TWI529443B - Exposure device and micro lens array structure - Google Patents

Description

Exposure device and microlens array structure

The present invention relates to an exposure apparatus for exposing a glass substrate or the like, which is used for a liquid crystal display panel for a mobile phone, etc. In particular, the present invention relates to a plurality of microlenses disposed between a mask and a substrate to be exposed, and An exposure apparatus and a microlens array structure capable of exposing a mask pattern with high resolution.

Conventionally, when exposure is applied to, for example, a glass substrate or the like of a large liquid crystal display panel, an exposure apparatus such as a lens scanning type, a mirror projection type, or a proximity type is used. Then, the transmitted light of the pattern formed on the large mask is incident on a plurality of projection optical systems (multiple lenses), and is divided and formed on the substrate, and exposure of a plurality of regions on the substrate is performed by one exposure. This exposure method is employed for exposure of a substrate requiring a resolution of 3 μm or more.

However, for example, in a glass substrate or the like used for a liquid crystal display panel for a mobile phone, when a substrate to be used is small, a high resolution of 2 μm or less is required, and the above-described exposure method using a multi-lens cannot be employed. Therefore, a step exposure apparatus for exposure of a substrate for a semiconductor or the like is used (for example, Patent Documents 1 and 2).

In the stepper exposure apparatus, the transmitted light formed in each pattern of the mask is irradiated onto the substrate after being transmitted through the reduction optical system. Conventionally, a glass substrate used for a liquid crystal display panel or the like for mobile phones is manufactured by, for example, a large substrate of 1.5 m ² , and is exposed at a plurality of times in a region constituting each of the individual glass sheets of one or a plurality of sheets during exposure. Then, the substrate is divided by exposing all the regions constituting the individual substrates by a plurality of exposures to fabricate a plurality of glass substrates.

Further, Patent Document 3 also discloses that a microlens is disposed between the mask and the substrate. The array, and the technique of increasing the resolution of the formed pattern by the microlens array. That is, as described in Patent Document 3, the mask forming the pattern to be exposed is provided corresponding to the size of each individual substrate (panel), and the pattern to be exposed is applied to the substrate by the respective microlenses of the microlens. The imaging of the erecting equal-magnification image can improve the resolution of the formed exposure pattern.

[Previous Technical Literature] [Patent Literature]

Patent Document 1 Japanese Patent Laid-Open Publication No. 2006-235515

Patent Document 2 International Publication No. 2005/038518

Patent Document 3 Japanese Patent Laid-Open Publication No. 2008-197226

However, in the above prior art, there are problems as follows. In the step-and-exposure apparatus disclosed in Patent Documents 1 and 2, it is necessary to repeat the plurality of exposures in the region of the individual glass substrates constituting each of the one or more sheets, and there is a problem that the exposure time period becomes long.

Further, as described in Patent Document 3, even when a high resolution is obtained by the microlens array, as in the case of the stepper exposure apparatus, the respective substrates are repeatedly arranged one by one by the respective sizes. The mask and the microlens array are exposed, and the positive photoresist material on the substrate is exposed one by one in the area constituting each individual substrate. Therefore, there is a problem that the exposure time is extremely lengthy.

In order to solve this problem, it is considered to use a mask corresponding to a plurality of substrates of a plurality of sheets to set a pattern to be exposed in plural. However, the microlens array for imaging the mask pattern is different from the case of the mask, and it is difficult to increase the size of the individual substrates corresponding to the plurality of sheets. Therefore, it is necessary to use a plurality of connections to match the width of each substrate (panel). Microlens array of microlens array sheets. At this time, the region between the microlens array sheets constitutes a light-shielding region supported by the support portion. Therefore, the area between the individual substrates (panels) corresponding to the light-shielding region is not exposed, and in the subsequent etching step, the electrode material remains in the region between the individual substrates, and therefore, there is a short circuit of the edge portions of the respective substrates. The problem point.

