TWI554468B - Methods and devices of producing ozone - Google Patents

Methods and devices of producing ozone Download PDF

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TWI554468B
TWI554468B TW104118460A TW104118460A TWI554468B TW I554468 B TWI554468 B TW I554468B TW 104118460 A TW104118460 A TW 104118460A TW 104118460 A TW104118460 A TW 104118460A TW I554468 B TWI554468 B TW I554468B
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ozone
carbon dioxide
mixed gas
oxygen
gas
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TW201643107A (en
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孔祥丞
魏碧玉
黃國棟
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財團法人工業技術研究院
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臭氧製造方法及裝置 Ozone manufacturing method and device

本揭露係關於一種臭氧製造方法,尤係關於使用紫外光光源之臭氧製造方法。 The present disclosure relates to an ozone manufacturing method, and more particularly to an ozone manufacturing method using an ultraviolet light source.

臭氧具有強氧化力,可分解環境中對人體健康有害的物質,是公認的高效殺菌物質。以臭氧淨化空氣或水質已廣泛地運用在如飲食、醫藥、農業、洗衣等領域。目前,臭氧產生裝置製造臭氧的方式主要區分為高壓放電法(Corona Discharge,CD)及紫外光(Ultraviolet,UV)化學法。 Ozone is a highly effective bactericidal substance that has strong oxidizing power and can decompose substances harmful to human health in the environment. The use of ozone to purify air or water has been widely used in areas such as diet, medicine, agriculture, and laundry. At present, the manner in which ozone generating devices produce ozone is mainly classified into a high pressure discharge method (CD) and an ultraviolet (UV) chemical method.

高壓放電法的原理近似於自然界的放電現象,其係將空氣通入兩個電極板之間,再施加電場使電子在該兩電極板之間移動,受電場驅動的電子提供能量游離空氣的氧分子而產生臭氧。然而,高壓放電法的臭氧產生裝置除了生成臭氧之外,還可能產生具有毒性且經研究證實為致癌物質的氮氧化物(如NOx等)。 The principle of the high-voltage discharge method is similar to the discharge phenomenon in nature, which is to pass air between two electrode plates, and then apply an electric field to move electrons between the two electrode plates, and the electrons driven by the electric field provide energy to free air oxygen. Molecules produce ozone. However, the ozone generating apparatus of the high pressure discharge method may generate nitrogen oxides (e.g., NOx, etc.) which are toxic and have been confirmed to be carcinogenic substances by research, in addition to ozone.

UV化學法係以紫外光照射空氣,波長小於242nm之紫外光可令空氣的氧分子游離,以形成臭氧。UV化學法的臭氧產生裝置主要係使用低壓汞燈或準分子紫外光燈 (Excimer UV,EUV,又稱為介質屏障放電燈(Dielectric barrier discharge,DBD))做為紫外光光源。 The UV chemistry method uses ultraviolet light to illuminate the air. Ultraviolet light with a wavelength of less than 242 nm can liberate the oxygen molecules of the air to form ozone. UV-based ozone generating devices mainly use low-pressure mercury lamps or excimer ultraviolet lamps (Excimer UV, EUV, also known as Dielectric barrier discharge (DBD)) as an ultraviolet light source.

低壓汞燈的放射光譜中能有效產生臭氧之紫外光(如波長185nm)所佔比例通常僅約全部光譜能量的7至15%,因此,低壓汞燈之臭氧產生裝置製造臭氧的效率偏低。 The proportion of ultraviolet light (e.g., wavelength 185 nm) capable of efficiently generating ozone in the emission spectrum of a low-pressure mercury lamp is usually only about 7 to 15% of the total spectral energy. Therefore, the ozone generating device of the low-pressure mercury lamp is inefficient in producing ozone.

EUV燈之燈管內填充有惰性氣體,當施加電場至EUV燈,燈管內之惰性氣體(例如氙Xe)輻射紫外光,空氣中的氧分子受到紫外光的激發而生成臭氧。一般而言,相較於低壓汞燈,EUV燈可產生較高的臭氧濃度。 The lamp tube of the EUV lamp is filled with an inert gas. When an electric field is applied to the EUV lamp, an inert gas (for example, Xe) in the lamp tube radiates ultraviolet light, and oxygen molecules in the air are excited by ultraviolet light to generate ozone. In general, EUV lamps produce higher ozone concentrations than low pressure mercury lamps.

