TWI576030B - Printed circuit board and fabricating method thereof - Google Patents

Printed circuit board and fabricating method thereof Download PDF

Info

Publication number
TWI576030B
TWI576030B TW105119873A TW105119873A TWI576030B TW I576030 B TWI576030 B TW I576030B TW 105119873 A TW105119873 A TW 105119873A TW 105119873 A TW105119873 A TW 105119873A TW I576030 B TWI576030 B TW I576030B
Authority
TW
Taiwan
Prior art keywords
layer
solder resist
lines
circuit
resist layer
Prior art date
Application number
TW105119873A
Other languages
Chinese (zh)
Other versions
TW201801583A (en
Inventor
林賢傑
鍾志業
李明賢
Original Assignee
南亞電路板股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 南亞電路板股份有限公司 filed Critical 南亞電路板股份有限公司
Priority to TW105119873A priority Critical patent/TWI576030B/en
Priority to CN201610925820.0A priority patent/CN107548230A/en
Application granted granted Critical
Publication of TWI576030B publication Critical patent/TWI576030B/en
Publication of TW201801583A publication Critical patent/TW201801583A/en

Links

Description

印刷電路板及其製作方法 Printed circuit board and manufacturing method thereof

本發明係關於一種印刷電路板及其製作方法。 The present invention relates to a printed circuit board and a method of fabricating the same.

在習知印刷電路板製作中,所採用的焊錫印刷製程(solder printing process)為在已完成線路層的基板表面塗佈防焊層(solder mask layer),並於防焊層內形成複數個開口,以露出下方線路層之接觸墊(contact pads)。接著,於基板表面架設印刷模板(print stencil),將錫膏利用刮刀擠入模板開環(stencil opening)內的防焊層開口中,之後取下模板,並進行迴焊,以將錫膏熔融為錫球。 In the conventional printed circuit board manufacturing, a solder printing process is employed to apply a solder mask layer on the surface of the completed circuit layer and form a plurality of openings in the solder resist layer. To expose the contact pads of the underlying circuit layer. Next, a print stencil is placed on the surface of the substrate, and the solder paste is squeezed into the solder mask opening in the stencil opening by a doctor blade, and then the template is removed and reflowed to melt the solder paste. For the solder ball.

此外,現今電子產品持續朝輕、薄、短、小、高速、高頻及多功能發展,為滿足這些需求,晶片的體積需更小且I/O數需更多,此意味著電路板之佈線面積及錫球間的間距(Bump pitch)亦分別需要增加及縮減。然而,在上述焊錫印刷製程中,受限於影像轉移對位誤差,印刷電路板最外層的線路層之接觸墊的尺寸必須大於防焊層開口的孔徑,其導致錫球間的間距難以縮減及封裝密度難以提升。 In addition, today's electronic products continue to be light, thin, short, small, high speed, high frequency and multi-functional development. To meet these demands, the size of the wafer needs to be smaller and the number of I/O needs to be more, which means the circuit board The wiring area and the pitch between the solder balls also need to be increased and reduced, respectively. However, in the above solder printing process, limited by the image transfer alignment error, the size of the contact pads of the outermost layer of the printed circuit board must be larger than the aperture of the solder resist opening, which makes it difficult to reduce the pitch between the solder balls. Packing density is difficult to increase.

業界目前發展出一種凸塊接線(Bump on line,BOL)結構,如第1A、1B圖所示,在印刷電路板之基板表面S上具有 線路層10及防焊層20,其中防焊層20內形成的複數個開口22對應下方線路層10(最外層)的線路12,而非接觸墊14,其中線路12的線寬W可小於防焊層開口22的孔徑D。如此一來,可使用線路層10的線路12取代接觸墊14來與後續焊錫印刷製程中的錫球B連接,從而能夠大幅縮減錫球B間的間距(即,線路12間的間距P)及提升封裝密度。 The industry has developed a bump on line (BOL) structure, as shown in FIGS. 1A and 1B, having a substrate surface S on a printed circuit board. The circuit layer 10 and the solder resist layer 20, wherein the plurality of openings 22 formed in the solder resist layer 20 correspond to the line 12 of the lower circuit layer 10 (outermost layer) instead of the contact pad 14, wherein the line width W of the line 12 can be less than The aperture D of the solder layer opening 22. In this way, the line 12 of the circuit layer 10 can be used instead of the contact pad 14 to connect with the solder ball B in the subsequent solder printing process, so that the pitch between the solder balls B (ie, the pitch P between the lines 12) can be greatly reduced. Increase package density.

然而,如第1C圖所示,在利用曝光顯影方式形成對應線路層10的線路12的複數個防焊層開口22時,由於線路12與防焊層開口22邊緣之間的區域相當狹窄,導致顯影藥水不易進入,而使顯影後在防焊層開口22的底部容易留下防焊層殘留物(Residue)23,其可能影響後續封裝的良率及信賴性。 However, as shown in FIG. 1C, when a plurality of solder resist opening 22 of the line 12 corresponding to the wiring layer 10 is formed by exposure development, the area between the line 12 and the edge of the solder resist opening 22 is rather narrow. The developing syrup is less likely to enter, and it is easy to leave a solder resist residue 23 at the bottom of the solder resist opening 22 after development, which may affect the yield and reliability of the subsequent package.

因此,業界亟需一種新穎的印刷電路板及其製作方法,以期能解決或減輕上述問題。 Therefore, there is a need in the industry for a novel printed circuit board and a method of fabricating the same, in order to solve or alleviate the above problems.

根據本發明一實施例,提供一種印刷電路板的製作方法,包括:提供一基板;於基板上形成一線路層,其中線路層包括複數條線路;於線路層上形成一絕緣層;回蝕刻絕緣層,以暴露出線路層的上表面;於絕緣層與線路層上形成一防焊層,其中防焊層具有複數個開口,分別對應線路層之線路,且各線路的線寬小於各開口的孔徑;以及於各線路上形成一表面處理層。 According to an embodiment of the present invention, a method for fabricating a printed circuit board includes: providing a substrate; forming a circuit layer on the substrate, wherein the circuit layer includes a plurality of lines; forming an insulating layer on the circuit layer; etching back etching a layer to expose an upper surface of the circuit layer; a solder resist layer formed on the insulating layer and the circuit layer, wherein the solder resist layer has a plurality of openings corresponding to the lines of the circuit layer, and the line width of each line is smaller than the openings Aperture; and forming a surface treatment layer on each line.

根據本發明一實施例,提供一種印刷電路板的製作方法,包括:提供一基板;於基板上形成一線路層,其中線路層包括複數條線路;於線路層上形成一第一防焊層;回蝕刻 第一防焊層,以暴露出線路層的上表面;於第一防焊層與線路層上形成一第二防焊層,其中第二防焊層具有複數個開口,分別對應線路層之線路,且各線路的線寬小於各開口的孔徑;以及於各線路上形成一表面處理層。 According to an embodiment of the present invention, a method for fabricating a printed circuit board includes: providing a substrate; forming a circuit layer on the substrate, wherein the circuit layer includes a plurality of lines; forming a first solder resist layer on the circuit layer; Etch etching a first solder resist layer to expose an upper surface of the circuit layer; a second solder resist layer formed on the first solder resist layer and the circuit layer, wherein the second solder resist layer has a plurality of openings corresponding to the lines of the circuit layer And the line width of each line is smaller than the aperture of each opening; and a surface treatment layer is formed on each line.

