TWI575221B - Surface roughness measurement system and method using the same - Google Patents
Surface roughness measurement system and method using the same Download PDFInfo
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一種表面粗度檢測系統及其方法,尤指一種差分干涉量測、四相位偏極感光元件與軸向色散模組所構成之表面粗度檢測方法,以及其所使用的系統。 A surface roughness detecting system and method thereof, in particular, a surface interference detecting method composed of a differential interference measuring, a four-phase polarizing photosensitive element and an axial dispersion module, and a system used therefor.
於現有的光電產業中,晶圓或晶粒的初步檢測係為粗度檢測,其係可分為接觸式量測或非接觸式量測。接觸式量測係以單點探針式架構進行量測,透過XYZ三軸移動量測出粗度資料。非接觸式量測係以光學探頭進行量測,其係利用干涉與共焦量測技術進行Z軸垂直掃描的移動,以進行形貌量測。 In the existing optoelectronic industry, the initial detection of wafers or grains is coarseness detection, which can be divided into contact measurement or non-contact measurement. The contact measurement system is measured by a single-point probe architecture, and the roughness data is measured by the XYZ three-axis movement amount. The non-contact measurement system is measured by an optical probe, which uses the interference and confocal measurement technology to perform the Z-axis vertical scanning movement to perform the topography measurement.
但上述之接觸式量測與非接觸式量測分別有其問題存在。接觸式量測的速度係非常緩慢,若需要進行大面積量測,則需要花費較長的時間。非接觸式量測係與區域面積量測,以加快量測速度,但量測時尚須要進行Z軸掃描,所以無法供生產線上量測使用。 However, the above-mentioned contact measurement and non-contact measurement have their own problems. The speed of contact measurement is very slow, and it takes a long time to perform large-area measurement. Non-contact measuring system and area measurement to speed up the measurement speed, but the measurement fashion needs to perform Z-axis scanning, so it can not be used for measurement on the production line.
本發明係提供一種表面粗度檢測系統,其包含有:一第一光源;一光譜控制單元;一光學準直模組; 一軸向色散模組;一第一光學單元;一第二光學單元;一光學導引模組;一第三光學單元;一第四光學單元;一第二光源;以及一四相位偏極感光元件;其中,該第一光源係提供一光束給該光學準直模組,該光束通過該光學準直模組後係形成為一第一組檢測光束,該軸向色散模組係位於該第一組檢測光束之行進路徑,該第一組檢測光束通過該軸向色散模組係形成一第三組檢測光束;該第二光源係提供一第二組檢測光束,該第四光學單元與該光學導引模組係位於該第二組檢測光束之行進路徑;該第一光學單元係位於該第三組檢測光束與該第二組檢測光束之交會路徑,該第三組檢測光束與該第二組檢測光束係結合,以形成一第四組檢測光束;該第二光學單元係位於該第四組檢測光束之行進路徑,該第四組檢測光束通過該第二光學單元後係形成為一第五組檢測光束;一待測物係設於該第五組檢測光束之行進路徑,該待測物係反射第五組檢測光束,以形成一第一組反射光束,該第一組反射光束係反射至該第二光學單元,以形成一第二組反射光束;該第二組反射光束係通過該第一光學單元,以形成一第三組反射光束與一第四組反射光束;第三組反射光束係通過該軸向色散模組,以形成一第五組反射光束;該第五組反射光束係通過該光學準直模組,以被該光譜控制單元所接收;該第四組反射光束係通過該光學導引模組與該第三光學單元,以形成一第六組反射光束,該第六組反射光束係被該四相位偏極感光元件所接收。 The invention provides a surface roughness detecting system, comprising: a first light source; a spectral control unit; an optical collimating module; An axial dispersion module; a first optical unit; a second optical unit; an optical guiding module; a third optical unit; a fourth optical unit; a second light source; and a four-phase polarization The first light source provides a light beam to the optical collimation module, and the light beam is formed into a first group of detection beams through the optical alignment module, and the axial dispersion module is located at the first a set of detection beam travel paths, the first set of detection beams forming a third set of detection beams through the axial dispersion module; the second source providing a second set of detection beams, the fourth optical unit and the The optical guiding module is located in a traveling path of the second group of detecting beams; the first optical unit is located at an intersection path of the third group of detecting beams and the second group of detecting beams, and the third group of detecting beams and the first The two sets of detection beams are combined to form a fourth set of detection beams; the second optical unit is located in the travel path of the fourth set of detection beams, and the fourth set of detection beams are formed into a fifth Detecting a light beam; a test object is disposed on a traveling path of the fifth group of detecting beams, wherein the object to be tested reflects a fifth group of detecting beams to form a first group of reflected beams, and the first group of reflected beams are reflected to The second optical unit is configured to form a second set of reflected light beams; the second set of reflected light beams are passed through the first optical unit to form a third set of reflected light beams and a fourth set of reflected light beams; and the third set of reflected light beams Passing through the axial dispersion module to form a fifth set of reflected beams; the fifth set of reflected beams passing through the optical collimation module to be received by the spectral control unit; the fourth set of reflected beams passing through The optical guiding module and the third optical unit form a sixth set of reflected light beams, and the sixth set of reflected light beams are received by the four-phase polarized photosensitive element.
