TWI515424B - Mask cleaning apparatus and the method thereof - Google Patents

Description

Mask cleaning device and method thereof

The present invention relates to a mask cleaning apparatus, and more particularly to a mask cleaning apparatus and a method thereof for performing laser irradiation on a lower surface of a metal mask.

Organic light-emitting diode or organic electroluminescence display technology has the advantages of low operating voltage, thin thickness, active illumination, full color, no need for backlight and easy fabrication. With the demand for high display screens of electronic products, the resolution of organic light-emitting diode displays is gradually moving toward high-resolution pixels. Therefore, the metal used for vapor deposition of organic light-emitting diode display panels is used. The cover is inevitably also required to meet the requirements of high-precision dimensional tolerances.

In general, metal masks are mainly used to prepare light-emitting layers of different colors by vapor deposition using a plurality of fine-opened metal masks having a specific pattern, so that the organic vapor-deposited material can penetrate through this. The holes are finely opened, and vapor deposition is formed on the substrate. Therefore, if the size or positioning accuracy of the metal mask is not good, the luminescent layer of different colors of the display will be disordered, which will seriously affect the uneven luminous efficiency of each luminescent layer, thereby causing the resolution of the display panel to be lowered. From this, it can be seen that the accuracy of the metal mask has a decisive influence on the high resolution of the display panel.

However, during the evaporation process, the organic material may adhere to the metal mask, for example, to the surface of the metal mask, or may be partially or completely blocked in the opening. It is not necessary to mention that the opening is completely blocked. Only a part of the opening is blocked, which will cause a change in the opening area, so that the original predetermined pattern is changed, thus causing the subsequent evaporation process. The evaporation accuracy will be significantly reduced. Moreover, because the metal mask is not easy to prepare and costly, the metal mask is not only used in one evaporation process, but in many The evaporation process is continuously repeated, and between each evaporation process, the metal mask must be transported back and forth to the equipment chamber where the evaporation process is to be performed, so the metal mask is inevitably contaminated. For example, an organic material that has been adhered to the previous vapor deposition process or an impurity such as fibers, dirt, or dust that adheres to the metal mask due to the conveyance process. In summary, in order to maintain the vapor deposition precision, after completing an evaporation process, it is necessary to clean the metal mask to remove the organic material or impurity particles attached thereto.

The traditional metal mask cleaning process mainly includes ultrasonic vibration and cleaning of the metal mask by non-contact laser irradiation. Generally, the metal mask is first placed in a specific solvent, the organic vapor deposition material is dissolved by ultrasonic vibration, and then the metal mask is dried, and then the metal mask is irradiated with a laser to remove the residual Impurities. However, although the conventional cleaning process includes a plurality of steps for removing impurities, in practice, some micro-impurities remain on the metal mask and cannot be completely removed. For example, a conventional metal mask opening has a cross-sectional structure generally formed by the upper vapor-deposited surface diverging from the opposite lower surface. Once the impurity in the opening is irradiated by laser, it is limited by the metal. The shape of the opening of the mask and the angle of the laser irradiation can only remove some of the impurities, and the impurities in the opening cannot be completely removed. Moreover, because the metal mask is a very thin metal sheet, even a very small force can cause distortion or deformation, which can damage the metal sheet, so how to prevent the metal mask from being damaged It can completely remove impurities such as organic materials on the metal mask, which is a problem that people in the field would like to solve.

The invention provides a mask cleaning device capable of performing laser irradiation on the upper and lower surfaces of a metal mask and a method thereof, which can solve various problems described in the prior art without damaging the metal mask. .

In an embodiment of the invention, the mask cleaning device includes a first stage, a second stage, a laser mount, a first laser device, and a second laser device. The first stage and the second stage are disposed in parallel with the machine at a distance and are movable relative to the machine along a first direction for carrying a metal mask

A laser mount is located between the first and second stages. The first laser device and the second laser device are both disposed in the second direction and are disposed on the laser bracket. More specifically, the first A laser device is moved to the laser mount to displace the first laser device in the second direction. Similarly, the second laser device is also moved to the laser mount and the second laser device is also displaced in the second direction. The first laser device can illuminate a surface of the metal mask carried on the first stage with a laser beam to remove a plurality of impurity particles on the upper surface of the metal mask. The second laser device can irradiate a laser beam on the lower surface of the metal mask carried on the second stage to remove the impurity particles remaining on the metal mask, for example, attached to the metal mask. Impurity particles on the lower surface, or impurity particles that have not been completely removed in the openings of the metal mask.

