TWI497626B - Vacuum processing apparatus - Google Patents

Description

Vacuum processing unit

BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a vacuum processing apparatus, and more particularly to a vacuum processing apparatus capable of performing vacuum processing, such as etching processing and deposition processing, on a glass-containing substrate for a liquid crystal display (LCD) panel.

Generally, a vacuum processing apparatus refers to a device that performs vacuum processing, such as etching processing and deposition processing, on a surface of a substrate having an electrode fixed on a substrate supporting unit. In the vacuum processing apparatus, at least one of the electrode systems is installed in a vacuum chamber having a vacuum processing space therein, and plasma can be formed by applying electric power to the electrodes under vacuum pressure.

A conventional vacuum processing apparatus includes a chamber body having an open upper portion and an upper cover detachably engaged with the upper portion of the chamber body. The upper cover is formed to be detachable from the chamber body and then moved to one side of the chamber body and rotated to facilitate maintenance and repair of the vacuum chamber.

Recently, with the advent of large-sized liquid crystal displays, the size of glass substrates for liquid crystal display panels has also increased. Therefore, the size of the vacuum processing apparatus for processing the glass substrate of the liquid crystal display panel is also increasing.

When the vacuum processing apparatus has a large size, the capacity (vacuum capacity) of the processing space is also increased, and the load applied to the outside of the chamber is also increased, thus causing deformation of the chamber body and the upper cover.

At this time, the deformation occurring in the upper cover is transmitted to the shower head mounted on the bottom surface of the upper cover. This can cause damage to the insulating parts of the shower head and the shower head and cause installation errors.

In addition, when the load applied to the outside of the chamber is increased, the thickness of the chamber must be increased in order to withstand an increased load, which increases the overall weight of the vacuum processing apparatus. Moreover, the thickness and weight of the upper cover will also increase.

In a conventional vacuum processing apparatus, when repairing or replacing an internal component, such as replacing a showerhead mounted on the underside of the upper cover with a new one, the upper cover will have to be raised and then rotated to separate from the chamber body.

However, the conventional vacuum processing apparatus has a problem that when the weight of the upper cover is increased, the rotating means such as the rotating motor and the speed reducer must also have a sufficient capacity to withstand the weight of the upper cover.

In particular, for different semiconductor devices, such as square glass substrates for eighth-generation liquid crystal display panels, the size of substrates that require vacuum processing can be very large, with a single side length of up to 2 meters or more. This causes the weight of the upper cover to increase sharply, and thus the upper cover is almost impossible to be rotated.

Therefore, in view of the above problems, it is an object of the present invention to provide a vacuum processing apparatus capable of separately mounting an upper cover and a showerhead unit.

Another object of the present invention is to provide a vacuum processing apparatus that can easily update a heavy equipment, such as a showerhead unit, during a maintenance process.

Another object of the present invention is to provide a vacuum processing apparatus capable of preventing a heavy equipment attached to the vicinity of an upper cover from being affected by deformation of the upper cover.

In order to achieve the objects and other advantages of the present invention and in accordance with the present invention, the present invention is embodied and described in detail. The present invention provides a vacuum processing apparatus comprising: a chamber body and an upper cover that are joined to each other. For forming a vacuum processing space, the substrate is vacuum processed in the vacuum processing space; the shower head unit mounted under the upper cover is for supplying gas into the vacuum processing space; and is disposed between the chamber body and the upper cover An auxiliary cover for supporting the edge portion of the showerhead unit.

Preferably, a vacuum processing apparatus can be formed into a rectangular shape with a single side length of greater than 1300 mm.

The auxiliary cover may be integrally formed with the showerhead unit or a part of the showerhead unit.

The shower head unit described above may be installed at a distance from the bottom surface of the upper cover.

The upper cover is attached to the auxiliary cover in a detachable manner.

The auxiliary cover is mounted to the chamber body in a detachable manner.

The upper cover and the auxiliary cover can be mounted to the chamber body in a detachable manner.

The showerhead unit is mounted to the auxiliary cover in a detachable mounting.

The showerhead unit can be mounted to separate upwardly from the auxiliary cover after the upper cover is separated from the auxiliary cover.

At least one of the upper cover, the showerhead unit, and the auxiliary cover may be provided with a separate mounting member engaging portion for engaging with the external separate mounting device.

A cooling plate for cooling the showerhead unit may also be installed above the showerhead unit. Also, the cooling plate may be provided with a separate mounting member engagement portion for engaging with an external separate mounting device.

