TWI576556B - Evaporator, cooling apparatus and electronic apparatus - Google Patents

Evaporator, cooling apparatus and electronic apparatus Download PDF

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Publication number
TWI576556B
TWI576556B TW104126573A TW104126573A TWI576556B TW I576556 B TWI576556 B TW I576556B TW 104126573 A TW104126573 A TW 104126573A TW 104126573 A TW104126573 A TW 104126573A TW I576556 B TWI576556 B TW I576556B
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evaporator
porous body
liquid
mask
cylindrical convex
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TW104126573A
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TW201616080A (en
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內田浩基
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富士通股份有限公司
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25BREFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B39/00Evaporators; Condensers
    • F25B39/02Evaporators
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28DHEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • F28D15/02Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/42Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
    • H01L23/427Cooling by change of state, e.g. use of heat pipes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Description

蒸發器、冷卻裝置及電子裝置 Evaporator, cooling device and electronic device 發明領域 Field of invention

本發明是有關於一種蒸發器、冷卻裝置及電子裝置。 The invention relates to an evaporator, a cooling device and an electronic device.

發明背景 Background of the invention

用以冷卻例如裝設在電腦等之電子裝置之電子零件等之發熱體的冷卻裝置,有利用液相作動流體蒸發而成為氣相作動流體時之蒸發潛熱而實現高冷卻性能之使用氣液二相流的冷卻裝置。 The cooling device for cooling a heating element such as an electronic component mounted on an electronic device such as a computer has a latent heat of vaporization by a liquid phase actuating fluid to be a gas phase actuating fluid, thereby achieving high cooling performance. Phase flow cooling device.

如此之冷卻裝置具有例如具有多孔質體(毛細結構)之蒸發器及冷凝器,蒸發器之出口與冷凝器之入口以蒸氣管連接,並且冷凝器之出口與蒸發器之入口是以液管連接,於內部封入作動流體之迴路式熱管(LHP:Loop Heat Pipe)。 Such a cooling device has, for example, an evaporator having a porous body (capillary structure) and a condenser, the outlet of the evaporator is connected to the inlet of the condenser by a vapor tube, and the outlet of the condenser and the inlet of the evaporator are connected by a liquid tube. A loop heat pipe (LHP: Loop Heat Pipe) in which an actuating fluid is enclosed.

如此之迴路式熱管中,例如可不使用液輸送泵等而藉由多孔質體之毛細管力使作動流體循環,輸送熱。 In such a loop type heat pipe, for example, the working fluid can be circulated by the capillary force of the porous body without using a liquid transfer pump or the like to transfer heat.

再者,在具有如上述之迴路式熱管的蒸發器中,使用平板狀之多孔質體時,蒸發面積小,無法得到充分的冷卻 性能。因此,為了加大蒸發面積,並且提高冷卻性能,有作成在多孔質體及加熱面設置凹凸,彼此相嵌。又,也有作成在成為傳熱部之殼體設置複數個突起部,並分別於該等複數個突起部嵌入多孔質體。 Further, in the evaporator having the loop type heat pipe as described above, when a flat porous body is used, the evaporation area is small and sufficient cooling cannot be obtained. performance. Therefore, in order to increase the evaporation area and improve the cooling performance, it is possible to provide irregularities on the porous body and the heating surface, and to be fitted to each other. Further, a plurality of protrusions are formed in the casing that serves as the heat transfer portion, and the porous bodies are embedded in the plurality of protrusions.

先行技術文獻 Advanced technical literature 【專利文獻】 [Patent Literature]

【專利文獻1】美國特許第4765396號明細書 [Patent Document 1] US Patent No. 4765396

【專利文獻2】日本特開2007-247931號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2007-247931

【專利文獻3】日本特開2009-115396號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2009-115396

【專利文獻4】日本特開2013-257129號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2013-257129

【專利文獻5】日本特開2003-185370號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2003-185370

發明概要 Summary of invention

然而,若是在多孔質體及加熱面設置凹凸,並且彼此相嵌的情況下,將多孔質體設置成加熱面之凸部與凸部之間的凹部會埋入時,若是在例如發熱體之發熱量增加而蒸發量增加的情況,會變得液相作動流體難以供給到多孔質體之加熱面側之端部。該結果是會產生乾涸,蒸發面積變小而冷卻性能降低。 However, when the porous body and the heating surface are provided with irregularities and are fitted to each other, the porous body is placed such that the concave portion between the convex portion and the convex portion of the heating surface is buried, for example, in a heating element. When the amount of heat generation increases and the amount of evaporation increases, it becomes difficult for the liquid phase actuating fluid to be supplied to the end portion of the heating surface side of the porous body. As a result, dryness is generated, the evaporation area becomes small, and the cooling performance is lowered.

為了防止如此,考慮在成為傳熱部之殼體設置複數個突起部,並在該等複數個突起部之各個嵌入多孔質體,形成液相作動流體流動於嵌入有多孔質體之各突起部之周圍的空間。 In order to prevent this, it is conceivable to provide a plurality of protrusions in the case of the heat transfer portion, and to embed the porous body in each of the plurality of protrusions, thereby forming a liquid phase fluid to flow to the protrusions in which the porous body is embedded. The space around it.

然而,當形成液相作動流體流動於嵌入有多孔質體之各突起部之周圍的空間時,多孔質體之液相作動流體接觸之接液面的面積變大。而且,當多孔質體之液相作動流體接觸之接液面的面積變大時,從多孔質體往液相作動流體的熱洩漏會增大,並且降低冷卻性能。 However, when a liquid phase actuating fluid flows in a space around the respective projections in which the porous body is embedded, the area of the liquid contact surface where the liquid phase of the porous body contacts the working fluid becomes large. Further, when the area of the liquid contact surface in contact with the liquid phase of the porous body becomes large, heat leakage from the porous body to the liquid phase working fluid increases, and the cooling performance is lowered.

因此,想要可減少由多孔質體往液相作動流體的熱洩漏,並且抑制冷卻性能之降低,得到安定之冷卻性能。 Therefore, it is desirable to reduce the heat leakage from the porous body to the liquid phase, and to suppress the decrease in the cooling performance, thereby obtaining stable cooling performance.

本蒸發器包含有:具有複數個筒狀凸部之多孔質體;由前述多孔質體分隔之蒸氣室及液室;殼體,具有:連接蒸氣管並規定前述蒸氣室之第1部分;連接液管並規定前述液室之第2部分;及複數個突起部,設置於前述第1部分並往前述第2部分之側突出,嵌入前述多孔質體之前述複數個筒狀凸部之各個,及複數個遮罩,用以覆蓋前述複數個筒狀凸部之各個的表面,使前述多孔質體之前述複數個筒狀凸部之接觸液相作動流體之接液面的面積變小。 The evaporator includes: a porous body having a plurality of cylindrical convex portions; a vapor chamber and a liquid chamber separated by the porous body; and a casing having: a first portion connecting the vapor tube and defining the vapor chamber; The liquid pipe defines a second portion of the liquid chamber; and a plurality of protrusions are provided on the first portion and protrude toward the side of the second portion, and are embedded in each of the plurality of cylindrical convex portions of the porous body. And a plurality of masks covering the surfaces of the plurality of cylindrical convex portions to reduce the area of the liquid contact surface of the liquid electrolyte fluid contacting the plurality of cylindrical convex portions of the porous body.

本冷卻裝置包含有:使液相作動流體蒸發之蒸發器;使氣相作動流體冷凝之冷凝器;連接前述蒸發器與前述冷凝器,並供氣相作動流體流動之蒸氣管;及連接前述冷凝器與前述蒸發器,並供液相作動流體流動之液管,前述蒸發器具有:具有複數個筒狀凸部之多孔質體;由前述多孔質體分隔之蒸氣室及液室;殼體,具有:連接蒸氣管並規定前述蒸氣室之第1部分;連接液管並規定前述液室之第2部分;及複數個突起部,設置於前述第1部分並往前述 第2部分之側突出,嵌入於前述多孔質體之前述複數個筒狀凸部之各個;及複數個遮罩,用以覆蓋前述複數個筒狀凸部之各個的表面,使前述多孔質體之前述複數個筒狀凸部之接觸液相作動流體的接液面之面積變小。 The cooling device comprises: an evaporator for evaporating the liquid phase working fluid; a condenser for condensing the gas phase working fluid; a vapor tube connecting the evaporator and the condenser and for flowing the gas phase working fluid; and connecting the condensation And the foregoing evaporator, and a liquid pipe for the liquid phase to move the fluid, the evaporator having: a porous body having a plurality of cylindrical protrusions; a vapor chamber and a liquid chamber separated by the porous body; Having a first portion of the vapor chamber connected to the vapor tube, a second portion connecting the liquid tube and defining the liquid chamber, and a plurality of protrusions provided in the first portion a side of the second portion protruding from each of the plurality of cylindrical convex portions of the porous body; and a plurality of masks covering the surfaces of the plurality of cylindrical convex portions to make the porous body The area of the liquid contact surface of the plurality of cylindrical convex portions contacting the liquid phase working fluid becomes small.

本電子裝置包含有:設置於配線基板上之電子零件,及用以冷卻前述電子零件之冷卻裝置,前述冷卻裝置包含有:使液相作動流體蒸發之蒸發器;使氣相作動流體冷凝之冷凝器;連接前述蒸發器與前述冷凝器,並供氣相作動流體流動之蒸氣管;及連接前述冷凝器與前述蒸發器,並供液相作動流體流動之液管,前述蒸發器具有:具有複數個筒狀凸部之多孔質體;由前述多孔質體分隔之蒸氣室及液室;殼體,具有:連接蒸氣管並規定前述蒸氣室之第1部分;連接液管並規定前述液室之第2部分;及複數個突起部,設置於前述第1部分並往前述第2部分之側突出,嵌入於前述多孔質體之前述複數個筒狀凸部之各個;及複數個遮罩,用以覆蓋前述複數個筒狀凸部之各個的表面,使前述多孔質體之前述複數個筒狀凸部之接觸液相作動流體的接液面之面積變小。 The electronic device includes: an electronic component disposed on the wiring substrate, and a cooling device for cooling the electronic component, wherein the cooling device includes: an evaporator that evaporates the liquid phase working fluid; and condenses the gas phase active fluid condensation a vapor tube connecting the evaporator and the condenser and supplying a gas flow to the gas phase; and a liquid pipe connecting the condenser and the evaporator and flowing the liquid to actuate the fluid, the evaporator having: a plurality a porous body having a cylindrical convex portion; a vapor chamber and a liquid chamber partitioned by the porous body; and a casing having a first portion for connecting the vapor tube and defining the vapor chamber; and connecting the liquid tube and defining the liquid chamber a second portion; and a plurality of protrusions are provided on the first portion and protrude toward the side of the second portion, and are embedded in each of the plurality of cylindrical protrusions of the porous body; and a plurality of masks are used The surface of each of the plurality of cylindrical convex portions is covered so that the area of the liquid contact surface of the plurality of cylindrical convex portions contacting the liquid phase working fluid of the porous body is reduced.

因此,根據本蒸發器,冷卻裝置及電子裝置,具有可減少從多孔質體往液相作動流體之熱洩漏,並且抑制冷卻性能降低,得到安定的冷卻性能。 Therefore, according to the present evaporator, the cooling device and the electronic device have heat leakage which can reduce the flow of the fluid from the porous body to the liquid phase, and suppress the decrease in the cooling performance, thereby obtaining stable cooling performance.

1‧‧‧冷卻裝置(迴路式熱管) 1‧‧‧Cooling device (circuit type heat pipe)

2‧‧‧蒸發器 2‧‧‧Evaporator

3‧‧‧冷凝器 3‧‧‧Condenser

4‧‧‧蒸氣管 4‧‧‧Vapor tube

5‧‧‧液管 5‧‧‧ liquid tube

6‧‧‧多孔質體 6‧‧‧Porous body

6A‧‧‧筒狀凸部 6A‧‧‧Cylindrical convex

6B‧‧‧平板狀部分 6B‧‧‧flat part

6C‧‧‧插入孔 6C‧‧‧ insertion hole

6D‧‧‧溝 6D‧‧‧Ditch

6X‧‧‧接液面 6X‧‧‧liquid level

6Y‧‧‧蒸發面 6Y‧‧‧Evaporation surface

61A‧‧‧第1筒狀凸部 61A‧‧‧1st cylindrical protrusion

62A‧‧‧第2筒狀凸部 62A‧‧‧2nd cylindrical protrusion

63A‧‧‧第3筒狀凸部 63A‧‧‧3rd cylindrical protrusion

64A‧‧‧第4筒狀凸部 64A‧‧‧4th cylindrical protrusion

7‧‧‧蒸氣室 7‧‧ ‧ vapor room

8‧‧‧液室 8‧‧‧ liquid room

9‧‧‧殼體 9‧‧‧Shell

9A‧‧‧下側部分 9A‧‧‧lower part

9AX‧‧‧底板 9AX‧‧‧ bottom plate

9AY‧‧‧凹部 9AY‧‧‧ recess

9B‧‧‧上側部分 9B‧‧‧ upper part

9BX‧‧‧框體 9BX‧‧‧ frame

9BY‧‧‧蓋體 9BY‧‧‧ cover

9C‧‧‧突起部 9C‧‧‧Protruding

9D‧‧‧蒸氣管連接用開口部 9D‧‧‧ opening for steam pipe connection

9E‧‧‧液管連接用開口部 9E‧‧‧ opening for liquid pipe connection

10‧‧‧遮罩 10‧‧‧ mask

10A‧‧‧開口部 10A‧‧‧ openings

10B‧‧‧孔 10B‧‧‧ hole

10C‧‧‧槽縫 10C‧‧‧ slots

10D‧‧‧槽縫 10D‧‧‧ slot

10E‧‧‧流路 10E‧‧‧Flow

10F‧‧‧溝 10F‧‧‧ditch

10G‧‧‧突起 10G‧‧‧ Protrusion

10H‧‧‧多孔質體遮罩 10H‧‧‧Porous body mask

101‧‧‧第1部分 101‧‧‧Part 1

102‧‧‧第2部分 102‧‧‧Part 2

103‧‧‧第3部分 103‧‧‧Part 3

104‧‧‧第4部分 104‧‧‧Part 4

105‧‧‧板狀部分 105‧‧‧ plate-shaped part

10-1~10-4‧‧‧鄰接之4個遮罩 10-1~10-4‧‧‧4 adjacent masks

101-1~101-4‧‧‧一個一個設置於鄰接之4個遮罩之各個的4個部分 101-1~101-4‧‧‧One part of each of the four adjacent masks

11‧‧‧液相作動流體(作動液) 11‧‧‧Liquid actuating fluid (actuating fluid)

50‧‧‧筐體 50‧‧‧Shell

51‧‧‧電子零件 51‧‧‧Electronic parts

51X‧‧‧CPU(發熱體;發熱零件;電子零件) 51X‧‧‧CPU (heating body; heating parts; electronic parts)

52‧‧‧配線基板 52‧‧‧Wiring substrate

53‧‧‧送風扇 53‧‧‧Send fan

54‧‧‧電源 54‧‧‧Power supply

55‧‧‧HDD 55‧‧‧HDD

56‧‧‧導熱膏 56‧‧‧ Thermal paste

57‧‧‧散熱扇 57‧‧‧heating fan

圖1是顯示設置在本實施形態之冷卻裝置之蒸發 器之構成的示意截面圖。 Figure 1 is a view showing evaporation of a cooling device provided in the present embodiment. A schematic cross-sectional view of the composition of the device.