In another embodiment of the invention, the mask cleaning device may comprise only one laser device and a rotating mechanism. The rotating mechanism is disposed on the laser bracket in a second direction perpendicular to the first direction, and the rotating mechanism is rotatable relative to the laser bracket. The laser device is fixed on the rotating mechanism, so that the laser device can rotate relative to the laser bracket between a first laser irradiation position and a second laser irradiation position. In this manner, when the laser device is in the first laser irradiation position, the surface of the metal mask carried on the first stage may be irradiated with laser light, and when the laser device is irradiated to the second laser In the position, the lower surface of the metal mask carried on the second stage may be irradiated with laser light to completely remove the impurity particles on the metal mask.

Alternatively, in a further embodiment of the present invention, the mask cleaning device may also include only one stage and two laser devices, using the first laser device and the second laser disposed on opposite sides of the base. The device is configured to perform laser irradiation on the upper surface of the metal mask carried on the stage. In detail, the stage is disposed on the base in a first direction, wherein the stage has an opening that communicates with the notch of the base such that the metal mask carried thereon exposes the upper and lower surfaces thereof.

a first laser device is located on one side of the base and movable relative to the base in a second direction perpendicular to the first direction, the laser light source of the first laser device facing the base The gap in the seat allows the first laser device to illuminate the upper surface of the metal mask carried on the mask stage with laser light. a second laser device is located on the other side of the base opposite the first laser device and movable relative to the base in the second direction, the laser light source of the second laser device facing the base The gap in the seat allows the second laser device to illuminate the lower surface of the metal mask carried on the stage with laser light.

The invention further provides a method of cleaning a metal mask comprising at least the following steps. A metal mask is placed in a first position and the upper surface of the metal mask faces a first direction. Next, the upper surface of the metal mask is irradiated with laser light by a laser device. Move this The metal mask is brought to a second position and the lower surface of the metal mask faces a second direction, wherein the second direction is different from the first direction. Finally, the lower surface of the metal mask is irradiated with laser light by the aforementioned laser device.

The invention further provides a method of cleaning a metal mask comprising at least the following steps. A metal mask is placed on a stage, and the metal mask on the stage is exposed to the upper surface and the lower surface. Finally, the upper surface and the lower surface of the metal mask are respectively irradiated with laser light by means of two laser devices.

The invention further provides a method of cleaning a metal mask comprising at least the following steps. A metal mask is placed in a first position and the upper surface of the metal mask faces a first direction. Next, the upper surface of the metal mask is irradiated with laser light by a laser device. Moving the metal mask to a second position and directing a lower surface of the metal mask toward a second direction, wherein the second direction is different from the first direction. Finally, the lower surface of the metal mask is irradiated with laser light by another laser device.

Therefore, the mask cleaning device of the present invention not only does not cause damage such as distortion or deformation of the metal mask, but also simultaneously cleans the upper surface and the lower surface of the metal mask, thereby ensuring the opening of the metal mask. The impurities attached to the inner and even the upper and lower surfaces can be completely removed, so that the cleanliness of the metal mask can be greatly improved.

Other inventive aspects and more detailed technical and functional descriptions of the present invention are disclosed in the following description.

100‧‧‧Base

100a‧‧‧ upper surface

101‧‧‧ Track

103‧‧‧ gap

105‧‧‧stage

105a‧‧‧ openings

200‧‧‧ frame

202‧‧‧ Uploading station

202a‧‧‧ openings

204‧‧‧Download

206‧‧‧Laser space

300‧‧‧Road bracket

301‧‧‧cross bar

301a‧‧‧ side

301b‧‧‧ side

401‧‧ ‧ laser device, first laser device

403‧‧‧second laser device

405‧‧‧Inspection device, first inspection device

407‧‧‧Second inspection device

500‧‧‧Metal mask

501a‧‧‧ upper surface

501b‧‧‧ lower surface

503‧‧‧Opening

507‧‧‧ impurity particles

507a‧‧‧ impurity particles

601‧‧‧First laser device

603‧‧‧First bracket

605‧‧‧First inspection device

701‧‧‧second laser device

703‧‧‧second bracket

705‧‧‧Second inspection device

800‧‧‧Rotating mechanism

The first figure is a schematic perspective view of a mask cleaning device according to a first embodiment of the present invention.

The second figure is a partially enlarged cross-sectional structural view of a metal mask in the first embodiment of the present invention.

