TWI509483B - Touch panel and manufacturing method - Google Patents

Touch panel and manufacturing method Download PDF

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TWI509483B
TWI509483B TW102130992A TW102130992A TWI509483B TW I509483 B TWI509483 B TW I509483B TW 102130992 A TW102130992 A TW 102130992A TW 102130992 A TW102130992 A TW 102130992A TW I509483 B TWI509483 B TW I509483B
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sensing
roll
insulating layer
area
display area
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TW102130992A
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TW201508578A (en
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Wei Chuan Chen
Hsiao Wen Kuo
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Rtr Tech Technology Co Ltd
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觸控結構及其製造方法Touch structure and manufacturing method thereof

本發明為一種觸控結構,提供一種具有降低觸控結構與液晶顯示裝置的厚度、減少製造成本與提升模組製作良率之觸控結構及其製造方法。The invention provides a touch structure, and provides a touch structure and a manufacturing method thereof, which have the advantages of reducing the thickness of the touch structure and the liquid crystal display device, reducing the manufacturing cost, and improving the manufacturing yield of the module.

現今各式消費性電子產品的市場中,個人數位助理(PDA)、行動電話(mobile Phone)、筆記型電腦(notebook)及平板電腦(tablet PC)等可攜式電子產品皆已廣泛的使用觸控式結構(touch panel)作為其資料溝通的界面工具。此外,由於目前電子產品的設計皆以輕、薄、短、小為方向,因此在產品上無足夠空間容納如鍵盤、滑鼠等傳統輸入裝置,尤其在講求人性化設計的平板電腦需求的帶動下,觸控式結構已經一躍成為關鍵的零組件之一。而且觸控式結構除了符合可作多層次選單設計要求外,亦能同時擁有鍵盤、滑鼠等的功能及手寫輸入等人性化的操作方式,尤其將輸入與輸出整合在同一介面(螢幕)的特質,更是其他傳統輸入裝置所不及之處。現今更發展出一種觸控顯示裝置,為顯示裝置上設置一觸控結構,以讓觸控結構依據顯示裝置之顯示畫面提供可觸控區域,供使用者依據畫面顯示之觸控物件進行觸控操作。In today's consumer electronics market, portable electronic products such as personal digital assistants (PDAs), mobile phones, notebooks, and tablet PCs have been widely used. The touch panel is used as an interface tool for data communication. In addition, since the design of electronic products is currently in the direction of light, thin, short and small, there is not enough space on the product to accommodate traditional input devices such as keyboards and mice, especially in the demand for tablet PCs that are designed with humanity in mind. Under the touch structure has become one of the key components. In addition to the multi-level menu design requirements, the touch-sensitive structure can also have the functions of a keyboard, a mouse, etc., and a humanized operation mode such as handwriting input, especially integrating the input and output in the same interface (screen). The traits are beyond the reach of other traditional input devices. A touch display device is further provided, and a touch structure is disposed on the display device, so that the touch structure provides a touchable area according to the display image of the display device, and the touch display device is used for the user to touch according to the touch object displayed on the screen. operating.

為了達成裝置薄型化的設計需求,傳統的觸控結構設計(強化玻璃/薄膜/薄膜,G/F/F)將導致觸控顯示裝置整體厚度增加,並造成光學效果變差、影響觸控顯示裝置的外觀。晚近則改 採SITO架橋結構,將複數軸向(X/Y)的感應電極設置在單一基材之一表面,運用絕緣層將複數軸向(X/Y)的感應電極的交會處使其彼此絕緣的手段。惟,此種SITO架橋結構的生產製程複雜、製造成本過高且生產良率不易控制。In order to achieve the design requirements of thinner devices, the traditional touch structure design (reinforced glass/film/film, G/F/F) will lead to an increase in the overall thickness of the touch display device, resulting in poor optical effects and affecting the touch display. The appearance of the device. Change late The SITO bridge structure is adopted, and a plurality of axial (X/Y) sensing electrodes are disposed on one surface of a single substrate, and an insulating layer is used to insulate the intersections of the plurality of axial (X/Y) sensing electrodes from each other. . However, the production process of such a SITO bridge structure is complicated, the manufacturing cost is too high, and the production yield is difficult to control.

鑑於先前技術所存在的問題,本發明提供了一種觸控結構及其製造方法,具有裝置薄型化、低製造成本與高模組製作良率等優點。In view of the problems existing in the prior art, the present invention provides a touch structure and a manufacturing method thereof, which have the advantages of thinner device, low manufacturing cost, and high module fabrication yield.