The showerhead unit may include an injection plate having a plurality of injection holes through which gas can be injected into the vacuum processing space.

The showerhead unit can also include one or more diffuser plates detachably joined to the injection plate and spaced a distance from the upper portion of the injection plate to form one or more diffusion spaces for gas diffusion.

The injection plate and the one or more diffusion plates may be integrally or detachably joined to each other. The separate mounting component engaging portion for engaging the external split mounting device may be formed on the injection plate or formed on one or more of the diffusion plates, or may be formed on both the injection plate and the diffusion plate.

The auxiliary cover may include: a cover supporting portion inserted between the upper end of the chamber main body and the lower end of the upper cover; and a shower head mounting portion extending from the cover supporting portion for supporting the edge portion of the shower head unit and having an opening The bottom surface of the showerhead unit can be exposed toward the vacuum processing space.

The opening of the showerhead mounting portion formed may be smaller than the substrate supporting unit mounted on the chamber body, thereby mounting the substrate thereon.

The showerhead mounting portion may form a stepped shape downward from the upper surface of the cover supporting portion to be spaced apart from the bottom surface of the upper cover.

A first shielding member may be mounted between the edge portion of the bottom surface of the showerhead unit and the bottom surface of the auxiliary cover to protect the portion exposed to the vacuum processing space from being plasmad.

The auxiliary cover can be equipped with a heat medium channel for temperature control.

A second shield member is detachably coupled to the auxiliary cover for protecting the surface of the auxiliary cover exposed to the vacuum processing space from being plasmad.

A separate mounting unit can be further included for separating the upper cover from the auxiliary cover or engaging the upper cover to the auxiliary cover.

The split mounting unit may include a horizontally moving portion for moving the upper cover in a horizontal direction relative to the chamber body.

The split mounting unit may include: an up and down moving unit for moving the upper cover up and down relative to the chamber body; and a horizontal moving unit for moving the upper cover in a horizontal direction relative to the chamber body.

The up and down moving unit is mounted to move the earth cover in the up and down direction by supporting the upper cover. And, the horizontal direction moving unit may include: a pair of rails mounted on both side surfaces of the chamber body, the up and down moving unit is movable along the horizontal direction; and a driving unit for moving along the rail Earth cover.

The horizontal direction moving unit may include: a pair of up and down moving rails mounted on both sides of the chamber body for moving the soil cover up and down by supporting the upper cover; and a driving unit for moving the up and down moving rails to be raised Move the earth cover along this up and down movement track. Moreover, the up-and-down moving unit may be configured to move the up-and-down moving track up and down, and the upper cover is supported by the up-and-down moving track.

The separation mounting unit may be further provided with a connecting rail for moving the earth cover by connecting the upper and lower moving rails after being raised and raised.

The upper cover can be hinged to one side of the chamber body.

The vacuum processing apparatus of the present invention has the following advantages:

First, since the upper cover and the showerhead unit can be separately mounted to the chamber body, the load of each element can be reduced to facilitate the transfer and detachable mounting of these components.

Second, since the upper cover and the auxiliary cover are detachably mounted to the chamber body, and the shower head unit supported by the auxiliary cover can be separated from the auxiliary cover. Therefore, the process for detachably mounting the components can be easily performed in accordance with the purpose of replacing and repairing the vacuum processing apparatus.

Third, since the upper cover is installed at a distance from the shower head unit supported by the auxiliary cover, the deformation of the upper cover due to the increase in the vacuum capacity is not transmitted to the shower head unit. This will prevent the showerhead unit from being deformed or damaged.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred embodiment of the present invention will now be described in detail with reference to the accompanying drawings.

Hereinafter, the vacuum processing apparatus of the present invention will be described in more detail with reference to the accompanying drawings.

Fig. 1 is an exploded perspective view of the vacuum processing apparatus of the present invention. "Fig. 2" is a cross-sectional view of the vacuum processing apparatus of "Fig. 1".

As shown in "Fig. 1" and "Fig. 2", the vacuum processing apparatus 100 of the present invention comprises a chamber body 120 having an opening at the upper portion and an upper cover 110 detachably coupled to the opening of the chamber body 120 and formed A vacuum processing space S.

Preferably, the vacuum processing apparatus 100 can be formed in a polygonal shape, such as a rectangular shape. The vacuum processing apparatus 100 is preferably configured to perform vacuum processing, such as etching processing and deposition processing, on a large glass substrate of a liquid crystal display (LCD) panel instead of a wafer or a small substrate by forming a plasma under vacuum.

