TWI570397B - Optical evaluation of lenses and lens molds - Google Patents

Optical evaluation of lenses and lens molds Download PDF

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TWI570397B
TWI570397B TW104126497A TW104126497A TWI570397B TW I570397 B TWI570397 B TW I570397B TW 104126497 A TW104126497 A TW 104126497A TW 104126497 A TW104126497 A TW 104126497A TW I570397 B TWI570397 B TW I570397B
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parallel portion
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TW201621290A (en
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迪 雷加 塞維爾 柯隆納
馬丁 費
古魯特 彼德J De
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賽格股份有限公司
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透鏡和透鏡模具的光學評估技術 Optical evaluation techniques for lenses and lens molds 參照相關申請 Refer to related application

本申請主張臨時申請案No.62/037,966的優先權,其標題為具有機械定位特徵的透鏡的尺寸與光學性質的光學評估,於2014年8月15日提申。以及本申請主張臨時申請案No.62/039,398的優先權,其標題為透鏡上的特徵位置的光學評估,於2014年8月19日提申。在此引入兩篇臨時申請案的全文內容作為參考。 The present application claims priority to Provisional Application No. 62/037,966, the disclosure of which is incorporated herein by reference in its entirety in its entirety in the entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire all And the priority of the present application, which is incorporated herein by reference. The full text of the two provisional applications is hereby incorporated by reference.

在特定樣態,本揭露是有關於描述模造透鏡的幾何與光學性質的方法與工具,模造透鏡用在消費性產品,並且以鑽石轉模造製造透鏡。本揭露更有關於包括此種模造透鏡的光學組件的製造,以及包括此種光學組件的消費性產品的製造。 In a particular aspect, the present disclosure is directed to methods and tools for describing the geometric and optical properties of molded lenses that are used in consumer products and that are manufactured by diamond transfer molding. The present disclosure is more concerned with the manufacture of optical components including such molded lenses, as well as the manufacture of consumer products including such optical components.

用在智慧型手機、手機、平板、攜帶型電腦、汽車以及卡車中的微型化相機的市場正快速擴張。對最先進的相機的影像品質需求迫使製造商發展複雜的、由很多非球面模造透鏡所組成的光學組件。 The market for miniaturized cameras used in smart phones, mobile phones, tablets, portable computers, automobiles and trucks is expanding rapidly. The image quality requirements of state-of-the-art cameras are forcing manufacturers to develop complex optical components consisting of many aspherically molded lenses.

圖1繪示一例示性光學組件,由四個模造塑膠透鏡所組成。尤其是,在美國專利號No.7,777,972中說明的此組件包含四個透鏡,四個透鏡在組件的相平面170前排列,以在感測器上形成一影像。透鏡元件排列成具有非球面凸物側面101、非球面凸像側面102以及正折射率的一第一透鏡元件100的第一透鏡群。組件也包括含第二透鏡元件110、第三透鏡元件120與第四透鏡元件130的的第二透鏡群。 Figure 1 illustrates an exemplary optical assembly consisting of four molded plastic lenses. In particular, the assembly illustrated in U.S. Patent No. 7,777,972 comprises four lenses, four lenses being arranged in front of the phase plane 170 of the assembly to form an image on the sensor. The lens elements are arranged in a first lens group having a non-spherical convex side 101, an aspherical convex side 102, and a first lens element 100 having a positive refractive index. The assembly also includes a second lens group including second lens element 110, third lens element 120, and fourth lens element 130.

負折射率的第二透鏡元件110有非球面凸物側面111與非球面凹像側面112。第三透鏡元件120具有非球面凹物側面121與非球面凸像側面122。第四透鏡元件130具有非球面凸物側面131與非球面凹像側面132。孔徑止擋140位在第一透鏡元件100與被取像的物體之間。紅外線濾波器150配置在第四透鏡元件130的像側面132與像平面170之間。紅外線濾波器150不影響成像光學透鏡組件的焦長。感測器蓋玻璃160被排列在紅外線濾波器150與像平面170之間,感測器蓋玻璃160也不影響成像光學透鏡組件的焦長。 The second lens element 110 having a negative refractive index has an aspherical convex side 111 and an aspherical concave side 112. The third lens element 120 has an aspherical concave side 121 and an aspherical convex side 122. The fourth lens element 130 has an aspherical convex side surface 131 and an aspherical concave image side surface 132. The aperture stop 140 is positioned between the first lens element 100 and the imaged object. The infrared filter 150 is disposed between the image side surface 132 of the fourth lens element 130 and the image plane 170. The infrared filter 150 does not affect the focal length of the imaging optical lens assembly. The sensor cover glass 160 is arranged between the infrared filter 150 and the image plane 170, and the sensor cover glass 160 does not affect the focal length of the imaging optical lens assembly.

一般來說,彎曲的透鏡面是對一軸呈旋轉對稱,且每個表面上的軸名義上位在一共用軸(組件的光軸)。透鏡面軸的共用片見性(centration,即定心)對整體組件的光學效能很重要。另外也很重要的是,每個透鏡面的曲率與在每個透鏡表面之間的間隙,即透鏡的厚度與鄰近透鏡之間的間隙。 Generally, a curved lens surface is rotationally symmetric about an axis, and the axes on each surface are nominally on a common axis (the optical axis of the assembly). The common slice visibility of the lens face axis is important to the optical performance of the overall assembly. It is also important that the curvature of each lens face is the gap between each lens surface, ie the thickness of the lens and the gap between adjacent lenses.

於是,每個獨立的透鏡典型包括多個片見性與間隙基準,以足夠小的公差製造。當圖1中繪示的曲面功能光學面層疊在一起,提供最終透鏡組件的適當對齊。這些基準一般 由每個透鏡上額外的非光學作用區域提供,其形成環繞有效的透鏡部分邊緣的一環。當組裝時,透鏡的非光學部分相對於彼此層疊在一起,整體透鏡組件設計需求對齊與間隔的透鏡部分。 Thus, each individual lens typically includes a plurality of sheet visibility and gap references, fabricated with sufficiently small tolerances. The curved functional optical faces illustrated in Figure 1 are laminated together to provide proper alignment of the final lens assembly. These benchmarks are generally Provided by an additional non-optical active area on each lens that forms a loop around the edge of the active lens portion. When assembled, the non-optical portions of the lens are stacked together relative to one another, and the overall lens assembly design requires alignment and spacing of the lens portions.

因為緊縮製造公差,在很多案例中習知的量測儀器(如接觸探針與儀表、觸覺輪廓儀、檢視顯微鏡)不再能達到所需的準確度或量測再現性。此外,在製造層面來說,用以量測某些透鏡性質(如折射率或雙折射性)的量測儀器也無法在市場上買到。於是,量測儀器的缺漏直至今日。 Because of the tight manufacturing tolerances, in many cases conventional measuring instruments (such as contact probes and gauges, tactile profilometers, inspection microscopes) are no longer able to achieve the required accuracy or measurement reproducibility. In addition, at the manufacturing level, measurement instruments used to measure certain lens properties, such as refractive index or birefringence, are not commercially available. Therefore, the measurement instrument is missing until today.

本揭露的方法與裝置可用以評估透明樣品的尺寸與光學性質,尤其是包括含彎曲的有效面區域的透鏡,且包括名義上平的、平行的上與下表面區域,舉例而言,在組件裡,機構上定位這些透鏡。 The methods and apparatus of the present disclosure can be used to evaluate the size and optical properties of a transparent sample, particularly a lens comprising a curved effective face area, and including nominally flat, parallel upper and lower surface areas, for example, in a component These lenses are positioned on the body.

在實施例中,裝置包括光學量測系統,用於量測樣品的名義上平行的上和下表面區域的相對位置,並且,使用來自樣品的名義上平行的上、下表面區域的兩個或多個位置所計算的光學和物理厚度而得到的訊息,用數據處理系統評估樣品的光學和尺寸特性。 In an embodiment, the apparatus includes an optical metrology system for measuring the relative position of the nominally parallel upper and lower surface regions of the sample and using two or more of the nominally parallel upper and lower surface regions from the sample The information obtained from the optical and physical thicknesses calculated at multiple locations is evaluated by the data processing system for the optical and dimensional characteristics of the sample.

二擇一地,或額外地,本揭露的方法與裝置,對樣品的上、下表面,通過組合三維表面形貌訊息(例如高度輪廓)與二維圖像(例如強度分佈),評估透明樣品(例如透鏡)的尺寸性質。形貌訊息和兩個圖像可以從樣品的相同側獲得。 Alternatively, or additionally, the method and apparatus of the present disclosure evaluates transparent samples by combining three-dimensional surface topographical information (eg, height contours) with two-dimensional images (eg, intensity distribution) on the upper and lower surfaces of the sample. The dimensional properties of (eg lenses). The topographical message and two images can be obtained from the same side of the sample.

方法和裝置可以在生產環境中使用。 The method and apparatus can be used in a production environment.

在一般情況下,樣品可以是透鏡,其包括被彎曲的上下有效表面區域(例如具有光功率),以及不被使用於導光的額外的上和下表面的區域。不被使用於導光的額外的上和下表面的區域是用於把在組件中的這些透鏡進行機械定位。這些部分可以具有平面平行表面。彎曲部分可以被稱為有效部分,而其他(例如,平面平行的部分)為非作用的部分。樣本可以具有是凸或凹、球面或非球面的有效部分的表面區域。 In general, the sample may be a lens that includes curved upper and lower effective surface areas (eg, having optical power), as well as areas that are not used for additional upper and lower surfaces of the light guide. The areas that are not used for the additional upper and lower surfaces of the light guide are used to mechanically position the lenses in the assembly. These portions may have planar parallel surfaces. The curved portion may be referred to as an active portion, while the other (eg, planarly parallel portions) are inactive portions. The sample may have a surface area that is a convex or concave, spherical or aspherical effective portion.

非作用部分的上和下表面可以是名義上平坦的或呈圓錐形,並且可以包括名義上為圓形的特徵或邊界,邊界為名義上與有效面積區域的頂點同心。 The upper and lower surfaces of the inactive portion may be nominally flat or conical and may include a nominally circular feature or boundary that is nominally concentric with the apex of the effective area region.

樣品可以是透鏡,用於便攜式電子設備的相機組件中。 The sample can be a lens for use in a camera assembly of a portable electronic device.

在一般情況下,尺寸特性可包括相對於額外的表面區域的參考特徵(例如,名義上圓形的參考特徵)的有效表面區域的頂點的位置。在一些實施例中,透鏡頂點是由三維的掠面表面形貌地圖評估而得,而參考特徵位於部件的二維圖像中。二維圖像可以來自如三維地圖相同的數據採集而提取,或可以是獨立的步驟的一部分。 In general, the dimensional characteristics may include the position of the apex of the effective surface area relative to a reference feature of the additional surface area (eg, a nominally circular reference feature). In some embodiments, the lens apex is evaluated from a three-dimensional swept surface topography map, and the reference features are located in a two-dimensional image of the component. Two-dimensional images can be extracted from the same data collection as a three-dimensional map, or can be part of a separate step.

尺寸特性可包括樣品的上和下頂點特徵的相對高度。這種量測可以依賴於來自於在樣品的名義上平行的上、下表面區域的兩個或多個位置所計算出的光學和物理厚度的額外訊息。 The dimensional characteristics may include the relative heights of the upper and lower vertex features of the sample. Such measurements may rely on additional information from the optical and physical thicknesses calculated at two or more locations of the nominally parallel upper and lower surface regions of the sample.

在某些實施例中,當透過樣品取景以確定其橫向位置時,該方法包括補償透鏡的折射性質。 In some embodiments, the method includes compensating for the refractive properties of the lens when traversing the sample to determine its lateral position.

在一些實施例中,裝置包括部件夾具,其包括輔助參考表面。這個輔助參考表面可以是名義上平坦的,並且位於光學組件之下的一距離,在測試時,它反射通過光學部件傳播回部件並朝向量測偵測管道的光。 In some embodiments, the device includes a component holder that includes an auxiliary reference surface. This auxiliary reference surface can be nominally flat and located a distance below the optical component that, during testing, reflects through the optical component and back to the component and measures the light of the detection tube.

在一些實施例中,裝置包括部件夾具、光學量測系統以及資料處理系統。部件夾具同時具有輔助參考表面與用於至少部分透明的樣品的夾具。光學量測系統為了量測輔助參考表面的位置以及在名義上平行的樣品的上、下表面區域。資料處理系統使用來自於在樣品的名義上平行的上和下表面區域的兩個或多個位置所計算的光學和物理厚度而衍生的訊息,評估樣品的光學與尺寸性質。 In some embodiments, the device includes a component fixture, an optical metrology system, and a data processing system. The component holder has both an auxiliary reference surface and a clamp for the at least partially transparent sample. The optical metrology system measures the position of the auxiliary reference surface and the upper and lower surface areas of the nominally parallel sample. The data processing system evaluates the optical and dimensional properties of the sample using information derived from optical and physical thicknesses calculated from two or more locations of the nominally parallel upper and lower surface regions of the sample.

在一些實施例中,完整的量測循環包括輔助參考表面的形貌的一個單獨的量測。 In some embodiments, the complete measurement cycle includes a separate measurement of the topography of the auxiliary reference surface.

在一些實施例中,裝置包括元件(多個),以改變量測系統(例如偏振器和/或波板)中使用的光的偏振狀態,以便評估與/或補償樣品的材料的雙折射性質。 In some embodiments, the device includes element(s) to change the polarization state of light used in the measurement system (eg, polarizer and/or wave plate) to evaluate and/or compensate for the birefringence properties of the material of the sample. .

在一些實施例中,光學量測裝置的視野延伸超出待測的光學部件的橫向範圍。為了提高精確度和降低漂移的靈敏度,相對於參考表面的內部基準,在參考表面未被光學部件覆蓋的區域,系統進行參考表面的位置的一個附加的量測。 In some embodiments, the field of view of the optical metrology device extends beyond the lateral extent of the optical component to be tested. To improve accuracy and reduce drift sensitivity, the system performs an additional measurement of the position of the reference surface relative to the internal reference of the reference surface where the reference surface is not covered by the optical component.

在一些實施例中,光學量測裝置是同調掃描干涉儀。例如,光學量測裝置可以是同調掃描干涉儀,掃描名義上平行於待測的光學部件的光軸。光源的同調特性可以被選擇,以提高(例如,最大化)的干涉信號的信噪比(對經由部件掃 描的過程中遇到的每個透明介面而蒐集的)。 In some embodiments, the optical metrology device is a coherent scanning interferometer. For example, the optical metrology device can be a coherent scanning interferometer that scans the optical axis nominally parallel to the optical component to be tested. The homology characteristics of the light source can be selected to increase (eg, maximize) the signal to noise ratio of the interfering signal (for sweeping via components) Collected by each transparent interface encountered in the process of drawing).

在一些實施例中,根據有關部件的厚度和光學性質的量測或標稱訊息,同調掃描干涉儀自動調節光源同調特性來增強(例如,最大化)信噪比。 In some embodiments, the coherent scanning interferometer automatically adjusts the source coherence characteristics to enhance (eg, maximize) the signal to noise ratio based on measurements or nominal information about the thickness and optical properties of the component.

在一些實施例中,相對於儀器在多個方位角方向量測樣本的量測結果被組合,以產生具有降低的系統誤差的最終結果。 In some embodiments, measurements of the measured samples in a plurality of azimuthal directions relative to the instrument are combined to produce a final result with reduced systematic error.

在一些實施例中,藉由掃描,使用共焦顯微鏡組態,用於偵測樣品的透明介面的位置。 In some embodiments, a confocal microscope configuration is used to detect the position of the transparent interface of the sample by scanning.

在某些實施例中,聚焦感應或結構照明的量測裝置被用於藉由掃描偵測樣品的透明介面的位置。 In some embodiments, a focus sensing or structured illumination measuring device is used to detect the position of the transparent interface of the sample by scanning.

在某些實施例中,聚焦感應或結構照明的量測裝置被用於藉由掃描偵測透明介面的位置。 In some embodiments, a focus sensing or structured illumination measuring device is used to detect the position of the transparent interface by scanning.

在一些實施例中,用於量測的輻射光被選擇在紫外光譜、可見光或紅外光譜。量測最佳在頻譜域內進行,該頻譜域靠近光學組件被設計的頻譜域。 In some embodiments, the radiant light used for the measurement is selected in the ultraviolet, visible, or infrared spectrum. The measurement is best performed in the spectral domain, which is close to the spectral domain in which the optical components are designed.

在某些實施例中,設備和方法可以用於描述模造鏡片的厚度和折射率。二選一地,或額外地,這些方法和裝置可以被用描述於模造透鏡的特徵(例如,關鍵的特徵)之間的厚度和橫向距離。 In certain embodiments, apparatus and methods can be used to describe the thickness and refractive index of a molded lens. Alternatively, or in addition, these methods and apparatus can be used to describe the thickness and lateral distance between features (e.g., critical features) of the molded lens.

在一般情況下,典型的透鏡成形工藝依賴於兩個模具彼此面對的精確對齊。模具之間的距離定義了模造部件的厚度。透鏡厚度為最終透鏡組件的性能的一關鍵參數。揭露的方法和裝置可以為頂點到頂點之間的厚度提供製程控制訊 息,例如,以次微米的精確度提供。 In general, a typical lens forming process relies on precise alignment of the two molds facing each other. The distance between the dies defines the thickness of the molded part. The lens thickness is a key parameter for the performance of the final lens assembly. The disclosed method and apparatus can provide process control signals for the thickness from vertex to vertex Information, for example, is provided in sub-micron accuracy.

橫跨透鏡的厚度變化提供了關於透鏡的兩半的相對的傾斜的定量訊息,另一個參數通常是對最終透鏡成像能力至關重要的。藉由揭露的裝置和方法,傾斜或平行度誤差是可被量測的另一個製程控制參數。 The thickness variation across the lens provides a quantitative information about the relative tilt of the two halves of the lens, and another parameter is often critical to the final lens imaging capability. The tilt or parallelism error is another process control parameter that can be measured by the disclosed apparatus and method.

在透鏡內的折射率與其變化也提供了製程控制的相關訊息。超出公差的折射率變化或應力雙折射性指出射出成形工藝的問題。這兩個參數影響光學構件的成像性能。以揭露的裝置和方法,針對製程控制,這兩個參數可以被定量評估。 The refractive index within the lens and its variation also provide information about process control. Refractive index changes or stress birefringence beyond tolerance indicate problems with the injection molding process. These two parameters affect the imaging performance of the optical component. With the disclosed apparatus and method, these two parameters can be quantitatively evaluated for process control.

模具之間的橫向定心定義了透鏡的頂點到頂點的定心,是對於最終透鏡能力另一個關鍵參數。揭露的方法和裝置對頂到頂點定心可以提供製程控制訊息,例如,用次數十微米精確。 The lateral centering between the dies defines the centering of the apex to the apex of the lens and is another key parameter for the final lens capability. The disclosed method and apparatus centering the top to the apex can provide process control information, for example, with a precision of ten microns.

