TWI510810B - Lens unit and laser processing apparatus - Google Patents

Lens unit and laser processing apparatus Download PDF

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TWI510810B
TWI510810B TW101141523A TW101141523A TWI510810B TW I510810 B TWI510810 B TW I510810B TW 101141523 A TW101141523 A TW 101141523A TW 101141523 A TW101141523 A TW 101141523A TW I510810 B TWI510810 B TW I510810B
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temperature
laser beam
optical lens
lens
temperature detector
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TW101141523A
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Chinese (zh)
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TW201326893A (en
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Tomohiko Ishizuka
Kenji Ito
Masashi Naruse
Teiji Takahashi
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Mitsubishi Electric Corp
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透鏡單元及雷射加工裝置Lens unit and laser processing device

本發明係關於一種將雷射射束(laser beam)垂直聚光照射於被加工對象物的透鏡單元、及使用該透鏡單元的雷射加工裝置。The present invention relates to a lens unit that vertically condenses a laser beam onto a workpiece, and a laser processing apparatus using the lens unit.

利用電流掃描器(galvano scanner)的雷射加工裝置,以往係使用在雷射雕刻機或雷射刻印機等,一般亦被稱為雷射標線器(laser marker),此已為眾所週知。A laser processing apparatus using a galvano scanner has been conventionally used as a laser engraving machine or a laser marking machine, and is also generally called a laser marker.

最近,此雷射加工裝置已用在多層印刷基板或精密電子零件等的開孔製造步驟上,以作為替代以往之鑽孔(drill)等之工法之微細又高速且具彈性的加工方法。Recently, this laser processing apparatus has been used in the manufacturing process of the opening of a multilayer printed circuit board or a precision electronic component, and has been used as a fine, high-speed and elastic processing method in place of the conventional drilling method.

近年來,隨著半導體之小型化及集積度的提升,電子電路及電子零件的高精細化已日益顯著。對於用在此種經高精細化的電子電路或電子零件之加工的雷射加工裝置,已要求以往的雷射標線器等所無法達成的μm單位的加工位置精確度。In recent years, with the miniaturization of semiconductors and the increase in the degree of integration, the high definition of electronic circuits and electronic components has become increasingly prominent. For a laser processing apparatus used for processing such a high-definition electronic circuit or electronic component, a processing position accuracy of μm units which cannot be achieved by a conventional laser reticle or the like has been required.

作為對應此種超高精確度之加工精確度之要求的雷射加工裝置,已提出一種具備電流鏡(galvano mirror)之溫度檢測手段、透鏡溫度檢測手段、以及根據來自該等溫 度檢測手段之溫度信號而動作之電流鏡之偏向變位動作位置之控制手段的雷射加工裝置。As a laser processing apparatus corresponding to the requirements of such ultra-high precision processing accuracy, a temperature detecting means having a galvano mirror, a lens temperature detecting means, and according to the isothermal temperature have been proposed. A laser processing apparatus for controlling a position of a current mirror that is biased to a displacement position by a temperature signal of a detection means.

此種雷射加工裝置係可依照設置環境周圍的溫度變化、伴隨高能量雷射射束的吸收所產生光學零件之發熱所導致的溫度變化、或者在構成雷射加工裝置之單元或零件層級(level)下的溫度變化等之雷射加工裝置的溫度變化來進行加工位置偏移的修正(請參照例如專利文獻1)。Such a laser processing apparatus is capable of changing a temperature caused by a temperature change around a setting environment, a heat generation caused by absorption of a high-energy laser beam, or a unit or a component level constituting a laser processing apparatus ( Correction of the machining position shift is performed by changing the temperature of the laser processing apparatus such as the temperature change under the level (see, for example, Patent Document 1).

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

專利文獻1:日本特許4320524(第4-5頁,第1圖)Patent Document 1: Japanese Patent No. 4320524 (page 4-5, first figure)

在專利文獻1所記載之以往的雷射加工裝置中,係以安裝於透鏡單元之橫面的溫度檢測器來檢測出屬於透鏡單元之f θ透鏡的溫度。In the conventional laser processing apparatus described in Patent Document 1, the temperature of the f θ lens belonging to the lens unit is detected by a temperature detector attached to the lateral surface of the lens unit.

一般而言,由於f θ透鏡係具備光學透鏡與保持光學透鏡的鏡筒,因此在以往的雷射加工裝置中,所謂在f θ透鏡的橫面設置溫度檢測器,就是在鏡筒的側面部分設有溫度檢測器。In general, since the f θ lens system includes an optical lens and a lens barrel that holds the optical lens, in the conventional laser processing apparatus, a temperature detector is provided on the lateral surface of the f θ lens, that is, in the side portion of the lens barrel. A temperature detector is provided.

以往的雷射加工裝置係以設在屬於透鏡單元之f θ透鏡之鏡筒側面的溫度檢測器來測量溫度。因此,在光學透鏡瞬間吸收高能量雷射(例如msec單位精確度)射束,而瞬間產生溫度上升之情形下,由於溫度測量點距雷射射束照射區域較遠,且鏡筒的熱容較大,因此會有無法以良好 精確度測量溫度變化,而無法修正加工位置的偏移的問題。In the conventional laser processing apparatus, the temperature is measured by a temperature detector provided on the side of the lens barrel of the f θ lens belonging to the lens unit. Therefore, in the case where the optical lens instantaneously absorbs a high-energy laser (for example, msec unit precision) beam, and instantaneously generates a temperature rise, since the temperature measurement point is far from the laser beam irradiation area, and the heat capacity of the lens barrel Larger, so there will be no good Accuracy measures temperature changes without the problem of offsetting the machining position.

本發明係為了解決上述問題而研創者,其第一目的在獲得一種即使在光學透鏡瞬間吸收高能量的雷射射束,而瞬間產生溫度上升的情形下,亦可藉由溫度檢測器以良好精確度來測量光學透鏡之溫度變化的透鏡單元。The present invention has been made in order to solve the above problems, and the first object thereof is to obtain a laser beam which absorbs high energy instantaneously in an optical lens and instantaneously generates a temperature rise, and can also be good by a temperature detector. Accuracy to measure the lens unit of the temperature change of the optical lens.

本發明之第2目的係在獲得一種雷射加工裝置,係使用該透鏡單元作為f θ透鏡,且可將因為形成f θ透鏡之光學透鏡瞬間吸收高能量的雷射射束所產生之加工位置的偏移,以良好精確度予以修正。A second object of the present invention is to obtain a laser processing apparatus which uses the lens unit as an f θ lens and can process a processing position caused by a laser beam which forms an optical lens of an f θ lens instantaneously absorbing high energy. The offset is corrected with good accuracy.

本發明係提供一種透鏡單元,係將雷射射束聚光照射於對象物者,該透鏡單元係具備:光學透鏡;用以保持光學透鏡的鏡筒;及複數個溫度檢測器:複數個溫度檢測器係設在位於光學透鏡之雷射射束照射區域與光學透鏡之外周之間的雷射射束非照射部分,用來測量用以求出光學透鏡的平均溫度、或光學透鏡之平均溫度及面內之溫度分布的溫度信號。The present invention provides a lens unit for concentrating a laser beam onto an object, the lens unit having: an optical lens; a lens barrel for holding the optical lens; and a plurality of temperature detectors: a plurality of temperatures The detector is disposed in a non-irradiated portion of the laser beam between the laser beam irradiation region of the optical lens and the outer periphery of the optical lens for measuring the average temperature of the optical lens or the average temperature of the optical lens. And the temperature signal of the temperature distribution in the plane.

本發明係提供一種雷射加工裝置,係具備:雷射振盪器;電流鏡,將從雷射振盪器所輸出的雷射射束予以偏向;電流掃描器,用以驅動電流鏡;透鏡單元,具有:光學透鏡;保持光學透鏡的鏡筒;及設在位於光學透鏡之雷射射束照射區域與光學透鏡之外周之間的雷射射束非照射部分,用來測量用以求出光學透鏡的平均溫度、或光學透鏡的平均溫度及面內的溫度分布之溫度信號的複數個溫度檢 測器;且透鏡單元將在電流鏡所偏向入射的雷射射束予以朝向對象物聚光照射;XY平台(table),用以載置對象物且在水平面內移動;電流驅動器(galvano driver),用以驅動電流掃描器;控制裝置,用以控制雷射振盪器、電流驅動器、及XY平台;及信號線,用以將溫度檢測器連接於控制裝置;控制裝置係根據從複數個溫度檢測器所測量的溫度信號,求出光學透鏡之上升溫度的平均值、或光學透鏡之上升溫度的平均值及面內的溫度分布,且根據所獲得的結果,來修正雷射射束的聚光點位置。The present invention provides a laser processing apparatus comprising: a laser oscillator; a current mirror that deflects a laser beam output from a laser oscillator; a current scanner for driving a current mirror; and a lens unit, Having: an optical lens; a lens barrel holding the optical lens; and a non-irradiated portion of the laser beam disposed between the laser beam irradiation area of the optical lens and the outer circumference of the optical lens for measuring the optical lens The temperature of the average temperature, or the average temperature of the optical lens and the temperature distribution of the in-plane temperature signal And the lens unit condenses the laser beam that is incident on the current mirror toward the object; the XY platform is used to mount the object and move in the horizontal plane; the galvano driver For driving a current scanner; a control device for controlling the laser oscillator, the current driver, and the XY stage; and a signal line for connecting the temperature detector to the control device; the control device is based on detecting from a plurality of temperatures The temperature signal measured by the device determines the average value of the rising temperature of the optical lens, the average value of the rising temperature of the optical lens, and the temperature distribution in the plane, and corrects the concentration of the laser beam according to the obtained result. Point location.

由於本發明之透鏡單元係以上述方式構成,因此可精確度良好地測量因為高能量雷射射束之瞬間吸收所導致的光學透鏡的平均溫度。Since the lens unit of the present invention is constructed in the above manner, the average temperature of the optical lens due to the instantaneous absorption of the high-energy laser beam can be accurately measured.

由於本發明之雷射加工裝置係以上述方式構成,因此即使是在高能量雷射輸出下的加工,也可修正雷射射束聚光點的位置偏移,而可達成高精確度的雷射加工。Since the laser processing apparatus of the present invention is constructed in the above manner, even in the processing under high-energy laser output, the positional deviation of the laser beam condensing point can be corrected, and a high-precision ray can be achieved. Shot processing.

1‧‧‧雷射振盪器1‧‧‧Laser oscillator

2‧‧‧雷射射束2‧‧‧Laser beam

3a‧‧‧第1電流鏡3a‧‧‧1st current mirror

3b‧‧‧第2電流鏡3b‧‧‧2nd current mirror

4a‧‧‧第1電流掃描器4a‧‧‧1st current scanner

4b‧‧‧第2電流掃描器4b‧‧‧2nd current scanner

5‧‧‧f θ透鏡5‧‧‧f θ lens

6‧‧‧工件6‧‧‧Workpiece

7‧‧‧XY平台7‧‧‧XY platform

8‧‧‧電流驅動器8‧‧‧ Current driver

9‧‧‧控制裝置9‧‧‧Control device

10‧‧‧信號線10‧‧‧ signal line

11a、11b‧‧‧光學透鏡11a, 11b‧‧‧ optical lens

12‧‧‧保護窗12‧‧‧Protection window

13‧‧‧鏡筒13‧‧‧Mirror tube

14‧‧‧溫度檢測器14‧‧‧ Temperature detector

14a‧‧‧第1溫度檢測器14a‧‧‧1st temperature detector

14b‧‧‧第2溫度檢測器14b‧‧‧2nd temperature detector

14c‧‧‧第3溫度檢測器14c‧‧‧3rd temperature detector

14d‧‧‧第4溫度檢測器14d‧‧‧4th temperature detector

15‧‧‧雷射射束照射區域15‧‧‧Laser beam irradiation area

16‧‧‧雷射射束非照射部分16‧‧‧Laser beam non-illuminated part

20‧‧‧透鏡單元20‧‧‧ lens unit

25‧‧‧雷射射束照射區域25‧‧‧Laser beam irradiation area

26‧‧‧雷射射束非照射部分26‧‧‧ Laser beam non-illuminated part

30、40、50‧‧‧透鏡單元30, 40, 50‧ ‧ lens unit

100‧‧‧雷射加工裝置100‧‧‧ Laser processing equipment

第1圖係為本發明之實施形態1之雷射加工裝置的整體構成圖。Fig. 1 is a view showing the overall configuration of a laser processing apparatus according to a first embodiment of the present invention.