In the glass substrate used for the fifth-generation liquid crystal display panel, the size of the glass substrate to be vacuum-treated was 1100 × 1300 mm. Therefore, the vacuum processing apparatus 100 for processing a large substrate can be preferably formed into a rectangular shape and has a single side length of more than 1300 mm.

Various modules and devices (installed devices) can be installed on the vacuum processing apparatus 100, including: a gas supply system, which is composed of a gas supply pipe, a showerhead unit 210, and the like for supplying gas to the vacuum processing space S. The power supply unit is for supplying electric power to form plasma in the vacuum processing space S; the exhaust system is for discharging air and controlling pressure.

The chamber body 120 and the upper cover 100 of the vacuum processing apparatus 100 are joined to each other to form a vacuum processing space S.

The chamber body 120 can be mounted to be supported by a support frame (not shown in the drawings) such that the bottom surface of the chamber body 120 can be spaced from the ground.

The substrate 1 may be introduced or drawn out of the chamber body 120 through an opening 130 formed on at least one side surface of the chamber body 120. Further, the substrate supporting unit 140 for mounting the substrate 1 thereon is mounted on the inner bottom surface of the chamber body 120.

The opening 130 can be opened and closed through a gate valve (not shown in the drawings), and is coupled to a transfer chamber (not shown in the drawings), and the transfer chamber is coupled to a load lock chamber (attached) Not shown in the figure) are connected.

The substrate supporting unit 140 may have a supporting surface on which the substrate 1 is mounted, and the substrate supporting unit 140 may be mounted with various components such as a low electrode and an electrostatic chuck for fixing the substrate 1 by electrostatic force.

The upper cover 110 can be manufactured in a variety of different shapes and configurations, such as a flat shape or a dish shape.

The upper cover 110 is detachably coupled to the chamber body 120 such that the equipment installed in the vacuum processing apparatus 100 can be repaired or replaced with a new one. Also, the upper cover 110 has a thickness sufficient to withstand the vacuum pressure in the vacuum processing space S. In addition, a reinforcing member may be further mounted on the outer surface of the upper cover 110 to prevent the upper cover 110 from being deformed due to vacuum pressure.

The auxiliary cover 300 is mounted between the chamber body 120 and the upper cover 110 and is detachably mounted to the chamber body 120. Of course, the upper cover 110 is detachably mounted to the auxiliary cover 300.

The auxiliary cover 300 detachably mounted to the upper cover 110 or the chamber main body 120 may include: a cover supporting portion 330 interposed between the upper end of the chamber main body 120 and the lower end of the upper cover 110; and a support for the shower head unit 210 The showerhead mounting portion 320 of the edge portion protrudes from the cover supporting portion 330 and has an opening 310 to enable the bottom surface of the showerhead unit 210 to be exposed toward the vacuum processing space S. The showerhead mounting portion 320 and the cover support portion 330 may be integrally joined to each other or to each other through the engaging member. Here, the sealing members 121, 122 may be inserted between the upper end of the chamber body 120 and the cover supporting portion 330, respectively, and between the bottom end of the upper cover 110 and the cover supporting portion 330.

The cover support portion 330 is coupled to the showerhead mounting portion 320 and is mounted between the chamber body 120 and the upper cover 110 to support the showerhead unit 210.

In consideration of the deformation of the upper cover 110 due to the vacuum pressure, the shower head mounting portion 320 for supporting the shower head unit 210 may preferably form a stepped shape downward from the upper surface of the cover supporting portion 330, whereby the upper cover 110 is The bottom surfaces are spaced apart.

The showerhead mounting portion 320 is provided with an opening 310 such that the bottom surface of the showerhead unit 210 can face the vacuum processing space S, and the gas injection hole 211a of the showerhead unit 210 can be exposed toward the vacuum processing space S. Also, the showerhead mounting portion 320 is configured to support the edge portion of the showerhead unit 210.

The showerhead mounting portion 320 can support the edge portion of the showerhead unit 210 in various ways, for example, in an upward or downward direction along the showerhead unit 210. When the showerhead unit 210 is composed of a plurality of components, the showerhead mounting portion 320 may be provided with stepped shaped support portions 321 and 322 to support the respective components.

Preferably, the showerhead mounting portion 320 can be mounted over the upper surface of the auxiliary cover 300 to enable the showerhead unit 210 to be easily serviced or replaced.