成形工藝的參數也影響模具內的填充因子(fill factor),因此頂點高度和定心對應於定位特徵。超出公差的頂點到特徵的高度和頂點到特徵的定心可以指出射出成形工藝的問題。這兩個參數影響光學元件的成像性能。以揭露的方法和裝置,針對製程控制,兩個參數被定量評估。 The parameters of the forming process also affect the fill factor within the mold, so the apex height and centering correspond to the positioning features. The vertices beyond the tolerance to the height of the feature and the centering of the vertices to the features may point to problems with the injection molding process. These two parameters affect the imaging performance of the optical component. With the disclosed method and apparatus, two parameters are quantitatively evaluated for process control.

本發明的各個方面總結如下。 Various aspects of the invention are summarized below.

在一般情況下,在第一個樣態中,本發明的方法,用於決定有關於由有效部分(例如透鏡部分)和非作用部分(例如平面平行的部分)所構成的透明光學元件的訊息,有效部分包括至少一彎曲表面與包括相對的第一和第二表面的非作用部分,該方法包括: 將量測光導向透明的光學元件;偵測來自於非作用部分的第一表面上的至少一個位置的反射的量測光;偵測來自於相應於非作用部分的第一表面上的至少一個位置的第二表面上的位置的反射的量測光;基於偵測到的光,決定關於非作用部分的訊息;以及基於關於非作用部分的訊息,評估透明光學元件。 In the general case, in the first aspect, the method of the present invention is used to determine a message relating to a transparent optical element composed of an active portion (e.g., a lens portion) and an inactive portion (e.g., a plane-parallel portion). The active portion includes at least one curved surface and an inactive portion including the opposing first and second surfaces, the method comprising: Directing the metered light to the transparent optical element; detecting reflected light from at least one location on the first surface of the inactive portion; detecting at least one from the first surface corresponding to the inactive portion Reflected light of the position on the second surface of the position; determining a message about the inactive portion based on the detected light; and evaluating the transparent optical element based on the information about the inactive portion.

方法的實施例可包括一個或多個下列特徵與/或其他樣態的特徵。例如,可使用同調掃描干涉(CSI)進行非作用的部分的第一和第二表面的表面量測。二擇一地,可使用共焦顯微鏡進行非作用的部分的第一和第二表面的表面量測。 Embodiments of the method may include one or more of the following features and/or other features. For example, coherent scanning interference (CSI) can be used to perform surface measurements of the first and second surfaces of the inactive portion. Alternatively, the surface measurements of the first and second surfaces of the inactive portion can be performed using a confocal microscope.

關於非作用部分的訊息可包括:非作用部分的第一表面的高度輪廓和非作用部分的第二表面的高度輪廓。關於非作用部分的訊息可包括:非作用的部分的物理厚度輪廓或光學厚度輪廓。 The information about the inactive portion may include a height profile of the first surface of the inactive portion and a height profile of the second surface of the inactive portion. The information about the inactive portion may include a physical thickness profile or an optical thickness profile of the inactive portion.

關於非作用部分中的訊息可包括:有關形成透明光學元件的材料的折射率的訊息。例如,關於折射率的訊息可包括材料的群折射率與/或材料的相折射率。關於折射率的訊息可包括關於非作用部分的不同位置之間的折射率的變化的訊息。關於折射率的訊息可包括關於形成透明的光學元件的材料(如塑膠)的雙折射性的訊息。 The information in the inactive portion may include a message regarding the refractive index of the material forming the transparent optical element. For example, the information about the refractive index may include the group index of refraction of the material and/or the phase index of the material. The information about the refractive index may include a message regarding the change in refractive index between different positions of the inactive portion. The information about the refractive index may include information about the birefringence of the material (e.g., plastic) that forms the transparent optical element.

在一些實施例中,方法更包括偵測來自於支撐透明光學元件的夾具上的參考特徵的反射的量測光,以及基於來自於參考特徵的偵測光,決定關於參考特徵的訊息。從參考特徵反射的量測光可從對應於非作用部分的第一表面上至少一個位置的位置反射(例如,成像到偵測器的相同位置)。從參 考特徵被反射之前和之後,量測光可藉由透明的光學元件傳送。在一些實施例中,透明的光學元件不處於來自參考特徵的反射的量測光的光徑上。在一些情況下,方法可包括偵測來自於在第二位置的夾具的反射的量測光,第二位置不同於對應於非作用部分的第一表面的至少一個位置。 In some embodiments, the method further includes detecting the reflected light from the reflection of the reference feature on the fixture supporting the transparent optical element, and determining the information about the reference feature based on the detected light from the reference feature. The measured light reflected from the reference feature can be reflected from a position corresponding to at least one location on the first surface of the inactive portion (eg, imaged to the same location of the detector). From the reference Before and after the test feature is reflected, the measurement light can be transmitted by a transparent optical element. In some embodiments, the transparent optical element is not on the optical path of the reflected measurement light from the reference feature. In some cases, the method can include detecting the reflected light from the reflection of the clamp at the second location, the second location being different than the at least one location corresponding to the first surface of the inactive portion.

對於第一偏振,量測光可被偵測,以及第二偏振不同於第一偏振。 For the first polarization, the measured light can be detected and the second polarization is different from the first polarization.

基於關於非作用部分的訊息,評估透明的光學元件可包括推斷關於有效部分的尺寸或光學特性的訊息。 Based on the information about the inactive portion, evaluating the transparent optical element can include inferring a message regarding the size or optical characteristics of the active portion.

在一些實施例中,非作用的部分是透明的光學元件的傾斜控制連鎖。有效部分的至少一個曲面可以是球面,或者非球面表面。有效部分可包括相對第一曲面的第二曲面。 In some embodiments, the inactive portion is a tilt control interlock of the transparent optical elements. The at least one curved surface of the effective portion may be a spherical surface or an aspherical surface. The active portion may include a second curved surface relative to the first curved surface.

關於有效部分的訊息可包括關於形成透鏡部分的材料的雙折射性訊息。關於有效部分的訊息可包括關於形成透鏡部分的材料的折射率的變化的訊息。 The information about the active portion may include a birefringence message about the material forming the lens portion. The message about the active portion may include a message regarding the change in the refractive index of the material forming the lens portion.

評估透明的光學元件可包括決定透明的光學元件是否滿足規格需求,規格需求是基於非作用部分的訊息。非作用部分可圍繞有效部分的圓周。 Evaluating transparent optical components can include determining whether a transparent optical component meets specification requirements, and specification requirements are based on non-active portions of the message. The inactive portion can surround the circumference of the active portion.

在又一樣態中,本發明的形成光學組件的方法,包括:使用前述方法,決定透明的光學元件的訊息,其中透明的光學元件是透鏡;以及相對於鏡筒中一個或多個其他透鏡,固定該些透鏡以形成光學組件。方法可包括相對於一個感測器,固定光學組件以提供數位相機的模組。 In still another aspect, the method of forming an optical component of the present invention comprises: determining a message of a transparent optical component using the foregoing method, wherein the transparent optical component is a lens; and fixing with respect to one or more other lenses in the lens barrel The lenses form an optical component. The method can include securing the optical assembly relative to a sensor to provide a module of the digital camera.

一般而言,在另一樣態中,本發明的系統,用於決定關於包括有效部分(如透鏡部分)與非作用部分(如平面平行的部分)的透明的光學元件的訊息,有效部分包括至少一個曲面與非作用部分包括互相相對的第一和第二表面,系統包括:夾具,用於支撐透明的光學元件;光學儀器,包括光源、偵測器以及光學元件,當透明的光學元件被支撐在夾具上,光學元件被排列以將光從光源導向透明的光學元件,且來自於透明光學元件的反射光導至偵測器;以及電子控制器,與偵測器通信。基於來自非作用部分的第一和第二表面相應的位置的偵測光,電子控制器被程式化以決定關於非作用部分的訊息。 In general, in another aspect, the system of the present invention is for determining information about a transparent optical component comprising an active portion (e.g., a lens portion) and an inactive portion (such as a planar parallel portion), the effective portion including at least A curved surface and an inactive portion include first and second surfaces opposite to each other, the system comprising: a clamp for supporting the transparent optical component; an optical instrument including the light source, the detector, and the optical component, when the transparent optical component is supported On the fixture, the optical elements are arranged to direct light from the light source to the transparent optical element, and the reflected light from the transparent optical element is directed to the detector; and an electronic controller is in communication with the detector. Based on the detected light from the corresponding locations of the first and second surfaces of the inactive portion, the electronic controller is programmed to determine the message regarding the inactive portion.

系統的實施例可包括下列一個或多個特徵與/或其他樣態的特徵。例如,光學儀器可以是光學掠面表面形貌儀,諸如同調掃描干涉儀或共焦顯微鏡。 Embodiments of the system may include one or more of the following features and/or other features. For example, the optical instrument can be an optical swept surface topography instrument such as a coherent scanning interferometer or a confocal microscope.

夾具可包括位於光學儀器的光徑中的參考特徵。在一些實施例中,參考特徵是平面反射器。夾具可包括支架,支架定位透明光學元件使其離參考特徵一距離。夾具可包括致動器,致動器用於相對於光學儀器的光軸旋轉透明的光學元件。 The fixture can include reference features located in the optical path of the optical instrument. In some embodiments, the reference feature is a planar reflector. The clamp can include a bracket that positions the transparent optical element at a distance from the reference feature. The clamp can include an actuator for rotating the transparent optical element relative to the optical axis of the optical instrument.

光源能提供具有可變頻譜的光。 The light source can provide light with a variable spectrum.

光學儀器可包括偏振模組,偏振膜組配置成將來自於光源的光偏振。偏振模組也可配置以選擇性地在正交偏振狀態將來自光源的光偏振。 The optical instrument can include a polarization module configured to polarize light from the source. The polarization module can also be configured to selectively polarize light from the source in an orthogonal polarization state.

一般來說,在又一樣態中,本發明的方法,用於決定關於透明的光學元件的訊息,透明的光學元件具有透鏡部 分與平面平行部分,方法包括:使用光學儀器以獲得高度訊息(如表面輪廓),高度訊息是關於透明光學元件的第一表面以及相對第一表面的透明的光學元件的第二表面;使用光學儀器以獲得第一表面和第二表面的強度的強度地圖(如影像);以及基於高度訊息和強度地圖,決定關於透明的光學元件上第一表面和第二表面至少一個的一個或多個特徵的尺寸訊息。 In general, in still another aspect, the method of the present invention is used to determine information about a transparent optical element having a lens portion Dividing into plane parallel portions, the method comprising: using an optical instrument to obtain a height information (such as a surface profile), the height information being about a first surface of the transparent optical element and a second surface of the transparent optical element opposite the first surface; using optical An instrument obtains an intensity map (eg, an image) of the intensity of the first surface and the second surface; and determines one or more features of the at least one of the first surface and the second surface on the transparent optical element based on the height information and the intensity map Size message.

方法的實施例可包括下列一個或多個特徵與/或其他樣態的特徵。例如,光學儀器可以是同調掃描干涉顯微鏡或共焦顯微鏡。 Embodiments of the method may include one or more of the following features and/or other features. For example, the optical instrument can be a coherent scanning interference microscope or a confocal microscope.

關於第一和第二表面的高度訊息可個別包括第一和第二表面的表面輪廓。如申請專利範圍第1項的方法,其中基於連續的強度框(使用光學儀器的多元件的偵測器收集),決定強度地圖。對於連續的強度框,藉由平均在多元件偵測器的每個元件的強度,決定強度地圖。使用光學儀器以獲得強度地圖可包括:相對於光學儀器的第一和第二表面的最佳焦點的對應位置,決定多元件偵測器的每個元件的強度。 The height information about the first and second surfaces may individually include surface contours of the first and second surfaces. The method of claim 1, wherein the intensity map is determined based on a continuous intensity box (collected by a multi-element detector using an optical instrument). For a continuous intensity box, the intensity map is determined by averaging the intensity of each element in the multi-element detector. Using an optical instrument to obtain an intensity map can include determining the intensity of each element of the multi-element detector relative to a corresponding location of the best focus of the first and second surfaces of the optical instrument.

尺寸訊息可包括第一或第二表面的頂點的位置,相對於第一或第二表面的另一特徵。在一些情況下,尺寸訊息是頂點和其他特徵之間的橫向距離,橫向距離是在名義上平行於平面平行部分的平面上所測得的距離。其它特徵可以是位於第一或第二表面的平面平行部分的特徵。其它特徵可以是一個環形的特徵,名義上的中心定位在頂點。其他特徵可以是位在平行平面部分的第一與/或第二表面的階梯。 The size message may include the location of the apex of the first or second surface, another feature relative to the first or second surface. In some cases, the size message is the lateral distance between the vertex and other features, and the lateral distance is the distance measured on a plane that is nominally parallel to the parallel portion of the plane. Other features may be features of planar parallel portions located on the first or second surface. Other features may be a circular feature with a nominal center located at the apex. Other features may be the steps of the first and/or second surface of the parallel planar portion.

光學儀器可被用於進行量測,以第一表面面向光 學儀器量測透明的光學目標,且以第二表面面向光學儀器量測透明的光學目標。以第一表面面向光學儀器的透明的光學目標的量測結果中得到的資料,可用以決定第一表面的透鏡部分的頂點的位置。以第一表面面向光學儀器的透明的光學目標的量測結果中得到的資料,可用相對於第一表面的平面平行部分的特徵的位置,決定第一表面的透鏡部分的頂點的位置。以第一表面面向光學儀器的透明的光學目標的量測結果中得到的資料,可用相對於第二表面的平面平行部分的特徵的位置,決定第一表面的平面平行部分的特徵的位置。以第二表面面向光學儀器的透明的光學目標的量測結果中得到的資料,可用相對於第一表面的頂點的位置,決定第二表面的透鏡部分的頂點的位置。 An optical instrument can be used to measure the first surface facing the light The instrument measures a transparent optical target and measures the transparent optical target with the second surface facing the optical instrument. The data obtained from the measurement of the transparent optical target of the first surface facing the optical instrument can be used to determine the position of the apex of the lens portion of the first surface. The data obtained from the measurement results of the transparent optical target of the first surface facing the optical instrument can determine the position of the apex of the lens portion of the first surface with respect to the position of the feature of the plane parallel portion of the first surface. The data obtained from the measurement results of the transparent optical target of the first surface facing the optical instrument can determine the position of the feature of the plane parallel portion of the first surface with respect to the position of the feature of the plane parallel portion of the second surface. The data obtained from the measurement results of the transparent optical target of the second surface facing the optical instrument can determine the position of the apex of the lens portion of the second surface with respect to the position of the apex of the first surface.

決定尺寸訊息可包括折射效應,折射效應來自於透明的光學元件相對於光學儀器的傾斜。考慮折射效應的尺寸訊息,可為光學儀器的對側的透明的光學元件的表面上的特徵的位置。 The sizing message can include a refraction effect resulting from the tilt of the transparent optical element relative to the optical instrument. The size information considering the effect of the refraction can be the position of features on the surface of the transparent optical element on the opposite side of the optical instrument.

光學儀器可用於相對於光學儀器的軸的第一方位角,進行透明的光學目標的量測,光學儀器可用於相對於軸的第二方位角(不同於第一方位角),進行透明的光學目標的量測。決定尺寸訊息可包括以第一方位角的透明光學元件的量測結果得到的資料,決定關於一個或多個特徵的尺寸訊息,以及決定尺寸訊息可包括以第二方位角的透明光學元件的量測結果得到的資料,決定關於一個或多個特徵的尺寸訊息。基於第一和第二方位角所獲得的尺寸訊息,決定尺寸訊息可包括減少 尺寸訊息的誤差。 An optical instrument can be used to measure a transparent optical target relative to a first azimuth of the axis of the optical instrument, the optical instrument being operable for a second azimuth (different from the first azimuth) relative to the axis for transparent optics Measurement of the target. The sizing message may include data obtained from the measurement of the transparent optical element of the first azimuth, determining a size message for the one or more features, and determining the size information may include the amount of transparent optical element at the second azimuth The resulting data determines the size information about one or more features. Determining the size information may include reducing based on the size information obtained by the first and second azimuth angles The error of the size message.

方法可包括決定透明的光學元件是否滿足基於尺寸訊息的規格要求。 The method can include determining whether the transparent optical component meets the specification requirements based on the size message.

在另一樣態中,本發明的系統用於決定關於透明的光學元件的訊息,系統包括:光學儀器與電子控制器,電子控制器與光學儀器通信,且電子控制器程式化以使系統進行前述樣態的方法。 In another aspect, the system of the present invention is used to determine information about a transparent optical component, the system comprising: an optical instrument and an electronic controller, the electronic controller is in communication with the optical instrument, and the electronic controller is programmed to cause the system to perform the foregoing The method of the form.

系統的實施例可包括一個或更多的其他樣態。 Embodiments of the system may include one or more other aspects.

一般來說,在另一樣態中,本發明的方法用於決定關於具有一個彎曲部分和平面部分的目標的訊息,彎曲部分包括具有頂點的第一曲面與定義目標的軸,該方法包括:將量測光導至目標;偵測從彎曲部分的第一曲面反射的量測光;偵測從目標的其他表面的至少一個反射的量測光;以及基於偵測到的光,決定關於彎曲部分的第一曲面的頂點的訊息。 In general, in another aspect, the method of the present invention is used to determine a message about a target having a curved portion and a planar portion, the curved portion including a first curved surface having a vertex and an axis defining the target, the method comprising: Measuring the light guide to the target; detecting the light reflected from the first curved surface of the curved portion; detecting the reflected light reflected from at least one of the other surfaces of the target; and determining the curved portion based on the detected light The message of the vertices of the first surface.

方法的實施例可包括下列一個或多個特徵與/或其他樣態的特徵。例如,目標可以是一個透明的光學元件,例如透鏡元件(例如模造的透鏡元件)。在一些實施例中,目標是一個光學元件的模具的一部分,諸如用於透鏡元件的一側的模具。 Embodiments of the method may include one or more of the following features and/or other features. For example, the target can be a transparent optical element, such as a lens element (eg, a molded lens element). In some embodiments, the target is a portion of a mold of an optical component, such as a mold for one side of the lens component.

彎曲部分可包括相對第一曲面的第二曲面,第二曲面具有頂點,關於第一曲面的頂點的訊息包括在第一表面的頂點與第二表面的頂點之間的透鏡的厚度,透鏡的厚度沿光軸量測。 The curved portion may include a second curved surface opposite to the first curved surface, the second curved surface having a vertex, and the information about the apex of the first curved surface includes a thickness of the lens between the apex of the first surface and the apex of the second surface, the thickness of the lens Measured along the optical axis.

