TWI564766B - Mesh electrode, sensing device, and electrode layer - Google Patents

Description

Mesh electrode, sensing element and electrode layer

The present invention relates to an electrode and an element, and more particularly to a mesh electrode, an electrode layer, and a sensing element.

The development of display technology has been oriented towards a more human-machine interface. With the rise of flat-panel displays, touch panels have become mainstream, which can replace the input devices of keyboards, mice, etc., making various information equipment products in use. much easier. Therefore, the era of easy-to-operate touch panels is coming soon, and it is widely used in applications such as automotive touch panels (car navigation), game consoles, and public information systems (such as vending machines, automatic teller machines (ATM)). , navigation system, etc.), industrial use, small electronic products (such as personal digital assistant (PDA)), e-books, etc.

Due to the increasing demand for smart phones, such as the explosive development of projected capacitive touch sensing components, more and more touch manufacturers are investing in the development and production of multi-touch technology.

One embodiment of the present invention provides a mesh electrode having a cross section having at least one curved portion.

Another embodiment of the invention provides a sensing element comprising a mesh electrode.

Yet another embodiment of the present invention provides an electrode layer comprising a strip electrode having at least one curved portion in cross section.

The mesh electrode of one embodiment of the present invention is formed of a plurality of ruled lines that are crossed and connected to each other. Each of the ruled lines has a bottom surface and a cross section, the cross section being perpendicular to the bottom surface and having at least one curved portion.

A sensing element in accordance with an embodiment of the invention includes a first substrate and a first sensing layer. The first sensing layer is disposed on the first substrate, and includes a plurality of first grid cells, wherein the plurality of first grid cells are formed by a plurality of grid lines intersecting and connected to each other, wherein each grid line has a bottom surface and a cross section The cross section is perpendicular to the bottom surface and has at least one bend.

An electrode layer according to an embodiment of the present invention includes a plurality of strip electrodes. At least one of a line width and a line pitch of the plurality of strip electrodes has at least three variations, and the ratios of the various line widths in the electrode layer are substantially the same, and the ratios of the various line lines in the electrode layer are substantially the same, each strip The electrode has a bottom surface and a cross section, the cross section being perpendicular to the bottom surface and having at least one curved portion.

In order to make the invention more apparent, the following detailed description of the embodiments and the accompanying drawings are set forth below.

100, 200, 300, 400, 500, 600, 700‧‧‧ sensing components

110, S‧‧‧ substrate

110A‧‧‧First substrate

110B‧‧‧second substrate

120‧‧‧Sensor layer

122‧‧‧Touch components

122A, 222A‧‧‧ first electrode

122B, 222B‧‧‧ second electrode

124, 224A, 224B, 322, 322A, 322B, 324, 324A, 324B‧‧‧ wires

126‧‧‧ pseudoelectrode

126A, 226A‧‧‧ first pseudo electrode

126B, 226B‧‧‧ second pseudo electrode

126C‧‧‧ third pseudo electrode

220A‧‧‧First sensing layer

220B‧‧‧Second Sensing Layer

320‧‧‧electrode layer

320A‧‧‧First electrode layer

320B‧‧‧Second electrode layer

A1‧‧‧active area

A2‧‧‧ surrounding area

AD‧‧‧Adhesive layer

AD1‧‧‧ first adhesive layer

AD2‧‧‧Second Adhesive Layer

BM‧‧‧decorative layer

C‧‧‧Bend

C1, E1A‧‧‧ first connection

C2, E2A‧‧‧ second connection

CL‧‧‧ cover

D1‧‧‧ first direction

D2‧‧‧ second direction

E1B‧‧‧First Extension

E2B‧‧‧Second Extension

EP1‧‧‧ first electrode pad

EP2‧‧‧Second electrode pad

G‧‧‧ gap

H‧‧‧thickness

I‧‧‧ intersection

IN‧‧‧Insulation

L _a , L _b , L _x , L _y , L _x1 , L _x2 , L _x3 , L _x4 , L _y1 , L _y2 , L _y3 , L _y4 , LW1 , LW2 , LW3‧‧‧ line width

LS, LS _x , LS _y ‧ ‧ grid

ME‧‧‧ mesh electrode

MU‧‧‧ grid unit

MU1‧‧‧ first grid unit

MU2‧‧‧Second grid unit

MU3‧‧‧ third grid unit

O‧‧‧ openings

P1, P2, P3, S _a , S _b , S _c , S _x , S _x1 , S _x2 , S _x3 , S _x4 , S _y , S _y1 , S _y2 , S _y3 , S _y4 ‧‧ ‧ line spacing

RF‧‧‧ reference plane

S1, S2‧‧‧ outer surface

T‧‧‧ tangent

W126A‧‧‧Width

X‧‧‧ junction

θ, θ1, θ2‧‧‧ angle

1A is a partial schematic view of a mesh electrode in accordance with an embodiment of the present invention.

1B to 1D are three schematic cross-sectional views taken along line A-A' of Fig. 1A, respectively.

2A-2K are partial schematic views of a mesh electrode, respectively, in accordance with an embodiment of the present invention.

3A is a schematic cross-sectional view of a sensing element in accordance with an embodiment of the present invention.

3B is a partial top plan view of the sensing layer of FIG. 3A.

Fig. 3C is an enlarged schematic view of a region A of Fig. 3B.

FIG. 3D is another embodiment of the grid unit of FIG. 3C.

4 is another partial top plan view of the sensing layer of FIG. 3A.

5 is a cross-sectional view of another sensing element in accordance with an embodiment of the present invention.

6A is a schematic cross-sectional view of a sensing element in accordance with an embodiment of the present invention.

FIG. 6B is a top view of the first sensing layer of FIG. 6A.