本發明係提供一種表面粗度檢測方法,其步驟包含有:調整差分干涉條紋之相位與差分干涉影像,產生一差分干涉條紋與一差分干涉影像,調整該差分干涉調為之相位,並將該差 分干涉影像調整至一清晰對焦焦距位置,該清晰對焦焦距位置為一差分干涉焦平面;將聚焦光點之位置調整至差分干涉影像之中心位置,其係將一第一焦點、一第二焦點與一第三焦點調整至該差分干涉影像之中心位置;監控軸向色散模組接收之待測物反射訊號,讓差分干涉焦平面於一對焦與追焦範圍內,該第一焦點與第三焦點之間的距離係構成一對焦與追焦範圍,該差分干涉焦平面係位於該對焦與追焦範圍內;找出待測物與差分干涉焦平面的距離,並讓差分干涉焦平面對應於待測物的表面;以及得出四相位差分干涉影像,並計算出形貌資料,以評估粗糙度,該差分干涉焦平面視為一基礎,該第一焦點、該第二焦點與該第三焦點於一待測物的表面之聚焦位置係依該待測物的表面之起伏而改變,一四相位偏極感光元件依據該改變得出至少一四相位差分干涉影像,以得出一形貌資訊,該形貌資訊係可用於評估該待測物之表面粗糙度。 The invention provides a method for detecting a surface roughness, comprising the steps of: adjusting a phase of a differential interference fringe and a differential interference image, generating a differential interference fringe and a differential interference image, adjusting the phase of the differential interference, and difference The sub-interference image is adjusted to a clear focus focal length position, the clear focus focal length position is a differential interference focal plane; the position of the focused spot is adjusted to the center position of the differential interference image, which is a first focus, a second focus And adjusting a third focus to a center position of the differential interference image; monitoring a reflection signal of the object to be tested received by the axial dispersion module, and causing the differential interference focal plane to be within a focus and focus range, the first focus and the third focus The distance between the focal points constitutes a focus and focus range, the differential interference focal plane is located within the focus and focus range; the distance between the object to be measured and the differential interference focal plane is found, and the differential interference focal plane corresponds to a surface of the object to be tested; and a four-phase differential interference image is obtained, and the topography data is calculated to evaluate the roughness, the differential interference focal plane is regarded as a basis, the first focus, the second focus, and the third The focus position of the surface of the object to be tested is changed according to the fluctuation of the surface of the object to be tested, and the four-phase polarized photosensitive element obtains at least one four-phase difference according to the change. Related image information to derive a topography, the topography-based information can be used to evaluate the surface roughness of the material under test.
10‧‧‧第一光源 10‧‧‧First light source
11‧‧‧光譜控制單元 11‧‧‧Spectrum Control Unit
12‧‧‧光學準直模組 12‧‧‧Optical collimation module
120‧‧‧第一光纖準直鏡 120‧‧‧First fiber collimating mirror
121‧‧‧第二光纖準直鏡 121‧‧‧Second fiber collimating mirror
123‧‧‧1對2光耦合光纖 123‧‧‧1 pair of 2 optical coupling fibers
124‧‧‧第一組檢測光束 124‧‧‧First set of detection beams
13‧‧‧軸向色散模組 13‧‧‧Axial Dispersion Module
130‧‧‧第一凸透鏡 130‧‧‧First convex lens
131‧‧‧第一凹透鏡 131‧‧‧First concave lens
132‧‧‧第二凸透鏡 132‧‧‧second convex lens
133‧‧‧第三凸透鏡 133‧‧‧third convex lens
134‧‧‧第二凹透鏡 134‧‧‧second concave lens
135‧‧‧第四凸透鏡 135‧‧‧4th convex lens
136‧‧‧第三組檢測光束 136‧‧‧The third set of detection beams
137‧‧‧第一鏡組 137‧‧‧ first mirror
138‧‧‧第二鏡組 138‧‧‧Second mirror
139‧‧‧第五組反射光束 139‧‧‧The fifth set of reflected beams
14‧‧‧第一光學單元 14‧‧‧First optical unit
140‧‧‧第四組檢測光束 140‧‧‧Fourth set of test beams
142‧‧‧第三組反射光束 142‧‧‧The third set of reflected beams
143‧‧‧第四組反射光束 143‧‧‧Fourth set of reflected beams
15‧‧‧第二光學單元 15‧‧‧Second optical unit
150‧‧‧第五組檢測光束 150‧‧‧Fifth Group Detection Beam
151‧‧‧第二組反射光束 151‧‧‧Second set of reflected beams
16‧‧‧光學導引模組 16‧‧‧Optical guidance module
160‧‧‧差分干涉稜鏡 160‧‧‧Differential Interference
161‧‧‧反射鏡 161‧‧‧Mirror
162‧‧‧分光鏡 162‧‧‧beam splitter
17‧‧‧第三光學單元 17‧‧‧ Third optical unit
170‧‧‧第六組反射光束 170‧‧‧ sixth set of reflected beams
18‧‧‧第四光學單元 18‧‧‧Fourth optical unit
19‧‧‧第二光源 19‧‧‧second light source
190‧‧‧第二組檢測光束 190‧‧‧Second set of detection beams
20‧‧‧四相位偏極感光元件 20‧‧‧Four phase polarized photosensitive element
30‧‧‧待測物 30‧‧‧Test object
300‧‧‧第一組反射光束 300‧‧‧First set of reflected beams
A‧‧‧色散光源聚焦順序 A‧‧‧Dispersive light source focus sequence
B‧‧‧軸向色散範圍 B‧‧‧Axial dispersion range
C‧‧‧第一焦點 C‧‧‧ first focus
D‧‧‧第二焦點 D‧‧‧second focus
E‧‧‧第三焦點 E‧‧‧ third focus
F‧‧‧差分干涉焦平面 F‧‧‧Differential Interferometric Focal Plane
S1~S6‧‧‧步驟 S1~S6‧‧‧Steps
第1圖為本揭露一實施例之一種表面粗度檢測系統示意圖。 FIG. 1 is a schematic diagram of a surface roughness detecting system according to an embodiment of the present disclosure.