為達成上述之目的,本發明之觸控結構包括:可撓式透明基材、複數組感測串列、一絕緣層以及複數跨接導線;其中,可撓式透明基材具有一顯示區和一端子線路區,端子線路區位於顯示區一側,該顯示區具有複數區域;每一組感測串列具有複數感測列,每一組感測串列分別設置於該顯示區之一區域,每一區域相鄰排列,每一感測列具有一延伸端點位於該端子線路區;絕緣層係位於端子線路區之上,且絕緣層相對於複數延伸端點處具有一開口;複數跨接導線則設置於絕緣層之上,每一跨接導線經由開口電性連接延伸端點使複數感測列電性連接。To achieve the above objective, the touch structure of the present invention comprises: a flexible transparent substrate, a complex array sensing series, an insulating layer, and a plurality of jumper wires; wherein the flexible transparent substrate has a display area and a terminal line area, the terminal line area is located at one side of the display area, the display area has a plurality of areas; each set of sensing series has a plurality of sensing columns, and each set of sensing series is respectively disposed in one of the display areas Each region is adjacently arranged, each sensing column has an extended end point in the terminal line region; the insulating layer is located above the terminal line region, and the insulating layer has an opening with respect to the plurality of extended end points; The connecting wires are disposed on the insulating layer, and each of the connecting wires electrically connects the extending end points via the openings to electrically connect the plurality of sensing columns.

為達成上述之目的,所述絕緣層可為光阻或絕緣油墨。For the above purposes, the insulating layer can be a photoresist or an insulating ink.

為達成上述之目的,所述跨接導線可為銀漿、奈米銀、石墨硒或奈米碳管。For the above purposes, the jumper wires may be silver paste, nano silver, graphite selenium or carbon nanotubes.

為達成上述之目的,本發明之觸控結構之製造方法,其包含:提供可撓式透明基材,具有一顯示區和一端子線路區,端子線路區位於顯示區一側,該顯示區具有複數區域,每一區域相鄰排列,於該可撓式透明基材之表面形成一透明導電層。圖案化透明導電層,形成複數組感測串列,每一組感測串列具有 複數感測列,每一組感測串列分別設置於該顯示區之一區域,每一感測列具有一延伸端點位於該端子線路區。形成絕緣層於端子線路區,絕緣層覆蓋部分複數延伸端點。圖案化絕緣層,於複數延伸端點形成複數開口,以及形成複數跨接導線串接複數開口於絕緣層之上,每一跨接導線經由該開口電性連接延伸端點使複數感測列電性連接。In order to achieve the above object, a method for manufacturing a touch structure of the present invention comprises: providing a flexible transparent substrate having a display area and a terminal line area, wherein the terminal line area is located on one side of the display area, and the display area has The plurality of regions are arranged adjacent to each other to form a transparent conductive layer on the surface of the flexible transparent substrate. Patterning the transparent conductive layer to form a complex array sensing series, each set of sensing series has The plurality of sensing columns are respectively disposed in an area of the display area, and each sensing column has an extended end point located in the terminal line area. An insulating layer is formed in the terminal line region, and the insulating layer covers a plurality of extended end points. The patterned insulating layer forms a plurality of openings at the plurality of extended end points, and forms a plurality of jumper wires connected in series to the insulating layer, and each of the jumper wires electrically connects the extended end points via the openings to electrically sense the plurality of sense lines Sexual connection.

為達成上述之目的,本發明之觸控結構之製造方法,其包含:捲對捲提供可撓式透明基材,具有一顯示區和一端子線路區,端子線路區位於顯示區一側,該顯示區具有複數區域,每一區域相鄰排列,於該可撓式透明基材之表面形成一透明導電層。捲對捲圖案化透明導電層,形成複數組感測串列,每一組感測串列具有複數感測列,每一組感測串列分別設置於該顯示區之一區域,每一感測列具有一延伸端點位於該端子線路區。捲對捲形成絕緣層於端子線路區,絕緣層覆蓋部分複數延伸端點。捲對捲圖案化絕緣層,於複數延伸端點形成複數開口,以及捲對捲形成跨接導線串接複數開口於絕緣層之上,每一跨接導線經由該開口電性連接延伸端點使複數感測列電性連接。In order to achieve the above object, a method for manufacturing a touch structure of the present invention comprises: providing a flexible transparent substrate with a roll-to-roll, having a display area and a terminal line area, wherein the terminal line area is located at a side of the display area, The display area has a plurality of regions, each of which is adjacently arranged to form a transparent conductive layer on the surface of the flexible transparent substrate. The roll-to-roll patterning transparent conductive layer forms a complex array sensing series, each set of sensing series has a plurality of sensing columns, and each set of sensing series is respectively disposed in one of the display areas, each sense The test column has an extended end point located in the terminal line region. The roll-to-roll forms an insulating layer in the terminal line region, and the insulating layer covers a portion of the plurality of extended end points. The roll-to-roll patterned insulating layer forms a plurality of openings at the plurality of extended end points, and the roll-to-roll forming jumper wires are connected in series to the insulating layer, and each of the jumper wires is electrically connected to the extended end point via the opening The complex sense column is electrically connected.