The present invention has been made in view of the related problems, and an object thereof is to provide a positive type in which an area in which an individual substrate can be exposed can be exposed in an exposure apparatus which can expose a substrate on which a positive resist material is formed across a plurality of areas constituting individual substrates. An exposure apparatus for a photoresist material and a microlens array structure for an exposure apparatus.

The exposure apparatus of the present invention comprises: a substrate on which a positive photoresist material is formed by scanning light in a first direction to form an exposure pattern, and a light source for emitting exposure light; the mask is perpendicular to a plurality of patterns to be exposed are disposed in a predetermined direction at a predetermined interval in the second direction of the first direction, and exposure light from the light source is transmitted through the pattern; and the microlens array is configured to image an erecting image of the pattern a plurality of microlenses on the substrate; a frame-shaped support portion for supporting the microlens array; and a driving portion for moving the microlens array and the light source relative to the mask in the first direction; a microlens array, wherein the microlens sheet is continuous in the second direction, the microlens sheet is provided with a plurality of microlenses; and the support portion is positioned between the microlens sheets of the microlens array An opening for transmitting light for exposure is provided.

A microlens array structure for an exposure apparatus according to the present invention includes: a light source for emitting an exposure light; and a mask for setting a plurality of exposures at a predetermined interval in a second direction perpendicular to a first direction of the substrate scanning direction. a pattern, the exposure light from the light source is transmitted through the pattern; the microlens array is provided with a plurality of microlenses for imaging an erecting image of the pattern on the substrate; a frame-shaped support portion for supporting the a microlens array; and a driving portion that causes the microlens array and the light source to Moving in the first direction relative to the mask; and a microlens array structure is used in an exposure device for forming a substrate of a positive photoresist material by exposing light to the surface in the first direction. Forming an exposure pattern, wherein in the microlens array structure, the microlens array is formed by arranging a plurality of microlens microlens sheets in the second direction, and the microlens is aligned in the support portion At the position between the microlens sheets of the array, an opening for transmitting the exposure light is provided.

In the present invention, for example, the opening of the support portion is provided at both ends of the front side and the rear side in the scanning direction of the substrate, or at one end of the front side and the rear side of the scanning direction of the substrate. Further, in the support portion, it is preferable to provide an opening for transmitting the exposure light at a position on the outer edge portion of each of the lenticular sheets which are aligned at both end portions of the microlens array.

In the above exposure apparatus, for example, there is further provided a control means for controlling the position of the substrate in the second direction in a state in which the emission of the exposure light from the light source is stopped, and the second portion located on the substrate When the number of regions to be exposed in the direction is larger than the number of patterns in the second direction of the mask, the control device may stop emitting the exposure light after exposing the region corresponding to the number of patterns of the substrate. The substrate is moved in the second direction, and the exposure light is again emitted, and the erected equal-magnification image of the pattern is imaged on the unexposed region of the substrate.

Further, for example, the control device may control the position of the substrate located in the first direction while the emission of the exposure light from the light source is stopped, and the area to be exposed in the first direction of the substrate When the number of patterns is larger than the number of patterns in the first direction of the mask, the exposure light may be stopped after the area corresponding to the number of patterns of the substrate is exposed, and the substrate is placed in the first direction. Moving, and again starting to emit the exposure light, the erected equal-magnification image of the pattern is imaged in the unexposed area of the substrate.

In the exposure apparatus of the present invention, the plurality of patterns to be exposed on the mask are provided at a predetermined interval in the first direction, and the exposure light from the light source is transmitted through the plurality of patterns juxtaposed in the first direction. Then, the microlens array for imaging the erected image of the pattern on the substrate is supported by the frame-shaped support portion, and the microlens array and the light source are opposite to the mask by the driving portion. Move in the direction. In the present invention, the microlens array is configured by arranging a plurality of microlens microlens sheets in the second direction, but at a position supporting the microlens array, at a position aligned between the microlens sheets An opening for transmitting the exposure light is provided. Therefore, in a state where the exposure light from the light source is emitted, when the microlens array and the light source are moved in the first direction with respect to the mask by the driving portion, the region between the patterns on the substrate is irradiated and transmitted. The exposure light of the opening of the support portion can positively expose the positive photoresist material between the regions constituting the individual substrates.

