TWI548124B - Flip chip light emitting device and package structure thereof - Google Patents

Flip chip light emitting device and package structure thereof Download PDF

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TWI548124B
TWI548124B TW102118653A TW102118653A TWI548124B TW I548124 B TWI548124 B TW I548124B TW 102118653 A TW102118653 A TW 102118653A TW 102118653 A TW102118653 A TW 102118653A TW I548124 B TWI548124 B TW I548124B
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layer
type semiconductor
conductive
semiconductor layer
conductive contact
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TW102118653A
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TW201445784A (en
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楊凱任
沈志秋
林裕承
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崴發控股有限公司
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覆晶式發光二極體元件及其封裝結構 Flip-chip LED component and package structure thereof

一種覆晶式發光二極體元件及其封裝結構,尤其是指一種具有側邊保護層及螢光轉換層之覆晶式發光二極體元件及其封裝結構。 A flip-chip light-emitting diode element and a package structure thereof, in particular, a flip-chip light-emitting diode element having a side protection layer and a fluorescent conversion layer and a package structure thereof.

覆晶式發光二極體的提出,是為了解決習知發光二極體結構中,出光為電極阻擋而效率不佳的問題;而覆晶封裝技術的提出,是為了解決傳統IC計算晶片對於電性的過度敏感問題。傳統IC晶粒被封裝成晶片時,需經打線(Wire Bonding)步驟,但打線步驟不僅會增加整個製程複雜度,且會衍生額外的電感效應,故覆晶封裝技術遂被提出以覆晶轉接板來取代打線步驟。後續有基於相同思維,將覆晶封裝技術用於覆晶式發光二極體上,以獲致相同效果。 The flip-chip light-emitting diode is proposed to solve the problem that the light-emitting diode barrier is inefficient in the conventional light-emitting diode structure; and the flip chip packaging technology is proposed to solve the traditional IC-calculated wafer for electricity. Sexual hypersensitivity issues. When a conventional IC die is packaged into a wafer, a wire bonding step is required, but the wire bonding step not only increases the complexity of the entire process, but also introduces an additional inductance effect, so the flip chip package technology is proposed to flip the crystal. Replace the board to replace the wire step. Subsequent to the same thinking, the flip chip packaging technology was applied to the flip-chip light-emitting diode to achieve the same effect.

覆晶式發光二極體與印刷電路板具有多種封裝形式,以下舉一常見之封裝形式說明之。 Flip-chip LEDs and printed circuit boards are available in a variety of package styles, as described in the following.

請參考第1圖,第1圖繪示傳統覆晶(flip chip)式發光二極體封裝製程流程圖。傳統覆晶型發光二極體製程包含下列 步驟:步驟101中,將晶圓(wafer)上形成的多個晶粒(die)110進行擴晶後,使各晶粒110間隔加大,以利於後續吸取步驟;步驟102中,利用一第一機器手臂210及其真空吸嘴211將晶粒110取下,晶粒110上並具有突塊(Bump)111;步驟103中,利用第一機器手臂210進行晶粒110翻轉;步驟104中,晶粒110被翻轉後由一第二機器手臂220及其真空吸嘴221接著後續製程。步驟105中,將晶粒110上的突塊111精準定位在一覆晶轉接板(Board)120上的導電接點121;步驟106中,加熱突塊111,使晶粒110與覆晶轉接板120電性連接;步驟107中,利用點膠技術填充晶粒110與覆晶轉接板120間的空隙,完成一晶片(chip)130的封裝製作;此時,通常需再對晶片130進行一次烘烤,以固化點膠時的填充材料。至此,晶片130方為一可直接使用的產品。實際應用時,晶片130利用覆晶轉接板120上預設的導電結構,與一印刷電路板(PCB)上的電路再進行電性連接。 Please refer to FIG. 1 , which illustrates a flow chart of a conventional flip chip type LED package process. The traditional flip-chip type photodiode process includes the following Step: In step 101, after a plurality of die 110 formed on a wafer is crystallized, the gaps of the die 110 are increased to facilitate a subsequent suction step; in step 102, a first A robot arm 210 and its vacuum nozzle 211 remove the die 110, and the die 110 has a bump 111. In step 103, the die 110 is flipped by the first robot arm 210; in step 104, After the die 110 is turned over, the second robot arm 220 and its vacuum nozzle 221 are followed by subsequent processes. In step 105, the bumps 111 on the die 110 are accurately positioned on the conductive contacts 121 on the flip-chip board 120. In step 106, the bumps 111 are heated to turn the die 110 and the flip chip. The board 120 is electrically connected; in step 107, the gap between the die 110 and the flip chip 120 is filled by a dispensing technique to complete the package fabrication of a chip 130; A baking is performed to cure the filling material at the time of dispensing. So far, the wafer 130 is a ready-to-use product. In practical applications, the wafer 130 is electrically connected to a circuit on a printed circuit board (PCB) by using a predetermined conductive structure on the flip-chip board 120.

近來為了形成高功率白光發光二極體,其中一種常用方法為使用發光二極體晶粒與螢光轉換層配合,藉由發光二極體晶粒本身的發光,對螢光轉換層形成二次激發,令兩者之發光互相搭配而形成白光。 Recently, in order to form a high-power white light-emitting diode, one of the commonly used methods is to use a light-emitting diode die to cooperate with a fluorescent conversion layer, and to form a fluorescent conversion layer twice by the light emission of the light-emitting diode die itself. Excitation, so that the two lights together to form a white light.

在上述第1圖所揭示的封裝製程中,若需利用晶片130與螢光轉換層搭配進行調光的功效,則前案中,有如步驟108所示,將螢光粉混合於點膠時的填充材料中,並使填充材料與螢光粉混合物覆蓋於晶粒110上。使晶粒110發光透過螢光粉後,產生調光效果。 In the packaging process disclosed in FIG. 1 above, if the effect of dimming by using the wafer 130 and the fluorescent conversion layer is required, in the foregoing case, as shown in step 108, the fluorescent powder is mixed in the dispensing. The filler material is filled with a filler material and a phosphor powder mixture over the die 110. After the crystal grains 110 are emitted and transmitted through the phosphor powder, a dimming effect is produced.

此外,亦有其他型式的覆晶式發光二極體晶粒與 螢光粉的封裝方法,例如將覆晶式發光二極體晶粒置於一杯體中,再將螢光粉倒入於杯體內覆蓋覆晶式發光二極體晶粒,而在覆晶式發光二極體晶粒上形成一螢光轉換層。 In addition, there are other types of flip-chip LEDs and The method of encapsulating the phosphor powder, for example, placing the flip-chip light-emitting diode die in a cup body, and then pouring the phosphor powder into the cup body to cover the flip-chip light-emitting diode crystal grain, and in the flip chip type A phosphor conversion layer is formed on the light emitting diode crystal grains.

然而,不論何種方式,螢光轉換層的形成,皆需 於最後製程中,再填入覆蓋發光二極體晶粒,此導致製程的自由度受到限制。且需額外的螢光粉封裝製程,此亦造成製造成本的上升。再者,由於發光二極體晶片本身不具有抗濕氣、防氧化、防外力等作用,因此需增加後段封裝製程後,才能與印刷電路板結合形成最終之成品。也因此,需額外添購打線固晶機、覆晶機及灌膠機等設備。此不僅造成額外成本的支出,且造成工時的延長,因而導致產能下降以及造成不良率的提高。 However, no matter what the way, the formation of the fluorescent conversion layer needs In the final process, the illuminating diode dies are refilled, which limits the freedom of the process. And an additional phosphor packaging process is required, which also causes an increase in manufacturing costs. Furthermore, since the LED chip itself does not have the functions of resisting moisture, oxidation, and external force, it is necessary to add a post-packaging process to form a final product in combination with the printed circuit board. Therefore, additional equipment such as wire bonding machine, flip chip machine and glue filling machine are required. This not only causes additional cost expenditures, but also leads to an increase in working hours, which leads to a decrease in production capacity and an increase in the non-performing rate.

