CN104076553B - Substrate structure and display panel - Google Patents
Substrate structure and display panel Download PDFInfo
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- CN104076553B CN104076553B CN201410335669.6A CN201410335669A CN104076553B CN 104076553 B CN104076553 B CN 104076553B CN 201410335669 A CN201410335669 A CN 201410335669A CN 104076553 B CN104076553 B CN 104076553B
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- 239000000758 substrate Substances 0.000 title claims abstract description 69
- 239000000463 material Substances 0.000 claims abstract description 47
- 239000012780 transparent material Substances 0.000 claims abstract description 24
- 239000010410 layer Substances 0.000 claims description 79
- 238000000926 separation method Methods 0.000 claims description 22
- 239000011241 protective layer Substances 0.000 claims description 14
- 238000001914 filtration Methods 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims description 8
- 239000004973 liquid crystal related substance Substances 0.000 claims description 3
- 238000009738 saturating Methods 0.000 claims description 3
- 238000010521 absorption reaction Methods 0.000 claims 1
- 230000004888 barrier function Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 3
- 239000002096 quantum dot Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
A substrate structure comprises a substrate, a shading pattern layer and a plurality of position identification pattern codes. The shading pattern layer is arranged on the substrate and is provided with a plurality of openings so as to expose one surface of the substrate. The position identification pattern code is configured on the substrate and is arranged corresponding to the opening. Each position identification image code is completely overlapped with the corresponding opening in the vertical projection direction. The material of the position identification pattern code is a transparent light resistance, and the transparent light resistance comprises a transparent material capable of absorbing infrared light.
Description
【Technical field】
The invention relates to a kind of board structure and display panel, and in particular to a kind of with positional information
Board structure its apply the display panel of this board structure.
【Background technology】
More lightly change and more humane for more convenient, volume, the input mode of many information products is by traditional
The device such as keyboard or mouse, is changed into the mode for using touch-control device as input.Touch-control device can be assembled all various
In the flat-panel screens of class, so that flat-panel screens has the function of display picture and input operation information concurrently.
The known display panel with location identification capability, is configured with multiple absorbable infrared finishes on one board structure
The location recognition figure code of material, wherein the plurality of location recognition figure code is to belong to same film layer with black matrix layer, and correspondence is configured at picture
In the slit of plain electrode.That is, the plurality of location recognition figure code is using the material with light-proofness, therefore the plurality of position
Putting identification figure code cannot be configured in pixel region (i.e. transmission region), only be configured in the slit of pixel electrode, can otherwise make
The aperture opening ratio of integral display panel declines.In other words, it is known that location recognition figure code configuration mode, because its material selection and
Still there is it to limit, it is impossible to arbitrarily to change its position, therefore its flexible configuration degree is relatively low, and then cause the position of overall display panel to be known
Other ability is not good.
【The content of the invention】
The present invention provides a kind of board structure, and it has location recognition figure code, it is possible to provide the function of identification position.
The present invention also provides a display panel, and it includes above-mentioned board structure, can improve the location recognition of display panel
Ability.
Board structure of the invention includes a substrate, a shielding pattern layer and multiple location recognition figure codes.Light-shielding pattern
Layer is configured on substrate, and wherein shielding pattern layer has multiple openings, to expose a surface of substrate.Location recognition figure code is matched somebody with somebody
It is placed on substrate and corresponding opening is set.Each position identification figure code is opened in completely overlapped on upright projection direction in corresponding
Mouthful.The material of location recognition figure code is a transparent photoresistance, and transparent material of the transparent photoresistance comprising an absorbable infrared light.
In one embodiment of this invention, above-mentioned board structure further includes multiple color filter patterns, is configured at substrate
On.Color filter patterns part covers shielding pattern layer and the opening of shielding pattern layer is completely covered.
In one embodiment of this invention, above-mentioned board structure further includes a protective layer, is configured on substrate and covers
Color filter patterns and shielding pattern layer.Location recognition figure code is configured on protective layer.
In one embodiment of this invention, above-mentioned board structure further includes multiple separation materials, is configured on protective layer.Often
The height of one separation material recognizes the height of figure code higher than each position.Each separation material on upright projection direction in being overlapped in shading
Patterned layer, and separation material and location recognition figure code are same film layer.