第2圖(a)及(b)係為本發明之實施形態1之用在雷射加工裝置之f θ透鏡之透鏡單元的側面剖面示意圖、及雷射射束入射之側的上面示意圖。Fig. 2(a) and Fig. 2(b) are schematic side sectional views showing a lens unit of an f θ lens used in a laser processing apparatus according to Embodiment 1 of the present invention, and a top view showing a side on which a laser beam is incident.

第3圖(a)及(b)係為本發明之實施形態2之用在雷射加工裝置之f θ透鏡之透鏡單元的側面剖面示意圖、 及雷射射束入射之側的上面示意圖。Fig. 3 (a) and (b) are schematic side sectional views showing a lens unit of an f θ lens used in a laser processing apparatus according to a second embodiment of the present invention; And the upper schematic view of the side on which the laser beam is incident.

第4圖(a)及(b)係為本發明之實施形態3之用在雷射加工裝置之f θ透鏡之透鏡單元的側面剖面示意圖、及該側面剖面示意圖中之A-A剖面的示意圖。Fig. 4 (a) and (b) are a schematic side sectional view showing a lens unit of an f θ lens used in a laser processing apparatus according to a third embodiment of the present invention, and a schematic view showing an A-A cross section in the side sectional view.

第5圖(a)及(b)係為本發明之實施形態3之用在雷射加工裝置之f θ透鏡之透鏡單元的側面剖面示意圖、及該側面剖面示意圖中之A-A剖面的示意圖。Fig. 5 (a) and (b) are schematic side sectional views showing a lens unit of an f θ lens used in a laser processing apparatus according to a third embodiment of the present invention, and a schematic view showing an A-A cross section in the side sectional view.

(實施形態1)(Embodiment 1)

第1圖係為本發明之實施形態1之雷射加工裝置的整體構成圖。Fig. 1 is a view showing the overall configuration of a laser processing apparatus according to a first embodiment of the present invention.

如第1圖所示,本實施形態之雷射加工裝置100係具備:雷射振盪器1;第1電流鏡3a;第2電流鏡3b;第1電流掃描器4a;第2電流掃描器4b;由透鏡單元所構成的f θ透鏡5;XY平台7;電流驅動器8;及控制裝置9。As shown in Fig. 1, the laser processing apparatus 100 of the present embodiment includes a laser oscillator 1, a first current mirror 3a, a second current mirror 3b, a first current scanner 4a, and a second current scanner 4b. An f θ lens 5 composed of a lens unit; an XY stage 7; a current driver 8; and a control device 9.

第1電流鏡3a係用以使從雷射振盪器1朝水平方向輸出的雷射射束2在水平面內偏向者。The first current mirror 3a is for biasing the laser beam 2 output from the laser oscillator 1 in the horizontal direction in the horizontal plane.

第2電流鏡3b係用以使在第1電流鏡3a偏向的雷射射束2進一步在垂直面內偏向者。The second current mirror 3b is for biasing the laser beam 2 deflected by the first current mirror 3a further in the vertical plane.

第1電流掃描器4a係用以驅動第1電流鏡3a者,而第2電流掃描器4b係用以驅動第2電流鏡3b者。The first current scanner 4a is for driving the first current mirror 3a, and the second current scanner 4b is for driving the second current mirror 3b.

f θ透鏡5係用以接受在第2電流鏡3b偏向的雷射射束2入射且將該入射的雷射射束2朝向要加工之對象物(簡稱工件(work))6上大致垂直地聚光照射者。The f θ lens 5 is configured to receive the laser beam 2 deflected by the second current mirror 3b and to direct the incident laser beam 2 toward the object to be processed (abbreviated as workpiece) 6 substantially vertically. Spotlights.

XY平台7係用以載置工件6且在水平面內移動動作者。The XY stage 7 is used to mount the workpiece 6 and move the actor in a horizontal plane.

電流驅動器8係用以驅動第1、第2電流掃描器4a、4b者。The current driver 8 is for driving the first and second current scanners 4a and 4b.

控制裝置9係用以控制雷射振盪器1與電流驅動器8與XY平台7者。The control device 9 is for controlling the laser oscillator 1 and the current driver 8 and the XY stage 7.

在第1圖中,箭頭X係顯示在XY平台7之水平面內之一方的移動方向,而箭頭Y係顯示在XY平台7之水平面內之相對於X方向為垂直方向的另一方的移動方向。再者,X、Y之各方向亦為工件6的加工方向。In Fig. 1, the arrow X shows the direction of movement in one of the horizontal planes of the XY stage 7, and the arrow Y shows the direction of movement of the other side in the horizontal plane with respect to the X direction in the horizontal plane of the XY stage 7. Furthermore, the directions of X and Y are also the processing directions of the workpiece 6.

此外,在本實施形態的雷射加工裝置100中,係於f θ透鏡5設有溫度檢測器14(請參照第2圖),而溫度檢測器14與控制裝置9係以信號線10連接。再者,控制裝置9係根據從溫度檢測器14所輸入的溫度信號控制電流驅動器8,藉此來控制第1、第2電流掃描器4a、4b。Further, in the laser processing apparatus 100 of the present embodiment, the temperature detector 14 is provided in the f θ lens 5 (see FIG. 2), and the temperature detector 14 and the control device 9 are connected by the signal line 10. Further, the control device 9 controls the first driver and the second current scanners 4a and 4b based on the temperature signal input from the temperature detector 14 to control the current driver 8.

以下將第1、第2電流鏡3a、3b、第1、第2電流掃描器4a、4b、及電流驅動器8整體稱為電流機構。Hereinafter, the first and second current mirrors 3a and 3b, the first and second current scanners 4a and 4b, and the current driver 8 are collectively referred to as a current mechanism.

第2圖(a)係為本發明之實施形態1之用在雷射加工裝置之f θ透鏡5之透鏡單元的側面剖面示意圖,第2圖(b)係為接受雷射射束2入射之側之透鏡單元的上面示意圖。Fig. 2(a) is a side cross-sectional view showing a lens unit of the f θ lens 5 used in the laser processing apparatus according to the first embodiment of the present invention, and Fig. 2(b) is a view of receiving the incident of the laser beam 2. The upper schematic view of the side lens unit.

如第2圖(a)所示,本實施形態之用在f θ透鏡的透鏡單元20係具備第1光學透鏡11a及第2光學透鏡11b、保護窗(window)12、鏡筒13、及2個溫度檢測器14。As shown in Fig. 2(a), the lens unit 20 used in the f θ lens of the present embodiment includes the first optical lens 11a and the second optical lens 11b, the window 12, the lens barrel 13, and the second lens. Temperature detectors 14.

第1光學透鏡11a及第2光學透鏡11b係隔開預定的間隔配置成2段。The first optical lens 11a and the second optical lens 11b are arranged in two stages at predetermined intervals.

保護窗12係具有雷射射束2可穿透的構成。再者,對第2光學透鏡11b以隔開預定間隔方式配置,來保護光學透鏡11a、11b。The protective window 12 has a configuration in which the laser beam 2 is permeable. Further, the second optical lenses 11b are disposed at predetermined intervals to protect the optical lenses 11a and 11b.

鏡筒13係用以保持光學透鏡11a、11b及保護窗12者。The lens barrel 13 is for holding the optical lenses 11a, 11b and the protective window 12.

2個溫度檢測器14係設置在第1光學透鏡11a之接受雷射射束2入射之側的表面。The two temperature detectors 14 are provided on the surface of the first optical lens 11a on the side where the laser beam 2 is incident.

再者,如第2圖(b)所示,溫度檢測器14係設置在通過第1光學透鏡11a之中心點(表面之圓的中心)之弦之兩端部的各者。Further, as shown in Fig. 2(b), the temperature detector 14 is provided at each of both end portions of the chord passing through the center point (the center of the circle of the surface) of the first optical lens 11a.

之後說明中所使用的「弦」,只要未特別指定,均為通過光學透鏡之中心點的弦,而「弦的兩端部」則係指雷射射束非照射部分16中,位於弦之兩端附近的區域。The "chord" used in the following description is a string that passes through the center point of the optical lens unless otherwise specified, and "the both ends of the string" refers to the non-irradiated portion 16 of the laser beam, which is located in the string. The area near the ends.

以下將第1光學透鏡11a與第2光學透鏡11b與保護窗12整體稱為光學系統零件群。Hereinafter, the entire first optical lens 11a, the second optical lens 11b, and the protective window 12 will be referred to as an optical system component group.

此外,第1光學透鏡11a與第2光學透鏡11b時則總稱為光學透鏡。Further, the first optical lens 11a and the second optical lens 11b are collectively referred to as an optical lens.

此外,在本實施形態之透鏡單元20中,係從接受第2圖(a)之上方側的雷射射束2入射之側,朝向第2圖(a)之下方側之雷射射束2出射之側,依序配置第1光學透鏡11a、第2光學透鏡11b、保護窗12。Further, in the lens unit 20 of the present embodiment, the laser beam 2 that is incident from the side on which the laser beam 2 on the upper side of the second drawing (a) is incident is directed toward the lower side of the second figure (a). On the side of the emission, the first optical lens 11a, the second optical lens 11b, and the protective window 12 are arranged in this order.

亦即,在雷射射束入射部配置有第1光學透鏡11a,而在雷射射束出射部配置有保護窗12。That is, the first optical lens 11a is disposed at the laser beam incident portion, and the protective window 12 is disposed at the laser beam exit portion.

通常,在雷射加工裝置中,由於使2個電流鏡偏向進行工件加工的範圍係為正方形,因此f θ透鏡5之光學透鏡之面中接受雷射射束照射的區域,係為正方形或長方形。Generally, in the laser processing apparatus, since the range in which the two current mirrors are biased toward the workpiece is square, the area of the optical lens of the f θ lens 5 that receives the laser beam irradiation is square or rectangular. .

因此,使用本實施形態之透鏡單元20作為f θ透鏡時,如第2圖(b)所示,2個溫度檢測器14係設在位於第1光學透鏡11a之屬於正方形或長方形之雷射射束照射區域15、及第1光學透鏡11a之圓形之外周之間的雷射射束非照射部分16。Therefore, when the lens unit 20 of the present embodiment is used as the f θ lens, as shown in Fig. 2(b), the two temperature detectors 14 are arranged in a square or rectangular laser beam located in the first optical lens 11a. The beam irradiation region 15 and the laser beam non-irradiation portion 16 between the outer circumferences of the circular shape of the first optical lens 11a.

具體而言,在第1光學透鏡11a中,位於與雷射射束照射區域15之一方之相對向之2邊正交之弦之兩端部的雷射射束非照射部分16的各者,配設有1個溫度檢測器14。Specifically, in the first optical lens 11a, each of the laser beam non-irradiation portions 16 located at both end portions of the chord orthogonal to the two sides of the one of the laser beam irradiation regions 15 is A temperature detector 14 is provided.