The auxiliary cover 300 may be provided with a heat medium passage 340 for temperature control to heat or cool the vacuum processing space S, or to perform a specific vacuum process.

The showerhead unit 210 is mounted below the upper cover 110 and supported by an auxiliary cover 300 spaced apart from the bottom surface of the upper cover 110. Also, the showerhead unit 210 can have various configurations to inject a gas, such as a process gas or a carrier gas, into the vacuum processing space S.

As shown in an example, the showerhead unit 210 may include: an injection plate 211 having a plurality of injection holes 211a through which gas may be injected into the vacuum processing space S; and one or more diffusion plates 212, It is bonded to the injection plate 211 and spaced apart from the upper portion of the injection plate 211 to form one or more diffusion spaces DS1 and DS2 for gas diffusion.

The injection plate 211 is formed of a plate-like member having a plurality of injection holes 211a penetratingly formed in a predetermined pattern in the vertical direction, so that the gas can be uniformly distributed in the vacuum processing space S. Also, the injection plate 211 is mounted such that its edge portion can be supported by the auxiliary cover 300. When the injection plate 211 is formed of aluminum, it undergoes an anodization process toward the surface of the vacuum processing space S.

The diffusion plate 212 is a plate-like member that is mounted above the injection plate 211 and in which the diffusion spaces DS1 and DS2 are formed. When having a plurality of diffusion spaces DS1 and DS2, the diffusion plate 212 is provided with a plurality of through holes 212a so that gas can be delivered into the diffusion space DS1 connected to the injection plate 211.

Preferably, the diffusion plate 212 in which the diffusion space is formed is sealingly joined to the injection plate 211 or the auxiliary cover 300 by interposing the sealing member 211c therebetween. In order to mount the diffusion plate 212 spaced apart from the upper surface of the injection plate 211, a protruding portion 211b for supporting the bottom surface of the diffusion plate 212 will protrude from the edge portion of the injection plate 211.

Here, the diffusion plate 212 may be integrally formed with the injection plate 211, or may be detachably coupled to the injection plate 211 or the auxiliary cover 300 through a joint member such as a screw. In other words, the diffusion plate 212 is detachably mounted on the injection plate 211 or the auxiliary cover 300, which will be described later.

Preferably, the diffuser plate 212 is mounted at a distance from the bottom surface of the upper cover 110 to prevent deformation of the upper cover 110 due to vacuum pressure. Here, a space formed by the interval between the diffusion plate 212 and the upper cover 110 can be used as the diffusion space DS2 for gas diffusion. The bottom surface of the upper cover 110 may be concave to be spaced apart from the diffusion plate 212.

The interval between the diffusion plate 212 and the bottom surface of the upper cover 110 is determined by the central portion of the upper cover 110, that is, the degree of deformation where the maximum deformation occurs. The degree of deformation for the upper cover 110 is increased from the edge portion toward the center portion, and thus the above interval can be set to increase toward the center portion.

Since the vacuum pressure is formed in the vacuum processing space S during the vacuum processing, when viewed from the outside of the upper cover 110, the upper cover 110 is found to be concavely deformed. However, since the diffuser plate 212 of the showerhead unit 210 is spaced from the bottom surface of the upper cover 110, the showerhead unit 210 is not affected by the deformation of the upper cover 110.

A cooling plate (not shown in the drawings) for controlling the temperature of the showerhead unit 210 may be further installed above the shower head unit 210. The edge portion of the cooling plate can be tightly coupled to the showerhead unit 210 to control the temperature of the showerhead unit 210. Moreover, the upper surface of the cooling plate can be spaced from the bottom surface of the upper cover 110 by replacing the shower head unit 210.

At least a portion of the showerhead unit 210, and/or the auxiliary cover 300 may be formed of a metal element having electrical conductivity to form a plasma in the vacuum processing space S. The above metal component can be used as an upper electrode (which is usually grounded).

When the showerhead unit 210 and the auxiliary cover 300 are formed of metal members, their surfaces are exposed to the vacuum processing space S through the plasma, and thus may be damaged by the etching process, or some particles may be deposited thereon. This will have an adverse effect on the vacuum process.

In order to solve the above problem, the edge portion of the bottom surface of the showerhead unit 210, or the edge of the bottom surface of the auxiliary cover 300 or a portion of the bottom surface may be provided with a first shielding member 240, such as ceramic, to protect it from being plasmad.