Hereinafter, embodiments of the present invention will be specifically described with reference to the drawings. 1 is a schematic view showing exposure of an exposure apparatus according to an embodiment of the present invention, and FIG. 2(a) is a plan view showing a microlens array and a support portion in an exposure apparatus according to an embodiment of the present invention, FIG. 2 (FIG. 2 (FIG. 2) b) shows a partially enlarged perspective view of the microlens array and the support portion in the exposure apparatus according to the embodiment of the present invention. 3(a) is a view showing a transmission region of exposure light in a microlens array in the exposure apparatus according to the first embodiment of the present invention, and FIG. 3(b) shows an exposure formed on the substrate. Floor plan of the area. In the exposure apparatus 1 of the present embodiment, the substrate 2 having the positive photoresist material formed on the surface thereof is scanned in the first direction to form an exposure pattern, and is formed by a light source 11 for emitting exposure light. The mask 12 forms a predetermined plurality of exposure patterns; the microlens array 13 is provided with a plurality of microlenses 131a for incident light incident on the mask 12, so that the patterns are erected, etc. The multiple image is imaged on the substrate; and the support portion 130 is for supporting the microlens array 13.

The substrate exposed by the exposure apparatus 1 of the present embodiment is, for example, a large glass substrate of 1500 mm × 1850 mm, and a plurality of individual substrates are produced by cutting out the large glass substrate. That is, the glass substrate 2 shown in FIG. 1 is formed into a transparent pattern on the surface through a development step and an etching step after being exposed to a predetermined pattern shape of each substrate, and is divided in the subsequent steps. And each of the substrates is formed. Therefore, on the surface of the glass substrate 2 in the present embodiment, a transparent electrode material such as ITO (Indium-Tin-Oxido) or the like is formed on the entire surface of the region constituting the individual substrate, and the transparent electrode material is formed on the transparent electrode material. A photoresist layer is formed. In the present invention, the exposure light is irradiated onto the photoresist layer in a shape corresponding to the pattern of the mask 12, and the photoresist layer irradiated with the exposure light is exposed by the exposure light, and thereafter, by performing imaging. And etching to remove it. Therefore, the photoresist layer in the present invention is formed by a positive-type photoresist material which combines a compound which generates an acid by photolysis, and which is improved by the decomposition of the generated acid. An adhesive resin such as the solubility of a photoresist layer in a liquid.

The light source 11 in the present embodiment is a light source that emits, for example, laser light composed of ultraviolet light, and can continuously emit laser light during exposure. The light source 11 is moved in the first direction together with a microlens array to be described later by a driving unit (not shown), whereby the irradiation position of the exposure light with respect to the mask 12 is moved in the first direction.

A mask 12 is formed to form a pattern 12a corresponding to the shape of the transparent electrode formed on the individual substrate. In the present embodiment, as shown in FIG. 1, the mask 12 is provided corresponding to the size of the glass substrate 2. Then, in the mask 12, the number of individual substrates produced by the glass substrate 2 is matched, and the pattern 12a corresponding to the shape of the circuit pattern for each substrate is the second perpendicular to the first direction of the woman drawing direction. The directions are arranged at predetermined intervals, and are arranged in a plurality of rows at predetermined intervals in the first direction of the scanning direction.

As shown in FIG. 2, the microlens array 13 is provided with a plurality of microlenses 131a, In the embodiment, five microlens sheets 131 are connected in the second direction. Then, each of the microlens sheets 131 is supported by the support portion 130 by being supported by the frame-shaped support portion 130 by the bracket 133 or the like. Each of the microlenses 131a of the microlens sheet 131 is arranged on the optical path of the exposure light, and the erected equal-magnification image of the pattern 12a is formed on the substrate 2 by incident light transmitted through the mask 12.