6C is a top plan view of the second sensing layer of FIG. 6A.

6D is a top plan view of a sensing element in accordance with an embodiment of the present invention.

7 to 10 are schematic cross-sectional views of other sensing elements, respectively, in accordance with an embodiment of the present invention.

11A is a schematic view of an electrode layer in accordance with an embodiment of the present invention.

Fig. 11B is a schematic cross-sectional view taken along line B-B' of Fig. 11A.

Figure 12 is a top plan view of a sensing element in accordance with an embodiment of the present invention.

1A is a partial schematic view of a mesh electrode according to an embodiment of the present invention, and FIGS. 1B to 1D are respectively three cross-sectional views along a line A-A' of FIG. 1A. Referring to FIGS. 1A to 1D, the mesh electrode ME is formed by a plurality of ruled lines LS _x , LS _y that are crossed and connected to each other. In the present embodiment, the ruled line LS _x extends, for example, along a first direction D1, and the ruled line LS _y extends, for example, along a second direction D2. The plurality of grid lines LS _x , LS _y may form a plurality of grid cells MU, and thus the mesh electrodes ME may include a plurality of grid cells MU. In the present embodiment, the mesh electrode ME is disposed, for example, on the substrate S. The substrate S may be a rigid substrate or a flexible substrate. The rigid substrate includes a rigid glass substrate, a sapphire substrate, a transparent ceramic substrate, or other suitable substrate. The flexible substrate includes a thin glass substrate or a polymer material flexible substrate.

As shown in FIG. 1B to FIG. 1D, each of the grid lines LS _x and LS _y has a bottom surface and a cross section, and the cross section is perpendicular to the bottom surface and has at least one curved portion C. Each of the grid lines LS _x has a cross section on a reference plane RF perpendicular to the substrate S. The cross section has at least one bend C. The shape of the curved portion C may be arcuate, and the slope of the curved portion C may be continuously changed. In addition, according to different design requirements, the process parameters or materials of the grid lines LS _x and LS _y can be appropriately adjusted to change the number and curvature radius of the curved portion C, or to change the shape and thickness H of the cross section. As seen in FIG. 1D, when the tangent line T passes through the intersection of the cross section and the substrate S, the angle θ between the substrate S and the tangent line T is an acute angle, and the angle θ is, for example, between 20 degrees and 60 degrees. Although in the present embodiment, the cross-sectional view of the ruled line LS _x is taken as an example, the ruled line LS _y may have the same cross-sectional view as the ruled line LS _x , and thus the description will not be repeated.

In the present embodiment, the formation method of the mesh electrode ME is, for example, a printing process. Since the grid lines LS _x and LS _y can be formed by using a printing process, in the cross section, the junction between the top surface and the side surface is a lead angle, or the top surface has an R value, and the angle between the side surface and the bottom surface is one. Sharp angle. In addition, the cross section of the wire formed by the yellow light process has an angle between the side surface and the bottom surface at a right angle or an obtuse angle due to over-corrosion, which is different from the foregoing features. Furthermore, under the same printing parameters (such as printing speed), the same ink material, and curing parameters (such as curing temperature), there is a positive correlation between the wire width and the wire thickness, that is, the wider the wire, the thicker the wire thickness. The narrower the wire, the thinner the wire thickness. In an embodiment, the wire width of the ruled lines LS _x , LS _y has a positive correlation with the wire thickness, for example.

The printing process has the advantages of simple steps, low machine cost and large-area manufacturing, and is in line with mass production. The printing may include Gravure off-set printing, inkjet printing, or nanoimprinting. The material of the mesh electrode ME may be a light-transmitting conductive material or a metal conductive material. The light-transmitting conductive material may be a metal oxide, a conductive/conjugated polymer, a carbon nanotube, a graphene, a terpene, a nanowire, a conductive ink or other light-transmitting conductive material. Metal oxides include, for example, indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium antimony zinc oxide, fluorine doped tin oxide, or other metal oxides. The conductive ink includes silver glue, copper glue or carbon glue. The metal conductive material may be a metal or a composite metal compound or the like. In the present embodiment, the mesh electrode ME is, for example, flexible, and the flexible radius of the mesh electrode ME may be, for example, less than R = 100 mm.

In the present embodiment, the ruled lines LS _x and LS _y have the same line widths L _x and L _y and the same line spacings S _x and S _y , but the invention is not limited thereto. For example, as shown in FIG. 2A to FIG. 2K, at least one of the line width and the line pitch of the ruled line LS may have at least three variations, for example, as described in detail below.

As shown in FIG. 2A, the grid lines LS _{x have} , for example, at least three kinds of line spacings S _x1 , S _x2 , and S _x3 , and the line spacings S _x1 , S _x2 , and S _{x3 are} randomly distributed between the grid lines LS _x , and The various line pitches S _x1 , S _x2 , and S _x3 have, for example, the same ratio in the mesh electrode ME. In detail, the ruled lines LS _x extending along the first direction D1 have different line spacings S _x1 , S _x2 , S _x3 , and the line pitches S _x1 , S _x2 , S _x3 may be randomly distributed on the ruled line LS _x between. The line widths L _x and L _y of the ruled lines LS _x and LS _y are, for example, 3 to 30 μm. L _x line width and pitch of the ruled line LS _x S _x1, S _x2, S, for example, the ratio _x3 is between 1/200 ~ 1/2. The line spacing S _y of the _ruled line LS _x , S _x1 , S _x2 , S _x3 and the ruled line LS _y may be the same or different. In the present embodiment, the fixed line spacing S _y between the ruled lines LS _y is taken as an example, but the invention is not limited thereto. For example, as shown in FIG. 2B, the ruled lines LS _y extending along the second direction D2 may have different line spacings S _y1 , S _y2 , S _y3 , and the line spacings S _y1 , S _y2 , S _Y3 may be randomly distributed between the grid lines LS _y , and the various line spacings S _y1 , S _y2 , S _y3 have the same ratio in the mesh electrode ME, for example, and the grid lines LS _x have a fixed line spacing S _x . Alternatively, as shown in FIG. 2C, the ruled lines LS _x extending along the first direction D1 and the ruled lines LS _y extending along the second direction D2 may have different line spacings S _x1 , S _x2 , S _x3 , S _y1 , S _y2 , S _y3 , and these line spacings S _x1 , S _x2 , S _x3 , S _y1 , S _y2 , S _y3 can be randomly distributed between the grid lines LS _x and LS _y , various line spacings S _x1 , S _x2 , S _x3 , S _y1 , S _y2 , and S _y3 have the same ratio in the mesh electrode ME, for example.