On the bottom surface of the auxiliary cover 300 exposed in the vacuum processing space S, a second shield member 350 may be detachably mounted in a manner similar to the chamber body 120. Therefore, it is possible to prevent the by-products generated in the vacuum processing apparatus 100 from being directly attached to the bottom surface of the auxiliary cover 300 exposed in the vacuum processing space S during the vacuum processing.

The upper cover 110 is detachably coupled to the chamber body 120 such that the apparatus installed in the vacuum processing apparatus 100 can be easily repaired or replaced with a new one. In order to detachably mount the upper cover 110 to or separate the upper cover 110 from the chamber main body 120, it is necessary to join the separate mounting unit to the chamber main body 120. Here, the separate mounting unit may be mounted around the chamber body 120. This separate installation unit will be explained later.

The upper cover 110 and the auxiliary cover 300 may be detachably mounted to the chamber body 120 simultaneously or separately.

When the upper cover 110 and the auxiliary cover 300 are separately detachably mounted to the chamber main body 120, the auxiliary cover 300 may be separated from the chamber main body 120 after the upper cover 110 is first separated from the chamber main body 120.

The showerhead unit 210 is detachably mounted to the auxiliary cover 300. Here, the showerhead unit 210 may be separated from the auxiliary cover 300 after the upper cover 110 is first separated from the auxiliary cover 300.

Therefore, unlike the conventional vacuum processing apparatus 100 in which the shower head unit 210 is coupled to the upper cover 110, in the vacuum processing apparatus 100 of the present invention, the upper cover 110 is first separated from the auxiliary cover 300. Then, the shower head unit 210 exposed to the outside is separated from the auxiliary cover 300. Therefore, in the present invention, the showerhead unit 210 can be replaced or repaired without rotating the upper cover 110.

The upper cover 110, the showerhead unit 210, and the auxiliary cover 300 are detachably mountable to and detached from the chamber body 120 in various manners. For example, the upper cover 110, the showerhead unit 210, and the auxiliary cover 300 can be mounted or separated and can be moved in various ways such as up and down movement, upward movement, tilting movement or sliding, or a combination of the above-described movement modes.

At least one of the upper cover 110, the showerhead unit 210, and the auxiliary cover 300 is detachably provided with separate mounting members 521, 522, and 523, such as a ring bolt connected to the traction cable 510 of the crane; and an external separation mounting device. In addition, one or more separate mounting component engaging portions for connecting the separate mounting units may be disposed at different locations, such as the upper cover 110, the showerhead unit 210, and the upper surface, side, and edge portions of the auxiliary cover 300.

The separation mounting member engaging portion may be of a type depending on an external device such as a crane or a separate mounting unit, and may have various configurations depending on the joining method. For example, the split mounting member engaging portion may be formed by internally threaded holes 521a, 522a, and 523a, or auxiliary taps 525, or slots, which pass through the eye bolts engaged with the upper cover 110, the showerhead unit 210, and the auxiliary cover 300. .

The various components of the vacuum processing apparatus 100 of the present invention need to be separated from the vacuum processing apparatus 100 in the following two cases. First, the components need to be split to repair or replace the device, such as the substrate support unit 140 mounted below the showerhead unit 210. Second, the showerhead unit 210 needs to be split for repair or replacement.

"3A" to "3C" and "4A" to "4C" are sectional views of the decomposition process and assembly process of the vacuum processing apparatus of "Fig. 1".

First, in order to repair or replace the device, for example, the substrate supporting unit 140 mounted under the showerhead unit 210, the substrate supporting unit 140, or the electrostatic chuck, the low electrode, etc. mounted on the substrate supporting unit 140 can pass through The decomposition process shown in FIGS. 3A to 3C is separated from the chamber body 120.

As shown in "3A" and "3B", the upper cover 110 is separated by using an external device such as a crane, and then moved to a predetermined position. Next, as shown in "3C", the auxiliary cover 300 and the showerhead unit 210 are separated from the vacuum processing apparatus 100 by using a crane. Here, the showerhead unit 210 can be separated together with the auxiliary cover 300 and can then be separated from the auxiliary cover 300.

Second, when the showerhead unit 210 is replaced or repaired, the auxiliary cover 300 does not have to be separated from the chamber body 120. Therefore, the decomposition process shown in "4A" and "4B" will be performed.

That is, as shown in "FIG. 4A" and "FIG. 4B", the showerhead unit 210 can be separated from the auxiliary cover 300 after the upper cover 110 is separated. Here, when the showerhead unit 210 is composed of the injection plate 211 and the diffusion plate 212, the injection plate 211 and the diffusion plate 212 may be separated from the auxiliary cover 300 sequentially or simultaneously.