為達成上述之目的,本發明之觸控結構之製造方法,其中形成絕緣層之方法可為塗佈法、印刷法或微影蝕刻法。In order to achieve the above object, the method for fabricating the touch structure of the present invention, wherein the method of forming the insulating layer may be a coating method, a printing method or a lithography method.

為達成上述之目的,本發明之觸控結構之製造方法,其中形成複數跨接導線之方法可為印刷法或或微影蝕刻法。To achieve the above object, the method for fabricating the touch structure of the present invention, wherein the method of forming the plurality of jumper wires may be a printing method or a photolithography method.

100,200‧‧‧可撓式透明基材100,200‧‧‧Flexible transparent substrate

21‧‧‧透明導電層21‧‧‧Transparent conductive layer

110,210‧‧‧感測串列110,210‧‧‧Sensor series

111a,111b,111c,211a,211b,211c‧‧‧感測列111a, 111b, 111c, 211a, 211b, 211c‧‧‧ Sensing columns

112a,112b,112c‧‧‧橋接線112a, 112b, 112c‧‧ ‧ bridge wiring

113a,113b,113c,213a,213b,213c‧‧‧延伸端點113a, 113b, 113c, 213a, 213b, 213c‧‧‧ extended endpoints

120a,120b,120c,220a,220b,220c‧‧‧跨接導線120a, 120b, 120c, 220a, 220b, 220c‧‧‧ jumper wires

150a,150b,150c,250a,250b,250c‧‧‧開口150a, 150b, 150c, 250a, 250b, 250c‧‧‧ openings

160,260‧‧‧絕緣層160,260‧‧‧Insulation

170,270‧‧‧透明保護層170,270‧‧‧ transparent protective layer

180,280‧‧‧顯示區180,280‧‧‧ display area

181,281‧‧‧區域181,281‧‧‧Area

190,290‧‧‧端子線路區190,290‧‧‧Terminal line area

第1a圖所示為本發明之一實施例之觸控結構之結構示意圖。FIG. 1a is a schematic structural view of a touch structure according to an embodiment of the present invention.

第1b圖所示為第1a圖之觸控結構依據剖面線AA剖面圖。Figure 1b is a cross-sectional view of the touch structure of Figure 1a according to a section line AA.

第2a圖至第2e圖所示為本發明之一實施例之觸控結構之製 造方法示意圖。2a to 2e are diagrams showing the structure of a touch structure according to an embodiment of the present invention. Schematic diagram of the method of manufacture.

第2f圖至第2k圖所示為第2a圖至第2e圖之觸控結構依據剖面線BB剖面圖。2f to 2k are cross-sectional views taken along line BB of the touch structure of FIGS. 2a to 2e.

請參閱第1a圖所示為本發明之一實施例之觸控結構之結構示意圖,以及第1b圖所示為第1a圖之觸控結構依據剖面線AA剖面圖。首先,本發明之觸控結構包括:可撓式透明基板100、複數組感測串列、一絕緣層以及複數跨接導線,其中可撓式透明基板100為可撓曲之材質所構成,可以捲曲成滾筒狀。可撓式透明基材100之材質例如可為PEN、PET、PES、可撓式玻璃、PMMA、PC或PI之一,也可為上述材質之多層複合材料,而前述材質之上亦可形成有多層之透明堆疊結構之基材,多層之透明堆疊結構例如可為抗反射層等,然並不以此為限。可撓式透明基板100之表面設有顯示區180和端子線路區190,端子線路區190位於顯示區180一側,顯示區180並具有複數區域181,每一區域181係相鄰排列。Please refer to FIG. 1a for a schematic structural view of a touch structure according to an embodiment of the present invention, and FIG. 1b is a cross-sectional view of the touch structure of FIG. 1a according to a cross-sectional line AA. First, the touch structure of the present invention comprises: a flexible transparent substrate 100, a complex array sensing series, an insulating layer, and a plurality of jumper wires, wherein the flexible transparent substrate 100 is made of a flexible material, and Curl into a roller shape. The material of the flexible transparent substrate 100 may be, for example, one of PEN, PET, PES, flexible glass, PMMA, PC or PI, or may be a multilayer composite material of the above materials, and the above materials may be formed thereon. The substrate of the multi-layer transparent stack structure, the transparent stack structure of the plurality of layers may be, for example, an anti-reflection layer or the like, but is not limited thereto. The surface of the flexible transparent substrate 100 is provided with a display area 180 and a terminal line area 190. The terminal line area 190 is located on the side of the display area 180. The display area 180 has a plurality of areas 181, and each area 181 is adjacently arranged.