第2圖為本揭露之又一實施例之一種表面粗度檢測系統示意圖。 FIG. 2 is a schematic diagram of a surface roughness detecting system according to still another embodiment of the present disclosure.
第3圖為本揭露一實施例之一軸向色散模組之示意圖。 FIG. 3 is a schematic diagram of an axial dispersion module according to an embodiment of the present disclosure.
第4圖為本揭露一實施例,顯示一進行Z軸移動追焦,以使一四相位偏極感光元件取得一干涉影像之動作示意圖。 FIG. 4 is a schematic diagram showing an operation of performing Z-axis moving chasing to obtain an interference image by a four-phase polarizing photosensitive element according to an embodiment of the present disclosure.
第5A~5D圖為本揭露一實施例之四相位差分干涉影像之示意圖。 5A-5D are schematic diagrams of a four-phase differential interference image according to an embodiment of the present disclosure.
第6圖為一四相位差分干涉影像經重建後之示意圖。 Figure 6 is a schematic diagram of a four-phase differential interference image after reconstruction.
第7圖為本揭露一實施例之一種表面粗度檢測方法之流程圖。 FIG. 7 is a flow chart of a surface roughness detecting method according to an embodiment of the present disclosure.
以下係藉由多個具體實施例說明本揭露之實施方式,所屬技術領域中具有通常知識者可由本說明書所揭示之內容,輕易地瞭解本揭露之其他優點與功效。 The embodiments of the present disclosure are described in the following by means of a plurality of specific embodiments, and those skilled in the art can easily understand other advantages and functions of the disclosure by the contents disclosed in the specification.
請配合參考第1圖所示之實施例,本實施例係一種表面粗度檢測系統,其包含有一第一光源10、一光譜控制單元11、一光學準直模組12、一軸向色散模組13、一第一光學單元14、一第二光學單元15、一光學導引模組16、一第三光學單元17、一第四光學單元18、一第二光源19與一四相位偏極感光元件20。 Referring to the embodiment shown in FIG. 1 , the embodiment is a surface roughness detecting system including a first light source 10 , a spectral control unit 11 , an optical collimating module 12 , and an axial dispersion mode . Group 13, a first optical unit 14, a second optical unit 15, an optical guiding module 16, a third optical unit 17, a fourth optical unit 18, a second light source 19 and a four-phase bias Photosensitive element 20.
光學準直模組12具有一第一光纖準直鏡120與一第二光纖準直鏡121。 The optical collimation module 12 has a first fiber collimating mirror 120 and a second fiber collimating mirror 121.
第一光源10與光譜控制單元11係以一1對2光耦合光纖123耦接第一光纖準直鏡120。第一光源10為一連續光光源。第一光源10係提供一光束給第一光纖準直鏡120,該光束通過光學準直模組12,該光束係形成一第一組檢測光束124。 The first light source 10 and the spectrum control unit 11 are coupled to the first fiber collimating mirror 120 by a pair of two optical coupling fibers 123. The first light source 10 is a continuous light source. The first source 10 provides a beam of light to the first fiber collimating mirror 120, which passes through an optical collimation module 12 that forms a first set of detection beams 124.
軸向色散模組13係位於第一組檢測光束124之行進路徑。軸向色散模組13係具有依序排列的一第一凸透鏡130、一第一凹透鏡131、一第二凸透鏡132、一第三凸透鏡133、一第二凹透鏡134與一第四凸透鏡135。第一組檢測光束124通過軸向色散模組13係形成一第三組檢測光束136。第一凸透鏡130、第一凹透鏡131與第二凸透鏡132可被視為一第一鏡組137。第三凸透鏡133、第二凹透鏡134與第四凸透鏡135可被視為一第二鏡組138。 The axial dispersion module 13 is located in the path of travel of the first set of detection beams 124. The axial dispersion module 13 has a first convex lens 130, a first concave lens 131, a second convex lens 132, a third convex lens 133, a second concave lens 134 and a fourth convex lens 135. The first set of detection beams 124 form a third set of detection beams 136 through the axial dispersion module 13. The first convex lens 130, the first concave lens 131 and the second convex lens 132 can be regarded as a first mirror group 137. The third convex lens 133, the second concave lens 134, and the fourth convex lens 135 can be regarded as a second mirror group 138.
