TWI580070B - Light emitting device with light extraction layer and fabricating method thereof - Google Patents
Light emitting device with light extraction layer and fabricating method thereof Download PDFInfo
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本發明為有關於一種發光元件及其製造方法,特別是指一種嵌入折射率匹配的光萃取層,用以降低發光層與封裝層間的折射率差異之具光萃取層的發光元件及其製造方法。 The present invention relates to a light-emitting element and a method of fabricating the same, and more particularly to a light-emitting element with a light-extraction layer embedded in a refractive index-matched light extraction layer for reducing the difference in refractive index between the light-emitting layer and the package layer, and a method of manufacturing the same .
近年來,隨著半導體科技的蓬勃發展與節能意識的抬頭,利用發光二極體(Light Emitting Diode,LED)取代傳統照明及顯示設備皆已逐漸被人們所接受,甚至已成為最受矚目的產業之一。 In recent years, with the rapid development of semiconductor technology and the rise of energy-saving awareness, the replacement of traditional lighting and display devices with Light Emitting Diodes (LEDs) has gradually been accepted and even become the most watched industry. one.
一般而言,傳統的發光二極體因為發光材料(即發光層)與空氣或封裝膠(即封裝層)之間的折射率不匹配,所以大部分的光子會因此產生全反射,使得光子只有在小於臨界角時才能穿透封裝層,成為肉眼可視的可見光,至於無法穿透的光子則在發光二極體內部慢慢被吸收,故造成發光效率不佳的問題。舉例來說,以目前發光層中最普遍的藍光發光二極體材料“GaN”而言,其折射率“nGaN”約在“2.5”至“2.8”之間,而另一藍光發光二極體材料“InGaN”,其折射率“nInGaN”約在“3.3”;紅光發光二極體材料“GaAs”,其折射率“nGaAs”約在“4”,上述這些材料的折射率皆與空氣介質或封裝層的折射率差異不小,倘若能夠降低發光層與外部介質(如:空氣或封裝層)之間的折射率差距,將有助於萃取出原本侷限在發光二極體內部的光子。 In general, conventional light-emitting diodes do not have a refractive index mismatch between the luminescent material (ie, the luminescent layer) and the air or encapsulant (ie, the encapsulating layer), so most of the photons will thus produce total reflection, so that the photons are only When it is smaller than the critical angle, it can penetrate the encapsulation layer and become visible light visible to the naked eye. As for the photons that cannot be penetrated, it is slowly absorbed inside the light-emitting diode, which causes a problem of poor luminous efficiency. For example, in the current most common blue light-emitting diode material "GaN" in the light-emitting layer, the refractive index "n GaN " is between "2.5" and "2.8", and the other blue light-emitting diode The bulk material "InGaN" has a refractive index "n InGaN " of about "3.3"; the red light-emitting diode material "GaAs" has a refractive index "n GaAs " of about "4", and the refractive indices of these materials are all The difference in refractive index from the air medium or encapsulation layer is not small. If the refractive index difference between the luminescent layer and the external medium (such as air or encapsulation layer) can be reduced, it will help to extract the original limitation inside the illuminating diode. Photon.
有鑑於此,便有廠商提出利用高折射率的封裝膠作為封裝層對發光二極體進行封裝,甚至在封裝膠中摻雜具有散射機制的材料,如:螢光粉、“TiO2”粉末、......等等。除此之外,亦有廠 商改變發光二極體的封裝結構來降低全反射狀態,以便提升光輸出效率。然而,以高折射率的封裝膠作為封裝層成本高昂且取得不易,至於改變發光二極體的封裝結構則造成封裝困難度,進而影響封裝製程良率,故上述兩種方法皆無法有效解決發光效率不佳的問題 In view of this, some manufacturers have proposed to use a high refractive index encapsulant as an encapsulation layer to encapsulate the light emitting diode, and even doping the encapsulant with a material having a scattering mechanism, such as: phosphor powder, "TiO2" powder, ......and many more. In addition, there are also factories The package structure of the light-emitting diode is changed to reduce the total reflection state in order to improve the light output efficiency. However, the use of a high refractive index encapsulant as an encapsulation layer is costly and difficult to obtain. As a result of changing the package structure of the LED, packaging difficulty is caused, and the package process yield is affected. Therefore, the above two methods cannot effectively solve the illumination. Inefficient problem
綜上所述,可知先前技術中長期以來一直存在無法有效解決發光二極體的發光效率不佳之問題,因此實有必要提出改進的技術手段,來解決此一問題。 In summary, it can be seen that there has been a long-standing problem in the prior art that the luminous efficiency of the light-emitting diode cannot be effectively solved. Therefore, it is necessary to propose an improved technical means to solve this problem.