The support portion 130 supporting the microlens array 13 is formed in a frame shape in order to support the respective lenticular sheets 131 at the edge portions thereof. Therefore, as shown in FIG. 2, between the microlens sheets 131, a light-shielding region that does not transmit the exposure light is formed by the support portion 130. Then, at a position aligned with the light shielding region between the lenticular sheets 131, an opening 132 for transmitting the exposure light is provided. In the present embodiment, the opening 132 is provided at a position on the side after the lenticular sheet 131 is located in the scanning direction. Therefore, as shown in FIG. 1, while the exposure light 3 is irradiated from the light source 11, the light source 11 and the microlens array 13 are moved by the driving portion in the first direction relative to the mask 12, by the mask 12. And the transmitted light of the microlens 131a, on the area of the substrate 2 constituting the individual substrate, the erect image 20a of the pattern 12a of the mask 12 is imaged, and the positive shape on the substrate is exposed corresponding to the shape of the pattern 12a A photoresist material to form an exposure pattern 2a. At this time, the region between the exposure patterns 2a is blocked by the support portion 130 to constitute a portion where the exposure light is not irradiated. In the present embodiment, the support portion 130 is provided with an opening 132 for transmitting the exposure light at a position aligned with the light-shielding region between the microlens sheets 131. Therefore, in the state in which the exposure light is emitted, When the light source 11 and the microlens array 13 are moved in the first direction by the driving portion, the exposure light that has passed through the opening 132 is irradiated to the positive photoresist material in the region between the exposure patterns 2a (Fig. Area 1b in 1). Thereby, the positive photoresist material between the regions constituting the individual substrates can be surely exposed. Therefore, it is possible to surely remove the exposed positive-type photoresist material in the subsequent etching step, and it is possible to prevent the circuit of the edge portion of each of the substrates from being short-circuited.

In the present embodiment, the support portion 130 is provided with an opening 132 for transmitting the exposure light, and each of the microlens sheets 131 aligned at both end portions of the microlens array 13 is provided. The position of the edge portion from the outer side is also provided, whereby the positive-type photoresist material at the edge portion of the substrate 2 can be exposed, and in the same manner as described above, the positive type after exposure is surely removed in the subsequent etching step. The photoresist material prevents the circuit of the edge portion of the individual substrate from being short-circuited.

Next, the operation of the exposure apparatus of this embodiment will be described. In the present embodiment, first, a transparent electrode material is formed on the surface, and a substrate 2 on which a positive resist material is formed is introduced into the exposure apparatus 1 and placed at an exposure start position.

Then, the exposure light is emitted from the light source 11. The exposure light emitted from the light source 11 is incident on the mask 12 as shown in FIG. The exposure light 3 is located in the irradiation region of the mask 12, and the width in the second direction in the vertical scanning direction is slightly larger than the plurality of regions constituting the individual substrates which are juxtaposed in the second direction.

Since the pattern 12a corresponding to the shape of the transparent electrode formed on the individual substrate is formed in the mask 12, one portion of the exposure light is partially blocked by the pattern 12a, and the incident mask 12 transmits the light to the microlens array 13.

Then, the erecting equal-magnification 20a of the pattern 12a is imaged on the substrate 2 by the respective microlenses 131a of the microlens array 13, and the positive-type photoresist material is exposed in accordance with the shape of the pattern 12a. In the present embodiment, as shown in FIG. 2, the microlens array 13 is composed of five microlens sheets 131 each provided with a plurality of microlenses 131a, and indirectly continues in the second direction. Then, since each of the microlens sheets 131 supports the edge portion by the support portion 130, a light shielding region that does not transmit the exposure light is formed between the microlens sheets 131.

However, in the present embodiment, as shown in FIG. 3(a), the position of the light-shielding region between the lenticular sheets 131 is aligned with the lenticular sheet 131 at a position closer to the scanning direction than the lenticular sheet 131. Where there is an opening for the transmission of exposure light 132. Thus, the exposure light transmitted through the opening 132 also illuminates the positive photoresist material (of the region 20b) between the regions constituting the individual substrates on the substrate 2.

