TWI509079B - Heat treatment device - Google Patents
Heat treatment device Download PDFInfo
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- TWI509079B TWI509079B TW102140995A TW102140995A TWI509079B TW I509079 B TWI509079 B TW I509079B TW 102140995 A TW102140995 A TW 102140995A TW 102140995 A TW102140995 A TW 102140995A TW I509079 B TWI509079 B TW I509079B
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Description
本發明係關於熱處理裝置。The present invention relates to a heat treatment apparatus.
已知有一種熱處理裝置,其用以對半導體用之材料等之被處理物進行熱處理(例如,參照專利文獻1)。專利文獻1所記載之熱處理裝置,係於爐內具有以風罩覆蓋被處理物之構成。於風罩上形成有噴嘴。自該噴嘴向被處理物輸送熱風。There is known a heat treatment apparatus for heat-treating a workpiece such as a material for a semiconductor (for example, refer to Patent Document 1). The heat treatment apparatus described in Patent Document 1 has a configuration in which a workpiece is covered with a wind cover in a furnace. A nozzle is formed on the hood. Hot air is delivered from the nozzle to the object to be processed.
更為具體而言,平板狀之被處理物係藉由上下隔開間隔配置多個而構成一區塊。並且,於水平方向也排列配置有複數個區塊。複數個區塊係以鉛直方向之位置被錯開之狀態所配置。而噴嘴係向最靠近該噴嘴之區塊之間隙輸送熱風。More specifically, the flat object is formed by arranging a plurality of blocks at intervals. Further, a plurality of blocks are arranged in the horizontal direction. A plurality of blocks are arranged in a state in which the position in the vertical direction is shifted. The nozzle delivers hot air to the gap closest to the block of the nozzle.
[專利文獻1]日本專利特開平6-267425號公報([摘要])[Patent Document 1] Japanese Patent Laid-Open No. Hei 6-267425 ([Abstract])
於熱處理裝置中,為了使各被處理物之處理狀態更均等,將被加熱之氣體係以更均等之分布供給於被處理物為較佳。然而,專利文獻1記載之構成中,由於噴嘴之方向係被固定,無法藉由改變 噴嘴之方向來調整朝向被處理物之氣流。In the heat treatment apparatus, in order to make the treatment state of each of the objects to be processed more uniform, it is preferable to supply the gas system to be heated to the object to be treated in a more uniform distribution. However, in the configuration described in Patent Document 1, since the direction of the nozzle is fixed, it cannot be changed by The direction of the nozzle adjusts the airflow toward the object to be treated.
在此,可考慮藉由調整噴嘴之方向來調整氣流之方向等的構成。然而,於熱處理中,配置有噴嘴之爐內係例如為數百℃之高溫。因此,作業員等為了調整噴嘴之方向,需要於停止熱處理裝置之運轉之後,一直等到爐內之溫度降低為止,因此造成噴嘴之調整作業花費時間。此外,為了調整噴嘴,還需要暫時停止熱處理裝置。因此,噴嘴之調整作業費時費力。Here, a configuration in which the direction of the airflow is adjusted by adjusting the direction of the nozzle can be considered. However, in the heat treatment, the furnace in which the nozzle is disposed is, for example, a high temperature of several hundred ° C. Therefore, in order to adjust the direction of the nozzle, the operator or the like needs to wait until the temperature in the furnace is lowered after the operation of the heat treatment apparatus is stopped, so that it takes time to adjust the nozzle. In addition, in order to adjust the nozzle, it is necessary to temporarily stop the heat treatment device. Therefore, the adjustment of the nozzle is time consuming and labor intensive.
本發明係鑑於上述事由,其目的在於,在熱處理裝置中可更容易地調整高溫之氣流。The present invention has been made in view of the above circumstances, and an object thereof is to more easily adjust a high-temperature airflow in a heat treatment apparatus.
(1)為了解決上述問題,本發明之一局面的熱處理裝置,其具備有:通道,其可使被加熱之氣體通過;氣流調整構件,其可對朝向可配置被處理物之處理室而通過上述通道之氣流進行調整;及操作裝置,其可自上述通道的外部對上述氣流調整構件進行操作。(1) In order to solve the above problems, a heat treatment apparatus according to one aspect of the present invention includes: a passage through which a heated gas can pass; and an air flow adjustment member which can pass through a processing chamber facing the configurable object to be processed The airflow of the passage is adjusted; and an operating device that operates the airflow adjusting member from outside the passage.
根據此構成,藉由設置氣流調整構件,可對供給於配置在處理室內之被處理物之氣流進行調整。藉此,可更均等地將熱風供給於被處理物。此外,藉由設置操作裝置,可自通道之外部操作氣流調整構件。因此,即使於熱處理裝置之運轉中,作業員不用進入高溫之通道內,而仍可操作氣流調整構件。藉此,不用停止熱處理裝置,即可進行氣流調整。藉此,可更容易調整高溫之氣流。According to this configuration, by providing the air flow adjusting member, the airflow supplied to the workpiece disposed in the processing chamber can be adjusted. Thereby, hot air can be supplied to the object to be processed more uniformly. Further, by providing the operating device, the air flow adjusting member can be operated from the outside of the passage. Therefore, even in the operation of the heat treatment apparatus, the operator can operate the air flow adjusting member without entering the passage of the high temperature. Thereby, the airflow adjustment can be performed without stopping the heat treatment apparatus. Thereby, it is easier to adjust the high temperature airflow.
(2)較佳為,上述操作裝置包含有:在上述通道內而連結於上述氣流調整構件之連結部;及配置在上述通道的外部,而與上述連結部產生連動且可進行位移之操作部。(2) Preferably, the operation device includes: a connection portion that is coupled to the airflow adjustment member in the passage; and an operation portion that is disposed outside the passage and that is movable in conjunction with the connection portion and is displaceable .
根據此構成,藉由對操作部進行操作以使連結部動作, 其結果,氣流調整構件發生位移。藉此,可進行使用氣流調整構件之氣流的調整。According to this configuration, by operating the operation unit to operate the connection unit, As a result, the air flow adjusting member is displaced. Thereby, the adjustment of the air flow using the air flow adjusting member can be performed.
(3)更佳為,上述熱處理裝置係更具備有形成上述通道之整流室、及配置有上述操作部之操作室,而上述整流室係配置相鄰於上述操作室,且配置相鄰於上述處理室。(3) More preferably, the heat treatment apparatus further includes a rectifying chamber that forms the passage and an operation chamber in which the operation unit is disposed, and the rectifying chamber is disposed adjacent to the operation chamber, and is disposed adjacent to the operation chamber Processing room.
根據此構成,可緊湊地配置整流室、操作室及處理室。藉此,可將熱處理裝置整體之結構小型化。According to this configuration, the rectification chamber, the operation chamber, and the processing chamber can be arranged compactly. Thereby, the structure of the whole heat processing apparatus can be miniaturized.
(4)更佳為,自上述整流室朝向上述處理室之方向,與自上述整流室朝向上述操作室之方向係不為相同。(4) More preferably, the direction from the rectifying chamber toward the processing chamber is not the same as the direction from the rectifying chamber toward the operating chamber.
根據此構成,可於整流室內減小自朝向處理室之高溫氣流傳遞至操作室之傳熱量。因此,可抑制操作室成為高溫之情況。According to this configuration, the amount of heat transfer from the high-temperature airflow toward the processing chamber to the operating chamber can be reduced in the rectifying chamber. Therefore, it is possible to suppress the operation chamber from becoming a high temperature.
(5)較佳為,於上述整流室之出口配置有上述氣流調整構件。(5) Preferably, the air flow adjusting member is disposed at an exit of the rectifying chamber.
根據此構成,可將朝向處理室之氣流更確實地調整為所需之流向。According to this configuration, the airflow toward the processing chamber can be more reliably adjusted to the desired flow direction.
(6)較佳為,上述氣流調整構件包含有用於將封閉上述通道的比例加以調整之遮板構件,上述操作裝置係連結於上述遮板構件且可使上述遮板構件產生位移。(6) Preferably, the airflow adjusting member includes a shutter member for adjusting a ratio of closing the passage, and the operating device is coupled to the shutter member to displace the shutter member.
根據此構成,藉由使用操作裝置使遮板構件位移,可調整朝向處理室之氣流。According to this configuration, the airflow toward the processing chamber can be adjusted by displacing the shutter member using the operating device.
(7)較佳為,上述氣流調整構件係包含有配置於上述通道內之風向調整構件,上述操作裝置係連結於上述風向調整構件且可改變上述風向調整構件之方向。(7) Preferably, the airflow adjusting member includes a wind direction adjusting member disposed in the passage, and the operating device is coupled to the wind direction adjusting member and can change a direction of the wind direction adjusting member.
根據此構成,藉由使用操作構件使風向調整構件位移, 可調整通過通道流向處理室之氣流之方向。According to this configuration, the wind direction adjusting member is displaced by using the operating member, The direction of the airflow through the channel to the processing chamber can be adjusted.
(8)較佳為,上述氣體係相對於在上述通道中之上述氣流的行進方向朝呈交叉之方向而被導入至上述通道。(8) Preferably, the gas system is introduced into the passage in a direction intersecting with respect to a traveling direction of the air current in the passage.
根據此構成,可將用以產生通過通道之氣流之風扇等之構件配置於與通道中之氣流的行進方向交叉之方向。藉此,不需要將上述風扇等之構件沿通道中之氣流的行進方向配置,可進一步提高熱處理裝置中之各構件的配置之自由度。其結果,例如可實現熱處理裝置之更加小型化等。According to this configuration, a member for generating a fan or the like through the air passage of the passage can be disposed in a direction crossing the traveling direction of the airflow in the passage. Thereby, it is not necessary to arrange the members such as the above-described fan along the traveling direction of the airflow in the duct, and the degree of freedom in the arrangement of the members in the heat treatment apparatus can be further improved. As a result, for example, it is possible to further reduce the size of the heat treatment apparatus.
根據本發明,可於熱處理裝置中更容易地進行高溫氣流之調整。According to the present invention, the adjustment of the high-temperature airflow can be performed more easily in the heat treatment apparatus.