複數組感測串列110,其中複數感測串列110之材質例如可為透明導電材質,例如可為銦錫氧化物、氧化銦、氧化鋅、氧化銦鋅、摻雜有鋁之氧化鋅、以及摻雜有銻之氧化錫中之一或其混合物,感測串列之數量亦可視需求而增加或減少,每一組感測串列110分別設置於顯示區之一區域181,而每一組感測串列110具有複數感測列111a、111b、111c,而複數感測列111a、111b、111c之形狀可為六角形、條形、三角形、菱形、雪花形等,具體形狀和尺寸可根據控制IC來選擇,且每一感測串列110a、110b、110c具有一延伸端點113a、113b、113c位於端子線路區190。The complex array sensing series 110, wherein the material of the plurality of sensing series 110 can be, for example, a transparent conductive material, such as indium tin oxide, indium oxide, zinc oxide, indium zinc oxide, zinc oxide doped with aluminum, And one or a mixture of antimony-doped tin oxide, the number of sensing series may also be increased or decreased according to requirements, and each set of sensing series 110 is respectively disposed in one of the display areas 181, and each The group sensing series 110 has a plurality of sensing columns 111a, 111b, 111c, and the plurality of sensing columns 111a, 111b, 111c may have a hexagonal shape, a strip shape, a triangle shape, a diamond shape, a snowflake shape, etc., and the specific shape and size may be Selected according to the control IC, and each of the sensing series 110a, 110b, 110c has an extended terminal 113a, 113b, 113c located in the terminal line region 190.

絕緣層160設置於端子線路區190之上,其中絕緣層 160之材質例如可為光阻或絕緣油墨,然並不設限於此。且絕緣層160相對於複數延伸端點113a、113b、113c處具有一開口150a、150b、150c。複數跨接導線120a、120b、120c,設置於絕緣層160之上,每一跨接導線120a、120b、120c經由開口150a、150b、150c電性連接延伸端點113a、113b、113c使複數感測列111a、111b、111c電性連接。再來,可撓式透明基板100之上更具有透明保護層170,僅於端子線路區190與軟性電路板電性連接的區域(無圖示)無透明保護層170覆蓋。透明保護層170之材質可為二氧化矽(SiO2 )、有機絕緣材質、無機絕緣材質或光阻,光阻例如可為液態光阻或乾膜光阻,對於防止感測結構之水氣入侵或氧化的保護相當優異。The insulating layer 160 is disposed on the terminal line region 190. The material of the insulating layer 160 may be, for example, a photoresist or an insulating ink, but is not limited thereto. And the insulating layer 160 has an opening 150a, 150b, 150c with respect to the plurality of extended end points 113a, 113b, 113c. The plurality of jumper wires 120a, 120b, and 120c are disposed on the insulating layer 160, and each of the jumper wires 120a, 120b, and 120c is electrically connected to the extended end points 113a, 113b, and 113c via the openings 150a, 150b, and 150c to perform complex sensing. The columns 111a, 111b, and 111c are electrically connected. Further, the transparent transparent substrate 100 further has a transparent protective layer 170, and is covered only by a transparent protective layer 170 in a region (not shown) where the terminal line region 190 and the flexible circuit board are electrically connected. The transparent protective layer 170 may be made of cerium oxide (SiO 2 ), an organic insulating material, an inorganic insulating material or a photoresist. The photoresist may be, for example, a liquid photoresist or a dry film photoresist, to prevent moisture intrusion of the sensing structure. Or the protection of oxidation is quite excellent.

