TWI542444B - A polishing pad dresser with a brush holder - Google Patents

Description

Polishing pad dresser with brushing member

The present invention relates to a polishing pad conditioner, and more particularly to a polishing pad conditioner having a brushing member.

The chemical mechanical polishing system is a flattening technique commonly used in various fields of the process. Since it is suitable for planarization of a large area, it is widely used for the planarization of the laminated tantalum surface or the copper surface of the integrated circuit. The chemical mechanical polishing device generally comprises a polishing pad and a polishing pad conditioner, which is operated by first applying the polishing solution to the polishing pad by spin coating, and pressing the surface of the object to be polished against the polishing pad. The surface of the article to be polished is polished by the polishing pad, and debris is generated by grinding during the grinding process, and the debris accumulates in the pores of the polishing pad and mixes with the polishing liquid to form a hardened layer, resulting in a decrease in polishing efficiency. , thereby shortening the service life of the polishing pad. Therefore, the surface of the polishing pad is continuously trimmed by the polishing pad dresser during the grinding process to extend the use time of the polishing pad. However, if the polishing pad surface is trimmed by a conventional polishing pad conditioner to only destroy the hardened layer and the debris cannot be removed from the pores, the extended polishing pad can be used for a relatively limited time period.

In view of this, as shown in FIG. 11 and FIG. 12, there is currently a polishing pad conditioner comprising a carrier 70, a plurality of abrasives 80 and a plurality of cleaning portions 90, the carrier 70 having a plurality of polishing regions 71 and a plurality of The brushing area 72, the polishing area 71 and the wiping area 72 are staggered in an annular direction, and the abrasives 80 are laid and fixed on the polishing areas 71, and the cleaning parts 90 are disposed on the brushes. Wiping area 72, each cleaning part 90 includes a plurality of bristles 91 fixed to the wiping area 72, the polishing pad The trimmer utilizes the bristles 91 to sweep the debris-containing slurry during the grinding process and to remove debris from the pores, thereby restoring the polishing efficiency of the polishing pad and prolonging the use time of the polishing pad.

However, as shown in FIG. 12, the polishing pad conditioner is spread on the carrier 70 by the abrasives 80, and the heights of the ends 81 of the respective abrasives 80 are different, and a uniform reference cannot be formed, so each bristles 91 The height of the end 911 relative to the end 81 of the abrasive 80 is also high or low. If the end 911 of the bristles 91 is lower relative to the end 81 of the abrasive 80, the bristles 91 will not effectively remove the debris in the pores; High at the end 81 of the abrasive 80 may result in reduced abrasive efficiency of the abrasive pad 80 to the surface of the polishing pad, so that the height of the end 911 of the bristles 91 of the polishing pad conditioner relative to the end 81 of the abrasive 80 will result in a partial area of the polishing pad. The debris in the pores is not effectively removed or the abrasive grinding efficiency of each region is inconsistent, so there is still room for improvement.

In view of this, the present invention improves the existing polishing pad conditioner to overcome the inconsistency in the height of the bristle end of the polishing pad conditioner relative to the end of the abrasive and the incomplete removal of debris in the pores or the abrasive polishing efficiency. Inconsistent issues.

The present invention provides a polishing pad conditioner having a brushing member, comprising: a substrate comprising a surface and a plurality of concave portions, the inner concave portions are concavely formed on the surface; a plurality of metal pillar abrasives, the metal The column abrasive system is mounted on the surface, each of the metal column abrasives comprises a metal column and an abrasive, the metal column includes a connecting end and a cutting end, and the connecting end is installed and fixed in the corresponding inner concave portion, The abrasive comprises a tip, the abrasive is mounted on the cutting end of the metal post and exposes the tip, and the vertical distance between the tip of each abrasive and the horizontal plane of the surface is equal; a plurality of brush wipes, the brush system Mounted on the surface, and the ends of the brush holders are farther from the surface relative to the tips of the abrasives, and the ends of the brush holders are perpendicular to the horizontal plane formed by the tips of the abrasives. And the system is between 0.1 mm and 1 mm.

The polishing pad dresser with brushing device of the present invention precisely controls the vertical distance between the tip of each abrasive and the horizontal plane of the surface and the vertical distance between the end of the brush and the horizontal surface formed by the tips of the abrasives. The effect of removing debris in the pores of the surface of the polishing pad can be further improved, and the problem that the debris in the pores of the polishing pad portion is not effectively removed or the abrasive polishing efficiency of each region is inconsistent is avoided.