1、1A‧‧‧熱處理裝置1, 1A‧‧‧ heat treatment unit
2‧‧‧框體2‧‧‧ frame
3‧‧‧熱風產生裝置3‧‧‧hot air generating device
4‧‧‧整流室4‧‧‧Rectifier room
5‧‧‧處理室5‧‧‧Processing room
6‧‧‧晶舟6‧‧‧The boat
7‧‧‧氣流回送構件7‧‧‧Airflow return member
8‧‧‧遮板構件(氣流調整構件)8‧‧‧Shutter member (airflow adjustment member)
9、9B‧‧‧操作裝置9, 9B‧‧‧ operating device
10‧‧‧操作室10‧‧‧Operating room
11‧‧‧架台11‧‧‧ 台台
12‧‧‧加熱氣12‧‧‧heating gas
13‧‧‧風扇13‧‧‧Fan
14‧‧‧導引構件14‧‧‧Guide members
15‧‧‧通道15‧‧‧ channel
16‧‧‧排氣口16‧‧‧Exhaust port
19‧‧‧門19‧‧‧
21~24‧‧‧側壁21~24‧‧‧ side wall
25~27‧‧‧側壁25~27‧‧‧ side wall
28‧‧‧門28‧‧‧
31~36‧‧‧噴嘴孔(處理室之出口)31~36‧‧‧Nozzle hole (export of treatment room)
91~93‧‧‧操作裝置91~93‧‧‧Operating device
91b、92b、93b‧‧‧操作部91b, 92b, 93b‧‧‧Operation Department
91c、91d‧‧‧連結部91c, 91d‧‧‧ link
92c、92d‧‧‧連結部92c, 92d‧‧‧ link
93c、93d‧‧‧連結部93c, 93d‧‧‧ link
101d、101e、102d、102e‧‧‧百葉板本體(氣流調整構件、風向調整構件)101d, 101e, 102d, 102e‧‧‧ louver body (airflow adjustment member, wind direction adjustment member)
110‧‧‧第2操作裝置(操作裝置)110‧‧‧2nd operating device (operating device)
111b、112b‧‧‧操作部111b, 112b‧‧‧Operation Department
111c、112c‧‧‧連結部111c, 112c‧‧‧ link
200‧‧‧被處理物200‧‧‧Processed objects
A1‧‧‧氣流A1‧‧‧ airflow
D1‧‧‧第1行進方向D1‧‧‧1st direction of travel
D2‧‧‧第2行進方向D2‧‧‧2nd direction of travel
圖1為顯示本發明之實施形態之熱處理裝置的構成之模式圖。Fig. 1 is a schematic view showing the configuration of a heat treatment apparatus according to an embodiment of the present invention.
圖2為熱處理裝置之主要部分之俯視圖,且以將一部分切斷之狀態顯示。Fig. 2 is a plan view showing a main part of the heat treatment apparatus, and is shown in a state in which a part is cut off.
圖3為顯示自行進方向之上游側所視之整流室內部之狀態之圖,且部分以剖面顯示。Fig. 3 is a view showing a state of the inside of the rectifying chamber viewed from the upstream side in the self-propelled direction, and partly shown in cross section.
圖4為本發明之第2實施形態之熱處理裝置的主要部分之俯視模式圖,且部分以剖面顯示。Fig. 4 is a plan view schematically showing a main part of a heat treatment apparatus according to a second embodiment of the present invention, and partly shown in cross section.
圖5為熱處理裝置之內部之百葉板周邊之側視圖,且部分以剖面顯示。Figure 5 is a side elevational view of the periphery of the louver of the interior of the heat treatment apparatus, and is partially shown in cross section.
圖6為熱處理裝置之內部之百葉板周邊之側視圖,且部分以剖面顯示。Figure 6 is a side elevational view of the periphery of the louver of the interior of the heat treatment apparatus, and is partially shown in cross section.
圖7為顯示變化例之主要部分之俯視圖,且部分以剖面顯示。Fig. 7 is a plan view showing a main part of a modification, and a part is shown in section.
以下,參照圖式對用以實施本發明之形態進行說明。又,本發明可作為用以對被處理物進行熱處理之熱處理裝置而廣泛使用。Hereinafter, embodiments for carrying out the invention will be described with reference to the drawings. Further, the present invention can be widely used as a heat treatment apparatus for heat-treating a workpiece.
圖1為顯示本發明之實施形態之熱處理裝置1的構成之模式圖。參照圖1,熱處理裝置1係用以對被處理物200實施熱處理之裝置。被處理物200係例如為半導體晶圓,其形成為圓板狀。作為於熱處理裝置1進行之熱處理,可例示烘烤處理等。Fig. 1 is a schematic view showing the configuration of a heat treatment apparatus 1 according to an embodiment of the present invention. Referring to Fig. 1, a heat treatment apparatus 1 is a device for performing heat treatment on a workpiece 200. The workpiece 200 is, for example, a semiconductor wafer formed in a disk shape. As the heat treatment performed in the heat treatment apparatus 1, a baking treatment or the like can be exemplified.
熱處理裝置1具有框體2、熱風產生裝置3、整流室4、處理室5、晶舟6、氣流回送構件7、複數之遮板構件(氣流調整構件)8、複數之操作裝置9、及操作室10。The heat treatment apparatus 1 has a frame 2, a hot air generating device 3, a rectifying chamber 4, a processing chamber 5, a boat 6, a gas returning member 7, a plurality of shutter members (airflow adjusting members) 8, a plurality of operating devices 9, and an operation Room 10.
框體2例如形成為中空之箱形形狀。圖1中,框體2之一部分係以虛擬輪廓線即二點點劃線所圖示。框體2係收容熱風產生裝置3、遮板構件8及操作裝置9之一部分等。The frame 2 is formed, for example, in a hollow box shape. In Fig. 1, a part of the frame 2 is illustrated by a virtual outline, that is, a two-dot chain line. The casing 2 houses a part of the hot air generating device 3, the shutter member 8, and the operating device 9.
熱風產生裝置3係對框體2內之氣體進行加熱,且構成為能產生此氣體之氣流即氣流A1。熱風產生裝置3例如配置於框體2之上部。此外,本實施形態中,熱風產生裝置3係配置於整流室4之斜上方。The hot air generating device 3 heats the gas in the casing 2, and is configured to generate a gas flow A1 which is a gas flow of the gas. The hot air generator 3 is disposed, for example, on the upper portion of the casing 2. Further, in the present embodiment, the hot air generating device 3 is disposed obliquely above the rectifying chamber 4.
熱風產生裝置3具有架台11、加熱器12、風扇13及導引構件14。The hot air generating device 3 has a gantry 11, a heater 12, a fan 13, and a guiding member 14.
架台11係作為熱風產生裝置3之骨架而設置,例如,形成為中空之箱狀。架台11係固定於框體2。架台11係支持加熱器12、風扇13及導引構件14等。於架台11之內部形成有可供氣體通過 之空間。於朝架台11之內部空間之入口配置有加熱器12。The gantry 11 is provided as a skeleton of the hot air generating device 3, and is formed, for example, in a hollow box shape. The gantry 11 is fixed to the casing 2. The gantry 11 supports the heater 12, the fan 13, the guide member 14, and the like. Formed inside the gantry 11 for gas to pass through Space. A heater 12 is disposed at an entrance to the internal space of the gantry 11.
加熱器12例如為電熱式加熱器,其設置為用以反複地對通過熱處理室5之氣體進行加熱。加熱器12係設置於架台11之例如一邊緣部。加熱器12係將氣體加熱為例如數百℃。通過加熱器12之氣體,於架台11內被吸入至風扇13。The heater 12 is, for example, an electrothermal heater provided to repeatedly heat the gas passing through the heat treatment chamber 5. The heater 12 is disposed on, for example, an edge portion of the gantry 11. The heater 12 heats the gas to, for example, several hundred °C. The gas passing through the heater 12 is sucked into the fan 13 in the gantry 11.
風扇13係設置為用以於框體2內產生氣流A1。風扇13例如包含電動馬達及連結於此電動馬達之輸出軸之螺旋翼,藉由此電動馬達之驅動,以使螺旋翼旋轉。藉此,產生氣流A1。The fan 13 is configured to generate an air flow A1 in the casing 2. The fan 13 includes, for example, an electric motor and a spiral wing coupled to the output shaft of the electric motor, and the electric motor is driven to rotate the spiral blade. Thereby, the air flow A1 is generated.
此外,風扇13只要能產生氣流即可,其構造不受限制。作為風扇13可例示槳翼式風扇、橫流扇等。風扇13係將高溫氣體向導引構件14吹出。Further, the fan 13 is not limited as long as it can generate an air flow. As the fan 13, a paddle type fan, a cross flow fan, or the like can be exemplified. The fan 13 blows high temperature gas to the guide member 14.
導引構件14係作為用以將氣體輸送給整流室4之通道15之導向構件而設置。導引構件14例如為板狀之構件,具有朝向通道15之一側面。The guiding member 14 is provided as a guide member for conveying gas to the passage 15 of the rectifying chamber 4. The guiding member 14 is, for example, a plate-like member having a side facing the passage 15.
整流室4係作為形成可供由加熱器12所加熱之氣體通過之通道15之部分而設置。整流室4例如形成為中空之長方體形,其俯視為形成矩形。此整流室4之上端開放,於整流室4之內部形成有通道15。The rectifying chamber 4 is provided as a portion forming a passage 15 through which the gas heated by the heater 12 passes. The rectifying chamber 4 is formed, for example, in a hollow rectangular parallelepiped shape, and is formed in a rectangular shape in plan view. The upper end of the rectifying chamber 4 is open, and a passage 15 is formed inside the rectifying chamber 4.
整流室4具有上下延伸之4個側壁21~24。這些4個側壁21~24係於俯視時整體配置為矩形狀。側壁21係構成框體2之前壁之一部分。側壁22係與側壁21對向配置,其作為區隔通道15與處理室5內之空間之隔壁而設置。The rectifying chamber 4 has four side walls 21 to 24 extending up and down. These four side walls 21 to 24 are arranged in a rectangular shape as a whole in a plan view. The side wall 21 forms part of the front wall of the frame 2. The side wall 22 is disposed opposite to the side wall 21, and is provided as a partition wall 15 and a partition wall in the processing chamber 5.
側壁23係構成框體2之左側壁之一部分。又,本實施形態中,以與側壁21對向之作業員為基準,而稱為前後左右。本實施 形態中,側壁23係設置為可自框體2之其他部分拆卸,藉由拆下側壁23,作業員可出入框體2內。側壁24係與側壁23對向配置,且位於框體2內。本實施形態中,由側壁21~24及底壁所圍成之區域即為通道15。The side wall 23 constitutes a part of the left side wall of the frame 2. Further, in the present embodiment, the operator is opposed to the side wall 21, and is referred to as front, rear, left, and right. This implementation In the form, the side wall 23 is provided to be detachable from the other portion of the frame 2, and the operator can enter and exit the frame 2 by removing the side wall 23. The side wall 24 is disposed opposite to the side wall 23 and is located inside the frame 2. In the present embodiment, the region surrounded by the side walls 21 to 24 and the bottom wall is the channel 15.
藉由導引構件14改變方向之氣流A1,自此通道15之斜上方被導向此通道15。亦即,加熱後之氣體通過通道15。作為通道15中之氣流A1之行進方向的一例之第2行進方向D2,與作為剛通過導引構件14後之氣流A1之行進方向之第1行進方向D1不同。The airflow A1, which is redirected by the guiding member 14, is guided to the passage 15 from obliquely above the passage 15. That is, the heated gas passes through the passage 15. The second traveling direction D2 which is an example of the traveling direction of the airflow A1 in the passage 15 is different from the first traveling direction D1 which is the traveling direction of the airflow A1 immediately after passing through the guiding member 14.