In one embodiment of this invention, above-mentioned board structure further includes an at least transparent pattern, is configured at protective layer
On, and correspond at least one opening setting of shielding pattern layer.The height of transparent pattern recognizes the height of figure code less than each position.
Transparent pattern is not in Chong Die with color filter patterns on upright projection direction, and transparent pattern and location recognition figure code are same film
Layer.
In one embodiment of this invention, above-mentioned board structure further includes multiple active components, multiple pixel electrodes, one
Insulating barrier and multiple color filter patterns.Active component is configured on substrate.Pixel electrode is configured on substrate and difference coupling
It is connected to source element.Insulating barrier is configured on substrate and covers active component and pixel electrode, and wherein shielding pattern layer is located at insulation
On layer.Color filter patterns are configured on insulating barrier, and are respectively arranged in the opening of shielding pattern layer, and covering position recognizes
Figure code.
In one embodiment of this invention, above-mentioned shielding pattern layer is in completely overlapped in active unit on upright projection direction
Part.
In one embodiment of this invention, above-mentioned active component on upright projection direction in partially overlapping light-shielding pattern
Layer.
In one embodiment of this invention, above-mentioned board structure further includes multiple separation materials, is configured on insulating barrier, and
Separation material is same film layer with location recognition figure code.
In one embodiment of this invention, the main absorbing wavelength of the transparent material of above-mentioned absorbable infrared light is 800
The infrared light of nanometer to 1100 nanometers.
In one embodiment of this invention, the external form profile of above-mentioned each position identification icon include strip, taper,
Column or point-like.
Display panel of the invention, it includes above-mentioned board structure, an opposite substrate and a display dielectric layer.To
Substrate be configured at board structure to.Display dielectric layer is configured between board structure and opposite substrate.
In one embodiment of this invention, above-mentioned when board structure is a colored optical filtering substrates, opposite substrate is one
Active elements array substrates.When board structure is the active array base plate that is integrated with colorized optical filtering layer pattern, opposite substrate
It is a substrate with a common electrode.
In one embodiment of this invention, above-mentioned display dielectric layer includes a liquid crystal layer.
Based on above-mentioned, due to the location recognition figure code of board structure of the invention be using transparent photoresistance as its material, and
This transparent photoresistance is the transparent material for including absorbable infrared light.Therefore, compared to the location recognition of known board structure
Figure code is to use the material with black matrix identical with light-proofness, and this location recognition figure code is only capable of being configured in slit keeping away
Exempt from for the problem of aperture opening ratio decline, location recognition figure code of the invention can allow visible ray to penetrate, and location recognition figure code
Size does not interfere with aperture opening ratio, and the area of increase location recognition figure code can also increase location identification capability.Therefore, position of the invention
The position configuration mode for putting identification figure code is to be configured in the opening of shielding pattern layer, you can with preferably flexible configuration degree.
It is that features described above of the invention and advantage can be become apparent, special embodiment below, and coordinate institute's accompanying drawings
It is described in detail below.
【Brief description of the drawings】
Fig. 1 is schematically shown as the schematic diagram of the vertical view of the board structure of one embodiment of the invention.
Fig. 2 is schematically shown as the schematic diagram of the vertical view of the board structure of another embodiment of the present invention.
Fig. 3 A are schematically shown as a kind of generalized section of board structure of one embodiment of the invention.
Fig. 3 B are schematically shown as the schematic diagram of three color scheme formula light shield.
Fig. 4 is schematically shown as a kind of generalized section of board structure of another embodiment of the present invention.
Fig. 5 is schematically shown as a kind of generalized section of board structure of another embodiment of the present invention.
Fig. 6 is schematically shown as a kind of schematic diagram of display panel of one embodiment of the invention.
Fig. 7 is schematically shown as a kind of schematic diagram of display panel of another embodiment of the present invention.