請參閱第2a圖至第2e圖所示為本發明之一實施例之觸控結構之製造方法示意圖,以及第2f圖至第2k圖所示為第2a圖至第2e圖之觸控結構依據剖面線BB剖面圖。首先,提供可撓式透明基板200,具有一顯示區280和一端子線路區290,端子線路區290位於顯示區280一側,顯示區280具有複數區域281,每一區域281相鄰排列,於可撓式透明基板200之上表面形成透明導電層11,其中透明導電層11例如可為金屬氧化物、奈米銀線或奈米導電金屬,金屬氧化物例如可為氧化銦錫(indium tin oxide,ITO)、氧化銦鋅(indium zinc oxide,IZO)、氧化鎘錫(cadmium tin oxide,CTO)、氧化鋁鋅(aluminum zinc oxide,AZO)、氧化銦鋅錫(indium tin zinc oxide,ITZO)、氧化鋅(zinc oxide)、氧化鎘(cadmium oxide)、氧化鉿(hafnium oxide,HfO)、氧化銦鎵鋅(indium gallium zinc oxide,InGaZnO)、氧化銦鎵鋅鎂(indium gallium zinc magnesium oxide,InGaZnMgO)、氧化銦鎵鎂(indium gallium magnesium oxide,InGaMgO)或氧化銦鎵鋁(indium gallium aluminum oxide,InGaAlO)等)。形成透明導電層11之方法例如可採濺鍍、蒸鍍、真空離子鍍、電鍍、物理氣相沉積(PVD)、化學氣相沉積(CVD)等等手段。再來進行第一道黃光製程將透明導電層11圖案化,其中第一道黃光製程包括形成圖案化光阻層(圖未示)於透明導電層11之上,光阻層之材質可為液態光阻或乾膜光阻。然後進行蝕刻透明導電層11,以及去除圖案化光阻層,形成複數組感測串列210,每一組感測串列210具有複數感測列211a、211b、211c,每一組感測串列210a、210b、210c分別設置於顯示區之一區域281,每一感測串列210a、210b、210c具有一延伸端點213a、213b、213c位於端子線路區290。形成一絕緣層260於端子線路區290,絕緣層260覆蓋部分複數延伸端點213a、213b、213c,其中形成絕緣層之方法例如可為塗佈法、印刷法或微影蝕刻法,然並不設限於此。再來圖案化絕緣層260包含進行第二道黃光製程,於複數延伸端點213a、213b、213c形成複數開口250a、250b、250c;接著形成跨接導線220a、220b、220c串接複數開口250a、250b、250c於絕緣層260之上,形成複數跨接導線之方法例如可為印刷法或微影蝕刻法,其中複數跨接導線之材質例如可為至少一層導電金屬層,或者多層導電金屬層。其材質可為銅合金、鋁合金、金、銀、鋁、銅、鉬等導電金屬或導電合金。多層導電金屬層之結構,例如可為鉬層/鋁層/鉬層之堆疊結構,或者可為選自銅合金、鋁合金、金、銀、鋁、銅、鉬等導電金屬或導電合金之一種或多種材質而堆疊之多層導電金屬層結構,每一跨接導線220a、220b、220c經由開口250a、250b、250c電性連接延伸端點213a、213b、213c,使複數感測列210a、210b、210c電性連接。繼之,於可撓式透明基板200上更可形成一透明保護層270,僅於端子線路區290與軟性電路板電性連接的區域(無圖示)無透明保護層270覆 蓋。透明保護層270對於防止感測結構之水氣入侵或氧化的保護相當優異。Please refer to FIGS. 2 a to 2 e for a schematic diagram of a method for fabricating a touch structure according to an embodiment of the present invention, and FIGS. 2f to 2k for a touch structure according to FIGS. 2a to 2 e. Section line BB section view. First, a flexible transparent substrate 200 is provided having a display area 280 and a terminal line area 290. The terminal line area 290 is located on the side of the display area 280. The display area 280 has a plurality of areas 281, and each area 281 is adjacently arranged. A transparent conductive layer 11 is formed on the upper surface of the flexible transparent substrate 200. The transparent conductive layer 11 can be, for example, a metal oxide, a nano silver wire or a nano conductive metal. The metal oxide can be, for example, indium tin oxide. , ITO), indium zinc oxide (IZO), cadmium tin oxide (CTO), aluminum zinc oxide (AZO), indium tin zinc oxide (ITZO), Zinc oxide, cadmium oxide, hafnium oxide (HfO), indium gallium zinc oxide (InGaZnO), indium gallium zinc magnesium oxide (InGaZnMgO) Indium gallium magnesium oxide (InGaMgO) or indium gallium aluminum (indium gallium) Aluminum oxide, InGaAlO), etc.). The method of forming the transparent conductive layer 11 can be, for example, sputtering, vapor deposition, vacuum ion plating, electroplating, physical vapor deposition (PVD), chemical vapor deposition (CVD), or the like. Then, the first yellow light process is performed to pattern the transparent conductive layer 11 , wherein the first yellow light process comprises forming a patterned photoresist layer (not shown) on the transparent conductive layer 11 , and the material of the photoresist layer can be It is a liquid photoresist or a dry film photoresist. Then etching the transparent conductive layer 11 and removing the patterned photoresist layer to form a complex array sensing series 210, each set of sensing series 210 having a plurality of sensing columns 211a, 211b, 211c, each set of sensing strings Columns 210a, 210b, 210c are respectively disposed in one of the display regions 281, and each of the sensing series 210a, 210b, 210c has an extended terminal 213a, 213b, 213c located in the terminal line region 290. Forming an insulating layer 260 in the terminal line region 290, the insulating layer 260 covers a portion of the plurality of extending terminals 213a, 213b, 213c, wherein the method of forming the insulating layer may be, for example, a coating method, a printing method or a photolithography method, but Limited to this. Then, the patterned insulating layer 260 includes a second yellow light process, forming a plurality of openings 250a, 250b, and 250c at the plurality of extended end points 213a, 213b, and 213c; and then forming jumper wires 220a, 220b, and 220c to connect the plurality of openings 250a. The method for forming a plurality of jumper wires on the insulating layer 260, for example, may be a printing method or a lithography method, wherein the material of the plurality of jumper wires may be, for example, at least one conductive metal layer or a plurality of conductive metal layers. . The material may be a conductive metal or a conductive alloy such as a copper alloy, an aluminum alloy, gold, silver, aluminum, copper or molybdenum. The structure of the multi-layer conductive metal layer may be, for example, a stacked structure of a molybdenum layer/aluminum layer/molybdenum layer, or may be a conductive metal or a conductive alloy selected from the group consisting of copper alloy, aluminum alloy, gold, silver, aluminum, copper, molybdenum, and the like. Or a plurality of layers of conductive metal layer structures stacked with a plurality of materials, each of the jumper wires 220a, 220b, and 220c being electrically connected to the extending end points 213a, 213b, and 213c via the openings 250a, 250b, and 250c, so that the plurality of sensing columns 210a, 210b, 210c is electrically connected. Then, a transparent protective layer 270 is further formed on the flexible transparent substrate 200, and only the region where the terminal line region 290 and the flexible circuit board are electrically connected (not shown) is not covered by the transparent protective layer 270. cover. The transparent protective layer 270 is quite excellent in protection against moisture intrusion or oxidation of the sensing structure.