第二光源19為一單波長光源。第二光源19係提供一第二組檢測光束190。第四光學單元18與光學導引模組16係位於第二組檢測光束190之行進路徑。第四光學單元18為一準直鏡。光學導引模組16具有一分光鏡162、一反射鏡161與一差分干涉(Differential Interference Contrast,DIC)稜鏡160,差分干涉稜鏡160係例如為沃拉斯頓稜鏡(Wollaston Prism)。第二組檢測光束190係依序通過第四光學單元18、分光鏡162、反射鏡161與差分干涉稜鏡160。 The second source 19 is a single wavelength source. The second source 19 provides a second set of detection beams 190. The fourth optical unit 18 and the optical guiding module 16 are located in the traveling path of the second group of detecting beams 190. The fourth optical unit 18 is a collimating mirror. The optical guiding module 16 has a beam splitter 162, a mirror 161 and a differential interference (DIC) 稜鏡 160, and the differential interference 稜鏡 160 is, for example, Wollaston Prism. The second set of detection beams 190 are sequentially passed through the fourth optical unit 18, the beam splitter 162, the mirror 161, and the differential interference 稜鏡160.
第一光學單元14係位於第三組檢測光束136與第二組檢測光束190之行進路徑交會處,第三組檢測光束136與第二組檢測光束190係結合,以形成一第四組檢測光束140。第一光學單元14為一分光鏡。 The first optical unit 14 is located at a intersection of the third set of detection beams 136 and the second set of detection beams 190, and the third set of detection beams 136 are combined with the second set of detection beams 190 to form a fourth set of detection beams. 140. The first optical unit 14 is a beam splitter.
第二光學單元15係位於第四組檢測光束140之行進路徑,第四組檢測光束140通過第二光學單元15後係形成為一第五組檢測光束150。第二光學單元15為一顯微物鏡。 The second optical unit 15 is located in the traveling path of the fourth group of detecting beams 140, and the fourth group of detecting beams 140 is formed into a fifth group of detecting beams 150 after passing through the second optical unit 15. The second optical unit 15 is a microscope objective.
請參閱第2圖所示之實施例,一待測物30係設於第五組檢測光束150之行進路徑,該待測物30係反射第五組檢測光束150,以形成一第一組反射光束300。第一組反射光束300係反射至第二光學單元15,以形成一第二組反射光束151。 Referring to the embodiment shown in FIG. 2, a test object 30 is disposed on a traveling path of the fifth group of detecting beams 150, and the object to be tested 30 reflects the fifth group of detecting beams 150 to form a first group of reflections. Light beam 300. The first set of reflected beams 300 are reflected to the second optical unit 15 to form a second set of reflected beams 151.
第二組反射光束151係通過第一光學單元14,以形成一第三組反射光束142與一第四組反射光束143。第三組反射光束142係通過軸向色散模組13,以形成一第五組反射光束139,第五組反射光束139係通過光學準直模組12,以被光譜控制單元11所接收。 The second set of reflected beams 151 pass through the first optical unit 14 to form a third set of reflected beams 142 and a fourth set of reflected beams 143. The third set of reflected beams 142 pass through the axial dispersion module 13 to form a fifth set of reflected beams 139, and the fifth set of reflected beams 139 pass through the optical collimation module 12 to be received by the spectral control unit 11.
第四組反射光束143係通過光學導引模組16,若更進一步說明,第四組反射光束143係依序通過差分干涉稜鏡160、反射鏡161與分光鏡162。 The fourth set of reflected beams 143 pass through the optical guiding module 16. As further explained, the fourth set of reflected beams 143 sequentially pass through the differential interference 稜鏡160, the mirror 161 and the beam splitter 162.
第三光學單元17為一聚焦鏡,第三光學單元17係位於第四組反射光束143之行進路徑,第四組反射光束143通過第三光學單元17,以形成一第六組反射光束170。四相位偏極感光元件20係位於第六組反射光束170之行進路徑。 The third optical unit 17 is a focusing mirror, the third optical unit 17 is located in the traveling path of the fourth group of reflected light beams 143, and the fourth group of reflected light beams 143 is passed through the third optical unit 17 to form a sixth group of reflected light beams 170. The four-phase polarized photosensitive element 20 is located in the path of travel of the sixth set of reflected light beams 170.
請配合參考第7圖所示之實施例,本實施例係一種表面粗度檢測方法,其步驟包含有: Please refer to the embodiment shown in FIG. 7. This embodiment is a method for detecting the surface roughness, and the steps include:
步驟S1,調整差分干涉條紋之相位與差分干涉影像。如第1圖所示之實施例,第二光源19係提供一第二組檢測光束190,第二組檢測光束190係依序通過第四光學單元18與光學導引模組16。通過差分干涉稜鏡160之第二組檢測光束190係被視一差分干涉條紋,差分干涉稜鏡160將差分干涉條紋的相位調整為0度。 In step S1, the phase of the differential interference fringe and the differential interference image are adjusted. In the embodiment shown in FIG. 1, the second source 19 provides a second set of detection beams 190, and the second set of detection beams 190 sequentially passes through the fourth optical unit 18 and the optical guide module 16. The second set of detection beams 190 passing through the differential interference 稜鏡160 are viewed as a differential interference fringe, and the differential interference 稜鏡160 adjusts the phase of the differential interference fringes to 0 degrees.