或者,在第1光學透鏡11a中,位於與雷射射束照射區域15之另一方之相對向之2邊正交之弦之兩端部的雷射射束非照射部分16的各者,配設有1個溫度檢測器14。Alternatively, in the first optical lens 11a, each of the laser beam non-irradiation portions 16 located at both end portions of the chord orthogonal to the other two sides of the laser beam irradiation region 15 is provided. A temperature detector 14 is provided.

此外,與雷射射束照射區域15之一方之相對向之2邊正交的方向,係與使第2電流鏡3b偏向的方向一致,而與雷射射束照射區域15之另一方之相對向之2邊正交的方向,係與使第1電流鏡3a偏向的方向一致。Further, the direction orthogonal to the two sides of the laser beam irradiation region 15 is aligned with the direction in which the second current mirror 3b is deflected, and is opposite to the other of the laser beam irradiation regions 15. The direction orthogonal to the two sides coincides with the direction in which the first current mirror 3a is deflected.

本實施形態之透鏡單元20中之第1、第2光學透鏡11a、11b,雖係為單面非球面且單面平面的透鏡,但亦可為雙面非球面形狀的透鏡、或雙面球面的透鏡,此外,亦可為凸面透鏡或凹面透鏡的任一者。The first and second optical lenses 11a and 11b in the lens unit 20 of the present embodiment are single-sided aspherical and single-sided planar lenses, but may be double-sided aspherical lenses or double-sided spherical surfaces. The lens may be any of a convex lens or a concave lens.

此外,在本實施形態之透鏡單元20中,雖係使用2片光學透鏡,但亦可使用1片光學透鏡,或亦可使用3片 以上的光學透鏡,以隔開預定間隔方式多段配置。Further, in the lens unit 20 of the present embodiment, two optical lenses are used, but one optical lens may be used, or three may be used. The above optical lenses are arranged in a plurality of stages at predetermined intervals.

此外,保護窗12的雙面係為平面。Further, the double sides of the protective window 12 are flat.

鏡筒13雖係以1個構件形成,但亦可組合複數個構件來形成。Although the lens barrel 13 is formed of one member, it may be formed by combining a plurality of members.

本實施形態之透鏡單元20,係在作為雷射加工裝置之f θ透鏡使用時,於熱容較鏡筒13小的第1光學透鏡11a中之雷射射束非照射部分16,配設有溫度檢測器14。因此,雷射射束非照射部分16接近雷射射束照射區域15,因而即使因為高能量等雷射射束2之瞬間吸收(例如msec單位精確度)而使第1光學透鏡11a的溫度瞬間上升之情形下,也可精確度良好地測量第1光學透鏡11a的溫度作為溫度信號。In the lens unit 20 of the present embodiment, when the f θ lens is used as the laser processing device, the laser beam non-irradiation portion 16 in the first optical lens 11a having a smaller heat capacity than the lens barrel 13 is disposed. Temperature detector 14. Therefore, the laser beam non-irradiation portion 16 approaches the laser beam irradiation region 15, and thus the temperature of the first optical lens 11a is instantaneous even if the laser beam 2 absorbs instantaneously (for example, msec unit accuracy) such as high energy. In the case of ascending, the temperature of the first optical lens 11a can also be accurately measured as a temperature signal.

此外,由於使用2個溫度檢測器14,因此可測量求出溫度上升之第1光學透鏡11a之平均溫度的溫度信號。Further, since the two temperature detectors 14 are used, it is possible to measure a temperature signal for determining the average temperature of the first optical lens 11a whose temperature rises.

在本實施形態中,為了測量求出第1光學透鏡11a之平均溫度的溫度信號,雖使用了2個溫度檢測器14,但亦可將2個以上的溫度檢測器14設在第1光學透鏡11a的雷射射束非照射部分16。In the present embodiment, in order to measure the temperature signal for obtaining the average temperature of the first optical lens 11a, two temperature detectors 14 are used, but two or more temperature detectors 14 may be provided in the first optical lens. The laser beam of 11a is non-irradiated portion 16.

此外,本實施形態之雷射加工裝置100係在f θ透鏡5使用了透鏡單元20,且將f θ透鏡5之第1光學透鏡11a因為瞬間吸收(例如msec單位精確度)高能量雷射射束2而溫度上升時之第1光學透鏡11a的溫度,藉由設置於第1光學透鏡11a的2個溫度檢測器14來測量。再者,藉由該雷射射束2個溫度檢測器14所測量的溫度係作為溫度信 號而輸入於控制裝置9。Further, in the laser processing apparatus 100 of the present embodiment, the lens unit 20 is used for the f θ lens 5, and the first optical lens 11a of the f θ lens 5 is absorbed by the instantaneous (for example, msec unit accuracy) high-energy laser beam. The temperature of the first optical lens 11a when the temperature is increased by the beam 2 is measured by the two temperature detectors 14 provided in the first optical lens 11a. Furthermore, the temperature measured by the two laser detectors 14 is used as the temperature signal. The number is input to the control device 9.

再者,控制裝置9係根據從2個溫度檢測器14所輸入的溫度信號,求出第1光學透鏡11a之溫度上升前後的溫度差(以下稱上升溫度)的平均值。Furthermore, the control device 9 obtains the average value of the temperature difference (hereinafter referred to as the rising temperature) before and after the temperature rise of the first optical lens 11a based on the temperature signals input from the two temperature detectors 14.

再者,控制裝置9係根據光學透鏡11a之上升溫度的平均值來控制電流驅動器8,藉此來控制第1、第2電流掃描器4a、4b。Further, the control device 9 controls the current driver 8 based on the average value of the rising temperatures of the optical lenses 11a, thereby controlling the first and second current scanners 4a and 4b.

亦即,在本實施形態之雷射加工裝置100中,係將起自雷射射束2之因為伴隨著光學零件群之溫度上升所產生之折射率變化所引起之雷射射束2之工件6之加工位置(稱為聚光點位置)的偏移,代表性地測量第1光學透鏡11a的平均溫度,且藉由根據此溫度信號來控制第1、第2電流掃描器4a、4b進行修正。That is, in the laser processing apparatus 100 of the present embodiment, the workpiece of the laser beam 2 caused by the change in the refractive index caused by the temperature rise of the optical component group from the laser beam 2 is obtained. The offset of the processing position (referred to as the condensed spot position) of 6 is representatively measured for the average temperature of the first optical lens 11a, and the first and second current scanners 4a, 4b are controlled by the temperature signal. Corrected.

茲說明本實施形態之雷射加工裝置100修正伴隨著f θ透鏡5中之光學系統零件群之溫度上升所產生之雷射射束2之聚光點位置的偏移的具體方法。It is to be noted that the laser processing apparatus 100 according to the present embodiment corrects a method of shifting the position of the condensed spot of the laser beam 2 caused by the temperature rise of the optical system component group in the f θ lens 5.

首先,將工件6之各加工點之X方向之修正量資料△X(X、Y、△ta)、及Y方向之修正量資料△Y(X、Y、△ta)保持於控制裝置9作為初期資料,該等修正量資料係從第1光學透鏡11a之上升溫度之平均值為△ta時所產生之雷射射束2之聚光點位置的偏移所求出者。First, the correction amount data ΔX (X, Y, Δta) in the X direction of each processing point of the workpiece 6 and the correction amount data ΔY (X, Y, Δta) in the Y direction are held in the control device 9 as In the initial data, the correction amount data is obtained by shifting the position of the condensed spot of the laser beam 2 generated when the average value of the rising temperature of the first optical lens 11a is Δta.

接著,以2個溫度檢測器14來測量在雷射加工裝置100將工件6進行雷射加工時之第1光學透鏡11a的溫度作為溫度資料,且以該溫度資料為溫度信號而輸入於控制 裝置9,來求出上升溫度的平均值△Ta。Next, the temperature of the first optical lens 11a when the laser processing device 100 performs laser processing on the workpiece 6 is measured as temperature data by the two temperature detectors 14, and the temperature data is input as a temperature signal. The device 9 calculates the average value ΔTa of the rising temperature.

接著,使用預先保持在控制裝置9之工件6之加工點的修正量資料,來算出△ta=△Ta時之X方向之修正量資料△X(X、Y、△Ta)與Y方向之修正量資料△Y(X、Y、△Ta)。Next, using the correction amount data of the machining point of the workpiece 6 held in advance by the control device 9, the correction amount data ΔX (X, Y, ΔTa) and the correction of the Y direction in the X direction when Δta = ΔTa are calculated. The quantity data △ Y (X, Y, ΔTa).

接著,以X方向之修正量資料△X(X、Y、△Ta)來修正修正前之位置偏移之雷射射束2之聚光點之X方向的位置Xs,使雷射射束2之聚光點之X方向的位置成為下述(1)式所示之Xr。Next, the X-direction position Xs of the condensed spot of the laser beam 2 before the correction is corrected by the correction amount data ΔX (X, Y, ΔTa) in the X direction, so that the laser beam 2 is made. The position in the X direction of the light collecting point is Xr shown by the following formula (1).

同時,將修正前之位置偏移之雷射射束2之聚光點之Y方向的位置Ys以Y方向之修正量資料△Y(X、Y、△Ta)來修正,使雷射射束2之聚光點之Y方向的位置成為下述(2)式所示之Yr。At the same time, the position Ys in the Y direction of the condensed spot of the laser beam 2 before the correction is corrected by the correction amount data ΔY (X, Y, ΔTa) in the Y direction to make the laser beam The position in the Y direction of the light collecting point of 2 is Yr shown by the following formula (2).

換言之,以使雷射射束2之聚光點之X方向的位置成為Xr、Y方向的位置成為Yr之方式控制第1、第2電流掃描器4a、4b,來修正雷射射束2之聚光點位置的偏移。In other words, the first and second current scanners 4a and 4b are controlled such that the position of the condensed spot of the laser beam 2 in the X direction is Yr and the position in the Y direction is Yr, and the laser beam 2 is corrected. The offset of the spot position.

Xr=Xs+△X(X、Y、△Ta) (1)Xr=Xs+△X(X,Y,△Ta) (1)

Yr=Ys+△Y(X、Y、△Ta) (2)Yr=Ys+△Y(X,Y,△Ta) (2)

亦即,雷射射束2之聚光點位置之偏移的修正,係藉由控制、修正電流機構的動作來實施。That is, the correction of the offset of the position of the focused spot of the laser beam 2 is performed by controlling and correcting the operation of the current mechanism.

實際上,係加上從溫度資料預測的位置偏移,且為使照射至所希望的位置,藉由將以修正量資料修正後的目標位置從控制裝置9輸出至電流驅動器8,且從電流驅動器8指示第1、第2電流掃描器4a、4b來進行。Actually, the positional deviation predicted from the temperature data is added, and in order to illuminate to the desired position, the target position corrected by the correction amount data is output from the control device 9 to the current driver 8, and the current is supplied. The driver 8 instructs the first and second current scanners 4a and 4b to perform the operation.

由於本實施形態之雷射加工裝置100即使是在高能量雷射輸出下的加工亦可修正雷射射束2的聚光點位置的偏移,因此可進行高精確度之工件6的雷射加工。Since the laser processing apparatus 100 of the present embodiment can correct the shift of the position of the condensed spot of the laser beam 2 even under the processing of the high-energy laser output, the laser of the workpiece 6 with high precision can be performed. machining.