為解決上述問題,本發明提供一種覆晶式發光二極體元件及其封裝結構。覆晶式發光二極體元件藉由側面保護層之形成,可保護覆晶式發光二極體元件免於受外界應力及環境(溫濕度、氧氣等)破壞,進而延長覆晶式發光二極體元件壽命。再者,藉由保護層及大面積之導電接觸層搭配導電接合墊設計,覆晶式發光二極體元件本身可免除後續封裝製程而能單獨使用,可大幅節省製造成本。 In order to solve the above problems, the present invention provides a flip-chip type light emitting diode element and a package structure thereof. The flip-chip light-emitting diode element can protect the flip-chip light-emitting diode component from external stress and environment (temperature, humidity, oxygen, etc.) by forming a side protective layer, thereby prolonging the flip-chip light-emitting diode Body component life. Moreover, by the protective layer and the large-area conductive contact layer combined with the conductive bonding pad design, the flip-chip LED component itself can be used alone without the subsequent packaging process, and the manufacturing cost can be greatly saved.

本發明之一態樣在提供一種覆晶式發光二極體元件,包含一第一型半導體層、一第二型半導體層、一第一導電接觸層、一第二導電接觸層、一第一導電接合墊、一第二導電接合 墊、一隔離層、一保護層、一螢光轉換層以及一平衡電極圖案層。第二型半導體層形成於第一型半導體層上。第一導電接觸層形成於第一型半導體層上且不接觸第二型半導體層,且第一導電接觸層具有一裸露面。第一導電接合墊電性連接於第一導電接觸層上。第二導電接觸層形成於第二型半導體層上,且第二導電接觸層具有一裸露面。第二導電接合墊電性連接於第一導電接觸層上。隔離層形成於第一導電接觸層與第二導電接觸層之間,藉以電性隔絕第一導電接觸層與第二導電接觸層。保護層形成於第一型半導體層、第二型半導體層、第一導電接觸層及第二導電接觸層之側邊。螢光轉換層覆蓋第一型半導體層之一表面。平衡電極圖案層電性連接第一型半導體層及第二型半導體層,藉以使通過覆晶式發光二極體元件之電流分佈均勻。其中,第一導電接合墊之面積及第二導電接合墊之面積皆大於10000微米平方。 One aspect of the present invention provides a flip-chip light emitting diode device including a first type semiconductor layer, a second type semiconductor layer, a first conductive contact layer, a second conductive contact layer, and a first Conductive bond pad, a second conductive bond a pad, an isolation layer, a protective layer, a fluorescent conversion layer, and a balanced electrode pattern layer. The second type semiconductor layer is formed on the first type semiconductor layer. The first conductive contact layer is formed on the first type semiconductor layer and does not contact the second type semiconductor layer, and the first conductive contact layer has an exposed surface. The first conductive bonding pad is electrically connected to the first conductive contact layer. The second conductive contact layer is formed on the second type semiconductor layer, and the second conductive contact layer has an exposed surface. The second conductive bonding pad is electrically connected to the first conductive contact layer. The isolation layer is formed between the first conductive contact layer and the second conductive contact layer to electrically isolate the first conductive contact layer from the second conductive contact layer. The protective layer is formed on a side of the first type semiconductor layer, the second type semiconductor layer, the first conductive contact layer, and the second conductive contact layer. The fluorescent conversion layer covers one surface of the first type semiconductor layer. The balanced electrode pattern layer is electrically connected to the first type semiconductor layer and the second type semiconductor layer, so that the current distribution through the flip chip type light emitting diode element is uniform. The area of the first conductive bonding pad and the area of the second conductive bonding pad are both greater than 10,000 micrometers square.

根據一實施例,螢光轉換層覆蓋保護層之至少一表面及側邊,且螢光轉換層可包含螢光粉。此外,保護層可與第一型半導體層形成一容置空間,供容置螢光轉換層。另外,螢光轉換層可為一固體螢光片,固體螢光片面積大於或等於第一型半導體層面積。 According to an embodiment, the fluorescent conversion layer covers at least one surface and sides of the protective layer, and the fluorescent conversion layer may include phosphor powder. In addition, the protective layer can form an accommodating space with the first type semiconductor layer for accommodating the fluorescent conversion layer. In addition, the fluorescent conversion layer can be a solid fluorescent sheet having a solid fluorescent sheet area greater than or equal to the area of the first type semiconductor layer.

本發明之另一態樣在提供一種覆晶式發光二極體元件,包含一透明基板、一第一型半導體層、一第二型半導體層、一第一導電接觸層、一第二導電接觸層、一第一導電接合墊、一第二導電接合墊、一隔離層、一保護層以及一平衡電極圖案層。第一型半導體層形成於透明基板上,其中透明基板面積大於第一型半導體層面積。第二型半導體層形成於第一型半導體層上。第 一導電接觸層形成於第一型半導體層上且不接觸第二型半導體層,且第一導電接觸層具有一裸露面。第一導電接合墊電性連接於第一導電接觸層上。第二導電接觸層形成於第二型半導體層上,且第二導電接觸層具有一裸露面。第二導電接合墊電性連接於第二導電接觸層上。隔離層形成於第一導電接觸層與第二導電接觸層之間,藉以電性隔絕第一導電接觸層與第二導電接觸層。保護層形成於第一型半導體層、第二型半導體層、第一導電接觸層及第二導電接觸層之側邊。平衡電極圖案層電性連接第一型半導體層及第二型半導體層,藉以使通過覆晶式發光二極體元件之電流分佈均勻。其中,第一導電接合墊之面積及第二導電接合墊之面積皆大於10000微米平方。 Another aspect of the present invention provides a flip chip type LED device comprising a transparent substrate, a first type semiconductor layer, a second type semiconductor layer, a first conductive contact layer, and a second conductive contact. a layer, a first conductive bond pad, a second conductive bond pad, an isolation layer, a protective layer, and a balance electrode pattern layer. The first type semiconductor layer is formed on the transparent substrate, wherein the transparent substrate area is larger than the area of the first type semiconductor layer. The second type semiconductor layer is formed on the first type semiconductor layer. First A conductive contact layer is formed on the first type semiconductor layer and does not contact the second type semiconductor layer, and the first conductive contact layer has an exposed surface. The first conductive bonding pad is electrically connected to the first conductive contact layer. The second conductive contact layer is formed on the second type semiconductor layer, and the second conductive contact layer has an exposed surface. The second conductive bonding pad is electrically connected to the second conductive contact layer. The isolation layer is formed between the first conductive contact layer and the second conductive contact layer to electrically isolate the first conductive contact layer from the second conductive contact layer. The protective layer is formed on a side of the first type semiconductor layer, the second type semiconductor layer, the first conductive contact layer, and the second conductive contact layer. The balanced electrode pattern layer is electrically connected to the first type semiconductor layer and the second type semiconductor layer, so that the current distribution through the flip chip type light emitting diode element is uniform. The area of the first conductive bonding pad and the area of the second conductive bonding pad are both greater than 10,000 micrometers square.