圖2是顯示設置在本實施形態之冷卻裝置之蒸發器之構成(具有具體構成例之第1具體例的遮罩者)的分解立體圖。 Fig. 2 is an exploded perspective view showing a configuration of an evaporator (a mask having a first specific example of a specific configuration example) provided in the cooling device of the embodiment.

圖3是顯示本實施形態之冷卻裝置及具有其之電子裝置之構成的示意立體圖。 Fig. 3 is a schematic perspective view showing a configuration of a cooling device and an electronic device having the same according to the embodiment.

圖4是圖4(A)、圖4(B)為用以說明本發明之課題的示意圖,圖4(A)為沿著設置於殼體之突起部之高度方向的截面圖,圖4(B)為沿著設置在殼體之突起部之徑方向的截面圖。 4(A) and 4(B) are schematic views for explaining the problem of the present invention, and FIG. 4(A) is a cross-sectional view along the height direction of the projection provided in the casing, and FIG. 4(FIG. 4( B) is a cross-sectional view along the radial direction of the protrusion provided in the casing.

圖5是圖5(A)、圖5(B)用以說明設置在本實施形態之冷卻裝置所具有之蒸發器之遮罩產生的作用、效果的示意截面圖,圖5(A)顯示未設有遮罩的情況,圖5(B)顯示未設有遮罩的情況。 Fig. 5 is a schematic cross-sectional view showing the action and effect of the mask provided in the evaporator of the cooling device of the embodiment, Figs. 5(A) and 5(B), and Fig. 5(A) shows no. In the case where a mask is provided, FIG. 5(B) shows a case where no mask is provided.

圖6是圖6(A)、圖6(B)顯示本實施形態之具體的構成例之冷卻裝置中使用了第1具體例之遮罩時之冷卻實驗的結果,圖6(A)顯示測定了蒸發器底面溫度的結果,圖6(B)顯示測定了蒸發器上面溫度的結果。 6(A) and 6(B) are diagrams showing the results of a cooling test in the case where the mask of the first specific example is used in the cooling device of the specific configuration example of the embodiment, and FIG. 6(A) shows the measurement. As a result of the temperature of the bottom surface of the evaporator, Fig. 6(B) shows the result of measuring the temperature above the evaporator.

圖7是顯示設置在本實施形態之冷卻裝置所具有之蒸發器之遮罩之變形例(具體構成例之第2具體例的遮罩)之構成的示意立體圖。 FIG. 7 is a schematic perspective view showing a configuration of a modification (a mask of a second specific example of a specific configuration example) of a mask provided in the evaporator of the cooling device of the embodiment.

圖8是圖8(A)、圖8(B)顯示使用了本實施形態之具體構成例之冷卻裝置中第2具體例之遮罩時之冷卻實驗的結果,圖8(A)顯示測定出蒸發器底面溫度之結果,圖8 (B)顯示測定出蒸發器上面溫度的結果。 8(A) and 8(B) show the results of a cooling test in the case of using the mask of the second specific example of the cooling device according to the specific configuration example of the embodiment, and FIG. 8(A) shows the measurement. The result of the evaporator bottom temperature, Figure 8 (B) shows the result of measuring the temperature above the evaporator.

圖9是顯示設置在本實施形態之冷卻裝置所具有之蒸發器之遮罩的變形例(具體構成例之第3具體例的遮罩)之構成的示意立體圖。 FIG. 9 is a schematic perspective view showing a configuration of a modification (a mask of a third specific example of a specific configuration example) of a mask provided in the evaporator of the cooling device of the embodiment.

圖10是圖10(A)、圖10(B)顯示本實施形態之具體構成例之冷卻裝置中使用了第3具體例之遮罩時之冷卻實驗的結果,圖10(A)顯示測定了蒸發器底面溫度的結果,圖10(B)顯示了測定蒸發器上面溫度的結果。 Fig. 10 (A) and Fig. 10(B) show the results of a cooling test in the case where the mask of the third specific example is used in the cooling device of the specific configuration example of the embodiment, and Fig. 10(A) shows the measurement. As a result of the temperature of the bottom surface of the evaporator, Fig. 10(B) shows the result of measuring the temperature above the evaporator.

圖11是顯示設置於本實施形態之冷卻裝置所具有之蒸發器之遮罩之變形例之構成的示意立體圖。 Fig. 11 is a schematic perspective view showing a configuration of a modification of the mask provided in the evaporator of the cooling device of the embodiment.

圖12是顯示設置於本實施形態之冷卻裝置所具有之蒸發器之遮罩之變形例之構成的示意立體圖。 Fig. 12 is a schematic perspective view showing a configuration of a modification of a mask provided in the evaporator of the cooling device of the embodiment.

圖13是顯示設置於本實施形態之冷卻裝置所具有之蒸發器之遮罩之變形例之構成的示意立體圖。 Fig. 13 is a schematic perspective view showing a configuration of a modification of the mask provided in the evaporator of the cooling device of the embodiment.

圖14是顯示在設置於本實施形態之冷卻裝置所具有之蒸發器之多孔質體之筒狀凸部設置變形例之遮罩之狀態的示意平面圖。 FIG. 14 is a schematic plan view showing a state in which a mask of a modified example is provided in a cylindrical convex portion of a porous body of an evaporator provided in the cooling device of the present embodiment.

圖15是顯示設置於本實施形態之冷卻裝置之蒸發器之變形例之構成的示意截面圖。 Fig. 15 is a schematic cross-sectional view showing a configuration of a modification of the evaporator provided in the cooling device of the embodiment.

圖16是圖16(A)、圖16(B)顯示設置於本實施形態之冷卻裝置所具有之蒸發器之遮罩之變形例之構成的模式圖,圖16(A)為立體圖,圖16(B)為截面圖。 Fig. 16 is a schematic view showing a configuration of a modification of the mask provided in the evaporator of the cooling device of the embodiment, Fig. 16 (A) and Fig. 16 (B), and Fig. 16 (A) is a perspective view, Fig. 16 (B) is a cross-sectional view.

圖17是顯示設置於本實施形態之冷卻裝置所具有之蒸發器之遮罩之變形例之構成的示意立體圖。 Fig. 17 is a schematic perspective view showing a configuration of a modification of the mask provided in the evaporator of the cooling device of the embodiment.

較佳實施例之詳細說明 Detailed description of the preferred embodiment

以下,根據圖式,參照圖1~圖17說明本發明之實施形態之蒸發器、冷卻裝置及電子裝置。 Hereinafter, an evaporator, a cooling device, and an electronic device according to an embodiment of the present invention will be described with reference to FIGS. 1 to 17 with reference to the drawings.

本實施形態之冷卻裝置是用以冷卻設置於例如電腦(例如伺服器或個人電腦)等之電子裝置之電子零件等之發熱體的冷卻裝置。再者,電子裝置也稱為電子機器。又,電子零件為例如CPU或LSI晶片等。 The cooling device of the present embodiment is a cooling device for cooling a heating element such as an electronic component of an electronic device such as a computer (for example, a server or a personal computer). Furthermore, electronic devices are also referred to as electronic devices. Further, the electronic component is, for example, a CPU or an LSI chip.

首先,本實施形態之電子裝置是例如圖3所示,於筐體50內具有:裝在有複數個電子零件51之配線基板52(例如印刷配線板等),使配線基板52上之電子零件51氣冷之送風扇53、電源54、及作為輔助記憶裝置之HDD(Hard Disk Drive)55。 First, as shown in FIG. 3, the electronic device of the present embodiment includes a wiring board 52 (for example, a printed wiring board) mounted on a plurality of electronic components 51 in the casing 50, and electronic components on the wiring board 52. 51 air-cooled delivery fan 53, power supply 54, and HDD (Hard Disk Drive) 55 as an auxiliary memory device.

而且,複數個電子零件51之中,包含有作為發熱體之電子零件,即發熱零件51X。在此,發熱零件包含有CPU(Central Processing Unit)51X。作為該發熱零件之CPU51X是因為光以送風扇53之送風無法充分冷卻,為了冷卻其而安裝了冷卻裝置1(在此為迴路式熱管)。 Further, among the plurality of electronic components 51, an electronic component as a heating element, that is, a heat generating component 51X is included. Here, the heat generating component includes a CPU (Central Processing Unit) 51X. The CPU 51X as the heat generating component is because the light is not sufficiently cooled by the air blown by the blower fan 53, and the cooling device 1 (here, a loop type heat pipe) is attached to cool it.

本實施形態中,冷卻裝置1是使用氣液二相流且利用液相(液體狀態)之作動流體蒸發而成為氣相(氣體狀態)之作動流體時之蒸發潛熱而實現高冷卻性能的冷卻裝置。 In the present embodiment, the cooling device 1 is a cooling device that realizes high cooling performance by using a gas-liquid two-phase flow and evaporating the working fluid in a liquid phase (liquid state) to become a working fluid in a gas phase (gas state). .

也就是說,本冷卻裝置1具有:使液相作動流體蒸發之蒸發器2、使氣相作動流體冷凝之冷凝器3、連接蒸發器2與 冷凝器3並供氣相作動流體流動之蒸氣管4、及連接冷凝器3與蒸發器2並供液相作動流體流動之液管5,該等是連接成迴路狀,並且於內部封入有作動流體(例如乙醇等)之迴路式熱管。 That is, the cooling device 1 has an evaporator 2 for evaporating a liquid phase working fluid, a condenser 3 for condensing a gas phase actuating fluid, and a connection evaporator 2 and a condenser 3 and a vapor tube 4 for supplying a gas-phase working fluid, and a liquid tube 5 for connecting the condenser 3 and the evaporator 2 and for supplying a liquid phase to move the fluid, which are connected in a loop shape and sealed inside. A loop type heat pipe of a fluid such as ethanol.

該迴路式熱管1中,如圖1所示,於蒸發器2具有多孔質體6,可藉由該多孔質體6之毛細管力使作動流體循環而輸送熱。 In the circuit type heat pipe 1, as shown in Fig. 1, the evaporator 2 has a porous body 6, and the operating fluid can be circulated by the capillary force of the porous body 6 to transfer heat.

也就是說,在此,蒸發器2是熱連接作為發熱零件之CPU51X。例如,蒸發器2是透過導熱膏56而緊貼於設置在配線基板52上之CPU51X上,而使來自CPU51X之熱傳往蒸發器2。 That is, here, the evaporator 2 is a CPU 51X that is thermally connected as a heat generating component. For example, the evaporator 2 is adhered to the CPU 51X provided on the wiring substrate 52 through the thermal conductive paste 56, and heat from the CPU 51X is transmitted to the evaporator 2.

藉此,供給至蒸發器2之液相作動流體之一部分分會從設置於蒸發器2之多孔質體6的表面滲出,從該多孔質體6之表面滲出之液相作動流體會藉由從作為發熱零件之CPU51X傳送之熱而蒸發(氣化),成為氣相作動流體。 Thereby, part of the liquid phase actuating fluid supplied to the evaporator 2 is oozing out from the surface of the porous body 6 provided on the evaporator 2, and the liquid phase actuating fluid which oozes from the surface of the porous body 6 is acted upon by The heat generated by the CPU 51X of the heat generating component evaporates (vaporizes) and becomes a gas phase actuating fluid.

該氣相作動流體是如圖3所示,經過蒸氣管4而流入冷凝器3。藉此,在蒸發器2吸收之熱會輸送到冷凝器3。 This gas phase actuating fluid flows into the condenser 3 through the vapor tube 4 as shown in FIG. Thereby, the heat absorbed in the evaporator 2 is sent to the condenser 3.

而且,流入冷凝器3之氣相作動流體會因在冷凝器3冷卻而冷凝(液化),成為液相作動流體。藉此,輸送到冷凝器3之熱會散熱。在此,冷凝器3設置在送風扇53之附近,又,在冷凝器3設有散熱扇57。而且,輸送到冷凝器3之熱會經由散熱扇57而散熱,並且藉由來自送風扇53之送風而往筐體50之外部釋放。 Further, the gas phase actuating fluid flowing into the condenser 3 is condensed (liquefied) by cooling in the condenser 3 to become a liquid phase actuating fluid. Thereby, the heat sent to the condenser 3 dissipates heat. Here, the condenser 3 is disposed in the vicinity of the blower fan 53, and the condenser 3 is provided with a heat dissipating fan 57. Further, the heat sent to the condenser 3 is radiated by the heat radiating fan 57, and is released to the outside of the casing 50 by the air blow from the blower fan 53.

再者,亦可設置散熱板等之其他散熱構件以取代 散熱扇57。又,亦可不設置散熱構件,而是對管件直接送風空氣以冷卻。又,在此,雖然是藉由氣冷式之冷卻手段進行冷卻,但亦可藉由水冷式之冷卻手段進行冷卻。 Furthermore, other heat dissipating members such as heat sinks may be provided instead. Cooling fan 57. Further, instead of providing a heat dissipating member, the pipe member may be directly supplied with air to cool. Here, although cooling is performed by an air-cooling type cooling means, it may be cooled by a water-cooling type cooling means.

該液相作動流體經由液管5而流入蒸發器2。 This liquid phase actuating fluid flows into the evaporator 2 via the liquid pipe 5.

如此,作動流體會在由蒸發器2、蒸氣管4、冷凝器3、液管5所構成之循環路徑循環流動。 Thus, the actuating fluid circulates in a circulation path composed of the evaporator 2, the vapor tube 4, the condenser 3, and the liquid tube 5.

尤其,本實施形態中,蒸發器2是如下所構成。 In particular, in the present embodiment, the evaporator 2 is configured as follows.

在此,蒸發器2是以適合有效率冷卻平板型發熱體(在此是作為發熱零件之CPU51X)之薄型平板狀蒸發器為例來進行說明。再者,也將薄型平板狀蒸發器稱為薄型蒸發器或平板型蒸發器。 Here, the evaporator 2 will be described as an example of a thin flat evaporator which is suitable for efficiently cooling a flat type heat generating body (here, a CPU 51X as a heat generating component). Further, the thin flat evaporator is also referred to as a thin evaporator or a flat evaporator.

本實施形態之蒸發器2如圖1、圖2所示,具有:多孔質體(由多孔質材料構成之毛細結構)6,藉由多孔質體6而分隔之蒸氣室7及液室8、殼體9、及遮罩10。 As shown in Fig. 1 and Fig. 2, the evaporator 2 of the present embodiment has a porous body (a capillary structure made of a porous material) 6, a vapor chamber 7 and a liquid chamber 8 partitioned by a porous body 6, The housing 9 and the mask 10.

在此,多孔質體6為低熱傳導率之多孔質體。具體而言為多孔質之PTFE(聚四氟乙烯)樹脂成形體(樹脂製多孔質體)。 Here, the porous body 6 is a porous body having a low thermal conductivity. Specifically, it is a porous PTFE (polytetrafluoroethylene) resin molded body (a porous body made of a resin).

