TWI581688B - Embedded component package structure and manufacturing method thereof - Google Patents
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本發明是有關於一種封裝結構及其製作方法,且特別是有關於一種內埋式元件封裝結構及其製作方法。 The present invention relates to a package structure and a method of fabricating the same, and more particularly to a buried component package structure and a method of fabricating the same.
近年來,為了增加印刷電路板(printed circuit board)的應用,已有許多技術將印刷電路板製作成多層線路結構,以增加其內部線路佈局的空間。多層式的線路結構的製作方式是將由銅箔(copper foil)與半固化片(prepreg)所組成的增層結構,反覆堆疊並壓合於核心板(core board)上,以增加多層線路結構的內部線路佈局的空間,並利用電鍍製程在各增層結構的盲孔中填充導電材料來導通各層。此外,許多不同種類的主動元件或被動元件也可依據需求配置在線路結構中,以增加線路結構的使用功能。 In recent years, in order to increase the application of printed circuit boards, many techniques have been used to fabricate printed circuit boards into a multi-layer circuit structure to increase the space of their internal wiring layout. The multi-layered wiring structure is formed by a layered structure composed of a copper foil and a prepreg, which are stacked and laminated on a core board to increase the internal wiring of the multilayer wiring structure. Layout space, and using a plating process to fill the blind holes in each build-up structure with a conductive material to conduct the layers. In addition, many different types of active or passive components can be placed in the line structure as needed to increase the use of the line structure.
以在線路結構中配置主動元件為例,由於主動元件在運作時會產生熱能,因此通常還會配置散熱元件於線路結構的外表面上,並透過導熱路徑來連接散熱器與主動元件,使得主動元件 所產生的熱能能經由導熱路徑與散熱器的傳導而逸散至外界。雖然上述散熱方式可使主動元件所產生的熱能自線路結構的內部導出,但是直接將散熱元件配置在線路結構的外表面上會造成線路結構的整體厚度增加,不符線路結構的薄型化的設計需求。 Taking the active component in the circuit structure as an example, since the active component generates thermal energy during operation, the heat dissipating component is usually disposed on the outer surface of the circuit structure, and the heat sink and the active component are connected through the heat conduction path to make the active element The generated thermal energy can escape to the outside through conduction through the heat conduction path and the heat sink. Although the above heat dissipation method can derive the thermal energy generated by the active component from the inside of the circuit structure, directly disposing the heat dissipation component on the outer surface of the circuit structure causes an increase in the overall thickness of the circuit structure, which is inconsistent with the thin design requirements of the line structure. .
本發明提供一種內埋式元件封裝結構,具有良好的散熱效率,並且符合薄型化的設計需求。 The invention provides a buried component packaging structure, has good heat dissipation efficiency, and meets the requirements of thin design.
本發明提供一種內埋式元件封裝結構的製作方法,能提高製作良率,並降低內埋式元件封裝結構的整體厚度。 The invention provides a manufacturing method of a buried component packaging structure, which can improve the manufacturing yield and reduce the overall thickness of the embedded component packaging structure.
本發明提出一種內埋式元件封裝結構,包括線路基板以及第一封裝模組。線路基板包括核心介電層以及第一線路層。核心介電層具有第一表面、相對於第一表面的第二表面、貫穿第一表面與第二表面的第一穿槽以及位於第一表面的一第一卡槽,其中第一卡槽連接第一穿槽。第一線路層位於第一表面上。第一封裝模組埋設於第一穿槽,且包括載板、第一元件以及散熱元件。載板卡合於第一卡槽。第一元件設置載板上。散熱元件連接第一元件,其中第一元件位於載板與散熱元件之間。 The invention provides a buried component package structure, comprising a circuit substrate and a first package module. The circuit substrate includes a core dielectric layer and a first circuit layer. The core dielectric layer has a first surface, a second surface opposite to the first surface, a first through slot extending through the first surface and the second surface, and a first card slot on the first surface, wherein the first card slot is connected The first slot. The first circuit layer is on the first surface. The first package module is embedded in the first through slot and includes a carrier, a first component, and a heat dissipating component. The carrier board is engaged with the first card slot. The first component is placed on the carrier. The heat dissipating component is coupled to the first component, wherein the first component is between the carrier and the heat dissipating component.
在本發明的一實施例中,上述的散熱元件暴露於第二表面。核心介電層還具有貫穿第一表面與第二表面的至少一第二穿槽,內埋式封裝結構還包括至少一第二封裝模組,埋設於前述至少一第二穿槽,其中前述至少一第二封裝模組包括相互堆疊的兩 第二元件。 In an embodiment of the invention, the heat dissipating component is exposed to the second surface. The core dielectric layer further has at least one second through-channel extending through the first surface and the second surface, the embedded package structure further comprising at least one second package module embedded in the at least one second through slot, wherein the at least the foregoing a second package module includes two stacked on each other The second component.
在本發明的一實施例中,上述的該散熱元件的上表面與第二表面齊平。 In an embodiment of the invention, the upper surface of the heat dissipating component is flush with the second surface.
在本發明的一實施例中,上述的第一元件具有主動元件表面、相對於主動元件表面的背面以及連接主動元件表面與背面的側表面。散熱元件連接背面與側表面。 In an embodiment of the invention, the first component has an active component surface, a back surface opposite the active component surface, and a side surface connecting the active component surface and the back surface. The heat dissipating component connects the back and side surfaces.
在本發明的一實施例中,上述的載板具有多個第一通孔、至少一第二通孔以及填充於這些第一通孔的多個中介體。第一元件以主動元件表面電性連接於這些中介體,而散熱元件具有至少一卡榫部。前述至少一卡榫部卡合於前述至少一第二通孔。 In an embodiment of the invention, the carrier has a plurality of first through holes, at least one second through holes, and a plurality of intermediate bodies filled in the first through holes. The first component is electrically connected to the intermediate body by the active component surface, and the heat dissipation component has at least one latching portion. The at least one latching portion is engaged with the at least one second through hole.
在本發明的一實施例中,上述的內埋式元件封裝結構更包括第一增層線路結構以及第二增層線路結構。第一增層線路結構包括第一增層介電層、第一增層線路層以及多個第一導電盲孔。第一增層介電層覆蓋於第二表面上,並填入前述至少一第二穿槽以固定前述至少一第二封裝模組。第一增層線路層位於第一增層介電層上。這些第一導電盲孔,穿過第一增層介電層以電性連接第一增層線路層與前述至少一第二封裝模組。第二增層線路結構包括第二增層介電層、第二增層線路層以及多個第二導電盲孔。第二增層介電層覆蓋於第一表面上。第二增層線路層位於第二增層介電層上。這些第二導電盲孔穿過第二增層介電層以電性連接第二增層線路層與第一線路層、電性連接第二增層線路層與這些中介體以及電性連接第二增層線路層與前述至少一第二封裝 模組。 In an embodiment of the invention, the buried component package structure further includes a first build-up line structure and a second build-up line structure. The first build-up line structure includes a first build-up dielectric layer, a first build-up circuit layer, and a plurality of first conductive blind vias. The first build-up dielectric layer covers the second surface and fills the at least one second through slot to fix the at least one second package module. The first build-up wiring layer is on the first build-up dielectric layer. The first conductive vias are electrically connected to the first build-up layer and the at least one second package through the first build-up dielectric layer. The second build-up line structure includes a second build-up dielectric layer, a second build-up circuit layer, and a plurality of second conductive blind vias. A second build-up dielectric layer overlies the first surface. The second build-up wiring layer is on the second build-up dielectric layer. The second conductive via holes pass through the second build-up dielectric layer to electrically connect the second build-up circuit layer and the first circuit layer, electrically connect the second build-up circuit layer to the interposers, and electrically connect the second The layered circuit layer and the at least one second package Module.
在本發明的一實施例中,上述的內埋式元件封裝結構更包括至少一導通孔,貫穿第一增層介電層、核心介電層以及第二增層介電層,以電性連接第一增層線路層與第二增層線路層。 In an embodiment of the invention, the embedded component package further includes at least one via hole extending through the first build-up dielectric layer, the core dielectric layer, and the second build-up dielectric layer to electrically connect The first build-up circuit layer and the second build-up circuit layer.
在本發明的一實施例中,上述的核心介電層還具有位於第二表面的第二卡槽。散熱元件卡合於第二卡槽。 In an embodiment of the invention, the core dielectric layer further has a second card slot on the second surface. The heat dissipating component is engaged with the second card slot.
在本發明的一實施例中,上述的第一元件具有主動元件表面與相對於主動元件表面的背面。散熱元件連接背面。 In an embodiment of the invention, the first element has a surface of the active element and a back surface opposite the surface of the active element. The heat sink is connected to the back.