然而,EUV燈作用時所產生的高溫會影響臭氧生成濃度及效率。為了避免高溫影響臭氧生成濃度的問題,現有解決問題的手段包括一方面改良EUV燈之臭氧產生裝置的冷卻結構,另一方面以高純度氧氣做為反應氣體來製造臭氧。此等手段雖可提高臭氧生成濃度,卻因為經改良的裝置結構過於複雜、高純度氧氣不易生產等因素導致製造成本大幅增加,從而此等手段不具實用性。 However, the high temperatures generated by the action of EUV lamps can affect the concentration and efficiency of ozone generation. In order to avoid the problem that the high temperature affects the concentration of ozone generation, the existing means for solving the problem include improving the cooling structure of the ozone generating device of the EUV lamp on the one hand, and producing ozone by using high purity oxygen as the reaction gas on the other hand. Although these methods can increase the concentration of ozone generation, the manufacturing cost is greatly increased due to factors such as an excessively complicated structure of the improved device and difficulty in production of high-purity oxygen, and thus such means are not practical.

因此,如何解決現有臭氧製造技術之種種問題,提高UV化學法製造臭氧之產率,即為發展本揭露之目的。 Therefore, how to solve various problems of the existing ozone manufacturing technology and improve the yield of ozone by the UV chemical method is to develop the purpose of the disclosure.

本揭露提供一種臭氧製造方法,該方法包含:提供包含二氧化碳及氧氣之混合氣體;以及使用準分子紫外光燈照射該混合氣體,以產生臭氧,其中,該準分子紫外光燈填充有選自氦、氖、氬、氪、氙、氟及溴所組成群組之至少一種氣體。 The present disclosure provides a method for producing ozone, comprising: providing a mixed gas containing carbon dioxide and oxygen; and irradiating the mixed gas with an excimer ultraviolet lamp to generate ozone, wherein the excimer ultraviolet lamp is filled with a selected one selected from the group consisting of At least one gas of the group consisting of helium, argon, neon, xenon, fluorine and bromine.

本揭露進一步提供一種臭氧製造裝置,該裝置包含氣體供應單元、反應室以及準分子紫外光燈,該氣體供應單元提供包含氧氣及二氧化碳之混合氣體,該反應室連通該氣體供應單元,該準分子紫外光燈設置於該反應室中且填充有選自氦、氖、氬、氪、氙、氟及溴所組成群組之至少一種氣體。 The present disclosure further provides an ozone manufacturing apparatus comprising a gas supply unit, a reaction chamber, and an excimer ultraviolet light, the gas supply unit providing a mixed gas containing oxygen and carbon dioxide, the reaction chamber communicating with the gas supply unit, the excimer An ultraviolet lamp is disposed in the reaction chamber and filled with at least one gas selected from the group consisting of ruthenium, rhodium, argon, krypton, xenon, fluorine, and bromine.

由於使用包含二氧化碳及氧氣之混合氣體做為反應氣體,經紫外光照射之二氧化碳可促進臭氧生成反應,且二氧化碳可穩定已生成之臭氧,故應用本揭露之臭氧製造方法的裝置除了可以大幅減少反應氣體的生產成本,更可有效提升紫外光光源製造臭氧之產率。 Since a mixed gas containing carbon dioxide and oxygen is used as a reaction gas, carbon dioxide irradiated by ultraviolet light can promote an ozone generation reaction, and carbon dioxide can stabilize the generated ozone, so that the apparatus for applying the ozone manufacturing method of the present disclosure can greatly reduce the reaction. The production cost of gas can effectively improve the yield of ozone produced by ultraviolet light source.