In the above embodiment, the ruled lines LS _x and LS _y have the same line width as an example, but the present invention is not limited thereto. In an embodiment, as shown in FIG. 2D to FIG. 2I, the ruled lines LS _x and LS _y have at least three line widths L _x , L _x1 , L _x2 , L _x3 , L _y , L _y1 , L _{y2 , for example.} , L _y3 , and grid lines LS _x , LS _y having different line widths L _x , L _x1 , L _x2 , L _x3 , L _y , L _y1 , L _y2 , L _y3 may be randomly distributed in the mesh electrode ME And for example, having the same ratio. Wherein the L _x line width of the ruled line LS _{x, L x1, L x2, L} x3 and the line width of the ruled line LS _{y L y, L y1, L y2} , L y3 may be the same or different. The line widths L _x , L _x1 , L _x2 , L _x3 , L _x4 , L _y , L _y1 , L _y2 , L _y3 , and L _{y4 are,} for example, between 3 and 30 μm. Line widths L _x , L _x1 , L _x2 , L _x3 , L _x4 , L _y , L _y1 , L _y2 , L _y3 , L _y4 and line spacing S _x , S _x1 , S of the respective grid lines LS _x and LS _y The ratio of _x2 , S _x3 , S _x4 , S _y , S _y1 , S _y2 , S _y3 , and S _y4 is, for example, _1/200 to 1/2. As can be seen from these embodiments, the line widths L _x , L _x1 , L _x2 , L _x3 , L _x4 and the line spacings S _x , S _x1 , S _x2 , S _x3 , S _{x4 of the} ruled line LS _x can have various variations and combinations. The line widths L _y , L _y1 , L _y2 , L _y3 , L _y4 and the line spacings S _y , S _y1 , S _y2 , S _y3 , S _{y4 of the ruled} line LS _y may also have various variations and combinations.

Furthermore, in the foregoing embodiments, the ruled line LS _x extends along the x-axis direction and the ruled line LS _y extends along the y-axis direction, but the invention is not limited thereto. In an embodiment, as shown in FIG. 2J and FIG. 2K, the ruled line LS _x may also have an angle θ1 from the horizontal direction, and an angle θ2 between the ruled line LS _y and the vertical direction, wherein 0° < θ1, θ2 < 90° and θ1 and θ2 may be the same or different. In addition, although the foregoing embodiment is an example in which the ruled line LS _{x is} perpendicular to the ruled line LS _y , the present invention is not limited thereto. In other embodiments, a line may be formed between the ruled line LS _x and the ruled line LS _y . Non-orthogonal or an arc angle (not shown). That is to say, the lattice pattern may be a diamond shape in addition to the rectangle illustrated in the drawing. Further, in the above-described embodiments, the grid pattern in which the respective grid cells MU are formed by the four ruled lines LS _x and LS _{y is} a quadrangular mesh pattern, but is not limited thereto.

In the above-described embodiment, the mesh electrode ME has characteristics of high light transmittance, low electrical resistance, and flexibility, and thus can be applied to elements such as display elements, sensing elements, foldable elements, and the like. Furthermore, the mesh electrodes ME having different line widths, wire thicknesses or resistance values can be produced by one printing according to different designs. That is to say, the mesh electrode ME has a simple manufacturing method.

Next, an embodiment in which the aforementioned mesh electrode is applied to a sensing element will be described.

3A is a schematic cross-sectional view of a sensing element in accordance with an embodiment of the present invention. 3B is a partial top plan view of the sensing layer of FIG. 3A. Fig. 3C is an enlarged schematic view of a region A of Fig. 3B. Referring to FIGS. 3A-3C , the sensing component 100 includes a substrate 110 and a sensing layer 120 .

The substrate 110 may be an element substrate in the display panel or a substrate disposed outside the display panel. The former is, for example, an opposite substrate of a liquid crystal display panel, a package cover of an organic light emitting diode display panel, or the like. The latter is, for example, a cover lens applied to the outside of the display panel, but is not limited thereto.

For example, the substrate 110 can be a plastic substrate, a glass substrate, a sapphire substrate, a transparent ceramic substrate, or other suitable substrate. The glass substrate may be a rigid glass substrate or a flexible thin glass substrate.

The substrate 110 has an active area A1 and a peripheral area A2. The peripheral area A2 is located on at least one side of the active area A1, and the peripheral area A2 is, for example, located in the active area A1. The opposite sides, but not limited to this. The peripheral area A2 is, for example, a bezel area that surrounds the active area A1. The active area A1 is, for example, a visible area, and the peripheral area A2 is, for example, an invisible area.

The sensing layer 120 is disposed on the substrate 110 , and the sensing layer 120 includes a plurality of touch elements 122 and a plurality of wires 124 . In this embodiment, the touch elements 122 and the wires 124 may belong to the same film layer, wherein the touch elements 122 are located in the active area A1, and the wires 124 are at least located in the peripheral area A2. Moreover, each touch element 122 is electrically connected to the plurality of wires 124.