第二組檢測光束190係被第一光學單元14導引至第二光學單元15,第二組檢測光束190係投射至待測物30之表面,藉由調整待測物30之表面於Z軸的位置,而使上述之差分干涉條紋於待測物30之表面,形成為一差分干涉影像,並將該差分干涉影像調整至一清晰對焦焦距位置,如第3圖所示之實施例,該清晰對焦焦距位置可視為一差分干涉焦平面F。 The second set of detection beams 190 are guided by the first optical unit 14 to the second optical unit 15, and the second set of detection beams 190 are projected onto the surface of the object to be tested 30 by adjusting the surface of the object to be tested 30 to the Z axis. a position of the differential interference fringe on the surface of the object to be tested 30, forming a differential interference image, and adjusting the differential interference image to a clear focus focal length position, as in the embodiment shown in FIG. 3, The clear focus focal length position can be regarded as a differential interference focal plane F.
步驟S2,將聚焦光點之位置調整至差分干涉影像之中心位置。請配合參閱第1圖與第3圖所示之實施例,第一光源10係提供一光束,光束係依序經過光學準直模組12,該光束係形成一第一組檢測光束124。 In step S2, the position of the focused spot is adjusted to the center position of the differential interference image. Referring to the embodiments shown in FIGS. 1 and 3, the first light source 10 provides a light beam, and the light beam sequentially passes through the optical collimation module 12, and the light beam forms a first set of detection beams 124.
如第3圖所示之實施例,第一組檢測光束124通過第一鏡組137時,第一組檢測光束124之色散光源聚焦順序A係例如由紅光、綠光與藍光,由內往外分佈。 In the embodiment shown in FIG. 3, when the first group of detection beams 124 pass through the first mirror group 137, the dispersion order of the first group of detection beams 124 is in focus order A, for example, from red, green and blue, from inside to outside. distributed.
第一組檢測光束124通過第二鏡組138,第一組檢測光束124係形成為第三組檢測光束136。第三組檢測光束136通過第一光學單元14後,第三組檢測光束136係形成為第四組檢測光束140。第四組檢測光束140通過第二光學單元15後,第二光學單元15能夠將第四組檢測光束140之聚焦範圍拉長為所需大小。軸向色散模組13能夠改變第三組檢測光束136之聚焦光訊號的方向,例如改為由藍光到紅光。其可依據各個光量測解析不同的特性進行設計。 The first set of detection beams 124 pass through a second set 138, and the first set of detection beams 124 are formed as a third set of detection beams 136. After the third set of detection beams 136 pass through the first optical unit 14, the third set of detection beams 136 are formed into a fourth set of detection beams 140. After the fourth set of detection beams 140 pass through the second optical unit 15, the second optical unit 15 is capable of elongating the focus range of the fourth set of detection beams 140 to a desired size. The axial dispersion module 13 is capable of changing the direction of the focused optical signal of the third set of detection beams 136, for example, from blue to red. It can be designed according to different characteristics of each light measurement and analysis.
第四組檢測光束140之軸向色散範圍B係至少形成一第一焦點C、一第二焦點D與一第三焦點E。第一焦點C、第二焦點D與第三焦點E係沿一軸向依序分佈。第一焦點C係例如為藍光之焦點。第二焦點D係例如為綠光之焦點。第三焦點E係例如為紅光之焦點。第四組檢測光束140與第二組檢測光束190係結合,以形成第五組檢測光束150。 The axial dispersion range B of the fourth group of detection beams 140 forms at least a first focus C, a second focus D and a third focus E. The first focus C, the second focus D, and the third focus E are sequentially distributed along one axial direction. The first focus C is, for example, the focus of blue light. The second focus D is, for example, the focus of green light. The third focus E is, for example, the focus of red light. The fourth set of detection beams 140 are combined with a second set of detection beams 190 to form a fifth set of detection beams 150.
第一焦點C、第二焦點D與第三焦點E係於該差分干涉影像之中心位置處。 The first focus C, the second focus D, and the third focus E are at a center position of the differential interference image.
步驟S3,監控軸向色散模組接收之待測物反射訊號,讓差分 干涉焦平面於一對焦與追焦範圍內。如第3圖所示之實施例中的軸向色散範圍B。 Step S3, monitoring the reflected signal of the object to be tested received by the axial dispersion module, so that the difference The interference focal plane is within a focus and focus range. The axial dispersion range B in the embodiment as shown in Fig. 3.
如第3圖所示,第一焦點C與第三焦點E之間的距離係能夠構成一對焦與追焦範圍。差分干涉焦平面F係位於第一焦點C與第三焦點E之間,即該對焦與追焦範圍內。 As shown in FIG. 3, the distance between the first focus C and the third focus E can constitute a focus and focus range. The differential interference focal plane F is located between the first focus C and the third focus E, that is, within the focus and focus range.
如將第二光學單元15作為差分干涉的基礎,並透過第一光學單元14讓軸向色散模組13之光源與差分干涉之光源達成共路。該差分干涉之光源係如第1圖所示之實施例中來自光學導引模組16之光源。 If the second optical unit 15 is used as the basis of the differential interference, the light source of the axial dispersion module 13 and the light source of the differential interference are shared by the first optical unit 14. The light source of the differential interference is the light source from the optical guiding module 16 in the embodiment shown in FIG.