根據本發明一實施例,提供一種印刷電路板,包括:一基板;一線路層,位於基板上,線路層包括複數條線路;一絕緣層,位於線路層上,絕緣層具有複數個第一開口,以分別埋設線路層之線路並暴露出該些線路的上表面;一防焊層,位於線路層及絕緣層上,防焊層具有複數個第二開口,分別對應前述線路,其中各線路的線寬小於各第二開口的孔徑;複數個表面處理層,分別位於前述線路上;以及複數個焊球,分別位於前述表面處理層上。 According to an embodiment of the invention, a printed circuit board includes: a substrate; a circuit layer on the substrate, the circuit layer includes a plurality of lines; an insulating layer on the circuit layer, the insulating layer having a plurality of first openings a circuit for respectively burying the circuit layer and exposing the upper surfaces of the lines; a solder resist layer on the circuit layer and the insulating layer, the solder resist layer having a plurality of second openings corresponding to the lines, wherein each line The line width is smaller than the aperture of each of the second openings; a plurality of surface treatment layers are respectively located on the line; and a plurality of solder balls are respectively located on the surface treatment layer.

根據本發明一實施例,提供一種印刷電路板,包括:一基板;一線路層,位於基板上,線路層包括複數條線路;一第一防焊層,位於線路層上,第一防焊層具有複數個第一開口,以分別埋設線路層之線路並暴露出該些線路的上表面;一第二防焊層,位於線路層及第一防焊層上,第二防焊層具有複數個第二開口,分別對應前述線路,其中各線路的線寬小於各第二開口的孔徑;複數個表面處理層,分別位於前述線路上;以及複數個焊球,分別位於前述表面處理層上。 According to an embodiment of the invention, a printed circuit board includes: a substrate; a circuit layer on the substrate, the circuit layer includes a plurality of lines; a first solder resist layer on the circuit layer, the first solder resist layer a plurality of first openings for respectively burying the lines of the circuit layer and exposing the upper surfaces of the lines; a second solder resist layer on the circuit layer and the first solder resist layer, and the second solder resist layer having a plurality of The second openings respectively correspond to the foregoing lines, wherein the line width of each line is smaller than the aperture of each second opening; a plurality of surface treatment layers are respectively located on the line; and a plurality of solder balls are respectively located on the surface treatment layer.

為讓本發明之上述和其他目的、特徵、和優點能更明顯易懂,下文特舉出較佳實施例,並配合所附圖式,作詳細說明如下。 The above and other objects, features, and advantages of the present invention will become more apparent and understood by the appended claims appended claims

10‧‧‧線路層 10‧‧‧Line layer

12‧‧‧線路 12‧‧‧ lines

14‧‧‧接觸墊 14‧‧‧Contact pads

20‧‧‧防焊層 20‧‧‧ solder mask

22‧‧‧防焊層開口、開口 22‧‧‧ solder mask opening, opening

23‧‧‧防焊層殘留物 23‧‧‧ solder mask residue

100‧‧‧基板 100‧‧‧Substrate

100a‧‧‧第一表面 100a‧‧‧ first surface

100b‧‧‧第二表面 100b‧‧‧ second surface

101‧‧‧導電通孔電極 101‧‧‧conductive via electrodes

102‧‧‧線路層 102‧‧‧Line layer

102a‧‧‧內層線路層 102a‧‧‧ Inner layer

102b‧‧‧介層插塞 102b‧‧‧Interlayer plug

102c‧‧‧外層線路層 102c‧‧‧ outer circuit layer

102d‧‧‧開孔 102d‧‧‧Opening

103‧‧‧絕緣層 103‧‧‧Insulation

104‧‧‧接觸墊 104‧‧‧Contact pads

106‧‧‧線路 106‧‧‧ lines

108‧‧‧絕緣層 108‧‧‧Insulation

108a‧‧‧第一開口 108a‧‧‧first opening

109‧‧‧第一防焊層 109‧‧‧First solder mask

109a‧‧‧第一開口 109a‧‧ first opening

110‧‧‧防焊層、第二防焊層 110‧‧‧ solder mask, second solder mask

112‧‧‧第二開口、開口 112‧‧‧Second opening, opening

114‧‧‧表面處理層 114‧‧‧Surface treatment layer

115‧‧‧晶種層 115‧‧‧ seed layer

116‧‧‧焊球 116‧‧‧ solder balls

117‧‧‧罩幕圖案層 117‧‧‧ Cover pattern layer

118‧‧‧開口 118‧‧‧ openings

119‧‧‧金屬層 119‧‧‧metal layer

B‧‧‧錫球 B‧‧‧ solder ball

D、D1、D2‧‧‧孔徑 D, D1, D2‧‧‧ aperture

P‧‧‧間距 P‧‧‧ spacing

S‧‧‧基板表面 S‧‧‧ substrate surface

W、W1、W2‧‧‧線寬 W, W1, W2‧‧‧ line width

第1A圖顯示一習知凸塊接線(Bump on line,BOL)結構的剖面示意圖;第1B圖顯示第1A圖中之線路與防焊層開口之相對關係的上視示意圖;第1C圖顯示形成第1A圖中之防焊層開口時留下防焊層殘留物的示意圖。 1A is a schematic cross-sectional view showing a conventional bump-line (BOL) structure; FIG. 1B is a top view showing the relationship between the line and the solder resist opening in FIG. 1A; FIG. 1C is a view showing formation A schematic view of the solder resist residue remaining in the opening of the solder resist layer in FIG. 1A.

第2A至2F圖顯示根據本發明一實施例之印刷電路板的製作方法的剖面示意圖。 2A to 2F are cross-sectional views showing a method of fabricating a printed circuit board according to an embodiment of the present invention.

第3圖顯示第2F圖中之線路、表面處理層與防焊層開口之相對關係的上視示意圖。 Fig. 3 is a top plan view showing the relationship between the line, the surface treatment layer and the opening of the solder resist layer in Fig. 2F.

第4A至4F圖顯示根據本發明另一實施例之印刷電路板的製作方法的剖面示意圖。 4A to 4F are cross-sectional views showing a method of fabricating a printed circuit board according to another embodiment of the present invention.

第5圖顯示第4F圖中之線路、表面處理層與第二防焊層開口之相對關係的上視示意圖。 Fig. 5 is a top plan view showing the relationship between the line, the surface treatment layer and the opening of the second solder resist layer in Fig. 4F.

第6A至6E圖顯示根據本發明一實施例之線路層的製作方法的剖面示意圖。 6A to 6E are cross-sectional views showing a method of fabricating a wiring layer according to an embodiment of the present invention.