根據一實施例,覆晶式發光二極體元件更包含一螢光轉換層。螢光轉換層可覆蓋透明基板之一表面,或覆蓋透明基板之至少一表面及側邊;且螢光轉換層可包含螢光粉;或螢光轉換層為一固體螢光片,固體螢光片面積大於或等於透明基板面積。此外,透明基板面積大於第一型半導體層面積。另外,覆晶式發光二極體元件更可包含一金屬反射層,形成於第二型半導體層與第二導電接合墊之間。並且,第一導電接合墊與第二導電接合墊或第二導電接合墊與第一導電接合墊面積比例為0.1:1至1:1。 According to an embodiment, the flip-chip light emitting diode element further comprises a fluorescent conversion layer. The fluorescent conversion layer may cover one surface of the transparent substrate or cover at least one surface and the side of the transparent substrate; and the fluorescent conversion layer may comprise fluorescent powder; or the fluorescent conversion layer is a solid fluorescent sheet, solid fluorescent The sheet area is greater than or equal to the transparent substrate area. Further, the transparent substrate area is larger than the area of the first type semiconductor layer. In addition, the flip-chip LED component may further comprise a metal reflective layer formed between the second semiconductor layer and the second conductive bonding pad. Moreover, the first conductive bonding pad and the second conductive bonding pad or the second conductive bonding pad and the first conductive bonding pad have an area ratio of 0.1:1 to 1:1.

本發明之又一態樣在提供一種應用上述覆晶式發光二極體元件的封裝結構,包含一覆晶式發光二極體元件、二接合層及一印刷電路板。二接合層分別形成於第一導電接合墊及第一導電接合墊上。印刷電路板具有分別相對於 第一導電接合墊及第二導電接合墊位置之一第一電路接合部及一第二電路接合部,並透過二接合層令第一電路接合部及第二電路接合部分別與第一導電接合墊及第二導電接合墊連接而電性導通。 Another aspect of the present invention provides a package structure using the above-described flip-chip light-emitting diode element, comprising a flip-chip light-emitting diode element, a bonding layer, and a printed circuit board. The two bonding layers are respectively formed on the first conductive bonding pad and the first conductive bonding pad. Printed circuit board has a relative to The first conductive bonding pad and the second conductive bonding pad are disposed at the first circuit bonding portion and the second circuit bonding portion, and the first circuit bonding portion and the second circuit bonding portion are respectively coupled to the first conductive bonding through the two bonding layers The pad and the second conductive bond pad are electrically connected.

根據一實施例,第一電路接合部面積及第二電路 接合部面積總合小於或等於覆晶式發光二極體元件2倍總面積。此外,第一、第二導電接合墊與第第一、第二電路接合部電性連接使用一錫膏,且鍚膏厚度大於等於20微米,於黏合後,錫膏爬膠高度小於覆晶式發光二極體元件高度的30%或無爬膠。 According to an embodiment, the first circuit junction area and the second circuit The total joint area is less than or equal to 2 times the total area of the flip-chip light-emitting diode element. In addition, the first and second conductive bonding pads are electrically connected to the first and second circuit bonding portions to form a solder paste, and the thickness of the solder paste is greater than or equal to 20 micrometers. After bonding, the solder paste height is less than the flip chip type. 30% of the height of the LED component or no creepage.

101-108‧‧‧步驟 101-108‧‧‧Steps

110‧‧‧晶粒 110‧‧‧ grain

111‧‧‧突塊 111‧‧‧Bumps

120‧‧‧覆晶轉接板 120‧‧‧Foiled Adapter Plate

121‧‧‧導電接點 121‧‧‧Electrical contacts

130‧‧‧晶片 130‧‧‧ wafer

210‧‧‧第一機器手臂 210‧‧‧First robotic arm

211、221‧‧‧真空吸嘴 211, 221‧‧‧ vacuum nozzle

220‧‧‧第二機器手臂 220‧‧‧Second robotic arm

309‧‧‧第二導電接合墊 309‧‧‧Second conductive bonding pad

310‧‧‧容置空間 310‧‧‧ accommodating space

311‧‧‧平衡電極圖案層 311‧‧‧Balance electrode pattern layer

400‧‧‧覆晶式發光二極體元件 400‧‧‧Flip-chip LED components

401‧‧‧第一型半導體層 401‧‧‧First type semiconductor layer

402‧‧‧第二型半導體層 402‧‧‧Second type semiconductor layer

403‧‧‧第一導電接觸層 403‧‧‧First conductive contact layer

404‧‧‧第二導電接觸層 404‧‧‧Second conductive contact layer

405‧‧‧隔離層 405‧‧‧Isolation

300‧‧‧覆晶式發光二極體元件 300‧‧‧Flip-chip LED components

301‧‧‧第一型半導體層 301‧‧‧First type semiconductor layer

301a‧‧‧表面 301a‧‧‧ surface

302‧‧‧第二型半導體層 302‧‧‧Second type semiconductor layer

303‧‧‧第一導電接觸層 303‧‧‧First conductive contact layer

304‧‧‧第二導電接觸層 304‧‧‧Second conductive contact layer

305‧‧‧隔離層 305‧‧‧Isolation

306‧‧‧保護層 306‧‧‧Protective layer

307‧‧‧螢光轉換層 307‧‧‧Fluorescent conversion layer

308‧‧‧第一導電接合墊 308‧‧‧First conductive bonding pad

406‧‧‧保護層 406‧‧‧Protective layer

407‧‧‧螢光轉換層 407‧‧‧Fluorescent conversion layer

408‧‧‧第一導電接合墊 408‧‧‧First conductive bonding pad

409‧‧‧第二導電接合墊 409‧‧‧Second conductive bonding pad

410‧‧‧透明基板 410‧‧‧Transparent substrate

410a‧‧‧表面 410a‧‧‧ surface

411‧‧‧金屬反射層 411‧‧‧Metal reflector

500‧‧‧封裝結構 500‧‧‧Package structure

501‧‧‧印刷電路板 501‧‧‧Printed circuit board

502a‧‧‧第一電路接合部 502a‧‧‧First circuit joint

502b‧‧‧第二電路接合部 502b‧‧‧Second circuit junction

503‧‧‧接合層 503‧‧‧ joint layer

第1圖繪示傳統覆晶式發光二極體封裝製程流程圖。 FIG. 1 is a flow chart showing a conventional flip-chip LED package process.

第2圖繪示依據本發明之覆晶式發光二極體元件之一實施例結構示意圖。 FIG. 2 is a schematic view showing the structure of an embodiment of a flip chip type LED device according to the present invention.

第3圖繪示依據第2圖中平衡電極圖案層之一實施例示意圖。 FIG. 3 is a schematic view showing an embodiment of a balanced electrode pattern layer according to FIG. 2.

第4圖繪示依據第2圖中保護層與螢光轉換層組合結構之另一實施例示意圖。 FIG. 4 is a schematic view showing another embodiment of the combined structure of the protective layer and the fluorescent conversion layer according to FIG. 2.

第5圖繪示依據第2圖中保護層與螢光轉換層組合結構之再一實施例示意圖。 FIG. 5 is a schematic view showing still another embodiment of the combined structure of the protective layer and the fluorescent conversion layer according to FIG. 2.

第6圖繪示依據本發明之覆晶式發光二極體元件另一實施例結構示意圖。 FIG. 6 is a schematic view showing the structure of another embodiment of the flip chip type LED device according to the present invention.

第7圖繪示依據第6圖中保護層與螢光轉換層組合結構之另一實 施例示意圖。 Figure 7 is a diagram showing another combination of the protective layer and the fluorescent conversion layer according to Figure 6 Schematic diagram of the example.

第8圖繪示依據本發明之覆晶式發光二極體元件之封裝結構之一實施例示意圖。 FIG. 8 is a schematic view showing an embodiment of a package structure of a flip chip type LED device according to the present invention.

第9圖繪示依據第8圖中覆晶式發光二極體元件之封裝結構之另一實施例示意圖。 FIG. 9 is a schematic view showing another embodiment of a package structure of a flip-chip type LED device according to FIG. 8.