1,1’‧‧‧臭氧製造裝置 1,1'‧‧‧Ozone manufacturing equipment

10,10’‧‧‧氣體供應單元 10,10’‧‧‧ gas supply unit

11‧‧‧反應室 11‧‧‧Reaction room

12‧‧‧準分子紫外光燈 12‧‧‧Excimer UV Lamp

100‧‧‧臭氧濃度偵測器 100‧‧‧Ozone concentration detector

101‧‧‧氧氣源 101‧‧‧Oxygen source

102‧‧‧二氧化碳源 102‧‧‧Carbon dioxide source

103‧‧‧管線 103‧‧‧ pipeline

第1A圖為應用本揭露之臭氧製造方法之裝置示意圖;以及第1B圖為應用本揭露之臭氧製造方法之另一裝置示意圖。 1A is a schematic view of an apparatus for applying the ozone manufacturing method of the present disclosure; and FIG. 1B is a schematic view of another apparatus for applying the ozone manufacturing method of the present disclosure.

以下係藉由特定的具體實施例說明本揭露之實施方式,所屬技術領域具有通常知識者可由本說明書所揭示之內容瞭解本揭露之其他優點與功效。本揭露也可藉由其他不同的具體實施例加以施行或應用,本說明書中的各項細節亦可基於不同觀點與應用,在不悖離本揭露之精神下進行各種修飾與變更。 The embodiments of the present disclosure are described below by way of specific embodiments, and those skilled in the art can understand the other advantages and functions of the disclosure by the contents disclosed in the specification. The present invention may be embodied or applied in various other specific embodiments. The details of the present invention can be variously modified and changed without departing from the spirit and scope of the invention.

除非文中另有說明,說明書及所附申請專利範圍中所 使用之單數形式「一」及「該」包括複數個體。 Unless otherwise stated in the text, the specification and the scope of the appended patent application The singular forms "a" and "the" are used in the plural.

第1A圖為應用本揭露之臭氧製造方法之裝置示意圖。如第1A圖所示,臭氧濃度偵測器100連通臭氧製造裝置1,用以偵測臭氧製造裝置1所製造之臭氧濃度,以供後續之應用。 Figure 1A is a schematic view of an apparatus for applying the ozone manufacturing method of the present disclosure. As shown in FIG. 1A, the ozone concentration detector 100 is connected to the ozone manufacturing apparatus 1 for detecting the ozone concentration produced by the ozone manufacturing apparatus 1 for subsequent application.

臭氧製造裝置1包含氣體供應單元10、反應室11、以及準分子紫外光燈12。氣體供應單元10提供包含氧氣以及二氧化碳之混合氣體,反應室11連通氣體供應單元10,準分子紫外光燈12設置於反應室11中且填充有選自氦、氖、氬、氪、氙、氟及溴所組成群組之至少一種氣體。 The ozone producing apparatus 1 includes a gas supply unit 10, a reaction chamber 11, and an excimer ultraviolet lamp 12. The gas supply unit 10 provides a mixed gas containing oxygen and carbon dioxide, and the reaction chamber 11 is connected to the gas supply unit 10, and the excimer ultraviolet lamp 12 is disposed in the reaction chamber 11 and filled with a group selected from the group consisting of ruthenium, rhodium, argon, krypton, xenon, and fluorine. And at least one gas of the group consisting of bromine.

在本實施例中,氣體供應單元10可為填充有混合特定比例二氧化碳以及氧氣的氣體鋼瓶,氣體供應單元10可設置調節機構(例如流量閥)用以調控該混合氣體的流率(升/分鐘)。 In the present embodiment, the gas supply unit 10 may be filled with a gas cylinder mixed with a specific proportion of carbon dioxide and oxygen, and the gas supply unit 10 may be provided with an adjustment mechanism (for example, a flow valve) for regulating the flow rate of the mixed gas (liters per minute). ).