具體而言,第1行進方向D1係朝向框體2之前斜左下方之方向。相對於此,第2行進方向D2係向框體2之後方筆直(略水平)延伸之方向,且與第1行進方向D1交叉。藉由此種構成,氣流A1於通過導引構件14之後,於通道15內被改變方向,而於通道15內沿第2行進方向D2行進。於側壁22形成有複數個後述之噴嘴孔,通道15內之氣體通過此噴嘴孔進入處理室5。Specifically, the first traveling direction D1 is directed in a direction obliquely to the lower left side before the casing 2 . On the other hand, the second traveling direction D2 is a direction in which the rearward direction of the casing 2 is straight (slightly horizontal) and intersects with the first traveling direction D1. With this configuration, the airflow A1 is redirected in the passage 15 after passing through the guide member 14, and travels in the second traveling direction D2 in the passage 15. A plurality of nozzle holes, which will be described later, are formed in the side wall 22, and the gas in the passage 15 enters the processing chamber 5 through the nozzle holes.
處理室5係作為於被處理物200之熱處理時配置此被處理物200之部分而設置。處理室5係以鄰接於整流室4之方式形成,例如,形成為中空之長方體形狀。處理室5具有門19。於打開此門19之狀態下,作業員可將載置有被處理物200之晶舟6搬進搬出。The processing chamber 5 is provided as a portion where the workpiece 200 is disposed during heat treatment of the workpiece 200. The processing chamber 5 is formed adjacent to the rectifying chamber 4, and is formed, for example, in a hollow rectangular parallelepiped shape. The processing chamber 5 has a door 19. In a state in which the door 19 is opened, the operator can carry in and out the wafer boat 6 on which the workpiece 200 is placed.
晶舟6係塔狀之構件。晶舟6係構成為以上下隔開間隔之狀態支持複數之被處理物200。此外,當於熱處理裝置1內進行熱處理時,門19為被關閉之狀態。處理室5內形成有排氣口16。排氣口16例如形成於第2行進方向D2之處理室5之下游側的側壁。處理室5內之氣體通過排氣口16被導入氣流回送構件7。The boat 7 is a tower-shaped member. The wafer boat 6 is configured to support a plurality of objects 200 to be processed in a state in which the wafers are spaced apart from each other. Further, when heat treatment is performed in the heat treatment apparatus 1, the door 19 is in a closed state. An exhaust port 16 is formed in the processing chamber 5. The exhaust port 16 is formed, for example, on the side wall on the downstream side of the processing chamber 5 in the second traveling direction D2. The gas in the processing chamber 5 is introduced into the airflow returning member 7 through the exhaust port 16.
氣流回送構件7係設置為用以使通過處理室5之氣體返 回熱風產生裝置3之加熱器12。氣流回送構件7例如為導管構件。氣流回送構件7之一端連接於排氣口16。氣流回送構件7之另一端連接於加熱器12。藉由此種構成,通過排氣口16之氣流A1通過氣流回送構件7之內部而被送回加熱器12。The air return member 7 is configured to return the gas passing through the processing chamber 5 The heater 12 of the hot air generating device 3 is returned. The airflow returning member 7 is, for example, a duct member. One end of the air return member 7 is connected to the exhaust port 16. The other end of the airflow returning member 7 is connected to the heater 12. With this configuration, the airflow A1 passing through the exhaust port 16 is returned to the heater 12 through the inside of the airflow returning member 7.
為了實施更均等之處理,以藉由熱處理裝置1所熱處理之複數個被處理物200盡可能均等地接受熱風為較佳。對使用於此之構成,更具體地進行說明。以下,對用以調整自整流室4輸送至處理室5之熱風的分布之構成進行說明。In order to carry out the more uniform treatment, it is preferred that the plurality of objects to be treated 200 heat-treated by the heat treatment apparatus 1 receive hot air as uniformly as possible. The configuration used here will be described more specifically. Hereinafter, a configuration for adjusting the distribution of the hot air sent from the rectification chamber 4 to the processing chamber 5 will be described.
操作室10係於作業員對自整流室4送至處理室5之熱風的分布進行調整時,作為該作業員進行作業之場所而設置。操作室10係與框體2之整流室4相鄰配置。又,本實施形態中,操作室10係配置於框體2之外部,但也可配置於框體2之內部。The operation room 10 is installed as a place where the worker performs work when the operator adjusts the distribution of the hot air sent from the rectification chamber 4 to the processing chamber 5. The operation room 10 is disposed adjacent to the rectification chamber 4 of the casing 2. Further, in the present embodiment, the operation room 10 is disposed outside the casing 2, but may be disposed inside the casing 2.
圖2為熱處理裝置1之主要部分之俯視圖,且以將一部分切斷之狀態顯示。參照圖1及圖2,操作室10係具有4個側壁23、25~27、及門28。亦即,本實施形態中,側壁23係整流室4之一個要素,且是操作室10之一個要素。Fig. 2 is a plan view showing a main part of the heat treatment apparatus 1 and is shown in a state in which a part is cut. Referring to FIGS. 1 and 2, the operation room 10 has four side walls 23, 25 to 27, and a door 28. That is, in the present embodiment, the side wall 23 is one element of the rectifying chamber 4 and is an element of the operation room 10.
這些4個側壁23、25~27係於俯視時整體配置為矩形狀。例如,於側壁25安裝有門28。作業員通過此門28可出入於操作室10。These four side walls 23 and 25 to 27 are arranged in a rectangular shape as a whole in a plan view. For example, a door 28 is mounted to the side wall 25. The operator can enter and exit the operation room 10 through the door 28.
操作室10與整流室4之間係採用氣密性密封構造。具體而言,本實施形態中,於側壁21與側壁25之連接部配置有密封構件29。此外,於側壁22與側壁27之連接部配置有密封構件30。A hermetic sealing structure is adopted between the operation chamber 10 and the rectification chamber 4. Specifically, in the present embodiment, the sealing member 29 is disposed at the connection portion between the side wall 21 and the side wall 25. Further, a sealing member 30 is disposed at a connection portion between the side wall 22 and the side wall 27.
密封構件29、30例如為矽橡膠製,用以氣密性地密封對應之側壁21,25、22,27之間。藉由此構成,即使於熱處理裝置1之 熱處理動作時,通過整流室4之熱風也不會進入操作室10。因此,即使於上述熱處理動作時,操作室10仍維持接近於常溫之狀態,從而可使作業員進入操作室10。此外,還可抑制框體2之外部之大氣中的氧侵入框體2之內部,藉此,可抑制氧侵入處理室5內。The sealing members 29, 30 are, for example, made of silicone rubber for hermetically sealing between the corresponding side walls 21, 25, 22, 27. By this configuration, even in the heat treatment apparatus 1 During the heat treatment operation, hot air passing through the rectification chamber 4 does not enter the operation chamber 10. Therefore, even in the above heat treatment operation, the operation chamber 10 is maintained in a state close to the normal temperature, so that the operator can enter the operation room 10. Further, it is possible to suppress the oxygen in the atmosphere outside the casing 2 from entering the inside of the casing 2, thereby suppressing the intrusion of oxygen into the processing chamber 5.
此外,自整流室4朝向處理室5之方向,係與自整流室4朝向操作室10之方向不同。更為具體而言,自整流室4朝向處理室5之方向係第2行進方向D2。另一方面,自整流室4朝向操作室10之方向,於俯視時與第2行進方向D2交叉(正交)。此外,整流室4係與操作室10相鄰配置,且與處理室5相鄰配置。本實施形態中,整流室4係與操作室10共用一個側壁(側壁23)。此外,整流室4係與處理室5共用一個側壁(側壁22)。Further, the direction from the rectification chamber 4 toward the processing chamber 5 is different from the direction from the rectifying chamber 4 toward the operation chamber 10. More specifically, the direction from the rectification chamber 4 toward the processing chamber 5 is the second traveling direction D2. On the other hand, the direction from the rectification chamber 4 toward the operation chamber 10 intersects (orthogonally) with the second traveling direction D2 in plan view. Further, the rectifying chamber 4 is disposed adjacent to the operation chamber 10 and disposed adjacent to the processing chamber 5. In the present embodiment, the rectifying chamber 4 shares one side wall (side wall 23) with the operation chamber 10. Further, the rectifying chamber 4 shares a side wall (side wall 22) with the processing chamber 5.
於操作室10中,作業員藉由對操作裝置9進行操作,而可操作遮板構件8。藉此,可使用遮板構件8對氣流A1之分布進行調整。In the operation room 10, the operator can operate the shutter member 8 by operating the operation device 9. Thereby, the distribution of the airflow A1 can be adjusted using the shutter member 8.
圖3為顯示自第2行進方向D2之上游側所視之整流室4內部之狀態之圖,且部分以剖面顯示。參照圖1至圖3,如前述,遮板構件8係設置為用以調整自通道15朝向處理室5之氣流A1的分布。此情況之「氣流A1的分布」係指與第2行進方向D2正交之方向的氣流A1之分布。Fig. 3 is a view showing a state in which the inside of the rectifying chamber 4 viewed from the upstream side in the second traveling direction D2 is partially shown in cross section. Referring to FIGS. 1 through 3, as previously described, the shutter member 8 is configured to adjust the distribution of the airflow A1 from the passage 15 toward the processing chamber 5. In this case, the "distribution of the airflow A1" means the distribution of the airflow A1 in the direction orthogonal to the second traveling direction D2.
遮板構件8(81~86)係設置為用以調整朝向處理室5而通過通道15之氣流A1。具體而言,遮板構件8(81~86)係藉由開閉形成於側壁22之複數個噴嘴孔31~36,來調整封閉通道15之比例。於進行遮板構件8之詳細說明之前,先對噴嘴孔31~36之構成進行說明。The shutter members 8 (81 to 86) are provided to adjust the air flow A1 passing through the passage 15 toward the processing chamber 5. Specifically, the shutter member 8 (81 to 86) adjusts the ratio of the closed passage 15 by opening and closing the plurality of nozzle holes 31 to 36 formed in the side wall 22. Before the detailed description of the shutter member 8, the configuration of the nozzle holes 31 to 36 will be described.
噴嘴孔31~36係設置為用以將通過通道15之氣流A1 朝處理室5吹出。噴嘴孔31~36係本發明之「處理室之出口」之一例。噴嘴孔31~36係設置複數個(本實施形態中為3×6=18個)。各噴嘴孔31~36係貫通側壁22,於本實施形態中形成為矩形狀。各噴嘴孔31~36之大小相同。噴嘴孔31~36係於側壁22有規則地配置。The nozzle holes 31~36 are arranged to pass the airflow A1 through the passage 15. Blow out toward the processing chamber 5. The nozzle holes 31 to 36 are examples of the "outlet of the processing chamber" of the present invention. A plurality of nozzle holes 31 to 36 are provided (in the present embodiment, 3 × 6 = 18). Each of the nozzle holes 31 to 36 penetrates the side wall 22, and is formed in a rectangular shape in the present embodiment. Each of the nozzle holes 31 to 36 has the same size. The nozzle holes 31 to 36 are regularly arranged on the side wall 22.
