TWI563115B - - Google Patents

Info

Publication number
TWI563115B
TWI563115B TW104128014A TW104128014A TWI563115B TW I563115 B TWI563115 B TW I563115B TW 104128014 A TW104128014 A TW 104128014A TW 104128014 A TW104128014 A TW 104128014A TW I563115 B TWI563115 B TW I563115B
Authority
TW
Taiwan
Application number
TW104128014A
Other languages
Chinese (zh)
Other versions
TW201623681A (zh
Original Assignee
Advanced Micro Fab Equip Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN201410838723.9A external-priority patent/CN105779970B/zh
Application filed by Advanced Micro Fab Equip Inc filed Critical Advanced Micro Fab Equip Inc
Publication of TW201623681A publication Critical patent/TW201623681A/zh
Application granted granted Critical
Publication of TWI563115B publication Critical patent/TWI563115B/zh

Links

TW104128014A 2014-12-26 2015-08-26 氣體噴淋頭及沉積裝置 TW201623681A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410838723.9A CN105779970B (zh) 2014-12-26 气体喷淋头和沉积装置

Publications (2)

Publication Number Publication Date
TW201623681A TW201623681A (zh) 2016-07-01
TWI563115B true TWI563115B (enExample) 2016-12-21

Family

ID=56389130

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104128014A TW201623681A (zh) 2014-12-26 2015-08-26 氣體噴淋頭及沉積裝置

Country Status (1)

Country Link
TW (1) TW201623681A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118223005A (zh) * 2022-12-21 2024-06-21 中微半导体设备(上海)股份有限公司 一种喷淋头加热装置、气相沉积设备及喷淋头控温方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060021574A1 (en) * 2004-08-02 2006-02-02 Veeco Instruments Inc. Multi-gas distribution injector for chemical vapor deposition reactors
CN102345112A (zh) * 2011-09-22 2012-02-08 中微半导体设备(上海)有限公司 一种半导体处理设备及其气体喷淋头冷却板
CN103334092A (zh) * 2013-06-13 2013-10-02 中国电子科技集团公司第四十八研究所 一种用于金属有机化学气相沉积反应器的管道冷却式气体分布装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060021574A1 (en) * 2004-08-02 2006-02-02 Veeco Instruments Inc. Multi-gas distribution injector for chemical vapor deposition reactors
CN102345112A (zh) * 2011-09-22 2012-02-08 中微半导体设备(上海)有限公司 一种半导体处理设备及其气体喷淋头冷却板
CN103334092A (zh) * 2013-06-13 2013-10-02 中国电子科技集团公司第四十八研究所 一种用于金属有机化学气相沉积反应器的管道冷却式气体分布装置

Also Published As

Publication number Publication date
CN105779970A (zh) 2016-07-20
TW201623681A (zh) 2016-07-01

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