有鑒於先前技術存在的問題,本發明遂揭露一種具光萃取層的發光元件及其製造方法。 In view of the problems of the prior art, the present invention discloses a light-emitting element having a light extraction layer and a method of manufacturing the same.
本發明所揭露之具光萃取層的發光元件,包含:發光層、光萃取層及封裝層。其中,發光層用以結合電子及電洞並產生多個光子;光萃取層以有機材質形成在該發光層之上,並且摻雜金屬材質,用以調整光萃取層的折射率以增加所述光子的穿透率,其中光萃取層的材質為三(8-羥基喹啉)鋁(Alq3)及4,4’-雙[N-(1-萘基)-N-苯胺基]聯苯(4,4'-bis[N-(1-naphthyl)-N-phenyl-amino]biphenyl,NPB)其中之一;封裝層形成在光萃取層之上,用以保護發光元件,並且使所述光子穿透此封裝層。 The light-emitting element with a light extraction layer disclosed in the present invention comprises: a light-emitting layer, a light extraction layer and an encapsulation layer. The light-emitting layer is configured to combine electrons and holes and generate a plurality of photons; the light extraction layer is formed on the light-emitting layer by an organic material, and is doped with a metal material for adjusting a refractive index of the light extraction layer to increase the Photon transmittance, wherein the material of the light extraction layer is tris(8-hydroxyquinoline)aluminum (Alq3) and 4,4'-bis[N-(1-naphthyl)-N-anilino]biphenyl ( One of 4,4'-bis[N-(1-naphthyl)-N-phenyl-amino]biphenyl, NPB); an encapsulation layer is formed on the light extraction layer to protect the light-emitting element and to cause the photon Penetrate this encapsulation layer.
至於本發明所揭露之具光萃取層的發光元件之製造方法,其步驟包括:提供發光層用以結合電子及電洞並產生多個光子;在發光層上以有機材質形成光萃取層,並且在光萃取層摻雜金屬材質,用以調整光萃取層的折射率以增加所述光子的穿透率,其中 光萃取層的材質為三(8-羥基喹啉)鋁(Alq3)及4,4’-雙[N-(1-萘基)-N-苯胺基]聯苯(4,4'-bis[N-(1-naphthyl)-N-phenyl-amino]biphenyl,NPB)其中之一;以及在光萃取層上形成封裝層,用以保護發光元件,並且使所述光子穿透封裝層。 The method for manufacturing a light-emitting element with a light extraction layer disclosed in the present invention includes the steps of: providing a light-emitting layer for combining electrons and holes and generating a plurality of photons; and forming a light extraction layer with an organic material on the light-emitting layer, and Doping a metal material in the light extraction layer to adjust the refractive index of the light extraction layer to increase the transmittance of the photon, wherein The material of the light extraction layer is tris(8-hydroxyquinoline)aluminum (Alq3) and 4,4'-bis[N-(1-naphthyl)-N-anilino]biphenyl (4,4'-bis[ One of N-(1-naphthyl)-N-phenyl-amino]biphenyl, NPB); and forming an encapsulation layer on the light extraction layer to protect the light-emitting element and pass the photon through the encapsulation layer.
本發明所揭露之元件及其製造方法如上,與先前技術之間的差異在於本發明是透過在發光層及封裝層之間嵌入光萃取層,以降低發光層與封裝層間的折射率差異,並且在光萃取層摻雜金屬材質,以便調整光萃取層的折射率。 The components disclosed in the present invention and the manufacturing method thereof are as above, and the difference from the prior art is that the present invention is to embed a light extraction layer between the light emitting layer and the encapsulating layer to reduce the refractive index difference between the light emitting layer and the encapsulating layer, and The light extraction layer is doped with a metal material to adjust the refractive index of the light extraction layer.
