the present invention, the first wire 21 of FIG. 2 is coupled to the P-type doping layer 11 of FIG. 1 , and the second wire 22 is coupled to the N-type doping layer 12, thus When the wire 41 is coupled to the first connection point and the fourth wire is coupled to the second connection point, the first connection point is coupled to the P-type doped layer 11 and the second connection point is coupled to the N-type doped layer 12 Therefore, the first connection point can serve as the positive terminal of the diode, and the second connection point can serve as the negative terminal of the diode. According to another embodiment of the present invention, the first connection point and the second connection point can be used as one of the positive terminal of the diode and the negative terminal of the diode by changing the connection mode.

根據本發明之一實施例,第2圖所示之第一導線21以及第二導線22以及第3圖所示之第一導線31以及第二導線32係位於半導體製程中之第一金屬層(metal-1 layer),其中第一導線21以及第二導線22或第一導線31以及第二導線32係經由接觸點(contact),分別耦接至P型摻雜層11以及N型摻雜層12。 According to an embodiment of the present invention, the first wire 21 and the second wire 22 shown in FIG. 2 and the first wire 31 and the second wire 32 shown in FIG. 3 are located in the first metal layer in the semiconductor process ( Metal-1 layer), wherein the first wire 21 and the second wire 22 or the first wire 31 and the second wire 32 are respectively coupled to the P-type doped layer 11 and the N-type doped layer via contacts 12.

根據本發明之另一實施例,第2圖所示之第一導線21以及第二導線22係位於半導體製程中之第一金屬層,其中第一導線21以及第二導線22亦可經由接觸點(contact),分別耦接至N型摻雜層12以及P型摻雜層11。 According to another embodiment of the present invention, the first wire 21 and the second wire 22 shown in FIG. 2 are located in the first metal layer in the semiconductor process, wherein the first wire 21 and the second wire 22 may also pass through the contact point. (contact), respectively coupled to the N-type doped layer 12 and the P-type doped layer 11.

根據本發明之一實施例,第4圖之第三導線41、第四導線42、第五導線44以及第六導線45係位於半導體製程中之頂部金屬層(top metal layer),其中第三導線41、第四導線42、第五導線44以及第六導線45利用穿孔層(via layer),分別與第2圖之第一導線21或第二導線22或第3圖之第一導線31或第二導線32相連接。 According to an embodiment of the present invention, the third wire 41, the fourth wire 42, the fifth wire 44, and the sixth wire 45 of FIG. 4 are located in a top metal layer in a semiconductor process, wherein the third wire 41. The fourth wire 42, the fifth wire 44, and the sixth wire 45 are formed by a via layer, respectively, with the first wire 21 or the second wire 22 of FIG. 2 or the first wire 31 or the third wire of FIG. The two wires 32 are connected.

根據本發明之另一實施例,第4圖之第三導線41、第四導線42、第五導線44以及第六導線45所使用之金屬層係為第一金屬層以上之任意金屬層。根據本發明之另一實施例,第2圖所示之第一導線21以及第二導線22以及第3圖所示之第一導線31以及第二導線32並不限定使用任一金屬層,也就是第三導線41、第四導線42、第五導線44以及第六導線45位於第2圖所示之第一導線21以及第二導線22以及第3圖所示之第一導線31以及第二導線32之上方即可。 According to another embodiment of the present invention, the metal layer used for the third wire 41, the fourth wire 42, the fifth wire 44, and the sixth wire 45 of FIG. 4 is any metal layer of the first metal layer or more. According to another embodiment of the present invention, the first wire 21 and the second wire 22 shown in FIG. 2 and the first wire 31 and the second wire 32 shown in FIG. 3 are not limited to use any metal layer, and That is, the third wire 41, the fourth wire 42, the fifth wire 44, and the sixth wire 45 are located in the first wire 21 and the second wire 22 shown in FIG. 2, and the first wire 31 and the second wire shown in FIG. Just above the wire 32.

根據本發明之一實施例,第2、3、4圖之佈局方式亦可應用於金氧半場效電晶體(Metal-Oxide-Semiconductor Field-Effect Transistor,MOSFET)。 According to an embodiment of the present invention, the layout of the second, third, and fourth embodiments can also be applied to a Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET).

以上敘述許多實施例的特徵,使所屬技術領域中具有通常知識者能夠清楚理解本說明書的形態。所屬技術領域中具有通常知識者能夠理解其可利用本發明揭示內容為基礎 以設計或更動其他製程及結構而完成相同於上述實施例的目的及/或達到相同於上述實施例的優點。所屬技術領域中具有通常知識者亦能夠理解不脫離本發明之精神和範圍的等效構造可在不脫離本發明之精神和範圍內作任意之更動、替代與潤飾。 The features of many embodiments are described above to enable those of ordinary skill in the art to clearly understand the form of the specification. Those of ordinary skill in the art will understand that it can be based on the disclosure of the present invention. The same objectives and/or advantages of the above-described embodiments are achieved by designing or modifying other processes and structures. It is also to be understood by those skilled in the art that <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt;