【Symbol description】
100a、100b、100c、100d、100e：Board structure
110：Substrate
112：Surface
120、120d、120e：Shielding pattern layer
122、122a、122b、122c、122d：Opening
130、130a、130b：Location recognition figure code
140a、140b、140c、140d、140e、140f、140g：Color filter patterns
150：Protective layer
160、160a、160b：Separation material
170：Transparent pattern
180：Insulating barrier
200a、200b：Board structure
300a、300b：Opposite substrate
302：Common electrode
400：Display dielectric layer
T：Active component
P：Pixel electrode
H1、H2、H3：Highly
GS：Glass substrate
HT：Semitransmissive layer
SL：Light shield layer
AR：Anti-reflecting layer
T1：First opening
T2：Second opening
T3：3rd opening
M：Three color scheme formula light shield
UV：Ultraviolet light
【Specific embodiment】
Fig. 1 is schematically shown as the signal of the configuration mode of various location recognition figure codes in the board structure of one embodiment of the invention
Figure.Fig. 1 is refer to, in the present embodiment, board structure 100a includes that substrate 110, shielding pattern layer 120 and multiple positions are known
Not figure code 130a.Shielding pattern layer 120 is configured on substrate 110, wherein shielding pattern layer 120 have multiple openings 122 (including
Opening 122a, 122b, 122c, 122d), to expose the surface 112 of substrate 110.Location recognition figure code 130a is configured at substrate
On 110 and corresponding opening 122a, 122b, 122c, 122d set.Each position recognizes figure code 130a in complete on upright projection direction
Full weight is laminated on corresponding opening 122a, 122b, 122c, 122d.The material of location recognition figure code 130a is transparent photoresistance, and saturating
Transparent material of Mingguang City's resistance comprising absorbable infrared light, wherein the transparent material of absorbable infrared light includes quantum dot or nanometer etc.
The materials such as the fluorescent material of level.
Specifically, the substrate 110 of the present embodiment e.g. glass substrate or plastic substrate, and shielding pattern layer 120
Material is, for example, black resin.It should be noted that, in the present embodiment, location recognition figure code 130a only corresponds to shielding pattern layer
120 opening 122b, 122c, 122d is set, and is not provided with the 122a of opening.Furthermore, the transparent photoresistance described in the present embodiment,
Its light transmittance is almost 100%, and can absorb the transparent material of infrared light, and its main absorbing wavelength is received for 800 nanometers to 1100
The infrared light of rice.
As Infrared irradiation board structure 100a, infrared light can be blocked patterned layer 120 and block but can penetrate opening
122b、122c、122d.In other words, it is infrared if being provided with corresponding location recognition figure code 130a in opening 122b, 122c, 122d
Light can partial penetration opening 122b, 122c, 122d；If conversely, be not provided with corresponding position in opening 122b, 122c, 122d knowing
Not figure code 130a, then infrared light can be directed through be open 122b, 122c, 122d.Therefore, when the location recognition figure code for absorbing infrared light
When 130a is corresponding opening 122b, 122c, 122d settings, can be using such as infrared light charge coupled cell (charge couple
Device, CCD) image reading device come recognize and interpretation location recognition figure code 130a, so as to calculate location recognition figure code
Position corresponding to 130a.Furthermore, it is understood that infrared light opening 122b, 122c, 122d are penetrated into the film layer of backlight module
Structure (such as diffusion sheet, prismatic lens or light guide plate etc.) produces diffusion and then reflects.Therefore when infrared light reflection, CCD can connect
Receive infrared light.Now, the region for being provided with location recognition figure code 130a can be shown as black because absorbing infrared light.Afterwards, locate
After reason device receives the image of CCD, through algorithm decoding, you can obtain location coordinate message.Sum it up, the present embodiment
Board structure 100a can provide the function of identification position because having location recognition figure code 130a.
Additionally, the shape of the present embodiment not defined position identification figure code 130a.Specifically, as the position in Fig. 1 is known
The shape of other code 130a is, for example, point-like, such as circular.In other embodiments, Fig. 2 is refer to, the position of board structure 100b is known
The shape of not figure code 130b is, for example, strip, such as rectangle.In other alternate embodiments, the shape of location recognition figure code also may be used
It is taper or column, is not any limitation as in this.