Fig. 3 is a perspective view showing the three-dimensional structure in which a metal mask is placed on an loading table in the mask cleaning device of the first embodiment of the present invention.

The fourth figure is a partially enlarged cross-sectional structural view of a metal mask in the first embodiment of the present invention.

Fig. 5 is a perspective view showing the structure of a mask cleaning device according to a second embodiment of the present invention.

Fig. 6 is a perspective view showing a three-dimensional structure in which a laser device is rotated and a second laser is irradiated in the mask cleaning device of the second embodiment of the present invention.

Fig. 7 is a perspective view showing the structure of a mask cleaning device according to a third embodiment of the present invention.

Figure 8 is a partially enlarged cross-sectional structural view showing a metal mask in a third embodiment of the present invention.

Hereinafter, the best mode for carrying out the invention will be described with reference to the drawings, but the invention is not limited to the following aspects.

First embodiment

The first figure is a schematic perspective view of a mask cleaning device according to a first embodiment of the present invention. As shown in the first figure, the mask cleaning device includes a base 100, a frame 200, and a laser mount 300. The base 100 is a working platform of a chamber machine. A set of rails 101 is disposed on the base 100, and the rails 101 are extended on the base 100 along the first direction. The first direction in this embodiment refers to the X-axis direction, but is not intended to limit the invention.

The frame body 200 is spanned on the base 100 and movable on the track 101 such that the frame body 200 can move relative to the base 100 on the track 101. The mask cleaning device further includes an uploading station 202 and a downloading station 204, and the loading station 202 and the downloading station 204 are disposed in parallel at a distance for respectively carrying a metal mask. That is, as shown in the first figure, the uploading station 202 and the downloading station 204 are fixedly coupled to the frame 200, and the uploading station 202 is disposed higher than the downloading station 204, so that the loading station 202 and the downloading station 204 are disposed. A laser space 206 is defined for subsequent laser illumination. In this embodiment, the uploading station 202 is disposed directly above the download station 204, but this is not intended to limit the invention. Further, the loading table 202 is substantially a rectangular frame stage and has an opening 202a such that the lower surface of the metal mask carried thereon can be exposed. The download station 204 is generally a rectangular platform, and may also be a rectangular frame table, and is not intended to limit the present invention.

Referring to the first figure, the laser mount 300 is disposed across the base 100 and extends through the laser space 206 in a second direction perpendicular to the first direction. More specifically, the laser mount 300 is substantially U-shaped, and the laser mount 300 has a crossbar 301 whose longitudinal direction is parallel to the Y-axis direction and allows the crossbar 301 to pass through the loading platform. 202 The laser space 206 between the download station 204 and the portion of the crossbar 301 is located in the laser space 206. .

Furthermore, the mask cleaning device further includes a first laser device 401 and a second laser device 403 for respectively irradiating the upper and lower surfaces of the metal mask with the laser light. As shown in the first figure, the first laser device 401 is moved and disposed on one side 301a of the cross bar 301 of the laser mount 300, and is movable in the Y-axis direction. More specifically, the first laser device 401 can be disposed on a track (not shown) on one side 301a of the crossbar 301 and moved along the track such that the first laser device 401 can follow the Y-axis direction. And moving on the laser mount 300.

Similar to the first laser device 401, the second laser device 403 is also moved on the side surface 301a of the crossbar 301 of the laser mount 300 and is movable along the Y-axis direction, in other words, the second laser device 403 Both the first laser device 401 and the first laser device 401 are disposed on the same side surface 301a of the laser holder 300. The second laser device 403 may share the same track as the first laser device 401, or may be disposed on a different track (not shown). Alternatively, in a further embodiment, the second laser device 403 and the first laser device 401 may be disposed on opposite sides of the laser bracket 300. In detail, the first laser device 401 is disposed on one side 301a of the crossbar 301, and the second laser device 403 is disposed on the other side 301b of the opposite side of the crossbar from the side surface 301a. It should be noted that the foregoing description of the manner in which the first and second laser devices 401, 403 are disposed on the laser mount 300 and the relative positions of the two laser devices is merely an explanation for facilitating the explanation of the embodiment, and is not In order to limit the invention, those skilled in the art can change themselves as needed.

It is worth mentioning that the movement of the above-mentioned frame, the movement of the first and second laser devices 401, 403, and the laser irradiation operation are usually controlled by at least one computer control device (not shown). That is to say, the computer control device is a precision measuring device for controlling the displacement of the frame body, the displacement of the first and second laser devices 401, 403, the laser irradiation, etc., so that the metal cover is carried. The stage of the cover and the first and second laser devices 401, 403 can be accurately moved to the target position, thereby performing a laser irradiation repair operation. The computer control device controls the frame body, the laser device, and the like, and is a technology that is well known and can be changed by those skilled in the art, and therefore will not be described herein.