The touch elements 122 are arranged along a first direction D1 and extend along a second direction D2, respectively. The second direction D2 intersects the first direction D1, and the second direction D2 and the first direction D1 are, for example, perpendicular to each other, but are not limited thereto.

In this embodiment, the touch elements 122 are respectively a single-layer touch sensing structure and are disposed on the same side of the substrate 110. Each of the touch elements 122 includes a first electrode 122A and a plurality of second electrodes 122B, wherein the first electrode 122A and the second electrodes 122B are structurally separated and insulated from each other. The first electrode 122A is, for example, a receiving electrode, and these second electrodes 122B are, for example, transmitting electrodes, but are not limited thereto.

As shown in FIG. 3B, each of the first electrodes 122A is, for example, a comb electrode, and includes a first connecting portion E1A and a plurality of first extending portions E1B respectively connected to the first connecting portion E1A. Each of the second electrodes 122B is, for example, a comb electrode, and includes a second connecting portion E2A and a plurality of second extending portions E2B respectively connected to the second connecting portion E2A. The first extension E1B and the second extension E2B are disposed between the first connection portion E1A and the second connection portion E2A, and each of the second extension portions E2B is located at the phase Between the two first extensions E1B.

The ends of the first connecting portion E1A and the second connecting portion E2A are respectively connected to one of the wires 124, and the wires 124 connected to the end of the first connecting portion E1A and the wires 124 connected to the ends of the second connecting portions E2A are actively One side of the area A1 extends into the peripheral area A2, but is not limited thereto. In another embodiment, the wires 124 may also extend from opposite sides of the active zone A1 into the peripheral zone A2, respectively. With the above design, the width of at least two sides of the peripheral area A2 can be reduced, thereby achieving the design requirement of a narrow bezel or even no bezel.

When the wire 124 extends from one side of the active area A1 into the peripheral area A2, the length of the wire 124 to which the second electrode 122B that is farther away from the side of the active area A1 is connected is longer. The longer the length of the wire 124, the greater its impedance value. In the present embodiment, the wires 124 located in the peripheral region A2 can be designed by winding to reduce the difference in impedance between the different wires 124, thereby contributing to the sensing element 100 having an ideal component performance.

The sensing layer 120 may further include a region where the dummy electrode 126 is disposed outside the touch element 122 and the wire 124 to compensate for visual differences caused by the presence or absence of the objects between the regions, thereby improving uniformity and reducing object visibility. .

The pseudo electrode 126 can include at least one first pseudo electrode 126A, at least one second pseudo electrode 126B, and at least one third pseudo electrode 126C. The first pseudo electrode 126A is located in the active area A1, wherein the first pseudo electrode 126A may be disposed between the adjacent first extension E1B and the second extension E2B, or in the adjacent first connection part E1A and the second Between the connecting portions E2A. And the first pseudo electrode 126A is structurally separated The first connecting portion E1A, the first extending portion E1B, the second connecting portion E2A, and the second extending portion E2B. The second pseudo electrode 126B is disposed between the adjacent first extensions E1B and between the adjacent second electrodes 122B, and the second pseudo electrode 126B may be extended from the active region A1 into the peripheral region A2. The third dummy electrode 126C is located in the peripheral area A2, and at least a part of the third dummy electrodes 126C are respectively disposed between the adjacent two wires 124.

In this embodiment, the sensing component 100 can further include a cover plate CL and an adhesive layer AD. The cover plate CL is disposed on one side of the substrate 110 and is bonded to the sensing layer 120 through the adhesive layer AD to provide a sense. The layer 120 is suitably protected. The cover plate CL may be a flexible plastic film or a flexible thin glass substrate having high toughness. Alternatively, the cover plate CL may also be a rigid substrate having high mechanical strength to protect (eg, scratch resistant) the covered components. When both the cover CL and the substrate 110 are flexible, the sensing element 100 is flexible and its deflectable radius can be, for example, less than 100 mm. The starting surface of the flexible radius is the operating surface of the sensing element 100. In the present embodiment, the operation surface is the outer surface S1 of the cover CL.

In this embodiment, the sensing component 100 can further include a decorative layer BM. The decorative layer BM is disposed on the cover plate CL, wherein the decorative layer BM can shield the peripheral area A2 and expose the active area A1. When the cover layer CL and the sensing layer 120 are joined, if the process deviation may cause the decorative layer BM to expose the opening O of the active area A1 and the active area A1 is not aligned, the partial wires 124 located in the peripheral area A2 are exposed. come out. By disposing the third pseudo electrode 126C in a region other than the wire 124 in the peripheral region A2, it is helpful to compensate for the visual difference in the peripheral region A2 due to the presence or absence of the wire 124. In other words, the opening O is not aligned with the active area A1. Next, the setting of the third pseudo electrode 126C helps to reduce the visibility of the wire 124.

In order to clearly distinguish the first electrode 122A, the second electrode 122B, and the pseudo electrode 126, the first electrode 122A, the second electrode 122B, and the pseudo electrode 126 in FIG. 3B are respectively depicted in different background colors. However, the first electrode 122A, the second electrode 122B, and the pseudo electrode 126 belong to the same film layer (the sensing layer 120), and may be formed by the same process step.

The sensing layer 120 (which may include the touch element 122, the wires 124, and the dummy electrode 126) is, for example, a grid pattern layer having a desired light transmittance. The sensing layer 120 may include a plurality of grid cells MU, which may be the same or different.