在本發明的一實施例中,上述的載板具有多個通孔以及填充於這些通孔的多個中介體。第一元件以主動元件表面電性連接於這些中介體。 In an embodiment of the invention, the carrier has a plurality of through holes and a plurality of interposers filled in the through holes. The first component is electrically connected to the interposers by the surface of the active component.
在本發明的一實施例中,上述的線路基板更包括第二線路層,位於第二表面上。 In an embodiment of the invention, the circuit substrate further includes a second circuit layer on the second surface.
在本發明的一實施例中,上述的內埋式元件封裝結構更包括增層材料層以及增層線路結構。增層材料層覆蓋於第一表面與第二表面上,並填入前述至少一第二穿槽以固定前述至少一第二封裝模組,其中增層材料層暴露出第一線路層與第二線路層。增層線路結構包括增層介電層、增層線路層以及多個導電盲孔。增層介電層覆蓋位於第一表面上的增層材料層。增層線路層位於增層介電層上,且電性連接第一線路層。這些導電盲孔穿過該增層介電層以電性連接增層線路層與這些中介體以及電性連接增層線路層與前述至少一第二封裝模組。 In an embodiment of the invention, the buried component package structure further includes a build-up material layer and a build-up line structure. The layer of build-up material covers the first surface and the second surface, and fills the at least one second through slot to fix the at least one second package module, wherein the layer of build-up material exposes the first circuit layer and the second layer Line layer. The build-up line structure includes a build-up dielectric layer, a build-up circuit layer, and a plurality of conductive blind vias. The build-up dielectric layer covers the layer of build-up material on the first surface. The build-up circuit layer is on the build-up dielectric layer and is electrically connected to the first circuit layer. The conductive vias pass through the build-up dielectric layer to electrically connect the build-up wiring layer to the interposers and to electrically connect the build-up wiring layer to the at least one second package module.
本發明提出一種內埋式元件封裝結構的製作方法,包括以下步驟。提供線路基板。線路基板包括核心介電層以及第一線路層,其中核心介電層具有第一表面、相對於第一表面的第二表面、貫穿第一表面與第二表面的第一穿槽以及位於第一表面的一第一卡槽,第一卡槽連接第一穿槽,且第一線路層位於第一表面上。提供第一封裝模組,包括載板、第一元件以及散熱元件,其中第一元件設置載板上,散熱元件連接第一元件,且第一元件位於載板與散熱元件之間。使載板卡合於第一卡槽,以將第一封裝模組埋設於第一穿槽。 The invention provides a method for fabricating a buried component package structure, comprising the following steps. A circuit substrate is provided. The circuit substrate includes a core dielectric layer and a first circuit layer, wherein the core dielectric layer has a first surface, a second surface relative to the first surface, a first through slot extending through the first surface and the second surface, and is located at the first a first card slot of the surface, the first card slot is connected to the first slot, and the first circuit layer is located on the first surface. A first package module is provided, including a carrier board, a first component, and a heat dissipating component, wherein the first component is disposed on the carrier, the heat dissipating component is coupled to the first component, and the first component is disposed between the carrier and the heat dissipating component. The carrier board is engaged with the first card slot to embed the first package module in the first slot.
在本發明的一實施例中,上述的第一封裝模組的製作方法包括以下步驟。提供載板,並形成多個第一通孔與至少一第二通孔於載板上。形成多個中介體於這些第一通孔。使第一元件以主動元件表面電性連接於這些中介體。使散熱元件罩覆於第一元件,並透過至少一卡榫部卡合於前述至少一第二通孔以固定於載板上。 In an embodiment of the invention, the method for fabricating the first package module includes the following steps. A carrier is provided, and a plurality of first through holes and at least one second through holes are formed on the carrier. A plurality of interposers are formed in the first through holes. The first component is electrically connected to the interposers by the active component surface. The heat dissipating component is covered on the first component, and is engaged with the at least one second through hole through the at least one latching portion to be fixed to the carrier.
在本發明的一實施例中,上述的線路基板的製作方法包括以下步驟。提供核心板。核心板包括核心介電層以及位於第一表面上的第一金屬層。圖案化第一金屬層以形成第一線路層。形成第一穿槽、至少一第二穿槽以及第一卡槽於核心介電層,其中前述至少一第二穿槽穿該第一表面與該第二表面。 In an embodiment of the invention, the method for fabricating the above circuit substrate includes the following steps. Provide the core board. The core board includes a core dielectric layer and a first metal layer on the first surface. The first metal layer is patterned to form a first wiring layer. Forming a first through slot, at least one second through slot, and a first card slot in the core dielectric layer, wherein the at least one second through slot passes through the first surface and the second surface.
在本發明的一實施例中,上述的內埋式元件封裝結構的製作方法包括以下步驟。形成膠層於第一表面。提供至少一第二 封裝模組,包括相互堆疊的兩第二元件,並使前述至少一第二封裝模組埋設於前述至少一第二穿槽。形成第一增層介電層於第二表面並填入前述至少一第二穿槽,並形成第一增層金屬層於第一增層介電層上。移除膠層。形成第二增層介電層於第一表面,並形成第二增層金屬層於第二增層介電層。圖案化第一增層金屬層以形成第一增層線路層,並形成多個第一導電盲孔於第一增層介電層,以電性連接第一增層線路層與前述至少一第二封裝模組。圖案化第二增層金屬層以形成第二增層線路層,並形成多個第二導電盲孔於第二增層介電層,以電性連接第二增層線路層與第一線路層、電性連接第二增層線路層與這些中介體以及電性連接第二增層線路層與前述至少一第二封裝模組。 In an embodiment of the invention, the method for fabricating the embedded component package structure includes the following steps. A glue layer is formed on the first surface. Provide at least one second The package module includes two second components stacked on each other, and the at least one second package module is embedded in the at least one second through slot. Forming a first build-up dielectric layer on the second surface and filling the at least one second via, and forming a first build-up metal layer on the first build-up dielectric layer. Remove the glue layer. Forming a second build-up dielectric layer on the first surface and forming a second build-up metal layer on the second build-up dielectric layer. Patterning the first build-up metal layer to form a first build-up circuit layer, and forming a plurality of first conductive vias on the first build-up dielectric layer to electrically connect the first build-up circuit layer with the at least one Two package modules. Patterning the second build-up metal layer to form a second build-up circuit layer, and forming a plurality of second conductive via holes in the second build-up dielectric layer to electrically connect the second build-up circuit layer and the first circuit layer And electrically connecting the second build-up circuit layer and the interposers and electrically connecting the second build-up circuit layer and the at least one second package module.
在本發明的一實施例中,上述的內埋式元件封裝結構的製作方法更包括以下步驟。形成貫穿第一增層介電層、核心介電層與第二增層介電層的至少一導通孔,以電性連接第一增層線路層與第二增層線路層。 In an embodiment of the invention, the method for fabricating the embedded component package structure further includes the following steps. Forming at least one via hole penetrating the first build-up dielectric layer, the core dielectric layer and the second build-up dielectric layer to electrically connect the first build-up wiring layer and the second build-up wiring layer.
在本發明的一實施例中,上述的第一封裝模組的製作方法包括以下步驟。提供載板,並形成多個通孔於載板。形成多個中介體於這些通孔。 In an embodiment of the invention, the method for fabricating the first package module includes the following steps. A carrier plate is provided and a plurality of through holes are formed in the carrier. A plurality of interposers are formed in the through holes.
在本發明的一實施例中,上述的線路基板還包括位於二表面上的第二線路層以及第二卡槽,其中線路基板的製作方法包括以下步驟。提供核心板。核心板包括核心介電層、位於第一表面上的第一金屬層以及位於第二表面上的第二金屬層。圖案化第 一金屬層與第二金屬層,以分別形成第一線路層與第二線路層。形成第一穿槽、貫穿第一表面與第二表面的至少一第二穿槽、第一卡槽以及第二卡槽於核心介電層。 In an embodiment of the invention, the circuit substrate further includes a second circuit layer and a second card slot on the two surfaces, wherein the manufacturing method of the circuit substrate includes the following steps. Provide the core board. The core board includes a core dielectric layer, a first metal layer on the first surface, and a second metal layer on the second surface. Patterning a metal layer and a second metal layer to form a first circuit layer and a second circuit layer, respectively. Forming a first through slot, at least one second through slot extending through the first surface and the second surface, the first card slot, and the second card slot in the core dielectric layer.
