TWI539670B - Multi-layer circuit board - Google Patents

Multi-layer circuit board Download PDF

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TWI539670B
TWI539670B TW103143059A TW103143059A TWI539670B TW I539670 B TWI539670 B TW I539670B TW 103143059 A TW103143059 A TW 103143059A TW 103143059 A TW103143059 A TW 103143059A TW I539670 B TWI539670 B TW I539670B
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layer
conductive
polymer layer
polymer
substrate
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TW103143059A
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TW201622242A (en
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黃萌祺
李偉宇
高端環
周敏傑
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財團法人工業技術研究院
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Priority to CN201410820850.6A priority patent/CN105792502B/en
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Description

積層式線路板 Laminated circuit board

本提案係關於一種積層式線路板,特別是有關於一種以低溫形成之積層式線路板。 This proposal relates to a laminated circuit board, and more particularly to a laminated circuit board formed at a low temperature.

於電子裝置中,通常會遇到於基板上形成線路,以電性連接各種電子元件。或甚至於無線通訊的領域中,還可藉由於基板上形成線圈,而製作出天線元件。 In an electronic device, a circuit is usually formed on a substrate to electrically connect various electronic components. Or even in the field of wireless communication, an antenna element can be fabricated by forming a coil on a substrate.

於習知製造天線元件的技術中,通常會將線圈設置於額外的電路板,並於完成天線元件後,再貼附於電子裝置的殼體內面。然而,如此的做法,往往會限制電子裝置內的電路配置,也較不易縮小電子裝置的體積。 In the conventional technique of manufacturing an antenna element, the coil is usually placed on an additional circuit board, and after the antenna element is completed, it is attached to the inner surface of the casing of the electronic device. However, such an approach tends to limit the circuit configuration within the electronic device and is less likely to shrink the size of the electronic device.

因此,有製造者直接在電子裝置的殼體內面設置高分子層,再於高分子層設置線圈,以擴展電子裝置內的電路配製的彈性,並縮小電子裝置的體積。然而,當將高分子層固化於殼體內面時,往往需要較高的固化溫度才能夠固化高分子層。但殼體本身的容許溫度卻又往往低於高分子層的固化溫度。如此一來,於固化高分子層的過程中,將會導致殼體變形或損壞。 Therefore, there is a manufacturer that directly sets a polymer layer on the inner surface of the casing of the electronic device, and then provides a coil on the polymer layer to expand the flexibility of circuit preparation in the electronic device and to reduce the volume of the electronic device. However, when the polymer layer is cured on the inner surface of the casing, a high curing temperature is often required to cure the polymer layer. However, the allowable temperature of the casing itself is often lower than the curing temperature of the polymer layer. As a result, the casing may be deformed or damaged during the process of curing the polymer layer.

有鑑於以上的問題,本提案提出一種積層式線路 板,藉由使用較低溫即可固化之高分子層,而能夠於較低溫度的環境下完成製造積層式線路板。 In view of the above problems, this proposal proposes a laminated circuit. The board can be used to manufacture a laminated circuit board in a lower temperature environment by using a polymer layer which can be cured at a lower temperature.

本提案提出一種積層式線路板,包括一基板及一第一線路積層。第一線路積層包括一第一高分子層及一第一導電層。第一高分子層設置於基板之一表面。第一高分子層之材質包括彼此混合之一第一觸發粒子、一第一高分子材料及一第一固化劑。第一高分子層之材料穩定溫度小於攝氏80度。第一導電層嵌設於第一高分子層遠離基板之一表面。 The proposal proposes a laminated circuit board comprising a substrate and a first line laminate. The first circuit layer includes a first polymer layer and a first conductive layer. The first polymer layer is disposed on one surface of the substrate. The material of the first polymer layer includes one of the first trigger particles, a first polymer material and a first curing agent mixed with each other. The material stability of the first polymer layer is less than 80 degrees Celsius. The first conductive layer is embedded on the surface of the first polymer layer away from the substrate.

根據本提案之積層式線路板,能夠藉由高分子層的材料穩定溫度小於攝氏80度,而於較低溫的環境下製造積層式線路板。因此,當電子裝置的殼體為此基板,且於基板之表面固化高分子層時,殼體不易受到高分子層之固化溫度的影響而變形或受損。而且,於其他場合中,積層式線路板還能應用容許溫度高於高分子層之固化溫度的各種基板。 According to the laminated circuit board of the present proposal, the laminated circuit board can be manufactured in a lower temperature environment by the material stable temperature of the polymer layer being less than 80 degrees Celsius. Therefore, when the casing of the electronic device is the substrate and the polymer layer is cured on the surface of the substrate, the casing is less likely to be deformed or damaged by the curing temperature of the polymer layer. Further, in other cases, the laminated circuit board can also apply various substrates which allow the temperature to be higher than the curing temperature of the polymer layer.

以上之關於本提案內容之說明及以下之實施方式之說明係用以示範與解釋本提案之精神與原理,並且提供本提案之專利申請範圍更進一步之解釋。 The above description of the contents of this proposal and the following description of the implementation of the proposal are used to demonstrate and explain the spirit and principle of this proposal, and provide a further explanation of the scope of the patent application of this proposal.

10、20、30、40‧‧‧積層式線路板 10, 20, 30, 40‧‧‧ laminated circuit boards

11、21、31、41‧‧‧基板 11, 21, 31, 41‧‧‧ substrates

111、211、311‧‧‧上表面 111, 211, 311‧‧‧ upper surface

12‧‧‧線路積層 12‧‧‧Line stacking

121‧‧‧高分子層 121‧‧‧ polymer layer

121a、231a‧‧‧凹槽 121a, 231a‧‧‧ grooves

1211‧‧‧表面 1211‧‧‧ surface

122‧‧‧導電層 122‧‧‧ Conductive layer

122a、222a、322a、422a‧‧‧第一饋入點 122a, 222a, 322a, 422a‧‧‧ first feed point

122b、232a、332a、422b‧‧‧第二饋入點 122b, 232a, 332a, 422b‧‧‧ second feed point

22、32、42‧‧‧第一線路積層 22, 32, 42‧‧‧ first line stack

221、321、421‧‧‧第一高分子層 221, 321, 421‧‧‧ first polymer layer

2211、3211‧‧‧表面 2211, 3211‧‧‧ surface

222、322、422‧‧‧第一導電層 222, 322, 422‧‧‧ first conductive layer

222b、322b‧‧‧第一連接點 222b, 322b‧‧‧ first connection point

23、33、43‧‧‧第二線路積層 23, 33, 43‧‧‧ second line stack

231、331、431‧‧‧第二高分子層 231, 331, 431‧‧‧ second polymer layer

2311、3311‧‧‧表面 2311, 3311‧‧‧ surface

232、332、432‧‧‧第二導電層 232, 332, 432‧‧‧ second conductive layer

232b、332b‧‧‧第二連接點 232b, 332b‧‧‧second connection point

24、34、441、442、443、444、445、446‧‧‧導電通孔 24, 34, 441, 442, 443, 444, 445, 446‧‧‧ conductive through holes

24a‧‧‧貫穿孔 24a‧‧‧through holes

31a‧‧‧第一貫穿孔 31a‧‧‧first through hole

310‧‧‧基板高分子層 310‧‧‧Substrate polymer layer

312‧‧‧下表面 312‧‧‧ lower surface

321a‧‧‧第一凹槽 321a‧‧‧first groove

331a‧‧‧第二凹槽 331a‧‧‧second groove

34a‧‧‧第二貫穿孔 34a‧‧‧second through hole

4221‧‧‧第一導電跡線 4221‧‧‧First conductive trace

4223‧‧‧第三導電跡線 4223‧‧‧3rd conductive trace

4225‧‧‧第五導電跡線 4225‧‧‧ fifth conductive trace

4227‧‧‧第七導電跡線 4227‧‧‧ seventh conductive trace

4322‧‧‧第二導電跡線 4322‧‧‧Second conductive trace

4324‧‧‧第四導電跡線 4324‧‧‧4th conductive trace

4326‧‧‧第六導電跡線 4326‧‧‧ sixth conductive trace

第1圖繪示依照本提案之一實施例之積層式線路板之立體示意圖。 FIG. 1 is a perspective view of a laminated circuit board according to an embodiment of the present proposal.

