CN104553110A - Method for manufacturing isolation structure for gauze mask - Google Patents
Method for manufacturing isolation structure for gauze mask Download PDFInfo
- Publication number
- CN104553110A CN104553110A CN201310481511.5A CN201310481511A CN104553110A CN 104553110 A CN104553110 A CN 104553110A CN 201310481511 A CN201310481511 A CN 201310481511A CN 104553110 A CN104553110 A CN 104553110A
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- CN
- China
- Prior art keywords
- base material
- mouth mask
- isolation structures
- manufacture method
- rolling device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000002955 isolation Methods 0.000 title claims abstract description 40
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 title claims abstract description 26
- 239000000463 material Substances 0.000 claims abstract description 174
- 238000005096 rolling process Methods 0.000 claims abstract description 36
- 238000010438 heat treatment Methods 0.000 claims abstract description 15
- 230000004888 barrier function Effects 0.000 claims description 31
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 12
- 239000004744 fabric Substances 0.000 claims description 11
- 239000004743 Polypropylene Substances 0.000 claims description 6
- 229920001155 polypropylene Polymers 0.000 claims description 6
- -1 polytetrafluoroethylene Polymers 0.000 claims description 6
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 6
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- 229920000742 Cotton Polymers 0.000 claims description 5
- 230000032258 transport Effects 0.000 claims description 4
- 239000002033 PVDF binder Substances 0.000 claims description 3
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 6
- 238000005367 electrostatic precipitation Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 241000700605 Viruses Species 0.000 description 3
- 241000894006 Bacteria Species 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 241000193830 Bacillus <bacterium> Species 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 206010022000 influenza Diseases 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000029058 respiratory gaseous exchange Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
Landscapes
- Respiratory Apparatuses And Protective Means (AREA)
Abstract
The invention relates to a method for manufacturing an isolation structure for a gauze mask. The method comprises the following steps: simultaneously transporting a first base material, a second base material and a third base material to the input end of a first rolling press device according to an upper, middle and lower position relation, heating by the first rolling press device, and overlapping the first base material, the second base material and the third base material to be output as an isolation material; then, simultaneously transporting a fourth base material, the isolation material and a fifth base material to the input end of a second rolling press device according to an upper, middle and lower position relation, and overlapping the fourth base material, the isolation material and the fifth base material to be output as an isolation material with non-planar surfaces; finally, stripping the fourth base material on the upper surface and the fifth base material on the lower surface of the isolation material with the non-planar surfaces, and thus forming the isolation structure with the first base material, the second base material, the third base material and the non-planar surfaces.
Description
Technical field
The invention relates to a kind of manufacture method of the isolation structures for mouth mask, refer to a kind of manufacture method that can be used in the isolation layer of Respirator structure especially, and the isolation structures of making can make mouth mask not need electrostatic precipitation also can reach filtration efficiency and can Long-Time Service.
Background technology
At present, be subject to the report that Influenza epidemic situation infects, the demand of market mouth mask is caused to increase, especially with the N95 mouth mask that current media are significantly reported, a difficulty is asked especially, and it has can suitable tubercle bacillus in protection air, the best product of effective barrier tape virus spittle, and emphasize it is the anti-dust respirator classer's description be verified by America NI OSH, be test with 0.075 μ sodium chloride particulate, efficiency reaches more than 95%.
And N95 mouth mask mainly has filtration, adsorbs, the function such as to kill, wherein by material and the weaving mode of mouth mask, and add electrostatic filter mesh layer, in order to by viruses adsorption at mouth mask filter course; Use titanium dioxide in addition, mouth mask material that photocatalyst one class has sterilizing function, then directly can kill virus.
But the mouth mask of this class of N95 on existing market take adhesive-bonded fabric as material, permeability is also good not, can be not enough so suck air capacity.Again because the air of the exhalation of user contains carbon dioxide, steam, bacterium and a small amount of oxygen.Carry mouth mask to breathe, along with the number of times breathed increases, the carbon dioxide in mouth mask, steam, bacterium are just more and more many.If the N95 mouth mask of long period, prestowage poor air permeability, all certain injury can be formed to our health, absorption system on the contrary; In addition, due to electrostatic precipitation function can along with Long-Time Service when, electrostatic can fade away, make filter efficiency decline simultaneously, and functional meeting worse and worse, the therefore effective storage life of N95 mouth mask, the longlyest only can maintain 8 hours, cannot reuse, this is also one of deficiency of N95 mouth mask.