以下以各實施例詳細說明並伴隨著圖式說明之範例,做為本發明之參考依據。在圖式或說明書描述中,相似或相同之部分皆使用相同之圖號,且在圖式中,實施例之形狀或是厚度可擴大,並以方便、簡化的方式予以標示。再者,圖式中各元件之部分將以分別描述說明之,值得注意的是,圖中未繪示或描述之元件,為所屬技術領域中具有通常知識者所知的形式,另外,特定之實施例僅為揭示本發明使用之特定方式,並非用以限定本發明。 The following is a detailed description of the embodiments and examples accompanying the drawings, which are the basis of the present invention. In the drawings or the description of the specification, the same reference numerals are used for the same or the same parts, and in the drawings, the shape or thickness of the embodiment can be enlarged and indicated in a convenient and simplified manner. In addition, the components of the drawings will be described separately, and it is noted that the components not shown or described in the drawings are known to those of ordinary skill in the art, and in particular, The examples are merely illustrative of specific ways of using the invention and are not intended to limit the invention.

請先參照第2F圖,其顯示根據本發明一實施例之印刷電路板的剖面示意圖。在本實施例中,印刷電路板包括一基板100、一線路層102、一絕緣層108、一防焊層110、複數個表面處理層114、及複數個焊球116。線路層102係形成於基板100上,其可為單層或多層線路層,若線路層102為多層線路層,則可包括內層線路層102a、外層線路層102c、及電性連接內、外層線路層102a及102c的介層插塞(via plug)102b。外層線路層102c包括至少一接觸墊104及複數條線路106,其中線路106係用以與後續形成的焊料凸塊形成電性連接(即,凸塊接線(Bump on line,BOL)結構)。絕緣層108係形成於線路層102上,其具有複數個第一開口108a,以分別埋設外層線路層102c中之接觸墊104及線路106並暴露出接觸墊104及線路106的上表面。防焊層110係形成於線路層102及絕緣層108上,其具有複數個第二開口112,分別對應於外層線路層102c中之線路106。表面處理層114係對應設置於每一第二開口112內的線路106上,而焊球116則對應設置於每一表面處理層114上。請一併參照第3圖,其顯示第2F圖中之線路106、表面處理層114與防焊層開口(即,第二開口112)之相對關係的上視示意圖。在本實施例中,各線路106與各表面處理層114大體上具有相同的線寬W1,其小於防焊層110的各第二開口112的孔徑D1。 Referring first to FIG. 2F, a cross-sectional view of a printed circuit board in accordance with an embodiment of the present invention is shown. In this embodiment, the printed circuit board includes a substrate 100, a wiring layer 102, an insulating layer 108, a solder resist layer 110, a plurality of surface treatment layers 114, and a plurality of solder balls 116. The circuit layer 102 is formed on the substrate 100, which may be a single layer or a plurality of circuit layers. If the circuit layer 102 is a multilayer circuit layer, the inner circuit layer 102a, the outer circuit layer 102c, and the inner and outer layers may be electrically connected. Via plugs 102b of circuit layers 102a and 102c. The outer wiring layer 102c includes at least one contact pad 104 and a plurality of lines 106, wherein the wiring 106 is used to form an electrical connection with a subsequently formed solder bump (ie, a bump on line (BOL) structure). The insulating layer 108 is formed on the wiring layer 102 and has a plurality of first openings 108a for respectively burying the contact pads 104 and the wiring 106 in the outer wiring layer 102c and exposing the upper surfaces of the contact pads 104 and the wiring 106. The solder resist layer 110 is formed on the wiring layer 102 and the insulating layer 108, and has a plurality of second openings 112 corresponding to the lines 106 in the outer wiring layer 102c, respectively. The surface treatment layer 114 corresponds to the line 106 disposed in each of the second openings 112, and the solder balls 116 are correspondingly disposed on each of the surface treatment layers 114. Referring to FIG. 3 together, a top view of the relationship between the line 106, the surface treatment layer 114 and the solder resist opening (ie, the second opening 112) in FIG. 2F is shown. In the present embodiment, each of the lines 106 and the respective surface treatment layers 114 have substantially the same line width W1 which is smaller than the aperture D1 of each of the second openings 112 of the solder resist layer 110.

第2A至2F圖顯示根據本發明一實施例之印刷電路板的製作方法的剖面示意圖。請依序參照第2A至2F圖。 2A to 2F are cross-sectional views showing a method of fabricating a printed circuit board according to an embodiment of the present invention. Please refer to Figures 2A to 2F in order.

如第2A圖所示,提供一基板100,例如一核心(core)板。基板100具有相對的一第一表面100a(例如,晶圓面)及一第 二表面100b(例如,焊接面)。在一些實施例中,基板100的材質可包括紙質酚醛樹脂(paper phenolic resin)、複合環氧樹脂(composite epoxy resin)、聚亞醯胺樹脂(polyimide resin)、玻璃纖維(glass fiber)、或其他習知的核心板材料。 As shown in FIG. 2A, a substrate 100, such as a core board, is provided. The substrate 100 has a first surface 100a (eg, a wafer surface) and a first surface Two surfaces 100b (eg, welded faces). In some embodiments, the material of the substrate 100 may include a paper phenolic resin, a composite epoxy resin, a polyimide resin, a glass fiber, or the like. The core material of the conventional core.

接著,在基板100的第一表面100a上形成一或多層線路層102,若線路層102為多層線路層,則可包括內層線路層102a、外層線路層102c、及電性連接內、外層線路層102a及102c的介層插塞102b。外層線路層102c包括至少一接觸墊104及複數條線路106,其中線路106係用以與後續形成的焊料凸塊形成電性連接(即,凸塊接線(BOL)結構)。應可理解的是,基板100的第二表面100b上亦可形成有一或多層線路層,且基板100內可具有一或多個導電通孔電極101,用以電性連接第一表面100a上的線路層102及第二表面100b上的線路層(未標示)。線路層102及導電通孔電極101可採用習知的印刷電路板製程製作而成,在此不加以贅述。 Next, one or more circuit layers 102 are formed on the first surface 100a of the substrate 100. If the circuit layer 102 is a multilayer circuit layer, the inner circuit layer 102a, the outer circuit layer 102c, and the inner and outer lines may be electrically connected. The via plugs 102b of layers 102a and 102c. The outer wiring layer 102c includes at least one contact pad 104 and a plurality of lines 106, wherein the wiring 106 is used to form an electrical connection with a subsequently formed solder bump (ie, a bump wiring (BOL) structure). It should be understood that one or more circuit layers may be formed on the second surface 100b of the substrate 100, and the substrate 100 may have one or more conductive via electrodes 101 for electrically connecting the first surface 100a. A circuit layer (not labeled) on the circuit layer 102 and the second surface 100b. The circuit layer 102 and the conductive via electrodes 101 can be fabricated by a conventional printed circuit board process, and will not be described herein.

