TWI558437B - Manufacturing method for isolation structure of masks - Google Patents

Description

Manufacturing method for insulating structure of mask

The present invention relates to a method for manufacturing an insulating structure for a mask, and more particularly to a method for manufacturing an insulating layer which can be used for a mask structure, and the isolated structure can be manufactured so that the mask can be electrostatically dust-free and can be made high. Filtration efficiency, and long-term use and no use period.

Recently, reports of flu epidemic have led to a sharp increase in the demand for market masks. Especially the N95 masks reported by the media in the past are even more difficult. They have the ability to properly protect against tuberculosis in the air and effectively block the virus. The best product of the droplets, and the dust mask grading mark passed by the US NIOSH certification, is tested with 0.075μ sodium chloride particles, the efficiency is over 95%.

The N95 mask mainly has the functions of filtering, adsorption, killing, etc., through the material and textile method of the mask, and adding an electrostatic filter layer to adsorb the virus on the mask filter layer; in addition, titanium dioxide and photocatalyst have sterilization function. The mask material can kill the virus directly.

However, in the existing market, N95s are made of non-woven fabrics, and the material is not breathable enough, so the amount of air intake will be insufficient. The air exhaled by the user then contains carbon dioxide, water vapor, bacteria and a small amount of oxygen. Breathing with a mask, with the breath As the number of times increases, there are more and more carbon dioxide, water vapor and bacteria in the mask. If the N95 mask with poor air permeability is used for a long time, it will cause certain damage to our body and absorption system. In addition, due to the function of electrostatic dust collection, the static electricity will gradually disappear with the long-term use. The filtration efficiency is reduced and the functionality is getting worse and worse. Therefore, the effective use time of the N95 mask can only last for 8 hours and can no longer be reused. This is one of the disadvantages of the N95 mask.

Therefore, if it is possible to manufacture an insulating layer for a mask structure, the mask structure does not require electrostatic dust collection, and at the same time, it can achieve a filtering effect of more than 95%, because it cannot be used for a long time due to the disappearance of static electricity, and at the same time, due to the structural pressure. A small difference will not cause the user to have difficulty breathing, so this should be an optimal solution.

The present invention provides a method for manufacturing an insulating structure for a mask, which is used for manufacturing an insulating layer for a mask structure, so that the mask structure does not require electrostatic dust collection and can achieve high filtration efficiency, and can be worn for a long time. Used with no expiration date.

The manufacturing method for the above-mentioned insulating structure for a mask can be achieved by the steps of: 1. simultaneously feeding the first substrate, the second substrate and the third substrate to the input end of a first rolling device in the middle and lower order. Carrying and heating by the first rolling device to superimpose and output the first substrate, the second substrate and the third substrate as an insulating material; 2. further, the fourth substrate, the insulating material and the first The five substrates are simultaneously transported to the input end of a second rolling device in the middle and lower order, and are heated by the second rolling device and pressed to fold the fourth substrate, the insulating material and the fifth base. The laminated output is an insulating material having a non-planar surface; 3. Finally, the fourth substrate of the upper surface of the insulating material having the non-planar surface is stripped from the fifth substrate of the lower surface to form only the first substrate, the second substrate, and the third substrate. An insulating material having a non-planar surface.

More specifically, the first substrate is a non-woven material.

More specifically, the third substrate is a nonwoven material.

More specifically, the second substrate is a film material, which is polytetrafluoroethylene (PTFE), polyfluorinated diethylene (PVDF), polypropylene (PP), polyfluorinated divinylidene. Polyether enamel (PES), polyurethane (PU) or meltblown materials.

More specifically, the fourth substrate is cotton, paper or non-woven fabric.

More specifically, the fifth substrate is cotton, paper or non-woven fabric.

More specifically, the temperature at which the first rolling device is heated must be lower than the melting point of the first substrate and the third substrate.

More specifically, the temperature at which the second rolling device is heated must be lower than the melting points of the first substrate and the third substrate.

More specifically, the second rolling device is a rolling device having a toothed structure.

More specifically, the non-planar surface of the insulating material having a non-planar surface is a wavy structure, a continuous crease structure, a discontinuous crease structure or a sawtooth structure.

〔this invention〕

1‧‧‧First substrate

2‧‧‧Second substrate

3‧‧‧ Third substrate

4‧‧‧First rolling device

51‧‧‧Insulation material

52‧‧‧Insulation materials

53‧‧‧Isolated structure

531‧‧‧ Non-planar surface

6‧‧‧fourth substrate

7‧‧‧ Fifth substrate

8‧‧‧Second rolling device

81‧‧‧ tooth structure

Fig. 1 is a schematic view showing the manufacturing process of the manufacturing method of the insulating structure for a mask of the present invention.

Fig. 2A is a schematic view showing the implementation of the manufacturing method of the insulating structure for a mask of the present invention.

Fig. 2B is a schematic view showing the implementation of the manufacturing method of the insulating structure for a mask of the present invention.

Fig. 2C is a schematic view showing the implementation of the manufacturing method of the insulating structure for a mask of the present invention.

Fig. 3 is a perspective view showing the insulating structure of the manufacturing method for the insulating structure of the mask of the present invention.

The above and other technical contents, features and advantages of the present invention will be apparent from the following detailed description of the preferred embodiments.