Therefore, if one can be manufactured for the isolation layer of Respirator structure, Respirator structure is made not need electrostatic precipitation, and the filter effect of more than 95% can be reached simultaneously, due to can not cannot Long-Time Service because electrostatic disappears, user can not be caused to have difficulty in breathing because composition structure pressure reduction is less simultaneously, so should be a best solution.
Summary of the invention
Namely the present invention is the manufacture method providing a kind of isolation structures for mouth mask, in order to manufacture one for the isolation layer of Respirator structure, do not need electrostatic precipitation to make Respirator structure and can filtration efficiency be reached and can for a long time comfortable wear with there is no useful life.
The manufacture method of the above-mentioned isolation structures for mouth mask can be reached, the steps include:
1. the first base material, the second base material and the 3rd base material position relation according to upper, middle and lower is transported toward the input of one first rolling device simultaneously, and to be undertaken heating with the output that the first base material, the second base material and the 3rd base material coincided by this first rolling device be a barrier material;
2. again the 4th base material, barrier material and the 5th base material position relation according to upper, middle and lower is transported toward the input of one second rolling device simultaneously, and undertaken heating by this second rolling device and go forward side by side with backfin, being a barrier material with non-planar surfaces by the 4th base material, barrier material and the superimposed output of the 5th base material;
3. last, then this is had the 4th base material of upper surface of barrier material of non-planar surfaces and the 5th base material of lower surface divests, to form the barrier material with non-planar surfaces only having the first base material, the second base material and the 3rd base material.
In particular, described first base material is an adhesive-bonded fabric material.
In particular, described 3rd base material is an adhesive-bonded fabric material.
In particular, described second base material is a thin-film material, and this thin-film material is polytetrafluoroethylene (PTFE) (PTEE), poly-fluoridizes divinyl (PVDF), polypropylene (PP), poly-ly fluoridizes divinyl polyether sulfone (PES), polyurethane (PU) or meltblown material.
In particular, described 4th base material is cotton, paper or adhesive-bonded fabric.
In particular, described 5th base material is cotton, paper or adhesive-bonded fabric.
In particular, described first rolling device carry out the temperature of heating must lower than the fusing point of this first base material and the 3rd base material.
In particular, described second rolling device carry out the temperature of heating must lower than the fusing point of this first base material and the 3rd base material.
In particular, described second rolling device is a rolling device with dentalation.
In particular, the non-planar surfaces described in the barrier material of non-planar surfaces is wavelike structure, continuously pleat trace structure, discontinuous pleat trace structure or laciniation.
Accompanying drawing explanation
Fig. 1 is the manufacturing process schematic diagram of the present invention for the manufacture method of the isolation structures of mouth mask.
Fig. 2 A is the enforcement schematic diagram of the present invention for the manufacture method of the isolation structures of mouth mask.
Fig. 2 B is the enforcement schematic diagram of the present invention for the manufacture method of the isolation structures of mouth mask.
Fig. 2 C is the enforcement schematic diagram of the present invention for the manufacture method of the isolation structures of mouth mask.
Fig. 3 is the isolation structures stereogram of the present invention for the manufacture method of the isolation structures of mouth mask.
[symbol description]
(the present invention)
1, the first base material 2, second base material
3, the 3rd base material 4, first rolling device
51, barrier material 52, barrier material
53, isolation structures 531, non-planar surfaces
6, the 4th base material 7, the 5th base material
8, the second rolling device 81, dentalation.
Detailed description of the invention
Have about aforementioned and other technology contents, feature and effect of the present invention, in the following detailed description coordinated with reference to the preferred embodiment of accompanying drawing, can clearly present.
Refer to Fig. 1, be used for the manufacturing process schematic diagram of the manufacture method of the isolation structures of mouth mask for the present invention, from figure, its manufacturing step is:
1, the first base material, the second base material and the 3rd base material position relation according to upper, middle and lower is transported toward the input of one first rolling device simultaneously, and undertaken heating to be a barrier material 101 by the first base material, the second base material and the superimposed output of the 3rd base material by this first rolling device;
2, again the 4th base material, barrier material 101 and the 5th base material position relation according to upper, middle and lower is transported toward the input of one second rolling device simultaneously, and undertaken heating by this second rolling device and carry out backfin, being a barrier material 102 with non-planar surfaces by the 4th base material, barrier material 101 and the superimposed output of the 5th base material;
3, last, then this is had the 4th base material of upper surface of barrier material 102 of non-planar surfaces and the 5th base material of lower surface divests, to form the barrier material 103 with non-planar surfaces only having the first base material, the second base material and the 3rd base material.