Preferably, the polishing pad conditioner having the brushing member further comprises a second substrate, the second substrate is mounted on the surface, and the brushing device is mounted on the second substrate. More preferably, the material of the second substrate is polyethylene, polypropylene, polyvinyl chloride, polystyrene, polyethylene terephthalate or polylactic acid.

Alternatively, the substrate further comprises a plurality of drilled holes, the drilled holes are concavely formed on the surface, and the bundle of brush wipes are installed in the corresponding drilled holes.

Preferably, the brushing members are divided into a plurality of soft bristles and a plurality of rigid bristles, and the soft bristles are staggered with the hard bristles. More preferably, the soft bristles are made of polypropylene or nylon, and the hard bristles are made of polypropylene or nylon.

Preferably, the substrate is in the form of a circular sheet, and the surface can be divided into a peripheral region of a concentric circle and a central region surrounding the central region; the concave portions are concavely formed on the surface In the peripheral region of the surface, the brushing members are mounted in a central region of the surface.

Further, the peripheral region is further divided into a staggered polishing area and a clearing area, the inner concave portions are concavely formed in a polishing area of the peripheral area of the surface, and the brushing parts are fixed to the The central area of the surface and the clearing area of the peripheral area of the surface.

Alternatively, the substrate is in the form of a circular sheet, and the surface can be divided into a peripheral region of a concentric circle and a central region, the peripheral region surrounding the central region and further divided into staggered polishing regions and a cleaning region; the inner concave portion is concavely formed in a polishing region of a peripheral portion of the surface, and the cleaning member is provided with a clearing region fixed to a peripheral region of the surface.

10, 10A, 10B, 10C‧‧‧ substrate

11, 11D‧‧‧ surface

111, 111A, 111B, 111C‧‧‧ peripheral area

1111B, 1111C‧‧‧ grinding area

1112B, 1112C‧‧‧ Clearing area

112, 112A, 112B, 112C, 112D‧‧‧ central area

12, 12B, 12C‧‧‧ recess

13, 13B, 13C‧‧‧ drilling

20, 20A‧‧‧Metal column abrasive

21, 21A‧‧‧ metal column

211‧‧‧Connected end

212‧‧‧ cutting end

22, 22A, 22D‧‧‧ abrasives

221, 221A, 221D‧‧‧ cutting-edge

30‧‧‧wiping parts

31, 31A, 31D‧‧‧ soft bristles

End of 311, 311A, 311D‧‧

32, 32A, 32D‧‧‧ Hard bristles

321, 321A, 321D‧‧‧ end

40A‧‧‧second substrate

60‧‧‧Precision fixture

61‧‧‧Abrasive plane

62‧‧‧Brush plane

70‧‧‧Carrier

71‧‧‧ Grinding area

72‧‧‧Swipe area

80‧‧‧Abrasive

End of 81‧‧‧

90‧‧‧Clean Department

91‧‧‧ bristles

End of 911‧‧

D1‧‧‧ vertical distance

D2‧‧‧ vertical distance

D3‧‧‧ vertical distance

D4‧‧‧ vertical distance

D5‧‧‧ vertical distance

D6‧‧‧ vertical distance

FIG. 1 is a top view of the first embodiment of the present invention.

2 is a schematic cross-sectional view showing a first embodiment of the present invention.

FIG. 3 is a schematic view showing the preparation process of the first embodiment of the present invention.

4 is a schematic cross-sectional view showing a second embodiment of the present invention.

FIG. 5 is a top view of the third embodiment of the present invention.

FIG. 6 is a top plan view of the fourth embodiment of the present invention.

Fig. 7 is a schematic cross-sectional view showing a comparative example of the creation.

Fig. 8 is an electron micrograph of the polishing pad after the polishing using the inventive example 1.

Fig. 9 is an electron micrograph of a polishing pad polished using the present comparative example.

Figure 10 is an electron micrograph of a polishing pad after grinding using a conventional polishing pad conditioner.

Figure 11 is a top plan view of a conventional polishing pad conditioner.

Figure 12 is a schematic cross-sectional view of a conventional polishing pad conditioner.

Example 1

As shown in FIG. 1 and FIG. 2, in this embodiment, a polishing pad conditioner having a brushing member is provided, which comprises: a substrate 10, a plurality of metal pillar abrasives 20 and a plurality of bundle brush holders 30.