在本發明的一實施例中,上述的內埋式元件封裝結構的製作方法更包括以下步驟。使散熱元件卡合於第二卡槽,並與第一元件相連接。形成膠層於第一表面。提供至少一第二封裝模組,包括相互堆疊的兩第二元件,並使前述至少一第二封裝模組埋設於前述至少一第二穿槽。 In an embodiment of the invention, the method for fabricating the embedded component package structure further includes the following steps. The heat dissipating component is engaged with the second card slot and connected to the first component. A glue layer is formed on the first surface. Providing at least one second package module includes two second components stacked on each other, and the at least one second package module is embedded in the at least one second through slot.
在本發明的一實施例中,上述的內埋式元件封裝結構的製作方法更包括以下步驟。在使前述至少一第二封裝模組埋設於前述至少一第二穿槽之後,形成增層材料層於第一表面與第二表面,並填入前述至少一第二穿槽以固定前述至少一第二封裝模組,其中增層材料層暴露出第一線路層與第二線路層。移除膠層。形成增層介電層於位於第一表面上的增層材料層,並形成增層金屬層於增層介電層上。圖案化增層金屬層以形成增層線路層,並形成多個第一導電盲孔於增層介電層,以電性連接增層線路層與這些中介體以及電性連接增層線路層與前述至少一第二封裝模組。形成多個第二導電盲孔於增層材料層,其中這些第二導電盲孔電性連接前述至少一第二封裝模組。 In an embodiment of the invention, the method for fabricating the embedded component package structure further includes the following steps. After embedding the at least one second package module in the at least one second through slot, forming a layer of build-up material on the first surface and the second surface, and filling the at least one second through slot to fix the at least one The second package module, wherein the layer of build-up material exposes the first circuit layer and the second circuit layer. Remove the glue layer. Forming a build-up dielectric layer on the build-up material layer on the first surface and forming a build-up metal layer on the build-up dielectric layer. Patterning a metallization layer to form a build-up wiring layer, and forming a plurality of first conductive blind vias in the build-up dielectric layer to electrically connect the build-up wiring layer with the interposers and to electrically connect the build-up wiring layers The at least one second package module. Forming a plurality of second conductive blind vias in the layer of build-up material, wherein the second conductive vias are electrically connected to the at least one second package module.
在本發明的一實施例中,上述的內埋式元件封裝結構的製作方法更包括以下步驟。形成電性連接於第二線路層與這些第二導電盲孔的多個銲球。 In an embodiment of the invention, the method for fabricating the embedded component package structure further includes the following steps. A plurality of solder balls electrically connected to the second circuit layer and the second conductive blind vias are formed.
在本發明的一實施例中,上述的第二封裝模組的製作方法包括以下步驟。a.形成多個貫孔於一介電層。b.形成膠層於介電層的其中一表面,以覆蓋這些貫孔。c.將多個第二元件分別設置於這些貫孔內,且由膠層所固定。d.填入介電材料於這些貫孔以固定這些第二元件。重複上述步驟a至d,以分別形成第一封裝體與第二封裝體。利用第一封裝體與第二封裝體形成多個該第二封裝模組。 In an embodiment of the invention, the method for fabricating the second package module includes the following steps. a. forming a plurality of through holes in a dielectric layer. b. forming a glue layer on one of the surfaces of the dielectric layer to cover the through holes. c. A plurality of second elements are respectively disposed in the through holes and fixed by the glue layer. d. Fill dielectric material into the through holes to secure the second components. The above steps a to d are repeated to form the first package and the second package, respectively. A plurality of the second package modules are formed by using the first package and the second package.
在本發明的一實施例中,上述的利用第一封裝體與第二封裝體以形成多個第二封裝模組的製作方法包括以下步驟。單體化第一封裝體以形成多個第一封裝單元。單體化第二封裝體以形成多個第二封裝單元。翻轉這些第二封裝單元,使各個第二裝單元的膠層朝向對應的第一封裝單元的膠層。移除連接各個第二封裝單元的膠層,並使各個第一封裝單元疊置於對應的第二封裝單元上,其中各個第一封裝單元的膠層連接對應的第二封裝單元。 In an embodiment of the invention, the method for fabricating a plurality of second package modules by using the first package and the second package includes the following steps. The first package is singulated to form a plurality of first package units. The second package is singulated to form a plurality of second package units. The second package units are turned over such that the glue layers of the respective second loading units face the glue layer of the corresponding first package unit. The glue layers connecting the second package units are removed, and the first package units are stacked on the corresponding second package unit, wherein the glue layers of the respective first package units are connected to the corresponding second package units.
基於上述,本發明的內埋式元件封裝結構的製作方法是在將第一封裝模組埋設於線路基板的核心介電層的第一穿槽時,可先使第一封裝模組的載板對準連接第一穿槽的第一卡槽,再使第一封裝模組朝第一穿槽移動,直到載板卡合於第一卡槽後,第一封裝模組即可埋設於第一卡槽。換言之,在核心介電層設置有連接第一穿槽的第一卡槽的情況下,不僅可提高將第一封裝模組埋設於第一穿槽時的準確性,亦可在載板卡合於第一卡槽後,使第一封裝模組牢固地埋設於核心介電層。此時,散熱元件會暴露 於核心介電層的第二表面而與外界接觸,因此第一元件運作時所產生的熱能可藉由散熱元件的傳導而逸散至外界。另一方面,相較於現有技術將散熱元件設置於線路結構的外部的配置方式而言,由於本發明的散熱元件係埋設於核心介電層,因此能有效降低內埋式元件封裝結構的整體厚度,以符合薄型化的設計需求。 Based on the above, the embedded component package structure of the present invention can be fabricated by first embedding the first package module in the first through slot of the core dielectric layer of the circuit substrate. Aligning the first slot that is connected to the first slot, and then moving the first package module toward the first slot, until the carrier is engaged with the first slot, the first package module can be buried in the first Card slot. In other words, in the case where the core dielectric layer is provided with the first card slot connecting the first through slots, the accuracy of embedding the first package module in the first through slot can be improved, and the carrier can be engaged. After the first card slot, the first package module is firmly embedded in the core dielectric layer. At this point, the heat sink component will be exposed The second surface of the core dielectric layer is in contact with the outside, so that the thermal energy generated by the operation of the first component can be dissipated to the outside by conduction of the heat dissipating component. On the other hand, compared with the prior art arrangement in which the heat dissipating component is disposed outside the wiring structure, since the heat dissipating component of the present invention is embedded in the core dielectric layer, the overall structure of the embedded component packaging structure can be effectively reduced. Thickness to meet the needs of thin design.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the invention will be apparent from the following description.
1、1A、1’、1A’‧‧‧第一封裝模組 1, 1A, 1', 1A'‧‧‧ first package module
2‧‧‧第一封裝體 2‧‧‧First package
2a‧‧‧第一封裝單元 2a‧‧‧First package unit
2’‧‧‧第二封裝體 2'‧‧‧Second package
2a’‧‧‧第二封裝單元 2a’‧‧‧Second package unit
3‧‧‧第二封裝模組 3‧‧‧Second package module
4、4’‧‧‧線路基板 4, 4'‧‧‧ circuit substrate
5、5A、5’、5A’‧‧‧內埋式元件封裝結構 5, 5A, 5', 5A'‧‧‧ buried component package structure
10、10’‧‧‧載板 10, 10’‧‧‧ Carrier Board
10a、10a’‧‧‧卡接部 10a, 10a’‧‧‧ card joint
11‧‧‧第一通孔 11‧‧‧ first through hole
11’‧‧‧通孔 11’‧‧‧through hole
12‧‧‧第二通孔 12‧‧‧Second through hole
13、13’‧‧‧中介體 13, 13’ ‧ ‧ Intermediary
20‧‧‧第一元件 20‧‧‧ first component
21‧‧‧主動元件表面 21‧‧‧Active component surface
22‧‧‧背面 22‧‧‧ Back
23‧‧‧側表面 23‧‧‧ side surface
30、30a、30’、30a’‧‧‧散熱元件 30, 30a, 30', 30a'‧‧‧ Heat Dissipation Components
31‧‧‧卡榫部 31‧‧‧Card Department
32、32a、32’、32a’‧‧‧上表面 32, 32a, 32', 32a'‧‧‧ upper surface
40‧‧‧介電層 40‧‧‧ dielectric layer
41‧‧‧貫孔 41‧‧‧through holes
42、42’‧‧‧膠層 42, 42'‧‧‧ glue layer
43、44‧‧‧表面 43, 44‧‧‧ surface
50、50’‧‧‧第二元件 50, 50'‧‧‧ second component
60‧‧‧介電材料 60‧‧‧ dielectric materials
70、70’‧‧‧核心板 70, 70’‧‧‧ core board
71‧‧‧核心介電層 71‧‧‧ core dielectric layer
71a‧‧‧第一表面 71a‧‧‧ first surface
71b‧‧‧第二表面 71b‧‧‧second surface
72‧‧‧第一金屬層 72‧‧‧First metal layer
72a‧‧‧第一線路層 72a‧‧‧First circuit layer
73‧‧‧第一穿槽 73‧‧‧First slot
74‧‧‧第二穿槽 74‧‧‧Second trough
75‧‧‧第一卡槽 75‧‧‧First card slot
76‧‧‧第二金屬層 76‧‧‧Second metal layer
76a‧‧‧第二線路層 76a‧‧‧Second circuit layer
77‧‧‧第二卡槽 77‧‧‧Second card slot
80‧‧‧膠層 80‧‧‧ glue layer
81‧‧‧第一增層介電層 81‧‧‧First build-up dielectric layer
81’‧‧‧增層材料層 81'‧‧‧Additional material layer
82‧‧‧第一增層金屬層 82‧‧‧First build-up metal layer
82a‧‧‧第一增層線路 82a‧‧‧First build-up line
83‧‧‧第二增層介電層 83‧‧‧Second layered dielectric layer
83’‧‧‧增層介電層 83'‧‧‧Additional dielectric layer
84‧‧‧第二增層金屬層 84‧‧‧Second layer of metal
84’‧‧‧增層金屬層 84’‧‧‧Additional metal layer
84a‧‧‧第二增層線路層 84a‧‧‧Second layered circuit layer
84a’‧‧‧增層線路層 84a’‧‧‧Additional circuit layer
85、85’‧‧‧第一導電盲孔 85, 85'‧‧‧ first conductive blind hole
86‧‧‧第一增層線路結構 86‧‧‧First build-up line structure
86’‧‧‧增層線路結構 86’‧‧‧Additional line structure
87、87’‧‧‧第二導電盲孔 87, 87'‧‧‧Second conductive blind hole
88‧‧‧第二增層線路結構 88‧‧‧Second layered line structure
89‧‧‧導通孔 89‧‧‧Through hole
90‧‧‧銲球 90‧‧‧ solder balls
圖1A至圖1E是本發明一實施例的第一封裝模組的製作流程示意圖。 1A to FIG. 1E are schematic diagrams showing a manufacturing process of a first package module according to an embodiment of the invention.