In this embodiment, as shown in FIG. 3C, the first electrode 122A and the connected wire 124 thereof comprise a plurality of first grid cells MU1, and the second electrode 122B and the connected wires 124 thereof comprise a plurality of second meshes. Cell unit MU2, and pseudo electrode 126 includes a plurality of third grid cells MU3. In order to clearly distinguish the first mesh unit MU1, the second mesh unit MU2, and the third mesh unit MU3, the first mesh unit MU1, the second mesh unit MU2, and the third mesh unit MU3 in FIG. 3C respectively Designed with lines of different line widths LW1, LW2, and LW3, however, design parameters of the first mesh unit MU1, the second mesh unit MU2, and the third mesh unit MU3, such as line widths LW1, LW2, LW3, and lines P1, P2, P3, shape, etc. can vary depending on different design requirements. The first grid unit MU1, the second grid unit MU2, and the third grid unit MU3 may be the grid unit MU or other similar grid unit described in any one of FIG. 1A, FIG. 2A to FIG. 2K. . In addition, the first mesh unit MU1, the second mesh unit MU2, and the third mesh unit MU3 may be irregular mesh cells in addition to the regular mesh cells. That is to say, the design parameters of the grid unit MU, such as line width, line spacing, shape, etc., may vary depending on different design requirements. For example, the line widths LW1, LW2, LW3 are less than or equal to 10 μm , and the line pitches P1, P2, and P3 fall within the range of 0.1 mm to 1 mm, respectively.

When a solid electrode and a solid wire (or a grid-shaped electrode and a solid wire) are formed by printing, in the case where the difference in width is too large, the electrode and the wire are easily broken at the boundary thereof. In the present invention, as shown in FIG. 3B, the electrodes (such as the first electrode 122A and the second electrode 122B) and the wires 124 to which they are connected are mainly composed of a plurality of grid cells, and the electrodes and the wires 124. The junction X, the grid cells of the electrodes and the grid cells of the wires 124 are connected to each other. Therefore, in the present embodiment, by causing the electrodes and the wires 124 to which they are connected to include grid cells having substantially similar line widths, the problem of wire breakage due to excessive width difference at the boundary X can be avoided.

FIG. 3D is another embodiment of the grid unit of FIG. 3C. Referring to FIG. 3D, since the grid unit MU of the sensing element 100 and the pixel array of the display panel each have an arrangement period, when the sensing element is overlapped with the display panel to form the touch display panel, the sensing element 100 and the display The overlapping regions of the panel are prone to optical moire patterns, which in turn affect the visual quality of the touch display panel. This embodiment can avoid the generation of optical interference fringes by rotating the grid cells MU by an angle θ . However, the method of improving the optical interference fringe is not limited thereto. In another embodiment, the shape and size (line spacing L _x , L _y ) of the grid unit MU can also be changed to avoid the generation of optical interference fringes.

Moreover, in order to meet different design requirements, the shape and size of the touch element 122, the wires 124, and the dummy electrodes 126 can also be changed. 4 is another partial top plan view of the sensing layer of FIG. 3A. For example, as shown in FIG. 4, the width W126A of the first dummy electrodes 126A disposed between the adjacent first extension portion E1B and the second extension portion E2B may be different, wherein the first pseudo electrode 126A is changed. The method of the width W126A may be changing the line pitch P3 of the third mesh unit MU3 (as shown in FIG. 3C) or the third grid unit MU3 in the width direction (the width direction of the first pseudo electrode 126A is parallel to the second direction of FIG. 1B). The number on D2). In another embodiment, the width of the first extension E1B or the width of the second extension E2B may also vary depending on different design requirements.

5 is a cross-sectional view of another sensing element in accordance with an embodiment of the present invention. The same elements are denoted by the same reference numerals and will not be described again. The substrate 110 of the sensing element 200 is a cover. The decorative layer BM may be further disposed on the substrate 110. In such an architecture, the outer surface S2 of the substrate 110 is an operation surface. In addition, since the sensing layer 120 and the decorative layer BM are both disposed on the substrate 110, the present embodiment may not consider the problem that the wire is exposed due to the joint deviation as shown in FIG. 3A, so that the third in FIG. 3B may be omitted. Pseudoelectrode 126C.

6A is a schematic cross-sectional view of a sensing element in accordance with an embodiment of the present invention. FIG. 6B is a top view of the first sensing layer of FIG. 6A. 6C is a top plan view of the second sensing layer of FIG. 6A. 6D is a top plan view of a sensing element in accordance with an embodiment of the present invention. The same elements are denoted by the same reference numerals and will not be described again. Referring to FIG. 6A to FIG. 6D, the sensing element 300 of the embodiment has a first sensing layer 220A and a second sensing layer 220B, wherein the first sensing layer 220A and the second sensing layer 220B are disposed on the same side of the substrate 110, for example, but are not limited thereto. this. In addition, the sensing element 300 may further include an insulating layer IN disposed between the first sensing layer 220A and the second sensing layer 220B to structurally separate the first sensing layer 220A and the second sensing layer 220B from each other. And insulated.

As shown in FIG. 6B, the first sensing layer 220A includes, for example, a plurality of first electrodes 222A, a plurality of wires 224A, and a plurality of first dummy electrodes 226A. The first electrodes 222A are located in the active area A1, wherein the first electrodes 222A are arranged in the second direction D2 and extend in the first direction D1, respectively. In this embodiment, the first electrode 222A may include a plurality of first electrode pads EP1 and a plurality of first connecting portions C1, and the first connecting portion C1 is configured to string the adjacent two first electrode pads EP1 along the first direction D1. Pick up. The wires 224A are located in the peripheral region A2 and are electrically connected to one of the first electrodes 222A, respectively. These first pseudo electrodes 226A are located in the active region A1 and are located outside the first electrode 222A. The first dummy electrode 226A can maintain a gap G with the first electrode 222A to ensure that the first electrode 222A can maintain independent electrical properties.