如第2B圖所示,於線路層102上形成一絕緣層108,以覆蓋外層線路層102c中之接觸墊104及線路106。在一些實施例中,絕緣層108的材質可包括環氧樹脂(epoxy resin)、雙馬來亞醯胺-三氮雜苯樹脂(bismaleimide triacine,BT)、ABF膜(Ajinomoto built-up film)、聚苯醚(polyphenylene,PPE)、或聚四氟乙烯(polytetrafluorethylene,PTFE),且絕緣層108的形成方法可為塗佈或熱壓合。 As shown in FIG. 2B, an insulating layer 108 is formed over the wiring layer 102 to cover the contact pads 104 and the lines 106 in the outer wiring layer 102c. In some embodiments, the material of the insulating layer 108 may include an epoxy resin, a bismaleimide triacine (BT), an ABF film (Ajinomoto built-up film), Polyphenylene (PPE), or polytetrafluorethylene (PTFE), and the formation method of the insulating layer 108 may be coating or thermocompression bonding.

如第2C圖所示,回蝕刻絕緣層108,以暴露出線路層102之外層線路層102c(接觸墊104及線路106)的上表面。在本 實施例中,可藉由物理刷磨(physical grinding)或化學機械研磨(chemical mechanical polishing,CMP)回蝕刻絕緣層108,以使絕緣層108與暴露出的外層線路層102c的上表面大體上為共平面。此外,在一些實施例中,亦可藉由化學蝕刻或電漿蝕刻進一步清潔絕緣層108與外層線路層102c的上表面,以使後續形成之結構層與絕緣層108及外層線路層102c間的接合度可提高。 As shown in FIG. 2C, the insulating layer 108 is etched back to expose the upper surface of the outer wiring layer 102c (contact pads 104 and lines 106) of the wiring layer 102. In this In an embodiment, the insulating layer 108 may be etched back by physical grinding or chemical mechanical polishing (CMP) such that the upper surface of the insulating layer 108 and the exposed outer wiring layer 102c are substantially Coplanar. In addition, in some embodiments, the upper surface of the insulating layer 108 and the outer wiring layer 102c may be further cleaned by chemical etching or plasma etching to make the subsequently formed structural layer and the insulating layer 108 and the outer wiring layer 102c. The degree of bonding can be increased.

如第2D圖所示,於絕緣層108及線路層102上形成一防焊層110,其中防焊層110具有複數個(第二)開口112,分別對應外層線路層102c中之線路106。在一些實施例中,防焊層110可為感光、感熱或其組合之材料,舉例來說,防焊層110可為綠漆,如紫外線型綠漆或熱硬化型綠漆等。防焊層110的形成方法可為塗佈或乾膜(dry film)壓合,且透過曝光顯影製程於防焊層110內形成開口112。 As shown in FIG. 2D, a solder resist layer 110 is formed on the insulating layer 108 and the wiring layer 102, wherein the solder resist layer 110 has a plurality of (second) openings 112 corresponding to the lines 106 in the outer wiring layer 102c. In some embodiments, the solder resist layer 110 may be photosensitive, sensible heat, or a combination thereof. For example, the solder resist layer 110 may be a green paint, such as an ultraviolet type green paint or a heat hard green paint. The solder resist layer 110 may be formed by coating or dry film bonding, and the opening 112 is formed in the solder resist layer 110 through an exposure and development process.

如第2E圖所示,於防焊層110之每一開口112內之暴露出的線路106上對應形成一表面處理層(或稱作導電凸塊)114,以防止線路106氧化及增加後續形成之焊球116(第2F圖)的接合能力。在一些實施例中,表面處理層114的材質可包括銅、鈦、化學鍍鎳/金、化鎳浸金(ENIG)、化鎳鈀浸金(ENEPIG)、化學鍍錫(Immersion Tin)、或有機保焊膜(OSP),且表面處理層114的形成方法可為無電極電鍍(electroless p1ating)。 As shown in FIG. 2E, a surface treatment layer (or conductive bump) 114 is formed on the exposed line 106 in each opening 112 of the solder resist layer 110 to prevent oxidation of the line 106 and increase subsequent formation. The bonding ability of the solder ball 116 (Fig. 2F). In some embodiments, the material of the surface treatment layer 114 may include copper, titanium, electroless nickel/gold, nickel immersion gold (ENIG), enamel immersion gold (ENEPIG), electroless tin plating (Immersion Tin), or The organic solder resist film (OSP), and the surface treatment layer 114 may be formed by electroless plating.

如第2F圖所示,於每一表面處理層上對應形成一焊球116。在一些實施例中,焊球116的材質可包括錫、錫鉛、 錫銀銅、錫銅、錫鉍、錫鉍鎳或上述之合金。 As shown in FIG. 2F, a solder ball 116 is formed on each surface treatment layer. In some embodiments, the material of the solder ball 116 may include tin, tin lead, Tin-silver-copper, tin-copper, tin-bismuth, tin-bismuth-nickel or alloys of the above.

根據上述第2A至2F圖所揭示之製作方法,可完成本發明一實施例之印刷電路板之製作。需特別說明的是,在本實施例中,當利用曝光顯影方式形成防焊層110內之(第二)開口112時,與開口112對應的外層線路層102c中之線路106為埋設於絕緣層108,故不會阻礙顯影藥水的流動,使得顯影藥水與防焊層110對應開口112的部分能夠順利地、完全地作用,不會留下防焊層殘留物於開口112的底部,而有利於改善印刷電路板(特別係,具有凸塊接線(BOL)結構之印刷電路板)之後續封裝的良率及信賴性。 According to the manufacturing method disclosed in the above 2A to 2F, the fabrication of the printed circuit board according to an embodiment of the present invention can be accomplished. It should be particularly noted that, in the present embodiment, when the (second) opening 112 in the solder resist layer 110 is formed by the exposure and development method, the line 106 in the outer layer wiring layer 102c corresponding to the opening 112 is buried in the insulating layer. 108, so that the flow of the developer solution is not hindered, so that the portion of the developer solution and the corresponding opening 112 of the solder resist layer 110 can smoothly and completely function, leaving the solder resist residue at the bottom of the opening 112, which is advantageous. Improve the yield and reliability of subsequent packaging of printed circuit boards (especially printed circuit boards with bump wiring (BOL) structures).