圖2A至圖2D是本發明一實施例的第二封裝模組的製作流程示意圖。 2A to 2D are schematic diagrams showing a manufacturing process of a second package module according to an embodiment of the invention.
圖3A至圖3B是本發明一實施例的線路基板的製作流程示意圖。 3A to 3B are schematic diagrams showing a manufacturing process of a circuit substrate according to an embodiment of the present invention.
圖3C與圖3D分別是圖3B的核心介電層的區域A的局部底視圖。 3C and 3D are partial bottom views of region A of the core dielectric layer of FIG. 3B, respectively.
圖4A至圖4D是將圖1E的第一封裝模組與圖2D的第二封裝模組埋設於圖3B的線路基板以構成本發明一實施例的內埋式元件封裝結構的製作流程示意圖。 4A to FIG. 4D are schematic diagrams showing a manufacturing process of embedding the first package module of FIG. 1E and the second package module of FIG. 2D in the circuit substrate of FIG. 3B to form a buried component package structure according to an embodiment of the present invention.
圖4E是本發明另一實施例的內埋式元件封裝結構的示意圖。 4E is a schematic diagram of a buried component package structure according to another embodiment of the present invention.
圖5A至圖5D是本發明另一實施例的第一封裝模組的製作流程示意圖。 5A to 5D are schematic diagrams showing a manufacturing process of a first package module according to another embodiment of the present invention.
圖6A至圖6B是本發明另一實施例的線路基板的製作流程示意圖。 6A-6B are schematic diagrams showing a manufacturing process of a circuit substrate according to another embodiment of the present invention.
圖7A至圖7G是將圖5D的第一封裝模組與圖2D的第二封裝模組埋設於圖6B的線路基板以構成本發明另一實施例的內埋式元件封裝結構的製作流程示意圖。 FIG. 7A to FIG. 7G are schematic diagrams showing the fabrication process of the embedded component package structure in which the first package module of FIG. 5D and the second package module of FIG. 2D are embedded in the circuit substrate of FIG. 6B to form another embodiment of the present invention. .
圖7H是本發明又一實施例的內埋式元件封裝結構的示意圖。 7H is a schematic diagram of a buried component package structure according to still another embodiment of the present invention.
圖1A至圖1E是本發明一實施例的第一封裝模組的製作流程示意圖。首先,請參考圖1A,提供載板10,其中載板10的材質可以是環氧樹脂、玻璃纖維或玻纖環氧樹脂。接著,請參考圖1B,例如以雷射鑽孔或機械鑽孔等方式形成多個第一通孔11與至少一第二通孔12(圖式中示意地繪示出兩個)於載板10上,其中這些第一通孔11例如是位於前述兩個第二通孔12之間。接著,請參考圖1C,例如以電鍍的方式在各個第一通孔11內形成中介體13,其材質可為銅,或者是其他適當的導電金屬或合金或導電膏。此處,中介體13的兩端部可略為突出於載板10,以利於後續製程的進行。接著,請參考圖1D,使第一元件20電性連接於這些中介體13。具體來說,第一元件20可為主動元件(例如晶片),其具有主動元件表面21、相對於主動元件表面21的背面22以及 連接主動元件表面21與背面22的側表面23,其中第一元件20例如是透過焊接或表面黏著技術(SMT)等方式使其主動元件表面21電性連接於這些中介體13。 1A to FIG. 1E are schematic diagrams showing a manufacturing process of a first package module according to an embodiment of the invention. First, referring to FIG. 1A, a carrier 10 is provided, wherein the carrier 10 may be made of epoxy resin, glass fiber or glass epoxy. Next, referring to FIG. 1B, a plurality of first through holes 11 and at least one second through holes 12 (two are schematically shown in the drawing) are formed on the carrier board, for example, by laser drilling or mechanical drilling. 10, wherein the first through holes 11 are located between the two second through holes 12, for example. Next, referring to FIG. 1C, an interposer 13 is formed in each of the first through holes 11 by electroplating, and the material may be copper or other suitable conductive metal or alloy or conductive paste. Here, the two ends of the interposer 13 may slightly protrude from the carrier 10 to facilitate the subsequent process. Next, referring to FIG. 1D, the first component 20 is electrically connected to the interposers 13. In particular, the first component 20 can be an active component (eg, a wafer) having an active component surface 21, a backside 22 relative to the active component surface 21, and The active component surface 21 and the side surface 23 of the back surface 22 are connected, wherein the first component 20 is electrically connected to the intermediate body 13 by, for example, soldering or surface adhesion (SMT).
之後,請參考圖1E,使散熱元件30罩覆於第一元件20,其中散熱元件30可具有至少一卡榫部31(圖式中示意地繪示出兩個),以在各個卡榫部31卡合於對應的第二通孔12後而固定於載板10上。在散熱元件30罩覆於第一元件20並且透過卡榫部30而固定於載板10上後,散熱元件30會分別連接第一元件20的背面22與側表面23。至此,第一封裝模組1的製作已大致完成。通常而言,散熱元件30的材質可以是氮化鋁、氮化硼、石墨或其他高導熱材質所構成,且由於散熱元件30會與第一元件20的背面22與側表面23面接觸地連接,因此第一元件20運作時所產生的熱能可透過散熱元件30以傳導至外界,以避免熱能累積於第一封裝模組1而致使第一元件20故障或損毀的情況產生,有助於提高第一元件20的運作效能以及延長其工作壽命。 Thereafter, referring to FIG. 1E, the heat dissipating component 30 is covered on the first component 20, wherein the heat dissipating component 30 can have at least one latching portion 31 (two are schematically shown in the drawing) to be in each of the latching portions. 31 is engaged with the corresponding second through hole 12 and fixed to the carrier 10 . After the heat dissipating component 30 covers the first component 20 and is fixed to the carrier 10 through the latching portion 30, the heat dissipating component 30 connects the back surface 22 and the side surface 23 of the first component 20, respectively. So far, the fabrication of the first package module 1 has been substantially completed. Generally, the heat dissipating component 30 may be made of aluminum nitride, boron nitride, graphite or other highly thermally conductive material, and the heat dissipating component 30 may be in surface contact with the back surface 22 of the first component 20 and the side surface 23 . Therefore, the thermal energy generated by the operation of the first component 20 can be transmitted to the outside through the heat dissipating component 30 to prevent thermal energy from accumulating in the first package module 1 and causing the first component 20 to malfunction or be damaged, thereby contributing to improvement. The operational performance of the first component 20 and its extended operating life.