In another embodiment of the present invention, the mask cleaning device further includes a first inspection device 405 coupled with the first laser device 401 for determining whether the upper surface 501a of the metal mask 500 has foreign particles to be removed. As shown in the first figure, the first inspection device 405 is fixed to the first laser device 401. That is, the first inspection device 405 is also moved to the laser branch. A track (not shown) on the side 301a of the frame 300 is movable along the track. The first inspection device 405 can be an image capture device, such as a Charge Coupled Device (CCD). The first inspection device 405 is for determining whether the upper surface 501a of the metal mask 500 has impurity particles to be removed. After the impurity particles to be removed are to be inspected and positioned, the first laser device 401 is used to illuminate the laser light.

In an embodiment of the present invention, in addition to the first inspection device 405, the first laser device 401 may further include another inspection device (not shown). The two inspection devices are generally subjected to inspection, positioning, and the like, and the inspection and positioning operations of the two inspection devices should be well-known to those skilled in the art, and therefore will not be described herein. It should be noted that the two inspection devices are merely illustrative of the embodiments and are not intended to limit the present invention. Those skilled in the art can change the number of inspection devices as needed.

Similarly, the mask cleaning device may further include a second inspection device 407 that is coupled to the second laser device 403. As shown in the first figure, the second inspection device 407 is fixed to the second laser device 403, and is disposed on the laser holder 300 and movable in the second direction to determine the lower portion of the metal mask 500. Whether the surface 501b has foreign particles to be removed. The position setting and operation of the second inspection device 407 are similar to those of the first inspection device 405 described above, and therefore will not be described herein.

Referring to both the first and second figures, first, the metal mask 500 is carried on the download station 204, and the upper surface 501a of the metal mask 500 faces the first laser device 401 (in this embodiment, The upper surface 501a of the metal mask 500 is upwardly directed, but is not intended to limit the invention as long as the upper surface 501a of the metal mask 500 faces the laser device. The metal mask 500 is a metal thin plate mounted on the metal frame, and the metal thin plate is formed with a plurality of patterned openings 503. Next, the first laser light is irradiated first. Adjusting the relative positions of the frame body 200 and the first laser device 401 to move the first laser device 401 to the target position in the laser space 206, and then using the first laser device 401 to the metal mask 500 The upper surface 501a illuminates the first laser light. At this time, the first laser light illuminates the impurity particles 507 attached to the metal mask 500, for example, the impurity particles 507 attached to the upper surface 501a of the metal mask 500 and the impurity particles 507 in the opening 503, so that the impurity particles 507 is detached from the metal mask 500.

Please refer to the third and fourth figures at the same time for the second laser light irradiation. The metal mask 500 is first taken out from the download station 204, and the metal mask 500 is placed on the loading platform 202. And the lower surface 501b of the metal mask 500 carried on the loading table 202 is exposed by the opening 202a of the loading table 202. At this time, the lower surface 501b of the metal mask 500 placed on the loading table 202 faces the second laser device 403 (in this embodiment, the lower surface 501b of the metal mask 500 faces downward, but is not used To limit the invention, as long as the lower surface 501b of the metal mask 500 faces the laser device). Next, the position of the frame body 200 and the second laser device 403 is adjusted and moved to the target position. Thereafter, the second laser light 403 is used to illuminate the lower surface 501b of the metal mask 500 with the second laser light. At this time, impurity particles 507a may remain on the lower surface 501b of the metal mask 500, for example, containing the impurity particles 507a attached to the lower surface 501b and the impurity particles 507a which are not completely removed by the laser irradiation in the opening 503. Therefore, the irradiation of the second laser light can further remove the residual impurity particles 507a to ensure the cleanness of the metal mask, thereby obtaining a higher metal mask cleaning effect.

The mask cleaning device may further include a first ultrasonic vibration device (not shown) and/or a first air flow device (not shown), the first ultrasonic vibration device and the first air flow device and the first The laser device 401 is fixed together and adjacent to the first laser device 401, that is, it is also moved on the side surface 301a of the cross bar 301 of the laser mount 300 and is movable in the Y-axis direction. The first ultrasonic vibration device generates ultrasonic vibration, and ultrasonic vibration is used to remove impurities such as dust on the surface of the metal mask 500. The first air flow device generates an air flow (for example, an intake air flow and/or a blow air flow) to remove dust and the like on the surface of the metal cover 500. For example, the first air flow device may further include a blower and a blower. The air suction member may be a blowing nozzle, and the air suction member may be a suction nozzle, the air blowing member first blowing impurities on the surface of the metal mask 500, and the air suction member is to be blown up. Impurities are sucked away.