In this state, while the exposure light is continuously emitted, if the light source 11 and the microlens array 13 are moved in the first direction by the driving portion, the irradiation position of the exposure light in the mask 12 may be Move in the first direction. Therefore, the pattern 12a is scanned in the first direction, and the exposure pattern 2a is formed by sequentially imaging the substrate 2 on the substrate 2 by the microlens array 13.

At this time, as shown in FIG. 3(b), in order to follow the pattern 12a formed on the substrate, and also between the regions constituting the individual substrates, the positive photoresist material in the region between the exposure patterns 2a (in FIG. 1) The region 20b) illuminates the exposure light transmitted through the opening 132 to form the exposed region 2b. In the present embodiment, the opening 132 is closer to the rear side in the scanning direction of the substrate 2 than the lenticular sheet 131, and the exposure pattern is located on the front side in the scanning direction of the substrate 2 when the exposure pattern 2a is formed. In the area between 2a, the unexposed area remains. However, after the formation of the exposure pattern 2a, the exposure light is irradiated, and the light source 11 and the microlens array 13 are moved in the scanning direction with respect to the mask 12, and the unexposed film remaining between the exposure patterns 2a may be exposed. region. Thereby, all of the positive-type photoresist materials between the regions constituting the individual substrates can be surely exposed, and the exposed positive-type photoresist materials can be surely removed in the subsequent etching step, thereby preventing the respective substrates. A short circuit occurs in the loop of the edge portion.

Then, when the opening 132 for transmitting the exposure light is disposed at the edge of each of the outer sides of the microlens sheet 131 which is aligned at both end portions of the microlens array 13, the edge portion of the substrate 2 can be made positive. The exposure of the photoresist material can also prevent short-circuiting of the edge portion of the individual substrates located in the portion, which is a preferred embodiment.

Further, in the present embodiment, the opening 132 for the exposure light transmission provided in the support portion 130 is located closer to the scanning direction than the lenticular sheet 131. However, as shown in FIG. 4, the opening 132 is provided. It may be provided at a position closer to the front side than the microlens sheet 131 in the scanning direction. In this case, the area pattern 12a formed on the individual substrates is formed by following the movement of the light source 11 and the microlens array 13 of the mask 12 to follow the exposed area 2b formed by the transmitted light of the opening 132. Therefore, the start position of the exposure is determined between the regions constituting the individual substrates at the rear of the scanning direction, and the region at the rear end side of the region irradiating the transmitted light of the opening 132. Thereby, similarly to the case where the opening 132 is provided closer to the end side in the scanning direction than the microlens sheet 131, the unexposed area is not left between the exposure patterns 2a, and the individual substrates can be formed. Inter-area The positive photoresist material is definitely exposed.

Further, the opening 132 may be provided at an end portion of both the front side and the rear side closer to the scanning direction of the substrate 2 than the lenticular sheet 131. In this case, the start position of the exposure can be matched to the pattern 12a of the mask 12, and the stroke of the light source 11 and the microlens array 13 relative to the movement of the mask 12 can be shortened compared to the above case.

Next, an exposure apparatus according to a second embodiment of the present invention will be described. In the first embodiment, the mask 12 is provided corresponding to the size of the substrate 2. However, in the present embodiment, the substrate 2 is larger than in the first embodiment, and in the second direction, the substrate 2 is The number of areas to be exposed is larger than the number of patterns of the mask 12 located in the second direction. Therefore, the area of the substrate 2 to be exposed cannot be exposed by one scan.