圖2A至圖2D是本發明一實施例的第二封裝模組的製作流程示意圖。首先,請參考圖2A,例如以雷射鑽孔或機械鑽孔等方式在介電層40上形成多個貫孔41,並形成膠層42於介電層40的表面43上以覆蓋這些貫孔41,而這些貫孔41位在介電層之另一表面44的開口仍被暴露出來,以利於後續製程的進行。通常而言,介電層40的材質可為環氧樹脂、玻璃纖維或玻纖環氧樹脂,而膠層42可為聚醯亞胺膠帶(或膠膜)、乙烯膠帶(或膠膜)或玻璃 紙膠帶(或膠膜),惟本發明不限於此。接著,將多個第二元件50(例如是被動元件)從對應的貫孔41位在表面44的開口置放於對應的貫孔41內。此時,各個第二元件50可接合至膠層42,並透過膠層42黏貼固定於對應的貫孔41內,藉以防止第二元件50在後續製程中產生偏移。 2A to 2D are schematic diagrams showing a manufacturing process of a second package module according to an embodiment of the invention. First, referring to FIG. 2A, a plurality of through holes 41 are formed on the dielectric layer 40 by, for example, laser drilling or mechanical drilling, and a glue layer 42 is formed on the surface 43 of the dielectric layer 40 to cover the through holes. The holes 41, and the openings of the through holes 41 on the other surface 44 of the dielectric layer are still exposed to facilitate the subsequent process. Generally, the material of the dielectric layer 40 may be epoxy resin, glass fiber or glass epoxy resin, and the adhesive layer 42 may be a polyimide tape (or a film), a vinyl tape (or a film) or glass Paper tape (or film), but the invention is not limited thereto. Next, a plurality of second elements 50 (eg, passive elements) are placed in the corresponding through holes 41 from the openings of the corresponding through holes 41 in the surface 44. At this time, each of the second members 50 can be bonded to the adhesive layer 42 and adhered to the corresponding through holes 41 through the adhesive layer 42 to prevent the second member 50 from being displaced in the subsequent process.
請參考圖2B,在各個第二元件50初步固定於對應的貫孔41內後,填入介電材料60於這些貫孔41,以將這些第二元件50牢固地埋設於介電層40。通常而言,介電材料60的材質可為聚醯亞胺、聚二甲基矽氧烷或ABF膜。至此,第一封裝體2的製作已大致完成,相似地,重複上述製作程序,即可完成第二封裝體2’的製作。之後,利用第一封裝體2與第二封裝體2’以形成多個堆疊元件模組3,其製作步驟如圖2C至圖2D所示。首先,單體化第一封裝體2以形成多個第一封裝單元2a,並單體化第二封裝體2’以形成多個第二封裝單元2a’。 Referring to FIG. 2B , after the second components 50 are initially fixed in the corresponding through holes 41 , the dielectric material 60 is filled in the through holes 41 to firmly embed the second components 50 in the dielectric layer 40 . Generally, the material of the dielectric material 60 may be a polyimide, a polydimethyl siloxane or an ABF film. Thus, the fabrication of the first package 2 has been substantially completed, and similarly, the above-described fabrication process is repeated to complete the fabrication of the second package 2'. Thereafter, the first package 2 and the second package 2' are utilized to form a plurality of stacked component modules 3, the fabrication steps of which are illustrated in Figures 2C-2D. First, the first package 2 is singulated to form a plurality of first package units 2a, and the second package 2' is singulated to form a plurality of second package units 2a'.
由於在單體化第一封裝體2時並未將膠層42斷開,因此各個第一封裝單元2a仍可透過膠層42而彼此連接。相似地,由於在單體化第一封裝體2’時並未將膠層42’斷開,因此各個第一封裝單元2a’仍可透過膠層42’而彼此連接。接著,翻轉這些第一封裝單元2a’而使膠層42與42’彼此相對。之後,移除膠層42’並使各個第一封裝單元2a疊置於對應的第二封裝單元2a’上,以令第一封裝單元2a透過膠層42與對應的第二封裝單元2a’膠合固定。又,連接各個第一封裝單元2a的膠層42經施 力後可分離成多個片段,並接合於第一封裝單元2a與對應的第二封裝單元2a’之間。至此,包括相互堆疊的第二元件50與50’的多個第二封裝模組3(圖2D示意地繪示出一個)已大致完成。 Since the glue layer 42 is not broken when the first package 2 is singulated, the respective first package units 2a can still be connected to each other through the glue layer 42. Similarly, since the glue layer 42' is not broken when the first package 2' is singulated, the respective first package units 2a' can still be connected to each other through the glue layer 42'. Next, the first package units 2a' are turned over so that the glue layers 42 and 42' face each other. After that, the adhesive layer 42' is removed and the first package units 2a are stacked on the corresponding second package unit 2a', so that the first package unit 2a is glued to the corresponding second package unit 2a' through the adhesive layer 42. fixed. Moreover, the glue layer 42 connecting the first package units 2a is applied The force can be separated into a plurality of segments and bonded between the first package unit 2a and the corresponding second package unit 2a'. To this end, the plurality of second package modules 3 (one of which is schematically illustrated in Fig. 2D) including the second elements 50 and 50' stacked on each other has been substantially completed.
圖3A至圖3B是本發明一實施例的線路基板的製作流程示意圖。圖3C與圖3D分別是圖3B的核心介電層的區域A的局部底視圖。首先,請參考圖3A,提供核心板70。核心板70包括核心介電層71以及第一金屬層72,其中核心介電層71具有第一表面71a與相對於第一表面71a的第二表面71b,且第一金屬層72例如是位於第一表面71a上。通常而言,核心介電層71的材質可以是環氧樹脂、玻璃纖維或玻纖環氧樹脂,而第一金屬層72可以是由導電金屬或合金所組成。 3A to 3B are schematic diagrams showing a manufacturing process of a circuit substrate according to an embodiment of the present invention. 3C and 3D are partial bottom views of region A of the core dielectric layer of FIG. 3B, respectively. First, referring to FIG. 3A, a core board 70 is provided. The core board 70 includes a core dielectric layer 71 and a first metal layer 72, wherein the core dielectric layer 71 has a first surface 71a and a second surface 71b opposite to the first surface 71a, and the first metal layer 72 is, for example, located at On a surface 71a. Generally, the core dielectric layer 71 may be made of epoxy, fiberglass or glass epoxy, and the first metal layer 72 may be composed of a conductive metal or alloy.
之後,請參考圖3B,例如以微影蝕刻的方式圖案化第一金屬層72以形成第一線路層72a,且例如以雷射鑽孔或機械鑽孔等方式形成貫穿第一表面71a與第二表面71b的第一穿槽73、至少一第二穿槽74(圖式中示意地繪示出兩個)。在形成第一穿槽73之前、之後或同時,例如以雷射鑽孔或機械鑽孔等方式形成位於第一表面71a且連接第一穿槽73的第一卡槽75。至此,線路基板4的製作已大致完成。需說明的是,如圖3C所示,第一卡槽75可以是由圍繞第一穿槽73的單一個連續之環狀卡槽所組成。又,如圖3D所示,第一卡槽75也可以是由圍繞第一穿槽73的多個矩形卡槽所組成,惟本發明並不以此為限。 Thereafter, referring to FIG. 3B, the first metal layer 72 is patterned, for example, by lithography to form the first wiring layer 72a, and is formed through the first surface 71a and the first, for example, by laser drilling or mechanical drilling. The first through groove 73 of the two surfaces 71b and the at least one second through groove 74 (two are schematically shown in the drawing). The first card slot 75 located on the first surface 71a and connected to the first through slot 73 is formed before, after or at the same time as the first through slot 73 is formed, for example, by laser drilling or mechanical drilling. So far, the fabrication of the circuit substrate 4 has been substantially completed. It should be noted that, as shown in FIG. 3C, the first card slot 75 may be composed of a single continuous annular card slot surrounding the first slot 73. Moreover, as shown in FIG. 3D, the first card slot 75 may also be composed of a plurality of rectangular card slots surrounding the first slot 73, but the invention is not limited thereto.