尤其,本實施形態中,多孔質體6具有複數個筒狀凸部6A。也就是說,多孔質體6具有:板狀部分6B,及設置在平板狀部分6B上之複數個筒狀凸部6A。在此,複數個筒狀凸部6A是設置成分別對平板狀部分6B突出於液室8側(即,殼體9之上側部分9B側),在蒸氣室7側(即,後述之殼體9之下側部分9A側)具有供設置於殼體9之下側部分9A之突起部9C插入的插入孔6C。又,在插入孔6C之側面設 有往其深度方向延伸之複數個溝6D。 In particular, in the present embodiment, the porous body 6 has a plurality of cylindrical convex portions 6A. That is, the porous body 6 has a plate-like portion 6B and a plurality of cylindrical convex portions 6A provided on the flat plate portion 6B. Here, the plurality of cylindrical convex portions 6A are provided so as to protrude from the liquid chamber 8 side (that is, the upper side portion 9B side of the casing 9) to the flat portion 6B, respectively, on the side of the vapor chamber 7 (that is, a casing to be described later) The lower side portion 9A side 9 has an insertion hole 6C into which the projection 9C provided at the lower side portion 9A of the casing 9 is inserted. Moreover, it is provided on the side of the insertion hole 6C. There are a plurality of grooves 6D extending in the depth direction thereof.

殼體9具有:連接蒸氣管4並規定蒸氣室7之下側部分(第1部分)9A,及連接液管5並規定液室8之上側部分(第2部分)9B。 The casing 9 has a portion (first portion) 9A that connects the steam pipe 4 and defines a lower portion of the vapor chamber 7, and a connecting liquid pipe 5 and defines an upper portion (second portion) 9B of the liquid chamber 8.

也就是說,於殼體9之下側部分9A設有蒸氣管連接用開口部9D(蒸發器2之出口),並且於該蒸氣管連接用開口部9D連接有蒸氣管4。如此,於藉由構成蒸發器2之殼體9的下側部分9A規定之蒸氣室7連接有蒸氣管4。在此,殼體9之下側部分9A由具有凹部9AY之底板9AX構成,並且於設置於該底板9AX之蒸氣管連接用開口部9D連接有蒸氣管4。 In other words, the vapor tube connection opening portion 9D (the outlet of the evaporator 2) is provided in the lower side portion 9A of the casing 9, and the vapor tube 4 is connected to the vapor tube connection opening portion 9D. In this manner, the vapor tube 4 is connected to the vapor chamber 7 defined by the lower portion 9A of the casing 9 constituting the evaporator 2. Here, the lower side portion 9A of the casing 9 is constituted by the bottom plate 9AX having the recessed portion 9AY, and the steam pipe 4 is connected to the steam pipe connecting opening portion 9D provided in the bottom plate 9AX.

又,於殼體9之上側部分9B設有液管連接用開口部9E(蒸發器2之入口),並於該液管連接用開口部9E連接有液管5。如此,於藉由構成蒸發器2之殼體9的上側部分9B規定之液室8連接有液管5。在此,殼體9之上側部分9B由框體9BX與蓋體9BY構成,並於設置於該框體9BX之液管連接用開口部9E連接有液管5。 Further, a liquid pipe connecting opening portion 9E (an inlet of the evaporator 2) is provided in the upper side portion 9B of the casing 9, and a liquid pipe 5 is connected to the liquid pipe connecting opening portion 9E. In this manner, the liquid pipe 5 is connected to the liquid chamber 8 defined by the upper portion 9B of the casing 9 constituting the evaporator 2. Here, the upper side portion 9B of the casing 9 is constituted by the frame body 9BX and the lid body 9BY, and the liquid pipe 5 is connected to the liquid pipe connection opening portion 9E provided in the frame body 9BX.

再者,在此,雖於殼體9之其中一側連接有蒸氣管4及液管5,但不限定於此,例如,亦可於殼體9之其中一側連接液管5,並於另一側連接蒸氣管4。 Here, although the vapor tube 4 and the liquid tube 5 are connected to one side of the casing 9, the present invention is not limited thereto. For example, the liquid pipe 5 may be connected to one side of the casing 9, and The other side is connected to the vapor tube 4.

而且,殼體9之下側部分9A熱連接於作為發熱零件之CPU51X。藉此,藉由殼體9之下側部分9A規定之蒸氣室7設置於接近CPU51X之位置,並且藉由殼體9之上側部分9B規定之液室8設置於距離CPU51X較遠的位置。又,使殼體9之上側部分9B之熱傳導率低於下側部分9A。例如,如後述, 藉令殼體9之上側部分9B為不銹鋼製,令殼體9之下側部分9A為銅製,只要使殼體9之上側部分9B之熱傳導率低於下側部分9A即可。藉此,作為發熱零件之CPU51X之熱難以傳送到液相作動流體,並且液相作動流體之溫度難以上昇。 Further, the lower side portion 9A of the casing 9 is thermally connected to the CPU 51X as a heat generating component. Thereby, the vapor chamber 7 defined by the lower side portion 9A of the casing 9 is disposed at a position close to the CPU 51X, and the liquid chamber 8 defined by the upper side portion 9B of the casing 9 is disposed at a position far from the CPU 51X. Further, the thermal conductivity of the upper side portion 9B of the casing 9 is made lower than that of the lower side portion 9A. For example, as will be described later, The upper side portion 9B of the casing 9 is made of stainless steel, so that the lower side portion 9A of the casing 9 is made of copper as long as the thermal conductivity of the upper side portion 9B of the casing 9 is lower than that of the lower side portion 9A. Thereby, the heat of the CPU 51X, which is a heat generating component, is difficult to be transmitted to the liquid phase actuating fluid, and the temperature of the liquid phase actuating fluid is hard to rise.

又,殼體9設置於下側部分9A,且往上側部分9B之側突出,並具有嵌入至多孔質體6之複數個筒狀凸部6A之各個的複數個突起部9C。也就是說,於殼體9之下側部分9A設有往上側部分9B之側突出之複數個突起部9C,該等複數個突起部9C嵌入於設置在多孔質體6之複數個筒狀凸部6A之各個的插入孔6C。在此,於殼體9之構成下側部分9A之底板9AX之凹部9AY之表面上一體形成有複數個突起部9C。而且,複數個突起部9C嵌入至設置於多孔質體6之複數個筒狀凸部6A之各個的插入孔6C,使突起部9C之中心軸與多孔質體6之筒狀凸部6A之中心軸(即插入孔6C之中心軸)一致。 Further, the casing 9 is provided on the lower side portion 9A and protrudes to the side of the upper side portion 9B, and has a plurality of projections 9C that are fitted into each of the plurality of cylindrical projections 6A of the porous body 6. That is, the lower side portion 9A of the casing 9 is provided with a plurality of projections 9C projecting to the side of the upper side portion 9B, and the plurality of projections 9C are embedded in a plurality of cylindrical projections provided in the porous body 6. The insertion hole 6C of each of the portions 6A. Here, a plurality of protrusions 9C are integrally formed on the surface of the recess 9AY of the bottom plate 9AX constituting the lower side portion 9A of the casing 9. Further, a plurality of projections 9C are fitted into the insertion holes 6C provided in each of the plurality of cylindrical projections 6A of the porous body 6, so that the central axis of the projections 9C and the center of the cylindrical projections 6A of the porous body 6 are formed. The axes (i.e., the central axes of the insertion holes 6C) are identical.

如此,多孔質體6收納於殼體9內。尤其,複數個突起部9C嵌入多孔質體6之複數個筒狀凸部6A之各個,而於多孔質體6之背面(圖1中,下面)與殼體9之下側部分9A之表面(圖1中,上面)之間形成空間。藉此,於多孔質體6之背面與殼體9之下側部分9A之表面之間形成的空間成為蒸氣室7。在此,複數個溝6D形成於設置在多孔質體6之複數個筒狀凸部6A之各個的插入孔6C之側面,並且形成於該等溝6D之間的空間,即,形成於插入孔6C之溝6D之底面與 突起部9C之側面之間的空間也構成蒸氣室7之一部分。另一方面,在多孔質體6之表面(圖1中,上面)與殼體9之上側部分9B之表面(圖1中,下面)之間形成之空間成為液室8。該液室8兼具用以貯留液相作動流體之貯液槽。 In this manner, the porous body 6 is housed in the casing 9. In particular, a plurality of projections 9C are fitted into each of the plurality of cylindrical projections 6A of the porous body 6, and on the back surface of the porous body 6 (lower side in Fig. 1) and the surface of the lower side portion 9A of the casing 9 ( In Fig. 1, a space is formed between the upper ones. Thereby, a space formed between the back surface of the porous body 6 and the surface of the lower side portion 9A of the casing 9 serves as the vapor chamber 7. Here, a plurality of grooves 6D are formed on the side faces of the insertion holes 6C provided in each of the plurality of cylindrical convex portions 6A of the porous body 6, and are formed in the space between the grooves 6D, that is, formed in the insertion holes. The bottom surface of 6D groove 6D The space between the side faces of the protrusions 9C also constitutes a part of the vapor chamber 7. On the other hand, a space formed between the surface of the porous body 6 (the upper surface in Fig. 1) and the surface (the lower surface in Fig. 1) of the upper side portion 9B of the casing 9 becomes the liquid chamber 8. The liquid chamber 8 also has a reservoir for storing the liquid phase working fluid.

而且,流入並貯留於液室8之液相作動流體藉毛細管現象從多孔質體6之複數個筒狀凸部6A之各個的周圍浸透,往蒸氣室7側滲出。另一方面,當作為發熱零件之CPU51X發熱時,其熱會傳熱到殼體9之下側部分9A,進而傳達到複數個突起部9C之各個。而且,藉由傳熱到複數個突起部9C之各個的熱,滲出到蒸氣室7側之液相作動流體會蒸發(氣化),成為氣相作動流體。尤其,藉於多孔質體6設置複數個筒狀凸部6A,加大蒸發面積,提高冷卻性能。進而,於殼體9之下側部分9A設置突起部9C,並於此嵌入筒狀凸部6A,藉此液相作動流體之浸透距離會均等。藉此,即使是例如為發熱零件之CPU51X大型化並增加發熱量而增加蒸發量等發熱體之發熱量增加而增加蒸發量時,亦可防止液相作動流體難以供給到多孔質體6之蒸氣室7側之表面(即,加熱面側之端部),並可防止產生乾涸,蒸發面積縮小而冷卻性能顯著降低的狀況。如此,在設置筒狀凸部6A而擴大蒸發面積之多孔質體6中,使其厚度均一,並使接觸突起部9C之多孔質體6之濡濕狀態均一,並且從擴大蒸發面積之多孔質體6有效率地使液相作動流體蒸發,而可得到安定的冷卻性能。 Further, the liquid-phase actuating fluid that has flowed in and stored in the liquid chamber 8 permeates from the periphery of each of the plurality of cylindrical convex portions 6A of the porous body 6 by capillary action, and oozes out toward the vapor chamber 7 side. On the other hand, when the CPU 51X which is a heat generating component generates heat, heat is transferred to the lower side portion 9A of the casing 9, and is further transmitted to each of the plurality of projections 9C. Further, by the heat transferred to each of the plurality of protrusions 9C, the liquid phase working fluid that has ooze out to the vapor chamber 7 side evaporates (vaporizes) and becomes a gas phase actuating fluid. In particular, a plurality of cylindrical convex portions 6A are provided by the porous body 6, and the evaporation area is increased to improve the cooling performance. Further, a projection portion 9C is provided in the lower side portion 9A of the casing 9, and the cylindrical projection portion 6A is fitted therein, whereby the penetration distance of the liquid phase working fluid is uniform. In this way, even if the CPU 51X of the heat generating component is increased in size, the amount of heat generation is increased, and the amount of heat generated by the heat generating body such as the amount of evaporation is increased to increase the amount of evaporation, it is also possible to prevent the liquid phase actuating fluid from being supplied to the vapor of the porous body 6. The surface on the side of the chamber 7 (i.e., the end on the heating surface side) can prevent the occurrence of dryness, a reduction in evaporation area, and a markedly lowered cooling performance. In the porous body 6 in which the cylindrical convex portion 6A is provided and the evaporation area is enlarged, the thickness is uniform, and the porous body 6 of the contact protrusion portion 9C is uniform in the wet state, and the porous body is expanded from the evaporation area. 6 Efficiently evaporates the liquid phase working fluid to obtain stable cooling performance.

另,如上述,如殼體9之下側部分9A設置突起部 9C,並於其嵌入筒狀凸部6A,並在嵌入筒狀凸部6A之各突起部9C之周圍形成液相作動流體流動的空間時,如圖4(A)、圖4(B)所示,多孔質體6之液相作動流體11接觸之接液面6X的面積會變大。而且,當多孔質體6之液相作動流體11接觸之接液面6X的面積變大時,從多孔質體6增大往液相作動流體11之熱洩漏,並且降低冷卻性能。再者,圖4(A)、圖4(B)中,以符號X表示之箭頭記號顯示熱之流動,並且以符號Y表示之箭頭記號顯示液相作動流體之流動。 Further, as described above, the protrusion is provided as the lower side portion 9A of the casing 9 9C, when the cylindrical convex portion 6A is fitted therein, and a space in which the liquid phase fluid flows is formed around the respective projections 9C of the cylindrical convex portion 6A, as shown in FIGS. 4(A) and 4(B). It is shown that the area of the liquid contact surface 6X where the liquid phase working fluid 11 of the porous body 6 contacts is increased. Further, when the area of the liquid contact surface 6X where the liquid phase working fluid 11 of the porous body 6 contacts is increased, heat leakage from the porous body 6 to the liquid phase working fluid 11 is increased, and the cooling performance is lowered. Further, in FIGS. 4(A) and 4(B), the arrow symbol indicated by the symbol X indicates the flow of heat, and the arrow symbol indicated by the symbol Y indicates the flow of the liquid phase actuating fluid.

也就是說,上述之迴路式熱管1中,為了提高冷卻性能,在熱連接於作為發熱零件之CPU51X之殼體9的下側部分9A設置突起部9C,並且於其嵌入多孔質體6之筒狀凸部6A,擴大蒸發面積。此種情況下,由於接觸多孔質體6之筒狀凸部6A之成為高溫之突起部9C的蒸發面6Y,與多孔質體6之筒狀凸部6A之接觸低溫之液相作動流體11的接液面6X表裡一體,因此如上述而當擴大多孔質體6之蒸發面6Y之面積時,會更為擴大接液面6X之面積。 In other words, in the above-described loop type heat pipe 1, in order to improve the cooling performance, the projection portion 9C is provided in the lower side portion 9A of the casing 9 thermally connected to the CPU 51X as a heat generating component, and is embedded in the cylinder of the porous body 6 The convex portion 6A expands the evaporation area. In this case, the molten surface 6Y of the protrusion 9C which is the high temperature of the cylindrical convex portion 6A of the porous body 6 is in contact with the cylindrical convex portion 6A of the porous body 6 in contact with the low-temperature liquid phase working fluid 11 Since the liquid contact surface 6X is integrated in the front and back, when the area of the evaporation surface 6Y of the porous body 6 is enlarged as described above, the area of the liquid contact surface 6X is further enlarged.

在此,從多孔質體6往液相作動流體11之熱傳達根據下式。 Here, the heat transfer from the porous body 6 to the liquid phase working fluid 11 is expressed by the following formula.

【數1】Q=hA(T W -T L ) [Number 1] Q = hA ( T W - T L )

在此,Q為從多孔質體6往液相作動流體11之熱洩漏熱量,h為熱傳達係數,A為多孔質體6與液相作動流體11之接觸面積(接液面積),TW為多孔質體6之表面溫度, TL為液相作動流體11之溫度。 Here, Q is the heat leakage heat from the porous body 6 to the liquid phase working fluid 11, h is the heat transfer coefficient, and A is the contact area (the liquid contact area) of the porous body 6 and the liquid phase working fluid 11, T W It is the surface temperature of the porous body 6, and TL is the temperature of the liquid phase working fluid 11.