請參照第2圖及第3圖,第2圖是依據本發明一實施 例中覆晶式發光二極體元件300的結構示意圖。第3圖是依據第2圖中,平衡電極圖案層311之一實施例示意圖。第2圖中,覆晶式發光二極體元件300包含一第一型半導體層301、一第二型半導體層302、一第一導電接觸層303、一第二導電接觸層304、一隔離層305、一保護層306、一螢光轉換層307、一第一導電接合墊308、一第二導電接合墊309以及一平衡電極圖案層311(請參照第3圖)。第二型半導體層302形成於第一型半導體層301上,第一導電接觸層303形成於第一型半導體層301上且不接觸第二型半導體層302。第二導電接觸層304形成於第二型半導體層302上。 Please refer to FIG. 2 and FIG. 3, and FIG. 2 is an embodiment according to the present invention. A schematic diagram of the structure of the flip-chip light-emitting diode element 300 in the example. Fig. 3 is a view showing an embodiment of the balanced electrode pattern layer 311 according to Fig. 2. In the second embodiment, the flip-chip LED device 300 includes a first semiconductor layer 301, a second semiconductor layer 302, a first conductive contact layer 303, a second conductive contact layer 304, and an isolation layer. 305. A protective layer 306, a phosphor conversion layer 307, a first conductive bonding pad 308, a second conductive bonding pad 309, and a balanced electrode pattern layer 311 (refer to FIG. 3). The second type semiconductor layer 302 is formed on the first type semiconductor layer 301, and the first conductive contact layer 303 is formed on the first type semiconductor layer 301 and does not contact the second type semiconductor layer 302. The second conductive contact layer 304 is formed on the second type semiconductor layer 302.

第一導電接觸層303及第二導電接觸層304各具有一 裸露面,其一作用係供與導電膠黏合之用。導電膠可使用錫膏,且導電膠種類不受限制,可以各種可能形式為之。 The first conductive contact layer 303 and the second conductive contact layer 304 each have a The exposed surface, one of which acts to bond with the conductive adhesive. Solder paste can be used for the conductive paste, and the type of the conductive paste is not limited and can be in various possible forms.

隔離層305形成於第一導電接觸層303與第二導電接 觸層304間,供電性隔絕第一導電接觸層303與第二導電接觸層304。 The isolation layer 305 is formed on the first conductive contact layer 303 and the second conductive connection Between the contact layers 304, the first conductive contact layer 303 and the second conductive contact layer 304 are electrically isolated.

螢光轉換層307覆蓋第一型半導體層301之一表面 301a,藉此作為調光之用,使覆晶式發光二極體元件300可發出不同色光,例如發出白光。 The fluorescent conversion layer 307 covers one surface of the first type semiconductor layer 301 301a, thereby serving as a dimming, enables the flip-chip LED element 300 to emit different colors of light, such as emitting white light.

本實施例中,第一導電接觸層303與第二導電接觸層 304皆具有相當大範圍之露出面積。藉此,有助於發光二極體散熱,亦可作為塗佈導電膠或為其他黏合製程之用。此外,第一型半導體層301可為一p型半導體層,且第二型半導體層302可為一n型半導體層,或反之亦可。第一型半導體層301及第二型半導體層302之材料可為鋁砷化鎵、砷化鎵磷化物、磷化鎵、磷化銦鎵鋁、磷化銦鎵鋁、銦氮化鎵、氮化鎵、鋁磷化鎵、硒化鋅、碳化矽等材料。 In this embodiment, the first conductive contact layer 303 and the second conductive contact layer 304 has a wide range of exposed areas. Thereby, the light-emitting diode can be used for heat dissipation, or can be used as a conductive adhesive or for other bonding processes. In addition, the first type semiconductor layer 301 can be a p-type semiconductor layer, and the second type semiconductor layer 302 can be an n-type semiconductor layer, or vice versa. The materials of the first type semiconductor layer 301 and the second type semiconductor layer 302 may be aluminum gallium arsenide, gallium arsenide phosphide, gallium phosphide, indium gallium phosphide, indium gallium phosphide, indium gallium nitride, nitrogen. Gallium, aluminum phosphide, zinc selenide, tantalum carbide and other materials.

保護層306可利用旋轉塗佈(Spin Coating)、蒸鍍或濺鍍等方式,使其形成於第一型半導體層301、第二型半導體層302、第一導電接觸層303以及第二導電接觸層304的側邊。保護層306目的為在覆晶式發光二極體元件300外側形成一保護膜,使覆晶式發光二極體元件300免於受到外界應力及環境(溫濕度、氧氣)的影響。此外,由於保護層306的形成,使覆晶式發光二極體元件300本身可免除後續繁複之灌膠封裝製程而形成能單獨使用之元件,不僅節省成本,更增加製程上應用的靈活性。 The protective layer 306 may be formed on the first type semiconductor layer 301, the second type semiconductor layer 302, the first conductive contact layer 303, and the second conductive contact by spin coating, evaporation, or sputtering. The sides of layer 304. The protective layer 306 is intended to form a protective film on the outside of the flip-chip light-emitting diode element 300, so that the flip-chip light-emitting diode element 300 is protected from external stress and environment (temperature, humidity, oxygen). In addition, due to the formation of the protective layer 306, the flip-chip LED component 300 itself can be dispensed with the subsequent complicated potting process to form a separately usable component, which not only saves cost, but also increases the flexibility of application in the process.

第一導電接合墊308及第二導電接合墊309分別與第一導電接觸層303及第二導電接觸層304電性連接,藉由第一導電接合墊308及第二導電接合墊309可擴展第一導電接觸層303及第二導電接觸層304之裸露面積,有助於發光二極體 散熱,亦可作為塗佈導電膠或為其他黏合製程之用,使覆晶式發光二極體元件300形成可獨立使用之發光元件,並可配合後續之組裝結構(印刷電路板或是電路基座等)使用。第一導電接合墊308及第二導電接合墊309可視需求調整面積大小,兩者間彼此面積比例可為0.1:1到1:1。第一導電接合墊308面積及第二導電接合墊309面積皆大於10000微米平方,再搭配保護層306,使覆晶式發光二極體元件300形成一無需再經由後續封裝等繁瑣製程即可單獨可使用之發光元件。需知上述實施例中,第一導電接觸層303及第二導電接觸層304即具有足夠大之裸露面積而能單獨與後續之組裝結構搭配使用,再配合第一導電接合墊308及第二導電接合墊309,可增加使用上之彈性。 The first conductive bonding pad 308 and the second conductive bonding pad 309 are electrically connected to the first conductive contact layer 303 and the second conductive contact layer 304 respectively, and the first conductive bonding pad 308 and the second conductive bonding pad 309 are expandable. The exposed area of a conductive contact layer 303 and the second conductive contact layer 304 contributes to the light emitting diode The heat dissipation can also be used as a coating conductive paste or other bonding process, so that the flip-chip LED component 300 can form a separately usable light-emitting component, and can be combined with a subsequent assembly structure (a printed circuit board or a circuit base). Block, etc.) use. The first conductive bond pad 308 and the second conductive bond pad 309 can be adjusted in size according to requirements, and the ratio of the area to each other can be 0.1:1 to 1:1. The area of the first conductive bond pad 308 and the area of the second conductive bond pad 309 are both greater than 10,000 micrometers square, and the protective layer 306 is used to form the flip-chip light-emitting diode element 300 so that it can be separated by a complicated process such as subsequent packaging. A light-emitting element that can be used. It should be noted that in the above embodiments, the first conductive contact layer 303 and the second conductive contact layer 304 have a sufficiently large exposed area and can be used alone with the subsequent assembled structure, and then coupled with the first conductive bonding pad 308 and the second conductive The bonding pad 309 can increase the elasticity of use.