The substrate 10 is formed into a circular sheet shape and includes a surface 11 , a plurality of concave portions 12 and a plurality of holes 13 , and the surface 11 is divided into a peripheral region 111 and a central region 112 which are concentric circles, and the peripheral region The 111 series surrounds the central area 112, in other words, the peripheral area 111 is located on the outer ring, and the The central region 112 is located in the inner ring, and the inner recesses 12 are concavely formed in the peripheral region 111 of the surface 11, and the drilled holes 13 are concavely formed in the central region 112 of the surface 11.

Each of the metal pillars 20 includes a metal post 21 and an abrasive 22, and the two ends of the metal post 21 are a connecting end 211 and a cutting end 212. The connecting end 211 is correspondingly fixed in the inner recesses 12, The abrasive 22 includes a tip end 221 which is mounted on the cutting end 212 of the metal post 21 and exposes the tip end 221, and the vertical distance d1 of the tip end 221 of each abrasive 20 from the horizontal plane of the peripheral region 111 is equal.

The brushing members 30 are divided into a plurality of soft bristles 31 and a plurality of rigid bristles 32. The soft bristles 31 are made of polypropylene and are installed in the corresponding drill holes 13, and the soft bristles 31 are provided. The wire diameter is from 0.15 mm to 0.25 mm (depending on the length, which is only exemplified herein), and the hard bristles 32 are made of polypropylene and are installed in the corresponding bores 13 and are hard. The wire diameter of the bristles 32 is 0.4 mm to 0.6 mm (related to the length, which is merely an example). Under the same material, the hard bristles have a relatively large wire diameter, and the soft bristles 31 and the hard bristles 32 are Staggered, the ends 311 of the soft bristles 31 are relatively far from the surface 11 relative to the tips 221 of the abrasives, and the vertical distances between the ends 311 of the soft bristles 31 and the horizontal surface formed by the tips 221 of the abrasives 22 The d2 is 0.1 mm, the ends 321 of the hard bristles 32 are relatively far from the surface 11 with respect to the tips 221 of the abrasives 22, and the ends 321 of the hard bristles 32 and the tips 221 of the abrasives 22 are formed. The vertical distance d3 of the horizontal plane is 0.1 mm.

The metal column abrasives 20 of the polishing pad conditioner of the present embodiment having the brushing member are prepared as follows. Preparing a mold, and placing a rubber pad on the surface of the lower mold, placing the substrate 10 on the silicone pad, and forming a cushion in the concave portion 12 of the substrate 10; injecting adhesive into each In the inner recess 12, the connecting end 211 of the metal post 21 of each metal post abrasive 20 is disposed in the inner recess 12; a spacer for adjusting the tip height of the abrasive 22 of the metal post abrasive 20 is placed at the tip of the abrasive 22 And placing an upper mold on the side of the gasket relative to the metal column abrasive 20, applying pressure The fixed pressure clamping upper and lower molds have the same vertical distance between the tip end of each abrasive 22 and the horizontal surface of the surface 11 of the substrate 10, heating to cure the adhesive, removing the upper mold, the lower mold, the gasket and the silicone pad, and the substrate The recess 12 is filled with adhesive glue to fill the inner portion 10 to complete the preparation of the metal column abrasives 22. The above description is only a preferred example of the present creation, and does not impose any form limitation on the creation.

Referring to FIG. 3 again, the polishing pad dresser having the brushing member of the present embodiment passes through a precision jig 60 to make the ends of the soft bristles 31 or the hard bristles 32 311, 321 and the tips of the abrasives 22 The vertical distance formed by the horizontal plane of 221 is 0.1 mm.

The precision fixture 60 comprises two planes, namely an abrasive plane 61 and a bristle plane 62, the abrasive plane 61 is opposite to the abrasives 22, and the bristle plane 62 corresponds to the soft bristles 31 and the hard materials. The ends 311, 321 of the bristles 32, and the abrasive plane 61 are relatively higher than the bristle plane 62, and the step d4 of the abrasive plane 61 and the bristle plane 62 is 0.1 mm. When the polishing pad conditioner having the brushing member is formed, the surface 11 of the substrate 10 is faced downward so that the soft bristles 31 and the ends 311, 321 of the hard bristles 32 abut against the bristle plane 62, thereby ensuring the The vertical distance between the soft bristles 31 or the ends 311, 321 of the hard bristles 32 and the horizontal surface formed by the tips 221 of the abrasives 22 is 0.1 mm apart.

