TWI563663B - Semiconductor device and fabrication method thereof - Google Patents
Semiconductor device and fabrication method thereofInfo
- Publication number
- TWI563663B TWI563663B TW102117265A TW102117265A TWI563663B TW I563663 B TWI563663 B TW I563663B TW 102117265 A TW102117265 A TW 102117265A TW 102117265 A TW102117265 A TW 102117265A TW I563663 B TWI563663 B TW I563663B
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor device
- fabrication method
- fabrication
- semiconductor
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW102117265A TWI563663B (en) | 2013-05-15 | 2013-05-15 | Semiconductor device and fabrication method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW102117265A TWI563663B (en) | 2013-05-15 | 2013-05-15 | Semiconductor device and fabrication method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201444086A TW201444086A (en) | 2014-11-16 |
TWI563663B true TWI563663B (en) | 2016-12-21 |
Family
ID=52423425
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102117265A TWI563663B (en) | 2013-05-15 | 2013-05-15 | Semiconductor device and fabrication method thereof |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI563663B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9941278B2 (en) * | 2016-07-06 | 2018-04-10 | Globalfoundries Inc. | Method and apparatus for placing a gate contact inside an active region of a semiconductor |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7646046B2 (en) * | 2006-11-14 | 2010-01-12 | Infineon Technologies Ag | Field effect transistor with a fin structure |
US7700456B2 (en) * | 2006-10-16 | 2010-04-20 | Elpida Memory, Inc. | Semiconductor device and manufacturing method of the same |
US20110111592A1 (en) * | 2009-11-09 | 2011-05-12 | International Business Machines Corporation | Angle ion implant to re-shape sidewall image transfer patterns |
-
2013
- 2013-05-15 TW TW102117265A patent/TWI563663B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7700456B2 (en) * | 2006-10-16 | 2010-04-20 | Elpida Memory, Inc. | Semiconductor device and manufacturing method of the same |
US7646046B2 (en) * | 2006-11-14 | 2010-01-12 | Infineon Technologies Ag | Field effect transistor with a fin structure |
US20110111592A1 (en) * | 2009-11-09 | 2011-05-12 | International Business Machines Corporation | Angle ion implant to re-shape sidewall image transfer patterns |
Also Published As
Publication number | Publication date |
---|---|
TW201444086A (en) | 2014-11-16 |
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