接著請參照第4F圖,其顯示根據本發明另一實施例之印刷電路板的剖面示意圖,其中相同於第2F圖的部件係使用相同標號。在本實施例中,印刷電路板包括一基板100、一線路層102、一第一防焊層109、一第二防焊層110、複數個表面處理層114、及複數個焊球116。線路層102係形成於基板100上,其可為單層或多層線路層,若線路層102為多層線路層,則可包括內層線路層102a、外層線路層102c、及電性連接內、外層線路層102a及102c的介層插塞102b。外層線路層102c包括至少一接觸墊104及複數條線路106,其中線路106係用以與後續形成的焊料凸塊形成電性連接(即,凸塊接線(BOL)結構)。第一防焊層109係形成於線路層102上,其具有複數個第一開口109a,以分別埋設外層線路層102c中之接觸墊104及線路106並暴露出接觸墊104及線路106的上表面。第二防焊層110係形成於線路層102及第一防焊層109上,其具有複數個第二開口 112,分別對應於外層線路層102c中之線路106。表面處理層114係對應設置於每一第二開口112內的線路106上,而焊球116則對應設置於每一表面處理層114上。請一併參照第5圖,其顯示第4F圖中之線路106、表面處理層114與第二防焊層開口(即,第二開口112)之相對關係的上視示意圖。在本實施例中,各線路106與各表面處理層114大體上具有相同的線寬W2,其小於第二防焊層110的各第二開口112的孔徑D2。 Next, please refer to FIG. 4F, which shows a cross-sectional view of a printed circuit board according to another embodiment of the present invention, wherein components identical to those of FIG. 2F are given the same reference numerals. In this embodiment, the printed circuit board includes a substrate 100, a wiring layer 102, a first solder resist layer 109, a second solder resist layer 110, a plurality of surface treatment layers 114, and a plurality of solder balls 116. The circuit layer 102 is formed on the substrate 100, which may be a single layer or a plurality of circuit layers. If the circuit layer 102 is a multilayer circuit layer, the inner circuit layer 102a, the outer circuit layer 102c, and the inner and outer layers may be electrically connected. The via plugs 102b of the circuit layers 102a and 102c. The outer wiring layer 102c includes at least one contact pad 104 and a plurality of lines 106, wherein the wiring 106 is used to form an electrical connection with a subsequently formed solder bump (ie, a bump wiring (BOL) structure). The first solder resist layer 109 is formed on the circuit layer 102 and has a plurality of first openings 109a for respectively embedding the contact pads 104 and the lines 106 in the outer circuit layer 102c and exposing the upper surfaces of the contact pads 104 and the lines 106. . The second solder resist layer 110 is formed on the circuit layer 102 and the first solder resist layer 109, and has a plurality of second openings 112, corresponding to the line 106 in the outer circuit layer 102c, respectively. The surface treatment layer 114 corresponds to the line 106 disposed in each of the second openings 112, and the solder balls 116 are correspondingly disposed on each of the surface treatment layers 114. Referring to FIG. 5 together, it is a top view showing the relative relationship between the line 106, the surface treatment layer 114 and the second solder resist opening (ie, the second opening 112) in FIG. 4F. In the present embodiment, each of the lines 106 and the surface treatment layers 114 generally have the same line width W2 which is smaller than the aperture D2 of each of the second openings 112 of the second solder mask layer 110.

第4A至4F圖顯示根據本發明另一實施例之印刷電路板的製作方法的剖面示意圖,其中相同於第2A至2F圖的部件係使用相同標號並省略其說明。請依序參照第4A至4F圖。 4A to 4F are cross-sectional views showing a method of fabricating a printed circuit board according to another embodiment of the present invention, wherein components identical to those of Figs. 2A to 2F are given the same reference numerals and their description will be omitted. Please refer to Figures 4A to 4F in order.

如第4A圖所示,同前述實施例之第2A圖所述步驟,提供一基板100,並於基板100上形成一線路層102,其中線路層102之外層線路層102c包括至少一接觸墊104及複數條線路106,其中線路106係用以與後續形成的焊料凸塊形成電性連接(即,凸塊接線(BOL)結構)。 As shown in FIG. 4A, in the same manner as the second embodiment of the foregoing embodiment, a substrate 100 is provided, and a circuit layer 102 is formed on the substrate 100. The circuit layer 102c of the circuit layer 102 includes at least one contact pad 104. And a plurality of lines 106, wherein the lines 106 are used to form an electrical connection with a subsequently formed solder bump (ie, a bump wiring (BOL) structure).

如第4B圖所示,於線路層102上形成一第一防焊層109,以覆蓋外層線路層102c中之接觸墊104及線路106。在一些實施例中,第一防焊層109可為感光、感熱或其組合之材料,舉例來說,第一防焊層109可為綠漆,如紫外線型綠漆或熱硬化型綠漆等。第一防焊層109的形成方法可為塗佈或乾膜壓合。 As shown in FIG. 4B, a first solder resist layer 109 is formed on the wiring layer 102 to cover the contact pads 104 and the wiring 106 in the outer wiring layer 102c. In some embodiments, the first solder mask layer 109 may be photosensitive, sensible heat, or a combination thereof. For example, the first solder resist layer 109 may be a green paint, such as an ultraviolet type green paint or a heat hard green paint. . The first solder resist layer 109 may be formed by coating or dry film pressing.

如第4C圖所示,回蝕刻第一防焊層109,以暴露出線路層102之外層線路層102c(接觸墊104及線路106)的上表面。在本實施例中,可藉由物理刷磨或化學機械研磨回蝕刻第一防焊層109,以使第一防焊層109與暴露出的外層線路層102c 的上表面大體上為共平面。此外,在一些實施例中,亦可藉由化學蝕刻或電漿蝕刻進一步清潔第一防焊層109與外層線路層102c的上表面,以使後續形成之結構層與第一防焊層109及外層線路層102c間的接合度可提高。 As shown in FIG. 4C, the first solder resist layer 109 is etched back to expose the upper surface of the outer wiring layer 102c (contact pads 104 and lines 106) of the wiring layer 102. In this embodiment, the first solder resist layer 109 may be etched back by physical brushing or chemical mechanical polishing to make the first solder resist layer 109 and the exposed outer layer layer 102c The upper surface is generally coplanar. In addition, in some embodiments, the upper surfaces of the first solder resist layer 109 and the outer wiring layer 102c may be further cleaned by chemical etching or plasma etching to make the subsequently formed structural layer and the first solder resist layer 109 and The degree of bonding between the outer wiring layers 102c can be improved.

如第4D圖所示,於第一防焊層109及線路層102上形成一第二防焊層110,其中第二防焊層110具有複數個(第二)開口112,分別對應外層線路層102c中之線路106。在一些實施例中,第二防焊層110與第一防焊層109可具有相同材質,舉例來說,第二防焊層110可為綠漆,如紫外線型綠漆或熱硬化型綠漆等。第二防焊層110的形成方法可為塗佈或乾膜壓合,且透過曝光顯影製程於第二防焊層110內形成開口112。 As shown in FIG. 4D, a second solder resist layer 110 is formed on the first solder resist layer 109 and the circuit layer 102, wherein the second solder resist layer 110 has a plurality of (second) openings 112 corresponding to the outer circuit layer. Line 106 in 102c. In some embodiments, the second solder resist layer 110 and the first solder resist layer 109 may have the same material. For example, the second solder resist layer 110 may be green paint, such as ultraviolet green paint or heat hard green paint. Wait. The second solder resist layer 110 may be formed by coating or dry film pressing, and the opening 112 is formed in the second solder resist layer 110 through an exposure and development process.