Please refer to FIG. 1 , which is a schematic diagram of a manufacturing process of a manufacturing method for an insulating structure for a mask according to the present invention. As shown in the figure, the manufacturing steps are as follows: 1. The first substrate, the second substrate and the third substrate are used. Simultaneously transporting to the input end of a first rolling device in the middle and lower order, and heating by the first rolling device to superimpose the first substrate, the second substrate and the third substrate into one The insulating material 101; 2. the fourth substrate, the insulating material and the fifth substrate are simultaneously transported to the input end of a second rolling device in the middle and lower order, and heated by the second rolling device. Pressing to fold the fourth substrate, the insulating material and the fifth substrate into an insulating material 102 having a non-planar surface; 3. Finally, the upper surface of the insulating material having the non-planar surface The fourth substrate is stripped from the fifth substrate of the lower surface to form an insulating material 103 having a non-planar surface only of the first substrate, the second substrate, and the third substrate.

2A, 2B, and 2C are schematic views showing the manufacturing process of the insulating structure. The first substrate 1, the second substrate 2, and the third substrate are first known from FIG. 2A. 3 is transported to the input end of a first rolling device 4 in the middle and lower order, wherein the first substrate 1 and the third substrate 3 are a non-woven material, and the second substrate 2 is a film material. The film material is polytetrafluoroethylene (PTFE), polyfluorinated diethylene (PVDF), polypropylene (PP), polyfluorinated divinyl polyether (PES), polyurethane (PU) or meltblown material; After the first base material 1, the second base material 2, and the third base material 3 are wound into the input end of the first rolling device 4, the rolling device 4 is heated by the first rolling device 4 (the The heating temperature must be lower than the melting point of the first substrate 1 and the third substrate 3, and since the first substrate 1, the second substrate 2, and the third substrate 3 are arranged in the upper and lower order, when heating is performed, After that, the first substrate 1, the second substrate 2, and the third substrate 3 can be superposed and outputted as an insulating material 51, and the insulating material 51 is sandwiched between the second substrate 2 and the first substrate 1 and Between the third substrates 3.

Then, as shown in FIG. 2B, the fourth substrate 6, the insulating material 51, and the fifth substrate 7 are further wound into the input end of the second rolling device 8 by the second rolling device 2, and The rolling device 8 is a rolling device 8 having a toothed structure 81. Therefore, when the fourth substrate 6, the insulating material 51 and the fifth substrate 7 are simultaneously moved to the second rolling device 8 in the middle and lower order, The input end is transported and heated by the second rolling device 8 (the heating temperature must be lower than the melting point of the first substrate 1 and the third substrate 3) and is pressed, so that the fourth can be made The substrate 6, the insulating material 51 and the fifth substrate 7 are superposed and outputted as an insulating material 52 having a non-planar surface (for example, a wavy structure, a continuous crease structure, a discontinuous crease structure or a sawtooth structure), wherein The fourth base material 6 and the fifth base material 7 are made of cotton cloth, paper or non-woven fabric.

Finally, as shown in FIG. 2C, since the fourth substrate 6 and the fifth substrate 7 are mainly intended to protect the first substrate 1 and the third substrate 3 from being pressed by the second rolling device 8, the surface thereof is It is not damaged, so after the crimping process, the fourth substrate 6 having the upper surface of the non-planar surface insulating material 52 and the fifth substrate 7 of the lower surface are stripped to form only the first An insulating structure 53 having a non-planar surface of a substrate 1, a second substrate 2 and a third substrate 3, Then, the insulating structure 53 having the non-planar surface 531 as shown in Fig. 3 can be formed.

The manufacturing method of the insulating structure for a mask provided by the present invention has the following advantages when compared with other conventional techniques:

1. The insulating material (insulation layer) produced by the invention makes the mask not need to be combined with an electrostatic filter layer or the like as a mesh layer for electrostatic dust collection, and can also achieve high filtration efficiency of more than 99%, and also because static electricity is not The problem that disappears and leads to a decrease in efficiency and cannot be used for a long time.

2. The insulating material produced by the present invention can be applied to various forms and types of masks.

The features and spirit of the present invention will be more apparent from the detailed description of the preferred embodiments. On the contrary, the intention is to cover various modifications and equivalents within the scope of the invention as claimed.

Claims (6)

A manufacturing method for an insulating structure for a mask, wherein the first substrate, the second substrate and the third substrate are simultaneously transported to the input end of a first rolling device in a middle-lower order, and The first rolling device is heated to laminate the first substrate, the second substrate and the third substrate into an insulating material; and the fourth substrate, the insulating material and the fifth substrate are placed in the middle The lower sequence is simultaneously transported to the input end of a second rolling device, wherein the second rolling device is a rolling device having a tooth structure, so that the second rolling device can be heated and pressed And superimposing the fourth substrate, the insulating material and the fifth substrate as an insulating material having a non-planar surface, wherein the material of the fourth substrate and the fifth substrate is paper, and is folded The non-planar surface can be formed, and the non-planar surface of the fourth substrate, the insulating material and the fifth substrate is a continuous crease structure, a discontinuous crease structure or a zigzag structure; finally, the non-planar structure a fourth substrate and a lower surface of the upper surface of the insulating material of the planar surface Five stripped substrate to form only the first base, second base and third base of the isolation structure having a non-planar surface. The method for manufacturing an insulating structure for a mask according to claim 1 , wherein the first substrate is a non-woven material. The method for manufacturing an insulating structure for a mask according to claim 1 , wherein the third substrate is a non-woven material. The method for manufacturing a barrier structure for a mask according to claim 1 , wherein the second substrate is a film material, and the film material is polytetrafluoroethylene (PTFE) or polyfluorinated ethylene (PTFE). PVDF), polypropylene (PP), polyfluoroethylene polyether oxime (PES), polyurethane (PU) or meltblown materials. The manufacturing method for an insulating structure for a mask according to claim 1 , wherein the temperature at which the first rolling device is heated must be lower than the melting points of the first substrate and the third substrate. The manufacturing method for an insulating structure for a mask according to claim 1 , wherein the temperature at which the second rolling device is heated must be lower than the melting points of the first substrate and the third substrate.