TWM458990U - Improved mask structure - Google Patents

Description

Mask structure improvement

This creation relates to a mask structure improvement, and in particular to a mask structure that does not require electrostatic dust collection and can achieve high filtration efficiency, and can be used for a long period of time without a service life.

Recently, reports of flu epidemic have led to a sharp increase in the demand for market masks. Especially the N95 masks reported by the media in the past are even more difficult. They have the ability to properly protect against tuberculosis in the air and effectively block the virus. The best product of the droplets, and the dust mask grading mark passed by the US NIOSH certification, is tested with 0.075μ sodium chloride particles, the efficiency is over 95%.

The N95 mask mainly has the functions of filtering, adsorption, killing, etc., through the material and textile method of the mask, and adding an electrostatic filter layer to adsorb the virus on the mask filter layer; in addition, titanium dioxide and photocatalyst have sterilization function. The mask material can kill the virus directly.

However, in the existing market, N95s are made of non-woven fabrics, and the material is not breathable enough, so the amount of air intake will be insufficient. The air exhaled by the user then contains carbon dioxide, water vapor, bacteria and a small amount of oxygen. Breathing with a mask, as the number of breaths increases, there are more and more carbon dioxide, water vapor, and bacteria in the mask. If the N95 mask with poor air permeability is used for a long time, it will cause certain damage to our body and absorption system. In addition, due to the function of electrostatic dust collection, static electricity will gradually disappear with long-term use. Loss, while reducing the filtration efficiency, and the functionality will be worse and worse, so the effective use time of the N95 mask can only last for 8 hours, can not be reused, which is one of the shortcomings of the N95 mask.

Therefore, if it is possible to form a mask structure that does not require electrostatic dust collection, and at the same time, it can achieve a filtering effect of more than 95%, because it cannot be used for a long time due to the disappearance of static electricity, and at the same time, the pressure difference of the constituent structure is small, and the user does not breathe. Difficulties, this should be an optimal solution.

The present invention aims to provide a mask structure improvement, which is a mask structure that does not require electrostatic dust collection and can achieve high filtration efficiency, and can be worn comfortably for a long period of time without a service life.

The above-mentioned mask structure improvement can be achieved, comprising: a plurality of non-woven fabric outer layers; at least one insulation layer is disposed between the plurality of non-woven fabric outer layers, wherein the insulation layer is formed by sandwiching two non-woven inner layers with a film layer, wherein The surface of the insulation layer is a non-planar structural layer.

More specifically, the film layer is made of polytetrafluoroethylene (PTEE), polyfluorinated diethylene (PVDF), polypropylene (PP), polyfluorinated divinyl polyether (PES), polyurethane (PU). Made of meltblown material.

More specifically, the non-planar structural layer is a wavy structure, a continuous crease structure, a discontinuous crease structure or a sawtooth structure.

More specifically, the mask structure is modified to have a strap attached to the outer edge.

In addition to the above structure, there is another improved mask structure, comprising: a non-woven outer layer; an insulating layer attached to one side of the outer layer of the non-woven fabric, the insulating layer is a film sandwiched by two inner layers of the non-woven fabric Made of layers, wherein the insulation layer is non-planar on the surface Structural layer.

More specifically, the film layer is made of polytetrafluoroethylene (PTEE), polyfluorinated diethylene (PVDF), polypropylene (PP), polyfluorinated divinyl polyether (PES), polyurethane (PU). Made of meltblown material.

More specifically, the non-planar structural layer is a wavy structure, a continuous crease structure, a discontinuous crease structure or a sawtooth structure.

More specifically, the mask structure is modified to have a strap attached to the outer edge.

[this creation]

1‧‧‧ Mask structure improvement

11‧‧‧Unwoven outer layer

111‧‧‧ bulging department

12‧‧‧Insulation

121‧‧‧Unwoven inner layer

122‧‧‧film layer

123‧‧‧Unwoven inner layer

124‧‧‧Continuous grooves

13‧‧‧Unwoven outer layer

131‧‧‧ bulging department

14‧‧‧Tie straps

2‧‧‧Users

3‧‧‧ Improved mask structure

31‧‧‧Unwoven outer layer

311‧‧‧ bulging department

312‧‧‧ outside side

32‧‧‧Insulation

321‧‧‧Non-woven outer layer

322‧‧‧film layer

323‧‧‧Non-woven outer layer

324‧‧‧Continuous grooves

Fig. 1A is a schematic exploded view showing the first embodiment of the improved mask structure.

Fig. 1B is a schematic view showing the first embodiment of the three-dimensional structure of the improved mask structure.

Fig. 2 is a schematic exploded view showing the structure of the first embodiment of the improved mask structure.

Fig. 3 is a schematic view showing the first implementation of the improved mask structure.

Figure 4 is a schematic diagram comparing the experimental data of the first implementation of the improved mask structure.

Fig. 5 is a schematic exploded view showing the structure of the second embodiment of the improved mask structure.

The foregoing and other technical features, features, and advantages of the present invention will be apparent from the following detailed description of the preferred embodiments.

Please refer to FIG. 1A, FIG. 1B and FIG. 2 for an exploded perspective view of the first embodiment of the modified mask structure, a first embodiment of the three-dimensional structure, and a first embodiment of the cross-sectional structure, which is known from the figure. The mask structure improved 1 series has two no The woven outer layers 11, 13 are sandwiched by an insulating layer 12 (but not limited to only two non-woven outer layers, and a plurality of non-woven outer layers can be used, and the insulating layer is sandwiched therein), wherein the insulating layer 12 is composed of two The non-woven inner layers 121, 123 are formed by sandwiching a film layer 122, and in the production process, a film made of polytetrafluoroethylene (PTFE) is sandwiched between the two non-woven fabrics, and pressed. After the bonding or lamination, the pleating process is performed. Therefore, the surface of the insulating layer 12 has a plurality of continuous grooves 124. Compared with the surface of the plane, the plurality of continuous grooves 124 can increase the area of filtering dust.