By Fig. 2 A, shown in Fig. 2 B and Fig. 2 C, for schematic diagram is implemented in the manufacture of isolation structures, wherein from Fig. 2 A, first by the first base material 1, second base material 2 and the 3rd base material 3 transport toward the input of one first rolling device 4 according to the position relation of upper, middle and lower simultaneously, wherein the first base material 1 and the 3rd base material 3 are an adhesive-bonded fabric material, and the second base material 2 is a thin-film material, this thin-film material is polytetrafluoroethylene (PTFE) (PTEE), gather and fluoridize divinyl (PVDF), polypropylene (PP), gather and fluoridize divinyl polyether sulfone (PES), polyurethane (PU) or meltblown(melt-blown) material, therefore after the first base material 1, second base material 2 and the 3rd base material 3 are involved in the input of the first rolling device 4 by the first rolling device 4, carry out heating (its temperature of heating must lower than the fusing point of this first base material 1 and the 3rd base material 3) by this first rolling device 4, because the position relation of the first base material 1, second base material 2 and the 3rd base material about 3 arranges, therefore after heating, can be a barrier material 51 by the first base material 1, second base material 2 and the superimposed output of the 3rd base material 3, in this barrier material 51, the second base material 2 be located between the first base material 1 and the 3rd base material 3.
And afterwards as shown in Figure 2 B, again by the second rolling device 2 by the 4th base material 6, after barrier material 51 and the 5th base material 7 are involved in the input of the second rolling device 8, because the second rolling device 8 is a rolling device 8 with dentalation 81, therefore when the 4th base material 6, barrier material 51 and the 5th base material 7 transport toward the input of one second rolling device 8 according to the position relation of upper, middle and lower simultaneously, and undertaken heating (its warm temperature must lower than the fusing point of this first base material 1 and the 3rd base material 3) by this second rolling device 8 and carry out backfin, so can make the 4th base material 6, barrier material 51 and the superimposed output of the 5th base material 7 are one have non-planar surfaces (such as wavelike structure, continuous pleat trace structure, discontinuous pleat trace structure or laciniation) barrier material 52, wherein the 4th base material 6 and the 5th base material 7 are cotton, paper or adhesive-bonded fabric.
Finally, as shown in Figure 2 C, due to the 4th base material 6 and the 5th base material 7 main purpose be to protect the first base material 1 and the 3rd base material 3 to be subject to the second rolling device 8 backfin time, its surface can not be destroyed, therefore when after backfin process, 4th base material 6 then again this with the upper surface of the barrier material 52 of non-planar surfaces divests with the 5th base material 7 of lower surface, the first base material 1 is only had to be formed, the isolation structures 53 with non-planar surfaces of the second base material 2 and the 3rd base material 3, like this then the isolation structures 53 with non-planar surfaces 531 that can be formed as shown in Figure 3, for making mouth mask.
The manufacture method of the isolation structures for mouth mask provided by the present invention, when mutually comparing with other prior aries, its advantage is as follows:
1, the barrier material (isolation layer) made by the present invention makes mouth mask not need in conjunction with the stratum reticulare of classes such as electrostatic filter mesh layer as electrostatic precipitation, also the filtration efficiency of more than 99% can be reached, in addition owing to will service efficiency be caused to decline because electrostatic disappears and cannot the problem of Long-Time Service.
2, the barrier material made by the present invention can be applied to the mouth mask of various forms and kind.
By the above detailed description of preferred embodiments, it is desirable to clearly to describe feature of the present invention and spirit, and not with above-mentioned disclosed preferred embodiment, category of the present invention is limited.On the contrary, its objective is wish to contain various change and tool equality be arranged in the present invention institute in the category of the scope of the claims applied for.
Claims (10)
1. for a manufacture method for the isolation structures of mouth mask, it is characterized in that, concrete steps are:
A first base material, the second base material and the 3rd base material position relation according to upper, middle and lower transports toward the input of one first rolling device by () simultaneously, and undertaken heating to be a barrier material by the first base material, the second base material and the superimposed output of the 3rd base material by this first rolling device;
B 4th base material, barrier material and the 5th base material position relation according to upper, middle and lower transports toward the input of one second rolling device by () more simultaneously, and undertaken heating by this second rolling device and carry out backfin, being a barrier material with non-planar surfaces by the 4th base material, barrier material and the superimposed output of the 5th base material;
C () is last, 5th base material of the 4th base material and lower surface again this with the upper surface of the barrier material of non-planar surfaces divests, to form the isolation structures with non-planar surfaces be only made up of the first base material, the second base material and the 3rd base material, for making mouth mask.