In the case where the auxiliary cover 300 needs to be separated, the auxiliary cover 300 is separated after the shower head unit 210 shown in "Fig. 4C" is separated.

5A to 5D are operational side cross-sectional views of an embodiment of a separate mounting unit of the vacuum processing apparatus of "FIG. 1". 6A to 6D are operational side cross-sectional views of another embodiment of the separation mounting unit of the vacuum processing apparatus of "FIG. 1". Fig. 7 is a side cross-sectional view showing an example in which the upper cover is hinged to the chamber main body of the vacuum processing apparatus of Fig. 1.

Unlike the external device, a separate mounting unit such as a crane may be additionally installed to separate the upper cover 110 from the auxiliary cover 300.

The separate mounting unit for separating the upper cover 110 from the chamber main body 120 and moving the upper cover 110 to a predetermined position may have a different configuration. Moreover, the separate mounting unit is configured to move the soil cover 110 for up and down movement and horizontal movement. Here, the upper cover 110 is movable in the up and down direction as it moves in the horizontal direction. And the upper cover 110 can be rotated.

Usually, the crane is installed in a factory in which the vacuum processing apparatus 100 is installed. Therefore, the separate mounting unit can be used as an external device, such as a crane, to separate and install the components of the vacuum processing device 100. Here, the upper cover 110, the showerhead unit 210, and the auxiliary cover 300 may be provided with separate mounting members 521, 522, and 523, such as a ring bolt that is coupled to the traction cable 510 of the crane at the split mounting member engagement portion. The split mounting members 521, 522, and 523 are detachably mounted to the split mounting member engaging portion.

The separation mounting unit may include: an up-and-down moving unit 530 for moving the upper cover 110 up and down with respect to the chamber main body 120; and a horizontal direction moving unit 540 for moving the upper cover 110 in a horizontal direction with respect to the chamber main body 120. Here, the separate mounting unit may be composed only of the up and down moving unit 530.

The split mounting unit upper and lower moving unit 530 and the horizontal moving unit 540 may have different configurations, which will now be described with reference to the drawings.

Referring to FIG. 5A, the up-and-down moving unit 530 is assembled to move the upper cover 110 up and down through the support upper cover 110. The upper cover 110 and the upper and lower moving units 530 are connectable to each other through one or more auxiliary taps 525.

The horizontal direction moving unit 540 may include: a pair of guide rails 541 disposed on both side surfaces of the chamber body 120, thereby moving the up and down moving unit 530 in a horizontal direction; and a driving unit (not shown in the drawing) for The earth cover 110 is moved along the guide rail 541.

As shown in "5A" to "5C", the separation mounting unit is used to separate the upper cover 110 from the auxiliary cover 300 or to join the upper cover 110 to the auxiliary cover 300.

As shown in "5D", the showerhead unit 210 can be separated from the auxiliary cover 300 after the upper cover 110 is first separated from the auxiliary cover 300 by a crane or the like. Of course, the auxiliary cover 300 can be separated simultaneously or separately.

In a variation example of the split mounting unit, the horizontal direction moving unit 540 may include: a pair of upper and lower moving rails 542 disposed on both sides of the chamber body 120 for supporting the upper cover 110 and moving in the up and down direction; and a driving unit (not shown in the drawings) is used to move the earth cover 110 along the up-and-down moving rail 542 after the up-and-down moving rail 542 is raised.

Here, the up-and-down moving unit 530 is configured to be movable up and down to support the upper and lower moving rails 542 of the upper cover 110.

The horizontal direction moving unit 540 may further include a connection rail 543 that is connected to the up and down movement rail 542 after the up and down movement rail 542 is raised, and moves the upper cover 110 along the connection rail 543.

The process of separating the upper cover 110 and the showerhead unit 210 by the separation mounting unit is disclosed in "Fig. 6A" to "6C".

As shown in "Fig. 7", the upper cover 110 can be hinged to one side of the chamber body 120.

In the prior art, since the showerhead unit 210 is attached to the bottom surface of the upper cover 110, the showerhead unit 210 has to be separated from the auxiliary cover 300 after the upper cover 110 is rotated by 180 degrees.