In addition, the present embodiment also quantity and its configuration mode of defined position identification figure code 130a and 130b.Come in detail
Say, the quantity of the location recognition figure code 130 in each opening 122 is not necessarily identical, as shown in Figures 1 and 2, middle two adjacent
Opening 122b, 122c in the quantity of location recognition figure code 130a, 130b be respectively two, and in the opening 122d of the rightmost side
Location recognition figure code 130a, 130b quantity be three.Furthermore, location recognition figure code 130a, 130b in each opening 122
Configuration mode it is also not necessarily identical, for example, location recognition figure in most left-of-center opening 122b code 130a, 130b
Arrangement mode represent position be " 01 "；The arrangement of location recognition figure code 130a, 130b in most center-right opening 122c
Mode represents that position is " 10 "；The arrangement mode of location recognition figure code 130a, 130b in the opening 122d of rightmost represents position
It is set to " 11 "；And the opening 122a that Far Left is not provided with location recognition figure code 130a, 130b then represents position for " 00 ", but this hair
Bright not limited to this.
Due to board structure 100a, 100b of the present embodiment be using transparent photoresistance as location recognition figure code 130a,
The material of 130b, and this transparent material includes the transparent material of absorbable infrared light.Therefore, the location recognition figure code of the present embodiment
130a, 130b are configured in the opening 122 of shielding pattern layer 120, you can with preferably flexible configuration degree.
Herein it should be noted that, following embodiments continue to use the element numbers and partial content of previous embodiment, wherein, adopt
Be denoted by the same reference numerals identical or approximate element, and eliminates the explanation of constructed content.On clipped
Explanation refer to previous embodiment, it is no longer repeated for following embodiments.
Fig. 3 A are schematically shown as a kind of generalized section of board structure of one embodiment of the invention.Refer to Fig. 3 A, this reality
The board structure 100a for applying the board structure 100c and Fig. 1 of example is similar, and only the two Main Differences part is：The base of the present embodiment
Hardened structure 100c further includes multiple color filter patterns 140a, 140b, 140c, wherein, color filter patterns 140a, 140b,
140c is configured on substrate 110, and color filter patterns 140a, 140b, 140c part cover shielding pattern layer 120 and covers completely
The opening 122 of lid shielding pattern layer 120.It should be noted that, color filter patterns 140a, 140b, 140c for example represent red respectively
Color filter pattern, green filter pattern and blue filter pattern.
Furthermore, the board structure 100c of the present embodiment can further include protective layer 150, wherein, protective layer 150 is configured at substrate
On 110 and covering color filter patterns 140a, 140b, 140c and shielding pattern layer 120, with protect color filter patterns 140a,
140b, 140c and shielding pattern layer 120.The location recognition figure code 130 of the present embodiment is configured on protective layer 150, and position is known
The shape of not figure code 130 is e.g. coniform, but is not limited thereto.
Additionally, the board structure 100c of the present embodiment can further include multiple separation materials 160 (shown schematically only illustrates one in Fig. 3 A
It is individual), wherein, separation material 160 is configured on protective layer 150.More particularly, the height H1 of each separation material 160 is higher than each
The height H2 of location recognition figure code 130.Each separation material 160 in being overlapped in shielding pattern layer 120 on upright projection direction, and
Gap thing 160 is same film layer with location recognition figure code 130.That is, the material of separation material 160 is transparent photoresistance, and this is saturating
Transparent material of Mingguang City's resistance comprising absorbable infrared light, wherein, the transparent material for caning absorb infrared light includes quantum dot or nanometer
The materials such as the fluorescent material of grade.
In addition, the board structure 100c of the present embodiment further includes transparent pattern 170, wherein, transparent pattern 170 is configured at guarantor
On sheath 150, and correspond to the setting of one of shielding pattern layer 120 opening 122.Specifically, the transparent print of the present embodiment
The height H3 of case 170 recognizes the height H2 of figure code 130 less than each position.Transparent pattern 170 on upright projection direction not with
Color filter patterns 140a, 140b, 140c are overlapped, and transparent pattern 170 and location recognition figure code 130 are same film layer.Also
It is to say, the material of transparent pattern 170 is transparent photoresistance, and this transparent photoresistance includes the transparent material of absorbable infrared light, wherein,
The materials such as the fluorescent material of the transparent material comprising quantum dot or nano-scale of absorbable infrared light.