在其他實施例中,如第1B圖所示,臭氧製造裝置1’的氣體供應單元10’可由氧氣源101、二氧化碳源102以及管線103所組成,管線103分別連通氧氣源101、二氧化碳源102以及反應室11。氧氣源101與二氧化碳源102可為氧氣鋼瓶與二氧化碳鋼瓶,氧氣源101與二氧化碳源102的純度並無特別限制,例如90%、93%、95%、99%。氧氣源101與二氧化碳源102分別設置有調節機構用以調控氧氣與二氧化碳的流率比例,而特定流率比例的氧氣與二氧化碳經由管線103形成該混合氣體,再輸送至反應室11。 In other embodiments, as shown in FIG. 1B, the gas supply unit 10' of the ozone manufacturing apparatus 1' may be composed of an oxygen source 101, a carbon dioxide source 102, and a line 103, which respectively connect the oxygen source 101, the carbon dioxide source 102, and Reaction chamber 11. The oxygen source 101 and the carbon dioxide source 102 may be oxygen cylinders and carbon dioxide cylinders, and the purity of the oxygen source 101 and the carbon dioxide source 102 is not particularly limited, for example, 90%, 93%, 95%, and 99%. The oxygen source 101 and the carbon dioxide source 102 are respectively provided with adjustment mechanisms for regulating the flow rate ratio of oxygen to carbon dioxide, and oxygen and carbon dioxide of a specific flow rate ratio form the mixed gas via the line 103, and are then sent to the reaction chamber 11.

於該混合氣體中,二氧化碳與氧氣之體積比可介於 1:9至3:1,例如1:9、1:3、1:1、3:2或3:1,但不以此為限。具體而言,以混合氣體中純氧氣與純二氧化碳之總體積計算,氧氣之體積百分比例如是90%、75%、50%、40%或25%,而二氧化碳之體積百分比例如是10%、25%、50%、60%或75%,但不以此為限。 In the mixed gas, the volume ratio of carbon dioxide to oxygen may be 1:9 to 3:1, such as 1:9, 1:3, 1:1, 3:2, or 3:1, but not limited to this. Specifically, the volume percentage of oxygen is, for example, 90%, 75%, 50%, 40% or 25%, based on the total volume of pure oxygen and pure carbon dioxide in the mixed gas, and the volume percentage of carbon dioxide is, for example, 10%, 25 %, 50%, 60% or 75%, but not limited to this.

反應室11具有氣體通道及相對之氣體入口及氣體出口,氣體入口與氣體出口分別連通氣體供應單元10與臭氧濃度偵測器100。 The reaction chamber 11 has a gas passage and a gas inlet and a gas outlet, and the gas inlet and the gas outlet communicate with the gas supply unit 10 and the ozone concentration detector 100, respectively.

準分子紫外光燈12設置於反應室11之該氣體通道中。準分子紫外光燈12之構造或型式並無特別限制,其可全文參照第201419372號台灣專利或第101106058號中國專利所揭示之介電質屏障放電燈,並將其內容併入本文。 The excimer ultraviolet lamp 12 is disposed in the gas passage of the reaction chamber 11. The structure or type of the excimer ultraviolet lamp 12 is not particularly limited, and the dielectric barrier discharge lamp disclosed in Japanese Patent No. 201419372 or Chinese Patent No. 101106058 is incorporated by reference in its entirety.

準分子紫外光燈12填充有選自氦、氖、氬、氪、氙、氟及溴所組成群組之至少一種氣體,此等氣體於電場中受激發而輻射之紫外光屬於真空紫外光(vacuum UV,VUV)之波長範圍(即200至100nm)。 The excimer ultraviolet lamp 12 is filled with at least one gas selected from the group consisting of ruthenium, osmium, argon, krypton, xenon, fluorine, and bromine, and the ultraviolet light that is excited by the gas in the electric field belongs to vacuum ultraviolet light ( The range of wavelengths of vacuum UV (VUV) (ie 200 to 100 nm).

本揭露之臭氧製造方法包含:以氣體供應單元10提供包含二氧化碳及氧氣之混合氣體;以及使用準分子紫外光燈12照射該混合氣體,以產生臭氧。 The ozone production method of the present disclosure includes: supplying a mixed gas containing carbon dioxide and oxygen with a gas supply unit 10; and irradiating the mixed gas with an excimer ultraviolet lamp 12 to generate ozone.