圖4A至圖4D是將圖1E的第一封裝模組與圖2D的第二 封裝模組埋設於圖3B的線路基板以構成本發明一實施例的內埋式元件封裝結構的製作流程示意圖。首先,請參考圖4A與圖4B,將第一封裝模組1埋設於第一穿槽73。具體而言,第一封裝模組1是先透過載板10的周緣的卡接部10a對準第一卡槽75,再使第一封裝模組1朝第一穿槽73移動,直到卡接部10a卡合於第一卡槽75後,第一封裝模組1即可埋設於第一卡槽75。換言之,在核心介電層71設置有連接第一穿槽73的第一卡槽75的情況下,不僅可提高將第一封裝模組1埋設於第一穿槽73時的準確性,亦可在載板10的卡接部10a卡合於第一卡槽75後,使第一封裝模組1牢固地埋設於核心介電層71。此時,散熱元件30會暴露於第二表面71b而與外界接觸,因此第一元件20運作時所產生的熱能可藉由散熱元件30的傳導而逸散至外界。 4A to 4D are the first package module of FIG. 1E and the second package of FIG. 2D. The packaging module is embedded in the circuit substrate of FIG. 3B to form a schematic diagram of a manufacturing process of the embedded component packaging structure according to an embodiment of the present invention. First, referring to FIG. 4A and FIG. 4B , the first package module 1 is embedded in the first through slot 73 . Specifically, the first package module 1 is first aligned with the first card slot 75 through the latching portion 10a of the periphery of the carrier 10, and then the first package module 1 is moved toward the first slot 73 until the card is attached. After the portion 10a is engaged with the first card slot 75, the first package module 1 can be embedded in the first card slot 75. In other words, in the case where the core dielectric layer 71 is provided with the first card slot 75 connecting the first through slots 73 , the accuracy of embedding the first package module 1 in the first through slots 73 can be improved. After the latching portion 10a of the carrier 10 is engaged with the first card slot 75, the first package module 1 is firmly embedded in the core dielectric layer 71. At this time, the heat dissipating component 30 is exposed to the second surface 71b to be in contact with the outside, so that the thermal energy generated when the first component 20 operates can be dissipated to the outside by conduction of the heat dissipating component 30.
接著,形成膠層80於第一表面71a以覆蓋第一封裝模組1及第二穿槽74位於第一表面71a的開口,再使各個第二封裝模組3經由對應的第二穿槽74位在第二表面71b的開口而埋設於對應的第二穿槽74,並使各個第二封裝模組3接合至膠層80。藉此,各個第二封裝模組3可透過膠層80黏貼固定於對應的第二穿槽74內,從而防止在後續製程中產生偏移。接著,請參考圖4C,形成第一增層介電層81於第二表面71b並填入第二穿槽74,以將第二封裝模組3牢固地埋設於核心介電層71。接著,形成第一增層金屬層82於第一增層介電層上81,且在移除膠層80後形成第二增層介電層83於第一表面71a,並形成第二增層金屬層84於第二增 層介電層83。通常而言,第一增層介電層81與第二增層介電層83的材質可為聚醯亞胺、聚二甲基矽氧烷或ABF膜,而第一增層金屬層82與第二增層金屬層84可為導電金屬或合金。 Then, the adhesive layer 80 is formed on the first surface 71a to cover the opening of the first package module 1 and the second through slot 74 on the first surface 71a, and then the second package modules 3 are respectively connected to the corresponding second through slots 74. The openings of the second surface 71b are buried in the corresponding second through slots 74, and the respective second package modules 3 are bonded to the glue layer 80. Thereby, each of the second package modules 3 can be adhered and fixed in the corresponding second through slots 74 through the adhesive layer 80, thereby preventing offset in subsequent processes. Next, referring to FIG. 4C , the first build-up dielectric layer 81 is formed on the second surface 71 b and filled into the second via 74 to firmly embed the second package module 3 in the core dielectric layer 71 . Next, a first build-up metal layer 82 is formed on the first build-up dielectric layer 81, and after removing the adhesive layer 80, a second build-up dielectric layer 83 is formed on the first surface 71a, and a second build-up layer is formed. Metal layer 84 is increased in the second Layer dielectric layer 83. Generally, the material of the first build-up dielectric layer 81 and the second build-up dielectric layer 83 may be a polyimide, a polydimethyl siloxane or an ABF film, and the first build-up metal layer 82 and The second build-up metal layer 84 can be a conductive metal or alloy.
需說明的是,在形成第一增層介電層81於第二表面71b上之前,可先就散熱元件30與第一增層介電層81之間的相對配置關係,在第一增層介電層81開設一個開口,以使第一增層介電層81壓合於第二表面71b上之時,讓散熱元件30的上表面32暴露於前述開口。又或者是,在第一增層介電層81未開設有前述開口的情況下,先將第一增層介電層81全面性地壓合於第二表面71b上,再透過雷射或化學藥液蝕刻的方式在對應於散熱元件30的上表面32所在處移除部分的第一增層介電層81,以暴露出散熱元件30的上表面32。雖然在形成第一增層金屬層82於第一增層介電層上81之後,散熱元件30的上表面32會被第一增層金屬層82所覆蓋,但通過後續的圖案化第一增層金屬層82以形成第一增層線路層82a的製作程序後,即能再次使散熱元件30的上表面32暴露於外。 It should be noted that, before forming the first build-up dielectric layer 81 on the second surface 71b, the relative arrangement relationship between the heat dissipating component 30 and the first build-up dielectric layer 81 may be first applied to the first build-up layer. The dielectric layer 81 defines an opening to expose the upper surface 32 of the heat dissipating component 30 to the opening when the first build-up dielectric layer 81 is pressed against the second surface 71b. Alternatively, in the case where the first build-up dielectric layer 81 is not provided with the opening, the first build-up dielectric layer 81 is first fully pressed onto the second surface 71b, and then transmitted through a laser or a chemical. The liquid etching manner removes a portion of the first build-up dielectric layer 81 at a location corresponding to the upper surface 32 of the heat dissipating component 30 to expose the upper surface 32 of the heat dissipating component 30. Although the upper surface 32 of the heat dissipating component 30 is covered by the first build-up metal layer 82 after forming the first build-up metal layer 82 on the first build-up dielectric layer 81, the first pattern is increased by subsequent patterning. After the layer metal layer 82 is formed to form the first build-up wiring layer 82a, the upper surface 32 of the heat dissipating component 30 can be exposed again.
之後,請參考圖4D,圖案化第一增層金屬層82以形成第一增層線路層82a,並形成多個第一導電盲孔85於第一增層介電層81。此處,穿過第一增層介電層81的第一導電盲孔85可電性連接第一增層線路層82a與第二封裝模組3,且第一增層線路結構86例如是由第一增層介電層81、第一導電盲孔85以及第一增層線路層82a所組成。 Thereafter, referring to FIG. 4D, the first build-up metal layer 82 is patterned to form the first build-up wiring layer 82a, and a plurality of first conductive vias 85 are formed on the first build-up dielectric layer 81. Here, the first conductive via hole 85 passing through the first build-up dielectric layer 81 can electrically connect the first build-up wiring layer 82a and the second package module 3, and the first build-up trace structure 86 is, for example, The first build-up dielectric layer 81, the first conductive vias 85, and the first build-up wiring layer 82a are formed.
圖案化第二增層金屬層84以形成第二增層線路層84a,並形成多個第二導電盲孔87於第二增層介電層83。此處,穿過第二增層介電層83的第二導電盲孔87可電性連接第二增層線路層84a與第一線路層72a、電性連接第二增層線路層84a與這些中介體13以及電性連接第二增層線路層84a與第二封裝模組3,其中第二增層線路結構88例如是由第二增層介電層83、第二導電盲孔87以及第二增層線路層84a所組成,且第二增層線路層84a可透過中介體13而電性連接至第一元件20。最後,形成貫穿第一增層介電層81、核心介電層71與第二增層介電層83的至少一導通孔89(圖4D示意繪示出兩個),以電性連接第一增層線路層82a與該第二增層線路層84a。至此,內埋式元件封裝結構5的製作已大致完成。另一方面,相較於現有技術將散熱元件設置於線路結構的外部的配置方式而言,由於本實施例的散熱元件30係埋設於核心介電層71並暴露出部分的表面與外界接觸,因此不僅能將第一元件20運作時所產生的熱能有效地透傳導至外界,亦能降低內埋式元件封裝結構5的整體厚度以符合薄型化的設計需求。 The second build-up metal layer 84 is patterned to form a second build-up wiring layer 84a, and a plurality of second conductive blind vias 87 are formed in the second build-up dielectric layer 83. Here, the second conductive via hole 87 passing through the second build-up dielectric layer 83 is electrically connected to the second build-up wiring layer 84a and the first wiring layer 72a, and electrically connected to the second build-up wiring layer 84a. The interposer 13 is electrically connected to the second build-up layer 84a and the second package module 3, wherein the second build-up line structure 88 is, for example, a second build-up dielectric layer 83, a second conductive via 87, and The second build-up circuit layer 84a is formed, and the second build-up circuit layer 84a is electrically connected to the first component 20 through the interposer 13 . Finally, at least one via hole 89 (two schematically shown in FIG. 4D) penetrating through the first build-up dielectric layer 81, the core dielectric layer 71 and the second build-up dielectric layer 83 is formed to electrically connect the first The wiring layer 82a and the second build-up wiring layer 84a are layered. So far, the fabrication of the embedded component package structure 5 has been substantially completed. On the other hand, the heat dissipating component 30 of the present embodiment is embedded in the core dielectric layer 71 and the exposed surface is in contact with the outside, as compared with the prior art. Therefore, not only the thermal energy generated by the operation of the first component 20 can be effectively transmitted to the outside, but also the overall thickness of the embedded component package 5 can be reduced to meet the thin design requirements.