As shown in FIG. 6C, the second sensing layer 220B includes, for example, a plurality of second electrodes 222B, a plurality of wires 224B, and a plurality of second dummy electrodes 226B. The second electrodes 222B are located in the active area A1, wherein the second electrodes 222B are arranged along the first direction D1 and extend in the second direction D2, respectively. In the present embodiment, the first direction D1 and the second direction D2 are not parallel, for example, vertical. The first direction D1 is, for example, the x-axis direction, and the second direction D2 is, for example, the y-axis direction, but the invention is not limited thereto. In this embodiment, the second electrode 222B may include a plurality of second electrode pads EP2 and a plurality of second connections. The portion C2, and the second connecting portion C2 connects the adjacent two second electrode pads EP2 in the second direction D2. The wires 224B are located in the peripheral region A2 and are electrically connected to one of the second electrodes 222B, respectively. These second pseudo electrodes 226B are located in the active region A1 and are located outside the second electrode 222B. The second pseudo electrode 226B can maintain a gap G with the second electrode 222B to ensure that the second electrode 222B can maintain independent electrical properties.

The first sensing layer 220A and the second sensing layer 220B may each be a grid pattern layer, and the first sensing layer 220A and the second sensing layer 220B may also be formed by printing. For example, the first sensing layer 220A and the second sensing layer 220B may be formed on the substrate 110 by one concave plate transfer, but are not limited thereto. Specifically, in the present embodiment, the wires 224A and 224B also include a grid unit, but the invention is not limited thereto. For example, in one embodiment, the wires 224A, 224B can also be a single solid wire, the line width of which can be designed according to resistance requirements, such as a line width specification of less than 20 μm, to obtain a narrow bezel and sufficient resistance value, and Depending on the design, components with different line widths, line thicknesses or resistance values can be produced by one print. In the present embodiment, a flexible substrate can be selected as the substrate 110, and the flexible radius of the sensing element 200 is, for example, less than R=100 mm. Therefore, the large-area rapid manufacturing can be performed using a roll-to-roll process as needed, and the sensing element 200 is applied to flexible electronic circuits and components.

The first sensing layer 220A includes a plurality of first mesh cells MU1, and the second sensing layer 220B includes a plurality of second mesh cells MU2. In order to distinguish the first mesh unit MU1 and the second mesh unit MU2, FIG. 6B, FIG. 6C and FIG. 6D illustrate the first mesh unit MU1 and the second mesh unit MU2 with lines of different widths. Of course However, the first mesh unit MU1 may also be identical to the second mesh unit MU2. Alternatively, at least one of the line width, the line spacing, and the shape of the first mesh unit MU1 and the second mesh unit MU2 may be different. The first grid unit MU1 and the second grid unit MU2 may be the grid unit MU or other similar grid unit described in any of FIG. 1A, FIG. 2A to FIG. 2K.

Referring to FIG. 6D, the sensing component 300 of the present embodiment can adopt a double-layer touch sensing structure, wherein the first electrodes 222A and the second electrodes 222B are interlaced with each other and maintain independence by the insulating layer IN in FIG. 6A. Electrical. The first electrode 222A may be, for example, a transfer electrode, and the second electrode 222B may be, for example, a receiving electrode, but is not limited thereto.

The active area A1 of the sensing element 300 may be formed by stacking two layers of mesh pattern layers on each other. In this architecture, as shown in FIG. 6D, the first grid cells MU1 and the second grid cells MU2 may be staggered with each other. The intersection I of the ruled line LS of the adjacent second grid unit MU2 falls, for example, in one of the first grid units MU1, and the intersection point I is located, for example, at the center of the first grid unit MU1. But it is not limited to this.

In an embodiment, the active area A1 may be divided into at least two or more areas according to requirements, and are designed to have different forms of mesh patterns in each area. For example, the first region includes a grid pattern as in FIGS. 1A, 2A to 2K, the second region includes another grid pattern as in FIGS. 1A, 2A to 2K, and so on. The first area and the second area may be two areas of up and down or left and right, or two areas separated by diagonal lines, or two divided by other means. region. For example, the active area A1 is divided into four areas, and the four areas may be any four areas separated by two intersecting line areas.

7 to 10 are schematic cross-sectional views of other sensing elements, respectively, in accordance with an embodiment of the present invention. Referring to FIG. 7 , the same components of the sensing component 400 and the sensing component 200 of the present embodiment are denoted by the same reference numerals and will not be described again. The sensing element 400 employs a dual layer touch sensing structure similar to that of FIG. 6A.

Referring to FIG. 8 , the same components of the sensing component 500 and the sensing component 300 of the present embodiment are denoted by the same reference numerals and will not be described again. The first sensing layer 220A and the second sensing layer 220B of the sensing element 500 are disposed on opposite sides of the substrate 110, respectively. Therefore, the sensing element 500 can omit the insulating layer IN such as the sensing element 300.

Referring to FIG. 9 , the same components of the sensing component 600 and the sensing component 300 of the present embodiment are denoted by the same reference numerals and will not be described again. The second sensing layer 220B of the sensing component 600 is disposed on the cover plate CL. The first sensing layer 220A of the sensing component 600 is disposed on the substrate 110, and the second sensing layer 220B and the first sensing layer 220A are transparent. The adhesive layer AD is structurally separated from each other. Therefore, the sensing element 600 can omit the insulating layer IN such as the sensing element 300. In this embodiment, the adhesive layer AD may be, for example, a mesh adhesive layer, and the second mesh unit MU2 disposed in the second sensing layer 220B overlaps with the first mesh unit MU1 of the first sensing layer 220A. .