The non-woven outer layers 11, 13 project outwardly from the center by a bulging portion 111, 131, so that when the insulating layer 12 is placed between the two non-woven outer layers 11, 13 and pressed to form a mask structure improvement 1, the bulging The portions 111, 131 protrude into the space formed inward, which makes it easier for the user to cover the mask structure 1 on the face. As shown in FIG. 3, the outer layer of the mask structure 1 is coupled with a strap 14 so that the user 2 The mask structure can be modified 1 by the strap 14, and the inwardly formed space of the bulging portions 111, 131 can be used to cover the nose and mouth of the user 2. The above-mentioned bulging portions 111, 131 belong to one of the types of masks, but the improved mask structure of the present invention can also be used for other types of masks.

In addition, this creation uses three N95 masks (3M 8210 N95 mask, N10SH N95 mask, SAF-T-FIT N95 mask) to compare with this creation. As shown in Figure 4, the air flow rate is controlled at 85LPM. The internal and external pressure difference of the 8210 N95 mask is 9.8mmH ₂ O, and the internal and external pressure difference of the N10SH N95 mask is 17.32mmH ₂ O. The internal and external pressure difference of the SAF-T-FIT N95 mask is 16.85mmH ₂ O, but The internal and external pressure difference measured by the improved mask structure is 6.3mmH ₂ O. It can be seen that the improved mask structure of the present invention has a smaller internal and external pressure difference than the conventional mask, so that the user does not have difficulty breathing.

In addition to the internal and external differential pressure test, the filtration efficiency test was also carried out. The filtration efficiency of the 8210 N95 mask was 99.56%, while the filtration efficiency of the N10SH N95 mask was 98.005%. The filtration efficiency of the SAF-T-FIT N95 mask was 97.085. %, but the filtration efficiency measured by the improved mask structure is 99.5%, and the filtering effect is close to that of 3M's 8210 N95 mask. It can be seen that even without electrostatic dust collection, the mask structure of this creation is improved. Has high filtration efficiency.

In addition, in addition to the structure of the first embodiment, the present invention can have another implementation structure. The internal structure of the present invention is as shown in FIG. 5. Only one non-woven outer layer 31 is combined with an insulating layer 32, and the insulating layer 32 is also The two non-woven outer layers 321 , 323 are formed by sandwiching a film layer 322 , and also have a plurality of continuous grooves 324 on the surface of the insulating layer 32 , and the insulating layer 32 is directly attached to the outer surface of the non-woven outer layer 31 . In 312, the mask structure improvement 3 having only the single-sided non-woven outer layer 31 is formed, and the bulging portion 311 protrudes into the space formed inwardly, and is also used for facilitating the user to cover the mask structure 3 on the face.

The improved mask structure provided by this creation has the following advantages when compared with other conventional techniques:

1. This creation does not need to be combined with a static filter layer or the like as a network layer for electrostatic dust collection, and can achieve a high filtration efficiency of more than 99%. In addition, since the use efficiency is not lost due to the disappearance of static electricity, it cannot be used for a long time. The problem is that there is no problem with the shelf life of the mask structure improvement of this creation.

2. Due to the design of the structure, the pressure difference between the inside and the outside is small, so the user does not have difficulty breathing.

3. The mask structure of the present invention can be made into various forms and types of masks.

The features and spirit of the present invention are more clearly described in the above detailed description of the preferred embodiments, and the scope of the present invention is not limited by the preferred embodiments disclosed herein. On the contrary, it is intended to cover all kinds of changes and equivalences within the scope of the patent application to which the present invention is intended.

1‧‧‧ Mask structure improvement

11‧‧‧Unwoven outer layer

12‧‧‧Insulation

13‧‧‧Unwoven outer layer

Claims (6)

A mask structure improvement comprising: a plurality of non-woven outer layers; at least one insulation layer disposed between the plurality of non-woven outer layers, the insulation layer being formed by sandwiching a film layer between two non-woven inner layers, wherein the insulation is A layer of structure that is non-planar on the surface of the layer. The improved mask structure according to claim 1 , wherein the film layer is made of polytetrafluoroethylene (PTEE), polyfluorinated diethylene (PVDF), polypropylene (PP), and polyfluorinated polytetraethylene polyether. Made of bismuth (PES), polyurethane (PU), and meltblown materials. The mask structure improvement according to claim 1 , wherein the non-planar structural layer is a wavy structure, a continuous crease structure, a discontinuous crease structure or a sawtooth structure. A mask structure improvement comprising: a non-woven outer layer; an insulating layer attached to one side of the outer layer of the non-woven fabric, the insulating layer being formed by sandwiching a film layer between two inner layers of the non-woven fabric, wherein the surface of the insulating layer The upper is a non-planar structural layer. The improved mask structure as described in claim 4 , wherein the film layer is made of polytetrafluoroethylene (PTEE), polyfluorinated diethylene (PVDF), polypropylene (PP), and polyfluorinated polytetraethylene polyether. Made of bismuth (PES), polyurethane (PU), and meltblown materials. The mask structure improvement according to claim 4 , wherein the non-planar structural layer is a wavy structure, a continuous crease structure, a discontinuous crease structure or a sawtooth structure.