在本實施形態中,控制裝置9亦可根據從溫度檢測器14所輸入的溫度信號來控制XY平台7。In the present embodiment, the control device 9 can also control the XY stage 7 based on the temperature signal input from the temperature detector 14.

此外,在本實施形態中,亦可將設在第1光學透鏡11a之雷射射束非照射部分16的溫度檢測器14設為2個以上,由控制裝置9根據將來自該等複數個溫度檢測器14之溫度信號輸入至控制裝置9所獲得之上升溫度的平均值,來控制第1、第2電流掃描器4a、4b進行修正。Further, in the present embodiment, the temperature detectors 14 provided in the laser beam non-irradiation portion 16 of the first optical lens 11a may be two or more, and the control device 9 may be based on the plurality of temperatures. The temperature signal of the detector 14 is input to the average value of the rising temperatures obtained by the control device 9, and the first and second current scanners 4a and 4b are controlled to perform correction.

在本實施形態中,雖係使用第1、第2電流鏡3a、3b作為使雷射射束2偏向的機構,但只要是使雷射射束2偏向的機構,則不限定於此。In the present embodiment, the first and second current mirrors 3a and 3b are used as the mechanism for deflecting the laser beam 2. However, the mechanism is not limited thereto as long as it is a mechanism for deflecting the laser beam 2.

(實施形態2)(Embodiment 2)

第3圖(a)係為本發明之實施形態2之用在雷射加工裝置之f θ透鏡之透鏡單元之側面剖面示意圖,第3圖(b)係為雷射射束入射之側之透鏡單元之上面示意圖(b)。Fig. 3(a) is a side cross-sectional view showing a lens unit of an f θ lens used in a laser processing apparatus according to a second embodiment of the present invention, and Fig. 3(b) is a lens of a side on which a laser beam is incident. Figure (b) above the unit.

如第3圖所示,本實施形態之用在f θ透鏡之透鏡單元30,除在接受第1光學透鏡11a之雷射射束2入射之側的表面設有4個溫度檢測器以外,均與實施形態1之透鏡單元20相同。As shown in Fig. 3, the lens unit 30 used in the f θ lens of the present embodiment is provided with four temperature detectors on the surface on the side where the laser beam 2 of the first optical lens 11a is incident. The same as the lens unit 20 of the first embodiment.

再者,如第3圖(b)所示,第1、第2、第3、第4溫度檢測器14a、14b、14c、14d係設置在第1光學透鏡11a中之彼此正交之2條弦之兩端部的各者。Further, as shown in FIG. 3(b), the first, second, third, and fourth temperature detectors 14a, 14b, 14c, and 14d are two orthogonal to each other disposed in the first optical lens 11a. Each of the two ends of the string.

使用本實施形態之透鏡單元30作為f θ透鏡時,如第3圖(b)所示,4個溫度檢測器係設在位於第1光學透鏡11a之屬於正方形或長方形之雷射射束照射區域15、與第1光學透鏡11a之圓形之外周之間的雷射射束非照射部分16。When the lens unit 30 of the present embodiment is used as the f θ lens, as shown in FIG. 3( b ), four temperature detectors are disposed in a laser beam irradiation region belonging to a square or a rectangle which is located in the first optical lens 11 a. 15. A laser beam non-irradiation portion 16 between the outer circumference of the circular shape of the first optical lens 11a.

例如,在第1光學透鏡11a中,第1溫度檢測器14a係設置在相當於時鐘文字板中之12時之位置的雷射射束非照射部分16。For example, in the first optical lens 11a, the first temperature detector 14a is provided in a laser beam non-irradiation portion 16 at a position corresponding to 12 o'clock in the dial pad.

第2溫度檢測器14b係設置在相當於時鐘文字板中之6時之位置的雷射射束非照射部分16。The second temperature detector 14b is provided in a laser beam non-irradiation portion 16 at a position corresponding to 6 o'clock in the dial pad.

第3溫度檢測器14c係設置在相當於時鐘文字板中之9時之位置的雷射射束非照射部分16。The third temperature detector 14c is provided in a laser beam non-irradiation portion 16 at a position corresponding to 9 o'clock in the dial pad.

第4溫度檢測器14d係設置在相當於時鐘文字板中之3時之位置的雷射射束非照射部分16。The fourth temperature detector 14d is provided in a laser beam non-irradiation portion 16 at a position corresponding to 3 o'clock in the dial pad.

亦即,本實施形態之透鏡單元30係以與通過第1溫度檢測器14a與第2溫度檢測器14b之弦(以下記為D1)、及通過第3溫度檢測器14c與第4溫度檢測器14d之弦(以下記為D2)正交之方式,在第1光學透鏡11a配置有各溫度檢測器。That is, the lens unit 30 of the present embodiment is connected to the string passing through the first temperature detector 14a and the second temperature detector 14b (hereinafter referred to as D1), and the third temperature detector 14c and the fourth temperature detector. Each of the temperature detectors is disposed in the first optical lens 11a such that the 14d string (hereinafter referred to as D2) is orthogonal.

再者,與D1平行的方向,係與使第1電流鏡3a偏向的方向一致,而與D2平行的方向,係與使第2電流鏡3b偏向的方向一致。Further, the direction parallel to D1 coincides with the direction in which the first current mirror 3a is deflected, and the direction parallel to D2 coincides with the direction in which the second current mirror 3b is deflected.

本實施形態之透鏡單元30,亦在作為雷射加工裝置之f θ透鏡使用之情形下,於熱容較鏡筒13小的第1光學透 鏡11a中之雷射射束非照射部分16,配設有第1、第2、第3、第4溫度檢測器14a、14b、14c、14d。藉此,雷射射束非照射部分16即接近雷射射束照射區域15,因此即使第1光學透鏡11a之溫度因為高能量雷射射束2之瞬間吸收(例如msec單位精確度)而瞬間上升時,也可精確度良好地測量第1光學透鏡11a的溫度作為溫度信號。In the case where the lens unit 30 of the present embodiment is used as an f θ lens of a laser processing apparatus, the first optical transmission is smaller than the lens barrel 13 in the heat capacity. The laser beam non-irradiation portion 16 in the mirror 11a is provided with first, second, third, and fourth temperature detectors 14a, 14b, 14c, and 14d. Thereby, the laser beam non-irradiation portion 16 is close to the laser beam irradiation region 15, so that even if the temperature of the first optical lens 11a is absorbed by the moment of the high-energy laser beam 2 (for example, msec unit accuracy), it is instantaneous. At the time of ascent, the temperature of the first optical lens 11a can also be accurately measured as a temperature signal.

尤其因為4個溫度檢測器係設置在第1光學透鏡11a的雷射射束非照射部分16,因此在控制裝置9所求出之第1光學透鏡11a之上升溫度之平均值的參差不齊較小,可更進一步提升上升溫度的測量精確度。In particular, since four temperature detectors are provided in the laser beam non-irradiation portion 16 of the first optical lens 11a, the average value of the rising temperatures of the first optical lenses 11a obtained by the control device 9 is uneven. Small, can further improve the measurement accuracy of the rising temperature.

此外,本實施形態之透鏡單元30係在第1光學透鏡11a的正交之2條弦中之一方之弦D1的兩端部配置有第1溫度檢測器14a與第2溫度檢測器14b,且在另一弦D2的兩端部配置有第3溫度檢測器14c與第4溫度檢測器14d。Further, in the lens unit 30 of the present embodiment, the first temperature detector 14a and the second temperature detector 14b are disposed at both ends of the chord D1 of one of the two orthogonal strings of the first optical lens 11a, and The third temperature detector 14c and the fourth temperature detector 14d are disposed at both ends of the other string D2.

因此,可從第1光學透鏡11a之溫度上升所形成之第1溫度檢測器14a的溫度信號與第2溫度檢測器14b的溫度信號,求出在D1方向的溫度分布。再者,可從第3溫度檢測器14c的溫度信號與第4溫度檢測器14d的溫度信號,求出D2方向的溫度分布。Therefore, the temperature distribution in the D1 direction can be obtained from the temperature signal of the first temperature detector 14a and the temperature signal of the second temperature detector 14b which are formed by the temperature rise of the first optical lens 11a. Further, the temperature distribution in the D2 direction can be obtained from the temperature signal of the third temperature detector 14c and the temperature signal of the fourth temperature detector 14d.

本實施形態之雷射加工裝置,除在f θ透鏡5使用透鏡單元30以外,均與實施形態1的雷射加工裝置相同。The laser processing apparatus of the present embodiment is the same as the laser processing apparatus of the first embodiment except that the lens unit 30 is used for the f θ lens 5.

本實施形態之雷射加工裝置係在f θ透鏡5使用透鏡單元30者,且由f θ透鏡5之第1光學透鏡11a瞬間吸收(例如msec單位精確度)高能量雷射射束2,並將溫度上 升時之第1光學透鏡11a的溫度,以第1、第2、第3、第4溫度檢測器14a、14b、14c、14d來測量。再者,該等溫度係作為溫度信號輸入至控制裝置9。In the laser processing apparatus of the present embodiment, the lens unit 30 is used in the f θ lens 5, and the high-energy laser beam 2 is instantaneously absorbed (for example, msec unit accuracy) by the first optical lens 11a of the f θ lens 5, and Will be on temperature The temperature of the first optical lens 11a at the time of rising is measured by the first, second, third, and fourth temperature detectors 14a, 14b, 14c, and 14d. Furthermore, these temperatures are input to the control device 9 as temperature signals.

此外,在本實施形態之雷射加工裝置中,控制裝置9係根據所輸入之來自第1、第2、第3、第4溫度檢測器14a、14b、14c、14d的各溫度信號,而求出第1光學透鏡11a的上升溫度的平均值。Further, in the laser processing apparatus of the present embodiment, the control device 9 seeks based on the input temperature signals from the first, second, third, and fourth temperature detectors 14a, 14b, 14c, and 14d. The average value of the rising temperature of the first optical lens 11a is obtained.

此外,控制裝置9係從所輸入之第1溫度檢測器14a的溫度信號與第2溫度檢測器14b的溫度信號,求出第1光學透鏡11a之D1方向的溫度分布。再者,從所輸入之第3溫度檢測器14c的溫度信號與第4溫度檢測器14d的溫度信號,求出第1光學透鏡11a之D2方向的溫度分布。Further, the control device 9 obtains the temperature distribution in the D1 direction of the first optical lens 11a from the temperature signal of the first temperature detector 14a and the temperature signal of the second temperature detector 14b. Further, the temperature distribution in the D2 direction of the first optical lens 11a is obtained from the temperature signal of the third temperature detector 14c that is input and the temperature signal of the fourth temperature detector 14d.

在本實施形態之雷射加工裝置中,係將起自雷射射束2之因為伴隨著光學零件群之溫度上升所產生之折射率變化所引起之雷射射束2之聚光點位置的偏移,代表性地求為第1光學透鏡11a之上升溫度的平均值資料。再者,根據該資料來控制第1、第2電流掃描器4a、4b進行修正。In the laser processing apparatus of the present embodiment, the position of the focused spot of the laser beam 2 caused by the change in the refractive index caused by the temperature rise of the optical component group is derived from the laser beam 2 The offset is typically obtained as an average value of the rise temperature of the first optical lens 11a. Further, the first and second current scanners 4a and 4b are controlled to perform correction based on the data.

此外,在本實施形態之雷射加工裝置中,係使f θ透鏡5之第1光學透鏡11a中之D1之方向與工件6的X方向一致,且使D2的方向與工件6的Y方向一致。Further, in the laser processing apparatus of the present embodiment, the direction of D1 in the first optical lens 11a of the f θ lens 5 coincides with the X direction of the workpiece 6, and the direction of D2 coincides with the Y direction of the workpiece 6. .