平衡電極圖案層311電性連接第一型半導體層301及第二型半導體層302,使電流於第一型半導體層301及第二型半導體層302中分佈均勻,增加發光效率。平衡電極圖案層311亦可單獨或同時電性連接於覆晶式發光二極體元件300本身的第一導電接觸層303或第二導電接觸層304,並可單獨或同時電性連接於第一導電接合墊308及第二導電接合墊309。平衡電極圖案層311形狀亦得不受侷限,可以任意幾何形狀為之。在一實施例中,平衡電極層圖案層311形狀如第3圖所繪示。第3圖中,可看到平衡電極圖案層311電性連接第一導電接觸層303及第二導電接觸層304,其具有指叉狀延伸結構,第一導電接觸層303及第二導電接觸層304並電性連接第一導電接合墊308及第二導電接合墊 309。藉此,可避免電流分佈過於集中,使電流分佈更為均勻。 The balanced electrode pattern layer 311 is electrically connected to the first type semiconductor layer 301 and the second type semiconductor layer 302 to uniformly distribute current in the first type semiconductor layer 301 and the second type semiconductor layer 302, thereby increasing luminous efficiency. The balanced electrode pattern layer 311 can also be electrically or separately connected to the first conductive contact layer 303 or the second conductive contact layer 304 of the flip-chip LED element 300 itself, and can be electrically connected to the first or the first. Conductive bond pad 308 and second conductive bond pad 309. The shape of the balanced electrode pattern layer 311 is also not limited, and may be any geometric shape. In an embodiment, the shape of the balance electrode layer pattern layer 311 is as shown in FIG. In FIG. 3, the balance electrode pattern layer 311 is electrically connected to the first conductive contact layer 303 and the second conductive contact layer 304, and has an interdigitated extension structure, a first conductive contact layer 303 and a second conductive contact layer. 304 electrically connecting the first conductive bonding pad 308 and the second conductive bonding pad 309. Thereby, the current distribution can be prevented from being excessively concentrated, and the current distribution can be made more uniform.

請參照第4圖,第4圖繪示依據第2圖中保護層306 與螢光轉換層307組合結構之另一實施例示意圖。為使發光更為均勻,螢光轉換層307不僅可覆蓋於第一型半導體層301之表面301a上,亦可延展覆蓋於保護層306側面。藉此,可調整螢光轉換層307覆蓋於覆晶式發光二極體元件300之比例,而得到更為均勻之調光效果。 Please refer to FIG. 4 , which illustrates the protective layer 306 according to FIG. 2 . A schematic diagram of another embodiment of a combination with a fluorescent conversion layer 307. In order to make the light emission more uniform, the fluorescent conversion layer 307 may cover not only the surface 301a of the first type semiconductor layer 301 but also the side of the protective layer 306. Thereby, the proportion of the fluorescent conversion layer 307 covering the flip-chip light-emitting diode element 300 can be adjusted to obtain a more uniform dimming effect.

請參照第5圖,第5圖繪示依據第2圖中保護層306 與螢光轉換層307組合結構之再一實施例示意圖。於製作保護層306時,使保護層306突出於第一型半導體層301之側邊,如此使保護層306與第一型半導體層301間形成一容置空間310,供容置螢光轉換層307之用,在其中一實施例中,可使用螢光粉填充於容置空間310而形成螢光轉換層307。螢光轉換層307亦可使用一固體螢光片,設置於容置空間310內,藉此可簡化製程。 Please refer to FIG. 5 , which shows a protective layer 306 according to FIG. 2 . A schematic diagram of still another embodiment of the combined structure with the fluorescent conversion layer 307. When the protective layer 306 is formed, the protective layer 306 is protruded from the side of the first type semiconductor layer 301, so that an accommodating space 310 is formed between the protective layer 306 and the first type semiconductor layer 301 for accommodating the fluorescent conversion layer. For use in 307, in one embodiment, the fluorescent conversion layer 307 can be formed by filling the accommodating space 310 with phosphor powder. The fluorescent conversion layer 307 can also be disposed in the accommodating space 310 by using a solid fluorescent sheet, thereby simplifying the process.

請參照第6圖,第6圖繪示依據本發明之覆晶式發光 二極體元件另一實施例結構示意圖。第6圖中,覆晶式發光二極體元件400包含一透明基板410、一第一型半導體層401、一第二型半導體層402、一第一導電接觸層403、一第二導電接觸層404、一隔離層405、一保護層406、一螢光轉換層407、一第一導電接合墊408、一第二導電接合墊409以及一平衡電極圖案層(未繪示)。第一型半導體層401形成於透明基板410上,且透明基版410面積大於第一型半導體層401面積。第二型半導體層402 形成於第一型半導體層401上,第一導電接觸層403形成於第一型半導體層401上且不接觸第二型半導體層402。第二導電接觸層404形成於第二摻雜半導體層402上。 Please refer to FIG. 6 , which shows a flip-chip illumination according to the present invention. A schematic structural view of another embodiment of a diode element. In the sixth embodiment, the flip-chip LED device 400 includes a transparent substrate 410, a first semiconductor layer 401, a second semiconductor layer 402, a first conductive contact layer 403, and a second conductive contact layer. 404, an isolation layer 405, a protective layer 406, a phosphor conversion layer 407, a first conductive bonding pad 408, a second conductive bonding pad 409, and a balanced electrode pattern layer (not shown). The first type semiconductor layer 401 is formed on the transparent substrate 410, and the area of the transparent substrate 410 is larger than the area of the first type semiconductor layer 401. Second type semiconductor layer 402 The first conductive contact layer 403 is formed on the first type semiconductor layer 401 and does not contact the second type semiconductor layer 402. The second conductive contact layer 404 is formed on the second doped semiconductor layer 402.

第一導電接觸層403及第二導電接觸層404各具有一裸露面,其一作用係供與導電膠黏合之用。 The first conductive contact layer 403 and the second conductive contact layer 404 each have an exposed surface, and one of the functions is for bonding with the conductive adhesive.

隔離層405形成於第一導電接觸層403與第二導電接觸層404間,供電性隔絕第一導電接觸層403與第二導電接觸層404。 The isolation layer 405 is formed between the first conductive contact layer 403 and the second conductive contact layer 404 to electrically isolate the first conductive contact layer 403 from the second conductive contact layer 404.

螢光轉換層407覆蓋透明基板410之一表面410a,藉此作為調光之用,使覆晶式發光二極體元件400可發出不同色光,例如發出白光。 The fluorescent conversion layer 407 covers one surface 410a of the transparent substrate 410, thereby serving as a dimming function, so that the flip-chip LED element 400 can emit different colors of light, for example, emit white light.

保護層406可利用旋轉塗佈(Spin Coating)、蒸鍍或濺鍍等方式,使其形成於第一型半導體層401、第二型半導體層402、第一導電接觸層403以及第二導電接觸層404的側邊。保護層406目的為在覆晶式發光二極體元件400外側形成一保護膜,使覆晶式發光二極體元件400免於受到外界應力及環境(溫濕度、氧氣)的影響。此外,由於保護層406的形成,使覆晶式發光二極體元件400本身可免除後續繁複之灌膠封裝製程而形成能單獨使用之元件,不僅節省成本,更增加製程上應用的靈活性。 The protective layer 406 may be formed on the first type semiconductor layer 401, the second type semiconductor layer 402, the first conductive contact layer 403, and the second conductive contact by spin coating, evaporation, or sputtering. The sides of layer 404. The protective layer 406 is intended to form a protective film on the outside of the flip-chip light-emitting diode element 400, so that the flip-chip light-emitting diode element 400 is protected from external stress and environment (temperature, humidity, oxygen). In addition, due to the formation of the protective layer 406, the flip-chip LED component 400 itself can be dispensed with the subsequent complicated potting process to form a separately usable component, which not only saves cost, but also increases flexibility in application on the process.

