CN104553110B - Manufacture method for the isolation structures of mask - Google Patents
Manufacture method for the isolation structures of mask Download PDFInfo
- Publication number
- CN104553110B CN104553110B CN201310481511.5A CN201310481511A CN104553110B CN 104553110 B CN104553110 B CN 104553110B CN 201310481511 A CN201310481511 A CN 201310481511A CN 104553110 B CN104553110 B CN 104553110B
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- China
- Prior art keywords
- base material
- mask
- isolation structures
- manufacture method
- rolling device
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000002955 isolation Methods 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 title claims abstract description 26
- 239000000463 material Substances 0.000 claims abstract description 174
- 230000004888 barrier function Effects 0.000 claims abstract description 36
- 238000005096 rolling process Methods 0.000 claims abstract description 36
- 238000010438 heat treatment Methods 0.000 claims abstract description 13
- 239000004744 fabric Substances 0.000 claims description 11
- 239000004743 Polypropylene Substances 0.000 claims description 6
- 229920001155 polypropylene Polymers 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 6
- 229920000742 Cotton Polymers 0.000 claims description 5
- 239000002033 PVDF binder Substances 0.000 claims description 3
- 229950000845 politef Drugs 0.000 claims description 3
- -1 polypropylene Polymers 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 3
- 239000004695 Polyether sulfone Substances 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 229920006393 polyether sulfone Polymers 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 6
- 238000005367 electrostatic precipitation Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 241000700605 Viruses Species 0.000 description 3
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 241000193830 Bacillus <bacterium> Species 0.000 description 1
- 208000000059 Dyspnea Diseases 0.000 description 1
- 206010013975 Dyspnoeas Diseases 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 206010022000 influenza Diseases 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 239000004531 microgranule Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
Landscapes
- Respiratory Apparatuses And Protective Means (AREA)
Abstract
A kind of manufacture method of the isolation structures for mask, it is first by the first base material, second base material and the 3rd base material transport toward the input of one first rolling device according to the position relation of upper, middle and lower simultaneously, and undertaken heating with by the first base material by this first rolling device, second base material and the 3rd base material overlapping are output as a barrier material, afterwards, again by the 4th base material, barrier material and the 5th base material transport toward the input of one second rolling device according to the position relation of upper, middle and lower simultaneously, with by the 4th base material, barrier material and the 5th base material overlapping are output as a barrier material with non-planar surfaces, finally, again the 4th base material of upper surface of this barrier material with non-planar surfaces is divested with the 5th base material of lower surface, the first base material is only had to be formed, the isolation structures with non-planar surfaces of the second base material and the 3rd base material.
Description
Technical field
The present invention is the manufacture method about a kind of isolation structures for mask, particularly relate to the manufacture method of a kind of isolation layer that can be used in Respirator structure, and the isolation structures made can make mask not need electrostatic precipitation and can reach filtration efficiency and can life-time service.
Background technology
At present, it is subject to the report that Influenza epidemic situation infects, the demand causing market mask increases, especially the N95 mask significantly reported with current media, a difficulty is asked especially, and it has can suitable tubercule bacillus in protection air, the best product of effective barrier tape virus spittle, and emphasize it is by the America NI OSH anti-dust respirator classer's description being verified, and it is test with 0.075 μ sodium chloride microgranule, efficiency reaches more than 95%.
And N95 mask mainly has filtration, adsorbs, the function such as kills, wherein by the material of mask and weaving mode, and add electrostatic filter mesh layer, in order to by viruses adsorption at mask filter course；Additionally use titanium dioxide, photocatalyst one class has the mask material of sterilizing function, then can directly kill virus.
But the mask of this class of N95 on existing market, with adhesive-bonded fabric for material, permeability is also good not, can deficiency so sucking air capacity.Again owing to the air of the exhalation of user contains carbon dioxide, steam, antibacterial and a small amount of oxygen.Carrying mask to breathe, along with the number of times breathed increases, the carbon dioxide in mask, steam, antibacterial are just more and more many.If the N95 mask of long period, prestowage poor air permeability, on the contrary our health, absorption system all can be formed certain injury；Additionally, due to electrostatic precipitation function can along with life-time service when, electrostatic can fade away, make filter efficiency decline simultaneously, and functional meeting is worse and worse, the therefore effective storage life of N95 mask, the longest being only capable of maintains 8 hours, cannot reusing, this is also one of the deficiency of N95 mask.
