TWI521057B - Water-soluble working fluid for fixed abrasive grain wire saw - Google Patents

Water-soluble working fluid for fixed abrasive grain wire saw Download PDF

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TWI521057B
TWI521057B TW101105989A TW101105989A TWI521057B TW I521057 B TWI521057 B TW I521057B TW 101105989 A TW101105989 A TW 101105989A TW 101105989 A TW101105989 A TW 101105989A TW I521057 B TWI521057 B TW I521057B
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working fluid
mass
water
less
present
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TW201241171A (en
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浜元伸二
大橋康正
沼田康德
石塚大倫
高橋宏明
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油脂鑞化學工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
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    • C10M125/26Compounds containing silicon or boron, e.g. silica, sand
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Description

固定研磨粒細線切割器用水溶性加工液 Water-soluble working fluid for fixed abrasive fine wire cutter

本發明係關於一種固定研磨粒細線切割器用水溶性加工液。 The present invention relates to a water-soluble working fluid for a fixed abrasive fine wire cutter.

近年來,為了謀求半導體元件之製造成本之降低,矽晶圓之大口徑化正在快速發展,矽晶圓之切割加工技術之提高變得重要。作為該切割加工技術,例如存在利用切割損失較少且加工效率較佳之細線工具(細線切割器)之切割方式。於利用細線切割器之切割方式中存在游離研磨粒方式及固定研磨粒方式,對於游離研磨粒方式提出有如下問題:(1)由於使用使研磨粒分散於油劑中而成之漿料作為加工液,故切割加工或周邊環境之污染嚴重;(2)含有大量切割時所產生之切割碎屑的漿料必需廢棄;(3)游離研磨粒與切割碎屑難以分離;(4)對於細線移動速度有限制,於加工效率提昇方面存在極限等。為了解決上述問題,研究有利用電沉積或樹脂黏合劑等將研磨粒固定於鋼琴線等細線表面而成之固定研磨粒型細線切割器。例如,於專利文獻1中,提出有以樹脂黏合劑固定30~60 μm之研磨粒之固定研磨粒細線切割器。藉由以1000~2500 m/min之線速使該固定研磨粒細線切割器移動並切割脆性材料,可進行高效率之切割加工。 In recent years, in order to reduce the manufacturing cost of semiconductor components, the large-diameter of germanium wafers is rapidly developing, and the improvement of the wafer-cutting processing technology becomes important. As the cutting processing technique, for example, there is a cutting method using a thin wire tool (fine wire cutter) which has less cutting loss and is excellent in processing efficiency. In the cutting method using the thin wire cutter, there are a free abrasive grain method and a fixed abrasive grain method. The free abrasive grain method has the following problems: (1) A slurry obtained by dispersing abrasive grains in an oil agent is used as a processing. Liquid, so the cutting process or the surrounding environment is seriously polluted; (2) the slurry containing a large amount of cutting debris generated during cutting must be discarded; (3) the free abrasive grains are difficult to separate from the cutting debris; (4) for fine line movement There are limits to speed and limits in terms of processing efficiency. In order to solve the above problems, a fixed abrasive grain type fine wire cutter which is obtained by fixing abrasive grains to a surface of a fine wire such as a piano wire by electrodeposition or a resin binder is used. For example, Patent Document 1 proposes a fixed abrasive fine wire cutter for fixing abrasive grains of 30 to 60 μm with a resin binder. The high-efficiency cutting process can be performed by moving the fixed abrasive fine wire cutter at a line speed of 1000 to 2500 m/min and cutting the brittle material.

另一方面,於使用固定研磨粒細線切割器對脆性材料進行 切割加工時,以潤滑、冷卻、切割碎屑之分散等為目的而同時使用加工液。作為該加工液,較佳為使用水溶性者。幾乎不含水之非水性加工液存在如下問題:非水性之揮發成分(溶劑成分)使作業環境惡化,加工液成為易燃性液體,加工後之洗淨步驟或廢液處理等於使用水溶性加工液之情形時變得更複雜。 On the other hand, the use of a fixed abrasive fine wire cutter for brittle materials At the time of cutting processing, the working fluid is used simultaneously for the purpose of lubrication, cooling, dispersion of cutting chips, and the like. As the working fluid, it is preferred to use a water-soluble one. The non-aqueous non-aqueous processing liquid has the following problems: the non-aqueous volatile component (solvent component) deteriorates the working environment, the processing fluid becomes a flammable liquid, and the washing step or waste liquid treatment after processing is equal to the use of the water-soluble working fluid. The situation becomes more complicated.

又,於被加工物為矽之情形時存在下述問題。即,矽之反應性較高,於切割加工中與加工液中之水分或鹼進行反應而生成氫氣,有易燃之虞。因此,較佳為抑制與矽之反應性之加工液。就上述觀點而言,提出有如專利文獻2中所示之加工液。 Further, in the case where the workpiece is defective, the following problems occur. That is, hydrazine has a high reactivity, and reacts with water or a base in the working fluid during the cutting process to generate hydrogen gas, which is flammable. Therefore, it is preferred to reduce the reactivity of the working fluid with ruthenium. From the above viewpoint, a working fluid as shown in Patent Document 2 has been proposed.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2001-054850公報[專利文獻2]日本專利特開2003-082334公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2001-054850 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2003-082334

作為使用使矽、藍寶石、玻璃、陶瓷纖維、釹等脆性材料固定研磨粒化而成之細線進行切割加工時所使用之加工液,廣泛使用如專利文獻2中所揭示之加工液般以二醇類與水為主成分者。然而,如上所述之習知之加工液有時無法充分地進行穩定之切割加工。尤其是,已知由於切割碎屑混入 加工液中而產生各種問題。若使用加工液進行矽等被加工物之切割加工,則該被加工物之切割碎屑混入加工液中。此時,根據情形有時加工液之黏度變高而達到對加工性能造成影響之程度。又,亦有時由於切割碎屑混入加工液中而導致如下不良情形:該切割碎屑阻塞設備之配管,於主導輥(main roller)之懸掛細線之凹槽中產生牢固之固著(以下,有時記作「硬質結塊」(hard cake))而導致細線之跳線(stitch skipping)(細線自凹槽偏離)等。 As a working fluid used for cutting a fine wire obtained by fixing and granulating a brittle material such as enamel, sapphire, glass, ceramic fiber or enamel, a diol is widely used as the processing liquid disclosed in Patent Document 2. Class and water are the main components. However, the conventional working fluid as described above sometimes does not sufficiently perform a stable cutting process. In particular, it is known that the cutting debris is mixed in Various problems occur in the processing fluid. When the machining liquid is used for cutting a workpiece such as a crucible, the cutting debris of the workpiece is mixed into the machining liquid. At this time, depending on the situation, the viscosity of the working fluid may become high to the extent that the processing performance is affected. Further, there is a case in which the cutting debris is mixed into the working fluid, which causes a problem that the cutting debris blocks the piping of the apparatus, and a firm fixing is formed in the groove of the hanging roller of the main roller (hereinafter, Sometimes referred to as "hard cake", which results in a stitching of the thin line (the thin line is offset from the groove).

因此,本發明之課題在於提供一種固定研磨粒細線切割器用水溶性加工液,其可抑制切割碎屑混入時之黏度之上升、及由混入之切割碎屑所導致的設備之配管阻塞或硬質結塊之產生。 Accordingly, an object of the present invention is to provide a water-soluble working fluid for a fixed abrasive fine wire cutter which can suppress an increase in viscosity when cutting chips are mixed, and a pipe jam or hard knot of a device caused by mixed cutting chips. The generation of blocks.

為了解決以上問題,本發明者等人進行努力研究而發現以下事項。 In order to solve the above problems, the inventors of the present invention conducted diligent research and found the following matters.

(1)於被加工物之切割碎屑混入加工液時,該切割碎屑為微粉(1 μm左右),或具有活性之新生面之切割碎屑彼此作用而包含周圍之加工液並且凝集,切割碎屑如增黏劑般發揮功能,藉此加工液之黏度明顯上升。 (1) When the cutting debris of the workpiece is mixed into the working fluid, the cutting debris is fine powder (about 1 μm), or the cutting debris of the active new surface interacts with each other to contain the surrounding working fluid and agglomerate, and the cutting is broken. The swarf functions as a tackifier, whereby the viscosity of the processing fluid rises remarkably.