Example 2

As shown in FIG. 4, the polishing pad conditioner having the brushing member of the embodiment is substantially the same as that of Embodiment 1, except that the substrate 10A does not include the holes, and the polishing pad with the brushing member is used. The trimmer further includes a second substrate 40A. The second substrate 40A is made of polypropylene. The second substrate 40A is mounted and fixed to the central portion 112A. The soft bristles 31A are mounted on the second substrate. In 40A, the soft bristles 31A are made of Nylon, and the vertical distance between the end 311A of the soft bristles 31A and the horizontal surface formed by the tips 221A of the abrasives 22A is 0.5 mm, and the hard bristles 32A are The hard bristles 32A are made of a nylon, and the ends 321A of the hard bristles 32A are perpendicular to the horizontal surface formed by the tips 221A of the abrasives 22A. The distance is 0.5 mm; the soft bristles 31A and the hard bristles 32A are mounted on the second substrate 40A, and the second substrate 40A is mounted on the substrate 10A, and the combined structure can be increased. Convenience.

Example 3

As shown in FIG. 5, the polishing pad conditioner having the brushing member of the present embodiment is substantially the same as that of Embodiment 1, except that the peripheral region 111B is further divided into the staggered polishing region 1111B and the cleaning region 1112B. The inner recesses 12B are concavely formed in the abrasive region 1111B of the peripheral region 111B of the surface, and the drilled holes 13B are concavely formed in the central region 112B of the surface and the clearing region 1112B of the peripheral region 111B of the surface, and The vertical distance between the ends of the soft bristles and the horizontal surface formed by the tips of the abrasives is 1 mm, and the vertical distance between the ends of the hard bristles and the horizontal surface formed by the tips of the abrasives is 1 mm. Adjusting the ratio between the soft/hard bristles and the abrasives can adjust the cleaning ability and cutting force of the polishing pad conditioner with the brushing member to suit different processes.

Example 4

As shown in FIG. 6, the polishing pad conditioner having the brushing member of the present embodiment is substantially the same as that of Embodiment 3, except that the holes 13C are only concavely formed in the clearing region of the peripheral region 111C of the surface. In 1112C, in this embodiment, the cleaning ability and the cutting force of the polishing pad conditioner having the brushing member can be adjusted by adjusting the ratio between the soft/hard bristles and the abrasive materials, so as to be suitable for different processes.

Control case

As shown in FIG. 7, the polishing pad conditioner having the brushing member of the comparative example is substantially the same as that of Embodiment 1, except that the end 311D of the soft bristles 31D is relatively opposite to the tip 221D of the abrasives 22D. Close to the surface 11D, and the vertical distance d5 of the end 311D of the soft bristles 31D and the horizontal surface formed by the tips 221D of the abrasives 22D is 0.1 mm, and the hard bristles 32D The end 321D is closer to the surface 11D than the tip 221D of the abrasive 22D, and the vertical distance d6 of the end 321D of the hard bristles 32D and the horizontal surface formed by the tip 221D of the abrasive 22D is 0.1 mm.

Test case

The polishing pad of the polishing pad with the brushing member of the first embodiment and the comparative example is trimmed with the polishing pad conditioner of the prior art, and the debris in the pores of the surface of the polishing pad after the trimming is confirmed by an electron microscope. Whether it was cleared or not, the results are shown in Fig. 8 (Example 1), Fig. 9 (Comparative Example), and Fig. 10 (Prior Art).

Comparing FIG. 8 (Example 1) with FIG. 9 (Comparative Example), it can be found that when the soft bristles or the hard bristles are lower than the tip end of the central region with respect to the tip of the abrasive, the surface of the polishing pad is in the pores. The removal of debris is not effective.

Comparing FIG. 8 (Embodiment 1) with FIG. 10 (Prior Art), it can be seen that the polishing pad conditioner having the brushing device of the present invention precisely controls the vertical distance between the tip end of each abrasive and the horizontal surface of the peripheral region and The ends of the soft bristles or the vertical distance between the ends of the hard bristles and the horizontal surface formed by the tips of the abrasives, and thus the crumbs in the pores of the polishing pad surface can be better than the polishing pad conditioner of the prior art. The cleaning effect is avoided, and the debris in the pores of the polishing pad portion is not effectively removed or the abrasive grinding efficiency of each region is inconsistent.