Therefore, if one can be manufactured for the isolation layer of Respirator structure, Respirator structure is made not need electrostatic precipitation, and the filter effect of more than 95% can be reached simultaneously, owing to method life-time service will not be disappeared without because of electrostatic, because forming, structure pressure reduction is less does not result in user dyspnea simultaneously, so should be a best solution.
Summary of the invention
Namely the present invention is in that to provide the manufacture method of a kind of isolation structures for mask, in order to manufacture one for the isolation layer of Respirator structure so that Respirator structure do not need electrostatic precipitation and can reach filtration efficiency and can for a long time comfortable wear with there is no useful life.
The manufacture method of the above-mentioned isolation structures for mask can be reached, the steps include:
1. the first base material, the second base material and the 3rd base material are transported toward the input of one first rolling device according to the position relation of upper, middle and lower simultaneously, and undertaken heating the first base material, the second base material and the 3rd base material to be coincided and be output as a barrier material by this first rolling device；
2. again the 4th base material, barrier material and the 5th base material are transported toward the input of one second rolling device according to the position relation of upper, middle and lower simultaneously, and undertaken heating by this second rolling device and go forward side by side with backfin, it is output as a barrier material with non-planar surfaces the 4th base material, barrier material and the 5th base material to be overlapped；
3. last, then the 4th base material of upper surface of this barrier material with non-planar surfaces is divested with the 5th base material of lower surface, to form the barrier material with non-planar surfaces only having the first base material, the second base material and the 3rd base material.
In particular, described first base material is an adhesive-bonded fabric material.
In particular, described 3rd base material is an adhesive-bonded fabric material.
In particular, described second base material is a thin-film material, and this thin-film material is politef (PTEE), poly-fluoride divinyl (PVDF), polypropylene (PP), poly-fluoride divinyl polyether sulfone (PES), polyurethane (PU) or meltblown material.
In particular, described 4th base material is cotton, paper or adhesive-bonded fabric.
In particular, described 5th base material is cotton, paper or adhesive-bonded fabric.
In particular, the temperature that described first rolling device carries out heating have to be lower than the fusing point of this first base material and the 3rd base material.
In particular, the temperature that described second rolling device carries out heating have to be lower than the fusing point of this first base material and the 3rd base material.
In particular, described second rolling device is a rolling device with dentalation.
In particular, the non-planar surfaces described in the barrier material of non-planar surfaces is wavelike structure, continuous pleat trace structure, discontinuous pleat trace structure or laciniation.
Accompanying drawing explanation
Fig. 1 is the present invention manufacturing process schematic diagram for the manufacture method of the isolation structures of mask.
Fig. 2 A is the present invention enforcement schematic diagram for the manufacture method of the isolation structures of mask.
Fig. 2 B is the present invention enforcement schematic diagram for the manufacture method of the isolation structures of mask.
Fig. 2 C is the present invention enforcement schematic diagram for the manufacture method of the isolation structures of mask.
Fig. 3 is the present invention isolation structures axonometric chart for the manufacture method of the isolation structures of mask.
[symbol description]
(present invention)
1, first base material the 2, second base material
3, the 3rd base material the 4, first rolling device
51, barrier material 52, barrier material
53, isolation structures 531, non-planar surfaces
6, the 4th base material the 7, the 5th base material
8, the second rolling device 81, dentalation.
Detailed description of the invention
It is related to the aforementioned of the present invention and other technology contents, feature and effect, coordinates with reference in the detailed description of the preferred embodiment of accompanying drawing following, can clearly present.