噴嘴孔31係於側壁22之右上部形成有3個,這些3個噴嘴孔31係於左右方向等間隔地排列。噴嘴孔32係於側壁22之左上部形成有3個,這些3個噴嘴孔32係於左右方向等間隔地排列。The nozzle holes 31 are formed in three right upper portions of the side walls 22, and the three nozzle holes 31 are arranged at equal intervals in the left-right direction. The nozzle holes 32 are formed in three on the upper left side of the side wall 22, and the three nozzle holes 32 are arranged at equal intervals in the left-right direction.
噴嘴孔33係於側壁22之上下方向中央部,靠近側壁22之右側形成有3個,這些3個噴嘴孔33係於左右方向等間隔地排列。噴嘴孔34係於側壁22之上下方向中央部,靠近側壁22之左側形成有3個,這些3個噴嘴孔34係於左右方向等間隔地排列。The nozzle holes 33 are formed in the center portion of the side wall 22 in the downward direction, and three of the nozzle holes 33 are formed on the right side of the side wall 22, and the three nozzle holes 33 are arranged at equal intervals in the left-right direction. The nozzle holes 34 are formed in the lower central portion of the side wall 22, and are formed on the left side of the side wall 22, and the three nozzle holes 34 are arranged at equal intervals in the left-right direction.
噴嘴孔35係於側壁22之右下部形成有3個,這些3個噴嘴孔35係於左右方向等間隔地排列。噴嘴孔36係於側壁22之左下部形成有3個,這些3個噴嘴孔36係於左右方向等間隔地排列。The nozzle holes 35 are formed in three right lower portions of the side walls 22, and the three nozzle holes 35 are arranged at equal intervals in the left-right direction. The nozzle holes 36 are formed in three at the lower left portion of the side wall 22, and the three nozzle holes 36 are arranged at equal intervals in the left-right direction.
與複數個上述噴嘴孔31~36之各個對應,配置有複數個遮板構件8(81~86)。遮板構件81~86分別與對應之噴嘴孔31~36相鄰配置。亦即,遮板構件81~86係配置於整流室4之出口。各遮板構件8例如使用金屬板形成為矩形狀,於整流室4中與側壁22之側面平行配置。各遮板構件8係以與側壁22之側面接觸之方式配置。Corresponding to each of the plurality of nozzle holes 31 to 36, a plurality of shutter members 8 (81 to 86) are disposed. The shutter members 81 to 86 are disposed adjacent to the corresponding nozzle holes 31 to 36, respectively. That is, the shutter members 81 to 86 are disposed at the outlet of the rectification chamber 4. Each of the shutter members 8 is formed in a rectangular shape by, for example, a metal plate, and is disposed in parallel with the side surface of the side wall 22 in the rectifying chamber 4. Each of the shutter members 8 is disposed in contact with the side surface of the side wall 22.
遮板構件8(81~86)具有開口部8a(81a~86a)及滑動用孔部8b(81b~86b)。The shutter members 8 (81 to 86) have openings 8a (81a to 86a) and sliding hole portions 8b (81b to 86b).
開口部81a~86a係設置為用以使熱風通過對應之噴嘴孔31~36。開口部81a~86a係於對應之遮板構件81~86上設置與對應之噴嘴孔31~36相同之數量。亦即,本實施形態中,於遮板構件81 ~86之各個設有3個開口部81a~86a。本實施形態中,開口部81a~86a之形狀分別與對應之噴嘴孔31~36之大小大致相同。The openings 81a to 86a are provided to allow hot air to pass through the corresponding nozzle holes 31 to 36. The openings 81a to 86a are provided in the same number as the corresponding nozzle holes 31 to 36 in the corresponding shutter members 81 to 86. That is, in the present embodiment, the shutter member 81 Each of the ~86 has three openings 81a to 86a. In the present embodiment, the shapes of the openings 81a to 86a are substantially the same as the sizes of the corresponding nozzle holes 31 to 36, respectively.
於遮板構件81~86之各個,開口部81a~86a之左右方向之配置間距,係與對應之噴嘴孔31~36之左右方向之配置間距相同。In the respective shutter members 81 to 86, the arrangement pitch of the openings 81a to 86a in the left-right direction is the same as the arrangement pitch of the corresponding nozzle holes 31 to 36 in the left-right direction.
滑動用孔部81b~86b係分別設置為用以導引對應之遮板構件81~86之位移。滑動用孔部81b~86b係分別設於對應之遮板構件81~86之例如4個角隅。本實施形態中,各滑動用孔部81b~86b係形成為左右方向延伸之細長的形狀。於滑動用孔部81b~86b分別貫通有對應之導引銷41~46。The sliding hole portions 81b to 86b are respectively provided to guide the displacement of the corresponding shutter members 81 to 86. The sliding hole portions 81b to 86b are provided, for example, at four corners of the corresponding shutter members 81 to 86, respectively. In the present embodiment, each of the sliding hole portions 81b to 86b is formed in an elongated shape extending in the left-right direction. Corresponding guide pins 41 to 46 are respectively inserted through the sliding hole portions 81b to 86b.
各導引銷41~46係固定於側壁22。藉由上述構成,遮板構件81~86被對應之導引銷41~46所支持且可左右方向滑動。並且,藉由各遮板構件81~86於左右方向進行位移,可實現將對應之噴嘴孔31~36封閉之狀態及將對應之噴嘴孔31~36之至少一部分開放之狀態。如此,藉由遮板構件81~86可調整封閉通道15(噴嘴孔31~36)之比例,進而可調整通過通道15之氣流A1之分布。Each of the guide pins 41 to 46 is fixed to the side wall 22. According to the above configuration, the shutter members 81 to 86 are supported by the corresponding guide pins 41 to 46 and are slidable in the right and left direction. Further, by displacing the shutter members 81 to 86 in the left-right direction, a state in which the corresponding nozzle holes 31 to 36 are closed and a state in which at least a part of the corresponding nozzle holes 31 to 36 are opened can be realized. Thus, the ratio of the closed passages 15 (nozzle holes 31 to 36) can be adjusted by the shutter members 81 to 86, and the distribution of the air flow A1 passing through the passage 15 can be adjusted.
圖3中顯示遮板構件81、82、85、86之各個將對應之噴嘴孔31、32、35、36於通道15開放之狀態。此外,圖3中顯示遮板構件83、84之各個將對應之噴嘴孔33、34封閉之狀態。這些遮板構件81~86係藉由操作裝置9(91~93)所操作。In Fig. 3, each of the shutter members 81, 82, 85, 86 is shown in a state in which the corresponding nozzle holes 31, 32, 35, 36 are opened in the passage 15. Further, in Fig. 3, the state in which each of the shutter members 83, 84 closes the corresponding nozzle holes 33, 34 is shown. These shutter members 81 to 86 are operated by the operating device 9 (91 to 93).
操作裝置91~93係設置為用以自通道15之外部操作對應之遮板構件81,82、83,84、85,86。本實施形態中,各操作裝置91~93係使用金屬等之耐熱性優良之材料,且作為單一構件而設置。又,各操作裝置91~93也可藉由組合複數個構件而形成。The operating devices 91-93 are arranged to operate corresponding shutter members 81, 82, 83, 84, 85, 86 from the outside of the passage 15. In the present embodiment, each of the operation devices 91 to 93 is made of a material having excellent heat resistance such as metal and is provided as a single member. Further, each of the operation devices 91 to 93 may be formed by combining a plurality of members.
操作裝置91係設置為用以一併使左右方向排列之2個 遮板構件81、82位移。The operation device 91 is provided to be used to arrange two of the left and right directions. The shutter members 81, 82 are displaced.
操作裝置91係具有本體部91a、操作部91b及2個連結部91c、91d。The operation device 91 has a main body portion 91a, an operation portion 91b, and two connection portions 91c and 91d.
本體部91a係作為左右方向延伸之構件而設置。本實施形態中,本體部91a係形成為圓軸狀。本體部91a係貫通操作室10(整流室4)之側壁23。本體部91a係經由襯套51而被支持於側壁23。襯套51係例如以PTFE(PolyTetraFluoroEthylene)等作為材料之圓環狀之構件,其摩擦係數較小。本體部91a係藉由襯套51可於左右方向滑動地被支持著。此外,藉由設置襯套51,可抑制熱風自通道15侵入操作室10內。於主體部91a之一端部設有操作部91b。The main body portion 91a is provided as a member extending in the left-right direction. In the present embodiment, the main body portion 91a is formed in a circular axis shape. The main body portion 91a penetrates the side wall 23 of the operation chamber 10 (reduction chamber 4). The body portion 91a is supported by the side wall 23 via the bushing 51. The bushing 51 is, for example, a ring-shaped member made of PTFE (PolyTetraFluoroEthylene) or the like, and has a small friction coefficient. The main body portion 91a is slidably supported by the bushing 51 in the left-right direction. Further, by providing the bushing 51, it is possible to suppress entry of hot air from the passage 15 into the operation chamber 10. An operation portion 91b is provided at one end of the main body portion 91a.
操作部91b係作為作業員對操作裝置91進行操作時所把持之把手部而設置,其可與連結部91c、91d連動進行位移。本實施形態中,操作部91b係與本體部91a形成一體之棒狀部分,且配置於通道15之外部、即操作室10內。又,以操作部91b之材料之熱傳導率係設定為比本體部91a之熱傳導率低為較佳。自作業員供給於操作部91b之力,係經由本體部91a傳遞給連結部91c、91d。The operation unit 91b is provided as a handle portion that is gripped by the operator when the operation device 91 is operated, and is displaceable in conjunction with the connection portions 91c and 91d. In the present embodiment, the operation portion 91b is formed in a rod-like portion integrally formed with the main body portion 91a, and is disposed outside the passage 15, that is, in the operation chamber 10. Further, it is preferable that the thermal conductivity of the material of the operation portion 91b is set to be lower than the thermal conductivity of the main portion 91a. The force supplied from the operator to the operation unit 91b is transmitted to the connection portions 91c and 91d via the main body portion 91a.
連結部91c、91d係作為連結於對應之遮板構件81、82之部分而設置。連結部91c、91d係配置於通道15內。連結部91c、91d例如形成為圓軸狀。連結部91c、91d係自本體部91a朝對應之遮板構件81、82延伸,且固定於對應之遮板構件81、82之例如下部。The connecting portions 91c and 91d are provided as a portion that is coupled to the corresponding shutter members 81 and 82. The connecting portions 91c and 91d are disposed in the passage 15. The connecting portions 91c and 91d are formed, for example, in a circular axis shape. The connecting portions 91c and 91d extend from the main body portion 91a toward the corresponding shutter members 81 and 82, and are fixed to, for example, the lower portions of the corresponding shutter members 81 and 82.
藉由上述構成,當作業員把持操作部91b以使操作部91b朝左右方向位移時,此位移經由本體部91a傳遞至對應之連結部91c、91d及遮板構件81、82。其結果,遮板構件81、82之位置被變更,從而可調整噴嘴孔31、32之開度。According to the above configuration, when the operator grips the operation portion 91b to displace the operation portion 91b in the left-right direction, the displacement is transmitted to the corresponding coupling portions 91c and 91d and the shutter members 81 and 82 via the main body portion 91a. As a result, the positions of the shutter members 81 and 82 are changed, and the opening degrees of the nozzle holes 31 and 32 can be adjusted.
