TWI561939B - Interference lithography device - Google Patents
Interference lithography deviceInfo
- Publication number
- TWI561939B TWI561939B TW104136195A TW104136195A TWI561939B TW I561939 B TWI561939 B TW I561939B TW 104136195 A TW104136195 A TW 104136195A TW 104136195 A TW104136195 A TW 104136195A TW I561939 B TWI561939 B TW I561939B
- Authority
- TW
- Taiwan
- Prior art keywords
- lithography device
- interference lithography
- interference
- lithography
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/106—Beam splitting or combining systems for splitting or combining a plurality of identical beams or images, e.g. image replication
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW104136195A TWI561939B (en) | 2015-11-03 | 2015-11-03 | Interference lithography device |
US15/145,816 US9904176B2 (en) | 2015-11-03 | 2016-05-04 | Interference lithography device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW104136195A TWI561939B (en) | 2015-11-03 | 2015-11-03 | Interference lithography device |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI561939B true TWI561939B (en) | 2016-12-11 |
TW201716875A TW201716875A (zh) | 2017-05-16 |
Family
ID=58227299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104136195A TWI561939B (en) | 2015-11-03 | 2015-11-03 | Interference lithography device |
Country Status (2)
Country | Link |
---|---|
US (1) | US9904176B2 (zh) |
TW (1) | TWI561939B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI596448B (zh) * | 2016-05-12 | 2017-08-21 | 國立中山大學 | 平坦化干涉微影裝置 |
CN107942426B (zh) * | 2017-12-11 | 2019-11-15 | 中国科学院长春光学精密机械与物理研究所 | 一种用于扫描干涉场曝光系统的光束姿态调整方法 |
CN112255895B (zh) * | 2020-11-12 | 2021-07-16 | 中国科学院光电技术研究所 | 一种可控跨尺度激光干涉光刻装置 |
CN114815523A (zh) * | 2022-06-22 | 2022-07-29 | 杭州拓致光电科技有限公司 | 一种干涉夹角连续可调的曝光装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6882477B1 (en) * | 1999-11-10 | 2005-04-19 | Massachusetts Institute Of Technology | Method and system for interference lithography utilizing phase-locked scanning beams |
US20070279642A1 (en) * | 2006-05-31 | 2007-12-06 | Asml Holding N.V. | System and method for printing interference patterns having a pitch in a lithography system |
US20130017498A1 (en) * | 2011-07-13 | 2013-01-17 | Weidong Mao | Tunable two-mirror interference lithography system |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0672962B2 (ja) * | 1985-07-19 | 1994-09-14 | 株式会社日立製作所 | 回折格子形成方法及び装置 |
US6709790B1 (en) * | 1992-08-26 | 2004-03-23 | Goodrich Corporation | Method and apparatus for generating periodic structures in substrates by synthetic wavelength holograph exposure |
JP4065468B2 (ja) * | 1998-06-30 | 2008-03-26 | キヤノン株式会社 | 露光装置及びこれを用いたデバイスの製造方法 |
WO2006034065A2 (en) * | 2004-09-20 | 2006-03-30 | Zetetic Institute | Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and /or adaptive catoptric surfaces |
NL1036349A1 (nl) * | 2007-12-28 | 2009-06-30 | Asml Holding Nv | Scanning EUV interference imaging for extremely high resolution patterning. |
TWI395071B (zh) * | 2008-06-26 | 2013-05-01 | Ind Tech Res Inst | 步進排列式干涉微影方法與系統 |
TWI401541B (zh) * | 2009-07-22 | 2013-07-11 | Nat Univ Tsing Hua | 適用於大面積曝光之拼接式雷射干涉微影設備 |
DE102011119764B4 (de) * | 2011-11-24 | 2015-04-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur Interferenzstrukturierung von flächigen Proben und deren Verwendung |
-
2015
- 2015-11-03 TW TW104136195A patent/TWI561939B/zh active
-
2016
- 2016-05-04 US US15/145,816 patent/US9904176B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6882477B1 (en) * | 1999-11-10 | 2005-04-19 | Massachusetts Institute Of Technology | Method and system for interference lithography utilizing phase-locked scanning beams |
US20070279642A1 (en) * | 2006-05-31 | 2007-12-06 | Asml Holding N.V. | System and method for printing interference patterns having a pitch in a lithography system |
US20130017498A1 (en) * | 2011-07-13 | 2013-01-17 | Weidong Mao | Tunable two-mirror interference lithography system |
Also Published As
Publication number | Publication date |
---|---|
US20170123325A1 (en) | 2017-05-04 |
TW201716875A (zh) | 2017-05-16 |
US9904176B2 (en) | 2018-02-27 |
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