Refer to Fig. 1, for the present invention manufacturing process schematic diagram of manufacture method for the isolation structures of mask, by figure it can be seen that its manufacturing step is:
1, the first base material, the second base material and the 3rd base material are transported toward the input of one first rolling device according to the position relation of upper, middle and lower simultaneously, and undertaken heating by this first rolling device and be output as a barrier material 101 the first base material, the second base material and the 3rd base material to be overlapped；
2, again the 4th base material, barrier material 101 and the 5th base material are transported toward the input of one second rolling device according to the position relation of upper, middle and lower simultaneously, and undertaken heating and carrying out backfin by this second rolling device, it is output as a barrier material 102 with non-planar surfaces the 4th base material, barrier material 101 and the 5th base material to be overlapped；
3, last, then the 4th base material of upper surface of this barrier material 102 with non-planar surfaces is divested with the 5th base material of lower surface, to form the barrier material 103 with non-planar surfaces only having the first base material, the second base material and the 3rd base material.
By Fig. 2 A, shown in Fig. 2 B and Fig. 2 C, schematic diagram is implemented in manufacture for isolation structures, wherein from Fig. 2 A, first by the first base material 1, second base material 2 and the 3rd base material 3 transport toward the input of one first rolling device 4 according to the position relation of upper, middle and lower simultaneously, wherein the first base material 1 and the 3rd base material 3 are an adhesive-bonded fabric material, and the second base material 2 is a thin-film material, this thin-film material is politef (PTEE), poly-fluoride divinyl (PVDF), polypropylene (PP), poly-fluoride divinyl polyether sulfone (PES), polyurethane (PU) or meltblown(are melt-blown) material；Therefore after first base material the 1, second base material 2 and the 3rd base material 3 are involved in by the first rolling device 4 to the input of the first rolling device 4, heat (fusing point that its temperature heated have to be lower than this first base material 1 and the 3rd base material 3) is carried out by this first rolling device 4, owing to the position relation of first base material the 1, second base material 2 and the 3rd base material about 3 arranges, therefore after heating, first base material the 1, second base material 2 and the 3rd base material 3 being overlapped and be output as a barrier material 51, in this barrier material 51, the second base material 2 is located between the first base material 1 and the 3rd base material 3.
nullAnd afterwards as shown in Figure 2 B，Again by the second rolling device 2 by the 4th base material 6、After barrier material 51 and the 5th base material 7 are involved in the input of the second rolling device 8，Owing to the second rolling device 8 is a rolling device 8 with dentalation 81，Therefore when the 4th base material 6、Barrier material 51 and the 5th base material 7 transport toward the input of one second rolling device 8 according to the position relation of upper, middle and lower simultaneously，And undertaken heating (fusing point that its warm temperature have to be lower than this first base material 1 and the 3rd base material 3) and carrying out backfin by this second rolling device 8，So will enable the 4th base material 6、Barrier material 51 and the 5th base material 7 overlapping are output as one and have non-planar surfaces (such as wavelike structure、Continuous pleat trace structure、Discontinuous pleat trace structure or laciniation) barrier material 52，Wherein the 4th base material 6 and the 5th base material 7 are cotton、Paper or adhesive-bonded fabric.
Finally, as shown in Figure 2 C, when being to protect the first base material 1 and the 3rd base material 3 to be subject to the second rolling device 8 backfin due to the 4th base material 6 and the 5th base material 7 main purpose, its surface will not be destroyed, therefore when after backfin process, then again the 4th base material 6 of upper surface of this barrier material 52 with non-planar surfaces is divested with the 5th base material 7 of lower surface, the first base material 1 is only had to be formed, the isolation structures 53 with non-planar surfaces of the second base material 2 and the 3rd base material 3, such then the isolation structures 53 with non-planar surfaces 531 as shown in Figure 3 can be formed, for making mask.
The manufacture method of the isolation structures for mask provided by the present invention, when mutually comparing with other prior aries, its advantage is as follows:
1, the barrier material (isolation layer) made by the present invention makes mask not need in conjunction with the classes such as the electrostatic filter mesh layer stratum reticulare as electrostatic precipitation, also the filtration efficiency of more than 99% can be reached, additionally, due to service efficiency being caused to decline because electrostatic disappears and cannot the problem of life-time service.
2, the barrier material made by the present invention can be applied to the mask of various forms and kind.
By the above detailed description of preferred embodiments, it would be desirable to clearly describe inventive feature and spirit, and not with above-mentioned disclosed preferred embodiment, scope of the invention is any limitation as.On the contrary, its objective is that the present invention that is arranged in wishing to contain various change and tool equality is intended in the category of the scope of the claims of application.