接著,對操作裝置92進行說明。由於操作裝置92係與操作裝置91同樣之構成,因此對與操作裝置91重複之說明,省略其中部分說明。Next, the operation device 92 will be described. Since the operation device 92 is configured in the same manner as the operation device 91, the description thereof will be repeated with respect to the operation device 91, and a part of the description will be omitted.
操作裝置92係設置為用以一併使左右方向排列之2個遮板構件83、84位移。The operation device 92 is provided to displace the two shutter members 83 and 84 arranged in the left-right direction.
操作裝置92係具有本體部92a、操作部92b及2個連結部92c、92d。The operation device 92 has a main body portion 92a, an operation portion 92b, and two connection portions 92c and 92d.
這些本體部92a、操作部92b及2個連結部92c、92d分別與對應之本體部91a、操作部91b及2個連結部91c、91d具有同樣之構成。此外,操作裝置92係與操作裝置91之配置同樣。惟操作裝置92係位於操作裝置91之下方。The main body portion 92a, the operation portion 92b, and the two connection portions 92c and 92d have the same configuration as the corresponding main body portion 91a, the operation portion 91b, and the two connection portions 91c and 91d. Further, the operation device 92 is the same as the configuration of the operation device 91. However, the operating device 92 is located below the operating device 91.
本體部92a係貫通操作室10(整流室4)之側壁23。本體部92a係經由襯套52而被支持於側壁22。襯套52係具有與襯套51同樣之構成。本體部92a藉由襯套52可於左右方向滑動地被支持著。此外,藉由設置襯套52,可抑制熱風自通道15侵入操作室10內。The main body portion 92a penetrates the side wall 23 of the operation chamber 10 (reduction chamber 4). The body portion 92a is supported by the side wall 22 via the bushing 52. The bushing 52 has the same configuration as the bushing 51. The body portion 92a is slidably supported by the bushing 52 in the left-right direction. Further, by providing the bushing 52, it is possible to suppress entry of hot air from the passage 15 into the operation chamber 10.
連結部92c、92d係作為連結於對應之遮板構件83、84之部分而設置。連結部92c、92d係自本體部92a朝對應之遮板構件83、84延伸,且固定於對應之遮板構件83、84之例如下部。The connecting portions 92c and 92d are provided as a portion that is coupled to the corresponding shutter members 83 and 84. The connecting portions 92c and 92d extend from the main body portion 92a toward the corresponding shutter members 83 and 84, and are fixed to, for example, the lower portions of the corresponding shutter members 83 and 84.
藉由上述構成,當作業員把持操作部92b以使操作部92b朝左右方向位移時,此位移經由本體部92a傳遞至對應之連結部92c、92d及遮板構件83、84。其結果,遮板構件83、84之位置被變更,從而可調整噴嘴孔33、34之開度。According to the above configuration, when the operator grips the operation portion 92b to displace the operation portion 92b in the left-right direction, the displacement is transmitted to the corresponding coupling portions 92c and 92d and the shutter members 83 and 84 via the main body portion 92a. As a result, the positions of the shutter members 83 and 84 are changed, and the opening degrees of the nozzle holes 33 and 34 can be adjusted.
接著,對操作裝置93進行說明。由於操作裝置93係與操作裝置91同樣之構成,因此對與操作裝置91重複之說明,省略其 中部分說明。Next, the operation device 93 will be described. Since the operation device 93 has the same configuration as the operation device 91, the description of the operation device 91 will be repeated, and the description thereof will be omitted. The middle part explains.
操作裝置93係設置為用以一併使左右方向排列之2個遮板構件85、86位移。The operation device 93 is provided to displace the two shutter members 85 and 86 arranged in the left-right direction.
操作裝置93係具有本體部93a、操作部93b及2個連結部93c、93d。The operation device 93 has a main body portion 93a, an operation portion 93b, and two connection portions 93c and 93d.
這些本體部93a、操作部93b及2個連結部93c、93d分別與對應之本體部91a、操作部91b及2個連結部91c、91d具有同樣之構成。此外,操作裝置93係與操作裝置91之配置同樣。惟操作裝置93係位於操作裝置92之下方。The main body portion 93a, the operation portion 93b, and the two connection portions 93c and 93d have the same configuration as the corresponding main body portion 91a, the operation portion 91b, and the two connection portions 91c and 91d. Further, the operation device 93 is the same as the arrangement of the operation device 91. However, the operating device 93 is located below the operating device 92.
本體部93a係貫通操作室10(整流室4)之側壁23。本體部93a係經由襯套53而被支持於側壁23。襯套53係具有與襯套51同樣之構成。本體部93a藉由襯套53可於左右方向滑動地被支持著。此外,藉由設置襯套53,可抑制熱風自通道15侵入操作室10內。The main body portion 93a penetrates the side wall 23 of the operation chamber 10 (reduction chamber 4). The body portion 93a is supported by the side wall 23 via the bushing 53. The bushing 53 has the same configuration as the bushing 51. The body portion 93a is slidably supported by the bushing 53 in the left-right direction. Further, by providing the bushing 53, it is possible to suppress entry of hot air from the passage 15 into the operation chamber 10.
連結部93c、93d係作為連結於對應之遮板構件85、86之部分而設置。連結部93c、93d係自本體部93a朝對應之遮板構件85、86延伸,且固定於對應之遮板構件85、86之例如下部。The connecting portions 93c and 93d are provided as a portion that is coupled to the corresponding shutter members 85 and 86. The connecting portions 93c and 93d extend from the main body portion 93a toward the corresponding shutter members 85 and 86, and are fixed to, for example, the lower portions of the corresponding shutter members 85 and 86.
藉由上述構成,當作業員把持操作部93b以使操作部93b朝左右方向位移時,此位移經由本體部93a傳遞至對應之連結部93c、93d及遮板構件85、86。其結果,遮板構件85、86之位置被變更,從而可調整噴嘴孔35、36之開度。According to the above configuration, when the operator grips the operation portion 93b to displace the operation portion 93b in the left-right direction, the displacement is transmitted to the corresponding coupling portions 93c and 93d and the shutter members 85 and 86 via the main body portion 93a. As a result, the positions of the shutter members 85 and 86 are changed, and the opening degrees of the nozzle holes 35 and 36 can be adjusted.
如以上說明,根據本發明之熱處理裝置1,藉由設置遮板構件8,可調整供給於配置在處理室5內之被處理物200之氣流A1之分布。藉此,於沿第2行進方向D2觀看時,可使處理室5中之氣流A1之分布更均等,因此可更均等地將熱風供給於被處理物200。此外, 藉由設置操作裝置9,即可自通道15之外部之操作室10對遮板構件8進行操作。因此,即使於熱處理裝置1之運轉中,作業員不用進入高溫之通道15內,而可操作遮板構件8。藉此,不用停止熱處理裝置1,可調整氣流A1之分布。藉此,可更容易調整高溫之氣流A1。As described above, according to the heat treatment apparatus 1 of the present invention, by providing the shutter member 8, the distribution of the airflow A1 supplied to the workpiece 200 disposed in the processing chamber 5 can be adjusted. Thereby, when viewed in the second traveling direction D2, the distribution of the airflow A1 in the processing chamber 5 can be made uniform, so that hot air can be supplied to the workpiece 200 more uniformly. In addition, The shutter member 8 can be operated from the operation room 10 outside the passage 15 by providing the operating device 9. Therefore, even in the operation of the heat treatment apparatus 1, the operator can operate the shutter member 8 without entering the high temperature passage 15. Thereby, the distribution of the airflow A1 can be adjusted without stopping the heat treatment apparatus 1. Thereby, the high-temperature airflow A1 can be adjusted more easily.
更為詳細而言,於遮板構件8之位置調整時,不用等待加熱器12之停止及通道15的冷卻,可由作業員進行遮板構件8之位置調整。因此,不需要為了進行遮板構件8之位置調整而停止熱處理裝置1,從而可迅速且於產生氣流A1之狀態下進行遮板構件8之位置調整作業。More specifically, when the position of the shutter member 8 is adjusted, the position of the shutter member 8 can be adjusted by the operator without waiting for the stop of the heater 12 and the cooling of the passage 15. Therefore, it is not necessary to stop the heat treatment apparatus 1 in order to adjust the position of the shutter member 8, and the position adjustment work of the shutter member 8 can be performed quickly and in the state which generate|occur|produces the airflow A1.
此外,根據熱處理裝置1,於操作裝置91~93之各個,藉由對操作部91b、92b、93b進行操作,以使對應之連結部91c,91d、92c,92d、93c,93d動作,其結果,對應之遮板構件81,82、83,84、85,86發生位移。藉此,可容易使用遮板構件8進行氣流A1之調整。如此,藉由使用操作裝置9以使遮板構件8位移,即可調整朝向處理室5之氣流A1之分布。Further, according to the heat treatment apparatus 1, the operation portions 91c, 92b, and 93b are operated by the operation portions 91b, 92b, and 93b in the operation devices 91 to 93, and the corresponding connection portions 91c, 91d, 92c, 92d, 93c, and 93d are operated. The corresponding shutter members 81, 82, 83, 84, 85, 86 are displaced. Thereby, the adjustment of the airflow A1 can be easily performed using the shutter member 8. Thus, by using the operating device 9 to displace the shutter member 8, the distribution of the airflow A1 toward the processing chamber 5 can be adjusted.
此外,噴嘴孔31~36及遮板構件81~86係分散配置於側壁22之複數個區域。藉此,藉由個別地調整遮板構件81、82之位置、遮板構件83、84之位置、及遮板構件85、86之位置,即可將朝向自第2行進方向D2所觀看之處理室5之各區域之熱風之供給量,更加均等地設定。Further, the nozzle holes 31 to 36 and the shutter members 81 to 86 are dispersedly disposed in a plurality of regions of the side wall 22. Thereby, the treatment from the second traveling direction D2 can be performed by individually adjusting the positions of the shutter members 81, 82, the positions of the shutter members 83, 84, and the positions of the shutter members 85, 86. The supply amount of hot air in each area of the chamber 5 is set more evenly.
此外,根據熱處理裝置1,整流室4係與操作室10相鄰配置,且與處理室5相鄰配置。根據此構成,可緊湊地配置整流室4、操作室10及處理室5。藉此,可將熱處理裝置1整體之結構小型化。Further, according to the heat treatment apparatus 1, the rectification chamber 4 is disposed adjacent to the operation chamber 10 and disposed adjacent to the processing chamber 5. According to this configuration, the rectification chamber 4, the operation chamber 10, and the processing chamber 5 can be arranged compactly. Thereby, the structure of the whole heat processing apparatus 1 can be made small.