軸向色散模組13係藉由多組光學鏡組,如上所述之第一鏡組137與第二鏡組138,而達到軸向色散現象,再由第二光學單元15進行成像。 The axial dispersion module 13 achieves axial dispersion by a plurality of sets of optical mirrors, the first mirror set 137 and the second mirror set 138 as described above, and is imaged by the second optical unit 15.
此時連續波段的光源會依不同波長聚焦至多個深度位置,如第3圖所示之第一焦點C至第三焦點E。軸向色散模組13可讓本揭露之表面粗度檢測系統能夠及時得到目前的高度資訊,藉以進行對焦與追焦功能,以反射光訊號的波長資訊做為高度的判斷依據,進而進行Z軸快速追焦,同時記錄各點(如上述之焦點)之間因高度變化所移動的Z軸距離量,以作為共面度計算資訊,如下述之步驟。 At this time, the light source of the continuous band will be focused to a plurality of depth positions according to different wavelengths, such as the first focus C to the third focus E shown in FIG. The axial dispersion module 13 can enable the surface roughness detection system of the present invention to obtain the current height information in time, thereby performing focusing and chasing functions, and using the wavelength information of the reflected optical signal as the basis for judging the height, and then performing the Z-axis. Quickly chase the focus, and record the amount of Z-axis distance moved by each point (such as the above focus) due to the height change, as the coplanarity calculation information, as described below.
步驟S4,找出待測物與差分干涉焦平面的距離,並讓差分干涉焦平面對應於待測物的表面。如第3圖所示之差分干涉焦平面F與如第1圖所示之待測物30的表面仍具有一距離,找出該距離,並記錄該距離。再將差分干涉焦平面F對應於待測物30的表面。 In step S4, the distance between the object to be tested and the differential interference focal plane is found, and the differential interference focal plane corresponds to the surface of the object to be tested. The differential interference focal plane F as shown in Fig. 3 still has a distance from the surface of the object to be tested 30 as shown in Fig. 1, finds the distance, and records the distance. The differential interference focal plane F is then corresponding to the surface of the object 30 to be tested.
步驟S5,得出四相位差分干涉影像,並計算出形貌資料,以評估粗糙度。如第4圖所示之實施例,待測物30的表面具有多個起伏。差分干涉焦平面F可視為一基礎。第一焦點C、第二焦點D與第三焦點E於待測物30的表面之聚焦位置係依待測物30的表面之起伏而改變。待測物30係反射第五檢測光束150,以形成第一組反射光束300。 In step S5, a four-phase differential interference image is obtained, and the topography data is calculated to evaluate the roughness. As in the embodiment shown in Fig. 4, the surface of the object to be tested 30 has a plurality of undulations. The differential interference focal plane F can be regarded as a basis. The focus position of the first focus C, the second focus D, and the third focus E on the surface of the object to be tested 30 changes depending on the fluctuation of the surface of the object to be tested 30. The object to be tested 30 reflects the fifth detection beam 150 to form a first group of reflected beams 300.
如第2圖所示之實施例,第一組反射光束300係包含有上述 之聚焦位置改變與第一焦點C至第三焦點D對比差分干涉焦平面F之影像資訊。第一組反射光束300係反射至第二光學單元15,以形成第二組反射光束151。 As in the embodiment shown in FIG. 2, the first set of reflected beams 300 includes the above The focus position changes the image information of the differential interference focal plane F with the first focus C to the third focus D. The first set of reflected beams 300 are reflected to the second optical unit 15 to form a second set of reflected beams 151.
第二組反射光束151係通過第一光學單元14,以形成第三組反射光束142與第四組反射光束143。第三組反射光束142係通過軸向色散模組13,以形成第五組反射光束139。第五組反射光束139係通過光學準直模組12,以被光譜控制單元11所接收,光譜分析單元11係分析第五組反射光束139之光譜,並記錄該光譜資料。該光譜資料係用於判斷上述之對焦資料。 The second set of reflected beams 151 pass through the first optical unit 14 to form a third set of reflected beams 142 and a fourth set of reflected beams 143. The third set of reflected beams 142 pass through the axial dispersion module 13 to form a fifth set of reflected beams 139. The fifth set of reflected beams 139 are passed through the optical collimation module 12 to be received by the spectral control unit 11, and the spectral analysis unit 11 analyzes the spectra of the fifth set of reflected beams 139 and records the spectral data. The spectral data is used to determine the above-mentioned focus data.
第四組反射光束143係通過光學導引模組16與第三光學單元17,以形成一第六組反射光束170。第六組反射光束170係被四相位偏極感光元件20所接收。四相位偏極感光元件20依據該第六組反射光束產生至少一四相位干涉影像。如第5A~5D圖所示,其係為一四相位干涉影像。 The fourth set of reflected beams 143 pass through the optical guiding module 16 and the third optical unit 17 to form a sixth set of reflected beams 170. The sixth set of reflected beams 170 are received by the four-phase polarized photosensitive element 20. The four-phase polarized photosensitive element 20 generates at least one four-phase interference image based on the sixth set of reflected light beams. As shown in Figures 5A-5D, it is a four-phase interference image.