Claims (10)
1. the manufacture method for the isolation structures of mask, it is characterised in that concretely comprise the following steps:
A first base material, the second base material and the 3rd base material are transported toward the input of one first rolling device by () according to the position relation of upper, middle and lower simultaneously, and undertaken heating the first base material, the second base material and the 3rd base material to be overlapped and be output as a barrier material by this first rolling device；
B 4th base material, barrier material and the 5th base material are transported toward the input of one second rolling device by () again according to the position relation of upper, middle and lower simultaneously, and undertaken heating and carrying out backfin by this second rolling device, it is output as a barrier material with non-planar surfaces the 4th base material, barrier material and the 5th base material to be overlapped；
C () is last, again the 4th base material of upper surface of this barrier material with non-planar surfaces is divested with the 5th base material of lower surface, with the isolation structures with non-planar surfaces that formation is only made up of the first base material, the second base material and the 3rd base material, it is used for making mask.
2. the manufacture method of the isolation structures for mask as claimed in claim 1, it is characterised in that this first base material is adhesive-bonded fabric material.
3. the manufacture method of the isolation structures for mask as claimed in claim 1, it is characterised in that the 3rd base material is adhesive-bonded fabric material.
4. the manufacture method of the isolation structures for mask as claimed in claim 1, it is characterized in that, second base material is thin-film material, and this thin-film material is politef (PTEE), poly-fluoride divinyl (PVDF), polypropylene (PP), poly-fluoride divinyl polyether sulfone, polyurethane (PU) or meltblown material.
5. the manufacture method of the isolation structures for mask as claimed in claim 1, it is characterised in that the 4th base material is cotton, paper or adhesive-bonded fabric.
6. the manufacture method of the isolation structures for mask as claimed in claim 1, it is characterised in that the 5th base material is cotton, paper or adhesive-bonded fabric.
7. the manufacture method of the isolation structures for mask as claimed in claim 1, it is characterised in that in (a) step, the temperature that this first rolling device carries out heating have to be lower than the fusing point of this first base material and the 3rd base material.
8. the manufacture method of the isolation structures for mask as claimed in claim 1, it is characterised in that in (b) step, the temperature that this second rolling device carries out heating have to be lower than the fusing point of this first base material and the 3rd base material.
9. the manufacture method of the isolation structures for mask as claimed in claim 1, it is characterised in that this second rolling device is a rolling device with dentalation.
10. the manufacture method of the isolation structures for mask as claimed in claim 1, it is characterised in that the non-planar surfaces of this barrier material with non-planar surfaces is wavelike structure, continuous pleat trace structure, discontinuous pleat trace structure or laciniation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310481511.5A CN104553110B (en) | 2013-10-15 | 2013-10-15 | Manufacture method for the isolation structures of mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310481511.5A CN104553110B (en) | 2013-10-15 | 2013-10-15 | Manufacture method for the isolation structures of mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104553110A CN104553110A (en) | 2015-04-29 |
| CN104553110B true CN104553110B (en) | 2016-07-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310481511.5A Expired - Fee Related CN104553110B (en) | 2013-10-15 | 2013-10-15 | Manufacture method for the isolation structures of mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104553110B (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5561908A (en) * | 1978-11-06 | 1980-05-10 | Mitsubishi Heavy Ind Ltd | Tanning treatment apparatus of dustproof filter material |
| EP1656844B1 (en) * | 2004-11-16 | 2010-01-13 | Moldex-Metric Ag & Co. Kg | Respirator mask |
| CN202635663U (en) * | 2011-12-26 | 2013-01-02 | 权盈科技工业有限公司 | A respirator with an improved structure |
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2013
- 2013-10-15 CN CN201310481511.5A patent/CN104553110B/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| CN104553110A (en) | 2015-04-29 |
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Effective date of registration: 20180222 Address after: The new Taiwan Chinese Taiwan New Taipei City Xizhi District Five Road No. 102 21 floor Patentee after: WEIFENG TECHNOLOGY CO., LTD. Address before: The new Taiwan Chinese Taiwan New Taipei City Xizhi District Five Road No. 106 19 floor Co-patentee before: Li Jiheng Patentee before: Lin Shiquan |
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Granted publication date: 20160706 Termination date: 20191015 |
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