此外,根據熱處理裝置1,自整流室4向處理室5之方 向係與自整流室4向操作室10之方向不同。根據此構成,於整流室4內可減小自朝向處理室5之高溫氣流A1傳遞至操作室10之傳熱量。因此,可抑制操作室10成為高溫之情況。Further, according to the heat treatment apparatus 1, from the rectification chamber 4 to the side of the processing chamber 5 The direction of the direction is different from the direction from the rectification chamber 4 to the operation chamber 10. According to this configuration, the amount of heat transfer from the high-temperature airflow A1 directed to the processing chamber 5 to the operation chamber 10 can be reduced in the rectifying chamber 4. Therefore, it is possible to suppress the operation chamber 10 from becoming a high temperature.
此外,根據熱處理裝置1,於作為整流室4之出口之噴嘴孔31~36配置有遮板構件8。根據此構成,可以成為所需之流動之方式更確實地調整朝向處理室5之氣流A1。Further, according to the heat treatment apparatus 1, the shutter member 8 is disposed in the nozzle holes 31 to 36 which are the outlets of the rectifying chamber 4. According to this configuration, the airflow A1 toward the processing chamber 5 can be more reliably adjusted in such a manner as to achieve the desired flow.
此外,根據熱處理裝置1,通過加熱器12之氣體係自熱風產生裝置3向與通道15中之氣流A1的第2行進方向D2交叉之第1行進方向D1而被導入通道15。根據此構成,可將用以產生通過通道15之氣流A1之風扇13等之構件,沿與通道15中之氣流A1的第2行進方向D2交叉之第1行進方向D1配置。藉此,不需要將風扇13等之構件沿通道15中之氣流A1的第2行進方向D2進行配置,從而可進一步提高熱處理裝置1中之風扇13等構件的配置之自由度。本實施形態中,將風扇13配置於通道15之上方。其結果,無於水平方向將熱處理裝置1大型化之情況,從而可實現熱處理裝置1之更小型化。Further, according to the heat treatment apparatus 1, the gas system by the heater 12 is introduced into the passage 15 from the hot air generating device 3 to the first traveling direction D1 that intersects the second traveling direction D2 of the airflow A1 in the passage 15. According to this configuration, the member for generating the fan 13 or the like passing through the airflow A1 of the duct 15 can be disposed in the first traveling direction D1 that intersects with the second traveling direction D2 of the airflow A1 in the duct 15. Thereby, it is not necessary to arrange the member such as the fan 13 along the second traveling direction D2 of the airflow A1 in the duct 15, and the degree of freedom in the arrangement of the members such as the fan 13 in the heat treatment apparatus 1 can be further improved. In the present embodiment, the fan 13 is disposed above the passage 15. As a result, the heat treatment apparatus 1 is not enlarged in the horizontal direction, and the heat treatment apparatus 1 can be further downsized.
圖4為本發明之第2實施形態之熱處理裝置1A的主要部分之俯視模式圖,且部分以剖面顯示。圖5及圖6為熱處理裝置1A之內部之百葉板100周邊之側視圖,且部分以剖面顯示。參照圖4至圖6,熱處理裝置1A係在熱處理裝置1之構成外,還具有百葉板100及用以操作百葉板100之第2操作裝置110。Fig. 4 is a plan view schematically showing a main part of a heat treatment apparatus 1A according to a second embodiment of the present invention, and is partially shown in cross section. 5 and 6 are side views of the periphery of the louver 100 inside the heat treatment apparatus 1A, and are partially shown in cross section. 4 to 6, the heat treatment apparatus 1A has a louver 100 and a second operation device 110 for operating the louver 100 in addition to the configuration of the heat treatment apparatus 1.
百葉板100係設置為用以對通過整流室4之通道15之熱風之分布進行調整。更為具體而言,百葉板100係設置為用以調整 通道15中之氣流A1之左右方向的流向。The louver 100 is arranged to adjust the distribution of the hot air passing through the passage 15 of the rectification chamber 4. More specifically, the louver 100 is configured to be adjusted The flow direction of the airflow A1 in the channel 15 in the left-right direction.
於本實施形態中,百葉板100(101、102)係設置有複數個(2個),且配置於通道15內。沿第2行進方向D2依百葉板100、遮板構件8之順序配置有該等百葉板100及遮板構件8。百葉板100係作為上下延伸之構件而設置。百葉板101、102係於左右方向分離配置。百葉板101例如與遮板構件81於前後方向排列。此外,百葉板102例如與遮板構件82於前後方向排列。In the present embodiment, the louver 100 (101, 102) is provided in plural (two) and disposed in the passage 15. The louver 100 and the shutter member 8 are disposed in the second traveling direction D2 in the order of the louver 100 and the shutter member 8. The louver 100 is provided as a member that extends vertically. The louvers 101 and 102 are arranged apart from each other in the left-right direction. The louver 101 is arranged, for example, in the front-rear direction with the shutter member 81. Further, the louver 102 is, for example, arranged in the front-rear direction with the shutter member 82.
百葉板100(101、102)係構成為可繞於上下方向(鉛直方向)延伸之軸線擺動,其可朝箭頭C1、C2方向擺動。The louver 100 (101, 102) is configured to be swingable about an axis extending in the vertical direction (vertical direction), and is swingable in the directions of arrows C1 and C2.
百葉板101係具有軸部101a、框101b、101c及百葉板本體101d、101e。The louver 101 has a shaft portion 101a, frames 101b and 101c, and louver bodies 101d and 101e.
軸部101a係上下方向延伸。本實施形態中,軸部101a係由3個棒狀構件所形成。軸部101a之下端部係可旋轉地被支持於整流室4之底壁。更為具體而言,於底壁形成有凹部111e,且軸部101a之下端部嵌入此凹部111e。此外,軸部101a之上端部可旋轉地被支持於例如自側壁24延伸之托架55。更為具體而言,托架55例如形成為細長之板狀,於此托架55之下面形成有凹部111e。此凹部111e內嵌入有軸部101a之上端部。軸部101a係支持框101b、101c。The shaft portion 101a extends in the vertical direction. In the present embodiment, the shaft portion 101a is formed of three rod-shaped members. The lower end portion of the shaft portion 101a is rotatably supported by the bottom wall of the rectifying chamber 4. More specifically, a concave portion 111e is formed in the bottom wall, and the lower end portion of the shaft portion 101a is fitted into the concave portion 111e. Further, the upper end portion of the shaft portion 101a is rotatably supported by, for example, the bracket 55 extending from the side wall 24. More specifically, the bracket 55 is formed, for example, in an elongated plate shape, and a recess 111e is formed on the lower surface of the bracket 55. An end portion of the shaft portion 101a is fitted into the recess 111e. The shaft portion 101a supports the frames 101b and 101c.
框101b、101c係設置為分別用以支持對應之百葉板本體101d、101e。框101b、101c係分別固定於軸部101a之中間部。於框101b之下方配置有框101c。框101b、101c係分別於側視時形成為略U字形,且向第2行進方向D2之下游側開放。於框101b、101c之各個固定有對應之百葉板本體101d、101e。The frames 101b, 101c are arranged to support the corresponding louver bodies 101d, 101e, respectively. The frames 101b and 101c are respectively fixed to the intermediate portion of the shaft portion 101a. A frame 101c is disposed below the frame 101b. The frames 101b and 101c are formed in a substantially U-shape in a side view and open to the downstream side in the second traveling direction D2. Corresponding louver bodies 101d and 101e are fixed to each of the frames 101b and 101c.
百葉板本體101d、101e係本發明之「氣流調整構件、 風向調整構件」之一例,是設置為用以調整通過通道15之氣流A1。百葉板本體101d、101e分別被藉由導引構件14(圖4至圖6中未圖示)而自通道15之上方被向通道15輸送之氣流A1衝撞。The louver bodies 101d and 101e are the airflow adjusting members of the present invention. An example of the wind direction adjusting member is provided to adjust the air flow A1 passing through the passage 15. The louver bodies 101d and 101e are respectively collided by the airflow A1 conveyed to the passage 15 from above the passage 15 by the guide member 14 (not shown in FIGS. 4 to 6).
百葉板本體101d、101e係例如於側視時形成為矩形狀之平板狀的構件。又,百葉板本體101d、101e之形狀並無特別限制,如圖5中如虛擬輪廓線即二點點劃線所示,其也可為於側視時為欠缺一部分之形狀。本實施形態中,百葉板本體101d之一部分係配置於由對應之框101b所圍成之區域內,百葉板本體101d之剩餘部分係於側視時自框101b突出。同樣地,百葉板本體101e之一部分係配置於由對應之框101c所圍成之區域內,百葉板本體101e之剩餘部分係於側視時自框101c突出。The louver bodies 101d and 101e are, for example, flat members that are formed in a rectangular shape when viewed from the side. Further, the shape of the louver bodies 101d and 101e is not particularly limited, and as shown by a two-dot chain line in Fig. 5 as a virtual outline, it may be a shape lacking a part in side view. In the present embodiment, one of the louver main bodies 101d is disposed in a region surrounded by the corresponding frame 101b, and the remaining portion of the louver main body 101d protrudes from the frame 101b when viewed from the side. Similarly, one portion of the louver body 101e is disposed in a region surrounded by the corresponding frame 101c, and the remaining portion of the louver body 101e protrudes from the frame 101c when viewed from the side.
藉由上述構成,當軸部101a朝繞軸部101a之箭頭C1方向擺動時,框101c、101d及百葉板本體101d、101e繞軸部101a之軸線擺動。從而可藉由百葉板本體101d、101e之方向調整氣流A1之方向。According to the above configuration, when the shaft portion 101a swings in the direction of the arrow C1 around the shaft portion 101a, the frames 101c and 101d and the louver bodies 101d and 101e swing around the axis of the shaft portion 101a. Thereby, the direction of the airflow A1 can be adjusted by the direction of the louver bodies 101d, 101e.
接著,對百葉板102進行說明。由於百葉板102係與百葉板101同樣之構成,因此對與百葉板101重複之說明,省略其中部分說明。Next, the louver 102 will be described. Since the louver 102 is configured in the same manner as the louver 101, the description of the louver 101 will be repeated, and the description thereof will be omitted.
百葉板102係具有軸部102a、框102b、102c及百葉板本體102d、102e。The louver 102 has a shaft portion 102a, frames 102b and 102c, and louver bodies 102d and 102e.
這些軸部102a、框102b、102c及百葉板本體102d、102e,分別與對應之軸部101a、框101b、101c及百葉板本體101d、101e具有同樣之構成。The shaft portion 102a, the frames 102b and 102c, and the louver bodies 102d and 102e have the same configuration as the corresponding shaft portion 101a, the frames 101b and 101c, and the louver bodies 101d and 101e, respectively.