In addition, the mask cleaning device may also include a second ultrasonic vibration device (not shown) and/or a second air flow device (not shown), and the second ultrasonic vibration device and the second air flow device. The second laser device 403 is fixed together and adjacent to the second laser device 403. The descriptions of the features such as the position and the moving direction of the second ultrasonic vibration device and the second air flow device are similar to those described above, and thus are not described herein.

Second embodiment

Please refer to FIG. 5 and FIG. 6 , which are schematic perspective views of a mask cleaning device according to a second embodiment of the present invention. Similar to the first embodiment described above, in the second embodiment, the mask cleaning device includes the base 100, the frame 200, and the laser mount 300. Frame 200 is based on The track 101 of the base 100 is disposed on the base 100 and moves along the first direction. The frame 200 has an loading platform 202 and a downloading station 204 for respectively carrying a metal mask. The laser mount 300 spans the base 100 and extends through the laser space 206 defined by the loading station 202 and the download station 204 in a second direction perpendicular to the first direction. The descriptions of the position, shape, moving direction, structural features, and the like of the susceptor 100, the frame 200, and the laser holder 300 are similar to those of the first embodiment described above, and thus are not described herein.

The difference from the first embodiment is that the mask cleaning device in this embodiment includes only one laser device 401 and one rotating mechanism 800. As shown in the fifth figure, the rotating mechanism 800 is movably disposed on the laser mount 300 and moves in the second direction. More specifically, the rotating mechanism 800 can be disposed on a track (not shown) on one side 301a of the crossbar 301 and moved along the track so that the rotating mechanism 800 can be along the Y-axis direction and on the laser mount 300. Move on. The laser device 401 is fixed to the rotating mechanism 800, so that the laser device 401 can be rotated relative to the laser bracket 300 by the rotating mechanism 800, for example, rotated by 180 degrees, so that the laser device 401 can be rotated to the first laser irradiation. a position or a second laser irradiation position, respectively illuminating a surface of the metal mask carried on the downloading station with a first laser light and a surface of the lower surface of the metal mask carried on the loading table Two lasers, which in turn remove a plurality of impurity particles on the metal mask. For example, the rotating mechanism 800 can include a driving member, such as a stepping motor. The driving member can drive the laser device 401 to rotate, but is not limited thereto. Those skilled in the art can adjust the rotating mechanism 800 when the self-change is self-changeable. the design of.

In still another embodiment of the present invention, the mask cleaning device further includes an inspection device 405 that is coupled to the laser device 401. As shown in the fifth figure, similar to the arrangement of the laser device 401, the inspection device 405 is also fixed to the rotating mechanism 800. It is worth mentioning that the position setting and operation of these inspection devices are similar to those of the first embodiment, and therefore will not be described herein.

Please refer to the fifth and sixth figures at the same time. As shown in the fifth figure, the metal mask 500 is carried on the download stage 204, and the upper surface 501a of the metal mask 500 faces the laser device 401. First, the first laser light is irradiated. The laser device 401 is rotated to the first laser irradiation position, that is, the laser head of the laser device 401 is rotated to face the download station 204. Next, the position of the frame body 200 and the laser device 401 is adjusted, and the laser device 401 is moved in the laser space 206 and moved to the target position. Thereafter, the first surface 501a of the metal mask 500 is irradiated with the first laser light by the laser device 401. At this time, the first laser light is irradiated and attached to the metal mask 500. The impurity particles 507 on the upper side include, for example, the impurity particles 507 attached to the upper surface 501a of the metal mask 500 and the impurity particles 507 in the opening 503, so that the impurity particles 507 are detached from the metal mask 500.