多個四相位干涉影像係得出一形貌資訊,該形貌資訊係可用於評估待測物30之表面粗糙度。 A plurality of four-phase interference images obtain a topographical information that can be used to evaluate the surface roughness of the object to be tested 30.
承上所述,軸向色散模組13係能夠讓光譜控制單元11得到目前待測物30的表面資訊,藉以進行對焦與追焦功能。光譜控制單元11係以反射光訊號的波長資訊做為高度的判斷依據進而進行Z軸快速追焦,同時紀錄各點之間因高度變化所移動的Z軸距離量,而做為共面度計算資訊。 As described above, the axial dispersion module 13 enables the spectrum control unit 11 to obtain the surface information of the current object 30 to perform focusing and tracking functions. The spectrum control unit 11 performs the Z-axis fast tracking by using the wavelength information of the reflected optical signal as the basis for determining the height, and simultaneously records the Z-axis distance between the points due to the height change, and calculates the coplanarity. News.
如第4圖所示之實施例,反射光波長與量測高度變化的對應關係如式(1),可表示為二次曲線,a、b與c為曲線參數,λ為各個波長。 As shown in the embodiment of Fig. 4, the correspondence between the wavelength of the reflected light and the change in the measured height is expressed as a quadratic curve, a, b and c are curve parameters, and λ is a respective wavelength.
Z=a λ2+b λ+c (1) Z=a λ 2 +b λ+c (1)
在各個量測位置進行快速追焦之後,將進行差分干涉影像擷取,透過四相位偏極感光元件20使得差分干涉影像產生四種不同干涉相位的變化。 After fast tracking in each measurement position, differential interference image capture is performed, and the four-phase polarization sensor 20 is used to cause differential interference images to produce four different interference phase changes.
如第5A~5D圖所示之實施例,四相位偏極感光元件20係取得四組干涉影像I1、I2、I3與I4,其相位差異變化相對值α為90°(Φ +0°,Φ+90°,Φ+180°,Φ+270°),並藉由四步相位移演算法演算(2)(3)計算出相位變化Φ,再由相位變化轉換成形貌高度。 As shown in the fifth embodiment of the fifth embodiment, the four-phase polarization detecting element 20 obtains four sets of interference images I 1 , I 2 , I 3 and I 4 , and the phase difference change relative value α is 90° (Φ + 0°, Φ+90°, Φ+180°, Φ+270°), and calculate the phase change Φ by the four-step phase shift algorithm (2)(3), and then transform the shape height by phase change .
I 1=I'+I"cosΦ I 2=I'+I"cos(Φ+α) I 3=I'+I"cos(Φ+2α) I 4=I'+I"cos(Φ+3α) (2) I 1 = I '+ I "cosΦ I 2 = I '+ I "cos(Φ+α) I 3 = I '+ I "cos(Φ+2α) I 4 = I '+ I "cos(Φ+3α ) (2)
由此四相位影像重建出高度形貌如第6圖所示。 The four-phase image reconstructs the height profile as shown in Fig. 6.
本實施例使用四相位偏極感光元件20,但本發明並不限於此,例如在一實施例中,亦可使用N相位偏極陣列感光元件,其中N大於2,且相位差異變化相對值α亦不限於90°。 This embodiment uses the four-phase polarized photosensitive element 20, but the present invention is not limited thereto. For example, in an embodiment, an N-phase polarized array photosensitive element may be used, wherein N is greater than 2, and the phase difference varies relative value α. It is also not limited to 90°.
步驟S6,移動多區域測量,並記錄各區域的表面高度變化,以評估待測物之平面度資訊。將待測物30的表面分為多個區域,並於各區域重覆進行上述之S4與S5步驟,以得出各區域的表面高度變化,並記錄該些表面高度變化。再由所記錄之該些表面高度變化,以評估待測物30之表面資訊。 In step S6, the multi-area measurement is moved, and the surface height change of each area is recorded to evaluate the flatness information of the object to be tested. The surface of the object to be tested 30 is divided into a plurality of regions, and the above-mentioned steps S4 and S5 are repeated in each region to obtain surface height variations of the respective regions, and the surface height changes are recorded. The surface height changes recorded are then evaluated to evaluate the surface information of the object 30 to be tested.
綜合上述,四相位偏極感光元件20的曝光時間係能夠決定上述之各區域之間的量測速度,所以本揭露可達到快速即時粗糙度量測,並可讓差分干涉量測可以進行區域範圍的粗糙度量測而且能準確的量測到各個區域的高度變化值。而且本揭露具有非同軸對焦裝置的優點,能夠準確的偵測到四相位偏極感光元件20的對焦平面,讓四相位偏極感光元件20獲得清晰的干涉影像來進行粗糙度量測。 In summary, the exposure time of the four-phase polarized photosensitive element 20 can determine the measurement speed between the above-mentioned regions, so the present disclosure can achieve fast and instantaneous roughness measurement, and can make the differential interference measurement can be performed on the regional range. The roughness measurement and accurate measurement of the height variation of each area. Moreover, the present disclosure has the advantages of a non-coaxial focusing device, which can accurately detect the focusing plane of the four-phase polarizing photosensitive element 20, and allow the four-phase polarizing photosensitive element 20 to obtain a clear interference image for roughness measurement.