因此,藉由接液面積A之擴大,增大從多孔質體6往液相作動流體11之熱洩漏熱量Q。 Therefore, the heat leakage heat Q from the porous body 6 to the liquid phase working fluid 11 is increased by the expansion of the liquid contact area A.

又,藉擴大接液面積A,多孔質體6之表面溫度TW會上昇。這是因為擴大多孔質體6之接液面積A,流入多孔質體6之接液面6X之液相作動流體11的流速會降低之故[參照圖5(A)]。在此,流入多孔質體6之液相作動流體11的流速是依據作動流體之種類或發熱量,但大略在數十μm/sec~數百μm/sec左右,影響多孔質體6內之熱傳導甚大。若往多孔質體6之接液面6X之流入速度快時,進入多孔質體6中之熱量(熱洩漏)會逆流回去,但若流入速度慢時,藉由熱傳導而進入多孔質體6中之熱量會變大,往液相作動流體11側之熱洩漏增大。如此,當多孔質體6之接液面積擴大時,不僅是熱交換面積(A)增大,熱交換面之溫度(TW)也會增加,因此熱洩漏會變得非常大。 Further, by increasing the liquid contact area A, the surface temperature T W of the porous body 6 rises. This is because the liquid contact area A of the porous body 6 is enlarged, and the flow velocity of the liquid phase working fluid 11 flowing into the liquid contact surface 6X of the porous body 6 is lowered (see FIG. 5(A)). Here, the flow velocity of the liquid phase working fluid 11 flowing into the porous body 6 is based on the type of the working fluid or the amount of heat generated, but is approximately several tens of μm/sec to several hundreds μm/sec, which affects the heat conduction in the porous body 6. Very big. When the inflow velocity to the liquid contact surface 6X of the porous body 6 is fast, the heat (heat leakage) entering the porous body 6 will flow back, but if the inflow velocity is slow, it enters the porous body 6 by heat conduction. The heat is increased, and the heat leakage to the side of the liquid phase working fluid 11 is increased. As described above, when the liquid contact area of the porous body 6 is enlarged, not only the heat exchange area (A) is increased, but also the temperature (T W ) of the heat exchange surface is increased, so that the heat leakage becomes extremely large.

而且,迴路式熱管1之內部之作動流體保持在飽和狀態,流體藉由以蒸發器2內之多孔質體6分隔之蒸氣側與液側之溫度差所致之蒸氣壓差而作動。因此,當從蒸發器2之蒸氣側經由多孔質體6而傳熱到液側之熱洩漏熱量大時,迴路式熱管1會產生顯著的性能降低。 Further, the operating fluid inside the loop type heat pipe 1 is kept in a saturated state, and the fluid is actuated by a vapor pressure difference caused by a temperature difference between the vapor side and the liquid side separated by the porous body 6 in the evaporator 2. Therefore, when the heat of heat transfer from the vapor side of the evaporator 2 to the liquid side via the porous body 6 is large, the loop type heat pipe 1 produces a significant performance degradation.

因此,欲去除迴路式熱管1之性能降低的原因,實現具有高冷卻性能之迴路式熱管1及具有其之電子裝置。 Therefore, in order to remove the cause of the performance degradation of the loop type heat pipe 1, a loop type heat pipe 1 having high cooling performance and an electronic device having the same are realized.

因此,本實施形態中,如圖1、圖2所示,設有用以覆蓋複數個筒狀凸部6A之各個表面之複數個遮罩10,以 使多孔質體6之複數個筒狀凸部6A之液相作動流體11接觸之接液面6X的面積變小。如此,藉由設置遮罩10,縮小液相作動流體11流入多孔質體6之筒狀凸部6A之表面之接觸液相作動流體11之接液面6X時的面積(通過面積)。如此,藉設置遮罩10,使多孔質體6之筒狀凸部6A的接液面6X變小,可減少液相作動流體11與多孔質體6直接接觸的面積,又,可提高流入到多孔質體6之液相作動流體11的流速。藉由該等相乘效果,可減少從多孔質體6往液相作動流體11之傳熱量,並且可減少從多孔質體6往液相作動流體11之熱洩漏,並可提高蒸發器2之冷卻效率,進而提高迴路式熱管1之冷卻能力。 Therefore, in the present embodiment, as shown in FIGS. 1 and 2, a plurality of masks 10 for covering the respective surfaces of the plurality of cylindrical projections 6A are provided, The area of the liquid contact surface 6X that contacts the liquid phase working fluid 11 of the plurality of cylindrical convex portions 6A of the porous body 6 is reduced. By providing the mask 10, the area (passing area) when the liquid-phase operating fluid 11 flows into the surface of the cylindrical convex portion 6A of the porous body 6 and contacts the liquid contact surface 6X of the liquid-phase fluid 11 is reduced. By providing the mask 10, the liquid contact surface 6X of the cylindrical convex portion 6A of the porous body 6 is made small, and the area in which the liquid-phase working fluid 11 and the porous body 6 are in direct contact with each other can be reduced, and the inflow can be improved. The flow rate of the liquid phase operating fluid 11 of the porous body 6. By the multiplication effect, the amount of heat transfer from the porous body 6 to the liquid phase working fluid 11 can be reduced, and heat leakage from the porous body 6 to the liquid phase working fluid 11 can be reduced, and the evaporator 2 can be improved. The cooling efficiency further increases the cooling capacity of the loop heat pipe 1.

例如,遮罩10只要做成於覆蓋筒狀凸部6A之側面之部分具有液相作動流體11流動之開口部10A即可。此種情況下,多孔質體6之筒狀凸部6A之表面被遮罩10所覆蓋,僅多孔質體6之筒狀凸部6A之側面之遮罩10的開口部10A所位於之部分成為接液面6X,多孔質體6之筒狀凸部6A之接液面6X的面積變小。 For example, the mask 10 may be formed to have an opening 10A through which the liquid-phase operating fluid 11 flows in a portion covering the side surface of the cylindrical convex portion 6A. In this case, the surface of the cylindrical convex portion 6A of the porous body 6 is covered by the mask 10, and only the portion of the opening 10A of the mask 10 on the side surface of the cylindrical convex portion 6A of the porous body 6 is located. The liquid contact surface 6X has a small area of the liquid contact surface 6X of the cylindrical convex portion 6A of the porous body 6.

在此,開口部10A只要做成複數個孔10B即可。 Here, the opening 10A may be formed as a plurality of holes 10B.

該等孔10B宜含括覆蓋部分之全面,均一地設置在遮罩10之筒狀凸部6A之側面。 Preferably, the holes 10B include a full extent of the covering portion and are uniformly disposed on the side of the cylindrical projection 6A of the mask 10.

又,該等孔10B如圖7所示,宜為相較於多孔質體6之筒狀凸部6A之前端側,平板狀部分6B側較大。也就是說,該等孔10B宜為位於下側部分(第1部分)9A之側者比位於殼體9之上側部分(第2部分)9B之側者大。這是因為藉下側 部分9A規定之蒸氣室7側變得比藉殼體9之上側部分9B規定之液室8側高溫,蒸發量較多之故。如此,藉令孔10B之大小分布,減少多孔質體6與液相作動流體11直接接觸的面積(接液面積),可使流入多孔質體6之液相作動流體11之流速均一地增加,可一樣地減少由多孔質體6往液相作動流體11之熱洩漏。 Further, as shown in Fig. 7, the holes 10B are preferably larger than the front end side of the cylindrical convex portion 6A of the porous body 6, and the flat portion 6B side. That is, it is preferable that the holes 10B are larger on the side of the lower side portion (first portion) 9A than on the side of the upper side portion (second portion) 9B of the casing 9. This is because the lower side The side of the vapor chamber 7 defined by the portion 9A is higher than the liquid chamber 8 side defined by the upper portion 9B of the casing 9, and the amount of evaporation is large. Thus, by reducing the size distribution of the pores 10B and reducing the area (the liquid contact area) where the porous body 6 is in direct contact with the liquid phase working fluid 11, the flow velocity of the liquid phase working fluid 11 flowing into the porous body 6 can be uniformly increased. The heat leakage from the porous body 6 to the liquid phase working fluid 11 can be similarly reduced.

再者,在此,是將孔10B之形狀作成圓形,但並不受限於此,可作成例如三角形、四角形等之各種形狀。 Here, the shape of the hole 10B is circular, but it is not limited thereto, and various shapes such as a triangle or a quadrangle may be formed.

又,開口部10A如圖11所示,亦可作為複數個槽縫10C。 Further, as shown in FIG. 11, the opening 10A may be a plurality of slits 10C.

該等槽縫10C宜作成含括覆蓋部分之全面均一地設置遮罩10之筒狀凸部6A之側面。 The slits 10C are preferably formed to include side faces of the cylindrical projections 6A in which the masks 10 are integrally and uniformly provided.

又,該等槽縫10C宜為平板狀部分6B側較多孔質體6之筒狀凸部6A之前端側為較寬幅度。也就是說,該等槽縫10C宜為位於下側部分(第1部分)9A之側者較位於殼體9之上側部分(第2部分)9B之側者的幅度寬。這是因為由下側部分9A規定之蒸氣室7側成為比由殼體9之上側部分9B規定之液室8側高溫,蒸發量較多之故。如此,藉改變槽縫10C之幅度,可減少多孔質體6與液相作動流體11直接接觸之面積(接液面積),並且可使流入多孔質體6之液相作動流體11的流速均一地增加,並且可一樣地減少由多孔質體6往液相作動流體11之熱洩漏。 Further, it is preferable that the slits 10C have a wider width on the front end side than the cylindrical convex portion 6A of the porous body 6 on the side of the flat portion 6B. That is, it is preferable that the slits 10C have a width wider than a side located on the lower side portion (first portion) 9A and a side closer to the upper side portion (second portion) 9B of the casing 9. This is because the vapor chamber 7 side defined by the lower portion 9A is higher in temperature than the liquid chamber 8 side defined by the upper portion 9B of the casing 9, and the amount of evaporation is large. Thus, by changing the extent of the slit 10C, the area (the liquid contact area) where the porous body 6 is in direct contact with the liquid phase working fluid 11 can be reduced, and the flow rate of the liquid phase working fluid 11 flowing into the porous body 6 can be uniformly made. The increase and the heat leakage from the porous body 6 to the liquid phase actuating fluid 11 can be similarly reduced.

再者,在此,將槽縫10C作成朝筒狀凸部6A之高度方向延伸者,但並不受限於此,例如,亦可作為朝筒狀 凸部6A之周方向延伸者。又,若作成朝筒狀凸部6A之高度方向延伸之槽縫10C時,考慮量產化、低成本化而可以模型製作,因此如圖12所示,宜為將槽縫10C延伸到下端,而從下端延伸之切入。 Here, the slit 10C is formed to extend in the height direction of the cylindrical convex portion 6A, but is not limited thereto, and may be, for example, a cylindrical shape. The convex portion 6A extends in the circumferential direction. In addition, when the slit 10C extending in the height direction of the cylindrical convex portion 6A is formed, it can be modeled in consideration of mass production and cost reduction. Therefore, as shown in Fig. 12, it is preferable to extend the slit 10C to the lower end. And the cut from the lower end.

該等情況下,遮罩10宜作成設有開口部10A,使筒狀凸部6A之側面之接液面6X的面積為筒狀凸部6A之側面之面積的50%以下。此種情況下,遮罩10之開口部10A之面積(開口面積)成為覆蓋遮罩10之筒狀凸部6A之側面之部分的面積的50%以下。也就是說,覆蓋遮罩10之筒狀凸部6A之側面的部分由開口部10A(多孔質體6與液相作動流體11接觸的部分)、及開口部10A以外的部分(多孔質體6與遮罩10接觸的部分)構成,開口部10A之面積成為開口部10A以外之部分的面積以下。如此,覆蓋遮罩10之筒狀凸部6A之側面之覆蓋部分中之開口部10A的比例,即,遮罩10之開口率宜為50%以下。如此,相較於不設置遮罩10的情況,宜使多孔質體6之筒狀凸部6A之側面之接液面6X的面積為50%以下。藉此,可將液相作動流體11(作動液)與多孔質體6直接接觸的面積減少到1/2以下,又,可將液相作動流體11流入到多孔質體6之流速加大到2倍以上。 In these cases, the mask 10 is preferably provided with the opening 10A such that the area of the liquid contact surface 6X on the side surface of the cylindrical convex portion 6A is 50% or less of the area of the side surface of the cylindrical convex portion 6A. In this case, the area (opening area) of the opening 10A of the mask 10 is 50% or less of the area of the portion covering the side surface of the cylindrical convex portion 6A of the mask 10. In other words, the portion covering the side surface of the cylindrical convex portion 6A of the mask 10 is composed of the opening portion 10A (the portion where the porous body 6 is in contact with the liquid phase working fluid 11) and the portion other than the opening portion 10A (the porous body 6). The portion that is in contact with the mask 10 is configured such that the area of the opening 10A is equal to or smaller than the area of the portion other than the opening 10A. Thus, the ratio of the opening portion 10A in the covering portion of the side surface of the cylindrical convex portion 6A covering the mask 10, that is, the opening ratio of the mask 10 is preferably 50% or less. As described above, the area of the liquid contact surface 6X on the side surface of the cylindrical convex portion 6A of the porous body 6 is preferably 50% or less as compared with the case where the mask 10 is not provided. Thereby, the area in which the liquid phase working fluid 11 (actuating liquid) is in direct contact with the porous body 6 can be reduced to 1/2 or less, and the flow rate of the liquid phase working fluid 11 to the porous body 6 can be increased to More than 2 times.

再者,筒狀凸部6A之接液面6X之面積愈大,宜降低遮罩10之開口率,且若後述之具體的構成例時,宜使例如遮罩10之開口率為35%左右或其以下。 Further, the larger the area of the liquid contact surface 6X of the cylindrical convex portion 6A, the lower the aperture ratio of the mask 10 is required, and in the case of a specific configuration example to be described later, for example, the aperture ratio of the mask 10 is preferably about 35%. Or below.

又,將作為開口部10A之複數個孔10B或槽縫10C之大小作成位於下側部分(第1部分)9A之側(筒狀凸部6A之 基底側;蒸氣室7側;突起部9C之高溫側)者比位於殼體9之上側部分(第2部分)9B之側(筒狀凸部6A之前端側;液室8側;突起部9C之低溫側)者大時,遮罩10之開口率之位於下側部分(第1部分)9A之側者比位於殼體9之上側部分(第2部分)9B之側者高。此種情況下,只要做成遮罩10之開口率之平均為50%以下即可。只要使遮罩10之開口率分布成如下即可:例如,在殼體9之下側部分(第1部分)9A之側,令遮罩10之開口率為55%,在中央附近令遮罩10之開口率為35%,在殼體9之上側部分(第2部分)9B之側,令遮罩10之開口率為15%,遮罩10之開口率之平均為50%以下。 Further, the size of the plurality of holes 10B or the slits 10C as the opening portion 10A is set to be on the side of the lower side portion (first portion) 9A (the cylindrical convex portion 6A) The base side; the vapor chamber 7 side; the high temperature side of the protrusion 9C is located on the side of the upper side portion (second portion) 9B of the casing 9 (the front end side of the cylindrical convex portion 6A; the liquid chamber 8 side; the projection portion 9C) When the low temperature side is large, the side of the lower portion (first portion) 9A of the opening ratio of the mask 10 is higher than the side of the upper portion (second portion) 9B of the casing 9. In this case, the average aperture ratio of the mask 10 may be 50% or less. As long as the aperture ratio of the mask 10 is distributed as follows: for example, on the side of the lower side portion (first portion) 9A of the casing 9, the aperture ratio of the mask 10 is 55%, and the mask is formed near the center. The aperture ratio of 10 is 35%, and the aperture ratio of the mask 10 is 15% on the side of the upper side portion (second portion) 9B of the casing 9, and the average aperture ratio of the mask 10 is 50% or less.