(2)若被加工物之切割碎屑混入加工液中,則該切割碎屑之比重大於構成加工液之組成物之比重,故比重較大之切割碎屑沉澱。此時,若切割碎屑於分散之狀態下均勻沉澱,則 沉澱之切割碎屑牢固且緊密地固化,設備之配管阻塞或產生硬質結塊。 (2) If the cutting debris of the workpiece is mixed into the machining fluid, the specific gravity of the cutting debris is greater than the specific gravity of the composition constituting the machining fluid, so that the cutting debris having a large specific gravity precipitates. At this time, if the cutting chips are uniformly precipitated in a dispersed state, then The precipitated cutting chips are firmly and tightly solidified, and the piping of the equipment is clogged or hard agglomerates.

(3)藉由適當調整加工液之導電率,可控制混入加工液之切割碎屑之分散行為而解決上述(1)及(2)之問題。 (3) The problem of the above (1) and (2) can be solved by appropriately adjusting the conductivity of the working fluid to control the dispersion behavior of the cutting debris mixed into the working fluid.

本發明係基於上述見解而成者,具有以下之構成。即: The present invention has the following constitution based on the above findings. which is:

本發明之第1態樣係一種固定研磨粒細線切割器水溶性加工液,其含有(C)羧酸、(D)溶解於水中而顯示鹼性之化合物、(E)水,且於25℃下之導電率為300 μS/cm以上且3000 μS/cm以下,25℃下之pH為5以上且10以下,添加平均粒徑為1.5 μm之矽粉10質量%並攪拌而形成之準使用液之黏度於25℃下未滿30 mPa.s。 A first aspect of the present invention is a water-soluble working fluid for a fixed abrasive fine wire cutter comprising (C) a carboxylic acid, (D) a compound which is dissolved in water to exhibit basicity, (E) water, and at 25 ° C. The lower conductivity is 300 μS/cm or more and 3000 μS/cm or less, the pH at 25° C. is 5 or more and 10 or less, and the quasi-use liquid formed by adding 10% by mass of niobium powder having an average particle diameter of 1.5 μm and stirring is added. The viscosity is less than 30 mPa at 25 °C. s.

於本發明中,所謂「黏度」,意指利用布氏黏度計所測定之黏度。又,所謂「平均粒徑」,意指使用堀場製作所股份有限公司製造之雷射繞射/散射式粒度分佈測定裝置「LA910」所計測者。 In the present invention, the term "viscosity" means the viscosity measured by a Brookfield viscometer. In addition, the "average particle diameter" means a measurement using a laser diffraction/scattering type particle size distribution measuring apparatus "LA910" manufactured by Horiba, Ltd.

本發明之第1態樣之加工液較佳為進而含有(A)自包含醇、環氧乙烷與環氧丙烷之共聚合體,及聚氧伸烷基二醇類中選擇之至少一種以上之非離子系界面活性劑。 The processing liquid according to the first aspect of the present invention preferably further comprises at least one selected from the group consisting of (A) a copolymer comprising an alcohol, ethylene oxide and propylene oxide, and a polyoxyalkylene glycol. Nonionic surfactant.

又,本發明之第1態樣之加工液較佳為進而含有(B)二醇類。 Moreover, it is preferable that the working liquid of the first aspect of the present invention further contains (B) a glycol.

本發明之第2態樣係一種固定研磨粒細線切割器用水溶性加工液,其含有:(A)自醇、環氧乙烷與環氧丙烷之共聚 合體,及聚氧伸烷基二醇類中選擇之至少1種以上之非離子系界面活性劑0.1質量%以上且8質量%以下;(B)二醇類0.1質量%以上且80質量%以下;(C)羧酸0.01質量%以上且5質量%以下;(D)溶解於水中而顯示鹼性化合物0.01質量%以上且7質量%以下;及(E)水;且於25℃下之導電率為300 μS/cm以上且3000 μS/cm以下,25℃下之pH為5以上且10以下,添加平均粒徑為1.5 μm之矽粉10質量%並攪拌而形成之準使用液之黏度於25℃下未滿30 mPa.s。 A second aspect of the present invention is a water-soluble working fluid for a fixed abrasive fine wire cutter comprising: (A) copolymerization from an alcohol, ethylene oxide and propylene oxide At least one or more nonionic surfactants selected from the group consisting of polyoxyalkylene glycols are contained in an amount of 0.1% by mass or more and 8% by mass or less; and (B) 0.1% by mass or more and 80% by mass or less of the diols. (C) carboxylic acid 0.01% by mass or more and 5% by mass or less; (D) dissolved in water to exhibit 0.01% by mass or more and 7% by mass or less of the basic compound; and (E) water; and conductive at 25 ° C The rate is 300 μS/cm or more and 3000 μS/cm or less, the pH at 25 ° C is 5 or more and 10 or less, and the viscosity of the quasi-use liquid formed by adding 10% by mass of the niobium powder having an average particle diameter of 1.5 μm and stirring is Less than 30 mPa at 25 °C. s.

本發明之第1及第2態樣之加工液較佳為於25℃下之表面張力為20 mN/m以上且50 mN/m以下。 The working fluid according to the first and second aspects of the present invention preferably has a surface tension of 20 mN/m or more and 50 mN/m or less at 25 °C.

又,本發明之第1及第2態樣之加工液較佳為進而含有水溶性高分子及/或消泡劑。 Moreover, it is preferable that the working liquid of the first and second aspects of the present invention further contains a water-soluble polymer and/or an antifoaming agent.

又,本發明之第1及第2態樣之加工液較佳為將整體之質量設為100質量%而含有(E)水1.0質量%以上且99.7質量%以下。 In addition, it is preferable that the processing liquid of the first and second aspects of the present invention has a total mass of 100% by mass and contains (E) water of 1.0% by mass or more and 99.7% by mass or less.

根據本發明,可提供一種能夠抑制切割碎屑混入時之黏度之上升、及由混入之切割碎屑所導致的設備之配管阻塞或硬質結塊之產生的固定研磨粒細線切割器用水溶性加工液。 According to the present invention, it is possible to provide a water-soluble working fluid for a fixed abrasive fine wire cutter capable of suppressing an increase in viscosity when a cutting debris is mixed, and a pipe blockage or hard agglomeration of a device caused by the mixed cutting debris. .

<本發明之加工液之性狀> <Properties of the processing liquid of the present invention>

(導電率) (Conductivity)

本發明之固定研磨粒細線切割器用水溶性加工液於25℃下之導電率為300 μS/cm以上且3000 μS/cm以下。導電率之上限較佳為2000 μS/cm以下,更佳為1000 μS/cm以下。 The water-soluble working fluid for a fixed abrasive fine wire cutter of the present invention has a conductivity of 300 μS/cm or more and 3000 μS/cm or less at 25 °C. The upper limit of the conductivity is preferably 2000 μS/cm or less, more preferably 1000 μS/cm or less.

所謂導電率,係表示電之傳導容易程度之指標,定義為電阻之倒數。加工液中所含之離子性物質之濃度越高,加工液之導電率越高,越容易通電。又,加工液中所含之離子性物質之濃度越高,具有電荷之微粒子(切割碎屑)越容易於加工液中凝集。即,加工液之導電率越高,混入該加工液之切割碎屑之視粒徑越大,切割碎屑越容易沉澱。又,可認為由於此時切割碎屑係於立體且膨脹之狀態下沉澱,故有難以產生硬質結塊之傾向。進而,藉由使切割碎屑凝聚並沉澱,可加快切割碎屑之沉澱速度,利用離心分離等而使切割碎屑容易自加工液中分離。 The conductivity is an index indicating the ease of conduction of electricity and is defined as the reciprocal of the resistance. The higher the concentration of the ionic substance contained in the working fluid, the higher the conductivity of the working fluid, and the easier it is to conduct electricity. Further, the higher the concentration of the ionic substance contained in the working fluid, the more easily the fine particles (cutting chips) having electric charge are aggregated in the working liquid. That is, the higher the conductivity of the working fluid, the larger the apparent particle size of the cutting debris mixed into the working fluid, and the easier the cutting debris is to precipitate. Further, it is considered that since the cutting chips are precipitated in a three-dimensional and expanded state at this time, it is difficult to cause hard agglomeration. Further, by agglomerating and precipitating the cutting chips, the sedimentation speed of the cutting chips can be increased, and the cutting chips can be easily separated from the machining liquid by centrifugal separation or the like.

然而,於導電率過高之情形時,切割碎屑難以於加工液中分散,故而加工液之黏度容易上升。 However, when the conductivity is too high, the cutting debris is difficult to disperse in the working fluid, so the viscosity of the working fluid is likely to rise.

另一方面,於導電率較低之情形時(純水等為其代表例),具有電荷之微粒子(切割碎屑)因各電荷之斥力而分散,即便切割碎屑混入,加工液之黏度亦難以上升。 On the other hand, in the case where the conductivity is low (pure water or the like is a representative example), the charged microparticles (cutting debris) are dispersed by the repulsive force of each electric charge, and even if the cutting debris is mixed, the viscosity of the working fluid is also Hard to rise.