圖4E是本發明另一實施例的內埋式元件封裝結構的示意圖。請參考圖4E,通過上述相同或相似的製作程序亦可得到本實施例的內埋式元件封裝結構5A,其與圖4D的內埋式元件封裝結構5之間的主要差異處是在於:內埋式元件封裝結構5A的第一封裝模組1A的散熱元件30a的上表面32a例如是與核心介電層71的第二表面71b齊平。 4E is a schematic diagram of a buried component package structure according to another embodiment of the present invention. Referring to FIG. 4E, the buried component package structure 5A of the present embodiment can also be obtained by the same or similar fabrication process as described above, and the main difference between the embedded component package structure 5A and the embedded component package structure 5 of FIG. 4D is that: The upper surface 32a of the heat dissipating component 30a of the first package module 1A of the buried component package structure 5A is, for example, flush with the second surface 71b of the core dielectric layer 71.
以下將列舉其他實施例以作為說明。在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。 Other embodiments are listed below for illustration. It is to be noted that the following embodiments use the same reference numerals and parts of the above-mentioned embodiments, and the same reference numerals are used to refer to the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted portions, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.
圖5A至圖5D是本發明另一實施例的第一封裝模組的製作流程示意圖。首先,請參考圖5A至圖5D,提供載板10’。接著,形成多個通孔11’於載板10’上。接著,在各個通孔11’內形成中介體13’。之後,使第一元件20電性連接於這些中介體13’。至此,第一封裝模組1’的製作已大致完成,惟散熱元件30’(繪示於7C至圖7G)例如是在後續的製作程序中才會設置於第一元件20的背面22。 5A to 5D are schematic diagrams showing a manufacturing process of a first package module according to another embodiment of the present invention. First, referring to Figures 5A to 5D, a carrier 10' is provided. Next, a plurality of through holes 11' are formed on the carrier 10'. Next, an interposer 13' is formed in each of the through holes 11'. Thereafter, the first component 20 is electrically connected to the interposers 13'. So far, the fabrication of the first package module 1' has been substantially completed, but the heat dissipating component 30' (shown in 7C to 7G) is disposed on the back surface 22 of the first component 20, for example, in a subsequent fabrication process.
圖6A至圖6B是本發明另一實施例的線路基板的製作流程示意圖。首先,請參考圖6A,提供核心板70’。核心板70’包括核心介電層71、第一金屬層72以及第二金屬層76,其中第一金屬層72例如是位於第一表面71a上,且第二金屬層76例如是位於第二表面71b上。之後,請參考圖6B,圖案化第一金屬層72與第二金屬層76,以分別形成第一線路層72a與第二線路層76a。另一方面,形成第一穿槽73與第二穿槽74,其中在形成第一穿槽73之前、之後或同時,形成位於第一表面71a且連接第一穿槽73的第一卡槽75以及形成位於第一表面71b且連接第一穿槽73的第二卡槽77。至此,且線路基板4’的製作已大致完成。 6A-6B are schematic diagrams showing a manufacturing process of a circuit substrate according to another embodiment of the present invention. First, referring to Fig. 6A, a core board 70' is provided. The core board 70' includes a core dielectric layer 71, a first metal layer 72, and a second metal layer 76, wherein the first metal layer 72 is, for example, located on the first surface 71a, and the second metal layer 76 is, for example, located on the second surface. On 71b. Thereafter, referring to FIG. 6B, the first metal layer 72 and the second metal layer 76 are patterned to form a first wiring layer 72a and a second wiring layer 76a, respectively. On the other hand, the first through groove 73 and the second through groove 74 are formed, wherein before, after or at the same time as forming the first through groove 73, the first card slot 75 is formed on the first surface 71a and connected to the first through groove 73. And forming a second card slot 77 located on the first surface 71b and connected to the first through slot 73. So far, the fabrication of the circuit substrate 4' has been substantially completed.
圖7A至圖7G是將圖5D的第一封裝模組與圖2D的第二封裝模組埋設於圖6B的線路基板以構成本發明另一實施例的內埋式元件封裝結構的製作流程示意圖。首先,請參考圖7A與圖7B,將第一封裝模組1’埋設於第一穿槽73。具體而言,第一封裝模組1’是先透過載板10’的周緣的卡接部10a’對準第一卡槽75,再使第一封裝模組1’朝第一穿槽73移動直到卡接部10a’卡合於第一卡槽75,第一封裝模組1即可埋設於第一卡槽75。換言之,在核心介電層71設置有連接第一穿槽73的第一卡槽75的情況下,不僅可提高將第一封裝模組1’埋設於第一穿槽73時的準確性,亦可在載板10’的卡接部10a’卡合於第一卡槽75後,使第一封裝模組1’牢固地埋設於核心介電層71。接著,形成膠層80於第一表面71a,以覆蓋第一封裝模組1’及第二穿槽74位於第一表面71a的開口,便於後續製程的進行。 FIG. 7A to FIG. 7G are schematic diagrams showing the fabrication process of the embedded component package structure in which the first package module of FIG. 5D and the second package module of FIG. 2D are embedded in the circuit substrate of FIG. 6B to form another embodiment of the present invention. . First, referring to FIG. 7A and FIG. 7B, the first package module 1' is buried in the first through slot 73. Specifically, the first package module 1 ′ is first aligned with the first card slot 75 through the latching portion 10 a ′ of the periphery of the carrier 10 ′, and then moves the first package module 1 ′ toward the first slot 73 . The first package module 1 can be embedded in the first card slot 75 until the latching portion 10a' is engaged with the first card slot 75. In other words, in the case where the core dielectric layer 71 is provided with the first card slot 75 connecting the first through slots 73, the accuracy of embedding the first package module 1 ′ in the first through slots 73 can be improved. After the latching portion 10a' of the carrier 10' is engaged with the first card slot 75, the first package module 1' can be firmly embedded in the core dielectric layer 71. Then, the adhesive layer 80 is formed on the first surface 71a to cover the opening of the first package module 1' and the second through slot 74 on the first surface 71a, so as to facilitate the subsequent process.
接著,請參考圖7C,使各個第二封裝模組3經由第二穿槽74位在第二表面71b的開口而埋設於對應的第二穿槽74,並使各個第二封裝模組3接合至膠層80。藉此,各個第二封裝模組3可透過膠層80黏貼固定於對應的第二穿槽74內,從而防止在後續製程中產生偏移。另一方面,使散熱元件30’卡合於第二卡槽77,並與第一元件20的背面22相連接。此時,散熱元件30’會暴露於第二表面71b而與外界接觸,因此第一元件20運作時所產生的熱能可藉由散熱元件30的傳導而逸散至外界。 Next, referring to FIG. 7C, each of the second package modules 3 is embedded in the corresponding second through slot 74 via the opening of the second surface 71b via the second through slot 74, and the second package modules 3 are joined. To the glue layer 80. Thereby, each of the second package modules 3 can be adhered and fixed in the corresponding second through slots 74 through the adhesive layer 80, thereby preventing offset in subsequent processes. On the other hand, the heat dissipating member 30' is engaged with the second card slot 77 and connected to the back surface 22 of the first member 20. At this time, the heat dissipating member 30' is exposed to the second surface 71b to be in contact with the outside, so that the heat generated by the operation of the first member 20 can be dissipated to the outside by conduction of the heat dissipating member 30.