再者,在此,遮罩10為具有開口部10A之圓筒狀遮罩,被覆於多孔質體6之筒狀凸部6A,但不限定於此。 Here, the mask 10 is a cylindrical mask having the opening 10A and is covered by the cylindrical convex portion 6A of the porous body 6, but the invention is not limited thereto.

例如,如圖13、圖14所示,遮罩10具有:部分的覆蓋鄰接之4個筒狀凸部6A所含之第1筒狀凸部61A之側面的第1部分101;部分的覆蓋4個筒狀凸部6A所含之第2筒狀凸部62A之側面的第2部分102;部分的覆蓋4個筒狀凸部6A所含之第3筒狀凸部63A之側面的第3部分103;及部分的覆蓋4個筒狀凸部6A所含之第4筒狀凸部64A之側面的第4部分104,以一個一個設置在鄰接之4個遮罩10-1~10-4之各個之4個部分101-1~101-4,亦可覆蓋1個筒狀凸部61A之側面,形成液相作動流體11流動於該等4個部分101-1~101-4之相互間的槽縫10D。 For example, as shown in FIG. 13 and FIG. 14, the mask 10 has a first portion 101 partially covering the side surface of the first cylindrical convex portion 61A included in the adjacent four cylindrical convex portions 6A; The second portion 102 on the side surface of the second cylindrical convex portion 62A included in each of the cylindrical convex portions 6A; and the third portion covering the side surface of the third cylindrical convex portion 63A included in the four cylindrical convex portions 6A And a part of the fourth portion 104 covering the side surface of the fourth cylindrical convex portion 64A included in the four cylindrical convex portions 6A is disposed one by one in the adjacent four masks 10-1 to 10-4. Each of the four portions 101-1 to 101-4 may cover the side surface of one of the cylindrical convex portions 61A, and the liquid-phase operating fluid 11 flows between the four portions 101-1 to 101-4. Slot 10D.

此種情況下,遮罩10具有:第1部分101~第4部 分104、及支持該等之板狀部分105,第1部分101~第4部分104插入到鄰接之4個筒狀凸部6A(61A~64A)所包圍之區域。 In this case, the mask 10 has: the first part 101 to the fourth part The portion 104 and the plate portion 105 supporting the first portion 101 to the fourth portion 104 are inserted into a region surrounded by the adjacent four cylindrical convex portions 6A (61A to 64A).

藉如此構成,即使筒狀凸部6A間之間隙狹小也可設置遮罩10。 According to this configuration, the mask 10 can be provided even if the gap between the cylindrical convex portions 6A is narrow.

設置如此構成之遮罩10之蒸發器2如圖15所示。 The evaporator 2 in which the mask 10 thus constructed is disposed is as shown in FIG.

再者,圖13、圖14中,作成遮罩10之各部分101~104一體化,並且於中央部設有液相作動流體11流動之流路10E。可是,並不限定於此,亦可作成遮罩10之各部分101~104彼此分離而獨立,該等各部分101~104所包圍之中央區域成為液相作動流體11流動之流路。 Further, in Figs. 13 and 14, the respective portions 101 to 104 of the mask 10 are integrated, and a flow path 10E through which the liquid phase working fluid 11 flows is provided at the center portion. However, the present invention is not limited thereto, and the respective portions 101 to 104 of the mask 10 may be separated from each other, and the central region surrounded by the respective portions 101 to 104 may be a flow path through which the liquid phase working fluid 11 flows.

此種情況下也與作為上述之開口部10A之槽縫10C同樣,槽縫10D宜為作成含括覆蓋遮罩10之筒狀凸部6A之側面之部分的全面而均一地設置。又,槽縫10D宜為下側部分(第1部分)9A之側較殼體9之上側部分(第2部分)9B之側成為較廣之幅度。又,遮罩10宜作成設有槽縫10D,以使筒狀凸部6A之側面之接液面6X之面積為筒狀凸部6A之側面之面積之50%以下。 In this case as well as the slit 10C as the opening 10A described above, the slit 10D is preferably provided uniformly and uniformly for the portion including the side surface of the cylindrical convex portion 6A covering the mask 10. Further, the slit 10D is preferably such that the side of the lower portion (first portion) 9A is wider than the side of the upper portion (second portion) 9B of the casing 9. Further, the mask 10 is preferably provided with a slit 10D such that the area of the liquid contact surface 6X on the side surface of the cylindrical convex portion 6A is 50% or less of the area of the side surface of the cylindrical convex portion 6A.

又,例如,如圖16(A)、圖16(B)所示,遮罩10亦可作成具有液相作動流體11流動於覆蓋筒狀凸部6A之側面之部分的溝10F。此種情況下,只要設置複數個溝10F即可。而且,與作為上述之開口部10A之孔10B或槽縫10C同樣,該等溝10F宜作成含括覆蓋遮罩10之筒狀凸部6A之側面之部分的全面而均一地設置。又,該等溝10F宜為下側部 分(第1部分)9A之側比殼體9之上側部分(第2部分)9B之側的幅度較寬。又,遮罩10宜為設置有溝10F,使筒狀凸部6A之側面之接液面6X之面積為筒狀凸部6A之側面之面積之50%以下。 Further, for example, as shown in FIGS. 16(A) and 16(B), the mask 10 may be formed as a groove 10F having a portion in which the liquid phase working fluid 11 flows on the side surface covering the cylindrical convex portion 6A. In this case, it is only necessary to provide a plurality of grooves 10F. Further, similarly to the hole 10B or the slit 10C as the above-described opening portion 10A, the grooves 10F are preferably provided integrally and uniformly including a portion including the side surface of the cylindrical convex portion 6A covering the mask 10. Moreover, the grooves 10F should be the lower side The side of the minute (first part) 9A is wider than the side of the upper side portion (second portion) 9B of the casing 9. Further, the mask 10 is preferably provided with a groove 10F such that the area of the liquid contact surface 6X on the side surface of the cylindrical convex portion 6A is 50% or less of the area of the side surface of the cylindrical convex portion 6A.

又,在此,遮罩10於其端面具有突起10G,並且插入到鄰接之4個筒狀凸部6A所包圍之區域,使得該突起10G為下方,藉此於多孔質體6之平板狀部分6B之間形成間隙。這是因為多孔質體6之平板狀部分6B之側成為高溫,蒸發量變多之故,因此在此容易供給液相作動流體11。 Here, the mask 10 has the protrusion 10G at its end surface, and is inserted into a region surrounded by the adjacent four cylindrical protrusions 6A so that the protrusion 10G is below, thereby being in the flat portion of the porous body 6. A gap is formed between 6B. This is because the side of the flat portion 6B of the porous body 6 is at a high temperature, and the amount of evaporation is increased. Therefore, the liquid phase working fluid 11 is easily supplied thereto.

再者,圖16(A)、圖16(B)中,遮罩10是做成插入到鄰接之4個筒狀凸部6A所包圍的區域,但不限定於此,亦可作成於外周面具有供液相作動流體11流動之溝10F之圓筒狀的遮罩,並且被覆於筒狀凸部6A。 Further, in FIGS. 16(A) and 16(B), the mask 10 is inserted into a region surrounded by the adjacent four cylindrical convex portions 6A. However, the present invention is not limited thereto, and may be formed on the outer peripheral surface. A cylindrical mask having a groove 10F through which the liquid phase working fluid 11 flows is applied to the cylindrical convex portion 6A.

再者,如上述,含括覆蓋遮罩10之筒狀凸部6A之側面之部分的全面均一地設置孔10B、槽縫10C、10D、溝10F,藉此可縮短液相作動流體11在多孔質體6之內部移動之距離,並可減少壓力損失。 Further, as described above, the hole 10B, the slits 10C, 10D, and the groove 10F are provided integrally and uniformly including the portion covering the side surface of the cylindrical projection 6A of the mask 10, whereby the liquid-phase actuating fluid 11 can be shortened. The distance within the body 6 is moved and the pressure loss can be reduced.

又,如圖9所示,遮罩10亦可為具有供液相作動流體11流動之孔(細孔)的多孔質體遮罩10H。此種情況下,多孔質體遮罩10H宜為空孔率50%以下者。再者,筒狀凸部6A之接液面6X的面積愈大,宜使用空孔率較低者,若是後述之具體的構成例,宜使用例如空孔率為35%左右或在其以下者。又,多孔質體遮罩10H宜使用孔的直徑較大者,以減少壓力損失。例如,多孔質體遮罩10H宜為孔之直徑(多 孔質徑;細孔徑)大於多孔質體6(毛細結構)。這是因為,為了得到毛細管力,作為毛細結構之多孔質體6宜使用徑之直徑較小者,相對於此,為了降低流動阻力,使流動性更佳,多孔質體遮罩10H宜使用孔之直徑較大者之故。例如,若於多孔質體6使用多孔質之PTFE樹脂成形體(樹脂製多孔質體)時,多孔質體遮罩10H只要使用多孔質徑比其大之多孔質之PTFE樹脂成形體(樹脂製多孔質體)即可。具體而言,多孔質體遮罩10H宜為孔之直徑在50μm以上。 Further, as shown in FIG. 9, the mask 10 may be a porous body mask 10H having pores (fine pores) through which the liquid phase working fluid 11 flows. In this case, the porous body mask 10H is preferably a porosity of 50% or less. In addition, as the area of the liquid contact surface 6X of the cylindrical convex portion 6A is larger, it is preferable to use a porosity having a lower porosity. For a specific configuration example to be described later, for example, a porosity of about 35% or less is preferably used. . Further, it is preferable that the porous body mask 10H has a larger diameter of the hole to reduce the pressure loss. For example, the porous body mask 10H should be the diameter of the hole (more The pore diameter; pore diameter) is larger than that of the porous body 6 (capillary structure). This is because, in order to obtain the capillary force, the diameter of the porous body 6 as the capillary structure is preferably smaller. In order to reduce the flow resistance, the fluidity is better, and the porous body mask 10H should preferably use a hole. The larger diameter is the reason. For example, when a porous PTFE resin molded body (a porous resin body) is used for the porous body 6, the porous body cover 10H is made of a porous PTFE resin molded body having a larger porous diameter (resin made of resin). The porous body can be used. Specifically, the porous body mask 10H preferably has a diameter of 50 μm or more.

又,複數個遮罩10是例如圖17所示,宜為一體化。藉此,可減少零件數,壓低成本。再者,在此,雖然是以圖13所示之遮罩10為一體化者為例,但不限定於此,亦可為上述之其他遮罩10一體化者。 Further, the plurality of masks 10 are, for example, as shown in Fig. 17, and are preferably integrated. Thereby, the number of parts can be reduced and the cost can be reduced. Here, although the mask 10 shown in FIG. 13 is exemplified as an integrator, the present invention is not limited thereto, and the other masks 10 described above may be integrated.

又,遮罩10之材料為低熱傳導率之材料,若使用例如PTFE樹脂,其熱傳導率為約0.2~約0.3W/mK左右。也就是說,遮罩10之材料為具有0.5W/mK以下之熱傳導率的材料(樹脂材料)。例如,遮罩10之材料宜為熱傳導率比液相作動流體11低之材料。在此,若液相作動流體11為水時,由於其熱傳導率為約0.6W/mK,因此遮罩10之材料宜為具有熱傳導率比0.6W/mK低之材料。又,例如,若液相作動流體11為乙醇或丙酮時,由於其熱傳導率為約0.2W/mK,因此遮罩10之材料宜為具有熱傳導率低於約0.2W/mK之材料。 Further, the material of the mask 10 is a material having a low thermal conductivity. When a PTFE resin is used, for example, the thermal conductivity is about 0.2 to about 0.3 W/mK. That is, the material of the mask 10 is a material (resin material) having a thermal conductivity of 0.5 W/mK or less. For example, the material of the mask 10 is preferably a material having a lower thermal conductivity than the liquid phase operating fluid 11. Here, when the liquid phase operating fluid 11 is water, since the thermal conductivity is about 0.6 W/mK, the material of the mask 10 is preferably a material having a thermal conductivity lower than 0.6 W/mK. Further, for example, when the liquid phase operating fluid 11 is ethanol or acetone, since the thermal conductivity is about 0.2 W/mK, the material of the mask 10 is preferably a material having a thermal conductivity of less than about 0.2 W/mK.

因此,根據本實施形態之蒸發器、冷卻裝置及電子裝置,減少由多孔質體6往液相作動流體11之熱洩漏,具 有可抑制冷卻性能之降低,並且得到安定之冷卻性能的優點。也就是說,可大幅度地提高迴路式熱管1之冷卻性能,並且安定地冷卻設置在電子裝置之發熱零件,可使電子裝置高性能化,並且可提高信賴性。 Therefore, according to the evaporator, the cooling device, and the electronic device of the present embodiment, heat leakage from the porous body 6 to the liquid phase working fluid 11 is reduced. There is an advantage that the reduction in cooling performance can be suppressed and the cooling performance of stability can be obtained. In other words, the cooling performance of the loop heat pipe 1 can be greatly improved, and the heat generating components provided in the electronic device can be cooled stably, and the electronic device can be improved in performance and reliability can be improved.

以下,就作為本實施形態之冷卻裝置1之迴路式熱管之具體構成例進行說明。 Hereinafter, a specific configuration example of the loop type heat pipe of the cooling device 1 of the present embodiment will be described.

首先,蒸發器2是令其外形尺寸約75mm×約75mm,令高度為約25mm。由於該蒸發器2之殼體9之下側部分9A熱連接於發熱體51X,因此作成熱傳導率較高的銅製,殼體9之上側部分9B作成熱傳導率比較低的不銹鋼製。藉此,來自發熱體51X之熱經由殼體9之下側部分9A而難以傳熱到液相作動流體。進而,在此,在殼體9之上側部分9B之內壁面,即直接接觸於液相作動流體之液室8的壁面安裝非多孔質之PTFE(聚四氟乙烯),並且隔絕從殼體9之上側部分9B往液相作動流體之熱漏洩。 First, the evaporator 2 has an outer dimension of about 75 mm x about 75 mm and a height of about 25 mm. Since the lower side portion 9A of the casing 9 of the evaporator 2 is thermally connected to the heating element 51X, it is made of copper having a high thermal conductivity, and the upper side portion 9B of the casing 9 is made of stainless steel having a relatively low thermal conductivity. Thereby, heat from the heat generating body 51X is hard to be transferred to the liquid phase actuating fluid via the lower side portion 9A of the casing 9. Further, here, non-porous PTFE (polytetrafluoroethylene) is attached to the inner wall surface of the upper side portion 9B of the casing 9, that is, the wall surface of the liquid chamber 8 which is in direct contact with the liquid phase working fluid, and is insulated from the casing 9 The upper side portion 9B leaks heat to the liquid phase working fluid.