然而,若加工液之導電率過低而使切割碎屑於加工液中過度分散,則切割碎屑於分散之狀態下均勻沉澱,並牢固且緊密地固化。容易產生如下不良情況:由於如上所述般切割碎 屑沉澱並牢固且緊密地固化而導致設備之配管阻塞;或者由於在主導輥之細線凹槽中產生硬質結塊而導致細線之跳線(細線偏離凹槽)等。又,若切割碎屑於加工液中過度分散,則切割碎屑之沉澱之速度變慢。因此,於以廢液處理或加工液之再利用為目的而將加工液中之切割碎屑去除時,難以藉由離心分離等去除加工液中之切割碎屑。 However, if the conductivity of the working fluid is too low to cause the cutting chips to be excessively dispersed in the working fluid, the cutting chips are uniformly precipitated in a dispersed state and firmly and tightly cured. It is easy to produce the following bad conditions: due to the cutting as described above The chips are precipitated and firmly and tightly cured to cause the piping of the apparatus to be clogged; or the jumper of the fine line (the thin line deviates from the groove) or the like due to the formation of hard agglomerates in the fine line grooves of the main guide rolls. Further, if the cutting chips are excessively dispersed in the working fluid, the rate of precipitation of the cutting chips becomes slow. Therefore, when the cutting debris in the working fluid is removed for the purpose of recycling the waste liquid or the processing liquid, it is difficult to remove the cutting debris in the working fluid by centrifugal separation or the like.

根據本發明之加工液,藉由將25℃下之導電率設為上述範圍,可使切割碎屑於加工液中適度地分散、凝集、沉澱。其結果,可抑制加工液之黏度之上升、或者抑制設備之配管堵塞或硬質結塊之產生等。 According to the working fluid of the present invention, by setting the electrical conductivity at 25 ° C to the above range, the cutting chips can be appropriately dispersed, aggregated, and precipitated in the working fluid. As a result, it is possible to suppress an increase in the viscosity of the working fluid or to suppress clogging of the piping or hard agglomeration of the equipment.

本發明之加工液之導電率可根據溶解於水中且離子化之物質於加工液中之添加量而進行調整。例如,可藉由調整下述(C)成分(羧酸)或(D)成分(溶解於水中而顯示鹼性之化合物)於加工液中之添加量而適當調整加工液之導電率。再者,本發明之加工液亦可以水稀釋而使用,於此情形時,稀釋後之加工液之導電率亦較佳為上述範圍。 The conductivity of the working fluid of the present invention can be adjusted according to the amount of the substance dissolved in water and ionized in the working fluid. For example, the conductivity of the working fluid can be appropriately adjusted by adjusting the amount of the component (C) (carboxylic acid) or (D) (the compound which is dissolved in water to exhibit alkalinity) in the working fluid. Further, the working fluid of the present invention can also be used by dilution with water. In this case, the conductivity of the diluted working fluid is also preferably in the above range.

(黏度) (viscosity)

本發明之加工液之黏度較佳為於25℃下為1 mPa.s以上且25 mPa.S以下,上限更佳為20 mPa.s以下。若加工液之黏度變得過高,則通常加工液中之水分量較少,吸收伴隨於使用固定研磨粒細線之加工而產生之熱的能力(以下,有時記作「冷卻性」)較弱。因此,有產生加工精度降低或對 工具之負荷增加等問題之虞。又,使既定之矽粉分散於本發明之加工液中而成之液體(準使用液)之黏度較佳為於25℃下為1 mPa.s以上且未滿30 mPa.s,更佳為1 mPa.s以上且20 mPa.s以下,進而較佳為1 mPa.s以上且15 mPa.s以下。該準使用液之黏度係於本發明之加工液中添加矽粉(平均粒徑為1.5 μm)10質量%,於攪拌混合後放入不鏽鋼鋼球(直徑為2 mm),以1000 rpm攪拌10小時,將該不鏽鋼鋼球濾除,對所獲得之準使用液進行測定而測得者。若上述加工液本身之黏度較高,則含有矽粉之準使用液之黏度必然變高。再者,加工液及準使用液之黏度可利用布氏黏度計進行測定。 The viscosity of the processing liquid of the present invention is preferably 1 mPa at 25 ° C. Above s and 25 mPa. Below S, the upper limit is preferably 20 mPa. s below. When the viscosity of the working fluid is too high, the amount of water in the working fluid is usually small, and the ability to absorb heat generated by processing using a fixed abrasive fine line (hereinafter, referred to as "cooling property") is relatively small. weak. Therefore, there is a reduction in machining accuracy or Problems such as increased load on tools. Further, the viscosity of the liquid (quasi-use liquid) obtained by dispersing the predetermined niobium powder in the processing liquid of the present invention is preferably 1 mPa at 25 ° C. Above s and less than 30 mPa. s, more preferably 1 mPa. Above s and 20 mPa. s is below, and further preferably 1 mPa. Above s and 15 mPa. s below. The viscosity of the quasi-use liquid is 10% by mass of cerium powder (average particle diameter of 1.5 μm) added to the working fluid of the present invention, and after mixing and mixing, a stainless steel ball (2 mm in diameter) is placed, and the mixture is stirred at 1000 rpm. The stainless steel ball was filtered out and measured for the obtained quasi-use liquid. If the viscosity of the above-mentioned working fluid itself is high, the viscosity of the quasi-use liquid containing niobium powder is inevitably high. Furthermore, the viscosity of the working fluid and the quasi-use fluid can be measured by a Brookfield viscometer.

本發明之加工液之黏度例如可根據下述(A)成分(非離子系界面活性劑)、(B)成分(二醇類)、(C)成分(羧酸)、(D)成分(溶解於水中而顯示鹼性之化合物)、(E)成分(水)之調配量而適當調整。又,亦可根據其他添加劑(例如,黏度調整劑)之調配而進行調整。再者,本發明之加工液亦可以水稀釋而使用,於該情形時,稀釋後之加工液之黏度亦較佳為上述範圍。 The viscosity of the working fluid of the present invention can be, for example, the following components (A) (nonionic surfactant), (B) component (diol), (C) component (carboxylic acid), and (D) component (dissolved). The amount of the compound (E) which is alkaline in water and the component (E) (water) is appropriately adjusted. Further, it can be adjusted according to the blending of other additives (for example, a viscosity adjuster). Further, the working fluid of the present invention can also be used by dilution with water. In this case, the viscosity of the diluted working fluid is also preferably in the above range.

(pH) (pH)

本發明之加工液之pH於25℃下為5以上且10以下。於加工液之pH未滿5之情形時,加工液對金屬之腐蝕性提高,有腐蝕加工液所接觸之設備或安裝於細線切割器上之金屬構件之虞。對金屬之腐蝕性取決於加工液中所含之水之量 等,但藉由將加工液之pH設為於25℃下為5以上而容易抑制上述腐蝕。就上述觀點而言,本發明之加工液之pH更佳為於25℃下為6以上,進而較佳為7以上。相反於加工液之pH超過10之情形時,加工液與混入加工液之切割碎屑(矽)之反應性提高,有加工液與切割碎屑進行反應而產生氫氣之虞,或加工時之加工液之黏度明顯上升之虞。藉由將加工液之pH設為於25℃下為10以下而容易抑制加工時之氫氣之產生、或加工時之加工液之黏度上升。 The pH of the working fluid of the present invention is 5 or more and 10 or less at 25 °C. When the pH of the working fluid is less than 5, the corrosiveness of the working fluid to the metal is improved, and the equipment in contact with the corrosive working fluid or the metal member attached to the thin wire cutter is defective. Corrosion to metals depends on the amount of water contained in the processing fluid However, it is easy to suppress the above corrosion by setting the pH of the working liquid to 5 or more at 25 °C. From the above viewpoints, the pH of the working fluid of the present invention is more preferably 6 or more at 25 ° C, and still more preferably 7 or more. On the contrary, when the pH of the working fluid exceeds 10, the reactivity of the working fluid with the cutting debris (矽) mixed into the working fluid is improved, and the processing liquid and the cutting debris react to generate hydrogen gas, or processing during processing. The viscosity of the liquid rises markedly. By setting the pH of the working liquid to 10 or less at 25 ° C, it is easy to suppress the generation of hydrogen during processing or the increase in viscosity of the working liquid during processing.