彎曲部分可包括相對第一曲面的第二曲面,第二 曲面具有頂點,關於第一曲面的頂點的訊息包括在第一表面的頂點與第二表面的頂點之間的橫向偏移,橫向偏移沿正交於光軸的平面量測。 The curved portion may include a second curved surface opposite to the first curved surface, the second The surface has vertices, and the information about the vertices of the first surface includes a lateral offset between the vertices of the first surface and the vertices of the second surface, the lateral offset being measured along a plane orthogonal to the optical axis.

量測光可以通過光學儀器被導至目標,當量測光反射時,第一曲面面對光學儀器。決定關於第一曲面的頂點的訊息可包括決定頂點的位置。至少一個其他表面可包括面向光學儀器的其他表面,且決定關於第一曲面的頂點的訊息更包括:在至少一個其它表面上,決定一橫向偏移,在正交於頂點與關注特徵之間的光軸的平面量測橫向偏移。至少一個其它表面可包括面離光學儀器的表面,且決定關於第一曲面的頂點的訊息更包括:決定一個橫向偏移,在正交於在面離光學儀器的表面上的特徵以及面向光學儀器的其他表面上的關注特徵之間的光軸的平面量測橫向偏移。彎曲部分可包括相對第一曲面的第二曲面,且決定關於第一曲面的頂點的訊息包括:決定第二曲面的頂點的位置。決定關於第一曲面的頂點的訊息可包括:基於第一和第二曲面的頂點的位置,沿光軸量測,決定曲面部分的厚度。在一些實施例中,決定關於第一曲面的頂點的訊息包括:決定第一表面的頂點與第二表面的頂點之間的橫向偏移,在一個正交於光軸的平面量測橫向偏移,基於:(i)在第一曲面的頂點與面向光學儀器的另一表面上的關注特徵之間的橫向偏移;(ii)在面向光學儀器的另一表面上的關注特徵與面離光學儀器的表面上的關注特徵之間的橫向偏移;(iii)在第二曲面的頂點與面離光學儀器的表面上的關注特徵之間的橫向偏移。 The measuring light can be guided to the target by the optical instrument, and the first curved surface faces the optical instrument when the equivalent metering is reflected. Determining the information about the vertices of the first surface may include determining the position of the vertices. The at least one other surface may include other surfaces facing the optical instrument, and determining the information about the vertices of the first curved surface further includes determining, on at least one other surface, a lateral offset between the orthogonal vertices and the feature of interest The plane of the optical axis measures the lateral offset. At least one other surface may include a surface that faces away from the optical instrument, and determining the information about the apex of the first curved surface further comprises: determining a lateral offset, orthogonal to features on the surface of the optical instrument, and facing the optical instrument The plane of the optical axis between the features of interest on the other surface measures the lateral offset. The curved portion may include a second curved surface relative to the first curved surface, and determining the information about the vertices of the first curved surface includes determining a position of a vertex of the second curved surface. Determining the information about the vertices of the first surface may include determining the thickness of the curved portion based on the positions of the vertices of the first and second curved surfaces along the optical axis. In some embodiments, determining the information about the vertices of the first surface comprises determining a lateral offset between the vertices of the first surface and the vertices of the second surface, and measuring the lateral offset at a plane orthogonal to the optical axis Based on: (i) a lateral offset between the apex of the first curved surface and the feature of interest on the other surface facing the optical instrument; (ii) the feature of interest and the off-axis optics on the other surface facing the optical instrument A lateral offset between the features of interest on the surface of the instrument; (iii) a lateral offset between the apex of the second curved surface and the feature of interest on the surface of the optical instrument.

決定關於第一曲面的頂點的訊息可包括:決定關於平面部分的至少一個表面的傾斜的訊息,且當決定關於第一表面的頂點的訊息時,考慮傾斜。關於傾斜的訊息是傾斜角αtilt,相對於光學儀器(用於將量測光導至物體)的光軸。 Determining the message regarding the vertices of the first surface may include determining a message regarding the tilt of at least one surface of the planar portion, and considering the tilt when determining a message regarding the vertices of the first surface. The message about tilt is the tilt angle α tilt relative to the optical axis of the optical instrument (used to direct the measured light to the object).

方法可包括在偵測量測光之後,相對於光學儀器(用於將量測光導至物體)調整目標的方位角,且在調整方位角之後,重複偵測來自第一曲面與來自至少一個其他表面的量測光。方法可包括在方位角調整後,基於所偵測的量測光,決定關於第一曲面的頂點的附加訊息。 The method can include adjusting an azimuth of the target relative to the optical instrument (for directing the measurement light to the object) after detecting the photometric light, and repeating detecting from the first curved surface and from at least one other after adjusting the azimuth angle Surface measurement light. The method can include, after the azimuth adjustment, determining an additional message regarding the vertices of the first surface based on the detected measurements.

在一些實施例中,方法包括在偵測量測光之後,改變量測光的偏振狀態,並在偏振態改變之後,重複來自第一曲面與來自至少一個其它表面的量測光的偵測。方法可包括在偏振狀態變化之前或之後,基於所偵測的量測光,決定關於目標的雙折射的訊息。 In some embodiments, the method includes changing the polarization state of the measurement light after detecting the measurement light, and repeating the detection of the measurement light from the first curved surface and from the at least one other surface after the polarization state is changed. The method can include determining a birefringence information about the target based on the detected measured light before or after the polarization state changes.

方法可包括基於關於第一曲面的頂點的訊息,評估目標。評估目標可包括決定目標是否滿足基於關於第一曲面的頂點的訊息的規範要求。 The method can include evaluating the target based on the information about the vertices of the first surface. Assessing the target may include determining whether the target satisfies the specification requirements based on the message regarding the vertices of the first surface.

平面部分可以是目標的傾斜控制連鎖。彎曲部分的至少一個彎曲表面可以是一個非球面。平面部分可以圍繞彎曲部分的圓周。 The plane portion can be the tilt control interlock of the target. The at least one curved surface of the curved portion may be an aspherical surface. The planar portion may surround the circumference of the curved portion.

在又一樣態中,本發明的一種形成光學組件的方法,包括:使用前述方法,決定關於目標的訊息,其中目標是一個透鏡;以及相對於鏡筒中一個或多個其他透鏡固定透鏡,以形成光學組件。方法可包括相對於一個感測器固定光學組 件,以提供一個數位相機的模組。 In still another aspect, a method of forming an optical component of the present invention comprises: using the foregoing method, determining a message about a target, wherein the target is a lens; and fixing the lens relative to one or more other lenses in the lens barrel to form Optical components. The method can include fixing the optical group relative to one sensor Pieces to provide a module for a digital camera.

在又一樣態中,本發明的一種系統,用於決定關於目標的訊息,目標具有彎曲部分和平面部分,彎曲部分具有含頂點的第一曲面且定義目標的軸,系統包括:夾具,用於支撐目標;光學儀器,包括光源、偵測器以及光學元件,光學元件佈置為將光由光源導向目標,當目標被支撐在夾具上,由目標的反射光導到偵測器;以及電子控制器,與偵測器通信,基於來自目標的第一曲面與來自其他表面至少一個所偵測到的光,電子控制器被程式化以決定關於第一表面的頂點的訊息。 In still another aspect, a system of the present invention is for determining a message about a target having a curved portion and a planar portion, the curved portion having a first curved surface having a vertex and defining an axis of the target, the system comprising: a clamp for a support target; an optical instrument comprising a light source, a detector, and an optical component, the optical component being arranged to direct light from the light source to the target, the target being supported on the fixture, the reflected light of the target being guided to the detector; and the electronic controller, In communication with the detector, based on the first surface from the target and at least one detected light from the other surface, the electronic controller is programmed to determine a message regarding the apex of the first surface.

系統的實施例可包括以下列一個或多個特徵與/或其他樣態的特徵。例如,光學儀器可以是光學掠面表面形貌儀,諸如同調掃描干涉儀或共焦顯微鏡。 Embodiments of the system may include features in one or more of the following features and/or other aspects. For example, the optical instrument can be an optical swept surface topography instrument such as a coherent scanning interferometer or a confocal microscope.

夾具可以包括致動器,致動器配置為相對於光學儀器重定向目標。例如,致動器可被配置為相對於光學儀器的光軸來旋轉物體。 The clamp can include an actuator configured to redirect the target relative to the optical instrument. For example, the actuator can be configured to rotate the object relative to the optical axis of the optical instrument.

光學儀器可包括偏振膜組,偏振模組配置為偏振來自光源的光。在正交偏振狀態,偏振模組可配置為選擇性偏振來自光源的光(例如,使用一個或多個偏振器和/或波板)。 The optical instrument can include a set of polarizing films configured to polarize light from the light source. In the orthogonal polarization state, the polarization module can be configured to selectively polarize light from the source (eg, using one or more polarizers and/or wave plates).

偵測器可以是多元件的偵測器(例如,CMOS陣列或CCD陣列),以及光學儀器可被裝配為將目標的表面成像到多元件的偵測器。 The detector can be a multi-element detector (eg, a CMOS array or a CCD array), and the optical instrument can be assembled to image the surface of the target to a multi-element detector.

光源能改變其光譜輸出。例如,光源可包括不同顏色的兩個或更多個LED。改變從兩個或更多個LED的相對光強度,而變化光的顏色。光源可以是可見光與/或紅外光源。 The light source can change its spectral output. For example, the light source can include two or more LEDs of different colors. The relative light intensity from two or more LEDs is varied while changing the color of the light. The light source can be a visible light and/or an infrared source.

本發明的其它樣態和優點將從下面描述中更顯而易見。 Other aspects and advantages of the invention will be apparent from the description which follows.

100‧‧‧第一透鏡元件 100‧‧‧First lens element

101‧‧‧非球面凸物側面 101‧‧‧Aspherical convex side

102‧‧‧非球面凸像側面 102‧‧‧Aspherical convex side

110‧‧‧第二透鏡元件 110‧‧‧second lens element

111‧‧‧非球面凸物側面 111‧‧‧Aspherical convex side

112‧‧‧非球面凹像側面 112‧‧‧Aspherical concave side

120‧‧‧第三透鏡元件 120‧‧‧ third lens element

121‧‧‧非球面凹物側面 121‧‧‧Aspherical concave side

122‧‧‧非球面凸像側面 122‧‧‧Aspherical convex side

130‧‧‧第四透鏡元件 130‧‧‧Fourth lens element

131‧‧‧非球面凸物側面 131‧‧‧Aspherical convex side

132‧‧‧非球面凹像側面 132‧‧‧Aspherical concave side

140‧‧‧孔徑止擋 140‧‧‧Aperture stop

150‧‧‧紅外線濾波器 150‧‧‧Infrared filter

160‧‧‧感測器蓋玻璃 160‧‧‧Sensor cover glass

170‧‧‧像平面 170‧‧‧ image plane

200‧‧‧透鏡 200‧‧‧ lens

201‧‧‧光學量測儀器 201‧‧‧Optical measuring instruments

210‧‧‧平面平行部分 210‧‧‧ Planar parallel

211‧‧‧表面 211‧‧‧ surface

212‧‧‧表面 212‧‧‧ surface

220‧‧‧透鏡部分 220‧‧‧ lens part

221‧‧‧表面 221‧‧‧ surface

222‧‧‧表面 222‧‧‧ surface

300‧‧‧CSI顯微鏡 300‧‧‧CSI microscope

301‧‧‧電子處理器 301‧‧‧Electronic processor

302‧‧‧光源 302‧‧‧Light source

304‧‧‧輸入光 304‧‧‧ Input light

306‧‧‧干涉目標 306‧‧‧ Interference target

308‧‧‧中繼光學器 308‧‧‧Relay optics

310‧‧‧中繼光學器 310‧‧‧Relay optics

312‧‧‧分光器 312‧‧ ‧ splitter

314‧‧‧瞳平面 314‧‧‧瞳 plane

315‧‧‧孔徑止擋 315‧‧‧Aperture stop

316‧‧‧虛邊線 316‧‧‧virtual line

317‧‧‧主實線 317‧‧‧Main solid line

318‧‧‧物鏡 318‧‧‧ objective lens

320‧‧‧分光器 320‧‧ ‧ splitter

322‧‧‧測試光 322‧‧‧Test light

324‧‧‧測試表面 324‧‧‧Test surface

326‧‧‧平台 326‧‧‧ platform

328‧‧‧參考光 328‧‧‧ reference light

330‧‧‧參考光學 330‧‧‧Reference optics

332‧‧‧組合光 332‧‧‧Combined light

334‧‧‧電子偵測器 334‧‧‧Electronic detector

336‧‧‧中繼透鏡 336‧‧‧Relay lens

338‧‧‧場止擋 338‧‧ ‧ stop

340、342、344、346‧‧‧偏振元件 340, 342, 344, 346‧‧‧ polarizing elements

350‧‧‧移動平台 350‧‧‧Mobile platform

400‧‧‧夾具 400‧‧‧ fixture

410‧‧‧支撐結構 410‧‧‧Support structure

420‧‧‧參考面 420‧‧‧ reference plane

421‧‧‧外部分 421‧‧‧ outside part

422‧‧‧內部分 422‧‧‧ inner part

500‧‧‧流程圖 500‧‧‧flow chart

510、520、530、540、550、560、570、580、590‧‧‧步驟 510, 520, 530, 540, 550, 560, 570, 580, 590‧ ‧ steps

700‧‧‧流程圖 700‧‧‧Flowchart

710、720‧‧‧步驟 710, 720‧‧ steps

800‧‧‧流程圖 800‧‧‧ Flowchart

810、820、830、840、850、860、870、880‧‧‧步驟 810, 820, 830, 840, 850, 860, 870, 880 ‧ ‧ steps

900‧‧‧透鏡 900‧‧‧ lens

910‧‧‧非作用部分 910‧‧‧Inactive part

911‧‧‧平面 911‧‧ plane

912‧‧‧平面 912‧‧‧ plane

914c‧‧‧關注特徵的中心,上表面 914c‧‧‧ Focus on the center of the feature, the upper surface

914i‧‧‧邊緣 914i‧‧‧ edge

914o‧‧‧邊緣 Edge of 914o‧‧

512c‧‧‧關於特徵的中心,下表面 512c‧‧‧About the center of the feature, the lower surface

915i‧‧‧邊緣 Edge of 915i‧‧

915o‧‧‧邊緣 Edge of 915o‧‧

916‧‧‧平面 916‧‧‧ plane

917‧‧‧平面 917‧‧‧ plane

918‧‧‧邊緣 Edge of 918‧‧

919‧‧‧邊緣 Edge of 919‧‧

920‧‧‧有效部分 920‧‧‧Efficient part

921‧‧‧上表面 921‧‧‧ upper surface

922‧‧‧下表面 922‧‧‧ lower surface

923‧‧‧頂點 923‧‧‧ vertex

924‧‧‧頂點 924‧‧‧ vertex

1400‧‧‧流程圖 1400‧‧‧flow chart

1405、1410、1415、1420、1425、1430、1435、1440、1445、1450、1455、1460、1465‧‧‧步驟 1405, 1410, 1415, 1420, 1425, 1430, 1435, 1440, 1445, 1450, 1455, 1460, 1465‧‧ steps

1600‧‧‧流程圖 1600‧‧‧flow chart

1605、1610、1615、1620、1625、1630、1635、1640、1645、1650、1655、1660、1665、1670、1675‧‧‧步驟 1605, 1610, 1615, 1620, 1625, 1630, 1635, 1640, 1645, 1650, 1655, 1660, 1665, 1670, 1675‧‧ steps

1800‧‧‧流程圖 1800‧‧‧flow chart

1805、1810、1815、1820、1825、1830、1835、1840、1845、 1850、1855‧‧‧步驟 1805, 1810, 1815, 1820, 1825, 1830, 1835, 1840, 1845, 1850, 1855‧‧‧ steps

1900‧‧‧透鏡模具 1900‧‧‧ lens mold

1912‧‧‧外平面 1912‧‧‧Outer plane

1914‧‧‧階梯 1914‧‧‧Ladder

1914o‧‧‧外邊緣 1914o‧‧‧ outer edge

1916‧‧‧內平面 1916‧‧‧ inner plane

1921‧‧‧曲面 1921‧‧‧ Surface

1923‧‧‧頂點 Vertex of 1923‧‧‧

2000‧‧‧流程圖 2000‧‧‧ Flowchart

2001‧‧‧流程圖 2001‧‧‧Flowchart

2010、2020、2030、2040、2050、2060、2070‧‧‧步驟 2010, 2020, 2030, 2040, 2050, 2060, 2070‧ ‧ steps

2011、2021、2031、2041、2051、2061、2071‧‧‧步驟 2011, 2021, 2031, 2041, 2051, 2061, 2071 ‧ ‧ steps

2100‧‧‧流程圖 2100‧‧‧Flowchart

2101‧‧‧流程圖 2101‧‧‧Flowchart

2110、2120、2130、2140、2150、2160、2170、2180‧‧‧步驟 2110, 2120, 2130, 2140, 2150, 2160, 2170, 2180‧‧ steps

T‧‧‧厚度 T‧‧‧ thickness

圖1是成像光學透鏡組件的剖面圖。 1 is a cross-sectional view of an imaging optical lens assembly.

圖2A待測試的透鏡樣品的側視圖。 Figure 2A is a side view of a lens sample to be tested.

圖2B是圖2A中待測的透鏡樣品的上視圖。 Figure 2B is a top view of the lens sample to be tested in Figure 2A.

圖3是同調掃描干涉顯微鏡的示意圖。 Figure 3 is a schematic illustration of a coherent scanning interference microscope.

圖4A是安裝在具有參考面的夾具上的待測的透鏡樣品的側視圖。 4A is a side view of a lens sample to be tested mounted on a jig having a reference surface.

圖4B與圖4C是圖4A中的透鏡樣品與夾具的側視圖,繪示量測過程中的兩個步驟。 4B and 4C are side views of the lens sample and fixture of FIG. 4A, illustrating two steps in the measurement process.

圖5是流程圖,繪示使用同調掃描干涉(coherence scanning interferometry,CSI)應用的流程以及圖4B與圖4C中繪示的步驟。 5 is a flow chart showing the flow of a coherence scanning interferometry (CSI) application and the steps illustrated in FIGS. 4B and 4C.

圖6A與圖6B是側視圖,繪示另一實施例的量測步驟。 6A and 6B are side views showing the measuring steps of another embodiment.

圖7是一流程圖,繪示使用同調掃描干涉的一實施例的流程以及繪示在圖6A與圖6B中的步驟。 Figure 7 is a flow chart showing the flow of an embodiment using coherent scanning interference and the steps illustrated in Figures 6A and 6B.

圖8是流程圖,繪示量測在透鏡的上與下平行面之間的雙折射性的一實施例流程。 Figure 8 is a flow chart showing an embodiment of measuring the birefringence between the upper and lower parallel faces of the lens.