而且,為了安裝多孔質體6,在殼體9之下側部分9A之底面(銅底部)設置縱向6個、横向6個且排列成格子狀而合計36個之突起部(圓柱;凸部;銅銷)9C(參照圖2),使各突起部9C之尺寸為直徑(外徑)φ約5mm、高度約15mm。 Further, in order to mount the porous body 6, a bottom surface (copper bottom portion) of the lower side portion 9A of the casing 9 is provided with six projections in the longitudinal direction, six in the horizontal direction, and arranged in a lattice shape, and a total of 36 projections (cylindrical; convex portions; The copper pin 9C (see Fig. 2) has a size of each of the projections 9C of a diameter (outer diameter) φ of about 5 mm and a height of about 15 mm.

多孔質體6是使用了模型之成形品,在此,作為空孔率約40%,多孔質徑之平均值為約10μm之多孔質之PTFE(聚四氟乙烯)樹脂成形體(樹脂製多孔質體)。於該多孔質體6設置縱向6個、横向6個、排列成格子狀而合計36個之圓筒 狀凸部(筒狀凸部)6A。該等圓筒狀凸部6A之尺寸是定為外徑φ約9mm、內徑φ約7mm。該等圓筒狀凸部6A之中心軸,即,設置於圓筒狀凸部6A之背面側之插入孔6C之中心軸分別與設置在殼體9之下側部分9A之各突起部9C的中心軸一致。而且,在設置於該等圓筒狀凸部6A之背面側之插入孔6C分別插入設置在殼體9之下側部分9A之底面之各突起部9C,而將多孔質體6安裝於殼體9之下側部分(參照圖1、圖2)。 The porous body 6 is a molded article using a mold. Here, a porous PTFE (polytetrafluoroethylene) resin molded body having a porosity of about 40% and an average value of a porous diameter of about 10 μm is used. Platinum). The porous body 6 is provided with six cylinders in the longitudinal direction, six in the lateral direction, and arranged in a lattice shape and a total of 36 cylinders. Concave convex portion (cylindrical convex portion) 6A. The cylindrical convex portions 6A have a size of about 9 mm in outer diameter φ and about 7 mm in inner diameter φ. The central axis of the cylindrical convex portion 6A, that is, the central axis of the insertion hole 6C provided on the back side of the cylindrical convex portion 6A, and the respective projections 9C provided at the lower side portion 9A of the casing 9 are respectively provided. The center axis is consistent. Further, the insertion holes 6C provided on the back side of the cylindrical convex portions 6A are respectively inserted into the respective projections 9C provided on the bottom surface of the lower side portion 9A of the casing 9, and the porous body 6 is attached to the casing. 9 lower side part (refer to Fig. 1, Fig. 2).

在此,設置於該等圓筒狀凸部6A之背面側之插入孔6C的深度約13mm。藉此,在設置於該等圓筒狀凸部6A之背面側之插入孔6C分別插入設置於殼體9之下側部分9A之底面之各突起部9C,而將多孔質體6安裝於殼體9之下側部分9A時,殼體9之底面(即,殼體9之下側部分9A之底面)與多孔質體6之背面(即,多孔質體6之平板狀部分6B之背面)之間形成約2mm之空間,並將其作為蒸氣室7(參照圖1)。 Here, the depth of the insertion hole 6C provided on the back side of the cylindrical convex portion 6A is about 13 mm. Thereby, the insertion holes 6C provided on the back side of the cylindrical convex portions 6A are respectively inserted into the respective projections 9C provided on the bottom surface of the lower side portion 9A of the casing 9, and the porous body 6 is attached to the casing. The lower surface portion 9A of the body 9 has the bottom surface of the casing 9 (i.e., the bottom surface of the lower side portion 9A of the casing 9) and the back surface of the porous body 6 (i.e., the back surface of the flat portion 6B of the porous body 6). A space of about 2 mm is formed between them as a vapor chamber 7 (refer to Fig. 1).

又,設置於該等圓筒狀凸部6A之背面側之插入孔6C之直徑比殼體9之突起部9C之外徑尺寸小約50μm~約200μm左右。藉此,將多孔質體6安裝於殼體9之下側部分9A時,可得到足夠的密合性。 Further, the diameter of the insertion hole 6C provided on the back side of the cylindrical convex portion 6A is smaller than the outer diameter of the projection 9C of the casing 9 by about 50 μm to about 200 μm. Thereby, when the porous body 6 is attached to the lower side portion 9A of the casing 9, sufficient adhesion can be obtained.

又,在插入孔6C之側面(內壁),均一地設置幅度約1mm、深度約1mm、間距約2mm之朝深度方向(垂直方向)延伸之溝(凹槽)6D(參照圖1、圖2)。藉此,形成於該等溝6D之間的空間,即,形成於插入孔6C之側面之溝6D的底面與 殼體9之突起部9C之側面之間的空間也發揮作為蒸氣室7之一部分的功能。如此,插入孔6C之側面成為散熱片構造,散熱片前端密著於殼體9之突起部9C之側面。而且,從多孔質體6之上方供給之液相作動流體11通過多孔質體6之筒狀凸部6A的內部,設置於插入孔6C之側面,且在接觸於殼體9之突起部9C之散熱片前端蒸發、氣化,在散熱片前端發生之蒸氣是在散熱片間之溝朝下方流動,通過多孔質體6之背面與殼體9之底面之間的空間,到達蒸氣管4。 Further, on the side surface (inner wall) of the insertion hole 6C, a groove (groove) 6D extending in the depth direction (vertical direction) having an amplitude of about 1 mm, a depth of about 1 mm, and a pitch of about 2 mm is uniformly provided (refer to Figs. 1 and 2). ). Thereby, a space formed between the grooves 6D, that is, a bottom surface of the groove 6D formed on the side of the insertion hole 6C is The space between the side faces of the projections 9C of the casing 9 also functions as a part of the steam chamber 7. Thus, the side surface of the insertion hole 6C serves as a fin structure, and the tip end of the fin is adhered to the side surface of the projection 9C of the casing 9. Further, the liquid-phase working fluid 11 supplied from above the porous body 6 passes through the inside of the cylindrical convex portion 6A of the porous body 6, and is provided on the side surface of the insertion hole 6C, and is in contact with the projection 9C of the casing 9. The front end of the fin is evaporated and vaporized, and the vapor generated at the tip end of the fin flows downward in the groove between the fins, and reaches the vapor tube 4 through the space between the back surface of the porous body 6 and the bottom surface of the casing 9.

而且,藉在安裝有多孔質體6之殼體9的下側部分9A結合殼體9之上側部分9B,在多孔質體6收納於殼體9內之狀態下,多孔質體6,即從多孔質體6之圓筒狀凸部6A之上面到殼體9之上側部分9B之下面之間形成約5mm之高度之內部空間,將該內部空間及多孔質體6之複數個筒狀凸部6A之間的空間作為兼具貯液槽之液室8(參照圖1)。 Further, the lower side portion 9A of the casing 9 to which the porous body 6 is attached is coupled to the upper side portion 9B of the casing 9, and the porous body 6 is housed in the casing 9 in a state where the porous body 6 is detached. An inner space of a height of about 5 mm is formed between the upper surface of the cylindrical convex portion 6A of the porous body 6 and the lower surface of the upper side portion 9B of the casing 9, and the inner space and the plurality of cylindrical convex portions of the porous body 6 are formed. The space between 6A serves as a liquid chamber 8 having a liquid storage tank (see Fig. 1).

如此製作之蒸發器2之蒸氣室7(即,規定蒸發器2之蒸氣室7之殼體9的下側部分9A)與冷凝器3之入口以蒸氣管4連接(參照圖3)。又,蒸發器2之液室8(即,規定蒸發器2之液室8之殼體9的上側部分9B)與冷凝器3之出口以液管5連接(參照圖3)。 The vapor chamber 7 of the evaporator 2 thus produced (that is, the lower portion 9A of the casing 9 defining the vapor chamber 7 of the evaporator 2) is connected to the inlet of the condenser 3 by a vapor tube 4 (refer to Fig. 3). Further, the liquid chamber 8 of the evaporator 2 (that is, the upper portion 9B of the casing 9 defining the liquid chamber 8 of the evaporator 2) is connected to the outlet of the condenser 3 by a liquid pipe 5 (see Fig. 3).

在此,蒸氣管4為外徑約6mm、內徑約5mm的銅管,且其長度約300mm。又,液管5為外徑約4mm、內徑約3mm之銅管,其長度約200mm。又,冷凝器3的尺寸為幅度約150mm、高度約50mm、長度約45mm。在此,將鋁製平板散熱片(散熱扇57)歛合安裝於設置在冷凝器3的冷凝管(參照圖3)。 該冷凝管使用外徑約6.35mm之銅製凹槽管,鋁製平板散熱片57的厚度約0.2mm、間距約1.5mm。 Here, the vapor tube 4 is a copper tube having an outer diameter of about 6 mm and an inner diameter of about 5 mm, and has a length of about 300 mm. Further, the liquid pipe 5 is a copper pipe having an outer diameter of about 4 mm and an inner diameter of about 3 mm, and has a length of about 200 mm. Further, the condenser 3 has a size of about 150 mm, a height of about 50 mm, and a length of about 45 mm. Here, the aluminum flat fin (heat radiating fan 57) is attached to the condensing duct provided in the condenser 3 (see FIG. 3). The condensing tube uses a copper grooved tube having an outer diameter of about 6.35 mm, and the aluminum flat plate fin 57 has a thickness of about 0.2 mm and a pitch of about 1.5 mm.

又,作動流體為乙醇,並且在藉由真空泵將迴路式熱管1之內部真空抽引而成為真空狀態後,封入預定量之已真空脫泡之飽和狀態的乙醇,並密封。 Further, the actuating fluid is ethanol, and after the internal vacuum of the loop type heat pipe 1 is evacuated by a vacuum pump to be in a vacuum state, a predetermined amount of ethanol which has been vacuum defoamed in a saturated state is sealed and sealed.

另,在具有如上述之構造的蒸發器2時,為了提高冷卻性能,如圖5(A)所示,在殼體9之下側部分9A之底面設置突起部9C(銷構造),並於其嵌入多孔質體6之筒狀凸部6A,而擴大蒸發面積,因此與蒸發面6Y表裏一體之接液面6X的面積也擴大。因此,多孔質體6與液相作動流體11的熱交換面積大,又,流入多孔質體6之液相作動流體11的流速也大,所以從多孔質體6往液相作動流體11之熱洩漏非常大。由於該影響,多孔質體6之上方之液體之作動流體11的溫度(液溫)上昇,並且供給到多孔質體6之液相作動流體11的溫度變高,而液相作動流體11蒸發、氣化之氣相作動流體的溫度也變高。因此,具有突起部9C之殼體9的溫度也成高溫,無法充分冷卻作為發熱零件之CPU51X。 Further, in the case of the evaporator 2 having the above configuration, in order to improve the cooling performance, as shown in Fig. 5(A), a projection 9C (pin configuration) is provided on the bottom surface of the lower side portion 9A of the casing 9, and Since the cylindrical convex portion 6A of the porous body 6 is fitted and the evaporation area is enlarged, the area of the liquid contact surface 6X integrated with the surface of the evaporation surface 6Y is also enlarged. Therefore, the heat exchange area between the porous body 6 and the liquid phase working fluid 11 is large, and the flow velocity of the liquid phase working fluid 11 flowing into the porous body 6 is also large, so that the heat of the fluid 11 is driven from the porous body 6 to the liquid phase. The leak is very large. Due to this influence, the temperature (liquid temperature) of the liquid working fluid 11 above the porous body 6 rises, and the temperature of the liquid phase working fluid 11 supplied to the porous body 6 becomes high, and the liquid phase working fluid 11 evaporates. The temperature of the gasified gas phase actuating fluid also becomes high. Therefore, the temperature of the casing 9 having the projections 9C is also high, and the CPU 51X as a heat generating component cannot be sufficiently cooled.

因此,作為第1具體例,為了防止從多孔質體6往液相作動流體11之熱流,因此設有於側面均一地設置直徑約1mm之孔10B的遮罩10(毛細結構遮罩;隔熱遮罩),使上述之多孔質體6之各筒狀凸部6C開口率為約35%[參照圖1、圖2、圖5(B)]。 Therefore, as a first specific example, in order to prevent the heat flow from the porous body 6 to the liquid phase working fluid 11, a mask 10 having a hole 10B having a diameter of about 1 mm uniformly provided on the side surface is provided (capillary structure mask; heat insulation) In the mask, the opening ratio of each of the cylindrical convex portions 6C of the porous body 6 described above is about 35% [see FIGS. 1 , 2 , and 5 (B)].

在此,遮罩10於其材料使用低熱傳導率(在此為約0.23W/mK),且耐熱性優異之PTFE樹脂(非多孔質體), 並且令其厚度為約0.8mm。藉設置該遮罩10,多孔質體6與液相作動流體11直接接觸的面積(接液面積)可削減約35%,且流入多孔質體6之液相作動流體11之流速可增加約3倍。 Here, the mask 10 uses a PTFE resin (non-porous body) having a low thermal conductivity (here, about 0.23 W/mK) and excellent heat resistance, And the thickness is about 0.8 mm. By providing the mask 10, the area (the liquid receiving area) of the porous body 6 in direct contact with the liquid phase working fluid 11 can be reduced by about 35%, and the flow rate of the liquid phase working fluid 11 flowing into the porous body 6 can be increased by about 3 Times.

接著,進行冷卻加熱器的實驗,該加熱器是使用具有設置了如此之遮罩10之蒸發器2的迴路式熱管1而模製電子裝置內之發熱零件51X的加熱器。又,為了比較,也進行使用具有未設置遮罩之蒸發器之迴路式熱管的冷卻實驗。 Next, an experiment of cooling the heater which is a heater for molding the heat generating component 51X in the electronic device using the loop type heat pipe 1 having the evaporator 2 provided with such a mask 10 is performed. Further, for comparison, a cooling experiment using a loop type heat pipe having an evaporator without a mask was also performed.

在此,圖6(A)是顯示進行該等冷卻實驗,並且測定了加熱器溫度,即,蒸發器底面溫度(殼體底面溫度)的結果。 Here, FIG. 6(A) shows the results of performing the cooling experiments and measuring the heater temperature, that is, the evaporator bottom surface temperature (case bottom temperature).

再者,圖6(A)中,實線A是顯示蒸發器2的底面溫度,該蒸發器是與使用具有設置了如上述之遮罩10之蒸發器2的迴路式熱管1冷卻加熱器時之加熱器相接。又,圖6(A)中,實線B是顯示蒸發器之底面溫度,該蒸發器是與使用具有未設置遮罩之蒸發器的迴路式熱管冷卻加熱器時之加熱器相接。 Further, in Fig. 6(A), the solid line A is a temperature indicating the bottom surface of the evaporator 2, and the evaporator is used to cool the heater using the loop type heat pipe 1 having the evaporator 2 provided with the mask 10 as described above. The heaters are connected. Further, in Fig. 6(A), the solid line B is a temperature indicating the bottom surface of the evaporator, and the evaporator is connected to a heater when a loop type heat pipe cooling heater having an evaporator having no mask is provided.