接著,請參考圖7D,形成增層材料層81’於第一表面 71a與第二表面71b上並填入第二穿槽74,以將第二封裝模組3牢固地埋設於核心介電層71。此時,會有部分的增層材料層81’位於第一表面71a與膠層80之間。另一方面,增層材料層81’會暴露出第一線路層72a與第二線路層76a。接著,請參考圖7E與圖7F,先移除膠層80,再形成增層介電層83’於第一表面71a上的增層材料層81’上,並形成增層金屬層84’於增層介電層83上。圖案化增層金屬層84’以形成增層線路層84a’,並形成多個第一導電盲孔85’於增層介電層83’。此處,穿過增層介電層83’的第一導電盲孔85’可電性連接增層線路層84a’與中介體13’以及電性連接增層線路層84a’與第二封裝模組3,且增層線路結構86’例如是由增層介電層83’、第一導電盲孔85’以及增層線路層84a’所組成。 Next, referring to FIG. 7D, a layer of build-up material 81' is formed on the first surface. The second surface 71b and the second surface 71b are filled with the second through grooves 74 to firmly embed the second package module 3 in the core dielectric layer 71. At this time, a portion of the layer of buildup material 81' is located between the first surface 71a and the glue layer 80. On the other hand, the build-up material layer 81' exposes the first wiring layer 72a and the second wiring layer 76a. Next, referring to FIG. 7E and FIG. 7F, the adhesive layer 80 is first removed, and the build-up dielectric layer 83' is formed on the build-up material layer 81' on the first surface 71a, and the build-up metal layer 84' is formed. The dielectric layer 83 is layered. The patterned metal layer 84' is patterned to form the build-up wiring layer 84a', and a plurality of first conductive vias 85' are formed in the build-up dielectric layer 83'. Here, the first conductive via hole 85' passing through the build-up dielectric layer 83' can electrically connect the build-up wiring layer 84a' with the intermediate body 13' and the electrical connection build-up wiring layer 84a' and the second package mold. Group 3, and the build-up line structure 86' is comprised of, for example, a build-up dielectric layer 83', a first conductive blind via 85', and a build-up wiring layer 84a'.
需說明的是,在形成增層材料層81’於第一表面71a與第二表面71b上並填入第二穿槽74之前,可先就散熱元件30’與增層材料層81’之間的相對配配置關係,在增層材料層81’開設一個開口,以使增層材料層81’壓合於第二表面71b上之時,讓散熱元件30’的上表面32’暴露於前述開口。又或者是,在增層材料層81’未開設有前述開口的情況下,先將增層材料層81’全面性地壓合於第二表面71b上,再透過雷射或化學藥液蝕刻的方式在對應於散熱元件30’的上表面32’所在處移除部分的增層材料層81’,以暴露出散熱元件30’的上表面32’。 It should be noted that before the formation of the layer of the build-up material 81' on the first surface 71a and the second surface 71b and filling the second through-hole 74, the heat dissipating component 30' and the build-up material layer 81' may be first The opposite arrangement relationship is such that when the build-up material layer 81' is opened to expose the build-up material layer 81' to the second surface 71b, the upper surface 32' of the heat dissipation element 30' is exposed to the opening. . Alternatively, in the case where the build-up material layer 81' is not provided with the opening, the build-up material layer 81' is first fully pressed against the second surface 71b, and then etched by laser or chemical liquid. The portion removes a portion of the build-up material layer 81' corresponding to the upper surface 32' of the heat dissipating component 30' to expose the upper surface 32' of the heat dissipating component 30'.
之後,請參考圖7G,先形成穿過增層材料層81’的多個 第二導電盲孔87’,其中這些第二導電盲孔87’電性連接第二封裝模組3,再形成電性連接於第二線路層76a以及這些第二導電盲孔87’的多個銲球90,以作為連接外部的電子元件(圖未示)或線路(圖未示)所用。至此,內埋式元件封裝結構5’的製作已大致完成,相較於現有技術將散熱元件設置於線路結構的外部的配置方式而言,由於本實施例的散熱元件30’係埋設於核心介電層71並暴露出部分的表面與外界接觸,因此不僅能將第一元件20運作時所產生的熱能有效地透傳導至外界,亦能降低內埋式元件封裝結構5’的整體厚度以符合薄型化的設計需求。 Thereafter, referring to FIG. 7G, a plurality of layers passing through the layer of build-up material 81' are formed first. The second conductive vias 87' are electrically connected to the second package module 3, and are electrically connected to the second circuit layer 76a and the plurality of second conductive blind holes 87'. The solder ball 90 is used as an electronic component (not shown) or a line (not shown) connected to the outside. So far, the fabrication of the embedded component package structure 5 ′ has been substantially completed, and the heat dissipation component 30 ′ of the present embodiment is embedded in the core interface in comparison with the prior art arrangement in which the heat dissipation component is disposed outside the circuit structure. The electrical layer 71 exposes a portion of the surface to be in contact with the outside, so that not only the heat generated by the operation of the first component 20 can be effectively transmitted to the outside, but also the overall thickness of the embedded component package 5' can be reduced. Thin design requirements.
圖7H是本發明又一實施例的內埋式元件封裝結構的示意圖。請參考圖7H,通過上述相同或相似的製作程序亦可得到本實施例的內埋式元件封裝結構5A’,其與圖7G的內埋式元件封裝結構5’之間的主要差異處是在於:內埋式元件封裝結構5A’的第一封裝模組1A’的散熱元件30a’的上表面32a’例如是與核心介電層71的第二表面71b齊平。 7H is a schematic diagram of a buried component package structure according to still another embodiment of the present invention. Referring to FIG. 7H, the embedded component package structure 5A' of the present embodiment can also be obtained by the same or similar fabrication process as described above, and the main difference between the embedded component package structure 5A' and the embedded component package structure 5' of FIG. 7G is that The upper surface 32a' of the heat dissipating component 30a' of the first package module 1A' of the embedded component package structure 5A' is, for example, flush with the second surface 71b of the core dielectric layer 71.
綜上所述,本發明的內埋式元件封裝結構的製作方法是在將第一封裝模組埋設於線路基板的核心介電層的第一穿槽時,可先使第一封裝模組的載板對準連接第一穿槽的第一卡槽,再使第一封裝模組朝第一穿槽移動,直到載板卡合於第一卡槽後,第一封裝模組即可埋設於第一卡槽。換言之,在核心介電層設置有連接第一穿槽的第一卡槽的情況下,不僅可提高將第一封裝模組埋設於第一穿槽時的準確性,亦可在載板卡合於第一卡槽後,使 第一封裝模組牢固地埋設於核心介電層。此時,散熱元件會暴露於核心介電層的第二表面而與外界接觸,因此第一元件運作時所產生的熱能可藉由散熱元件的傳導而逸散至外界。另一方面,相較於現有技術將散熱元件設置於線路結構的外部的配置方式而言,由於本發明的散熱元件係埋設於核心介電層,因此能有效降低內埋式元件封裝結構的整體厚度,以符合薄型化的設計需求。 In summary, the embedded component package structure of the present invention can be fabricated by first embedding the first package module in the first via of the core dielectric layer of the circuit substrate. The carrier board is aligned with the first slot of the first slot, and then the first package module is moved toward the first slot. After the carrier is engaged with the first slot, the first package module can be buried. The first card slot. In other words, in the case where the core dielectric layer is provided with the first card slot connecting the first through slots, the accuracy of embedding the first package module in the first through slot can be improved, and the carrier can be engaged. After the first card slot, make The first package module is firmly embedded in the core dielectric layer. At this time, the heat dissipating component is exposed to the second surface of the core dielectric layer to be in contact with the outside, so that the thermal energy generated when the first component operates can be dissipated to the outside by conduction of the heat dissipating component. On the other hand, compared with the prior art arrangement in which the heat dissipating component is disposed outside the wiring structure, since the heat dissipating component of the present invention is embedded in the core dielectric layer, the overall structure of the embedded component packaging structure can be effectively reduced. Thickness to meet the needs of thin design.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.
1‧‧‧第一封裝模組 1‧‧‧First package module
3‧‧‧第二封裝模組 3‧‧‧Second package module
4‧‧‧線路基板 4‧‧‧Line substrate
5‧‧‧內埋式元件封裝結構 5‧‧‧Internal component package structure
10‧‧‧載板 10‧‧‧ Carrier Board
13‧‧‧中介體 13‧‧‧Intermediary
20‧‧‧第一元件 20‧‧‧ first component
30‧‧‧散熱元件 30‧‧‧Heat components
32‧‧‧上表面 32‧‧‧ upper surface
71‧‧‧核心介電層 71‧‧‧ core dielectric layer
71a‧‧‧第一表面 71a‧‧‧ first surface
71b‧‧‧第二表面 71b‧‧‧second surface
72a‧‧‧第一線路層 72a‧‧‧First circuit layer
81‧‧‧第一增層介電 81‧‧‧First Layered Dielectric
82a‧‧‧第一增層線路層 82a‧‧‧First build-up circuit layer
83‧‧‧第二增層介電層 83‧‧‧Second layered dielectric layer
84a‧‧‧第二增層線路層 84a‧‧‧Second layered circuit layer
85‧‧‧第一導電盲孔 85‧‧‧First conductive blind hole
86‧‧‧第一增層線路結構 86‧‧‧First build-up line structure
87‧‧‧第二導電盲孔 87‧‧‧Second conductive blind hole
88‧‧‧第二增層線路結構 88‧‧‧Second layered line structure
89‧‧‧導通孔 89‧‧‧Through hole
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