透過上述的技術手段,本發明可以達到提升發光元件的發光效率之技術功效。 Through the above technical means, the present invention can achieve the technical effect of improving the luminous efficiency of the light-emitting element.
以下將配合圖式及實施例來詳細說明本發明之實施方式,藉此對本發明如何應用技術手段來解決技術問題並達成技術功效的實現過程能充分理解並據以實施。 The embodiments of the present invention will be described in detail below with reference to the drawings and embodiments, so that the application of the technical means to solve the technical problems and achieve the technical effects can be fully understood and implemented.
首先,先針對本發明具光萃取層的發光元件作說明,請參閱「第1圖」,「第1圖」為本發明具光萃取層的發光元件之剖面示意圖,所述發光元件10a包含:發光層11、光萃取層12及封裝層13。其中發光層11用以結合電子及電洞並產生多個光子,所述發光層11可為發光二極體、有機發光二極體......等用以產生光子的材料層所組成,舉例來說,倘若發光層11為發光二極體,則此發光層11至少包含摻雜(doped)有N型雜質(亦稱之為「施體」),例如:矽(Si)、磷(P)、砷(As)、銻(Sb)......等五價元素的半導體層(即N型半導體層),以及摻雜有P型雜質(亦稱之為「受體」),如: 鎂(Mg)、硼(B)、鋁(Al)、鎵(Ga)、銦(In)......等三價元素的半導體層(即P型半導體層),以便分別提供電子、電洞,並且使兩者結合進行光電轉換。在實際實施上,N型半導體層與P型半導體層之間更可具有多量子井(Multi Quantum Well,MQW)結構或量子點結構的主動層,以便讓電子及電洞更容易侷限在一起進而增加發光亮度,亦即提升電能轉換成光能的比例。由於所述發光二極體結構、多量子井結構皆為習知技術,故在此將不再多作贅述。特別要說明的是,所述發光元件10a之所以未包含基板(圖中未示),是因為在發光層11成功形成於基板上後利用雷射或研磨等習知技術移除此基板,如此一來,即可提高發光元件10a的發光效率及散熱效果。 First, a light-emitting element having a light-extracting layer of the present invention will be described. Please refer to FIG. 1 and FIG. 1 is a schematic cross-sectional view of a light-emitting element having a light extraction layer according to the present invention. The light-emitting element 10a includes: The light-emitting layer 11, the light extraction layer 12, and the encapsulation layer 13. The luminescent layer 11 is configured to combine electrons and holes and generate a plurality of photons, and the luminescent layer 11 may be composed of a material layer for generating photons, such as a light emitting diode, an organic light emitting diode, and the like. For example, if the light-emitting layer 11 is a light-emitting diode, the light-emitting layer 11 includes at least doped N-type impurities (also referred to as "donor"), for example, germanium (Si), phosphorus. a semiconductor layer of a pentavalent element such as (P), arsenic (As), antimony (Sb), etc. (ie, an N-type semiconductor layer), and doped with a P-type impurity (also referred to as a "receptor") ),Such as: a semiconductor layer of a trivalent element such as magnesium (Mg), boron (B), aluminum (Al), gallium (Ga), indium (In), etc. (ie, a P-type semiconductor layer) to provide electrons, respectively A hole is formed and the two are combined for photoelectric conversion. In practical implementation, the active layer between the N-type semiconductor layer and the P-type semiconductor layer may have a multi-quantum well (MQW) structure or a quantum dot structure, so that the electrons and the holes are more easily confined together. Increase the brightness of the light, that is, increase the proportion of electrical energy converted into light energy. Since the light-emitting diode structure and the multi-quantum well structure are all conventional techniques, no further description will be given here. In particular, the reason why the light-emitting element 10a does not include a substrate (not shown) is because the light-emitting layer 11 is successfully formed on the substrate, and the substrate is removed by a conventional technique such as laser or polishing. As a result, the luminous efficiency and the heat dissipation effect of the light-emitting element 10a can be improved.