The polishing pad conditioner having the brushing member of the present invention precisely controls the vertical distance between the tip of each abrasive and the horizontal surface of the peripheral region and the end of the soft bristles or the ends of the hard bristles and the tips of the abrasives The vertical distance of the formed horizontal plane can further improve the removal effect on the debris in the pores of the polishing pad surface, and avoid the problem that the debris in the pore region of the polishing pad is not effectively removed or the abrasive polishing efficiency of each region is inconsistent. And the arrangement of the brush members different from the metal column abrasives is also applicable to the polishing pads of different situations.

The above description is only a preferred example of the present invention, and is not intended to limit the present invention in any way. Although the present invention has been disclosed above in the preferred embodiment, it is not intended to limit the present invention, and is generally in the art. Those skilled in the art, while departing from the technical scope of the present invention, may make some modifications or modifications to equivalent embodiments by using the technical contents disclosed above, but the content of the technical solution without departing from the present invention is based on The technical essence of the present invention makes any simple modification, equivalent change and modification to the above embodiments, and still belongs to the scope of the technical solution of the present invention.

11‧‧‧ surface

111‧‧‧ peripheral area

112‧‧‧Central District

12‧‧‧ Inside recess

13‧‧‧Drilling

21‧‧‧Metal column

211‧‧‧Connected end

212‧‧‧ cutting end

22‧‧‧Abrasive

221‧‧‧ tip

30‧‧‧wiping parts

31‧‧‧Soft bristles

End of 311‧‧‧

32‧‧‧hard bristles

End of 321‧‧‧

D1‧‧‧ vertical distance

D2‧‧‧ vertical distance

D3‧‧‧ vertical distance

Claims (10)

A polishing pad conditioner having a brushing member, comprising: a substrate comprising a surface and a plurality of concave portions, the inner concave portions are concavely formed on the surface; a plurality of metal column abrasives, the metal column abrasives Provided on the surface, each of the metal pillar abrasives comprises a metal column and an abrasive, the metal column includes a connecting end and a cutting end, the connecting end is correspondingly fixed in the inner recess, the abrasive comprises a tip The abrasive is mounted on the cutting end of the metal post and exposes the tip, and the vertical distance between the tip of each abrasive and the horizontal surface of the surface is equal; the plurality of brush wipes, the brush is mounted on the a surface, wherein the ends of the plexus wipers are relatively far from the surface relative to the tips of the abrasives, and the vertical distance between the ends of the plexus wipers and the horizontal surface formed by the tips of the abrasives is between 0.1 mm and Between 1 mm. A polishing pad conditioner having a brushing member according to claim 1, wherein the brushing member is divided into a plurality of soft bristles and a plurality of rigid bristles, and the soft bristles are staggered with the hard bristles. A polishing pad conditioner having a brushing member according to claim 2, wherein the soft bristles are made of polypropylene or nylon, and the hard bristles are made of polypropylene or nylon. A polishing pad conditioner having a brushing member according to claim 1, wherein the substrate further comprises a plurality of holes, the holes are concavely formed on the surface, and the plurality of brush holders are correspondingly mounted on the drills. In the middle of the hole. A polishing pad conditioner having a brushing member according to claim 1, further comprising a second substrate, the second substrate is mounted on the surface, and the brushing device is mounted on the second Substrate. A polishing pad conditioner having a brush member according to claim 5, wherein the material of the second substrate is polypropylene. A polishing pad conditioner having a brushing member according to claim 1, wherein the substrate is in the form of a circular sheet, and the surface can be divided into a peripheral region of a concentric circle and a central region, the peripheral region surrounding the a central portion; the inner concave portion is concavely formed on a peripheral portion of the surface, and the brushing members are mounted to be fixed to a central portion of the surface. A polishing pad conditioner having a brushing member according to claim 1, wherein the substrate is in the form of a circular sheet, and the surface can be divided into a peripheral region and a central region which are concentric circles, and the peripheral region is surrounded by The central area is divided into a staggered grinding area and a clearing area; the inner concave parts are concavely formed in a grinding area of the peripheral area of the surface, and the cleaning parts are mounted on a central area of the surface and the The clearing area of the peripheral area of the surface. A polishing pad conditioner having a brushing member according to claim 1, wherein the substrate is in the form of a circular sheet, and the surface can be divided into a peripheral region of a concentric circle and a central region, the peripheral region surrounding the The central area is divided into a staggered grinding area and a clearing area; the inner concave parts are concavely formed in the grinding area of the peripheral area of the surface, and the cleaning parts are provided with a clearing area fixed to the peripheral area of the surface . A polishing pad conditioner having a brush member according to claim 1, wherein a vertical distance between an end of each of the brush members and a horizontal surface formed by the tips of the abrasives is equal.