圖9是待測的另一透鏡樣品的側視圖。 Figure 9 is a side view of another lens sample to be tested.

圖10是圖9中待測的透鏡樣品的上視圖。 Figure 10 is a top plan view of the lens sample to be tested in Figure 9.

圖11繪示圖9中待測的透鏡樣品的另一上視圖。在關注的橫方向仔細描繪,為了說明誇大了離心性(decenter)。 11 is another top view of the lens sample to be tested in FIG. Carefully depicted in the horizontal direction of interest, in order to illustrate the exaggeration of the decenter.

圖12是示意圖,繪示透過樣品量測關注特徵的明顯且實際的最佳焦距位置。 Figure 12 is a schematic diagram showing the apparent and actual optimal focal length position of the feature of interest measured through the sample.

圖13繪示圖9中待測的透鏡樣品的側視圖。在此為凹透鏡表面面向光學儀器。 Figure 13 is a side elevational view of the lens sample to be tested of Figure 9. Here, the surface of the concave lens faces the optical instrument.

圖14是流程圖,繪示使用CSI的一實施例的流程。 Figure 14 is a flow chart showing the flow of an embodiment using CSI.

圖15A是示意圖,繪示對於折射效應校正的關注特徵明顯且實際的位置。 Figure 15A is a schematic diagram showing the apparent and actual position of the feature of interest for the refraction effect correction.

圖15B繪示因為折射所引起的方位角的傾斜與橫向偏移。 Figure 15B illustrates the tilt and lateral offset of the azimuth due to refraction.

圖16是流程圖,繪示使用CSI的另一實施例的流程。 Figure 16 is a flow chart showing the flow of another embodiment using CSI.

圖17A和17B是上視圖,繪示透鏡在不同的樣品與儀器方位角方向。 17A and 17B are top views showing the orientation of the lens in different samples and instruments.

圖18是流程圖,繪示使用CSI的又一實施例的流程。 Figure 18 is a flow chart showing the flow of still another embodiment using CSI.

圖19是待測的透鏡模具的側視圖。 Figure 19 is a side view of the lens mold to be tested.

圖20A是流程圖,繪示出透鏡的特性分析的流程。 Fig. 20A is a flow chart showing the flow of characteristic analysis of a lens.

圖20B是流程圖,繪示出另一個透鏡的特性分析的流程。 Fig. 20B is a flow chart showing the flow of characteristic analysis of another lens.

圖21A和21B是流程圖,繪示出透鏡的成形工藝的特性分析的流程。 21A and 21B are flowcharts showing the flow of characteristic analysis of a forming process of a lens.

參照圖2A與圖2B,透鏡200包括非作用的平面平行部分210與有效的透鏡部分220。在此例中,平面平行部分包括兩名義上平的、名義上平行的表面211與212。在此,「名義上」參照為透鏡的設計。名義上的平坦與名義上的平行可能發生可察覺的偏差,如來自於製造誤差。透鏡部分220為凹凸透鏡(meniscus lens),具有上凸面221與下凹面222。一般來 說,表面221與222可為球面或非球面。平面平形表面211與212,舉例而言,可為形成在樣品上的特徵。在最終組件中,相對於一個或多個透鏡協助對齊與固定透鏡。 Referring to Figures 2A and 2B, lens 200 includes an inactive planar parallel portion 210 and an active lens portion 220. In this example, the planar parallel portion includes two nominally flat, nominally parallel surfaces 211 and 212. Here, the "nominally" reference is the design of the lens. Nominal flatness and nominal parallelism may occur with appreciable deviations, such as from manufacturing tolerances. The lens portion 220 is a meniscus lens having an upper convex surface 221 and a lower concave surface 222. Generally come Said surfaces 221 and 222 can be spherical or aspherical. Planar planar surfaces 211 and 212, for example, can be features formed on the sample. In the final assembly, the alignment and fixation lenses are assisted with respect to one or more lenses.

光學量測儀器201用以評估一些透鏡200的光學性質,尤其是包括折射率的均勻性與殘留應力的雙折射性,以及諸如透鏡厚度的尺寸特徵,包括但不限於厚度T,在圖中其為座標x、y的函數(如圖2A中所示的直角座標系統)。本揭露的方法藉由量測在平面平行表面211與212之間的區域的光學性質與實際尺寸進行評估。這些量測結果可作為透鏡的整體光學與尺寸性質的一個指標。 The optical measuring instrument 201 is used to evaluate the optical properties of some of the lenses 200, in particular including the uniformity of the refractive index and the birefringence of the residual stress, and dimensional features such as the thickness of the lens, including but not limited to the thickness T, in the figure It is a function of coordinates x, y (such as the Cartesian coordinate system shown in Figure 2A). The method of the present disclosure evaluates the optical properties and actual dimensions of the region between the plane parallel surfaces 211 and 212 by measuring. These measurements can be used as an indicator of the overall optical and dimensional properties of the lens.

一般來說,光學量測儀器201可以是各種不同儀器之一,能夠執行透鏡200掠面表面形貌量測。儀器的例子包括同調掃描干涉顯微鏡(coherence scanning interferometry,CSI)(如揭露在P.de Groot的“同調掃描干涉”,在表面形貌的光學量測,由R.Leach編輯,chapt.9,pp.187-208,(Springer Verlag,柏林,2011))、成像共焦顯微鏡(如揭露在R.Artigas的“成像共焦顯微鏡”,在表面形貌的光學量測,由R.Leach編輯,chapt.11,pp.237-286,(Springer柏林海德堡,2011))、結構照明顯微鏡(如揭露在X.M.Colonna de Lega的“使用調變照明非接觸表面特性分析”,美國專利(2014年))、焦點感測(如揭露在F.Helmli的“焦點變化儀器”,在表面形貌的光學量測,由R.Leach編輯,chapt.7,pp.131-166,(Springer柏林海德堡,2011))或波長調諧傅立葉轉換的相偏移干涉(Fourier transform phase shifting interferometry,FTPSI)系統(如揭露 在L.L.Deck的“傅立葉轉換相偏移干涉”,在應用光學42(13),2354-2365(2003))。 In general, optical metrology instrument 201 can be one of a variety of different instruments capable of performing spectroscopic surface topography measurements of lens 200. Examples of instruments include coherence scanning interferometry (CSI) (eg, "coherent scanning interference" revealed in P. de Groot, optical measurement of surface topography, edited by R. Leach, chapt. 9, pp .187-208, (Springer Verlag, Berlin, 2011)), Imaging Confocal Microscopy (as disclosed in R. Artigas, "Imaging Confocal Microscopy", Optical Measurement of Surface Topography, edited by R. Leach, chapt .11, pp. 237-286, (Springer Berlin Heidelberg, 2011)), structured illumination microscopes (as disclosed in XMColonna de Lega, "Using Modulated Illumination Non-Contact Surface Characteristics Analysis", US Patent (2014)), Focus sensing (eg uncovered in F. Helmli's "Focus Change Instrument", Optical Measurement of Surface Topography, edited by R. Leach, chapt.7, pp. 131-166, (Springer Berlin Heidelberg, 2011)) Or a wavelength-tuned Fourier transform phase shifting interferometry (FTPSI) system (such as exposing In L.L. Deck, "Fourier Transform Phase Offset Interference", in Applied Optics 42 (13), 2354-2365 (2003)).

參照圖3,作為一個例子,適於描述透鏡200的一種光學量測工具是CSI顯微鏡300。在本系統中,光源302引導輸入光304通過中繼光學器308、310以及分光器312到干涉目標306。中繼光學器308、310由空間中延伸的源302,將輸入光304成像在孔徑止擋315與相應的干涉目標306的瞳平面314上(如虛邊線316和主實線317所示)。 Referring to FIG. 3, as an example, one optical metrology tool suitable for describing lens 200 is CSI microscope 300. In the present system, light source 302 directs input light 304 through relay optics 308, 310 and beam splitter 312 to interference target 306. The relay optics 308, 310 are imaged by a source 302 extending in space, imaging the input light 304 onto the pupil plane 314 of the aperture stop 315 and the corresponding interference target 306 (as indicated by the virtual edge 316 and the main solid line 317).

在圖3的實施例中,干涉目標306是Mirau型,包括一個物鏡318、分光器320以及參改表面322。分光器320將輸入光304分離成測試光122以及參考光328,測試光122被導至被平台326支撐的透鏡200,且參考光328由參考表面322反射。物鏡318個別聚焦測試光與參考光到測試表面與參考表面。支撐參考面322的參考光學330被塗布成只反射聚焦的參考光,使得大多數的輸入光在被分光器320分離之前通過參考光學。 In the embodiment of FIG. 3, the interference target 306 is of the Mirau type and includes an objective lens 318, a beam splitter 320, and a parametric surface 322. The beam splitter 320 separates the input light 304 into test light 122 and reference light 328, the test light 122 is directed to the lens 200 supported by the platform 326, and the reference light 328 is reflected by the reference surface 322. The objective lens 318 individually focuses the test light and the reference light onto the test surface and the reference surface. The reference optics 330 supporting the reference surface 322 are coated to reflect only the focused reference light such that most of the input light passes through the reference optics before being separated by the beam splitter 320.

從測試和參考表面反射之後,藉由分光器320將測試光與參考光重新組合,以形成組合光332。其是由分光器312和中繼透鏡336輸送,以在電子偵測器334上形成光學干涉圖樣(舉例而言,一個多元件CCD或CMOS偵測器)。穿過偵測器的光學干涉圖案的強度分佈由偵測器的不同元件量測,並儲存在電子處理器301(例如,獨立或聯網的電腦,或與系統的其它部件集成的處理器)中進行分析。中繼透鏡336將目標306的焦平面上的不同點成像到偵測器334上對應的 點。 After being reflected from the test and reference surfaces, the test light is recombined with the reference light by the beam splitter 320 to form combined light 332. It is delivered by beam splitter 312 and relay lens 336 to form an optical interference pattern on electronic detector 334 (for example, a multi-element CCD or CMOS detector). The intensity distribution of the optical interference pattern passing through the detector is measured by different components of the detector and stored in an electronic processor 301 (eg, a stand-alone or networked computer, or a processor integrated with other components of the system). Analyze. The relay lens 336 images different points on the focal plane of the target 306 onto the corresponding detector 334 point.

位於中繼光學器308與310之間的場止擋338定義被測試光122照射的測試表面324的區域。在透鏡200和參考面的反射之後,組合光332在物鏡的瞳平面314形成源的二次圖像。 Field stop 338 between relay optics 308 and 310 defines the area of test surface 324 that is illuminated by test light 122. After reflection of the lens 200 and the reference surface, the combined light 332 forms a secondary image of the source at the pupil plane 314 of the objective lens.

任選地,偏振元件340、342、344以及346定義被導至相應的測試面與參考面的測試光與參考光的偏振狀態,並且該偏振狀態的組合光被導至偵測器。根據實施例,每個偏振元件可為偏光鏡(例如線性偏光鏡)、相位差板(如半或四分之一波板),或類似的光學元件,可影響入射光束的偏振狀態。再者,在一些實施例中,一個或多個偏振元件可不存在。此外,根據本實施例,分光器312可為偏振分光器或非偏振分光器。一般而言,因為偏振元件340、342與/或346的存在,在測試表面324的測試光322的偏振狀態可為光在瞳平面314中的方位角位置的函數。 Optionally, polarizing elements 340, 342, 344, and 346 define the polarization states of the test and reference light that are directed to the respective test and reference planes, and the combined light of the polarization states is directed to the detector. According to an embodiment, each of the polarizing elements may be a polarizer (eg, a linear polarizer), a phase difference plate (such as a half or quarter wave plate), or a similar optical element that affects the polarization state of the incident beam. Again, in some embodiments, one or more polarizing elements may not be present. Further, according to the present embodiment, the beam splitter 312 may be a polarization beam splitter or a non-polarization beam splitter. In general, because of the presence of polarizing elements 340, 342, and/or 346, the polarization state of test light 322 at test surface 324 can be a function of the azimuthal position of light in pupil plane 314.

在目前說明的實施例中,源302提供寬帶波長的照光(如具有全寬度的發光頻譜是半最大超過20奈米、半最大超過50奈米,或最佳地,更超過100奈米)。舉例而言,源302可以是白光二極體(LED)、鹵素燈泡的燈絲、如氙的弧光燈或所謂的超連續光譜源(supercontinuum source),在光學材料使用非線性效應,以產生很廣的源光譜(>200奈米)。波長的寬頻對應於有限的同調長度。移動平台350調整在測試與參考光之間的相對光徑長度,以在每個偵測器元件產生光干涉信號。例如,在圖3的實施例中,移動平台350是壓電轉換器, 耦合到干涉目標306,以調整測試面與干涉目標之間的距離,並從而改變在偵測器的測試光與參考光之間的相對光徑長度。 In the presently illustrated embodiment, source 302 provides illumination of broadband wavelengths (e.g., a full-width illumination spectrum is half maximum greater than 20 nanometers, half maximum greater than 50 nanometers, or optimally, more than 100 nanometers). For example, the source 302 can be a white light diode (LED), a filament of a halogen bulb, an arc lamp such as a neon or a so-called supercontinuum source, using a nonlinear effect in the optical material to produce a wide range. Source spectrum (>200 nm). The broadband of the wavelength corresponds to a finite coherence length. The mobile platform 350 adjusts the relative optical path length between the test and reference light to produce an optical interference signal at each of the detector elements. For example, in the embodiment of FIG. 3, the mobile platform 350 is a piezoelectric transducer, The interference target 306 is coupled to adjust the distance between the test surface and the interference target and thereby change the relative optical path length between the test light and the reference light of the detector.

返回參考圖2A,光學儀器201沿平行於圖2A中所示的z軸的觀察方向向下看透鏡200。在圖中,S1和S2個別表示從透鏡200的名義上的上與下平面平行表面211與212上的反射光。在量測數據採集時,系統在全域座標系中的x,y和z蒐集這些表面的高度資訊。這個座標系統由光學儀器201建立。在理想情況下,透鏡表面的旋轉軸名義上是對齊平行z軸。 Referring back to FIG. 2A, the optical instrument 201 looks down the lens 200 in a viewing direction parallel to the z-axis shown in FIG. 2A. In the figure, S1 and S2 individually represent the reflected light from the nominal upper and lower plane parallel surfaces 211 and 212 of the lens 200. In the measurement data acquisition, the system collects the height information of these surfaces in x, y and z in the global coordinate system. This coordinate system is established by optical instrument 201. Ideally, the axis of rotation of the lens surface is nominally aligned parallel to the z-axis.

透鏡200的上表面211的量測訊息由光在空氣中(圖中的訊號“S1”)的反射而得。個別地,在圖中,透鏡200的下表面212的量測訊息由光在透鏡材料(訊號“S2”)內的反射而得。 The measurement information of the upper surface 211 of the lens 200 is obtained by reflection of light in the air (signal "S1" in the figure). Individually, in the figure, the measurement information of the lower surface 212 of the lens 200 is derived from the reflection of light within the lens material (signal "S2").

考慮如系統300的CSI顯微鏡系統的特定例子,在特定的座標x、y的上表面211與下表面212之間的相對距離T,T給定為T=T'/n G (1)其中T'是表觀或量測的光學厚度,藉由CSI顯微術或藉由使用同調資訊的波長調諧FTPSI來決定,以及在低NA(如0.06或更小),nG是群速折射率(在高NA,如0.2或更高,因為傾角的影響,nG值可改變,從而導致有效的群速折射率)。反之,當使用共焦、結構照明或焦點感測時,信號S2將出現在一個較高的位置z,。在此例中,物理厚度由下式給出T=nT" (2) 其中T"是如由共焦或相關的焦點敏感的儀器測定的表觀或量測的光學厚度,n是相速度折射率。 Considering a specific example of a CSI microscope system such as system 300, the relative distance T between the upper surface 211 and the lower surface 212 of a particular coordinate x, y is given as T = T' / n G (1) where T ' is the apparent or measured optical thickness, determined by CSI microscopy or by tuning the FTPSI with wavelengths using homology information, and at low NA (eg 0.06 or less), n G is the group velocity index ( At high NA, such as 0.2 or higher, the n G value can be varied due to the effect of the tilt angle, resulting in an effective group velocity index). Conversely, when confocal, structural illumination or focus sensing is used, signal S2 will appear at a higher position z. In this example, the physical thickness is given by T = nT" (2) where T" is the apparent or measured optical thickness as measured by a confocal or related focus-sensitive instrument, and n is the phase velocity refraction rate.

厚度地圖T'(x,y)或T"(x,y)提供了關於物理厚度T(x,y)的均勻性與平均值的訊息,以及透鏡200的光學特性,如例示的折射率nG(x,y)或n(x,y)。在一些例子中,合成物的均勻性與尺寸、光學這兩種性質的平均值,是足以在透鏡200的製程中控制。 The thickness map T'(x, y) or T"(x, y) provides information about the uniformity and average of the physical thickness T(x, y), as well as the optical properties of the lens 200, as exemplified by the refractive index n G (x, y) or n (x, y). In some examples, the average of the composition's uniformity and size, optical properties, is sufficient to control in the process of lens 200.

如果需要的話,如厚度地圖T(x,y)或光學折射率n(x,y)等額外訊息可通過其他方式取得,例如藉由接觸式輪廓儀(如揭露在P.Scott的“藉接觸探針儀器的非球面的量測的最新發展“,Proc.SPIE4927,199-207(2002)),可補充由光學量測儀器201所進行的量測,由物理厚度允許分離與獨立評估折射率效應。 If desired, additional information such as thickness map T(x, y) or optical refractive index n(x, y) can be obtained by other means, such as by contact profilometers (eg, disclosed in P. Scott's "borrowing contact" The latest development in the measurement of aspheric surfaces of probe instruments, Proc. SPIE 4927, 199-207 (2002), can be supplemented by measurements made by optical metrology instrument 201, allowing separation and independent evaluation of refractive index from physical thickness effect.

雖然上述的透鏡的特性分析僅依賴於對表面211和212的高度輪廓資料訊息,透鏡的特性分析也可以利用其他訊息。例如,在一些實施例中,包括特定的參考夾具提供附加的光學訊息。參考圖4A,在某些實施例中,透鏡200被安裝在具有嵌入的參考面420的夾具400上。在圖4A中,S1、S2以及S3表示透鏡200的關注的上與下表面(211和212)以及參考夾具的上表面420的反射光,該些反射光藉由沿z軸量測的距離Tair由下透鏡面212分離出來。 Although the characterization of the lens described above relies only on the height profile information of the surfaces 211 and 212, the characterization of the lens can utilize other information. For example, in some embodiments, a particular reference fixture is included to provide additional optical information. Referring to FIG. 4A, in some embodiments, the lens 200 is mounted on a clamp 400 having an embedded reference surface 420. In FIG. 4A, S1, S2, and S3 represent the reflected light of the upper and lower surfaces (211 and 212) of interest of the lens 200 and the upper surface 420 of the reference jig, which are measured by the distance T along the z-axis. Air is separated by the lower lens surface 212.