Fig. 3 B illustrate the schematic diagram of three color scheme formula light shield.Fig. 3 B are refer to, in the present embodiment, location recognition figure code 130,
The manufacturing method thereof of separation material 160 and transparent pattern 170, e.g. through three color scheme formula light shield (Tri-tone Mask) M, wherein,
Three color scheme formula light shield M is, for example, in sequentially forming semitransmissive layer HT, light shield layer SL and anti-reflecting layer AR on glass substrate GS.In detail
For carefully, three color scheme formula light shield M has the first opening T1, the second opening T2 and multiple 3rd opening T3, wherein, the first opening
T1 exposes glass substrate GS, and the second opening T2 exposes semitransmissive layer HT, and the 3rd opening T3 exposes light shield layer SL.First
Be open T1 aperture more than second opening T2 aperture, and second opening T2 aperture more than the 3rd opening T3 aperture.By
First opening T1, second opening T2 and the 3rd opening T3 different pore size size with produce respectively location recognition figure code 130,
Separation material 160 and transparent pattern 170.Then, by this three color scheme formula light shield M be configured at semi-finished product board structure 100c (i.e. in
The transparent material that a flood includes absorbable infrared light is covered on protective layer 150) top, and by the side of three color scheme formula light shield M
To towards board structure 100c irradiating ultraviolet light UV, wherein, the first opening T1 can form gap in the corresponding position of board structure 100c
Thing 160, the second opening T2 is in the corresponding position meeting forming position identification figure code 130 of board structure 100c, and the 3rd opening T3 is in base
The corresponding position of hardened structure 100c can form transparent pattern 170.
In short, because the board structure 100c of the present embodiment has color filter patterns 140a, 140b, 140c, therefore
The board structure 100c of the present embodiment can be considered colored optical filtering substrates.Furthermore, because the board structure 100c of the present embodiment is to adopt
With transparent photoresistance as location recognition figure code 130c material, and this transparent material includes the transparent material of absorbable infrared light.
Therefore, the location recognition figure code 130c of the present embodiment is configured in the opening 122 of shielding pattern layer 120, you can with preferably
Flexible configuration degree.In addition, the board structure 100c of the present embodiment is except with location recognition figure code 130, it is possible to provide identification position
Function outside, board structure 100c also has color filter patterns 140a, 140b, 140c, can be vertical with other substrate in batch and provide
The function of colour display.
Fig. 4 is schematically shown as a kind of generalized section of board structure of one embodiment of the invention.Refer to Fig. 4, this implementation
The board structure 100d of example is similar to the board structure 100a of Fig. 1, and only the two Main Differences part is：The substrate of the present embodiment
Structure 100d further include multiple active component T, multiple pixel electrode P, insulating barrier 180 and multiple color filter patterns 140d,
140e、140f、140g.Active component T is configured on substrate 110.Pixel electrode P is configured on substrate 110 and has been respectively coupled to
Source element T.Insulating barrier 180 is configured on substrate 110 and covers active component T and pixel electrode P, wherein, shielding pattern layer
120d is located on insulating barrier 180.Color filter patterns 140d, 140e, 140f, 140g are configured on insulating barrier 180, and are matched somebody with somebody respectively
It is placed in the opening 122d of shielding pattern layer 120d, and covering position recognizes figure code 130.The active component T of the present embodiment is in vertical
Shielding pattern layer 120d is partially overlapped on straight projecting direction, and the shape of location recognition figure code 130 is e.g. coniform, but simultaneously
It is not limited.
Additionally, the board structure 100d of the present embodiment can further include multiple separation material 160a, 160b, wherein, separation material
160a, 160b are configured on insulating barrier 180, and separation material 160a, 160b and location recognition figure code 130 are same film layer.Also
It is to say, the material of separation material 160a, 160b is transparent photoresistance, and this transparent photoresistance includes the transparent material of absorbable infrared light.
Herein, because board structure 100d has active component T and color filter patterns 140d, 140e, 140f, 140g, therefore substrate
Structure 100d can be considered the active array base plate for being integrated with colorized optical filtering layer pattern.