如第4E圖所示,同前述實施例之第2E圖所述步驟,於第二防焊層110之每一開口112內之暴露出的線路106上對應形成一表面處理層(或稱作導電凸塊)114,以防止線路106氧化及增加後續形成之焊球116(第4F圖)的接合能力。接著,如第4F圖所示,同前述實施例之第2F圖所述步驟,於每一表面處理層上對應形成一焊球116。 As shown in FIG. 4E, in the step of FIG. 2E of the foregoing embodiment, a surface treatment layer (or conductive) is formed on the exposed line 106 in each opening 112 of the second solder resist layer 110. Bumps 114 to prevent oxidation of line 106 and increase the bonding capability of subsequently formed solder balls 116 (Fig. 4F). Next, as shown in FIG. 4F, a solder ball 116 is formed on each of the surface treatment layers in the same manner as in the second embodiment of the foregoing embodiment.

根據上述第4A至4F圖所揭示之製作方法,可完成本發明另一實施例之印刷電路板之製作。類似於前述實施例(第2A至2F圖),在本實施例中,當利用曝光顯影方式形成第二防焊層110內之(第二)開口112時,與開口112對應的外層線路層102c中之線路106為埋設於第一防焊層109,故也不會阻擋顯影藥水的流動,使得顯影藥水與第二防焊層110對應開口112的部分能夠順利地、完全地作用,不會留下防焊層殘留物於開口112 的底部,而有利於改善印刷電路板(特別係,具有凸塊接線(BOL)結構之印刷電路板)之後續封裝的良率及信賴性。 According to the manufacturing method disclosed in the above 4A to 4F, the fabrication of the printed circuit board of another embodiment of the present invention can be completed. Similar to the foregoing embodiment (Figs. 2A to 2F), in the present embodiment, when the (second) opening 112 in the second solder resist layer 110 is formed by the exposure developing method, the outer layer wiring layer 102c corresponding to the opening 112 The line 106 is buried in the first solder resist layer 109, so that the flow of the developer solution is not blocked, so that the portion of the developing potion and the corresponding opening 112 of the second solder resist layer 110 can smoothly and completely function without leaving Lower solder resist residue in opening 112 At the bottom, it is beneficial to improve the yield and reliability of subsequent packaging of printed circuit boards (especially printed circuit boards with bump wiring (BOL) structures).

再者,第6A至6E圖顯示根據本發明一實施例之線路層的製作方法的剖面示意圖,其中相同於第2A、4A圖的部件係使用相同的標號並省略其說明。請依序參照第6A至6E圖。 6A to 6E are cross-sectional views showing a method of fabricating a circuit layer according to an embodiment of the present invention, wherein components similar to those of FIGS. 2A and 4A are denoted by the same reference numerals and the description thereof will be omitted. Please refer to Figures 6A to 6E in order.

如第6A圖所示,於基板100的第一表面100a上形成內層線路層102a,並於基板100及內層線路層102a上形成一絕緣層103。在一些實施例中,絕緣層103的材質可包括環氧樹脂(epoxy resin)、雙馬來亞醯胺-三氮雜苯樹脂(bismaleimide triacine,BT)、ABF膜(Ajinomoto built-up film)、聚苯醚(polyphenylene,PPE)或聚四氟乙烯(polytetrafluorethylene,PTFE),且絕緣層103的形成方法可為塗佈或熱壓合。應可理解的是,基板100的第二表面100b上亦可形成有一或多層線路層,且基板100內可具有一或多個導電通孔電極101,用以電性連接第一表面100a及第二表面100b上的線路層。 As shown in FIG. 6A, an inner wiring layer 102a is formed on the first surface 100a of the substrate 100, and an insulating layer 103 is formed on the substrate 100 and the inner wiring layer 102a. In some embodiments, the material of the insulating layer 103 may include an epoxy resin, a bismaleimide triacine (BT), an ABF film (Ajinomoto built-up film), Polyphenylene (PPE) or polytetrafluoroethylene (PTFE), and the formation method of the insulating layer 103 may be coating or thermocompression bonding. It should be understood that one or more circuit layers may be formed on the second surface 100b of the substrate 100, and the substrate 100 may have one or more conductive via electrodes 101 for electrically connecting the first surface 100a and the first surface. The circuit layer on the surface 100b.

如第6B圖所示,於絕緣層103內形成至少一開孔102d,連接內層線路層102a,並於絕緣層103上及開孔102d內順應性地形成一晶種層115。在一些實施例中,晶種層115與內層線路層102a可具有相同材質,包括銅、錫、鎳、鋁、鉻、鈦、鎢、上述之合金或上述之組合,且晶種層115的形成方法可為物理氣相沉積、化學氣相沉積、濺鍍或無電極電鍍。 As shown in FIG. 6B, at least one opening 102d is formed in the insulating layer 103, and the inner layer wiring layer 102a is connected, and a seed layer 115 is conformally formed on the insulating layer 103 and the opening 102d. In some embodiments, the seed layer 115 and the inner wiring layer 102a may have the same material, including copper, tin, nickel, aluminum, chromium, titanium, tungsten, the above alloy, or a combination thereof, and the seed layer 115 The formation method may be physical vapor deposition, chemical vapor deposition, sputtering, or electroless plating.

如第6C圖所示,於晶種層115上形成一罩幕圖案層117,其中罩幕圖案層117具有複數個開口118,以露出開孔102d及部分的晶種層115。在一些實施例中,罩幕圖案層117可包括 感光性的材料,如光阻或乾膜,且透過曝光顯影製程於罩幕圖案層117內形成開口118。 As shown in FIG. 6C, a mask pattern layer 117 is formed on the seed layer 115, wherein the mask pattern layer 117 has a plurality of openings 118 to expose the opening 102d and a portion of the seed layer 115. In some embodiments, the mask pattern layer 117 can include A photosensitive material, such as a photoresist or a dry film, and an opening 118 is formed in the mask pattern layer 117 through an exposure development process.

如第6D圖所示,分別於開口118內及晶種層115的露出部分上形成一金屬層119,並填入開孔102d。在一些實施例中,金屬層119與晶種層115可具有相同材質,且金屬層119的形成方法可為電鍍或無電極電鍍。舉例來說,可以晶種層115作為電極並進行電鍍製程,以在每一開口118內形成金屬層(即,電鍍金屬層)119。 As shown in Fig. 6D, a metal layer 119 is formed in the opening 118 and the exposed portion of the seed layer 115, respectively, and is filled in the opening 102d. In some embodiments, the metal layer 119 and the seed layer 115 may have the same material, and the metal layer 119 may be formed by electroplating or electroless plating. For example, the seed layer 115 can be used as an electrode and an electroplating process can be performed to form a metal layer (ie, a plated metal layer) 119 within each opening 118.

接著,如第6E圖所示,可透過習知的剝除法及蝕刻製程,依序移除罩幕圖案層117及其下方的晶種層115,以完成外層線路層102c(接觸墊104及線路106)的製作。 Next, as shown in FIG. 6E, the mask pattern layer 117 and the seed layer 115 under it can be sequentially removed by a conventional stripping method and an etching process to complete the outer layer layer 102c (contact pads 104 and lines). 106) production.