夾具400包括支撐結構410與反射上表面420。透鏡200擱置在支撐結構410上,將透鏡定位在離反射面420的一距離Tair上。支撐結構410可由透鏡200對側上的多個支柱 或壁組成,或者可以是一個單一的圓柱形支撐,由反射面420的外部分421分離出內部分422。夾具400可以專門為透鏡200量身訂做,當量測不同形狀的透鏡時,可以用另一夾具取代。 The clamp 400 includes a support structure 410 and a reflective upper surface 420. Lens 200 rests on the support structure 410, the lens is positioned on a T air distance from the reflecting surface 420. The support structure 410 may be comprised of a plurality of struts or walls on opposite sides of the lens 200, or may be a single cylindrical support separated by an outer portion 421 of the reflective surface 420. The jig 400 can be tailor-made specifically for the lens 200, and can be replaced with another jig when equivalently measuring lenses of different shapes.

圖4B和4C繪示使用光學儀器201的兩個連續的量測步驟,量測透鏡200的平面平行部分210的全域。根據圖5的流程500,這些步驟提供的量測訊息,包括表面211、212以及420的高度輪廓量測,以完成透鏡的光學性質與幾何性質的特性分析。在圖中,表觀高度量測Z1,...4各自對應於反射光S1...S4。 4B and 4C illustrate the measurement of the entire area of the planar parallel portion 210 of the lens 200 using two successive measurement steps of the optical instrument 201. According to the process 500 of FIG. 5, the measurement information provided by these steps includes height profile measurements of the surfaces 211, 212, and 420 to complete the characterization of the optical and geometric properties of the lens. In the figure, the apparent height measurements Z 1, ... 4 each correspond to the reflected light S1 ... S4.

在第一步驟中,如圖4B所示,用於三個表面211、212以及420的量測訊息被收集(步驟510、520、530)。其中,下表面212和輔助參考面420穿過透鏡材料量測並因此對應於表觀高度。用於三個表面的量測訊息被收集,而無需調整在夾具上的透鏡的位置。 In the first step, as shown in FIG. 4B, measurement information for the three surfaces 211, 212, and 420 is collected (steps 510, 520, 530). Therein, the lower surface 212 and the auxiliary reference surface 420 are measured through the lens material and thus correspond to the apparent height. Measurement information for the three surfaces is collected without the need to adjust the position of the lens on the fixture.

在第二步驟中,如圖4C所示,透鏡由夾具400被移除(步驟540),且輔助參考面420第二次量測(信號S4)(步驟550)。 In a second step, as shown in Figure 4C, the lens is removed by the clamp 400 (step 540) and the secondary reference surface 420 is measured a second time (signal S4) (step 550).

量測訊息被組合以產生透鏡元件的上與下平行表面之間的厚度和折射率分佈的地圖。對於同調掃描干涉儀與可相比的干涉儀器,在獲得表觀高度訊息Z1,...4後,物理和光學厚度地圖分別為:T(x,y)=z 1(x,y)-z 2(x,y)+z 3(x,y)-z 4(x,y) (3) The measurement information is combined to produce a map of the thickness and refractive index profile between the upper and lower parallel surfaces of the lens element. For the homology scanning interferometer and the comparable interferometric instrument, after obtaining the apparent height information Z 1,...4 , the physical and optical thickness maps are: T ( x, y ) = z 1 ( x, y ) - z 2 ( x,y )+ z 3 ( x,y )- z 4 ( x,y ) (3)

T'(x,y)=z 1(x,y)-z 2(x,y). (4) T' ( x,y )= z 1 ( x,y )- z 2 ( x,y ). (4)

接著,群速折射率的地圖為 n G (x,y)=T'(x,y)/T(x,y). (5) Next, the map of the group velocity index is n G ( x, y ) = T' ( x, y ) / T ( x, y ). (5)

當量測系統依賴於共焦、結構照明或焦點感測表面輪廓儀,方程式(4)和(5)成為T"(x,y)=z 1(x,y)-z 2(x,y), (6) Equivalent systems rely on confocal, structured illumination or focus-sensing surface profilometers, and equations (4) and (5) become T" ( x, y ) = z 1 ( x, y ) - z 2 ( x, y ), (6)

n=T/T". (7) n = T / T" . (7)

根據從透鏡的一側到另一側的量測厚度的變化,厚度地圖提供關於透鏡的平均厚度資訊以及在透鏡的兩側之間可能的傾斜。折射率地圖提供了關於整個鏡片面積可能的折射率梯度的訊息。 The thickness map provides information about the average thickness of the lens and possible tilt between the two sides of the lens based on the change in thickness measured from one side of the lens to the other. The refractive index map provides information about the possible refractive index gradients for the entire lens area.

作為可選擇的附加步驟,知道在透鏡內的材料的標稱折射率的分散性,經常可變換群折射率到相折射率:n=Transform(n G ). (8) As an optional additional step, knowing the dispersion of the nominal refractive index of the material within the lens, it is often possible to change the group index to the phase index: n = Transform ( n G ). (8)

在某些情況下,變換可簡如添加一常數。例如, 該添加的常數是,其中n(k)是材料的標稱折射率(由 製造商所稱或經由一些方法量測),以波數的函數表示,並且K0是用於量測頻譜帶的質心波數。其它變換是可能的,例如一個查找表或多項式函數。藉由量測的群折射率的擬合(fitting)數據點(使用儀器),變換多項式可產生測試樣品的已知折射率的函數。 In some cases, the transformation can be as simple as adding a constant. For example, the added constant is Where n(k) is the nominal refractive index of the material (referred to by the manufacturer or measured by some method), expressed as a function of wavenumber, and K 0 is the number of centroid waves used to measure the spectral band. Other transformations are possible, such as a lookup table or polynomial function. The transform polynomial produces a function of the known refractive index of the test sample by fitting the data points of the group refractive index (using the instrument).

為了提高流程的精度,也可以附加量測。例如,參考圖6A、6B以及圖7,在一些實施例中,為了從光徑暢通的夾具參考面反射的S5,藉由透鏡200,附加量測z5(x,y)同時被透鏡圖像擷取(在流程圖700的步驟710)。舉例而言,對於夾具可在兩個量測步驟之間移動的例子,這個附加訊息可 相對於該光學儀器提供夾具的整體的高度位移量。此訊息可以校正z4(x,y)的量測結果,舉例而言,藉由提供位移量或位移量的組合,為了在量測之間的夾具位置的改變的尖端與傾斜補償(步驟720)。 In order to improve the accuracy of the process, it is also possible to add a measurement. For example, referring to FIGS. 6A, 6B, and 7, in some embodiments, for the S5 reflected from the jig reference surface of the optical path, the additional measurement z 5 (x, y) is simultaneously applied to the lens image by the lens 200. Capture (in step 710 of flowchart 700). For example, for an example where the clamp can be moved between two measurement steps, this additional information can provide an overall height displacement of the clamp relative to the optical instrument. This message can correct the measurement result of z 4 (x, y), for example, by providing a combination of the displacement amount or the displacement amount, the tip and tilt compensation for the change of the clamp position between the measurements (step 720) ).

在一些實施例中,為了儀器的不同組態,重複量測,使得大體上以不同的頻譜分佈收集數據。例如,第一頻譜分佈的中心位於400奈米與490奈米之間,第二頻譜分佈的中心位於490奈米與590奈米之間,以及第三光譜分佈的中心位於590奈米與700奈米之間。每個頻譜分佈提供了透鏡材料的光學特性的一個獨立的量測。群速折射率或相速折射率的多個量測值接著可被組合,以波長(或色散)導出該材料的光學特性變化的估算。與/或用於控制製程,其可用於驗證該材料是否在工差範圍內。在儀器量測群折射率(如同調掃描干涉儀)的例子中,色散的估計進一步被用來計算折射率的估計值,舉例而言,藉由質心波數使用一階導數的乘積來計算。在一些實施例中,多頻譜分佈同時存在,而儀器收集從掃描數據採集所得到的數據。多頻譜帶在偵側器被分離,舉例而言,使用色敏元件(配備彩色濾波器的CCD或CMOS照相機)隔開偵測器。二擇一地,來自感測器的返回光藉由二色性(dichroic)光學元件在空間中被分離,二色性光學元件反射或輸送特定頻譜構件到多個單色感測器。最少需要兩個頻譜帶以估計該材料的色散。 In some embodiments, the measurements are repeated for different configurations of the instrument such that data is collected substantially in different spectral distributions. For example, the center of the first spectral distribution is between 400 nm and 490 nm, the center of the second spectral distribution is between 490 nm and 590 nm, and the center of the third spectral distribution is located at 590 nm and 700 N. Between meters. Each spectral distribution provides an independent measure of the optical properties of the lens material. A plurality of measurements of the group velocity index or the phase velocity index can then be combined to derive an estimate of the change in optical properties of the material in wavelength (or dispersion). And/or used to control the process, which can be used to verify that the material is within tolerance. In the example where the instrument measures the refractive index of the group (as in a chirped interferometer), the estimation of the dispersion is further used to calculate an estimate of the refractive index, for example, by using the product of the first derivative of the centroid number. . In some embodiments, the multi-spectral distribution is present at the same time, and the instrument collects the data obtained from the scan data acquisition. The multi-spectral band is separated at the side detector, for example, using a color sensitive element (a CCD or CMOS camera equipped with a color filter) to separate the detectors. Alternatively, the return light from the sensor is separated in space by a dichroic optical element that reflects or delivers a particular spectral component to the plurality of monochrome sensors. A minimum of two spectral bands are needed to estimate the dispersion of the material.

雖然前述量測可以使用偏振光或非偏振的光來進行,也可點滴收集有關使用偏振光的透鏡200的額外訊息。例 如,參考圖8,以透鏡(或其它部分透明的樣品)的製造揭示問題,可決定關於透鏡的偏振相依的光學特性資訊,包括應力雙折射的效應。在大多數情況下,沒有應力與相應的應力雙折射性的透鏡是製程控制的設計目標。 While the foregoing measurements can be performed using polarized or unpolarized light, additional information about the lens 200 using polarized light can also be collected by drop. example For example, referring to Figure 8, the problem is revealed by the fabrication of a lens (or other partially transparent sample) that can determine the optical property information about the polarization dependence of the lens, including the effects of stress birefringence. In most cases, lenses with no stress and corresponding stress birefringence are the design goals of process control.

樣品中的應力雙折射性的存在可通過觀察其在樣品的平面平行區域的效應進行監測。在此,概述在流程圖500中或流程圖700中的量測過程進行至少兩次,其中在量測系統所使用的照明光的不同偏振狀態下,進行每個完整的數據採集週期。使用常規偏振器與/或波板來操縱光學量測儀器的偏振狀態。 The presence of stress birefringence in the sample can be monitored by observing its effect on the planar parallel regions of the sample. Here, the metrology process outlined in flowchart 500 or in flowchart 700 is performed at least twice, with each complete data acquisition cycle being performed in different polarization states of the illumination light used by the metrology system. Conventional polarizers and/or wave plates are used to manipulate the polarization state of the optical metrology instrument.

例如,如流程圖800所示,以線性沿著x方向線偏振的照明光進行第一量測,並線性以沿y方向線偏振的照明光重複進行第一量測。在一些實施例中,相對於透鏡200上的參考特徵,對齊偏振方向。例如,其中的透鏡是射出成形(injection-molded)透鏡,參考特徵可對應閘,閘為射出材料進入模具孔穴的位置。 For example, as shown in flowchart 800, the first measurement is performed with illumination light linearly linearly polarized along the x-direction, and the first measurement is repeated linearly with illumination light linearly polarized along the y-direction. In some embodiments, the polarization direction is aligned relative to a reference feature on lens 200. For example, where the lens is an injection-molded lens, the reference feature can correspond to a gate that is the location where the exit material enters the mold cavity.

收集到的多個折射率地圖接著被組合,以提供存在於透鏡材料的雙折射性的定量量測。例如,在步驟870中,從量測結果計算出雙折射效應。在步驟880中,從該量測值計算平均折射率。雙折射性,舉例而言,可表現為通過透鏡的光徑差,如流程圖800的步驟870所示。在此,通過透鏡的雙折射性的累積效應被計算為B(x,y)=[n 2(x,y)-n 1(x,y)] T (9) The collected plurality of refractive index maps are then combined to provide a quantitative measure of the birefringence present in the lens material. For example, in step 870, the birefringence effect is calculated from the measurement results. In step 880, an average refractive index is calculated from the measured value. Birefringence, for example, can be manifested as the difference in optical path through the lens, as shown in step 870 of flowchart 800. Here, the cumulative effect of the birefringence through the lens is calculated as B ( x, y ) = [ n 2 ( x, y ) - n 1 ( x, y )] T (9)

而平均折射率(如步驟880中所示)為 And the average refractive index (as shown in step 880) is

類似地,雙折射性可表示為材料內每單位長度的傳播的光徑差。相速折射率n1,2對應於兩個偏振方向。為了製程控制,藉由群折射率量測(舉例而言,遵循來自CSI顯微鏡的量測結果),這些折射率可被適當表示。此外,為了一些製程控制的情況,光學厚度變化的量測為B'(x,y)=T' 2(x,y)-T' 1(x,y) (11)或為B"(x,y)=T"2(x,y)-T"1(x,y) (12) Similarly, birefringence can be expressed as the difference in optical path length per unit length within the material. The phase velocity refractive index n 1,2 corresponds to two polarization directions. For process control, these refractive indices can be suitably represented by group refractive index measurements (for example, following measurements from CSI microscopes). In addition, for some process control cases, the measurement of optical thickness variation is B' ( x, y ) = T' 2 ( x, y ) - T' 1 ( x, y ) (11) or B "( x , y )= T " 2 ( x,y )- T " 1 ( x,y ) (12)

使用圖2A中簡單的組態可能已足夠。 It may be sufficient to use the simple configuration in Figure 2A.

儘管前述實施例涉及量測,描述透鏡的非作用區域(如平面平行部分)的量測,且一般從這些表徵推斷關於透鏡的訊息。其它實施例也是可能的。舉例而言,也可進行量測並直接描述透鏡的有效部分。 Although the foregoing embodiments relate to metrology, measurements of non-active regions of the lens (e.g., planar parallel portions) are described, and information about the lens is generally inferred from these characterizations. Other embodiments are also possible. For example, measurements can also be made and directly describe the effective portion of the lens.

參照圖9與圖10,測試中的樣品透鏡900,包括含曲面的有效部分920、非作用部分。非作用部分由好幾個環繞有效部分的名義上的平面組成。圖9繪示透鏡900的側視圖,而圖10繪示上視圖。有效部分920對應於上凸面921與下凸面922。上表面921具有一個頂點923,頂點923與沿下表面922的頂點924相同的軸線為名義上對齊。 Referring to Figures 9 and 10, the sample lens 900 under test includes an effective portion 920 having a curved surface and an inactive portion. The inactive portion consists of several nominal planes that surround the active portion. 9 is a side view of the lens 900, and FIG. 10 is a top view. The effective portion 920 corresponds to the upper convex surface 921 and the lower convex surface 922. Upper surface 921 has a vertex 923 that is nominally aligned with the same axis along apex 924 of lower surface 922.

非作用部分由一系列有階梯特徵的平面、環形表面在透鏡900的每一側偏移內與外平面表面。一般而言,非作用部分的表面,舉例而言,可包括形成在樣品上的特徵,在最終裝配時協助透鏡的對齊與夾持,與/或使透鏡特徵的相對對 齊的量測更便利。在此例子中,非作用部分的上側包括平面912和916。步驟914分離平面912和916、步驟914在邊緣914o接觸面912、在邊緣914i接觸面916。表面916在邊緣918接觸上凸面921。 The inactive portion is offset from the inner and outer planar surfaces on each side of the lens 900 by a series of planar, annular surfaces having stepped features. In general, the surface of the inactive portion, for example, may include features formed on the sample, assist in alignment and clamping of the lens during final assembly, and/or relative pairs of lens features The measurement is more convenient. In this example, the upper side of the inactive portion includes planes 912 and 916. Step 914 separates planes 912 and 916, step 914 contacts surface 912 at edge 914o, and contacts 916 at edge 914i. Surface 916 contacts upper convex surface 921 at edge 918.

非作用部分的下側包括平面911和917。步驟915分離面911與917。步驟915在邊緣915o接觸面911、在邊緣915i接觸面917。面917在邊緣919接觸下凹面922。 The underside of the inactive portion includes planes 911 and 917. Step 915 separates faces 911 and 917. Step 915 contacts surface 911 at edge 915o and surface 917 at edge 915i. Face 917 contacts lower concave surface 922 at edge 919.

光學量測儀器201是用來評估透鏡900的一些尺寸特徵,包括(但不限於)頂點到頂點的厚度TApex與表面特徵位置的相對的x,y橫向偏移(參照共通軸z),包括(但不限於)頂點中心與對齊的表面特徵。通過量測上表面輪廓來決定三維頂點位置、相對的三維位置以及其他表面特徵的形貌,以進行這些評估。這些量測作為透鏡整體的尺寸特性的指標。 The optical metrology instrument 201 is used to evaluate some of the dimensional features of the lens 900, including but not limited to the apex-to-apex thickness T Apex and the relative x, y lateral offset of the surface feature position (see common axis z), including (but not limited to) vertex center and aligned surface features. These measurements were made by measuring the top surface profile to determine the position of the three-dimensional vertices, the relative three-dimensional position, and the topography of other surface features. These measurements are an indicator of the dimensional characteristics of the lens as a whole.

如圖9所示,在操作過程中,光學儀器201沿著平行於z軸的觀察方向向下看樣品,對應於儀器201的光軸。在量測數據採集時,在全域座標系的x,y,z中,系統對關注的表面收集高度和強度訊息。 As shown in FIG. 9, during operation, the optical instrument 201 looks down the sample in a viewing direction parallel to the z-axis, corresponding to the optical axis of the instrument 201. In the measurement data acquisition, in the x, y, z of the global coordinate system, the system collects height and intensity information on the surface of interest.

頂點923的量測訊息由光在空氣中的反射(在圖9中的信號SUA)衍生,如在上表面關注的其他特徵中的量測訊息(在圖9中的信號SUF)。個別地,下表面上的關注特徵的量測訊息是從透鏡材料內(在圖9中的信號SLF)的反射光而衍生。 The measurement information for vertex 923 is derived from the reflection of light in the air (signal S UA in Figure 9), such as the measurement information in other features of interest on the upper surface (signal S UF in Figure 9). Individually, the measurement information of the feature of interest on the lower surface is derived from the reflected light within the lens material (signal S LF in Figure 9).