上述之覆晶式發光二極體元件400中,可增設一第一導電接合墊408及一第二導電接合墊409分別與第一導電接觸層403及第二導電接觸層404電性連接,藉由第一導電接合墊408及第二導電接合墊409可擴展第一導電接觸層403 及第二導電接觸層404之裸露面積,有助於發光二極體散熱,亦可作為塗佈導電膠或為其他黏合製程之用,並使覆晶式發光二極體元件400形成可獨立使用之發光元件,可配合後續之組裝結構(印刷電路板或是電路基座等)使用。第一導電接合墊408及第二導電接合墊409可視需求調整面積大小,兩者間彼此面積比例可為0.1:1至1:1。第一導電接合墊408面積及第二導電接合墊409面積皆大於10000微米平方,再搭配保護層406,使覆晶式發光二極體元件400形成一無需再經由後續封裝等繁瑣製程即可單獨可使用之發光元件。如同前述之實施例,第一導電接觸層403及第二導電接觸層404即具有足夠大之裸露面積而能單獨與後續之組裝結構搭配使用,再配合第一導電接合墊408及第二導電接合墊409,可增加使用上之彈性。 In the flip-chip LED device 400, a first conductive pad 408 and a second conductive pad 409 are electrically connected to the first conductive contact layer 403 and the second conductive contact layer 404, respectively. The first conductive contact layer 403 is expandable by the first conductive bond pad 408 and the second conductive bond pad 409 And the exposed area of the second conductive contact layer 404, which helps the light emitting diode to dissipate heat, can also be used as a conductive adhesive or other bonding process, and the flip-chip LED component 400 can be used independently. The light-emitting element can be used in conjunction with a subsequent assembly structure (a printed circuit board or a circuit base, etc.). The first conductive bond pad 408 and the second conductive bond pad 409 can be adjusted in size according to requirements, and the ratio of the area to each other can be 0.1:1 to 1:1. The area of the first conductive bonding pad 408 and the area of the second conductive bonding pad 409 are both greater than 10,000 micrometers square, and the protective layer 406 is used together to form the flip-chip LED component 400 so that it can be separated by a complicated process such as subsequent packaging. A light-emitting element that can be used. As in the foregoing embodiments, the first conductive contact layer 403 and the second conductive contact layer 404 have a sufficiently large exposed area and can be used alone with the subsequent assembled structure, and then coupled with the first conductive bond pad 408 and the second conductive bond. Pad 409 can increase the flexibility of use.

平衡電極圖案層電性連接第一型半導體層401及第二型半導體層402,使電流於第一型半導體層401及第二型半導體層402中分佈均勻,增加發光效率。此實施例中,平衡電極圖案層的結構與前述實施例之平衡電極圖案層311類似,不再另述。 The balanced electrode pattern layer is electrically connected to the first type semiconductor layer 401 and the second type semiconductor layer 402 to uniformly distribute current in the first type semiconductor layer 401 and the second type semiconductor layer 402, thereby increasing luminous efficiency. In this embodiment, the structure of the balanced electrode pattern layer is similar to that of the balanced electrode pattern layer 311 of the foregoing embodiment, and will not be described again.

此外,上述之覆晶式發光二極體元件400中,可在第二導電接觸層404與第二導電接合墊409間增設一金屬反射層411,可增加出光效率。 In addition, in the flip-chip LED device 400 described above, a metal reflective layer 411 can be added between the second conductive contact layer 404 and the second conductive pad 409 to increase the light extraction efficiency.

請參照第7圖,第7圖繪示依據第6圖中保護層406與螢光轉換層407組合結構之另一實施例示意圖。為使發光更為均勻,螢光轉換層407不僅可覆蓋於透明基板410之表 面410a上,亦可延展覆蓋於透明基板410側面。藉此,可調整螢光轉換層407覆蓋於覆晶式發光二極體元件400之比例,而得到更為均勻之調光效果。此外,螢光轉換層407可使用一固體螢光片,其面積大於透明基板410面積。藉此,可省卻傳統使用螢光粉時繁雜的封膠製程,增加製程上之便利。 Referring to FIG. 7, FIG. 7 is a schematic diagram showing another embodiment of a combined structure of the protective layer 406 and the fluorescent conversion layer 407 according to FIG. In order to make the light emission more uniform, the fluorescent conversion layer 407 can cover not only the surface of the transparent substrate 410. The surface 410a can also be extended over the side surface of the transparent substrate 410. Thereby, the proportion of the fluorescent conversion layer 407 covering the flip-chip light-emitting diode element 400 can be adjusted to obtain a more uniform dimming effect. In addition, the fluorescent conversion layer 407 can use a solid fluorescent sheet having an area larger than that of the transparent substrate 410. Thereby, the complicated sealing process in the conventional use of the fluorescent powder can be omitted, and the convenience in the process is increased.

請參照第8圖,第8圖繪示依據本發明之覆晶式發光二極體元件400之封裝結構500之一實施例示意圖。第6圖中,覆晶式發光二極體元件400本身即為一可單獨使用的發光元件。在本實施例中,揭示覆晶式發光二極體元件400與一印刷電路板501結合的封裝結構500,須知覆晶式發光二極體元件400亦可與其他形式的基板結合,並不以印刷電路板為限。覆晶式發光二極體元件400具有一第一導電接合墊408及一第二導電接合墊409。印刷電路板501上具有一第一電路接合部502a及一第二電路接合部502b,分別對應到第一導電接合墊408及第二導電接合墊409的位置。為使覆晶式發光二極體元件400與印刷電路板501能連接而導通,分別在第一導電接合墊408與第一電路接合部502a之間,及第二導電接合墊409與第二電路接合部502b之間設有一接合層503。接合層503所使用接合方式可為共晶、導電膠、凸塊、或錫膏製程等任何方式。在此實施例中,第一導電接合墊408及第二導電接合墊409與第一電路接合部502a及第二電路接合部502b電性連接之接合層503使用錫膏時,鍚膏厚度大於等於20微米,且於黏合後,錫膏爬膠高度小於覆晶式發光二 極體元件400高度的30%或無爬膠。 Please refer to FIG. 8. FIG. 8 is a schematic diagram showing an embodiment of a package structure 500 of a flip-chip LED device 400 according to the present invention. In Fig. 6, the flip-chip light-emitting diode element 400 itself is a separately usable light-emitting element. In this embodiment, the package structure 500 in which the flip-chip LED device 400 is combined with a printed circuit board 501 is disclosed. It should be noted that the flip-chip LED device 400 can also be combined with other forms of substrates. Printed circuit boards are limited. The flip-chip LED device 400 has a first conductive bond pad 408 and a second conductive bond pad 409. The printed circuit board 501 has a first circuit bonding portion 502a and a second circuit bonding portion 502b corresponding to the positions of the first conductive bonding pads 408 and the second conductive bonding pads 409, respectively. In order to enable the flip-chip LED device 400 to be connected to the printed circuit board 501, respectively, between the first conductive bonding pad 408 and the first circuit bonding portion 502a, and the second conductive bonding pad 409 and the second circuit. A bonding layer 503 is disposed between the joint portions 502b. The bonding layer 503 may be bonded in any manner such as a eutectic, a conductive paste, a bump, or a solder paste process. In this embodiment, when the first conductive bonding pad 408 and the second conductive bonding pad 409 are electrically connected to the bonding layer 503 of the first circuit bonding portion 502a and the second circuit bonding portion 502b, the thickness of the paste is greater than or equal to 20 microns, and after bonding, the solder paste height is less than the flip-chip light The polar body element 400 is 30% high or has no creepage.

請參照第9圖,第9圖繪示依據第8圖中覆晶式發光二極體元件400之封裝結構500之另一實施例示意圖。第9圖中,第一電路接合部502a及第二電路接合部502b面積總合小於或等於覆晶式發光二極體元件400之2倍總面積。 Referring to FIG. 9 , FIG. 9 is a schematic diagram showing another embodiment of a package structure 500 according to the flip-chip LED device 400 of FIG. 8 . In FIG. 9, the total area of the first circuit junction portion 502a and the second circuit junction portion 502b is less than or equal to twice the total area of the flip-chip light-emitting diode element 400.