軸部102a之下端部係可旋轉地被支持於整流室4之底 壁。更為具體而言,於底壁形成有凹部112e,且軸部102a之下端部嵌入此凹部112e。此外,軸部102a之上端部可旋轉地被支持於例如自側壁23延伸之托架56。更為具體而言,托架56例如形成為細長之板狀,於此托架56之下面形成有凹部112e。此凹部112e內嵌入有軸部102a之上端部。軸部102a係支持框102b、102c。The lower end of the shaft portion 102a is rotatably supported at the bottom of the rectifying chamber 4 wall. More specifically, a concave portion 112e is formed in the bottom wall, and the lower end portion of the shaft portion 102a is fitted into the concave portion 112e. Further, the upper end portion of the shaft portion 102a is rotatably supported by, for example, the bracket 56 extending from the side wall 23. More specifically, the bracket 56 is formed, for example, in an elongated plate shape, and a recess 112e is formed on the lower surface of the bracket 56. The upper end portion of the shaft portion 102a is fitted into the recess 112e. The shaft portion 102a supports the frames 102b and 102c.
框102b、102c係設置為分別用以支持對應之百葉板本體102d、102e。於框102b之下方配置有框102c。於框102b、102c之各個固定有對應之百葉板本體102d、102e。Blocks 102b, 102c are configured to support respective louver bodies 102d, 102e, respectively. A block 102c is disposed below the frame 102b. Corresponding louver bodies 102d, 102e are fixed to each of the blocks 102b, 102c.
藉由上述構成,當軸部102a朝繞軸部102a之箭頭C2方向擺動時,框102b、102c及百葉板本體102d、102e繞軸部102a之軸線擺動。從而可藉由百葉板本體102d、102e之方向調整氣流A1之方向。According to the above configuration, when the shaft portion 102a swings in the direction of the arrow C2 around the shaft portion 102a, the frames 102b and 102c and the louver bodies 102d and 102e swing around the axis of the shaft portion 102a. Thereby, the direction of the airflow A1 can be adjusted by the direction of the louver bodies 102d, 102e.
具有上述構成之百葉板100(101、102)係藉由第2操作裝置110(111、112)所操作而改變方向。第2操作裝置111、112係設置為用以自通道15之外部對對應之百葉板101、102進行操作。本實施形態中,各第2操作裝置111、112係使用與操作裝置9同樣之材料所形成。The louver 100 (101, 102) having the above configuration is changed in direction by the operation of the second operating device 110 (111, 112). The second operating devices 111, 112 are arranged to operate the corresponding louvers 101, 102 from outside the channel 15. In the present embodiment, each of the second operating devices 111 and 112 is formed using the same material as the operating device 9.
第2操作裝置111係設置為用以使百葉板101擺動。The second operating device 111 is provided to swing the louver 101.
第2操作裝置111具有本體部111a、操作部111b、及連結部111c。The second operation device 111 has a main body portion 111a, an operation portion 111b, and a coupling portion 111c.
本體部111a係作為左右方向延伸之構件而設置。本實施形態中,本體部111a係形成為圓軸狀。本體部111a係貫通操作室10(整流室4)之側壁23。本體部111a係經由襯套157而被支持於側壁23。襯套157係例如以PTFE(PolyTetraFluoroEthylene)等作為材料之圓 環狀之構件,其摩擦係數較小。本體部111a藉由襯套157可於左右方向滑動地被支持著。此外,藉由設置襯套157,可抑制熱風自通道15侵入操作室10內。於主體部111a之一端部設有操作部111b。The main body portion 111a is provided as a member extending in the left-right direction. In the present embodiment, the main body portion 111a is formed in a circular axis shape. The main body portion 111a penetrates the side wall 23 of the operation chamber 10 (reduction chamber 4). The body portion 111a is supported by the side wall 23 via the bushing 157. The bushing 157 is, for example, a circle made of PTFE (PolyTetraFluoroEthylene) or the like. The annular member has a small coefficient of friction. The main body portion 111a is slidably supported by the bushing 157 in the left-right direction. Further, by providing the bushing 157, it is possible to suppress entry of hot air from the passage 15 into the operation chamber 10. An operation portion 111b is provided at one end of the main body portion 111a.
操作部111b係作為作業員對操作裝置111進行操作時所把持之把手部而設置,其可與連結部111c連動進行位移。本實施形態中,操作部111b係與本體部111a形成一體之棒狀部分,且被配置於操作室10。又,以操作部111b之材料之熱傳導率係比本體部111a之熱傳導率低為較佳。自作業員供給於操作部111b之力,係經由本體部111a傳遞給連結部111c。The operation unit 111b is provided as a handle portion that is gripped by the operator when the operation device 111 is operated, and is displaceable in conjunction with the connection portion 111c. In the present embodiment, the operation portion 111b is formed in the operation chamber 10 in a rod-like portion that is integrally formed with the main body portion 111a. Further, it is preferable that the thermal conductivity of the material of the operation portion 111b is lower than the thermal conductivity of the main portion 111a. The force supplied from the operator to the operation unit 111b is transmitted to the connection unit 111c via the main body portion 111a.
連結部111c係作為連結於百葉板101之部分而設置。連結部111c係配置於通道15內。連結部111c例如為球面接頭。The connecting portion 111c is provided as a portion that is coupled to the louver 101. The connecting portion 111c is disposed in the passage 15. The connecting portion 111c is, for example, a spherical joint.
連結部111c具有凸部111d及凹部111e。The connecting portion 111c has a convex portion 111d and a concave portion 111e.
凸部111d係形成為突起狀,且固定於百葉板101之例如框101b。凸部111d之前端部形成為球狀。凸部111d嵌入凹部111e。凹部111e係形成可接受凸部111d之球面狀之空間,且固定於本體部111a之一端。藉此,連結部111c經由框101b等連結於百葉板本體101d、101e。The convex portion 111d is formed in a protruding shape and is fixed to, for example, the frame 101b of the louver 101. The front end portion of the convex portion 111d is formed in a spherical shape. The convex portion 111d is fitted into the concave portion 111e. The concave portion 111e is formed into a spherical space which can receive the convex portion 111d, and is fixed to one end of the main body portion 111a. Thereby, the connection portion 111c is coupled to the louver bodies 101d and 101e via the frame 101b or the like.
藉由上述構成,當作業員把持操作部111b以使操作部111b朝左右方向位移時,此位移經由本體部111a及連結部111c傳遞至框101b。藉此,百葉板101繞軸部101a擺動,以改變百葉板本體101d、101e之方向。According to the above configuration, when the operator grips the operation portion 111b to displace the operation portion 111b in the left-right direction, the displacement is transmitted to the frame 101b via the main body portion 111a and the connection portion 111c. Thereby, the louver 101 is swung around the shaft portion 101a to change the direction of the louver bodies 101d, 101e.
接著,對第2操作裝置112進行說明。由於第2操作裝置112係與第2操作裝置111同樣之構成,因此對與第2操作裝置111重複之說明,省略其中部分說明。第2操作裝置112係設置為用以使 百葉板102擺動。Next, the second operation device 112 will be described. Since the second operation device 112 has the same configuration as the second operation device 111, the description of the second operation device 111 will be repeated, and the description thereof will be omitted. The second operating device 112 is configured to The louver 102 is swung.
第2操作裝置112具有本體部112a、操作部112b、及連結部112c。The second operation device 112 has a main body portion 112a, an operation portion 112b, and a coupling portion 112c.
這些本體部112a、操作部112b及連結部112c分別與對應之本體部111a、操作部111b及連結部111c具有同樣之構成。The main body portion 112a, the operation portion 112b, and the coupling portion 112c have the same configuration as the corresponding main body portion 111a, the operation portion 111b, and the coupling portion 111c.
本體部112a係貫通操作室10(整流室4)之側壁23。本體部112a係經由襯套158而被支持於側壁23。襯套158係具有與襯套157同樣之構成。本體部112a藉由襯套158可於左右方向滑動地被支持著。此外,藉由設置襯套158,可抑制熱風自通道15侵入操作室10內。The body portion 112a penetrates the side wall 23 of the operation chamber 10 (the rectification chamber 4). The body portion 112a is supported by the side wall 23 via the bushing 158. The bushing 158 has the same configuration as the bushing 157. The body portion 112a is slidably supported by the bushing 158 in the left-right direction. Further, by providing the bushing 158, it is possible to suppress entry of hot air from the passage 15 into the operation chamber 10.
連結部112c係作為連結於百葉板102之部分而設置。連結部112c係配置於通道15內。連結部112c例如為球面接頭。The connecting portion 112c is provided as a portion that is coupled to the louver 102. The connecting portion 112c is disposed in the passage 15. The connecting portion 112c is, for example, a spherical joint.
連結部112c具有凸部112d及凹部112e。The connecting portion 112c has a convex portion 112d and a concave portion 112e.
凸部112d係形成為突起狀,且固定於百葉板102之例如框102b。凸部112d之前端部形成為球狀。凸部112d嵌入凹部112e。凹部112e係形成可接受凸部112d之球面狀之空間,且固定於本體部112a之一端。藉此,連結部112c經由框102b等連結於百葉板本體102d、102e。The convex portion 112d is formed in a protruding shape and is fixed to, for example, the frame 102b of the louver 102. The front end portion of the convex portion 112d is formed in a spherical shape. The convex portion 112d is fitted into the concave portion 112e. The concave portion 112e forms a spherical space that can receive the convex portion 112d, and is fixed to one end of the body portion 112a. Thereby, the connection portion 112c is coupled to the louver bodies 102d and 102e via the frame 102b or the like.
藉由上述構成,當作業員把持操作部112b以使操作部112b朝左右方向位移時,此位移經由本體部112a及連結部112c傳遞至框102b。藉此,百葉板102如箭頭C2所示繞軸部102a擺動,以改變百葉板本體102d、102e之方向。According to the above configuration, when the operator grips the operation portion 112b to displace the operation portion 112b in the left-right direction, the displacement is transmitted to the frame 102b via the main body portion 112a and the connection portion 112c. Thereby, the louver 102 is swung around the shaft portion 102a as indicated by an arrow C2 to change the direction of the louver bodies 102d, 102e.
如以上說明,根據本發明之第2實施形態之熱處理裝置1A,可獲得與第1實施形態之熱處理裝置1同樣之作用及功效。此外, 藉由設置百葉板100,可調整供給於被配置在處理室5內之被處理物200之氣流A1之分布。藉此,自第2行進方向D2觀看時,可使處理室5中之氣流A1之分布更均等,因此可更均等地將熱風供給於被處理物200。此外,藉由設置第2操作裝置110,可自通道15之外部之操作室10對百葉板100進行操作。因此,即使於熱處理裝置1A之運轉中,作業員不用進入高溫之通道15內,而可操作百葉板100。藉此,不用停止熱處理裝置1A,而可調整氣流A1之方向。藉此,可更容易調整高溫之氣流A1。As described above, according to the heat treatment apparatus 1A of the second embodiment of the present invention, the same functions and effects as those of the heat treatment apparatus 1 of the first embodiment can be obtained. In addition, By providing the louver 100, the distribution of the airflow A1 supplied to the workpiece 200 disposed in the processing chamber 5 can be adjusted. Thereby, the distribution of the airflow A1 in the processing chamber 5 can be made uniform when viewed from the second traveling direction D2, so that hot air can be supplied to the workpiece 200 more uniformly. Further, by providing the second operating device 110, the louver 100 can be operated from the operation room 10 outside the passage 15. Therefore, even in the operation of the heat treatment apparatus 1A, the operator can operate the louver 100 without entering the high temperature passage 15. Thereby, the direction of the airflow A1 can be adjusted without stopping the heat treatment apparatus 1A. Thereby, the high-temperature airflow A1 can be adjusted more easily.