本發明之加工液之pH例如可根據下述(B)成分(二醇類)、或(C)成分(羧酸)及(D)成分(溶解於水中而顯示鹼性之化合物)之含量而適當調整。又,亦可根據其他添加劑(例如,pH調整劑)而調整。再者,本發明之加工液亦可以水稀釋而使用,於該情形時,稀釋後之加工液之pH亦較佳為上述範圍。 The pH of the working fluid of the present invention can be, for example, the content of the following component (B) (diol), or (C) component (carboxylic acid) and (D) component (a compound which is dissolved in water to exhibit basicity). Appropriate adjustments. Further, it may be adjusted according to other additives (for example, a pH adjuster). Further, the working fluid of the present invention can also be used by dilution with water. In this case, the pH of the diluted working fluid is also preferably in the above range.

(表面張力) (Surface Tension)

本發明者等人發現:習知之加工液對所使用之細線之潤濕性或對被加工物之間隙之滲透性不充分,應到達加工部(被加工物中之與細線接觸之部分)之加工液不足,有時會導致加工性能之降低。於加工液之表面張力過高之情形時,加工液之潤濕性或滲透性變差,有加工液無法到達加工部之虞。於極端之例中,加工部於乾燥之狀態下進行切割加工。因此,有加工部之發熱變得明顯且對工具施加過度之負荷而使細線斷線,或加工精度降低而使被加工物之表面粗糙度變差 之虞。就上述觀點而言,本發明之加工液之表面張力較佳為於25℃下為50 mN/m以下,更佳為45 mN/m以下,進而較佳為40 mN/m以下。藉由將加工液之表面張力設為上述範圍,可提高對被加工物(矽等)或細線(鎳或樹脂等)之潤濕性、或對加工部之滲透性。 The present inventors have found that the conventional working fluid has insufficient wettability to the fine thread used or the gap to the workpiece, and should reach the processing portion (the portion in the workpiece that is in contact with the fine line). Insufficient processing fluid sometimes leads to a decrease in processability. When the surface tension of the working fluid is too high, the wettability or permeability of the working fluid is deteriorated, and the working fluid cannot reach the processing portion. In an extreme case, the processing section performs a cutting process in a dry state. Therefore, the heat generated in the processed portion becomes conspicuous and an excessive load is applied to the tool to break the thin wire, or the machining accuracy is lowered to deteriorate the surface roughness of the workpiece. After that. From the above viewpoints, the surface tension of the working fluid of the present invention is preferably 50 mN/m or less, more preferably 45 mN/m or less, and still more preferably 40 mN/m or less at 25 °C. By setting the surface tension of the working fluid to the above range, the wettability to the workpiece (such as ruthenium) or the fine thread (nickel or resin) or the permeability to the processed portion can be improved.

另一方面,於表面張力較低之情形時,加工液之起泡變強。因此,存在於切割加工時氣泡被咬入加工液中而使冷卻性變弱之問題。又,由於自加工液中產生氣泡,故而亦有該氣泡自為積存加工液而設置之槽中溢出等問題。就上述觀點而言,本發明之加工液之表面張力較佳為於25℃下為20 mN/m以上,更佳為30 mN/m以上。 On the other hand, when the surface tension is low, the foaming of the working fluid becomes strong. Therefore, there is a problem in that the bubble is bitten into the machining liquid at the time of cutting processing, and the cooling property is weakened. Further, since air bubbles are generated from the machining liquid, there is a problem that the air bubbles overflow from the grooves provided for storing the machining liquid. From the above viewpoints, the surface tension of the working fluid of the present invention is preferably 20 mN/m or more, more preferably 30 mN/m or more at 25 °C.

本發明之加工液之表面張力例如可藉由調整下述(A)成分或消泡劑之調配量而適當調整。再者,本發明之加工液亦可以水稀釋而使用,於該情形時,稀釋後之加工液之表面張力亦較佳為上述範圍。 The surface tension of the working fluid of the present invention can be appropriately adjusted, for example, by adjusting the amount of the following component (A) or the amount of the antifoaming agent. Further, the working fluid of the present invention can also be used by dilution with water. In this case, the surface tension of the diluted working fluid is also preferably in the above range.

<本發明之加工液所含有之成分> <Components Contained in the Processing Fluid of the Present Invention>

於本發明之加工液中例如可含有以下所說明之成分。 The processing liquid of the present invention may contain, for example, the components described below.

((A)成分) ((A) component)

於本發明之加工液中,作為(A)成分,可含有自醇、環氧乙烷與環氧丙烷之共聚合體,及聚氧伸烷基二醇類中選擇之至少一種以上之非離子系界面活性劑。藉由使加工液中含有(A)成分,可降低該加工液之表面張力而提昇加工液之潤濕 性或滲透性。 In the working fluid of the present invention, as the component (A), at least one selected from the group consisting of a copolymer of alcohol, ethylene oxide and propylene oxide, and a polyoxyalkylene alkyl glycol may be contained. Surfactant. By containing the component (A) in the working fluid, the surface tension of the working fluid can be lowered to enhance the wetting of the working fluid. Sex or permeability.

可用作上述醇者並無特別限制,例如可使用碳數為8以上且12以下之醇。 The alcohol to be used as the above alcohol is not particularly limited, and for example, an alcohol having 8 or more and 12 or less carbon atoms can be used.

作為上述聚氧伸烷基二醇類之具體例,可列舉:聚乙二醇、聚丙二醇、聚氧乙烯與聚氧丙烯之共聚合體等。本發明中所使用之聚氧伸烷基二醇類之質量平均分子量(使用凝膠滲透之標準聚苯乙烯換算)較佳為10000以下,更佳為5000以下,進而較佳為3500以下。 Specific examples of the polyoxyalkylene glycols include polyethylene glycol, polypropylene glycol, a copolymer of polyoxyethylene and polyoxypropylene, and the like. The mass average molecular weight (in terms of standard polystyrene using gel permeation) of the polyoxyalkylene glycol used in the present invention is preferably 10,000 or less, more preferably 5,000 or less, still more preferably 3,500 or less.

本發明之加工液可根據切割加工之作業環境,適當地以水稀釋而製作。即,可製作包含本發明之加工液所含之成分中除水以外之成分的濃縮組合物,於作業現場等以水稀釋該濃縮組合物而製作本發明之加工液。又,亦可製作高濃度之本發明之加工液(使水略少而製作本發明之加工液),根據切割加工之作業環境而直接使用,或進一步以水稀釋而使用。於將本發明之加工液實際用於切割加工時,以本發明之加工液整體之質量為基準(100質量%),(A)成分之含量之下限較佳為0.1質量%以上,更佳為0.2質量%以上,進而較佳為0.5質量%以上,且上限較佳為0.8質量%以下,更佳為0.7質量%以下,進而較佳為0.6質量%以下。其中,於以如上所述之方式製作高濃度之本發明的加工液之情形時,以本發明之加工液整體之質量為基準(100質量%),(A)成分之含量之上限較佳為8質量%以下,更佳為7質量%以下,進而較佳 為6質量%以下。 The working fluid of the present invention can be produced by appropriately diluting with water according to the working environment of the cutting process. In other words, a concentrated composition containing components other than water in the components contained in the working fluid of the present invention can be produced, and the concentrated composition can be diluted with water at a work site or the like to prepare a working fluid of the present invention. Further, it is also possible to produce a high-concentration working fluid of the present invention (the processing liquid of the present invention is prepared with a small amount of water), and it can be used as it is according to the working environment of the cutting process, or can be further diluted with water. When the working fluid of the present invention is actually used for cutting, the lower limit of the content of the component (A) is preferably 0.1% by mass or more based on the mass of the entire working fluid of the present invention (100% by mass), more preferably 0.2% by mass or more, more preferably 0.5% by mass or more, and the upper limit is preferably 0.8% by mass or less, more preferably 0.7% by mass or less, still more preferably 0.6% by mass or less. In the case where the high-concentration working fluid of the present invention is produced as described above, the upper limit of the content of the component (A) is preferably based on the mass of the entire working fluid of the present invention (100% by mass). 8 mass% or less, more preferably 7 mass% or less, and further preferably It is 6 mass% or less.

((B)成分) ((B) component)

又,本發明之加工液可含有二醇類作為(B)成分。藉由使本發明之加工液中含有既定量之(B)成分,可使除(B)成分以外之成分穩定地溶解於本發明之加工液中,或可抑制本發明之加工液之乾燥。 Further, the working fluid of the present invention may contain a glycol as the component (B). By containing the component (B) in a predetermined amount in the working fluid of the present invention, components other than the component (B) can be stably dissolved in the working fluid of the present invention, or drying of the working fluid of the present invention can be suppressed.