In the present embodiment, the exposure apparatus includes a control device (not shown) for controlling the position of the substrate 2 positioned in the second direction. For example, in the exposure apparatus, the position of the stage on which the substrate 2 is placed is controlled by the control device, and the position of the substrate 2 can be moved in the second direction. Therefore, in the present embodiment, when the exposure corresponding to the number of patterns 12a formed in the mask 12 is completed, the control device temporarily stops the emission of the exposure light from the light source 11. Then, the control device, as shown in FIG. 5, moves the platform to make the pattern by the microlens array 13 The erect equal magnification image of 12a is imaged in the unexposed area of the substrate 2. Thereafter, the control device causes the exposure light from the light source 11 to start to be emitted again, and the light source 11 and the microlens array 13 are relatively moved in the first direction by the driving unit, and the first embodiment The same is done for continuous exposure. Further, as shown in FIG. 5, the scanning direction is opposite to the case of the first embodiment, and it is not necessary to return the relative positions of the light source 11 and the microlens array 13 to the mask 12 when the exposure light is stopped. The exposure time can be shortened, so it is a preferred embodiment.

In the present embodiment, as in the first embodiment, a light-shielding region that does not transmit exposure light is formed between the five lenticular sheets 131 by the support portion 130. However, the support portion 130 is provided in the support portion 130. The exposure light 132 for illuminating the light-transmitting region at the position between the lenticular sheets 131 is aligned, so that the exposure light transmitted through the opening 132 is also irradiated to the region (of the region 20b) between the regions constituting the individual substrates on the substrate 2. Type photoresist material.

If the exposure light is continuously emitted in this state, and the light source 11 and the microlens array 13 are moved in the first direction by the driving portion, the irradiation position of the exposure light at the mask 12 will be The exposure pattern 2a is formed by sequentially moving the microlens array 13 on the substrate 2 while moving in the first direction and scanning the pattern 12a in the first direction. At this time, in order to follow the pattern 12a formed on the substrate, a positive-type photoresist material (region 20b in FIG. 5) which is also in a region between the exposure patterns 2a is irradiated through the opening 132 between the regions constituting the individual substrates. Exposure light. However, in the present embodiment, the position of the opening 132 in the first direction is located closer to the front side than the lenticular sheet 131 in the smear direction, so that the exposure is the same as that of the modification of the first embodiment. .

As described above, in the present embodiment, the positive-type photoresist material between the regions constituting the individual substrates can be reliably exposed, and the exposed positive-type photoresist material can be surely removed in the subsequent etching step. It is possible to prevent the circuit of the edge portion of each of the substrates from being short-circuited. Then, if the micro-lens array 13 is aligned with the micro-lens array 13 An opening 132 for transmitting the exposure light is disposed at an edge of each of the outer side edges of the mirror sheet 131, and the positive photoresist material at the edge portion of the substrate 2 can be exposed, and the edge portion loop of the individual substrates in the portion can be prevented from occurring. Short circuit is a preferred embodiment.

Further, in the present embodiment, the opening 132 may be provided at an end portion of both the front side and the rear side closer to the scanning direction of the substrate 2 than the lenticular sheet 131, and the start position of the exposure is fitted to the mask 12 The pattern 12a shortens the stroke in which the light source 11 and the microlens array 13 are relatively moved with respect to the mask 12.

Next, an exposure apparatus according to a third embodiment of the present invention will be described. In the present embodiment, the substrate 2 is larger than in the case of the second embodiment, and the number of regions to be exposed of the substrate 2 in the first direction in the scanning direction is larger than the number of patterns of the mask 12 in the second direction. Therefore, the area of the substrate 2 to be exposed cannot be exposed by one scan.

In the present embodiment, in the exposure apparatus according to the second embodiment, the control device may control the position of the substrate 2 in the first direction. Therefore, in the present embodiment, after the exposure of the predetermined exposure target region arranged in the second direction is completed, the control device temporarily stops the emission of the exposure light from the light source 11. Then, as shown in FIG. 6, the control device moves the platform in the first direction in order to image the erecting equal-magnification image of the pattern 12a of the microlens array 13 in the unexposed region of the substrate 2. Thereafter, the control device causes the exposure light from the light source 11 to start to be emitted again, and the light source 11 and the microlens array 13 are moved in the first direction with respect to the mask 12 by the driving portion, and the first embodiment and the first embodiment In the second embodiment, continuous exposure was performed in the same manner. Further, as shown in Fig. 6, the scanning direction is the same as that in the case of the first embodiment, and it is not necessary to restore the relative position of the light source 11 and the microlens array 13 to the mask 12 when the exposure light is stopped. The exposure time can be shortened, so it is a preferred embodiment.