In short, due to the present embodiment board structure 100d using transparent photoresistance as location recognition figure code 130
Material, and this transparent material includes the transparent material of absorbable infrared light.Therefore, the location recognition figure code 130 of the present embodiment is matched somebody with somebody
It is placed in the opening 122d of shielding pattern layer 120d, you can with preferably flexible configuration degree.Additionally, the substrate knot of the present embodiment
Structure 100d is except with location recognition figure code 130, it is possible to provide outside the function of identification position, and board structure 100d also has colored filter
Light pattern 140d, 140e, 140f, 140g and active component T, can be vertical with other substrates and display dielectric layer group and offer is colored aobvious
Show and drive the function of display medium.
Fig. 5 is schematically shown as a kind of generalized section of board structure of one embodiment of the invention.Refer to Fig. 5, this implementation
The board structure 100e of example is similar to the board structure 100d of Fig. 4, and only the two Main Differences part is：The substrate of the present embodiment
The shielding pattern layer 120e of structure 100e is in completely overlapped in active component T on upright projection direction.
Fig. 6 is schematically shown as a kind of schematic diagram of display panel of one embodiment of the invention.Fig. 6 is refer to, the present embodiment
Display panel 200a includes board structure 100c, the opposite substrate 300a and display dielectric layer 400 of above-mentioned Fig. 2.Opposite substrate
300a be configured at board structure 100c to and display dielectric layer 400 is configured at board structure 100c and opposite substrate 300a
Between.Herein, display dielectric layer 400 is, for example, liquid crystal layer, but is not limited thereto, and board structure 100c is colorized optical filtering base
Plate, and opposite substrate 300a is active elements array substrates.Because the board structure 100c of the present embodiment has location recognition figure
Code 130, therefore the display panel 200a of the present embodiment can provide the function of recognizing position.Further, since the present embodiment is to use
As the material of location recognition figure code 130, and this transparent material includes the transparent material of absorbable infrared light to transparent photoresistance.Cause
This, the location recognition figure of the present embodiment code 130 is configured in the opening 122 of shielding pattern layer 120, you can with preferably configuring
Flexibility ratio, and the display panel 200a with board structure 100c can effectively improve its location identification capability.
Fig. 7 is schematically shown as a kind of schematic diagram of display panel of another embodiment of the present invention.Refer to Fig. 7, the present embodiment
Display panel 200b it is similar to the display panel 200a of Fig. 6, only the two Main Differences part is：The substrate knot of the present embodiment
Structure 100d is the active array base plate for being integrated with colorized optical filtering layer pattern, and opposite substrate 300b is with common electrode 302
Substrate.
In sum, due to board structure of the invention location recognition figure code be using transparent photoresistance as its material, and
This transparent photoresistance is the transparent material for including absorbable infrared light.Therefore, compared to the location recognition of known board structure
Figure code is to use the material with black matrix identical with light-proofness, and this location recognition figure code is only capable of being configured in slit keeping away
Exempt from for the problem of aperture opening ratio decline, the position configuration mode of location recognition figure code of the invention is to be configured at shielding pattern layer
In opening, you can with preferably flexible configuration degree.Additionally, using the display panel of board structure of the invention, can effectively carry
Its location identification capability high.
Although the present invention is disclosed above with embodiment, so it is not limited to the present invention, any art
Middle tool usually intellectual, it is without departing from the spirit and scope of the present invention, therefore of the invention when a little change and retouching can be made
Protection domain when being defined depending on the appended claims person of defining.
Claims (8)
1. a kind of board structure, including：
One substrate；
One shielding pattern layer, is configured on the substrate, and wherein the shielding pattern layer has multiple openings, to expose the substrate
One surface；
Multiple color filter patterns, are configured on the substrate；And
Multiple location recognition figure codes, are configured on the substrate and the plurality of opening of correspondence is set, wherein respectively location recognition figure code
In completely overlapped in the corresponding opening on upright projection direction, and the material of the plurality of location recognition figure code is a transparent light
Resistance, transparent material of the transparent photoresistance comprising an absorbable infrared light；
One protective layer, is configured on the substrate and covers the plurality of color filter patterns and the shielding pattern layer, wherein the plurality of
Location recognition figure code is configured on the protective layer；
An at least transparent pattern, is configured on the protective layer, and to should at least the one of the shielding pattern layer opening set, this is saturating
, less than the height of respectively location recognition figure code, wherein the transparent pattern is in more not with this on upright projection direction for the height of bright pattern
Individual color filter patterns are overlapped, and the transparent pattern and the plurality of location recognition figure code are same film layer.