第2圖、第3圖及第4圖繪示第1圖之積層式線路板之製造 流程剖面示意圖。 2, 3, and 4 illustrate the manufacture of the laminated circuit board of FIG. Schematic diagram of the process profile.

第5圖繪示依照本提案之另一實施例之積層式線路板之立體示意圖。 FIG. 5 is a schematic perspective view of a laminated circuit board according to another embodiment of the present proposal.

第6圖、第7圖、第8圖及第9圖繪示第5圖之積層式線路板之製造流程剖面示意圖。 Fig. 6, Fig. 7, Fig. 8, and Fig. 9 are schematic cross-sectional views showing the manufacturing process of the laminated circuit board of Fig. 5.

第10圖繪示依照本提案之另一實施例之積層式線路板之立體示意圖。 FIG. 10 is a perspective view of a laminated circuit board according to another embodiment of the present proposal.

第11圖、第12圖及第13圖繪示第10圖之積層式線路板之製造流程剖面示意圖。 11 , 12 and 13 are cross-sectional views showing the manufacturing process of the laminated circuit board of FIG. 10 .

第14圖繪示依照本提案之另一實施例之積層式線路板之立體示意圖。 Figure 14 is a perspective view showing a laminated circuit board according to another embodiment of the present proposal.

以下在實施方式中詳細敘述本提案之詳細特徵以及優點,其內容足以使任何本領域中具通常知識者了解本提案之技術內容並據以實施,且根據本說明書所揭露之內容、申請專利範圍及圖式,任何本領域中具通常知識者可輕易地理解本提案相關之目的及優點。以下之實施例係進一步詳細說明本提案之觀點,但非以任何觀點限制本提案之範疇。 The detailed features and advantages of the present invention are described in detail below in the embodiments, which are sufficient to enable any person skilled in the art to understand the technical contents of the present invention and implement them according to the contents disclosed herein. And the drawings, any one of ordinary skill in the art can easily understand the purpose and advantages of this proposal. The following examples further illustrate the views of this proposal in detail, but do not limit the scope of this proposal by any point of view.

圖中繪示的比例僅為參考示意用,而非用以限定本提案。 The proportions shown in the figures are for reference only and are not intended to limit the proposal.

請參照第1圖,繪示依照本提案之一實施例之積層式線路板10之立體示意圖。於本實施例中,積層式線路板10包 括一基板11及一線路積層12。基板11可為電子裝置的殼體,也可為電子裝置內的電路板。線路積層12包括一高分子層121及一導電層122。高分子層121設置於基板11之一上表面111。高分子層121之材質包括彼此混合之一觸發粒子、一高分子材料、一固化劑及一色料。高分子層121之材料穩定溫度小於80度,更甚者為高分子層121之固化溫度小於攝氏80度。高分子層121為電性絕緣。導電層122嵌設於高分子層121之一表面1211,此表面1211為遠離基板11之表面1211。導電層122之裸露表面可鍍有保護層(未繪示),保護層之材質可例如但不限於為金或鎳。雖於本實施例中,高分子層121之材質包括色料,但不限於此。於其他實施例中,高分子層121之材質亦可依需求而不包括色料。 Please refer to FIG. 1 , which is a perspective view of a laminated circuit board 10 according to an embodiment of the present proposal. In this embodiment, the laminated circuit board 10 package A substrate 11 and a wiring layer 12 are included. The substrate 11 can be a housing of an electronic device or a circuit board within the electronic device. The wiring layer 12 includes a polymer layer 121 and a conductive layer 122. The polymer layer 121 is provided on one of the upper surfaces 111 of the substrate 11. The material of the polymer layer 121 includes one of the trigger particles, a polymer material, a curing agent and a colorant. The material temperature of the polymer layer 121 is less than 80 degrees, and even more, the curing temperature of the polymer layer 121 is less than 80 degrees Celsius. The polymer layer 121 is electrically insulated. The conductive layer 122 is embedded on the surface 1211 of the polymer layer 121. The surface 1211 is away from the surface 1211 of the substrate 11. The exposed surface of the conductive layer 122 may be plated with a protective layer (not shown), and the material of the protective layer may be, for example but not limited to, gold or nickel. In the present embodiment, the material of the polymer layer 121 includes a coloring material, but is not limited thereto. In other embodiments, the material of the polymer layer 121 may also include a colorant as needed.

於本實施例中,高分子層121之厚度可例如但不限於10~100μm。導電層122之厚度可例如但不限於10~20μm。但導電層122之厚度小於高分子層121之厚度。導電層122可設置成線圈的圖案。舉例而言,此線圈的圖案可為螺旋圖案。更甚者可為方形的螺旋圖案。導電層122之兩端分別具有一第一饋入點122a及一第二饋入點122b。訊號源可藉由第一饋入點122a及第二饋入點122b對導電層122饋入訊號。製造者可藉由適當調整導電層122之線寬及線距,以改變導電層122內的電容性耦合。藉此能夠設計整體線圈的饋入虛部感抗量,以補償導電層122所產生的高電感效應,且調整補償饋入電容效應,改善輸入阻抗匹配,提高饋入激發電流強度。 In the present embodiment, the thickness of the polymer layer 121 can be, for example but not limited to, 10 to 100 μm. The thickness of the conductive layer 122 can be, for example but not limited to, 10-20 μm. However, the thickness of the conductive layer 122 is smaller than the thickness of the polymer layer 121. The conductive layer 122 may be arranged in a pattern of coils. For example, the pattern of this coil can be a spiral pattern. Even more can be a square spiral pattern. Each of the two ends of the conductive layer 122 has a first feed point 122a and a second feed point 122b. The signal source can feed the conductive layer 122 by the first feed point 122a and the second feed point 122b. The manufacturer can change the capacitive coupling within the conductive layer 122 by appropriately adjusting the line width and line spacing of the conductive layer 122. Thereby, the imaginary inductance of the feeding of the integral coil can be designed to compensate for the high inductance effect generated by the conductive layer 122, and the compensation feed capacitor effect is adjusted, the input impedance matching is improved, and the excitation current intensity is improved.

於本實施例中,基板11之材質可例如但不限於選自鐵氧體(ferrite)、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)及聚醯亞胺(polyimide,PI)所構成之群組。於其他實施例中,基板11之材質亦可例如但不限於為玻璃、銅、鐵或其他高分子聚合物。 In this embodiment, the material of the substrate 11 can be, for example but not limited to, selected from the group consisting of ferrite, polyethylene terephthalate (PET), and polyimide (PI). Group of. In other embodiments, the material of the substrate 11 can also be, for example but not limited to, glass, copper, iron or other high molecular polymer.

觸發粒子可例如但不限於為陶瓷粒子、有機金屬粒子、金屬螯合物或能隙大於等於3電子伏特(eV)的半導體材料。 The triggering particles can be, for example but not limited to, ceramic particles, organometallic particles, metal chelates, or semiconductor materials having an energy gap of 3 electron volts (eV) or greater.