In the present embodiment, as in the first embodiment and the second embodiment, a light-shielding region that does not transmit the exposure light is formed between the five microlens sheets 131. However, the support portion 130 is provided in the support portion 130. The opening 132 for light transmission is exposed at a position where the light shielding region between the microlens sheets 131 is aligned, so that the exposure light transmitted through the opening 132 is also irradiated to the positive region (of the region 20b) between the regions constituting the individual substrates on the substrate 2. Photoresist material. Therefore, by the same continuous exposure as in the first embodiment and the second embodiment, the positive resist material between the regions constituting the individual substrates can be reliably exposed, and the subsequent etching step can be surely removed. After the exposure of the positive photoresist material, it is possible to prevent the circuit of the edge portion of each substrate from being short-circuited. Then, if the opening 132 for the transmission of the exposure light is provided at the position of the edge portion of each of the outer sides of the microlens sheet 131 aligned at both end portions of the microlens array 13, the positive photoresist material of the edge portion of the substrate 2 can be made. The exposure is performed, and it is possible to prevent a short circuit in the edge portion loop of the individual substrates in the portion, which is a preferred embodiment.

Further, in the present embodiment, the opening 132 may be provided at an end portion of both the front side and the rear side closer to the scanning direction of the substrate 2 than the lenticular sheet 131, and the start position of the exposure is matched with the pattern of the mask 12. 12a, the stroke for relatively moving the light source 11 and the microlens array 13 with respect to the mask 12 can be shortened.

Further, in the region indicated by the chain double-dashed line in Fig. 6, after the above-described exposure, the erecting equal-magnification image of the pattern 12a using the microlens array 13 is imaged in the unexposed area of the substrate 2 by the control means. The substrate is moved in the second direction, and by performing the same exposure as described above, an exposure region for preventing the edge portion of the individual substrate from being short-circuited can be formed.

In the exposure apparatus described above, for example, as shown in FIG. 7, four light sources 11 are provided, and if the mask 12 and the microlens array 13 are provided corresponding to the respective light sources 11, the larger substrate 2 can be exposed. And can get the effect of shortening the exposure time.

[The possibility of industrial use]

The present invention is advantageous for an exposure apparatus for exposing a pattern of a mask with high resolution in the manufacture of a small liquid crystal display panel or the like for a mobile phone.

1‧‧‧Exposure device

11‧‧‧Light source

12‧‧‧ mask

13‧‧‧Microlens array

130‧‧‧Support Department

131‧‧‧Microlens sheet

131a‧‧‧microlens

132‧‧‧Opening opening for light transmission

133‧‧‧ bracket

2‧‧‧Substrate

2a‧‧‧ exposure pattern

2b‧‧‧Exposure area

20a‧‧‧正立等倍像

3‧‧‧Exposure light

Fig. 1 is a view showing exposure by an exposure apparatus relating to an embodiment of the present invention.

2(a) is a plan view showing a microlens array and a support portion in an exposure apparatus according to an embodiment of the present invention, and (b) is a view showing a microlens array and a support portion in an exposure apparatus according to an embodiment of the present invention. Partially enlarged perspective view.

Fig. 3 (a) is a plan view showing a transmission region of exposure light in a microlens array in the exposure apparatus according to the first embodiment of the present invention, and Fig. 3 (b) is a plan view showing an exposure region formed on the substrate.

(a) of FIG. 4 is a view showing a transmission region of exposure light in a microlens array in the exposure apparatus according to the modification of the first embodiment, and (b) shows an exposure of a modification of the first embodiment. In the device, a plan view of an exposed region formed on a substrate.

Fig. 5 is a plan view showing an exposure region formed on a substrate by an exposure apparatus according to a second embodiment of the present invention.