作為用作(B)成分之二醇類之具體例,可列舉:乙二醇、丙二醇、1,4-丁二醇、己二醇、新戊二醇、二乙二醇、三乙二醇、二丙二醇、三丙二醇、聚乙二醇、聚丙二醇、乙二醇與丙二醇之共聚合體、及環氧乙烷與環氧丙烷之共聚合體等二醇,三乙二醇單丁醚、三乙二醇單甲醚、二乙二醇單丁醚及三丙二醇單甲醚等二醇單烷基醚,環氧乙烷與環氧丙烷之共聚合體之單烷基醚等水溶性二醇類。於上述例示之二醇類中,較佳為使用丙二醇、二丙二醇、二乙二醇、三乙二醇、聚乙二醇或聚丙二醇,特佳為使用二丙二醇、或二乙二醇。該等可單獨使用1種或組合2種以上使用。又,亦可使用包含上述2種以上之成分之共聚合體。上述二醇類之質量平均分子量(使用凝膠滲透之標準聚苯乙烯換算)較佳為100以上且700以下,更佳為100以上且200以下。 Specific examples of the diol used as the component (B) include ethylene glycol, propylene glycol, 1,4-butanediol, hexanediol, neopentyl glycol, diethylene glycol, and triethylene glycol. , dipropylene glycol, tripropylene glycol, polyethylene glycol, polypropylene glycol, a copolymer of ethylene glycol and propylene glycol, and a copolymer of ethylene oxide and propylene oxide, triethylene glycol monobutyl ether, triethyl A glycol monoalkyl ether such as diol monomethyl ether, diethylene glycol monobutyl ether or tripropylene glycol monomethyl ether; or a water-soluble glycol such as a monoalkyl ether of a copolymer of ethylene oxide and propylene oxide. Among the above-exemplified diols, propylene glycol, dipropylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol or polypropylene glycol is preferably used, and particularly preferably dipropylene glycol or diethylene glycol. These may be used alone or in combination of two or more. Further, a copolymer comprising two or more of the above components may also be used. The mass average molecular weight (in terms of standard polystyrene using gel permeation) of the above diols is preferably 100 or more and 700 or less, more preferably 100 or more and 200 or less.

於將本發明之加工液實際用於切割加工時,以本發明之加工液整體之質量為基準(100質量%),(B)成分之含量之下限較佳為0.1質量%以上,更佳為0.5質量%以上,進而較佳 為2質量%以上,且上限較佳為8質量%以下,更佳為7質量%以下。再者,於以如上所述之方式製作高濃度之本發明的加工液之情形時,以本發明之加工液整體之質量為基準(100%質量),(B)成分之含量之上限較佳為80質量%以下,更佳為70質量%以下。藉由將(B)成分之含量設為上述範圍,可使除(B)成分以外之成分穩定地溶解於本發明之加工液中,或可抑制本發明之加工液之乾燥。 When the working fluid of the present invention is actually used for the cutting process, the lower limit of the content of the component (B) is preferably 0.1% by mass or more based on the mass of the entire working fluid of the present invention (100% by mass), more preferably 0.5% by mass or more, and further preferably The content is 2% by mass or more, and the upper limit is preferably 8% by mass or less, and more preferably 7% by mass or less. Further, in the case where a high concentration of the working fluid of the present invention is produced as described above, the upper limit of the content of the component (B) is preferably based on the mass of the entire processing liquid of the present invention (100% by mass). It is 80% by mass or less, more preferably 70% by mass or less. By setting the content of the component (B) to the above range, components other than the component (B) can be stably dissolved in the working fluid of the present invention, or drying of the working fluid of the present invention can be suppressed.

((C)成分) ((C) component)

又,本發明之加工液可含有羧酸作為(C)成分。藉由使本發明之加工液中含有既定量之(C)成分,可利用與下述(D)成分之組合而發揮如下效果:可調整本發明之加工液之pH或導電率,可緩衝切割加工時之本發明之加工液的pH之變動,可緩和本發明之加工液對金屬之腐蝕,可使其他成分穩定地溶解於本發明之加工液中等。 Further, the working fluid of the present invention may contain a carboxylic acid as the component (C). By including the component (C) in a predetermined amount in the working fluid of the present invention, the combination of the following component (D) can be utilized to adjust the pH or conductivity of the working fluid of the present invention to cushion the cutting. The fluctuation of the pH of the working fluid of the present invention at the time of processing can alleviate the corrosion of the metal of the working fluid of the present invention, and can stably dissolve other components in the working fluid of the present invention.

作為用作(C)成分之羧酸之具體例,可列舉:檸檬酸、琥珀酸、乳酸、蘋果酸、己二酸、草酸、十二烷二酸、乙酸等。其中,較佳為使用檸檬酸、琥珀酸,更佳為使用檸檬酸。該等可單獨使用1種或組合2種以上使用。 Specific examples of the carboxylic acid used as the component (C) include citric acid, succinic acid, lactic acid, malic acid, adipic acid, oxalic acid, dodecanedioic acid, and acetic acid. Among them, citric acid and succinic acid are preferably used, and citric acid is more preferably used. These may be used alone or in combination of two or more.

於將本發明之加工液實際用於切割加工時,以本發明之加工液整體之質量為基準(100質量%),(C)成分之含量之下限較佳為0.01質量%以上,更佳為0.1質量%以上。上限較佳為0.5質量%以下,更佳為0.3質量%以下,進而較佳為0.2 質量%以下。再者,於以如上所述之方式製作高濃度之本發明的加工液之情形時,以本發明之加工液整體之質量為基準(100質量%),(C)成分之含量之上限較佳為5質量%以下,更佳為3質量%以下,進而較佳為2質量%以下。藉由將(C)成分之含量設為上述範圍,可發揮因含有上述(C)成分而產生之效果。若(C)成分之含量過少,則有無法充分獲得該效果之虞,若(C)成分之含量過多,則用於中和(C)成分之(D)成分之使用量增加,導致意料之外的導電率之上升,且容易腐蝕金屬。 When the working fluid of the present invention is actually used for the cutting process, the lower limit of the content of the component (C) is preferably 0.01% by mass or more based on the mass of the entire working fluid of the present invention (100% by mass), more preferably 0.1% by mass or more. The upper limit is preferably 0.5% by mass or less, more preferably 0.3% by mass or less, still more preferably 0.2% by mass. Below mass%. Further, in the case where the high-concentration working fluid of the present invention is produced as described above, the upper limit of the content of the component (C) is preferably based on the mass of the entire processing liquid of the present invention (100% by mass). It is 5% by mass or less, more preferably 3% by mass or less, and still more preferably 2% by mass or less. By setting the content of the component (C) to the above range, the effect of containing the component (C) can be exhibited. If the content of the component (C) is too small, the effect may not be sufficiently obtained. If the content of the component (C) is too large, the amount of the component (D) used for neutralizing the component (C) increases, which leads to an unexpected result. The external conductivity increases and the metal is easily corroded.

(D)溶解於水中而顯示鹼性之化合物 (D) a compound which is dissolved in water and exhibits basicity

又,本發明之加工液含有溶解於水中而顯示鹼性之化合物(以下,有時記作「鹼性化合物」)作為(D)成分。藉由使本發明之加工液中含有既定量之(D)成分,可利用與上述(C)成分組合而發揮如下效果:可調整本發明之加工液之pH或導電率,可於切割加工時緩衝本發明之加工液之pH之變動,可緩和本發明之加工液對金屬之腐蝕,可使其他成分穩定地溶解於本發明之加工液中等。 Further, the working fluid of the present invention contains a compound which is dissolved in water and exhibits alkalinity (hereinafter, referred to as "basic compound") as the component (D). By including the component (D) in a predetermined amount in the working fluid of the present invention, the combination of the component (C) and the component (C) can be used to adjust the pH or conductivity of the working fluid of the present invention, which can be used during cutting. By buffering the fluctuation of the pH of the working fluid of the present invention, the corrosion of the metal of the working fluid of the present invention can be alleviated, and other components can be stably dissolved in the working fluid of the present invention.

作為用作(D)成分之鹼性化合物之具體例,可列舉:氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等含有鹼金屬元素之化合物,或三乙醇胺、三異丙醇胺、乙二胺、N-(2-胺基乙基)-2-胺乙醇、N-(β-胺基乙基)乙醇胺等胺。該等可單獨使用1種或組合2種以上使用。 Specific examples of the basic compound used as the component (D) include a compound containing an alkali metal element such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate or potassium hydrogencarbonate, or triethanolamine. An amine such as triisopropanolamine, ethylenediamine, N-(2-aminoethyl)-2-amineethanol or N-(β-aminoethyl)ethanolamine. These may be used alone or in combination of two or more.