有機金屬粒子之結構例如為R-M-R或R-M-X,其中M為金屬,R為烷基、芳香烴、環烷、鹵烷、雜環或羧酸,X為鹵素化合物或胺類。M可選自由金、銀、銅、錫、鋁、鎳及鈀所構成之群組。 The structure of the organometallic particles is, for example, R-M-R or R-M-X, wherein M is a metal, R is an alkyl group, an aromatic hydrocarbon, a cycloalkane, a halogene, a heterocyclic ring or a carboxylic acid, and X is a halogen compound or an amine. M can be selected from the group consisting of gold, silver, copper, tin, aluminum, nickel and palladium.

金屬螯合物可由一螯合劑螯合一金屬而形成。螯合劑可為吡咯烷二硫代氨基甲酸銨(Ammonium pyrrolidine dithiocarbamate,APDC)、乙二胺四乙酸(ehtylenediaminetetraacetic acid,EDTA)、NTA(nitrilotri actiate)或二乙烯三胺五乙酸(diethylenetriamine pentaacetic acid,DTPA)。舉例而言,金屬螯合物可為銅-乙二胺四乙酸(Cu-EDTA)螯合物。 The metal chelate can be formed by chelation of a metal with a chelating agent. The chelating agent may be Ammonium pyrrolidine dithiocarbamate (APDC), ehtylenediaminetetraacetic acid (EDTA), NTA (nitrilotri actiate) or diethylenetriamine pentaacetic acid (DTPA). ). For example, the metal chelate can be a copper-ethylenediaminetetraacetic acid (Cu-EDTA) chelate.

能隙大於等於3電子伏特(eV)的半導體材料如選自由氮化鎵、硫化鋅、碳化矽、氧化鋅、二氧化鈦、氮化鋁鎵、氮化鋁、氧化鋁、氮化硼、氮化矽及二氧化矽所構成之群組。 A semiconductor material having an energy gap of 3 electron volts (eV) or higher is selected from the group consisting of gallium nitride, zinc sulfide, tantalum carbide, zinc oxide, titanium oxide, aluminum gallium nitride, aluminum nitride, aluminum oxide, boron nitride, and tantalum nitride. And a group of cerium oxide.

高分子材料可例如但不限於選自環氧材料 (epoxy)、聚甲基丙烯酸甲酯(PMMA)及壓克力樹酯所構成之群組。其中,環氧材料例如為雙酚(bisphenol)及環氧樹脂的混合物。 The polymer material can be, for example but not limited to, selected from epoxy materials Group of (epoxy), polymethyl methacrylate (PMMA) and acrylic resin. Among them, the epoxy material is, for example, a mixture of bisphenol and epoxy resin.

固化劑可例如但不限於選自胺類交聯劑及亞甲基雙丙烯醯胺(MBA)交聯劑所構成之群組。其中,胺類交聯劑例如為雙氰胺(DICY)交聯劑、苯胺類交聯劑等。其中,當高分子材料為環氧材料,固化劑為雙氰胺交聯劑時,高分子層121的固化溫度可小於攝氏60度。 The curing agent can be, for example but not limited to, a group selected from the group consisting of an amine crosslinking agent and a methylene bis acrylamide (MBA) crosslinking agent. Among them, the amine crosslinking agent is, for example, a dicyandiamide (DICY) crosslinking agent or an aniline crosslinking agent. Wherein, when the polymer material is an epoxy material and the curing agent is a dicyandiamide crosslinking agent, the curing temperature of the polymer layer 121 may be less than 60 degrees Celsius.

請參照第2圖、第3圖及第4圖,繪示第1圖之積層式線路板10之製造流程剖面示意圖。如第2圖所示,提供基板11,且於基板11之上表面111形成高分子層121,且於低於攝氏80度的環境下固化高分子層121。 Referring to FIGS. 2, 3, and 4, a cross-sectional view showing the manufacturing process of the laminated circuit board 10 of FIG. 1 is shown. As shown in FIG. 2, the substrate 11 is provided, and the polymer layer 121 is formed on the upper surface 111 of the substrate 11, and the polymer layer 121 is cured in an environment lower than 80 degrees Celsius.

如第3圖所示,利用雷射等手段,於高分子層121之表面1211且相對應於第1圖所示之導電層122的位置刻劃出凹槽121a。於凹槽121a內,高分子材料會被移除,而留下觸發粒子於凹槽121a內表面。於本實施例中,因高分子層121內混合有色料,故所選擇的雷射可為可見光的雷射,以利高分子層121吸收雷射所提供的能量。於其他實施例中,當高分子層121內未混合有色料時,所選擇的雷射可為不可見光的雷射,如紫外光雷射。 As shown in Fig. 3, the groove 121a is scribed on the surface 1211 of the polymer layer 121 by a laser or the like and corresponding to the position of the conductive layer 122 shown in Fig. 1. In the recess 121a, the polymer material is removed, leaving the trigger particles on the inner surface of the recess 121a. In the present embodiment, since the coloring material is mixed in the polymer layer 121, the selected laser beam can be a visible light laser, so that the polymer layer 121 absorbs the energy provided by the laser. In other embodiments, when the colorant is not mixed in the polymer layer 121, the selected laser may be a non-visible laser such as an ultraviolet laser.

如第4圖所示,於凹槽121a內形成導電層122。形成導電層122時,可例如但不限於使用無電鍍的方式,以觸發粒 子做為核心,於凹槽121a內沉積導電層122。另外可於導電層122之裸露表面鍍上保護層(未繪示)。藉由第2圖至第4圖所示之步驟,完成積層式線路板10之製作。 As shown in FIG. 4, a conductive layer 122 is formed in the recess 121a. When the conductive layer 122 is formed, for example, but not limited to, using an electroless plating method to trigger the particles As a core, a conductive layer 122 is deposited in the recess 121a. In addition, a protective layer (not shown) may be plated on the exposed surface of the conductive layer 122. The fabrication of the laminated circuit board 10 is completed by the steps shown in Figs. 2 to 4 .

請參照第5圖,繪示依照本提案之另一實施例之積層式線路板20之立體示意圖。於本實施例中,積層式線路板20包括一基板21、一第一線路積層22、一第二線路積層23及一導電通孔24。 Referring to FIG. 5, a perspective view of a laminated circuit board 20 in accordance with another embodiment of the present disclosure is shown. In the present embodiment, the laminated circuit board 20 includes a substrate 21, a first wiring layer 22, a second wiring layer 23, and a conductive via 24.

第一線路積層22包括一第一高分子層221及一第一導電層222。第一高分子層221設置於基板21之上表面211。第一高分子層221之材質包括彼此混合之一第一觸發粒子、一第一高分子材料、一第一固化劑及一第一色料。第一高分子層221之材料穩定溫度小於80度,更甚者為第一高分子層221之固化溫度小於攝氏80度。第一高分子層221為電性絕緣。第一導電層222嵌設於第一高分子層221之一表面2211,此表面2211為遠離基板21之表面2211。雖於本實施例中,第一高分子層221之材質包括第一色料,但不限於此。於其他實施例中,第一高分子層221之材質亦可依需求而不包括第一色料。 The first wiring layer 22 includes a first polymer layer 221 and a first conductive layer 222. The first polymer layer 221 is disposed on the upper surface 211 of the substrate 21. The material of the first polymer layer 221 includes one of the first trigger particles, a first polymer material, a first curing agent and a first color material. The material stability temperature of the first polymer layer 221 is less than 80 degrees, and even more so that the curing temperature of the first polymer layer 221 is less than 80 degrees Celsius. The first polymer layer 221 is electrically insulated. The first conductive layer 222 is embedded on the surface 2211 of the first polymer layer 221 , and the surface 2211 is away from the surface 2211 of the substrate 21 . In the present embodiment, the material of the first polymer layer 221 includes the first color material, but is not limited thereto. In other embodiments, the material of the first polymer layer 221 may also include the first color material as needed.