A second laser light irradiation is performed. As shown in the sixth figure, the metal mask 500 is first taken out from the download station 204, and then the metal mask 500 is placed on the loading platform 202, and is carried on the loading platform 202 by the opening 202a of the loading station 202. The lower surface 501b of the metal mask 500 is exposed. Next, the laser device 401 is rotated about 180 degrees to rotate the laser device 401 to the second laser irradiation position, that is, the laser head of the laser device 401 is rotated to face the metal mask placed on the loading table 202. The position of the surface 501b below 500. The position of the frame 200 and the laser device 401 is adjusted and moved to the target position. Thereafter, the second surface 501b of the metal mask 500 is irradiated with the second laser light by the laser device 401. At this time, impurity particles 507a may remain on the lower surface 501b of the metal mask 500, for example, the impurity particles 507a attached to the lower surface 501b and the impurities not completely removed by the laser irradiation in the opening 503 are included in the fourth figure. Particle 507a. Therefore, the irradiation of the second laser light can further remove the residual impurity particles 507a to ensure the cleanness of the metal mask, thereby obtaining a higher metal mask cleaning effect.

The mask cleaning device may further include an ultrasonic vibration device (not shown) and/or an air flow device (not shown), and the ultrasonic vibration device and the air flow device are fixed on the rotating mechanism 800, that is, the ultrasonic wave. The vibrating device and the airflow device and the laser device 401 are movable in the second direction relative to the base 100, and can also be rotated by the rotating mechanism 800 at the same time. The description of the characteristics of the ultrasonic vibration device and the air flow device is similar to that of the first embodiment described above, and therefore will not be described herein.

Third embodiment

Please refer to the seventh figure, which is a schematic perspective view of a mask cleaning device according to a third embodiment of the present invention. As shown in the seventh figure, the mask cleaning device includes a base 100 and a stage 105 disposed on the base 100 in a first direction. Specifically, a recess 103 is defined in the base 100, and a pair of rails 101 are disposed on opposite sides of the notch 103. The rail 101 is extended on the base 100 along the first direction. In this embodiment, the first direction refers to the X-axis direction, but this is not intended to limit the invention.

In the third embodiment, the stage 105 is disposed on the track 101 on the base 100 and moves on the track 101 such that the stage 105 can be moved relative to the base 100 on the track 101. As shown in the seventh figure, the stage 105 is substantially a rectangular frame structure, and the stage 105 has an opening 105a. Therefore, when the stage 105 is disposed on the base 100, the opening 105a of the stage 105 communicates with the base. The notch 103 of 100 allows the upper and lower surfaces of the metal mask to be subsequently carried thereon to be exposed.

Referring to the seventh figure, the first bracket 603 is disposed across the upper surface 100a of the base 100, and is disposed on the base 100 along a second direction perpendicular to the first direction, that is, the Y-axis direction. . In this embodiment, the first bracket 603 is substantially U-shaped, but is not limited thereto. The first laser device 601 is disposed on the first bracket 603. More specifically, the first laser device 601 can be moved to the laser bracket 300 by a track (not shown) on the first bracket 603. The first laser device 601 is displaceable relative to the susceptor 100 in the Y-axis direction. It should be noted that the technology of the first laser device 601 mounted on the first bracket 603 is a technology that can be arbitrarily changed by those skilled in the art, and is not limited to the technology mentioned in the embodiment.

Similar to the first bracket 603, with respect to the lower surface (not shown) of the upper surface 100a of the base 100, a second bracket 703 is provided, and the second bracket 703 is also in a second direction perpendicular to the first direction, That is, the Y-axis direction is provided on the lower surface of the susceptor 100. The second laser device 701 is disposed on the second bracket 703 and is displaceable relative to the base 100 along the Y-axis direction. The second laser device 701 is mounted on the second bracket 703, like the first laser device 601, and should be well known to those skilled in the art, and therefore will not be described herein.

It should be noted that, as described in the first embodiment, the movement of the stage 105, the movement of the first and second laser devices 601, 701, and the laser irradiation operation are usually performed by at least one computer device (not drawn It is to be controlled, and such operations should be well known to those of ordinary skill in the art and are not described herein.

Please refer to the seventh and eighth figures simultaneously, and perform the first laser light irradiation and the second laser light irradiation, respectively. The metal mask 500 is carried on the stage 105, and the upper surface 501a, 501b of the metal mask 500 carried on the stage 105 is exposed through the opening 105a of the stage 105 and the notch 103 of the base 100. At this time, the upper surface 501a of the metal mask 500 faces the first laser device 601, and the lower surface 501b of the metal mask 500 faces the second laser device 701. Next, the positions of the stage 105 and the first and second laser devices 601 and 701 are sequentially adjusted and moved to the target position. Thereafter, using the first laser device 601 and the second laser device 701, respectively The upper surface 501a and the lower surface 501b of the metal mask 500 are irradiated with the first laser light and the second laser light. At this time, the first laser light illuminates the impurity particles 507 adhering to the metal mask 500, for example, containing the impurity particles 507 attached to the upper surface 501a of the metal mask 500 and the opening 503, and the second laser light is irradiated. The impurity particles 507 attached to the lower surface 501b of the metal mask 500 include, for example, impurity particles 507 adhered to the lower surface 501b and in the opening 503. In this way, all the impurity particles 507 on the metal mask 500 can be completely removed, thereby obtaining a higher metal mask cleaning effect.