更為詳細而言,於百葉板100之位置調整時,不用等待加熱器12之停止及通道15的冷卻,可由作業員進行百葉板100之位置調整。因此,不需要為了進行百葉板100之位置調整而停止熱處理裝置1,從而可迅速且於產生氣流A1之狀態下進行百葉板100之位置調整作業。More specifically, when the position of the louver 100 is adjusted, the operator can perform the position adjustment of the louver 100 without waiting for the stop of the heater 12 and the cooling of the passage 15. Therefore, it is not necessary to stop the heat treatment apparatus 1 in order to adjust the position of the louver 100, and the position adjustment operation of the louver 100 can be performed quickly and in the state which generate|occur|produces the airflow A1.
此外,根據熱處理裝置1A,於第2操作裝置111、112之各個,藉由對操作部111b、112b進行操作,以使連結部111c、112c動作,其結果,對應之百葉板101、102發生位移。藉此,可容易進行使用百葉板101、102之氣流A1之調整。如此,藉由使用第2操作裝置111、112以使百葉板101、102位移,即可調整朝向處理室5之氣流A1之分布。Further, according to the heat treatment apparatus 1A, the operation portions 111b and 112b are operated by the operation portions 111b and 112b in each of the second operation devices 111 and 112, and as a result, the corresponding louvers 101 and 102 are displaced. . Thereby, the adjustment of the airflow A1 using the louvers 101 and 102 can be performed easily. Thus, by using the second operating devices 111, 112 to displace the louvers 101, 102, the distribution of the airflow A1 toward the processing chamber 5 can be adjusted.
此外,百葉板本體101d,101e、102d,102e係於通道15內分散配置於複數個區域。藉此,藉由個別地調整百葉板101、百葉板102之各個之方向,即可將朝向自第2行進方向D2所觀看之處理室5之各區域之熱風之供給量,更加均等地設定。Further, the louver bodies 101d, 101e, 102d, and 102e are dispersedly disposed in the plurality of regions in the channel 15. Thereby, by individually adjusting the directions of the louver 101 and the louver 102, the supply amount of the hot air in each region of the processing chamber 5 viewed from the second traveling direction D2 can be more uniformly set.
此外,根據熱處理裝置1A,其加上遮板構件8外,且 還設置有百葉板100。因此,藉由進行調整百葉板100之方向,只要對遮板構件8之左右方向之位置進行微調,即可使處理室5中之氣流A1更均等。如此,根據遮板構件8與百葉板100之加乘效應,可減少用於遮板構件8之調整之時間及人工。Further, according to the heat treatment device 1A, the shutter member 8 is added, and A louver 100 is also provided. Therefore, by adjusting the direction of the louver 100, the airflow A1 in the processing chamber 5 can be made uniform by finely adjusting the position of the shutter member 8 in the left-right direction. Thus, according to the multiplication effect of the shutter member 8 and the louver 100, the time and labor for the adjustment of the shutter member 8 can be reduced.
以上,對本發明之實施形態進行了說明,惟本發明不限於上述實施形態。只要是在申請專利範圍所記載之範圍內,本發明即可作各種之變更。Although the embodiments of the present invention have been described above, the present invention is not limited to the above embodiments. The present invention can be variously modified as long as it is within the scope of the patent application.
(1)上述第2實施形態中,以百葉板101、102之各軸部101a、102a沿鉛直方向延伸之形態為例進行了說明。惟也可不如此形成。例如,如圖7所示,百葉板101之軸部101a也可朝與垂直方向交叉之方向延伸。例如,百葉板101之軸部101a也可沿水平方向延伸。此情況下,百葉板101之軸部101a可旋轉地被支持於整流室4之側壁23、24。並且,軸部101a之一端部配置於操作室10內,此一端部可作為操作部91b使用。此情況下,操作裝置9B係構成為具有作為連結部之框101b、101c及操作部91b。(1) In the second embodiment, the configuration in which the shaft portions 101a and 102a of the louvers 101 and 102 extend in the vertical direction has been described as an example. However, it may not be formed as such. For example, as shown in FIG. 7, the shaft portion 101a of the louver 101 may also extend in a direction crossing the vertical direction. For example, the shaft portion 101a of the louver 101 may also extend in the horizontal direction. In this case, the shaft portion 101a of the louver 101 is rotatably supported by the side walls 23, 24 of the rectifying chamber 4. Further, one end of the shaft portion 101a is disposed in the operation chamber 10, and this one end portion can be used as the operation portion 91b. In this case, the operation device 9B is configured to include the frames 101b and 101c as the connection portions and the operation portion 91b.
(2)此外,上述各實施形態中,對操作裝置9及第2操作裝置110均貫通區隔通道15之內部及外部之側壁23之形態進行了說明。惟也可不如此形成。例如,也可使用磁鐵等以非接觸之狀態連結配置於操作室10之操作部91b、92b、93b、111b、112b及配置於通道15內之構件(連結構件等)。(2) In the above embodiments, the configuration in which both the operation device 9 and the second operation device 110 penetrate the inside and outside side walls 23 of the partition passage 15 has been described. However, it may not be formed as such. For example, the operating portions 91b, 92b, 93b, 111b, and 112b disposed in the operation chamber 10 and the members (connecting members and the like) disposed in the passage 15 may be connected in a non-contact state using a magnet or the like.
(3)此外,上述各實施形態中,也可於排氣口16設置本發明之遮板構件及操作此遮板構件之操作裝置。(3) Further, in the above embodiments, the shutter member of the present invention and the operation device for operating the shutter member may be provided in the exhaust port 16.
本發明可作為熱處理裝置而廣泛使用。The present invention can be widely used as a heat treatment apparatus.
1‧‧‧熱處理裝置1‧‧‧ Heat treatment unit
2‧‧‧框體2‧‧‧ frame
3‧‧‧熱風產生裝置3‧‧‧hot air generating device
4‧‧‧整流室4‧‧‧Rectifier room
5‧‧‧處理室5‧‧‧Processing room
6‧‧‧晶舟6‧‧‧The boat
7‧‧‧氣流回送構件7‧‧‧Airflow return member
8‧‧‧遮板構件(氣流調整構件)8‧‧‧Shutter member (airflow adjustment member)
9‧‧‧操作裝置9‧‧‧Operating device
10‧‧‧操作室10‧‧‧Operating room
11‧‧‧架台11‧‧‧ 台台
12‧‧‧加熱器12‧‧‧heater
13‧‧‧風扇13‧‧‧Fan
14‧‧‧導引構件14‧‧‧Guide members
15‧‧‧通道15‧‧‧ channel
16‧‧‧排氣口16‧‧‧Exhaust port
19‧‧‧門19‧‧‧
21~24‧‧‧側壁21~24‧‧‧ side wall
25~27‧‧‧側壁25~27‧‧‧ side wall
28‧‧‧門28‧‧‧
91~93‧‧‧操作裝置91~93‧‧‧Operating device
200‧‧‧被處理物200‧‧‧Processed objects
A1‧‧‧氣流A1‧‧‧ airflow
D1‧‧‧第1行進方向D1‧‧‧1st direction of travel
D2‧‧‧第2行進方向D2‧‧‧2nd direction of travel
Claims (8)
Applications Claiming Priority (1)
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JP2013160255A JP6177616B2 (en) | 2013-08-01 | 2013-08-01 | Heat treatment equipment |
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TW201506166A TW201506166A (en) | 2015-02-16 |
TWI509079B true TWI509079B (en) | 2015-11-21 |
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TW102140995A TWI509079B (en) | 2013-08-01 | 2013-11-12 | Heat treatment device |
TW104132696A TWI572720B (en) | 2013-08-01 | 2013-11-12 | Heat treatment device |
Family Applications After (1)
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TW104132696A TWI572720B (en) | 2013-08-01 | 2013-11-12 | Heat treatment device |
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JP (1) | JP6177616B2 (en) |
TW (2) | TWI509079B (en) |
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JP6600408B2 (en) | 2016-03-24 | 2019-10-30 | 株式会社Kokusai Electric | Substrate processing apparatus, semiconductor device manufacturing method, and recording medium |
JP7101599B2 (en) * | 2018-11-27 | 2022-07-15 | 東京エレクトロン株式会社 | Heat treatment equipment and heat treatment method |
Citations (3)
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CN1323508A (en) * | 1998-10-13 | 2001-11-21 | 松下电器产业株式会社 | Heating device and heating method |
CN101173840A (en) * | 2006-09-13 | 2008-05-07 | 爱斯佩克株式会社 | Heat treatment apparatus |
CN102980284A (en) * | 2011-09-02 | 2013-03-20 | 松下电器产业株式会社 | Air conditioner |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS6254431A (en) * | 1985-09-03 | 1987-03-10 | Toshiba Corp | Hot blast heater |
JP2558657Y2 (en) * | 1992-02-29 | 1997-12-24 | トリニティ工業株式会社 | Hot air circulation furnace |
JP3644849B2 (en) * | 1999-06-28 | 2005-05-11 | 光洋サーモシステム株式会社 | Batch oven |
JP3578985B2 (en) * | 2000-12-20 | 2004-10-20 | 光洋サーモシステム株式会社 | Heat treatment equipment |
JP4069035B2 (en) * | 2003-08-12 | 2008-03-26 | 東京エレクトロン株式会社 | Substrate processing system and substrate heat treatment method |
JP4899586B2 (en) * | 2006-03-30 | 2012-03-21 | 大日本印刷株式会社 | Wind speed distribution adjustment device |
JP4896952B2 (en) * | 2008-12-04 | 2012-03-14 | エスペック株式会社 | Heat treatment equipment |
JP5443856B2 (en) * | 2009-06-30 | 2014-03-19 | Dowaサーモテック株式会社 | Heat treatment apparatus, heat treatment equipment and heat treatment method |
-
2013
- 2013-08-01 JP JP2013160255A patent/JP6177616B2/en active Active
- 2013-11-12 TW TW102140995A patent/TWI509079B/en active
- 2013-11-12 TW TW104132696A patent/TWI572720B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1323508A (en) * | 1998-10-13 | 2001-11-21 | 松下电器产业株式会社 | Heating device and heating method |
CN101173840A (en) * | 2006-09-13 | 2008-05-07 | 爱斯佩克株式会社 | Heat treatment apparatus |
CN102980284A (en) * | 2011-09-02 | 2013-03-20 | 松下电器产业株式会社 | Air conditioner |
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JP6177616B2 (en) | 2017-08-09 |
TWI572720B (en) | 2017-03-01 |
JP2015031428A (en) | 2015-02-16 |
TW201604287A (en) | 2016-02-01 |
TW201506166A (en) | 2015-02-16 |
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