如圖6(A)所示,使用具有設置了如上述之遮罩10之蒸發器2的迴路式熱管1時,在全部的發熱量中,與使用了具有未設置遮罩之蒸發器的迴路式熱管的情況比較,蒸發器底面溫度、即加熱器溫度可減少前後約10℃。 As shown in Fig. 6(A), when the loop type heat pipe 1 having the evaporator 2 provided with the above-described mask 10 is used, a circuit having an evaporator having no mask is used in all of the calorific value. In the case of a heat pipe, the evaporator bottom temperature, that is, the heater temperature, can be reduced by about 10 ° C before and after.

又,由於考慮到兼具貯液槽之蒸發器2的上面溫度反映了液相作動流體11之溫度,因此連測定蒸發器2之上面溫度 (殼體上面溫度)時,也得到如圖6(B)所示之測定結果。 Further, since it is considered that the temperature of the upper surface of the evaporator 2 having the liquid storage tank reflects the temperature of the liquid phase operating fluid 11, the temperature above the evaporator 2 is measured. (The temperature above the casing) also obtained the measurement result as shown in Fig. 6 (B).

再者,圖6(B)中,實線A顯示了使用具有設置了如上述之遮罩10之蒸發器2的迴路式熱管1冷卻加熱器時之蒸發器2的上面溫度。又,圖6(B)中,實線B是顯示使用具有未設置遮罩之蒸發器的迴路式熱管冷卻加熱器時之蒸發器的上面溫度。 Further, in Fig. 6(B), the solid line A shows the upper surface temperature of the evaporator 2 when the heater is cooled using the loop type heat pipe 1 having the evaporator 2 provided with the mask 10 as described above. Further, in Fig. 6(B), the solid line B is the upper surface temperature of the evaporator when the loop type heat pipe cooling heater having the evaporator without the mask is used.

如圖6(B)所示,使用具有設置了如上述之遮罩10之蒸發器2的迴路式熱管1時,在所有的發熱量中,相較於使用了具有未設置遮罩之蒸發器的迴路式熱管的情況,蒸發器上面溫度低約5~約8℃左右,此意味著液相作動流體11之溫度減少。 As shown in Fig. 6(B), when the loop type heat pipe 1 having the evaporator 2 provided with the above-described mask 10 is used, among all the calorific values, an evaporator having no mask is used as compared with the case where the evaporator is provided In the case of a loop type heat pipe, the temperature above the evaporator is about 5 to about 8 ° C, which means that the temperature of the liquid phase actuating fluid 11 is reduced.

如此,藉使用具有設置了如上述之遮罩10之蒸發器2的迴路式熱管1,可確認:減少液相作動流體11之溫度,並且可減少從多孔質體6往液相作動流體11之熱洩漏。又,可確認:可減少加熱器溫度,可抑制冷卻性能之降低,得到安定之冷卻性能。 Thus, by using the loop type heat pipe 1 having the evaporator 2 provided with the mask 10 as described above, it can be confirmed that the temperature of the liquid phase actuating fluid 11 is reduced, and the flow of the fluid 11 from the porous body 6 to the liquid phase can be reduced. Heat leaks. Further, it was confirmed that the heater temperature can be reduced, the cooling performance can be suppressed from being lowered, and the cooling performance can be stabilized.

又,第2具體例是在上述之多孔質體6之各筒狀凸部6A設置,於側面設置直徑約0.5mm~約1.5mm之孔10B,使得開口率平均為約35%之遮罩10,即,使開口率分布具有之遮罩10(毛細結構遮罩;隔熱遮罩)(參照圖7),以防止從多孔質體6往液相作動流體11之熱流。 Further, in the second specific example, the cylindrical convex portion 6A of the porous body 6 is provided, and the hole 10B having a diameter of about 0.5 mm to about 1.5 mm is provided on the side surface so that the opening ratio is about 35% on average. That is, the mask 10 (capillary structure mask; heat insulating mask) (see FIG. 7) having the aperture ratio distribution is provided to prevent the heat flow from the porous body 6 to the liquid phase.

在此,遮罩10於其材料使用低熱傳導率(在此為約0.23W/mK),且耐熱性優異之PTFE樹脂(非多孔質體),其厚度為約0.8mm。又,由於殼體9之突起部9C(銅銷)的 溫度在基底部分較高,前端部分較低,因此推測蒸發量為突起部9C之基底部分較多,前端部分較少。因此,在殼體9之突起部9C之基底之側使遮罩10之開口率為55%(開口部直徑約1.5mm),在中央附近令遮罩10之開口率為35%(開口部直徑1.0mm),在殼體9之突起部9C之前端之側令遮罩10之開口率為15%(開口部直徑約0.5mm),遮罩10之開口率之平均在35%左右,如此在突起部9C之高度方向分布持有遮罩10之開口率。藉設置該遮罩,多孔質體6與液相作動流體1直接接觸之面積(接液面積)全體可削減約35%,且可將流入多孔質體6之液相作動流體11的流速均一地增加到約3倍。如此,可使流入多孔質體6之筒狀凸部6A之接液面6X之液相作動流體11的流速在高度方向上大略均一,並且可使從多孔質體6之表面往液相作動流體11之熱洩漏在高度方向上一樣減少。 Here, the mask 10 uses a PTFE resin (non-porous body) having a low thermal conductivity (here, about 0.23 W/mK) and excellent heat resistance, and has a thickness of about 0.8 mm. Also, due to the projection 9C (copper pin) of the housing 9 Since the temperature is higher in the base portion and the front end portion is lower, it is presumed that the evaporation amount is larger in the base portion of the projection portion 9C and less in the front end portion. Therefore, the opening ratio of the mask 10 is 55% (opening diameter: about 1.5 mm) on the side of the base of the projection 9C of the casing 9, and the opening ratio of the mask 10 is 35% (opening diameter) near the center. 1.0 mm), the side of the front end of the projection 9C of the casing 9 has an opening ratio of 15% (opening diameter of about 0.5 mm), and the average opening ratio of the mask 10 is about 35%. The height direction distribution of the protrusions 9C holds the aperture ratio of the mask 10. By providing the mask, the area (the liquid-collecting area) in which the porous body 6 is in direct contact with the liquid-phase fluid 1 can be reduced by about 35%, and the flow rate of the liquid-phase fluid 11 flowing into the porous body 6 can be uniformly. Increase to about 3 times. Thus, the flow velocity of the liquid phase working fluid 11 flowing into the liquid contact surface 6X of the cylindrical convex portion 6A of the porous body 6 can be made substantially uniform in the height direction, and the fluid can be made to flow from the surface of the porous body 6 to the liquid phase. The heat leak of 11 is reduced as much in the height direction.

而且,進行冷卻加熱器的實驗,該加熱器是使用具有設置了如此之遮罩10之蒸發器2的迴路式熱管1,模製電子裝置內之發熱零件51X的加熱器。又,為了比較,也進行使用了具有未設置遮罩之蒸發器的迴路式熱管的冷卻實驗。 Further, an experiment of cooling the heater which uses a loop type heat pipe 1 having the evaporator 2 provided with such a mask 10 to mold the heat generating component 51X in the electronic device is performed. Further, for comparison, a cooling experiment using a loop type heat pipe having an evaporator without a mask was also performed.

在此,圖8(A)顯示了進行該等冷卻實驗,測定了加熱器溫度,即蒸發器底面溫度(殼體底面溫度)的結果。再者,圖8(A)中,實線A顯示了蒸發器之底面溫度,該蒸發器是與使用設置了如上述之遮罩10之蒸發器2的迴路式熱管1冷卻時的加熱器相接。又,圖8(A)中,實線B顯 示蒸發器之底面溫度,該蒸發器是與使用具有未設置遮罩之蒸發器的迴路式熱管冷卻加熱器時之加熱器相接。 Here, FIG. 8(A) shows the results of performing the cooling experiments and measuring the heater temperature, that is, the evaporator bottom surface temperature (the bottom surface temperature of the casing). Further, in Fig. 8(A), the solid line A shows the temperature of the bottom surface of the evaporator, which is the heater phase when cooled by the loop type heat pipe 1 using the evaporator 2 provided with the mask 10 as described above. Pick up. Also, in Figure 8(A), the solid line B is displayed. The bottom surface temperature of the evaporator is shown, which is connected to a heater when a loop type heat pipe cooling heater having an evaporator without a mask is used.

如圖8(A)所示,使用具有設置了如上述之遮罩10之蒸發器2的迴路式熱管1時,在所有的發熱量中,相較於使用了具有未設置遮罩之蒸發器的迴路式熱管的情況,蒸發器底面溫度,即加熱器溫度可減少前後約12℃。 As shown in Fig. 8(A), when the loop type heat pipe 1 having the evaporator 2 provided with the above-described mask 10 is used, among all the calorific values, an evaporator having no mask is used as compared with the case where the evaporator is provided In the case of a loop heat pipe, the evaporator bottom temperature, that is, the heater temperature, can be reduced by about 12 ° C before and after.

又,由於考量到兼具貯液槽之蒸發器2的上面溫度反映了液相作動流體11之溫度,因此連測定蒸發器2之上面溫度(殼體上面溫度)時,也得到如圖8(B)所示之測定結果。再者,圖8(B)中,實線A是顯示使用具有設置了如上述之遮罩10之蒸發器2的迴路式熱管1冷卻加熱器時之蒸發器的上面溫度。又,圖8(B)中,實線B顯示了使用具有未設置遮罩之蒸發器的迴路式熱管冷卻加熱器時之蒸發器的上面溫度。 Further, since the temperature of the upper surface of the evaporator 2 having the liquid storage tank is considered to reflect the temperature of the liquid phase working fluid 11, the temperature of the upper surface of the evaporator 2 (the temperature above the casing) is measured, as shown in Fig. 8 ( B) The measurement results shown. Further, in Fig. 8(B), the solid line A is the upper surface temperature of the evaporator when the heater is cooled using the loop type heat pipe 1 having the evaporator 2 provided with the above-described mask 10. Further, in Fig. 8(B), the solid line B shows the upper temperature of the evaporator when the heater is cooled using a loop type heat pipe having an evaporator in which no mask is provided.

如圖8(B)所示,使用具有設置了如上述之遮罩10之蒸發器2的迴路式熱管1的態樣,在所有的發熱量中,相較於使用具有未設置遮罩之蒸發器的迴路式熱管的態樣,蒸發器上面溫度低約6~約9℃左右,此意味著液相作動流體11的溫度正在減少。 As shown in Fig. 8(B), using the loop type heat pipe 1 having the evaporator 2 provided with the mask 10 as described above, in all the calorific values, evaporation with no mask is provided as compared with the use. In the case of the loop type heat pipe, the temperature above the evaporator is about 6 to about 9 ° C, which means that the temperature of the liquid phase operating fluid 11 is decreasing.

如此,藉使用具有設置了如上述之遮罩10之蒸發器2的迴路式熱管1,可確認可減少液相作動流體11之溫度,並可減少從多孔質體6往液相作動流體11之熱洩漏。又,可確認可減少加熱器溫度,可抑制冷卻性能之降低,得到安定之冷卻性能。 Thus, by using the loop type heat pipe 1 having the evaporator 2 provided with the mask 10 as described above, it can be confirmed that the temperature of the liquid phase working fluid 11 can be reduced, and the flow of the fluid 11 from the porous body 6 to the liquid phase can be reduced. Heat leaks. Further, it was confirmed that the temperature of the heater can be reduced, and the reduction in cooling performance can be suppressed, and the cooling performance of stability can be obtained.

又,第3具體例是為了防止從多孔質體6往液相作動流體11之熱流,在上述之多孔質體6之各筒狀凸部6A設置了空孔率為約35%之多孔質體遮罩10H(毛細結構遮罩;隔熱遮罩)作為遮罩10(參照圖9)。在此,多孔質體遮罩10H於其材料使用低熱傳導率(在此為約0.23W/mK),耐熱性優異之PTFE樹脂(多孔質體),且其厚度為約0.8mm。在此,作為毛細結構之多孔質體6為了使作動流體流動,需要產生微細的多孔質徑產生的較大毛細管力,相對於此,遮罩10之多孔質體不需要產生毛細管力,由於液相作動流體11通過遮罩10時之壓力損失較小者有利於安定作動,因此多孔質徑宜為盡可能較大。因此,在此,多孔質體遮罩10H之多孔質徑為約100μm。藉設置該多孔質體遮罩10H,可將多孔質體6與液相作動流體11直接接觸之面積(接液面積)削減為約35%,且可將流入多孔質體6之液相作動流體11之流速增加到約3倍。 Further, in the third specific example, in order to prevent the heat flow from the porous body 6 to the liquid phase working fluid 11, a porous body having a porosity of about 35% is provided in each of the cylindrical convex portions 6A of the porous body 6 described above. A mask 10H (capillary structure mask; heat insulating mask) is used as the mask 10 (refer to FIG. 9). Here, the porous body mask 10H uses a PTFE resin (porous body) having a low thermal conductivity (here, about 0.23 W/mK) and excellent heat resistance, and has a thickness of about 0.8 mm. Here, the porous body 6 having the capillary structure needs to generate a large capillary force due to the fine porous diameter in order to flow the working fluid, whereas the porous body of the mask 10 does not need to generate capillary force due to the liquid. When the phase fluid 11 passes through the mask 10, the pressure loss is small, which is advantageous for the stable operation, and therefore the porous diameter is preferably as large as possible. Therefore, here, the porous body mask 10H has a porous diameter of about 100 μm. By providing the porous body mask 10H, the area (the liquid contact area) in which the porous body 6 is in direct contact with the liquid phase working fluid 11 can be reduced to about 35%, and the liquid phase flowing into the porous body 6 can be used as the working fluid. The flow rate of 11 increased to about 3 times.

接著,進行冷卻加熱器的實驗,該加熱器是使用具有設置了如此之遮罩10H之蒸發器2的迴路式熱管1模製出電子裝置內之發熱零件51X的加熱器。又,為了比較,也進行使用了具有未設置遮罩之蒸發器的迴路式熱管的冷卻實驗。 Next, an experiment of cooling the heater which molds the heat generating component 51X in the electronic device using the loop type heat pipe 1 having the evaporator 2 provided with such a mask 10H is performed. Further, for comparison, a cooling experiment using a loop type heat pipe having an evaporator without a mask was also performed.

在此,圖10(A)顯示了進行該等冷卻實驗,測定出加熱器溫度,即蒸發器底面溫度(殼體底面溫度)之結果。再者,圖10(A)中,實線A是顯示蒸發器2之底面溫度,該蒸發器是與使用具有設置了如上述之遮罩10H之蒸發器2 的迴路式熱管1冷卻加熱器之態樣的加熱器相接。又,圖10(A)中,實線B顯示蒸發器之底面溫度,該加熱器是與使用具有未設置遮罩之蒸發器的迴路式熱管冷卻加熱器時之之加熱器相接。 Here, FIG. 10(A) shows the results of performing the cooling experiments and measuring the heater temperature, that is, the evaporator bottom surface temperature (the bottom surface temperature of the casing). Further, in Fig. 10(A), the solid line A is the temperature of the bottom surface of the evaporator 2, and the evaporator is used with the evaporator 2 having the mask 10H as described above. The loop type heat pipe 1 is connected to the heater of the cooling heater. Further, in Fig. 10(A), the solid line B indicates the bottom surface temperature of the evaporator which is in contact with the heater when the loop type heat pipe cooling heater having the evaporator having no mask is provided.