於將本發明之加工液實際用於切割加工時,以本發明之加工液整體之質量為基準(100質量%),(D)成分之含量之下限較佳為0.01質量%以上,更佳為0.1質量%以上,且上限較佳為0.7質量%以下,更佳為0.6質量%以下,進而較佳為0.5質量%以下。再者,於以如上所述之方式製作高濃度之本發明的加工液之情形時,以本發明之加工液整體之質量為基準(100質量%)(D)成分之含量之上限較佳為7質量%以下,更佳為6質量%以下,進而較佳為5質量%以下。藉由將(D)成分之含量設為上述範圍,可發揮因含有上述(D)成分而產生之效果。又,若(D)成分之含量過多,則中和所必需之(C)成分之量增加,導致本發明之意料之外的導電率之上升,且使切割碎屑之分散惡化。 When the working fluid of the present invention is actually used for cutting, the lower limit of the content of the component (D) is preferably 0.01% by mass or more based on the mass of the entire working fluid of the present invention (100% by mass), more preferably 0.1% by mass or more, and the upper limit is preferably 0.7% by mass or less, more preferably 0.6% by mass or less, still more preferably 0.5% by mass or less. Further, in the case where the high-concentration working fluid of the present invention is produced as described above, the upper limit of the content of the component (D) based on the mass of the entire working fluid of the present invention is preferably 7 mass% or less, more preferably 6% by mass or less, further preferably 5% by mass or less. By setting the content of the component (D) to the above range, the effect of containing the component (D) can be exhibited. Further, when the content of the component (D) is too large, the amount of the component (C) necessary for neutralization increases, which leads to an unexpected increase in the electrical conductivity of the present invention and deteriorates the dispersion of the cutting chips.

又,本發明之加工液亦可含有由(C)成分及(D)成分所形成之鹽代替上述(C)成分及(D)成分。該鹽之含量較佳為以(C)成分及(D)成分換算,以成為上述之含量之方式而含有。作為該鹽之具體例,可列舉羧酸之鹼金屬鹽或羧酸之胺鹽等。 Further, the working fluid of the present invention may contain a salt formed of the component (C) and the component (D) in place of the component (C) and the component (D). The content of the salt is preferably such that it is converted to the above content in terms of the components (C) and (D). Specific examples of the salt include an alkali metal salt of a carboxylic acid or an amine salt of a carboxylic acid.

((E)成分) ((E) component)

又,本發明之加工液含有水作為(E)成分。作為該水,為蒸餾水、自來水等,其種類無特別限定。但是,於使用導電率較高之水例如高硬度之水之情形時,較佳為調整含有之離子之量而使用。例如,自來水因地區、國家不同而含有之離子濃度(硬度)不同。 Further, the working fluid of the present invention contains water as the component (E). The water is distilled water, tap water, or the like, and the kind thereof is not particularly limited. However, in the case of using water having a high conductivity such as water of high hardness, it is preferred to use an amount of ions to be adjusted. For example, tap water has different ion concentrations (hardness) depending on regions and countries.

與習知之游離研磨粒方式相比較,使用固定研磨粒化之細線之切割加工係伴隨於切割加工而產生之發熱量較多。因此,對細線或被加工物之負荷變大。又,可知被加工物隨著發熱而膨脹,藉此會對加工精度造成不良影響。進而,可知於細線上固定化之鑽石研磨粒容易磨耗,對工具壽命亦造成不良影響。因此,對於加工中之加工液要求冷卻性。為提昇冷卻性,必需增加加工液中之水分量。然而,於以矽作為被加工物之情形時,有時加工液中之水與切割碎屑進行反應而生成氫氣。因此,於習知之水性加工液中,難以增加水分量,故而關於冷卻性之問題尚未根本性解決。若混入加工液之切割碎屑與加工液中之水進行反應而生成氫氣,則有時導致如下不良情況:由於在利用泵供給加工液時咬入氣泡,故加工液之供給流量變得不穩定;或由於氣泡之咬入使液比重降低,故於以液比重控制加工液之細線切割器中檢測出異常而使加工停止。又,亦存在所產生之氫氣因靜電等而爆炸之危險性。 Compared with the conventional free abrasive method, the cutting process using the fixed abrasive granulated fine wire has a large amount of heat generated accompanying the cutting process. Therefore, the load on the thin wire or the workpiece is increased. Further, it can be seen that the workpiece is swollen with heat, which adversely affects the processing accuracy. Further, it is understood that the diamond abrasive grains fixed on the thin wires are easily worn and adversely affect the life of the tool. Therefore, cooling is required for the processing fluid in the process. In order to improve the cooling performance, it is necessary to increase the amount of water in the working fluid. However, when ruthenium is used as a workpiece, water in the working fluid may react with the cutting debris to generate hydrogen gas. Therefore, in the conventional aqueous working fluid, it is difficult to increase the amount of water, and thus the problem regarding the cooling property has not been fundamentally solved. When the cutting debris mixed in the working fluid reacts with the water in the working fluid to generate hydrogen gas, the following problems may occur: the flow rate of the machining fluid becomes unstable because the air bubbles are trapped when the machining fluid is supplied by the pump. Or the liquid specific gravity is lowered by the bite of the air bubbles, so that the abnormality is detected in the thin wire cutter that controls the working fluid by the liquid specific gravity, and the processing is stopped. Moreover, there is also a risk that the generated hydrogen gas will explode due to static electricity or the like.

根據本發明之加工液,藉由調配上述各成分且將pH設為上述既定之值,可抑制加工液與切割碎屑之反應,故可增加水分量而提昇冷卻性。即,根據本發明之加工液,可同時實現氫氣產生之抑制與冷卻性之提昇。 According to the working fluid of the present invention, by blending the above components and setting the pH to the predetermined value, the reaction between the working fluid and the cutting debris can be suppressed, so that the moisture content can be increased and the cooling property can be improved. That is, according to the working fluid of the present invention, the suppression of hydrogen generation and the improvement of the cooling property can be simultaneously achieved.

又,於增加加工液中之水分量之情形時,有容易腐蝕加工液所接觸之設備或細線之金屬構件之虞。然而,根據本發明 之加工液,藉由以既定量含有(B)成分或(C)成分、或使pH為上述既定之範圍內之值,可抑制腐蝕,可增加水分量而提昇冷卻性。即,根據本發明之加工液,可同時實現腐蝕之抑制與冷卻性之提昇。 Further, in the case where the amount of water in the working fluid is increased, there is a possibility that the equipment to be contacted by the working fluid or the metal member of the thin wire is corroded. However, according to the invention The processing liquid can suppress corrosion by increasing the value of the component (B) or the component (C) or the pH within the predetermined range as described above, thereby increasing the moisture content and improving the cooling property. That is, according to the working fluid of the present invention, the suppression of corrosion and the improvement of the cooling property can be simultaneously achieved.

以本發明之加工液整體之質量為基準(100質量%),水之含量之下限較佳為10質量%以上,更佳為25質量%以上,進而較佳為50質量%以上。藉由將水之含量設為10質量%以上,容易確保加工液之冷卻性,容易謀求加工精度之降低之防止或對工具之負荷之減輕。另一方面,上限較佳為99.7質量%以下。於水分量為100%(純水)時,就潤濕性或滲透性之觀點而言不適合作為加工液,可認為即便以微量含有本發明中所規定之其他成分,亦有效果。又,加工液中所含之水分越多,加工液之冷卻性越好。 The lower limit of the water content is preferably 10% by mass or more, more preferably 25% by mass or more, and still more preferably 50% by mass or more based on the mass of the entire working fluid of the present invention (100% by mass). By setting the water content to 10% by mass or more, it is easy to ensure the cooling property of the working fluid, and it is easy to prevent the reduction in the processing accuracy or the load on the tool. On the other hand, the upper limit is preferably 99.7% by mass or less. When the water content is 100% (pure water), it is not suitable as a working fluid from the viewpoint of wettability or permeability, and it is considered to be effective even if a small amount of other components specified in the present invention are contained. Further, the more water contained in the working fluid, the better the cooling property of the working fluid.

(水溶性高分子) (water soluble polymer)

本發明之加工液可含有水溶性高分子。藉由如上所述將導電率設為既定之值,本發明之加工液可控制加工液中之切割碎屑之分散性。藉由使本發明之加工液中含有水溶性高分子,更容易控制混入加工液之切割碎屑之分散性。 The working fluid of the present invention may contain a water-soluble polymer. By setting the conductivity to a predetermined value as described above, the working fluid of the present invention can control the dispersibility of the cutting debris in the working fluid. By including the water-soluble polymer in the working fluid of the present invention, it is easier to control the dispersibility of the cutting chips mixed into the working fluid.

