TWI495034B - - Google Patents
Info
- Publication number
- TWI495034B TWI495034B TW101143552A TW101143552A TWI495034B TW I495034 B TWI495034 B TW I495034B TW 101143552 A TW101143552 A TW 101143552A TW 101143552 A TW101143552 A TW 101143552A TW I495034 B TWI495034 B TW I495034B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210022296.8A CN102789949B (zh) | 2012-02-01 | 2012-02-01 | 一种等离子反应器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201334113A TW201334113A (zh) | 2013-08-16 |
| TWI495034B true TWI495034B (https=) | 2015-08-01 |
Family
ID=47155325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101143552A TW201334113A (zh) | 2012-02-01 | 2012-11-21 | 一種設有埋入射頻電極的靜電吸盤 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102789949B (https=) |
| TW (1) | TW201334113A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104112638B (zh) * | 2013-04-22 | 2017-07-18 | 中微半导体设备(上海)有限公司 | 一种等离子体反应室及其静电夹盘 |
| CN110600357B (zh) * | 2019-11-14 | 2020-03-31 | 北京北方华创微电子装备有限公司 | 用等离子体加工系统进行加工的方法及等离子体加工系统 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200845090A (en) * | 2007-01-30 | 2008-11-16 | Applied Materials Inc | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources |
| TW201013830A (en) * | 2008-09-19 | 2010-04-01 | Ips Ltd | Electrostatic chuck and manufacturing method for the same |
| TW201016078A (en) * | 2008-06-23 | 2010-04-16 | Applied Materials Inc | Cathode with inner and outer electrodes at different heights |
| TW201041082A (en) * | 2009-05-15 | 2010-11-16 | Advanced Micro Fab Equip Inc | Electrostatic chuck device, plasma processing apparatus and manufacturing method for electrostatic chuck |
| TW201101414A (en) * | 2009-04-24 | 2011-01-01 | Applied Materials Inc | Substrate support having side gas outlets and methods |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3847363B2 (ja) * | 1996-02-02 | 2006-11-22 | 富士通株式会社 | 半導体ウェハ処理装置及び半導体ウェハ処理方法 |
| US6741446B2 (en) * | 2001-03-30 | 2004-05-25 | Lam Research Corporation | Vacuum plasma processor and method of operating same |
| US20050130620A1 (en) * | 2003-12-16 | 2005-06-16 | Andreas Fischer | Segmented radio frequency electrode apparatus and method for uniformity control |
| US20070215284A1 (en) * | 2006-03-16 | 2007-09-20 | Tokyo Electron Limited | Plasma processing apparatus and electrode assembly for plasma processing apparatus |
| JP5233092B2 (ja) * | 2006-08-10 | 2013-07-10 | 東京エレクトロン株式会社 | プラズマ処理装置用の載置台及びプラズマ処理装置 |
| JP2008103403A (ja) * | 2006-10-17 | 2008-05-01 | Tokyo Electron Ltd | 基板載置台及びプラズマ処理装置 |
| CN102098862A (zh) * | 2009-12-10 | 2011-06-15 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种下电极装置及应用该下电极装置的等离子体处理设备 |
-
2012
- 2012-02-01 CN CN201210022296.8A patent/CN102789949B/zh active Active
- 2012-11-21 TW TW101143552A patent/TW201334113A/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200845090A (en) * | 2007-01-30 | 2008-11-16 | Applied Materials Inc | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources |
| TW201016078A (en) * | 2008-06-23 | 2010-04-16 | Applied Materials Inc | Cathode with inner and outer electrodes at different heights |
| TW201013830A (en) * | 2008-09-19 | 2010-04-01 | Ips Ltd | Electrostatic chuck and manufacturing method for the same |
| TW201101414A (en) * | 2009-04-24 | 2011-01-01 | Applied Materials Inc | Substrate support having side gas outlets and methods |
| TW201041082A (en) * | 2009-05-15 | 2010-11-16 | Advanced Micro Fab Equip Inc | Electrostatic chuck device, plasma processing apparatus and manufacturing method for electrostatic chuck |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201334113A (zh) | 2013-08-16 |
| CN102789949B (zh) | 2015-06-24 |
| CN102789949A (zh) | 2012-11-21 |