2., as claimed in claim 1 for the manufacture method of the isolation structures of mouth mask, it is characterized in that, this first base material is adhesive-bonded fabric material.
3., as claimed in claim 1 for the manufacture method of the isolation structures of mouth mask, it is characterized in that, the 3rd base material is adhesive-bonded fabric material.
4. as claimed in claim 1 for the manufacture method of the isolation structures of mouth mask, it is characterized in that, second base material is thin-film material, and this thin-film material is polytetrafluoroethylene (PTFE) (PTEE), poly-fluoridizes divinyl (PVDF), polypropylene (PP), poly-ly fluoridizes divinyl polyether sulfone (PES), polyurethane (PU) or meltblown material.
5., as claimed in claim 1 for the manufacture method of the isolation structures of mouth mask, it is characterized in that, the 4th base material is cotton, paper or adhesive-bonded fabric.
6., as claimed in claim 1 for the manufacture method of the isolation structures of mouth mask, it is characterized in that, the 5th base material is cotton, paper or adhesive-bonded fabric.
7. as claimed in claim 1 for the manufacture method of the isolation structures of mouth mask, it is characterized in that, in (a) step, this first rolling device carries out the temperature of heating must lower than the fusing point of this first base material and the 3rd base material.
8. as claimed in claim 1 for the manufacture method of the isolation structures of mouth mask, it is characterized in that, in (b) step, this second rolling device carries out the temperature of heating must lower than the fusing point of this first base material and the 3rd base material.
9., as claimed in claim 1 for the manufacture method of the isolation structures of mouth mask, it is characterized in that, this second rolling device is a rolling device with dentalation.
10. as claimed in claim 1 for the manufacture method of the isolation structures of mouth mask, it is characterized in that, this non-planar surfaces with the barrier material of non-planar surfaces is wavelike structure, continuously pleat trace structure, discontinuous pleat trace structure or laciniation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201310481511.5A CN104553110B (en) | 2013-10-15 | 2013-10-15 | Manufacture method for the isolation structures of mask |
Applications Claiming Priority (1)
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CN201310481511.5A CN104553110B (en) | 2013-10-15 | 2013-10-15 | Manufacture method for the isolation structures of mask |
Publications (2)
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CN104553110A true CN104553110A (en) | 2015-04-29 |
CN104553110B CN104553110B (en) | 2016-07-06 |
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CN201310481511.5A Expired - Fee Related CN104553110B (en) | 2013-10-15 | 2013-10-15 | Manufacture method for the isolation structures of mask |
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CN (1) | CN104553110B (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5561908A (en) * | 1978-11-06 | 1980-05-10 | Mitsubishi Heavy Ind Ltd | Tanning treatment apparatus of dustproof filter material |
EP1656844A1 (en) * | 2004-11-16 | 2006-05-17 | Moldex-Metric Ag & Co. Kg | Respirator mask |
CN202635663U (en) * | 2011-12-26 | 2013-01-02 | 权盈科技工业有限公司 | A respirator with an improved structure |
-
2013
- 2013-10-15 CN CN201310481511.5A patent/CN104553110B/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5561908A (en) * | 1978-11-06 | 1980-05-10 | Mitsubishi Heavy Ind Ltd | Tanning treatment apparatus of dustproof filter material |
EP1656844A1 (en) * | 2004-11-16 | 2006-05-17 | Moldex-Metric Ag & Co. Kg | Respirator mask |
CN202635663U (en) * | 2011-12-26 | 2013-01-02 | 权盈科技工业有限公司 | A respirator with an improved structure |
Non-Patent Citations (1)
Title |
---|
鹿建春等: "生物防护口罩的研制及其防护效果评价", 《中国消毒学杂志》 * |
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TR01 | Transfer of patent right |
Effective date of registration: 20180222 Address after: The new Taiwan Chinese Taiwan New Taipei City Xizhi District Five Road No. 102 21 floor Patentee after: WEIFENG TECHNOLOGY CO., LTD. Address before: The new Taiwan Chinese Taiwan New Taipei City Xizhi District Five Road No. 106 19 floor Co-patentee before: Li Jiheng Patentee before: Lin Shiquan |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160706 Termination date: 20191015 |