However, in the present invention, the showerhead unit 210 is detachably coupled to the auxiliary cover 300. Therefore, the shower head unit 210 can be easily separated from the auxiliary cover 300 by an external device such as a crane after the upper cover 110 is rotated by the auxiliary separation mounting unit by about 90 degrees. The auxiliary separation mounting unit is composed of a hydraulic cylinder 545 or the like.

Here, the separate mounting unit for separating the upper cover can also be used to separate the auxiliary cover 300 from the chamber body 120.

Although the present invention has been disclosed above in the foregoing embodiments, it is not intended to limit the invention. It is within the scope of the invention to be modified and modified without departing from the spirit and scope of the invention. Please refer to the attached patent application for the scope of protection defined by the present invention.

1. . . Substrate

100. . . Vacuum processing unit

110. . . Upper cover

120. . . Chamber body

121. . . Sealing element

122. . . Sealing element

130. . . Opening

140. . . Substrate support unit

210. . . Shower head unit

211. . . Injection plate

211a. . . Injection hole

211b. . . Projection

211c. . . Sealing element

212. . . Diffuser

212a. . . Through hole

240. . . First shielding element

300. . . Auxiliary cover

310. . . Opening

320. . . Shower head mounting part

321. . . Support part

322. . . Support part

330. . . Cover support part

340. . . Thermal medium channel

350. . . Second shielding element

510. . . Traction cable

521. . . Separate mounting components

521a. . . Internal threaded hole

522. . . Separate mounting components

522a. . . Internal threaded hole

523. . . Separate mounting components

523a. . . Internal threaded hole

525. . . Auxiliary tap

530. . . Moving unit up and down

540. . . Moving unit horizontally

541. . . guide

542. . . Move the track up and down

543. . . Connecting track

545. . . Hydraulic cylinder

S. . . Vacuum processing space

DS1. . . Diffusion space

DS2. . . Diffusion space

Figure 1 is an exploded perspective view of the vacuum processing apparatus of the present invention;

Figure 2 is a cross-sectional view of the vacuum processing apparatus of Figure 1;

3A to 3C and 4A to 4C are cross-sectional views showing a decomposition process and an assembly process of the vacuum processing apparatus of Fig. 1;

5A to 5D are cross-sectional views of the operation side of one embodiment of the separate mounting unit of the vacuum processing apparatus of Fig. 1;

6A to 6C are cross-sectional views of the operation side of another embodiment of the separate mounting unit of the vacuum processing apparatus of Fig. 1;

Fig. 7 is a side cross-sectional view showing an example in which an upper cover is hinged to the chamber main body of the vacuum processing apparatus of Fig. 1.

100. . . Vacuum processing unit

110. . . Upper cover

120. . . Chamber body

121. . . Sealing element

122. . . Sealing element

130. . . Opening

210. . . Shower head unit

211. . . Injection plate

211a. . . Injection hole

211b. . . Projection

211c. . . Sealing element

212. . . Diffuser

212a. . . Through hole

300. . . Auxiliary cover

310. . . Opening

320. . . Shower head mounting part

321. . . Support part

322. . . Support part

330. . . Cover support part

521a. . . Internal threaded hole

522a. . . Internal threaded hole

523a. . . Internal threaded hole

S. . . Vacuum processing space

Claims (24)