承上所述,倘若發光層11為有機發光二極體,則至少包含氧化銦錫(indium tin oxide,ITO)、有機發光層及陰極層相互堆疊而成(圖中未示),其中,氧化銦錫為透明的陽極材料,具有高透光率、低電阻、高化學穩定性及易蝕刻......等特性;當施加電壓於氧化銦錫及陰極層後,兩者將分別提供電洞及電子,此時電洞及電子將於氧化銦錫及陰極層之間的有機發光層結合,並且提供能量產生光子。所述有機發光層可以選用螢光或磷光材料,並且藉由修飾分子結構或官能團來調整化合物的能階差,由於所述有機發光二極體的各層結構為習知技術,故在此不再多作贅述。 As described above, if the light-emitting layer 11 is an organic light-emitting diode, at least an indium tin oxide (ITO), an organic light-emitting layer, and a cathode layer are stacked on each other (not shown), wherein the light-emitting layer 11 is oxidized. Indium tin is a transparent anode material with high light transmittance, low electrical resistance, high chemical stability and easy etching. When voltage is applied to indium tin oxide and cathode layer, the two will be provided separately. Holes and electrons, where the holes and electrons combine with the organic light-emitting layer between the indium tin oxide and the cathode layer and provide energy to generate photons. The organic light-emitting layer may be a fluorescent or phosphorescent material, and the energy level difference of the compound is adjusted by modifying the molecular structure or the functional group. Since the layers of the organic light-emitting diode are conventional technologies, they are no longer used here. Repeat more.
光萃取層12形成在發光層11之上,並且摻雜有金屬材質,例如:鋁、銀......等等,用以調整光萃取層12的折射率以增加發光層11所產生的光子之穿透率,所述金屬材質可以共蒸鍍的方式摻雜在光萃取層12之中,產生折射率為“1.5”至“2.5”範圍內 的材質,且光萃取層12的厚度可根據光子的諧振進行調整,甚至更可將光萃取層12包覆發光層11或包覆發光層11之側邊。在實際實施上,此光萃取層12可為「4,4’-雙[N-(1-萘基)-N-苯胺基]聯苯(4,4'-bis[N-(1-naphthyl)-N-phenyl-amino]biphenyl,NPB)」、「三(8-羥基喹啉)鋁(Alq3)」......等折射率介於發光層11及封裝層13之間的材質。特別要說明的是,本發明並未以上述舉例限定光萃取層12的材質,任何折射率介於發光層11及封裝層13兩者折射率之間的材質皆不脫離本發明的應用範疇,而在沒有封裝層13的情況下,所述光萃取層12的折射率則以介於發光層11及封裝層13兩者折射率之間的材質來實現,其折射率可根據摻雜金屬材質的濃度來作適當的調整,例如:摻雜的金屬材質的濃度越濃,則折射率將隨之越高,反之摻雜金屬材質的濃度越低,則折射率將隨之降低。 The light extraction layer 12 is formed on the light-emitting layer 11 and is doped with a metal material such as aluminum, silver, etc. to adjust the refractive index of the light extraction layer 12 to increase the light-emitting layer 11 The photon transmittance, the metal material can be doped in the light extraction layer 12 by co-evaporation, and the refractive index is in the range of "1.5" to "2.5". The material and the thickness of the light extraction layer 12 can be adjusted according to the resonance of the photons, and the light extraction layer 12 can be even coated on the side of the light-emitting layer 11 or the light-emitting layer 11. In practical implementation, the light extraction layer 12 can be "4,4'-bis[N-(1-naphthyl)-N-anilino]biphenyl (4,4'-bis[N-(1-naphthyl) -N-phenyl-amino]biphenyl, NPB)", "tris(8-hydroxyquinoline)aluminum (Alq3)", etc., such as a material having a refractive index between the light-emitting layer 11 and the encapsulating layer 13 . In particular, the present invention does not limit the material of the light extraction layer 12 by the above examples, and any material having a refractive index between the refractive indices of the light-emitting layer 11 and the package layer 13 does not deviate from the application scope of the present invention. In the absence of the encapsulation layer 13, the refractive index of the light extraction layer 12 is achieved by a material between the refractive indices of the luminescent layer 11 and the encapsulation layer 13, and the refractive index can be based on the doped metal material. The concentration is appropriately adjusted. For example, the richer the concentration of the doped metal material, the higher the refractive index will be. On the contrary, the lower the concentration of the doped metal material, the lower the refractive index will be.