藉此,即可將將起自雷射射束2之因為伴隨著光學零件群之與工件6之X方向相同方向之溫度分布及與工件之Y方向相同方向之溫度分布所產生之折射率變化所引起之雷射射束2之聚光點位置的偏移,藉由代表性地求出第1 光學透鏡11a之D1方向的溫度分布資料與D2方向之溫度分布資料,且根據此資料來控制第1、第2電流掃描器4a、4b進行修正。Thereby, the refractive index change from the laser beam 2 due to the temperature distribution in the same direction as the X direction of the workpiece 6 and the temperature distribution in the same direction as the Y direction of the workpiece can be obtained from the laser beam 2 The offset of the position of the condensed spot of the laser beam 2 caused by the representative first The temperature distribution data in the D1 direction of the optical lens 11a and the temperature distribution data in the D2 direction are used to control the first and second current scanners 4a and 4b to perform correction based on the data.

茲說明本實施形態之雷射加工裝置修正伴隨著f θ透鏡5之光學系統零件群之溫度上升所產生之雷射射束2之聚光點位置之偏移的具體方法。A specific method for correcting the shift of the position of the condensed spot of the laser beam 2 caused by the temperature rise of the optical system component group of the f θ lens 5 will be described in the laser processing apparatus according to the present embodiment.

首先,將各加工點之X方向之修正量資料△X(X、Y、△ta)、及Y方向之修正量資料△Y(X、Y、△ta)保持於控制裝置9作為初期資料,該等修正量資料係從第1光學透鏡11a之上升溫度之平均值為△ta時所產生之雷射射束2之聚光點位置的偏移所求出者。First, the correction amount data ΔX (X, Y, Δta) in the X direction and the correction amount data ΔY (X, Y, Δta) in the Y direction are held in the control device 9 as initial data. The correction amount data is obtained by shifting the position of the condensed spot of the laser beam 2 generated when the average value of the rising temperature of the first optical lens 11a is Δta.

此外,將工件6之各加工點之X方向之修正量資料△Xx(X、Y、△tx)、及Y方向之修正量資料△Yx(X、Y、△tx)保持於控制裝置9,該等修正量資料係從第1光學透鏡11a中之因為D1方向亦即X方向之溫度分布△tx所產生之雷射射束聚光點位置的偏移所求出者。Further, the correction amount data ΔXx (X, Y, Δtx) in the X direction of each machining point of the workpiece 6 and the correction amount data ΔYx (X, Y, Δtx) in the Y direction are held in the control device 9, The correction amount data is obtained from the offset of the position of the laser beam condensing point due to the temperature distribution Δtx in the X direction of the first optical lens 11a.

再者,將各加工點之X方向之修正量資料△Xy(X、Y、△ty)、及Y方向之修正量資料△Yy(X、Y、△ty)保持於控制裝置9,該等修正量資料係從因為D2方向亦即Y方向之溫度分布△ty所產生之雷射射束聚光點位置的偏移所求出者。Further, the correction amount data ΔXy (X, Y, Δty) in the X direction and the correction amount data ΔYy (X, Y, Δty) in the Y direction are held in the control device 9, and the like The correction amount data is obtained from the offset of the position of the laser beam condensing point due to the temperature distribution Δty in the D2 direction, that is, the Y direction.

接著,在雷射加工裝置中,以將工件6進行雷射加工時之第1光學透鏡11a中之第1、第2、第3、第4溫度檢測器14a、14b、14c、14d來測量溫度,且將該溫度資料輸 入於控制裝置9,來求出上升溫度的平均值△Ta。Next, in the laser processing apparatus, the temperature is measured by the first, second, third, and fourth temperature detectors 14a, 14b, 14c, and 14d in the first optical lens 11a when the workpiece 6 is subjected to laser processing. And the temperature data is lost The control device 9 is used to obtain the average value ΔTa of the rising temperature.

此外,從在第1溫度檢測器14a與第2溫度檢測器14b所測得的溫度求出第1光學透鏡11a中之X方向的溫度分布△Tx,且從在第3溫度檢測器14c與第4溫度檢測器14d所測得的溫度來求出第1光學透鏡11a中之Y方向的溫度分布△Ty。Further, the temperature distribution ΔTx in the X direction of the first optical lens 11a is obtained from the temperature measured by the first temperature detector 14a and the second temperature detector 14b, and the third temperature detector 14c and the The temperature distribution ΔTy in the Y direction of the first optical lens 11a is obtained by the temperature measured by the temperature detector 14d.

接著使用預先保持於控制裝置9之加工點的修正量資料,算出△ta=△Ta時之X方向之修正量資料△X(X、Y、△Ta)與Y方向之修正量資料△Y(X、Y、△Ta)。Then, using the correction amount data held in advance at the processing point of the control device 9, the correction amount data ΔX (X, Y, ΔTa) in the X direction and the correction amount data ΔY in the Y direction when Δta = ΔTa are calculated ( X, Y, ΔTa).

此外,算出△tx=△Tx時之X方向之修正量資料△Xx(X、Y、△Tx)與Y方向之修正量資料△Yx(X、Y、△Tx)。Further, the correction amount data ΔXx (X, Y, ΔTx) in the X direction and the correction amount data ΔYx (X, Y, ΔTx) in the Y direction when Δtx = ΔTx are calculated.

此外,算出△ty=△Ty時之X方向之修正量資料△Xy(X、Y、△Ty)與Y方向之修正量資料△Yy(X、Y、△Ty)。Further, the correction amount data ΔXy (X, Y, ΔTy) in the X direction and the correction amount data ΔYy (X, Y, ΔTy) in the Y direction when Δty = ΔTy are calculated.

接著,將修正前之位置偏移之雷射射束聚光點之X方向的位置Xs,以X方向之修正量資料、△X(X、Y、△Ta)與△Xx(X、Y、△Tx)與△Xy(X、Y、△Ty)來修正,而雷射射束聚光點之X方向的位置即成為如下述(3)式所示的Xr。Next, the X-direction position Xs of the laser beam condensing point before the correction is corrected by the X-direction correction amount data, ΔX (X, Y, ΔTa) and ΔXx (X, Y, ΔTx) and ΔXy (X, Y, ΔTy) are corrected, and the position of the laser beam condensing point in the X direction is Xr as shown in the following formula (3).

同時,將修正前之位置偏移之雷射射束聚光點之Y方向的位置Ys,以Y方向之修正量資料、△Y(X、Y、△Ta)與△Yx(X、Y、△Tx)與△Yy(X、Y、△Ty)來修正,而雷射射束聚光點之Y方向的位置即成為如下述(4)式 所示的Yr。At the same time, the Y-direction position Ys of the laser beam condensing point before the correction is corrected, and the correction amount data in the Y direction, ΔY (X, Y, ΔTa) and ΔYx (X, Y, ΔTx) and ΔYy (X, Y, ΔTy) are corrected, and the position of the laser beam condensing point in the Y direction is as follows (4) Yr shown.

亦即,以雷射射束聚光點之X方向的位置成為Xr、Y方向的位置成為Yr之方式控制第1、第2電流掃描器4a、4b,來修正雷射射束聚光點位置的偏移。In other words, the first and second current scanners 4a and 4b are controlled such that the position in the X direction of the laser beam condensing point is Yr and the position in the Y direction is Yr, thereby correcting the position of the laser beam condensing point. Offset.

Xr=Xs+△X(X、Y、△Ta)+△Xx(X、Y、△Tx)+△Xy(X、Y、△Ty) (3)Xr=Xs+△X(X,Y,△Ta)+△Xx(X,Y,△Tx)+△Xy(X,Y,△Ty) (3)

Yr=Ys+△Y(X、Y、△Ta)+△Yx(X、Y、△Tx)+△Yy(X、Y、△Ty) (4)Yr=Ys+△Y(X,Y,△Ta)+△Yx(X,Y,△Tx)+△Yy(X,Y,△Ty) (4)

換言之,雷射射束聚光點位置之偏移的修正,係藉由控制裝置9來控制修正電流機構的動作而實施。In other words, the correction of the offset of the position of the laser beam condensing point is performed by the control device 9 controlling the operation of the correction current mechanism.

實際上,係加上從溫度資料預測的位置偏移,且為使照射至所希望的位置,藉由將以修正量資料所修正的目標位置從控制裝置9輸出至電流驅動器8,且從電流驅動器8指示第1、第2電流掃描器4a、4b來進行。Actually, the positional deviation predicted from the temperature data is added, and in order to illuminate to the desired position, the target position corrected by the correction amount data is output from the control device 9 to the current driver 8, and the current is supplied. The driver 8 instructs the first and second current scanners 4a and 4b to perform the operation.

由於本實施形態之雷射加工裝置即使是在高能量雷射輸出下的加工亦可更精確度良好地修正雷射射束聚光點位置的偏移,因此可進行更高精確度的雷射加工。Since the laser processing apparatus of the present embodiment can correct the offset of the position of the laser beam condensing point more accurately even under the processing of the high-energy laser output, a laser with higher precision can be performed. machining.

在本實施形態中,控制裝置9亦可根據從第1、第2、第3、第4溫度檢測器14a、14b、14c、14d所輸入的溫度信號來控制XY平台7。In the present embodiment, the control device 9 can also control the XY stage 7 based on the temperature signals input from the first, second, third, and fourth temperature detectors 14a, 14b, 14c, and 14d.

在本實施形態中,雖係在透鏡單元30的第1光學透鏡11a設置4個溫度檢測器的第1、第2、第3、第4溫度檢測器14a、14b、14c、14d,但亦可在第1光學透鏡11a中之弦的兩端部,亦即與第1光學透鏡11a之中心對稱的位 置,僅設置各一個,亦即合計2個溫度檢測器。In the present embodiment, the first, second, third, and fourth temperature detectors 14a, 14b, 14c, and 14d of the four temperature detectors are provided in the first optical lens 11a of the lens unit 30. Both ends of the chord in the first optical lens 11a, that is, bits symmetrical with the center of the first optical lens 11a Set, only one is set, that is, a total of two temperature detectors.

此外,只要可測量與第1光學透鏡11a之D1方向平行之方向的溫度分布及與D2方向平行之方向的溫度分布,則亦可設置4個以上的溫度檢測器。Further, as long as the temperature distribution in the direction parallel to the D1 direction of the first optical lens 11a and the temperature distribution in the direction parallel to the D2 direction can be measured, four or more temperature detectors may be provided.

此外,雖使用第1、第2電流鏡3a、3b作為使雷射射束2偏向的機構,但只要是使雷射射束2偏向的機構,則不予限定。Further, although the first and second current mirrors 3a and 3b are used as the mechanism for deflecting the laser beam 2, the mechanism is not limited as long as it is a mechanism for deflecting the laser beam 2.

(實施形態3)(Embodiment 3)

第4圖(a)係為本發明之實施形態3之用在雷射加工裝置之f θ透鏡之透鏡單元之側面剖面示意圖,第4圖(b)係為該側面剖面示意圖中之透鏡單元之A-A剖面的示意圖。Fig. 4(a) is a side cross-sectional view showing a lens unit of an f θ lens used in a laser processing apparatus according to a third embodiment of the present invention, and Fig. 4(b) is a lens unit in the side sectional view. Schematic diagram of the AA profile.

如第4圖所示,本實施形態之用在f θ透鏡之透鏡單元40,除在接受第2光學透鏡11b之雷射射束2入射之側的表面設有2個溫度檢測器14以外,均與實施形態1之透鏡單元20相同。As shown in Fig. 4, the lens unit 40 used in the f θ lens of the present embodiment is provided with two temperature detectors 14 on the surface on the side where the laser beam 2 of the second optical lens 11b is incident. Both are the same as the lens unit 20 of the first embodiment.