20‧‧‧二極體 20‧‧‧ diode

21‧‧‧第一導線 21‧‧‧First wire

22‧‧‧第二導線 22‧‧‧second wire

23‧‧‧中心 23‧‧‧ Center

Claims (9)

一種半導體元件,包括:複數第一導線,其中上述第一導線之每一者係形成一封閉多邊形,且圍繞一中心;以及複數第二導線,其中上述第二導線之每一者係形成上述封閉多邊形,且圍繞上述中心,其中上述第一導線以及上述第二導線相互交錯,並且上述第一導線以及上述第二導線之任二者不相連接。 A semiconductor device comprising: a plurality of first wires, wherein each of the first wires forms a closed polygon and surrounds a center; and a plurality of second wires, wherein each of the second wires forms the above-mentioned closed a polygon, and surrounding the center, wherein the first wire and the second wire are interdigitated, and any one of the first wire and the second wire are not connected. 如申請專利範圍第1項所述之半導體元件,更包括:複數第三導線,位於上述第一導線以及上述第二導線之上,且自上述中心向外輻射延伸;以及複數第四導線,位於上述第一導線以及上述第二導線之上,且自上述中心向外輻射延伸。 The semiconductor device of claim 1, further comprising: a plurality of third wires located on the first wire and the second wire, and extending outward from the center; and a plurality of fourth wires located at And above the first wire and the second wire, and radiating outward from the center. 如申請專利範圍第2項所述之半導體元件,其中上述第三導線以及上述第四導線相互交錯且不相連接,其中上述第三導線以及上述第四導線係等分上述封閉多邊形。 The semiconductor device according to claim 2, wherein the third wire and the fourth wire are staggered and not connected to each other, wherein the third wire and the fourth wire are equally divided into the closed polygon. 如申請專利範圍第3項所述之半導體元件,其中上述第三導線相交於上述中心以及一第一連接點,上述第四導線相交於一第二連接點,其中上述第一連接點以及上述第二連接點係位於上述第一導線以及上述第二導線所形成之上述封閉多邊形之外。 The semiconductor device of claim 3, wherein the third wire intersects the center and a first connection point, and the fourth wire intersects with a second connection point, wherein the first connection point and the first The two connection points are located outside the closed polygon formed by the first wire and the second wire. 如申請專利範圍第3項所述之半導體元件,更包括: 複數第五導線,與上述第一導線重疊且位於上述第一導線之上,其中上述第五導線與上述第三導線相耦接,上述第五導線與上述第四導線之間具有一既定間隙;以及複數第六導線,與上述第二導線重疊且位於上述第二導線之上,其中上述第六導線與上述第四導線相耦接,上述第五導線與上述第三導線之間具有上述既定間隙。 The semiconductor component as described in claim 3, further comprising: a plurality of fifth wires overlapping the first wire and located above the first wire, wherein the fifth wire is coupled to the third wire, and the fifth wire and the fourth wire have a predetermined gap; And a plurality of sixth wires overlapping the second wire and located above the second wire, wherein the sixth wire is coupled to the fourth wire, and the predetermined gap is formed between the fifth wire and the third wire . 如申請專利範圍第5項所述之半導體元件,其中上述第五導線係與上述第一導線電性連接,上述第六導線係與上述第二導線電性連接。 The semiconductor device according to claim 5, wherein the fifth wire is electrically connected to the first wire, and the sixth wire is electrically connected to the second wire. 如申請專利範圍第1項所述之半導體元件,其中上述封閉多邊形係為一正多邊形、一圓形或一橢圓形。 The semiconductor device according to claim 1, wherein the closed polygon is a regular polygon, a circle or an ellipse. 如申請專利範圍第1項所述之半導體元件,其中上述第一導線係耦接至一二極體一P型摻雜層,上述第二導線係耦接至上述二極體之一N型摻雜層。 The semiconductor device of claim 1, wherein the first wire is coupled to a diode-P-doped layer, and the second wire is coupled to one of the diodes. Miscellaneous layer. 如申請專利範圍第8項所述之半導體元件,其中上述第一導線係為一二極體正極端,上述第二導線係為一二極體負極端。 The semiconductor device of claim 8, wherein the first wire is a diode positive terminal and the second wire is a diode negative terminal.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201006963A (en) * 2008-08-06 2010-02-16 Qiu-Li Zhuang Electrolysis plate having P-N junction cell
TW201033868A (en) * 2009-03-13 2010-09-16 Tpk Touch Solutions Inc Pressure-sensing type touch device
TW201338118A (en) * 2012-03-15 2013-09-16 Tpk Touch Solutions Xiamen Inc Touch panel and a method for manufacturing the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201006963A (en) * 2008-08-06 2010-02-16 Qiu-Li Zhuang Electrolysis plate having P-N junction cell
TW201033868A (en) * 2009-03-13 2010-09-16 Tpk Touch Solutions Inc Pressure-sensing type touch device
TW201338118A (en) * 2012-03-15 2013-09-16 Tpk Touch Solutions Xiamen Inc Touch panel and a method for manufacturing the same

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