考慮CSI顯微鏡系統的特定例子,如圖3中所示,一般信號SUA被處理以產生高度訊息,接著被分析以決定的頂 點923的三維位置PUA。從信號SUF導出的高度訊息可以與PUA組合以決定HUA,在z的頂點高度,相對於關注特徵的上表面-面912。相同的高度訊息也可以用以決定上表面邊緣特徵的位置,舉例而言,關注特徵912的上表面為名義上的圓形邊緣。二擇一地,或附加地,信號SUF可被處理以產生強度訊息,接著被分析以決定上表面邊緣特徵914o的位置。 Considering a specific example of a CSI microscope system, as shown in Figure 3, the general signal S UA is processed to generate a height message, which is then analyzed to determine the three-dimensional position P UA of the vertex 923. The height information derived from the signal S UF can be combined with P UA to determine H UA , at the apex height of z, relative to the upper surface-surface 912 of the feature of interest. The same height information can also be used to determine the position of the upper surface edge feature, for example, the upper surface of the attention feature 912 is a nominally rounded edge. Alternatively, or in addition, the signal S UF can be processed to generate an intensity message, which is then analyzed to determine the position of the upper surface edge feature 914o.

SLF是非干涉強度信號,可被分析以決定下表面邊緣特徵915o的位置。參照圖12,SLF可以用顯微鏡系統在最佳焦點Z位置進行量測,如圖12中所示,在x,y位置、相對於上表面的焦平面被TBF所取代。對於厚度Tfeature和折射率n,為接近垂直的入射角度,TBF可以計算為:T BF =T feature /n (13) S LF is a non-interference intensity signal that can be analyzed to determine the position of the lower surface edge feature 915o. Referring to Fig. 12, S LF can be measured at the optimum focus Z position by the microscope system, as shown in Fig. 12, at the x, y position, with respect to the focal plane of the upper surface, replaced by T BF . For the thickness T feature and the refractive index n, which is a nearly vertical incident angle, T BF can be calculated as: T BF = T feature / n (13)

對於這個計算,厚度與折射率可以假設為標稱值或先前通過其他方式量測,如使用相同的儀器或卡尺。取決於給定應用所要求的精度,可以更有利於補償來自穿過透鏡材料的折射的球面像差的影響,並為TBF計算校正值,如使用下列公式: For this calculation, the thickness and refractive index can be assumed to be nominal or previously measured by other means, such as using the same instrument or caliper. Depending on the accuracy required for a given application, it may be more advantageous to compensate for the effects of spherical aberration from the refraction through the lens material and calculate a correction for T BF , using the following formula:

式中NA表示光學儀器的數值孔徑。 Wherein NA represents the numerical aperture of the optical instrument.

上表面頂點CUA的橫向位置由PUA的x,y座標給出。其他關注特徵的位置可以用其他方式來定義,例如,作為量測的邊緣位置的中心,在圖11中指示為CUF與CLF。在這些位置之間的橫向距離對應於平行於z軸的軸之間的偏移,隱含為基準面,並在某些情況下對應於上表面的平面特徵。舉例而 言,間特徵橫向距離XYFeature可以計算為:XY Feature =C UF -C LF (14) The lateral position of the upper surface vertex C UA is given by the x, y coordinate of P UA . The location of other features of interest may be defined in other ways, for example, as the center of the measured edge location, indicated as C UF and C LF in FIG. The lateral distance between these locations corresponds to the offset between the axes parallel to the z-axis, implicit to the reference plane, and in some cases to the planar features of the upper surface. For example, the inter-feature lateral distance XY Feature can be calculated as: XY Feature = C UF - C LF (14)

類似地,上表面頂點到特徵的橫向距離XYUAF可以計算為:XY UAF =C UA -C UF (15) Similarly, the lateral distance from the top surface vertex to the feature XY UAF can be calculated as: XY UAF = C UA - C UF (15)

在某些情況下,XYFeature足以在透鏡的製造中控制製程,例如,作為半模的橫向對齊的工具。類似地,XYUAF連同相對的頂點高度HUA,足以用於識別透鏡形成的問題。例如,這些來自上表面的半模的預期尺寸偏離。 In some cases, the XY Feature is sufficient to control the process in the manufacture of the lens, for example, as a tool for lateral alignment of the mold halves. Similarly, the XY UAF, along with the relative vertex height H UA , is sufficient for identifying the problem of lens formation. For example, the expected size deviation of these mold halves from the upper surface.

需明確地量測在上表面頂點和下表面頂點之間的尺寸特性,諸如圖9中的頂點厚度TApex或間頂點橫向距離XYApex,如圖11中所示對應於CUA和CLA之間的橫向距離。在一些實施例中,參照圖13,這可以通過額外量測透鏡900,其定向為下表面911、917以及922面向光學儀器201,同時,相對於與透鏡900的上表面面對光學儀器201所進行的量測,保持方位角的軌道。使用類似於用於第一量測中描述的方法,該第二量測提供HLA、PLA以及下表面頂點到特徵的橫向距離XYLAF,對應於CLA與CLF之間的橫向距離:XY LAF =C LA -C LF (16) It is necessary to explicitly measure the dimensional characteristics between the upper surface apex and the lower surface apex, such as the vertex thickness T Apex or the inter- vertex lateral distance XY Apex in FIG. 9, corresponding to C UA and C LA as shown in FIG. The lateral distance between. In some embodiments, referring to FIG. 13, this may be by an additional measurement lens 900 oriented with the lower surfaces 911, 917, and 922 facing the optical instrument 201 while facing the optical instrument 201 with respect to the upper surface of the lens 900. The measurements are taken to maintain the azimuth of the orbit. Using a method similar to that described in the first measurement, the second measurement provides H LA , P LA and the lateral distance XY LAF of the lower surface vertex to the feature, corresponding to the lateral distance between C LA and C LF : XY LAF = C LA - C LF (16)

需要注意的是,對於在圖13中繪示的特定的幾何形狀,HLA是負的。 It should be noted that for the particular geometry depicted in Figure 13, HLA is negative.

在某些情況下,該第二量測可提供XYFeature的獨立量測。 In some cases, this second measurement provides an independent measurement of the XY Feature .

在一些實施例中,首先從透鏡一表面面向儀器量 測,然後量測另一個,所得到的量測訊息根據在圖14中所示的流程1400組合,以產生全頂點厚度的量測與所欲的橫向距離。在此實施例中,步驟的順序如下:首先,透鏡900被定位成上表面面對量測儀器201(步驟1405)。在此組態中,量測儀器201至少在上表面的頂點的區域中量測高度輪廓,並計算此上頂點的位置(步驟1410)。透鏡900位在相同的位置,對關注的上特徵,儀器201量測高度輪廓與強度分佈,例如邊緣914o(步驟1415)。在步驟1420中,系統接著計算上頂點高度HUA,與上頂點到特徵的橫向距離XYUAF(如使用方程式(15))。 In some embodiments, the instrument is first measured from the surface of the lens and then the other is measured, and the resulting measurement information is combined according to the flow 1400 shown in FIG. 14 to produce a measurement of the full vertex thickness. The lateral distance of the desire. In this embodiment, the sequence of steps is as follows: First, the lens 900 is positioned such that the upper surface faces the metrology instrument 201 (step 1405). In this configuration, the metrology instrument 201 measures the height profile at least in the region of the apex of the upper surface and calculates the position of the upper vertex (step 1410). The lens 900 is in the same position, and for the upper feature of interest, the instrument 201 measures the height profile and intensity distribution, such as edge 914o (step 1415). In step 1420, the system then calculates the upper vertex height H UA , the lateral distance from the upper vertex to the feature XY UAF (as in equation (15)).

對下表面特徵的量測而言,量測儀器201與透鏡900量測相對彼此移動,使得關注的下特徵,例如邊緣915o,處於最佳焦點位置(步驟1425)。此位置可使用Tfeature與n的標稱值或量測值來決定。在此位置,儀器量測下特徵的強度分布(步驟1430)。使用來自強度分佈的訊息,系統計算(在步驟1435中)一個間特徵的橫向偏移XYFeatureFor the measurement of the lower surface features, the metrology instrument 201 and the lens 900 measure relative to each other such that the lower feature of interest, such as the edge 915o, is in the best focus position (step 1425). This position can be determined using the nominal or measured values of T feature and n. At this location, the instrument measures the intensity distribution of the features (step 1430). Using the message from the intensity distribution, the system calculates (in step 1435) the lateral offset XY Feature of an inter-feature.

下一步,透鏡900被翻轉並定位成其下表面面向儀器201(步驟1440)。在此位置,在下頂點924的區域中量測高度輪廓,且計算下頂點位置PLA(步驟1445)。然後,為下表面上的一個或多個特徵(例如邊緣915o),系統在步驟1450中量測高度輪廓與強度分佈。以此量測,系統計算一個下頂點高度HLA與下頂點到特徵的橫向距離XYLAF(步驟1455)。 Next, lens 900 is flipped and positioned with its lower surface facing instrument 201 (step 1440). At this position, the height profile is measured in the region of the lower vertex 924, and the lower vertex position P LA is calculated (step 1445). Then, for one or more features on the lower surface (eg, edge 915o), the system measures the height profile and intensity distribution in step 1450. Using this measurement, the system calculates a lateral distance H LA from the lower vertex to the feature XY LAF (step 1455).

在步驟1460中,頂點厚度TApex可以計算為:T Apex =H UA +T feature +H LA (17) In step 1460, the vertex thickness T Apex can be calculated as: T Apex = H UA + T feature + H LA (17)

最後,在步驟1465,間頂點橫向距離XYApex對應CUA和CLA之間的橫向距離,並且可以根據以下內容計算,其中上標代表參數是否從上表面量測或下表面量測獲得:XY Apex =XY UAF upper +(XY Feature ) upper -XY LAF lower (18) Finally, at step 1465, the inter- vertex lateral distance XY Apex corresponds to the lateral distance between C UA and C LA and can be calculated from the following, where the superscript represents whether the parameter is obtained from the upper surface measurement or the lower surface measurement: XY Apex = XY UAF upper +( XY Feature ) upper - XY LAF lower (18)

如果下表面量測提供間特徵的橫向距離XYFeature的獨立量測,下面的表達式可以任選地用於減少潛在的統計可變性:XY Feature =0.5[XY Feature upper +XY Feature lower ] (19) If the lower surface measurement provides an independent measure of the lateral distance of the feature XY Feature , the following expression can optionally be used to reduce the potential statistical variability: XY Feature = 0.5[ XY Feature upper + XY Feature lower ] (19 )

XY Apex =XY UAF upper +XY Feature -XY LAF lower (20) XY Apex = XY UAF upper + XY Feature - XY LAF lower (20)

在一些實施例中,如先前參照圖4A至圖4C中討論,該裝置可包括部件夾具,部件夾具包括名義上平的反射面,反射面置於樣品下,使得通過樣品傳播回來的反射光朝向量測儀器。此種實施例可以改善使用光學儀器201獲取的強度圖像的對比。 In some embodiments, as previously discussed with reference to Figures 4A-4C, the apparatus can include a component holder that includes a nominally flat reflective surface that is placed under the sample such that the reflected light propagating through the sample is oriented Measuring instrument. Such an embodiment can improve the contrast of the intensity images acquired using the optical instrument 201.

在某些實施例中,關於區域內x,y空間變化中的訊息(包括關注特徵)可被利用來更準確地決定尺寸特徵。例如,該訊息可以包括折射率n(x,y)、厚度T(x,y),以及表面形貌SUA(x,y)和SLA(x,y)等的地圖。 In some embodiments, information about x, y spatial variations in the region (including features of interest) may be utilized to more accurately determine the size features. For example, the message may include a refractive index n(x, y), a thickness T(x, y), and a map of surface topography S UA (x, y) and S LA (x, y), and the like.

參照圖15A與圖15B,待測的透鏡的平面區域似乎是平行的,但在實際中和理想是有可能偏差的。例如,通過上下關注特徵的最佳擬合平面可能偏離平行。這可以產生相對於第二量測(下表面面向儀器),對第一量測(上表面朝向儀器)的非平行部分的傾斜。例如,個別相對於上和下表面的不 平行特徵會調整部件的傾斜。這些相對部件的傾斜形成楔角W,可從厚度地圖T(x,y)來導出並納入的尺寸特徵計算。舉例而言,頂點厚度TApex可以表示為:T Apex =f ApexZ (H UA ,T feature ,H LA ,W) (21) Referring to Figures 15A and 15B, the planar areas of the lens to be tested appear to be parallel, but in practice the ideal is likely to be deviated. For example, the best fit plane through the up and down attention features may deviate from parallel. This can result in a tilt of the non-parallel portion of the first measurement (upper surface towards the instrument) relative to the second measurement (lower surface facing instrument). For example, individual non-parallel features relative to the upper and lower surfaces may adjust the tilt of the component. The tilt of these opposing components forms a wedge angle W that can be derived from the thickness map T(x,y) and incorporated into the dimensional features. For example, the vertex thickness T Apex can be expressed as: T Apex = f ApexZ ( H UA , T feature , H LA , W ) (21)

橫向距離XY Feature XY Apex 可表示為:XY Feature =f FeatureXY (C UF ,C LF ,W) (22) The lateral distance XY Feature and XY Apex can be expressed as: XY Feature = f FeatureXY ( C UF , C LF , W ) (22)

XY Apex =f ApexXY (XY UAF ,XY Feature ,XY LAF ,W) (23) XY Apex = f ApexXY ( XY UAF , XY Feature , XY LAF , W ) (23)

圖9繪示通過上表面介面量測的下表面邊緣,似乎是垂直於掠面表面形貌儀的光軸,但在實際中有可能和理想偏差。此外,這種偏差可具有(x,y)的依賴性,例如,在表面形貌圖SUA(x,y)中顯露為在局部傾斜的變化。圖15A繪示在特定的橫向位置的關注定位,此位置透過一光束量具有一折射率n的材料厚度T,首先遇到相對於垂直的一表面傾斜αtiltFigure 9 illustrates the lower surface edge measured by the upper surface interface, which appears to be perpendicular to the optical axis of the sweeping surface topography, but in practice it is possible to deviate from the ideal. Moreover, such a deviation may have a dependency of (x, y), for example, a change in local tilt in the surface topography map S UA (x, y). Figure 15A illustrates the position of interest at a particular lateral position through a material thickness T having a refractive index n through a beam amount, first encountering a surface tilt α tilt relative to the vertical.

由於折射效應,關注定位在明顯且實際的橫向位置之間的橫向偏移△L大約為:△L=T sin(α refr ) (24)其中根據Snell定律,sin(α refr )與sin(α tilt )相關:sin(α refr )=sin(α tilt )/n. (25)因此,△L為:△L=T sin(α tilt )/n. (26) Due to the refraction effect, the lateral offset ΔL that focuses on the apparent and actual lateral position is approximately: Δ L = T sin( α refr ) (24) where sin( α refr ) and sin( α ) according to Snell's law Tilt ) Correlation: sin( α refr )=sin( α tilt )/ n . (25) Therefore, Δ L is: Δ L = T sin( α tilt )/ n . (26)

在圖15A中,厚度T被描繪為沿著光束的方向量測,在同一方位的樣品如預期的某些厚度的量測方法。對於一些實施例,T可以對應於沿光軸的厚度。對於小的αtilt值通常 遇到的這種對△L的影響這種潛在的差異是可忽略的。 In Figure 15A, the thickness T is depicted as a measure of the thickness of the sample in the same orientation as the expected direction of the beam. For some embodiments, T may correspond to a thickness along the optical axis. This potential difference in the effect of ΔL, which is commonly encountered with small α tilt values, is negligible.

在XY平面,局部的傾斜αtilt會有一些方位角取向θtilt。如圖15B所示,橫向偏移△L具有相同的方位角取向。關注定位的位置明顯的x,y座標校正個別為:△x=△L.cos(θ tilt ) (27) In the XY plane, the local tilt α tilt has some azimuthal orientation θ tilt . As shown in Fig. 15B, the lateral offset ΔL has the same azimuthal orientation. The x, y coordinate corrections where the position of the focus is noticeable are: △x=△ L . Cos( θ tilt ) (27)

△y=△L.sin(θ tilt ) (28) △y=△ L . Sin( θ tilt ) (28)

在一般情況下,折射率n、厚度T、傾斜αtilt以及方位角方向θtilt取決於橫向位置(x,y),所以△L通常是(x,y)的函數。折射校正可被應用到每個量測的邊緣點,隨後校正的邊緣點的集合可根據需要分析,以產生關注特徵的校正位置。 In general, the refractive index n, the thickness T, the tilt α tilt, and the azimuthal direction θ tilt depend on the lateral position (x, y), so ΔL is usually a function of (x, y). A refraction correction can be applied to each measured edge point, and the set of corrected edge points can then be analyzed as needed to produce a corrected position of the feature of interest.

參考圖16,繪示在流程圖1600中,例示性實施例說明具有透鏡的傾斜角。在此,透鏡首先被定位成其上表面面向量測儀器(步驟1605),並使用儀器來量測上頂點區域的高度輪廓,以及從該量測中,計算上頂點位置PUA(步驟1610)。然後,系統對關注的上特徵(如上表面914或在上表面上的邊緣)量測高度和強度分佈(步驟1615)。從此量測中,系統計算的上特徵中心CUF。在步驟1620中,系統隨後計算的上頂點高度HUA與上頂點到特徵的橫向距離XYUAF。為了下一次量測,使用為Tfeature與n的標稱值與量測值,系統相對於光學儀器移動透鏡,使得關注的下特徵(如平面或邊緣)位在一個最好的聚焦位置(步驟1625)。在這個位置上,系統量測測下表面特徵的強度分佈,並且量測在下表面的表觀邊緣位置(步驟1630)。對橫向偏移△L,藉系統校正這些量測值。對每個邊緣位置使用局部的折射率n、傾斜αtilt以及厚度T(步驟1635)。 使用校正的邊緣位置,系統計算下特徵的中心的位置CLF(步驟1640)。具有上、下特徵的位置(CUF和CLF)以及楔角W,系統計算間特徵的橫向偏移XYFeature(步驟1645)。在此,楔角對應於透鏡的厚度地圖中的傾斜。 Referring to Figure 16, depicted in flowchart 1600, an illustrative embodiment illustrates a tilt angle having a lens. Here, the lens is first positioned as its upper surface area vector measuring instrument (step 1605), and the instrument is used to measure the height profile of the upper vertex region, and from the measurement, the upper vertex position P UA is calculated (step 1610). . The system then measures the height and intensity distribution for the upper feature of interest (such as surface 914 or the edge on the upper surface) (step 1615). From this measurement, the system calculates the upper feature center C UF . In step 1620, the system then calculates the upper vertex height H UA and the lateral distance from the upper vertex to the feature XY UAF . For the next measurement, using the nominal and measured values of T feature and n, the system moves the lens relative to the optical instrument such that the underlying features of interest (such as planes or edges) are in a best focus position (steps) 1625). In this position, the system measures the intensity distribution of the underlying features and measures the apparent edge position of the lower surface (step 1630). For the lateral offset ΔL, these measurements are corrected by the system. A local refractive index n, a tilt α tilt, and a thickness T are used for each edge position (step 1635). Using the corrected edge position, the system calculates the position C LF of the center of the lower feature (step 1640). The positions with the upper and lower features (C UF and C LF ) and the wedge angle W, the system calculates the lateral offset XY Feature of the feature (step 1645). Here, the wedge angle corresponds to the tilt in the thickness map of the lens.