第二線路積層23包括一第二高分子層231及一第二導電層232。第二高分子層231設置於第一線路積層22之表面2211。第二高分子層231之材質包括彼此混合之一第二觸發粒子、一第二高分子材料、一第二固化劑及一第二色料。第二高分子層231之材料穩定溫度小於80度,更甚者為第二高分子層231 之固化溫度小於攝氏80度。第二高分子層231為電性絕緣。第二導電層232嵌設於第二高分子層231之一表面2311,此表面2311為遠離第一線路積層22之表面2311。第二導電層232之裸露表面可鍍有保護層(未繪示)。雖於本實施例中,第二高分子層231之材質包括第二色料,但不限於此。於其他實施例中,第二高分子層231之材質亦可依需求而不包括第二色料。 The second wiring layer 23 includes a second polymer layer 231 and a second conductive layer 232. The second polymer layer 231 is disposed on the surface 2211 of the first wiring layer 22. The material of the second polymer layer 231 includes a second triggering particle, a second polymer material, a second curing agent and a second coloring material mixed with each other. The material stability temperature of the second polymer layer 231 is less than 80 degrees, and even more so is the second polymer layer 231. The curing temperature is less than 80 degrees Celsius. The second polymer layer 231 is electrically insulated. The second conductive layer 232 is embedded in a surface 2311 of the second polymer layer 231. The surface 2311 is away from the surface 2311 of the first wiring layer 22. The exposed surface of the second conductive layer 232 may be plated with a protective layer (not shown). In the present embodiment, the material of the second polymer layer 231 includes the second color material, but is not limited thereto. In other embodiments, the material of the second polymer layer 231 may also include the second colorant as needed.

導電通孔24貫穿第二高分子層231且電性連接第一導電層222及第二導電層232。 The conductive vias 24 penetrate the second polymer layer 231 and are electrically connected to the first conductive layer 222 and the second conductive layer 232 .

於本實施例中,第一線路積層22及第二線路積層23之尺寸及材質與第1圖所示之線路積層12之尺寸及材質可相似甚至實質上相同,故在此不再加以贅述。 In this embodiment, the size and material of the first circuit layer 22 and the second circuit layer 23 may be similar or even substantially the same as those of the circuit layer 12 shown in FIG. 1 , and thus will not be further described herein.

第一導電層222及第二導電層232可設置成線圈的圖案。舉例而言,此線圈的圖案可為螺旋圖案。更甚者可為方形的螺旋圖案。第一導電層222之兩端分別具有一第一饋入點222a及一第一連接點222b,第二導電層232之兩端分別具有一第二饋入點232a及一第二連接點232b。導電通孔24電性連接至第一連接點222b及第二連接點232b。訊號源可藉由第一饋入點222a及第二饋入點232a對第一導電層222及第二導電層232饋入訊號。製造者可藉由適當調整第一導電層222及第二導電層232之線寬及線距,以改變第一導電層222及第二導電層232內的電容性耦合。另外,可藉由適當調整第一導電層222及第二導電層232投影至基板21時重疊的位置及多寡,以改變第一導電層222及第 二導電層232之間的電容性耦合。藉此能夠設計整體線圈的饋入虛部感抗量,以補償第一導電層222及第二導電層232所產生的高電感效應,且調整補償饋入電容效應,改善輸入阻抗匹配,提高饋入激發電流強度。 The first conductive layer 222 and the second conductive layer 232 may be disposed in a pattern of coils. For example, the pattern of this coil can be a spiral pattern. Even more can be a square spiral pattern. The first conductive layer 222 has a first feeding point 222a and a first connecting point 222b. The two ends of the second conductive layer 232 have a second feeding point 232a and a second connecting point 232b. The conductive vias 24 are electrically connected to the first connection point 222b and the second connection point 232b. The signal source can feed the first conductive layer 222 and the second conductive layer 232 by the first feed point 222a and the second feed point 232a. The manufacturer can change the capacitive coupling in the first conductive layer 222 and the second conductive layer 232 by appropriately adjusting the line width and the line pitch of the first conductive layer 222 and the second conductive layer 232. In addition, the first conductive layer 222 and the first conductive layer 222 can be changed by appropriately adjusting the positions and the positions of the first conductive layer 222 and the second conductive layer 232 when they are projected onto the substrate 21. Capacitive coupling between the two conductive layers 232. Thereby, the imaginary inductance of the feeding of the integral coil can be designed to compensate for the high inductance effect generated by the first conductive layer 222 and the second conductive layer 232, and the compensation feed capacitor effect is adjusted, the input impedance matching is improved, and the feed is improved. Into the excitation current intensity.

請參照第6圖、第7圖、第8圖及第9圖,繪示第5圖之積層式線路板20之製造流程剖面示意圖。如第6圖所示,提供基板21及設置於基板21之上表面211之第一線路積層22。第一線路積層22之第一高分子層221及第一導電層222之製造方式可與第2圖、第3圖及第4圖所示之高分子層121及導電層122之製造方式相似,故在此不再贅述。 Referring to FIGS. 6 , 7 , 8 , and 9 , a cross-sectional view showing a manufacturing process of the laminated circuit board 20 of FIG. 5 is illustrated. As shown in FIG. 6, a substrate 21 and a first wiring layer 22 provided on the upper surface 211 of the substrate 21 are provided. The first polymer layer 221 and the first conductive layer 222 of the first wiring layer 22 can be manufactured in a similar manner to the polymer layer 121 and the conductive layer 122 shown in FIGS. 2, 3, and 4, Therefore, it will not be repeated here.

如第7圖所示,於第一高分子層221之表面2211形成第二高分子層231,且於低於攝氏80度的環境下固化第二高分子層231。 As shown in FIG. 7, the second polymer layer 231 is formed on the surface 2211 of the first polymer layer 221, and the second polymer layer 231 is cured in an environment of less than 80 degrees Celsius.

如第8圖所示,利用雷射等手段,於第二高分子層231之表面2311且相對應於第5圖所示之第二導電層232的位置刻劃出凹槽231a,且相對應於第5圖所示之導電通孔24的位置形成貫穿孔24a。貫穿孔24a貫穿第二高分子層231。於凹槽231a及貫穿孔24a內,第二高分子材料會被移除,而留下第二觸發粒子於凹槽231a內表面及貫穿孔24a內表面。於本實施例中,因第二高分子層231內混合有第二色料,故所選擇的雷射可為可見光的雷射,以利第二高分子層231吸收雷射所提供的能量。當第二高分子層231內未混合有第二色料時,所選擇的雷射可為不可見 光的雷射,如紫外光雷射。 As shown in FIG. 8, the groove 231a is scribed on the surface 2311 of the second polymer layer 231 and corresponding to the position of the second conductive layer 232 shown in FIG. 5 by means of laser or the like, and correspondingly The through hole 24a is formed at the position of the conductive via 24 shown in FIG. The through hole 24a penetrates the second polymer layer 231. In the recess 231a and the through hole 24a, the second polymer material is removed, leaving the second triggering particles on the inner surface of the recess 231a and the inner surface of the through hole 24a. In the present embodiment, since the second color layer is mixed in the second polymer layer 231, the selected laser beam can be a visible light laser, so that the second polymer layer 231 absorbs the energy provided by the laser. When the second color layer is not mixed in the second polymer layer 231, the selected laser may be invisible. A laser of light, such as an ultraviolet laser.