A vacuum processing apparatus comprising: a chamber body and an upper cover joined to each other for forming a vacuum processing space, a substrate is vacuum-treated in the vacuum processing space; and a shower head mounted under the upper cover a unit for supplying gas into the vacuum processing space; and an auxiliary cover disposed between the chamber body and the upper cover for supporting an edge portion of the shower head unit; the auxiliary cover comprising: an opening Passing through the opening such that the bottom surface of the showerhead unit can be exposed toward the vacuum processing space; and a cover supporting portion disposed between the upper end of the chamber body and the lower end of the upper cover, and the chamber body a sealing member is interposed between the upper end and the cover supporting portion, and between the bottom end of the upper cover and the cover supporting portion; wherein the upper cover and the auxiliary cover are detachably mounted to the chamber body; Wherein at least one of the upper cover, the showerhead unit and the auxiliary cover is provided with a separate mounting component engaging portion for external use Engaging with the mounting device; and wherein an edge portion of the auxiliary cover and an edge portion of the upper cover extend further outward than an inner wall of the chamber body; an edge portion of the auxiliary cover, an edge portion of the upper cover And an upper end of the chamber body overlaps in a vertical direction. The vacuum processing apparatus of claim 1, wherein the vacuum processing apparatus is shaped as Rectangular shape with a single side length greater than 1300 mm. The vacuum processing apparatus of claim 1, wherein the auxiliary cover is integrally formed with the showerhead unit or a portion of the showerhead unit. The vacuum processing apparatus of claim 1, wherein the showerhead unit is mounted at a distance from a bottom surface of the upper cover. The vacuum processing apparatus of claim 1, wherein the upper cover is detachably mounted to the auxiliary cover. The vacuum processing apparatus of claim 1, wherein the auxiliary cover is detachably mounted to the chamber body. The vacuum processing apparatus of claim 1, wherein the showerhead unit is mounted to the auxiliary cover in a detachable manner. A vacuum processing apparatus according to claim 1, wherein the showerhead unit is mounted to be separated upward from the auxiliary cover after the upper cover is separated from the auxiliary cover. The vacuum processing apparatus according to any one of claims 1 to 8, further comprising a cooling plate for cooling the showerhead unit above the showerhead unit, wherein the cooling plate is provided for use with an external A separate mounting component engagement portion that engages the mounting device. The vacuum processing apparatus according to any one of claims 1 to 8, wherein the showerhead unit comprises an injection plate having a plurality of injection holes through which a gas system is injected into the vacuum processing space. The vacuum processing apparatus of claim 10, wherein the showerhead unit further comprises one or more diffusion plates detachably coupled to the injection plate and The upper surface of the injection plate is spaced apart by a distance to form one or more diffusion spaces for gas diffusion, and wherein the injection plate is associated with one or more diffusion plates for engagement with an external separate mounting device The mounting component engaging portion is separated. The vacuum processing apparatus according to any one of claims 1 to 8, wherein the auxiliary cover comprises: a showerhead mounting portion extending from the cover supporting portion for supporting an edge portion of the showerhead unit, And the shower head mounting portion has the opening. The vacuum processing apparatus of claim 1, wherein the opening portion of the showerhead mounting portion is formed to be smaller than a substrate supporting unit mounted on the chamber body, thereby mounting a substrate thereon. The vacuum processing apparatus of claim 12, wherein the showerhead mounting portion is formed in a stepped shape downward from an upper surface of the cover supporting portion to be spaced apart from a bottom surface of the upper cover. The vacuum processing apparatus according to any one of claims 1 to 8, wherein a first shielding member is mounted between an edge portion of the bottom surface of the showerhead unit and the bottom surface of the auxiliary cover, thereby protecting the vacuum A portion of the treatment space is not plasmad. A vacuum processing apparatus according to any one of claims 1 to 8, wherein the auxiliary cover is provided with a heat medium passage for temperature control. A vacuum processing apparatus according to any one of claims 1 to 8, wherein a second screen A shielding element is detachably coupled to the auxiliary cover for protecting the surface of the auxiliary cover exposed to the vacuum processing space from being plasmad. The vacuum processing apparatus according to any one of claims 1 to 8, further comprising a separate mounting unit for separating the upper cover from the auxiliary cover or joining the upper cover to the auxiliary cover. The vacuum processing apparatus of claim 18, wherein the separate mounting unit comprises a horizontal direction moving unit for moving the upper cover in a horizontal direction relative to the chamber body. The vacuum processing apparatus of claim 18, wherein the separate mounting unit comprises: an up and down moving unit for moving the upper cover up and down relative to the chamber body; and a horizontal moving unit for making The upper cover moves in a horizontal direction relative to the chamber body. The vacuum processing apparatus of claim 20, wherein the up-and-down moving unit is mounted to move the upper cover in an up-and-down direction by supporting the upper cover, and wherein the horizontally-moving unit comprises: a pair of the mounting body Guide rails on both sides of the main body of the chamber, along which the up and down moving units are movable in a horizontal direction; and a driving unit for moving the upper cover along the rails. The vacuum processing apparatus of claim 20, wherein the horizontally moving unit comprises: a pair of up and down moving rails mounted on both sides of the main body of the chamber for moving the upper cover up and down by supporting the upper cover; and a driving unit for extending the up and down moving rails along the The upper and lower moving rails move the upper cover, and wherein the upper and lower moving units are configured to move the upper and lower moving rails up and down, and the upper cover is supported by the upper and lower moving rails. The vacuum processing apparatus of claim 22, wherein the separate mounting unit is further configured with a plurality of connecting rails for moving the upper and lower moving rails by being connected to the upper and lower moving rails The upper cover. The vacuum processing apparatus of any one of claims 1 to 8, wherein the upper cover is hinged to a side of the chamber body.