Referring to FIG. 10, the same components of the sensing component 700 and the sensing component 300 of the present embodiment are denoted by the same reference numerals and will not be described again. Sensing element 700 includes a substrate and an adhesive layer. The first sensing layer 220A is disposed on the first substrate 110A, And the second sensing layer 220B is disposed on the second substrate 110B. The second substrate 110B is disposed between the first substrate 110A and the cover plate CL. The first substrate 110A is bonded to the second substrate 110B through the first adhesive layer AD1, and the second substrate 110B is bonded to the cover plate CL through the second adhesive layer AD2. In the present embodiment, the sensing element 700 can omit the insulating layer IN such as the sensing element 300.

The sensing elements 100, 200, 300, 400, 500, 600, and 700 of the above embodiments may have an aperture ratio of 83% to 96%.

Generally, the display panel includes a regular arrangement structure such as a black matrix or a pixel array. Therefore, when the regularly arranged grid-shaped touch electrode layer is overlapped with the display panel to form a touch device, the display panel is The regular arrangement structure may generate optical interference fringes with the grid-shaped touch electrode layer, thereby affecting the display quality of the display panel. However, in the foregoing embodiment, a grid-shaped touch electrode layer having a randomly varying line width and/or line spacing according to an embodiment of the present invention is used in the touch device, so that the grid-shaped touch electrode layer has Irregular and randomly arranged lattice patterns. In this way, the occurrence of optical interference fringes can be reduced, thereby improving the display quality of the display panel.

11A is a schematic view of an electrode layer according to an embodiment of the present invention, and FIG. 11B is a cross-sectional view taken along line BB' of FIG. 11A. Referring to FIGS. 11A and 11B, the electrode layer 320 has a plurality of wires 322, 324 having line widths L _a , L _b and line spacings S _a , S _b , S _c . The conductor width of L _a 322,324, L _b and line spacing S _a, S _b, S _c is at least one of at least three kinds of change, and various line widths L _a, L _b proportional to the electrode layer 320 Substantially the same, or the ratios of the various line spacings S _a , S _b , and S _c in the electrode layer 320 are substantially the same. In the present embodiment, the line widths L _a and L _{b are,} for example, 3 to 30 μm, and the line spacings S _a , S _b , and S _{c are,} for example, 50 to 200 μm, but are not limited thereto. In the present embodiment, the ratio of the line widths L _a , L _{b of the} wires 322 and 324 to the line spacings S _a , S _b , and S _c may be between 1/200 and 1/2. The aperture ratio of the electrode layer 320 may range from 83% to 96%. As shown in FIG. 11B, each of the wires 322, 324 has a bottom surface and a cross section perpendicular to the bottom surface and having at least one curved portion C. The bend C is, for example, curved or has a continuously varying slope. Although in the present embodiment, a cross-sectional view of the wire 322 is taken as an example, it should be noted that the wire 324 may have a cross-sectional view similar to that of the wire 322, and thus the description will not be repeated. Further, the curved portion C may have a configuration as shown in FIGS. 1C and 1D. The curved portion C can be referred to the foregoing, and will not be described herein. In the present embodiment, the electrode layer 320 is disposed on the substrate 110, for example. The method of forming the electrode layer 320 is, for example, a printing process. The material of the electrode layer 320 may be a light-transmitting conductive material such as a metal oxide, a conductive/conjugated polymer, a carbon nanotube, a graphene, a terpene, a nano silver wire or other light-transmitting conductive material. Metal oxides include, for example, indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium antimony zinc oxide, fluorine doped tin oxide, or other metal oxides. The material of the substrate 110 can be referred to the foregoing, and will not be described herein.

In the present embodiment, the electrode layer 320 may function as a sensing layer, wherein the wire 322 is, for example, a transmitting electrode or a sensing electrode, and the wire 324 is, for example, a wire connected to the wire 322. For example, as shown in FIG. 12, the first electrode layer 320A functions as a first sensing layer, wherein the wire 322A is, for example, a transmitting electrode, the wire 324A is, for example, a peripheral wire, and the second electrode layer 320B is used as a second sensing layer. Wherein the wire 322B is, for example, a receiving electrode, and the wire 324B is, for example, a peripheral wire. In this way, the first electrode layer 320A and the second electrode layer 320B can be used in the sensing element as shown in FIGS. 6A and 7 to 10. Of course, the electrode layer 320 can also be applied to other components than the sensing component, and the invention is not limited thereto. Furthermore, although in the above embodiments, each of the wires 322, 322A, and 322B has the same line width L _a and the line spacing S _a as an example, the present invention is not limited thereto, that is, according to requirements. The wires 322, 322A, 322B can have varying line widths and line spacings, and similarly, the wires 324, 324A, 324B can have varying line widths and line spacings.

In this embodiment, the electrode layers 320, 320A, and 320B have high transmittance, low resistance, and flexibility, wherein the flexible radius can be less than 100 mm, and can be applied to, for example, display elements, sensing elements, foldable elements, and the like. In the component. Moreover, the wires 322, 322A, 322B and the wires 340 having different line widths, line thicknesses or resistance values can be produced by one printing according to different designs. That is, the electrode layers 320, 320A, 320B have a simple manufacturing method.

Although the above embodiment is exemplified by the application of the mesh electrode and the electrode layer to the sensing element, the invention is not limited thereto. That is to say, the mesh electrode and the electrode layer can be applied to other components.