具體而言,將準分子紫外光燈12設置於反應室11後,接著,開啟氣體供應單元10以輸送該混合氣體通過反應室11,輸送該混合氣體通過反應室11之流率可依實際需求而調整,例如3L/min、6L/min、9L/min,換言之,可以3至9L/min之流率輸送該混合氣體通過反應室11,但不以 此為限。之後,施加電壓至準分子紫外光燈12,準分子紫外光燈12所填充之氣體受電場激發而輻射紫外光照射流通經過反應室11之該混合氣體。照射該混合氣體之紫外光波長不大於185奈米,以氙氣為例,氙氣所輻射之紫外光之主要波長為172nm、150nm及147nm。 Specifically, after the excimer ultraviolet lamp 12 is disposed in the reaction chamber 11, then the gas supply unit 10 is turned on to transport the mixed gas through the reaction chamber 11, and the flow rate of the mixed gas through the reaction chamber 11 can be adjusted according to actual needs. And adjustment, for example, 3 L / min, 6 L / min, 9 L / min, in other words, the mixed gas can be transported through the reaction chamber 11 at a flow rate of 3 to 9 L / min, but not This is limited. Thereafter, a voltage is applied to the excimer ultraviolet lamp 12, and the gas filled by the excimer ultraviolet lamp 12 is excited by the electric field to radiate ultraviolet light to illuminate the mixed gas flowing through the reaction chamber 11. The wavelength of the ultraviolet light irradiated to the mixed gas is not more than 185 nm, and in the case of helium gas, the main wavelengths of the ultraviolet light radiated by the helium gas are 172 nm, 150 nm, and 147 nm.

根據研究,UV照射氧分子生成臭氧之反應係包含下列反應式:反應式1:O2+UV→2O,其中UV之波長介於185至240nm。 According to research, the reaction of UV irradiation of oxygen molecules to generate ozone comprises the following reaction formula: Reaction formula 1: O 2 + UV → 2O, wherein the wavelength of UV is between 185 and 240 nm.

反應式2:O+O2+M→O3+M+反應熱(-106.6kJ/mole),其中反應式2為放熱反應,M表示中性之第三氣體,通常不參與反應,其主要作用為吸收反應熱以穩定生成之臭氧。 Reaction formula 2: O + O 2 + M → O 3 + M + reaction heat (-106.6 kJ / mole), wherein the reaction formula 2 is an exothermic reaction, M represents a neutral third gas, usually does not participate in the reaction, its main role To absorb the heat of reaction to stabilize the generated ozone.

進一步來說,各種分子鍵具有鍵能,若以施予對應該鍵能之特定波長的紫外光,該分子鍵即可被破壞而進行化學反應。與本揭露有關之各種分子鍵的鍵能及各鍵能所對應之波長列示於表1。 Further, various molecular bonds have a bond energy, and if ultraviolet light of a specific wavelength corresponding to the bond energy is applied, the molecular bond can be destroyed to carry out a chemical reaction. The bond energies of the various molecular bonds related to the present disclosure and the wavelengths corresponding to the respective bond energies are shown in Table 1.

如表1所示,二氧化碳分子的C=O鍵能為724.2kJ/mole,該鍵能所對應的紫外光波長為164.7nm,亦即,波長短於164.7nm之紫外光(如氙氣所輻射波長為150nm 及147nm之紫外光)可提供足夠的能量破壞二氧化碳分子的C=O以生成CO+O或C+O2。而CO的化學活性極高,可與氧分子作用生成額外的氧原子,此額外的氧原子可進一步與氧分子結合生成臭氧,從而提升臭氧之產率。 As shown in Table 1, the C=O bond energy of the carbon dioxide molecule is 724.2 kJ/mole, and the wavelength of the ultraviolet light corresponding to the bond energy is 164.7 nm, that is, the ultraviolet light having a wavelength shorter than 164.7 nm (such as the wavelength of the helium gas). and the ultraviolet light is 147nm) 150 nm provide enough energy to destroy the carbon dioxide molecules to form C = O or CO + O C + O 2. The chemical activity of CO is extremely high, and it can react with oxygen molecules to form additional oxygen atoms. This additional oxygen atom can further combine with oxygen molecules to form ozone, thereby increasing the yield of ozone.

