TWI563588B - - Google Patents
Info
- Publication number
- TWI563588B TWI563588B TW103145594A TW103145594A TWI563588B TW I563588 B TWI563588 B TW I563588B TW 103145594 A TW103145594 A TW 103145594A TW 103145594 A TW103145594 A TW 103145594A TW I563588 B TWI563588 B TW I563588B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410553794.4A CN105575848B (zh) | 2014-10-17 | 2014-10-17 | 真空锁系统及基片处理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201616595A TW201616595A (zh) | 2016-05-01 |
| TWI563588B true TWI563588B (zh) | 2016-12-21 |
Family
ID=55885845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103145594A TW201616595A (zh) | 2014-10-17 | 2014-12-25 | 真空鎖系統及基片處理方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN105575848B (zh) |
| TW (1) | TW201616595A (zh) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107611054B (zh) * | 2016-07-12 | 2020-02-14 | 北京北方华创微电子装备有限公司 | 反应腔室 |
| CN108470704B (zh) * | 2017-02-23 | 2021-01-29 | 北京北方华创微电子装备有限公司 | 传片腔室及半导体加工设备 |
| JP7330181B2 (ja) * | 2017-11-16 | 2023-08-21 | アプライド マテリアルズ インコーポレイテッド | 高圧蒸気アニール処理装置 |
| US11515128B2 (en) * | 2018-08-28 | 2022-11-29 | Lam Research Corporation | Confinement ring with extended life |
| CN112725747B (zh) * | 2019-10-29 | 2022-10-18 | 中国电子科技集团公司第四十八研究所 | 一种磁控溅射机台 |
| CN112779510B (zh) * | 2019-11-11 | 2022-11-11 | 中国电子科技集团公司第四十八研究所 | 一种磁控溅射镀膜设备 |
| CN113035752B (zh) * | 2021-03-05 | 2022-11-11 | 上海广川科技有限公司 | 负载锁定装置及基片传片方法 |
| CN114695222B (zh) * | 2022-06-02 | 2022-08-16 | 江苏邑文微电子科技有限公司 | 晶片传输系统和方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003014411A1 (en) * | 2001-08-08 | 2003-02-20 | Lam Research Corporation | Rapid cycle chamber having a top vent with nitrogen purge |
| JP2003077975A (ja) * | 2001-08-31 | 2003-03-14 | Anelva Corp | マルチチャンバースパッタ処理装置 |
| WO2005098934A1 (ja) * | 2004-03-30 | 2005-10-20 | Tokyo Electron Limited | 半導体処理装置及び方法 |
| TW200949899A (en) * | 2006-01-27 | 2009-12-01 | Advanced Micro Fab Equip Inc | Semiconductor processing chamber |
| WO2011035041A2 (en) * | 2009-09-16 | 2011-03-24 | Applied Materials, Inc. | Substrate transfer mechanism with preheating features |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4540953B2 (ja) * | 2003-08-28 | 2010-09-08 | キヤノンアネルバ株式会社 | 基板加熱装置及びマルチチャンバー基板処理装置 |
| DE102005039452B4 (de) * | 2005-08-18 | 2007-08-09 | Asys Automatic Systems Gmbh & Co. Kg | Übergabeeinrichtung in Handhabungs- oder Bearbeitungsanlagen für großflächige Substrate |
| JP5108557B2 (ja) * | 2008-02-27 | 2012-12-26 | 東京エレクトロン株式会社 | ロードロック装置および基板冷却方法 |
-
2014
- 2014-10-17 CN CN201410553794.4A patent/CN105575848B/zh active Active
- 2014-12-25 TW TW103145594A patent/TW201616595A/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003014411A1 (en) * | 2001-08-08 | 2003-02-20 | Lam Research Corporation | Rapid cycle chamber having a top vent with nitrogen purge |
| JP2003077975A (ja) * | 2001-08-31 | 2003-03-14 | Anelva Corp | マルチチャンバースパッタ処理装置 |
| WO2005098934A1 (ja) * | 2004-03-30 | 2005-10-20 | Tokyo Electron Limited | 半導体処理装置及び方法 |
| TW200949899A (en) * | 2006-01-27 | 2009-12-01 | Advanced Micro Fab Equip Inc | Semiconductor processing chamber |
| WO2011035041A2 (en) * | 2009-09-16 | 2011-03-24 | Applied Materials, Inc. | Substrate transfer mechanism with preheating features |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105575848A (zh) | 2016-05-11 |
| TW201616595A (zh) | 2016-05-01 |
| CN105575848B (zh) | 2018-08-28 |