再者,如第4圖(b)所示,溫度檢測器14係設置在通過第2光學透鏡11b之中心點之弦之兩端部的各者。Further, as shown in Fig. 4(b), the temperature detector 14 is provided at each of both end portions of the chord passing through the center point of the second optical lens 11b.

使用本實施形態之透鏡單元40作為f θ透鏡時,如第4圖(b)所示,接受第2光學透鏡11b之面中之雷射射束2照射的區域,係為正方形或長方形。When the lens unit 40 of the present embodiment is used as the f θ lens, as shown in FIG. 4( b ), the region irradiated by the laser beam 2 on the surface of the second optical lens 11 b is a square or a rectangle.

因此,2個溫度檢測器14係設在位於第2光學透鏡11b之面中之雷射射束照射區域25、及第2光學透鏡11b之圓形之外周之間的雷射射束非照射部分26。Therefore, the two temperature detectors 14 are provided in the laser beam non-irradiation portion between the laser beam irradiation region 25 located on the surface of the second optical lens 11b and the circular outer circumference of the second optical lens 11b. 26.

具體而言,係在第2光學透鏡11b中之位於與雷射射束照射區域25之一方之相對向之2邊正交之弦之兩端部之雷射射束非照射部分26的各者,配設一個溫度檢測器14。Specifically, each of the laser beam non-irradiation portions 26 located at both ends of the chord orthogonal to the two sides of the laser beam irradiation region 25 is located in the second optical lens 11b. A temperature detector 14 is provided.

或者,在第2光學透鏡11b中之位於與雷射射束照射區域25之另一方之相對向之2邊正交之弦之兩端部之雷射射束非照射部分26的各者,配設一個溫度檢測器14。Alternatively, each of the laser beam non-irradiation portions 26 of the second optical lens 11b located at both ends of the chord orthogonal to the other of the two sides of the laser beam irradiation region 25 is provided. A temperature detector 14 is provided.

此外,雷射射束照射區域25中之與一方之相對向之2邊正交的方向係與使第2電流鏡3b偏向的方向一致,而與另一方之相對向之2邊正交的方向係與使第1電流鏡3a偏向的方向一致。Further, the direction orthogonal to the two sides of the laser beam irradiation region 25 is the same as the direction in which the second current mirror 3b is deflected, and the other side is orthogonal to the two sides. It is aligned with the direction in which the first current mirror 3a is deflected.

本實施形態之透鏡單元40,在作為雷射加工裝置之f θ透鏡使用之情形下,於熱容較鏡筒13小的第2光學透鏡11b中之雷射射束非照射部分16,配設有溫度檢測器14,由於雷射射束非照射部分26接近雷射射束照射區域25,因此即使第2光學透鏡11b之溫度因為高能量雷射射束2之瞬間吸收(例如msec單位精確度)而瞬間上升時,也可精確度良好地測量第2光學透鏡11b的溫度作為溫度信號。In the case where the lens unit 40 of the present embodiment is used as the f θ lens of the laser processing apparatus, the laser beam non-irradiation portion 16 in the second optical lens 11b having a smaller heat capacity than the lens barrel 13 is disposed. There is a temperature detector 14, since the laser beam non-irradiation portion 26 is close to the laser beam irradiation region 25, even if the temperature of the second optical lens 11b is absorbed by the moment of the high-energy laser beam 2 (for example, msec unit accuracy) When the temperature rises instantaneously, the temperature of the second optical lens 11b can be accurately measured as a temperature signal.

此外,由於第2光學透鏡11b之溫度檢測器14的設置面並非為與外部之大氣接觸的面,因此不會受到工件6加工時所產生之粉塵的影響。Further, since the installation surface of the temperature detector 14 of the second optical lens 11b is not a surface that is in contact with the outside atmosphere, it is not affected by the dust generated when the workpiece 6 is processed.

此外,由於使用2個溫度檢測器14,因此可測量求出溫度上升之第2光學透鏡11b之平均溫度的溫度信號。Further, since the two temperature detectors 14 are used, it is possible to measure a temperature signal for determining the average temperature of the second optical lens 11b whose temperature rises.

在本實施形態中,為了測量求出第2光學透鏡11b之平均溫度的溫度信號,雖使用了2個溫度檢測器14,但亦 可將2個以上的溫度檢測器14設在第2光學透鏡11b之雷射射束非照射部分26。In the present embodiment, in order to measure the temperature signal for obtaining the average temperature of the second optical lens 11b, two temperature detectors 14 are used, but Two or more temperature detectors 14 may be provided in the laser beam non-irradiation portion 26 of the second optical lens 11b.

本實施形態之雷射加工裝置,除了在f θ透鏡5使用透鏡單元40以外,均與實施形態1的雷射加工裝置相同。The laser processing apparatus of the present embodiment is the same as the laser processing apparatus of the first embodiment except that the lens unit 40 is used for the f θ lens 5.

在本實施形態之雷射加工裝置中,即使在第2光學透鏡11b之溫度因為f θ透鏡5中之第2光學透鏡11b之高能量雷射射束2之瞬間吸收(例如msec單位精確度)而瞬間上升時,也可藉由設置於第2光學透鏡11b之2個溫度檢測器14來測量第2光學透鏡11b的溫度,且可將藉由該2個溫度檢測器14所測量的溫度作為溫度信號來輸入於控制裝置9。In the laser processing apparatus of the present embodiment, even if the temperature of the second optical lens 11b is absorbed by the high-energy laser beam 2 of the second optical lens 11b in the f θ lens 5 (for example, msec unit accuracy) On the other hand, when the temperature rises instantaneously, the temperature of the second optical lens 11b can be measured by the two temperature detectors 14 provided in the second optical lens 11b, and the temperature measured by the two temperature detectors 14 can be used as the temperature. The temperature signal is input to the control device 9.

再者,控制裝置9係根據從2個溫度檢測器14所輸入的溫度信號,來求出第2光學透鏡11b的上升溫度的平均值。Furthermore, the control device 9 obtains the average value of the rising temperatures of the second optical lenses 11b based on the temperature signals input from the two temperature detectors 14.

再者,控制裝置9係根據第2光學透鏡11b之上升溫度的平均值,來控制電流驅動器8,藉此來控制第1、第2電流掃描器4a、4b。Further, the control device 9 controls the current driver 8 based on the average value of the rising temperatures of the second optical lenses 11b, thereby controlling the first and second current scanners 4a and 4b.

在本實施形態之雷射加工裝置中,係將起自雷射射束2之因為伴隨著光學零件群之溫度上升所產生之折射率變化所引起之雷射射束2之聚光點位置的偏移,代表性地測量第2光學透鏡11b之平均溫度。再者,根據該溫度信號來控制第1、第2電流掃描器4a、4b進行修正。In the laser processing apparatus of the present embodiment, the position of the focused spot of the laser beam 2 caused by the change in the refractive index caused by the temperature rise of the optical component group is derived from the laser beam 2 The average temperature of the second optical lens 11b is representatively measured by the offset. Further, the first and second current scanners 4a and 4b are controlled to perform correction based on the temperature signal.

亦即,根據在第2光學透鏡11b之上升溫度之平均值的資料,藉由與實施形態1之雷射加工裝置100相同的機 構,以控制第1、第2電流掃描器4a、4b方式來修正雷射射束聚光點位置的偏移。That is, the same machine as the laser processing apparatus 100 of the first embodiment is based on the data of the average value of the rising temperatures of the second optical lens 11b. The first and second current scanners 4a and 4b are controlled to correct the offset of the position of the laser beam condensing point.

實際上,係加上從溫度資料預測的位置偏移,且為使照射至所希望的位置,藉由將以修正量資料所修正的目標位置從控制裝置9輸出至電流驅動器8,且從電流驅動器8指示第1、第2電流掃描器4a、4b來進行。Actually, the positional deviation predicted from the temperature data is added, and in order to illuminate to the desired position, the target position corrected by the correction amount data is output from the control device 9 to the current driver 8, and the current is supplied. The driver 8 instructs the first and second current scanners 4a and 4b to perform the operation.

由於本實施形態之雷射加工裝置即使是在高能量雷射輸出下的加工亦可精確度良好地修正雷射射束聚光點位置的偏移,因此可進行高精確度的雷射加工。Since the laser processing apparatus of the present embodiment can accurately correct the shift of the position of the laser beam condensing point even if it is processed under high-energy laser output, high-precision laser processing can be performed.

在本實施形態中,控制裝置9亦可根據從溫度檢測器所輸入的溫度信號來控制XY平台7。In the present embodiment, the control device 9 can also control the XY stage 7 based on the temperature signal input from the temperature detector.

此外,在本實施形態中,亦可將設在第2光學透鏡11b之雷射射束非照射部分26的溫度檢測器14設為2個以上,由控制裝置9根據將來自該等複數個溫度檢測器14之溫度信號輸入至控制裝置9所獲得之上升溫度的平均值,來控制第1、第2電流掃描器4a、4b進行修正。Further, in the present embodiment, the temperature detectors 14 provided in the laser beam non-irradiation portion 26 of the second optical lens 11b may be two or more, and the control device 9 may be based on the plurality of temperatures. The temperature signal of the detector 14 is input to the average value of the rising temperatures obtained by the control device 9, and the first and second current scanners 4a and 4b are controlled to perform correction.

在本實施形態中,雖係使用第1、第2電流鏡3a、3b作為使雷射射束2偏向的機構,但只要是使雷射射束2偏向的機構,則不限定於此。In the present embodiment, the first and second current mirrors 3a and 3b are used as the mechanism for deflecting the laser beam 2. However, the mechanism is not limited thereto as long as it is a mechanism for deflecting the laser beam 2.

在本實施形態之用在f θ透鏡5的透鏡單元40中,雖係將溫度檢測器14設在第2光學透鏡11b,但只要是設在不與外部之大氣接觸之光學透鏡的面,則可設在任何光學透鏡。In the lens unit 40 used in the f θ lens 5 of the present embodiment, the temperature detector 14 is provided on the second optical lens 11b, but if it is provided on the surface of the optical lens that is not in contact with the outside atmosphere, Can be placed on any optical lens.

此外,亦可將溫度檢測器14設在保護窗12之雷射射束出射面之相反側之面的雷射射束非照射部分。Further, the temperature detector 14 may be provided on the non-irradiated portion of the laser beam on the opposite side of the laser beam exit surface of the protection window 12.

(實施形態4)(Embodiment 4)

第5圖(a)係為本發明之實施形態4之用在雷射加工裝置之f θ透鏡之透鏡單元之側面剖面示意圖、與該側面剖面示意圖中之透鏡單元之A-A剖面的示意圖b)。Fig. 5(a) is a side cross-sectional view showing a lens unit of an f θ lens used in a laser processing apparatus according to a fourth embodiment of the present invention, and a schematic view b) of an A-A cross section of the lens unit in the side sectional view.

如第5圖所示,本實施形態之用在f θ透鏡之透鏡單元50,除在接受第2光學透鏡11b之雷射射束2入射之側的表面設有4個溫度檢測器14a、14b、14c、14d檢測器14以外,均與實施形態2之透鏡單元30相同。As shown in Fig. 5, the lens unit 50 used in the f θ lens of the present embodiment is provided with four temperature detectors 14a and 14b on the surface on the side where the laser beam 2 of the second optical lens 11b is incident. The 14c and 14d detectors 14 are the same as the lens unit 30 of the second embodiment.