作為可用於本發明中之水溶性高分子,可無特別限定地使用習知之加工液中所使用者。例如,可使用聚乙烯吡咯啶酮、或含有源自乙烯吡咯啶酮之結構單位之共聚合體等。水溶性高分子之含量可於如下範圍內適當選擇:可發揮因含有 水溶性高分子而產生之上述效果且不妨礙其他成分所產生之效果,或不對加工液造成不良影響之範圍。 As the water-soluble polymer which can be used in the present invention, a user skilled in the working fluid can be used without particular limitation. For example, polyvinylpyrrolidone or a copolymer containing a structural unit derived from vinylpyrrolidone or the like can be used. The content of the water-soluble polymer can be appropriately selected within the following range: The above-described effects produced by the water-soluble polymer do not interfere with the effects produced by other components or the extent that the processing fluid is not adversely affected.

(消泡劑) (antifoaming agent)

本發明之加工液可含有消泡劑。藉由使本發明之加工液中含有消泡劑,可減少加工液中所產生之氣泡。 The working fluid of the present invention may contain an antifoaming agent. By including the antifoaming agent in the working fluid of the present invention, bubbles generated in the working fluid can be reduced.

作為消泡劑,可無特別限定地使用公知者。其中,較佳為可於加工液中穩定地分散者。 As the antifoaming agent, a known one can be used without particular limitation. Among them, those which are stably dispersed in the working fluid are preferred.

於將本發明之加工液實際用於切割加工時,以本發明之加工液整體之質量為基準(100質量%),消泡劑之含量之下限較佳為0.01質量%以上,更佳為0.02質量%以上,進而較佳為0.03質量%以上,且上限較佳為0.06質量%以下,更佳為0.05質量%以下,進而較佳為0.04質量%以下。再者,於以如上所述之方式製作高濃度之本發明的加工液之情形時,以本發明之加工液整體之質量為基準(100質量%),消泡劑之含量之上限較佳為0.6質量%以下,更佳為0.5質量%以下,進而較佳為0.4質量%以下。藉由將消泡劑之含量設為上述範圍,可發揮因含有上述消泡劑而產生之效果。又,若消泡劑之含量過多,則有加工液分離等而使加工液之穩定性降低之虞。 When the working fluid of the present invention is actually used for cutting, the lower limit of the content of the antifoaming agent is preferably 0.01% by mass or more, more preferably 0.02, based on the mass of the entire working fluid of the present invention (100% by mass). The mass% or more is more preferably 0.03 mass% or more, and the upper limit is preferably 0.06 mass% or less, more preferably 0.05 mass% or less, still more preferably 0.04 mass% or less. Further, in the case where a high concentration of the working fluid of the present invention is produced as described above, the upper limit of the content of the antifoaming agent is preferably based on the mass of the entire working fluid of the present invention (100% by mass). 0.6% by mass or less, more preferably 0.5% by mass or less, further preferably 0.4% by mass or less. When the content of the antifoaming agent is in the above range, the effect of containing the antifoaming agent can be exhibited. Further, when the content of the antifoaming agent is too large, the stability of the working fluid is lowered by separation of the working fluid or the like.

(其他成分) (other ingredients)

本發明之加工液亦可含有除上述成分以外之成分。可於不影響加工性能之範圍內,添加不對被加工物造成腐蝕、變色 等不良影響,且不影響混合後之系統之穩定性之各種添加劑。作為如上所述之添加劑,例如可列舉:黏度調整劑、pH調整劑、抗氧化劑等。作為黏度調整劑、pH調整劑及抗氧化劑,可無特別限定地使用公知者。其中,較佳為可溶於水者。 The working fluid of the present invention may also contain components other than the above components. It can add corrosion and discoloration to the workpiece without affecting the processing performance. Various additives that have adverse effects and do not affect the stability of the system after mixing. Examples of the additive as described above include a viscosity modifier, a pH adjuster, and an antioxidant. A viscosity adjuster, a pH adjuster, and an antioxidant can be used without any particular limitation. Among them, those which are soluble in water are preferred.

[實施例] [Examples] <加工液之製作> <Production of processing fluid>

以成為表1及表2所示之組成之方式製作本發明之固定研磨粒細線切割器用水溶性加工液(實施例1~4)及除本發明以外之固定研磨粒細線切割器用水溶性加工液(比較例1~13)。表1及表2所示之各成分之調配量係以質量%表示。再者,比較例9係含有Yushiro化學工業製造之合成(Synthetic)油劑10質量%及水90質量%之加工液。又,表1及表2中之「C10醇:EOPO」意指碳數為10之醇與環氧乙烷及環氧丙烷之共聚合體。 The water-soluble working fluid for fixed abrasive fine wire cutter of the present invention (Examples 1 to 4) and the water-soluble working fluid for fixed abrasive fine wire cutter other than the present invention were produced in the form shown in Tables 1 and 2. (Comparative Examples 1 to 13). The blending amounts of the respective components shown in Tables 1 and 2 are expressed by mass%. Further, Comparative Example 9 contained a working liquid containing 10% by mass of a synthetic (Synthetic) oil agent and 90% by mass of water manufactured by Yushiro Chemical Industries. Further, "C10 alcohol: EOPO" in Tables 1 and 2 means a copolymer of an alcohol having 10 carbon atoms and ethylene oxide and propylene oxide.

<評價> <evaluation>

對於所製作之加工液,針對表1及表2所示之項目進行評價。「外觀」表示以目視觀察加工液之外觀之結果。「pH」表示測定加工液於25℃下之pH之結果。「濁點」表示測定加工液之濁點之結果。「加工液黏度」表示利用布氏黏度計測定之加工液於25℃下之黏度。「表面張力」表示使用合社股份有限公司製造之數位張力計RTM-101型,利用白金環法(Du Nouy ring method)測定加工液於25℃下之靜態表面 張力之結果。「導電率」表示使用堀場製作所股份有限公司製造之導電率計ES-51測定加工液於25℃下之導電率的結果。「準使用液黏度」表示以下述順序進行之測定之結果。首先,於各加工液中添加矽粉(平均粒徑為1.5 μm)10質量%,於攪拌混合後,放入不鏽鋼鋼球(直徑為2 mm),並以1000 rpm攪拌10小時,製作準使用液。繼而,利用金屬絲網(50網眼)將不鏽鋼鋼球自該準使用液中濾除後,利用布氏黏度計測定準使用液於25℃下之黏度。「氫氣產生量」表示測定將上述準使用液10 ml加熱至50℃而於30分鐘內產生之氫氣量之結果。「硬質結塊」係於將準使用液於玻璃容器內靜置1週,並去除上清液後,以藥匙確認殘留於玻璃容器底部的沉澱層之牢固度。將沉澱層牢固、藥匙未達到玻璃容器之底面之情形設為「×」,將達到底面之情形設為「○」。「沉澱性」係於玻璃容器內靜置1週,根據上清液之顏色而以目視進行判斷。將上清液因矽粉而懸濁之情形設為「×」,將清澈之情形時設為「○」。「腐蝕性」係以如下方式進行評價:將鑄鐵切割碎屑放入玻璃製之培養皿中,並注入加工液直至切割碎屑完全浸沒;其後,蓋上蓋子靜置10分鐘後,於蓋有蓋子之狀態下將培養皿傾斜而使加工液流出;接著,將培養皿放置於水平台之上,於該狀態下靜置24小時,觀察評價鏽之生成之有無。於腐蝕性之評價之表示中,「○」表示鏽之生成未滿鑄鐵切割碎屑之10%。 The materials shown in Tables 1 and 2 were evaluated for the produced working fluids. "Appearance" means the result of visually observing the appearance of the working fluid. "pH" means the result of measuring the pH of the working fluid at 25 °C. "Cloud point" means the result of measuring the cloud point of the working fluid. "Processing Fluid Viscosity" means the viscosity of the working fluid measured at 25 ° C using a Brookfield viscometer. "Surface tension" means the use of the digital tension meter RTM-101 manufactured by Heshe Co., Ltd., and the static surface of the processing liquid at 25 ° C is measured by the Du Nouy ring method. The result of tension. "Electrical conductivity" is a result of measuring the electrical conductivity of the working fluid at 25 ° C using a conductivity meter ES-51 manufactured by Horiba, Ltd. "Quasi-use liquid viscosity" means the result of measurement performed in the following order. First, 10% by mass of cerium powder (having an average particle diameter of 1.5 μm) was added to each working solution, and after stirring and mixing, stainless steel balls (diameter: 2 mm) were placed, and stirred at 1000 rpm for 10 hours to prepare a quasi-use. liquid. Then, the stainless steel ball was filtered from the quasi-use liquid by a wire mesh (50 mesh), and the viscosity of the quasi-use liquid at 25 ° C was measured by a Brookfield viscometer. The "hydrogen generation amount" is a result of measuring the amount of hydrogen generated by heating 10 ml of the above-mentioned quasi-use liquid to 50 ° C in 30 minutes. The "hard agglomerate" was obtained by allowing the quasi-use liquid to stand in a glass container for one week, and removing the supernatant, and confirming the firmness of the precipitate layer remaining on the bottom of the glass container with a medicine spoon. The case where the sedimentation layer is firm, the spoon does not reach the bottom surface of the glass container is "x", and the case where the bottom surface is reached is "○". The "precipitation property" was allowed to stand in a glass container for one week, and it was judged visually based on the color of the supernatant liquid. The case where the supernatant was suspended by the powder was set to "X", and when it was clear, it was set to "○". "Corrosion" was evaluated by placing the cast iron cutting chips in a glass petri dish and injecting the working fluid until the cutting chips were completely submerged; thereafter, the lid was placed on the lid for 10 minutes and then placed on the lid. The culture dish was tilted to allow the processing liquid to flow out with a lid; then, the culture dish was placed on a water platform, and allowed to stand in this state for 24 hours, and the presence or absence of rust formation was observed. In the evaluation of the evaluation of corrosivity, "○" indicates that the generation of rust is less than 10% of the cast iron cutting debris.