上述實施例中所揭示之覆晶式發光二極體元件(300、400),係在晶圓製作過程中,利用沉積、曝光、顯影、蝕刻等步驟,即形成用以作為正負電極的第一導電接觸層(303、403)、第二導電接觸層(304、404)、隔離層305以及保護層306。然後,再經切割後便可成為能夠獨立使用的發光元件結構,而習知覆晶式發光二極體因無隔離層305及保護層306的設計,仍無法以裸晶形式單獨使用。藉此,本發明之覆晶式發光二極體元件(300、400)可節省傳統覆晶封裝製程中之擴晶、翻轉、轉置、微波、點膠及烘烤等步驟及相關之昂貴設備,可大幅節省製造成本。此外,也可節省習知覆晶式發光二極體封裝製程中複雜步驟所造成的時間耗費,進而增進產能。 The flip-chip light-emitting diode elements (300, 400) disclosed in the above embodiments are formed by using deposition, exposure, development, etching, etc. in the wafer fabrication process, that is, forming the first as positive and negative electrodes. Conductive contact layer (303, 403), second conductive contact layer (304, 404), isolation layer 305, and protective layer 306. Then, after being cut, it can be used as a light-emitting element structure that can be used independently. However, the conventional flip-chip type light-emitting diode cannot be used alone in the form of bare crystal because of the design of the isolation layer 305 and the protective layer 306. Thereby, the flip-chip LED component (300, 400) of the invention can save the steps of crystal expansion, flipping, transposition, microwave, dispensing and baking in the conventional flip chip packaging process and related expensive equipment. , can greatly save manufacturing costs. In addition, the time cost caused by the complicated steps in the conventional flip-chip LED packaging process can be saved, thereby increasing the throughput.

綜上所述,本發明提供一種覆晶式發光二極體元件及其封裝結構。本發明之覆晶式發光二極體元件具有下列優點: In summary, the present invention provides a flip-chip light emitting diode element and a package structure thereof. The flip chip type LED device of the present invention has the following advantages:

1.具有大電極結構,可增加散熱,降低光衰問題。 1. With large electrode structure, it can increase heat dissipation and reduce light attenuation.

2.具有側邊之保護層,可加強覆晶式發光二極體元件免受外部應力及環境影響而增加可靠度、信賴度,進而增加覆晶式發光二極體元件之壽命。 2. The protective layer on the side can enhance the reliability and reliability of the flip-chip LED component from external stress and environmental influence, thereby increasing the life of the flip-chip LED component.

3.第一導電接觸層及第二導電接觸層間設有隔離層,可作為電性隔絕之用。 3. An isolation layer is disposed between the first conductive contact layer and the second conductive contact layer for electrical isolation.

4.保護層結構上可具有各種不同設計,與螢光轉換層搭配可得到不同調光效果;並可簡化螢光轉換層封裝製程,減少額外設備成本。 4. The protective layer structure can have various designs, and the fluorescent conversion layer can be combined to obtain different dimming effects; the fluorescent conversion layer packaging process can be simplified, and the additional equipment cost can be reduced.

5.晶圓製程階段直接形成可單獨使用之覆晶式發光二極體元件,可免除後續繁複之封裝製程,進而可減少封裝設備的不必要投資,大幅節省製造成本。 5. The wafer process stage directly forms a flip-chip light-emitting diode component that can be used alone, which can eliminate the complicated packaging process, thereby reducing unnecessary investment in packaging equipment and greatly saving manufacturing costs.

6.大電極可使用共晶、導電膠、凸塊、或錫膏製程使覆晶式發光二極體元件與印刷電路板連接而導通。 6. The large electrode can be connected to the printed circuit board by using a eutectic, conductive paste, bump, or solder paste process to conduct.

7.可增設平衡電極圖案層,使電流分佈更為均勻,增加發光效率。 7. A balanced electrode pattern layer can be added to make the current distribution more uniform and increase the luminous efficiency.

400‧‧‧覆晶式發光二極體元件 400‧‧‧Flip-chip LED components

401‧‧‧第一型半導體層 401‧‧‧First type semiconductor layer

402‧‧‧第二型半導體層 402‧‧‧Second type semiconductor layer

403‧‧‧第一導電接觸層 403‧‧‧First conductive contact layer

404‧‧‧第二導電接觸層 404‧‧‧Second conductive contact layer

405‧‧‧隔離層 405‧‧‧Isolation

406‧‧‧保護層 406‧‧‧Protective layer

407‧‧‧螢光轉換層 407‧‧‧Fluorescent conversion layer

408‧‧‧第一導電接合墊 408‧‧‧First conductive bonding pad

409‧‧‧第二導電接合墊 409‧‧‧Second conductive bonding pad

410‧‧‧透明基板 410‧‧‧Transparent substrate

410a‧‧‧表面 410a‧‧‧ surface

411‧‧‧金屬反射層 411‧‧‧Metal reflector

Claims (10)