接著,在步驟1650中,透鏡被翻轉,使得下表面面對光學儀器(步驟1650)以及獲取下頂點區域的高度輪廓(步驟1655)。從這個高度輪廓系統計算下頂點位置PLA。然後,系統量測關注的下表面特徵的高度輪廓與強度分佈(步驟1660)。接著從步驟1655和1660取得的訊息進行計算下表面頂點高度HLA以及下頂點到特徵的橫向距離XYLAF(步驟1665)。對HLA使用此值以及隨著HUA與Tfeature的值,系統計算頂點厚度TApex(步驟1670)。使用XYUAF、XYLAF、XYFeature以及W,系統還計算一個間頂點的橫向偏移的值XYApex(步驟1675)。 Next, in step 1650, the lens is flipped such that the lower surface faces the optical instrument (step 1650) and the height profile of the lower vertex region is acquired (step 1655). The lower vertex position P LA is calculated from this height contour system. The system then measures the height profile and intensity distribution of the underlying surface features of interest (step 1660). The information obtained from steps 1655 and 1660 is then used to calculate the lower surface vertex height H LA and the lower vertex to feature lateral distance XY LAF (step 1665). Using this value for H LA and with the values of H UA and T feature , the system calculates the vertex thickness T Apex (step 1670). Using XY UAF , XY LAF , XY Feature, and W, the system also calculates the value of the lateral offset of the inter-vertex XY Apex (step 1675).

在一些實施例中,相對於光學儀器,在兩個或更多個方位角方向量測樣品。在不同的方位角方向,通過獲得透鏡的尺寸特性的獨立量測,系統可以組合這些獨立的量測值,以便在最終報告的尺寸特性減少系統誤差。 In some embodiments, the sample is measured in two or more azimuthal directions relative to the optical instrument. By obtaining independent measurements of the dimensional characteristics of the lens in different azimuthal directions, the system can combine these independent measurements to reduce system errors in the final reported dimensional characteristics.

系統誤差來源的例子包括光軸與掃描軸之間的錯對位,照明的橫向或軸向不對齊,以及在樣品傾斜的偏差。 Examples of sources of systematic error include misalignment between the optical axis and the scan axis, lateral or axial misalignment of the illumination, and deviations in the tilt of the sample.

在一些情況下,系統誤差具有一個組件,其獨立於樣品的取向。例如,兩個特定的特徵之間的報告的橫向距離可因一些在儀器座標(△xbias,△ybias)的偏移被偏差。這個偏差可以取決於被量測的特定樣品特徵。在這樣的情況下,在測 定橫向距離中,相對於儀器在一個方位角方向θ0量測樣品以及相對於儀器在方位角方向θ180量測樣品,其中θ180相對於θ0應偏移180°,可以通過組合此兩量測值,減少系統誤差。如圖17A與圖17B所示,這對應於在樣品座標(xsample,ysample)與儀器座標(xinstr,yinstr)之間的180°的相對方位角旋轉。這種相對方位取向可以通過樣品夾持或對準部件本身的顯著特徵來實現。例如,樣品支撐可包括旋轉台和尺,可手動或自動以所需數量繞著光學儀器的光軸旋轉。 In some cases, the systematic error has a component that is independent of the orientation of the sample. For example, the reported lateral distance between two particular features may be skewed by some offset at the instrument coordinates (Δx bias , Δy bias ). This deviation can depend on the particular sample characteristics being measured. In such a case, in determining the lateral distance, the sample is measured relative to the instrument in an azimuthal direction θ 0 and the sample is measured in the azimuthal direction θ 180 relative to the instrument, where θ 180 is offset 180 relative to θ 0 . °, can reduce the systematic error by combining these two measurements. As shown in Figures 17A and 17B, this corresponds to a relative azimuthal rotation of 180° between the sample coordinates (x sample , y sample ) and the instrument coordinates (x instr , y instr ). This relative azimuthal orientation can be achieved by sample clamping or by aligning the salient features of the component itself. For example, the sample support can include a rotary table and a ruler that can be manually or automatically rotated about the optical axis of the optical instrument in the desired number.

參照圖18,流程圖1800繪示利用樣本旋轉的一例示性方法。此過程結合了相對於儀器的四個不同取向的透鏡進行的測定序列: Referring to Figure 18, a flow chart 1800 illustrates an exemplary method of utilizing sample rotation. This process combines the sequence of measurements with respect to the four differently oriented lenses of the instrument:

- 位在方位取向θ0,上表面面對儀器 - Position in orientation orientation θ 0 , upper surface facing instrument

- 位在方位取向θ180,上表面面對儀器 - Position in orientation orientation θ 180 , upper surface facing instrument

- 位在方位取向θ0,下表面面對儀器 - Position in orientation orientation θ 0 , lower surface facing instrument

- 位在方位取向θ180,下表面面對儀器 - Position in orientation orientation θ 180 , lower surface facing instrument

具體步驟如下。首先,將透鏡定位成其上表面面對光學儀器且位在方位角方向θ0(步驟1805)。在此取向中,系統執行連續的高度與強度分佈量測,並計算的值(步驟1810)。 Specific steps are as follows. First, the lens is positioned such that its upper surface faces the optical instrument and is in the azimuthal direction θ 0 (step 1805). In this orientation, the system performs continuous height and intensity distribution measurements and calculates versus The value of (step 1810).

對於下一個量測序列,透鏡定位成其上表面面對光學儀器且位在方位角方向θ180(步驟1815)。在此取向中,系統執行連續的高度和強度分佈量測,並計算的值(步驟1820)。 For the next measurement sequence, the lens is positioned with its upper surface facing the optical instrument and positioned in the azimuthal direction θ 180 (step 1815). In this orientation, the system performs continuous height and intensity distribution measurements and calculates versus The value of (step 1820).

對於隨後的量測序列,透鏡定位成其下表面面對 光學儀器且位在方位角方向θ0(步驟1825)。在此取向中,系統執行連續的高度和強度分佈量測,並計算的值(步驟1830)。 For subsequent measurement sequences, the lens is positioned with its lower surface facing the optical instrument and positioned in the azimuthal direction θ 0 (step 1825). In this orientation, the system performs continuous height and intensity distribution measurements and calculates The value of (step 1830).

對於最終的量測序列,透鏡定位成其下表面面對光學儀器且位在方位角方向θ180(步驟1835)。在此取向中,系統執行連續的高度和強度分佈量測,並計算的值(步驟1840)。其中,在這些相對取向作出的量測的順序不重要,可由方便性決定。 For the final measurement sequence, the lens is positioned such that its lower surface faces the optical instrument and is in the azimuthal direction θ 180 (step 1835). In this orientation, the system performs continuous height and intensity distribution measurements and calculates The value of (step 1840). Among them, the order of measurement made in these relative orientations is not important and can be determined by convenience.

所計算的值接著用來計算在每個方向的構成值的間頂點的橫向距離(步驟1845)。最後,使用這些構成值,系統計算間頂點的橫向距離(步驟1850)與最終頂點到特徵的橫向距離(步驟1855)。 The calculated value is then used to calculate in each direction versus The lateral distance between the vertices of the constituent values (step 1845). Finally, using these constituent values, the system calculates the lateral distance between the vertices (Step 1850) and the lateral distance from the final vertex to the feature versus (Step 1855).

最後報告的橫向距離XY final 藉由組合在θ0與θ180量測的相應的橫向距離計算,分別為XY 0XY 180XY final =f Combine (XY 0 ,XY 180) (29) The final reported lateral distance XY final is calculated by combining the corresponding lateral distances measured at θ 0 and θ 180 , respectively XY 0 and XY 180 : XY final = f Combine ( XY 0 , XY 180 ) (29)

前述方程式可以應用於關注的橫向距離,包括那些先前討論的,如間特徵的橫向距離XYFeature、頂點到特徵的橫向距離XYUAF與XYLAF以及間頂點的橫向距離XYApex。如果橫向距離的構成的量測都在參考的樣本框中,也就是說,相對於樣品座標(xsample,ysample),在一些情況下,組合功能可以簡單為構成量測值的算術平均值。二選一地,或額外地,在一個單一的步驟,一些操作可以映射工具參考框的結果到樣品參考框。可能其他的操作可說明先前決定的殘存工具偏差。 The foregoing equations can be applied to the lateral distances of interest, including those previously discussed, such as the lateral distance XY Feature of the feature , the vertex-to-feature lateral distances XY UAF and XY LAF, and the lateral distance XY Apex between the vertices. If the measurement of the lateral distance is in the reference sample frame, that is, relative to the sample coordinates (x sample , y sample ), in some cases, the combined function can simply be the arithmetic mean of the measured values. . Alternatively, or in addition, in a single step, some operations can map the results of the tool reference frame to the sample reference frame. It is possible that other operations may account for previously determined residual tool deviations.

如前所述,量測誤差的另一種潛在的來源是在樣 品中的材料的雙折射性。在某些情況下,使用多種偏光狀態(例如,使用偏振器與/或波板)的儀器獲得的量測結果,通過結合多種量測值可以減少量測誤差。這可進一步與相對於儀器的樣品的相對方位取向的變化組合。 As mentioned earlier, another potential source of measurement error is The birefringence of the material in the product. In some cases, measurements obtained using instruments with multiple polarized states (eg, using polarizers and/or wave plates) can reduce measurement errors by combining multiple measurements. This can be further combined with a change in the relative azimuthal orientation of the sample relative to the instrument.

以上所述的裝置和方法允許評價在生產過程中的透明樣品,特別是包括透鏡(含彎曲的有效表面區域以及作為代用品的平面平行區域),以決定樣品的尺寸與光學特性。透明的樣品包括鏡片,如模造鏡片,其是多透鏡的透鏡組件的一部分,透鏡組件例如是數碼相機的一部分。這種透鏡組件被廣泛用於移動設備中的照相機,諸如手機,智慧手機,和平板電腦,在其他例子中。 The apparatus and method described above allow for the evaluation of transparent samples during production, particularly including lenses (including curved effective surface areas and planar parallel areas as substitutes) to determine the size and optical properties of the sample. Transparent samples include lenses, such as molded lenses, which are part of a multi-lens lens assembly, such as a portion of a digital camera. Such lens assemblies are widely used in cameras in mobile devices, such as cell phones, smart phones, and tablets, among other examples.

在一些實施例中,上述方法可以應用於測定製造透鏡用的模具。例如,參考圖19,被測樣品可以是半個透鏡模具1900。此模具包括曲面1921,對應於利用模具所形成的透鏡的有效區。曲面1921具有頂點1923。模具還包括平面部分,平面部分由第一內平面1916與第二外平面1912組成。平面被階梯1914分離。在描述模具1900的量測時,階梯1914的外邊緣1914o可做為關注特徵。藉由沿著儀器201的z軸量測的高度HA,外平面1912與頂點1923被偏移。模具1900藉由獲得高度輪廓與強度分布進行特性分析,舉例而言,來自表面1921(經由光SA)與外平面1912(光SF)的高度輪廓與強度分布。例如關於頂點位置與頂點到關注特徵邊緣的橫向偏移的訊息可由前述透鏡900的說明決定。 In some embodiments, the above method can be applied to the determination of a mold for making a lens. For example, referring to FIG. 19, the sample to be tested may be a half lens mold 1900. This mold includes a curved surface 1921 corresponding to the effective area of the lens formed using the mold. Surface 1921 has a vertex 1923. The mold also includes a planar portion that is comprised of a first inner plane 1916 and a second outer plane 1912. The plane is separated by a step 1914. In describing the measurement of the mold 1900, the outer edge 1914o of the step 1914 can serve as a feature of interest. The outer plane 1912 is offset from the apex 1923 by the height H A measured along the z-axis of the instrument 201. Mold 1900 performs characterization by obtaining a high profile and intensity distribution, for example, a height profile and intensity distribution from surface 1921 (via light S A ) and outer plane 1912 (light S F ). For example, the message regarding the vertex position and the lateral offset of the vertex to the edge of the feature of interest can be determined by the description of the aforementioned lens 900.

在圖20A與圖20B中的流程圖繪示出了所述技術 的可能應用。圖20A中的流程圖2000繪示透鏡的特性分析技巧,使用如上所述的厚度與雙折射率的量測(步驟2010)。在步驟2020中,基於這些量測,系統將得出厚度、平行度、平均折射率、折射率梯度以及雙折射等的值。這些值下一步與這些參數的預定規格相比(步驟2030)。 The technique is illustrated in the flowcharts in Figures 20A and 20B Possible application. Flowchart 2000 in Figure 20A illustrates the characteristic analysis technique of the lens using the thickness and birefringence measurements as described above (step 2010). In step 2020, based on these measurements, the system will derive values for thickness, parallelism, average refractive index, refractive index gradient, and birefringence. These values are next compared to the predetermined specifications of these parameters (step 2030).

對於那些不符合規格的透鏡,透鏡被拒收(步驟2040),且系統得出相應的成形處超出製程控制目標以外(步驟2050)。對於那些符合規格的透鏡,透鏡被分類成厚度會(步驟2060)且相應的成形處被報告為在製程控制目標之內(步驟2070)。 For those lenses that do not meet specifications, the lens is rejected (step 2040) and the system concludes that the corresponding forming location is outside of the process control target (step 2050). For those lenses that meet the specifications, the lens is classified as thickness (step 2060) and the corresponding formed portion is reported to be within the process control target (step 2070).

圖20B中的流程圖2001繪示透鏡特性分析技術,使用頂點到特徵的高度、頂點厚度、間頂點橫向距離以及間特徵橫向距離等的量測。在此,在第一步驟2011中,如上所述說明的量測從高度和強度數據得到對透鏡的各種特徵的位置。在步驟2021中,基於這些量測,系統將得出頂點到特徵高度、頂點厚度,間頂點橫向距離以及間特徵的橫向距離等的值。這些值接著與這些參數的預定規格相比(步驟2031)。 Flowchart 2001 in Figure 20B illustrates lens characterization techniques using measurements of vertex-to-feature height, vertex thickness, inter-vertex lateral distance, and inter-feature lateral distance. Here, in a first step 2011, the measurements as described above derive the position of the various features of the lens from the height and intensity data. In step 2021, based on these measurements, the system will derive values from vertex to feature height, vertex thickness, lateral apex lateral distance, and lateral distance between features. These values are then compared to the predetermined specifications of these parameters (step 2031).

對於那些不符合規格的透鏡,鏡片被拒收(步驟2041),且系統得出相應的成形處作為超出製程控制目標以外(步驟2051)。對於那些符合規格的透鏡,鏡片被分類成厚度倉(步驟2061)且相應的成形處被報告為在製程控制目標之內(步驟2071)。 For those lenses that do not meet the specifications, the lens is rejected (step 2041) and the system derives the corresponding forming location beyond the process control target (step 2051). For those lenses that meet the specifications, the lenses are classified into thickness bins (step 2061) and the corresponding forming locations are reported to be within the process control target (step 2071).

量測技術也可以用來對用於製造透鏡的模造工藝特性分析。在圖21A和圖21B中的流程圖繪示對模造工藝特 性分析的實施例。 Measurement techniques can also be used to analyze the characteristics of the molding process used to make the lens. The flow chart in FIG. 21A and FIG. 21B shows the molding process. An example of sexual analysis.

在圖21A中的流程圖2100繪示的過程,第一步驟2110是量測透鏡的非作用部分的厚度和雙折射性。根據這些量測結果,系統分析透鏡的厚度、平行度、平均折射率、折射率梯度以及雙折射性等(步驟2120)。基於這種分析,模具的兩半的相對位置被調整,以滿足厚度與平行度規格(步驟2130)。成形工藝參數(例如,溫度和升溫速率、透鏡材料組成物、注射壓力)被調節,以便滿足折射率的規格(步驟2140)。 In the process illustrated by flowchart 2100 in FIG. 21A, a first step 2110 is to measure the thickness and birefringence of the inactive portion of the lens. Based on these measurements, the system analyzes the thickness, parallelism, average refractive index, refractive index gradient, and birefringence of the lens (step 2120). Based on this analysis, the relative positions of the two halves of the mold are adjusted to meet the thickness and parallelism specifications (step 2130). The forming process parameters (eg, temperature and ramp rate, lens material composition, injection pressure) are adjusted to meet the specifications of the refractive index (step 2140).

在圖21B中的流程圖2101繪示製程,第一步驟2150是量測的透鏡表面的高度輪廓以及頂點與特徵的橫向位置。根據這些量測結果,系統決定與得出頂點到特徵的高度、頂點厚度、間頂點的橫向距離以及間特徵的橫向距離(步驟2160)。基於此種分析,模具的兩半的相對位置被調整,以滿足厚度和橫向定心的規格(步驟2130)。成形工藝參數(如溫度和升溫速率、透鏡材料組成物)被調整,以滿足頂點到特徵的功能規格(步驟2140)。 Flowchart 2101 is depicted in FIG. 21B, which is a measurement of the height profile of the lens surface and the lateral position of the apex and features. Based on these measurements, the system determines and derives the vertex-to-feature height, vertex thickness, lateral distance between the vertices, and the lateral distance of the features (step 2160). Based on this analysis, the relative positions of the two halves of the mold are adjusted to meet the thickness and lateral centering specifications (step 2130). Forming process parameters (such as temperature and ramp rate, lens material composition) are adjusted to meet the vertex-to-feature functional specifications (step 2140).

雖然上述流程圖繪示雙折射與厚度量測以及頂點與特徵的量測是分開的程序,在一些實施例中,這兩組量測可以結合,舉例而言,以改良透鏡的特性分析與/或透鏡成形。 Although the above flow chart illustrates the separation of birefringence and thickness measurements and the measurement of vertices and features, in some embodiments, the two sets of measurements can be combined, for example, to improve the characteristics of the lens and/or Or lens shaping.