於另一實施例中(無圖示),形成觸控結構之方法為捲對捲(Roll to Roll)提供具有可撓性之可撓式透明基板捲料,具有一顯示區和一端子線路區,端子線路區位於顯示區一側,顯示區具有複數區域,每一區域相鄰排列,於可撓式透明基板捲料之表面形成透明導電層,其中形成透明導電層之方法例如可採捲對捲濺鍍、捲對捲蒸鍍、捲對捲真空離子鍍、捲對捲電鍍、捲對捲物理氣相沉積(PVD)、捲對捲化學氣相沉積(CVD)等手段。再來進行捲對捲圖案化透明導電層,其包含捲對捲第一道黃光製程將透明導電層圖案化,其中捲對捲第一道黃光製程包括形成圖案化光阻層(圖未示)於透明導電層之上,光阻層之材質可為液態光阻或乾膜光阻。然後進行捲對捲蝕刻透明導電層,以及去除圖案化光阻層,形成複數組感測串列,每一組感測串列具有複數感測列,每一組感測串列分別設置於顯示區之一區域,每一感測串列具有一延伸端點位於端子線路區。接著捲對捲形成絕緣層於端子線路區之上,絕緣層覆設於部分的複數延伸端點之上,其中形成絕緣層之方法例如可為塗佈法、印刷法或微影蝕刻法,然並不設限於此。再來進行捲對捲圖案化絕緣層其包含第二道黃光製程,於絕緣層上相對應於複數延伸端點形成複數開口,接著捲對捲形成複數跨接導線串接複數開口於絕緣層之上。形成複數跨接導線之方法例如可為捲對捲印刷法或捲對捲微影蝕刻法,其中複數跨接導線之材質例如可為至少一層導電金屬層,或者多層導電金屬層。其材質可為銅合金、鋁合金、金、銀、鋁、銅、鉬等導電金屬或導電合金。多層導電金屬層之結構,例如可為鉬層/鋁層/鉬層之堆疊結構,或者可為選自銅合金、鋁合金、金、銀、鋁、銅、鉬等導電 金屬或導電合金之一種或多種材質而堆疊之多層導電金屬層結構。藉由複數跨接導線經由開口電性連接延伸端點使複數感測列電性連接。於此,複數感測列上產生之觸控信號,藉由複數跨接導線電性連接,而將觸控信號傳遞至軸向端子線路。繼之,於可撓式透明基材上更可形成一透明保護層,僅於端子線路區與軟性電路板電性連接的區域(無圖示)無透明保護層覆蓋。透明保護層對於防止感測結構之水氣入侵或氧化的保護相當優異。運用捲對捲製程進行全自動化生產,所以具有簡化製程工序、提高產能、降低人力作業及提升產品的良率等特徵。In another embodiment (not shown), the method of forming a touch structure provides a flexible flexible substrate roll with a flexible display to a roll-to-roll, having a display area and a terminal line area. The terminal line region is located at one side of the display area, and the display area has a plurality of regions, each of which is adjacently arranged to form a transparent conductive layer on the surface of the flexible transparent substrate web, wherein the method for forming the transparent conductive layer is, for example, a roll pair Roll sputtering, roll-to-roll evaporation, roll-to-roll vacuum ion plating, roll-to-roll plating, roll-to-roll physical vapor deposition (PVD), roll-to-roll chemical vapor deposition (CVD). And performing a roll-to-roll patterned transparent conductive layer, comprising a roll-to-roll first yellow light process to pattern the transparent conductive layer, wherein the roll-to-roll first yellow light process comprises forming a patterned photoresist layer (not shown) Shown on the transparent conductive layer, the material of the photoresist layer can be liquid photoresist or dry film photoresist. Then, the roll-to-roll etching transparent conductive layer is performed, and the patterned photoresist layer is removed to form a complex array sensing series. Each group of sensing series has a plurality of sensing columns, and each group of sensing series is respectively disposed on the display. In one of the zones, each sense train has an extended end point located in the terminal line zone. Then, the roll-to-roll is formed with an insulating layer over the terminal line region, and the insulating layer is overlaid on the plurality of extended end points of the portion, wherein the method of forming the insulating layer can be, for example, coating, printing or lithography. It is not limited to this. Then, the roll-to-roll patterned insulating layer comprises a second yellow light process, and a plurality of openings are formed on the insulating layer corresponding to the plurality of extended end points, and then the roll-to-roll forms a plurality of jumper wires connected in series to the insulating layer Above. The method of forming the plurality of jumper wires may be, for example, a roll-to-roll printing method or a roll-to-roll lithography method, wherein the material of the plurality of jumper wires may be, for example, at least one conductive metal layer or a plurality of conductive metal layers. The material may be a conductive metal or a conductive alloy such as a copper alloy, an aluminum alloy, gold, silver, aluminum, copper or molybdenum. The structure of the multi-layer conductive metal layer may be, for example, a stacked structure of a molybdenum layer/aluminum layer/molybdenum layer, or may be a conductive material selected from the group consisting of copper alloy, aluminum alloy, gold, silver, aluminum, copper, molybdenum, and the like. A multilayer conductive metal layer structure stacked with one or more materials of a metal or a conductive alloy. The plurality of jumper wires are electrically connected by extending the end points via the openings to electrically connect the plurality of sense columns. In this case, the touch signals generated on the plurality of sensing columns are electrically connected by the plurality of jumper wires, and the touch signals are transmitted to the axial terminal lines. Then, a transparent protective layer can be formed on the flexible transparent substrate, and only the region where the terminal line region and the flexible circuit board are electrically connected (not shown) is covered by the transparent protective layer. The transparent protective layer is excellent in protection against moisture intrusion or oxidation of the sensing structure. Fully automated production using the roll-to-roll process, it features features such as streamlined process, increased productivity, reduced manpower and improved product yield.