The grid lines of the mesh electrodes according to an embodiment of the present invention have randomly varying line widths and/or line spacings, and thus the mesh electrodes are substantially composed of lattice patterns of randomly varying sizes. In other words, the mesh electrodes have an irregular and randomly arranged lattice pattern. In this way, when the mesh electrode is applied to a sensing element (such as a touch panel), regular alignment structures such as a black matrix or a pixel array in the mesh electrode and the sensing element can be avoided. The optical interference fringes are generated, thereby improving the display quality of the sensing element. In addition, the line width and the line pitch of the electrode layer according to an embodiment of the present invention can be easily adjusted according to different designs, and all the electrodes and wires having the required line width and line spacing can be printed at one time.

Furthermore, since the mesh electrode and the electrode layer can be fabricated by a printing process, the process has the advantages of simple process steps, low machine cost, and large-area fabrication. In addition, the mesh electrode composed of the lattice pattern has the characteristics of good light transmittance, low resistance value, good film uniformity, and adjustment of printing patterns according to different designs. In addition, the roll-to-roll process can be used for large-area rapid manufacturing according to requirements, and the sensing components are applied to flexible electronic circuits and components.

While the present invention has been described above with reference to the embodiments of the present invention, it is not intended to limit the present invention, and it is possible to make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims and their equivalents.

C‧‧‧Bend

H‧‧‧thickness

L _x ‧‧‧ line width

LS _x ‧ ‧ grid

RF‧‧‧ reference plane

S‧‧‧Substrate

Claims (33)

A mesh electrode is formed by a plurality of conductive grid lines that are crossed and connected to each other, each of the conductive grid lines having a bottom surface and a cross section perpendicular to the bottom surface and having at least one curved portion. The mesh electrode according to claim 1, wherein at least one of a line width and a line pitch of the conductive ruled lines has at least three variations, and a ratio of the various line widths in the mesh electrode is substantially The same, or the ratio of the various line spacings in the mesh electrode is substantially the same. The mesh electrode of claim 1, wherein the curved portion has an arc shape or has a continuously varying slope. The mesh electrode according to claim 1, which has flexibility. The mesh electrode according to claim 4, wherein the flexible electrode has a flexible radius of less than 100 mm. The mesh electrode according to claim 1, wherein the conductive grid material comprises a metal oxide, a conductive polymer, a conjugated polymer, a carbon nanotube, a graphene, a terpene, a nano metal. Wire, conductive ink, metal, composite metal compound or a combination of the above. The mesh electrode according to claim 1, wherein the conductive grid lines have a line width of 3 to 30 μm. The mesh electrode according to claim 1, wherein the ratio of the line width to the line pitch of the conductive ruled lines is between 1/200 and 1/2. A sensing component includes: a first substrate; and a first sensing layer disposed on the first substrate, including a plurality of first grid cells, the first grid cells being intersected and connected to each other A plurality of conductive grid lines are formed, wherein each of the conductive grid lines has a bottom surface and a cross section perpendicular to the bottom surface and having at least one curved portion. The sensing element of claim 9, wherein at least one of a line width and a line spacing of the conductive grid lines has at least 3 variations, and a ratio of various line widths in the first sensing layer Substantially the same, or the ratio of the various line spacings in the first sensing layer is substantially the same. The sensing element of claim 9, wherein the first grid cells constitute a plurality of first electrodes. The sensing element of claim 11, further comprising a plurality of pseudo electrodes composed of a plurality of second grid cells disposed between the first electrodes. The sensing component of claim 11, further comprising a plurality of first wires electrically connected to the first electrodes. The sensing component of claim 9, further comprising a second sensing layer stacked with the first sensing layer, wherein the second sensing layer comprises a plurality of third grid cells, The third grid unit is formed by a plurality of conductive grid lines that are crossed and connected to each other. The sensing element of claim 14, wherein the first sensing layer and the second sensing layer are located on opposite surfaces of the first substrate. The sensing component of claim 14, further comprising a second substrate, wherein the second sensing layer is disposed on the second substrate. The sensing component of claim 16, further comprising a transparent adhesive layer disposed at an intersection of the first sensing layer and the second sensing layer. The sensing element of claim 9, wherein the first sensing layer is flexible. The sensing element of claim 18, wherein the first sensing layer has a flexible radius of less than 100 mm. The sensing component of claim 9, wherein the conductive grating material comprises a metal oxide, a conductive polymer, a conjugated polymer, a carbon nanotube, a graphene, a terpene, a nano metal. Wire, conductive ink, metal, composite metal compound or a combination of the above. The sensing component of claim 9, wherein the conductive grid lines have a line width of 3 to 30 μm. The sensing element of claim 9, wherein the ratio of the line width to the line spacing of the conductive grid lines is between 1/200 and 1/2. The sensing element according to claim 9 of the patent application has an aperture ratio of 83% to 96%. The sensing element of claim 9, wherein the curved portion is curved or has a continuously varying slope. An electrode layer comprising a plurality of wires having at least three variations in line width and line pitch, and a ratio of various line widths in the electrode layer Substantially the same, or the various lines are substantially the same in the electrode layer, each of the wires having a bottom surface and a cross section perpendicular to the bottom surface and having at least one bend. The electrode layer of claim 25, wherein the curved portion is curved or has a continuously varying slope. The electrode layer according to claim 25, which has flexibility. The electrode layer according to claim 27, wherein the flexible layer has a flexible radius of less than 100 mm. The electrode layer according to claim 25, wherein the materials of the wires comprise a metal oxide, a conductive polymer, a conjugated polymer, a carbon nanotube, a graphene, a terpene, a nanowire, and a conductive Ink, metal, composite metal compound or a combination of the above. The electrode layer according to claim 25, wherein the wires have a line width of 3 to 30 μm. The electrode layer according to claim 25, wherein the ratio of the line width to the line pitch of the wires is between 1/200 and 1/2. The electrode layer as described in claim 25 has an aperture ratio of 83% to 96%. The electrode layer of claim 25, wherein the wires are sensing electrodes.