雖然本發明以前述之實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可做些許之更動與潤飾。因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed above in the foregoing embodiments, it is not intended to limit the invention. Those skilled in the art having the ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

100‧‧‧基板 100‧‧‧Substrate

100a‧‧‧第一表面 100a‧‧‧ first surface

100b‧‧‧第二表面 100b‧‧‧ second surface

101‧‧‧導電通孔電極 101‧‧‧conductive via electrodes

102‧‧‧線路層 102‧‧‧Line layer

102a‧‧‧內層線路層 102a‧‧‧ Inner layer

102b‧‧‧介層插塞 102b‧‧‧Interlayer plug

102c‧‧‧外層線路層 102c‧‧‧ outer circuit layer

104‧‧‧接觸墊 104‧‧‧Contact pads

106‧‧‧線路 106‧‧‧ lines

109‧‧‧第一防焊層 109‧‧‧First solder mask

109a‧‧‧第一開口 109a‧‧ first opening

110‧‧‧第二防焊層 110‧‧‧Second solder mask

112‧‧‧第二開口、開口 112‧‧‧Second opening, opening

114‧‧‧表面處理層 114‧‧‧Surface treatment layer

116‧‧‧焊球 116‧‧‧ solder balls

W2‧‧‧線寬 W2‧‧‧ line width

Claims (11)

一種印刷電路板的製作方法,包括:提供一基板;於該基板上形成一線路層,其中該線路層包括複數條線路;於該線路層上形成一絕緣層;回蝕刻該絕緣層,以暴露出該線路層的上表面;於該絕緣層與該線路層上形成一防焊層,其中該防焊層具有複數個開口,分別對應該線路層之該些線路,且各該些線路的線寬小於各該些開口的孔徑;以及於各該些線路上形成一表面處理層。 A manufacturing method of a printed circuit board, comprising: providing a substrate; forming a circuit layer on the substrate, wherein the circuit layer comprises a plurality of lines; forming an insulating layer on the circuit layer; etching the insulating layer to expose Forming an upper surface of the circuit layer; forming a solder resist layer on the insulating layer and the circuit layer, wherein the solder resist layer has a plurality of openings respectively corresponding to the lines of the circuit layer, and lines of the respective lines a width that is smaller than the apertures of the openings; and a surface treatment layer formed on each of the lines. 如申請專利範圍第1項所述的印刷電路板的製作方法,其中回蝕刻該絕緣層以暴露出該線路層的上表面,係藉由物理刷磨或化學機械研磨達成。 The method of fabricating a printed circuit board according to claim 1, wherein the insulating layer is etched back to expose the upper surface of the circuit layer by physical brushing or chemical mechanical polishing. 如申請專利範圍第1或2項所述的印刷電路板的製作方法,其中在回蝕刻該絕緣層以暴露出該線路層的上表面的步驟中,更包括:將該絕緣層回蝕刻至與該線路層的上表面為共平面;以及藉由化學蝕刻或電漿蝕刻清潔該絕緣層與該線路層的上表面。 The method for fabricating a printed circuit board according to claim 1 or 2, wherein in the step of etching back the insulating layer to expose an upper surface of the wiring layer, the method further comprises: etching back the insulating layer to The upper surface of the wiring layer is coplanar; and the insulating layer and the upper surface of the wiring layer are cleaned by chemical etching or plasma etching. 一種印刷電路板的製作方法,包括:提供一基板;於該基板上形成一線路層,其中該線路層包括複數條線 路;於該線路層上形成一第一防焊層;回蝕刻該第一防焊層,以暴露出該線路層的上表面;於該第一防焊層與該線路層上形成一第二防焊層,其中該第二防焊層具有複數個開口,分別對應該線路層之該些線路,且各該些線路的線寬小於各該些開口的孔徑;以及於各該些線路上形成一表面處理層。 A manufacturing method of a printed circuit board, comprising: providing a substrate; forming a circuit layer on the substrate, wherein the circuit layer comprises a plurality of lines Forming a first solder resist layer on the circuit layer; etching back the first solder resist layer to expose an upper surface of the circuit layer; forming a second on the first solder resist layer and the circuit layer a solder resist layer, wherein the second solder resist layer has a plurality of openings respectively corresponding to the lines of the circuit layer, and a line width of each of the lines is smaller than an aperture of each of the openings; and forming on each of the lines A surface treatment layer. 如申請專利範圍第4項所述的印刷電路板的製作方法,其中回蝕刻該第一防焊層以暴露出該線路層的上表面,係藉由物理刷磨或化學機械研磨達成。 The method of fabricating a printed circuit board according to claim 4, wherein the etching the first solder resist layer to expose the upper surface of the circuit layer is achieved by physical brushing or chemical mechanical polishing. 如申請專利範圍第4或5項所述的印刷電路板的製作方法,其中在回蝕刻該第一防焊層以暴露出該線路層的上表面的步驟中,更包括:將該第一防焊層回蝕刻至與該線路層的上表面為共平面;以及藉由化學蝕刻或電漿蝕刻清潔該第一防焊層與該線路層的上表面。 The manufacturing method of the printed circuit board of claim 4, wherein in the step of etching back the first solder resist layer to expose the upper surface of the circuit layer, the method further comprises: The solder layer is etched back to be coplanar with the upper surface of the wiring layer; and the first solder resist layer and the upper surface of the wiring layer are cleaned by chemical etching or plasma etching. 如申請專利範圍第1或4項所述的印刷電路板的製作方法,其中於各該些線路上形成一表面處理層,係藉由無電極電鍍達成,且該些表面處理層的材質包括銅、鈦、化學鍍鎳/金、化鎳浸金(ENIG)、化鎳鈀浸金(ENEPIG)、化學鍍錫(Immersion Tin)、或有機保焊膜(OSP)。 The method for fabricating a printed circuit board according to claim 1 or 4, wherein a surface treatment layer is formed on each of the lines by electrodeless plating, and the materials of the surface treatment layers include copper. , titanium, electroless nickel/gold, nickel immersion gold (ENIG), nickel-palladium immersion gold (ENEPIG), electroless tin plating (Immersion Tin), or organic solder mask (OSP). 如申請專利範圍第1或4項所述的印刷電路板的製作方法,更包括: 於各該些表面處理層上對應形成一焊球。 The method for manufacturing a printed circuit board according to claim 1 or 4, further comprising: A solder ball is formed on each of the surface treatment layers. 一種印刷電路板,包括:一基板;一線路層,位於該基板上,該線路層包括複數條線路;一絕緣層,位於該線路層上,該絕緣層具有複數個第一開口,以分別暴露出該些線路的上表面;一防焊層,位於該線路層及該絕緣層上,該防焊層具有複數個第二開口,分別對應該些線路,其中各該些線路的線寬小於各該些第二開口的孔徑;以及複數個表面處理層,分別位於該些線路上。 A printed circuit board comprising: a substrate; a circuit layer on the substrate, the circuit layer comprising a plurality of lines; an insulating layer on the circuit layer, the insulating layer having a plurality of first openings for respectively exposing An upper surface of the circuit; a solder resist layer on the circuit layer and the insulating layer, the solder resist layer having a plurality of second openings respectively corresponding to the lines, wherein each of the lines has a line width smaller than each The apertures of the second openings; and a plurality of surface treatment layers are respectively located on the lines. 一種印刷電路板,包括:一基板;一線路層,位於該基板上,該線路層包括複數條線路;一第一防焊層,位於該線路層上,該第一防焊層具有複數個第一開口,以分別暴露出該些線路的上表面;一第二防焊層,位於該線路層及該第一防焊層上,該第二防焊層具有複數個第二開口,分別對應該些線路,其中各該些線路的線寬小於各該些第二開口的孔徑;以及複數個表面處理層,分別位於該些線路上。 A printed circuit board comprising: a substrate; a circuit layer on the substrate, the circuit layer comprising a plurality of lines; a first solder resist layer on the circuit layer, the first solder resist layer having a plurality of An opening to respectively expose upper surfaces of the lines; a second solder resist layer on the circuit layer and the first solder resist layer, the second solder resist layer having a plurality of second openings respectively corresponding to And a line, wherein each of the lines has a line width smaller than an aperture of each of the second openings; and a plurality of surface treatment layers are respectively located on the lines. 如申請專利範圍第9或10項所述的印刷電路板,更包括:複數個焊球,分別位於該些表面處理層上。 The printed circuit board of claim 9 or 10, further comprising: a plurality of solder balls respectively located on the surface treatment layers.
TW105119873A 2016-06-24 2016-06-24 Printed circuit board and fabricating method thereof TWI576030B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW105119873A TWI576030B (en) 2016-06-24 2016-06-24 Printed circuit board and fabricating method thereof
CN201610925820.0A CN107548230A (en) 2016-06-24 2016-10-24 Printed circuit board and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW105119873A TWI576030B (en) 2016-06-24 2016-06-24 Printed circuit board and fabricating method thereof