本發明具有裝置薄型化、優越的觸控靈敏度、低製造成本與製作良率高等優點。雖然本發明已以實施例揭露如上,然其並非用以限定本發明。任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視申請專利範圍所界定者為準。The invention has the advantages of thinner device, superior touch sensitivity, low manufacturing cost and high production yield. Although the present invention has been disclosed above by way of example, it is not intended to limit the invention. The scope of the present invention is defined by the scope of the claims, and the scope of the invention is intended to be limited by the scope of the invention.

100‧‧‧可撓式透明基材100‧‧‧Flexible transparent substrate

110‧‧‧感測串列110‧‧‧Sensor series

111a,111b,111‧‧‧感測列111a, 111b, 111‧‧‧ Sensing columns

112a,112b,112c‧‧‧橋接線112a, 112b, 112c‧‧ ‧ bridge wiring

113a,113b,113c‧‧‧延伸端點113a, 113b, 113c‧‧‧ extended endpoints

120a,120b,120c‧‧‧跨接導線120a, 120b, 120c‧‧‧ jumper wires

160‧‧‧絕緣層160‧‧‧Insulation

170‧‧‧透明保護層170‧‧‧Transparent protective layer

180‧‧‧顯示區180‧‧‧ display area

181‧‧‧區域181‧‧‧Area

190‧‧‧端子線路區190‧‧‧Terminal line area

Claims (7)