如第9圖所示,於凹槽231a內形成第二導電層232,且於貫穿孔24a內形成導電通孔24。形成第二導電層232及導電通孔24時,可例如但不限於使用無電鍍的方式,以觸發粒子做為核心,於凹槽231a內沉積第二導電層232,且於貫穿孔24a內沉積導電通孔24。另外可於第二導電層232之裸露表面鍍上保護層(未繪示)。藉由第6圖至第9圖所示之步驟,完成積層式線路板20之製作。 As shown in FIG. 9, a second conductive layer 232 is formed in the recess 231a, and a conductive via 24 is formed in the through hole 24a. When the second conductive layer 232 and the conductive vias 24 are formed, for example, but not limited to, using an electroless plating method, the triggering particles are used as a core, and the second conductive layer 232 is deposited in the recess 231a and deposited in the through holes 24a. Conductive through hole 24. In addition, a protective layer (not shown) may be plated on the exposed surface of the second conductive layer 232. The fabrication of the laminated circuit board 20 is completed by the steps shown in Figs. 6 to 9.

請參照第10圖,繪示依照本提案之另一實施例之積層式線路板30之立體示意圖。於本實施例中,積層式線路板30包括一基板31、一第一線路積層32、一第二線路積層33及一導電通孔34。 Referring to FIG. 10, a perspective view of a laminated circuit board 30 in accordance with another embodiment of the present disclosure is shown. In the present embodiment, the laminated circuit board 30 includes a substrate 31, a first wiring layer 32, a second wiring layer 33, and a conductive via 34.

第一線路積層32包括一第一高分子層321及一第一導電層322。第一高分子層321設置於基板31之上表面311。第一高分子層321之材質包括彼此混合之一第一觸發粒子、一第一高分子材料、一第一固化劑及一第一色料。第一高分子層321之材料穩定溫度小於80度,更甚者為第一高分子層321之固化溫度小於攝氏80度。第一高分子層321為電性絕緣。第一導電層322嵌設於第一高分子層321之一表面3211,此表面3211為遠離基板31之表面3211。第一導電層322之裸露表面可鍍有保護層(未繪示)。雖於本實施例中,第一高分子層321之材質包括第一色料,但不限於此。於其他實施例中,第一高分子層321之 材質亦可依需求而不包括第一色料。 The first wiring layer 32 includes a first polymer layer 321 and a first conductive layer 322. The first polymer layer 321 is disposed on the upper surface 311 of the substrate 31. The material of the first polymer layer 321 includes one of the first trigger particles, a first polymer material, a first curing agent and a first color material. The material stability temperature of the first polymer layer 321 is less than 80 degrees, and even more so that the curing temperature of the first polymer layer 321 is less than 80 degrees Celsius. The first polymer layer 321 is electrically insulated. The first conductive layer 322 is embedded in a surface 3211 of the first polymer layer 321 . The surface 3211 is a surface 3211 away from the substrate 31 . The exposed surface of the first conductive layer 322 may be plated with a protective layer (not shown). In the present embodiment, the material of the first polymer layer 321 includes the first color material, but is not limited thereto. In other embodiments, the first polymer layer 321 The material can also include the first color material as required.

第二線路積層33包括一第二高分子層331及一第二導電層332。第二高分子層331設置於基板31之下表面312,且第一高分子層321及第二高分子層331位於基板31之相對兩側。 The second wiring layer 33 includes a second polymer layer 331 and a second conductive layer 332. The second polymer layer 331 is disposed on the lower surface 312 of the substrate 31 , and the first polymer layer 321 and the second polymer layer 331 are located on opposite sides of the substrate 31 .

第二高分子層331之材質包括彼此混合之一第二觸發粒子、一第二高分子材料、一第二固化劑及一第二色料。第二高分子層331之材料穩定溫度小於80度,更甚者為第二高分子層331之固化溫度小於攝氏80度。第二高分子層331為電性絕緣。第二導電層332嵌設於第二高分子層331之一表面3311,此表面3311為遠離基板31之表面3311。第二導電層332之裸露表面可鍍有保護層(未繪示)。雖於本實施例中,第二高分子層331之材質包括第二色料,但不限於此。於其他實施例中,第二高分子層331之材質亦可依需求而不包括第二色料。 The material of the second polymer layer 331 includes a second triggering particle, a second polymer material, a second curing agent and a second coloring material mixed with each other. The material stability temperature of the second polymer layer 331 is less than 80 degrees, and even more so that the curing temperature of the second polymer layer 331 is less than 80 degrees Celsius. The second polymer layer 331 is electrically insulated. The second conductive layer 332 is embedded in a surface 3311 of the second polymer layer 331 . The surface 3311 is away from the surface 3311 of the substrate 31 . The exposed surface of the second conductive layer 332 may be plated with a protective layer (not shown). In the present embodiment, the material of the second polymer layer 331 includes the second color material, but is not limited thereto. In other embodiments, the material of the second polymer layer 331 may also include the second colorant as needed.

導電通孔34貫穿第一高分子層321、基板31及第二高分子層331,且電性連接第一導電層322及第二導電層332。 The conductive vias 34 penetrate the first polymer layer 321 , the substrate 31 , and the second polymer layer 331 , and electrically connect the first conductive layer 322 and the second conductive layer 332 .

於本實施例中,第一線路積層32及第二線路積層33之尺寸及材質與第1圖所示之線路積層12之尺寸及材質可相似甚至實質上相同,故在此不再加以贅述。 In this embodiment, the size and material of the first circuit layer 32 and the second circuit layer 33 may be similar or even substantially the same as those of the circuit layer 12 shown in FIG. 1 , and thus will not be further described herein.

第一導電層322及第二導電層332可設置成線圈的圖案。舉例而言,此線圈的圖案可為螺旋圖案。更甚者可為方形的螺旋圖案。第一導電層322之兩端分別具有一第一饋入點322a及一第一連接點322b,第二導電層332之兩端分別具有一第二饋 入點332a及一第二連接點332b。導電通孔34電性連接至第一連接點322b及第二連接點332b。訊號源可藉由第一饋入點322a及第二饋入點332a對第一導電層322及第二導電層332饋入訊號。 The first conductive layer 322 and the second conductive layer 332 may be disposed in a pattern of coils. For example, the pattern of this coil can be a spiral pattern. Even more can be a square spiral pattern. Each of the two ends of the first conductive layer 322 has a first feed point 322a and a first connection point 322b, and the two ends of the second conductive layer 332 respectively have a second feed. An entry point 332a and a second connection point 332b. The conductive vias 34 are electrically connected to the first connection point 322b and the second connection point 332b. The signal source can feed the first conductive layer 322 and the second conductive layer 332 by the first feed point 322a and the second feed point 332a.