In another embodiment of the invention, the mask cleaning device further includes a first inspection device 605 that is coupled to the first laser device 601. As shown in the seventh figure, the first inspection device 605 is moved and disposed on the first bracket 603. The first inspection device 605 can be an image capture device, such as a Charge Coupled Device (CCD). The first inspection device 605 is for determining whether the upper surface 501a of the metal mask 500 has impurity particles to be removed. After the impurity particles to be removed are detected and positioned, the first laser device 601 is used to illuminate the laser light. In still another embodiment of the present invention, in addition to the first inspection device 605, the first laser device 601 further includes another inspection device (not shown). It is worth mentioning that the position setting and operation of these inspection devices are similar to those of the first inspection device of the first embodiment, and therefore will not be further described herein.

In a further embodiment of the invention, the mask cleaning device may further comprise a second inspection device 705 in combination with the second laser device 701. As shown in the seventh figure, the second inspection device 705 is moved on the second bracket 703 and moved in the second direction to determine whether the lower surface 501b of the metal mask 500 has foreign particles to be removed. The position setting and operation of the second inspection device 705 are similar to those of the first inspection device described above, and thus are not described herein.

Alternatively, the mask cleaning device may further include a first ultrasonic vibration device (not shown) and/or a first air flow device (not shown), and the first ultrasonic vibration device moves with the first air flow device. It is disposed on the first bracket 603 and is movable along the Y-axis direction. The feature description of the first ultrasonic vibration device and the first air flow device is similar to that of the first embodiment described above, and therefore will not be described herein.

In addition, the mask cleaning device may further include a second ultrasonic vibration device (not shown) and/or a second air flow device (not shown), and the second ultrasonic vibration device and the second air flow device are moved as required. It is disposed on the second bracket 703 and is movable along the Y-axis direction. As for the second supersonic The features of the wave vibrating device and the second airflow device are similar to those of the first embodiment described above, and thus are not described herein.

Therefore, the present invention not only does not cause damage such as distortion or deformation of the metal mask, but also simultaneously cleans the upper surface and the lower surface of the metal mask, thereby ensuring the inside of the opening of the metal mask, and even even The impurities attached to the upper and lower surfaces can be completely removed, so that the cleanliness of the metal mask can be greatly improved.

In addition, the above, the first, the second, and the second described in the foregoing embodiments are merely illustrative of the various embodiments, and are not intended to limit the scope of the present invention. For example, the mask cleaning device of the present invention is not limited to the above. In the embodiment, the metal mask is placed horizontally on the stage for repairing and cleaning, and the metal mask can be erected in the machine table according to requirements. At this time, the laser device and the detecting device must be simultaneously adjusted. The orientation of the device is designed to clean the upright metal mask.

In any event, anyone can obtain sufficient teaching from the description of the above examples, and it is understood that the present invention is indeed different from the prior art, and is industrially usable and progressive. It is the invention that has indeed met the patent requirements and has filed an application in accordance with the law.

100‧‧‧Base

101‧‧‧ Track

200‧‧‧ frame

202‧‧‧ Uploading station

202a‧‧‧ openings

204‧‧‧Download

206‧‧‧Laser space

300‧‧‧Road bracket

301‧‧‧cross bar

301a‧‧‧ side

301b‧‧‧ side

401‧‧‧ Laser device

405‧‧‧Checking device

500‧‧‧Metal mask

503‧‧‧Opening

800‧‧‧Rotating mechanism

Claims (17)