於本揭露中,混合氣體的二氧化碳促進臭氧生成之反應機制據信包含下列反應式:反應式3:CO2+UV → CO+O In the present disclosure, the reaction mechanism of the mixed gas carbon dioxide to promote ozone generation is believed to include the following reaction formula: Reaction Formula 3: CO 2 + UV → CO + O

反應式4:CO2+UV → C+O2 Reaction formula 4: CO 2 + UV → C + O 2

反應式5:C+O → CO Reaction formula 5: C+O → CO

反應式6:CO+O2 → CO2+O Reaction formula 6: CO + O 2 → CO 2 + O

反應式7:O+O2 → O3 Reaction formula 7: O+O 2 → O 3

藉由上述反應機制,經紫外光分解之二氧化碳可有效促進臭氧之生成。再者,未分解之二氧化碳可吸收反應式2之反應熱,具有穩定已生成之臭氧的功能,從而確保臭氧產率。 By the above reaction mechanism, carbon dioxide decomposed by ultraviolet light can effectively promote the formation of ozone. Further, the undecomposed carbon dioxide can absorb the heat of reaction of the reaction formula 2, and has a function of stabilizing the generated ozone, thereby ensuring the ozone yield.

表2為混合不同比例之氧氣及二氧化碳的混合氣體(實施例1至5)與純氧氣(比較例)製造臭氧的實施結果。 Table 2 shows the results of the production of ozone by mixing gases of different ratios of oxygen and carbon dioxide (Examples 1 to 5) and pure oxygen (Comparative Example).

如表2所示,對照使用純氧氣作為反應氣體之比較例可知,依據本揭露之方法,各種混合比例的混合氣體皆可有效提升臭氧的產率。而本揭露之方法應用於連續式反應中,換算每單位之EUV消耗功率,臭氧產率可達到32毫克/小時-瓦(mg/hr-W)以上,且不會產生任何有毒副產物。 As shown in Table 2, in comparison with the comparative example using pure oxygen as the reaction gas, according to the method of the present disclosure, the mixed gas of various mixing ratios can effectively increase the yield of ozone. While the method of the present disclosure is applied to a continuous reaction, the EUV power consumption per unit can be converted to an ozone yield of 32 mg/hr-watt (mg/hr-W) or more without any toxic by-products.

綜上所述,於本揭露之臭氧製造方法,由於使用包含二氧化碳及氧氣之混合氣體做為反應氣體,經紫外光照射之二氧化碳可促進臭氧生成反應,且二氧化碳可穩定已生成之臭氧,故應用本揭露之臭氧製造方法的裝置除了可以 大幅減少反應氣體的生產成本,更可有效提升紫外光光源製造臭氧之產率。 In summary, in the ozone manufacturing method disclosed in the present invention, since a mixed gas containing carbon dioxide and oxygen is used as a reaction gas, carbon dioxide irradiated by ultraviolet light can promote an ozone generation reaction, and carbon dioxide can stabilize the generated ozone, so application The apparatus for the ozone manufacturing method of the present disclosure may be The production cost of the reaction gas is greatly reduced, and the yield of ozone produced by the ultraviolet light source can be effectively improved.

上述實施例僅例示性說明,而非用於限制本揭露。任何熟習此項技藝之人士均可在不違背本揭露之精神及範疇下,對上述實施例進行修飾與改變。因此,本揭露之權利保護範圍,應如本案所附之申請專利範圍所載。 The above embodiments are merely illustrative and are not intended to limit the disclosure. Any of the above-described embodiments may be modified and altered by those skilled in the art without departing from the spirit and scope of the disclosure. Therefore, the scope of protection of the present disclosure should be as set forth in the scope of the patent application attached to this application.