如表1所示般,實施例1~4係於硬質結塊、沉澱性、及腐蝕性之各評價中獲得良好之結果。又,實施例1~4係氫氣生成量較少,且準加工液之黏度較低。另一方面,如表1及表2中所示般,比較例1~13係於硬質結塊、沉澱性、及腐蝕性任一項之評價中結果較差,或準加工液之黏度變高,或氫氣之生成量變多。 As shown in Table 1, Examples 1 to 4 obtained good results in each of the evaluations of hard agglomeration, precipitability, and corrosivity. Further, in Examples 1 to 4, the amount of hydrogen generated was small, and the viscosity of the quasi-working liquid was low. On the other hand, as shown in Tables 1 and 2, Comparative Examples 1 to 13 were inferior in the evaluation of any of hard agglomerates, sedimentation, and corrosivity, or the viscosity of the quasi-working fluid became high. Or the amount of hydrogen generated is increased.

以上,針對可認為是目前最具實踐性且較佳之實施形態,對本發明進行了說明,但本發明並不限定於本申請案說明書中所揭示之實施形態,於不違背可自申請專利範圍及說明書整體中領會之發明的主旨或思想之範圍內,可進行適當變更,又,伴隨上述變更之固定研磨粒細線切割器用水溶性加工液亦應理解為包含於本發明之技術性範圍內者。 The present invention has been described above with respect to the embodiments which are considered to be the most practical and preferred embodiments, but the present invention is not limited to the embodiments disclosed in the specification of the present application, and does not violate the scope of the patent application and It is to be understood that the water-soluble working fluid for a fixed abrasive fine wire cutter according to the above-described changes is also included in the technical scope of the present invention within the scope of the gist of the invention.

(產業上之可利用性) (industrial availability)

本發明之固定研磨粒細線切割器用水溶性加工液可於利用固定研磨粒細線切割器切割矽晶圓時使用。 The water-soluble working fluid for a fixed abrasive fine wire cutter of the present invention can be used when cutting a tantalum wafer with a fixed abrasive fine wire cutter.

Claims (9)

一種固定研磨粒細線切割器用水溶性加工液,其含有(C)羧酸、(D)溶解於水中而顯示鹼性之化合物、及(E)水,且於25℃下之導電率為300μS/cm以上且3000μS/cm以下,於25℃下之pH為5以上且10以下,添加平均粒徑為1.5μm之矽粉10質量%並攪拌而形成之準使用液之黏度於25℃下未滿30mPa.s,於25℃下之表面張力為20mN/m以上且50mN/m以下。 A water-soluble working fluid for a fixed abrasive fine wire cutter comprising (C) a carboxylic acid, (D) a compound which is dissolved in water to exhibit alkalinity, and (E) water, and a conductivity of 300 μS at 25 ° C / The viscosity of the quasi-use liquid formed at a temperature of 25 ° C or more and 3000 μS/cm or less at 25 ° C is 5 or more and 10 or less, and the viscosity of the quasi-use liquid formed by adding 10% by mass of the niobium powder having an average particle diameter of 1.5 μm is not satisfied at 25 ° C. 30mPa. s, the surface tension at 25 ° C is 20 mN / m or more and 50 mN / m or less. 如申請專利範圍第1項之固定研磨粒細線切割器用水溶性加工液,其中,進而含有(A)自醇、環氧乙烷與環氧丙烷之共聚合體,及聚氧伸烷基二醇類中選擇之至少一種以上之非離子系界面活性劑。 The water-soluble working fluid for a fixed abrasive fine-wire cutter according to the first aspect of the invention, which further comprises (A) a copolymer of alcohol, ethylene oxide and propylene oxide, and a polyoxyalkylene glycol. At least one or more nonionic surfactants selected from the group consisting of. 如申請專利範圍第1項之固定研磨粒細線切割器用水溶性加工液,其中,進而含有(B)二醇類。 The water-soluble working fluid for a fixed abrasive fine wire cutter according to the first aspect of the invention, further comprising (B) a glycol. 如申請專利範圍第2項之固定研磨粒細線切割器用水溶性加工液,其中,進而含有(B)二醇類。 A water-soluble working fluid for a fixed abrasive fine wire cutter according to the second aspect of the invention, which further comprises (B) a glycol. 一種固定研磨粒細線切割器用水溶性加工液,其包含:(A)自醇、環氧乙烷與環氧丙烷之共聚合體,及聚氧伸烷基二醇類中選擇之至少1種以上之非離子系界面活性劑0.1質量%以上且8質量%以下;(B)二醇類0.1質量%以上且80質量%以下;(C)羧酸0.01質量%以上且5質量%以下; (D)溶解於水中而顯示鹼性之化合物0.01質量%以上且7質量%以下;及(E)水;且於25℃下之導電率為300μS/cm以上且3000μS/cm以下,於25℃下之pH為5以上且10以下,添加平均粒徑為1.5μm之矽粉10質量%並攪拌而形成之準使用液之黏度於25℃下未滿30mPa.s。 A water-soluble working fluid for a fixed abrasive fine wire cutter comprising: (A) at least one selected from the group consisting of alcohol, a copolymer of ethylene oxide and propylene oxide, and a polyoxyalkylene glycol 0.1% by mass or more and 8% by mass or less of the nonionic surfactant; (B) 0.1% by mass or more and 80% by mass or less of the diol; (C) 0.01% by mass or more and 5% by mass or less of the carboxylic acid; (D) 0.01% by mass or more and 7% by mass or less of the compound which is alkaline in water, and (E) water; and the electrical conductivity at 25 ° C is 300 μS/cm or more and 3000 μS/cm or less at 25 ° C The lower pH is 5 or more and 10 or less, and the viscosity of the quasi-use liquid formed by adding 10% by mass of the niobium powder having an average particle diameter of 1.5 μm and stirring is less than 30 mPa at 25 ° C. s. 如申請專利範圍第5項之固定研磨粒細線切割器用水溶性加工液,其中,於25℃下之表面張力為20mN/m以上且50mN/m以下。 The water-soluble working fluid for a fixed abrasive fine wire cutter according to the fifth aspect of the invention, wherein the surface tension at 25 ° C is 20 mN/m or more and 50 mN/m or less. 如申請專利範圍第1至6項中任一項之固定研磨粒細線切割器用水溶性加工液,其中,進而含有水溶性高分子及/或消泡劑。 The water-soluble working fluid for a fixed abrasive fine wire cutter according to any one of claims 1 to 6, which further comprises a water-soluble polymer and/or an antifoaming agent. 如申請專利範圍第1至6項中任一項之固定研磨粒細線切割器用水溶性加工液,其中,將固定研磨粒細線切割器用水溶性加工液整體之質量設為100質量%而含有上述(E)水10質量%以上且99.7質量%以下。 The water-soluble working fluid for a fixed abrasive fine-wire cutter according to any one of the first to sixth aspects of the present invention, wherein the mass of the water-soluble working fluid for the fixed abrasive fine wire cutter is 100% by mass or more (including the above) E) Water is 10% by mass or more and 99.7% by mass or less. 如申請專利範圍第7項之固定研磨粒細線切割器用水溶性加工液,其中,將固定研磨粒細線切割器用水溶性加工液整體之質量設為100質量%而含有上述(E)水10質量%以上且99.7質量%以下。 The water-soluble working fluid for a fixed abrasive fine-wire cutter according to the seventh aspect of the invention, wherein the mass of the water-soluble working fluid for the fixed abrasive fine wire cutter is 100% by mass, and the (E) water is 10% by mass. The above and 99.7 mass% or less.
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