Fig. 6 is a plan view showing an exposure region formed on a substrate by an exposure apparatus according to a third embodiment of the present invention.

Fig. 7 is a perspective view showing an example of an exposure apparatus according to an embodiment of the present invention.

1‧‧‧Exposure device

11‧‧‧Light source

12‧‧‧ mask

13‧‧‧Microlens array

Claims (10)

An exposure apparatus for forming a substrate with a positive photoresist material by scanning light in a first direction to form an exposure pattern, comprising: a light source for emitting exposure light; and a mask perpendicular to the first direction a plurality of patterns to be exposed are disposed at a predetermined interval in a second direction, and exposure light from the light source is transmitted through the pattern; and the microlens array is configured to image an erecting image of the pattern on the substrate a plurality of microlenses; a frame-shaped support portion for supporting the microlens array; and a driving portion for moving the microlens array and the light source relative to the mask in the first direction; the microlens array, The microlens sheet is continuous in the second direction, and the microlens sheet is provided with a plurality of microlenses; and the support portion is disposed at a position between the microlens sheets of the microlens array An opening for exposing light transmission. The exposure apparatus according to claim 1, wherein the opening of the support portion is provided at both ends of the front side and the rear side in the scanning direction of the substrate. The exposure apparatus according to claim 1, wherein the opening of the support portion is provided at one of an front end and a rear end of the substrate in the scanning direction. The exposure apparatus according to any one of claims 1 to 3, wherein the support portion is further positioned at an edge portion on an outer side of each of the microlens sheets at both end portions of the microlens array. An opening for transmitting the exposure light is provided. The exposure apparatus according to any one of claims 1 to 3, further comprising a control device for controlling the second direction in a state in which the emission of the exposure light from the light source is stopped When the number of regions of the substrate to be exposed in the second direction of the substrate is larger than the number of patterns in the second direction of the mask, the control device corresponds to After exposing the area of the pattern of the substrate, the exposure light is stopped, the substrate is moved in the second direction, and the exposure light is again emitted, and the erecting image of the pattern is imaged on the substrate. Unexposed area. The exposure apparatus according to claim 5, wherein the control device controls the position of the substrate located in the first direction while the emission of the exposure light from the light source is stopped; When the number of regions to be exposed in the first direction of the substrate is larger than the number of patterns in the first direction of the mask, the exposure light is stopped after exposing the region corresponding to the number of patterns of the substrate. The substrate is moved in the first direction, and the exposure light is again emitted, and the erecting equal-magnification image of the pattern is imaged on the unexposed region of the substrate. A microlens array structure for an exposure apparatus, comprising: a light source for emitting an exposure light; and a mask for providing a plurality of patterns to be exposed at a predetermined interval in a second direction perpendicular to a first direction of the substrate scanning direction; Exposing the exposure light from the light source to the pattern; the microlens array is provided with a plurality of microlenses for imaging the erecting equal-magnification image of the pattern on the substrate; a frame-shaped support portion for supporting the microlens array And a driving portion that moves the microlens array and the light source relative to the mask in the first direction; and a microlens array structure is used in an exposure device, wherein the exposure device exposes light to the first Forming an exposure pattern by forming a substrate of a positive photoresist material on the scanning surface in one direction, and in the microlens array structure, the microlens array is formed by continuation of the microlens sheet in the second direction, the micro The lens sheet is provided with a plurality of microlenses, and at the support portion, an opening for transmitting the exposure light is provided at a position between the microlens sheets aligned with the microlens array. The microlens array structure for an exposure apparatus according to claim 7, wherein The opening of the support portion is provided at both ends of the front side and the rear side in the scanning direction of the substrate. The microlens array structure for an exposure apparatus according to claim 7, wherein the opening of the support portion is provided at one of an front end and a rear end of the substrate in the scanning direction. The microlens array structure for an exposure apparatus according to any one of claims 7 to 9, wherein in the support portion, each of the microlens sheets aligned at both end portions of the microlens array is further An opening for transmitting the exposure light is provided at the position of the outer edge portion.