1‧‧‧臭氧製造裝置 1‧‧‧Ozone manufacturing equipment

10‧‧‧氣體供應單元 10‧‧‧ gas supply unit

11‧‧‧反應室 11‧‧‧Reaction room

12‧‧‧準分子紫外光燈 12‧‧‧Excimer UV Lamp

100‧‧‧臭氧濃度偵測器 100‧‧‧Ozone concentration detector

Claims (8)

一種臭氧製造方法,包含:提供包含二氧化碳及氧氣之混合氣體,其中,於該混合氣體中,該二氧化碳與該氧氣之體積比係介於1:9至3:1;以及使用準分子紫外光燈照射該混合氣體,以產生臭氧,其中,該準分子紫外光燈填充有選自氦、氖、氬、氪、氙、氟及溴所組成群組之至少一種氣體。 An ozone production method comprising: providing a mixed gas comprising carbon dioxide and oxygen, wherein a volume ratio of the carbon dioxide to the oxygen is between 1:9 and 3:1 in the mixed gas; and using an excimer ultraviolet lamp The mixed gas is irradiated to generate ozone, wherein the excimer ultraviolet lamp is filled with at least one gas selected from the group consisting of ruthenium, rhodium, argon, krypton, xenon, fluorine, and bromine. 如申請專利範圍第1項所述之臭氧製造方法,其中,於該混合氣體中,該二氧化碳與該氧氣之體積比係介於1:3至3:2。 The method for producing ozone according to claim 1, wherein in the mixed gas, the volume ratio of the carbon dioxide to the oxygen is between 1:3 and 3:2. 如申請專利範圍第1項所述之臭氧製造方法,其中,使用該準分子紫外光燈照射該混合氣體之步驟包含:設置該準分子紫外光燈於反應室中;以及輸送該混合氣體通過該反應室。 The method for producing ozone according to claim 1, wherein the step of irradiating the mixed gas using the excimer ultraviolet lamp comprises: disposing the excimer ultraviolet lamp in a reaction chamber; and conveying the mixed gas through the Reaction chamber. 如申請專利範圍第3項所述之臭氧製造方法,其中,輸送該混合氣體通過該反應室之流率係介於3至9升/分鐘(L/min)。 The method for producing ozone according to claim 3, wherein the flow rate of the mixed gas passing through the reaction chamber is between 3 and 9 liters per minute (L/min). 如申請專利範圍第1項所述之臭氧製造方法,其中,該準分子紫外光燈照射該混合氣體之紫外光波長不大於185奈米。 The method for producing ozone according to claim 1, wherein the excimer ultraviolet lamp irradiates the mixed gas with an ultraviolet light having a wavelength of not more than 185 nm. 如申請專利範圍第1項所述之臭氧製造方法,其中,產生臭氧之產率大於32毫克/小時-瓦(mg/hr-W)。 The method for producing ozone according to claim 1, wherein the ozone yield is greater than 32 mg/hr-watt (mg/hr-W). 一種臭氧製造裝置,包含: 氣體供應單元,用以提供包含氧氣以及二氧化碳之混合氣體,其中,於該混合氣體中,該二氧化碳與該氧氣之體積比係介於1:9至3:1;反應室,係連通該氣體供應單元;以及準分子紫外光燈,係設置於該反應室中且填充有選自氦、氖、氬、氪、氙、氟及溴所組成群組之至少一種氣體。 An ozone manufacturing device comprising: a gas supply unit for providing a mixed gas containing oxygen and carbon dioxide, wherein a volume ratio of the carbon dioxide to the oxygen is between 1:9 and 3:1 in the mixed gas; the reaction chamber is connected to the gas supply And an excimer ultraviolet lamp disposed in the reaction chamber and filled with at least one gas selected from the group consisting of ruthenium, rhodium, argon, krypton, xenon, fluorine, and bromine. 如申請專利範圍第7項所述之臭氧製造裝置,其中,該氣體供應單元包含氧氣源、二氧化碳源以及管線,其中,該管線分別連通該氧氣源、該二氧化碳源與該反應室。 The ozone manufacturing apparatus according to claim 7, wherein the gas supply unit comprises an oxygen source, a carbon dioxide source, and a pipeline, wherein the pipeline is connected to the oxygen source, the carbon dioxide source, and the reaction chamber, respectively.
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* Cited by examiner, † Cited by third party
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