請參照第11圖、第12圖及第13圖,繪示第10圖之積層式線路板30之製造流程剖面示意圖。如第11圖所示,提供基板31。基板具有一第一貫穿孔31a,第一貫穿孔31a的位置與第10圖所示之導電通孔34的位置相對應,且第一貫穿孔31a的外徑可大於導電通孔34的外徑,但不限於此。於其他實施例中,若基板31之材質為絕緣材質,第一貫穿孔31a的外徑可實質上等於導電通孔34的外徑。 Referring to FIG. 11, FIG. 12 and FIG. 13, a schematic cross-sectional view showing the manufacturing process of the laminated circuit board 30 of FIG. 10 is shown. As shown in Fig. 11, a substrate 31 is provided. The substrate has a first through hole 31a. The position of the first through hole 31a corresponds to the position of the conductive through hole 34 shown in FIG. 10, and the outer diameter of the first through hole 31a may be larger than the outer diameter of the conductive through hole 34. , but not limited to this. In other embodiments, if the material of the substrate 31 is made of an insulating material, the outer diameter of the first through hole 31a may be substantially equal to the outer diameter of the conductive through hole 34.

於基板31之上表面311形成第一高分子層321,於基板31之下表面312形成第二高分子層331,且於第一貫穿孔31a內填入一基板高分子層310。基板高分子層310之材質可與第一高分子層321或第二高分子層331之材質相同基板高分子層310之材質包括彼此混合之一基板觸發粒子、一基板高分子材料、一基板固化劑及一基板色料,但不限於此。於其他實施例中,基板高分子層310之材質亦可依需求而不包括基板色料。基板高分子層310為電性絕緣。於低於攝氏80度的環境下固化第一高分子層321、基板高分子層310及第二高分子層331。 A first polymer layer 321 is formed on the upper surface 311 of the substrate 31, a second polymer layer 331 is formed on the lower surface 312 of the substrate 31, and a substrate polymer layer 310 is filled in the first through hole 31a. The material of the substrate polymer layer 310 may be the same as the material of the first polymer layer 321 or the second polymer layer 331. The material of the substrate polymer layer 310 includes a substrate triggering particle, a substrate polymer material, and a substrate curing. And a substrate color, but are not limited thereto. In other embodiments, the material of the substrate polymer layer 310 may also include a substrate color material as needed. The substrate polymer layer 310 is electrically insulated. The first polymer layer 321, the substrate polymer layer 310, and the second polymer layer 331 are cured in an environment lower than 80 degrees Celsius.

如第12圖所示,利用雷射等手段,於第一高分子層321之表面3211且相對應於第10圖所示之第一導電層322的位置刻劃出第一凹槽321a,於第二高分子層331之表面3311且相 對應於第10圖所示之第二導電層332的位置刻劃出第二凹槽331a,且相對應於第10圖所示之導電通孔34的位置形成第二貫穿孔34a。第二貫穿孔34a貫穿第一高分子層321、基板高分子層310及第二高分子層331。於第一凹槽321a、第二凹槽331a及第二貫穿孔34a內,第一高分子材料、第二高分子材料及基板高分子材料會被移除,而留下第一觸發粒子於第一凹槽321a內表面,留下第二觸發粒子於第二凹槽331a內表面,且留下基板觸發粒子於第二貫穿孔34a內表面。於本實施例中,因第一高分子層321、基板高分子層310及第二高分子層331內分別混合有第一色料、基板色料及第二色料,故所選擇的雷射可為可見光的雷射,以利第一高分子層321、基板高分子層310及第二高分子層331吸收雷射所提供的能量。當第一高分子層321、基板高分子層310及第二高分子層331內未混合有第一色料、基板色料及第二色料時,所選擇的雷射可為不可見光的雷射。 As shown in FIG. 12, the first recess 321a is scribed on the surface 3211 of the first polymer layer 321 and corresponding to the first conductive layer 322 shown in FIG. 10 by means of laser or the like. The surface 3311 of the second polymer layer 331 and the phase The second recess 331a is scored corresponding to the position of the second conductive layer 332 shown in FIG. 10, and the second through hole 34a is formed corresponding to the position of the conductive via 34 shown in FIG. The second through hole 34 a penetrates the first polymer layer 321 , the substrate polymer layer 310 , and the second polymer layer 331 . In the first recess 321a, the second recess 331a, and the second through hole 34a, the first polymer material, the second polymer material, and the substrate polymer material are removed, leaving the first trigger particle in the first The inner surface of a recess 321a leaves the second triggering particle on the inner surface of the second recess 331a, and leaves the substrate triggering particles on the inner surface of the second through hole 34a. In this embodiment, since the first color layer, the substrate polymer layer 310, and the second polymer layer 331 are respectively mixed with the first color material, the substrate color material, and the second color material, the selected laser light can be selected. For the laser of visible light, the first polymer layer 321, the substrate polymer layer 310, and the second polymer layer 331 absorb the energy provided by the laser. When the first color layer, the substrate polymer layer 310, and the second polymer layer 331 are not mixed with the first color material, the substrate color material, and the second color material, the selected laser may be a non-visible laser. .

如第13圖所示,於第一凹槽321a內形成第一導電層322,於第二凹槽331a內形成第二導電層332,且於第二貫穿孔34a內形成導電通孔34。形成第一導電層322、第二導電層332及導電通孔34時,可例如但不限於使用無電鍍的方式,以觸發粒子做為核心,於第一凹槽321a內沉積第一導電層322,於第二凹槽331a內沉積第二導電層332,且於第二貫穿孔34a內沉積導電通孔34。另外可於第一導電層322之裸露表面及第二導電層332之裸露表面鍍上保護層(未繪示)。藉由第11圖至第13圖所 示之步驟,完成積層式線路板30之製作。 As shown in FIG. 13, a first conductive layer 322 is formed in the first recess 321a, a second conductive layer 332 is formed in the second recess 331a, and a conductive via 34 is formed in the second through hole 34a. When the first conductive layer 322, the second conductive layer 332, and the conductive vias 34 are formed, the first conductive layer 322 may be deposited in the first recess 321a by using, for example, but not limited to, an electroless plating method. A second conductive layer 332 is deposited in the second recess 331a, and a conductive via 34 is deposited in the second through hole 34a. In addition, a protective layer (not shown) may be plated on the exposed surface of the first conductive layer 322 and the exposed surface of the second conductive layer 332. By Figures 11 to 13 In the steps shown, the fabrication of the laminated circuit board 30 is completed.

請參照第14圖,繪示依照本提案之另一實施例之積層式線路板40之立體示意圖。本實施例之積層式線路板40與第10圖所示之積層式線路板30相似,但配線方式略有不同。於本實施例中,積層式線路板40包括一基板41、一第一線路積層42、一第二線路積層43及多個導電通孔441、442、443、444、445、446。第一導電層422於基板41之投影偏於基板41之一側,第二導電層432於基板41之投影偏於基板41之另一側。第一導電層422及第二導電層432於基板41之投影僅重疊於導電通孔441、442、443、444、445、446。 Please refer to FIG. 14 , which is a perspective view of a laminated circuit board 40 according to another embodiment of the present proposal. The laminated circuit board 40 of the present embodiment is similar to the laminated circuit board 30 shown in Fig. 10, but the wiring pattern is slightly different. In the present embodiment, the laminated circuit board 40 includes a substrate 41, a first wiring layer 42, a second wiring layer 43, and a plurality of conductive vias 441, 442, 443, 444, 445, and 446. The projection of the first conductive layer 422 on the substrate 41 is biased on one side of the substrate 41, and the projection of the second conductive layer 432 on the substrate 41 is biased on the other side of the substrate 41. The projections of the first conductive layer 422 and the second conductive layer 432 on the substrate 41 overlap only the conductive vias 441, 442, 443, 444, 445, and 446.

第一導電層422包括奇數序號的導電跡線,即一第一導電跡線4221、一第三導電跡線4223、一第五導電跡線4225及一第七導電跡線4227,且圍繞基板41的中央位置並由內向外排列。第二導電層432包括偶數序號的導電跡線,即一第二導電跡線4322、一第四導電跡線4324及一第六導電跡線4326,且圍繞基板41的中央位置並由內向外排列。導電通孔441、442、443、444、445、446貫穿第一高分子層421、基板41及第二高分子層431。 The first conductive layer 422 includes odd-numbered conductive traces, that is, a first conductive trace 4221, a third conductive trace 4223, a fifth conductive trace 4225, and a seventh conductive trace 4227, and surrounds the substrate 41. The central position is arranged from the inside out. The second conductive layer 432 includes even-numbered conductive traces, that is, a second conductive trace 4322, a fourth conductive trace 4324, and a sixth conductive trace 4326, and is disposed around the center of the substrate 41 and is arranged from the inside to the outside. . The conductive vias 441, 442, 443, 444, 445, and 446 penetrate the first polymer layer 421, the substrate 41, and the second polymer layer 431.

導電通孔441電性連接第一導電跡線4221之一端及第二導電跡線4322之一端。導電通孔442電性連接第二導電跡線4322之另一端及第三導電跡線4223之一端。導電通孔443電性連接第三導電跡線4223之另一端及第四導電跡線4324之一 端。導電通孔444電性連接第四導電跡線4324之另一端及第五導電跡線4225之一端。導電通孔445電性連接第五導電跡線4225之另一端及第六導電跡線4326之一端。導電通孔446電性連接第六導電跡線4326之另一端及第七導電跡線4227之一端。第一導電層422之第一饋入點422a位於第一導電跡線4221相對於導電通孔441之一端,第二饋入點422b位於第七導電跡線4227相對於導電通孔446之一端。 The conductive via 441 is electrically connected to one end of the first conductive trace 4221 and one end of the second conductive trace 4322. The conductive via 442 is electrically connected to the other end of the second conductive trace 4322 and one end of the third conductive trace 4223. The conductive via 443 is electrically connected to the other end of the third conductive trace 4223 and one of the fourth conductive traces 4324 end. The conductive via 444 is electrically connected to the other end of the fourth conductive trace 4324 and one end of the fifth conductive trace 4225. The conductive via 445 is electrically connected to the other end of the fifth conductive trace 4225 and one end of the sixth conductive trace 4326. The conductive via 446 is electrically connected to the other end of the sixth conductive trace 4326 and one end of the seventh conductive trace 4227. The first feed point 422a of the first conductive layer 422 is located at one end of the first conductive trace 4221 with respect to the conductive via 441, and the second feed point 422b is located at one end of the seventh conductive trace 4227 with respect to the conductive via 446.

由於第一導電層422及第二導電層432於基板41之投影僅重疊於導電通孔441、442、443、444、445、446,故第一導電層422及第二導電層432實質上是設置成單層線圈。訊號源可藉由第一饋入點422a及第二饋入點422b對第一導電層422及第二導電層432饋入訊號。由於第一導電層422及第二導電層432所設置成之單層線圈相對於基板41具有一偏斜方向,故此線圈所造成的磁力線方向相對於基板41也會有所偏斜。若以此線圈做為天線,則其發射方向及接收方向相對於基板41也會有所偏斜,甚至具有90度的偏轉。 The first conductive layer 422 and the second conductive layer 432 are substantially Set to a single layer coil. The signal source can feed the first conductive layer 422 and the second conductive layer 432 by the first feed point 422a and the second feed point 422b. Since the single-layer coils provided by the first conductive layer 422 and the second conductive layer 432 have a skew direction with respect to the substrate 41, the direction of the magnetic lines of force caused by the coils is also skewed relative to the substrate 41. If the coil is used as an antenna, the direction of emission and the direction of reception are also skewed relative to the substrate 41, even with a deflection of 90 degrees.

綜上所述,本提案之積層式線路板,能夠藉由高分子層的材料穩定溫度小於80度,更甚者為高分子層的固化溫度小於攝氏80度,而於較低溫的環境下製造積層式線路板。因此,當電子裝置的殼體為此基板,且於基板之表面固化高分子層時,殼體不會受到高分子層之固化溫度的影響而變形或受損。而且,於其他場合中,積層式線路板還能應用容許溫度高於高分子層之 固化溫度的各種基板。 In summary, the laminated circuit board of the present invention can be manufactured in a lower temperature environment by a material having a stable temperature of less than 80 degrees, or a curing temperature of the polymer layer being less than 80 degrees Celsius. Laminated circuit board. Therefore, when the casing of the electronic device is the substrate and the polymer layer is cured on the surface of the substrate, the casing is not deformed or damaged by the curing temperature of the polymer layer. Moreover, in other occasions, the laminated circuit board can also be applied with a temperature higher than that of the polymer layer. Various substrates for curing temperatures.

此外,本提案之積層式線路板,能夠藉由調整導電層之線寬及線距,改變導電層內的電容性耦合,以設計整體線圈的饋入虛部感抗量,補償導電層所產生的高電感效應,且調整補償饋入電容效應,改善輸入阻抗匹配,以提高饋入激發電流強度。 In addition, the laminated circuit board of the present proposal can change the capacitive coupling in the conductive layer by adjusting the line width and the line spacing of the conductive layer, thereby designing the imaginary inductance of the integral coil to compensate the conductive layer. The high inductance effect, and the adjustment compensates for the feed capacitance effect, improving the input impedance matching to improve the excitation current intensity.

另外,本提案之積層式線路板,還能夠藉由藉由調整第一導電層及第二導電層投影至基板時重疊的位置及多寡,改變第一導電層及第二導電層之間的電容性耦合。另外,藉由第一導電層及第二導電層於位置上的配置,能夠製造出具有偏向性的單層線圈,以得到具有偏向性的電磁特徵。 In addition, the laminated circuit board of the present invention can also change the capacitance between the first conductive layer and the second conductive layer by adjusting the position and the amount of overlap of the first conductive layer and the second conductive layer when projected onto the substrate. Sexual coupling. In addition, by the positional arrangement of the first conductive layer and the second conductive layer, a single-layer coil having a bias property can be manufactured to obtain an electromagnetic characteristic having a bias property.

雖然本提案以前述之實施例揭露如上,然其並非用以限定本提案。在不脫離本提案之精神和範圍內,所為之更動與潤飾,均屬本提案之專利保護範圍。關於本提案所界定之保護範圍請參考所附之申請專利範圍。 Although this proposal is disclosed above in the foregoing embodiments, it is not intended to limit the proposal. All changes and refinements are within the scope of the patent protection of this proposal without departing from the spirit and scope of this proposal. Please refer to the attached patent application scope for the scope of protection defined in this proposal.

10‧‧‧積層式線路板 10‧‧‧Laminated circuit board

11‧‧‧基板 11‧‧‧Substrate

111‧‧‧上表面 111‧‧‧Upper surface

12‧‧‧線路積層 12‧‧‧Line stacking

121‧‧‧高分子層 121‧‧‧ polymer layer

1211‧‧‧表面 1211‧‧‧ surface

122‧‧‧導電層 122‧‧‧ Conductive layer

122a‧‧‧第一饋入點 122a‧‧‧First feed point

122b‧‧‧第二饋入點 122b‧‧‧second feed point

Claims (11)

一種積層式線路板,包括:一基板;以及一第一線路積層,包括:一第一高分子層,設置於該基板之一表面,該第一高分子層之材質包括彼此混合之一第一觸發粒子、一第一高分子材料及一第一固化劑,該第一高分子層之材料穩定溫度小於攝氏80度,該第一觸發粒子為陶瓷粒子、有機金屬粒子、金屬螯合物或能隙大於等於3電子伏特(eV)的半導體材料,其中有機金屬粒子之結構為R-M-R或R-M-X,M為選自由金、銀、銅、錫、鋁、鎳及鈀所構成之群組之金屬,R為烷基、芳香烴、環烷、鹵烷、雜環或羧酸,X為鹵素化合物或胺類,金屬螯合物為由一螯合劑螯合金屬而形成,該螯合劑為吡咯烷二硫代氨基甲酸銨(Ammonium pyrrolidine dithiocarbamate,APDC)、乙二胺四乙酸(ehtylenediaminetetraacetic acid,EDTA)、NTA(nitrilotri actiate)或二乙烯三胺五乙酸(diethylenetriamine pentaacetic acid,DTPA),能隙大於等於3電子伏特的半導體材料選自由氮化鎵、硫化鋅、碳化矽、氧化鋅、二氧化鈦、氮化鋁鎵、氮化鋁、氧化鋁、氮化硼、氮化矽及二氧化矽所構成之群組;以及一第一導電層,嵌設於該第一高分子層遠離該基板 之一表面。 A laminated circuit board comprising: a substrate; and a first circuit layer, comprising: a first polymer layer disposed on a surface of the substrate, the material of the first polymer layer comprising one of the first layers The triggering particles, a first polymer material and a first curing agent, wherein the first polymer layer has a material stable temperature of less than 80 degrees Celsius, and the first triggering particles are ceramic particles, organic metal particles, metal chelates or energy A semiconductor material having a gap of 3 electron volts (eV) or more, wherein the structure of the organometallic particles is RMR or RMX, and M is a metal selected from the group consisting of gold, silver, copper, tin, aluminum, nickel, and palladium, R Is an alkyl group, an aromatic hydrocarbon, a cycloalkane, a halogen alkane, a heterocyclic ring or a carboxylic acid, X is a halogen compound or an amine, and the metal chelate compound is formed by chelation of a metal with a chelating agent, which is pyrrolidine disulfide. Ammonium pyrrolidine dithiocarbamate (APDC), ethiylenediaminetetraacetic acid (EDTA), NTA (nitrilotri actiate) or diethylenetriamine pentaacetic acid (DTPA), energy gap The semiconductor material of 3 electron volts or more is selected from the group consisting of gallium nitride, zinc sulfide, tantalum carbide, zinc oxide, titanium dioxide, aluminum gallium nitride, aluminum nitride, aluminum oxide, boron nitride, tantalum nitride and hafnium oxide. And a first conductive layer embedded in the first polymer layer away from the substrate One of the surfaces. 如請求項1所述之積層式線路板,其中該第一高分子層之固化溫度小於攝氏80度。 The laminated circuit board of claim 1, wherein the first polymer layer has a curing temperature of less than 80 degrees Celsius. 如請求項1所述之積層式線路板,其中該基板之材質選自鐵氧體(ferrite)、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)及聚醯亞胺(polyimide,PI)所構成之群組。 The laminated circuit board according to claim 1, wherein the material of the substrate is selected from the group consisting of ferrite, polyethylene terephthalate (PET), and polyimide (PI). The group formed. 如請求項1所述之積層式線路板,其中該第一高分子材料選自環氧樹酯及壓克力樹酯所構成之群組。 The laminated circuit board of claim 1, wherein the first polymer material is selected from the group consisting of epoxy resin and acrylic resin. 如請求項1所述之積層式線路板,其中該第一固化劑選自胺類交聯劑及亞甲基雙丙烯醯胺(MBA)交聯劑所構成之群組。 The laminated circuit board of claim 1, wherein the first curing agent is selected from the group consisting of an amine crosslinking agent and a methylene bisacrylamide (MBA) crosslinking agent. 如請求項1所述之積層式線路板,其中該第一高分子層之材質還包括一色料,與該第一觸發粒子、該第一高分子材料及該第一固化劑彼此混合。 The laminated circuit board of claim 1, wherein the material of the first polymer layer further comprises a colorant, and the first triggering particles, the first polymer material and the first curing agent are mixed with each other. 如請求項1所述之積層式線路板,更包括一第二線路積層,包括:一第二高分子層,設置於該第一線路積層遠離該基板之一表面,該第二高分子層之材質包括彼此混合之一第二觸發粒子、一第二高分子材料及一第二固化劑,該第二高分子層之固化溫度小於攝氏80度:以及一第二導電層,嵌設於該第二高分子層遠離該第一線路積層之一表面。 The layered circuit board of claim 1, further comprising a second circuit layer, comprising: a second polymer layer disposed on the surface of the first circuit layer away from the surface of the substrate, the second polymer layer The material comprises a second triggering particle, a second polymer material and a second curing agent, wherein the second polymer layer has a curing temperature of less than 80 degrees Celsius: and a second conductive layer is embedded in the first layer The two polymer layers are away from the surface of one of the first line laminates. 如請求項7所述之積層式線路板,更包括一導電通孔,貫穿該第二高分子層且電性連接該第一導電層及該第二導電層。 The laminated circuit board of claim 7, further comprising a conductive via extending through the second polymer layer and electrically connecting the first conductive layer and the second conductive layer. 如請求項1所述之積層式線路板,更包括一第二線路積層,包括:一第二高分子層,設置於該基板之另一表面,且該第一高分子層及該第二高分子層位於該基板之相對兩側,該第二高分子層之材質包括彼此混合之一第二觸發粒子、一第二高分子材料及一第二固化劑,該第二高分子層之固化溫度小於攝氏80度:以及一第二導電層,嵌設於該第二高分子層遠離該基板之一表面。 The laminated circuit board of claim 1, further comprising a second circuit layer, comprising: a second polymer layer disposed on the other surface of the substrate, and the first polymer layer and the second high layer The molecular layer is located on opposite sides of the substrate, and the material of the second polymer layer comprises a second triggering particle, a second polymer material and a second curing agent mixed with each other, and the curing temperature of the second polymer layer Less than 80 degrees Celsius: and a second conductive layer embedded in the second polymer layer away from a surface of the substrate. 如請求項9所述之積層式線路板,更包括一導電通孔,貫穿該第一高分子層、該第二高分子層及該基板,且電性連接該第一導電層及該第二導電層。 The laminated circuit board of claim 9, further comprising a conductive via extending through the first polymer layer, the second polymer layer and the substrate, and electrically connecting the first conductive layer and the second Conductive layer. 如請求項9所述之積層式線路板,更包括一第一導電通孔、一第二導電通孔及一第三導電通孔,貫穿該第一高分子層、該第二高分子層及該基板,該第一導電層包括一第一導電跡線及一第三導電跡線,該第二導電層包括一第二導電跡線及一第四導電跡線,該第一導電通孔電性連接該第一導電跡線之一端及該第二導電跡線之一端,該第二導電通孔電性連接該第二導電跡線之另一端及該第三導電跡線之一端,該第三導電通孔電性連接該第三導電跡線之另一端及該第四導電 跡線之一端。 The laminated circuit board of claim 9, further comprising a first conductive via, a second conductive via, and a third conductive via extending through the first polymer layer, the second polymer layer, and The first conductive layer includes a first conductive trace and a third conductive trace, the second conductive layer includes a second conductive trace and a fourth conductive trace, and the first conductive via is electrically One end of the first conductive trace and one end of the second conductive trace, the second conductive via is electrically connected to the other end of the second conductive trace and one end of the third conductive trace, the first The three conductive vias are electrically connected to the other end of the third conductive trace and the fourth conductive One end of the trace.
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