2. board structure as claimed in claim 1, it is characterised in that further include：
Wherein the plurality of color filter patterns part covers the shielding pattern layer and the plurality of of the shielding pattern layer is completely covered
Opening.
3. board structure as claimed in claim 1, it is characterised in that further include：
Multiple separation materials, are configured on the protective layer, and respectively the height of the separation material is higher than the height of respectively location recognition figure code,
Wherein respectively the separation material in being overlapped in the shielding pattern layer on upright projection direction, and the plurality of separation material is known with the plurality of position
Figure code is not same film layer.
4. board structure as claimed in claim 1, it is characterised in that the main absorption of the transparent material of the absorbable infrared light
Wavelength is 800 nanometers to 1100 nanometers of infrared light.
5. board structure as claimed in claim 1, it is characterised in that respectively the external form profile of the location recognition pattern includes strip
Shape, taper, column or point-like.
6. a kind of display panel, including：
One board structure as claimed in claim 1；
One opposite substrate, be configured at the board structure to；And
One display dielectric layer, is configured between the board structure and the opposite substrate.
7. display panel as claimed in claim 6, it is characterised in that when the board structure is a colored optical filtering substrates, should
Opposite substrate is an active elements array substrates, and it is an active array for being integrated with colorized optical filtering layer pattern to work as the board structure
During substrate, the opposite substrate is a substrate with a common electrode.
8. display panel as claimed in claim 6, it is characterised in that the display dielectric layer includes a liquid crystal layer.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103109034 | 2014-03-13 | ||
| TW103109034A TWI529451B (en) | 2014-03-13 | 2014-03-13 | Substrate structure and display panel |
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| CN104076553A CN104076553A (en) | 2014-10-01 |
| CN104076553B true CN104076553B (en) | 2017-06-06 |
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| CN201410335669.6A Expired - Fee Related CN104076553B (en) | 2014-03-13 | 2014-07-15 | Substrate structure and display panel |
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| TW (1) | TWI529451B (en) |
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| TWI691875B (en) * | 2018-09-07 | 2020-04-21 | 友達光電股份有限公司 | Detection-display device and display module using the same |
| US11249245B2 (en) | 2019-09-05 | 2022-02-15 | Himax Technologies Limited | Patterned light guide structure and method to form the same |
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| CN1614625A (en) * | 2004-12-03 | 2005-05-11 | 友达光电股份有限公司 | Handwritten inputting devices |
| CN101105736A (en) * | 2006-07-13 | 2008-01-16 | 富士施乐株式会社 | Handwriting detection sheet and handwriting system |
| CN103226258A (en) * | 2013-03-25 | 2013-07-31 | 京东方科技集团股份有限公司 | Liquid crystal display panel and manufacturing method thereof |
Family Cites Families (4)
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| SE517445C2 (en) * | 1999-10-01 | 2002-06-04 | Anoto Ab | Position determination on a surface provided with a position coding pattern |
| US7385594B2 (en) * | 2004-02-19 | 2008-06-10 | Au Optronics Corporation | Position encoded sensing device and a method thereof |
| JP2007304680A (en) * | 2006-05-09 | 2007-11-22 | Three M Innovative Properties Co | Functional film and method for using the same |
| TWI476495B (en) * | 2012-09-26 | 2015-03-11 | Au Optronics Corp | A display device having position-encoding data |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1614625A (en) * | 2004-12-03 | 2005-05-11 | 友达光电股份有限公司 | Handwritten inputting devices |
| CN101105736A (en) * | 2006-07-13 | 2008-01-16 | 富士施乐株式会社 | Handwriting detection sheet and handwriting system |
| CN103226258A (en) * | 2013-03-25 | 2013-07-31 | 京东方科技集团股份有限公司 | Liquid crystal display panel and manufacturing method thereof |
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| TW201535014A (en) | 2015-09-16 |
| TWI529451B (en) | 2016-04-11 |
| CN104076553A (en) | 2014-10-01 |
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