一種觸控結構,包括:一可撓式透明基材,具有一顯示區和一端子線路區,該端子線路區位於該顯示區一側,該顯示區具有複數區域;複數組感測串列,每一組感測串列具有複數感測列,每一組感測串列分別設置於該顯示區之一區域,每一區域相鄰排列,每一感測列具有一延伸端點位於該端子線路區;一絕緣層,僅接於該端子線路區之上,且該絕緣層相對於該些延伸端點處具有一開口;以及複數跨接導線,設置於該絕緣層之上,每一跨接導線經由該開口電性連接延伸端點使複數感測列電性連接。 A touch structure includes: a flexible transparent substrate having a display area and a terminal line area, the terminal line area is located on a side of the display area, the display area has a plurality of areas; a complex array sensing series, Each set of sensing series has a plurality of sensing columns, each set of sensing series is respectively disposed in an area of the display area, each area is adjacently arranged, and each sensing column has an extended end located at the terminal a line region; an insulating layer connected only to the terminal line region, and the insulating layer has an opening with respect to the extension ends; and a plurality of jumper wires disposed on the insulating layer, each span The connecting wires are electrically connected to the extending end points via the openings to electrically connect the plurality of sensing columns. 如申請專利範圍第1項之觸控結構,其中該絕緣層可為光阻或絕緣油墨。 The touch structure of claim 1, wherein the insulating layer is a photoresist or an insulating ink. 如申請專利範圍第1項之觸控結構,其中該些跨接導線可為銀漿、奈米銀、石墨硒或奈米碳管。 The touch structure of claim 1, wherein the jumper wires are silver paste, nano silver, graphite selenium or carbon nanotubes. 一種觸控結構之製造方法,其包含:提供一可撓式透明基材,具有一顯示區和一端子線路區,該端子線路區位於該顯示區一側,該顯示區具有複數區域,每一區域相鄰排列,於該可撓式透明基材之表面形成一透明導電層;圖案化該透明導電層,形成複數組感測串列,每一組感測串列具有複數感測列,每一組感測串列分別設置於該顯示區之一區域,每一感測列具有一延伸端點位於該端子線路區;形成一絕緣層僅接於端子線路區,該絕緣層覆蓋部分該些延伸端 點;圖案化該絕緣層,於該些延伸端點形成複數開口;以及形成跨接導線串接該些開口於絕緣層之上,每一跨接導線經由該開口電性連接延伸端點使複數感測列電性連接。 A method for manufacturing a touch structure, comprising: providing a flexible transparent substrate having a display area and a terminal line area, the terminal line area being located on a side of the display area, the display area having a plurality of areas, each The regions are adjacently arranged to form a transparent conductive layer on the surface of the flexible transparent substrate; the transparent conductive layer is patterned to form a complex array sensing series, and each set of sensing series has a plurality of sensing columns, each a sensing sequence is respectively disposed in an area of the display area, each sensing column has an extended end point located in the terminal line area; forming an insulating layer only connected to the terminal line area, the insulating layer covering the part Extended end a plurality of openings are formed at the extension ends; and a jumper wire is formed in series to connect the openings to the insulating layer, and each of the jumper wires is electrically connected to the extended end point via the opening to make the plurality Sensing the electrical connection. 一種觸控結構之製造方法,其包含:捲對捲提供一可撓式透明基材,具有一顯示區和一端子線路區,該端子線路區位於該顯示區一側,該顯示區具有複數區域,每一區域相鄰排列,於該可撓式透明基材之表面形成一透明導電層;捲對捲圖案化該透明導電層,形成複數組感測串列,每一組感測串列具有複數感測列,每一組感測串列分別設置於該顯示區之一區域,每一感測列具有一延伸端點位於該端子線路區;捲對捲形成一絕緣層僅接於端子線路區,該絕緣層覆蓋部分該些延伸端點;捲對捲圖案化該絕緣層,於該些延伸端點形成複數開口;以及捲對捲形成跨接導線串接該些開口於絕緣層之上,每一跨接導線經由該開口電性連接延伸端點使複數感測列電性連接。 A manufacturing method of a touch structure, comprising: a roll-to-roll providing a flexible transparent substrate, having a display area and a terminal line area, the terminal line area being located at a side of the display area, the display area having a plurality of areas Each region is adjacently arranged to form a transparent conductive layer on the surface of the flexible transparent substrate; the transparent conductive layer is patterned by roll-to-roll to form a complex array sensing series, and each set of sensing series has a plurality of sensing columns, each of the sensing series being respectively disposed in an area of the display area, each sensing column having an extended end point located in the terminal line area; the roll-to-roll forming an insulating layer only connected to the terminal line a region, the insulating layer covers a portion of the extended end points; the roll-to-roll patterning the insulating layer forms a plurality of openings at the extended ends; and the roll-to-roll forming jumper wires are connected in series to the openings above the insulating layer Each of the jumper wires is electrically connected to the extended end point via the opening to electrically connect the plurality of sensing columns. 如申請專利範圍第4項或第5項之觸控結構之製造方法,其中形成該絕緣層之方法可為塗佈法、印刷法或微影蝕刻法。 The method for manufacturing a touch structure according to claim 4 or 5, wherein the method of forming the insulating layer may be a coating method, a printing method or a lithography method. 如申請專利範圍第4項或第5項之觸控結構之製造方法,其中形成該些跨接導線之方法可為印刷法或或微影蝕刻法。 The method for manufacturing a touch structure according to claim 4 or 5, wherein the method of forming the jumper wires may be a printing method or a photolithography method.
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