一種覆晶式發光二極體元件,包含:一第一型半導體層;一第二型半導體層,形成於該第一型半導體層上;一第一導電接觸層,形成於該第一型半導體層上且不接觸該第二型半導體層,其中該第一導電接觸層具有一裸露面;一第一導電接合墊,電性連接於該第一導電接觸層上;一第二導電接觸層,形成於該第二型半導體層上,且該第二導電接觸層具有一裸露面;一第二導電接合墊,電性連接於該第二導電接觸層上;一隔離層,形成於該第一導電接觸層與該第二導電接觸層之間,藉以電性隔絕該第一導電接觸層與該第二導電接觸層;一保護層,該保護層形成於該第一型半導體層、該第二型半導體層、該第一導電接觸層及該第二導電接觸層之側邊;一螢光轉換層,該螢光轉換層覆蓋該第一型半導體層之至少一表面及側邊;以及一平衡電極圖案層,電性連接該第一型半導體層及該第二型半導體層,藉以使通過該覆晶式發光二極體元件之電流分佈均勻;其中,該第一導電接合墊之面積及該第二導電接合墊之面積皆大於10000微米平方。 A flip-chip light emitting diode device comprising: a first type semiconductor layer; a second type semiconductor layer formed on the first type semiconductor layer; and a first conductive contact layer formed on the first type semiconductor And not contacting the second type semiconductor layer, wherein the first conductive contact layer has a bare surface; a first conductive bonding pad electrically connected to the first conductive contact layer; and a second conductive contact layer, Formed on the second type semiconductor layer, and the second conductive contact layer has a bare surface; a second conductive bonding pad electrically connected to the second conductive contact layer; an isolation layer formed on the first Between the conductive contact layer and the second conductive contact layer, the first conductive contact layer and the second conductive contact layer are electrically insulated; a protective layer formed on the first type semiconductor layer, the second a semiconductor layer, a side of the first conductive contact layer and the second conductive contact layer; a fluorescent conversion layer covering at least one surface and a side of the first semiconductor layer; and a balance Electrode pattern layer, electrical Connecting the first type semiconductor layer and the second type semiconductor layer, so that a current distribution through the flip-chip light emitting diode element is uniform; wherein an area of the first conductive bonding pad and the second conductive bonding pad The area is larger than 10,000 micrometers square. 如請求項1之覆晶式發光二極體元件,其中該螢光轉換層包含螢光粉或固體螢光片,該固體螢光片面積大於或等於該第一型半導體層面積。 The flip-chip light emitting diode device of claim 1, wherein the fluorescent conversion layer comprises a phosphor powder or a solid fluorescent sheet, the solid fluorescent sheet area being greater than or equal to the first type semiconductor layer area. 如請求項1之覆晶式發光二極體元件,其中該保護層與該第一型半導體層形成一容置空間,供容置該螢光轉換層。 The flip-chip LED component of claim 1, wherein the protective layer and the first semiconductor layer form an accommodating space for accommodating the fluorescent conversion layer. 如請求項1之覆晶式發光二極體元件,更包含:一透明基板,形成於該第一型半導體層上,其中該透明基板面積大於該第一型半導體層面積。 The flip-chip LED component of claim 1, further comprising: a transparent substrate formed on the first type semiconductor layer, wherein the transparent substrate area is larger than the area of the first type semiconductor layer. 一種覆晶式發光二極體元件,包含:一透明基板;一第一型半導體層,形成於該透明基板上,其中該透明基板面積大於該第一型半導體層面積;一第二型半導體層,形成於該第一型半導體層上;一第一導電接觸層,形成於該第一型半導體層上且不接觸該第二型半導體層,其中該第一導電接觸層具有一裸露面;一第一導電接合墊,電性連接於該第一導電接觸層上;一第二導電接觸層,形成於該第二型半導體層上,且該第二導電接觸層具有一裸露面;一第二導電接合墊,電性連接於該第二導電接觸層上;一隔離層,形成於該第一導電接觸層與該第二導電接觸層之間,藉以電性隔絕該第一導電接觸層與該第二導電接觸層;一保護層,該保護層形成於該第一型半導體層、該第二型半導體層、該第一導電接觸層及該第二導電接觸層之側邊;以及 一平衡電極圖案層,電性連接該第一型半導體層及該第二型半導體層,藉以使通過該覆晶式發光二極體元件之電流分佈均勻;其中,該第一導電接合墊之面積及該第二導電接合墊之面積皆大於10000微米平方,該第一導電接合墊與該第二導電接合墊或該第二導電接合墊與該第一導電接合墊面積比例為0.1:1至1:1。 A flip-chip light-emitting diode element comprising: a transparent substrate; a first-type semiconductor layer formed on the transparent substrate, wherein the transparent substrate has a larger area than the first-type semiconductor layer; and a second-type semiconductor layer Forming on the first type semiconductor layer; a first conductive contact layer formed on the first type semiconductor layer and not contacting the second type semiconductor layer, wherein the first conductive contact layer has an exposed surface; a first conductive bonding pad electrically connected to the first conductive contact layer; a second conductive contact layer formed on the second type semiconductor layer, and the second conductive contact layer has an exposed surface; a conductive bonding pad electrically connected to the second conductive contact layer; an isolation layer formed between the first conductive contact layer and the second conductive contact layer, thereby electrically isolating the first conductive contact layer from the a second conductive contact layer; a protective layer formed on a side of the first type semiconductor layer, the second type semiconductor layer, the first conductive contact layer and the second conductive contact layer; a balanced electrode pattern layer electrically connected to the first type semiconductor layer and the second type semiconductor layer, so that current distribution through the flip chip type LED element is uniform; wherein the area of the first conductive pad And the area of the second conductive bonding pad is greater than 10000 micrometers, and the first conductive bonding pad and the second conductive bonding pad or the second conductive bonding pad and the first conductive bonding pad have an area ratio of 0.1:1 to 1 :1. 如請求項5之覆晶式發光二極體元件,更包含:一螢光轉換層,該螢光轉換層覆蓋該透明基板之一表面或覆蓋該透明基板之至少一表面及側邊;其中,該螢光轉換層包含螢光粉或固體螢光片,且該固體螢光片面積大於或等於該透明基板面積。 The flip-chip LED device of claim 5, further comprising: a fluorescent conversion layer covering a surface of the transparent substrate or covering at least one surface and a side of the transparent substrate; wherein The fluorescent conversion layer comprises a phosphor powder or a solid fluorescent sheet, and the solid fluorescent sheet area is greater than or equal to the transparent substrate area. 如請求項5之覆晶式發光二極體元件,更包含:一金屬反射層,形成於該第二型半導體層與該第二導電接合墊之間。 The flip-chip LED device of claim 5, further comprising: a metal reflective layer formed between the second semiconductor layer and the second conductive bonding pad. 一種應用如請求項5之覆晶式發光二極體元件的封裝結構,包含:一覆晶式發光二極體元件;二接合層,分別形成於該覆晶式發光二極體元件之該第一導電接合墊及該第二導電接合墊上;以及一印刷電路板,該印刷電路板具有分別相對於該第一導電接合墊及該第二導電接合墊位置之一第一電路接合部及 一第二電路接合部,其中透過該二接合層令該第一、第二電路接合部分別與該第一、第二導電接合墊連接而電性導通。 A package structure using the flip-chip light-emitting diode element of claim 5, comprising: a flip-chip light-emitting diode element; and two bonding layers respectively formed on the flip-chip light-emitting diode element a conductive bonding pad and the second conductive bonding pad; and a printed circuit board having a first circuit junction portion with respect to the first conductive bonding pad and the second conductive bonding pad respectively a second circuit junction portion, wherein the first and second circuit junction portions are electrically connected to the first and second conductive bonding pads through the two bonding layers. 如請求項8之封裝結構,其中該第一電路接合部及該第二電路接合部面積總合小於或等於該覆晶式發光二極體元件2倍總面積。 The package structure of claim 8, wherein the total area of the first circuit joint portion and the second circuit joint portion is less than or equal to 2 times the total area of the flip-chip light-emitting diode element. 如請求項8之封裝結構,其中該第一、第二導電接合墊與該第一、第二電路接合部電性連接之接合層使用一錫膏,且該鍚膏厚度大於等於20微米,且於黏合後,該錫膏爬膠高度小於該覆晶式發光二極體元件高度的30%或無爬膠。 The package structure of claim 8, wherein the bonding layer electrically connecting the first and second conductive pads to the first and second circuit bonding portions uses a solder paste, and the thickness of the paste is 20 μm or more, and After bonding, the solder paste has a height less than 30% of the height of the flip-chip LED component or no creepage.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI729389B (en) * 2019-05-07 2021-06-01 錼創顯示科技股份有限公司 Micro device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111916534B (en) * 2019-05-07 2022-06-21 錼创显示科技股份有限公司 Micro-element
TWI723855B (en) * 2020-04-28 2021-04-01 友達光電股份有限公司 Light emitting diode display and manufacturing method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200929618A (en) * 2007-12-31 2009-07-01 Epivalley Co Ltd III-nitride semiconductor light emitting device
CN101859861A (en) * 2010-05-13 2010-10-13 厦门市三安光电科技有限公司 GaN-based flip-chip light-emitting diode with double reflecting layers and preparation method thereof
US8211722B2 (en) * 2009-07-20 2012-07-03 Lu Lien-Shine Flip-chip GaN LED fabrication method
WO2012123840A1 (en) * 2011-03-14 2012-09-20 Koninklijke Philips Electronics N.V. Led having vertical contacts redistributed for flip chip mounting

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200929618A (en) * 2007-12-31 2009-07-01 Epivalley Co Ltd III-nitride semiconductor light emitting device
US8211722B2 (en) * 2009-07-20 2012-07-03 Lu Lien-Shine Flip-chip GaN LED fabrication method
CN101859861A (en) * 2010-05-13 2010-10-13 厦门市三安光电科技有限公司 GaN-based flip-chip light-emitting diode with double reflecting layers and preparation method thereof
WO2012123840A1 (en) * 2011-03-14 2012-09-20 Koninklijke Philips Electronics N.V. Led having vertical contacts redistributed for flip chip mounting

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI729389B (en) * 2019-05-07 2021-06-01 錼創顯示科技股份有限公司 Micro device
US11362239B2 (en) 2019-05-07 2022-06-14 PlayNitride Display Co., Ltd. Micro device

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