Publications (2)

Publication Number Publication Date
TWI576030B true TWI576030B (en) 2017-03-21
TW201801583A TW201801583A (en) 2018-01-01

Family

ID=58766319

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105119873A TWI576030B (en) 2016-06-24 2016-06-24 Printed circuit board and fabricating method thereof

Country Status (2)

Country Link
CN (1) CN107548230A (en)
TW (1) TWI576030B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110933862A (en) * 2019-10-08 2020-03-27 广合科技(广州)有限公司 Solder-resisting zero-clearance PCB preparation method

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101262735A (en) * 1996-11-20 2008-09-10 揖斐电株式会社 Printed circuit boards
CN102934530A (en) * 2010-06-04 2013-02-13 揖斐电株式会社 Method for manufacturing wiring board
CN102084731B (en) * 2008-07-07 2013-04-03 揖斐电株式会社 Printed wiring board and method for manufacturing same
TW201324710A (en) * 2011-08-15 2013-06-16 Advanced Analogic Tech Inc Solder bump bonding in semiconductor package using solder balls having high-temperature cores
CN103202107A (en) * 2010-11-05 2013-07-10 富士胶片株式会社 Method for manufacturing printed wiring board, and printed wiring board
TW201603218A (en) * 2014-05-12 2016-01-16 英凡薩斯公司 Conductive connections, structures with such connections, and methods of manufacture

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2538067Y (en) * 2002-04-24 2003-02-26 威盛电子股份有限公司 Crystal covered package base
KR100850243B1 (en) * 2007-07-26 2008-08-04 삼성전기주식회사 Printed circuit board and manufacturing method thereof
CN101534607B (en) * 2008-03-12 2011-03-23 南亚电路板股份有限公司 Routing substrate and production method thereof
CN101282622B (en) * 2008-05-29 2011-04-06 日月光半导体制造股份有限公司 Circuit board and method for manufacturing the same
CN101599475A (en) * 2008-06-05 2009-12-09 欣兴电子股份有限公司 Buried circuit board and flip-chip encapsulating structure
CN102056398B (en) * 2009-11-06 2012-12-12 欣兴电子股份有限公司 Circuit board structure and making method thereof
CN105228364B (en) * 2015-10-30 2018-07-24 广州兴森快捷电路科技有限公司 Package substrate resistance welding processing method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101262735A (en) * 1996-11-20 2008-09-10 揖斐电株式会社 Printed circuit boards
CN102084731B (en) * 2008-07-07 2013-04-03 揖斐电株式会社 Printed wiring board and method for manufacturing same
CN102934530A (en) * 2010-06-04 2013-02-13 揖斐电株式会社 Method for manufacturing wiring board
CN103202107A (en) * 2010-11-05 2013-07-10 富士胶片株式会社 Method for manufacturing printed wiring board, and printed wiring board
TW201324710A (en) * 2011-08-15 2013-06-16 Advanced Analogic Tech Inc Solder bump bonding in semiconductor package using solder balls having high-temperature cores
TW201603218A (en) * 2014-05-12 2016-01-16 英凡薩斯公司 Conductive connections, structures with such connections, and methods of manufacture

Also Published As

Publication number Publication date
CN107548230A (en) 2018-01-05
TW201801583A (en) 2018-01-01

Similar Documents

Publication Publication Date Title
US8590147B2 (en) Method for fabricating circuit board structure with concave conductive cylinders
US9179552B2 (en) Wiring board
JP5913063B2 (en) Wiring board
JP2006196860A (en) Semiconductor package and method of fabricating it
JP2008004924A (en) Manufacturing method of package substrate
US20080185711A1 (en) Semiconductor package substrate
TWI455268B (en) Package substrate and method for fabricating the same
US7521800B2 (en) Solder pad and method of making the same
US8158891B2 (en) Circuit board structure and method for manufacturing the same
JP2010171387A (en) Circuit board structure and production method therefor
US20060243482A1 (en) Circuit board structure and method for fabricating the same
TW202017447A (en) Method for manufacturing circuit board
TWI386139B (en) Package substrate having double-sided circuits and fabrication method thereof
US8186043B2 (en) Method of manufacturing a circuit board
TWI419630B (en) Embedded printed circuit board and method of manufacturing the same
TWI395522B (en) Substrate with embedded device and fabrication method thereof
TWI576030B (en) Printed circuit board and fabricating method thereof
TWI669034B (en) Printed circuit board structure and method of forming the same
TWI455216B (en) Package method for quad flat no-lead package and its structure formedby
TWI360214B (en) Package substrate and method for fabricating the s
TWI407538B (en) Package substrate and fabrication method thereof
JP2011040720A (en) Printed circuit board and manufacturing method thereof
JP2009099730A (en) Solder ball arrangement-side surface structure of package board, and its manufacturing method
TWI607681B (en) Fabrication method for circuit substrate
TWI404466B (en) Printed circuit board

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees