TWI529451B - Substrate structure and display panel - Google Patents

Description

Substrate structure and display panel

The present invention relates to a substrate structure and a display panel, and more particularly to a display panel having a substrate structure with position information and a substrate structure to which the substrate structure is applied.

In order to be more convenient, lighter and more user-friendly, many information products have been converted from traditional keyboards or mice to devices that use touch devices as input. The touch device can be assembled on a wide variety of flat-panel displays, so that the flat-panel display has both a display screen and input operation information.

A display panel having a position recognition capability, wherein a substrate structure is provided with a plurality of position recognition patterns capable of absorbing infrared light materials, wherein the position recognition patterns are the same film layer as the black matrix layer, and correspondingly disposed on the substrate layer In the slit of the pixel electrode. That is to say, these position recognition patterns are materials having a light-shielding property, so these position recognition patterns cannot be disposed in the pixel area (ie, the light-transmitting area), and can only be disposed in the slit of the pixel electrode, otherwise This will cause the aperture ratio of the overall display panel to decrease. In other words, the configuration method of the conventional position recognition pattern is still limited due to the material selection, and the position cannot be changed at will, so the configuration flexibility is low, and further This leads to poor position recognition of the overall display panel.

The present invention provides a substrate structure having a position recognition pattern that provides a function of identifying a position.

The present invention also provides a display panel comprising the above-described substrate structure, which can improve the position recognition capability of the display panel.

The substrate structure of the present invention comprises a substrate, a light shielding pattern layer and a plurality of position recognition patterns. The light shielding pattern layer is disposed on the substrate, wherein the light shielding pattern layer has a plurality of openings to expose a surface of the substrate. The position recognition pattern is disposed on the substrate and is disposed corresponding to the opening. Each position recognition pattern completely overlaps the corresponding opening in the vertical projection direction. The material of the position recognition pattern is a transparent photoresist, and the transparent photoresist comprises a transparent material that absorbs infrared light.

In an embodiment of the invention, the substrate structure further includes a plurality of color filter patterns disposed on the substrate. The color filter pattern partially covers the light shielding pattern layer and completely covers the opening of the light shielding pattern layer.

In an embodiment of the invention, the substrate structure further includes a protective layer disposed on the substrate and covering the color filter pattern and the light shielding pattern layer. The location identification pattern is configured on the protection layer.

In an embodiment of the invention, the substrate structure further includes a plurality of spacers disposed on the protective layer. The height of each spacer is higher than the height of each location identification code. Each spacer overlaps the light shielding pattern layer in a vertical projection direction, and The spacer and the position identification pattern are the same film layer.

In an embodiment of the invention, the substrate structure further includes at least one transparent pattern disposed on the protective layer and disposed corresponding to at least one opening of the light shielding pattern layer. The height of the transparent pattern is lower than the height of each position recognition pattern. The transparent pattern does not overlap the color filter pattern in the vertical projection direction, and the transparent pattern and the position recognition pattern are the same film layer.

In an embodiment of the invention, the substrate structure further includes a plurality of active elements, a plurality of pixel electrodes, an insulating layer, and a plurality of color filter patterns. The active component is disposed on the substrate. The pixel electrodes are disposed on the substrate and coupled to the active components respectively. The insulating layer is disposed on the substrate and covers the active component and the pixel electrode, wherein the light shielding pattern layer is located on the insulating layer. The color filter patterns are disposed on the insulating layer and disposed in the openings of the light shielding pattern layer, respectively, and cover the position identification pattern.

In an embodiment of the invention, the light shielding pattern layer completely overlaps the active element in the vertical projection direction.

In an embodiment of the invention, the active component partially overlaps the light shielding pattern layer in a vertical projection direction.

In an embodiment of the invention, the substrate structure further includes a plurality of spacers disposed on the insulating layer, and the spacers and the position identification pattern are the same film layer.

In an embodiment of the invention, the infrared light absorbing transparent material has a primary absorption wavelength of from 800 nm to 1100 nm.

In an embodiment of the invention, the contour of each of the position recognition patterns includes a strip shape, a cone shape, a column shape or a dot shape.

The display panel of the present invention includes the above substrate structure, a pair of substrates, and a display medium layer. The counter substrate is disposed opposite to the substrate structure. The display medium layer is disposed between the substrate structure and the opposite substrate.

In an embodiment of the invention, when the substrate structure is a color filter substrate, the opposite substrate is an active device array substrate. When the substrate structure is an active array substrate integrated with a color filter layer pattern, the opposite substrate is a substrate having a common electrode.

In an embodiment of the invention, the display dielectric layer comprises a liquid crystal layer.

Based on the above, since the position recognition pattern of the substrate structure of the present invention is made of a transparent photoresist, the transparent photoresist is a transparent material containing infrared light absorbing. Therefore, the position recognition pattern of the conventional substrate structure is the same light-shielding material as the black matrix, and the position recognition pattern can be disposed only in the slit to avoid the problem of the decrease in the aperture ratio. The position recognition pattern of the present invention can transmit visible light, and the size of the position recognition pattern does not affect the aperture ratio, and increasing the area of the position recognition pattern can also increase the position recognition capability. Therefore, the positional arrangement of the position recognition pattern of the present invention is disposed in the opening of the light shielding pattern layer, which can have better configuration flexibility.

The above described features and advantages of the invention will be apparent from the following description.

100a, 100b, 100c, 100d, 100e‧‧‧ substrate structure

110‧‧‧Substrate

112‧‧‧ surface

120, 120d, 120e‧‧‧ shading pattern layer

122, 122a, 122b, 122c, 122d‧‧‧ openings

130, 130a, 130b‧‧‧ location identification code

140a, 140b, 140c, 140d, 140e, 140f, 140g‧‧‧ color filter patterns

150‧‧‧protection layer

160, 160a, 160b‧‧‧ spacers

170‧‧‧Transparent pattern

180‧‧‧Insulation

200a, 200b‧‧‧ substrate structure

300a, 300b‧‧‧ opposite substrate

302‧‧‧Common electrode

400‧‧‧Display media layer

T‧‧‧ active components

P‧‧‧ pixel electrodes

H1, H2, H3‧‧‧ height

GS‧‧‧glass substrate

HT‧‧‧ semi-transmissive layer

SL‧‧‧ shading layer

AR‧‧‧Anti-reflective layer

T1‧‧‧ first opening

T2‧‧‧ second opening

T3‧‧‧ third opening

M‧‧‧Three-tone mask

UV‧‧‧UV light

FIG. 1 is a schematic top plan view of a substrate structure according to an embodiment of the invention.

2 is a schematic plan view showing a structure of a substrate according to another embodiment of the present invention.

3A is a cross-sectional view showing a structure of a substrate according to an embodiment of the invention.

FIG. 3B is a schematic diagram of a three-tone mask.

4 is a cross-sectional view showing a structure of a substrate according to another embodiment of the present invention.

FIG. 5 is a cross-sectional view showing a structure of a substrate according to still another embodiment of the present invention.

FIG. 6 is a schematic diagram of a display panel according to an embodiment of the invention.

FIG. 7 is a schematic diagram of a display panel according to another embodiment of the present invention.

FIG. 1 is a schematic diagram showing a configuration manner of multiple position recognition patterns in a substrate structure according to an embodiment of the invention. Referring to FIG. 1 , in the embodiment, the substrate structure 100 a includes a substrate 110 , a light shielding pattern layer 120 , and a plurality of position identification patterns 130 a . The light shielding pattern layer 120 is disposed on the substrate 110, wherein the light shielding pattern layer 120 has a plurality of openings 122 (including openings 122a, 122b, 122c, 122d) to expose the surface 112 of the substrate 110. The position recognition pattern 130a is disposed on the substrate 110 and disposed corresponding to the openings 122a, 122b, 122c, and 122d. Each location identification code 130a Fully overlapping the corresponding openings 122a, 122b, 122c, 122d in the vertical projection direction. The position recognition pattern 130a is made of a transparent photoresist, and the transparent photoresist comprises a transparent material that absorbs infrared light. The transparent material that absorbs infrared light comprises a quantum dot or a nano-grade phosphor powder.

In detail, the substrate 110 of the present embodiment is, for example, a glass substrate or a plastic substrate, and the material of the light shielding pattern layer 120 is, for example, a black resin. It should be noted that, in this embodiment, the position identification pattern 130a is only disposed corresponding to the openings 122b, 122c, and 122d of the light shielding pattern layer 120, and is not disposed in the opening 122a. Furthermore, the transparent photoresist described in this embodiment has a light transmittance of almost 100%, and a transparent material capable of absorbing infrared light, which mainly absorbs infrared light having a wavelength of 800 nm to 1100 nm.

When the infrared light illuminates the substrate structure 100a, the infrared light is blocked by the light shielding pattern layer 120 but penetrates the openings 122b, 122c, 122d. In other words, if the corresponding position identification pattern 130a is provided in the openings 122b, 122c, and 122d, the infrared light partially penetrates the openings 122b, 122c, and 122d; otherwise, if the corresponding positions are not provided in the openings 122b, 122c, and 122d. Upon identification of the code 130a, the infrared light will directly penetrate the openings 122b, 122c, 122d. Therefore, when the position recognition pattern 130a for absorbing infrared light is disposed corresponding to the openings 122b, 122c, and 122d, the image reading device such as an infrared charge coupled device (CCD) can be used to recognize and interpret the position recognition map. The code 130a is used to calculate the position corresponding to the position identification pattern 130a. Further, the infrared light penetrates through the openings 122b, 122c, and 122d to penetrate the film structure of the backlight module (for example, a diffusion sheet, a cymbal sheet or a light guide plate, etc.) to diffuse and reflect. Therefore, when infrared light is reflected, the CCD can receive infrared light. At this point, there is a location identification code The area of 130a is shown as black due to absorption of infrared light. After the processor receives the image of the CCD and decodes it through the algorithm, the position coordinate message can be obtained. In summary, the substrate structure 100a of the present embodiment has a function of recognizing a position because it has the position identification pattern 130a.

Further, the present embodiment does not limit the shape of the position recognition pattern 130a. In detail, the shape of the position identification code 130a as in FIG. 1 is, for example, a dot shape such as a circle. In other embodiments, referring to FIG. 2, the shape of the position identification pattern 130b of the substrate structure 100b is, for example, elongated, such as a rectangle. In other variant embodiments, the shape of the position recognition pattern may also be tapered or columnar, which is not limited herein.

In addition, the embodiment does not limit the number of the location identification patterns 130a and 130b and the arrangement thereof. In detail, the number of position identification patterns 130 in each opening 122 is not necessarily the same. As shown in FIGS. 1 and 2, the position identification patterns 130a, 130b in the two adjacent openings 122b, 122c in the middle are shown. The number is two, and the number of position identification patterns 130a, 130b in the rightmost opening 122d is three. Moreover, the arrangement of the position identification patterns 130a and 130b in each of the openings 122 is not necessarily the same. For example, the arrangement of the position recognition patterns 130a and 130b in the most center-left opening 122b indicates that the position is 『01』; the arrangement of the position recognition patterns 130a and 130b in the most center-right opening 122c indicates that the position is “10”; and the arrangement of the position recognition patterns 130a and 130b in the rightmost opening 122d indicates that the position is "11"; and the opening 122a on the leftmost side where the position identification patterns 130a, 130b are not provided indicates that the position is "00", but the present invention is not limited thereto.

Since the substrate structures 100a, 100b of the embodiment are made of transparent photoresist The material of the pattern identification code 130a, 130b is identified, and the transparent material comprises a transparent material that absorbs infrared light. Therefore, the position recognition patterns 130a and 130b of the present embodiment are disposed in the opening 122 of the light shielding pattern layer 120, which can have better configuration flexibility.

It is to be noted that the following embodiments use the same reference numerals and parts of the above-mentioned embodiments, and the same reference numerals are used to refer to the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted portions, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.

3A is a cross-sectional view showing a structure of a substrate according to an embodiment of the invention. Referring to FIG. 3A, the substrate structure 100c of the present embodiment is similar to the substrate structure 100a of FIG. 1, but the main difference is that the substrate structure 100c of the embodiment further includes a plurality of color filter patterns 140a, 140b, and 140c. The color filter patterns 140a, 140b, and 140c are disposed on the substrate 110, and the color filter patterns 140a, 140b, and 140c partially cover the light shielding pattern layer 120 and completely cover the opening 122 of the light shielding pattern layer 120. It should be noted that the color filter patterns 140a, 140b, and 140c respectively represent, for example, a red filter pattern, a green filter pattern, and a blue filter pattern.

Furthermore, the substrate structure 100c of the present embodiment may further include a protective layer 150 disposed on the substrate 110 and covering the color filter patterns 140a, 140b, 140c and the light shielding pattern layer 120 to protect the color filter pattern 140a. , 140b, 140c and the light shielding pattern layer 120. The location identification code 130 of the embodiment is disposed on the protection layer 150, and the shape of the location identification pattern 130 is, for example, conical, but is not limited thereto.

In addition, the substrate structure 100c of the embodiment may further include a plurality of spacers 160. (only one is schematically shown in FIG. 3A), wherein the spacer 160 is disposed on the protective layer 150. More specifically, the height H1 of each spacer 160 is higher than the height H2 of each position identification code 130. Each spacer 160 overlaps the light shielding pattern layer 120 in the vertical projection direction, and the spacer 160 and the position identification pattern 130 are the same film layer. That is to say, the material of the spacer 160 is a transparent photoresist, and the transparent photoresist comprises a transparent material capable of absorbing infrared light, and the transparent material capable of absorbing infrared light comprises a material such as a quantum dot or a nano-grade phosphor powder.

In addition, the substrate structure 100c of the present embodiment further includes a transparent pattern 170, wherein the transparent pattern 170 is disposed on the protective layer 150 and disposed corresponding to one of the openings 122 of the light shielding pattern layer 120. In detail, the height H3 of the transparent pattern 170 of the present embodiment is lower than the height H2 of each position recognition pattern 130. The transparent pattern 170 does not overlap the color filter patterns 140a, 140b, 140c in the vertical projection direction, and the transparent pattern 170 and the position recognition pattern 130 are the same film layer. That is to say, the material of the transparent pattern 170 is a transparent photoresist, and the transparent photoresist comprises a transparent material capable of absorbing infrared light, wherein the transparent material capable of absorbing infrared light comprises a material such as a quantum dot or a nano-grade phosphor powder.

FIG. 3B is a schematic view of a three-tone mask. Referring to FIG. 3B, in the embodiment, the method for processing the position identification pattern 130, the spacer 160, and the transparent pattern 170 is, for example, a Tri-tone Mask M, wherein the three-tone mask is used. M is, for example, sequentially forming a semi-transmissive layer HT, a light shielding layer SL, and an anti-reflection layer AR on the glass substrate GS. In detail, the three-tone mask M has a first opening T1, a second opening T2, and a plurality of third openings T3, wherein the first opening T1 is exposed The glass substrate GS, the second opening T2 exposes the semi-transmissive layer HT, and the third opening T3 exposes the light shielding layer SL. The aperture of the first opening T1 is larger than the aperture of the second opening T2, and the aperture of the second opening T2 is larger than the aperture of the third opening T3. The position identification pattern 130, the spacer 160, and the transparent pattern 170 are respectively fabricated by different aperture sizes of the first opening T1, the second opening T2, and the third opening T3. Next, the three-tone mask M is disposed on the semi-finished substrate structure 100c (that is, over the entire protective layer 150 is covered with a transparent material containing infrared light absorbing), and is oriented by the three-tone mask M. The substrate structure 100c is irradiated with ultraviolet light UV, wherein the first opening T1 forms a spacer 160 at a corresponding portion of the substrate structure 100c, and the second opening T2 forms a position identification pattern 130 at a corresponding portion of the substrate structure 100c, and the third opening T3 forms a transparent pattern 170 at a corresponding portion of the substrate structure 100c.

In short, since the substrate structure 100c of the present embodiment has the color filter patterns 140a, 140b, and 140c, the substrate structure 100c of the present embodiment can be regarded as a color filter substrate. Furthermore, since the substrate structure 100c of the present embodiment is made of a transparent photoresist as the position recognition pattern 130c, the transparent material includes a transparent material that absorbs infrared light. Therefore, the position identification pattern 130c of the present embodiment is disposed in the opening 122 of the light shielding pattern layer 120, which can have better configuration flexibility. In addition, the substrate structure 100c of the present embodiment has a function of recognizing a position in addition to the position recognition pattern 130. The substrate structure 100c also has color filter patterns 140a, 140b, and 140c, which can be combined with other substrates to provide color display. Features.

4 is a cross-sectional view showing a structure of a substrate according to an embodiment of the invention. Referring to FIG. 4, the substrate structure 100d of the embodiment and the substrate structure of FIG. 100a is similar, but the main difference between the two is that the substrate structure 100d of the embodiment further includes a plurality of active elements T, a plurality of pixel electrodes P, an insulating layer 180, and a plurality of color filter patterns 140d, 140e, 140f, 140g. The active device T is disposed on the substrate 110. The pixel electrodes P are disposed on the substrate 110 and coupled to the active device T, respectively. The insulating layer 180 is disposed on the substrate 110 and covers the active device T and the pixel electrode P, wherein the light shielding pattern layer 120d is located on the insulating layer 180. The color filter patterns 140d, 140e, 140f, and 140g are disposed on the insulating layer 180, and are disposed in the openings 122d of the light-shielding pattern layer 120d, respectively, and cover the position identification pattern 130. The active component T of the present embodiment partially overlaps the light-shielding pattern layer 120d in the vertical projection direction, and the shape of the position recognition pattern 130 is, for example, a conical shape, but is not limited thereto.

In addition, the substrate structure 100d of the present embodiment may further include a plurality of spacers 160a, 160b, wherein the spacers 160a, 160b are disposed on the insulating layer 180, and the spacers 160a, 160b and the position identification pattern 130 are the same film layer. That is to say, the material of the spacers 160a, 160b is a transparent photoresist, and the transparent photoresist comprises a transparent material that can absorb infrared light. Here, since the substrate structure 100d has the active device T and the color filter patterns 140d, 140e, 140f, 140g, the substrate structure 100d can be regarded as an active array substrate integrated with a color filter layer pattern.

In short, the substrate structure 100d of the present embodiment uses a transparent photoresist as the material of the position recognition pattern 130, and the transparent material includes a transparent material that can absorb infrared light. Therefore, the position identification pattern 130 of the embodiment is disposed in the opening 122d of the light shielding pattern layer 120d, which can have better configuration flexibility. In addition, the substrate structure 100d of the embodiment provides the identification in addition to the location identification pattern 130. In addition to the function of the other positions, the substrate structure 100d also has color filter patterns 140d, 140e, 140f, 140g and an active device T, which can be combined with other substrates and display medium layers to provide functions for color display and driving of the display medium.

FIG. 5 is a cross-sectional view showing a structure of a substrate according to an embodiment of the invention. Referring to FIG. 5, the substrate structure 100e of the present embodiment is similar to the substrate structure 100d of FIG. 4, but the main difference is that the light shielding pattern layer 120e of the substrate structure 100e of the present embodiment completely overlaps in the vertical projection direction. Active component T.

FIG. 6 is a schematic diagram of a display panel according to an embodiment of the invention. Referring to FIG. 6, the display panel 200a of the present embodiment includes the substrate structure 100c, the opposite substrate 300a, and the display medium layer 400 of FIG. 2 described above. The counter substrate 300a is disposed opposite to the substrate structure 100c, and the display medium layer 400 is disposed between the substrate structure 100c and the counter substrate 300a. Here, the display dielectric layer 400 is, for example, a liquid crystal layer, but not limited thereto, and the substrate structure 100c is a color filter substrate, and the opposite substrate 300a is an active device array substrate. Since the substrate structure 100c of the present embodiment has the position identification pattern 130, the display panel 200a of the present embodiment can provide a function of recognizing a position. In addition, since the embodiment uses a transparent photoresist as the material of the position recognition pattern 130, the transparent material includes a transparent material that can absorb infrared light. Therefore, the position recognition pattern 130 of the embodiment is disposed in the opening 122 of the light shielding pattern layer 120, which can have better configuration flexibility, and the display panel 200a having the substrate structure 100c can effectively improve the position recognition capability.

FIG. 7 is a schematic diagram of a display panel according to another embodiment of the present invention. Referring to FIG. 7, the display panel 200b of the present embodiment and the display panel 200a of FIG. Similarly, the main difference between the two is that the substrate structure 100d of the present embodiment is an active array substrate integrated with a color filter layer pattern, and the opposite substrate 300b is a substrate having a common electrode 302.

In summary, since the position recognition pattern of the substrate structure of the present invention is made of a transparent photoresist, the transparent photoresist is a transparent material that absorbs infrared light. Therefore, the position recognition pattern of the conventional substrate structure is the same light-shielding material as the black matrix, and the position recognition pattern can be disposed only in the slit to avoid the problem of the decrease in the aperture ratio. The positional arrangement mode of the position recognition pattern of the present invention is disposed in the opening of the light shielding pattern layer, which can have better configuration flexibility. In addition, the display panel using the substrate structure of the present invention can effectively improve its position recognition capability.

Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

100a‧‧‧Substrate structure

110‧‧‧Substrate

112‧‧‧ surface

120‧‧‧Lighting pattern layer

122, 122a, 122b, 122c, 122d‧‧‧ openings

130a‧‧‧Location identification code

Claims (13)

A substrate structure includes: a substrate; a light shielding pattern layer disposed on the substrate, wherein the light shielding pattern layer has a plurality of openings to expose a surface of the substrate; and a plurality of position recognition patterns disposed on the substrate And a plurality of openings are disposed on the substrate, wherein each of the position recognition patterns is completely overlapped with the corresponding opening in the vertical projection direction, and the material of the position recognition patterns is a transparent photoresist, and the transparent photoresist comprises A transparent material that absorbs infrared light, and the transparent material that absorbs infrared light mainly absorbs infrared light having a wavelength of 800 nm to 1100 nm. The substrate structure of claim 1, further comprising: a plurality of color filter patterns disposed on the substrate, wherein the color filter patterns partially cover the light shielding pattern layer and completely cover the light shielding pattern layer The openings. The substrate structure of claim 2, further comprising: a protective layer disposed on the substrate and covering the color filter patterns and the light shielding pattern layer, wherein the position identification patterns are disposed in the protection On the floor. The substrate structure of claim 3, further comprising: a plurality of spacers disposed on the protective layer, wherein a height of each of the spacers is higher than a height of each of the position identification patterns, wherein each of the gaps The object overlaps the light shielding pattern layer in a vertical projection direction, and the spacers are the same film as the position recognition patterns Floor. The substrate structure of claim 3, further comprising: at least one transparent pattern disposed on the protective layer and disposed corresponding to at least one of the openings of the light shielding pattern layer, the transparent pattern having a height lower than each of the The height of the position recognition pattern is not overlapped with the color filter patterns in the vertical projection direction, and the transparent pattern and the position recognition pattern are the same film layer. The substrate structure of claim 1, further comprising: a plurality of active elements disposed on the substrate, a plurality of pixel electrodes disposed on the substrate and respectively coupled to the active components; an insulating layer And disposed on the substrate and covering the active elements and the pixel electrodes, wherein the light shielding pattern layer is located on the insulating layer; and a plurality of color filter patterns disposed on the insulating layer, and respectively disposed on the insulating layer The openings of the light shielding pattern layer are covered by the position recognition patterns. The substrate structure of claim 6, wherein the light shielding pattern layer completely overlaps the active elements in a vertical projection direction. The substrate structure of claim 6, wherein the active elements partially overlap the light shielding pattern layer in a vertical projection direction. The substrate structure of claim 6, further comprising: a plurality of spacers disposed on the insulating layer, wherein the spacers and the position identification patterns are the same film layer. The substrate structure of claim 1, wherein the outline of each of the position recognition patterns comprises a strip shape, a cone shape, a column shape or a dot shape. A display panel comprising: the substrate structure according to claim 1; a pair of substrates disposed opposite to the substrate structure; and a display dielectric layer disposed on the substrate structure and the opposite substrate between. The display panel of claim 11, wherein when the substrate structure is a color filter substrate, the opposite substrate is an active device array substrate, and when the substrate structure is an integrated color filter layer In the case of a patterned active array substrate, the opposite substrate is a substrate having a common electrode. The display panel of claim 11, wherein the display dielectric layer comprises a liquid crystal layer.