封裝層13用以形成在光萃取層12之上用以保護發光元件10a,並且使發光層11產生的光子穿透封裝層13。在實際實施上,所述封裝層13的材質可為矽膠或環氧樹脂,其折射率約在“1.5”左右。由於封裝層13為習知技術,故在此不再多作說明。 The encapsulation layer 13 is formed over the light extraction layer 12 to protect the light emitting element 10a, and the photons generated by the light emitting layer 11 are penetrated through the encapsulation layer 13. In practical implementation, the encapsulating layer 13 may be made of silicone or epoxy resin and has a refractive index of about "1.5". Since the encapsulation layer 13 is a conventional technique, it will not be described here.
如「第2圖」所示意,「第2圖」為本發明具光萃取層的發光元件之製造方法之流程圖,其包括:提供發光層11用以結合電子及電洞並產生多個光子(步驟210);在發光層11上形成光萃取層12,並且在光萃取層12摻雜金屬材質,用以調整光萃取層12的折射率以增加所述光子的穿透率(步驟220);在光萃取層12上形成封裝層13,用以保護發光元件10a,並且使所述光子穿透封裝層13(步驟230)。藉由上述步驟即可透過在發光層11及封裝層13 之間嵌入光萃取層12,以降低發光層11與封裝層13間的折射率差異,並且在光萃取層12摻雜金屬材質,以便調整光萃取層12的折射率。 As shown in FIG. 2, FIG. 2 is a flow chart of a method for manufacturing a light-emitting element having a light extraction layer according to the present invention, which includes providing a light-emitting layer 11 for combining electrons and holes and generating a plurality of photons. (Step 210); forming a light extraction layer 12 on the light-emitting layer 11, and doping a metal material on the light extraction layer 12 for adjusting the refractive index of the light extraction layer 12 to increase the transmittance of the photons (step 220) An encapsulation layer 13 is formed on the light extraction layer 12 to protect the light-emitting element 10a and to pass the photons through the encapsulation layer 13 (step 230). Through the above steps, the light-emitting layer 11 and the encapsulation layer 13 can be transmitted. The light extraction layer 12 is interposed to reduce the refractive index difference between the light-emitting layer 11 and the encapsulation layer 13, and the light extraction layer 12 is doped with a metal material to adjust the refractive index of the light extraction layer 12.
請參閱「第3A圖」,「第3A圖」為本發明具光萃取層的發光元件的第二實施例之剖面示意圖。前面提到,發光元件10a的基板會透過雷射等方式移除以便增加發光效率及散熱效果。然而,實際實施上,亦可如「第3A圖」所示意的發光元件10b保留位於發光層11下的基板14,此基板14可選用藍寶石(Sapphire)基板、矽(silicon)基板、鍺(Ge)基板、碳化矽(SiC)基板、砷化鎵(GaAs)基板或玻璃(Glass)基板等材質以作為蒸鍍(evaporation)、濺鍍(sputtering)或印刷(printing)薄膜之用,所述蒸鍍方式可選用但不限於有機金屬化學氣相沉積(Metal-organic Chemical Vapor Deposition,MOCVD)。特別要說明的是,本發明的基板14並未侷限於上述列舉的各種光電材料基板,任何能夠作為光電元件的基板皆不脫離本發明的應用範疇。 Please refer to FIG. 3A. FIG. 3A is a schematic cross-sectional view showing a second embodiment of a light-emitting element having a light extraction layer according to the present invention. As mentioned above, the substrate of the light-emitting element 10a is removed by laser or the like in order to increase luminous efficiency and heat dissipation. However, in actual implementation, the light-emitting element 10b, which is also illustrated in FIG. 3A, may retain the substrate 14 under the light-emitting layer 11. The substrate 14 may be a sapphire substrate, a silicon substrate, or a germanium (Ge). a substrate, a tantalum carbide (SiC) substrate, a gallium arsenide (GaAs) substrate, or a glass substrate, for use as an evaporation, sputtering, or printing film, the steaming The plating method may be selected from, but not limited to, Metal-organic Chemical Vapor Deposition (MOCVD). In particular, the substrate 14 of the present invention is not limited to the various photovoltaic material substrates listed above, and any substrate capable of functioning as a photovoltaic element does not depart from the scope of application of the present invention.