再者,如第5圖(b)所示,第1、第2、第3、第4溫度檢測器14a、14b、14c、14d係設置在第2光學透鏡11b中之彼此正交之2條弦之兩端部的各者。Further, as shown in Fig. 5(b), the first, second, third, and fourth temperature detectors 14a, 14b, 14c, and 14d are provided in the second optical lens 11b and are orthogonal to each other. Each of the two ends of the string.

使用本實施形態之透鏡單元50作為f θ透鏡時,如第5圖(b)所示,接受第2光學透鏡11b之面中之雷射射束2照射的區域,係為正方形或長方形。When the lens unit 50 of the present embodiment is used as the f θ lens, as shown in Fig. 5(b), the region irradiated by the laser beam 2 in the surface of the second optical lens 11b is square or rectangular.

因此,第2光學透鏡11b中之各溫度檢測器14a、14b、14c、14d的設置位置,係為位於雷射射束照射區域25、與第2光學透鏡11b之圓形之外周之間4個位置的雷射射束非照射部分26。Therefore, the temperature detectors 14a, 14b, 14c, and 14d in the second optical lens 11b are disposed between the laser beam irradiation region 25 and the circular outer circumference of the second optical lens 11b. The position of the laser beam is non-irradiated portion 26.

如第5圖(b)所示,例如,在第2光學透鏡11b中,第1溫度檢測器14a係設置在相當於時鐘文字板中之12時之位置的雷射射束非照射部分26。As shown in Fig. 5(b), for example, in the second optical lens 11b, the first temperature detector 14a is provided in a laser beam non-irradiation portion 26 corresponding to 12 o'clock in the clock dial.

第2溫度檢測器14b係設置在相當於時鐘文字板中之6時之位置的雷射射束非照射部分26。The second temperature detector 14b is provided in a laser beam non-irradiation portion 26 at a position corresponding to 6 o'clock in the dial pad.

第3溫度檢測器14c係設置在相當於時鐘文字板中之 9時之位置的雷射射束非照射部分26。The third temperature detector 14c is disposed in a clock equivalent The laser beam at the 9 o'clock position is not illuminated by the portion 26.

第4溫度檢測器14d係設置在相當於時鐘文字板中之3時之位置的雷射射束非照射部分26。The fourth temperature detector 14d is provided in a laser beam non-irradiation portion 26 at a position corresponding to 3 o'clock in the clock dial.

亦即,本實施形態之透鏡單元50係以通過第1溫度檢測器14a與第2溫度檢測器14b之弦的D1、及通過第3溫度檢測器14c與第4溫度檢測器14d之弦的D2正交之方式,在第2光學透鏡11B配置有各溫度檢測器。That is, the lens unit 50 of the present embodiment is D1 passing through the chord of the first temperature detector 14a and the second temperature detector 14b, and D2 passing through the chord of the third temperature detector 14c and the fourth temperature detector 14d. In the orthogonal manner, each temperature detector is disposed in the second optical lens 11B.

此外,與D1平行的方向,係與使第1電流鏡3a偏向的方向一致,而與D2平行的方向,係與使第2電流鏡3b偏向的方向一致。Further, the direction parallel to D1 coincides with the direction in which the first current mirror 3a is deflected, and the direction parallel to D2 coincides with the direction in which the second current mirror 3b is deflected.

本實施形態之透鏡單元50,亦在作為雷射加工裝置之f θ透鏡使用之情形下,於熱容較鏡筒13小的第2光學透鏡11b中之雷射射束非照射部分26,配設有第1、第2、第3、第4溫度檢測器14a、14b、14c、14d,雷射射束非照射部分26即接近雷射射束照射區域25。In the case where the lens unit 50 of the present embodiment is used as the f θ lens of the laser processing apparatus, the laser beam non-irradiation portion 26 in the second optical lens 11b having a smaller heat capacity than the lens barrel 13 is provided. The first, second, third, and fourth temperature detectors 14a, 14b, 14c, and 14d are provided, and the laser beam non-irradiation portion 26 is close to the laser beam irradiation region 25.

藉此,即使第2光學透鏡11b之溫度因為高能量雷射射束2之瞬間吸收(例如msec單位精確度)而瞬間上升時,也可精確度良好地測量第2光學透鏡11b的溫度作為溫度信號。Thereby, even if the temperature of the second optical lens 11b rises instantaneously due to the instantaneous absorption (for example, msec unit accuracy) of the high-energy laser beam 2, the temperature of the second optical lens 11b can be accurately measured as the temperature. signal.

尤其因為4個溫度檢測器係設置在第2光學透鏡11b的雷射射束非照射部分26,因此第2光學透鏡11b之上升溫度之平均值的參差不齊較小,而可更進一步提升上升溫度的測量精確度。In particular, since the four temperature detectors are provided in the laser beam non-irradiation portion 26 of the second optical lens 11b, the average value of the rising temperatures of the second optical lens 11b is small, and the rise can be further increased. Temperature measurement accuracy.

此外,由於第2光學透鏡11b之溫度檢測器設置面並 非為與外部之大氣接觸的面,因此不會受到工件6加工時所產生之粉塵的影響。In addition, since the temperature detector of the second optical lens 11b is provided with a surface It is not a surface that comes into contact with the outside atmosphere, so it is not affected by the dust generated when the workpiece 6 is processed.

本實施形態之雷射加工裝置,除在f θ透鏡5使用透鏡單元50以外,均與實施形態2的雷射加工裝置相同。The laser processing apparatus of the present embodiment is the same as the laser processing apparatus of the second embodiment except that the lens unit 50 is used for the f θ lens 5.

此外,使透鏡單元50中之D1之方向與工件6之X方向一致,且使D2之方向與工件6的Y方向一致。Further, the direction of D1 in the lens unit 50 is made to coincide with the X direction of the workpiece 6, and the direction of D2 is made to coincide with the Y direction of the workpiece 6.

在本實施形態之雷射加工裝置中,係以4個溫度檢測器來測量f θ透鏡5中之第2光學透鏡11b之因為高能量雷射射束2之瞬間吸收(例如msec單位精確度)而溫度上升時之第2光學透鏡11b的溫度,且將此等溫度作為溫度信號而輸入於控制裝置9。In the laser processing apparatus of the present embodiment, the instantaneous absorption of the second optical lens 11b of the f θ lens 5 due to the high-energy laser beam 2 (for example, msec unit accuracy) is measured by four temperature detectors. The temperature of the second optical lens 11b at the time of temperature rise is input to the control device 9 as a temperature signal.

再者,控制裝置9係從4個溫度檢測器的溫度信號,來求出第2光學透鏡11b之上升溫度的平均值。Furthermore, the control device 9 determines the average value of the rising temperatures of the second optical lenses 11b from the temperature signals of the four temperature detectors.

此外,從第1溫度檢測器14a與第2溫度檢測器14b的溫度信號,求出第2光學透鏡11b之D1方向的溫度分布,且從第3溫度檢測器14c與第4溫度檢測器14d的溫度信號,求出D2方向的溫度分布。Further, from the temperature signals of the first temperature detector 14a and the second temperature detector 14b, the temperature distribution in the D1 direction of the second optical lens 11b is obtained, and the third temperature detector 14c and the fourth temperature detector 14d are obtained. The temperature signal is used to find the temperature distribution in the D2 direction.

再者,在本實施形態之雷射加工裝置中,係將起自雷射射束2之因為伴隨著光學零件群之溫度上升所產生之折射率變化所引起之雷射射束2之聚光點位置的偏移,藉由根據第2光學透鏡11b之上升溫度之平均值資料來控制第1、第2電流掃描器4a、4b進行修正。Further, in the laser processing apparatus of the present embodiment, the laser beam 2 is collected by the laser beam 2 due to the change in the refractive index caused by the temperature rise of the optical component group. The offset of the dot position is controlled by the first and second current scanners 4a and 4b based on the average value of the rising temperature of the second optical lens 11b.

同時,將起自雷射射束2之因為伴隨著光學零件群之與工件6之X方向相同方向的溫度分布及與工件6之Y方 向相同方向的溫度分布所產生之折射率變化所引起之雷射射束2之聚光點位置的偏移,藉由根據第2光學透鏡11b之D1方向之溫度分布資料與D2方向之溫度分布資料來控制第1、第2電流掃描器4a、4b進行修正。At the same time, it will be from the laser beam 2 because of the temperature distribution in the same direction as the X direction of the workpiece 6 of the optical component group and the Y side of the workpiece 6. The deviation of the position of the condensed spot of the laser beam 2 caused by the change in the refractive index generated by the temperature distribution in the same direction, by the temperature distribution data in the D1 direction of the second optical lens 11b and the temperature distribution in the D2 direction The data is controlled to control the first and second current scanners 4a and 4b.

亦即,在本實施形態之雷射加工裝置中,係從第2光學透鏡11b之上升溫度之平均值的資料、第2光學透鏡11b中之與工件6之X方向相同方向之溫度分布的資料、及第2光學透鏡11b中之與工件6之Y方向相同方向之溫度分布的資料,藉由與實施形態2之雷射加工裝置相同的機構,來控制第1、第2電流掃描器4a、4b。藉此,來修正雷射射束2之聚光點位置的偏移。In the laser processing apparatus of the present embodiment, the data of the average value of the rising temperature of the second optical lens 11b and the temperature distribution of the second optical lens 11b in the same direction as the X direction of the workpiece 6 are included. And the temperature distribution of the second optical lens 11b in the same direction as the Y direction of the workpiece 6 is controlled by the same mechanism as the laser processing apparatus of the second embodiment, and the first and second current scanners 4a are controlled. 4b. Thereby, the offset of the position of the focused spot of the laser beam 2 is corrected.

換言之,雷射射束2之聚光點位置之偏移的修正,係藉由控制裝置9來控制修正電流機構之動作而實施。In other words, the correction of the offset of the position of the focused spot of the laser beam 2 is performed by the control device 9 controlling the operation of the correcting current mechanism.

實際上,係加上從溫度資料預測的位置偏移,且為使照射至所希望的位置,藉由將以修正量資料所修正的目標位置從控制裝置9輸出至電流驅動器8,且從電流驅動器8指示第1、第2電流掃描器4a、4b來進行。Actually, the positional deviation predicted from the temperature data is added, and in order to illuminate to the desired position, the target position corrected by the correction amount data is output from the control device 9 to the current driver 8, and the current is supplied. The driver 8 instructs the first and second current scanners 4a and 4b to perform the operation.

由於本實施形態之雷射加工裝置100即使是在高能量雷射輸出下的加工亦可更精確度良好地修正雷射射束2的聚光點位置的偏移,因此可進行更高精確度之雷射加工。Since the laser processing apparatus 100 of the present embodiment can correct the shift of the spot position of the laser beam 2 more accurately even in the processing of the high-energy laser output, higher precision can be performed. Laser processing.

在本實施形態中,控制裝置9亦可根據從溫度檢測器所輸入的溫度信號來控制XY平台7。In the present embodiment, the control device 9 can also control the XY stage 7 based on the temperature signal input from the temperature detector.

在本實施形態之用在f θ透鏡的透鏡單元50中,雖係4個溫度檢測器14a、14b、14c、14d設在第2光學透鏡11b, 但只要是設在不與外部之大氣接觸之光學透鏡的面,則可設在任何光學透鏡。In the lens unit 50 used in the f θ lens of the present embodiment, four temperature detectors 14a, 14b, 14c, and 14d are provided in the second optical lens 11b. However, any optical lens can be provided as long as it is provided on the surface of the optical lens that is not in contact with the outside atmosphere.