雖然已說明某些實施例,但其他實施例也是可能的。例如,雖然透鏡200與透鏡900均為凹凸透鏡,更一般地說,其他類型的透鏡也可以使用揭露的技術進行特性分析。舉例而言,如凸凸透鏡、凹凹透鏡、平凸透鏡以及平凹透鏡等。透鏡表面可為非球面的。在一些實施例中,透鏡的表面可以包 括拐點(points of inflection),其中,表面的凹部改變。此種表面的一個例子是圖1中所示的表面132。 While certain embodiments have been described, other embodiments are possible. For example, although lens 200 and lens 900 are both meniscus lenses, more generally, other types of lenses can also be characterized using the disclosed techniques. For example, convex convex lenses, concave concave lenses, plano-convex lenses, and plano-concave lenses. The lens surface can be aspherical. In some embodiments, the surface of the lens can be packaged A points of inflection, in which the concave portion of the surface changes. An example of such a surface is the surface 132 shown in FIG.

此外,除了上述說明的那些以外,也可使用多種對齊特徵。例如,雖然在透鏡200與900的平表面是環形表面,但其他幾何形狀也是可能的。離散的特徵,如在表面上有升起部分、下陷或在表面上簡單地標記,可以用作在上述的量測時的特徵。 In addition, a variety of alignment features can be used in addition to those described above. For example, while the planar surfaces of lenses 200 and 900 are annular surfaces, other geometries are possible. Discrete features, such as raised portions on the surface, sags, or simply marked on the surface, can be used as features in the above-described measurements.

儘管本說明書一般集中於光學部件的量測,一個相關種類應用是用於製造射出成形透鏡的模具的量測。在這種情況下,一個模具表現出所有出現在透鏡上的特徵,即,特徵是一個有效的光學表面以及一個或多個位置、中心定位或對位基準。對於透鏡的一側,所說明的量測步驟容易施加。例如,相對於機械基準,儀器是用來量測光學表面的頂點的中心定位與高度。其它量測步驟包括外基準面之間的階梯的特性分析,以及陡峭的錐形中心定位基準面的角度。 While the present specification generally focuses on the measurement of optical components, a related category of applications is the measurement of the mold used to make the injection molded lens. In this case, a mold exhibits all of the features present on the lens, i.e., the feature is an effective optical surface and one or more position, center or alignment references. For the side of the lens, the illustrated measurement steps are easy to apply. For example, the instrument is used to measure the center position and height of the apex of the optical surface relative to the mechanical reference. Other measurement steps include characterization of the steps between the outer datums and the angle of the steep conical centering datum.

在某些實施例中,例如當被測部件比光學儀器的視野大時,部件的不同區域的量測可以被拼接在一起,以提供整個部件的量測。拼接量測的例示性技巧揭露在J.Roth和P.de Groot的“粗糙表面的寬場掃描白光干涉,”Proc.ASPE春季專題會議,表面量測進展,57-60(1997)。 In some embodiments, such as when the component under test is larger than the field of view of the optical instrument, measurements of different regions of the component can be stitched together to provide measurement of the entire component. An exemplary technique for splicing measurements is disclosed in J. Roth and P. de Groot, "Wide Field Scanning White Light Interference on Rough Surfaces," Proc. ASPE Spring Conference, Surface Measurement Progress, 57-60 (1997).

在一些實施例中,附加的校正可被應用,以提高量測精確度。例如,可施加表面的反射特性上的相變化的校正。見,例如,在P.de Groot,J.Biegen,J.Clark,X.Colonna de Lega以及D.Grigg的“量測工業零件的幾何尺寸的光學干 涉”,應用光學41(19),3853-3860(2002)。 In some embodiments, additional corrections can be applied to improve measurement accuracy. For example, a correction of the phase change in the reflective properties of the surface can be applied. See, for example, P. de Groot, J. Biegen, J. Clark, X. Colonna de Lega, and D. Grigg, "Measurement of the optical dimensions of industrial parts. Involved in, Applied Optics 41 (19), 3853-3860 (2002).

在某些實施例中,部件可以從多於一個視角量測,或從兩側量測。見,例如,在P.de Groot,J.Biegen,J.Clark,X.Colonna de Lega以及D.Grigg的“量測工業零件的幾何尺寸的光學干涉”,應用光學41(19),3853-3860(2002)。 In some embodiments, the component can be measured from more than one viewing angle, or measured from both sides. See, for example, P. de Groot, J. Biegen, J. Clark, X. Colonna de Lega, and D. Grigg, "Optical Interference in Measuring Geometrical Dimensions of Industrial Parts," Applied Optics 41 (19), 3853- 3860 (2002).

量測的結果可與其它的量測進行組合,例如,包括對非球面形式的探針量測,如揭露在,例如P.Scott的“藉由接觸探針儀器在非球面量測的近期發展”,4927,199-207(2002)。 The results of the measurements can be combined with other measurements, for example, including probe measurements in the form of aspheric surfaces, as disclosed, for example, in P. Scott's "Recent Development of Aspheric Measurement by Contact Probe Instruments" ", 4927, 199-207 (2002).

可應用各種數據處理方法。例如,可使用適於量測多個表面的方法(使用同調掃描干涉儀)。見,如P.J.de Groot與X.CXolonna de Lega的“藉由干涉顯微鏡的透明膜剖析與分析”,Proc.SPIE 7064,706401-1 706401-6(2008)。 Various data processing methods can be applied. For example, a method suitable for measuring a plurality of surfaces (using a homology scanning interferometer) can be used. See, for example, P.J. de Groot and X. CXolonna de Lega, "Analysis and Analysis of Transparent Membranes by Interference Microscopy", Proc. SPIE 7064, 706401-1 706401-6 (2008).

依據在此說明的方法和附圖,與上述的量測和分析相關的計算可以在電腦程式中使用的標準編程技術實現。程式碼被應用於輸入數據,以執行在此所述的功能與產生輸出訊息。輸出訊息可應用於一個或多個輸出設備,諸如顯示器。每個程式可以在高級程序或物件導向程式語言中實行,以和電腦系統進行通信。然而,如果需要的話,程式可以組合語言或機械語言來實行。在任何情況下,語言可以編譯語言或翻譯語言。此外,為此目的,程式可以在預編程的專用集成電路上運行。 In accordance with the methods and figures illustrated herein, the calculations associated with the above described measurements and analysis can be implemented in standard programming techniques used in computer programs. The code is applied to the input data to perform the functions described herein and to generate an output message. The output message can be applied to one or more output devices, such as a display. Each program can be implemented in a high-level program or object-oriented programming language to communicate with a computer system. However, the program can be implemented in a combination of language or mechanical language, if desired. In any case, the language can compile a language or a translation language. In addition, the program can be run on a pre-programmed application specific integrated circuit for this purpose.

每個此種電腦程式最佳儲存在儲存媒體或裝置上(例如,ROM、光碟或磁碟),其可被通用或專用的可編程電 腦讀取,當儲存媒體或裝置由電腦讀取以執行在此描述的程序,用於配置和操作該電腦。電腦程式也可在程式執行期間駐留在快取記憶體或主記憶體中。校正方法也可被實現,至少部分地,作為電腦可讀的儲存媒體,配置有電腦程式,其中,如此配置的儲存媒體使電腦以特定和既定方式操作以執行在此描述的功能。 Each such computer program is optimally stored on a storage medium or device (eg, ROM, CD or disk), which can be used by general purpose or dedicated programmable Brain reading, when the storage medium or device is read by a computer to perform the procedures described herein for configuring and operating the computer. The computer program can also reside in the cache or main memory during program execution. The correction method can also be implemented, at least in part, as a computer readable storage medium, configured with a computer program, wherein the storage medium so configured causes the computer to operate in a particular and predetermined manner to perform the functions described herein.

其他實施例位在下列的申請專利範圍。 Other embodiments are within the scope of the following patent application.

200‧‧‧透鏡 200‧‧‧ lens

201‧‧‧光學量測儀器 201‧‧‧Optical measuring instruments

210‧‧‧平面平行部分 210‧‧‧ Planar parallel

211‧‧‧表面 211‧‧‧ surface

212‧‧‧表面 212‧‧‧ surface

220‧‧‧透鏡部分 220‧‧‧ lens part

221‧‧‧表面 221‧‧‧ surface

222‧‧‧表面 222‧‧‧ surface

T‧‧‧厚度 T‧‧‧ thickness

Claims (35)

一種決定關於一透明光學元件的訊息的方法,該透明光學元件包含一透鏡部分與一平面平行部分,該透鏡部分包含至少一曲面,該平面平行部分包含相對的一第一與一第二表面,該方法包含:將量測光導向該透明光學元件;偵測來自於該平面平行部分的該第一表面上的至少一位置的反射的量測光;在對應於該第一表面上的該至少一位置的一位置,偵測來自於該平面平行部分的該第二表面的反射的量測光;基於該偵測光,決定關於該平面平行部分的訊息;以及基於關於該平面平行部分的訊息,評估該透明光學元件。 A method of determining a message about a transparent optical element, the transparent optical element comprising a lens portion and a planar parallel portion, the lens portion comprising at least one curved surface, the planar parallel portion comprising an opposite first and a second surface, The method includes: directing the measured light to the transparent optical element; detecting reflected light from at least one location on the first surface of the planar parallel portion; the at least corresponding to the first surface a position of a position detecting a reflected light from the second surface of the parallel portion of the plane; determining a message about the parallel portion of the plane based on the detected light; and based on the information about the parallel portion of the plane The transparent optical element was evaluated. 如申請專利範圍第1項的方法,其中該平面平行部分的該第一與該第二表面的該表面量測以一同調掃描干涉儀進行。 The method of claim 1, wherein the surface measurement of the first and second surfaces of the planar parallel portion is performed by a coherent scanning interferometer. 如申請專利範圍第1項的方法,其中該平面平行部分的該第一與該第二表面的該表面量測以一共焦顯微鏡進行。 The method of claim 1, wherein the surface measurement of the first and second surfaces of the planar parallel portion is performed by a confocal microscope. 如申請專利範圍第1項的方法,其中關於該平面平行部分的該訊息包含:該平面平行部分的該第一表面的一高度輪廓以及該平面平行部分的該第二表面的一高度輪廓。 The method of claim 1, wherein the message regarding the parallel portion of the plane comprises: a height profile of the first surface of the parallel portion of the plane and a height profile of the second surface of the parallel portion of the plane. 如申請專利範圍第1項的方法,其中關於該平面平行部分的該訊息包含:該平面平行部分的一物理厚度輪廓或一光學厚度輪廓。 The method of claim 1, wherein the message regarding the parallel portion of the plane comprises: a physical thickness profile or an optical thickness profile of the parallel portion of the plane. 如申請專利範圍第1項的方法,其中關於該平面平行部分 的該訊息包含:關於形成該透明光學元件的一材料的一折射率的訊息。 The method of claim 1, wherein the parallel portion of the plane The message includes information about a refractive index of a material forming the transparent optical component. 如申請專利範圍第6項的方法,其中關於該折射率的該訊息包含:該材料的一群折射率。 The method of claim 6, wherein the message regarding the refractive index comprises: a refractive index of the material. 如申請專利範圍第6項的方法,其中關於該折射率的該訊息包含:該材料的一相折射率。 The method of claim 6, wherein the message regarding the refractive index comprises: a phase refractive index of the material. 如申請專利範圍第6項的方法,其中關於該折射率的該訊息包含:關於在平面平行部分的不同位置之間的一折射率變化的訊息。 The method of claim 6, wherein the message regarding the refractive index comprises: a message relating to a change in refractive index between different positions of the parallel portions of the plane. 如申請專利範圍第6項的方法,其中關於該折射率的該訊息包含:關於形成該透明材料的該材料的雙折射性的訊息。 The method of claim 6, wherein the message regarding the refractive index comprises: a message regarding the birefringence of the material forming the transparent material. 如申請專利範圍第1項的方法,更包含:偵測來自於一夾具上的一參考特徵的反射的量測光,該夾具支撐該透明光學元件,以及基於來自於該參考特徵的該偵測光,決定關於該參考特徵的訊息。 The method of claim 1, further comprising: detecting the reflected light from a reference feature on a fixture, the fixture supporting the transparent optical component, and based on the detection from the reference feature Light, decides the message about the reference feature. 如申請專利範圍第11項的方法,其中來自於該參考特徵的反射的量測光在相應於該平面平行部分的該第一表面的該至少一位置的一位置被反射。 The method of claim 11, wherein the reflected light from the reference feature is reflected at a location corresponding to the at least one location of the first surface of the planar parallel portion. 如申請專利範圍第12項的方法,其中該量測光在被該參考特徵反射之前與之後,藉由該透明光學元件被傳送。 The method of claim 12, wherein the metering light is transmitted by the transparent optical element before and after being reflected by the reference feature. 如申請專利範圍第12項的方法,其中該透明光學元件不位於從該參考特徵反射的量測光的光徑上。 The method of claim 12, wherein the transparent optical element is not located on the optical path of the measured light reflected from the reference feature. 如申請專利範圍第12項的方法,更包含:在不同於相應於該平面平行部分的該第一表面的該至少一位置的一位置的 一第二位置,偵測來自於該夾具的反射的量測光。 The method of claim 12, further comprising: at a position different from the at least one position of the first surface corresponding to the parallel portion of the plane A second position detects the reflected light from the fixture. 如申請專利範圍第1項的方法,其中該量測光以一第一偏振被偵測,以及在之後,量測光以不同於該第一偏振的一第二偏振被偵測。 The method of claim 1, wherein the metering is detected with a first polarization, and thereafter, the measuring light is detected with a second polarization different from the first polarization. 如申請專利範圍第1項的方法,其中評估該透明光學元件包含:基於關於該平面平行部分的該訊息,推斷關於該透鏡部分的尺寸或光學性質的訊息。 The method of claim 1, wherein evaluating the transparent optical element comprises inferring a message regarding the size or optical properties of the lens portion based on the information about the parallel portion of the plane. 如申請專利範圍第1項的方法,其中該平面平行部分是該透明光學元件的一傾斜控制連鎖(interlock)。 The method of claim 1, wherein the planar parallel portion is an oblique control interlock of the transparent optical element. 如申請專利範圍第1項的方法,其中該透鏡部分的該至少一曲面是一非球面表面。 The method of claim 1, wherein the at least one curved surface of the lens portion is an aspherical surface. 如申請專利範圍第1項的方法,其中該透鏡部分包含:彼此相對的一第一曲面及一第二曲面。 The method of claim 1, wherein the lens portion comprises: a first curved surface and a second curved surface opposite to each other. 如申請專利範圍第1項的方法,其中關於該透鏡部分的該訊息包含:關於形成該透鏡部分的一材料的雙折射性的訊息。 The method of claim 1, wherein the message regarding the lens portion comprises: a birefringence message about a material forming the lens portion. 如申請專利範圍第1項的方法,其中關於該透鏡部分的該訊息包含:關於形成該透鏡部分的一材料的一折射率變化的訊息。 The method of claim 1, wherein the message regarding the lens portion comprises: a message relating to a change in refractive index of a material forming the lens portion. 如申請專利範圍第1項的方法,其中評估該透明光學元件包含:基於關於該平面平行部分的該訊息,決定該透明光學元件是否符合一規格。 The method of claim 1, wherein the evaluating the transparent optical component comprises determining whether the transparent optical component conforms to a specification based on the information about the parallel portion of the plane. 如申請專利範圍第1項的方法,其中該平面平行部分位於該透鏡部分的圓周附近。 The method of claim 1, wherein the planar parallel portion is located near a circumference of the lens portion. 一種形成光學組件的方法,包含:使用申請專利範圍第1項的方法,決定關於該透明光學元件的訊息,其中該透明光學元件是一透鏡;以及相對於在鏡筒中一個或多個其他透鏡,固定該鏡片,以形成該光學組件。 A method of forming an optical component, comprising: determining a message about the transparent optical component using the method of claim 1 wherein the transparent optical component is a lens; and relative to one or more other lenses in the lens barrel, The lens is fixed to form the optical component. 如申請專利範圍第25項的方法,更包含:相對於一感測器,固定該光學組件以提供一數位相機的一模組。 The method of claim 25, further comprising: fixing the optical component relative to a sensor to provide a module of a digital camera. 一種系統,用以決定關於一透明光學元件的訊息,該透明光學元件包含一透鏡部分與一平面平行部分,該透鏡部分包含至少一曲面且該平面平行部分包含相對的第一與第二表面,該系統包含:一夾具,用以支撐該透明光學元件;一光學儀器,包含一光源、一偵測器以及多個光學元件,當該透明光學元件被該夾具支撐時,該些光學元件被排列以將來自於該光源的光導至該透明光學元件,且將來自於該透明光學元件的反射的光導至該偵測器;以及一電子控制器,與該偵測器通訊,基於來自於該平面平行部分的該第一與該第二表面的相應位置的偵測的光,該電子控制器被程式化以決定關於該平面平行部分的訊息。 a system for determining a message about a transparent optical element, the transparent optical element comprising a lens portion and a planar parallel portion, the lens portion comprising at least one curved surface and the planar parallel portion comprising opposing first and second surfaces, The system comprises: a fixture for supporting the transparent optical component; an optical instrument comprising a light source, a detector and a plurality of optical components, the optical components being arranged when the transparent optical component is supported by the clamp Directing light from the light source to the transparent optical element and directing reflected light from the transparent optical element to the detector; and an electronic controller communicating with the detector based on the plane from The detected light of the first portion of the parallel portion and the corresponding position of the second surface, the electronic controller is programmed to determine a message about the parallel portion of the plane. 如申請專利範圍第27項的系統,其中該光學儀器是一光學掠面表面形貌儀。 A system as claimed in claim 27, wherein the optical instrument is an optical swept surface topographer. 如申請專利範圍第28項的系統,其中該光學掠面表面形貌儀是一同調掃描干涉儀。 The system of claim 28, wherein the optical surface profiler is a coherent scanning interferometer. 如申請專利範圍第28項的系統,其中該光學掠面表面形貌 儀是一共焦顯微鏡。 Such as the system of claim 28, wherein the optical surface morphology The instrument is a confocal microscope. 如申請專利範圍第27項的系統,其中該夾具包含:位於來自於該光學儀器的該光的光徑上的一參考特徵。 A system of claim 27, wherein the fixture comprises: a reference feature located on an optical path of the light from the optical instrument. 如申請專利範圍第31項的系統,其中該參考特徵是一平的反射器。 The system of claim 31, wherein the reference feature is a flat reflector. 如申請專利範圍第31項的系統,其中該夾具包含:一台座,其定位該透明光學元件離該參考特徵一距離。 The system of claim 31, wherein the fixture comprises: a pedestal positioned to position the transparent optical element a distance from the reference feature. 如申請專利範圍第27項的系統,其中該光學儀器包含:一偏振膜組,裝配為偏振來自於該光源的光。 The system of claim 27, wherein the optical instrument comprises: a polarizing film set assembled to polarize light from the light source. 如申請專利範圍第34項的系統,其中該偏振膜組被裝配為在正交偏振狀態選擇性偏振來自於該光源的光。 A system of claim 34, wherein the set of polarizing films is configured to selectively polarize light from the source in an orthogonal polarization state.
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