請參閱「第3B圖」,「第3B圖」為本發明具光萃取層的發光元件的第三實施例之剖面示意圖。前面提到,光萃取層12除了形成在發光層11之上,更能夠包覆發光層11或包覆發光層11之側邊,在實際實施上,以包覆發光層11為例,其包覆方式可如「第3B圖」所示意的發光元件10c,將光萃取層12形成在發光層11之表面以包覆整個發光層11。接著,再將封裝層13形成在光萃取層12之上,用以保護發光元件10c。至於將光萃取層12包覆在發光層11之側邊與上述包覆整個發光層11之差異僅在於發光層11底部未包覆光萃取層12,故在此不再多作贅述。 Please refer to "FIG. 3B", and FIG. 3B is a schematic cross-sectional view showing a third embodiment of a light-emitting element having a light extraction layer of the present invention. As mentioned above, the light extraction layer 12 is formed on the light-emitting layer 11 to cover the side of the light-emitting layer 11 or the light-emitting layer 11. In actual practice, the light-emitting layer 11 is used as an example. The coating method can form the light extraction layer 12 on the surface of the light-emitting layer 11 to cover the entire light-emitting layer 11 as in the light-emitting element 10c illustrated in FIG. 3B. Next, an encapsulation layer 13 is formed over the light extraction layer 12 to protect the light-emitting element 10c. The difference between the side of the light-extracting layer 12 and the light-emitting layer 11 is that the light-emitting layer 11 is not covered by the light-emitting layer 11 at the bottom of the light-emitting layer 11, and therefore will not be further described herein.
接著,請參閱「第3C圖」,「第3C圖」為本發明具光萃取層的發光元件的第四實施例之剖面示意圖。倘若發光元件10d未以雷射移除基板14,則光萃取層12可如「第3C圖」所示意包覆發光層11之側邊。此時,光萃取層12將有一部分與基板14接觸,之後再將封裝層13形成在光萃取層12之上用以保護發光元件10d。 Next, please refer to "3C" and "3C" is a schematic cross-sectional view showing a fourth embodiment of a light-emitting element having a light extraction layer of the present invention. If the light-emitting element 10d does not remove the substrate 14 by laser, the light extraction layer 12 may cover the side of the light-emitting layer 11 as shown in FIG. 3C. At this time, a part of the light extraction layer 12 is in contact with the substrate 14, and then the encapsulation layer 13 is formed on the light extraction layer 12 for protecting the light-emitting element 10d.
最後,如「第4圖」所示意,「第4圖」為應用本發明提升發光元件的發光效率之示意圖。當不具有光萃取層12時,發光層11產生的光子若小於第一臨界角41,則這些光子將得以穿透發光層11與封裝層13之間的邊界(如:光子以實線箭頭進行示意),至於大於第一臨界角41的光子則會被反射並侷限在發光層11中直到被吸收為止。然而,當發光層11與封裝層13之間具有本發明所述的光萃取層12時,發光層11產生的光子將在小於第二臨界角42時穿透發光層11與光萃取層12之間的邊界(如:光子以虛線箭頭進行示意),至於大於第二臨界角42的光子仍然會被反射並侷限在發光層11中直到被吸收為止。不過,由於第二臨界角42大於第一臨界角41,因此相對來說,能夠穿透發光層11的光子將比原先不具光萃取層12的情況來得多,故可達到提升發光元件的發光效率。 Finally, as shown in "Fig. 4", "Fig. 4" is a schematic diagram for improving the luminous efficiency of the light-emitting element by applying the present invention. When the light extraction layer 12 is not provided, if the photons generated by the light-emitting layer 11 are smaller than the first critical angle 41, the photons will penetrate the boundary between the light-emitting layer 11 and the encapsulation layer 13 (eg, photons are indicated by solid arrows). It is shown that photons larger than the first critical angle 41 are reflected and confined in the luminescent layer 11 until absorbed. However, when the light extraction layer 12 of the present invention is provided between the light-emitting layer 11 and the encapsulation layer 13, the photons generated by the light-emitting layer 11 will penetrate the light-emitting layer 11 and the light extraction layer 12 when it is smaller than the second critical angle 42. The boundaries between the two (e.g., photons are indicated by dashed arrows), and photons larger than the second critical angle 42 are still reflected and confined in the luminescent layer 11 until absorbed. However, since the second critical angle 42 is larger than the first critical angle 41, relatively, the photon capable of penetrating the luminescent layer 11 will be much more than the original photo-extraction layer 12, so that the luminous efficiency of the illuminating element can be improved. .