以上所述之具體實施例,僅係用於例釋本發明之特點及功效,而非用於限定本發明之可實施範疇,於未脫離本發明上揭之精神與技術範疇下,任何運用本發明所揭示內容而完成之等效改變及修飾,均仍應為下述之申請專利範圍所涵蓋。 The specific embodiments described above are only used to exemplify the features and functions of the present invention, and are not intended to limit the scope of the present invention, and may be used without departing from the spirit and scope of the invention. Equivalent changes and modifications made to the disclosure of the invention are still covered by the scope of the following claims.
10‧‧‧第一光源 10‧‧‧First light source
11‧‧‧光譜控制單元 11‧‧‧Spectrum Control Unit
12‧‧‧光學準直模組 12‧‧‧Optical collimation module
120‧‧‧第一光纖準直鏡 120‧‧‧First fiber collimating mirror
121‧‧‧第二光纖準直鏡 121‧‧‧Second fiber collimating mirror
123‧‧‧1對2光耦合光纖 123‧‧‧1 pair of 2 optical coupling fibers
124‧‧‧第一組檢測光束 124‧‧‧First set of detection beams
13‧‧‧軸向色散模組 13‧‧‧Axial Dispersion Module
130‧‧‧第一凸透鏡 130‧‧‧First convex lens
131‧‧‧第一凹透鏡 131‧‧‧First concave lens
132‧‧‧第二凸透鏡 132‧‧‧second convex lens
133‧‧‧第三凸透鏡 133‧‧‧third convex lens
134‧‧‧第二凹透鏡 134‧‧‧second concave lens
135‧‧‧第四凸透鏡 135‧‧‧4th convex lens
136‧‧‧第三組檢測光束 136‧‧‧The third set of detection beams
137‧‧‧第一鏡組 137‧‧‧ first mirror
138‧‧‧第二鏡組 138‧‧‧Second mirror
14‧‧‧第一光學單元 14‧‧‧First optical unit
140‧‧‧第四組檢測光束 140‧‧‧Fourth set of test beams
15‧‧‧第二光學單元 15‧‧‧Second optical unit
150‧‧‧第五組檢測光束 150‧‧‧Fifth Group Detection Beam
16‧‧‧光學導引模組 16‧‧‧Optical guidance module
160‧‧‧差分干涉稜鏡 160‧‧‧Differential Interference
161‧‧‧反射鏡 161‧‧‧Mirror
162‧‧‧分光鏡 162‧‧‧beam splitter
17‧‧‧第三光學單元 17‧‧‧ Third optical unit
18‧‧‧第四光學單元 18‧‧‧Fourth optical unit
19‧‧‧第二光源 19‧‧‧second light source
190‧‧‧第二組檢測光束 190‧‧‧Second set of detection beams
20‧‧‧四相位偏極感光元件 20‧‧‧Four phase polarized photosensitive element
30‧‧‧待測物 30‧‧‧Test object
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TW104138585A TWI575221B (en) | 2015-11-20 | 2015-11-20 | Surface roughness measurement system and method using the same |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN112326203A (en) * | 2020-10-28 | 2021-02-05 | 桂林电子科技大学 | Method for determining imaging system parameters through interference fringe central area data |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3849003A (en) * | 1970-03-25 | 1974-11-19 | Philips Corp | Interferometer apparatus for measuring the roughness of a surface |
US4534649A (en) * | 1981-10-30 | 1985-08-13 | Downs Michael J | Surface profile interferometer |
US5133601A (en) * | 1991-06-12 | 1992-07-28 | Wyko Corporation | Rough surface profiler and method |
WO2012094175A2 (en) * | 2011-01-07 | 2012-07-12 | Zeta Instruments, Inc. | 3d microscope including insertable components to provide multiple imaging and measurement capabilities |
TW201303286A (en) * | 2011-03-15 | 2013-01-16 | 荏原製作所股份有限公司 | Inspection apparatus |
TWI467127B (en) * | 2009-05-21 | 2015-01-01 | 尼康股份有限公司 | Means, observation means and an image processing method for measuring the shape of |
-
2015
- 2015-11-20 TW TW104138585A patent/TWI575221B/en active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3849003A (en) * | 1970-03-25 | 1974-11-19 | Philips Corp | Interferometer apparatus for measuring the roughness of a surface |
US4534649A (en) * | 1981-10-30 | 1985-08-13 | Downs Michael J | Surface profile interferometer |
US5133601A (en) * | 1991-06-12 | 1992-07-28 | Wyko Corporation | Rough surface profiler and method |
TWI467127B (en) * | 2009-05-21 | 2015-01-01 | 尼康股份有限公司 | Means, observation means and an image processing method for measuring the shape of |
WO2012094175A2 (en) * | 2011-01-07 | 2012-07-12 | Zeta Instruments, Inc. | 3d microscope including insertable components to provide multiple imaging and measurement capabilities |
TW201303286A (en) * | 2011-03-15 | 2013-01-16 | 荏原製作所股份有限公司 | Inspection apparatus |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112326203A (en) * | 2020-10-28 | 2021-02-05 | 桂林电子科技大学 | Method for determining imaging system parameters through interference fringe central area data |
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