如圖10(A)所示,使用具有設置了如上述之遮罩10H之蒸發器2的迴路式熱管1之態樣,在全部的發熱量中,相較於使用具有未設置遮罩之蒸發器之迴路式熱管的態樣,蒸發器底面溫度、即加熱器溫度可減少前後約10℃。 As shown in Fig. 10(A), in the case of the loop type heat pipe 1 having the evaporator 2 provided with the mask 10H as described above, in all the calorific values, evaporation with no mask is provided as compared with the use. In the case of the loop type heat pipe, the evaporator bottom temperature, that is, the heater temperature can be reduced by about 10 ° C before and after.

又,由於考慮到兼具貯液槽之蒸發器2的上面溫度(殼體上面溫度)反映了液相作動流體11之溫度,因此在測定蒸發器2之上面溫度時,也得到如圖10(B)所示之測定結果。再者,圖10(B)中,實線A是顯示使用具有設置了如上述之遮罩10H之蒸發器2的迴路式熱管1冷卻加熱器的態樣時之蒸發器2的上面溫度。又,圖10(B)中,實線B是顯示使用具有未設置遮罩之蒸發器的迴路式熱管冷卻加熱器時之蒸發器的上面溫度。 Further, since the temperature of the upper surface of the evaporator 2 (the temperature above the casing) reflecting the temperature of the liquid phase operating fluid 11 is considered, the temperature of the upper surface of the evaporator 2 is also measured as shown in Fig. 10 ( B) The measurement results shown. Further, in Fig. 10(B), the solid line A is the upper surface temperature of the evaporator 2 when the state in which the heater is cooled by the loop type heat pipe 1 having the evaporator 2 of the above-described mask 10H is used. Further, in Fig. 10(B), the solid line B is the upper surface temperature of the evaporator when the loop type heat pipe cooling heater having the evaporator having no mask is provided.

如圖10(B)所示,使用具有設置了如上述之遮罩10H之蒸發器2的迴路式熱管1時,在所有的發熱量中,相較於使用具有未設置遮罩之蒸發器的迴路式熱管的態樣,蒸發器上面溫度低約5~約8℃左右,這意味著液相作動流體11之溫度正在減少。 As shown in Fig. 10(B), when the loop type heat pipe 1 having the evaporator 2 provided with the mask 10H as described above is used, in all the calorific values, compared with the use of the evaporator having the mask not provided In the case of a loop type heat pipe, the temperature above the evaporator is about 5 to about 8 ° C, which means that the temperature of the liquid phase actuating fluid 11 is decreasing.

如此,藉使用具有設置了如上述之遮罩10H之蒸發器2的迴路式熱管1,可確認可減少液相作動流體11之溫度,並且可減少從多孔質體6往液相作動流體11之熱洩漏。 又,可確認可減少加熱器溫度,並可抑制冷卻性能之降低,得到安定之冷卻性能。 Thus, by using the loop type heat pipe 1 having the evaporator 2 provided with the above-described mask 10H, it can be confirmed that the temperature of the liquid phase actuating fluid 11 can be reduced, and the flow of the fluid 11 from the porous body 6 to the liquid phase can be reduced. Heat leaks. Further, it was confirmed that the heater temperature can be reduced, and the cooling performance can be suppressed from being lowered, and the cooling performance of stability can be obtained.

再者,本發明並不限定於如上述之實施形態所記載之構成,可在不脫離本發明之宗旨的範圍內作各種變形。 The present invention is not limited to the configuration described in the above embodiments, and various modifications can be made without departing from the spirit and scope of the invention.

2‧‧‧蒸發器 2‧‧‧Evaporator

4‧‧‧蒸氣管 4‧‧‧Vapor tube

5‧‧‧液管 5‧‧‧ liquid tube

6‧‧‧多孔質體 6‧‧‧Porous body

6A‧‧‧筒狀凸部 6A‧‧‧Cylindrical convex

6B‧‧‧平板狀部分 6B‧‧‧flat part

6C‧‧‧插入孔 6C‧‧‧ insertion hole

6D‧‧‧溝 6D‧‧‧Ditch

6X‧‧‧接液面 6X‧‧‧liquid level

7‧‧‧蒸氣室 7‧‧ ‧ vapor room

8‧‧‧液室 8‧‧‧ liquid room

9‧‧‧殼體 9‧‧‧Shell

9A‧‧‧下側部分 9A‧‧‧lower part

9B‧‧‧上側部分 9B‧‧‧ upper part

9C‧‧‧突起部 9C‧‧‧Protruding

9D‧‧‧蒸氣管連接用開口部 9D‧‧‧ opening for steam pipe connection

9E‧‧‧液管連接用開口部 9E‧‧‧ opening for liquid pipe connection

10‧‧‧遮罩 10‧‧‧ mask

10A‧‧‧開口部 10A‧‧‧ openings

10B‧‧‧孔 10B‧‧‧ hole

11‧‧‧液相作動流體 11‧‧‧Liquid actuating fluid

51,51X‧‧‧電子零件 51,51X‧‧‧Electronic parts

56‧‧‧導熱膏 56‧‧‧ Thermal paste

Claims (20)

一種蒸發器,其特徵在於包含有:具有複數個筒狀凸部之多孔質體;由前述多孔質體分隔之蒸氣室及液室;殼體,具有:連接蒸氣管並規定前述蒸氣室之第1部分;連接液管並規定前述液室之第2部分;及複數個突起部,設置於前述第1部分並往前述第2部分之側突出,嵌入於前述多孔質體之前述複數個筒狀凸部之各個,及複數個遮罩,用以覆蓋前述複數個筒狀凸部之各個的表面,使前述多孔質體之前述複數個筒狀凸部之接觸液相作動流體之接液面的面積變小。 An evaporator comprising: a porous body having a plurality of cylindrical convex portions; a vapor chamber and a liquid chamber separated by the porous body; and a casing having: a steam pipe connected to the steam chamber a first portion; a second portion of the liquid chamber connected to the liquid pipe; and a plurality of protrusions provided on the first portion and protruding toward the side of the second portion, and embedded in the plurality of cylindrical bodies of the porous body Each of the convex portions and the plurality of masks cover a surface of each of the plurality of cylindrical convex portions, so that the plurality of cylindrical convex portions of the porous body contact the liquid-contacting surface of the liquid-phase fluid The area becomes smaller. 如請求項1之蒸發器,其中前述遮罩在覆蓋前述筒狀凸部之側面的部分具有供前述液相作動流體流動之開口部。 The evaporator according to claim 1, wherein the portion of the mask covering the side surface of the cylindrical convex portion has an opening portion through which the liquid phase operating fluid flows. 如請求項2之蒸發器,其中前述開口部為複數個孔。 The evaporator of claim 2, wherein the opening portion is a plurality of holes. 如請求項3之蒸發器,其中前述孔是位於前述殼體之前述第1部分之側者比位於前述第2部分之側者大。 The evaporator of claim 3, wherein the hole is located on a side of the first portion of the casing and larger than a side located on the second portion. 如請求項2之蒸發器,其中前述開口部為複數個槽縫。 The evaporator of claim 2, wherein the opening portion is a plurality of slits. 如請求項1之蒸發器,其中前述遮罩具有:部分地覆蓋鄰接之4個前述筒狀凸部所含之第1筒狀凸部之側面的第1部分;部分地覆蓋前述4個筒狀凸部所含之第2筒狀凸部之側面的第2部分;部分地覆蓋前述4個筒狀凸部所含之第3筒狀凸部之側面的第3部分;及部分地覆蓋前述 4個筒狀凸部所含之第4筒狀凸部之側面的第4部分,並以一個一個設置於鄰接之4個前述遮罩之各個的4個部分覆蓋1個前述筒狀凸部之側面,且於前述4個部分之相互間形成有供液相作動流體流動之槽縫。 The evaporator of claim 1, wherein the mask has a first portion that partially covers a side surface of the first cylindrical convex portion included in the adjacent four cylindrical convex portions; and partially covers the four cylindrical shapes a second portion of the side surface of the second cylindrical convex portion included in the convex portion; a third portion partially covering the side surface of the third cylindrical convex portion included in the four cylindrical convex portions; and partially covering the aforementioned The fourth portion of the side surface of the fourth cylindrical convex portion included in the four cylindrical convex portions covers one of the cylindrical convex portions at four portions provided in each of the four adjacent masks On the side surface, a slit for flowing a liquid phase working fluid is formed between the four portions. 如請求項5或6之蒸發器,其中前述槽縫是位於前述殼體之前述第1部分之側者的幅度比位於前述殼體之前述第2部分之側者寬。 The evaporator of claim 5 or 6, wherein the slit is located on a side of the first portion of the casing and has a width wider than a side of the second portion of the casing. 如請求項2或5之蒸發器,其中前述遮罩設有前述開口部,使得前述筒狀凸部之側面之前述接液面的面積為前述筒狀凸部之側面之面積的50%以下。 The evaporator according to claim 2 or 5, wherein the mask is provided with the opening such that an area of the liquid receiving surface on a side surface of the cylindrical convex portion is 50% or less of an area of a side surface of the cylindrical convex portion. 如請求項6之蒸發器,其中前述槽縫設置成前述筒狀凸部之側面之前述接液面的面積為前述筒狀凸部之側面之面積的50%以下。 The evaporator of claim 6, wherein the slit is provided such that an area of the liquid contact surface on a side surface of the cylindrical convex portion is 50% or less of an area of a side surface of the cylindrical convex portion. 如請求項1之蒸發器,其中前述遮罩於覆蓋前述筒狀凸部之側面的部分具有供前述液相作動流體流動之溝。 The evaporator of claim 1, wherein the portion of the mask covering the side surface of the cylindrical convex portion has a groove for flowing the liquid phase working fluid. 如請求項10之蒸發器,其中前述溝是位於前述殼體之前述第1部分之側者的幅度比位於前述第2部分之側者寬。 The evaporator of claim 10, wherein the groove is located on a side of the first portion of the casing and has a width wider than a side of the second portion. 如請求項10或11之蒸發器,其中前述遮罩是設有前述溝,使得前述筒狀凸部之側面之前述接液面的面積為前述筒狀凸部之側面之面積的50%以下。 The evaporator of claim 10 or 11, wherein the mask is provided with the groove such that an area of the liquid contact surface on a side surface of the cylindrical convex portion is 50% or less of an area of a side surface of the cylindrical convex portion. 如請求項1之蒸發器,其中前述遮罩為具有供前述液相作動流體流動之孔的多孔質體遮罩。 An evaporator according to claim 1, wherein said mask is a porous body mask having pores for flowing said liquid phase actuating fluid. 如請求項13之蒸發器,其中前述多孔質體遮罩的空孔率 為50%以下。 The evaporator of claim 13, wherein the porosity of the porous body mask is It is 50% or less. 如請求項13或14之蒸發器,其中前述多孔質體遮罩是前述孔的直徑比前述多孔質體大。 The evaporator of claim 13 or 14, wherein said porous body mask is such that said pore has a larger diameter than said porous body. 如請求項13或14之蒸發器,其中前述多孔質體遮罩是前述孔的直徑為50μm以上。 The evaporator of claim 13 or 14, wherein the porous body mask is such that the pores have a diameter of 50 μm or more. 如請求項1至6、10、11、13、14中任一項之蒸發器,其中前述遮罩之材料是具有0.5W/mK以下之熱傳導率的材料。 The evaporator of any one of claims 1 to 6, 10, 11, 13, 14 wherein the material of the aforementioned mask is a material having a thermal conductivity of 0.5 W/mK or less. 如請求項1至6、10、11、13、14中任一項之蒸發器,其中前述複數個遮罩是呈一體化。 The evaporator of any one of claims 1 to 6, 10, 11, 13, 14 wherein the plurality of masks are integrated. 一種冷卻裝置,其特徵在於包含有:使液相作動流體蒸發之蒸發器;使氣相作動流體冷凝之冷凝器;連接前述蒸發器與前述冷凝器,並供氣相作動流體流動之蒸氣管;及連接前述冷凝器與前述蒸發器,並供液相作動流體流動之液管,前述蒸發器具有:具有複數個筒狀凸部之多孔質體;由前述多孔質體分隔之蒸氣室及液室;殼體,具有:連接蒸氣管並規定前述蒸氣室之第1部分;連接液管並規定前述液室之第2部分;及複數個突起部,設置於前述第1部分並往前述第2部分之側突出,嵌入於前述多孔質體之前述複數個筒狀凸部之 各個;及複數個遮罩,用以覆蓋前述複數個筒狀凸部之各個的表面,使前述多孔質體之前述複數個筒狀凸部之接觸液相作動流體之接液面的面積變小。 A cooling device, comprising: an evaporator for evaporating a liquid phase actuating fluid; a condenser for condensing the gas phase actuating fluid; a vapor tube connecting the evaporator and the condenser and for supplying a gas phase actuating fluid; And a liquid pipe connecting the condenser and the evaporator and flowing the liquid phase to operate, the evaporator having: a porous body having a plurality of cylindrical protrusions; and a vapor chamber and a liquid chamber separated by the porous body The casing has a first portion for connecting the steam pipe and defining the steam chamber, a second portion for connecting the liquid pipe and defining the liquid chamber, and a plurality of protrusions provided in the first portion and to the second portion a side protruding, embedded in the plurality of cylindrical protrusions of the porous body And a plurality of masks covering the surfaces of the plurality of cylindrical protrusions to reduce the area of the liquid contact surface of the liquid electrolyte fluid contacting the plurality of cylindrical protrusions of the porous body . 一種電子裝置,其特徵在於包含有:設置於配線基板上之電子零件,及用以冷卻前述電子零件之冷卻裝置,前述冷卻裝置包含有:使液相作動流體蒸發之蒸發器;使氣相作動流體冷凝之冷凝器;連接前述蒸發器與前述冷凝器,並供氣相作動流體流動之蒸氣管;及連接前述冷凝器與前述蒸發器,並供液相作動流體流動之液管,前述蒸發器具有:具有複數個筒狀凸部之多孔質體;由前述多孔質體分隔之蒸氣室及液室;殼體,具有:連接蒸氣管並規定前述蒸氣室之第1部分;連接液管並規定前述液室之第2部分;及複數個突起部,設置於前述第1部分並往前述第2部分之側突出,嵌入於前述多孔質體之前述複數個筒狀凸部之各個;及複數個遮罩,用以覆蓋前述複數個筒狀凸部之各個的表面,使前述多孔質體之前述複數個筒狀凸部之接觸液相作動流體之接液面的面積變小。 An electronic device comprising: an electronic component disposed on a wiring substrate; and a cooling device for cooling the electronic component, wherein the cooling device comprises: an evaporator for evaporating a liquid phase actuating fluid; a condenser for fluid condensation; a vapor tube connecting the evaporator and the condenser and flowing the gas to the gas phase; and a liquid tube connecting the condenser and the evaporator and flowing the liquid to operate the fluid, the evaporator a porous body having a plurality of cylindrical convex portions; a vapor chamber and a liquid chamber separated by the porous body; and a casing having a first portion for connecting the vapor tube and defining the vapor chamber; a second portion of the liquid chamber; and a plurality of protrusions are provided on the first portion and protrude toward the side of the second portion, and are embedded in each of the plurality of cylindrical protrusions of the porous body; and a plurality of a mask for covering a surface of each of the plurality of cylindrical protrusions, wherein the plurality of cylindrical protrusions of the porous body are in contact with a liquid contact surface of the liquid phase The area becomes smaller.
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