綜上所述,可知本發明與先前技術之間的差異在於透過在發光層11及封裝層13之間嵌入光萃取層12,以降低發光層11與封裝層13間的折射率差異,並且在光萃取層12摻雜金屬材質,以便調整光萃取層12的折射率,藉由此一技術手段可以解決先前技術中所存在的問題,進而達成提升發光元件(10a~10d)的發光效率 之技術功效。 In summary, it is understood that the difference between the present invention and the prior art is that the light extraction layer 12 is embedded between the light-emitting layer 11 and the encapsulation layer 13 to reduce the refractive index difference between the light-emitting layer 11 and the encapsulation layer 13, and The light extraction layer 12 is doped with a metal material to adjust the refractive index of the light extraction layer 12, and the technical problems can be solved by the prior art, thereby improving the luminous efficiency of the light-emitting elements (10a-10d). Technical efficacy.
雖然本發明以前述之實施例揭露如上,然其並非用以限定本發明,任何熟習相像技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之專利保護範圍須視本說明書所附之申請專利範圍所界定者為準。 While the present invention has been described above in the foregoing embodiments, it is not intended to limit the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of patent protection shall be subject to the definition of the scope of the patent application attached to this specification.
10a~10d‧‧‧具光萃取層的發光元件 10a~10d‧‧‧Lighting elements with light extraction layer
11‧‧‧發光層 11‧‧‧Lighting layer
12‧‧‧光萃取層 12‧‧‧Light extraction layer
13‧‧‧封裝層 13‧‧‧Encapsulation layer
14‧‧‧基板 14‧‧‧Substrate
41‧‧‧第一臨界角 41‧‧‧first critical angle
42‧‧‧第二臨界角 42‧‧‧second critical angle
步驟210‧‧‧提供一發光層,用以結合電子及電洞並產生多個光子 Step 210‧‧‧ provides a luminescent layer for combining electrons and holes and generating multiple photons
步驟220‧‧‧在該發光層上形成一光萃取層,並且在該光萃取層摻雜一金屬材質,用以調整該光萃取層的一折射率以增加該些光子的穿透率 Step 220 ‧ ‧ forming a light extraction layer on the luminescent layer, and doping a metal material on the light extraction layer to adjust a refractive index of the light extraction layer to increase the transmittance of the photons
步驟230‧‧‧在該光萃取層上形成一封裝層,用以保護發光元件,並且使該些光子穿透該封裝層 Step 230‧ ‧ forming an encapsulation layer on the light extraction layer for protecting the light-emitting elements and allowing the photons to penetrate the package layer
第1圖為本發明具光萃取層的發光元件的第一實施例之剖面示意圖。 Fig. 1 is a schematic cross-sectional view showing a first embodiment of a light-emitting element having a light extraction layer of the present invention.
第2圖為本發明具光萃取層的發光元件之製造方法之流程圖。 Fig. 2 is a flow chart showing a method of manufacturing a light-emitting element having a light extraction layer of the present invention.
第3A圖為本發明具光萃取層的發光元件的第二實施例之剖面示意圖。 Fig. 3A is a schematic cross-sectional view showing a second embodiment of a light-emitting element having a light extraction layer of the present invention.
第3B圖為本發明具光萃取層的發光元件的第三實施例之剖面示意圖。 Fig. 3B is a schematic cross-sectional view showing a third embodiment of the light-emitting element having the light extraction layer of the present invention.
第3C圖為本發明具光萃取層的發光元件的第四實施例之剖面示意圖。 Fig. 3C is a schematic cross-sectional view showing a fourth embodiment of the light-emitting element having the light extraction layer of the present invention.
第4圖為本發明提升發光元件的發光效率之示意圖。 Fig. 4 is a schematic view showing the improvement of the luminous efficiency of the light-emitting element of the present invention.
10a...發光元件10a. . . Light-emitting element
11...發光層11. . . Luminous layer
12...光萃取層12. . . Light extraction layer
13...封裝層13. . . Encapsulation layer
Claims (8)
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US20070029560A1 (en) * | 2005-08-04 | 2007-02-08 | Jung-Chieh Su | Light-emitting devices with high extraction efficiency |
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