此外,亦可將4個溫度檢測器14a、14b、14c、14d,設在保護窗12之雷射射束入射面之相反側之面的雷射射束非照射部分。Further, four temperature detectors 14a, 14b, 14c, and 14d may be provided on the non-irradiated portion of the laser beam on the opposite side of the laser beam incident surface of the protection window 12.

此外,在各實施形態中,雖係以將溫度檢測器設在光學透鏡之接受雷射射束2入射之側之表面為例進行了說明,但亦可設在與接受雷射射束2入射之側相反側之光學透鏡的面(光學透鏡的背面)。Further, in each of the embodiments, the temperature detector is provided on the surface of the optical lens on the side where the laser beam 2 is incident, but the radiation beam 2 may be incident on the receiving laser beam 2 as an example. The face of the optical lens (the back side of the optical lens) on the opposite side of the side.

在本實施形態中,雖係於透鏡單元50之第2光學透鏡11b中設有4個溫度檢測器14a、14b、14c、14d,但亦可在第2光學透鏡11b中之弦的兩端部,亦即對稱位置各設置1個,亦即合計2個溫度檢測器。In the present embodiment, four temperature detectors 14a, 14b, 14c, and 14d are provided in the second optical lens 11b of the lens unit 50, but they may be at both ends of the chord in the second optical lens 11b. That is, one symmetrical position is set, that is, a total of two temperature detectors.

此外,只要可測量第2光學透鏡11b之與D1方向平行之方向之溫度分布及與D2方向平行之方向之溫度分布,亦可設置4個以上的溫度檢測器。Further, as long as the temperature distribution in the direction parallel to the direction D1 and the temperature distribution in the direction parallel to the direction D2 of the second optical lens 11b can be measured, four or more temperature detectors may be provided.

此外,雖係使用第1、第2電流鏡3a、3b作為使雷射射束2偏向的機構,惟只要是使雷射射束2偏向的機構,則不予限定。Further, although the first and second current mirrors 3a and 3b are used as the mechanism for deflecting the laser beam 2, it is not limited as long as it is a mechanism for deflecting the laser beam 2.

本發明中之雷射射束2,亦可為單脈衝(pulse)、複數脈衝或連續振盪的任一者。The laser beam 2 in the present invention may also be any one of a single pulse, a complex pulse or a continuous oscillation.

在本發明之雷射加工裝置中的加工內容,並不限定於開孔,只要是可藉由切斷、變形、熔接、熱處理、或標線等的雷射等進行加工者,則可為任何的加工內容。此外, 在被加工物中,只要是可藉由燃燒、熔融、昇華或變色等之雷射所產生的變化,則可使產生任何的變化。The processing content in the laser processing apparatus of the present invention is not limited to the opening, and may be any one as long as it can be processed by laser cutting such as cutting, deformation, welding, heat treatment, or marking. Processing content. In addition, In the workpiece, any change can be made as long as it is a change which can be caused by a laser such as burning, melting, sublimation or discoloration.

另外,本發明在該發明的範圍內,可自由組合各實施的型態,或可適當變更、省略各實施形態。Further, the present invention can be freely combined with each embodiment within the scope of the invention, or each embodiment can be appropriately changed or omitted.

[產業上的可利用性][Industrial availability]

由於本發明之雷射加工裝置係可精確度良好地修正聚光點位置的偏移,且可進行高精確度的雷射加工,因此可用在已高精細化之電子電路或電子零件的加工。Since the laser processing apparatus of the present invention can correct the offset of the position of the condensed spot with high precision and can perform laser processing with high precision, it can be used for processing of high-definition electronic circuits or electronic parts.

1‧‧‧雷射振盪器1‧‧‧Laser oscillator

2‧‧‧雷射射束2‧‧‧Laser beam

3a‧‧‧第1電流鏡3a‧‧‧1st current mirror

3b‧‧‧第2電流鏡3b‧‧‧2nd current mirror

4a‧‧‧第1電流掃描器4a‧‧‧1st current scanner

4b‧‧‧第2電流掃描器4b‧‧‧2nd current scanner

5‧‧‧f θ透鏡5‧‧‧f θ lens

6‧‧‧工件6‧‧‧Workpiece

7‧‧‧XY平台7‧‧‧XY platform

8‧‧‧電流驅動器8‧‧‧ Current driver

9‧‧‧控制裝置9‧‧‧Control device

10‧‧‧信號線10‧‧‧ signal line

Claims (9)

一種透鏡單元,係將雷射射束聚光照射於對象物者,該透鏡單元係具備:光學透鏡;用以保持上述光學透鏡的鏡筒;及複數個溫度檢測器:上述複數個溫度檢測器係在上述光學透鏡之接受上述雷射射束入射之側之表面或與接受該雷射射束入射之側相反側之表面,並設在位於上述光學透鏡之雷射射束照射區域與上述光學透鏡之外周之間的雷射射束非照射部分,用來測量用以求出上述光學透鏡的平均溫度、或上述光學透鏡之平均溫度及面內之溫度分布的溫度信號。 A lens unit for concentrating a laser beam onto an object, the lens unit comprising: an optical lens; a lens barrel for holding the optical lens; and a plurality of temperature detectors: the plurality of temperature detectors And a surface of the optical lens on the side opposite to the side on which the laser beam is incident or on the side opposite to the side on which the laser beam is incident, and is disposed on the laser beam irradiation region of the optical lens and the optical The non-irradiated portion of the laser beam between the outer circumferences of the lens is used to measure a temperature signal for determining the average temperature of the optical lens or the average temperature of the optical lens and the temperature distribution in the plane. 如申請專利範圍第1項所述之透鏡單元,其中,在通過上述光學透鏡之中心點之弦中之兩端部之各者,配置至少一個上述溫度檢測器。 The lens unit according to claim 1, wherein at least one of the temperature detectors is disposed at each of both end portions of the chord passing through the center point of the optical lens. 如申請專利範圍第1項所述之透鏡單元,其中,在通過上述光學透鏡之中心點之正交的2條弦中之一方之弦之兩端部的各者、及另一方之弦之兩端部的各者,配置至少一個上述溫度檢測器。 The lens unit according to claim 1, wherein each of the two ends of the two strings of the two orthogonal strings passing through the center point of the optical lens, and the other two of the strings Each of the ends is provided with at least one of the above temperature detectors. 如申請專利範圍第1至3項中任一項所述之透鏡單元,其中,上述溫度檢測器係配置在於雷射射束入射部配置之上述光學透鏡。 The lens unit according to any one of claims 1 to 3, wherein the temperature detector is disposed in the optical lens in which a laser beam incident portion is disposed. 如申請專利範圍第1至3項中任一項所述之透鏡單 元,其中,上述溫度檢測器係配置在上述光學透鏡之與上述鏡筒外部之大氣接觸之面以外的面。 Lens sheet as described in any one of claims 1 to 3. And wherein the temperature detector is disposed on a surface of the optical lens other than a surface in contact with an atmosphere outside the lens barrel. 一種雷射加工裝置,係具備:雷射振盪器;電流鏡,將從上述雷射振盪器所輸出的雷射射束予以偏向;電流掃描器,用以驅動上述電流鏡;透鏡單元,具有:光學透鏡;保持上述光學透鏡的鏡筒;及在上述光學透鏡之接受上述雷射射束入射之側之表面或與接受該雷射射束入射之側相反側之表面,並設在位於上述光學透鏡之雷射射束照射區域與上述光學透鏡之外周之間的雷射射束非照射部分,用來測量用以求出上述光學透鏡的平均溫度、或上述光學透鏡的平均溫度及面內的溫度分布之溫度信號的複數個溫度檢測器;且將在上述電流鏡所偏向入射的上述雷射射束予以朝向對象物聚光照射;XY平台,用以載置上述對象物且在水平面內移動;電流驅動器,用以驅動上述電流掃描器;控制裝置,用以控制上述雷射振盪器、上述電流驅動器、及上述XY平台;及信號線,用以將上述溫度檢測器連接於上述控制裝置;上述控制裝置係根據從上述複數個溫度檢測器所測量的溫度信號,求出上述光學透鏡之上升溫度的平 均值、或上述光學透鏡之上升溫度的平均值及面內的溫度分布所獲得的結果,來修正上述雷射射束的聚光點位置。 A laser processing apparatus includes: a laser oscillator; a current mirror that deflects a laser beam output from the laser oscillator; a current scanner for driving the current mirror; and a lens unit having: An optical lens; a lens barrel holding the optical lens; and a surface on a side opposite to a side on which the laser beam is incident on the optical lens or on a side opposite to a side on which the laser beam is incident, and is disposed on the optical a laser beam non-irradiation portion between the laser beam irradiation region of the lens and the outer periphery of the optical lens for measuring an average temperature of the optical lens or an average temperature and in-plane of the optical lens a plurality of temperature detectors for temperature signal temperature distribution; and concentrating the laser beam incident on the current mirror toward the object; the XY stage is configured to mount the object and move in a horizontal plane a current driver for driving the current scanner; a control device for controlling the laser oscillator, the current driver, and the XY platform; a line for connecting the temperature detector to the control device; the control device determining a level of rise temperature of the optical lens based on a temperature signal measured from the plurality of temperature detectors The position of the condensed spot of the above-mentioned laser beam is corrected by the average value or the average value of the rising temperature of the optical lens and the temperature distribution in the plane. 如申請專利範圍第6項所述之雷射加工裝置,其中,在通過上述光學透鏡之中心點之弦中之兩端部之各者,配置至少一個上述溫度檢測器。 The laser processing apparatus according to claim 6, wherein at least one of the temperature detectors is disposed at each of both end portions of the chord passing through the center point of the optical lens. 如申請專利範圍第6項所述之雷射加工裝置,其中,上述複數個溫度檢測器係為第1溫度檢測器、第2溫度檢測器、第3溫度檢測器、及第4溫度檢測器的4個;在通過上述光學透鏡之中心點之彼此正交的2條弦中之一方之弦的兩端部,配置有上述第1溫度檢測器與上述第2溫度檢測器,而在另一方之弦的兩端部,配置有上述第3溫度檢測器與上述第4溫度檢測器;上述控制裝置係從上述複數個溫度檢測器所測量的所有溫度信號,求出上述光學透鏡之上升溫度的平均值,且從上述第1溫度檢測器與上述第2溫度檢測器的上述溫度信號,求出上述光學透鏡中之X方向的溫度分布,且從上述第3溫度檢測器與上述第4溫度檢測器的上述溫度信號,求出上述光學透鏡中之Y方向的溫度分布;根據所求得的各結果,來修正雷射射束的聚光點位置。 The laser processing apparatus according to claim 6, wherein the plurality of temperature detectors are a first temperature detector, a second temperature detector, a third temperature detector, and a fourth temperature detector. Four of the two chords of one of the two chords that are orthogonal to each other at the center point of the optical lens, and the first temperature detector and the second temperature detector are disposed, and the other is The third temperature detector and the fourth temperature detector are disposed at both ends of the string, and the control device obtains an average of the rising temperatures of the optical lenses from all the temperature signals measured by the plurality of temperature detectors. And obtaining, from the temperature signal of the first temperature detector and the second temperature detector, a temperature distribution in the X direction of the optical lens, and the third temperature detector and the fourth temperature detector The temperature signal is obtained from the temperature signal in the Y direction, and the position of the condensed spot of the laser beam is corrected based on the obtained results. 如申請專利範圍第6至8項中任一項所述之雷射加工 裝置,藉由上述控制裝置,透過上述電流驅動器來控制上述電流掃描器,且修正上述雷射射束的聚光點位置。Laser processing as described in any one of claims 6 to 8 The device controls the current scanner through the current driver by the control device, and corrects the position of the condensed spot of the laser beam.
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