A mask cleaning device includes: a first stage and a second stage disposed at a distance parallel to a machine and movable relative to the machine along a first direction for carrying a metal mask a laser bracket disposed between the first and second stages; a rotating mechanism disposed on the laser bracket in a second direction perpendicular to the first direction, and the rotating mechanism is opposite Rotating the laser mount; and a laser device fixed to the rotating mechanism to rotate the laser device relative to the laser mount between a first laser irradiation position and a second laser irradiation position And when the laser device is in the first laser irradiation position, the surface of the metal mask carried on the first stage may be irradiated with laser light, and when the laser device is irradiated to the second laser In the position, the lower surface of the metal mask carried on the second stage may be irradiated with laser light. The device of claim 1, further comprising an inspection device coupled to the laser device, the inspection device being fixed to the rotation mechanism. The device of claim 2, further comprising an ultrasonic vibration device, the ultrasonic vibration device being fixed to the rotation mechanism. The device of claim 3, further comprising an air flow device matched with the laser device, the air flow device being fixed to the rotating mechanism. A mask cleaning device comprising: a first stage and a second stage are disposed at a distance parallel to a machine and are movable relative to the machine along a first direction for carrying a metal cover; a laser mount is located at the same Between the first and second stages; a first laser device disposed on the laser mount in a second direction perpendicular to the first direction, the first laser device being The upper surface of the metal mask on the first stage illuminates the laser light; and a second laser device is disposed on the laser holder along the second direction, and the second laser device can be carried on the The underside of the metal mask on the second stage illuminates the laser light. The device of claim 5, wherein the first and the second laser device are respectively disposed on the same side of the laser mount. The device of claim 5, further comprising a first inspection device coupled with the first laser device and a second inspection device coupled with the second laser device, the first and the first The two inspection devices are respectively disposed on the laser bracket along the second direction. The device of claim 7, further comprising a first ultrasonic vibration device and a first air flow device coupled with the first laser device, the first ultrasonic vibration device and the air flow device respectively The second direction of movement is disposed on the laser mount. The device of claim 8, further comprising a second ultrasonic vibration device and a second air flow device coupled with the second laser device, wherein the second ultrasonic vibration device and the air flow device are respectively The second direction of movement is disposed on the laser mount. A mask cleaning device includes: a base having a notch; a stage disposed on the base along a first direction to carry a metal cover, the stage having an opening, the opening Connecting the notch of the pedestal and exposing an upper surface and a lower surface of the metal mask carried thereon; a first laser device located on one side of the pedestal and opposite to the pedestal Moving along a second direction perpendicular to the first direction, the laser light source of the first laser device faces the gap in the base, so that the first laser device can be carried on the stage The upper surface of the metal mask is irradiated with laser light; a second laser device is located on the other side of the base opposite the first laser device and movable relative to the base along the second direction The laser light source of the second laser device faces the gap in the base, so that the second laser device can irradiate the lower surface of the metal mask carried on the stage with laser light. The device of claim 10, further comprising a first bracket and a second bracket, the first bracket spanning the side of the base, the second bracket spanning the base On the other side, the first laser device is disposed on the first bracket, and the second laser device is disposed on the second bracket. The device of claim 10, further comprising: a first inspection device matched with the first laser device and a matching with the second laser device And a second inspection device, wherein the first inspection device and the second inspection device are respectively disposed on the laser bracket along the second direction. The device of claim 12, further comprising a first ultrasonic vibration device and a first air flow device matched with the first laser device, the first ultrasonic vibration device and the first air flow device Located on the side of the base, the first ultrasonic vibration device and the first air flow device are movable relative to the base in the second direction. The device of claim 13, further comprising a second ultrasonic vibration device and a second air flow device in combination with the second laser device, the second ultrasonic vibration device and the second air flow device Located on the other side of the base, and the second ultrasonic vibration device and the second air flow device are movable relative to the base in the second direction. A method of cleaning a metal mask, comprising: placing a metal mask in a first position and directing an upper surface of the metal mask toward a first direction; when the metal is masked in the first position, a laser device irradiates the upper surface of the metal mask with laser light; moving the metal mask to a second position, and directing a lower surface of the metal mask toward a second direction, wherein the second direction is different from The first direction; and when the metal is masked in the second position, the lower surface of the metal mask is irradiated with laser light by the laser device. A method of cleaning a metal mask comprising: Placing a metal mask on a stage, and exposing the metal mask on the upper surface to the upper surface and the lower surface; and respectively covering the upper surface and the lower surface of the metal mask by two laser devices The surface is illuminated with laser light. A method of cleaning a metal mask, comprising: placing a metal mask in a first position and directing an upper surface of the metal mask toward a first direction; when the metal is masked in the first position, a laser device irradiates the upper surface of the metal mask with laser light; moving the metal mask to a second position, and directing a lower surface of the metal mask toward a second direction, wherein the second direction is different from The first direction; and when the metal is masked in the second position, the lower surface of the metal mask is irradiated with laser light by another laser device.